TWI394007B - 曝光裝置 - Google Patents
曝光裝置 Download PDFInfo
- Publication number
- TWI394007B TWI394007B TW94113744A TW94113744A TWI394007B TW I394007 B TWI394007 B TW I394007B TW 94113744 A TW94113744 A TW 94113744A TW 94113744 A TW94113744 A TW 94113744A TW I394007 B TWI394007 B TW I394007B
- Authority
- TW
- Taiwan
- Prior art keywords
- exposed
- exposure
- scanning
- illumination
- photographing
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7007—Alignment other than original with workpiece
- G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7007—Alignment other than original with workpiece
- G03F9/7015—Reference, i.e. alignment of original or workpiece with respect to a reference not on the original or workpiece
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004134440A JP4338577B2 (ja) | 2004-04-28 | 2004-04-28 | 露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200537257A TW200537257A (en) | 2005-11-16 |
TWI394007B true TWI394007B (zh) | 2013-04-21 |
Family
ID=35241829
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW94113744A TWI394007B (zh) | 2004-04-28 | 2005-04-28 | 曝光裝置 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP4338577B2 (ja) |
TW (1) | TWI394007B (ja) |
WO (1) | WO2005106590A1 (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI386762B (zh) * | 2005-05-24 | 2013-02-21 | V Technology Co Ltd | 曝光裝置及圖形形成方法 |
DE102006014380A1 (de) * | 2006-03-27 | 2007-10-11 | Carl Zeiss Smt Ag | Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille |
JP5133239B2 (ja) * | 2006-04-05 | 2013-01-30 | シャープ株式会社 | 露光方法および露光装置 |
JP2008076709A (ja) * | 2006-09-21 | 2008-04-03 | V Technology Co Ltd | 露光装置 |
JP4997908B2 (ja) * | 2006-10-11 | 2012-08-15 | 大日本印刷株式会社 | カラーフィルタの製造装置および製造方法 |
JP2009188012A (ja) * | 2008-02-04 | 2009-08-20 | Nsk Ltd | 露光装置 |
JP5489050B2 (ja) * | 2008-02-04 | 2014-05-14 | 日本精工株式会社 | 露光装置 |
JP2009251290A (ja) * | 2008-04-07 | 2009-10-29 | V Technology Co Ltd | 露光装置 |
JP5510317B2 (ja) | 2008-05-28 | 2014-06-04 | 凸版印刷株式会社 | カラーフィルタの製造方法及びパターン付き基板の製造方法 |
JP6708217B2 (ja) * | 2015-12-17 | 2020-06-10 | 株式会社ニコン | パターン描画装置 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002040669A (ja) * | 2000-07-19 | 2002-02-06 | Toray Eng Co Ltd | 描画装置 |
US20040000833A1 (en) * | 2000-03-30 | 2004-01-01 | Lilie Dietmar Erich Bernhard | Process for forming an annular stack of metallic laminations for the stator of a linear motor and an annular stack of metallic laminations |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09320939A (ja) * | 1996-05-29 | 1997-12-12 | Nikon Corp | 位置検出方法及び装置 |
FR2800565B1 (fr) * | 1999-11-03 | 2002-10-25 | Automa Tech Sa | Dispositif de mesure d'erreur de position relative |
JP2004012903A (ja) * | 2002-06-07 | 2004-01-15 | Fuji Photo Film Co Ltd | 露光装置 |
-
2004
- 2004-04-28 JP JP2004134440A patent/JP4338577B2/ja not_active Expired - Fee Related
-
2005
- 2005-04-28 WO PCT/JP2005/008114 patent/WO2005106590A1/ja active Application Filing
- 2005-04-28 TW TW94113744A patent/TWI394007B/zh not_active IP Right Cessation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040000833A1 (en) * | 2000-03-30 | 2004-01-01 | Lilie Dietmar Erich Bernhard | Process for forming an annular stack of metallic laminations for the stator of a linear motor and an annular stack of metallic laminations |
JP2002040669A (ja) * | 2000-07-19 | 2002-02-06 | Toray Eng Co Ltd | 描画装置 |
Also Published As
Publication number | Publication date |
---|---|
JP4338577B2 (ja) | 2009-10-07 |
TW200537257A (en) | 2005-11-16 |
JP2005316166A (ja) | 2005-11-10 |
WO2005106590A1 (ja) | 2005-11-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |