TWI498152B - Supplying method and supplier of hydrogen selenide-mixed gas - Google Patents

Supplying method and supplier of hydrogen selenide-mixed gas Download PDF

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TWI498152B
TWI498152B TW099127883A TW99127883A TWI498152B TW I498152 B TWI498152 B TW I498152B TW 099127883 A TW099127883 A TW 099127883A TW 99127883 A TW99127883 A TW 99127883A TW I498152 B TWI498152 B TW I498152B
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hydrogen
gas
control means
mixed gas
flow path
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TW201136657A (en
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Yoshinori Ito
Yasuhiro Takahashi
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Taiyo Nippon Sanso Corp
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    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B19/00Selenium; Tellurium; Compounds thereof
    • C01B19/04Binary compounds including binary selenium-tellurium compounds
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/541CuInSe2 material PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30Hydrogen technology
    • Y02E60/32Hydrogen storage
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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Description

硒化氫混合氣體之供應方法及供應裝置Supply method and supply device for hydrogen selenide mixed gas

本發明是有關一種硒化氫混合氣體之供應方法及供應裝置之改良。The present invention relates to a method for supplying a hydrogen selenide mixed gas and an improvement of the supply device.

本發明是根據在2009年9月4日於日本申請之特願2009-205230號而主張優先權,在此援用其內容。The present invention claims priority based on Japanese Patent Application No. 2009-205230, filed on Sep.

近年,由於所謂的環境污染、地球暖化、石化燃料枯竭之問題,因此太陽電池作為石油替代能源受到注目。作為太陽電池目前之主流的CIGS(Cu(InGa)Se)系薄膜太陽電池者,例如,已知有專利文獻1之化合物太陽電池。In recent years, solar cells have attracted attention as an alternative energy source for petroleum due to the so-called environmental pollution, global warming, and depletion of fossil fuels. As a CIGS (Cu(InGa)Se)-based thin film solar cell which is currently in the mainstream of solar cells, for example, a compound solar cell of Patent Document 1 is known.

在專利文獻1中,揭示一種含有銅、銦、鎵、硒之黃銅礦型(chalcopyrite)的光吸收層及其之製造方法。具體上,黃銅礦型的光吸收層薄膜,係在基板上,利用濺鍍法等使銅(Cu)、銦(In)及鎵(Ga)附著後,藉由於硒化氫(H2 Se)氣體之環境下進行退火(anneal)而形成。Patent Document 1 discloses a light absorbing layer containing a chalcopyrite of copper, indium, gallium, and selenium, and a method for producing the same. Specifically, a chalcopyrite-type light absorbing layer film is attached to a substrate, and copper (Cu), indium (In), and gallium (Ga) are adhered by a sputtering method or the like, and hydrogen selenide (H 2 Se Formed by annealing in a gas atmosphere.

在化合物太陽電池之製造裝置中,供應調整至預定濃度之硒化氫(hydrogen selenide,也可以叫做氫化硒(selenium hydride);H2 Se)混合氣體時,係使用預先調整至預定濃度之混合氣體。然而,受到近年之太陽電池需求升高,於實現化合物太陽電池之大量生產上,必須將大量之硒化氫混合氣體供應到太陽電池製造裝置中。因此,使用填充有調整至預定濃度之混合氣體之氣體鋼瓶之習知技術,係有鋼瓶之交換頻率變多,而無法確保充分之氣體供 應量的問題。In the manufacturing apparatus of the compound solar cell, when a mixed gas of hydrogen selenide (also called selenium hydride; H 2 Se) adjusted to a predetermined concentration is supplied, a mixed gas adjusted to a predetermined concentration in advance is used. . However, due to the increasing demand for solar cells in recent years, in order to realize mass production of compound solar cells, a large amount of hydrogen selenide mixed gas must be supplied to the solar cell manufacturing apparatus. Therefore, the conventional technique of using a gas cylinder filled with a mixed gas adjusted to a predetermined concentration is a problem in that the exchange frequency of the steel cylinder is increased, and a sufficient gas supply amount cannot be ensured.

於是,如第2圖所示,使用可連續供應硒化氫混合氣體之硒化氫混合氣體的供應裝置101。在此供應裝置101設置有與省略圖示之基底氣體供應源連接之基底氣體供應流路L101、及與省略圖示之原料氣體供應源連接之原料氣體供應流路L102,分別可以供應濃度100%之惰性氣體與硒化氫氣體。又,在基底氣體供應流路L101及原料氣體供應流路L102分別設置有可以控制流量之質量流量控制器(Mass Flow Controller;MFC)105、112。而且,在基底氣體供應流路L101及原料氣體供應流路L102之下游側設置有貯存調整至預定濃度之硒化氫混合氣體的緩衝槽(Buffer tank)102。Then, as shown in Fig. 2, a supply device 101 for continuously supplying a hydrogen-selenide mixed gas of a hydrogen-selenide mixed gas is used. The supply device 101 is provided with a base gas supply flow path L101 connected to a base gas supply source (not shown) and a raw material gas supply flow path L102 connected to a raw material gas supply source (not shown), and can supply a concentration of 100%, respectively. Inert gas and hydrogen selenide gas. Further, mass flow controllers (MFCs) 105 and 112 that can control the flow rate are provided in the base gas supply flow path L101 and the material gas supply flow path L102, respectively. Further, on the downstream side of the base gas supply flow path L101 and the raw material gas supply flow path L102, a buffer tank 102 for storing a hydrogen-selenide mixed gas adjusted to a predetermined concentration is provided.

使用上述供應裝置101的以往之硒化氫混合氣體之供應方法,首先,以成為預定流量比之方式設定設置於基底氣體供應流路L101及原料氣體供應流路L102之各個質量流量控制器105、112的流量。其次,在分別設定成一定流量之質量流量控制器105、112的後段,以混合器將100%硒化氫氣體與基底氣體混合調整至預定濃度,將所得之太陽電池用硒化氫混合氣體貯存在緩衝槽102中。而且,自緩衝槽102將該太陽電池用硒化氫混合氣體供應到太陽電池之製造裝置中。同時,為了控制100%硒化氫氣體流量而設置於原料氣體供應流路L102的質量流量控制器112,係利用流量感測器檢測由流入氣體所產生之熱擴散並進行流量調整者。In the method of supplying the conventional hydrogen selenide mixed gas of the above-described supply device 101, first, the mass flow controllers 105 provided in the base gas supply flow path L101 and the material gas supply flow path L102 are set so as to have a predetermined flow rate ratio, 112 traffic. Next, in the latter stage of the mass flow controllers 105, 112 respectively set to a certain flow rate, 100% hydrogen selenide gas is mixed with the base gas by a mixer to adjust to a predetermined concentration, and the obtained solar cell is stored with a hydrogen selenide mixed gas. In the buffer tank 102. Further, the solar cell is supplied with the hydrogen-selenide mixed gas from the buffer tank 102 to the manufacturing apparatus of the solar cell. At the same time, the mass flow controller 112 provided in the raw material gas supply flow path L102 for controlling the flow rate of the 100% hydrogen selenide gas is used to detect the heat diffusion generated by the inflow gas and adjust the flow rate by the flow rate sensor.

[先前技術文獻][Previous Technical Literature] (專利文獻)(Patent Literature)

專利文獻1:日本特開2007-317885號公報Patent Document 1: Japanese Laid-Open Patent Publication No. 2007-317885

然而,以往之供應裝置及供應方法,在原料氣體供應管L102及質量流量控制器112中長時間使高濃度之硒化氫氣體通過時,硒化氫(H2 Se)會自行分解成氫(H2 )與硒(Se),原料氣體供應管L102及原料氣體用質量流量控制器112之內部的流量感測器中會產生硒結晶析出之現象。有由於該現象而流量控制會失效之問題。如此,流量控制失效時,由於100%硒化氫氣體用之質量流量控制器(MFC)112會將流動之氣體的量判斷為比實際更少量而開放控制閥,而會使比設定值更多量之氣體流動。結果,有自硒化氫混合氣體開始供應隨著時間的經過,作為目的的硒化氫混合氣體之濃度(設定值)、與實際所調製之硒化氫混合氣體之濃度(實測值)之間的誤差會變大之問題(將此稱為漂移(drift)現象(參照第3圖))。However, in the conventional supply device and supply method, when a high-concentration hydrogen selenide gas is passed through the raw material gas supply pipe L102 and the mass flow controller 112 for a long period of time, hydrogen selenide (H 2 Se) decomposes itself into hydrogen ( H 2) and selenium (Se), and the raw material gas supply pipe L102 material gas flow sensors inside the mass flow controller 112 will produce a precipitate of selenium crystallization. There is a problem that flow control will fail due to this phenomenon. Thus, when the flow control fails, the mass flow controller (MFC) 112 for the 100% hydrogen selenide gas judges the amount of the flowing gas to be smaller than the actual amount and opens the control valve, which will cause more than the set value. The amount of gas flows. As a result, there is a supply of hydrogen selenide mixed gas from time to time, between the concentration of the target hydrogen-selenide mixed gas (set value) and the concentration of the actually-synthesized hydrogen-selenide mixed gas (measured value). The error will become larger (this is called the drift phenomenon (see Figure 3)).

本發明是有鑑於上述原因而研創者,目的為提供一種可以連續地供應硒化氫濃度安定的硒化氫混合氣體之硒化氫混合氣體的供應方法及供應裝置。The present invention has been made in view of the above-described reasons, and an object thereof is to provide a supply method and a supply device for a hydrogen-selenide mixed gas which can continuously supply a hydrogen-selenide mixed gas having a stable hydrogen selenide concentration.

為了解決如此課題,本發明之第1態樣是一種硒化氫混合氣體之供應方 法,該方法係具有:供應將自基底氣體供應流路所供應之惰性氣體、與自原料氣體供應流路所供應之100%硒化氫氣體藉由混合而調整至預定濃度之硒化氫混合氣體的供應步驟,前述供應步驟中,藉由設置於該原料氣體供應流路之流量控制手段,將前述100%硒化氫氣體之流量控制在預定流量,藉由設置於前述流量控制手段之下游側的壓力控制手段,將前述流量控制手段與該壓力控制手段之間的前述100%硒化氫氣體之壓力控制在預定壓力。In order to solve such a problem, the first aspect of the present invention is a supply side of a hydrogen selenide mixed gas. The method has a method of: supplying an inert gas supplied from a base gas supply flow path and mixing with a hydrogen sulfide gas supplied from a raw material gas supply flow path to a predetermined concentration of selenide hydrogen a gas supply step, in the supplying step, controlling a flow rate of the 100% hydrogen selenide gas to a predetermined flow rate by a flow rate control means provided in the material gas supply flow path, and being disposed downstream of the flow rate control means The side pressure control means controls the pressure of the 100% hydrogen selenide gas between the flow rate control means and the pressure control means to a predetermined pressure.

在本發明之第1態樣中,以前述流量控制手段為孔口(orifice)或針閥(Needle Valve),前述壓力控制手段是自動壓力控制裝置(APR)為佳。In the first aspect of the invention, the flow rate control means is an orifice or a needle valve, and the pressure control means is preferably an automatic pressure control means (APR).

又,在本發明之第1態樣中,以前述孔口或針閥是金屬製者為佳。Further, in the first aspect of the invention, it is preferable that the orifice or the needle valve is made of metal.

又,在本發明之第1態樣中,以將調整至預定濃度之前述硒化氫混合氣體貯存在緩衝槽中,由前述緩衝槽供應所期望之濃度的硒化氫混合氣體為佳。Further, in the first aspect of the invention, it is preferable that the hydrogen-selenide mixed gas adjusted to a predetermined concentration is stored in a buffer tank, and a hydrogen-selenide mixed gas having a desired concentration is supplied from the buffer tank.

又,在本發明之第1態樣中,以於前述原料氣體供應流路中,將流路內之壓力減壓1次以上,於最後減壓後調整前述100%硒化氫氣體之流量為佳。Further, in the first aspect of the present invention, the pressure in the flow path is depressurized one time or more in the material gas supply flow path, and the flow rate of the 100% hydrogen selenide gas is adjusted after the final pressure reduction. good.

本發明之第2態樣是一種硒化氫混合氣體之供應裝置,其係具備基底氣體供應流路、與原料氣體供應流路,供應將自基底氣體供應流路所供應之惰性氣體、與自原料氣體供應流路所供應之100%硒化氫氣體藉由混合而 調整至預定濃度之硒化氫混合氣體,前述原料氣體供應流路係具備:用以將前述100%硒化氫氣體之流量控制在預定流量之流量控制手段、與用以將前述100%硒化氫氣體之壓力控制在一定之壓力控制手段,前述壓力控制手段是設置於前述流量控制手段之下游側。A second aspect of the present invention provides a hydrogen selenide mixed gas supply device comprising a base gas supply flow path and a raw material gas supply flow path for supplying an inert gas supplied from a base gas supply flow path, and 100% hydrogen selenide gas supplied from the raw material gas supply flow path by mixing Adjusting to a predetermined concentration of the hydrogen-selenide mixed gas, the raw material gas supply flow path having: a flow rate control means for controlling the flow rate of the 100% hydrogen selenide gas to a predetermined flow rate, and selenizing the 100% The pressure of the hydrogen gas is controlled by a certain pressure control means, and the pressure control means is provided on the downstream side of the flow rate control means.

在本發明之第2態樣中,以前述流量控制手段是孔口或針閥,前述壓力控制手段是自動壓力控制裝置(APR)為佳。In the second aspect of the invention, the flow rate control means is an orifice or a needle valve, and the pressure control means is preferably an automatic pressure control means (APR).

又,在本發明之第2態樣中,以前述孔口或針閥是金屬製者為佳。Further, in the second aspect of the invention, it is preferable that the orifice or the needle valve is made of metal.

又,在本發明之第2態樣中,以復具備貯存調整至預定濃度之前述硒化氫混合氣體之緩衝槽為佳。Further, in the second aspect of the present invention, it is preferable to further include a buffer tank for storing the hydrogen-selenide mixed gas adjusted to a predetermined concentration.

在前述緩衝槽以設置有用以供應前述硒化氫混合氣體之供應口為佳。It is preferable to provide a supply port for supplying the aforementioned hydrogen-selenide mixed gas in the aforementioned buffer tank.

又,本發明之第2態樣,以於前述原料氣體供應流路設置有1個以上之壓力調整器,在最下游側之前述壓力調整器與前述壓力控制手段之間設置有前述流量控制手段為佳。Further, according to a second aspect of the present invention, the material gas supply flow path is provided with one or more pressure regulators, and the flow rate control means is provided between the pressure regulator and the pressure control means on the most downstream side. It is better.

本發明之硒化氫混合氣體之供應方法係具備下述結構:藉由設置於原料氣體供應流路之流量控制手段,將前述100%硒化氫氣體之流量控制在預定流量,藉由設置於該流量控制手段之下游側的壓力控制手段,將流量控制手段 與壓力控制手段之間的100%硒化氫氣體一面保持在預定壓力一面供應。The method for supplying a hydrogen-selenide mixed gas according to the present invention is characterized in that the flow rate of the 100% hydrogen selenide gas is controlled to a predetermined flow rate by a flow rate control means provided in a raw material gas supply flow path, and is provided by The pressure control means on the downstream side of the flow control means, the flow control means The 100% hydrogen selenide gas between the pressure control means is supplied while being maintained at a predetermined pressure.

藉此,經由連續使100%硒化氫氣體通過,由於即使在原料氣體供應流路、流量控制手段與壓力控制手段有硒(Se)結晶析出,也可以將流量控制手段與壓力控制手段之間的壓力保持在一定,故可以安定地控制100%硒化氫氣體之流量。即,可以排除由因連續使100%硒化氫氣體通過而產生之硒(Se)結晶析出所造成之影響,而連續地供應硒化氫濃度安定的硒化氫混合氣體。Thereby, by continuously passing 100% of the hydrogen selenide gas, the flow rate control means and the pressure control means can be used even if selenium (Se) crystals are precipitated in the raw material gas supply flow path, the flow rate control means, and the pressure control means. The pressure is kept constant, so the flow rate of 100% hydrogen selenide gas can be stably controlled. That is, it is possible to eliminate the influence of the precipitation of selenium (Se) crystals generated by the continuous passage of 100% of the hydrogen selenide gas, and continuously supply the hydrogen-selenide mixed gas having a stable hydrogen selenide concentration.

本發明的硒化氫混合氣體之供應裝置係具備下述結構:原料氣體供應流路係具備流量控制手段與壓力控制手段,壓力控制手段是設置於流量控制手段之下游側。藉此,由於可以將100%硒化氫氣體之流量控制在預定流量,同時,將流量控制手段與壓力控制手段之間的壓力保持在一定,故可以安定地控制100%硒化氫氣體之流量。因此,可以連續地供應硒化氫之濃度安定的硒化氫混合氣體。The hydrogen selenide mixed gas supply device of the present invention has a configuration in which the raw material gas supply flow path system includes a flow rate control means and a pressure control means, and the pressure control means is provided on the downstream side of the flow rate control means. Thereby, since the flow rate of the 100% hydrogen selenide gas can be controlled to a predetermined flow rate, and the pressure between the flow rate control means and the pressure control means is kept constant, the flow rate of the 100% hydrogen selenide gas can be stably controlled. . Therefore, it is possible to continuously supply a hydrogen selenide mixed gas of a stable concentration of hydrogen selenide.

以下,使用圖式詳細說明使用本發明之一實施形態的太陽電池用硒化氫混合氣體之供應方法、與該方法所使用之太陽電池用硒化氫混合氣體的供應裝置。Hereinafter, a method of supplying a hydrogen-selenide mixed gas for a solar cell according to an embodiment of the present invention and a supply device for a mixed hydrogen-selenide gas for a solar cell used in the method will be described in detail with reference to the drawings.

又,在以下說明中使用之圖式,為了容易瞭解其特徵,有為了方便而將成為特徵部分擴大顯示之情形,各結構要件之尺寸比率等不一定與實際相同。Further, in the drawings used in the following description, in order to facilitate the understanding of the features, the feature portions may be enlarged for convenience, and the dimensional ratios and the like of the respective constituent elements are not necessarily the same as the actual ones.

又,關於本說明書中使用之單位,濃度是表示體積濃 度、壓力是表示錶壓、流量是表示體積流量。又,在本說明書中所示之體積是在基準狀態(0℃、1atm(大氣壓))下之體積。Also, regarding the unit used in the present specification, the concentration means that the volume is rich. Degree, pressure means gauge pressure, flow rate means volume flow. Further, the volume shown in the present specification is the volume in the reference state (0 ° C, 1 atm (atmospheric pressure)).

首先,說明使用本發明之一實施形態的太陽電池用硒化氫混合氣體之供應裝置(以下,僅稱為「供應裝置」)的結構。First, a configuration of a supply device (hereinafter simply referred to as "supply device") for a hydrogen selenide mixed gas for a solar cell according to an embodiment of the present invention will be described.

如第1圖所示,本實施形態之供應裝置1是因應太陽電池之製造裝置的生產狀況,供應調整至預定濃度之硒化氫混合氣體的裝置。具體上,供應裝置1係具備:用以供應基底氣體之基底氣體供應流路L1、用以供應原料氣體之原料氣體供應流路L2、與用以貯存調整至預定濃度之硒化氫混合氣體的緩衝槽2之概略結構。As shown in Fig. 1, the supply device 1 of the present embodiment is a device that supplies a hydrogen-selenide mixed gas adjusted to a predetermined concentration in response to the production state of the solar cell manufacturing apparatus. Specifically, the supply device 1 includes a base gas supply flow path L1 for supplying a base gas, a raw material gas supply flow path L2 for supplying a raw material gas, and a mixed gas of selenide for storing and adjusting to a predetermined concentration. The schematic structure of the buffer tank 2.

基底氣體供應流路L1,係一端與省略圖示的基底氣體供應源連接,另一端與省略圖示的混合器連接。The base gas supply flow path L1 is connected to one end of a base gas supply source (not shown), and the other end is connected to a mixer (not shown).

基底氣體只要是稀釋用途之惰性氣體即可而無特別限定。作為上述氣體者,列舉如,氮(N2 )氣、氬(Ar)氣等。The base gas is not particularly limited as long as it is an inert gas for dilution. Examples of the gas include nitrogen (N 2 ) gas, argon (Ar) gas, and the like.

在基底氣體供應流路L1,係自上游側向下游側,依序設置有開關閥3、壓力調整器4、質量流量控制器5、自動閥6。又,在壓力調整器4之上游側及下游側,分別設置有壓力計7、8,可以目視確認壓力調整器4之前後之壓力。In the base gas supply flow path L1, the on-off valve 3, the pressure regulator 4, the mass flow controller 5, and the automatic valve 6 are provided in this order from the upstream side to the downstream side. Further, pressure gauges 7 and 8 are provided on the upstream side and the downstream side of the pressure regulator 4, respectively, and the pressure before and after the pressure regulator 4 can be visually confirmed.

壓力調整器4是為了將自基底氣體供應源所供應之基底氣體之壓力減壓到所期望之壓力而設置者。在本實施形態之供應裝置1雖在基底氣體供應流路L1只有顯示1個壓力調整器4,但並不侷限於此,壓力調整器4也可以設置2 個以上。The pressure regulator 4 is provided for decompressing the pressure of the base gas supplied from the base gas supply source to a desired pressure. In the supply device 1 of the present embodiment, only one pressure regulator 4 is displayed in the base gas supply flow path L1. However, the present invention is not limited thereto, and the pressure regulator 4 may be provided with 2 More than one.

同時,質量流量控制器5之正前方之壓力,可以因應對太陽電池製造裝置之供應壓力而適當選擇。例如,質量流量控制器5之正前方之壓力,可以設成0.6至0.7MPa之範圍。At the same time, the pressure directly in front of the mass flow controller 5 can be appropriately selected in response to the supply pressure of the solar cell manufacturing apparatus. For example, the pressure directly in front of the mass flow controller 5 can be set in the range of 0.6 to 0.7 MPa.

質量流量控制器5是測量基底氣體之質量流量並進行流量控制之流量控制機器,可以高精度地進行流量測量及控制。作為搭載在質量流量控制器5之質量流量感測器者,並無特別限定,例如,可以是一般使用的熱式質量流量感測器或差壓(differential pressure)式質量流量感測器等。The mass flow controller 5 is a flow rate control device that measures the mass flow rate of the base gas and performs flow rate control, and can perform flow rate measurement and control with high precision. The mass flow sensor mounted on the mass flow controller 5 is not particularly limited, and may be, for example, a general-purpose thermal mass flow sensor or a differential pressure mass flow sensor.

原料氣體供應流路L2係一端與省略圖示的原料氣體供應源連接,另一端與省略圖示的混合器連接。One end of the material gas supply flow path L2 is connected to a source gas supply source (not shown), and the other end is connected to a mixer (not shown).

原料氣體是濃度100%之硒化氫(H2 Se)氣體。同時,本說明書中,僅記載為100%硒化氫氣體。The material gas is a hydrogen selenide (H 2 Se) gas having a concentration of 100%. Meanwhile, in the present specification, only 100% hydrogen selenide gas is described.

原料氣體供應流路L2,係自上游側向下游側,依序設置有自動閥9、開關閥10、壓力調整器11、流量控制手段12、壓力控制手段13、自動閥14。又,在壓力調整器11之上游側及下游側,分別設置有壓力計15、16,可以目視確認壓力調整器11之前後之壓力。The material gas supply flow path L2 is provided with an automatic valve 9, an on-off valve 10, a pressure regulator 11, a flow rate control means 12, a pressure control means 13, and an automatic valve 14 from the upstream side to the downstream side. Further, pressure gauges 15 and 16 are provided on the upstream side and the downstream side of the pressure regulator 11, respectively, and the pressure before and after the pressure regulator 11 can be visually confirmed.

壓力調整器11是為了將自原料氣體供應源所供應之100%硒化氫氣體之壓力減壓到所期望之壓力而設置者。在本實施形態之供應裝置1雖在原料氣體供應流路L2只有顯示1個之壓力調整器11,但並不侷限於此,壓力調整器11 也可以設置2個以上。The pressure regulator 11 is provided to depressurize the pressure of 100% hydrogen selenide gas supplied from the source gas supply source to a desired pressure. In the supply device 1 of the present embodiment, only one pressure regulator 11 is shown in the material gas supply flow path L2. However, the pressure regulator 11 is not limited thereto. It is also possible to set two or more.

又,當供應原料氣體時,沒有將原料氣體減壓之必要性之情形,也可以不設置壓力調整器11。沒有減壓之必要性的情形是指,例如,即使不降低原料氣體供應壓力,原料氣體也會以預定壓力在原料氣體供應流路L2中流動之情形。Further, when the material gas is supplied, there is no need to depressurize the material gas, and the pressure regulator 11 may not be provided. The case where there is no necessity of decompression means that, for example, the raw material gas flows in the raw material gas supply flow path L2 at a predetermined pressure without lowering the material gas supply pressure.

流量控制手段12係設置於:設置於原料氣體供應流路L2之最下游側的壓力調整器11、與壓力控制手段13之間。流量控制手段12只要是能將原料氣體之100%硒化氫氣體流量控制在預定流量的構件即可,而無特別限定。作為上述構件者,例如,針閥或孔口等。又,硒化氫氣體自行分解所產生之硒(Se)結晶,由於容易析出在樹脂性之構件,故上述之針閥或孔口是以使用金屬製者為佳。The flow rate control means 12 is provided between the pressure regulator 11 provided on the most downstream side of the material gas supply flow path L2 and the pressure control means 13. The flow rate control means 12 is not particularly limited as long as it can control the flow rate of the 100% hydrogen selenide gas of the material gas to a predetermined flow rate. As the above member, for example, a needle valve or an orifice or the like. Further, since selenium (Se) crystals generated by self-decomposition of hydrogen selenide gas are easily precipitated in a resinous member, it is preferable that the above-mentioned needle valve or orifice is made of metal.

作為如此之針閥者,可以例示FUDDFM-71M-6.35。又,作為孔口者,可以例示UJR-6.35RE-RG-O-0.5。As such a needle valve, FUDDFM-71M-6.35 can be exemplified. Further, as the orifice, UJR-6.35RE-RG-O-0.5 can be exemplified.

流量控制手段12之下游側的流量,可以因應必要之硒化氫混合氣體的供應量而適當選擇。具體上,例如可以在0至20L/min之範圍。The flow rate on the downstream side of the flow rate control means 12 can be appropriately selected in accordance with the supply amount of the required hydrogen-selenide mixed gas. Specifically, it can be, for example, in the range of 0 to 20 L/min.

壓力控制手段13是設置於流量控制手段12之下游側。壓力控制手段13,只要是能使流量控制手段12與壓力控制手段13之間的壓力保持在一定的構件即可,而無特別限定。作為上述之構件者,可列舉如,自動壓力控制裝置(APR)。The pressure control means 13 is provided on the downstream side of the flow rate control means 12. The pressure control means 13 is not particularly limited as long as it can maintain a constant pressure between the flow rate control means 12 and the pressure control means 13. As the above-mentioned members, for example, an automatic pressure control device (APR) can be cited.

流量控制手段12與壓力控制手段13之間的壓力,可 以因應對太陽電池製造裝置的供應壓力而適當選擇。例如作為藉由壓力控制手段13所管理之壓力者,可以在0.5至0.6MPa之範圍。The pressure between the flow control means 12 and the pressure control means 13 can be It is appropriately selected in response to the supply pressure of the solar cell manufacturing apparatus. For example, as the pressure managed by the pressure control means 13, it can be in the range of 0.5 to 0.6 MPa.

基底氣體供應流路L1及原料氣體供應流路L2所連接之省略圖示的混合器與緩衝槽2,係藉由流路L3而連接。在該流路L3之上游側及下游側分別設置有開關閥17、18。The mixer and the buffer tank 2 (not shown) to which the base gas supply flow path L1 and the material gas supply flow path L2 are connected are connected by the flow path L3. On-off valves 17 and 18 are provided on the upstream side and the downstream side of the flow path L3, respectively.

緩衝槽2是用以貯存藉由混合器而調整至預定濃度之硒化氫混合氣體的貯存槽。緩衝槽的容量並無特別限定,可以因應對太陽電池製造裝置的硒化氫混合氣體之供應量而適當選擇。The buffer tank 2 is a storage tank for storing a hydrogen-selenide mixed gas adjusted to a predetermined concentration by a mixer. The capacity of the buffer tank is not particularly limited, and may be appropriately selected in response to the supply amount of the hydrogen-selenide mixed gas in the solar cell manufacturing apparatus.

在緩衝槽2設置有省略圖示的供應口,在該供應口連接有流路L4之一端,該流路L4之另一端是連接在太陽電池製造裝置。藉此,可以自緩衝槽2向太陽電池製造裝置供應硒化氫混合氣體。又,在流路L4之供應口側設置有開關閥19。The buffer tank 2 is provided with a supply port (not shown), and one end of the flow path L4 is connected to the supply port, and the other end of the flow path L4 is connected to the solar cell manufacturing apparatus. Thereby, the hydrogen selenide mixed gas can be supplied from the buffer tank 2 to the solar cell manufacturing apparatus. Further, an on-off valve 19 is provided on the supply port side of the flow path L4.

又,在緩衝槽2連接有流路L5之一端,該流路L5之另一端是連接在壓力計20。藉由該壓力計20,可以確認緩衝槽內之壓力。又,在流路L5設置有開關閥21。Further, one end of the flow path L5 is connected to the buffer tank 2, and the other end of the flow path L5 is connected to the pressure gauge 20. With the pressure gauge 20, the pressure in the buffer tank can be confirmed. Further, the on-off valve 21 is provided in the flow path L5.

再者,緩衝槽2是與自流路L3分枝出的流路L6連通。流路L6之一端是與流路L3連接,另一端與省略圖示之排氣導管(duct)連接。又,在流路L6設置有氣體濃度分析計22。藉由該氣體濃度分析計22,可以測定在緩衝槽2內之硒化氫混合氣體中的硒化氫氣體濃度。又,在氣體濃度分析計22之上游側及下游側,分別設置有開關閥23、24。Further, the buffer tank 2 is in communication with the flow path L6 branched from the flow path L3. One end of the flow path L6 is connected to the flow path L3, and the other end is connected to an exhaust duct (not shown). Further, a gas concentration analyzer 22 is provided in the flow path L6. The concentration of hydrogen selenide gas in the hydrogen-selenide mixed gas in the buffer tank 2 can be measured by the gas concentration analyzer 22. Further, on the upstream side and the downstream side of the gas concentration analyzer 22, on-off valves 23 and 24 are provided, respectively.

其次,說明使用上述供應裝置1之本實施形態的太陽電池用硒化氫混合氣體之供應方法(以下,僅稱為「供應方法」)。Next, a method of supplying a hydrogen-selenide mixed gas for a solar cell according to the present embodiment of the above-described supply device 1 (hereinafter, simply referred to as "supply method") will be described.

本實施形態的供應方法為一種太陽電池用硒化氫混合氣體之供應方法,其係具有:供應將自基底氣體供應流路L1所供應之惰性氣體、與自原料氣體供應流路L2所供應之100%硒化氫氣體藉由混合而調整至預定濃度之硒化氫混合氣體供應之供應步驟,在供應步驟中,藉由設置於原料氣體供應流路L2之流量控制手段12,將100%硒化氫氣體之流量控制在預定流量,藉由設置於流量控制手段12之下游側的壓力控制手段13,將流量控制手段12與壓力控制手段13之間的100%硒化氫氣體之壓力控制在預定壓力。The supply method of the present embodiment is a method of supplying a hydrogen selenide mixed gas for a solar cell, which is provided by supplying an inert gas supplied from the base gas supply flow path L1 and supplied from the raw material gas supply flow path L2. 100% hydrogen selenide gas is supplied to a predetermined concentration of the supply of hydrogen selenide mixed gas by mixing, and in the supply step, 100% selenium is provided by the flow control means 12 disposed in the raw material gas supply flow path L2 The flow rate of the hydrogen-producing gas is controlled at a predetermined flow rate, and the pressure of the 100% hydrogen selenide gas between the flow rate control means 12 and the pressure control means 13 is controlled by the pressure control means 13 provided on the downstream side of the flow rate control means 12. Scheduled pressure.

具體上,首先,一面將開關閥3、10、17、18、19、21、23、24進行開關操作,一面進行流路內之清洗(purge)。上述清洗結束後,如第1圖所示將全部之開關閥設定在打開狀態。Specifically, first, the switching valves 3, 10, 17, 18, 19, 21, 23, and 24 are subjected to a switching operation to perform a purge in the flow path. After the above cleaning is completed, all of the on-off valves are set to the open state as shown in Fig. 1.

其次,自基底氣體供應流路L1將惰性氣體、自原料氣體供應源L2將100%硒化氫氣體分別供應到混合器內。Next, 100% of hydrogen selenide gas is supplied from the base gas supply flow path L1 to the mixer from the raw material gas supply source L2, respectively.

惰性氣體係自基底氣體供應源供應到基底氣體流路L1。在該基底氣體供應流路L1中,藉由壓力調整器4減壓到預定壓力後,導入質量流量控制器5內。自質量流量控制器5排出所設定之流量的惰性氣體。因此,自動閥6在打開狀態時,向混合器供應預定流量之惰性氣體。The inert gas system is supplied from the base gas supply source to the base gas flow path L1. In the base gas supply flow path L1, the pressure regulator 4 is depressurized to a predetermined pressure, and then introduced into the mass flow controller 5. The inert gas of the set flow rate is discharged from the mass flow controller 5. Therefore, the automatic valve 6 supplies the mixer with a predetermined flow of inert gas when it is in the open state.

100%硒化氫氣體係自原料氣體供應源供應到原料氣 體供應流路L2。在該原料氣體供應流路L2中,藉由壓力調整器11減壓到預定壓力後,經由流量控制手段12之孔口或針閥控制在預定流量。於是,藉由壓力控制手段13,將流量控制手段12與壓力控制手段13之間的壓力控制在預定壓力,自動閥14在打開狀態時,向混合器供應預定流量之100%硒化氫氣體。100% selenide hydrogen system is supplied from raw material gas supply source to raw material gas The body supply flow path L2. In the material gas supply flow path L2, after the pressure regulator 11 is depressurized to a predetermined pressure, it is controlled at a predetermined flow rate via an orifice or a needle valve of the flow rate control means 12. Then, by the pressure control means 13, the pressure between the flow rate control means 12 and the pressure control means 13 is controlled to a predetermined pressure, and when the automatic valve 14 is in the open state, the mixer is supplied with a predetermined flow rate of 100% hydrogen selenide gas.

其次,藉由混合器混合以預定流量所供應之惰性氣體以及100%硒化氫氣體,調製預定濃度之硒化氫混合氣體。Next, a predetermined concentration of the hydrogen-selenide mixed gas is prepared by mixing an inert gas supplied at a predetermined flow rate and 100% hydrogen selenide gas by a mixer.

硒化氫混合氣體之濃度,並無特別之限制,可以因應太陽電池製造裝置的要求而適當選擇。具體上,例如,可以將硒化氫混合氣體中之硒化氫濃度設定在5至20vol%。The concentration of the hydrogen selenide mixed gas is not particularly limited and may be appropriately selected in accordance with the requirements of the solar cell manufacturing apparatus. Specifically, for example, the concentration of hydrogen selenide in the hydrogen-selenide mixed gas can be set to 5 to 20 vol%.

其次,將調整至預定濃度之硒化氫混合氣體經由流路L3向緩衝槽2供應。因此,自連接在該緩衝槽2之供應口之流路L4,因應生產狀況而將硒化氫混合氣體向太陽電池製造裝置供應。同時,緩衝槽2內之壓力,可以藉由壓力計20測量。又,緩衝槽2內之硒化氫混合氣體之濃度,可以藉由氣體濃度分析計22而測量。Next, the hydrogen-selenide mixed gas adjusted to a predetermined concentration is supplied to the buffer tank 2 via the flow path L3. Therefore, the hydrogen selenide mixed gas is supplied to the solar cell manufacturing apparatus in accordance with the production condition from the flow path L4 connected to the supply port of the buffer tank 2. At the same time, the pressure in the buffer tank 2 can be measured by the pressure gauge 20. Further, the concentration of the hydrogen-selenide mixed gas in the buffer tank 2 can be measured by the gas concentration analyzer 22.

如此,將硒化氫之濃度安定的硒化氫混合氣體連續的供應到太陽電池製造裝置中。In this manner, the hydrogen selenide mixed gas having a stable concentration of hydrogen selenide is continuously supplied to the solar cell manufacturing apparatus.

向緩衝槽2之硒化氫混合氣體供應,除了如上述之連續方式之外,也可以選擇批次(batch)方式。The supply of the hydrogen-selenide mixed gas to the buffer tank 2 may be selected in addition to the continuous mode as described above.

批次方式是指在所設定之上限值及下限值的範圍內管理緩衝槽2內壓力,以使緩衝槽2內之壓力維持上述管理範圍之方式供應硒化氫混合氣體之方法。The batch mode is a method of managing the pressure in the buffer tank 2 within the range of the upper limit and the lower limit, and supplying the hydrogen-selenide mixed gas so that the pressure in the buffer tank 2 maintains the above-described management range.

具體上,緩衝槽2內之壓力低於所設定之下限值時,則會將信號送至設置於基底氣體供應流路L1的自動閥6及設置於原料氣體供應流路L2的自動閥9、14,此等自動閥6、9、14變成打開狀態。此等自動閥6、9、14變成打開狀態時,設定在各個流量的惰性氣體及100%硒化氫氣體經由混合器,向緩衝槽2內供應調整至預定濃度之硒化氫混合氣體。因此,緩衝槽2內之壓力達到所設定之上限值時,會將信號送至設置於基底氣體供應流路L1之自動閥6及設置於原料氣體供應流路L2之自動閥9、14,此等自動閥6、9、14變成關閉狀態,而結束供應。同時,上述循環稱為1批次。Specifically, when the pressure in the buffer tank 2 is lower than the set lower limit value, the signal is sent to the automatic valve 6 provided in the base gas supply flow path L1 and the automatic valve 9 provided in the raw material gas supply flow path L2. 14, these automatic valves 6, 9, 14 are turned on. When the automatic valves 6, 9, and 14 are turned on, the inert gas and the 100% hydrogen selenide gas set at the respective flow rates are supplied to the buffer tank 2 through the mixer, and the hydrogen-selenide mixed gas adjusted to a predetermined concentration is supplied. Therefore, when the pressure in the buffer tank 2 reaches the set upper limit value, the signal is sent to the automatic valve 6 provided in the base gas supply flow path L1 and the automatic valves 9, 14 provided in the raw material gas supply flow path L2. These automatic valves 6, 9, 14 are turned off, and the supply is ended. At the same time, the above cycle is called 1 batch.

如以上說明,本實施形態的供應裝置1係具有下述結構:在原料氣體供應流路L2具備流量控制手段12與壓力控制手段13,壓力控制手段13是設置於流量控制手段12之下游側。藉此,可以將原料氣體側之100%硒化氫氣體之流量控制在預定流量,同時,可以將流量控制手段12與壓力控制手段13之間的壓力維持在一定。因此,可以安定地將流量控制在一定之100%硒化氫氣體供應到混合器中。因此,可以因應生產狀態,將硒化氫濃度安定的硒化氫混合氣體連續地供應到太陽電池製造裝置中。As described above, the supply device 1 of the present embodiment has a configuration in which the flow rate control means 12 and the pressure control means 13 are provided in the material gas supply flow path L2, and the pressure control means 13 is provided on the downstream side of the flow rate control means 12. Thereby, the flow rate of the 100% hydrogen selenide gas on the material gas side can be controlled to a predetermined flow rate, and the pressure between the flow rate control means 12 and the pressure control means 13 can be maintained constant. Therefore, it is possible to stably control the flow rate to supply a certain amount of 100% hydrogen selenide gas to the mixer. Therefore, the hydrogen selenide mixed gas having a stable hydrogen selenide concentration can be continuously supplied to the solar cell manufacturing apparatus in accordance with the production state.

在本實施形態的供應裝置1,,因為使用孔口或針閥作為流量控制手段12,所以可以確實控制100%硒化氫氣體之流量。而且,孔口或針閥以金屬製,可以抑制硒(Se)之結晶析出。In the supply device 1 of the present embodiment, since the orifice or the needle valve is used as the flow rate control means 12, the flow rate of the 100% hydrogen selenide gas can be surely controlled. Further, the orifice or the needle valve is made of metal, and selenium (Se) crystal precipitation can be suppressed.

又,因為使用自動壓力控制裝置(APR)作為壓力控制手段,所以可以容易地進行流量控制手段12與壓力控制手段13之間的壓力控制。Moreover, since the automatic pressure control device (APR) is used as the pressure control means, the pressure control between the flow rate control means 12 and the pressure control means 13 can be easily performed.

在本實施形態的供應裝置1,由於具備緩衝槽2,所以可以預先貯存調整至預定濃度之硒化氫混合氣體。藉此,可以因應生產狀態適當將硒化氫混合氣體供應至太陽電池製造裝置。In the supply device 1 of the present embodiment, since the buffer tank 2 is provided, the hydrogen-selenide mixed gas adjusted to a predetermined concentration can be stored in advance. Thereby, the hydrogen-selenide mixed gas can be appropriately supplied to the solar cell manufacturing apparatus in accordance with the production state.

依照本實施形態的供應方法,藉由設置於原料氣體供應流路L2之流量控制手段12,將100%硒化氫氣體之流量控制在預定流量,藉由設置於該流量控制手段12之下游側的壓力控制手段13,一面將流量控制手段12與壓力控制手段13之間的100%硒化氫氣體維持在預定壓力,一面供應原料氣體之100%硒化氫氣體。藉此,連續供應100%硒化氫氣體時,即使在原料氣體供應流路L2、流量控制手段12、及壓力控制手段13中硒(Se)結晶析出,也可以將流量控制手段12與壓力控制手段13之間的壓力維持在一定。因此,可以安定地控制100%硒化氫氣體之流量。即,即使連續供應硒化氫混合氣體之情形,也不會產生目的之硒化氫混合氣體的濃度(設定值)、與實際所調製之硒化氫混合氣體的濃度(實測值)之間的誤差變大之問題。According to the supply method of the present embodiment, the flow rate of the 100% hydrogen selenide gas is controlled to a predetermined flow rate by the flow rate control means 12 provided in the material gas supply flow path L2, and is provided on the downstream side of the flow rate control means 12 The pressure control means 13 supplies 100% of the hydrogen selenide gas of the material gas while maintaining the 100% hydrogen selenide gas between the flow rate control means 12 and the pressure control means 13 at a predetermined pressure. Thereby, when 100% hydrogen selenide gas is continuously supplied, the flow rate control means 12 and the pressure control can be controlled even if selenium (Se) crystallizes in the raw material gas supply flow path L2, the flow rate control means 12, and the pressure control means 13. The pressure between means 13 is maintained at a certain level. Therefore, the flow rate of 100% hydrogen selenide gas can be stably controlled. That is, even if the hydrogen-selenide mixed gas is continuously supplied, the concentration (set value) of the desired hydrogen-selenide mixed gas and the concentration (actual measured value) of the actually-mixed hydrogen-selenide mixed gas are not generated. The problem of large errors.

如此,本發明可以排除由因連續使100%硒化氫氣體通過而產生之硒(Se)結晶析出所造成之影響,連續供應硒化氫濃度安定之硒化氫混合氣體。於是,可以在太陽電池製造製程中因應生產量而連續供應濃度安定的硒化氫混合氣 體,可以大量生產太陽電池。Thus, the present invention can eliminate the influence of the precipitation of selenium (Se) crystals generated by the continuous passage of 100% hydrogen selenide gas, and continuously supply a hydrogen selenide mixed gas having a stable hydrogen selenide concentration. Therefore, the concentration-stabilized hydrogen-selenide mixture can be continuously supplied in the solar cell manufacturing process in response to the production amount. The body can mass produce solar cells.

(實施例)(Example)

以下,顯示具體例。Hereinafter, a specific example will be shown.

(例1)(example 1)

使用第1圖所示之供應裝置1,在太陽電池製造裝置中連續供應硒化氫混合氣體。對太陽電池製造裝置連續供應硒化氫混合氣體,係採用使用緩衝槽2之批次方式。The hydrogen selenide mixed gas is continuously supplied to the solar cell manufacturing apparatus using the supply device 1 shown in Fig. 1. The continuous supply of the hydrogen-selenide mixed gas to the solar cell manufacturing apparatus is a batch method using the buffer tank 2.

又,在硒化氫混合氣體之供應時作為供應裝置1的條件者,使用表1之條件。Further, as conditions for the supply device 1 at the time of supply of the hydrogen-selenide mixed gas, the conditions of Table 1 were used.

依據表1之條件進行50次之批次處理後,使用連接於緩衝槽2之氣體濃度分析計22記錄混合氣體之濃度變化。結果在表2中表示。After 50 batch processing according to the conditions of Table 1, the concentration change of the mixed gas was recorded using the gas concentration analyzer 22 connected to the buffer tank 2. The results are shown in Table 2.

(例2)(Example 2)

使用第2圖所示之供應裝置101,在太陽電池製造裝置中連續供應硒化氫混合氣體。對太陽電池製造裝置連續供應硒化氫混合氣體,係採用使用緩衝槽102之批次方式,作為供應裝置101之硒化氫混合氣體的供應條件是使用表1之條件。The hydrogen selenide mixed gas is continuously supplied to the solar cell manufacturing apparatus using the supply device 101 shown in FIG. The continuous supply of the hydrogen-selenide mixed gas to the solar cell manufacturing apparatus is a batch method using the buffer tank 102, and the supply conditions of the hydrogen-selenide mixed gas as the supply apparatus 101 are the conditions of Table 1.

依據表1之條件進行50次之批次處理後,使用連接於緩衝槽102之氣體濃度分析計122,記錄混合氣體之濃度變化。結果在表2中表示。After 50 batch processing according to the conditions of Table 1, the concentration change of the mixed gas was recorded using the gas concentration analyzer 122 connected to the buffer tank 102. The results are shown in Table 2.

如表2所示,習知技術之例2中進行緩衝槽之50次的批次處理後,硒化氫混合氣體之設定濃度與實測濃度之誤差是+1.31%。相對於此,使用本發明之例1中,設定濃度與實測濃度之誤差是+0.10%。As shown in Table 2, after the batch treatment of the buffer tank 50 times in Example 2 of the prior art, the error between the set concentration of the hydrogen-selenide mixed gas and the measured concentration was +1.31%. On the other hand, in Example 1 of the present invention, the error between the set concentration and the measured concentration was +0.10%.

由以上,確認連續供應硒化氫混合氣體時,使用本發明之例1,與習知技術之例2相比較,連續供應前後之硒化氫混合氣體的濃度變化可以抑制到約1/13左右。From the above, when the continuous supply of the hydrogen-selenide mixed gas is confirmed, the example 1 of the present invention is used, and the concentration change of the hydrogen-selenide mixed gas before and after the continuous supply can be suppressed to about 1/13 as compared with the conventional example 2 .

1‧‧‧供應裝置(太陽電池用硒化氫混合氣體之供應裝置)1‧‧‧Supply device (supply device for hydrogen selenide mixed gas for solar cells)

2‧‧‧緩衝槽2‧‧‧buffer tank

3、10、14、17、18、19、21、23、24‧‧‧開關閥3, 10, 14, 17, 18, 19, 21, 23, 24‧‧‧ switch valves

4、11‧‧‧壓力調整器4, 11‧‧‧ pressure regulator

5‧‧‧質量流量控制器(MFC)5‧‧‧Quality Flow Controller (MFC)

6、9、14‧‧‧自動閥6, 9, ‧ ‧ automatic valves

7、8、15、16、20‧‧‧壓力計7, 8, 15, 16, 20‧‧‧ pressure gauges

12‧‧‧流量控制手段12‧‧‧Flow control means

13‧‧‧壓力控制手段13‧‧‧ Pressure control measures

22‧‧‧氣體濃度分析計22‧‧‧ gas concentration analyzer

L1‧‧‧基底氣體供應流路L1‧‧‧base gas supply flow path

L2‧‧‧原料氣體供應流路L2‧‧‧ material gas supply flow path

L3至L6‧‧‧流路L3 to L6‧‧‧ flow path

101‧‧‧硒化氫混合氣體的供應裝置101‧‧‧Supply device for hydrogen selenide mixed gas

102‧‧‧緩衝槽102‧‧‧buffer tank

105、112‧‧‧質量流量控制器(MFC)105, 112‧‧‧ Mass Flow Controller (MFC)

122‧‧‧氣體濃度分析計122‧‧‧Gas concentration analyzer

L101‧‧‧基底氣體供應流路L101‧‧‧Base gas supply flow path

L102‧‧‧原料氣體供應流路L102‧‧‧Material gas supply flow path

第1圖表示本發明之一實施形態的硒化氫混合氣體之供應裝置的示意圖。Fig. 1 is a schematic view showing a supply apparatus of a hydrogen-selenide mixed gas according to an embodiment of the present invention.

第2圖表示以往之硒化氫混合氣體之供應裝置的示意圖。Fig. 2 is a view showing a conventional apparatus for supplying a hydrogen selenide mixed gas.

第3圖表示以往之硒化氫混合氣體的供應方法中混合氣體中的硒化氫氣體濃度之設定值與實測值的關係之圖。Fig. 3 is a graph showing the relationship between the set value of the hydrogen selenide gas concentration in the mixed gas and the measured value in the conventional method of supplying a hydrogen selenide mixed gas.

1‧‧‧供應裝置(太陽電池用硒化氫混合氣體之供應裝置)1‧‧‧Supply device (supply device for hydrogen selenide mixed gas for solar cells)

2‧‧‧緩衝槽2‧‧‧buffer tank

3、10、14、17、18、19、21、23、24‧‧‧開關閥3, 10, 14, 17, 18, 19, 21, 23, 24‧‧‧ switch valves

4、11‧‧‧壓力調整器4, 11‧‧‧ pressure regulator

5‧‧‧質量流量控制器(MFC)5‧‧‧Quality Flow Controller (MFC)

6、9、14‧‧‧自動閥6, 9, ‧ ‧ automatic valves

7、8、15、16、20‧‧‧壓力計7, 8, 15, 16, 20‧‧‧ pressure gauges

12‧‧‧流量控制手段12‧‧‧Flow control means

13‧‧‧壓力控制手段13‧‧‧ Pressure control measures

22‧‧‧氣體濃度分析計22‧‧‧ gas concentration analyzer

L1‧‧‧基底氣體供應流路L1‧‧‧base gas supply flow path

L2‧‧‧原料氣體供應流路L2‧‧‧ material gas supply flow path

L3至L6‧‧‧流路L3 to L6‧‧‧ flow path

Claims (10)

一種硒化氫混合氣體之供應方法,其係具有:供應將自基底氣體供應流路所供應之惰性氣體、與自原料氣體供應流路所供應之100%硒化氫氣體藉由混合而調整至預定濃度之硒化氫混合氣體之供應步驟,前述供應步驟中,藉由設置於前述原料氣體供應流路之流量控制手段,將前述100%硒化氫氣體之流量控制在預定流量,藉由設置於前述流量控制手段之下游側的壓力控制手段,將前述流量控制手段與該壓力控制手段之間的前述100%硒化氫氣體之壓力控制在預定壓力。 A method for supplying a hydrogen selenide mixed gas, comprising: supplying an inert gas supplied from a base gas supply flow path and mixing 100% hydrogen selenide gas supplied from a raw material gas supply flow path to a supply step of a predetermined concentration of a hydrogen-selenide mixed gas, wherein, in the supplying step, the flow rate of the 100% hydrogen selenide gas is controlled at a predetermined flow rate by a flow rate control means provided in the raw material gas supply flow path, by setting The pressure control means on the downstream side of the flow rate control means controls the pressure of the 100% hydrogen selenide gas between the flow rate control means and the pressure control means to a predetermined pressure. 如申請專利範圍第1項所述之硒化氫混合氣體之供應方法,其中,前述流量控制手段是孔口或針閥,前述壓力控制手段是自動壓力控制裝置(APR)。 The method of supplying a hydrogen-selenide mixed gas according to the first aspect of the invention, wherein the flow rate control means is an orifice or a needle valve, and the pressure control means is an automatic pressure control means (APR). 如申請專利範圍第2項所述之硒化氫混合氣體之供應方法,其中,前述孔口或針閥是金屬製者。 The method for supplying a hydrogen-selenide mixed gas according to claim 2, wherein the orifice or the needle valve is made of metal. 如申請專利範圍第1項所述之硒化氫混合氣體之供應方法,其中,將調整至預定濃度之前述硒化氫混合氣體貯存在緩衝槽,由前述之緩衝槽供應所期望濃度之硒化氫混合氣體。 The method for supplying a hydrogen selenide mixed gas according to claim 1, wherein the hydrogen selenide mixed gas adjusted to a predetermined concentration is stored in a buffer tank, and the desired concentration of selenization is supplied from the buffer tank. Hydrogen mixed gas. 如申請專利範圍第1項所述之硒化氫混合氣體之供應方法,其中,在前述原料氣體供應流路中,將流路內之壓力減壓1次以上,在最後減壓後調整前述100%硒化 氫氣體之流量。 The method for supplying a hydrogen-selenide mixed gas according to the first aspect of the invention, wherein the pressure in the flow path is decompressed one time or more in the raw material gas supply flow path, and the 100 is adjusted after the final decompression. % selenization The flow of hydrogen gas. 一種硒化氫混合氣體之供應裝置,其係具備基底氣體供應流路、與原料氣體供應流路,供應將自基底氣體供應流路所供應之惰性氣體、與自原料氣體供應流路所供應之100%硒化氫氣體藉由混合而調整至預定濃度之硒化氫混合氣體,前述原料氣體供應流路係具備:用以將前述100%硒化氫氣體之流量控制在預定流量之流量控制手段、與用以將前述100%硒化氫氣體之壓力控制在一定之壓力控制手段,前述壓力控制手段是設置於前述流量控制手段之下游側。 A hydrogen selenide mixed gas supply device comprising a base gas supply flow path and a raw material gas supply flow path for supplying an inert gas supplied from a base gas supply flow path and supplied from a raw material gas supply flow path 100% hydrogen selenide gas is adjusted to a predetermined concentration of hydrogen selenide mixed gas by mixing, and the raw material gas supply flow path system has flow control means for controlling the flow rate of the 100% hydrogen selenide gas to a predetermined flow rate And the pressure control means for controlling the pressure of the 100% hydrogen selenide gas to be constant, wherein the pressure control means is disposed on the downstream side of the flow rate control means. 如申請專利範圍第6項所述之硒化氫混合氣體之供應裝置,其中,前述流量控制手段是孔口或針閥,前述壓力控制手段是自動壓力控制裝置(APR)。 The apparatus for supplying a hydrogen selenide mixed gas according to claim 6, wherein the flow rate control means is an orifice or a needle valve, and the pressure control means is an automatic pressure control means (APR). 如申請專利範圍第7項所述之硒化氫混合氣體之供應裝置,其中,前述孔口或針閥是金屬製者。 The apparatus for supplying a hydrogen selenide mixed gas according to claim 7, wherein the orifice or the needle valve is made of metal. 如申請專利範圍第6項所述之硒化氫混合氣體之供應裝置,其中,復具備貯存調整至預定濃度之前述硒化氫混合氣體之緩衝槽,在前述緩衝槽設置有用以供應前述硒化氫混合氣體之供應口。 The apparatus for supplying a hydrogen-selenide mixed gas according to claim 6, wherein the buffer tank for storing the hydrogen-selenide mixed gas adjusted to a predetermined concentration is provided in the buffer tank to supply the selenization. Supply port of hydrogen mixed gas. 如申請專利範圍第6項所述之硒化氫混合氣體之供應 裝置,其中,在前述原料氣體供應流路設置有1個以上之壓力調整器,在最下游側之前述壓力調整器與前述壓力控制手段之間設置有前述流量控制手段。 Supply of hydrogen selenide mixed gas as described in claim 6 In the apparatus, one or more pressure regulators are provided in the material gas supply flow path, and the flow rate control means is provided between the pressure regulator on the most downstream side and the pressure control means.
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