TWI416095B - Substrate inspection apparatus - Google Patents
Substrate inspection apparatus Download PDFInfo
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- TWI416095B TWI416095B TW096133454A TW96133454A TWI416095B TW I416095 B TWI416095 B TW I416095B TW 096133454 A TW096133454 A TW 096133454A TW 96133454 A TW96133454 A TW 96133454A TW I416095 B TWI416095 B TW I416095B
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N2021/0106—General arrangement of respective parts
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Abstract
Description
本發明係有關於基板檢查裝置。有關於例如水平搬送如液晶玻璃基板等薄板狀之基板以檢查表面缺陷之基板檢查裝置。The present invention relates to a substrate inspection apparatus. A substrate inspection apparatus for inspecting a surface defect, for example, by horizontally transporting a thin plate-shaped substrate such as a liquid crystal glass substrate.
本申請案對2006年9月11日所申請之日本專利申請第2006-245739號主張優先權，且在此沿用其內容。The present application claims priority to Japanese Patent Application No. 2006-245739, filed on Sep. 11, 2006, the content of which is incorporated herein.
近年來，隨著液晶顯示器的大型化，液晶玻璃基板也跟著大型化。因此，用以檢查這種薄板狀基板之表面缺陷的基板檢查裝置很多都是將製造步驟中之基板移載至氣體浮起台等搬送台，且例如吸附保持基板之端部等而搬送至檢查部，並在檢查部中水平移動基板以檢查基板表面。藉此，可減少移動基板的時間、能量流失及因搬送對基板造成之損傷等。In recent years, with the increase in size of liquid crystal displays, liquid crystal glass substrates have also become larger. Therefore, many of the substrate inspection apparatuses for inspecting the surface defects of such a thin-plate-shaped substrate are transferred to a transfer table such as a gas floating stage, and are transported to the inspection, for example, by suction-holding the end portion of the substrate. And moving the substrate horizontally in the inspection section to inspect the surface of the substrate. Thereby, it is possible to reduce the time of moving the substrate, the loss of energy, and the damage caused to the substrate by the transfer.
例如，特開2004-279335號中記載有包含將氣體吹起使基板浮起之浮起塊及吸附保持浮起至浮起塊上的基板兩端且朝一個方向搬送基板之基板搬送部之基板搬送裝置(參照特開2004-279335號之第1圖)。For example, JP-A-2004-279335 discloses a substrate including a floating block that blows a gas to float a substrate, and a substrate transfer portion that adsorbs and holds both ends of the substrate on the floating block and transports the substrate in one direction. The conveying device (refer to the first drawing of JP-A-2004-279335).
又，特開2000-9661號中記載有在滾筒搬送部之其中一側沿著搬送方向設有Y平台且藉由固持機構朝厚度方向固持基板的其中一側以搬送它之平面面板檢查裝置(參照特 開2000-9661號之第1~3圖)。Further, a flat panel inspection device in which one side of the drum conveyance unit is provided with a Y platform along the conveyance direction and one side of the substrate is held in the thickness direction by the holding mechanism to convey it is described (Japanese Patent Publication No. 2000-9661) Reference Open the first to third figures of 2000-9661).
然而，上述習知基板檢查裝置有下列問題。However, the above conventional substrate inspection apparatus has the following problems.
在特開2004-279335號所記載之技術中，藉由沿著基板搬送路徑兩側平行配置之基板搬送部來吸附保持基板兩端以搬送之。因此，會由一對基板搬送部來限制基板兩側，如此，會因基板搬送部平行度的不安定等而從兩側擠壓薄板上之玻璃基板，而容易變形，且因基板扭曲會影響檢查精度。In the technique described in Japanese Laid-Open Patent Publication No. 2004-279335, both ends of the substrate are sucked and held by the substrate transfer portion arranged in parallel along both sides of the substrate transfer path. Therefore, the both sides of the substrate are restricted by the pair of substrate transporting portions, and the glass substrate on the thin plate is pressed from both sides due to the instability of the parallelism of the substrate transporting portion, etc., and is easily deformed, and the substrate distortion is affected. Check the accuracy.
又，在特開2004-279335號所記載之基板檢查裝置中，相對於浮起塊設有共通之基板搬送部。但，在平面面板之製造線中，因搬送路徑之配置或檢查部的數量等會配列多數浮起塊而形成長而大的搬送路徑。在該搬送路徑中配置多數製造裝置或檢查裝置。此時，在設置多數浮起塊與各裝置共通之兩端保持之基板搬送部時必須使互相之配置精度高精度，因此，基板檢查裝置設置要花的功夫或組裝成本會增加。特別是為了隔斷來自外部之振動，基板檢查裝置會載置於除振台上。這種載置於除振台上之裝置會因為隨著基板的移動使載置於除振台上之浮起塊的上面傾斜或者因來自外部之振動而產生複雜的移動，而無法設置共通之基板搬送部。In the substrate inspection device described in Japanese Laid-Open Patent Publication No. 2004-279335, a common substrate transfer unit is provided with respect to the floating block. However, in the manufacturing line of the flat panel, a large and large transport path is formed by arranging a plurality of floating blocks due to the arrangement of the transport paths or the number of inspection portions. A plurality of manufacturing apparatuses or inspection apparatuses are disposed in the transport path. In this case, when the substrate transfer unit held by both the floating blocks and the respective devices is provided, it is necessary to accurately arrange the mutual placement precision. Therefore, the labor required for the substrate inspection device installation or the assembly cost increases. In particular, in order to block vibration from the outside, the substrate inspection device is placed on the vibration isolation table. Such a device placed on the vibration removing table cannot be set to be complicated because the substrate is placed on the floating block on the vibration removing table or the complex vibration is generated due to vibration from the outside. Substrate transfer unit.
為迴避後者的問題，也考慮過在每個浮起塊分別設置基板搬送部，但需要從上游之基板搬送部改搬至下游之基板搬送部的搬送機器人等，如此，裝置構造會變複雜。In order to avoid the latter problem, it is conceivable to provide a substrate transfer unit for each floating block, but it is necessary to relocate the transfer mechanism from the upstream substrate transfer unit to the downstream substrate transfer unit, and the device structure is complicated.
又，在特開2000-9661號所記載之技術中，在將基板搬 送至下游之搬送部時，必須暫時使基板脫離。此時，基板在水平方向之受限會消失，因此，有損於已對準至基準位置之基板的定位狀態。因此，會有在傳遞後必需再進行對準調整的問題。Further, in the technique described in Japanese Laid-Open Patent Publication No. 2000-9661, the substrate is moved. When sending to the downstream conveying section, the substrate must be temporarily removed. At this time, the limitation of the substrate in the horizontal direction disappears, and thus the positioning state of the substrate aligned to the reference position is impaired. Therefore, there is a problem that alignment adjustment must be performed after the transfer.
本發明有鑑於上述問題，以提供即使搬送路徑很長基板也不會變形且可以良好之精度搬送基板之基板檢查裝置為目的。In view of the above problems, the present invention has an object of providing a substrate inspection apparatus that can transport a substrate with good precision even if the substrate is not deformed for a long time.
為解決上述問題，本發明之基板檢查裝置係包含用以搬送被檢查體之薄板狀基板之搬送台及配置於與搬送台之搬送方向垂直之方向之其中一側且保持基板端部且賦與基板搬送力之多數單側搬送部，並在多數單側搬送部之間依序傳遞基板，藉此搬送基板。In order to solve the above problem, the substrate inspection apparatus of the present invention includes a transfer table for transporting a thin plate-shaped substrate of the test object, and one side of the direction perpendicular to the transport direction of the transfer table, and holds the end of the substrate and is provided A plurality of single-side conveying portions of the substrate conveying force sequentially convey the substrates between the plurality of single-side conveying portions, thereby conveying the substrates.
根據本發明之基板檢查裝置，由於在多數單側搬送部之間傳遞基板以進行搬送，故即使搬送長度很長，基板也不會變形，且可以良好之精度搬送基板。According to the substrate inspection apparatus of the present invention, since the substrate is transferred between the plurality of single-side conveying units for transport, the substrate is not deformed even if the transport length is long, and the substrate can be transported with good precision.
第1圖係顯示本發明第1實施形態之基板檢查裝置之概略構造之平面圖。Fig. 1 is a plan view showing a schematic structure of a substrate inspecting apparatus according to a first embodiment of the present invention.
第2A圖係第1圖之A部的部份放大圖。Fig. 2A is a partially enlarged view of a portion A of Fig. 1.
第2B圖係從第2A圖之B觀看之正視圖。Fig. 2B is a front view as seen from B of Fig. 2A.
第3圖係針對本發明第1實施形態之基板檢查裝置之動作來說明之平面圖。Fig. 3 is a plan view showing the operation of the substrate inspecting apparatus according to the first embodiment of the present invention.
第4圖係針對本發明第1實施形態之基板檢查裝置之動作來說明之平面圖。Fig. 4 is a plan view showing the operation of the substrate inspecting apparatus according to the first embodiment of the present invention.
第5圖係本發明第1實施形態之變形例之基板檢查裝置之概略構造之平面圖。Fig. 5 is a plan view showing a schematic configuration of a substrate inspecting apparatus according to a modification of the first embodiment of the present invention.
第6圖係顯示本發明第2實施形態之基板檢查裝置之概略構造之平面圖。Fig. 6 is a plan view showing a schematic structure of a substrate inspecting apparatus according to a second embodiment of the present invention.
第7圖係顯示本發明第3實施形態之基板檢查裝置之概略構造之平面圖。Fig. 7 is a plan view showing a schematic structure of a substrate inspecting apparatus according to a third embodiment of the present invention.
第8圖係顯示本發明第4實施形態之基板檢查裝置之概略構造之平面圖。Fig. 8 is a plan view showing a schematic configuration of a substrate inspecting apparatus according to a fourth embodiment of the present invention.
以下針對本發明實施形態參照所附圖式來說明。在所有圖式中，即使是不同的實施形態，同一或同等之構件皆賦與相同符號，且省去共通之說明。Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. In all the drawings, the same or equivalent components are given the same symbols, and the common description is omitted.
針對本發明第1實施形態之基板檢查裝置來說明。The substrate inspection device according to the first embodiment of the present invention will be described.
第1圖係顯示本發明第1實施形態之基板檢查裝置之概略構造之平面圖。第2A圖係第1圖之A部的部份放大圖。第2B圖係從第2A圖之B觀看之正視圖。Fig. 1 is a plan view showing a schematic structure of a substrate inspecting apparatus according to a first embodiment of the present invention. Fig. 2A is a partially enlarged view of a portion A of Fig. 1. Fig. 2B is a front view as seen from B of Fig. 2A.
本實施形態係適用於以例如液晶玻璃基板等所構成之薄板狀基板4為被檢查體且朝水平方向一面使基板4浮起一面搬送之，以檢查基板4表面之基板檢查裝置100。The present embodiment is applied to the substrate inspection apparatus 100 for inspecting the surface of the substrate 4 by using the thin plate-like substrate 4 made of, for example, a liquid crystal glass substrate as the object to be inspected and transporting the substrate 4 while floating in the horizontal direction.
基板檢查裝置100之構略構造係如第1圖所示，沿著基 板4之搬送方向依序配置有基板搬入部1、檢查部2及基板搬出部3。The structure of the substrate inspection device 100 is as shown in Fig. 1, along the base. The substrate carrying unit 1, the inspection unit 2, and the substrate carrying unit 3 are disposed in the order in which the sheets 4 are transported.
基板4從平面看的形狀為搬送方向之長度為L且與搬送方向垂直之方向(以下，稱作搬送寬度方向)的寬度為W之矩形。The shape of the substrate 4 as viewed in plan is a rectangle in which the length of the transport direction is L and the width perpendicular to the transport direction (hereinafter referred to as the transport width direction) is W.
基板搬入部1具有藉由具有多數抬高桿之抬高構件接收用例如搬送機器人等從裝置外部搬送過來的基板4，且載置於浮起台1A上，並在水平面內將浮在浮起台1A上之基板4定位於搬送方向及搬送寬度方向之基準桿8a、8a、8b與推壓桿8c、8c所構成之基板定位機構，更具有浮起台1A及吸附搬送部5(單側搬送部)。The substrate loading unit 1 has a substrate 4 that is conveyed from the outside of the apparatus by a lifting robot or the like by a lifting member having a plurality of raising levers, and is placed on the floating table 1A and floats in a horizontal plane. The substrate 4 on the stage 1A is positioned on the substrate positioning mechanism including the reference rods 8a, 8a, and 8b in the transport direction and the transport width direction and the push rods 8c and 8c, and further includes a floating table 1A and an adsorption transport unit 5 (one side) Transport department).
浮起台1A為用以朝水平方向載置基板4使其可朝水平方向自由移動且以低負荷朝固定方向搬送基板4之搬送台。在本實施形態中，由在台之表面設有多數氣體噴射孔N，且從該等氣體噴射孔N噴出氣體以浮起支持基板4之浮起台構成。The floating table 1A is a transfer table for placing the substrate 4 in the horizontal direction so as to be movable in the horizontal direction and transporting the substrate 4 in a fixed direction with a low load. In the present embodiment, a plurality of gas injection holes N are provided on the surface of the stage, and a gas is ejected from the gas injection holes N to float the support table of the support substrate 4.
浮起台1A的大小係設定成搬送方向之長度較基板4之搬送方向長度L長且搬送寬度方向之寬度較基板4之寬度W窄一點點。The size of the floating table 1A is set such that the length in the transport direction is longer than the length L of the substrate 4 in the transport direction and the width in the transport width direction is narrower than the width W of the substrate 4.
基準桿8a、8a為抵接於基板4之搬送寬度方向之端部以進行搬送寬度方向之定位之卡止構件，且以向著浮起台1A之搬送方向為右側(第1圖之下側，以下，稱作搬送方向右側)之固定配置設成可相對於基板4之載置面朝上下方向出沒之狀態。The reference rods 8a and 8a are the locking members that are in contact with the end portions of the substrate 4 in the transport width direction to be positioned in the transport width direction, and the transport direction toward the floating table 1A is the right side (the lower side of the first drawing, Hereinafter, the fixed arrangement of the right side in the transport direction is set so as to be able to be displayed in the vertical direction with respect to the mounting surface of the substrate 4.
基準桿8b為抵接於基板4之搬送方向之端部以進行搬送方向之定位之卡止構件，且在浮起台1A之搬送方向下游設成可相對於基板4之載置面朝上下方向出沒之狀態。The reference rod 8b is a locking member that abuts on the end portion of the substrate 4 in the transport direction to be positioned in the transport direction, and is disposed downstream of the mounting surface of the floating table 1A so as to be vertically movable with respect to the mounting surface of the substrate 4. Haunted state.
另，第1圖為顯示模式圖誇大了大小等東西，結果，描繪成基準桿8b與滑動引導構件9互相干擾之位置關係。但，基準桿8b設於與滑動引導構件9有一點距離的位置，且在不與滑件10干擾之狀態下在基板4之定位後下降，並可退避至不與後述吸附搬送部5干擾之位置。In addition, in the first drawing, the display mode diagram exaggerates the size and the like, and as a result, the positional relationship between the reference bar 8b and the slide guide member 9 is described. However, the reference rod 8b is provided at a position slightly away from the slide guiding member 9, and is lowered after the positioning of the substrate 4 without interfering with the slider 10, and can be retracted so as not to interfere with the adsorption transport portion 5 which will be described later. position.
推壓桿8c為用以推壓基板4且賦與勢能使基板4朝設於基準位置之基準桿8a、8a、8b移動之推壓構件，且在向著浮起台1A之搬送方向為左側(第1圖之上側，以下，稱作搬送方向左側)與浮起台1A之搬送方向上游中，設成可朝基板4移動之狀態。The pressing lever 8c is a pressing member for pressing the substrate 4 and biasing the substrate 4 toward the reference rods 8a, 8a, 8b provided at the reference position, and is disposed to the left side in the conveying direction toward the floating table 1A ( The upper side of the first drawing, hereinafter referred to as the left side in the transport direction, and the upstream side of the transporting direction of the floating table 1A are provided in a state of being movable toward the substrate 4.
另，基準桿8a、8b、推壓桿8c只要是可在不傷到基板4的端部之狀態下抵接之卡止構件，則不限於桿狀構件，例如亦可為塊狀構件。又，推壓構件在表面蓋上緩衝材料等亦可。In addition, the reference levers 8a and 8b and the pressing lever 8c are not limited to the rod-shaped member as long as they can abut against the end portion of the substrate 4, and may be, for example, a block member. Further, the pressing member may be provided with a cushioning material or the like on the surface.
吸附搬送部5沿著浮起台1A之搬送方向右側配置，且吸附保持浮起支持於浮起台1A之基板4的搬送方向右側裡面，以朝搬送方向賦與搬送力。The adsorption transport unit 5 is disposed on the right side in the transport direction of the floating table 1A, and is adsorbed and held on the right side in the transport direction of the substrate 4 of the floating table 1A, and the transport force is applied in the transport direction.
吸附搬送部5之概略構造係如第2A圖、第2B圖所示，由滑動引導構件9、滑件10、升降機構11、升降台12、吸附台13及吸附塊14構成。The schematic structure of the adsorption transport unit 5 is constituted by the slide guide member 9, the slider 10, the elevating mechanism 11, the elevating table 12, the adsorption stage 13, and the adsorption block 14, as shown in Figs. 2A and 2B.
滑動引導構件9及滑件10為以滑動引導構件9作為引導 構件且使滑件10在固定直線上往返移動之線性馬達所構成之移動機構。本實施形態中，採用線性馬達作為移動機構，但亦可採用使用滾珠螺桿等之單軸驅動機構。The sliding guide member 9 and the slider 10 are guided by the sliding guide member 9 The moving mechanism of the member and the linear motor that reciprocates the slider 10 on a fixed straight line. In the present embodiment, a linear motor is used as the moving mechanism, but a single-axis driving mechanism using a ball screw or the like may be employed.
吸附搬送部5之滑動引導構件9係如第1圖所示，沿著浮起台1A之搬送方向右側配置，且從浮起台1A之基準定位領域P1 之中間部延伸至浮起台2A上游之基板傳遞領域P2 之中間部。The slide guide member 9 of the adsorption transport unit 5 is disposed on the right side in the transport direction of the floating table 1A as shown in Fig. 1 and extends from the intermediate portion of the reference positioning region P 1 of the floating table 1A to the floating table 2A. The upstream substrate transfers the middle portion of the field P 2 .
升降機構11係固定於滑件10上，且在搬送基板4時使吸附台13上升，且傳遞基板4，且在要返回原來的位置時，在吸附台13不與基板4互相干擾之情況下使該吸附台13下降。The elevating mechanism 11 is fixed to the slider 10, and when the substrate 4 is transported, the adsorption stage 13 is raised, and the substrate 4 is transferred, and when it is returned to the original position, when the adsorption stage 13 does not interfere with the substrate 4, The adsorption stage 13 is lowered.
升降台12為用以保持設於升降機構11上端面之吸附台13之保持構件。The lifting table 12 is a holding member for holding the suction stage 13 provided on the upper end surface of the lifting mechanism 11.
吸附台13為用以將多數吸附塊14固定在上面而設且長度較基板4之搬送方向長度L短一點點之矩形的支持構件。該吸附台13在長向與浮起台1A之端面平行之狀態下固定於升降台12上。The adsorption stage 13 is a rectangular support member for fixing a plurality of adsorption blocks 14 to the upper surface and having a length shorter than the length L of the substrate 4 in the transport direction. The suction stage 13 is fixed to the lifting table 12 in a state where the longitudinal direction is parallel to the end surface of the floating table 1A.
吸附塊14為以其上端面從裡面吸附基板4之搬送方向右側之端部的吸附墊，且在各上端面整齊排列於平面上之狀態下，隔著適當間隔設置多數在吸附台13上。本實施形態中，依附塊14在等分基板4之搬送方向寬度方向之端部的全長L之位置設置6個，且基板4之其中一端部由吸附塊14整個吸附。The adsorption block 14 is an adsorption pad which adsorbs the end portion on the right side in the conveyance direction of the substrate 4 from the inside, and is provided on the adsorption table 13 at an appropriate interval in a state where the upper end faces are aligned on the plane. In the present embodiment, the attachment block 14 is provided at six positions of the entire length L of the end portion in the width direction of the transfer direction of the substrate 4, and one end portion of the substrate 4 is entirely adsorbed by the adsorption block 14.
可採用例如在從平面看為矩形之吸附面設有凹部14a且在該凹部14a中央設有藉由吸引源進行真空吸引之吸引 孔14b的構造作為吸附塊14之構造。For example, a concave portion 14a may be provided on an adsorption surface which is rectangular in plan view, and a vacuum suction attraction by a suction source may be provided in the center of the concave portion 14a. The configuration of the hole 14b serves as a configuration of the adsorption block 14.
檢查部2係檢查從基板搬入部1搬送而至之基板4且傳遞至基板搬出部3。The inspection unit 2 inspects the substrate 4 that has been transported from the substrate loading unit 1 and transmits it to the substrate unloading unit 3 .
檢查部2由固定於未圖示之基台上之門型作業台2a、可移動地設於該作業台2a之水平臂部之顯微鏡等檢查頭2b、浮起台2A及吸附搬送部6所構成。檢查部2在檢查時為了不要受到外部振動的影響宜設置於除振台上。The inspection unit 2 includes a door type work table 2a fixed to a base (not shown), an inspection head 2b such as a microscope movably provided on a horizontal arm portion of the work table 2a, a floating table 2A, and an adsorption transfer unit 6. Composition. The inspection unit 2 is preferably placed on the vibration isolation stage in order to prevent external vibration from being affected during the inspection.
浮起台2A為朝水平方向載置基板4且朝固定方向搬送之搬送台，本實施形態中，採用與浮起台1A同樣的空氣浮起台。但，檢查部2之浮起台1A的大小則設定為搬送寬度方向之寬度與浮起台1A等寬，而搬送方向之長度則大於2．L。因此，當欲在浮起台2A之基板傳遞領域P2 下游設置檢查領域P3 時，只要確保在於浮起台2A上之基板傳遞領域P2 將基板4從吸附搬送部5傳遞至吸附搬送部6之狀態下，使基板4可相對於檢查頭2a之檢查線從搬送方向前端移動至後端以藉由檢查頭2a檢查基板4全部之長度即可。The floating table 2A is a transfer table in which the substrate 4 is placed in the horizontal direction and transported in the fixed direction. In the present embodiment, the same air floating table as the floating table 1A is used. However, the size of the floating table 1A of the inspection unit 2 is set such that the width in the transport width direction is equal to the width of the floating table 1A, and the length of the transport direction is greater than 2. L. Therefore, when the inspection area P 3 is to be provided downstream of the substrate transfer area P 2 of the floating stage 2A, the substrate transfer area P 2 on the floating stage 2A is ensured to transfer the substrate 4 from the adsorption transfer unit 5 to the adsorption transfer unit. In the state of 6, the substrate 4 can be moved from the front end to the rear end in the transport direction with respect to the inspection line of the inspection head 2a, and the entire length of the substrate 4 can be inspected by the inspection head 2a.
檢查部2在從基板搬入部1搬入基板4時，宜啟動除振台且使浮起台2A與浮起台1A等高。When the inspection unit 2 carries the substrate 4 from the substrate loading unit 1, it is preferable to activate the vibration isolation table and to make the floating table 2A and the floating table 1A equal in height.
吸附搬送部6與第2B圖所示之吸附搬送部5之構造具有相同構造。吸附搬送部6如第1圖所示沿著吸附搬送部5相反側之浮起台2A之搬送方向左側配置，且從吸附搬送部5接收已由基板搬入部1定位之基板4並浮起搬送之。The adsorption transport unit 6 has the same structure as the structure of the adsorption transport unit 5 shown in FIG. 2B. The adsorption transport unit 6 is disposed on the left side in the transport direction of the floating table 2A on the opposite side of the adsorption transport unit 5 as shown in FIG. 1 , and receives the substrate 4 that has been positioned by the substrate loading unit 1 from the adsorption transport unit 5 and floats and transports it. It.
吸附搬送部6可藉由多數吸附塊14吸附基板4之搬送方向左側裡面且賦與基板4搬送力。The adsorption transport unit 6 can adsorb the transfer force of the substrate 4 by the plurality of adsorption blocks 14 in the left side of the transfer direction of the substrate 4 .
檢查部2之滑動引導構件9係如第1圖所示，沿著浮起台2A之搬送方向左側配置，且從浮起台2A之基板傳遞領域P2 之中間部延伸至基板傳遞領域(檢查領域)P3 之中間部。As shown in Fig. 1, the slide guide member 9 of the inspection unit 2 is disposed on the left side in the transport direction of the floating table 2A, and extends from the intermediate portion of the substrate transfer region P 2 of the float table 2A to the substrate transfer region (inspection) fIELD) P 3 of the intermediate portion.
該滑動引導構件9的長度只要是在相鄰之基板傳遞領域P2 、P3 中滑件10可在浮起台2A之搬送方向長度之範圍中往返移動之長度即可，亦可與浮起台2A之搬送方向長度大致等長。The length of the sliding guide member 9 may be a length that can reciprocate in a range in which the slider 10 can be moved in the transport direction length of the floating table 2A in the adjacent substrate transfer fields P 2 and P 3 , and can also be floated The transport direction of the table 2A is approximately the same length.
因此，從平面看，吸附搬送部5之滑動引導構件9與吸附搬送部6之滑動引導構件9係隔著浮起台2A互相平行相向。相向配置之吸附搬送部5、6只要可在基板傳遞領域P2 中傳遞基板4即可，滑件10不在基板傳遞領域P2 中間(L/2)也沒關係，但為正確且穩定地搬送已定位之基板，仍可將各滑件10移動至基板傳遞領域P2 中間(L/2)。Therefore, the slide guide member 9 of the adsorption transport unit 5 and the slide guide member 9 of the adsorption transport unit 6 are parallel to each other across the floating table 2A as viewed in plan. The adsorption transport units 5 and 6 that are disposed to face each other can transmit the substrate 4 in the substrate transfer region P 2 , and the slider 10 does not have to be in the middle of the substrate transfer region P 2 (L/2), but the carrier is correctly and stably transported. The positioned substrate can still move each slider 10 to the middle of the substrate transfer area P 2 (L/2).
本實施形態中，設定成可在浮起台2A上之基板傳遞領域P2 將由吸附搬送部5吸附搬送之基板4傳遞至吸附搬送部6。如第2A圖及第2B圖所示，藉由吸附搬送部5之各吸附塊14、吸附搬送部6之各吸附塊14吸附保持基板4之搬送寬度方向之端部全部。吸附搬送部5之滑件10之移動範圍為了使吸附搬送部5、6之移動中心在基板4之長度L的大致中央，係設定在與基板4的長度相等之基準定位領域P1 與基板傳遞領域P2 之中間位置。In the present embodiment, the substrate 4 that is adsorbed and transported by the adsorption transport unit 5 can be transported to the adsorption transport unit 6 in the substrate transfer region P 2 on the floating table 2A. As shown in FIG. 2A and FIG. 2B, all of the adsorption block 14 of the adsorption transport unit 5 and each of the adsorption blocks 14 of the adsorption transport unit 6 adsorb and hold all of the end portions of the substrate 4 in the transport width direction. Moving range of the adsorption conveying portion slider 5 of the member 10 of the order of the adsorption conveying movement of the central portion 5 and 6 of the substantially longitudinal center of the substrate 4 of the L, the line is set at a reference location field is equal to the length of the substrate 4 P 1 of the substrate transfer The middle position of the field P 2 .
同樣地，吸附搬送部6之滑件10之移動範圍則設定在基板傳遞領域P2 、P3 之中間位置。Similarly, the movement range of the slider 10 of the adsorption transport unit 6 is set at the intermediate position between the substrate transfer fields P 2 and P 3 .
基板搬出部3藉由例如搬送機器人將在檢查部2之檢查 結束之基板4搬出至裝置外部，且包含浮起台3A及吸附搬送部7。The substrate carrying-out unit 3 checks the inspection unit 2 by, for example, a transfer robot. The completed substrate 4 is carried out to the outside of the apparatus, and includes a floating stage 3A and an adsorption transport unit 7.
浮起台3A、吸附搬送部7分別與浮起台1A、吸附搬送部5具有同樣構造。吸附搬送部7沿著吸附搬送部6相反側之浮起台3A之搬送方向右側配置。該吸附搬送部7之滑動引導構件9從浮起台2A下游之基板傳遞領域P3 的中間部延伸至浮起台3A之基板搬出領域P4 的中間部。The floating table 3A and the adsorption transport unit 7 have the same structure as the floating stage 1A and the adsorption transport unit 5, respectively. The adsorption transport unit 7 is disposed on the right side in the transport direction of the floating table 3A on the opposite side of the adsorption transport unit 6. The slide guide member 9 of the adsorption transport unit 7 extends from the intermediate portion of the substrate transfer region P 3 downstream of the float table 2A to the intermediate portion of the substrate carry-out field P 4 of the floating table 3A.
吸附搬送部6之滑動引導構件9與吸附搬送部7之滑動引導構件9之一部分係分別隔著浮起台2A之基板傳遞領域P3 互相平行相向。因此，由吸附搬送部6吸附搬送之基板4可傳遞至在與浮起台2A上游之浮起台3A相鄰接之基板傳遞領域P3 中相向之吸附搬送部7。One portion of the slide guide member 9 of the adsorption transport unit 6 and the slide guide member 9 of the adsorption transport unit 7 are parallel to each other via the substrate transfer region P 3 of the floating table 2A. Therefore, the substrate 4 adsorbed and transported by the adsorption transport unit 6 can be transferred to the adsorption transport unit 7 facing the substrate transfer area P 3 adjacent to the floating stage 3A upstream of the floating stage 2A.
如此一來，本實施形態之基板檢查裝置100中，浮起台1A、2A、3A朝搬送方向依序相鄰接且延伸，且吸附搬送部5、6、7在該搬送方向兩側交互地配置成千鳥格狀。因此，可在基板傳遞領域P2 、P3 將已定位之基板4分別從吸附搬送部5朝吸附搬送部6或從吸附搬送部6朝吸附搬送部7依序傳遞且搬送。In the substrate inspection apparatus 100 of the present embodiment, the floating stages 1A, 2A, and 3A are sequentially adjacent to each other in the conveyance direction, and the adsorption conveyance units 5, 6, and 7 alternately move on both sides in the conveyance direction. Configured in a thousand bird shape. Therefore, the substrate 4 that has been positioned can be sequentially transferred from the adsorption transport unit 5 to the adsorption transport unit 6 or from the adsorption transport unit 6 to the adsorption transport unit 7 in the substrate transfer fields P 2 and P 3 , and can be transported.
接著，針對本實施形態之基板檢查裝置100的動作，以基板4之搬送動作為中心來做說明。Next, the operation of the substrate inspection apparatus 100 of the present embodiment will be described focusing on the conveyance operation of the substrate 4.
第3、4圖針對本發明第1實施形態之基板檢查裝置的動作來說明之平面圖。3 and 4 are plan views for explaining the operation of the substrate inspecting apparatus according to the first embodiment of the present invention.
首先，如第1圖之圖式左端所示，使吸附搬送部5之滑件10移動至成為搬送開始側之基準定位領域P1 之中間位 置。此時，調整升降機構11的高度，且先使吸附塊14的上端面較基板4裡面之浮起高度低。First, as shown in the drawings the left end in FIG. 1, the suction conveyance unit 10 moves the slide member 5 to be of the P 1 position of the intermediate transfer start reference side of the positioning art. At this time, the height of the elevating mechanism 11 is adjusted, and the upper end surface of the adsorption block 14 is made lower than the floating height of the inside of the substrate 4.
然後，將由未圖示之搬送機器人等搬入之基板4移載至較浮起台1A上突出之抬高構件之各抬高桿上。抬高構件在從搬送機器人接收基板4之後，會下降且使基板4載置於浮起台1A上。移載於浮起台1A上之基板4藉由從浮起台1A朝上方噴射之氣體浮起至預定高度。由於基板4浮起於浮起台1A上，故平面方向之移動是自由的，且即使基板4的尺寸較大，也可以些微負荷移動。Then, the substrate 4 carried in by the transfer robot or the like (not shown) is transferred to the respective raising levers of the raising members that protrude from the floating table 1A. After the lifting member receives the substrate 4 from the transfer robot, the lifting member is lowered and the substrate 4 is placed on the floating table 1A. The substrate 4 transferred to the floating stage 1A is floated to a predetermined height by the gas ejected upward from the floating stage 1A. Since the substrate 4 floats on the floating stage 1A, the movement in the planar direction is free, and even if the size of the substrate 4 is large, it is possible to move with a slight load.
接著，移動推壓桿8c、8c，且將浮起狀態之基板4推向基準桿8a、8a、8b以在基準位置進行定位。Next, the push rods 8c and 8c are moved, and the substrate 4 in the floating state is pushed toward the reference rods 8a, 8a, and 8b to be positioned at the reference position.
藉由該等動作，藉由基準桿8a、8a、8b推壓浮起於浮起台1A上之基板4的兩邊，以分別相對於搬送寬度方向、搬送方向之基準位置來定位從平看之位置。By these operations, both sides of the substrate 4 floating on the floating table 1A are pressed by the reference rods 8a, 8a, and 8b, and are positioned relative to the transport width direction and the reference position of the transport direction, respectively. position.
在此狀態下，驅動升降機構11，使吸附塊14上升至基板4裡面之高度，且真空吸附已定位於基準位置之基板4。In this state, the elevating mechanism 11 is driven to raise the adsorption block 14 to the height inside the substrate 4, and vacuum-adsorbs the substrate 4 which has been positioned at the reference position.
在真空吸附結束後，使基準桿8b下降，同時使推壓桿8朝遠離基板4之方向退避。After the vacuum adsorption is completed, the reference rod 8b is lowered, and the pressing rod 8 is retracted away from the substrate 4.
然後，吸附搬送部5之滑件10移動至基板傳遞領域P2 之中間位置，且將基板4搬送至檢查部2之基板傳遞領域P2 。Then, the slider 10 of the adsorption transport unit 5 moves to the intermediate position of the substrate transfer region P 2 , and the substrate 4 is transported to the substrate transfer region P 2 of the inspection unit 2 .
此時，吸附搬送部6之滑件10使升降機構11下降，且使吸附塊14之上端面較基板4裡面的高度低，且移動至浮起台1A之基板傳遞領域P2 待機。At this time, the slider 10 of the adsorption transport unit 6 lowers the elevating mechanism 11 and lowers the upper end surface of the adsorption block 14 than the inside of the substrate 4, and moves to the substrate transfer area P 2 of the floating table 1A to stand by.
結果，如第3圖所示，吸附搬送部5、6之各滑件10在移 動於浮起台2A之基板傳遞領域P2 之基板4下面配置於互相相向之位置。在該狀態下，使升降機構11上升，使吸附搬送部6之吸附塊14之上端面抵接於基板4裡面。然後，在以吸附搬送部5之吸附塊14吸附保持基板4之狀態下，由吸附搬送部6真空吸附。此時，與搬送寬度方向相向之基板4的兩端部分別由吸附搬送部5、6之各吸附塊14吸附保持大致全長的部份。As a result, as shown in Fig. 3, the sliders 10 of the adsorption transporting units 5 and 6 are disposed at positions facing each other under the substrate 4 which is moved to the substrate transfer region P 2 of the floating table 2A. In this state, the elevating mechanism 11 is raised, and the upper end surface of the adsorption block 14 of the adsorption transport unit 6 is brought into contact with the inside of the substrate 4. Then, in the state in which the substrate 4 is adsorbed and held by the adsorption block 14 of the adsorption transport unit 5, the adsorption transport unit 6 vacuum-adsorbs. At this time, both end portions of the substrate 4 facing the transport width direction are adsorbed and held by the respective adsorption blocks 14 of the adsorption transport units 5 and 6 at substantially the entire length.
在吸附結束後，解除吸附搬送部5之吸附，且使吸附搬送部5之升降機構11下降。吸附搬送部5移動至基板搬入部1之基板定位領域P1 ，且回到上述開始搬送時之狀態，並備用於下一基板4之搬送。After the adsorption is completed, the adsorption by the adsorption transport unit 5 is released, and the elevating mechanism 11 of the adsorption transport unit 5 is lowered. The adsorption transport unit 5 moves to the substrate positioning area P 1 of the substrate loading unit 1 and returns to the state at the time of starting the transfer, and is used for the transfer of the next substrate 4.
藉此，由基板定位機構定位之基板4以已定位之狀態從搬送方向右側之吸附搬送部5傳遞至搬送方向左側之吸附搬送部6。Thereby, the substrate 4 positioned by the substrate positioning mechanism is transferred from the adsorption transport unit 5 on the right side in the transport direction to the adsorption transport unit 6 on the left side in the transport direction.
如此一來，藉由在以吸附搬送部6吸附保持由吸附搬送部5搬送而至之基板4的相反側之狀態下解除吸附搬送部5之吸附，藉此，基板4之平面方向之基準位置不會改變，且基板4可以由基板定位機構維持基準位置之狀態傳遞至相向之吸附搬送部6。In this way, the adsorption of the adsorption transport unit 5 is released in a state where the adsorption transport unit 6 adsorbs and holds the opposite side of the substrate 4 transported by the adsorption transport unit 5, whereby the reference position of the substrate 4 in the planar direction is achieved. The substrate 4 can be transferred to the opposite adsorption transport unit 6 by the state in which the substrate positioning mechanism maintains the reference position.
接著，使吸附搬送部6之滑件10移動至檢查領域P3 ，且在浮起台2A上，朝浮起台3A搬送基板4(參照第4圖)。此時，因應檢查部2之檢查所需，以預先設定之固定速度搬送，或以預定之速度變化搬送，或進行預定之位置移動來搬送。在本實施形態中，根據基板4上之各缺陷之座標資料，搬送 基板4且使其停止，使所指定之缺陷與檢查頭2b之檢查線一致，同時使檢查頭2b沿著作業台2a移動，使檢查頭2b之光軸與缺陷一致。如此一來，藉由使基板4與檢查頭2b相對性地朝XY移動，可檢查基板4之任意位置。Next, the slider 10 of the adsorption transport unit 6 is moved to the inspection area P 3 , and the substrate 4 is transported to the floating stage 3A on the floating stage 2A (see FIG. 4). At this time, in accordance with the inspection required by the inspection unit 2, the conveyance is carried out at a predetermined fixed speed, or at a predetermined speed, or at a predetermined position. In the present embodiment, the substrate 4 is transported and stopped according to the coordinate data of each defect on the substrate 4, and the specified defect is aligned with the inspection line of the inspection head 2b, and the inspection head 2b is moved along the writing table 2a. , the optical axis of the inspection head 2b is made to coincide with the defect. In this way, by moving the substrate 4 and the inspection head 2b relatively XY, the arbitrary position of the substrate 4 can be inspected.
此時，吸附搬送部7之滑件10使升降機構11下降，且使吸附塊14之上端面較基板4裡面之高度低，且移動至浮起台2A之基板傳遞領域P3 待機。At this time, the adsorption feed conveying unit 7 of the slider 10 causes the lift mechanism 11 is lowered, and the suction block 14 above the lower end face of the substrate 4 than the height of the inside, and the mobile station 2A to float the substrate transfer standby art P 3.
然後，當基板4移動至浮起台2A之搬送方向之端部時，吸附搬送部6、7之滑件10會相向地配置於基板4下面。在該狀態下，驅動吸附搬送部7之升降機構11，且使其上升至吸附搬送部7之吸附塊14的上端面抵接於基板4裏面。然後，在以吸附搬送部6之吸附塊14吸附保持基板4之狀態下，由吸附搬送部7真空吸附。此時，與搬送寬度方向相向之基板4的兩端部分別由吸附搬送部6、7之各吸附塊14吸附保持大致全長的部份。Then, when the substrate 4 is moved to the end portion of the floating table 2A in the conveying direction, the sliders 10 of the adsorption conveying portions 6 and 7 are disposed opposite to each other on the lower surface of the substrate 4. In this state, the elevating mechanism 11 of the adsorption transport unit 7 is driven to rise to the upper end surface of the adsorption block 14 of the adsorption transport unit 7 to abut against the inside of the substrate 4. Then, in a state in which the substrate 4 is adsorbed and held by the adsorption block 14 of the adsorption transport unit 6, the adsorption transport unit 7 vacuum-adsorbs. At this time, both end portions of the substrate 4 facing the transport width direction are adsorbed and held by the respective adsorption blocks 14 of the adsorption transport units 6 and 7 at substantially the entire length.
在吸附搬送部7之吸附結束後，解除吸附搬送部6之吸附，且使吸附搬送部6之升降機構11下降。吸附搬送部6移動基板傳遞領域P2 ，且回到上述接收基板時之狀態，並備用於下一基板4之接收。After the adsorption of the adsorption transport unit 7 is completed, the adsorption of the adsorption transport unit 6 is released, and the elevating mechanism 11 of the adsorption transport unit 6 is lowered. The adsorption transport unit 6 moves the substrate transfer area P 2 and returns to the state when the substrate is received, and is used for reception of the next substrate 4.
接著，移動吸附搬送部7之滑件10，將基板4搬送至浮起台3A上。然後，將基板4傳遞至未圖示之搬送機器人等，同時解除吸附搬送部7之吸附，且接收下一基板4，故使吸附搬送部7之滑件10回到基板傳遞領域P3 。Next, the slider 10 of the adsorption transport unit 7 is moved, and the substrate 4 is transported to the floating table 3A. Then, the substrate 4 is transferred to a transfer robot or the like (not shown), the adsorption of the adsorption transport unit 7 is released, and the next substrate 4 is received. Therefore, the slider 10 of the adsorption transport unit 7 is returned to the substrate transfer region P 3 .
如此一來，基板4之接收、檢查、搬出則結束。As a result, the reception, inspection, and removal of the substrate 4 are completed.
如此一來，根據本實施形態之基板檢查裝置100，可藉由吸附搬送部5、6、7交互地保持基板4之搬送寬度方向之端部，且在浮起台1A、2A、3A上依序搬送基板4。如此一來，藉由保持基板4之其中一側來進行單軸搬送，由吸附搬送部5、6、7吸附支持之基板4的另一端部則成為自由狀態，因此，不會如過去保持兩側來搬送時給基板4帶來壓力。如此一來，藉由僅吸附保持基板4之其中一側，可水平地搬送基板4，並可防止對基板4之檢查精度下降。According to the substrate inspection apparatus 100 of the present embodiment, the end portions of the substrate 4 in the transport width direction can be alternately held by the adsorption transport units 5, 6, and 7, and on the floating tables 1A, 2A, and 3A. The substrate 4 is sequentially transferred. In this manner, by holding one of the substrates 4 and performing uniaxial transport, the other end portion of the substrate 4 that is adsorbed and supported by the adsorption transport units 5, 6, and 7 is in a free state, and therefore, the two are not maintained as in the past. The side brings pressure to the substrate 4 when it is transported. In this way, by merely adsorbing one side of the holding substrate 4, the substrate 4 can be horizontally conveyed, and the inspection accuracy of the substrate 4 can be prevented from being lowered.
又，可緩和各單側搬送部之配置精度，且因應所需在每個搬送台皆改變搬送方向。Further, the arrangement accuracy of each of the single-side conveying units can be alleviated, and the conveying direction can be changed for each conveying table as needed.
又，藉由在基板傳遞領域P2 、P3 由吸附搬送部5、6及吸附搬送部6、7來吸附保持搬送寬度方向之兩端部，可維持定位狀態一面傳遞基板4來搬送。藉此，可省去在傳遞時要進行位置調整等的工夫，並簡化基板檢查裝置100之調整機構，同時提高檢查效率。In addition, both end portions in the transport width direction are adsorbed and held by the adsorption transport units 5 and 6 and the adsorption transport units 6 and 7 in the substrate transfer fields P 2 and P 3 , and the substrate 4 can be transported while being transported while maintaining the positioning state. Thereby, it is possible to omit the time required to perform position adjustment and the like at the time of transfer, and to simplify the adjustment mechanism of the substrate inspection apparatus 100 while improving the inspection efficiency.
又，由於一面維持基板4之定位狀態一面搬送至基板傳遞領域P4 ，故可將基板4正確地傳遞至搬送機器人。因此，搬送機器人在將基板4***匣盒內時，在基板4不要碰到匣盒之側壁之狀況下，不用重新對準即可將基板4搬送至匣盒內。Moreover, since the substrate transfer area P4 is conveyed while maintaining the positioning state of the substrate 4 , the substrate 4 can be accurately transferred to the transfer robot. Therefore, when the transfer robot inserts the substrate 4 into the cassette, the substrate 4 can be transported into the cassette without realignment without the substrate 4 hitting the side wall of the cassette.
接著，針對本實施形態之變形例來說明。Next, a modification of the embodiment will be described.
第5圖係本發明第1實施形態之變形例之基板檢查裝置之概略構造之平面圖。Fig. 5 is a plan view showing a schematic configuration of a substrate inspecting apparatus according to a modification of the first embodiment of the present invention.
本實施例之基板檢查裝置110係如第5圖所示，具有吸 附搬送部15(單側搬送部)來取代上述第1實施形態之基板檢查裝置100之吸附搬送部5、7。以下，以與上述第1實施形態不同的點為中心來說明。The substrate inspection device 110 of the present embodiment has a suction as shown in FIG. The transport unit 15 (single-side transport unit) is replaced by the transport unit 5 and 7 of the substrate test apparatus 100 according to the first embodiment. Hereinafter, a point different from the above-described first embodiment will be mainly described.
吸附搬送部15為將吸附搬送部5之滑動引導構件9替換成延長至吸附搬送部7之滑動引導構件9之位置之滑動引導構件16，同時，取代吸附搬送部5之滑件10，將由同樣構造所構成之兩個滑件10A、10B可移動地設於滑動引導構件16上。The adsorption transport unit 15 is a slide guide member 16 that replaces the slide guide member 9 of the adsorption transport unit 5 with a position that extends to the slide guide member 9 of the adsorption transport unit 7, and the slider 10 of the adsorption transport unit 5 is replaced by the same The two sliders 10A, 10B formed by the structure are movably provided on the slide guiding member 16.
另，在滑件10A、10B上部如第2B圖所示，具有升降機構11、升降台12、吸附台13及吸附塊14。Further, as shown in FIG. 2B, the upper portions of the sliders 10A and 10B include an elevating mechanism 11, an elevating table 12, a suction stage 13, and an adsorption block 14.
即，相當於連接上述第1實施形態所示之吸附搬送部5、7之各滑動引導構件9形成為一條之構造。In other words, each of the slide guide members 9 that are connected to the adsorption transport units 5 and 7 described in the first embodiment is formed in a single structure.
根據本變形例之基板檢查裝置110，藉由將上述第1實施形態之吸附搬送部5、7之滑件10分別替換成吸附搬送部15之滑件10A、10B，可進行完全同樣的動作。因此，具有與前述第1實施形態同樣的作用效果。According to the substrate inspection apparatus 110 of the present modification, the sliders 10 of the adsorption transport units 5 and 7 of the first embodiment are replaced with the sliders 10A and 10B of the adsorption transport unit 15, respectively, and the same operation can be performed. Therefore, the same operational effects as those of the first embodiment described above are obtained.
再者，根據本變形例，由於吸附搬送部5、7與吸附搬送部15一體化，故可減少零件數量。又，由於滑件10A、10B可移動至浮起台2A之任意位置，故即使基板4之長度L改變，亦可輕易地對應，同時，可輕易地變更浮起台2A之基板傳遞領域P2 、P3 之位置。Further, according to the present modification, since the adsorption transport units 5 and 7 are integrated with the adsorption transport unit 15, the number of components can be reduced. Further, since the sliders 10A, 10B can be moved to any position of the floating table 2A, even if the length L of the substrate 4 is changed, it is easy to correspond, and at the same time, the substrate transfer field P 2 of the floating table 2A can be easily changed. , the location of P 3 .
針對本發明第2實施形態之基板檢查裝置做說明。A substrate inspection apparatus according to a second embodiment of the present invention will be described.
第6圖係顯示本發明第2實施形態之基板檢查裝置之概 略構造之平面圖。Fig. 6 is a view showing a substrate inspecting apparatus according to a second embodiment of the present invention; A slightly structured plan.
本實施形態之基板檢查裝置120係如第6圖所示具有吸附搬送部17、19(單側搬送部)來取代上述第1實施形態之基板檢查裝置100之吸附搬送部5、6，且去掉吸附搬送部7。以下以與上述第1實施形態不同的點為中心來說明。The substrate inspection apparatus 120 of the present embodiment has the adsorption transport units 17 and 19 (one-side transport unit) as shown in FIG. 6 instead of the adsorption transport units 5 and 6 of the substrate inspection apparatus 100 of the first embodiment, and is removed. The transfer unit 7 is adsorbed. Hereinafter, a point different from the above-described first embodiment will be mainly described.
吸附搬送部17為取代使基板檢查裝置100之吸附搬送部5之滑動引導構件9延長至浮起台2A之基板傳遞領域P3 ，且使滑件10可在浮起台2A之搬送方向的大致全長的範圍移動之滑動引導構件18。The adsorption transport unit 17 is configured to extend the slide guide member 9 of the adsorption transport unit 5 of the substrate inspection device 100 to the substrate transfer region P 3 of the floating table 2A, and to make the slider 10 substantially in the transport direction of the floating table 2A. The sliding guide member 18 is moved over a full length range.
吸附搬送部19使吸附搬送部6之滑動引導構件9延長至浮起台3A之基板搬出領域P4 ，且使基板4可在浮起台2A與浮起台3A之間移動。The adsorption transport unit 19 extends the slide guide member 9 of the adsorption transport unit 6 to the substrate carry-out area P 4 of the floating table 3A, and moves the substrate 4 between the floating stage 2A and the floating stage 3A.
藉由上述構造，藉由吸附搬送部17在基板搬入部1與檢查部2之範圍或藉由吸附搬送部19在檢查部2與基板搬出部3之範圍中分別搬送基板4。然後，在吸附搬送部17、19之搬送範圍共有之浮起台2A上任意位置，可將基板4從吸附搬送部17傳遞至吸附搬送部19。即，浮起台2A上之傳遞位置在浮起台2A之浮起台1A側、浮起台3A側、或該等之中間位置等任何位置可因應所需選擇。According to the above configuration, the substrate 4 is transported by the adsorption transport unit 17 in the range of the substrate loading unit 1 and the inspection unit 2 or by the adsorption transport unit 19 in the range of the inspection unit 2 and the substrate carry-out unit 3, respectively. Then, the substrate 4 can be transferred from the adsorption transport unit 17 to the adsorption transport unit 19 at any position on the floating table 2A shared by the transport ranges of the adsorption transport units 17 and 19. That is, the transfer position on the floating table 2A can be selected at any position such as the floating table 1A side of the floating table 2A, the floating table 3A side, or the intermediate position.
如此一來，本實施形態藉由將2個單側搬送部配置於3個搬送台，可實現在各單側搬送部之間傳遞基板來搬送之構造。此為本發明中相對於3個搬送台具有最低限度之單側搬送部之構造例。In this way, in the present embodiment, by arranging the two single-side conveying units on the three conveying tables, the structure in which the substrates are transferred between the single-side conveying units can be realized. This is an example of the structure of the single-side conveying unit having the smallest limit with respect to the three conveying tables in the present invention.
根據本實施形態，相對於第1實施形態可減少單側搬送 部的數量。According to this embodiment, it is possible to reduce single-side transport with respect to the first embodiment. The number of departments.
又，本實施形態中，由於吸附搬送部17、19共有浮起台2A之搬送方向之大致全長之搬送範圍，故在檢查部2內可使所吸附保持之端部左右對換。因此，例如，即使吸附塊14成為檢查阻礙之檢查，例如，如第1圖所示，使檢查頭2b朝基板4之搬送方向掃描時，當檢查頭2b與吸附保持基板4之吸附塊14互相干擾時，亦可改由相反側之吸附塊14來拿基板4，藉此可進行各端部之檢查。Further, in the present embodiment, since the adsorption transporting sections 17 and 19 share the transport range of substantially the entire length of the transporting direction of the floating table 2A, the end portion to be adsorbed and held can be swapped right and left in the inspection unit 2. Therefore, for example, even if the adsorption block 14 is inspected for inspection, for example, as shown in Fig. 1, when the inspection head 2b is scanned in the conveyance direction of the substrate 4, the inspection head 2b and the adsorption block 14 of the adsorption holding substrate 4 are mutually In the case of interference, the substrate 4 can be taken up by the adsorption block 14 on the opposite side, whereby the inspection of each end portion can be performed.
針對本發明第3實施形態之基板檢查裝置做說明。A substrate inspection apparatus according to a third embodiment of the present invention will be described.
第7圖係顯示本發明第3實施形態之基板檢查裝置之概略構造之平面圖。Fig. 7 is a plan view showing a schematic structure of a substrate inspecting apparatus according to a third embodiment of the present invention.
本實施形態之基板檢查裝置130係如第7圖所示具有多數檢查部2a、2b來取代上述第1實施形態之基板檢查裝置100之檢查部2，且因應於此具有多數吸附搬送部6a、6b(單側搬送部)來取代吸附搬送部6，並在各檢查部2a、2b之間追加吸附搬送部70(單側搬送部)。以下以與上述第1實施形態不同的點為中心來說明。In the substrate inspection apparatus 130 of the present embodiment, a plurality of inspection units 2a and 2b are provided in place of the inspection unit 2 of the substrate inspection apparatus 100 according to the first embodiment, and a plurality of adsorption transport units 6a are provided. In place of the adsorption transport unit 6 , 6b (single-side transport unit) is added, and an adsorption transport unit 70 (single-side transport unit) is added between each of the inspection units 2a and 2b. Hereinafter, a point different from the above-described first embodiment will be mainly described.
檢查部2a、2b用以進行圖案檢查、再檢查、巨觀檢查等檢查，雖未特別圖示，但具有因應各檢查而不同的檢查部份。檢查部2a具有浮起台2A與吸附搬送部6a，檢查部2b具有浮起台2A與吸附搬送部6b。The inspection units 2a and 2b are used for inspections such as pattern inspection, re-inspection, and giant inspection, and are not particularly illustrated, but have inspection portions that differ depending on each inspection. The inspection unit 2a has a floating table 2A and an adsorption transport unit 6a, and the inspection unit 2b includes a floating table 2A and an adsorption transport unit 6b.
然後，在基板搬入部1與檢查部2a之間以與第1實施形態同樣之位置關係配置有吸附搬送部5。Then, the adsorption transport unit 5 is disposed between the substrate loading unit 1 and the inspection unit 2a in the same positional relationship as in the first embodiment.
又，吸附搬送部70之滑動引導構件90係延伸至與檢查部2a、2b相鄰接之檢查領域P3 與基板傳遞領域P2 各自之中間部。吸附搬送部70之構造只有滑動引導構件90的長度不同，其他構造皆與吸附搬送部7相同。Further, the slide guide member 90 of the adsorption transport unit 70 extends to an intermediate portion between the inspection region P 3 and the substrate transfer region P 2 adjacent to the inspection portions 2a and 2b. The structure of the adsorption transport unit 70 is different only in the length of the slide guide member 90, and the other structures are the same as those of the adsorption transport unit 7.
又，在檢查部2b與基板搬出部3之間以與第1實施形態相同之位置關係配置有吸附搬送部7。Further, the adsorption transport unit 7 is disposed between the inspection unit 2b and the substrate carry-out unit 3 in the same positional relationship as in the first embodiment.
藉由該構造，與第1實施形態相同，可將以基板搬入部1定位之基板4傳遞至吸附搬送部6a。然後，在檢查部2a之檢查後，在吸附搬送部6a與吸附搬送部70之間搬送範圍共有之浮起台2A之檢查領域P3 中將基板4傳遞至吸附搬送部70。According to this configuration, the substrate 4 positioned by the substrate loading unit 1 can be transferred to the adsorption transport unit 6a in the same manner as in the first embodiment. Then, after checking portion 2a of the inspection, the suction conveying portion 6a and the suction conveying portion 70 between the transport station 2A total range of P in the checking region 3 of the substrate 4 is transmitted to the floating suction conveyance unit 70.
吸附保持於吸附搬送部70之基板4同樣搬送至相鄰之檢查部2b之基板傳遞領域P2 ，且將基板傳遞至吸附搬送部6b。The substrate 4 adsorbed and held by the adsorption transport unit 70 is similarly transported to the substrate transfer region P 2 of the adjacent inspection unit 2b, and the substrate is transferred to the adsorption transport unit 6b.
然後，在檢查部2b結束檢查之基板4藉由吸附搬送部6a搬送至下游之基板傳遞領域P3 ，且在該基板傳遞領域P3 中將基板4傳遞至吸附搬送部7，並藉由基板搬出部3之吸附搬送部7搬送至基板搬出領域P4 ，且藉由未圖示之搬送機器人搬送至裝置外部。Then, the inspection in the inspection portion 2b of the substrate 4 by suction conveying portion 6a downstream of the substrate conveyed to the transfer of art P 3, and the substrate P in the art will transfer 34 is transmitted to the suction conveying portion substrate 7, and by the substrate The adsorption transport unit 7 of the carry-out unit 3 transports the substrate 7 to the substrate carry-out area P 4 and transports it to the outside of the apparatus by a transport robot (not shown).
本實施形態成為設有多數檢查部時的例子。如此一來，本發明中，在基板搬入部1與基板搬出部3之間可增設多數檢查部2。This embodiment is an example in which a large number of inspection units are provided. As described above, in the present invention, a plurality of inspection units 2 can be added between the substrate loading unit 1 and the substrate carrying unit 3.
因此，即使各搬送台、單側搬送部之搬送距離較短，藉由相鄰配置其等，亦可延長整體之搬送距離。Therefore, even if the conveyance distance of each conveyance stage and a single side conveyance part is short, it can extend the whole conveyance distance by arrange|positioning it mutually.
針對本發明第4實施形態之基板檢查裝置做說明。A substrate inspection apparatus according to a fourth embodiment of the present invention will be described.
第8圖係顯示本發明第4實施形態之基板檢查裝置之概略構造之平面圖。Fig. 8 is a plan view showing a schematic configuration of a substrate inspecting apparatus according to a fourth embodiment of the present invention.
本實施形態之基板檢查裝置140如第8圖所示具有滾筒台1B、2B、3B(搬送台)來取代上述第1實施形態之基板檢查裝置100之浮起台1A、2A、3A。以下以與上述第1實施形態不同的點為中心來說明。As shown in Fig. 8, the substrate inspection device 140 of the present embodiment has roller tables 1B, 2B, and 3B (transporting stations) instead of the floating tables 1A, 2A, and 3A of the substrate inspection device 100 of the first embodiment. Hereinafter, a point different from the above-described first embodiment will be mainly described.
滾筒台1B、2B、3B為在從平面看分別與浮起台1A、2A、3A同樣大小之矩形的台面上以適當間隔配列多數用以以固定高度朝水平方向搬送基板4之搬送滾筒30。The roller table 1B, 2B, and 3B are a plurality of transporting drums 30 for transporting the substrate 4 in a horizontal direction at a fixed height at appropriate intervals on a rectangular table surface having the same size as that of the floating tables 1A, 2A, and 3A.
搬送滾筒30可採用例如在滾筒台1B、2B、3B之水平面內支持成可自由地朝360度方向旋轉之圓筒滾筒或球狀滾筒等。The conveyance drum 30 can be supported, for example, in a horizontal plane supported by the drum tables 1B, 2B, and 3B so as to be rotatable in a 360-degree direction.
根據上述構造，除了基板4在搬送滾筒30上用滾筒搬送這點以外，可進行與上述第1實施形態同樣的動作，因此，與上述第1實施形態具有同樣的作用效果。According to the above configuration, the same operation as in the above-described first embodiment can be performed except that the substrate 4 is transported by the drum on the transport drum 30. Therefore, the same operational effects as those of the first embodiment described above are obtained.
另，在上述說明中，以相鄰接多數搬送台而配置時的例子做說明，但亦可朝搬送方向延伸設置一個搬送台，且在與搬送方向垂直之方向的其中一側配置多數單側搬送部，且在該等多數單側搬送部之間傳遞基板來搬送之。例如，在上述各實施形態、變形例中，亦可變形為分別以浮起台1A、2A、3A或滾筒台1B、2B、3B等作為一體之搬送台。In the above description, an example in which a plurality of transport stages are arranged adjacent to each other is described. However, one transport stage may be extended in the transport direction, and a plurality of one sides may be disposed on one side in a direction perpendicular to the transport direction. The transport unit transfers the substrate between the plurality of single-side transport units. For example, in each of the above-described embodiments and modifications, the transfer table may be integrally formed by the floating tables 1A, 2A, and 3A or the drum tables 1B, 2B, and 3B.
此時，由於可在整個搬送方向將決定基板搬送精度之單側搬送部分成多數，因此，例如，在每一個需要搬送精度之檢查部份皆分割單側搬送部，藉此相較於整個搬送路徑全長僅設置一個進行高精度搬送之單側搬送部，可成為簡單且便宜的構造。In this case, since the one-side transport portion that determines the substrate transport accuracy can be made large in the entire transport direction, for example, the one-side transport portion is divided in each of the inspection portions that require the transport accuracy, thereby comparing the entire transport. It is possible to provide a single-side conveying unit that performs high-precision conveyance over the entire length of the path, and it is possible to have a simple and inexpensive structure.
又，在上述說明中，當搬送台分割為多數時，基板之傳遞位置係位於相鄰之搬送台之其中一者的端部。但，當搬送台之段差非常小時，如第5圖、第6圖所示，亦可在基板跨越兩個相鄰之搬送基板之位置進行基板傳遞。Further, in the above description, when the transfer table is divided into a plurality of stages, the transfer position of the substrate is located at one end of one of the adjacent transfer stages. However, when the step of the transfer table is very small, as shown in Figs. 5 and 6, the substrate can be transferred at a position where the substrate spans two adjacent transfer substrates.
又，在上述說明中，多數單側搬送部係設於在基板之傳遞位置可隔著搬送台相向之位置。但，只要可傳遞基板，亦可將多數單側搬送部設於在搬送台之同一方向側邊可朝與搬送方向垂直之方向相向之位置。Further, in the above description, the plurality of single-side conveying portions are disposed at positions where the transfer position of the substrate can be opposed to each other via the transfer table. However, as long as the substrate can be transferred, the plurality of single-side conveying portions may be disposed at positions facing the conveying direction in the same direction side of the conveying table.
又，在上述說明中，檢查部2宜保持於除振台，但因應所需亦可將任一搬送台、單側搬送部配置於除振台上。根據本發明，該除振台亦可每個搬送台與每個單側單送部皆個別地設置，因此有裝置之設置更為容易之優點。Further, in the above description, the inspection unit 2 is preferably held by the vibration isolation stage, but any of the conveyance stages and the one-side conveyance unit may be disposed on the vibration isolation stage as needed. According to the present invention, the vibration isolation table can also be provided separately for each of the transfer table and each of the single-side single delivery portions, so that the arrangement of the device is easier.
又，上述說明之各實施形態、變形例之各構成要素只要技術上可行，亦可在本發明之技術性思想之範圍內適當地組合來實施。Further, each of the constituent elements of the respective embodiments and modifications described above can be implemented as appropriate within the scope of the technical idea of the present invention as long as it is technically feasible.
以上已說明本發明之較佳實施例，但本發明並不限於該等實施例。在不脫離本發明之旨趣之範圍內，可進行構造之附加、省略、替換及其他變更。本發明並非由前述之說明來限定，而僅由所附之申請專利範圍來限定。The preferred embodiments of the invention have been described above, but the invention is not limited to the embodiments. Additions, omissions, substitutions, and other modifications can be made without departing from the scope of the invention. The invention is not limited by the foregoing description, but only by the scope of the appended claims.
1‧‧‧基板搬入部1‧‧‧Substrate loading department
1A、2A、3A‧‧‧浮起台1A, 2A, 3A‧‧‧ floating table
1B、2B、3B‧‧‧滾筒台1B, 2B, 3B‧‧‧ Roller table
2‧‧‧檢查部2‧‧‧Inspection Department
2a‧‧‧作業台2a‧‧‧Workstation
2b‧‧‧檢查頭2b‧‧‧Check head
3‧‧‧基板搬出部3‧‧‧Substrate removal department
4‧‧‧基板4‧‧‧Substrate
5、6、6a、6b、7、70‧‧‧吸附搬送部5, 6, 6a, 6b, 7, 70‧‧ ‧ adsorption transport department
8a、8b‧‧‧基準桿8a, 8b‧‧‧ benchmark
8c‧‧‧推壓桿8c‧‧‧Pushing rod
9‧‧‧滑動引導構件9‧‧‧Sliding guide members
10、10A、10B‧‧‧滑件10, 10A, 10B‧‧‧Sliding parts
11‧‧‧升降機構11‧‧‧ Lifting mechanism
12‧‧‧升降台12‧‧‧ Lifting table
13‧‧‧吸附台13‧‧‧Adsorption station
14‧‧‧吸附塊14‧‧‧Adsorption block
14a‧‧‧凹部14a‧‧‧ recess
14b‧‧‧吸引孔14b‧‧‧Attraction hole
15、17、19‧‧‧吸附搬送部15, 17, 19‧ ‧ Adsorption and Transport Department
18‧‧‧滑動引導構件18‧‧‧Sliding guide members
30‧‧‧搬送滾筒30‧‧‧Transport roller
90‧‧‧滑動引導構件90‧‧‧Sliding guide members
100、110、120、130、140‧‧‧基板檢查裝置100, 110, 120, 130, 140‧‧‧ substrate inspection device
N‧‧‧氣體噴射孔N‧‧‧ gas injection hole
L‧‧‧搬送方向長度L‧‧‧Transport direction length
W‧‧‧寬度W‧‧‧Width
P1 ‧‧‧基準定位領域P 1 ‧‧ ‧Based positioning field
P2 ‧‧‧基板傳遞領域P 2 ‧‧‧Substrate transfer field
P3 ‧‧‧基板傳遞領域、檢查領域P 3 ‧‧‧Substrate transfer field, inspection field
P4 ‧‧‧基板搬出領域P 4 ‧‧‧Substrate removal field
第1圖係顯示本發明第1實施形態之基板檢查裝置之概 略構造之平面圖。Fig. 1 is a view showing a substrate inspecting apparatus according to a first embodiment of the present invention. A slightly structured plan.
第2A圖係第1圖之A部的部份放大圖。Fig. 2A is a partially enlarged view of a portion A of Fig. 1.
第2B圖係從第2A圖之B觀看之正視圖。Fig. 2B is a front view as seen from B of Fig. 2A.
第3圖係針對本發明第1實施形態之基板檢查裝置之動作來說明之平面圖。Fig. 3 is a plan view showing the operation of the substrate inspecting apparatus according to the first embodiment of the present invention.
第4圖係針對本發明第1實施形態之基板檢查裝置之動作來說明之平面圖。Fig. 4 is a plan view showing the operation of the substrate inspecting apparatus according to the first embodiment of the present invention.
第5圖係本發明第1實施形態之變形例之基板檢查裝置之概略構造之平面圖。Fig. 5 is a plan view showing a schematic configuration of a substrate inspecting apparatus according to a modification of the first embodiment of the present invention.
第6圖係顯示本發明第2實施形態之基板檢查裝置之概略構造之平面圖。Fig. 6 is a plan view showing a schematic structure of a substrate inspecting apparatus according to a second embodiment of the present invention.
第7圖係顯示本發明第3實施形態之基板檢查裝置之概略構造之平面圖。Fig. 7 is a plan view showing a schematic structure of a substrate inspecting apparatus according to a third embodiment of the present invention.
第8圖係顯示本發明第4實施形態之基板檢查裝置之概略構造之平面圖。Fig. 8 is a plan view showing a schematic configuration of a substrate inspecting apparatus according to a fourth embodiment of the present invention.
1‧‧‧基板搬入部1‧‧‧Substrate loading department
1A、2A、3A‧‧‧浮起台1A, 2A, 3A‧‧‧ floating table
2‧‧‧檢查部2‧‧‧Inspection Department
2a‧‧‧作業台2a‧‧‧Workstation
2b‧‧‧檢查頭2b‧‧‧Check head
3‧‧‧基板搬出部3‧‧‧Substrate removal department
4‧‧‧基板4‧‧‧Substrate
5、6、7‧‧‧吸附搬送部5,6,7‧‧‧Adsorption and Transportation Department
8a、8b‧‧‧基準桿8a, 8b‧‧‧ benchmark
8c‧‧‧推壓桿8c‧‧‧Pushing rod
9‧‧‧滑動引導構件9‧‧‧Sliding guide members
10‧‧‧滑件10‧‧‧Sliding parts
100‧‧‧基板檢查裝置100‧‧‧Substrate inspection device
N‧‧‧氣體噴射孔N‧‧‧ gas injection hole
L‧‧‧搬送方向長度L‧‧‧Transport direction length
W‧‧‧寬度W‧‧‧Width
P1 ‧‧‧基準定位領域P 1 ‧‧ ‧Based positioning field
P2 ‧‧‧基板傳遞領域P 2 ‧‧‧Substrate transfer field
P3 ‧‧‧基板傳遞領域、檢查領域P 3 ‧‧‧Substrate transfer field, inspection field
P4 ‧‧‧基板搬出領域P 4 ‧‧‧Substrate removal field
Claims (10)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
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| JP2006245739A JP5265099B2 (en) | 2006-09-11 | 2006-09-11 | Board inspection equipment |
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| TW200819734A TW200819734A (en) | 2008-05-01 |
| TWI416095B true TWI416095B (en) | 2013-11-21 |
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| TW096133454A TWI416095B (en) | 2006-09-11 | 2007-09-07 | Substrate inspection apparatus |
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| JP (1) | JP5265099B2 (en) |
| KR (1) | KR101424017B1 (en) |
| CN (1) | CN101144920B (en) |
| TW (1) | TWI416095B (en) |
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| JP5317618B2 (en) * | 2008-10-06 | 2013-10-16 | 株式会社日立ハイテクノロジーズ | Display panel module assembly apparatus and substrate transfer apparatus |
| JP5380225B2 (en) * | 2009-09-24 | 2014-01-08 | 株式会社日立ハイテクノロジーズ | Glass substrate inspection equipment |
| JP5683333B2 (en) * | 2011-03-10 | 2015-03-11 | 東レエンジニアリング株式会社 | Substrate inspection apparatus and method |
| CN102320472B (en) | 2011-06-03 | 2013-07-10 | 深圳市华星光电技术有限公司 | Substrate conveying system and conveying method |
| CN108974943B (en) * | 2013-02-26 | 2021-06-29 | 株式会社Ihi | Conveying device |
| TWI472767B (en) * | 2014-01-22 | 2015-02-11 | Utechzone Co Ltd | Detection device |
| US10289930B2 (en) * | 2017-02-09 | 2019-05-14 | Glasstech, Inc. | System and associated for online measurement of the optical characteristics of a glass sheet |
| KR102140869B1 (en) * | 2018-09-14 | 2020-08-03 | 양승현 | PCB board conveying device |
| WO2020153741A1 (en) * | 2019-01-24 | 2020-07-30 | 주식회사 고영테크놀러지 | Jig for test device, test device, test set, and object testing method using same |
| CN109926792B (en) * | 2019-04-25 | 2021-04-06 | 大族激光科技产业集团股份有限公司 | Laser cutting microscope carrier |
| CN112595722B (en) * | 2021-03-02 | 2021-06-08 | 苏州天准科技股份有限公司 | Sectional type air flotation platform, platform module and detection equipment |
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| US20040120571A1 (en) * | 1999-08-05 | 2004-06-24 | Orbotech Ltd. | Apparatus and methods for the inspection of objects |
| TW200614412A (en) * | 2004-09-27 | 2006-05-01 | Olympus Corp | Macroscopic inspection apparatus and macroscopic inspection method |
| TWI261041B (en) * | 2003-10-06 | 2006-09-01 | Sumitomo Heavy Industries | Conveying apparatus, application system and inspection system |
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| JP2000009661A (en) * | 1998-06-26 | 2000-01-14 | Ntn Corp | Flat panel inspection device |
| JP2005010221A (en) * | 2003-06-16 | 2005-01-13 | Kowa:Kk | Heat treating device for glass substrate |
| KR101023729B1 (en) * | 2004-06-30 | 2011-03-25 | 엘지디스플레이 주식회사 | Shuttle and Transferring Method to transfer Large size plate for LCD manufacturing |
| KR20060007187A (en) * | 2004-07-19 | 2006-01-24 | 삼성전자주식회사 | Method for processing substrate and apparatus therefor |
| JP4579670B2 (en) * | 2004-12-16 | 2010-11-10 | 芝浦メカトロニクス株式会社 | Parts crimping apparatus and crimping method |
| JP4378301B2 (en) * | 2005-02-28 | 2009-12-02 | 東京エレクトロン株式会社 | Substrate processing apparatus, substrate processing method, and substrate processing program |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US20040120571A1 (en) * | 1999-08-05 | 2004-06-24 | Orbotech Ltd. | Apparatus and methods for the inspection of objects |
| TWI261041B (en) * | 2003-10-06 | 2006-09-01 | Sumitomo Heavy Industries | Conveying apparatus, application system and inspection system |
| TW200614412A (en) * | 2004-09-27 | 2006-05-01 | Olympus Corp | Macroscopic inspection apparatus and macroscopic inspection method |
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| JP2008063130A (en) | 2008-03-21 |
| KR20080023647A (en) | 2008-03-14 |
| CN101144920B (en) | 2011-11-09 |
| TW200819734A (en) | 2008-05-01 |
| JP5265099B2 (en) | 2013-08-14 |
| KR101424017B1 (en) | 2014-07-28 |
| CN101144920A (en) | 2008-03-19 |
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