TWI497640B - - Google Patents
Info
- Publication number
- TWI497640B TWI497640B TW101144196A TW101144196A TWI497640B TW I497640 B TWI497640 B TW I497640B TW 101144196 A TW101144196 A TW 101144196A TW 101144196 A TW101144196 A TW 101144196A TW I497640 B TWI497640 B TW I497640B
- Authority
- TW
- Taiwan
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210063136.8A CN102610476B (en) | 2012-03-12 | 2012-03-12 | Electrostatic chuck |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201338090A TW201338090A (en) | 2013-09-16 |
| TWI497640B true TWI497640B (en) | 2015-08-21 |
Family
ID=46527771
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101144196A TW201338090A (en) | 2012-03-12 | 2012-11-26 | Electrostatic sucking disc |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN102610476B (en) |
| TW (1) | TW201338090A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105789107A (en) * | 2014-12-26 | 2016-07-20 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Base and plasma processing equipment |
| CN106816354B (en) * | 2015-12-02 | 2019-08-23 | 北京北方华创微电子装备有限公司 | A kind of lower electrode and reaction chamber |
| CN111052344B (en) * | 2018-08-13 | 2024-04-02 | 朗姆研究公司 | Edge ring assembly |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW334609B (en) * | 1996-09-19 | 1998-06-21 | Hitachi Ltd | Electrostatic chuck, method and device for processing sanyle use the same |
| TW200515841A (en) * | 2003-10-31 | 2005-05-01 | Tokyo Electron Ltd | Electrostatic chuck, plasma processing apparatus, and plasma processing method |
| TW200721915A (en) * | 2005-11-30 | 2007-06-01 | Ips Ltd | Electrostatic chuck for vacuum processing apparatus, vacuum processing apparatus having the same, and method for manufacturing the same |
| TW201021153A (en) * | 2008-09-09 | 2010-06-01 | Komico Ltd | Electrostatic chuck containing double buffer layer for reducing thermal stress |
| TW201021154A (en) * | 2008-09-09 | 2010-06-01 | Komico Ltd | Electrostatic chuck containing buffer layer for reducing thermal stress |
| TW201120988A (en) * | 2009-08-21 | 2011-06-16 | Komico Ltd | Electrostatic chuck and method of manufacturing the same |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100495654C (en) * | 2003-02-03 | 2009-06-03 | 日本奥特克株式会社 | Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method |
| US8607731B2 (en) * | 2008-06-23 | 2013-12-17 | Applied Materials, Inc. | Cathode with inner and outer electrodes at different heights |
| CN102280342B (en) * | 2011-08-19 | 2013-08-21 | 中微半导体设备(上海)有限公司 | Plasma treatment device |
-
2012
- 2012-03-12 CN CN201210063136.8A patent/CN102610476B/en active Active
- 2012-11-26 TW TW101144196A patent/TW201338090A/en unknown
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW334609B (en) * | 1996-09-19 | 1998-06-21 | Hitachi Ltd | Electrostatic chuck, method and device for processing sanyle use the same |
| TW200515841A (en) * | 2003-10-31 | 2005-05-01 | Tokyo Electron Ltd | Electrostatic chuck, plasma processing apparatus, and plasma processing method |
| TW200721915A (en) * | 2005-11-30 | 2007-06-01 | Ips Ltd | Electrostatic chuck for vacuum processing apparatus, vacuum processing apparatus having the same, and method for manufacturing the same |
| TW201021153A (en) * | 2008-09-09 | 2010-06-01 | Komico Ltd | Electrostatic chuck containing double buffer layer for reducing thermal stress |
| TW201021154A (en) * | 2008-09-09 | 2010-06-01 | Komico Ltd | Electrostatic chuck containing buffer layer for reducing thermal stress |
| TW201120988A (en) * | 2009-08-21 | 2011-06-16 | Komico Ltd | Electrostatic chuck and method of manufacturing the same |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201338090A (en) | 2013-09-16 |
| CN102610476A (en) | 2012-07-25 |
| CN102610476B (en) | 2015-05-27 |