TWI445578B - Coating device - Google Patents
Coating device Download PDFInfo
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- TWI445578B TWI445578B TW099135112A TW99135112A TWI445578B TW I445578 B TWI445578 B TW I445578B TW 099135112 A TW099135112 A TW 099135112A TW 99135112 A TW99135112 A TW 99135112A TW I445578 B TWI445578 B TW I445578B
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- coating
- foreign matter
- matter detecting
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C13/00—Means for manipulating or holding work, e.g. for separate articles
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B15/00—Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
- B05B15/50—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
- B05C11/1002—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
- B05C11/1015—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to a conditions of ambient medium or target, e.g. humidity, temperature ; responsive to position or movement of the coating head relative to the target
- B05C11/1021—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to a conditions of ambient medium or target, e.g. humidity, temperature ; responsive to position or movement of the coating head relative to the target responsive to presence or shape of target
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0225—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work characterised by flow controlling means, e.g. valves, located proximate the outlet
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
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- Engineering & Computer Science (AREA)
- Coating Apparatus (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Description
本發明係關於對有機EL顯示裝置用玻璃基板、液晶顯示裝置用玻璃基板、PDP用玻璃基板、太陽電池用基板、電子紙用基板或半導體裝置製造用光罩基板等之基板，塗布塗布液之塗布裝置。The present invention relates to a substrate such as a glass substrate for an organic EL display device, a glass substrate for a liquid crystal display device, a glass substrate for a PDP, a substrate for a solar cell, a substrate for an electronic paper, or a photomask substrate for manufacturing a semiconductor device, and a coating liquid is applied thereto. Coating device.
例如，對液晶顯示裝置用玻璃基板塗布塗布液時，係一面將基板向一方向搬送，一面從塗布噴嘴噴出狹縫狀之塗布液，從而於玻璃基板之表面形成塗布液之薄膜。此處，搬送液晶顯示裝置用玻璃基板等之精密電子裝置用基板時，要求一方面防止基板之污損、一方面可進行有效率之搬送。For example, when the coating liquid is applied to the glass substrate for a liquid crystal display device, the substrate is transported in one direction, and a slit-shaped coating liquid is discharged from the coating nozzle to form a film of the coating liquid on the surface of the glass substrate. In the case of transporting a substrate for a precision electronic device such as a glass substrate for a liquid crystal display device, it is required to prevent the substrate from being contaminated and to efficiently transport the substrate.
另一方面，近年來，製造液晶顯示器之主玻璃基板之尺寸逐漸大型化。搬送如此之大型玻璃基板時，重要的是高精度保持基板之平面度進行搬送，以免因搬送之衝擊而對玻璃基板造成損傷。On the other hand, in recent years, the size of the main glass substrate for manufacturing a liquid crystal display has been gradually increased. When transporting such a large-sized glass substrate, it is important to convey the flatness of the substrate with high precision so as not to damage the glass substrate due to the impact of the conveyance.
因此，提案有對基板之下面供給氣體，藉此在使基板懸浮的狀態下，使基板向一方向移動之搬送機構。且，在專利文獻1中，提案有一種基板處理裝置，其將用於懸浮搬送基板之平台分割成複數個區域，並針對各區域，變更對平台與基板之間之區域噴出氣體之噴出口、與從平台與基板之間之區域排放氣體之排氣口的配置密度，藉此可順暢地搬送基板。Therefore, there has been proposed a transfer mechanism that supplies a gas to the lower surface of the substrate to move the substrate in one direction while the substrate is suspended. Further, Patent Document 1 proposes a substrate processing apparatus that divides a platform for suspending and transporting a substrate into a plurality of regions, and changes a discharge port for ejecting gas to a region between the platform and the substrate for each region. The arrangement density of the exhaust port for discharging the gas from the region between the stage and the substrate allows the substrate to be smoothly conveyed.
在該專利文獻1記載之基板處理裝置中，採用之構成為將用於懸浮搬送基板之平台分割成基板之搬入區域、基板之搬出區域、液供給區域、搬入區域與液供給區域之間之遷移區域、及液供給區域與搬出區域之間之遷移區域，並針對該等之各區域，變更對平台與基板之間之區域噴出氣體之噴出口、與從平台與基板之間之區域排放氣體之排氣口的配置密度。In the substrate processing apparatus described in Patent Document 1, the platform for suspending and transporting the substrate is divided into a substrate loading region, a substrate carrying region, a liquid supply region, a loading region, and a liquid supply region. a region, a migration region between the liquid supply region and the carry-out region, and for each of the regions, changing a discharge port for ejecting gas to a region between the platform and the substrate, and discharging a gas with a region between the platform and the substrate The density of the exhaust port.
[專利文獻1]日本特開2006-253373號公報[Patent Document 1] Japanese Patent Laid-Open Publication No. 2006-253373
然而，在如此之塗布裝置中，於基板之表面存在異物之情形時，該異物會與塗布噴嘴衝突，從而損傷塗布噴嘴，或使塗布噴嘴之位置產生誤差，導致無法進行其後之塗布作業。因此，在如此之塗布裝置中，考慮在相對於塗布噴嘴而位於基板之搬送方向之上游側，配設檢測存在於基板之表面之異物之異物檢測機構。However, in such a coating apparatus, when foreign matter is present on the surface of the substrate, the foreign matter may collide with the coating nozzle, thereby damaging the coating nozzle or causing an error in the position of the coating nozzle, resulting in failure to perform the subsequent coating operation. Therefore, in such a coating apparatus, it is conceivable to arrange a foreign matter detecting means for detecting foreign matter existing on the surface of the substrate on the upstream side in the conveying direction of the substrate with respect to the coating nozzle.
又，於基板塗布塗布液之塗布區域中，必須防止基板上下移動，而高精度地維持基板表面之高度位置。另一方面，在上述之基板之搬入區域或搬出區域中，基板與用於懸浮搬送基板之平台之距離則不要求如塗布區域般之精度。Further, in the application region of the substrate coating coating liquid, it is necessary to prevent the substrate from moving up and down, and to maintain the height position of the substrate surface with high precision. On the other hand, in the above-described substrate loading or unloading area, the distance between the substrate and the stage for suspending and transporting the substrate does not require accuracy as in the application area.
又，從亦需檢測相對較小之異物之目的來看，上述之異物檢測機構必須靠近於基板而配置。因此，以該異物檢測機構檢測異物時，若將基板之高度方向之位置精度設為與基板之搬入區域或搬出區域同樣之位置精度，則基板與異物檢測機構有可能發生衝突。再者，於塗布噴嘴與異物檢測機構之間，必須相對於基板之搬送方向保有一定之距離。Further, from the viewpoint of also detecting a relatively small foreign matter, the above-described foreign matter detecting mechanism must be disposed close to the substrate. Therefore, when the foreign matter detecting means detects foreign matter, if the positional accuracy in the height direction of the substrate is the same as the positional accuracy of the substrate loading or unloading area, the substrate and the foreign matter detecting means may collide. Further, it is necessary to maintain a certain distance from the transfer direction of the substrate between the coating nozzle and the foreign matter detecting mechanism.
因此，為藉由異物檢測機構適當地進行異物之檢測，必須在用於懸浮搬送基板之平台中，擴大具有與基板之塗布區域相同精度之區域的基板之搬送方向之尺寸。然而，為提高基板之高度方向之位置精度，不僅需增加向平台與基板之間之區域噴出氣體之噴出口或從平台與基板之間之區域排放氣體之排氣口之個數，且由於必須提高平台表面之加工精度，故擴大用於以高精度維持基板之高度方向之位置精度之區域時，會產生裝置之製造成本增加之問題。Therefore, in order to appropriately detect the foreign matter by the foreign matter detecting means, it is necessary to enlarge the size of the substrate in the transport direction of the region having the same accuracy as the coated region of the substrate in the platform for suspending and transporting the substrate. However, in order to improve the positional accuracy of the height direction of the substrate, it is necessary to increase not only the number of discharge ports for ejecting gas to the region between the stage and the substrate but also the number of exhaust ports for discharging gas from the region between the stage and the substrate, and Since the processing accuracy of the surface of the stage is improved, when the area for maintaining the positional accuracy in the height direction of the substrate with high precision is expanded, there is a problem that the manufacturing cost of the device increases.
本發明係為解決上述問題而完成者，其目的在於提供一種能夠一方面維持低價之裝置製造成本，一方面正確地實行塗布液之塗布與異物之檢測之塗布裝置。The present invention has been made to solve the above problems, and an object of the invention is to provide a coating apparatus capable of accurately performing coating of a coating liquid and detection of a foreign matter while maintaining a manufacturing cost of a device at a low price.
技術方案1之發明之塗布裝置，其係對基板之下面供給氣體，藉此在使基板懸浮的狀態下，使基板向一方向移動，從而將塗布液塗布於基板之表面者，其特徵為具備：塗布噴嘴，其對向一方向移動之基板之表面塗布塗布液；異物檢測機構，其相對於上述塗布噴嘴而配置於基板之搬送方向之上游側，且檢測存在於基板之表面之異物；一對懸浮平台，其形成有向其與基板之間之區域噴出氣體之噴出口；精密懸浮平台，其配置於上述一對懸浮平台之間，且形成有向其與基板之間之區域噴出氣體之噴出口，與從其與基板之間之區域排放氣體之排氣口；第1排氣機構，其用於從上述精密懸浮平台之位於基板之搬送方向之上游側的排氣口排放氣體；及第2排氣機構，其用於從相對於上述精密懸浮平台之藉由上述第1排氣機構進行排氣之排氣口而位於上述基板之搬送方向之下游側之吸引口排放氣體。In the coating apparatus of the invention according to the first aspect of the invention, the gas is supplied to the lower surface of the substrate, and the substrate is moved in one direction while the substrate is suspended, and the coating liquid is applied to the surface of the substrate. a coating nozzle that applies a coating liquid to a surface of a substrate that moves in one direction, and a foreign matter detecting mechanism that is disposed upstream of a conveying direction of the substrate with respect to the coating nozzle, and detects foreign matter existing on a surface of the substrate; The floating platform is formed with a discharge port for ejecting gas to a region between the substrate and the substrate; a precision suspension platform disposed between the pair of floating platforms and formed with a gas ejected toward a region between the substrate and the substrate a discharge port, and an exhaust port for discharging a gas from a region between the substrate and the substrate; and a first exhaust mechanism for discharging gas from an exhaust port of the precision floating platform upstream of a transfer direction of the substrate; and a second exhaust mechanism for transporting the substrate from the exhaust port that is exhausted by the first exhaust mechanism with respect to the precision floating platform The gas is discharged to the suction port on the downstream side.
技術方案2之發明，其在技術方案1之發明中，上述精密懸浮平台具備藉由上述異物檢測機構檢測異物所使用之異物檢測平台，與相較於上述異物檢測平台而配置於基板之搬送方向之下游側、且藉由上述塗布噴嘴塗布塗布液所使用之塗布平台；上述第1排氣機構係從形成於上述異物檢測平台之排氣口進行排氣，且上述第2排氣機構係從形成於上述塗布平台之排氣口進行排氣。According to a second aspect of the invention, the precision suspension platform includes a foreign matter detecting platform for detecting a foreign matter by the foreign matter detecting means, and a transporting direction disposed on the substrate compared to the foreign matter detecting platform. a coating platform for applying a coating liquid on the downstream side of the coating nozzle; the first exhaust mechanism exhausts from an exhaust port formed on the foreign matter detecting platform, and the second exhaust mechanism is The exhaust port formed on the coating platform is exhausted.
技術方案3之發明，其在技術方案2之發明中，上述異物檢測平台其基板之搬送方向之長度大於利用上述塗布噴嘴之塗布液之塗布位置，與利用上述異物檢測機構之異物之檢測位置的基板之搬送方向之距離。According to the invention of claim 2, in the foreign matter detecting platform, the length of the substrate in the conveying direction is larger than the coating position of the coating liquid by the coating nozzle, and the detection position of the foreign matter by the foreign matter detecting means. The distance in which the substrate is transported.
技術方案4之發明，其在技術方案2之發明中，具備用於從形成於上述異物檢測平台之噴出口噴出氣體之第1氣體供給機構，與用於從形成於上述塗布平台之噴出口噴出氣體之第2氣體供給機構。According to the invention of claim 2, the first gas supply mechanism for ejecting gas from the discharge port formed in the foreign matter detecting platform and the discharge port for ejecting from the discharge port formed on the coating platform The second gas supply mechanism of the gas.
技術方案5之發明，其在技術方案4之發明中，上述異物檢測平台之上述排氣口及上述噴出口之間距，大於上述塗布平台之上述排氣口及上述噴出口之間距。According to a fourth aspect of the invention, the distance between the exhaust port and the discharge port of the foreign matter detecting platform is larger than a distance between the exhaust port and the discharge port of the coating platform.
技術方案6之發明，其在技術方案2之發明中，上述精密懸浮平台進一步具備相較於上述塗布平台而配置於基板之搬送方向之下游側之振動防止平台，且具備從形成於上述振動防止平台之排氣口進行排氣之第3排氣機構。According to the invention of claim 2, the precision suspension platform further includes a vibration preventing platform disposed on a downstream side of the substrate in the transport direction of the substrate, and is provided from the vibration preventing portion. The third exhaust mechanism that exhausts the exhaust port of the platform.
技術方案7之發明，其在技術方案6之發明中，進一步具備用於從形成於上述振動防止平台之噴出口噴出氣體之第3氣體供給機構。According to the invention of claim 6, the third aspect of the invention provides the third gas supply mechanism for ejecting gas from the discharge port formed in the vibration prevention platform.
技術方案8之發明，其在技術方案7之發明中，上述振動防止平台之上述排氣口及上述噴出口之間距，大於上述塗布平台之上述排氣口及上述噴出口之間距。According to a seventh aspect of the invention, the distance between the exhaust port and the discharge port of the vibration preventing platform is larger than a distance between the exhaust port and the discharge port of the coating platform.
技術方案9之發明，其在技術方案2之發明中，上述塗布平台之上面之平坦度，高於上述異物檢測平台及上述懸浮平台之上面之平坦度。According to the invention of claim 2, in the invention of claim 2, the flatness of the upper surface of the coating platform is higher than the flatness of the foreign matter detecting platform and the upper surface of the floating platform.
技術方案10之發明，其在技術方案9之發明中，上述塗布平台之基板保持高度為該塗布平台之平坦度之正值的2至4倍。The invention of claim 10, wherein in the invention of claim 9, the substrate holding height of the coating platform is 2 to 4 times the positive value of the flatness of the coating platform.
技術方案11之發明，其在技術方案10之發明中，上述塗布平台之上面之平坦度為±4至±8 μm，且基板保持高度為16至32 μm。The invention of claim 11, wherein in the invention of claim 10, the flatness of the upper surface of the coating platform is ±4 to ±8 μm, and the substrate holding height is 16 to 32 μm.
根據技術方案1之發明，由於使用第1排氣機構與第2排氣機構之個別之排氣機構，對精密懸浮平台之位於基板之搬送方向之上游側與其下游側之排氣口進行排氣，故可正確地實行塗布液之塗布與異物之檢測。According to the invention of claim 1, the exhaust mechanism of the first suspension mechanism and the second exhaust mechanism is used to exhaust the exhaust port of the precision suspension platform on the upstream side and the downstream side of the substrate. Therefore, the coating of the coating liquid and the detection of foreign matter can be performed correctly.
根據技術方案2之發明，由於精密懸浮平台包含異物檢測平台與塗布平台，故能夠縮小製造成本昂貴之塗布平台之尺寸，從而一方面維持低價之裝置製造成本，一方面正確地實行塗布液之塗布於異物之檢測。According to the invention of claim 2, since the precision suspension platform includes the foreign matter detecting platform and the coating platform, the size of the coating platform which is expensive to manufacture can be reduced, thereby maintaining the manufacturing cost of the device at a low price, and correctly implementing the coating liquid on the one hand. Coating on the detection of foreign matter.
根據技術方案3之發明，由於異物檢測平台之基板之搬送方向之長度大於利用塗布噴嘴之塗布液之塗布位置，與利用異物檢測機構之異物之檢測位置的基板之搬送方向之距離，故可有效地防止基板與異物檢測機構之衝突。According to the invention of claim 3, the length of the substrate in the transport direction of the foreign matter detecting platform is larger than the coating position of the coating liquid by the coating nozzle, and the distance from the substrate in the transport direction of the foreign matter detecting means of the foreign matter detecting means is effective. The ground plate is prevented from colliding with the foreign matter detecting mechanism.
根據技術方案4之發明，由於個別具備用於從形成於異物檢測平台之噴出口噴出氣體之第1氣體供給機構，與用於從形成於塗布平台之噴出口噴出氣體之第2氣體供給機構，故可更正確地實行塗布液之塗布於異物之檢測。According to the invention of claim 4, the first gas supply mechanism for ejecting gas from the discharge port formed in the foreign matter detecting platform and the second gas supply mechanism for ejecting gas from the discharge port formed on the coating platform are provided. Therefore, the application of the coating liquid to the detection of the foreign matter can be performed more accurately.
根據技術方案5之發明，可更低價地製造異物檢測平台，且能夠在塗布平台中，更高精度地調整基板之高度。According to the invention of claim 5, the foreign matter detecting platform can be manufactured at a lower cost, and the height of the substrate can be adjusted with higher precision in the coating platform.
根據技術方案6之發明，由於精密懸浮平台具備較塗布平台配置於基板之搬送方向之下游側之振動防止平台，與從形成於該振動防止平台之排氣口進行排氣之第3排氣機構，故可防止塗布液之塗布時之基板振動，從而提高塗布裝置之塗布精度。According to the invention of claim 6, the precision suspension platform has a vibration preventing platform disposed on the downstream side of the coating platform in the conveying direction of the substrate, and a third exhausting mechanism that exhausts from the exhaust port formed in the vibration preventing platform. Therefore, it is possible to prevent the substrate from vibrating during the application of the coating liquid, thereby improving the coating accuracy of the coating device.
根據技術方案7之發明，由於進一步具備用於從形成於振動防止平台之噴出口噴出氣體之第3氣體供給機構，故可進一步提高塗布裝置之塗布精度。According to the invention of claim 7, the third gas supply mechanism for ejecting gas from the discharge port formed in the vibration prevention platform is further provided, so that the coating accuracy of the coating device can be further improved.
根據技術方案8之發明，可更低價地製造振動防止平台，且能夠在塗布平台中，更高精度地調整基板之高度位置。According to the invention of claim 8, the vibration preventing platform can be manufactured at a lower cost, and the height position of the substrate can be adjusted with higher precision in the coating platform.
根據技術方案9之發明，將塗布平台之上面之平坦度設為最高精度，藉此可進一步提高塗布裝置之塗布精度。According to the invention of claim 9, the flatness of the upper surface of the coating platform is set to the highest precision, whereby the coating accuracy of the coating device can be further improved.
根據技術方案10之發明，由於在塗布平台中，將基板之高度位置即基板保持高度設定為該塗布平台之平坦度之正值的2~4倍，可進一步提高塗布裝置之塗布精度。又，由於基板保持高度在如此之範圍內，故可一方面將氣體之消耗量設為最小限度，一方面進一步防止基板與平台接觸之危險。According to the invention of claim 10, in the coating platform, the height of the substrate, that is, the substrate holding height is set to be 2 to 4 times the positive value of the flatness of the coating platform, whereby the coating accuracy of the coating device can be further improved. Further, since the substrate holding height is within such a range, the consumption of the gas can be minimized on the one hand, and the risk of the substrate being in contact with the stage can be further prevented on the other hand.
根據技術方案11之發明，由於可在塗布平台中，將其上面之加工精度設為高精度者，且將基板保持高度維持於精密之值，故可進一步提高塗布裝置之塗布精度。According to the invention of claim 11, since the processing accuracy of the upper surface can be made high in the coating platform and the substrate holding height is maintained at a precise value, the coating accuracy of the coating device can be further improved.
以下，基於圖式說明本發明之實施形態。圖1係本發明之第1實施形態之塗布裝置之平面概要圖。Hereinafter, embodiments of the present invention will be described based on the drawings. Fig. 1 is a schematic plan view showing a coating apparatus according to a first embodiment of the present invention.
該塗布裝置係對基板100之下面供給氣體，藉此在使基板100懸浮的狀態下，使基板100向一方向移動，從而將塗布液塗布於基板100之表面者。該塗布裝置具備將塗布液塗布於向一方向移動之基板100之表面之塗布噴嘴21，與相對於塗布噴嘴21配置於基板100之搬送方向之上游側、且檢測存在於基板100之表面異物之異物檢測機構22。再者，使用空氣作為該氣體。但亦可使用氮氣等之惰性氣體等空氣以外之氣體。In the coating apparatus, a gas is supplied to the lower surface of the substrate 100, whereby the substrate 100 is moved in one direction while the substrate 100 is suspended, and the coating liquid is applied to the surface of the substrate 100. The coating device includes a coating nozzle 21 that applies a coating liquid to the surface of the substrate 100 that moves in one direction, and is disposed on the upstream side in the conveying direction of the substrate 100 with respect to the coating nozzle 21, and detects foreign matter existing on the surface of the substrate 100. Foreign matter detecting mechanism 22. Furthermore, air is used as the gas. However, a gas other than air such as an inert gas such as nitrogen may be used.
又，該塗布裝置具備形成有向其與基板100之間之區域噴出氣體之噴出口的一對懸浮平台14、15，與精密懸浮平台10，該精密懸浮平台10配置於該一對懸浮平台14、15之間，且形成有向其與基板100之間之區域噴出氣體之噴出口，及從其與基板100之間之區域排放氣體之排氣口。該精密懸浮平台10包含藉由異物檢測機構22檢測異物所使用之異物檢測平台12，與相較於異物檢測平台12而配置於基板100之搬送方向之下游側、且藉由塗布噴嘴21塗布塗布液所使用之塗布平台11。Further, the coating apparatus includes a pair of floating platforms 14, 15 formed with a discharge port for discharging a gas to the region between the substrate 100 and the precision floating platform 10, and the precision suspension platform 10 is disposed on the pair of suspension platforms 14 Between 15 and 15, a discharge port for discharging a gas to a region between the substrate 100 and a discharge port for discharging a gas from a region between the substrate 100 and the substrate 100 is formed. The precision floating platform 10 includes a foreign matter detecting platform 12 for detecting foreign matter by the foreign matter detecting means 22, and is disposed on the downstream side in the conveying direction of the substrate 100 as compared with the foreign matter detecting platform 12, and is coated by the coating nozzle 21. The coating platform 11 used for the liquid.
於懸浮平台14、異物檢測平台12、塗布平台11及懸浮平台15之側方，配設有一對導軌32。且，於該等之導軌32上可滑動地配設有基板搬送夾具31。該等之基板搬送夾具31係藉由懸浮平台14、異物檢測平台12、塗布平台11及懸浮平台15之作用，保持下面為非接觸狀態之基板100之端緣，使基板100沿著其搬送路徑移動者。A pair of guide rails 32 are disposed on the side of the suspension platform 14, the foreign matter detecting platform 12, the coating platform 11, and the floating platform 15. Further, a substrate transfer jig 31 is slidably disposed on the guide rails 32. The substrate transfer jig 31 maintains the edge of the substrate 100 in a non-contact state by the action of the floating platform 14, the foreign matter detecting platform 12, the coating stage 11, and the floating platform 15, so that the substrate 100 is transported along the path thereof. Mover.
圖2係顯示上述之塗布噴嘴21及異物檢測機構22，與搬送狀態下之基板100之關係之側視圖。此處，圖2(a)為異物檢測機構22未檢測基板100上之異物時之狀態之側視圖，圖2(b)係顯示異物檢測機構22檢測出基板100上之異物102時之狀態之側視圖。Fig. 2 is a side view showing the relationship between the coating nozzle 21 and the foreign matter detecting mechanism 22 described above and the substrate 100 in the transport state. Here, FIG. 2(a) is a side view showing a state in which the foreign matter detecting means 22 does not detect foreign matter on the substrate 100, and FIG. 2(b) shows a state in which the foreign matter detecting means 22 detects the foreign matter 102 on the substrate 100. Side view.
在上述之圖1中，為便於說明，乃將塗布噴嘴21與異物檢測機構22以隔離的狀態下加以表現，然而異物檢測機構22具有附設於塗布噴嘴21之側面之構成。即，異物檢測機構22包含附設於塗布噴嘴21之支架23；以配設於支架23並以軸24為中心可搖動之異物檢測金屬板25；及檢測該異物檢測金屬板25之搖動之感測器26。In the above-described FIG. 1, the coating nozzle 21 and the foreign matter detecting mechanism 22 are expressed in a state of being separated from each other for convenience of explanation. However, the foreign matter detecting mechanism 22 has a configuration attached to the side surface of the coating nozzle 21. In other words, the foreign matter detecting means 22 includes a holder 23 attached to the coating nozzle 21, a foreign matter detecting metal plate 25 which is disposed on the holder 23 and is rotatable about the shaft 24, and a sensing of the shaking of the foreign matter detecting metal plate 25 Device 26.
異物檢測金屬板25具有橫跨與基板100之搬送方向正交之方向之全域的長度。如圖2(a)所示，該異物檢測金屬板25在通常之塗布液101之塗布狀態下係朝向垂直方向。且，當該異物檢測金屬板25與基板100上之異物102抵接時，從圖2(a)所示之狀態搖動至圖2(b)所示之狀態。該異物檢測金屬板25之搖動動作係藉由感測器26予以檢測。The foreign matter detecting metal plate 25 has a length spanning the entire direction orthogonal to the conveying direction of the substrate 100. As shown in FIG. 2(a), the foreign matter detecting metal plate 25 is oriented in the vertical direction in the application state of the usual coating liquid 101. When the foreign matter detecting metal plate 25 comes into contact with the foreign matter 102 on the substrate 100, it is shaken from the state shown in FIG. 2(a) to the state shown in FIG. 2(b). The shaking motion of the foreign matter detecting metal plate 25 is detected by the sensor 26.
且，使來自感測器26之信號發送至裝置之控制部，從而停止基板100之搬送。藉此，可防止塗布噴嘴21與異物102衝突、塗布噴嘴損傷，或塗布噴嘴之位置產生誤差，使得其後之塗布作業無法進行之問題發生。Then, the signal from the sensor 26 is sent to the control unit of the device to stop the transfer of the substrate 100. Thereby, it is possible to prevent the coating nozzle 21 from colliding with the foreign matter 102, the coating nozzle from being damaged, or the position of the coating nozzle is erroneous, so that the problem that the subsequent coating operation cannot be performed occurs.
圖3係說明懸浮平台14、異物檢測平台12、塗布平台11及懸浮平台15之構成之圖。此處，圖3(a)係懸浮平台14、異物檢測平台12、塗布平台11及懸浮平台15之平面圖，圖3(b)係將懸浮平台14、異物檢測平台12、塗布平台11及懸浮平台15與塗布噴嘴21及基板100一起顯示之側視圖。又，圖3(c)係顯示圖3(a)之變形例之平面圖。3 is a view showing the configuration of the suspension platform 14, the foreign matter detecting platform 12, the coating platform 11, and the floating platform 15. Here, FIG. 3( a ) is a plan view of the suspension platform 14 , the foreign matter detecting platform 12 , the coating platform 11 , and the floating platform 15 , and FIG. 3( b ) is a suspension platform 14 , a foreign matter detecting platform 12 , a coating platform 11 , and a floating platform . 15 is a side view showing the coating nozzle 21 and the substrate 100 together. 3(c) is a plan view showing a modification of FIG. 3(a).
如圖3(a)所示，於一對懸浮平台14、15上形成有向其與基板100之間之區域噴出氣體之噴出口1。又，於異物檢測平台12與塗布平台11上，形成有向其與基板100之間之區域噴出氣體之噴出口1，與從其與基板100之間之區域排放氣體之排氣口2。再者，異物檢測平台12之排氣口2及噴出口1之間距，設定為大於塗布平台11之排氣口2及噴出口1之間距。As shown in FIG. 3(a), a discharge port 1 for ejecting gas to a region between the suspension platform 14 and 15 is formed. Further, on the foreign matter detecting platform 12 and the coating stage 11, an ejection port 1 for ejecting a gas to a region between the substrate and the substrate 100, and an exhaust port 2 for discharging a gas from a region between the substrate and the substrate 100 are formed. Further, the distance between the exhaust port 2 and the discharge port 1 of the foreign matter detecting platform 12 is set to be larger than the distance between the exhaust port 2 and the discharge port 1 of the coating stage 11.
如後所述，基板100之懸浮位置之精度必須為，異物檢測平台12較一對懸浮平台14、15更高精度，且必須為，塗布平台11較異物檢測平台12更高精度。因此，各平台表面之加工精度亦是異物檢測平台12較一對懸浮平台14、15更高精度，且，塗布平台11較異物檢測平台12更高精度。塗布平台11係以使該塗布平台11之上面之大致全域之平坦度為相對於基準面±10 μm以內(更佳為±4~±8 μm)的方式，最高精度地進行加工，其次，高精度地加工異物檢測平台12(平坦度為±10~±20 μm)。再者，懸浮平台14、15之加工精度係平坦度為±50~100 μm左右即可，無需要求構成精密懸浮平台10之塗布平台11及異物檢測平台12般之精度。且，根據如此之各平台之表面之加工精度，亦設定所保持之基板之懸浮高度(基板保持高度)，該等之懸浮高度係藉由控制後述之氣體供給機構等而維持於特定之範圍。各平台之基板保持高度較佳為設定成各平台之上面的平坦度之正數值(正側之數值)的2~4倍。即，若平台之基板保持高度小於該範圍之值，則基板與平台接觸之危險性增高。又，反之，若將基板保持於大於該範圍之值之較高之位置，則會使氣體之消耗量增加至超過必要程度。再者，各平台之保持基板時之懸浮高度，例如若為塗布平台11，則設定、維持於16~32 μm左右之範圍內，若為異物檢測平台12，則設定、維持於30~60 μm左右之範圍內，若為懸浮平台14、15，則設定、維持於150~300 μm左右之範圍內。As will be described later, the accuracy of the suspension position of the substrate 100 must be such that the foreign matter detecting platform 12 is more precise than the pair of floating platforms 14, 15 and the coating platform 11 must be more accurate than the foreign matter detecting platform 12. Therefore, the machining accuracy of each platform surface is also higher than that of the foreign object detecting platform 12 compared to the pair of floating platforms 14, 15, and the coating platform 11 is more accurate than the foreign object detecting platform 12. The coating stage 11 is formed so that the flatness of substantially the entire upper surface of the coating stage 11 is within ±10 μm (more preferably ±4 to ±8 μm) with respect to the reference surface, and the processing is performed with the highest precision, and secondly, the height is high. The foreign matter detection platform 12 is processed with precision (flatness is ±10~±20 μm). Furthermore, the processing accuracy of the suspension platforms 14 and 15 is about ±50 to 100 μm, and the precision of the coating platform 11 and the foreign matter detecting platform 12 constituting the precision suspension platform 10 is not required. Further, the suspension height (substrate retention height) of the substrate to be held is set according to the processing accuracy of the surface of each of the platforms, and the suspension height is maintained within a specific range by controlling a gas supply mechanism or the like to be described later. The substrate holding height of each platform is preferably set to be 2 to 4 times the positive value (the value of the positive side) of the flatness of the upper surface of each platform. That is, if the substrate holding height of the platform is less than the value of the range, the risk of the substrate coming into contact with the platform is increased. On the other hand, if the substrate is held at a position higher than the value of the range, the consumption of the gas is increased to more than necessary. In addition, the suspension height at the time of holding the substrate of each platform is set and maintained in the range of about 16 to 32 μm, for example, in the case of the coating stage 11, and is set to 30 to 60 μm in the case of the foreign matter detecting platform 12. In the range of the left and right, if the suspension platforms 14 and 15 are set, they are set and maintained in the range of about 150 to 300 μm.
再者，異物檢測平台12其基板100之搬送方向之長度Y(圖3之左右方向之長度)係以大於圖2所示之利用塗布噴嘴21之塗布液101之塗布位置，與利用異物檢測機構22之異物檢測金屬板25之異物之檢測位置的基板100之搬送方向上之距離X的方式進行設定。In addition, the length Y of the transport direction of the substrate 100 (the length in the left-right direction of FIG. 3) of the foreign matter detecting platform 12 is larger than the coating position of the coating liquid 101 by the coating nozzle 21 shown in FIG. 2, and the foreign matter detecting mechanism is used. The foreign matter of 22 detects the distance X in the transport direction of the substrate 100 at the detection position of the foreign matter of the metal plate 25.
圖3(c)顯示圖3(a)所示之實施形態之變形例。在圖3(c)所示之實施形態中，將圖3(a)所示之異物檢測平台12及塗布平台11之表面部分設為通用化之單一精密懸浮平台16。然而，後述之第1、第2排氣機構及第1、第2氣體供給機構與圖3(a)所示之實施形態相同。即，圖3(c)所示之實施形態與圖3(a)所示之實施形態僅其表面部分不同，且圖3(c)所示之精密懸浮平台16係包含圖3(a)所示之異物檢測平台12及塗布平台11者。因此，精密懸浮平台16之表面之加工精度較一對懸浮平台14、15更高精度，且，該等之區域中相當於塗布平台11之區域較相當於異物檢測平台12之區域更高精度。Fig. 3(c) shows a modification of the embodiment shown in Fig. 3(a). In the embodiment shown in Fig. 3(c), the surface portion of the foreign matter detecting stage 12 and the coating stage 11 shown in Fig. 3(a) is a generalized single precision floating platform 16. However, the first and second exhaust mechanisms and the first and second gas supply mechanisms to be described later are the same as those in the embodiment shown in Fig. 3(a). That is, the embodiment shown in Fig. 3(c) and the embodiment shown in Fig. 3(a) differ only in the surface portion thereof, and the precision suspension platform 16 shown in Fig. 3(c) includes the Fig. 3(a). The foreign matter detecting platform 12 and the coating platform 11 are shown. Therefore, the machining accuracy of the surface of the precision suspension platform 16 is higher than that of the pair of suspension platforms 14, 15 and the area corresponding to the coating stage 11 in the areas is more precise than the area corresponding to the foreign matter detecting platform 12.
圖4係顯示對異物檢測平台12及塗布平台11之氣體之排放及供給機構之概要圖。4 is a schematic view showing a gas discharge and supply mechanism to the foreign matter detecting platform 12 and the coating platform 11.
塗布平台11之各排氣口2係經由流量調整閥48b、流量計44b、壓力計49b而與吹風機41連接。基於流量計44b及壓力計49b之檢測值，控制流量調整閥48b，藉此可將來自塗布平台11之排氣口2之排氣量控制於特定之值。又，塗布平台11之各噴出口1係經由壓力調節器46a、流量調整閥48a、流量計44a、壓力計49a，而與壓縮空氣之供給源47連接。基於流量計44a及壓力計49a之檢測值，控制流量調整閥48a及壓力調節器46a，藉此可將來自塗布平台11之噴出口1之氣體之噴出量及噴出壓力控制於特定之值。Each of the exhaust ports 2 of the coating platform 11 is connected to the blower 41 via a flow rate adjusting valve 48b, a flow meter 44b, and a pressure gauge 49b. Based on the detected values of the flow meter 44b and the pressure gauge 49b, the flow rate adjusting valve 48b is controlled, whereby the amount of exhaust gas from the exhaust port 2 of the coating stage 11 can be controlled to a specific value. Further, each of the discharge ports 1 of the coating stage 11 is connected to a supply source 47 of compressed air via a pressure regulator 46a, a flow rate adjustment valve 48a, a flow meter 44a, and a pressure gauge 49a. The flow rate adjustment valve 48a and the pressure regulator 46a are controlled based on the detected values of the flow meter 44a and the pressure gauge 49a, whereby the discharge amount and the discharge pressure of the gas from the discharge port 1 of the coating stage 11 can be controlled to a specific value.
同樣地，異物檢測平台12之各排氣口2係經由流量調整閥48d、流量計44d、壓力計49d而與吹風機42連接。基於流量計44d及壓力計49d之檢測值，控制流量調整閥48d，藉此可將來自異物檢測平台12之排氣口2之排氣量控制於特定之值。又，異物檢測平台12之各噴出口1係經由壓力調節器46c、流量調整閥48c、流量計44c、壓力計49c，而與壓縮空氣之供給源47連接。基於流量計44c及壓力計49c之檢測值，控制流量調整閥48c及壓力調節器46c，藉此可將來自異物檢測平台12之噴出口1之氣體之噴出量及噴出壓力控制於特定之值。Similarly, each of the exhaust ports 2 of the foreign matter detecting platform 12 is connected to the blower 42 via the flow rate adjusting valve 48d, the flow meter 44d, and the pressure gauge 49d. Based on the detected values of the flow meter 44d and the pressure gauge 49d, the flow rate adjusting valve 48d is controlled, whereby the amount of exhaust gas from the exhaust port 2 of the foreign matter detecting platform 12 can be controlled to a specific value. Further, each of the discharge ports 1 of the foreign matter detecting platform 12 is connected to a supply source 47 of compressed air via a pressure regulator 46c, a flow rate adjusting valve 48c, a flow meter 44c, and a pressure gauge 49c. The flow rate adjustment valve 48c and the pressure regulator 46c are controlled based on the detected values of the flow meter 44c and the pressure gauge 49c, whereby the discharge amount and the discharge pressure of the gas from the discharge port 1 of the foreign matter detecting stage 12 can be controlled to a specific value.
用於從形成於異物檢測平台12之排氣口2進行排氣之流量調整閥48d、流量計44d、壓力計49d、吹風機42構成本發明之第1排氣機構，而用於從形成於異物檢測平台12之噴出口1噴出氣體之壓力調節器46c、流量調整閥48c、流量計44c、壓力計49c、壓縮空氣之供給源47構成本發明之第1氣體供給機構。同樣地，用於從形成於塗布平台11之排氣口2進行排氣之流量調整閥48b、流量計44b、壓力計49b、吹風機41構成本發明之第2排氣機構，而用於從形成於塗布平台11之噴出口1噴出氣體之壓力調節器46a、流量調整閥48a、流量計44a、壓力計49a、壓縮空氣之供給源47構成本發明之第2氣體供給機構。The flow rate adjustment valve 48d, the flow meter 44d, the pressure gauge 49d, and the blower 42 for exhausting from the exhaust port 2 formed in the foreign matter detecting platform 12 constitute the first exhaust mechanism of the present invention, and are used for forming from the foreign matter. The pressure regulator 46c, the flow rate adjustment valve 48c, the flow meter 44c, the pressure gauge 49c, and the supply source 47 for compressed air of the discharge port 1 of the detection platform 12 constitute the first gas supply mechanism of the present invention. Similarly, the flow rate adjusting valve 48b, the flow meter 44b, the pressure gauge 49b, and the blower 41 for exhausting from the exhaust port 2 formed on the coating stage 11 constitute the second exhaust mechanism of the present invention, and are used for formation. The pressure regulator 46a, the flow rate adjusting valve 48a, the flow meter 44a, the pressure gauge 49a, and the supply source 47 for compressed air which discharge the gas to the discharge port 1 of the coating stage 11 constitute the second gas supply means of the present invention.
再者，一對懸浮平台14、15之各噴出口1雖省略圖式，其係經由與上述之壓力調節器46a、46c、流量調整閥48a、48c、流量計44a、44c、壓力計49a、49c同樣之構成，而與壓縮空氣之供給源47連接。Further, although the respective discharge ports 1 of the pair of suspension stages 14 and 15 are omitted from the drawings, they are passed through the pressure regulators 46a and 46c, the flow rate adjusting valves 48a and 48c, the flow meters 44a and 44c, and the pressure gauge 49a. The same configuration as 49c is connected to the supply source 47 of compressed air.
在塗布平台11中將塗布液塗布於基板100時，為正確地維持塗布噴嘴21之下端部與基板100之表面之距離，必須高精度地維持基板100之下面與塗布平台11之表面之距離。又，在異物檢測平台12中，為正確地檢測異物，必須某種程度正確地維持基板100之下面與異物檢測平台12之表面之距離，但由於在一對懸浮平台14、15中，僅需使基板100懸浮並搬送即可，故基板100之下面與懸浮平台14、15之表面之距離若干粗略亦無問題。When the coating liquid is applied to the substrate 100 in the coating stage 11, in order to accurately maintain the distance between the lower end portion of the coating nozzle 21 and the surface of the substrate 100, it is necessary to maintain the distance between the lower surface of the substrate 100 and the surface of the coating stage 11 with high precision. Further, in the foreign matter detecting platform 12, in order to accurately detect the foreign matter, it is necessary to accurately maintain the distance between the lower surface of the substrate 100 and the surface of the foreign matter detecting platform 12 to some extent, but since only a pair of floating platforms 14, 15 are required The substrate 100 can be suspended and transported, so that the distance between the lower surface of the substrate 100 and the surfaces of the suspension platforms 14, 15 is rough and has no problem.
因此，如上所示，各平台表面之加工精度為，異物檢測平台12較一對懸浮平台14、15更高精度，且，塗布平台11較異物檢測平台12更高精度。又，相對於一對懸浮平台14、15只形成有向其與基板100之間之區域噴出氣體之噴出口1，於異物檢測平台12與塗布平台11上，形成有向其與基板100之間之區域噴出氣體之噴出口1，與從其與基板100之間之區域排放氣體之排氣口2，從而控制氣體之噴出量與排氣量，藉此精密地控制基板100與異物檢測平台12及塗布平台11之距離。再者，為在塗布平台11中，更精密地控制基板100與塗布平台11之距離，如上所述，以小於異物檢測平台12之排氣口2及噴出口1之間距之間距，形成排氣口2及噴出口1，且在異物檢測平台12與塗布平台11中，採用個別之排氣機構及氣體供給機構。Therefore, as described above, the processing accuracy of each platform surface is such that the foreign matter detecting platform 12 is more precise than the pair of floating platforms 14, 15 and the coating platform 11 is more precise than the foreign matter detecting platform 12. Further, only a pair of floating platforms 14 and 15 are formed with a discharge port 1 for ejecting gas to the region between the substrate and the substrate 100, and between the foreign object detecting platform 12 and the coating platform 11, a substrate is formed between the substrate and the substrate 100. The discharge port 1 for discharging the gas and the exhaust port 2 for discharging the gas from the region between the region and the substrate 100 control the discharge amount and the discharge amount of the gas, thereby precisely controlling the substrate 100 and the foreign matter detecting platform 12 And the distance of the coating platform 11. Further, in order to more precisely control the distance between the substrate 100 and the coating stage 11 in the coating stage 11, as described above, the exhaust gas is formed to be smaller than the distance between the exhaust port 2 and the discharge port 1 of the foreign matter detecting platform 12. The port 2 and the discharge port 1 are provided, and in the foreign matter detecting platform 12 and the coating platform 11, an individual exhaust mechanism and a gas supply mechanism are employed.
在具有如上所述之構成之塗布裝置中，將塗布液塗布於基板100時，從懸浮平台14、異物檢測平台12、塗布平台11及懸浮平台15之噴出口1噴出氣體，且從異物檢測平台其12及塗布平台11之排氣口2排放氣體，藉此使基板100懸浮。且，在該狀態下，藉由基板搬送夾具31保持基板100之端緣，使基板100沿著懸浮平台14、異物檢測平台12、塗布平台11及懸浮平台15移動。In the coating apparatus having the above configuration, when the coating liquid is applied to the substrate 100, gas is ejected from the floating platform 14, the foreign matter detecting platform 12, the coating platform 11, and the discharge port 1 of the floating platform 15, and the foreign matter detecting platform is used. The exhaust port 2 of the 12 and the coating platform 11 discharges gas, thereby suspending the substrate 100. In this state, the edge of the substrate 100 is held by the substrate transfer jig 31, and the substrate 100 is moved along the floating platform 14, the foreign matter detecting platform 12, the coating stage 11, and the floating platform 15.
此時之基板100之高度位置係藉由未圖示之感測器予以常時檢測。且，在懸浮平台14及懸浮平台15中，基於基板100之高度位置，控制從噴出口1噴出之氣體之噴出量及噴出壓力。又，在異物檢測平台12及塗布平台11中，控制從噴出口噴出之氣體之噴出量及噴出壓力，且控制從排氣口2排放之氣體之排放量。The height position of the substrate 100 at this time is always detected by a sensor (not shown). Further, in the floating platform 14 and the floating platform 15, the discharge amount and the discharge pressure of the gas ejected from the discharge port 1 are controlled based on the height position of the substrate 100. Further, in the foreign matter detecting platform 12 and the coating stage 11, the discharge amount and the discharge pressure of the gas discharged from the discharge port are controlled, and the discharge amount of the gas discharged from the exhaust port 2 is controlled.
如圖3(b)所示，基板100通過懸浮平台14上時，基板100之下面與懸浮平台14之表面之距離D維持於特定之高度。又，基板100通過異物檢測平台12上時，為正確地檢測基板100上之異物，使基板100之下面與異物檢測平台12之表面之距離D變更為低於懸浮平台14之位置，且更高精度地予以維持。As shown in FIG. 3(b), when the substrate 100 passes over the floating platform 14, the distance D between the lower surface of the substrate 100 and the surface of the floating platform 14 is maintained at a specific height. Further, when the substrate 100 passes through the foreign matter detecting stage 12, in order to accurately detect the foreign matter on the substrate 100, the distance D between the lower surface of the substrate 100 and the surface of the foreign matter detecting stage 12 is changed to be lower than the position of the floating stage 14, and higher. Maintain it with precision.
此處，如上所述，異物檢測平台12之基板100之搬送方向之長度Y係以大於利用塗布噴嘴21之塗布液101之塗布位置、與異物檢測機構22之利用異物檢測金屬板25之異物之檢測位置的距離X的方式設定。因此，可有效地防止基板100與異物檢測機構22之衝突。再者，基板100從懸浮平台14移動至異物檢測平台12時，如為變更上述之距離D而必須保有特定之距離之情形，較佳為將異物檢測平台12之基板100之搬送方向之長度Y設為對利用塗布噴嘴21之塗布液101之塗布位置、與異物檢測機構22之利用異物檢測金屬板25之異物之檢測位置的距離X，加上該高度之變更所需之距離之長度。Here, as described above, the length Y of the substrate 100 in the transport direction of the foreign matter detecting stage 12 is larger than the coating position of the coating liquid 101 by the coating nozzle 21, and the foreign matter of the foreign matter detecting member 22 using the foreign matter detecting means 22 The distance X of the detected position is set. Therefore, the collision of the substrate 100 with the foreign matter detecting mechanism 22 can be effectively prevented. Further, when the substrate 100 is moved from the floating platform 14 to the foreign matter detecting platform 12, it is necessary to maintain a specific distance for changing the distance D, and it is preferable to length the Y of the substrate 100 of the foreign matter detecting platform 12 The distance X between the application position of the coating liquid 101 by the coating nozzle 21 and the detection position of the foreign matter detecting mechanism 22 of the foreign matter detecting metal plate 25 is added, and the length of the distance required for the change of the height is added.
接著搬送基板100，使基板100從異物檢測平台12移動至塗布平台11時，基板100之下面與塗布平台11之表面之距離D變更至更低之位置，從而更高精度地予以維持。When the substrate 100 is transferred and the substrate 100 is moved from the foreign matter detecting stage 12 to the coating stage 11, the distance D between the lower surface of the substrate 100 and the surface of the coating stage 11 is changed to a lower position, and the substrate 100 is maintained with higher precision.
此時，在該塗布裝置中，作為排氣機構，使用用於從形成於異物檢測平台12之排氣口2進行排氣之第1排氣機構，與用於從形成於塗布平台11之排氣口2進行排氣之第2排氣機構的個別排氣機構，且作為氣體供給機構，使用用於從形成於異物檢測平台12之噴出口1噴出氣體之第1氣體供給機構，與用於從形成於塗布平台11之噴出口1噴出氣體之第2氣體供給機構的個別氣體供給機構。因此，可正確地控制基板100之高度位置，從而正確地實行塗布液之塗布與異物之檢測。At this time, in the coating apparatus, the first exhaust mechanism for exhausting from the exhaust port 2 formed in the foreign matter detecting stage 12 and the row for forming from the coating stage 11 are used as the exhaust mechanism. The air outlet 2 performs an individual exhaust mechanism of the second exhaust mechanism that exhausts, and a first gas supply mechanism for ejecting gas from the discharge port 1 formed in the foreign matter detecting stage 12 is used as the gas supply means, and is used for An individual gas supply mechanism of the second gas supply mechanism that ejects gas from the discharge port 1 of the coating stage 11. Therefore, the height position of the substrate 100 can be accurately controlled, so that the application of the coating liquid and the detection of foreign matter can be performed correctly.
再者，若搬送基板100並將完成塗布液101之塗布之基板100從塗布平台11移動至懸浮平台15，則基板100之下面與懸浮平台15之表面之距離D變更至與懸浮平台14相同程度。Further, when the substrate 100 is transferred and the substrate 100 on which the coating liquid 101 is applied is moved from the coating stage 11 to the floating stage 15, the distance D between the lower surface of the substrate 100 and the surface of the floating platform 15 is changed to the same level as that of the floating platform 14. .
其次，說明本發明之其他之實施形態。圖5係本發明之第2實施形態之塗布裝置之平面概要圖。又，圖6係說明懸浮平台14、異物檢測平台12、塗布平台11、振動防止平台13及懸浮平台15之構成。此處，圖6(a)係懸浮平台14、異物檢測平台12、塗布平台11、振動防止平台13及懸浮平台15平面圖，圖6(b)係將懸浮平台14、異物檢測平台12、塗布平台11、振動防止平台13及懸浮平台15與塗布噴嘴21及基板100一起顯示之側視圖。又，圖6(c)係顯示圖6(a)之變形例之平面圖。再者，圖7係顯示對異物檢測平台12、塗布平台11及振動防止平台13設置之氣體之排放及供給機構之概要圖。Next, other embodiments of the present invention will be described. Fig. 5 is a plan schematic view showing a coating apparatus according to a second embodiment of the present invention. Moreover, FIG. 6 illustrates the configuration of the suspension platform 14, the foreign matter detecting platform 12, the coating platform 11, the vibration preventing platform 13, and the floating platform 15. Here, FIG. 6(a) is a plan view of the suspension platform 14, the foreign matter detecting platform 12, the coating platform 11, the vibration preventing platform 13, and the floating platform 15, and FIG. 6(b) is a floating platform 14, a foreign matter detecting platform 12, and a coating platform. 11. A side view showing the vibration preventing platform 13 and the floating platform 15 together with the coating nozzle 21 and the substrate 100. Further, Fig. 6(c) is a plan view showing a modification of Fig. 6(a). In addition, FIG. 7 is a schematic view showing a gas discharge and supply mechanism provided to the foreign matter detecting platform 12, the coating stage 11, and the vibration preventing platform 13.
該第2實施形態之塗布裝置相對於上述之第1實施形態之塗布裝置，具有如下構成：於較塗布平台11更往基板之搬送方向之下游側，即於塗布平台11與懸浮平台15之間，配置振動防止平台13。其他之構成與上述之第1實施形態相同。再者，對與上述之第1實施形態相同之構件，附註相同之符號，省略詳細之說明。The coating device according to the second embodiment has a configuration in which the coating device is disposed on the downstream side of the substrate 11 in the conveying direction of the substrate, that is, between the coating stage 11 and the floating platform 15 . The vibration preventing platform 13 is disposed. The other configuration is the same as that of the first embodiment described above. The same components as those in the first embodiment are denoted by the same reference numerals, and the detailed description thereof will be omitted.
該第2實施形態之塗布裝置，其構成為於塗布平台11與懸浮平台15之間，配置有振動防止平台13。如圖6(a)所示，於振動防止平台13上，形成有向其與基板100之間之區域噴出氣體之噴出口1，與從其與基板100之間之區域排放氣體之排氣口2。再者，振動防止平台13之排氣口2及噴出口1之間距為與異物檢測平台12之排氣口2與噴出口1之間距相同之間距，且設定為大於塗布平台11之排氣口2及噴出口1之間距。又，該振動防止平台13之基板100之懸浮位置之精度只要與異物檢測平台12為相同程度即可。因此，該振動防止平台13之表面之加工精度亦與異物檢測平台12為相同程度。The coating apparatus according to the second embodiment is configured such that a vibration preventing platform 13 is disposed between the coating stage 11 and the floating platform 15. As shown in FIG. 6(a), on the vibration preventing platform 13, an ejection port 1 for ejecting a gas to a region between the substrate 100 and a discharge port for discharging gas from a region between the substrate and the substrate 100 is formed. 2. Furthermore, the distance between the exhaust port 2 and the ejection port 1 of the vibration preventing platform 13 is the same as the distance between the exhaust port 2 and the ejection port 1 of the foreign matter detecting platform 12, and is set to be larger than the exhaust port of the coating platform 11. 2 and the distance between the discharge ports 1. Further, the accuracy of the floating position of the substrate 100 of the vibration preventing platform 13 may be the same as that of the foreign matter detecting platform 12. Therefore, the processing accuracy of the surface of the vibration preventing platform 13 is also the same as that of the foreign matter detecting platform 12.
如圖7所示，振動防止平台13之各排氣口2係經由流量調整閥48f、流量計44f、壓力計49f而與吹風機43連接。基於流量計44f及壓力計49f之檢測值，控制流量調整閥48f，藉此可將來自振動防止平台13之排氣口2之排氣量控制於特定之值。又，振動防止平台13之各噴出口1係經由壓力調節器46e、流量調整閥48e、流量計44e、壓力計49e，而與壓縮空氣之供給源47連接。基於流量計44e及壓力計49e之檢測值，控制流量調整閥48e及壓力調節器46e，藉此可將來自振動防止平台13之噴出口1之氣體的噴出量及噴出壓力控制於特定之值。As shown in Fig. 7, each of the exhaust ports 2 of the vibration preventing platform 13 is connected to the blower 43 via a flow rate adjusting valve 48f, a flow meter 44f, and a pressure gauge 49f. Based on the detected values of the flow meter 44f and the pressure gauge 49f, the flow rate adjusting valve 48f is controlled, whereby the amount of exhaust gas from the exhaust port 2 of the vibration preventing platform 13 can be controlled to a specific value. Further, each of the discharge ports 1 of the vibration preventing platform 13 is connected to a supply source 47 of compressed air via a pressure regulator 46e, a flow rate adjusting valve 48e, a flow meter 44e, and a pressure gauge 49e. The flow rate adjustment valve 48e and the pressure regulator 46e are controlled based on the detected values of the flow meter 44e and the pressure gauge 49e, whereby the discharge amount and the discharge pressure of the gas from the discharge port 1 of the vibration prevention stage 13 can be controlled to a specific value.
用於從形成於振動防止平台13之排氣口2進行排氣之流量調整閥48f、流量計44f、壓力計49f、吹風機43構成本發明之第3排氣機構，而用於從形成於振動防止平台13之噴出口1噴出氣體之壓力調節器46e、流量調整閥48e、流量計44e、壓力計49e、壓縮空氣之供給源47構成本發明之第3氣體供給機構。The flow rate adjusting valve 48f for exhausting from the exhaust port 2 formed in the vibration preventing platform 13, the flow meter 44f, the pressure gauge 49f, and the blower 43 constitute the third exhaust mechanism of the present invention, and are used for forming from the vibration. The pressure regulator 46e, the flow rate adjusting valve 48e, the flow meter 44e, the pressure gauge 49e, and the compressed air supply source 47 for preventing the gas from being discharged from the discharge port 1 of the stage 13 constitute the third gas supply mechanism of the present invention.
圖6(c)顯示圖6(a)所示之實施形態之變形例。在圖6(c)所示之實施形態中，將圖6(a)所示之異物檢測平台12、塗布平台11及振動防止平台13之表面部分設為共通化之單一精密懸浮平台17。然而，上述之第1、第2、第3排氣機構及第1、第2、第3氣體供給機構與圖6(a)所示之實施形態相同。即，圖6(c)所示之實施形態與圖6(a)所示之實施形態僅其表面部分不同，且圖6(c)所示之精密懸浮平台17係包含圖6(a)所示之異物檢測平台12、塗布平台11及振動防止平台13者。因此，精密懸浮平台17之表面之加工精度較一對懸浮平台14、15更高精度，且，該等之區域中相當於塗布平台11之區域較相當於異物檢測平台12及振動防止平台13之區域更高精度。Fig. 6(c) shows a modification of the embodiment shown in Fig. 6(a). In the embodiment shown in Fig. 6(c), the surface portions of the foreign matter detecting stage 12, the coating stage 11, and the vibration preventing platform 13 shown in Fig. 6(a) are used as a single precision floating platform 17 which is common. However, the above-described first, second, and third exhaust mechanisms and the first, second, and third gas supply mechanisms are the same as those of the embodiment shown in Fig. 6(a). That is, the embodiment shown in Fig. 6(c) and the embodiment shown in Fig. 6(a) differ only in the surface portion, and the precision suspension platform 17 shown in Fig. 6(c) includes the Fig. 6(a). The foreign matter detecting platform 12, the coating platform 11, and the vibration preventing platform 13 are shown. Therefore, the machining accuracy of the surface of the precision suspension platform 17 is higher than that of the pair of suspension platforms 14, 15 , and the area corresponding to the coating platform 11 in the areas is equivalent to the foreign matter detecting platform 12 and the vibration preventing platform 13 The area is more precise.
上述之第1實施形態中，在懸浮平台15中，會發生以塗布平台11經塗布塗布液之基板100產生振動之情形。因此，在該第2實施形態中，以與異物檢測平台12相同程度之精度，將搬送基板100之振動防止平台13配置於塗布平台11與懸浮平台15之間。再者，在振動防止平台13中，將基板100之下面與振動防止平台13之表面之距離設為與異物檢測平台12相同即可。In the first embodiment described above, in the suspension stage 15, a vibration occurs in the substrate 100 coated with the coating liquid on the coating stage 11. Therefore, in the second embodiment, the vibration preventing platform 13 of the transport substrate 100 is placed between the coating stage 11 and the floating platform 15 with the same accuracy as the foreign matter detecting platform 12. Further, in the vibration preventing platform 13, the distance between the lower surface of the substrate 100 and the surface of the vibration preventing platform 13 may be the same as that of the foreign matter detecting platform 12.
在該第2實施形態之塗布裝置中，與第1實施形態之塗布裝置亦同樣地可藉由第1、第2、第3排氣機構及第1、第2、第3氣體供給機構之作用，正確地控制基板100之高度位置，從而正確地實行塗布液之塗布與異物之檢測In the coating apparatus according to the second embodiment, similarly to the coating apparatus of the first embodiment, the first, second, and third exhaust mechanisms and the first, second, and third gas supply mechanisms can be used. , correctly controlling the height position of the substrate 100, thereby correctly performing coating liquid coating and foreign matter detection
1．．．噴出口1. . . Spray outlet
2．．．排氣口2. . . exhaust vent
10．．．精密懸浮平台10. . . Precision suspension platform
11．．．塗布平台11. . . Coating platform
12．．．異物檢測平台12. . . Foreign object detection platform
13．．．振動防止平台13. . . Vibration prevention platform
14．．．懸浮平台14. . . Suspension platform
15．．．懸浮平台15. . . Suspension platform
16．．．精密懸浮平台16. . . Precision suspension platform
17．．．精密懸浮平台17. . . Precision suspension platform
21．．．塗布噴嘴twenty one. . . Coating nozzle
22．．．異物檢測機構twenty two. . . Foreign body detection mechanism
31．．．基板搬送夾具31. . . Substrate transfer jig
32．．．導軌32. . . guide
41．．．吹風機41. . . hair dryer
42．．．吹風機42. . . hair dryer
43．．．吹風機43. . . hair dryer
47．．．壓縮空氣之供給源47. . . Compressed air supply
100．．．基板100. . . Substrate
圖1係本發明之第1實施形態之塗布裝置之平面概要圖。Fig. 1 is a schematic plan view showing a coating apparatus according to a first embodiment of the present invention.
圖2(a)、(b)係顯示塗布噴嘴21及異物檢測機構22，與搬送狀態下之基板100之關係之側視圖。2(a) and 2(b) are side views showing the relationship between the coating nozzle 21 and the foreign matter detecting means 22 and the substrate 100 in the transport state.
圖3(a)~(c)係說明懸浮平台14、異物檢測平台12、塗布平台11及懸浮平台15之構成之圖。3(a) to (c) are views showing the configuration of the suspension platform 14, the foreign matter detecting platform 12, the coating platform 11, and the floating platform 15.
圖4係顯示對異物檢測平台12及塗布平台11之氣體之排放及供給機構之概要圖。4 is a schematic view showing a gas discharge and supply mechanism to the foreign matter detecting platform 12 and the coating platform 11.
圖5係本發明之第2實施形態之塗布裝置之平面概要圖。Fig. 5 is a plan schematic view showing a coating apparatus according to a second embodiment of the present invention.
圖6(a)~(c)係說明懸浮平台14、異物檢測平台12、塗布平台11、振動防止平台13及懸浮平台15之構成之圖。6(a) to 6(c) are views showing the configuration of the suspension platform 14, the foreign matter detecting platform 12, the coating platform 11, the vibration preventing platform 13, and the floating platform 15.
圖7係顯示對異物檢測平台12、塗布平台11及振動防止平台13之氣體之排放及供給機構之概要圖。Fig. 7 is a schematic view showing a gas discharge and supply mechanism for the foreign matter detecting platform 12, the coating platform 11, and the vibration preventing platform 13.
1．．．噴出口1. . . Spray outlet
2．．．排氣口2. . . exhaust vent
10．．．精密懸浮平台10. . . Precision suspension platform
11．．．塗布平台11. . . Coating platform
12．．．異物檢測平台12. . . Foreign object detection platform
14．．．懸浮平台14. . . Suspension platform
15．．．懸浮平台15. . . Suspension platform
16．．．精密懸浮平台16. . . Precision suspension platform
21．．．塗布噴嘴twenty one. . . Coating nozzle
100．．．基板100. . . Substrate
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| JP2010081564A JP5437134B2 (en) | 2010-03-31 | 2010-03-31 | Coating device |
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| KR101362292B1 (en) | 2012-06-04 | 2014-02-13 | 주식회사 나래나노텍 | Improved Apparatus and Method of Coating Both Sides of Film |
| KR102066041B1 (en) * | 2012-12-03 | 2020-02-11 | 세메스 주식회사 | Substrate treating apparatus |
| JP6518891B2 (en) * | 2014-08-01 | 2019-05-29 | 株式会社ブイ・テクノロジー | Transport device |
| JP2018043200A (en) * | 2016-09-15 | 2018-03-22 | 株式会社Ｓｃｒｅｅｎホールディングス | Coating applicator and application method |
| JP6860356B2 (en) * | 2017-01-20 | 2021-04-14 | 株式会社Ｓｃｒｅｅｎホールディングス | Coating device and coating method |
| KR102027116B1 (en) * | 2018-04-04 | 2019-10-01 | 주식회사 필옵틱스 | Non―contact adsorption device of flexible material |
| KR102134161B1 (en) * | 2018-08-23 | 2020-07-21 | 세메스 주식회사 | Apparatus and method for treating substrate |
| JP6896008B2 (en) * | 2019-03-19 | 2021-06-30 | 株式会社Ｓｃｒｅｅｎホールディングス | Substrate processing equipment and substrate processing method |
| JP6916833B2 (en) * | 2019-04-18 | 2021-08-11 | 株式会社Ｓｃｒｅｅｎホールディングス | Coating device and coating method |
| CN113070169B (en) * | 2021-04-19 | 2022-08-05 | 深圳市弘德胜自动化设备有限公司 | Electronic paper coating equipment |
| JP7470742B2 (en) | 2022-07-11 | 2024-04-18 | 株式会社Ｓｃｒｅｅｎホールディングス | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD |
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| US7643046B2 (en) * | 2005-12-21 | 2010-01-05 | Ricoh Company, Ltd. | Laser beam scanning device, image forming apparatus, and laser beam detecting method by the laser beam scanning device |
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| JP5303129B2 (en) * | 2007-09-06 | 2013-10-02 | 東京応化工業株式会社 | Coating apparatus and coating method |
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