TWI600535B - - Google Patents

Info

Publication number
TWI600535B
TWI600535B TW104118901A TW104118901A TWI600535B TW I600535 B TWI600535 B TW I600535B TW 104118901 A TW104118901 A TW 104118901A TW 104118901 A TW104118901 A TW 104118901A TW I600535 B TWI600535 B TW I600535B
Authority
TW
Taiwan
Application number
TW104118901A
Other languages
Chinese (zh)
Other versions
TW201605610A (zh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of TW201605610A publication Critical patent/TW201605610A/zh
Application granted granted Critical
Publication of TWI600535B publication Critical patent/TWI600535B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Physical Vapour Deposition (AREA)
TW104118901A 2014-06-17 2015-06-11 高耐久性銀鏡子 TW201605610A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014123990 2014-06-17

Publications (2)

Publication Number Publication Date
TW201605610A TW201605610A (zh) 2016-02-16
TWI600535B true TWI600535B (ja) 2017-10-01

Family

ID=54935442

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104118901A TW201605610A (zh) 2014-06-17 2015-06-11 高耐久性銀鏡子

Country Status (4)

Country Link
JP (1) JP6340608B2 (ja)
CN (1) CN106062590B (ja)
TW (1) TW201605610A (ja)
WO (1) WO2015194455A1 (ja)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10170509B2 (en) * 2016-02-12 2019-01-01 Viavi Solutions Inc. Optical filter array
CN106443847B (zh) * 2016-11-08 2018-11-13 江苏北方湖光光电有限公司 一种外反银镜及其低温镀制方法
JP2020046445A (ja) * 2017-01-18 2020-03-26 Ａｇｃ株式会社 Ｃｓｐミラー、およびｃｓｐミラー用の膜付きガラス基板の製造方法
CN108693578A (zh) * 2017-04-12 2018-10-23 扬明光学股份有限公司 反射元件及反射镜
JP6981086B2 (ja) 2017-08-03 2021-12-15 セイコーエプソン株式会社 波長変換素子、光源装置及びプロジェクター
US10859899B2 (en) 2017-08-03 2020-12-08 Seiko Epson Corporation Wavelength conversion element, method for producing wavelength conversion element, light source device, and projector
JP2019164258A (ja) 2018-03-20 2019-09-26 セイコーエプソン株式会社 波長変換素子、波長変換素子の製造方法、光源装置及びプロジェクター
KR102125614B1 (ko) * 2018-07-25 2020-06-22 유흥상 거울면에 진공증착에 의한 문양을 형성하는 방법
CN109628894B (zh) * 2018-12-29 2020-10-23 润坤(上海)光学科技有限公司 一种远紫外高反射镜的制备方法
JP7022355B2 (ja) 2019-11-28 2022-02-18 セイコーエプソン株式会社 波長変換素子、光源装置およびプロジェクター
CN112011770A (zh) * 2020-09-01 2020-12-01 本溪玉晶玻璃有限公司 一种快节拍高亮度反射率环保铝镜生产线
CN112848425A (zh) * 2020-12-31 2021-05-28 宁波锦辉光学科技有限公司 一种应用于hud的自由反射镜的制造工艺
WO2022270475A1 (ja) * 2021-06-25 2022-12-29 Ａｇｃ株式会社 ミラー及びその製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1286759A (zh) * 1997-11-19 2001-03-07 瑞士铝业技术及管理有限公司 具有稳定表面的反射体
JP2006010929A (ja) * 2003-06-27 2006-01-12 Asahi Glass Co Ltd 高反射鏡
JP2008260978A (ja) * 2007-04-10 2008-10-30 Nidek Co Ltd 反射膜の形成方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4351678B2 (ja) * 2003-09-22 2009-10-28 株式会社村上開明堂 銀鏡およびその製造方法
JP2006098856A (ja) * 2004-09-30 2006-04-13 Ulvac Japan Ltd Ａｇ系反射膜およびその作製方法
JP2007310335A (ja) * 2006-04-21 2007-11-29 Central Glass Co Ltd 表面鏡
JP2009099533A (ja) * 2007-09-25 2009-05-07 Hitachi Maxell Ltd 放熱部材、反射部材および照明ユニット
JP2011095658A (ja) * 2009-11-02 2011-05-12 Tamron Co Ltd 裏面反射鏡
JP2011128501A (ja) * 2009-12-21 2011-06-30 Konica Minolta Opto Inc フィルムミラー、フィルムミラーの製造方法及び太陽光集光用ミラー
JP2011164552A (ja) * 2010-02-15 2011-08-25 Osaka Univ 電子部品、電子回路装置、および電子部品の製造方法
JP2012150295A (ja) * 2011-01-19 2012-08-09 Kuramoto Seisakusho Co Ltd Ａｇリフレクタ

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1286759A (zh) * 1997-11-19 2001-03-07 瑞士铝业技术及管理有限公司 具有稳定表面的反射体
JP2006010929A (ja) * 2003-06-27 2006-01-12 Asahi Glass Co Ltd 高反射鏡
JP2008260978A (ja) * 2007-04-10 2008-10-30 Nidek Co Ltd 反射膜の形成方法

Also Published As

Publication number Publication date
TW201605610A (zh) 2016-02-16
CN106062590B (zh) 2018-08-21
CN106062590A (zh) 2016-10-26
JP6340608B2 (ja) 2018-06-13
JPWO2015194455A1 (ja) 2017-04-20
WO2015194455A1 (ja) 2015-12-23

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