TWI603159B - Dust removing device and dust removing method of exposure device - Google Patents
Dust removing device and dust removing method of exposure device Download PDFInfo
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- TWI603159B TWI603159B TW102123760A TW102123760A TWI603159B TW I603159 B TWI603159 B TW I603159B TW 102123760 A TW102123760 A TW 102123760A TW 102123760 A TW102123760 A TW 102123760A TW I603159 B TWI603159 B TW I603159B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Cleaning In General (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Description
本發明係有關於一種將圖樣曝光至感光性基板的曝光裝置，且特別有關於其除塵裝置及除塵方法。 The present invention relates to an exposure apparatus for exposing a pattern to a photosensitive substrate, and more particularly to a dust removing apparatus and a dust removing method therefor.
印刷基板、半導體基板等的各種基板的製造中廣泛地使用曝光裝置，利用光微影技術，在塗布光阻(感光材料)的工件(感光性基板)上曝光既定的圖樣，之後再透過蝕刻步驟在工件上形成圖樣。這種曝光裝置有各種廣為人知的曝光方式，包括緊密接觸光罩與工件後曝光的接觸式曝光、光罩與工件不接觸的接近式曝光與投影式曝光、沒有光罩的直接曝光等。另外也有在工件的兩面進行曝光的兩面曝光、僅在單面進行曝光的單面曝光等曝光方式。 In the manufacture of various substrates such as a printed substrate and a semiconductor substrate, an exposure apparatus is widely used, and a predetermined pattern is exposed on a workpiece (photosensitive substrate) coated with a photoresist (photosensitive material) by photolithography, and then an etching step is performed. A pattern is formed on the workpiece. Such exposure devices have a variety of well-known exposure modes, including contact exposure with close contact between the reticle and the workpiece, proximity exposure and projection exposure where the reticle is not in contact with the workpiece, direct exposure without a reticle, and the like. There are also exposure methods such as double-sided exposure for exposure on both sides of the workpiece, and single-sided exposure for exposure on only one side.
不管是使用哪一種曝光方式的曝光裝置，當在外部環境下被塵埃、碎屑或異物(以下將這些東西簡稱為「塵埃」)等污染的工件進入曝光裝置時，污染的工件本身會發生曝光缺陷、顯像缺陷。另外，在載置工件的曝光桌或使用光罩的裝置中，塵埃也會轉移於光罩上，同樣可能成為曝光缺陷或顯像缺陷的原因。再者，來自工件的光阻的塵埃也會產生同樣的問題。 Regardless of the exposure mode in which the exposure method is used, when a contaminated workpiece such as dust, debris, or foreign matter (hereinafter referred to as "dust") enters the exposure device in an external environment, the contaminated workpiece itself may be exposed. Defects, imaging defects. In addition, in an exposure table on which a workpiece is placed or a device using a reticle, dust is also transferred to the reticle, which may also be a cause of exposure defects or development defects. Furthermore, the dust from the photoresist of the workpiece will also cause the same problem.
[先行技術文獻] [Advanced technical literature]
[專利文獻] [Patent Literature]
[專利文獻1]特開2002-162749號公報 [Patent Document 1] JP-A-2002-162749
[專利文獻2]特開2007-25436號公報 [Patent Document 2] JP-A-2007-25436
[專利文獻3]特開2009-157249號公報 [Patent Document 3] JP-A-2009-157249
為了對上述的曝光裝置的除塵對象物(工件、曝光桌或光罩)進行除塵，專利文獻1、2、3提出了一種除塵裝置，使用周面具有黏著材料的除塵滾輪(黏著滾輪)在除塵對象物表面轉動。 In order to dedust the dust-removing object (workpiece, exposure table, or reticle) of the above-described exposure apparatus, Patent Documents 1, 2, and 3 propose a dust removing device that uses a dust removing roller (adhesive roller) having an adhesive material on the circumferential surface to perform dust removal. The surface of the object rotates.
然而，專利文獻1的除塵裝置在除塵滾輪於光罩與曝光桌上轉動時，一時附著於除塵滾輪上的塵埃可能再次移動(再附著)回光罩或曝光桌。專利文獻2的除塵裝置分別設置了光罩除塵用的除塵滾輪與曝光桌除塵用的除塵滾輪，但同樣地，一時附著於除塵滾輪上的塵埃可能再次移動(再附著)回光罩或曝光桌。專利文獻3的除塵滾輪因為將分別對工件、曝光桌及光罩除塵的除塵滾輪設置於1個清潔單元上，所以會造成裝置變大、變重。另外，與專利文獻1、2的除塵裝置不同地，會有無法與工件的搬運裝置兼用的問題。 However, in the dust removing device of Patent Document 1, when the dust removing roller is rotated on the reticle and the exposure table, the dust adhering to the dust removing roller at a time may move (reattach) to the reticle or the exposure table again. In the dust removing device of Patent Document 2, the dust removing roller for dust removal of the mask and the dust removing roller for dust removal of the exposure table are separately provided, but in the same manner, the dust attached to the dust removing roller may be moved (reattached) to the mask or the exposure table again. . In the dust removing roller of Patent Document 3, since the dust removing roller that separates the workpiece, the exposure table, and the reticle is disposed on one cleaning unit, the device becomes large and heavy. Further, unlike the dust removing devices of Patent Documents 1 and 2, there is a problem that it cannot be used together with the conveying device of the workpiece.
本發明基於習知裝置以上的問題，提出一種曝光裝置的除塵裝置及除塵方法，在除塵時附著於除塵滾輪的被除去的塵埃、碎屑或異物等不會再附著於除塵對象物上。 The present invention proposes a dust removing device and a dust removing method for an exposure device based on the above problems of the conventional device, and the removed dust, debris, foreign matter, and the like adhering to the dust removing roller during dust removal do not adhere to the dust removing object.
本發明的曝光裝置的除塵裝置，用於曝光圖樣於 感光性基板的曝光裝置中，包括：除塵滾輪，其周面可接近或遠離該曝光裝置內的除塵對象物的除塵表面；以及移動機構，一邊使該除塵轉輪的周面接觸該除塵對象物的除塵表面，一邊使該除塵滾輪與該除塵對象物產生相對移動，來轉動除塵滾輪。該除塵滾輪的週長設定在比該除塵滾輪的周面與該除塵對象物的除塵表面之間因為該移動機構而相對移動時的接觸移動距離來得長。 The dust removing device of the exposure device of the present invention is used for exposing a pattern to An exposure apparatus for a photosensitive substrate includes: a dust removing roller having a circumferential surface that is close to or away from a dust removing surface of a dust removing object in the exposure device; and a moving mechanism that brings the circumferential surface of the dust removing wheel into contact with the dust removing object The dust removing surface rotates the dust removing roller while causing the dust removing roller to move relative to the dust removing object. The circumferential length of the dust removing roller is set to be longer than the contact moving distance between the circumferential surface of the dust removing roller and the dust removing surface of the dust removing object due to the moving mechanism.
該除塵滾輪可以有複數個，分別在將單一除塵對象物的除塵表面分割為複數個的分割除塵表面上轉動，其中各除塵滾輪的週長設定在比各除塵滾輪的周面與各分割除塵表面的接觸移動距離來得長。 The dust removing roller may have a plurality of pieces, and the dust removing surface of the single dust removing object is divided into a plurality of divided dust removing surfaces, wherein the circumference of each dust removing roller is set to be smaller than the circumferential surface of each dust removing roller and each divided dust removing surface. The contact moves a long distance.
該除塵滾輪可具備第1、第2除塵滾輪，分別在將單一除塵對象物的除塵表面分割為2個的第1、第2分割除塵表面上轉動，其中該第1除塵滾輪的週長設定在比該第1除塵滾輪的周面與該第1分割除塵表面的接觸移動距離來得長，該第2除塵滾輪的週長設定在比該第2除塵滾輪的周面與該第2分割除塵表面的接觸移動距離來得長。 The dust removing roller may include first and second dust removing rollers, and each of the first and second divided dust removing surfaces that divide the dust removing surface of the single dust removing object into two, wherein the circumference of the first dust removing roller is set at The distance between the circumferential surface of the first dust removing roller and the first divided dust removing surface is longer, and the circumferential length of the second dust removing roller is set to be larger than the circumferential surface of the second dust removing roller and the second divided dust removing surface. The contact distance is long.
本發明的曝光裝置的除塵裝置可更包括：控制部，交互地進行該第1除塵滾輪在第1分割除塵表面上的轉動以及該第2除塵滾輪在第2分割除塵表面上的轉動。 The dust removing device of the exposure apparatus according to the present invention may further include a control unit that alternately rotates the first dust removing roller on the first divided dust removing surface and the second dust removing roller on the second divided dust removing surface.
該除塵滾輪可由在單一除塵對象物的全除塵表面上轉動的單一滾輪所組成。 The dust removing roller may be composed of a single roller that rotates on a full dust removing surface of a single dust removing object.
該移動機構可兼具保持該感光性基板並移動的工件移動機構的功能。 This moving mechanism can function as a workpiece moving mechanism that holds the photosensitive substrate and moves.
該除塵對象物可包括感光性基板、曝光桌及光罩中的一者以上。 The dust-removing object may include one or more of a photosensitive substrate, an exposure table, and a photomask.
本發明的曝光裝置的除塵裝置可更包括：集塵裝置，收集附著於該除塵滾輪上的塵埃。 The dust removing device of the exposure apparatus of the present invention may further include: a dust collecting device that collects dust attached to the dust removing roller.
本發明的曝光裝置的除塵方法，包括：將除塵滾輪的周面接觸於曝光裝置內的除塵對象物的表面並使該除塵滾輪轉動而除塵的除塵步驟；以及清掃除塵步驟後的該除塵滾輪的周面的清掃步驟，其中該除塵步驟與該清掃步驟交替進行，且在1次除塵步驟中以該除塵滾輪的周面上的同一部分不會接觸該除塵對象物的除塵表面2次的方式除塵(除塵滾輪以不轉動完一圈的方式除塵)。 The dust removing method of the exposure apparatus of the present invention includes: a dust removing step of bringing the circumferential surface of the dust removing roller into contact with the surface of the dust removing object in the exposure device and rotating the dust removing roller; and removing the dust removing roller after the dust removing step a cleaning step of the circumferential surface, wherein the dust removing step and the cleaning step are alternately performed, and in the dust removing step, the same portion of the surface of the dust removing roller does not contact the dust removing surface of the dust removing object twice for dust removal. (The dust removing roller removes dust in a way that does not rotate one turn).
根據本發明，在除塵中除塵滾輪的同一部分不會接觸除塵對象物的除塵表面兩次(除塵滾輪以不轉動完一圈的方式除塵)。因此，除塵時附著於除塵滾輪的被除去的塵埃、碎屑或異物等不會再附著於除塵對象物上，能夠預先防止起因於再附著的曝光缺陷、或顯像缺陷。 According to the present invention, the same portion of the dust removing roller in the dust removing does not contact the dust removing surface of the dust removing object twice (the dust removing roller removes dust in such a manner that it does not rotate one turn). Therefore, the removed dust, debris, foreign matter, and the like adhering to the dust removing roller during dust removal do not adhere to the dust removing object, and exposure defects or development defects caused by reattachment can be prevented in advance.
EX‧‧‧曝光裝置 EX‧‧‧Exposure device
W‧‧‧工件(感光性基板、除塵對象物) W‧‧‧Workpiece (photosensitive substrate, dust removal target)
WS‧‧‧除塵表面 WS‧‧‧dust surface
WS1‧‧‧第1除塵表面(分割除塵表面) WS1‧‧‧1st dust removal surface (divided dust removal surface)
WS2‧‧‧第2除塵表面(分割除塵表面) WS2‧‧‧2nd dust removal surface (divided dust removal surface)
P‧‧‧吸附墊 P‧‧‧Adsorption pad
1‧‧‧投入部 1‧‧‧Investment Department
1a‧‧‧平台 1a‧‧‧ platform
2‧‧‧第1曝光部 2‧‧‧1st exposure department
3‧‧‧反轉部 3‧‧‧Reversal Department
4‧‧‧第2曝光部 4‧‧‧2nd exposure department
5‧‧‧排出部 5‧‧‧Exporting Department
5a‧‧‧平台 5a‧‧‧ platform
6‧‧‧第1搬運機(工件移動機構) 6‧‧‧1st transporter (workpiece moving mechanism)
6a‧‧‧搬入搬運機 6a‧‧‧ moving into the handler
6b‧‧‧搬出搬運機 6b‧‧‧Moving out the carrier
7‧‧‧第2搬運機(工件移動機構) 7‧‧‧2nd transporter (workpiece moving mechanism)
7a‧‧‧搬入搬運機 7a‧‧‧ moving into the handler
7b‧‧‧搬出搬運機 7b‧‧‧Moving out the carrier
8‧‧‧曝光桌(除塵對象物) 8‧‧‧Exposure table (dust removal object)
8S‧‧‧除塵表面 8S‧‧‧Dust surface
8S1‧‧‧第1除塵表面(分割除塵表面) 8S1‧‧‧1st dust removal surface (divided dust removal surface)
8S2‧‧‧第2除塵表面(分割除塵表面) 8S2‧‧‧2nd dust removal surface (divided dust removal surface)
9‧‧‧反轉裝置 9‧‧‧Reversal device
10‧‧‧光罩(除塵對象物) 10‧‧‧Photomask (dust removal object)
10S‧‧‧除塵表面 10S‧‧‧Dust surface
10S1‧‧‧第1除塵表面(分割除塵表面) 10S1‧‧‧1st dust removal surface (divided dust removal surface)
10S2‧‧‧第2除塵表面(分割除塵表面) 10S2‧‧‧2nd dust removal surface (divided dust removal surface)
12‧‧‧除塵裝置(清潔單元) 12‧‧‧Dust removal device (cleaning unit)
12a‧‧‧第1除塵裝置 12a‧‧‧1st dust removal device
12b‧‧‧第2除塵裝置 12b‧‧‧2nd dust removal device
14‧‧‧光源 14‧‧‧Light source
16a‧‧‧第1除塵滾輪 16a‧‧‧1st dust removal roller
16ar‧‧‧第1除塵滾輪的週長(有效徑) 16ar‧‧‧The circumference of the first dust removal roller (effective diameter)
16b‧‧‧第2除塵滾輪 16b‧‧‧2nd dust removal roller
16br‧‧‧第2除塵滾輪的週長(有效徑) 16br‧‧‧The circumference of the second dust removal roller (effective diameter)
16c‧‧‧控制部 16c‧‧‧Control Department
17‧‧‧框架 17‧‧‧Frame
18‧‧‧轉印滾輪(集塵裝置) 18‧‧‧Transfer roller (dust collecting device)
19‧‧‧導引軌道 19‧‧‧Guided orbit
20‧‧‧搬運框架(移動機構、工件移動機構) 20‧‧‧Transportation frame (moving mechanism, workpiece moving mechanism)
21‧‧‧導引軌道 21‧‧‧Guided track
22‧‧‧y方向移動桌 22‧‧‧y direction mobile table
23‧‧‧接續框架 23‧‧‧Continuous framework
24‧‧‧導引軌道 24‧‧‧Guided track
25‧‧‧z方向移動桌 25‧‧‧z moving table
26‧‧‧支柱 26‧‧‧ pillar
27‧‧‧驅動馬達 27‧‧‧Drive motor
28‧‧‧除電器 28‧‧‧Removal
第1圖係本發明一實施例的曝光裝置的除塵裝置的概略構造之側面透視圖。 Fig. 1 is a side perspective view showing a schematic configuration of a dust removing device of an exposure apparatus according to an embodiment of the present invention.
第2圖係除塵裝置(清潔單元)的詳細構造的平面圖。 Fig. 2 is a plan view showing the detailed structure of the dust removing device (cleaning unit).
第3圖係除塵裝置(清潔單元)的詳細構造的側面圖。 Fig. 3 is a side view showing the detailed structure of the dust removing device (cleaning unit).
第4圖係顯示除塵滾輪與轉印滾輪之間的位置關係的兩面 圖。 Figure 4 shows the two sides of the positional relationship between the dust removing roller and the transfer roller. Figure.
第5圖係顯示第1除塵滾輪與第2除塵滾輪的週長(有效徑)與做為除塵對象物的工件的除塵表面之間的關係。 Fig. 5 is a view showing the relationship between the circumference (effective diameter) of the first dust removing roller and the second dust removing roller and the dust removing surface of the workpiece as the object to be dust-removed.
第6圖係顯示第1除塵滾輪與第2除塵滾輪的週長(有效徑)與做為除塵對象物的曝光桌的除塵表面之間的關係。 Fig. 6 is a view showing the relationship between the circumference (effective diameter) of the first dust removing roller and the second dust removing roller and the dust removing surface of the exposure table as the object to be dust-removed.
第7圖係顯示第1除塵滾輪與第2除塵滾輪的週長(有效徑)與做為除塵對象物的光罩的除塵表面之間的關係。 Fig. 7 is a view showing the relationship between the circumference (effective diameter) of the first dust removing roller and the second dust removing roller and the dust removing surface of the mask as the object to be dust-removed.
第8圖係顯示曝光裝置的除塵裝置的動作的第1步驟圖。 Fig. 8 is a first step view showing the operation of the dust removing device of the exposure apparatus.
第9圖係顯示曝光裝置的除塵裝置的動作的第2步驟圖。 Fig. 9 is a second step view showing the operation of the dust removing device of the exposure apparatus.
第10圖係顯示曝光裝置的除塵裝置的動作的第3步驟圖。 Fig. 10 is a third step view showing the operation of the dust removing device of the exposure apparatus.
第11圖係顯示曝光裝置的除塵裝置的動作的第4步驟圖。 Fig. 11 is a fourth step view showing the operation of the dust removing device of the exposure apparatus.
第12圖係顯示曝光裝置的除塵裝置的動作的第5步驟圖。 Fig. 12 is a fifth step view showing the operation of the dust removing device of the exposure apparatus.
第13圖係顯示曝光裝置的除塵裝置的動作的第6步驟圖。 Fig. 13 is a sixth step diagram showing the operation of the dust removing device of the exposure apparatus.
第14圖係顯示曝光裝置的除塵裝置的動作的第7步驟圖。 Fig. 14 is a seventh step view showing the operation of the dust removing device of the exposure apparatus.
以下，參照第1至14圖，說明本發明的曝光裝置的除塵裝置的一實施例。本實施例適用於以將光罩與工件緊密接觸而進行曝光的接觸式曝光方式來對工件兩面曝光的曝光裝置EX。以下說明的的x、y、z的各方向以圖中所示的箭頭方向為準。 Hereinafter, an embodiment of the dust removing device of the exposure apparatus of the present invention will be described with reference to Figs. 1 to 14. This embodiment is applied to an exposure apparatus EX that exposes both sides of a workpiece by a contact exposure method in which a reticle is brought into close contact with a workpiece to perform exposure. The respective directions of x, y, and z described below are based on the direction of the arrow shown in the drawing.
本實施例使用的工件(感光性基板、除塵對象物)W由平面基材所組成，其兩面分別積層了通過曝光及蝕刻處理後所殘留的做為電路配線的金屬膜以及光阻層。 The workpiece (photosensitive substrate, dust-removing object) W used in the present embodiment is composed of a planar base material, and a metal film and a photoresist layer which are circuit wirings which are left after exposure and etching treatment are laminated on both surfaces thereof.
<曝光裝置的全體構造> <Overall construction of exposure apparatus>
如第1圖所示，曝光裝置EX由第1圖的左側至右側依序具備投入部1、第1曝光部2、反轉部3、第2曝光部4、及排出部5。 As shown in Fig. 1, the exposure apparatus EX includes the input unit 1, the first exposure unit 2, the inversion unit 3, the second exposure unit 4, and the discharge unit 5 in this order from the left side to the right side of Fig. 1 .
投入部1是將未曝光的工件(感光性基板、除塵對象物)W從曝光裝置EX的外部搬入內部的搬入口。投入部1設置有平台1a，用來載置作業者或搬運裝置(未圖示)搬入的工件W。 The input unit 1 is a transfer port that carries an unexposed workpiece (photosensitive substrate, dust removal target) W from the outside of the exposure device EX. The input unit 1 is provided with a stage 1a for placing a workpiece W carried by an operator or a conveyance device (not shown).
第1曝光部2是用來對未曝光的工件W的第1面(上面)曝光的曝光裝置。第1曝光部2具備載置工件W的曝光桌(除塵對象物)8、位於曝光桌8上方並描繪有既定圖樣的光罩(除塵對象物)10、位於光罩10上方的光源14。第1曝光部2具備升降機構(未圖示)，使曝光桌8相對光罩10升降。當曝光桌8藉由此升降機構朝光罩10上升時，載置於曝光桌8的工件W的第1面(上面)會與光罩10緊密接觸。在工件W與光罩10緊密接觸的狀態下，光源14照射會使工件W的光阻層感光的波長帶的光(例如紫外光)，使描繪於光罩10的既定圖樣曝光至工件W的第1面(上面)的光阻層。另外，曝光桌8的上面形成有多個吸引口(未圖示)，透過此吸引口抽氣，使工件W吸附固定於曝光桌8的表面。 The first exposure unit 2 is an exposure device for exposing the first surface (upper surface) of the unexposed workpiece W. The first exposure unit 2 includes an exposure table (dusting object) 8 on which the workpiece W is placed, a mask (dusting object) 10 that is positioned above the exposure table 8 and has a predetermined pattern, and a light source 14 that is positioned above the mask 10 . The first exposure unit 2 includes an elevating mechanism (not shown) to elevate and lower the exposure table 8 with respect to the reticle 10. When the exposure table 8 is raised toward the photomask 10 by the elevating mechanism, the first surface (upper surface) of the workpiece W placed on the exposure table 8 comes into close contact with the photomask 10. In a state where the workpiece W is in close contact with the reticle 10, the light source 14 illuminates light of a wavelength band (for example, ultraviolet light) that causes the photoresist layer of the workpiece W to be exposed, and exposes a predetermined pattern drawn on the reticle 10 to the workpiece W. The photoresist layer on the first side (upper surface). Further, a plurality of suction ports (not shown) are formed on the upper surface of the exposure table 8, and the workpiece W is suction-fixed and fixed to the surface of the exposure table 8 through the suction port.
反轉部3具備反轉裝置9，將第1面(上面)被第1曝光部2曝光的工件W上下反轉。藉由反轉部3(反轉裝置9)反轉工件W的上下面，使已曝光的工件W的第1面朝下，未曝光的工件W的第2面朝上。 The inverting unit 3 includes an inverting device 9 that vertically inverts the workpiece W exposed by the first exposure unit 2 on the first surface (upper surface). The upper and lower surfaces of the workpiece W are reversed by the inverting portion 3 (reversing device 9) so that the first surface of the exposed workpiece W faces downward, and the second surface of the unexposed workpiece W faces upward.
第2曝光部4是用來對第1面(下面)已曝光的工件 W的第2面(上面)曝光的曝光裝置。第2曝光裝置4的構造與第1曝光部2的構造相同，因此標記相同符號並省略說明。 The second exposure unit 4 is a workpiece for exposing the first surface (lower surface) Exposure device for exposure of the second side (upper surface) of W. Since the structure of the second exposure device 4 is the same as that of the first exposure unit 2, the same reference numerals will be given thereto, and the description thereof will be omitted.
排出部5是將兩面被第1曝光部2與第2曝光部4曝光的工件W從曝光裝置EX的內部搬出外部的搬出口。排出部5設置有平台5a，用以載置已曝光的工件W，平台5a載置的工件W被作業者或搬運裝置(未圖示)搬出。 The discharge unit 5 is an unloading port that carries the workpiece W exposed on both sides by the first exposure unit 2 and the second exposure unit 4 from the inside of the exposure apparatus EX. The discharge unit 5 is provided with a stage 5a for placing the exposed workpiece W, and the workpiece W placed on the stage 5a is carried out by an operator or a conveyance device (not shown).
曝光裝置EX具備第1搬運機(工件移動機構)6，保持工件W並將其依序從投入部1移動至第1曝光部2與反轉部3。第1搬運機6具備兩個獨立的構成元件：搬入搬運機6a，將工件W從投入部1A移動至第1曝光部2的曝光桌8；以及搬出搬運機6b，將工件W從第1曝光部2的曝光桌8移動至反轉部3的反轉裝置9。搬入搬運機6a與搬出搬運機6b具有吸附墊P(第2、3圖)，可自由地吸附或脫離工件W。搬入搬運機6a與搬出搬運機6b可藉由後述的搬運框架20各自獨立地朝第1圖中的左右方向移動。 The exposure apparatus EX includes a first transporter (work moving mechanism) 6, holds the workpiece W, and sequentially moves it from the input unit 1 to the first exposure unit 2 and the reversing unit 3. The first conveyor 6 includes two independent components: a loading conveyor 6a, a workpiece W moving from the input unit 1A to the exposure table 8 of the first exposure unit 2, and a transporting machine 6b, and the workpiece W is exposed from the first exposure. The exposure table 8 of the portion 2 moves to the inverting device 9 of the inverting portion 3. The carry-in conveyor 6a and the carry-out transporter 6b have the adsorption pad P (Figs. 2 and 3), and can freely adsorb or detach the workpiece W. The carry-in conveyor 6a and the carry-out transporter 6b can be independently moved to the left-right direction in FIG. 1 by the conveyance frame 20 mentioned later.
曝光裝置EX具備第2搬運機(工件移動機構)7，保持工件W並將其依序從反轉部3移動至第2曝光部4與排出部5。第2搬運機7具備兩個獨立的構成元件：搬入搬運機7a，將工件W從反轉部3的反轉裝置9移動至第2曝光部4的曝光桌8；以及搬出搬運機7b，將工件W從第2曝光部4的曝光桌8移動至排出部5的平台5a。搬入搬運機7a與搬出搬運機7b具有吸附墊P(第2、3圖)，可自由地吸附或脫離工件W。搬入搬運機7a與搬出搬運機7b可藉由後述的搬運框架20各自獨立地朝第1圖中的左右方向移動。 The exposure apparatus EX includes a second conveyor (workpiece moving mechanism) 7 that holds the workpiece W and sequentially moves it from the reversing unit 3 to the second exposure unit 4 and the discharge unit 5. The second conveyor 7 includes two independent components: the loading conveyor 7a, the workpiece W is moved from the reversing device 9 of the reversing unit 3 to the exposure table 8 of the second exposure unit 4, and the transporting machine 7b is carried out. The workpiece W is moved from the exposure table 8 of the second exposure unit 4 to the stage 5a of the discharge unit 5. The carry-in conveyor 7a and the carry-out transporter 7b have the adsorption pad P (second and third figures), and can freely adsorb or detach the workpiece W. The carry-in conveyor 7a and the carry-out transporter 7b can be independently moved to the left-right direction in FIG. 1 by the conveyance frame 20 mentioned later.
<除塵裝置的構造> <Configuration of dust removal device>
第1曝光部2及第2曝光部4分別設有相同結構的除塵裝置(清潔單元)12。第2、3圖中，僅畫出設置於第1曝光部2的除塵裝置12，對應第2曝光部4的構成元件的符號表示於括號內。 Each of the first exposure unit 2 and the second exposure unit 4 is provided with a dust removing device (cleaning unit) 12 having the same configuration. In the second and third figures, only the dust removing device 12 provided in the first exposure unit 2 is shown, and the symbols corresponding to the constituent elements of the second exposure unit 4 are shown in parentheses.
如第2、3圖所示，除塵裝置12具備彼此相對的第1除塵裝置12a與第2除塵裝置12b。 As shown in FIGS. 2 and 3, the dust removing device 12 includes a first dust removing device 12a and a second dust removing device 12b that face each other.
第1除塵裝置12a與第2除塵裝置12b被配置於第1曝光部2(第2曝光部4)內的搬運框架20所保持。搬運框架20具備：一對導引軌道21，是沿著y方向(工件搬運方向)延伸的固定構件；一對y方向移動桌22，被上述一對導引軌道21所支持並可自由地在y方向(工件搬運方向)滑動；接續框架23，以跨過上述一對導引軌道21的方式架設於y方向移動桌22上並且沿著x方向延伸；一對z方向移動桌25，被上述一對y方向移動桌22所支持並可自由地在z方向(重力方向)滑動；以及一對支柱26，以從上述一對z方向移動桌25朝y方向彼此靠近的方式突出形成。一對z方向移動桌25被延伸於z方向(重力方向)的一對導引軌道24(固定構件)所支持並可自由地滑動。y方向移動桌22與z方向移動桌25根據未圖示的制動器相對於導引軌道21與導引軌道24滑動來決定位置。 The first dust removing device 12a and the second dust removing device 12b are held by the transport frame 20 disposed in the first exposure unit 2 (second exposure unit 4). The transport frame 20 includes a pair of guide rails 21 which are fixed members extending in the y direction (work conveyance direction), and a pair of y-direction moving tables 22 supported by the pair of guide rails 21 and freely The y direction (work conveyance direction) slides; the splicing frame 23 is mounted on the y-direction moving table 22 so as to extend across the pair of guide rails 21 and extends along the x direction; and the pair of z-direction movement tables 25 are A pair of y-direction moving tables 22 are supported and are free to slide in the z direction (gravity direction); and a pair of struts 26 are formed to protrude from the pair of z-direction moving tables 25 toward each other in the y direction. The pair of z-direction moving tables 25 are supported by a pair of guiding rails 24 (fixing members) extending in the z direction (gravity direction) and are slidable freely. The y-direction moving table 22 and the z-direction moving table 25 are slid with respect to the guide rail 21 and the guide rail 24 by a brake (not shown) to determine the position.
第1除塵裝置12a具備第1除塵滾輪16a，其旋轉軸朝向x方向。此第1除塵滾輪16a被一對支柱26中一者的前端部所支持並可自由旋轉。第2除塵裝置12b具備第2除塵滾輪16b，其旋轉軸朝向x方向。此第2除塵滾輪16b被一對支柱26中另一者 的前端部所支持並可自由旋轉。第1除塵滾輪16a與第2除塵滾輪16b的外周面形成有黏著材料層。第1除塵滾輪16a與第2除塵滾輪16b的材質能夠配合除塵對象而適當地選擇，一般選擇矽膠類的材質。 The first dust removing device 12a includes a first dust removing roller 16a whose rotation axis faces the x direction. The first dust removing roller 16a is supported by the front end portion of one of the pair of pillars 26 and is rotatable. The second dust removing device 12b includes a second dust removing roller 16b whose rotation axis faces the x direction. The second dust removing roller 16b is the other of the pair of pillars 26 The front end is supported and free to rotate. An adhesive material layer is formed on the outer circumferential surfaces of the first dust removing roller 16a and the second dust removing roller 16b. The materials of the first dust removing roller 16a and the second dust removing roller 16b can be appropriately selected in accordance with the dust removing target, and a silicone rubber material is generally selected.
搬運框架20構成一種移動機構，使第1除塵滾輪16a及第2除塵滾輪16b靠近或遠離除塵對象物的工件W、曝光桌8或光罩10的除塵表面，同時使第1除塵滾輪16a及第2除塵滾輪16b的周面接觸於除塵對象物的除塵表面的方式下旋轉驅動第1除塵滾輪16a及第2除塵滾輪16b，並且讓第1除塵滾輪16a及第2除塵滾輪16b與除塵對象物相對移動。跟隨著搬運框架20的移動，第1除塵滾輪16a及第2除塵滾輪16b在除塵對象物的除塵表面上旋轉移動，因此藉由第1除塵滾輪16a及第2除塵滾輪16b的外周面上黏著材料的黏著力，能夠清除除塵對象物的除塵表面上附著的塵埃。 The transport frame 20 constitutes a moving mechanism, and the first dust removing roller 16a and the second dust removing roller 16b are brought closer to or away from the workpiece W of the dust removing object, the exposure table 8 or the dust removing surface of the reticle 10, and the first dust removing roller 16a and the first (2) The first dust removing roller 16a and the second dust removing roller 16b are rotationally driven while the circumferential surface of the dust removing roller 16b is in contact with the dust removing surface of the dust removing object, and the first dust removing roller 16a and the second dust removing roller 16b are opposed to the dust removing target. mobile. The first dust removing roller 16a and the second dust removing roller 16b are rotatably moved on the dust removing surface of the dust removing target object, and the adhesive material is adhered to the outer peripheral surface of the first dust removing roller 16a and the second dust removing roller 16b. The adhesion is capable of removing dust adhering to the dust-removing surface of the dust-removing object.
曝光裝置EX具備控制部16c，用來控制搬運框架(移動機構)20對第1除塵滾輪16a及第2除塵滾輪16b的驅動。控制部16c使第1除塵滾輪16a在除塵對象物上的轉動與第2除塵滾輪16b在除塵對象物上的轉動交互進行。也就是說，控制部16c控制搬運框架20，不讓第1除塵滾輪16a及第2除塵滾輪16b同時在除塵對象物上轉動。藉此，能夠防止第1除塵滾輪16a及第2除塵滾輪16b在除塵對象物上互相干涉。 The exposure apparatus EX includes a control unit 16c for controlling the driving of the transport frame (moving mechanism) 20 to the first dust removing roller 16a and the second dust removing roller 16b. The control unit 16c causes the rotation of the first dust removing roller 16a on the dust removing target to interact with the rotation of the second dust removing roller 16b on the dust removing target. In other words, the control unit 16c controls the transport frame 20 so that the first dust removing roller 16a and the second dust removing roller 16b are not simultaneously rotated on the dust removing object. Thereby, it is possible to prevent the first dust removing roller 16a and the second dust removing roller 16b from interfering with each other on the dust removing target.
如第2、3圖所示，搬運框架20的一對接續框架23的一者與另一者分別固定著第1搬運機6的搬入搬運機6a與搬出搬運機6b(第2搬運機7的搬入搬運機7a與搬出搬運機7b)， 第1除塵滾輪16a與搬入搬運機6a(搬入搬運機7a)一體地移動，第2除塵滾輪16b與搬入搬運機6b(搬出搬運機7b)一體地移動。也就是說，搬運框架20構成移動第1除塵滾輪16a與第2除塵滾輪16b的移動機構，以及與第1搬運機6及第2搬運機7協動來移動工件W的工件移動機構(兼具移動機構與工件移動機構的功能)。 As shown in FIGS. 2 and 3, the carry-in conveyor 6a and the carry-out transporter 6b of the first transporter 6 are fixed to one of the pair of splice frames 23 of the transport frame 20, respectively (the second transporter 7) Carrying in the transporter 7a and the transporting transporter 7b), The first dust removing roller 16a moves integrally with the loading conveyor 6a (loading conveyor 7a), and the second dust removing roller 16b moves integrally with the loading conveyor 6b (loading conveyor 7b). In other words, the transport frame 20 constitutes a moving mechanism that moves the first dust removing roller 16a and the second dust removing roller 16b, and a workpiece moving mechanism that moves the workpiece W in cooperation with the first conveyor 6 and the second conveyor 7 (both The function of the moving mechanism and the workpiece moving mechanism).
如第1、3、4圖所示，曝光裝置EX具備轉印滾輪(集塵裝置)18，收集第1除塵滾輪16a與第2除塵滾輪16b的外周面上附著的塵埃並清掃外周面。轉印滾輪18被設置在第1曝光部2與第2曝光部4的框架17(是獨立設置的，而不是與搬運框架20設置在一起的)所支持。轉印滾輪18透過鏈條或齒輪等常見的傳遞裝置，被驅動馬達27旋轉驅動，在其外周面纏繞著具有比第1除塵滾輪16a與第2除塵滾輪16b更強的黏著力的膠帶。第1除塵滾輪16a與第2除塵滾輪16b在其清掃位置與轉印滾輪18接觸，由於轉印滾輪18的旋轉而被跟著轉動。結果，附著於第1除塵滾輪16a與第2除塵滾輪16b的外周面的塵埃轉移至轉印滾輪18的表面而被回收。以這樣的方式被轉印滾輪18回收的塵埃可藉由從轉印滾輪18外周面剝掉一圈黏著膠帶而廢棄。為了剝除或轉印滾輪更換的便利性，框架17的基部設置有導引軌道19，藉由拔除未圖示的卡榫能夠將轉印滾輪18拉出至作業者側。框架17又設置有除電器28，用以當第1除塵滾輪16a與第2除塵滾輪16b位於清掃位置時除去第1除塵滾輪16a與第2除塵滾輪16b的靜電。 As shown in the first, third, and fourth views, the exposure apparatus EX includes a transfer roller (dust collecting device) 18, and collects dust adhering to the outer peripheral surfaces of the first dust removing roller 16a and the second dust removing roller 16b, and cleans the outer peripheral surface. The transfer roller 18 is supported by the frame 17 of the first exposure unit 2 and the second exposure unit 4 (which are provided separately, instead of being disposed with the transport frame 20). The transfer roller 18 is rotatably driven by a drive motor 27 through a common transmission device such as a chain or a gear, and an adhesive tape having a stronger adhesive force than the first dust removing roller 16a and the second dust removing roller 16b is wound around the outer peripheral surface thereof. The first dust removing roller 16a and the second dust removing roller 16b are in contact with the transfer roller 18 at the cleaning position, and are rotated by the rotation of the transfer roller 18. As a result, the dust adhering to the outer peripheral surfaces of the first dust removing roller 16a and the second dust removing roller 16b is transferred to the surface of the transfer roller 18 to be recovered. The dust recovered by the transfer roller 18 in this manner can be discarded by peeling off a ring of adhesive tape from the outer peripheral surface of the transfer roller 18. For the convenience of stripping or transfer roller replacement, the base of the frame 17 is provided with a guide rail 19, and the transfer roller 18 can be pulled out to the operator side by removing a cassette (not shown). The frame 17 is further provided with a neutralizer 28 for removing static electricity of the first dust removing roller 16a and the second dust removing roller 16b when the first dust removing roller 16a and the second dust removing roller 16b are located at the cleaning position.
現在參照第5、6、7圖，關注第1除塵滾輪16a與第 2除塵滾輪16b的週長(有效徑)。第5圖顯示載置於曝光桌8的工件W為除塵對象物的情況，第6圖顯示曝光桌8為除塵對象物的情況，第7圖顯示光罩10為除塵對象物的情況。 Referring now to Figures 5, 6, and 7, attention is paid to the first dust removing roller 16a and the first 2 The circumference (effective diameter) of the dust removing roller 16b. Fig. 5 shows a case where the workpiece W placed on the exposure table 8 is a dust-removing object, Fig. 6 shows a case where the exposure table 8 is a dust-removing object, and Fig. 7 shows a case where the reticle 10 is a dust-removing object.
如第5圖所示，做為除塵對象物的工件W的除塵表面WS均等地分割為第1除塵表面(分割除塵表面)WS1與第2除塵表面(分割除塵表面)WS2，第1除塵滾輪16a在第1除塵表面WS1上轉動，第2除塵滾輪16b在第2除塵表面WS2上轉動。第1除塵滾輪16a的週長16ar設定在比第1除塵滾輪16a的周面與第1除塵表面WS1接觸移動距離(第5圖中的第1除塵表面WS1的寬度)來得長。第2除塵滾輪16b的週長16br設定在比第2除塵滾輪16b的周面與第2除塵表面WS2接觸移動距離(第5圖中的第2除塵表面WS2的寬度)來得長。 As shown in Fig. 5, the dust removing surface WS of the workpiece W as the object to be dust-removed is equally divided into a first dust-removing surface (divided dust-removing surface) WS1 and a second dust-removing surface (divided dust-removing surface) WS2, and a first dust removing roller 16a. The second dust removing roller 16b rotates on the second dust removing surface WS2. The circumferential length 16ar of the first dust removing roller 16a is set to be longer than the circumferential distance between the circumferential surface of the first dust removing roller 16a and the first dust removing surface WS1 (the width of the first dust removing surface WS1 in FIG. 5). The circumferential length 16br of the second dust removing roller 16b is set to be longer than the circumferential distance between the circumferential surface of the second dust removing roller 16b and the second dust removing surface WS2 (the width of the second dust removing surface WS2 in FIG. 5).
如第6圖所示，做為除塵對象物的曝光桌8的除塵表面8S均等地分割為第1除塵表面(分割除塵表面)8S1與第2除塵表面(分割除塵表面)8S2，第1除塵滾輪16a在第1除塵表面8S1上轉動，第2除塵滾輪16b在第2除塵表面8S2上轉動。第1除塵滾輪16a的週長16ar設定在比第1除塵滾輪16a的周面與第1除塵表面8S1接觸移動距離(第6圖中的第1除塵表面8S1的寬度)來得長。第2除塵滾輪16b的週長16br設定在比第2除塵滾輪16b的周面與第2除塵表面8S2接觸移動距離(第6圖中的第2除塵表面8S2的寬度)來得長。 As shown in Fig. 6, the dust removing surface 8S of the exposure table 8 as the object to be dust-removed is equally divided into a first dust-removing surface (divided dust-removing surface) 8S1 and a second dust-removing surface (divided dust-removing surface) 8S2, and a first dust removing roller 16a rotates on the first dust removing surface 8S1, and the second dust removing roller 16b rotates on the second dust removing surface 8S2. The circumferential length 16ar of the first dust removing roller 16a is set to be longer than the circumferential distance between the circumferential surface of the first dust removing roller 16a and the first dust removing surface 8S1 (the width of the first dust removing surface 8S1 in Fig. 6). The circumferential length 16br of the second dust removing roller 16b is set to be longer than the circumferential distance between the circumferential surface of the second dust removing roller 16b and the second dust removing surface 8S2 (the width of the second dust removing surface 8S2 in Fig. 6).
如第7圖所示，做為除塵對象物的光罩10的除塵表面10S均等地分割為第1除塵表面(分割除塵表面)10S1與第2除塵表面(分割除塵表面)10S2，第1除塵滾輪16a在第1除塵 表面10S1上轉動，第2除塵滾輪16b在第2除塵表面10S2上轉動。第1除塵滾輪16a的週長16ar設定在比第1除塵滾輪16a的周面與第1除塵表面10S1接觸移動距離(第7圖中的第1除塵表面10S1的寬度)來得長。第2除塵滾輪16b的週長16br設定在比第2除塵滾輪16b的周面與第2除塵表面10S2接觸移動距離(第7圖中的第2除塵表面10S2的寬度)來得長。 As shown in Fig. 7, the dust removing surface 10S of the mask 10 as the object to be dust-removed is equally divided into a first dust-removing surface (divided dust-removing surface) 10S1 and a second dust-removing surface (divided dust-removing surface) 10S2, and a first dust removing roller 16a in the first dust removal The surface 10S1 is rotated, and the second dust removing roller 16b is rotated on the second dust removing surface 10S2. The circumferential length 16ar of the first dust removing roller 16a is set to be longer than the circumferential distance between the circumferential surface of the first dust removing roller 16a and the first dust removing surface 10S1 (the width of the first dust removing surface 10S1 in Fig. 7). The circumferential length 16br of the second dust removing roller 16b is set to be longer than the circumferential distance between the circumferential surface of the second dust removing roller 16b and the second dust removing surface 10S2 (the width of the second dust removing surface 10S2 in Fig. 7).
因此，第1除塵滾輪16a與第2除塵滾輪16b在除塵對象物的除塵表面轉動除塵時，第1除塵滾輪16a與第2除塵滾輪16b的周面上的同一部分不會接觸除塵對象物的除塵表面2次(第1除塵滾輪16a與第2除塵滾輪16b轉動除塵時不會轉滿一圈)。因此，除塵中一旦附著於第1除塵滾輪16a與第2除塵滾輪16b上的被除去的塵埃不會附著回去，能夠防止因為再附著而造成的曝光缺陷或顯像缺陷。 Therefore, when the first dust removing roller 16a and the second dust removing roller 16b are dusted on the dust removing surface of the dust removing target, the same portion of the circumferential surfaces of the first dust removing roller 16a and the second dust removing roller 16b are not in contact with the dust removing object. The surface is applied twice (the first dust removing roller 16a and the second dust removing roller 16b do not turn over once when rotating and dusting). Therefore, the removed dust adhering to the first dust removing roller 16a and the second dust removing roller 16b does not adhere to the dust during the dust removal, and exposure defects or development defects due to reattachment can be prevented.
<曝光裝置的除塵裝置的動作> <Operation of dust removing device of exposure device>
參照第8至14圖說明本實施例的曝光裝置EX的除塵裝置12的動作。在此，第1曝光部2的光罩10與曝光桌8為除塵對象物，以對光罩10除塵後再對曝光桌8除塵的狀況為例子來說明。 The operation of the dust removing device 12 of the exposure apparatus EX of the present embodiment will be described with reference to Figs. 8 to 14. Here, the mask 10 and the exposure table 8 of the first exposure unit 2 are dust-removing objects, and a state in which the exposure table 8 is dust-removed after the mask 10 is removed is described as an example.
首先，被作業者或搬運裝置(未圖示)搬入的未曝光的工件W載置於投入部1的平台1a。接著，工件W被第1搬運機6的搬入搬運機6a從投入部1的平台1a移動到第1曝光部2的曝光桌8。移動到曝光桌8的工件W被形成於曝光桌8上面的吸引口(未圖示)所吸附固定。接著，藉由升降機構(未圖示)，將曝光桌8朝光罩10上升，使載置於曝光桌8的工件W的第1面 (上面)與光罩10緊密接觸。接著，在此緊密接觸狀態，藉由光源14照射出讓工件W的光阻層感光的波長帶域的光(例如紫外光)，將描繪於光罩10的既定圖樣曝光於工件W的第1面(上面)的光阻層。接著，藉由升降機構(未圖示)將曝光桌8下降到其上表面與傳遞路徑的高度同一高度(第1圖)，並且解除曝光桌8的吸引口(未圖示)對工件W的吸附。然後藉由第1搬運機6的搬出搬運機6b將工件W從第1曝光部2的曝光桌8移動至反轉部3的反轉裝置9。 First, the unexposed workpiece W carried by the operator or the conveyance device (not shown) is placed on the platform 1a of the input unit 1. Then, the workpiece W is moved from the platform 1a of the input unit 1 to the exposure table 8 of the first exposure unit 2 by the loading and transporting machine 6a of the first conveyor 6. The workpiece W moved to the exposure table 8 is suction-fixed by a suction port (not shown) formed on the exposure table 8. Next, the exposure table 8 is raised toward the mask 10 by a lifting mechanism (not shown) to place the first surface of the workpiece W placed on the exposure table 8. (Top) in close contact with the reticle 10. Then, in the close contact state, the light source 14 is irradiated with light of a wavelength band (for example, ultraviolet light) that causes the photoresist layer of the workpiece W to be exposed, and the predetermined pattern drawn on the photomask 10 is exposed to the first surface of the workpiece W. (top) photoresist layer. Next, the exposure table 8 is lowered by the elevating mechanism (not shown) to the same height as the height of the upper surface of the transfer path (Fig. 1), and the suction port (not shown) of the exposure table 8 is released from the workpiece W. Adsorption. Then, the workpiece W is moved from the exposure table 8 of the first exposure unit 2 to the inversion device 9 of the inversion unit 3 by the carry-out conveyor 6b of the first conveyor 6.
工件W移動到反轉部3的反轉裝置9後，除塵裝置12進行對第1曝光部2的光罩10與曝光桌8的除塵作業。 After the workpiece W has moved to the inverting device 9 of the inverting portion 3, the dust removing device 12 performs a dust removing operation on the mask 10 and the exposure table 8 of the first exposure unit 2.
首先，如第8圖所示，將第1除塵裝置12a及第2除塵裝置12b移動到初始位置後，以搬運框架20驅動第1除塵裝置12a的第1除塵滾輪16a，使第1除塵滾輪16a在第1除塵表面10S1上轉動，對光罩10的第1除塵表面10S1除塵。 First, as shown in Fig. 8, after the first dust removing device 12a and the second dust removing device 12b are moved to the initial position, the first dust removing roller 16a of the first dust removing device 12a is driven by the transport frame 20, and the first dust removing roller 16a is driven. The first dust removing surface 10S1 is rotated on the first dust removing surface 10S1 to remove dust from the first dust removing surface 10S1 of the mask 10.
接著，如第9圖所示，以搬運框架20將第1除塵滾輪16a移動到與轉印滾輪18接觸的清掃位置，使轉印滾輪18旋轉，開始清掃第1除塵滾輪16a。同時，以搬運框架20驅動第2除塵裝置12b的第2除塵滾輪16b，使第2除塵滾輪16b在第2除塵表面10S2上轉動，對光罩10的第2除塵表面10S2除塵。 Then, as shown in FIG. 9, the first dust removing roller 16a is moved to the cleaning position in contact with the transfer roller 18 by the transport frame 20, and the transfer roller 18 is rotated to start cleaning the first dust removing roller 16a. At the same time, the second dust removing roller 16b of the second dust removing device 12b is driven by the transport frame 20, and the second dust removing roller 16b is rotated on the second dust removing surface 10S2 to dust the second dust removing surface 10S2 of the mask 10.
接著，如第10圖所示，以搬運框架20將第2除塵滾輪16b移動到與轉印滾輪18接觸的清掃位置，使轉印滾輪18旋轉，開始清掃第2除塵滾輪16b。 Next, as shown in FIG. 10, the second dust removing roller 16b is moved to the cleaning position in contact with the transfer roller 18 by the transport frame 20, and the transfer roller 18 is rotated to start cleaning the second dust removing roller 16b.
如第11圖所示，第1除塵滾輪16a的清掃結束後，第2除塵滾輪16b繼續清掃的狀態下，以搬運框架20驅動第1除 塵裝置12a的第1除塵滾輪16a，使第1除塵滾輪16a在第1除塵表面8S1上轉動，對曝光桌8的第1除塵表面8S1除塵。對曝光桌8的第1除塵表面8S1除塵期間，第2除塵滾輪16b的清掃結束。 As shown in Fig. 11, after the cleaning of the first dust removing roller 16a is completed, the second dust removing roller 16b continues to be cleaned, and the first dividing by the transport frame 20 is driven. The first dust removing roller 16a of the dust device 12a rotates the first dust removing roller 16a on the first dust removing surface 8S1, and dusts the first dust removing surface 8S1 of the exposure table 8. During the dust removal of the first dust removing surface 8S1 of the exposure table 8, the cleaning of the second dust removing roller 16b is completed.
接著，如第12圖所示，以搬運框架20將第1除塵滾輪16a移動到與轉印滾輪18接觸的清掃位置，使轉印滾輪18旋轉，開始清掃第1除塵滾輪16a。同時，以搬運框架20驅動第2除塵裝置12b的第2除塵滾輪16b，使第2除塵滾輪16b在第2除塵表面8S2上轉動，對曝光桌8的第2除塵表面8S2除塵。 Then, as shown in Fig. 12, the first dust removing roller 16a is moved to the cleaning position in contact with the transfer roller 18 by the transport frame 20, and the transfer roller 18 is rotated to start cleaning the first dust removing roller 16a. At the same time, the second dust removing roller 16b of the second dust removing device 12b is driven by the transport frame 20, and the second dust removing roller 16b is rotated on the second dust removing surface 8S2 to dust the second dust removing surface 8S2 of the exposure table 8.
接著，如第13圖所示，以搬運框架20將第2除塵滾輪16b移動到與轉印滾輪18接觸的清掃位置，使轉印滾輪18旋轉，開始清掃第2除塵滾輪16b。 Next, as shown in Fig. 13, the second dust removing roller 16b is moved to the cleaning position in contact with the transfer roller 18 by the transport frame 20, and the transfer roller 18 is rotated to start cleaning the second dust removing roller 16b.
最後，如第14圖所示，在第1除塵滾輪16a的清掃結束後將第1除塵裝置12a移動到初始位置，之後，在第2除塵滾輪16b的清掃結束後將第2除塵裝置12b移動到初始位置。 Finally, as shown in Fig. 14, after the cleaning of the first dust removing roller 16a is completed, the first dust removing device 12a is moved to the initial position, and thereafter, after the cleaning of the second dust removing roller 16b is completed, the second dust removing device 12b is moved to initial position.
如以上說明，本實施例的曝光裝置EX的除塵方法中，第1除塵滾輪16a及第2除塵滾輪16b對除塵對象物除塵的步驟以及除塵步驟後用轉印滾輪18清掃第1除塵滾輪16a及第2除塵滾輪16b的清掃步驟會交替進行。 As described above, in the dust removing method of the exposure apparatus EX of the present embodiment, the first dust removing roller 16a and the second dust removing roller 16b clean the first dust removing roller 16a by the transfer roller 18 after the dust removing target and the dust removing step. The cleaning step of the second dust removing roller 16b is alternately performed.
在此，雖說明了在第1曝光部2的除塵動作，但在第2曝光部4也可進行完全相同的除塵動作。在第1曝光部2及第2曝光部4中進行除塵的時間點只要是在曝光桌8與光罩10之間產生有空間的時間點即可，或以預定的曝光週期除塵，或是在任意的曝光結束後工件W排出的時間點開始除塵都是可行的。 Here, although the dust removing operation in the first exposure unit 2 has been described, the same dust removing operation can be performed in the second exposure unit 4. The time at which the dust is removed in the first exposure unit 2 and the second exposure unit 4 may be a time point when a space is formed between the exposure table 8 and the reticle 10, or may be dusted by a predetermined exposure period, or It is possible to start dust removal at the time point when the workpiece W is discharged after the end of any exposure.
而第1曝光部2與第2曝光部4中進行除塵的順序僅 為一例，本發明並不限定於此。例如，也可以先進行由第2除塵裝置12b(第2除塵滾輪16b)的除塵，再進行由第1除塵裝置12a(第1除塵滾輪16a)的除塵。或者是先進行對曝光桌8的除塵再進行對光罩10的除塵。也可以第1除塵裝置12a(第1除塵滾輪16a)與第2除塵裝置12b(第2除塵滾輪16b)同時開始除塵動作。 The order in which the first exposure unit 2 and the second exposure unit 4 perform dust removal is only As an example, the present invention is not limited to this. For example, dust removal by the second dust removing device 12b (second dust removing roller 16b) may be performed first, and dust removal by the first dust removing device 12a (first dust removing roller 16a) may be performed. Alternatively, the dust removal of the reticle 10 may be performed before the dust removal of the exposure table 8 is performed. The first dust removing device 12a (first dust removing roller 16a) and the second dust removing device 12b (second dust removing roller 16b) may simultaneously start the dust removing operation.
根據本實施例，將第1除塵滾輪16a的週長16ar設定在比第1除塵滾輪16a的周面與除塵對象物的第1除塵表面(WS1、8S1、10S1)的接觸距離來得長，將第2除塵滾輪16b的週長16br設定在比第2除塵滾輪16b的周面與除塵對象物的第2除塵表面(WS2、8S2、10S2)的接觸距離來得長。因此，在1次的除塵步驟中，第1除塵滾輪16a及第2除塵滾輪16b在除塵對象物的除塵表面轉動進行除塵時，第1除塵滾輪16a及第2除塵滾輪16b的周面上同一部分不會接觸除塵對象物的除塵表面兩次(第1除塵滾輪16a及第2除塵滾輪16b轉動除塵時不會轉滿1圈)。因此，除塵中一旦附著於第1除塵滾輪16a與第2除塵滾輪16b上的已被除去的塵埃不會附著回去到除塵對象物上，能夠防止因為再附著而造成的曝光缺陷或顯像缺陷。 According to the present embodiment, the circumferential length 16ar of the first dust removing roller 16a is set to be longer than the contact distance between the circumferential surface of the first dust removing roller 16a and the first dust removing surfaces (WS1, 8S1, and 10S1) of the dust removing target. The circumferential length 16br of the dust removing roller 16b is set to be longer than the contact distance between the circumferential surface of the second dust removing roller 16b and the second dust removing surface (WS2, 8S2, 10S2) of the dust removing object. Therefore, in the dust removal step of the first time, when the first dust removing roller 16a and the second dust removing roller 16b are rotated to remove dust on the dust removing surface of the dust removing object, the same portion on the circumferential surface of the first dust removing roller 16a and the second dust removing roller 16b. The dust-removing surface of the dust-removing object is not touched twice (the first dust-removing roller 16a and the second dust-removing roller 16b do not turn over once when rotating and dust-removing). Therefore, the dust that has been removed from the first dust removing roller 16a and the second dust removing roller 16b does not adhere to the dust removing object during dust removal, and exposure defects or development defects due to reattachment can be prevented.
以上實施例中，僅以設置第1除塵滾輪16a與第2除塵滾輪16b共2個除塵滾輪為例子來說明，但也可以設置單一的除塵滾輪在單一個除塵對象物的全除塵表面上轉動。在這個情況下，將單一除塵滾輪的週長(有效徑)設定在比單一除塵滾輪的周面與除塵對象物的除塵表面的接觸移動距離來得長。 In the above embodiment, only two dust removing rollers are provided with the first dust removing roller 16a and the second dust removing roller 16b as an example. However, a single dust removing roller may be provided to rotate on the entire dust removing surface of the single dust removing object. In this case, the circumference (effective diameter) of the single dust removing roller is set to be longer than the contact moving distance of the circumferential surface of the single dust removing roller and the dust removing surface of the dust removing object.
以上實施例中，僅以設置第1除塵滾輪16a與第2除 塵滾輪16b共2個除塵滾輪為例子來說明，但也可以設置3個以上的除塵滾輪。在這個情況下，將各個除塵滾輪的週長(有效徑)設定在比各除塵滾輪的周面與除塵對象物的各分割除塵表面的接觸移動距離來得長。 In the above embodiment, only the first dust removing roller 16a and the second dividing are provided. The dust roller 16b has two dust removing rollers as an example, but three or more dust removing rollers may be provided. In this case, the circumference (effective diameter) of each of the dust removing rollers is set to be longer than the contact moving distance between the circumferential surface of each of the dust removing rollers and each of the divided dust removing surfaces of the dust removing object.
以上實施例中，以緊密接觸光罩及工件(感光性基板)後曝光的接觸式曝光方式來對工件的兩面依序曝光的曝光裝置EX為例來說明，但本發明的適用對象並不限定於此。例如，除了接觸式曝光方式外，本發明也可以適用於採用各種曝光方式的曝光裝置，例如，使光罩與工件接近且不接觸的接近式曝光方式、不用光罩而用一邊調變光一邊掃描的方式來直接描繪圖樣的直接曝光方式、光罩與基板之間設置投影光學系統的投影曝光方式等。另外，本發明也適用於採用對工件的兩面同時進行曝光的兩面同時曝光方式或僅對單面進行曝光的單面曝光方式的曝光裝置。 In the above embodiment, the exposure apparatus EX in which the both surfaces of the workpiece are sequentially exposed by the contact exposure method in which the mask and the workpiece (photosensitive substrate) are exposed in close contact are taken as an example, but the application object of the present invention is not limited. herein. For example, in addition to the contact exposure method, the present invention is also applicable to an exposure apparatus using various exposure methods, for example, a proximity exposure method in which a reticle is brought close to and in contact with a workpiece, and a side light is modulated without using a reticle. The method of scanning directly describes the direct exposure mode of the pattern, the projection exposure mode of the projection optical system between the reticle and the substrate, and the like. Further, the present invention is also applicable to an exposure apparatus using a two-sided simultaneous exposure method in which both sides of a workpiece are simultaneously exposed or a single-sided exposure method in which only one side is exposed.
以上實施例中，以邊搬運工件於水平方向邊進行曝光的橫型曝光裝置為例來說明，但本發明也可以適用於邊搬運工件於鉛直方向邊進行曝光的縱型曝光裝置。 In the above embodiment, the horizontal exposure apparatus that performs the exposure while the workpiece is being conveyed in the horizontal direction has been described as an example. However, the present invention is also applicable to a vertical exposure apparatus that performs exposure while moving the workpiece in the vertical direction.
以上實施例中，舉出以工件(感光性基板)、曝光桌、或光罩做為除塵對象物為例來說明，但也能夠將曝光裝置內部會附著灰塵的所有構件做為除塵對象物。 In the above embodiment, the workpiece (photosensitive substrate), the exposure table, or the photomask is taken as an example of the object to be dust-removed. However, it is also possible to use all the members to which dust is attached to the inside of the exposure device as the object to be dust-removed.
以上實施例中，以收集附著於第1除塵滾輪16a及第2除塵滾輪16b上的塵埃的轉印滾輪(集塵裝置)18為例來說明。然而，也可以省略轉印滾輪(集塵裝置)18，而在每次第1除塵滾輪16a及第2除塵滾輪16b除塵動作結束後，從第1除塵 滾輪16a及第2除塵滾輪16b的外周面剝下一圈黏著材料(黏著膠帶)。在這種清掃方式下，每次從第1除塵滾輪16a及第2除塵滾輪16b的外周面剝下黏著材料(黏著膠帶)就會縮小滾輪的週長，因此，需以黏著材料(黏著膠帶)的纏繞量最少的狀態為標準來設定第1除塵滾輪16a及第2除塵滾輪16b的週長。 In the above embodiment, the transfer roller (dust collecting device) 18 that collects the dust adhering to the first dust removing roller 16a and the second dust removing roller 16b will be described as an example. However, the transfer roller (dust collecting device) 18 may be omitted, and the first dust removing operation may be performed every time the dust removing operation of the first dust removing roller 16a and the second dust removing roller 16b is completed. An adhesive material (adhesive tape) is peeled off from the outer peripheral surface of the roller 16a and the second dust removing roller 16b. In this cleaning method, the adhesive material (adhesive tape) is peeled off from the outer peripheral surface of the first dust removing roller 16a and the second dust removing roller 16b, and the circumference of the roller is reduced. Therefore, an adhesive material (adhesive tape) is required. The state in which the amount of winding is the smallest is set to the circumference of the first dust removing roller 16a and the second dust removing roller 16b.
W‧‧‧工件(感光性基板、除塵對象物) W‧‧‧Workpiece (photosensitive substrate, dust removal target)
WS‧‧‧除塵表面 WS‧‧‧dust surface
WS1‧‧‧第1除塵表面(分割除塵表面) WS1‧‧‧1st dust removal surface (divided dust removal surface)
WS2‧‧‧第2除塵表面(分割除塵表面) WS2‧‧‧2nd dust removal surface (divided dust removal surface)
8‧‧‧曝光桌(除塵對象物) 8‧‧‧Exposure table (dust removal object)
12a‧‧‧第1除塵裝置 12a‧‧‧1st dust removal device
12b‧‧‧第2除塵裝置 12b‧‧‧2nd dust removal device
16a‧‧‧第1除塵滾輪 16a‧‧‧1st dust removal roller
16ar‧‧‧週長(有效徑) 16ar‧‧‧ perimeter (effective path)
16b‧‧‧第2除塵滾輪 16b‧‧‧2nd dust removal roller
16br‧‧‧週長(有效徑) 16br‧‧‧ perimeter (effective path)
18‧‧‧轉印滾輪(集塵裝置) 18‧‧‧Transfer roller (dust collecting device)
Claims (9)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012205315A JP5893537B2 (en) | 2012-09-19 | 2012-09-19 | Dust removal apparatus and dust removal method for exposure apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201413397A TW201413397A (en) | 2014-04-01 |
| TWI603159B true TWI603159B (en) | 2017-10-21 |
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| Application Number | Title | Priority Date | Filing Date |
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| TW102123760A TWI603159B (en) | 2012-09-19 | 2013-07-03 | Dust removing device and dust removing method of exposure device |
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| Country | Link |
|---|---|
| JP (1) | JP5893537B2 (en) |
| KR (1) | KR102062419B1 (en) |
| CN (1) | CN104508561B (en) |
| TW (1) | TWI603159B (en) |
| WO (1) | WO2014045885A1 (en) |
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| TWI553424B (en) * | 2014-11-11 | 2016-10-11 | Beac Co Ltd | Exposure device |
| TWI553423B (en) * | 2014-11-11 | 2016-10-11 | Beac Co Ltd | Exposure device |
| CN104716795B (en) * | 2015-03-28 | 2017-08-08 | 东莞市森江机电科技有限公司 | Dust removing units |
| CN105093854B (en) * | 2015-09-09 | 2017-04-12 | 合肥芯碁微电子装备有限公司 | Automatic dust sticking device for laser direct-writing exposure machine |
| CN105470150B (en) * | 2015-12-21 | 2018-07-10 | 中国电子科技集团公司第五十五研究所 | A kind of glass passivating method of silicon mesa diode |
| JP6811015B2 (en) * | 2016-02-02 | 2021-01-13 | 株式会社アドテックエンジニアリング | Roll-to-roll double-sided exposure device |
| JP6215986B2 (en) * | 2016-02-24 | 2017-10-18 | 株式会社オーク製作所 | Exposure apparatus equipped with a dust removal device |
| JP6865609B2 (en) | 2017-03-26 | 2021-04-28 | 株式会社アドテックエンジニアリング | Exposure device |
| CN108646525B (en) * | 2017-06-16 | 2020-05-12 | 深圳市前海野马自动化设备有限公司 | Automatic alignment device with lifting mechanism and exposure equipment thereof |
| CN108255029A (en) * | 2018-03-09 | 2018-07-06 | 广东华恒智能科技有限公司 | A kind of sided exposure machine and its exposure method |
| CN109739071A (en) * | 2019-01-30 | 2019-05-10 | 广东华恒智能科技有限公司 | A kind of roll-to-roll Full-automatic exposure machine |
| CN112269302B (en) * | 2020-09-16 | 2023-05-30 | 上海光起电子设备有限公司 | Dust removing device of exposure machine |
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- 2013-09-05 KR KR1020157002557A patent/KR102062419B1/en active IP Right Grant
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Also Published As
| Publication number | Publication date |
|---|---|
| TW201413397A (en) | 2014-04-01 |
| KR20150056526A (en) | 2015-05-26 |
| CN104508561B (en) | 2016-09-21 |
| JP2014059494A (en) | 2014-04-03 |
| JP5893537B2 (en) | 2016-03-23 |
| KR102062419B1 (en) | 2020-01-03 |
| CN104508561A (en) | 2015-04-08 |
| WO2014045885A1 (en) | 2014-03-27 |
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