TWI369422B - Vitreous silica crucible - Google Patents

Vitreous silica crucible

Info

Publication number
TWI369422B
TWI369422B TW099143495A TW99143495A TWI369422B TW I369422 B TWI369422 B TW I369422B TW 099143495 A TW099143495 A TW 099143495A TW 99143495 A TW99143495 A TW 99143495A TW I369422 B TWI369422 B TW I369422B
Authority
TW
Taiwan
Prior art keywords
vitreous silica
silica crucible
crucible
vitreous
silica
Prior art date
Application number
TW099143495A
Other languages
English (en)
Other versions
TW201131027A (en
Inventor
Toshiaki Sudo
Hiroshi Kishi
Makiko Kodama
Original Assignee
Japan Super Quartz Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Super Quartz Corp filed Critical Japan Super Quartz Corp
Publication of TW201131027A publication Critical patent/TW201131027A/zh
Application granted granted Critical
Publication of TWI369422B publication Critical patent/TWI369422B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
    • C30B35/002—Crucibles or containers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
    • C03C23/0025—Other surface treatment of glass not in the form of fibres or filaments by irradiation by a laser beam
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/10—Crucibles or containers for supporting the melt
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C30B29/06—Silicon
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10—Apparatus
    • Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
    • Y10T117/1032—Seed pulling

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Glass Melting And Manufacturing (AREA)
TW099143495A 2009-12-11 2010-12-13 Vitreous silica crucible TWI369422B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009282138 2009-12-11

Publications (2)

Publication Number Publication Date
TW201131027A TW201131027A (en) 2011-09-16
TWI369422B true TWI369422B (en) 2012-08-01

Family

ID=44145718

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099143495A TWI369422B (en) 2009-12-11 2010-12-13 Vitreous silica crucible

Country Status (7)

Country Link
US (1) US9115445B2 (zh)
EP (1) EP2385157B1 (zh)
JP (1) JP4875229B2 (zh)
KR (1) KR101248915B1 (zh)
CN (1) CN102325928B (zh)
TW (1) TWI369422B (zh)
WO (1) WO2011071176A1 (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013079555A1 (de) * 2011-11-30 2013-06-06 Bayer Intellectual Property Gmbh Formkörper mit hoher oberflächengüte
DE102012109181B4 (de) 2012-09-27 2018-06-28 Heraeus Quarzglas Gmbh & Co. Kg Ziehen eines Halbleiter-Einkristalls nach dem Czochralski-Verfahren und dafür geeigneter Quarzglastiegel
CN103526280A (zh) * 2013-10-12 2014-01-22 南通路博石英材料有限公司 一种内表面具有凹槽拉晶用石英玻璃坩埚的制备方法
JP6546721B2 (ja) * 2014-05-19 2019-07-17 信越石英株式会社 単結晶シリコン引き上げ用石英ガラスるつぼ
JP6336867B2 (ja) * 2014-09-22 2018-06-06 株式会社Sumco ルツボ測定装置
CN107287652A (zh) * 2017-05-29 2017-10-24 德令哈晶辉石英材料有限公司 一种抑制熔融硅液面振动的石英坩埚及其制备方法
CN108977879B (zh) * 2018-09-13 2021-02-26 浙江美晶新材料有限公司 一种单晶用高纯石英坩埚及其制备方法
CN110656370A (zh) * 2019-11-06 2020-01-07 西安奕斯伟硅片技术有限公司 一种坩埚
KR20230153383A (ko) * 2021-03-05 2023-11-06 신에쯔 세끼에이 가부시키가이샤 석영유리 도가니의 평가방법 및 제조방법 그리고 석영유리 도가니

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE8225484U1 (de) * 1982-09-10 1984-01-05 Martin Merkel GmbH & Co KG, 2102 Hamburg Abstreifring
JP2766330B2 (ja) * 1989-08-25 1998-06-18 旭電化工業株式会社 結晶性高分子材料組成物
JP2533643Y2 (ja) * 1989-12-06 1997-04-23 三菱マテリアル 株式会社 シリコン単結晶引上げ用石英ルツボ
JPH08245230A (ja) * 1995-03-09 1996-09-24 Toshiba Ceramics Co Ltd 半導体製造プロセス用石英ガラス製品及びその製造方法
DE19917288C2 (de) * 1999-04-16 2001-06-28 Heraeus Quarzglas Quarzglas-Tiegel
JP4086283B2 (ja) 2002-07-31 2008-05-14 信越石英株式会社 シリコン単結晶引上げ用石英ガラスルツボおよびその製造方法
JP4338990B2 (ja) * 2003-02-21 2009-10-07 ジャパンスーパークォーツ株式会社 石英ガラスルツボ及びこれを用いたシリコン単結晶の引き上げ方法
JP4994576B2 (ja) * 2004-03-23 2012-08-08 コバレントマテリアル株式会社 シリカガラスルツボ
KR100847500B1 (ko) * 2006-03-30 2008-07-22 코바렌트 마테리얼 가부시키가이샤 실리카 유리 도가니
JP5181178B2 (ja) 2007-09-12 2013-04-10 Ｓｕｍｃｏ Ｔｅｃｈｘｉｖ株式会社 半導体単結晶製造装置における位置計測装置および位置計測方法
JP5273512B2 (ja) 2007-10-25 2013-08-28 株式会社Ｓｕｍｃｏ 石英ガラスルツボとその製造方法および用途
JP4799536B2 (ja) * 2007-12-14 2011-10-26 ジャパンスーパークォーツ株式会社 大径のシリコン単結晶インゴット中のピンホール欠陥の低減を可能とする大径シリコン単結晶インゴット引上げ用高純度石英ガラスルツボ
WO2009107834A1 (ja) * 2008-02-29 2009-09-03 ジャパンスーパークォーツ株式会社 シリコン単結晶引上げ用石英ルツボ及びその製造方法

Also Published As

Publication number Publication date
JPWO2011071176A1 (ja) 2013-04-22
US20120260852A1 (en) 2012-10-18
KR101248915B1 (ko) 2013-04-01
EP2385157B1 (en) 2015-02-11
CN102325928A (zh) 2012-01-18
KR20110119730A (ko) 2011-11-02
US9115445B2 (en) 2015-08-25
WO2011071176A1 (ja) 2011-06-16
EP2385157A1 (en) 2011-11-09
CN102325928B (zh) 2014-02-26
TW201131027A (en) 2011-09-16
EP2385157A4 (en) 2012-08-22
JP4875229B2 (ja) 2012-02-15

Similar Documents

Publication Publication Date Title
TWI369422B (en) Vitreous silica crucible
EP2452926A4 (en) GLASS
HK1202642A1 (zh) 眼鏡
IL206987A0 (en) Glass frits
HK1165239A1 (zh) 品嘗用玻璃杯
EP2604583A4 (en) LI2O-Al2o3-Sio2-BASED CRYSTALLIZED GLASS
EP2248776A4 (en) QUARTZ GLASS CRUCIBLE
EP2412684A4 (en) OPTICAL FLUORPHOSPHATE GLASS
PL2496340T3 (pl) Dyspersja krzemionki
EP2410081A4 (en) SILICONE GLASS BAR AND METHOD FOR THE PRODUCTION THEREOF
GB0902551D0 (en) Glazing
ZA201106115B (en) Glass sheet
AU327693S (en) Champagne glass
EP2433915A4 (en) COLORLESS GLASS COMPOSITION
EP2385156A4 (en) GLASS CREEK OF SILICE
EP2518030A4 (en) TIO2-CONTAINING QUARTZ GLASS
EP2351716A4 (en) GLASS
GB2471709B (en) Furnace
GB0900081D0 (en) Glass block
EP2426784A4 (en) GLASS ANTENNA
EP2799597A4 (en) SILICON GLASS CRUCIBLE
PL2403813T3 (pl) Barwione płatki szklane
ZA201204479B (en) Nose support for glasses
GB0909708D0 (en) Glass gauge
GB0903395D0 (en) Ordered mesoporous silica material

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees