TWI525742B - 基底傳送設備和基底加工設備 - Google Patents
基底傳送設備和基底加工設備 Download PDFInfo
- Publication number
- TWI525742B TWI525742B TW102141165A TW102141165A TWI525742B TW I525742 B TWI525742 B TW I525742B TW 102141165 A TW102141165 A TW 102141165A TW 102141165 A TW102141165 A TW 102141165A TW I525742 B TWI525742 B TW I525742B
- Authority
- TW
- Taiwan
- Prior art keywords
- transfer table
- shaft
- substrate
- air bearing
- suction
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims description 109
- 238000006243 chemical reaction Methods 0.000 claims description 27
- 239000006096 absorbing agent Substances 0.000 claims description 24
- 230000002093 peripheral effect Effects 0.000 claims description 5
- 238000004891 communication Methods 0.000 claims description 4
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 4
- -1 polytetrafluoroethylene Polymers 0.000 claims description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 2
- 230000032258 transport Effects 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 description 19
- 239000007789 gas Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 9
- 238000010586 diagram Methods 0.000 description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 229910052732 germanium Inorganic materials 0.000 description 5
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 239000010408 film Substances 0.000 description 4
- 239000000356 contaminant Substances 0.000 description 3
- 239000000314 lubricant Substances 0.000 description 3
- 238000000137 annealing Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000026058 directional locomotion Effects 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000011195 cermet Substances 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000005499 laser crystallization Methods 0.000 description 1
- 230000033001 locomotion Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67784—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations using air tracks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67784—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations using air tracks
- H01L21/67787—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations using air tracks with angular orientation of the workpieces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1876—Particular processes or apparatus for batch treatment of the devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020120128136A KR101403458B1 (ko) | 2012-11-13 | 2012-11-13 | 기판 이송 장치 및 기판 처리 장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201420467A TW201420467A (zh) | 2014-06-01 |
TWI525742B true TWI525742B (zh) | 2016-03-11 |
Family
ID=50707975
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW102141165A TWI525742B (zh) | 2012-11-13 | 2013-11-13 | 基底傳送設備和基底加工設備 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5925747B2 (ko) |
KR (1) | KR101403458B1 (ko) |
CN (1) | CN103811386B (ko) |
TW (1) | TWI525742B (ko) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101983327B1 (ko) | 2016-07-26 | 2019-05-29 | 에이피시스템 주식회사 | 레이저 처리장치 |
CN112828485B (zh) * | 2020-12-31 | 2023-03-24 | 南昌航空大学 | 一种用于止推顶箔微激光点焊的装置 |
CN114724999B (zh) * | 2022-03-31 | 2023-01-03 | 先之科半导体科技(东莞)有限公司 | 一种二极管入料座 |
CN117276160B (zh) * | 2023-11-21 | 2024-02-13 | 上海隐冠半导体技术有限公司 | 一种气浮刹车装置、运动装置及气浮刹车装置的控制方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58141536A (ja) * | 1982-02-17 | 1983-08-22 | Sanyo Electric Co Ltd | 半導体ウエハ−の吸着ヘツド |
KR0131754Y1 (ko) * | 1995-12-27 | 1999-02-01 | 문정환 | 스테이지 구동장치 |
JP2000264411A (ja) * | 1999-03-17 | 2000-09-26 | Mitsubishi Heavy Ind Ltd | 浮上移動台車 |
JP2002217082A (ja) * | 2001-01-12 | 2002-08-02 | Nikon Corp | ステージ装置及び露光装置 |
US7313926B2 (en) * | 2005-01-18 | 2008-01-01 | Rexorce Thermionics, Inc. | High efficiency absorption heat pump and methods of use |
JP4782710B2 (ja) * | 2006-03-02 | 2011-09-28 | 住友重機械工業株式会社 | ステージ装置 |
TWI457193B (zh) * | 2006-03-02 | 2014-10-21 | Sumitomo Heavy Industries | Stage device |
JP2009210295A (ja) * | 2008-02-29 | 2009-09-17 | Canon Inc | 位置決め装置、露光装置及びデバイス製造方法 |
KR100982345B1 (ko) * | 2008-05-14 | 2010-09-15 | 주식회사 쎄믹스 | 레이저 리페어 시스템을 위한 척 플레이트 이송장치 |
JP2010286784A (ja) * | 2009-06-15 | 2010-12-24 | Canon Inc | ステージ装置、露光装置およびデバイス製造方法 |
KR101089626B1 (ko) * | 2009-07-24 | 2011-12-06 | 에이피시스템 주식회사 | 기판 이송이 에어 베어링을 통해 이루어지는 레이저 열처리 장치 |
JP2011133724A (ja) * | 2009-12-25 | 2011-07-07 | Nikon Corp | 流体静圧軸受、移動体装置、露光装置、デバイス製造方法、及び清掃装置 |
KR20110131011A (ko) * | 2010-05-28 | 2011-12-06 | (유)에스엔티 | 스크린 프린터의 클리닝 장치 및 이를 구비하는 스크린 프린터 |
JP5454971B2 (ja) * | 2012-04-13 | 2014-03-26 | 株式会社日本製鋼所 | 移動ステージ |
-
2012
- 2012-11-13 KR KR1020120128136A patent/KR101403458B1/ko active IP Right Grant
-
2013
- 2013-11-11 JP JP2013233057A patent/JP5925747B2/ja active Active
- 2013-11-13 CN CN201310572302.1A patent/CN103811386B/zh active Active
- 2013-11-13 TW TW102141165A patent/TWI525742B/zh active
Also Published As
Publication number | Publication date |
---|---|
JP2014099607A (ja) | 2014-05-29 |
TW201420467A (zh) | 2014-06-01 |
JP5925747B2 (ja) | 2016-05-25 |
CN103811386B (zh) | 2017-04-12 |
KR20140061614A (ko) | 2014-05-22 |
KR101403458B1 (ko) | 2014-06-30 |
CN103811386A (zh) | 2014-05-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI525742B (zh) | 基底傳送設備和基底加工設備 | |
KR102337428B1 (ko) | 레이저 어닐 장치, 레이저 어닐 처리용 연속 반송로, 레이저광 조사 수단 및 레이저 어닐 처리 방법 | |
CN1277299C (zh) | 基板校准装置,基板处理装置及基板搬运装置 | |
CN102714139B (zh) | 接合***和接合方法 | |
KR101842504B1 (ko) | 반송 장치, 기판 처리 시스템 및 자세 제어 기구 | |
CN1348552A (zh) | 具有诸垂直堆叠处理室的半导体晶片生产***和单轴双晶片传送*** | |
US20120305024A1 (en) | Substrate processing apparatus and substrate processing method | |
CN1333385A (zh) | 用于真空蒸镀和有机电荧光器件的设备和方法 | |
JP5611152B2 (ja) | 基板熱処理装置 | |
TW200844021A (en) | Conveying device | |
JP2010518604A (ja) | ガラスシートの半導体コーティングシステムおよび方法および得られる製品 | |
US20070138228A1 (en) | Method and apparatus for finishing a glass sheet | |
JP2006016144A (ja) | トランスファロボット | |
WO2013153979A1 (ja) | 移動ステージ | |
JP3965131B2 (ja) | 基板処理装置 | |
TW201508813A (zh) | 排氣設備和具有排氣設備的基板處理設備 | |
KR101089626B1 (ko) | 기판 이송이 에어 베어링을 통해 이루어지는 레이저 열처리 장치 | |
TWI731438B (zh) | 成膜裝置 | |
JP2004319558A (ja) | 基板処理方法及び基板処理装置 | |
KR102435306B1 (ko) | 파티클 제거용 기판이송장치 | |
JP6299210B2 (ja) | 基板搬送装置及びefem | |
CN212268817U (zh) | 一种真空吸盘及硅片输送装置 | |
KR101862311B1 (ko) | 기판 처리 장치 | |
JP6364388B2 (ja) | 半導体製造装置および半導体装置の製造方法 | |
TW201132569A (en) | Sucking device |