TWI484526B - - Google Patents
Info
- Publication number
- TWI484526B TWI484526B TW101143573A TW101143573A TWI484526B TW I484526 B TWI484526 B TW I484526B TW 101143573 A TW101143573 A TW 101143573A TW 101143573 A TW101143573 A TW 101143573A TW I484526 B TWI484526 B TW I484526B
- Authority
- TW
- Taiwan
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110431014.5A CN103177923B (zh) | 2011-12-20 | 2011-12-20 | 一种应用于等离子处理装置的气体分布***及验证方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201334022A TW201334022A (zh) | 2013-08-16 |
| TWI484526B true TWI484526B (zh) | 2015-05-11 |
Family
ID=48637704
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101143573A TW201334022A (zh) | 2011-12-20 | 2012-11-21 | 一種應用於等離子處理裝置的氣體分佈系統及驗證方法 |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN103177923B (zh) |
| TW (1) | TW201334022A (zh) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104916517B (zh) * | 2014-03-11 | 2017-06-09 | 上海华虹宏力半导体制造有限公司 | 反应腔与石英管的隔离装置及其控制方法 |
| CN105590825A (zh) * | 2014-11-03 | 2016-05-18 | 中微半导体设备(上海)有限公司 | 气体输送装置及等离子体处理装置 |
| CN112563105B (zh) * | 2019-09-10 | 2023-11-03 | 中微半导体设备(上海)股份有限公司 | 等离子体处理装置中实现气体流量验证的***及方法 |
| TWI742453B (zh) * | 2019-10-23 | 2021-10-11 | 樂華科技股份有限公司 | 氣體檢測裝置 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI235902B (en) * | 2003-06-20 | 2005-07-11 | Fujikin Kk | Gas distribution supply device and gas distribution supply method for supplying air to chamber by gas supply equipment with flow control device |
| JP2007242976A (ja) * | 2006-03-10 | 2007-09-20 | Hitachi High-Technologies Corp | 半導体製造装置および分流器診断方法 |
| TW200839870A (en) * | 2006-11-17 | 2008-10-01 | Lam Res Corp | Methods for performing actual flow verification |
| US20100297783A1 (en) * | 2005-05-17 | 2010-11-25 | Shoji Ikuhara | Plasma Processing Method |
| JP4620537B2 (ja) * | 2005-07-21 | 2011-01-26 | 東京エレクトロン株式会社 | プラズマ処理装置およびプラズマ処理装置の制御方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4550507B2 (ja) * | 2004-07-26 | 2010-09-22 | 株式会社日立ハイテクノロジーズ | プラズマ処理装置 |
| US7846497B2 (en) * | 2007-02-26 | 2010-12-07 | Applied Materials, Inc. | Method and apparatus for controlling gas flow to a processing chamber |
-
2011
- 2011-12-20 CN CN201110431014.5A patent/CN103177923B/zh active Active
-
2012
- 2012-11-21 TW TW101143573A patent/TW201334022A/zh unknown
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI235902B (en) * | 2003-06-20 | 2005-07-11 | Fujikin Kk | Gas distribution supply device and gas distribution supply method for supplying air to chamber by gas supply equipment with flow control device |
| US20100297783A1 (en) * | 2005-05-17 | 2010-11-25 | Shoji Ikuhara | Plasma Processing Method |
| JP4620537B2 (ja) * | 2005-07-21 | 2011-01-26 | 東京エレクトロン株式会社 | プラズマ処理装置およびプラズマ処理装置の制御方法 |
| JP2007242976A (ja) * | 2006-03-10 | 2007-09-20 | Hitachi High-Technologies Corp | 半導体製造装置および分流器診断方法 |
| TW200839870A (en) * | 2006-11-17 | 2008-10-01 | Lam Res Corp | Methods for performing actual flow verification |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103177923B (zh) | 2016-05-11 |
| CN103177923A (zh) | 2013-06-26 |
| TW201334022A (zh) | 2013-08-16 |