TWI394007B - 曝光裝置 - Google Patents

曝光裝置 Download PDF

Info

Publication number
TWI394007B
TWI394007B TW94113744A TW94113744A TWI394007B TW I394007 B TWI394007 B TW I394007B TW 94113744 A TW94113744 A TW 94113744A TW 94113744 A TW94113744 A TW 94113744A TW I394007 B TWI394007 B TW I394007B
Authority
TW
Taiwan
Prior art keywords
exposed
exposure
scanning
illumination
photographing
Prior art date
Application number
TW94113744A
Other languages
English (en)
Chinese (zh)
Other versions
TW200537257A (en
Inventor
Ito Miyoshi
Original Assignee
V Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by V Technology Co Ltd filed Critical V Technology Co Ltd
Publication of TW200537257A publication Critical patent/TW200537257A/zh
Application granted granted Critical
Publication of TWI394007B publication Critical patent/TWI394007B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7015—Reference, i.e. alignment of original or workpiece with respect to a reference not on the original or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW94113744A 2004-04-28 2005-04-28 曝光裝置 TWI394007B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004134440A JP4338577B2 (ja) 2004-04-28 2004-04-28 露光装置

Publications (2)

Publication Number Publication Date
TW200537257A TW200537257A (en) 2005-11-16
TWI394007B true TWI394007B (zh) 2013-04-21

Family

ID=35241829

Family Applications (1)

Application Number Title Priority Date Filing Date
TW94113744A TWI394007B (zh) 2004-04-28 2005-04-28 曝光裝置

Country Status (3)

Country Link
JP (1) JP4338577B2 (ja)
TW (1) TWI394007B (ja)
WO (1) WO2005106590A1 (ja)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI386762B (zh) * 2005-05-24 2013-02-21 V Technology Co Ltd 曝光裝置及圖形形成方法
DE102006014380A1 (de) * 2006-03-27 2007-10-11 Carl Zeiss Smt Ag Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille
JP5133239B2 (ja) * 2006-04-05 2013-01-30 シャープ株式会社 露光方法および露光装置
JP2008076709A (ja) * 2006-09-21 2008-04-03 V Technology Co Ltd 露光装置
JP4997908B2 (ja) * 2006-10-11 2012-08-15 大日本印刷株式会社 カラーフィルタの製造装置および製造方法
JP2009188012A (ja) * 2008-02-04 2009-08-20 Nsk Ltd 露光装置
JP5489050B2 (ja) * 2008-02-04 2014-05-14 日本精工株式会社 露光装置
JP2009251290A (ja) * 2008-04-07 2009-10-29 V Technology Co Ltd 露光装置
JP5510317B2 (ja) 2008-05-28 2014-06-04 凸版印刷株式会社 カラーフィルタの製造方法及びパターン付き基板の製造方法
JP6708217B2 (ja) * 2015-12-17 2020-06-10 株式会社ニコン パターン描画装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002040669A (ja) * 2000-07-19 2002-02-06 Toray Eng Co Ltd 描画装置
US20040000833A1 (en) * 2000-03-30 2004-01-01 Lilie Dietmar Erich Bernhard Process for forming an annular stack of metallic laminations for the stator of a linear motor and an annular stack of metallic laminations

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09320939A (ja) * 1996-05-29 1997-12-12 Nikon Corp 位置検出方法及び装置
FR2800565B1 (fr) * 1999-11-03 2002-10-25 Automa Tech Sa Dispositif de mesure d'erreur de position relative
JP2004012903A (ja) * 2002-06-07 2004-01-15 Fuji Photo Film Co Ltd 露光装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040000833A1 (en) * 2000-03-30 2004-01-01 Lilie Dietmar Erich Bernhard Process for forming an annular stack of metallic laminations for the stator of a linear motor and an annular stack of metallic laminations
JP2002040669A (ja) * 2000-07-19 2002-02-06 Toray Eng Co Ltd 描画装置

Also Published As

Publication number Publication date
JP4338577B2 (ja) 2009-10-07
TW200537257A (en) 2005-11-16
JP2005316166A (ja) 2005-11-10
WO2005106590A1 (ja) 2005-11-10

Similar Documents

Publication Publication Date Title
TWI394007B (zh) 曝光裝置
US7812920B2 (en) Production method of substrate for liquid crystal display using image-capturing and reference position detection at corner of pixel present in TFT substrate
KR20070024685A (ko) 노광 장치
CN109557768B (zh) 曝光装置以及曝光方法
TWI391796B (zh) 曝光裝置及被曝光體
KR101094468B1 (ko) 노광 패턴 형성 방법
KR101103155B1 (ko) 노광 장치
KR101098729B1 (ko) 노광 장치 및 패턴 형성 방법
JP4613098B2 (ja) 露光装置
JP4338628B2 (ja) 露光装置
JP4235584B2 (ja) 露光装置及びパターン形成方法
WO2005106595A1 (ja) 露光装置及びパターン形成方法
TWI386762B (zh) 曝光裝置及圖形形成方法
JPH07302754A (ja) 走査型露光装置
JP4951036B2 (ja) 露光装置
JP2006058496A (ja) 基板測定装置及び基板搬送装置並びに基板測定装置を備えた画像形成装置と基板測定方法
TW202414123A (zh) 描繪裝置以及描繪方法
JP4914043B2 (ja) 露光装置
CN117745770A (zh) 模板生成装置、描绘***、模板生成方法以及存储介质
CN1885167B (zh) 曝光装置及图形形成方法

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees