TWI418933B - 著色感光性樹脂組合物、利用其所製造之彩色濾光片及液晶顯示裝置 - Google Patents

著色感光性樹脂組合物、利用其所製造之彩色濾光片及液晶顯示裝置 Download PDF

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Publication number
TWI418933B
TWI418933B TW099127238A TW99127238A TWI418933B TW I418933 B TWI418933 B TW I418933B TW 099127238 A TW099127238 A TW 099127238A TW 99127238 A TW99127238 A TW 99127238A TW I418933 B TWI418933 B TW I418933B
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TW
Taiwan
Prior art keywords
photosensitive resin
resin composition
colored photosensitive
fluorine
meth
Prior art date
Application number
TW099127238A
Other languages
English (en)
Chinese (zh)
Other versions
TW201122723A (en
Inventor
Bo Ram Jung
Seung Mo Hong
Byung Hoon Song
Original Assignee
Dongwoo Fine Chem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongwoo Fine Chem Co Ltd filed Critical Dongwoo Fine Chem Co Ltd
Publication of TW201122723A publication Critical patent/TW201122723A/zh
Application granted granted Critical
Publication of TWI418933B publication Critical patent/TWI418933B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/23—Photochromic filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Liquid Crystal (AREA)
TW099127238A 2009-08-21 2010-08-16 著色感光性樹脂組合物、利用其所製造之彩色濾光片及液晶顯示裝置 TWI418933B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020090077623A KR20110019979A (ko) 2009-08-21 2009-08-21 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 액정표시장치

Publications (2)

Publication Number Publication Date
TW201122723A TW201122723A (en) 2011-07-01
TWI418933B true TWI418933B (zh) 2013-12-11

Family

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Family Applications (1)

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TW099127238A TWI418933B (zh) 2009-08-21 2010-08-16 著色感光性樹脂組合物、利用其所製造之彩色濾光片及液晶顯示裝置

Country Status (4)

Country Link
JP (1) JP4998906B2 (ja)
KR (1) KR20110019979A (ja)
CN (1) CN101995771B (ja)
TW (1) TWI418933B (ja)

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JP5608413B2 (ja) * 2010-04-30 2014-10-15 太陽ホールディングス株式会社 硬化性樹脂組成物
TWI422631B (zh) * 2011-06-30 2014-01-11 Everlight Chem Ind Corp 黑色樹脂組成物、黑色矩陣及遮光層
JP5857578B2 (ja) * 2011-09-22 2016-02-10 Jsr株式会社 カラーフィルタ、液晶表示素子およびカラーフィルタの製造方法
JP2013205820A (ja) * 2012-03-29 2013-10-07 Fujifilm Corp 着色硬化性組成物、カラーフィルタ、カラーフィルタの製造方法、液晶表示装置、有機ｅｌ表示装置、及び固体撮像素子
KR101992867B1 (ko) * 2013-03-29 2019-06-25 동우 화인켐 주식회사 착색 감광성 수지 조성물
KR102093759B1 (ko) * 2013-07-19 2020-03-26 동우 화인켐 주식회사 투명화소 형성용 감광성 수지조성물
KR20150029921A (ko) * 2013-09-11 2015-03-19 동우 화인켐 주식회사 디스플레이 장치의 전면 차광층 형성용 착색 감광성 수지 조성물
JPWO2015060458A1 (ja) * 2013-10-25 2017-03-09 日産化学工業株式会社 ヒドロキシ基を有するパーフルオロポリエーテルを含む重合性組成物
CN104497627B (zh) * 2015-01-02 2016-06-29 温州泓呈祥科技有限公司 一种银掺杂改性染料的制备方法
TWI736530B (zh) * 2015-04-07 2021-08-21 日商日產化學工業股份有限公司 耐擦傷性塗佈用硬化性組成物
KR102345843B1 (ko) * 2015-04-07 2021-12-31 닛산 가가쿠 가부시키가이샤 방현성 코팅용 경화성 조성물
JP6808976B2 (ja) * 2016-05-26 2021-01-06 凸版印刷株式会社 カラーフィルタ、液晶表示装置、有機エレクトロルミネッセンス表示装置

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TW200830051A (en) * 2006-09-25 2008-07-16 Fujifilm Corp Resist composition, resin for use in the resist composition, compound for use in the synthesis of the resin, and pattern-forming method using the resist composition
TW200844664A (en) * 2007-03-28 2008-11-16 Fujifilm Corp Positive resist composition and pattern forming method
TW200907576A (en) * 2007-04-13 2009-02-16 Fujifilm Corp Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method
TW200910002A (en) * 2007-07-30 2009-03-01 Fujifilm Corp Positive resist composition and pattern forming method
TW200928584A (en) * 2007-09-26 2009-07-01 Fujifilm Corp Negative resist composition and resist pattern forming method using the same

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US7078445B2 (en) * 2001-02-01 2006-07-18 E. I. Du Pont De Nemours And Company Photosensitive acrylate composition and waveguide device
JP5177933B2 (ja) * 2003-08-12 2013-04-10 東洋インキＳｃホールディングス株式会社 隔壁用組成物、それを用いた画素形成用基板および画素の形成方法
US8044235B2 (en) * 2005-03-15 2011-10-25 Showa Denko K.K. (Meth) acryloyl group-containing aromatic isocyanate compound and production process thereof
JP5217112B2 (ja) * 2005-05-24 2013-06-19 Ｊｓｒ株式会社 硬化性組成物、硬化膜、反射防止膜積層体及び硬化膜の製造方法
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TW200830051A (en) * 2006-09-25 2008-07-16 Fujifilm Corp Resist composition, resin for use in the resist composition, compound for use in the synthesis of the resin, and pattern-forming method using the resist composition
TW200844664A (en) * 2007-03-28 2008-11-16 Fujifilm Corp Positive resist composition and pattern forming method
TW200907576A (en) * 2007-04-13 2009-02-16 Fujifilm Corp Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method
TW200910002A (en) * 2007-07-30 2009-03-01 Fujifilm Corp Positive resist composition and pattern forming method
TW200928584A (en) * 2007-09-26 2009-07-01 Fujifilm Corp Negative resist composition and resist pattern forming method using the same

Also Published As

Publication number Publication date
JP2011053674A (ja) 2011-03-17
CN101995771B (zh) 2013-04-17
TW201122723A (en) 2011-07-01
KR20110019979A (ko) 2011-03-02
CN101995771A (zh) 2011-03-30
JP4998906B2 (ja) 2012-08-15

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