TW200537257A

TW200537257A - Exposing apparatus

Info

Publication number: TW200537257A
Application number: TW94113744A
Authority: TW
Inventors: Miyoshi Ito
Original assignee: Integrated Solutions Co Ltd
Priority date: 2004-04-28
Filing date: 2005-04-28
Publication date: 2005-11-16
Also published as: JP4338577B2; TWI394007B; JP2005316166A; WO2005106590A1

Abstract

An exposure apparatus (1) relatively scans a glass board (8) by laser beams by an exposure optical system (3), and directly exposes a functional pattern on the glass board (8). The exposure apparatus is provided with an image pickup means (5), which is arranged on a same side as the exposure optical system (3) to the glass board (8), and picks up an image of a pixel (22) of a black matrix (21) previously formed to be an exposure position reference on the glass board (8), having a front side of the scanning position of the laser beams in a transfer direction of the glass board (8) as an image pickup position; an illuminating means (6) arranged at least in one of the directions vertical to the glass board (8), for illuminating the pixel (22) to allow image pickup by the image pickup means (5); and an optical system control means (7), which detects the reference position previously set in the pixel (22) image of which is picked up by the image pickup means (5) and controls irradiation start or irradiation stop of the laser beams, having the reference position as a reference. Thus, alignment accuracy of the functional pattern is improved and cost increase of the exposure apparatus is suppressed.

Description

200537257 五、發明說明（1) 【發明所屬之技術領域】本發明係關於一種在被曝光體上直接曝露機能性圖型之曝光裝置’及圖整之形成方法。詳言之，係關於一種曝光裝置’以攝影機構攝影檢出該被曝光體預先形成做為基準的機能性圖型所設定的基準位置，而以該基準位置為基準’以控制光束之照射開始或照射停止，以利提高機能二 •圖塑之重合精度，並抑制曝光裝置之成本者。【先前技 ^ 從前當於機能型轉印曝 (Mirror 這些傳統合’各層液晶顯示排列光罩昂貴。又蜇與光罩另一束在被曝曝光裝置源的雷射運的搬運術】之曝光裝置’係使用在玻璃基板上預先形成之相性圖型之光罩圖形，而在被曝光體上將該光罩圖露，例如設有分步器（S t e p p e r )、對稱投影 Projection)、近接功能（proximity)等裝置。但的曝光裝置，於積層形成複層的機能性圖型之場間重合機能性圖型的精度產生問題。尤其對大型用TFT與彩色過〉慮器之形成上所用大型光罩，其圖型須要求絕對的尺寸精度，而使光罩價格異f 為了獲得上述重合精度，須對準底層的機能性= 圖型，對於大型光罩，尤其不易對準。 θ 方面，也有不使用光罩，而使用電子束與雷射光體上直接描繪CAD數據圖型之曝光繁晉。田士机复。違種 ’具備雷射光源’用以往復掃描發射自兮+射、光束之曝光光學系；及以承載被曝光體之&離光機構，來依據CAD數據控制雷射光源的&發射狀200537257 V. Description of the invention (1) [Technical field to which the invention belongs] The present invention relates to an exposure device for directly exposing a functional pattern on an object to be exposed 'and a method for forming a pattern. In detail, it relates to an exposure device 'based on a reference position set by a photographic mechanism that detects a pre-formed pattern of the object to be exposed as a reference, and uses the reference position as a reference' to control the start of beam irradiation Or stop the irradiation, in order to improve the accuracy of the second function and figure, and reduce the cost of the exposure device. [Previous technology ^ Previously, it was a function-type transfer exposure (Mirror, which is a traditional combination of various layers of liquid crystal display arrays. The photomask is expensive. It is also necessary to transport the laser beam with another photomask at the source of the exposure device.) 'It uses a mask pattern of a phase pattern formed in advance on a glass substrate, and exposes the mask on the object to be exposed, for example, a stepper (S tepper), a symmetrical projection Projection), and a proximity function ( proximity). However, in the exposure device of the multi-layered functional pattern, the accuracy of the functional pattern is overlapped between the fields. Especially for the large photomask used in the formation of large-scale TFTs and color filters, the pattern must require absolute dimensional accuracy, and the price of the photomask must be different. In order to obtain the above-mentioned coincidence accuracy, the function of the bottom layer must be aligned. Patterns are especially difficult to align for large photomasks. In terms of θ, there are also pros and cons of exposures that do not use a mask, but use an electron beam and a laser beam to directly draw a CAD data pattern. Tian Shi Ji Fu. Violation ‘Equipped with laser light source’ for reciprocating scanning of the exposure optical system that emits light and light; and the & light-off mechanism that carries the exposed object controls the & emission status of the laser light source based on CAD data

第5頁 200537257 五、發明說明（2) 以往復掃描，同時搬運被曝光體至與雷射光束掃描方向垂直的方向，以二維方式形成相當於機能性圖形之C A D數據圖形（例如特開2 0 (Π - 1 4 4 4 1 5公報）。但是，這樣的直接描繪型傳統曝光裝置，其CAD數據圖型之排列尺寸精度，絕對須要高度精密，此點與使用光罩的曝光裝置同樣，又在使用複數的曝光裝置形成機能性 .圖型的製造過程中，曝光裝置間的精度如有參差不齊，則機能性圖型的重合精度變差。由是，為了解決這樣的問 ·β題，必須有高精度的曝光裝置而增加其成本。 φ 此外，事先須要對準底層的機能性圖型與CAD數據圖，此點與使用光罩的其他曝光裝置同樣。也有上述問【發明内容】於是本發明為了應付這問題，以提供可提高重合機能性圖型精度，同時可抑制曝光裝置成本為目的。為了達成上述目的’第一種發明為’以曝光光學系將雷射光束對著被曝光體相對的掃描，而在該被曝光體上直接曝露機能性圖型的曝光裝置，具有對該被曝光體配置於，曝光光學系之同側，而且沿著該被曝光體搬運方向而在 _雷射光束掃描位置前側為攝影位置，來攝取預先形成於該玻璃基板之曝光裝置上做為基準的機能性圖型之攝影機構；配置於對該被曝光體上下方向至少一方向以照明做為 •基準的機能性圖型，而使該攝影機構得以攝影的照明機Page 5 200537257 V. Explanation of the invention (2) Scan the back and forth while moving the exposed object to the direction perpendicular to the scanning direction of the laser beam, and form a CAD data figure equivalent to the functional figure in a two-dimensional manner (for example, JP 2) 0 (Π-1 4 4 4 1 5 gazette). However, such direct drawing type traditional exposure devices must have a high degree of precision in the arrangement of CAD data patterns. This is the same as the exposure device using a photomask. Functionality is also formed by using a plurality of exposure devices. In the manufacturing process of patterns, if the accuracy between exposure devices is uneven, the accuracy of the coincidence of the functional patterns becomes worse. Therefore, in order to solve such a problem, β In addition, it is necessary to have a high-precision exposure device to increase its cost. Φ In addition, it is necessary to align the underlying functional pattern and CAD data map in advance. This is the same as other exposure devices using photomasks. Therefore, in order to cope with this problem, the present invention aims to provide a pattern accuracy that can improve the coincidence function, and at the same time can reduce the cost of the exposure device. In order to achieve the above object The first invention is an exposure device that uses an exposure optical system to scan a laser beam toward an exposed object, and directly exposes the exposed object to a functional pattern. On the same side of the optical system, and along the conveyance direction of the exposed object, a photographing position is located in front of the laser beam scanning position, to take a photograph of a functional pattern previously formed on the exposure device of the glass substrate as a reference Mechanism; a illuminating device arranged on a functional pattern that uses illumination as a reference in at least one of the up and down directions of the exposed object so that the photographing mechanism can take pictures

第6頁 200537257 五、發明說明（3) 構；及檢出該攝影機構所攝取該圖型上預先設定之基準位置，並以該基準位置為基準來控制雷射光束的照射開始或照射停止的光學系控制機構。以此構成，藉配設於對被曝光體上下方向之至少一方向的照明機構來照明預先形成於被曝光體做為基準的機能性圖形，而以在該被曝光體搬運方向把該光束掃描位置前 .方做為攝影位置的攝影機構攝取做為該基準的機能性圖型，並檢出由光學系控制機構所攝該做為基準的機能性圖 '型預先設定之基準位置，藉控制以該基準位置為基準往復 |描的光束照射開始或照射停止。由是得以對該基準位置進行在既定位置上之既定機能性圖型之高精度曝光。由是於形成複數積層的機能性圖型的場合，也可提高重合各層機能圖型的精度。準此，於使用複數曝光裝置形成積層圖型的場合，可排除起因於曝光裝置間的精度差而降低機能性圖型重合精度的問題，並抑制曝光裝置的成本。又由於配設攝影裝置於曝光光學系同側，可一體成形製造曝光光學系與攝影機構，可提高此部份的機械安定性，抑減成本，而且組裝裝置亦容易。又該照明機構係對該被曝光體配設於該攝影機構之同 •I。由是從攝影機構同側藉照明機構照明預先形成於被曝光體做為基準的機能性圖形，而用攝影機構藉反射照明攝取做為基準的機能性圖形。由是該基準機能性圖形上形成有不透明膜時，亦可攝得該基準機能性圖形。此外，該被曝光體係屬透明基板，而且該照明機構乃Page 6 200537257 V. Description of the invention (3) structure; and detecting a preset reference position on the pattern taken by the photographing agency and controlling the start or stop of laser beam irradiation based on the reference position Optical system control mechanism. With this configuration, a lighting mechanism provided in at least one of the up-down direction of the exposed object is used to illuminate a functional pattern previously formed on the exposed object as a reference, and the light beam is scanned in the direction of the exposed object conveyance. In front of the position, the camera as the shooting position captures the functional pattern that is used as the reference, and detects the functional pattern that is taken by the optical control mechanism as the reference. The preset reference position is set by the control. With this reference position as a reference, the beam irradiation starts or stops. Therefore, it is possible to perform high-precision exposure of a predetermined functional pattern of the reference position at a predetermined position. When a functional pattern of a plurality of layers is formed, the accuracy of overlapping the functional patterns of the layers can be improved. Therefore, in the case of forming a multi-layered pattern by using a plurality of exposure devices, the problem of lowering the accuracy of functional pattern registration due to the accuracy difference between the exposure devices can be eliminated, and the cost of the exposure device can be suppressed. Also, because the photographic device is arranged on the same side of the exposure optics, the exposure optics and the photography mechanism can be integrally formed to manufacture, which can improve the mechanical stability of this part, reduce the cost, and assemble the device easily. And the lighting mechanism is the same as that of the exposure body arranged in the photographing mechanism. The illumination mechanism is used to illuminate the functional pattern pre-formed on the exposed object from the same side of the photographic mechanism as the reference, and the photographic mechanism is used to acquire the functional pattern as the reference by reflecting illumination. When an opaque film is formed on the reference functional pattern, the reference functional pattern can also be captured. In addition, the exposed system is a transparent substrate, and the lighting mechanism is

第7頁 200537257Page 7 200537257

五、發明說明（4) 對該被曝光體配設於相& 明機構照明預先形成於$ 形，以攝影機構藉透過职形。藉此，以攝影機構所像數據取得精度亦提高，再者，該照明機構， ‘兩側，並可互相交換使用光體上下方向兩側的照明 ~體上做為基準的機能性圖射照明之任一種攝取做被曝光體透明或不透明圖形上之膜透明或不透明又，依照本發明之第明的被曝光體相對掃描光被曝光體上的曝光位置，曝光光學系相反側，而在掃描前方為攝影位置，以方向且在該光束掃描前方該被曝光體曝光位置上做 _，配置於對該被曝光體明該做為基準的機能性圖照明機構；及檢出該攝影性圖形上預先設定的基準控制該光束照射開始或照側。藉明曝光射攝取取得的因而高係配設 °因而機構，形，而為基準 ’不管 ’均可 —實施束’而其具備該被曝攝影預為攝影為基準上下方形，俾機構所位置，射停止此從攝體上做該做為畫像之精度的於對該互相交以照明以攝影的該機形成於以用同例係，直接曝有配置光體搬先形成位置，的機能向的至使該攝攝得的並以該的光學影機構相為基準的基準的機對照得以曝光得以被曝光體換使用配預先形成機構藉透能性圖形做為基準一曝光裝藉曝光光露機能性於對該被運方向且於該被曝以攝取預性圖形的少一側，影機構得該做為基基準位置糸控制機反側的照機能性圖能性圖提南，晝實現。上下方向設於被曝於被曝光過照明或。由是不的機能性置應付。學系對透圖形於該曝光體在在該光束光體搬運先形成於攝影機而用以照以攝影的準之機能為基準來構0V. Description of the invention (4) The exposed object is arranged in a photo shape in advance, and it is formed in the shape of a dollar, and it is borrowed by the photography agency. As a result, the accuracy of the data obtained by the photographic institution is also improved. Furthermore, the lighting mechanism can use the lighting on both sides of the light body in the up and down direction of the body to perform functional projection lighting as a reference. Either one is taken to make the film on the transparent or opaque pattern of the exposed object transparent or opaque. In addition, according to the invention, the exposed object is exposed to the scanning light. The front is the photographing position, and the direction is at the exposure position of the exposed object in front of the beam scanning, and it is arranged on the functional map lighting mechanism for the exposed object as the reference; and the photographic pattern is detected. A preset reference controls the start or side of the beam irradiation. The high system configuration obtained by the exposure of the exposure is therefore the basis of the structure, and it is based on the 'no matter'-the implementation of the beam 'and it has the exposed photography which is based on the photography as the reference. Stop this to make the accuracy of the image from the subject, the machine that illuminates each other for photography is formed in the same example system, and is directly exposed to the position where the light body is moved to form first. The exposure of the photographed machine with the reference of the optical shadow mechanism as a reference can be exposed, and the exposed body can be replaced with a pre-formed mechanism to borrow the permeability pattern as a reference. For the direction to be transported and on the lesser side exposed to take pre-patterns, the shadow mechanism should be used as the base reference position, and the functional performance of the control unit on the opposite side of the control unit should be optimized to achieve the daylight. The up and down direction is set to be exposed to the exposed lighting or. Cope with functional features that are not. The department's through-the-lens pattern is formed on the exposure body in the beam. The light body is first formed on the camera and used to take pictures.

第8頁 200537257 五、發明說明（5) 以上述構成，藉配設於對透明的被曝光體上下方向的至少一側之照明機構來照明預先形成於被曝光體曝光位置的基準機能性圖形’而以在被曝光體搬運方向該光束掃描位置前方為攝影位置的攝影機構，從下方透過透明曝光基板攝得該基準機能性圖形，並藉光學系控制機構，來檢出以攝影機構所攝得在該基準機能性圖形上預先設定的基準 .位置，藉此控制以該基準位置為基準往復掃描的光束之照射開始或照射停止。藉此提高對預先形成於被曝光體上做 /為基準的機能性圖形重合既定機能性圖形之精度。由是即 #在基準機能性圖形上形成有透明膜的場合，亦可攝取該基準機能性圖形而檢出基準位置。因此，即使基準機能性圖形為不透明膜所覆蓋，仍可以高精度進行各層既定圖形的重合。再者，該照明機構係對該被曝光體配設於該攝影機構同側者。因此從攝影機構同側藉照明機構照明預先形成於被曝光體上做為基準的機能性圖型，而用攝影機構藉反射照明攝得該基準機能性圖型。因此在基準機能性圖型上形成有不透明膜的場合，仍可攝得該基準機能性圖型。再者，該照明機構係對該被曝光體配設於該攝影機構 •側者。因此從攝影機構反側藉照明機構照明預先形成於透明被曝光體上做為基準的機能性圖形，而用攝影機構藉透過照明攝得該基準機能性圖型。因此攝影機構所取得的畫像之對照得以提高，畫像數據之取得精度亦可提高，故 '可實現高精度之曝光。 (s.Page 8 200537257 V. Description of the invention (5) With the above-mentioned structure, the reference functional figure formed in advance at the exposed position of the exposed object is illuminated by the illumination mechanism provided on at least one side in the up-down direction of the transparent exposed object ' A photographing mechanism with the photographing position in front of the beam scanning position in the conveying direction of the exposed object captures the reference functional pattern through the transparent exposure substrate from below, and detects the image captured by the photographing mechanism through the optical control mechanism. A preset reference position on the reference functional pattern is used to control the start or stop of the irradiation of the light beam that is scanned back and forth based on the reference position. In this way, the accuracy of the functional pattern formed on the object to be exposed / referenced is increased to the accuracy of the predetermined functional pattern. In other words, when a transparent film is formed on the reference functional pattern, the reference functional pattern may be captured to detect the reference position. Therefore, even if the reference functional pattern is covered by an opaque film, the predetermined patterns of the layers can be superposed with high accuracy. In addition, the lighting mechanism is one in which the subject to be exposed is located on the same side of the photographing mechanism. Therefore, the illumination mechanism is used to illuminate the functional pattern pre-formed on the exposed object from the same side of the photographic mechanism, and the reference pattern is captured by the photographic mechanism by reflected illumination. Therefore, when an opaque film is formed on the reference functional pattern, the reference functional pattern can still be captured. In addition, the lighting mechanism is one in which the exposed object is disposed on the side of the photography mechanism. Therefore, the illumination mechanism illuminates the functional pattern previously formed on the transparent exposed body from the reverse side of the photographic mechanism as a reference, and the photographic mechanism obtains the reference functional pattern through the illumination. Therefore, the comparison of the images obtained by the photography agency can be improved, and the accuracy of acquiring the image data can be improved, so that 'high-precision exposure can be achieved. (s.

第9頁 200537257 五、發明說明（6) 再者，該照明機構，係配設於對該被曝光體上下方向兩側，並可互相交換使用。因而互相交換使用配設於被曝光體上下方向兩侧的照明機構，以&明預先形成於被曝光體上做為基準的機能性圖型，而以攝影機構藉透過照明或反射照明之任一種攝取做為基準的機能性圖型。由是不管被曝光體透明或不透明，不管形成於做為基準的機能性圖 ♦型上之膜透明或不透明，均可以同一曝光裝置應付。施第裝射實光雷 [·曝有式方此具Λ 。並5 圖，構念者機概型影的圖攝例性，實機豸二路U 第曝& 置接i f 裝直CO 光上系曝體學之光光明曝光發被曝本在、為乃！圖源置光於如器屬例光乃，濾，型色型圖各圖的綠性分、能部青機成、該構紅又要，，必型上圖作素動畫而陣的矩目色來黑本的成器 6達光構為濾機品色明製彩構機制控系學光及光型曝圖被極為電做種板各基及璃型玻圖用線器配光為濾中色件彩部用體使導就半例在施其實。。下明等以說型。做圖等體源光射雷之模鎖定固全出輸 2高源之光上以雷4W 該出輸生產為如例束光身發為乃線外紫 m η 學光光曝有設方前向丨方板射基發璃束玻光在之以 2 3 原用 wy 3 光系射學雷光在光曝此起12 端鏡前角向多方、于 1 身 T-H 發子束鏡光一射第雷、在10 ，構束機光向射偏雷的束光為做描掃復往上光第、及 9 _ ' 擇3 光有設Page 9 200537257 V. Description of the invention (6) Furthermore, the lighting mechanism is arranged on both sides of the object to be exposed in the vertical direction and can be used interchangeably. Therefore, the lighting mechanisms provided on the upper and lower sides of the exposed object are used interchangeably, and the functional pattern based on the & Ming pre-formed on the exposed object is used as a reference. A functional pattern based on ingestion. Therefore, regardless of whether the exposed object is transparent or opaque, and regardless of the functional figure formed as a reference, the film on the model is transparent or opaque, and can be handled by the same exposure device. Shi Di loaded and fired the real light thunder [· Exposure style square with this Λ. Figure 5 is an example of a schematic image of the constructor ’s machine. The real machine is not exposed to the second U & connection if installed directly on the CO. The light exposure of the body is exposed. !! The source of the picture is placed in the light of the device, such as the light, the filter, the green color of each figure, and the green part of the energy department. The red structure is also required. The 6-layer photostructure from the black book is used as a filter. The color system is controlled. The light and light exposure pictures are extremely electric. The bases and glass slides of the seeding board are wired with light for the filter. Color pieces and color parts use the body to guide half of the cases. . Xia Ming et al. The mode of the body source light laser is locked and the output is locked. 2 The light source is 4W on the high source light. The output is produced as an example. The beam body is made out of the line. The purple light is exposed. Fire the glass beam of the base glass to the square plate. The original wy 3 optical system is used for the thunder beam. After the light is exposed, the front angle of the 12-end mirror is directed to the square, and the thunder beam is shot at the thunder. At 10, the beam of the beam-forming machine is directed towards the polarized beam, and the beam is set for scanning and upward, and 9_ 'choose 3

第 200537257 五、發明說明（7) ' ~~--- 鏡子1 4。者。以切換雷射光束照射及照射停止狀態離配置成2亥圖偏所光不’生把第一與第二偏光元件15A，W分圖中偏光元件15A之7^件J5A，153的偏光軸9互相正交（在該 15B之偏光軸p設定二先針：定於垂直方向，偏光元件 15A ^ 15BF1 ^ $ &水平方向）。該第1及第2偏光元件 •與調产哭/fu配:有電氣光學調變器1 6的構成。該電氣光 • I : Ϊ : 壓時以數nSeC的高速回轉偏光（直線偏光） β # ί U、n 如^加電壓為零時，同圖（a)中以第一偏光 f H 生的透過之例如垂直方向的具有偏；皮面之直杜、。’二直透過該電器光學調變器16而達於第二偏光元此第一偏光元件1 5 B因係配置成可令具有水平方向偏波面的直線偏光選擇性的透過，是以具有垂直方向偏波面的直線偏光無法透過，此時雷射光束成照射停止狀態。另方面’如同圖（b)所示，加壓於電器光學調變器丨6， ^射於該電器光學調變器丨6的直線偏光偏波面回轉，9 〇。時’具有垂直方向偏波面的直線偏光，在電氣光學調度器 1 6發射時’成為具有水平方向偏波面，而此直線偏光則透 =第=偏光元件1 5 B，由是雷射光束成照射狀態。驗光偏向機構1 〇係用以調整雷射光束的掃描位置偏移於其2描方向正交之方向（破璃基板8之移動方向與第1圖所不前頭A方向一致），使其掃描正確位置者，例如音響光學元件（A0元件）。又第一鏡子1 1，係用以彎曲通過光偏向機構丨〇的雷射Article 200537257 V. Description of Invention (7) '~~ --- Mirror 1 4 By. By switching the laser beam irradiation and the irradiation stop state, the polarized axis 9 of the first and second polarizing elements 15A, WA, 7A, J5A, and 153 of the polarizing element 15A, which are arranged in a 2H figure polarized light, are separated. Orthogonal to each other (two polarizers are set at the polarization axis p of the 15B: set in the vertical direction, and the polarizing element 15A ^ 15BF1 ^ $ & horizontal direction). The 1st and 2nd polarizing elements • Compatible with production adjustment / fu: It has a structure of an electro-optical modulator 16. The electrical light • I: Ϊ: High-speed rotating polarized light (linear polarized light) with a number of nSeC when pressed. # # U, n When the applied voltage is zero, the transmission through the first polarized light f H in the same figure (a) is transmitted. For example, the vertical direction has a deviation; the leather surface is straight. 'The second polarizer passes through the electrical optical modulator 16 and reaches the second polarizer. The first polarizer 15B is configured to selectively transmit the linearly polarized light having a horizontally polarized wave surface. The linearly polarized light on the polarization surface cannot pass through, and at this time, the laser beam enters the irradiation stop state. On the other side, as shown in Fig. (B), the linearly polarized polarization plane of the electrical optical modulator 6 is pressurized, and the linearly polarized polarization plane of the electrical optical modulator 6 is rotated, 90. When the 'linearly polarized light with a vertical polarization plane is emitted at the time of the electro-optical scheduler 16', it becomes a horizontally polarized light, and this linearly polarized light is transmitted through the = th polarizing element 1 5 B, and is irradiated by the laser beam. status. The optometry deflection mechanism 10 is used to adjust the scanning position of the laser beam to a direction orthogonal to its 2 drawing direction (the moving direction of the broken glass substrate 8 is consistent with the direction A in front of the first figure), so that it scans correctly. Position person, for example, acoustic optical element (A0 element). And the first mirror 11 is a laser for bending the light deflection mechanism 丨〇

d 200537257 五、發明說明（8) 光束進行方向於後述之多角型鏡1 2的設置方向者，係屬一平面鏡。再者，多角形鏡1 2係用以往復掃描雷射光束，例如在正八角形柱狀回轉體側面形成的8個鏡子。此時該鏡之一所反射的雷射光束，隨著多角形鏡1 2之回轉在一維之、、往〃方向掃描，在雷射光束照射位置移於下一鏡面瞬間返回復之方向，再度隨著多角形鏡1 2之回轉，開始一維往〃方向掃描。又，f 0透鏡1 3，係用以使雷射光束掃描速度在玻璃基 ’板8上成等速者，其焦點位置配置在與多角形鏡;[2的鏡面 #置大約一致之位置。至於第二鏡子1 4則用以反射通過f 0 -透鏡1 3的雷射光束，使其入射於對玻璃基板8之表面略成垂直方向者，是屬於平面鏡。又在ίθ透鏡出射側之表面近傍在復掃描之雷射光束掃描開始側之部分’設有行傳感測器1 7與掃描方向成正交，以檢出雷射光束之既定掃描位置與實際掃描位置之偏移量，同時檢出雷射光束掃描開始時刻。此外，此線上傳感器1 7不只在f 0透鏡1 3側，只要能夠檢出雷射光束掃描開始點，則設在何處都可以，例如亦可設在後述之玻璃基板搬運用站台1 8側。。在第一鏡子1 4下方’設有搬運機構4。此搬運機構4乃 #以承載玻璃基板8於站台1 8上，而以規定速度搬運於與 -雷射光束掃描方向正交之方向，具有移動站台1 8用的例如，搬運滾輪1 9、例如回轉驅動搬運滾輪丨3的馬達等搬運驅部 2 0。 7 在搬運機：構4上方以箭頭a所示搬運方向之雷射光束掃d 200537257 V. Description of the invention (8) The direction in which the light beam travels in the setting direction of the polygon mirror 12 described below belongs to a plane mirror. Furthermore, the polygon mirror 12 is used for reciprocating scanning of a laser beam, such as eight mirrors formed on the side of a regular octagonal cylindrical rotating body. At this time, the laser beam reflected by one of the mirrors is scanned in the one-dimensional direction along with the rotation of the polygon mirror 12 in the direction of 〃, and the position where the laser beam is irradiated moves to the next mirror surface to return to the complex direction instantly. Following the rotation of the polygon mirror 12 again, one-dimensional scanning in the 〃 direction is started. The f 0 lens 13 is used to make the scanning speed of the laser beam equal to the speed on the glass substrate ′. The focal position is arranged at a position approximately the same as that of the polygon mirror [2. The second mirror 14 is used to reflect the laser beam passing through the f 0 -lens 13 and make it incident on the surface of the glass substrate 8 slightly perpendicular to the plane mirror. On the surface near the exit side of the lens of ίθ, near the part where the laser beam scanning start side of the complex scan is located, a line sensor 17 is set to be orthogonal to the scanning direction to detect the predetermined scanning position of the laser beam and the actual The scan position is offset, and the laser beam scanning start time is detected at the same time. In addition, this on-line sensor 17 is not only on the f 0 lens 1 3 side, but can be installed anywhere as long as it can detect the laser beam scanning start point. For example, it can also be provided on the glass substrate transporting platform 18 to be described later. . . A transport mechanism 4 is provided below the first mirror 14 '. This transport mechanism 4 is to carry the glass substrate 8 on the platform 18, and to transport it at a predetermined speed in a direction orthogonal to the laser beam scanning direction. It has a mobile platform 18, such as a transport roller 19, such as The conveyance drive unit 20 such as a motor that drives the conveyance rollers 3 in a rotary manner is 20. 7 On the conveyor: the laser beam sweeping in the conveying direction shown by arrow a above the structure 4

第12頁 200537257 五、發明說明（9) 描位置前方設有攝影機構5。此攝形成於玻璃基板8上曝光位置之係用以攝取預先黑色矩陣畫素者，例如以^做//_準用機能性圖型之 CCD。於此如第3圖所示，攝^ # 列狀排列的線形占々攝衫機構5之攝影位置Ε與雷射光束柃描位置F間之距離d，今宕成w田⑺兀運方向排列節距P的整數;t陣21的晝素22之搬至畫素22的中心與雷射光束(；"描)位^玻璃基板«搬運又距離D越小越好。由是可減】$ 致時即開始知描。玻璃基板8之移動誤差，並正確決疋μ射先束％描位置對畫素22的位置。此外，第工攝Λ機構5三台之例’如雷射光束掃描範圍一嘗口㈣像處理領域•，攝影機❺-台就 :於攝影機構5一台的畫像處理領域，則應其而要可设置多台攝影機購5。Page 12 200537257 V. Description of the invention (9) A photographing mechanism 5 is provided in front of the scanning position. This photograph is formed at the exposure position on the glass substrate 8 to capture a black matrix pixel in advance, for example, a CCD with a quasi-functional pattern. Here, as shown in FIG. 3, the line ^ # is arranged in a line to occupy the distance d between the photographing position E and the laser beam tracing position F of the camera mechanism 5. Now it is arranged in the direction of the field transportation. An integer of the pitch P; the day element 22 of the t array 21 is moved to the center of the pixel 22 and the position of the laser beam (;); the glass substrate «is transported and the smaller the distance D is, the better. Since it can be deducted] $ will begin to describe when it reaches. The movement error of the glass substrate 8 accurately determines the position of the μ-beam-beam-trace position to the position of the pixel 22. In addition, the third example of the third camera Λ mechanism 5 "If the laser beam scanning range is a taste of the field of image processing, the camera ❺-stage is: in the image processing field of the camera 5, it should be necessary Can set up multiple cameras to buy 5.

在搬運機構4下方·1¾•右日g g日P 又有…、明機構6。此照明機構6係用 :ΐ!ΐ:2丄2而f攝影機構5得以照相。光學系控制機構7 包έ有每射光源2、光開關9、光偏向機構1〇、乡角形鏡 U、行傳感器17而連接於搬運機構4及攝影機構5。此光學糸控制機構7檢出被攝影機構5攝得的預先設定於畫素之之圖型畫像的基準位置…該基準位置為基準來控制雷射 ^源2之雷射光束照射開始或照射停止，同時依據行傳感益1 7之輸出控制印加於光偏向機構丨〇之電壓，而使雷射光束之發射方向偏向，控制多角形鏡丨2之轉速藉以維持雷射光束之掃描速度於設定值，並控制搬運機構4搬運玻璃基板8之速度於設定值。並且具備有用以點燃雷射光源2之光 200537257 五、發明說明（10) 源驅動部23，用以控制雷射光束照射開始及照射停止之光開關控制器2 4，用以控制光偏向機構1 〇的雷射光束偏向量之光偏向機構驅動部2 5 A，用以控制多角形鏡1 2之驅動的多角形驅動部2 5 B，用以控制搬運機構4的搬運速度之搬運控制器2 6，職司照明機構6的點燈與關燈的照明控制器 2 7，把攝影機構5所攝得之畫像做A / D變換的A/ D變換部 _ 28，依據經A/D變換後的畫像數據而判定雷射光束照射開始位置及照射停止位置的畫像處理部2 9，用以記憶經畫像 ^處理部2 9處理所得雷射光束照射位置（以下稱曝光開始位 0 )及照射停止位置（以下稱曝光終了位置）之數據，同時記憶後述之曝光開始位置及曝光終了位置之觀測台等的記憶部3 0，依據製作記憶部3 0讀出之曝光開始位置及曝光終了位置數據來製作ON/OFF光開關9的調變數據之調變數據製作處理部3 1，及用以適當的控制整個裝置依設定目的動作之控制部3 2。第4圖及第5圖表示畫像處理部29的構成方塊圖之一例。如第4圖所示，畫像處理部2 9具備有例如3個並聯的環狀緩衝記憶體33A、33B、33C，分別連接於環狀緩衝記憶體3 3 A、3 3 B、3 3 C的例如3個行緩衝記憶體3 4 A、3 4 B、馨4C，連接於行緩衝記憶體34A、34B、34C用以與既定門才監值比較而把灰度水準數據2值化而輸出之比較回路3 5 ;自以上九個行緩衝記憶體34A、34B及34C的輸出數據與自第j 圖所示記憶部3 0所得決定曝光開始位置的相當於第一基準位置之畫像數據觀測台（曝光開始位置用LUT)相比較，兩Below the conveying mechanism 4, there are 1 ... right day g g day P again ... The lighting mechanism 6 uses: ΐ! Ϊ́: 2 丄 2 and the f-photographing mechanism 5 takes a picture. The optical system control mechanism 7 includes a light source 2, a light switch 9, a light deflection mechanism 10, a horn lens U, and a line sensor 17, and is connected to the transport mechanism 4 and the imaging mechanism 5. This optical beam control mechanism 7 detects a reference position of a picture image set in advance in a picture taken by the photographing mechanism 5. The reference position is used as a reference to control the start or stop of the irradiation of the laser beam of the laser source 2 At the same time, the voltage applied to the light deflection mechanism 丨〇 is controlled according to the output of the line sensing benefit 17 to deflect the emission direction of the laser beam and control the rotation speed of the polygon mirror 丨 2 to maintain the scanning speed of the laser beam at the setting Value, and controls the speed at which the conveyance mechanism 4 conveys the glass substrate 8 to a set value. And it is provided with light for igniting the laser light source 2 200537257 V. Description of the invention (10) The source driving unit 23 is used to control the laser beam irradiation start and stop of the light switch controller 2 4 to control the light deflection mechanism 1 The light deflection vector of the laser beam deflection vector is deflected to the mechanism driving section 2 5 A, and the polygon driving section 2 5 B for controlling the driving of the polygon mirror 12 2, and the conveying controller 2 for controlling the conveying speed of the conveying mechanism 4 6. Lighting controller 2 for lighting and turning off of the lighting mechanism 6 of the professional division. 7. The A / D conversion unit _ 28 that performs the A / D conversion on the image taken by the photography mechanism 5. Based on the A / D conversion. The image processing unit 29, which determines the laser beam irradiation start position and the irradiation stop position based on the image data, is used to memorize the laser beam irradiation position (hereinafter referred to as the exposure start bit 0) and the irradiation stop obtained by the image ^ processing unit 29 processing. Position (hereinafter referred to as the end-of-exposure position) data, and also memorize the exposure start position and the end-of-exposure position described later in the memory section 30 of the observation table, etc., based on the exposure start position and the end-of-exposure position data read out by the creation memory section 30 Modulation of the production data modulation ON / OFF switch 9 becomes an optical data creating section 31, and a control unit for appropriate control by setting the entire apparatus 32 of the action object. 4 and 5 show an example of a block diagram of the configuration of the image processing unit 29. As shown in FIG. 4, the image processing unit 29 is provided with, for example, three circular buffer memories 33A, 33B, and 33C connected in parallel and connected to the circular buffer memories 3 3 A, 3 3 B, and 3 3 C, respectively. For example, 3 line buffer memories 3 4 A, 3 4 B, and Xin 4C are connected to the line buffer memories 34A, 34B, and 34C to compare with the threshold value of a predetermined gate and binarize the gray level data and output it. Comparison circuit 3 5; The output data from the above nine line buffer memories 34A, 34B, and 34C and the image data observation table corresponding to the first reference position determined from the memory section 30 shown in the j-th figure to determine the exposure start position ( The exposure start position is compared with LUT).

第14頁 200537257 五、數定輸的用的位 •次光較數素調的最曝 m 此即預信發明說明（11) 據一致時輸出曝光開始位置判定結果的曝光開始位置判迴路3 6 ;及自以上九個行緩衝記憶體3 4 A、3 4 B、3 4 C的出數據與自第1圖所示記憶部3 0所得決定曝光終了位置相當於第二基準位置之畫像數據觀測台（曝光終了位置 L U T)相比較’兩數據一致時輸出曝光終了位置判定結果曝光終了位置判定回路3 7。又如第5圖所示，畫像處理部2 9具備有輪入曝光開始置判定結果而計算相當於第一基準位置的晝像數據相符數的計數回路38A，比較計數回路38A的輸出與第}圖所自記憶部3 0所得曝光開始晝像號碼，兩數值一致時把曝開始信號輸出於第1圖所示調變數據製成處理部3丨的比+ 回路39A ;輸入曝光終了位置判定結果而計算相當於第基準位置的畫像數據相符次數的計數回路3 8 β ;比回路38Β的輸出與第！圖所示自記憶部3〇所得曝光終乂/書號碼，兩數值一致時把曝光終了信號輸出於第丨圖所i 變數據製成處理部31的比較回路3 9 B ;依攄_ | ” 輸出計算最先畫素數的最先畫素計數：路據4=^^^Page 14 200537257 V. The number of bits used for fixed input • The sub-light is more exposed than the number of primes. This is the explanation of the letter of the invention. (11) According to the exposure start position judgment circuit that outputs the result of the determination of the exposure start position when it agrees. 3 6 ; And the output data from the above nine line buffer memories 3 4 A, 3 4 B, 3 4 C and the image data observation from the memory section 30 shown in Figure 1 to determine the end of exposure position equivalent to the second reference position Table (end-of-exposure position LUT) is compared. 'When the two data match, the output end-of-exposure position determination result is output. The end-of-exposure position determination circuit 3 7 is output. As shown in FIG. 5, the image processing unit 29 includes a counting circuit 38A that calculates the number of coincidences of daylight image data corresponding to the first reference position with the result of the turn-on exposure start determination, and compares the output of the counting circuit 38A with The number of exposure start day images obtained from the memory section 30 is shown in the figure. When the two values are the same, the exposure start signal is output to the modulation data shown in Figure 1 to make the ratio of the processing section 3 丨 + circuit 39A; the judgment result of the input end position is input. And counting the number of times corresponding to the image data corresponding to the reference position of the counting circuit 3 8 β; than the output of the circuit 38B and the first! As shown in the figure, the exposure end book / book number obtained from the memory section 30 is outputted at the end of the exposure signal to the comparison circuit 3 9 B of the processing section 31 when the two values are the same; Output the first pixel count to calculate the first pixel number: Route 4 = ^^^

= 輸出與自第1圖所示記憶部3。所V 士畫：列破碼，兩數值一致時，㈣光畫素斤; 出於第/圖所示調變數據製成處理部31之比二虎夕甘=數回路ΜΑ、38Β在攝影機構5的讀取動作開始據八α買取開始仏號而整定。又，〇 ^ JL, ^ 取先畫素什數回錄4 0在先私疋的既定曝光圖型形成終號而重新整定。『寻即據曝先圖型終了= Output from memory 3 shown in Figure 1. So V painting: when the numbers are broken, when the two values are the same, the light is light; the ratio of the processing unit 31 is made based on the modulation data shown in the figure / fig. Hu Xigan = number circuit Μ, 38B in the photography agency The reading operation of 5 starts to be set according to the eight alpha purchase start number. In addition, 〇 ^ JL, ^ takes the number of first pixels and records the 40 previous exposure patterns of the previous private image to form the final number and re-set. "Finding is the end of the pattern according to the exposure

200537257 五、發明說明（12) 其次’說明具有如此構成的曝光裝置1之動作及圖变形成方法。_先投入電源於曝光裝置1 ’就驅動光學系控制機構7。由是雷射光源2起動而發射雷射光束。同時多角形鏡1 2開始回轉而可掃描雷射光束。但此時光開關9仍是 0 F F的狀態，是以雷射光束尚未照射。其次，搭載玻璃基板8於搬運機構4之站台1 8上。此 ‘夕卜’因搬運機構4係以一定速度搬運玻璃基板8，故如第6 圖所示’雷射光束之掃描執跡（箭頭B)相對站台1 8的移動方向（箭頭A)成為斜向。因此如玻璃基板8係平行於該移動 f向（箭頭A)設置時，如同圖（a)所示，曝光位置可能在黑色矩陣2 1之掃描開始晝素2 2 a與掃描終了畫素2 2 b發生偏移。遇此場合，如同圖（b)所示，把玻璃基板8對搬運方向 (箭頭A方向）傾斜設置，使畫素2 2之排列方向與雷射光束之掃描軌跡（箭頭B)成為一致即可。但是事實上由於雷射光束之掃描速度遠較玻璃基板8的搬運速度為快，上述之偏移量並不太大。因此把玻璃基板8平行於移動方向設置^藉攝影機構5攝取之數據計測偏移量，並控制曝光光學系3的光偏向機構1 〇以修正偏移量亦可。又，在以下之 έ兒明中’該偏移量認為可予忽略者。 _ 其次，向第1圖之箭頭Α方向以搬運驅動部2 〇移動站台 =^此時藉光學系控制機構7的搬運控制器2 6控制成一定搆二=成二玻:機基二200537257 V. Description of the invention (12) Next, the operation of the exposure device 1 configured as described above and the method of forming the pattern will be described. When the power is first applied to the exposure device 1 ', the optical system control mechanism 7 is driven. When the laser light source 2 is activated, a laser beam is emitted. At the same time, the polygon mirror 12 starts to rotate and can scan the laser beam. However, at this time, the optical switch 9 is still in the state of 0 F F, and the laser beam is not irradiated yet. Next, the glass substrate 8 is mounted on the stage 18 of the conveyance mechanism 4. In this "Xibu", since the conveying mechanism 4 conveys the glass substrate 8 at a constant speed, as shown in Fig. 6, the scanning position of the laser beam (arrow B) is inclined relative to the moving direction of the station 18 (arrow A). to. Therefore, if the glass substrate 8 is set parallel to the movement f direction (arrow A), as shown in Figure (a), the exposure position may be in the black matrix 2 1 when scanning starts at day 2 2 a and at the end of scanning 2 2 b is shifted. In this case, as shown in Figure (b), the glass substrate 8 may be tilted to the conveying direction (arrow A direction), so that the arrangement direction of the pixels 22 and the scanning trajectory of the laser beam (arrow B) can be consistent with each other. . However, in fact, since the scanning speed of the laser beam is much faster than the conveying speed of the glass substrate 8, the above-mentioned offset is not too large. Therefore, it is also possible to set the glass substrate 8 parallel to the moving direction and measure the offset by using the data captured by the photographing mechanism 5 and control the light deflection mechanism 10 of the exposure optical system 3 to correct the offset. In addition, in the following description, the offset is considered to be negligible. _ Next, move the drive unit 2 in the direction of arrow A in Figure 1 〇 Mobile station = ^ At this time, the transport controller 2 6 of the optical system control mechanism 7 is used to control the structure.

第16頁 200537257 五、發明說明（13) 矩陣2 1之晝像數據檢出曝光開始位置及曝光終了位置。下文中參照第7圖所不之流程圖來說明圖型之形成方法。首先在步驟S 1中’以攝影機構5取得黑色矩陣2丨的畫素2 2之畫像。此取得的畫像數據被送入第4圖所示晝像處理不2 9之三個環狀緩衝記憶體3 3 a、3 3 B、3 3 c中接受處理。於是從各環狀緩衝記憶體3 3 A、3 3 β、3 3 c輸出最新的 •，三個數據。此時例如從環狀緩衝記憶體33A輸出前兩個數據，從環狀緩衝記憶體3 3B輸出前一個數據，從環狀緩衝記憶體3 3 C輸出最新數據。再者，各該數據分別由三個行 _衝記憶體3 4A、3 4B、3 4C，例如將3 X 3之CCD晝素之畫像 -配置於同一時間軸。結果得如第8圖（a)所示之畫像。如把此畫像數值化，對應於同圖（b )所示之3 X 3數值。這些數值化之晝像，並列於同一時間軸，以比較回路3 5與門檻值比較而被數值化。例如門檻值為、、4 5 "時，同圖（a)之畫像，如與同圖（c ) 一樣，可被2值化。其次在步驟S2中，可檢出曝光開始及曝光終了之基準位置。具體而言，基準位置之檢出，係藉曝光開始位置判定回路3 6，把上述2值化數據與從第1圖所示記憶部3 0所得之曝光開始位置用LUT之數據比較而得。 ' φ 例如指定曝光開始位置的第一基準位置設定在第9圖 (a )所示之黑色矩陣2 1的畫素2 2左上端角落時，曝光開始用LUT為同圖（b)所示者，此時曝光開始用LUT之數據為° 、、0 0 0 0 1 1 0 1 1，。由是上述之2值化數據與該曝光開始用 LUT之數據、' 0 0 0 0 1 1 0 1 1 "比較結果，兩數據一致時，攝影Page 16 200537257 V. Description of the invention (13) The daylight image data of matrix 21 detects the exposure start position and the end position of exposure. The method of forming a pattern will be described below with reference to the flowchart shown in FIG. First, in step S1 ', a picture of the pixel 22 of the black matrix 2 丨 is obtained by the photographing mechanism 5. The acquired image data is sent to three ring buffer memories 3 3 a, 3 3 B, and 3 3 c for day image processing not shown in FIG. 4 for processing. Then, the latest • and three data are output from each of the ring buffer memories 3 3 A, 3 3 β, and 3 3 c. At this time, for example, the first two data are output from the ring buffer memory 33A, the previous data is output from the ring buffer memory 3 3B, and the latest data is output from the ring buffer memory 3 3 C. In addition, each of the data is composed of three rows of memory 3 4A, 3 4B, and 3 4C. For example, a 3 × 3 image of a CCD day element is arranged on the same time axis. The result is the portrait shown in Figure 8 (a). If this image is digitized, it corresponds to the value of 3 X 3 shown in the same figure (b). These digitized day images are aligned on the same time axis, and are digitized to compare the circuit 35 with the threshold value. For example, when the threshold value is 4, 5 ", the image in the same figure (a) can be binarized as in the same figure (c). Next, in step S2, the reference positions at which the exposure starts and the end of the exposure can be detected. Specifically, the detection of the reference position is obtained by comparing the above-mentioned binary data with the exposure start position obtained from the memory unit 30 shown in Fig. 1 by using the data of the LUT by using the exposure start position determination circuit 36. 'φ For example, when the first reference position for specifying the exposure start position is set at the upper left corner of the black matrix 2 1 of the black matrix 2 shown in FIG. 9 (a), the exposure start LUT is the same as that shown in (b) At this time, the data of the exposure start LUT is °,, 0 0 0 0 1 1 0 1 1. As a result of the comparison between the above-mentioned binary data and the LUT data used for the exposure start, '0 0 0 0 1 1 0 1 1 "

第17頁 200537257 五、發明說明（14) 機構5所取得的晝像數據被判定屬於第一基準位置，而曝光位置判定回路36輸出開始位置判宁：里山，而* 且利疋結果。此外，如第 1 0圖所示有6個畫素2 2並列時，各書辛” η續甘，隹从琪口 ι22的左上端角落就是第一基準位置。依據上述判定結果，在第5圖所示計數回路38α計算上述之相符次數。於是其計得數在比較回路39Α與第丨圖所示 j己憶部30所得之曝光開始畫素號碼相比較，而數值一致時’輸出曝光開始信號於第丨圖所示之調變數據製成處理部3 1。此時如第1 0圖所示，於雷射光束掃描方向，決定第鲁畫袭221及第四晝素224之左上端角落為第一基準位置時，對應於该第一基準位置的攝影機構5之行[c d上元件地址，例如、、1 0 0 0 ” 、、、4 0 0 0 ”即被光開關控製器24所記憶〇另一方面，上述之2值化數據，在曝光終了判定回路 3 7中’與第1圖所示記憶部3 〇所得曝光終了位置用[υτ數據比較，例如指定曝光終了位址的第二基準位置設定在第1 1 圖（a)所示之黑色矩陣2 1的畫素2 2右上端角落時，曝光終了位置用LUT為同圖（b)所示者，此時曝光終了位置用LUT 之數據為、、1 1 0 1 1 0 0 〇 (T 。由是上述之2值化數據與該曝光鲁了位置用LUT之數據、、11 〇 1 1 0 0 00 比較結果，兩數據一致時’攝影機構5所取得的畫像數據被判定屬於曝光終了的基準位置，而由曝光終了位置判定回路3 7輸出終了位置判定結果。此外，與上述情形同樣，例如如第1 〇圖所示有 6個晝素2 2並列時，各畫素2 2右上端角落就是第二基準位Page 17 200537257 V. Description of the invention (14) The day image data obtained by the mechanism 5 is determined to belong to the first reference position, and the exposure position determination circuit 36 outputs the start position determination: Satoyama, and * and the result is favorable. In addition, when there are 6 pixels 2 2 juxtaposed as shown in Fig. 10, each book is "Xin Gan", and the upper left corner of Qikou 22 is the first reference position. According to the above determination result, in the 5th The counting circuit 38α shown in the figure calculates the above-mentioned coincidence times. Therefore, the counted number is compared in the comparison circuit 39A and the exposure start pixel number obtained by the memory module 30 shown in FIG. 丨, and when the values are consistent, the output exposure starts The signal is made into the processing section 31 according to the modulation data shown in Fig. 丨. At this time, as shown in Fig. 10, in the scanning direction of the laser beam, the upper left ends of Dilu painting 221 and fourth day element 224 are determined. When the corner is the first reference position, the row of the camera 5 corresponding to the first reference position [the component address on the cd, for example,, 1 0 0 0 ”,, 4 0 0 0” is the optical switch controller 24 On the other hand, the above-mentioned binary data is compared in the end-of-exposure determination circuit 37 with the exposure-end position obtained by the memory section 30 shown in FIG. 1 using [υτ data, for example, specifying the address of the end-of-exposure address. The second reference position is set to the black moment shown in Figure 1 (a) When the pixel 2 of the array 2 1 is at the upper right corner, the LUT at the end of exposure is the same as shown in Figure (b). At this time, the data of the LUT at the end of exposure is 1, 1 0 1 1 0 0 〇 (T . As a result of the comparison between the above-mentioned binary data and the LUT data for the exposure position, 11 001 1 0 00. When the two data match, the image data obtained by the photographing agency 5 is determined to be the end of the exposure. The reference position, and the end-of-exposure determination result is output by the end-of-exposure position determination circuit 37. In addition, as in the case described above, for example, when there are 6 day elements 2 2 juxtaposed as shown in FIG. 10, the upper right end of each pixel 2 2 The corner is the second datum

第18頁 200537257 五、發明說明（15) 置。依據上述判定結果，在第5圖所示計數回路3 8 B計算上述之相符次數。於是其計得數在比較回路3 9 B與第1圖所示記憶部3 0所得之曝光終了晝素號碼相比較，兩數值一致時，輸出曝光終了信號於第1圖所示之調變數據製成處理部3 1。此時如圖所示，例如於雷射光束掃描方向，決定第 .一畫素221及第四畫素224之右上端角落為第二基準位置時，對應於該第二基準位置的攝影機構5之行CCD上元件地址，例如、、1 9 0 0，，，，4 90 0 "即被光開關控制器22所記Page 18 200537257 V. Description of Invention (15). Based on the above determination result, the above-mentioned matching times are calculated in the counting circuit 3 8 B shown in FIG. 5. Therefore, the calculated number is compared in the comparison circuit 3 9 B with the exposure end day number obtained in the memory portion 30 shown in FIG. 1. When the two values are consistent, the exposure end signal is output as the modulation data shown in FIG. 1. Finished processing section 31. At this time, as shown in the figure, for example, when the upper right corner of the first pixel 221 and the fourth pixel 224 is determined as the second reference position in the laser beam scanning direction, the photographing mechanism 5 corresponding to the second reference position The address of the component on the CCD, such as, 1,900, 4,900, " is recorded by the optical switch controller 22.

。於是如上述情形，曝光開始位置及曝光終了位置的基位置被檢出後，即進入步驟S3。步驟S3中檢出在玻璃基板8移動方向之曝光位置。於此如第3圖所示，雷射光束掃描位置F與攝影機構5攝影位置E間之距離係設定為沿畫素2 2移動方向的排列節距p的整數倍（η倍），因此計算雷射光束知描週期，即可得知曝光位置。例如第1 2圖所示，雷射光束掃描位置與攝影機構5 攝影位置間之距離D設定為畫素2 2排列節距ρ之例如3倍時，在步驟S 2中檢出位於畫素2 2端部之第一及第二基準位置後（參照同圖（a))’俟玻璃基板8移動而畫素列中心線抵鬱攝影機構5之攝影位置（參照同圖（b))時，與雷射光束婦描開始時機一致。於是雷射光束以週期T掃描時，玻璃基1" 板8之搬運速度被控制成與雷射光束之週期τ同步移動書 22的一節距份。由是在下一次之^間，畫素22就^動^同圖（c)所示位置。再2T後，畫素22移動同（d)所示位置，於. Therefore, as described above, after the base positions of the exposure start position and the exposure end position are detected, the process proceeds to step S3. An exposure position in the moving direction of the glass substrate 8 is detected in step S3. Here, as shown in FIG. 3, the distance between the laser beam scanning position F and the photographing mechanism E's photographing position E is set to an integer multiple (η times) of the arrangement pitch p along the moving direction of the pixel 22, so it is calculated The laser beam knows the scanning period, and the exposure position can be known. For example, as shown in FIG. 12, when the distance D between the scanning position of the laser beam and the shooting position of the photographing mechanism 5 is set to be 3 times the pixel 2 2 arrangement pitch ρ, for example, the pixel 2 is detected in step S 2. After the first and second reference positions of the two end portions (refer to the same figure (a)) 'when the glass substrate 8 moves and the center line of the pixel row abuts the photographing position of the photographing mechanism 5 (refer to the same figure (b)), The timing coincides with the start of laser beam tracing. Thus, when the laser beam is scanned at a period T, the carrying speed of the glass substrate 1 " plate 8 is controlled to move one pitch of Book 22 in synchronization with the period τ of the laser beam. Therefore, in the next time, pixel 22 will move to the same position as shown in Figure (c). After 2T, pixel 22 moves to the position shown in (d).

第19頁 200537257 五、發明說明（16) --- 是3T後，如同圖（e)所示，畫速22的列中心線就抵達於雷射光束之知描位置。如此就可檢出曝光位置。其次在步驟S4中，一面以雷射光束掃描，一面調整曝光位置。具體而言，如第1 3圖所示，曝光位置的調整，係以一f0透鏡中所設行傳感器17檢出之現在雷射光束掃描位置 (7L件地址）與既定基準元件地址比較而檢出其偏差量，控制光偏向機構1 0使雷射光束掃描位置與基準元件地址（美準掃描位置）一致。其次，於步驟S5中，開始曝光，係藉光開關控制器24 #制光開關9的動作。此時首先使光開關9成〇N的狀鳆而以 -雷射光束掃描，並界行傳感器17檢出雷射光束的掃^開始 .時刻後立即關閉光開關9。此時可從調變數據製成處理° 3 1讀出例如對應於第丨〇圖之曝光開始位置的攝影機構5 元件地址、、1 0 0 0 "而控制部32演算出從雷射光束掃描時刻至曝光開始位置之時間t丨。此時預先計測從雷射: 的掃描開始時刻至攝影機構5之元件地址、' 丨〃的掃描時門 10 ’並使雷射光束的掃描速度同步於攝影機構5之行Ccj)時間軸CLK，則由計算至元件地址、、丨〇〇〇〃止之時間軸數，、可谷易求得掃描開始時刻11 = t 〇 + 1 〇〇〇 c L K。由是在雷射 • |束掃描開始時刻至11後，使光開關9 0 N而開始曝光。其次在步驟S 6中檢出曝光終了位置。與上述情形一 _樣，例如在元件地址、、1 9 〇〇，，之曝光終了時刻t 2 = 10 + 1 9 0 0CLK求得。由是在雷射光束掃描開始時刻至12後關閉 '光開關9而終止曝光。Page 19 200537257 V. Description of the invention (16) --- After 3T, as shown in Figure (e), the center line of the column at the drawing speed 22 reaches the position of the laser beam. This will detect the exposure position. Next, in step S4, the exposure position is adjusted while scanning with a laser beam. Specifically, as shown in FIG. 13, the adjustment of the exposure position is performed by comparing the current laser beam scanning position (7L address) detected by the line sensor 17 set in an f0 lens with the predetermined reference element address. The deviation amount is controlled, and the light deflection mechanism 10 is controlled so that the laser beam scanning position is consistent with the reference element address (US standard scanning position). Next, in step S5, the exposure is started, which is based on the operation of the light switch controller 24 #light control switch 9. At this time, the optical switch 9 is first scanned with a laser beam, and the scanning of the laser beam is detected by the boundary line sensor 17. The optical switch 9 is closed immediately after the time. At this time, the modulation data can be created and processed. 3 1 reads, for example, the camera address 5 corresponding to the exposure start position of the image in FIG. 1 and the control unit 32 calculates the laser beam from the laser beam. The time t 丨 from the scanning time to the exposure start position. At this time, the scanning time from the laser: to the component address of the camera 5 and the scan time gate 10 'of the camera 5 are measured in advance, and the scanning speed of the laser beam is synchronized with the time of the camera 5 (Ccj) time axis CLK, From the calculation to the component address, the number of time axes until 丨〇〇〇〃, can be easily obtained from the scan start time 11 = t 〇 + 1 〇〇〇c LK. The exposure is started by turning the optical switch 90 N after the laser scanning start time until 11 o'clock. Next, the end-of-exposure position is detected in step S6. As in the above case, for example, it can be obtained at the end of the exposure of the device address, 1 900, t 2 = 10 + 19 0 0CLK. The exposure is terminated by turning off the 'light switch 9' after the start time of the laser beam scan to 12 o'clock.

200537257 五、發明說明（17) 其次在步驟S 7中，判斷雷射光束之一巡掃描是否終了。如果判斷為N 0 〃，則回歸S 2而重複上述動作。於是在S 2中，如第1 0圖所示，例如檢出第二曝光開始位置 "4 0 0 0 及第二曝光終了位置、' 4 9 0 0 "，則京S 4而進入 S 5，與上述情形一樣，從元件地址a 4 0 0 0 β開始曝光，而曝光終了於元件地址Μ 9 0 0 〃。 . 又在步驟S7中，如果判斷為^ YES β ，即回歸S 1，移行於新的曝光位置檢出動作。於是上述動作反覆進行結 /果，在所希望之領域形成曝光圖形。 φ 如此，依照本發明之曝光裝置及圖形之形成方法，係 -1攝影機構5取得之玻璃基板8上預先形成的黑色矩陣2 1之晝素2 2畫像，檢出在其上預先設定之基準位置，並以此為 ’基準進行雷射光束之照射開始與照射停止之控制，由是形成曝光圖形，這樣一來，可提高畫素22的曝光精度。又因依據畫素2 2上預先設定之基準位置形成曝光圖形，可排除起因於曝光裝置間精度差之機能性圖型重合經度劣化的問題，因此應用於使用複數之曝光裝置1形成積層圖形之製程仍可確保很高的重合經度。藉此可抑制曝光裝置1之成本。 • _ 再者，藉配置照明機構5於曝光光學系3之同側，可將兩者一體成形，故可提高此部分的機械安定性，減低成本，組裝裝置也容易。於此，藉配置照明機構6於以透明玻璃基板8為界攝影〜機構5之相反側，可提高攝影機構5所取得畫像的對照及畫200537257 V. Description of the invention (17) Next, in step S7, it is judged whether one of the laser beam scanning scans has ended. If it is determined that N 0 〃, the process returns to S 2 and the above operation is repeated. Therefore, in S 2, as shown in FIG. 10, for example, if the second exposure start position " 4 0 0 0 and the second exposure end position " 4 9 0 0 " are detected, then S 4 enters S 5. As in the above case, the exposure starts from the element address a 4 0 0 0 β, and the exposure ends at the element address M 9 0 0 〃. In step S7, if it is determined that ^ YES β, it returns to S 1 and moves to the new exposure position to detect the action. Then, the above-mentioned actions are performed repeatedly, and an exposure pattern is formed in a desired area. φ In this way, according to the exposure device and pattern forming method of the present invention, it is a black matrix 2 1 daytime element 2 2 image formed in advance on the glass substrate 8 obtained by the -1 photographing mechanism 5, and a pre-set reference is detected thereon. Position, and using this as a reference to control the start and stop of the laser beam irradiation, so as to form an exposure pattern, the exposure accuracy of the pixel 22 can be improved. Because the exposure pattern is formed according to a preset reference position on the pixel 22, the problem of functional pattern overlap and longitude deterioration caused by poor accuracy between exposure devices can be ruled out. Therefore, it is applied to the use of multiple exposure devices 1 to form laminated patterns. The process still ensures a high coincidence longitude. Thereby, the cost of the exposure apparatus 1 can be suppressed. • _ Furthermore, by arranging the lighting mechanism 5 on the same side of the exposure optical system 3, the two can be formed integrally, so the mechanical stability of this part can be improved, the cost can be reduced, and the device can be easily assembled. Here, by arranging the lighting mechanism 6 on the transparent glass substrate 8 as the boundary to the side opposite to the mechanism 5, the contrast and drawing of the image obtained by the photography mechanism 5 can be improved.

第21頁 200537257Page 21 200537257

像數據取得精度。因此可實甘4〜、n ^ J見南精度的曝光。其-人έ兄明本發明曝光裝明與第一實施型態不同之處。之苐二實施形態。在此僅說第1 4圖所示本第二實構5及照明機構6的配置於搬^ : ^曝光裝置1，其攝影機基板8上之反射照明取得預運钱構4之下方，俾便藉玻璃 •色矩陣2 1之晝素2 2之像。、/成於該玻璃基板8表面之黑藉此構成，以反射日g & •機構5攝得預务带Λf 攸下方透過玻璃基板8以攝影 ^，而、、_先幵y成表玻璃基板8上面的黑色矩陣2 1之畫素 IΪ光學系控制機構7檢出預先設定於該畫素2 2之基 t〜=控!!1曝光開始及曝光終了，曝露例如紅、青、綠心〜光器等既定機能性圖形於對應該畫素2 2之位置。其盡# ί依照第二實施形態，與第〆實施形態同樣，可對在蚩妾9 9 扣度形成既定機能性圖形於既定位置。由是。上形成複數層之圖型時，各層圖型之重合精度亦 3之誘因攝影機構5與照明機構6係配置於曝光光學系 4曰古#丨、曝光光學系3與各該機構可以一體成形。因而可提N具機插sL·今& %, 女疋性，減低成本，又组裝容易，而且玻璃基板8之下你||处χ 4 .π ι曰〗王可供搬運機構4之驅動機械系統使用，利 5又叶。斑二=說明本發明曝光裝置之第三實施形態。在此僅就，、々貫施形態不同部份加以說明。係配置於搬不第三實施形態之曝光裝置1，其攝影機構5 、叙運機構6之上方，同時把照明機構6a、6b配置Image data acquisition accuracy. Therefore, it is possible to perform exposures with a precision of 4 ~, n ^ J. The man-to-man tells the difference between the exposure device of the present invention and the first embodiment. The second form of implementation. Here, only the arrangement of the second real structure 5 and the lighting mechanism 6 shown in Figs. 14 and 14 are disposed in the moving device ^: ^ exposure device 1, and the reflected illumination on the camera substrate 8 is obtained below the pre-shipment structure 4, so it is convenient Borrow the image of the day prime 2 2 from the glass • color matrix 2 1. 、 / The black formed on the surface of the glass substrate 8 is formed to reflect the day g & • The photo taken by the mechanism 5 through the glass substrate 8 through the glass substrate 8 to take a picture ^, and, _ 先幵 y into a table glass The black matrix 2 on the substrate 8 and the pixel I of the 1Ϊ optical system control mechanism 7 detect the base t ~ = control set in advance on the pixel 2 2 !! 1 The exposure starts and the end of the exposure, such as red, cyan, and green hearts ~ Predetermined functional patterns such as optical devices are at positions corresponding to pixels 2 2.其尽 # According to the second embodiment, similar to the first embodiment, it is possible to form a predetermined functional pattern at a predetermined position with respect to the 9-9 degree. By. When a pattern of a plurality of layers is formed on the upper layer, the coincidence accuracy of the patterns of the layers is also 3. The photography mechanism 5 and the lighting mechanism 6 are arranged in the exposure optical system 4, and the exposure optical system 3 and each of the mechanisms can be integrally formed. Therefore, it is possible to provide N machine insert sL · 今 &%, son-in-law, low cost, easy assembly, and under the glass substrate 8 The drive mechanical system is used, Lee 5 and Ye. Spot 2 = A third embodiment of the exposure apparatus according to the present invention will be described. Only the different parts of the morphology of 々 and 々施 are explained here. It is arranged on the exposure device 1 of the third embodiment, and the photo mechanism 5 and the transport mechanism 6 are arranged above, and the lighting mechanisms 6a and 6b are arranged

第22頁 (s 200537257P. 22 (s 200537257

五、發明說明（19) 於搬運機構以此構時，則點亮形成的基準該基準機能了，並形成一方面，假亮下側照明照性的基準 | 這樣依透明體，依或反射照明其次說與第一實施 4之上下兩側成，假如所用上側照明機構機能性圖形，性圖形上的基既定曝光圖形如所用基板係機構6 b而利用機能性圖形。照第三實施形照基板屬性，方式切換使用明本發明曝光形態不同部份 ’則可互相切換使用。基板不透明致不能利用透過照明 6 a ’以攝影機構5取得機版上面藉光學系控制機構7檢出設定於準位置來控制曝光開始及曝光終於對該基準位置之既定位置。另透明致可利用透過照明時，可點透過照明以攝影機構5攝得高對態，視所使用基板為透明體或非可將照明機構6 a、6 b以透過照明 ’以提高使用上之方便性。裝置之第四實施形態。於此僅就加以說明。第1 6圖所示之第四實施形態之曝光裝置}，其攝影機構5及照明機構6均配設於搬運機構4之下方，透過透明的玻璃基板8從下方攝取預先形成於該玻璃基板8表面之黑色矩陣2 1的晝素2 2。以此構成’藉照明機構透過透明的玻璃基板8從下方馨明預先形成於該玻璃基板8表面的黑色矩陣2 1，再以攝影機構5從玻璃基板8下方透過玻璃基板8攝取黑色矩陣21 之晝素22像，再以光學系控制機構7檢出設定於該晝素22 的基準位置來控制曝光開始及曝光終了，而在對應於畫素 22之位置曝露例如紅、青、綠之彩色濾光器等既定機能性V. Description of the invention (19) When the conveying mechanism is structured, the reference formed by the light is turned on and the reference function is formed, and on the one hand, the base of the illumination of the false side is illuminated | Secondly, it is formed with the upper and lower sides of the first embodiment 4. If the functional pattern of the upper side illumination mechanism is used, the predetermined exposure pattern on the sexual pattern is the functional pattern as the substrate-based mechanism 6b used. According to the third embodiment, according to the properties of the substrate, the mode is switched and used. It is clear that different parts of the exposure form of the present invention can be used interchangeably. The substrate is opaque and cannot be transmitted through the illumination 6 a ′ to obtain the upper surface of the machine plate by the photographing mechanism 5. The optical system control mechanism 7 detects and sets it to a predetermined position to control the exposure start and the exposure to a predetermined position with respect to the reference position. In addition, when transparent lighting can be used, point-through lighting can be used to take a high contrast with the photographing mechanism 5. Depending on the substrate used is a transparent body or the lighting mechanism 6 a, 6 b can be transmitted through the lighting to improve the use. Convenience. A fourth embodiment of the device. Only the description will be given here. The exposure device of the fourth embodiment shown in FIG. 16}, the photographing mechanism 5 and the lighting mechanism 6 are both disposed below the conveying mechanism 4, and taken through the transparent glass substrate 8 from below and formed in advance on the glass substrate 8 The black matrix 2 1 on the surface is the day element 2 2. With this structure, the black matrix 21 formed in advance on the surface of the glass substrate 8 through the transparent glass substrate 8 is transmitted through the transparent glass substrate 8 by the illumination mechanism, and the black matrix 21 is taken by the photography mechanism 5 through the glass substrate 8 from below the glass substrate 8. The day 22 image is controlled by the optical system control mechanism 7 to detect the reference position set at the day 22 to control the start and end of the exposure, and the color filters such as red, cyan, and green are exposed at the position corresponding to the pixel 22 Optical equipment and other established functions

(S 200537257 五、發明說明（20) 圖形。這樣依照第四實施形態，與第一實施形態一樣，可對基準位置在既定位置形成高精度之既定機能性圖形。由是在畫素22上形成複數層之圖型時，各層圖型之重合精度亦可提高。又在做為基準之畫素2 2上例如形成有不透明膜時，亦可透過透明玻璃基板8從下方攝得基準畫素2 2而檢出基準位置，由是畫素2 2上即使被不透明膜所隱蔽，仍可高精度進行各層之既定機能性圖形之重合。其次說明本發明曝光裝置之第五實施形態。於此僅就 #第一實施形態不同部份加以說明。第1 7圖所示之第五實施形態之曝光裝置1，其攝影機構5係配置於搬運機構4之下方，照明機構6則配設於搬運機構4之上方，透過透明的玻璃基板8從下方攝取預先形成於該玻璃基板8表面之黑色矩陣2 1之畫素2 2像。以此構成，藉透過照明以攝影機構5從下方透過玻璃基板8攝取形成於玻璃基板8上面的黑色矩陣2 1之畫素2 2，再藉光學系控制機構7檢出設定於畫素2 2之基準位置來控制曝光開始及曝光終了，而在對應於畫素2 2之位置，曝露例如紅、青、綠之彩色濾光器等既定機能性圖形。 _ 這樣依照第五實施形態，與第一實施形態一樣，可對基準位置在既定位置形成高精度之既定機能性圖型。由是在畫素2 2上形成複數層之圖型時，各層圖型之重合精度亦可提高。又因係使用透過照明，攝影機構5取得之畫像的對照得以提高，畫像數據之取得精度也會提高，因此可實(S 200537257 V. Description of the invention (20) graphics. According to the fourth embodiment, like the first embodiment, it is possible to form a high-precision predetermined functional figure for a reference position at a predetermined position. It is formed on pixel 22. In the case of a plurality of layers, the overlay accuracy of the layers can also be improved. When the opaque film is formed on the reference pixel 2 2, for example, the reference pixel 2 can be taken from below through the transparent glass substrate 8. 2 and the reference position is detected, since the pixel 2 2 can be concealed by the opaque film, the predetermined functional patterns of the layers can be superposed accurately. Next, the fifth embodiment of the exposure device of the present invention will be described. The different parts of the # 1st embodiment will be described. The exposure device 1 of the fifth embodiment shown in FIG. 17 has a photographing mechanism 5 disposed below the transport mechanism 4 and an illumination mechanism 6 disposed on the transport mechanism. Above 4, the transparent matrix substrate 8 takes in the pixels 2 2 images of the black matrix 2 1 formed on the surface of the glass substrate 8 in advance from below. With this configuration, the photography mechanism 5 is transmitted from below through the illumination. The pixels 2 2 of the black matrix 2 1 formed on the glass substrate 8 are taken through the glass substrate 8, and then the optical system control mechanism 7 detects the reference position set at the pixels 2 2 to control the start and end of the exposure. A predetermined functional pattern such as a color filter of red, cyan, and green is exposed at a position corresponding to the pixel 22. _ According to the fifth embodiment, the reference position can be formed at a predetermined position in the same manner as the first embodiment. A high-precision functional pattern. When a plurality of layers of patterns are formed on the pixels 22, the overlay accuracy of the patterns of each layer can also be improved. Also, because of the use of through-lighting, the comparison of the images obtained by the photography mechanism 5 As a result, the accuracy of obtaining the image data is improved, so

CsCs

第24頁 200537257 五、發明說明（21) 現高精度的曝光。此外，由於配置佔空間較小之照明機構 6於曝光光學系3之同側，不至於引起照明機構6與曝光光學系3兩設置空間互相干擾之問題。此外，本發明之曝光裝置，並不限定於液晶顯示器之彩色濾光器等大型基板使用，亦可適用於半導體等曝光裝置。P.24 200537257 V. Description of the invention (21) High-precision exposure. In addition, because the lighting mechanism 6 with a small space is arranged on the same side of the exposure optical system 3, the problem that the two installation spaces of the lighting mechanism 6 and the exposure optical system 3 interfere with each other will not be caused. In addition, the exposure device of the present invention is not limited to the use of a large substrate such as a color filter of a liquid crystal display, and can also be applied to an exposure device such as a semiconductor.

(S(S

第25頁 200537257 圖式簡單說明【圖式簡單說明】第1圖為本發明之曝光裝置第一實施形態之概念圖。第2圖為說明光開關之構成及動作之斜視圖。第3圖為表示雷射光束掃描位置與攝影機構的攝影位置關係之說明圖。第4圖為表示畫像處理部内部構成中處理系統前半部，之方塊圖。第5圖為表示畫像處理部内部構成中處理系統後半部 /之方塊圖。 φ 第6圖為表示於雷射光束掃描方向成正交移動之黑色 .矩陣與雷射光束掃描軌跡關係之說明圖。第7圖為說明本發明圖形形成方法順序之流程圖。 ' 第8圖為表示環狀緩衝記憶體輸出2值化方法的說明圖。第9圖為表示預先設定於黑色矩陣畫素上曝光開始位置之畫像與其觀測台之說明圖。第1 0圖為表示預先設定於黑色矩陣畫素上基準位置與攝影機構元件間關係之說明圖。第1 1圖為表示預先設定於黑色矩陣畫素上曝光終了位 • 0之畫像與其觀測台之說明圖。第1 2圖為表示對在該玻璃基板搬運方向的上述畫素上曝光位置之檢出方法說明圖。第1 3圖為表示雷射光束掃描位置修正方法之說明圖。 • 第1 4圖至第1 7圖圖依序分別為表示本發明第二、三、Page 25 200537257 Brief description of the drawings [Simplified description of the drawings] FIG. 1 is a conceptual diagram of the first embodiment of the exposure apparatus of the present invention. Fig. 2 is a perspective view illustrating the structure and operation of the optical switch. Fig. 3 is an explanatory diagram showing the relationship between the scanning position of the laser beam and the photographing position of the photographing mechanism. Fig. 4 is a block diagram showing the first half of the processing system in the internal configuration of the image processing section. Fig. 5 is a block diagram showing the second half of the processing system in the internal configuration of the image processing section. φ Figure 6 is an explanatory diagram showing the relationship between the black .matrix and laser beam scanning trajectory that move orthogonally in the laser beam scanning direction. FIG. 7 is a flowchart illustrating the sequence of the pattern forming method of the present invention. 'Figure 8 is an explanatory diagram showing a method of binarizing the output of the circular buffer memory. Fig. 9 is an explanatory diagram showing an image of an exposure start position preset on a black matrix pixel and an observation platform thereof. Fig. 10 is an explanatory diagram showing a relationship between a reference position set in advance on a black matrix pixel and a camera mechanism element. Fig. 11 is an explanatory diagram showing a portrait of the end-of-exposure • 0 set on a black matrix pixel and its observation platform. Fig. 12 is an explanatory diagram showing a method for detecting an exposure position on the pixel in the glass substrate conveying direction. Fig. 13 is an explanatory diagram showing a laser beam scanning position correction method. • Figures 14 to 17 show the second, third, and

200537257 圖式簡單說明四、五實施形態主要部份之概念圖。【主要元件符號說明】 1 :曝光裝置 2 :雷射光源 3 :曝光光學系 4 :搬運機構 5 ·.攝影機構 6 :背面照射機構 . 7 :光學控制機構 8 :玻璃基板 9 :光開關 1 0 :偏光機構， 1 1 :第一鏡子 1 2 :多角鏡 1 3 ·. f 0透鏡 1 4 :第二鏡子 . 1 5 A :第一偏光元件 1 5 C :第二偏光元件 1 6 :電器光學調變器 1 7 :行傳感器 * 1 8 :站台 1 9 :搬運滾輪 2 0 :搬運驅動部 2 1 :黑色矩陣 2 2 :畫素 2 3 :光源驅動部 2 4 ·.光開關控制器 2 5 A :光偏向機構驅動部 2 5 B ·.多角型驅動部 2 6 :搬運控制器 27 :背面光控制器 28 : A/D變換部 2 9 :畫像處理部 3 0 :記憶部 -φ 3 1 :調變數據製成處理部 3 2 :控制部 3 3 A，3 3 B，3 3 C :環狀緩衝記憶體 3 5 :比較回路 34A，34B，34C ·.行緩衝記憶體 3 6 :曝光開始位置判定回路 3 7 :曝光終了位置判定回路 3 8 A :計數回路200537257 Schematic illustrations The conceptual diagrams of the main parts of the fourth and fifth implementation forms. [Description of Symbols of Main Components] 1: Exposure device 2: Laser light source 3: Exposure optics 4: Transport mechanism 5 · Photographing mechanism 6: Back-illuminating mechanism 7: Optical control mechanism 8: Glass substrate 9: Light switch 1 0 : Polarizing mechanism, 1 1: First mirror 1 2: Polygon mirror 1 3 ·. F 0 Lens 1 4: Second mirror. 1 5 A: First polarizing element 1 5 C: Second polarizing element 16: Electrical optics Modulator 1 7: Row sensor * 1 8: Platform 1 9: Carrying roller 2 0: Carrying driving section 2 1: Black matrix 2 2: Pixel 2 3: Light source driving section 2 4 ... Optical switch controller 2 5 A: Light deflection mechanism drive unit 2 5 B. Polygonal drive unit 2 6: Transport controller 27: Back light controller 28: A / D conversion unit 2 9: Image processing unit 3 0: Memory unit-φ 3 1 : Modulation data creation processing unit 3 2: Control unit 3 3 A, 3 3 B, 3 3 C: Ring buffer memory 3 5: Comparison circuit 34A, 34B, 34C · Line buffer memory 3 6: Exposure Start position determination circuit 3 7: End-of-exposure position determination circuit 3 8 A: Counting circuit

第27頁 200537257Page 27 200537257

第28頁Page 28

Claims

200537257 六、申請專利範圍 1 . 一種曝光裝置，係以曝光光學系將光束對著被曝光體相對的掃描，而在該被曝光體上直接暴露機能性圖型者，其具備有：對該被曝光體而言係配置於該曝光光學系之同側，而且沿著該被曝光體搬運方向，而在該雷射光束掃描位置前側為攝影位置，來攝取預先形成於該被曝光體之曝光位置、上做為基準的機能性圖型之攝影機構；配置於該被曝光體上下方向至少一方向，以照明該做 •為基準的機能性圖型，而使該攝影機構得以攝影的照明機 •;及檢出該攝影機構所攝取的該做為基準的該機能性圖型上預先設定為基準位置，並以該基準位置為基準來控制該光束的照射開始或照射停止的光學系控制機構。 2. 如申請專利範圍第1項之曝光裝置，其中所述照明機構係配置於對該被曝光體在該攝影機構之同側。 3. 如申請專利範圍第1項之曝光裝置，其中所述被曝光體為透明基板，該照明機構對該被曝光體係配置於該攝影機構之相反側。 4. 如申請專利範圍第1項之曝光裝置，其中所述照明 φ；構對該被曝光體配設於上下方向兩側，而可交替使用者。 5. 一種曝光裝置，藉曝光光學系對透明的被曝光體相對掃描光束，而直接曝露機能性圖型於該被曝光體上的曝光位置，其具有：200537257 VI. Application for Patent Scope 1. An exposure device that scans a light beam relative to an object to be exposed with an exposure optical system, and directly exposes a functional pattern on the object to be exposed, which includes: The exposure body is arranged on the same side of the exposure optical system, and along the conveyance direction of the exposed body, the photographing position is taken in front of the laser beam scanning position to capture the exposure position formed in advance on the exposed body. A functional photographic mechanism that is used as a reference; a lighting mechanism that is arranged in at least one of the up and down directions of the exposed object to illuminate the functional pattern that is used as a reference to enable the photographic mechanism to take pictures. And an optical system control mechanism that detects the functional pattern taken by the photographing agency as a reference and presets it as a reference position, and uses the reference position as a reference to control the start or stop of irradiation of the light beam. 2. The exposure device according to item 1 of the patent application scope, wherein the illumination mechanism is disposed on the same side of the exposure object as the photographing mechanism. 3. The exposure device according to item 1 of the patent application scope, wherein the object to be exposed is a transparent substrate, and the illumination mechanism is arranged on the opposite side of the exposure system from the exposure system. 4. The exposure device according to item 1 of the patent application scope, wherein the illumination φ is arranged on both sides of the object to be exposed, and can be used alternately. 5. An exposure device that directly exposes a functional pattern on an exposed position of an exposed object by scanning a light beam relative to a transparent object with an exposure optical system, which has:

第29頁 200537257 六、申請專利範圍配置於對該被曝光體在該曝光光學系相反側，而在該被曝光體搬運方向且在該光束掃描前方為攝影位置，已攝取預先形成於該被曝光體曝光位置上做為基準的機能性圖型的攝影機構；配置於對該被曝光體上下方向的至少一側，而用以照明該做為基準的機能性圖型，俾使該攝影機構得以攝影的 .照明機構；及檢出該攝影機構所攝得的該做為基準之機能性圖型上預先設定的基準位置，並以該基準位置為基準來控制該光 ^的照射開始或照射停止的光學系控制機構。 ^ 6.如申請專利範圍第5項之曝光裝置，其中所述照明機構係配置於對該被曝光體在該攝影機構之同側。 7. 如申請專利範圍第5項之曝光裝置，其中所述照明機構係配置於對該被曝光體在該攝影機構之相反側。 8. 如申請專利範圍第5項之曝光裝置，其中所述照明機構對該被曝光體配設於上下方向兩側，而可交替使用者0Page 29 200537257 VI. The scope of the patent application is arranged on the opposite side of the exposed object to the exposure optical system, and in the transport direction of the exposed object and in front of the beam scanning is the photographing position, which has been taken and formed in advance on the exposed A photographic mechanism with a functional pattern as a reference at the body exposure position; it is arranged on at least one side in the up-down direction of the exposed object, and is used to illuminate the functional pattern as the reference, so that the photographic mechanism can A lighting mechanism for photographing; and detecting a preset reference position on a functional pattern taken as a reference by the photographing mechanism, and controlling the irradiation start or stop of the light using the reference position as a reference Optical system control mechanism. ^ 6. The exposure device according to item 5 of the scope of patent application, wherein the illumination mechanism is disposed on the same side of the exposure object as the photography mechanism. 7. The exposure device according to item 5 of the scope of patent application, wherein the illumination mechanism is disposed on the opposite side of the object to be exposed from the photographing mechanism. 8. For the exposure device according to item 5 of the application for a patent, wherein the illumination mechanism is arranged on both sides of the object to be exposed, and can be used alternately.