TWI513504B - Chemical liquid mixing apparatus and chemical liquid mixing method - Google Patents
Chemical liquid mixing apparatus and chemical liquid mixing method Download PDFInfo
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本案係關於半導體清洗技術領域，特別係關於一種化學液混合裝置及方法。This case relates to the field of semiconductor cleaning technology, and in particular to a chemical liquid mixing device and method.
本申請案主張2012年9月19日申請之大陸申請案第201210350984.7號之優先權，該等案至全文以引用的方式併入本文中。The present application claims priority to PCT Application No. 20121035098, filed on Sep. 19, 2012, which is hereby incorporated by reference herein
在半導體工藝清洗設備中，針對化學液回收的情況，在工藝過程中，有一部分化學液不經過工藝腔室而直接回到儲液罐中，另一部分化學液做完工藝之後需要回收到儲液罐中，而不是直接排掉。當化學液到達一定的壽命時間之後，就把化學液整體排掉，然後再重新補充新鮮的化學液，對化學液進行溫度處理和循環之後再開始下一輪的工藝過程。In the semiconductor process cleaning equipment, in the case of chemical liquid recovery, in the process, a part of the chemical liquid directly returns to the liquid storage tank without passing through the process chamber, and another part of the chemical liquid needs to be recovered after the process is completed. Cans instead of draining directly. When the chemical liquid reaches a certain life time, the chemical liquid is completely drained, and then the fresh chemical liquid is replenished, and the chemical liquid is subjected to temperature treatment and circulation before starting the next round of the process.
針對回收後的化學液粘度相對工藝之前有所增加，為了確保在一定的時間內正常完成工藝，需要在工藝過程中補充因揮發而造成的水分丟失。目前採取的解決方案係在工藝過程中定時定量補充超純水，但是存在的問題是補充後的水都浮在儲液罐內的化學液上表面，原因是化學液本身粘度比較大，超純水很難混合在化學液中，經過比較長一段時間，可以很明顯發現補充後的超純水大多都浮在化學液表面上，從而造成儲液罐內的化學液在工藝過程中並 不處於相對均勻的狀態。目前習知半導體清洗設備中常用的補液方法及裝置有兩種，如圖1所示，化學液返回管11、化學液回收管12和化學液補充管13分別***化學液儲罐14中。如圖2所示，化學液返回管21和化學液回收管22出口連接，形成一匯合管並與化學液補充管23分別***化學液儲罐24中。這兩種裝置並沒有將補充的液體與化學液進行混合的功能，不能夠將三種液體進行均勻的混合，因此縮短了化學液的使用壽命。The viscosity of the chemical liquid after the recovery is increased before the process. In order to ensure the normal completion of the process within a certain period of time, it is necessary to replenish the moisture loss caused by the volatilization during the process. The current solution is to periodically and quantitatively replenish ultrapure water during the process, but the problem is that the replenished water floats on the upper surface of the chemical liquid in the liquid storage tank because the viscosity of the chemical liquid itself is relatively large and ultrapure. Water is difficult to mix in the chemical liquid. After a long period of time, it can be clearly found that most of the ultrapure water after the replenishment floats on the surface of the chemical liquid, thereby causing the chemical liquid in the liquid storage tank to be in the process. Not in a relatively uniform state. At present, there are two kinds of rehydration methods and devices commonly used in conventional semiconductor cleaning equipment. As shown in FIG. 1, the chemical liquid return pipe 11, the chemical liquid recovery pipe 12, and the chemical liquid supply pipe 13 are respectively inserted into the chemical liquid storage tank 14. As shown in FIG. 2, the chemical liquid return pipe 21 and the chemical liquid recovery pipe 22 are connected to each other to form a merge pipe and are respectively inserted into the chemical liquid storage tank 24 with the chemical liquid supply pipe 23. These two devices do not have the function of mixing the replenished liquid with the chemical liquid, and cannot uniformly mix the three liquids, thereby shortening the service life of the chemical liquid.
本案欲針對先前技術的不足，提供一種化學液混合裝置及方法，通過將補充的液體與直接回來的化學液和回收回來的化學液在儲液罐外部及內部的兩次混合，達到均勻混合的目的，從而滿足半導體工藝清洗設備的需要，並且延長了化學液的使用壽命。In order to overcome the deficiencies of the prior art, the present invention provides a chemical liquid mixing device and method for uniformly mixing by mixing the replenished liquid with the chemical liquid directly returned and the recovered chemical liquid twice in the outside and inside of the liquid storage tank. The purpose is to meet the needs of semiconductor process cleaning equipment and to extend the service life of the chemical liquid.
為實現上述目的，本案係提供一種化學液混合裝置，包括：一化學液返回管、一化學液回收管、一補充液輸出管、一化學液儲罐、一第一混合器和一第二混合器，該化學液返回管、化學液回收管和補充液輸出管的輸出端連接為第一輸出端；該第一混合器與該第一輸出端連接；該第二混合器通過一液體輸送管與該第一混合器連接，該第二混合器伸入該化學液儲罐內部。In order to achieve the above object, the present invention provides a chemical liquid mixing device, comprising: a chemical liquid return pipe, a chemical liquid recovery pipe, a replenishing liquid output pipe, a chemical liquid storage tank, a first mixer and a second mixing. The output end of the chemical liquid return pipe, the chemical liquid recovery pipe and the replenishing liquid output pipe are connected as a first output end; the first mixer is connected to the first output end; the second mixer is passed through a liquid delivery pipe Connected to the first mixer, the second mixer extends into the interior of the chemical fluid storage tank.
優選地，該第二混合器為伸入該化學液儲罐內部的一輸入管，該輸入管壁上設有一個或多個開孔並且該輸入管 的末端封堵。Preferably, the second mixer is an input pipe extending into the chemical liquid storage tank, the inlet pipe wall is provided with one or more openings and the input pipe The end of the block is blocked.
優選地，該第一混合器為線上混流器。Preferably, the first mixer is an in-line mixer.
優選地，該輸入管末端用堵塞封堵或焊接封堵。Preferably, the end of the input tube is blocked by plugging or welding.
優選地，該化學液混合裝置更包括：位於該化學液儲罐側面用於感測化學液的一液位感測器；以及用於將該化學液儲罐中的化學液輸送到相應工藝單元的一配置泵。Preferably, the chemical liquid mixing device further comprises: a liquid level sensor located on the side of the chemical liquid storage tank for sensing the chemical liquid; and for conveying the chemical liquid in the chemical liquid storage tank to the corresponding process unit One of the configuration pumps.
優選地，該液位感測器的數量至少為一個。Preferably, the number of liquid level sensors is at least one.
優選地，該化學液混合裝置更包括：用於存儲補充液的一補充液緩衝罐。Preferably, the chemical liquid mixing device further comprises: a replenishing liquid buffer tank for storing the replenishing liquid.
優選地，該補充液緩衝罐側面設有一液位感測器，該補充液緩衝罐與控制補充液輸出的一輸出泵連接。Preferably, a side liquid sensor is arranged on the side of the replenishing liquid buffer tank, and the replenishing liquid buffer tank is connected to an output pump for controlling the output of the replenishing liquid.
本發明又提供一種化學液混合方法，包括如下步驟：S1：將化學返回液、化學回收液以及補充液匯合；S2：將匯合後的液體經過一第一混合器進行第一次混合；S3：將該第一次混合後的液體充入一化學液儲罐內部，通過一第二混合器與該化學液儲罐內部的新液體進行第二次混合。The invention further provides a chemical liquid mixing method, comprising the following steps: S1: merging the chemical return liquid, the chemical recovery liquid and the replenishing liquid; S2: mixing the merged liquid through a first mixer for the first time; S3: The first mixed liquid is charged into a chemical liquid storage tank, and a second mixing is performed with a new liquid inside the chemical liquid storage tank through a second mixer.
優選地，該補充液通過一輸出泵從一補充液緩衝罐輸出與該化學返回液和該化學回收液進行匯合。Preferably, the replenishing liquid is combined with the chemical return liquid and the chemical recovery liquid from an replenishing liquid buffer tank through an output pump.
承上所述，本案所提供的化學液混合裝置及方法，可以有效解決現有半導體工藝設備中存在的補液不均勻問題，結構簡單，易於實現。As described above, the chemical liquid mixing device and method provided in the present invention can effectively solve the problem of non-uniformity of liquid replenishment existing in the existing semiconductor process equipment, and has a simple structure and is easy to implement.
為讓本發明之上述和其他特徵和優點能更明顯易 懂，下文特舉較佳實施例，並配合所附圖式，作詳細說明如下。The above and other features and advantages of the present invention are made more apparent It is to be understood that the preferred embodiments are described in the following, and are described in detail below with reference to the accompanying drawings.
以下將配合圖式及實施例來詳細說明本發明之特徵與實施方式，內容足以使任何熟習相關技藝者能夠輕易地充分理解本發明解決技術問題所應用的技術手段並據以實施，藉此實現本發明可達成的功效，其中相同的元件將以相同的參照符號加以說明。The features and embodiments of the present invention will be described in detail below with reference to the drawings and embodiments, which are sufficient to enable those skilled in the art to fully understand the technical means to which the present invention solves the technical problems, and The achievable effects of the present invention will be explained by the same reference numerals.
如圖3並參考圖4所示，一種化學液混合裝置，包括：化學液返回管31、化學液回收管32、補充液輸出管、化學液儲罐36、第一混合器33和第二混合器34，化學液返回管31、化學液回收管32和補充液輸出管的輸出端連接為第一輸出端；第一混合器33與第一輸出端連接；第二混合器34通過液體輸送管與第一混合器33連接，第二混合器34伸入該化學液儲罐36內部。As shown in FIG. 3 and with reference to FIG. 4, a chemical liquid mixing device includes: a chemical liquid return pipe 31, a chemical liquid recovery pipe 32, a replenishing liquid output pipe, a chemical liquid storage tank 36, a first mixer 33, and a second mixing. The output of the chemical liquid return pipe 31, the chemical liquid recovery pipe 32 and the replenishing liquid output pipe is connected as a first output end; the first mixer 33 is connected to the first output end; the second mixer 34 is passed through the liquid delivery pipe Connected to the first mixer 33, the second mixer 34 extends into the interior of the chemical fluid storage tank 36.
第二混合器34為伸入化學液儲罐36內部的輸入管，輸入管34壁上設有開孔並且該輸入管34的末端封堵。The second mixer 34 is an input tube that extends into the interior of the chemical fluid storage tank 36. An opening is provided in the wall of the inlet tube 34 and the end of the inlet tube 34 is closed.
第一混合器33為線上混流器(in-line mixer)。輸入管34末端用堵塞封堵或焊接封堵。The first mixer 33 is an in-line mixer. The end of the input tube 34 is blocked by a plug or a weld.
化學液混合裝置還包括：位於化學液儲罐36側面用於感測化學液的液位感測器35。液位感測器35的數量至少為一個。The chemical liquid mixing device further includes a liquid level sensor 35 located on the side of the chemical liquid storage tank 36 for sensing the chemical liquid. The number of liquid level sensors 35 is at least one.
化學液混合裝置還包括：用於將化學液儲罐36中的 化學液輸送到相應工藝單元的配置泵37。The chemical liquid mixing device further includes: used in the chemical liquid storage tank 36 The chemical liquid is delivered to a configuration pump 37 of the respective process unit.
化學液混合裝置還包括：存儲補充液的補充液緩衝罐38(Buffer Tank)。The chemical liquid mixing device further includes a buffer tank 38 (Buffer Tank) for storing the replenishing liquid.
補充液緩衝罐38側面設有液位感測器39，補充液緩衝罐38與控制補充液輸出的輸出泵40連接。A liquid level sensor 39 is provided on the side of the replenishing liquid buffer tank 38, and the replenishing liquid buffer tank 38 is connected to an output pump 40 that controls the output of the replenishing liquid.
以下具體說明化學液混合裝置的工作原理。The working principle of the chemical liquid mixing device will be specifically described below.
工藝時首先打開控制閥門41，向化學液儲罐36中注入化學液，直到液位感測器35感測到化學液，然後關閉控制閥門41。此時運轉配置泵37將化學液輸送到相應的工藝單元，化學返回液、化學回收液以及補充液通過化學液返回管31、化學液回收管32以及補充液輸出管匯合到第一混合器33中進行混合，將第一次混合後的液體充入化學液儲罐36內部，通過輸入管34與化學液儲罐36內部的新液體進行第二次混合。In the process, the control valve 41 is first opened, and the chemical liquid is injected into the chemical liquid storage tank 36 until the liquid level sensor 35 senses the chemical liquid, and then the control valve 41 is closed. At this time, the operation configuration pump 37 delivers the chemical liquid to the corresponding process unit, and the chemical return liquid, the chemical recovery liquid, and the replenishing liquid are merged to the first mixer 33 through the chemical liquid return pipe 31, the chemical liquid recovery pipe 32, and the replenishing liquid output pipe. The mixing is carried out, and the first mixed liquid is charged into the inside of the chemical liquid storage tank 36, and the second liquid is mixed with the new liquid inside the chemical liquid storage tank 36 through the inlet pipe 34.
如圖5所示，本發明提供一種化學液混合方法，包括如下步驟：S1：將化學返回液、化學回收液以及補充液匯合；S2：將匯合後的液體經過第一混合器33進行第一次混合；S3：將該第一次混合後的液體充入化學液儲罐36內部，通過輸入管34與化學液儲罐36內部的新液體進行第二次混合。As shown in FIG. 5, the present invention provides a chemical liquid mixing method comprising the steps of: S1: merging a chemical return liquid, a chemical recovery liquid, and a replenishing liquid; S2: passing the merged liquid through the first mixer 33 for the first time. The second mixing; S3: charging the first mixed liquid into the chemical liquid storage tank 36, and performing a second mixing with the new liquid inside the chemical liquid storage tank 36 through the input pipe 34.
較佳的，補充液通過輸出泵40從補充液緩衝罐38輸出與化學返回液和化學回收液進行匯合。Preferably, the replenishing liquid is output from the replenishing liquid buffer tank 38 through the output pump 40 to merge with the chemical return liquid and the chemical recovery liquid.
以上該僅為舉例性，而非為限制性者。任何未脫離本案之精神與範疇，而對其進行之等效修改或變更，均應包含於後附之申請專利範圍中。The above is merely exemplary and not limiting. Any equivalent modifications or changes made to the spirit and scope of this case shall be included in the scope of the appended patent application.
11,21,31‧‧‧化學液返回管11,21,31‧‧‧Chemical liquid return pipe
12,22,32‧‧‧化學液回收管12,22,32‧‧‧Chemical liquid recovery pipe
13,23‧‧‧化學液補充管13,23‧‧‧Chemical fluid supplement tube
14,24,36‧‧‧化學液儲罐14,24,36‧‧‧chemical liquid storage tank
33‧‧‧第一混合器33‧‧‧First Mixer
34‧‧‧第二混合器34‧‧‧Second mixer
35,39‧‧‧液位感測器35, 39‧‧‧ Liquid level sensor
37‧‧‧配置泵37‧‧‧Configure pump
38‧‧‧補充液緩衝罐38‧‧‧Replenishment buffer tank
40‧‧‧輸出泵40‧‧‧Output pump
41‧‧‧控制閥門41‧‧‧Control valve
圖1為習知的化學液混合裝置的結構示意圖；圖2為習知的化學液混合裝置的結構示意圖；圖3本發明一實施例化學液混合裝置結構示意圖；圖4本發明一實施例化學液混合裝置的輸入管的結構示意圖；圖5為本發明一實施例化學液混合方法步驟流程圖。1 is a schematic structural view of a conventional chemical liquid mixing device; FIG. 2 is a schematic structural view of a conventional chemical liquid mixing device; FIG. 3 is a schematic structural view of a chemical liquid mixing device according to an embodiment of the present invention; Schematic diagram of the input pipe of the liquid mixing device; FIG. 5 is a flow chart of the steps of the chemical liquid mixing method according to an embodiment of the present invention.
31‧‧‧化學液返回管31‧‧‧Chemical liquid return pipe
32‧‧‧化學液回收管32‧‧‧Chemical liquid recovery pipe
33‧‧‧第一混合器33‧‧‧First Mixer
34‧‧‧第二混合器34‧‧‧Second mixer
35,39‧‧‧液位感測器35, 39‧‧‧ Liquid level sensor
36‧‧‧化學液儲罐36‧‧‧Chemical fluid storage tank
37‧‧‧配置泵37‧‧‧Configure pump
38‧‧‧補充液緩衝罐38‧‧‧Replenishment buffer tank
40‧‧‧輸出泵40‧‧‧Output pump
41‧‧‧控制閥門41‧‧‧Control valve
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006076811A (en) * | 2004-09-08 | 2006-03-23 | Mitsubishi Chemical Engineering Corp | Method for recovering hydrofluoric acid |
| JP2006111487A (en) * | 2004-10-14 | 2006-04-27 | Mitsubishi Chemical Engineering Corp | Method for recovering hydrofluoric acid |
| WO2009110548A1 (en) * | 2008-03-07 | 2009-09-11 | 三井・デュポンフロロケミカル株式会社 | Method and system for washing electronic component |
| TW201032891A (en) * | 2008-11-14 | 2010-09-16 | Nanomizer Inc | Liquid mixing device |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6295998B1 (en) * | 1999-05-25 | 2001-10-02 | Infineon Technologies North America Corp. | Temperature controlled gassification of deionized water for megasonic cleaning of semiconductor wafers |
| CN1292822C (en) * | 2004-04-01 | 2007-01-03 | 上海宏力半导体制造有限公司 | Cleaning device for use in cleaning liquid circulating system for increasing filter life |
| CN101489661A (en) * | 2006-05-19 | 2009-07-22 | 乔治洛德方法研究和开发液化空气有限公司 | Systems and methods for reclaiming process fluids in a processing environment |
| JPWO2009110549A1 (en) * | 2008-03-07 | 2011-07-14 | 三井・デュポンフロロケミカル株式会社 | Electronic component cleaning method and cleaning system |
| US9259694B2 (en) * | 2008-08-07 | 2016-02-16 | Asahi Organic Chemicals Industry Co., Ltd. | Fluid mixer and apparatus using fluid mixer |
| CN101773916A (en) * | 2010-01-20 | 2010-07-14 | 常州亿晶光电科技有限公司 | Stepped multi-stage silicon material cleaning equipment |
| CN201954184U (en) * | 2010-11-23 | 2011-08-31 | 北京七星华创电子股份有限公司 | Liquid return conduit |
| CN102208327B (en) * | 2011-01-30 | 2012-11-14 | 北京七星华创电子股份有限公司 | Device and method for managing semiconductor cleaning solution |
| CN203002230U (en) * | 2012-09-19 | 2013-06-19 | 北京七星华创电子股份有限公司 | Chemical liquid mixing device |
-
2012
- 2012-09-19 CN CN201210350984.7A patent/CN102847480B/en active Active
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2013
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Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006076811A (en) * | 2004-09-08 | 2006-03-23 | Mitsubishi Chemical Engineering Corp | Method for recovering hydrofluoric acid |
| JP2006111487A (en) * | 2004-10-14 | 2006-04-27 | Mitsubishi Chemical Engineering Corp | Method for recovering hydrofluoric acid |
| WO2009110548A1 (en) * | 2008-03-07 | 2009-09-11 | 三井・デュポンフロロケミカル株式会社 | Method and system for washing electronic component |
| TW201032891A (en) * | 2008-11-14 | 2010-09-16 | Nanomizer Inc | Liquid mixing device |
| US20110273955A1 (en) * | 2008-11-14 | 2011-11-10 | Nanomizer Inc. | Liquid mixing device |
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