TWI351318B - Chemical injector and apparatus for processing a s - Google Patents
Chemical injector and apparatus for processing a s Download PDFInfo
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- TWI351318B TWI351318B TW098114491A TW98114491A TWI351318B TW I351318 B TWI351318 B TW I351318B TW 098114491 A TW098114491 A TW 098114491A TW 98114491 A TW98114491 A TW 98114491A TW I351318 B TWI351318 B TW I351318B
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Nonlinear Science (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Spray Control Apparatus (AREA)
- Infusion, Injection, And Reservoir Apparatuses (AREA)
Description
13513181351318
* TW5445PA 六、發明說明： 【發明所屬之技術領域】 本發明是有關於一種化學物質射出器以及包括該化 學物質射出器之處理基底之裝置，且特別是有關於一種化 學物質射出器，將化學物質射出至移動之基底，以及包括 該化學物質射出器之處理基底之裝置。 【先前技術】 φ 通常，平面顯示裝置為廣為使用之半導體積體電路裝 置之一，係通常經由一系列單元製程，例如在玻璃基底上 附著製程，在該玻璃基底上之薄層進行微影照相製程以形 成光罩圖案，使用該光罩圖案對該薄層蝕刻製程，以及從 晶圓去除殘留物與污染物之清潔製程。 蝕刻製程與清潔製程可在一處理室中使用各種化學 物質進行。包括一薄層與光罩之晶圓由移動單元移至處理 室中，且隨著蝕刻製程與清潔製程，化學物質經由處理基 φ 底之裝置之化學物質射出器提供至晶圓。 習知化學物質射出器包括一供應管，從處理裝置之外 側提供化學物質，以及一射出管，連接至供應管，且包括 垂直連接於射出管之複數喷頭，將化學物質射出至處理室 中之晶圓。 複數射出管係隨著晶圓尺寸而彼此平行連接於供應 管。每一射出管在處理室中擺動，因而固定於射出管之喷 頭也隨著射出管擺動。因此，化學物質均勻射出至處理室 中之晶圓。 3 1351318 TW5445PA ' ' 對於射出管之擺動，驅動單元安裝於每一射出管相反 於供應管之末端部，提供射出管驅動動力。例如，射出管 由單一驅動單元同時擺動。 然而，隨著晶圓尺寸增大，射出管加長，且射出管之 數量增加，單一驅動單元不足以驅動所有射出管。 因此，射出管無法由驅動單元充分擺動，且化學物質 無法均勻射出至晶圓。 【發明内容】 因此，實施例提供一種裝置，用以將化學物質射出， 其中射出管係由一驅動單元穩定擺動。 實施例更提供一種處理基底之裝置，包括上述化學物 質射出裝置。 根據實施例，提供一種化學物質射出器，包括第一與 第二射出管以及介於該第一與第二射出管之間之驅動單 元。第一與第二射出管可排列在同一線上，使得該第一與 第二射出管之上端部彼此相鄰接，且分別包括第一與第二 射出喷頭，化學物質經由該第一與第二射出喷頭射出至一 基底。驅動單元可介於該第一與第二射出管之間，且施加 驅動動力至該第一與第二射出管鄰接之該上端部，以擺動 該第一與第二射出管。 在一實施例中，該第一與第二射出管分別包括第一與 第二受驅板，位於該上端部，且該驅動單元包括一驅動 板，介於該第一與第二受驅板之間，其中該驅動動力係從 該驅動板傳輸至該第一與第二受驅板。 1351318 * TW5445PA* 在一實施例中，該驅動板與該第一與第二受驅板包括 圍繞一轉動轴之複數磁性構件，使得該驅動動力係做為磁 力而從該驅動板傳輸至該第一與第二受驅板。 在一實施例中，該驅動單元包括馬達，產生該驅動動 力；以及動力傳輸構件，連接至該馬達與該驅動板，且將 該馬達之轉動轉換成線性往復運動，因而將該線性往復運 動從該馬達傳輸至該驅動板，使得該驅動板進行擺動動 作。 • 例如，該動力傳輸構件包括：偏心輪，由該馬達產生 之該驅動動力轉動；以及連桿，線性連接該偏心輪之第一 偏心部以及該驅動板之第二偏心部，且將該馬達之轉動轉 換成該線性往復運動。 在一實施例中，該驅動板包括：第一板，連接至該動 力傳輸構件且面對該第一受驅板；以及第二板，在一中心 軸上連接至該第一板，且面對該第二受驅板，使得該第二 板與該第一板一同進行該擺動動作。 • 在一實施例中，化學物質射出器可更包括一箱，包括 該動力傳輸構件與該驅動板。例如，該箱之一側壁係介於 該驅動板與該第一受驅板之間以及該驅動板與該第二受 驅板之間，使得該驅動板分別經由該箱之該側壁面對該第 一與第二受驅板。 在一實施例中，化學物質射出器可更包括平行於該第 一射出管之第三射出管以及平行於該第二射出管之第四 射出管，該第三與第四射出管包括第三與第四射出喷頭， 化學物質經由該第三與第四射出喷頭射出至該基底。 5 1351318 TW5445PA 1 * 又，化學物質射出器可更包括擺動傳輸構件，將該第 一射出管連接於該第三射出管以及將該第二射出管連接 於該第四射出管，以將該第一射出管之該擺動動作傳輸至 該第三射出管，且將該第二射出管之該擺動動作傳輸至該 第四射出管。 在一實施例中，該第一、第二、第三與第四射出喷頭 係突出朝向該基底，且該擺動傳輸構件將該第一射出喷頭 連結於該第三射出喷頭以及將該第二射出喷頭連結於該 第四射出喷頭。 在一實施例中，該擺動傳輸構件包括至少一對驅動齒 輪與受驅齒輪，分別將該第一與第二射出喷頭之該擺動動 作傳輸至該第三與第四射出喷頭。 在一實施例中，該擺動傳輸構件包括一齒條和複數小 齒輪，分別將該第一與第二射出喷頭之該擺動動作傳輸至 該第三與第四射出喷頭。 根據某些實施例，提供一種裝置，將化學物質射出至 一基底，包括第一與第二射出管、驅動單元以及擺動傳輸 構件。第一與第二射出管彼此平行，且分別包括第一與第 二射出喷頭，化學物質經由該第一與第二射出喷頭射出至 該基底。驅動單元施加驅動動力至該第一射出管之末端 部，以擺動該第一射出管。擺動傳輸構件將該第二射出管 連接於該第一射出管，且將該第一射出管之擺動動作傳輸 至該第二射出管。 在一實施例中，該第一與第二射出喷頭係突出朝向該 基底，且該擺動傳輸構件將該第二射出喷頭連結於該第一 1351318 1 TW5445PA1 射出喷頭。 在一實施例中，該擺動傳輸構件包括至少一對驅動齒 輪與受驅齒輪，分別將該第一射出喷頭之該擺動動作傳輸 至該第二射出喷頭。 在一實施例中，該擺動傳輸構件包括一齒條和複數小 齒輪，分別將該第一射出喷頭之該擺動動作傳輸至該第二 射出喷頭。 根據某些實施例，提供一種處理基底之裝置，包括一 φ 處理槽，第一與第二供應管，第一與第二射出管以及驅動 單元。處理槽提供處理該基底之空間。第一與第二供應管 從該處理槽之外部延伸至該處理槽之内部彼此平行，化學 物質從該處理槽之外部經由該第一與第二供應管供應至 該處理槽。第一與第二射出管分別垂直連接於該第一與第 二供應管，且排列在同一線上，使得該第一與第二射出管 之上端部彼此相鄰接，該第一與第二射出管分別包括第一 與第二射出噴頭，化學物質經由該第一與第二射出喷頭射 • 出至該基底。驅動單元介於該第一與第二射出管之間，且 施加驅動動力至該第一與第二射出管鄰接之該上端部，以 擺動該第一與第二射出管。 在一實施例中，該第一與第二射出管分別包括第一與 第二受驅板，位於該上端部，且該驅動單元包括一驅動 板，介於該第一與第二受驅板之間，其中該驅動動力係從 該驅動板傳輸至該第一與第二受驅板。 在一實施例中，該驅動單元包括馬達，產生該驅動動 力；以及動力傳輸構件，連接至該馬達與該驅動板，且將 7 1351318 TW5445PA * * 該馬達之轉動轉換成線性往復運動，因而將該線性往復運 動從該馬達傳輸至該驅動板，使得該驅動板進行擺動動 作。 在一實施例中，該裝置更包括耦合器，介於該第一供 應管與第一射出管之間以及該第二供應管與第二射出管 之間，使得在化學物質分別從該第一與第二供應管流經該 第一與第二射出管時，由該驅動單元可擺動該第一與第二 射出管。 根據某些實施例，提供一種處理基底之裝置，包括一 處理槽，複數供應管，第一與第二射出管，驅動單元以及 擺動傳輸構件。處理槽提供處理該基底之空間。供應管從 該處理槽之外部延伸至該處理槽之内部彼此平行，化學物 質從該處理槽之外部經由該等供應管供應至該處理槽。第 一與第二射出管分別垂直連接於該等供應管，且彼此平行 排列，該第一與第二射出管分別包括第一與第二射出喷 頭，化學物質經由該第一與第二射出喷頭射出至該基底。 驅動單元施加驅動動力至該第一射出管之末端部，以擺動 該第一射出管。擺動傳輸構件將該第二射出管連接於該第 一射出管，且將該第一射出管之擺動動作傳輸至該第二射 出管。 根據某些實施例，第一與第二射出管排列在同一線 上，且驅動動力在介於該第一與第二射出管之間之共同區 域施加至第一與第二射出管，因而相較於當第一與第二射 出管一體成形且驅動動力施加於末端部，增加射出管擺動 動作之穩定性。 1351318 TW5445PA1 另外，上述設置中，化學物質經由第一與第二射出管 之兩個通道射出至基底，可有利於近來大尺寸化之基底。 亦即，由於第一與第二射出管，化學物質可穩定均勻地提 供至大尺寸基底，因而增進基底品質。 為讓本發明之上述内容能更明顯易懂，下文特舉一較 佳實施例，並配合所附圖式，作詳細說明如下： 【實施方式】 以下請參照相關圖式，詳細說明本發明適用之具體實 施例。然而，本發明可適用於各種不同形態，不應限定於 所揭露之實施例。實施例係用以揭露完整之技術，且提供 熟悉此技藝之人士本發明之技術，且提供熟悉此技藝之人 士本發明之完整内容。在圖式中，塗層與區域之尺寸及相 關比例可能因明確繪示而誇大。 當元件或塗層之說明係為「在其上」、「連結於」或「接 續於」另一元件或塗層時，可為直接在其上、連結或接續， 也可有中介之元件或塗層。相反地，當元件之說明係為「直 接在其上」、「直接連結於」或「直接接續於」另一元件或 塗層時，沒有中介之元件或塗層。相同之標號係標示相同 之元件。名詞「及/或」係包括所列出項目之任何所有組 合。 雖然說明中可能採用第一、第二、第三等名詞描述各 種元件、配件、區域、塗層及/或區段，這些元件、配件、 區域、塗層及/或區段不應限定於此。上述名詞僅用於區 i 9* TW5445PA VI. Description of the Invention: [Technical Field] The present invention relates to a chemical substance injector and a device comprising the same, and in particular to a chemical substance injector, The substance is ejected to the moving substrate and the device comprising the processing substrate of the chemical emitter. [Prior Art] φ Generally, a flat display device is one of widely used semiconductor integrated circuit devices, which is usually lithographically deposited on a thin layer of a glass substrate via a series of unit processes, for example, a process attached to a glass substrate. The photographic process forms a reticle pattern, the etch mask process is used to etch the thin layer, and the cleaning process for removing residues and contaminants from the wafer. The etching process and the cleaning process can be carried out using a variety of chemicals in a processing chamber. The wafer including a thin layer and a reticle is moved from the moving unit to the processing chamber, and with the etching process and the cleaning process, the chemical is supplied to the wafer via the chemical emitter of the apparatus of the processing substrate. The conventional chemical injector includes a supply tube for supplying chemicals from the outside of the processing device, and an injection tube connected to the supply tube, and including a plurality of nozzles vertically connected to the injection tube to eject the chemical into the processing chamber. Wafer. The plurality of injection tubes are connected to the supply tube in parallel with each other in accordance with the wafer size. Each of the injection tubes is swung in the processing chamber, so that the nozzles fixed to the injection tubes also oscillate with the injection tubes. Therefore, the chemical is evenly emitted to the wafer in the processing chamber. 3 1351318 TW5445PA ' ' For the swing of the injection tube, the drive unit is mounted at the end of each injection tube opposite to the supply tube to provide the injection tube drive power. For example, the injection tube is simultaneously oscillated by a single drive unit. However, as the wafer size increases, the exit tube lengthens, and the number of shot tubes increases, a single drive unit is not sufficient to drive all of the shot tubes. Therefore, the injection tube cannot be sufficiently swung by the driving unit, and the chemical substance cannot be uniformly emitted to the wafer. SUMMARY OF THE INVENTION Accordingly, embodiments provide an apparatus for ejecting a chemical substance, wherein the ejection tube is stably oscillated by a driving unit. The embodiment further provides an apparatus for treating a substrate, comprising the above chemical substance ejection device. According to an embodiment, a chemical injector is provided comprising first and second injection tubes and a drive unit interposed between the first and second injection tubes. The first and second injection tubes may be arranged on the same line such that the upper ends of the first and second injection tubes are adjacent to each other, and respectively include first and second injection nozzles, and the first and second chemical substances are passed through the first and the second The two injection nozzles are ejected to a substrate. The driving unit may be interposed between the first and second injection tubes, and apply driving power to the upper end portion adjacent to the first and second injection tubes to swing the first and second injection tubes. In an embodiment, the first and second exit tubes respectively include first and second driven plates at the upper end, and the driving unit includes a driving board between the first and second driven boards Between the driving powertrains being transmitted from the driving board to the first and second driven boards. 1351318 * TW5445PA* In one embodiment, the drive plate and the first and second driven plates comprise a plurality of magnetic members surrounding a rotating shaft such that the driving power is transmitted as magnetic force from the driving plate to the first One and the second driven board. In one embodiment, the driving unit includes a motor to generate the driving power; and a power transmitting member coupled to the motor and the driving plate, and converting the rotation of the motor into a linear reciprocating motion, thereby the linear reciprocating motion The motor is transmitted to the drive plate such that the drive plate performs a swinging motion. • For example, the power transmission member includes: an eccentric wheel, the driving power rotation generated by the motor; and a connecting rod linearly connecting the first eccentric portion of the eccentric wheel and the second eccentric portion of the driving plate, and the motor The rotation is converted into the linear reciprocating motion. In an embodiment, the driving board includes: a first board connected to the power transmission member and facing the first driven board; and a second board connected to the first board on a central axis, and The second driven plate is caused to perform the swinging motion together with the first plate. • In an embodiment, the chemical injector may further include a box including the power transmitting member and the drive plate. For example, one side wall of the box is interposed between the driving board and the first driven board and between the driving board and the second driven board, such that the driving board faces the side through the side wall of the box respectively First and second driven plates. In an embodiment, the chemical injector may further include a third injection tube parallel to the first injection tube and a fourth injection tube parallel to the second injection tube, the third and fourth injection tubes including a third And the fourth injection nozzle, the chemical substance is emitted to the substrate through the third and fourth injection nozzles. 5 1351318 TW5445PA 1 * Further, the chemical substance injector may further include a swing transmission member, the first injection tube being connected to the third injection tube and the second injection tube being connected to the fourth injection tube to The oscillating motion of an ejection tube is transmitted to the third ejection tube, and the oscillating motion of the second ejection tube is transmitted to the fourth ejection tube. In one embodiment, the first, second, third, and fourth injection nozzles protrude toward the base, and the swing transmission member connects the first injection nozzle to the third injection nozzle and The second injection nozzle is coupled to the fourth injection nozzle. In one embodiment, the oscillating transmission member includes at least one pair of drive gears and driven gears for transmitting the oscillating motions of the first and second injection nozzles to the third and fourth injection nozzles, respectively. In one embodiment, the oscillating transmission member includes a rack and a plurality of pinions for transmitting the oscillating motion of the first and second ejection nozzles to the third and fourth ejection nozzles, respectively. According to some embodiments, a device is provided for ejecting chemicals to a substrate, including first and second injection tubes, a drive unit, and a oscillating transport member. The first and second injection tubes are parallel to each other and include first and second injection nozzles, respectively, through which the chemical is injected to the substrate. The drive unit applies driving power to an end portion of the first injection tube to swing the first injection tube. The oscillating transmission member connects the second injection pipe to the first injection pipe, and transmits the oscillating motion of the first injection pipe to the second injection pipe. In one embodiment, the first and second ejection nozzles project toward the substrate, and the oscillating transmission member couples the second ejection nozzle to the first 1351318 1 TW5445PA1 injection nozzle. In one embodiment, the oscillating transmission member includes at least one pair of drive gears and driven gears for respectively transmitting the oscillating motion of the first injection nozzle to the second injection nozzle. In one embodiment, the oscillating transmission member includes a rack and a plurality of pinions for respectively transmitting the oscillating motion of the first ejection head to the second ejection head. According to some embodiments, an apparatus for processing a substrate is provided, including a φ processing tank, first and second supply tubes, first and second injection tubes, and a drive unit. The processing tank provides space to process the substrate. The first and second supply tubes extend from the outside of the processing tank to the inside of the processing tank in parallel with each other, and chemicals are supplied from the outside of the processing tank to the processing tank via the first and second supply tubes. The first and second injection tubes are vertically connected to the first and second supply tubes, respectively, and are arranged on the same line such that the upper ends of the first and second ejection tubes are adjacent to each other, and the first and second ejections are respectively The tubes respectively include first and second injection nozzles through which the chemical is emitted to the substrate. The driving unit is interposed between the first and second injection pipes, and applies driving power to the upper end portion adjacent to the first and second injection pipes to swing the first and second injection pipes. In an embodiment, the first and second exit tubes respectively include first and second driven plates at the upper end, and the driving unit includes a driving board between the first and second driven boards Between the driving powertrains being transmitted from the driving board to the first and second driven boards. In an embodiment, the driving unit includes a motor to generate the driving power; and a power transmission member coupled to the motor and the driving plate, and converting the rotation of the motor to a linear reciprocating motion, thereby The linear reciprocating motion is transmitted from the motor to the drive plate such that the drive plate performs a swinging motion. In an embodiment, the apparatus further includes a coupler between the first supply pipe and the first injection pipe and between the second supply pipe and the second injection pipe, so that the chemical substances are respectively from the first The first and second injection tubes are swingable by the drive unit when the second supply tube flows through the first and second injection tubes. According to some embodiments, an apparatus for processing a substrate is provided, comprising a processing tank, a plurality of supply tubes, first and second injection tubes, a drive unit, and a oscillating transmission member. The processing tank provides space to process the substrate. The supply pipe extends from the outside of the treatment tank to the inside of the treatment tank in parallel with each other, and chemicals are supplied from the outside of the treatment tank to the treatment tank via the supply pipes. The first and second injection tubes are vertically connected to the supply tubes, respectively, and are arranged in parallel with each other. The first and second injection tubes respectively include first and second injection nozzles, and the chemical substances are emitted through the first and second portions. The showerhead is ejected to the substrate. The driving unit applies driving power to a distal end portion of the first injection tube to swing the first injection tube. The oscillating transmission member connects the second injection pipe to the first injection pipe, and transmits the oscillating motion of the first injection pipe to the second injection pipe. According to some embodiments, the first and second injection tubes are arranged on the same line, and the driving power is applied to the first and second injection tubes in a common area between the first and second injection tubes, thereby comparing When the first and second injection tubes are integrally formed and the driving power is applied to the distal end portion, the stability of the swinging motion of the injection tube is increased. 1351318 TW5445PA1 Further, in the above arrangement, the chemical substance is emitted to the substrate through the two passages of the first and second injection tubes, which is advantageous for the recently large-sized substrate. That is, since the first and second injection tubes, the chemical substance can be stably and uniformly supplied to the large-sized substrate, thereby improving the quality of the substrate. In order to make the above-mentioned contents of the present invention more comprehensible, the following description of the preferred embodiments and the accompanying drawings will be described in detail as follows: [Embodiment] Hereinafter, the present invention will be described in detail with reference to the related drawings. Specific embodiment. However, the invention is applicable to a variety of different forms and should not be limited to the disclosed embodiments. The embodiments are used to disclose the complete technology, and the technology of the present invention is provided by those skilled in the art, and the entire contents of the present invention are provided by those skilled in the art. In the drawings, the size and relative proportions of the coating and the area may be exaggerated due to the explicit depiction. When the description of a component or coating is "on," "connected to," or "connected to" another element or coating, it may be directly on, connected or connected, or may have an intervening component or coating. On the contrary, when the description of the component is "directly connected", "directly connected" or "directly connected" to another component or coating, there is no intervening component or coating. The same reference numerals are used to identify the same elements. The term "and/or" includes any and all combinations of the listed items. Although the terms first, second, third, etc. may be used in the description to describe various elements, components, regions, coatings and/or sections, these elements, components, regions, coatings and/or sections are not limited thereto. . The above nouns are only used in the district i 9
TVV5445PA 分不同之元件、配件 '區域 ., 下所述之第-元件、配件、區域= 或區段。因此4 脫離本發明之教示之下做為二、θ及/或區段可在不 及/或區段。 ’·、 一凡件、配件、區域、塗層 空間性相對名詞，例如「在复下 尚於」等，可用以便於 」低於」、「在其上」、 徵在圖式中緣示之相對關與其他元件或特 蓋裝置除圖示,χ外在使用或=間性相對名詞係為涵 言，若圖中之裝置被反置，所述之方向。舉例而 或「較高」。因此，實施例中件或特徵「之上」 其上與其下。裝置也 在其下」可涵蓋在 他方向），故空間性相對名:向放置（旋轉90度或其 η生相對名η也需做對應 所使用之名詞僅為描述特 。 限制本發明。如下所述，除_容财實=:且，用以 二二與「該」係為包括複數。使用於=:書;t :牛數、步驟、操作一或 配：之存在’但並未限制一或多個其他特徵、整數、步驟、 ㈣、7C件、配件及/或群組之存在或添加。 中ΓΓ之實施例係以做為本發明理想化實施例（及其 中間4)之不意圖之剖面圖顯示。如此，製造技術及/ 或公差等圖式形狀之改變係可預期之。因此，本發明之實 施例並非用以限制區域之特殊形狀，而應包括製造時等形 狀之變形。舉例而言，圖示為矩形之植入區域通常在其邊 緣具有圓肖或❹之特徵及/或植人濃度之梯度而非從植 1351318 ‘ TW5445PA· 入到未植入區域之二元化改變。相似地，由植入形成之埋 入區域可能導致埋入區域與植入所進行之表面之間區域 產生部分植入。因此，圖式中之區域係為示意，其形狀並 非裝置之區域實際形狀，也非用以限定本發明之範圍。 除非另行定義，在此使用之所有名詞（包括技術與科 學名詞）均具有與熟習本發明相關技藝之人士所普遍理解 之相同意義。除非明確定義，否則這些名詞例如一般使用 之字典中所定義，應解讀為與相關技藝之内容中意義一致 φ 而非解讀為理想化或過度正式化。 以下請參照相關圖式，詳細說明本發明適用之具體實 施例。 第1圖係本發明之實施例之處理基底之裝置之結構 圖，且第2圖係第1圖所示之處理基底之裝置之驅動單元 周圍區域之平面圖。 請參見第1圖與第2圖，實施例中之處理基底之裝置 1000 (以下稱為處理裝置）可包括一處理室100，傳輸單 • 元200，第一與第二供應管300與400，以及化學物質射 出器500。 處理室100可提供處理包括做為平面顯示裝置之玻 璃材料之玻璃基底G之空間。在玻璃基底G上之處理可包 括蝕刻製程與清潔製程。基底G也可包括半導體基底，包 括半導體材料，例如半導體裝置之晶片。 傳輸單元200可位於處理室100内。傳輸單元200可 將基底G連續移動至處理室100。傳輸單元200可包括複 數滾輪210，在基底G寬度之方向對齊且彼此平行。 11 1351318 TW5445PA I · 移動基底G之力矩可施加在滾輪之一部分以增進效 能。在此場合中，由力矩滚動之滾輪之間距可較基底G之 長度短。 在一實施例中，第一供應管300可越過處理室100之 外部與内部之間。亦即，第一供應管300可連接至位於處 理室100外部之化學物質保存槽10,因此化學物質C可經 由第一供應管300供應至處理室100。 化學物質C可用於蝕刻製程或清潔製程，且化學物質 C之範例可包括硫酸、鹽酸、氫氟酸、H202、去離子水等。 這些可單獨或混合使用。 在一實施例中，第二供應管400也可越過處理室100 之外部與内部之間，因而第一與第二供應管300與400可 彼此鄰接於處理室100之入口與出口處。因此，化學物質 C之射出區域可在處理室100内擴大。 如第一供應管，第二供應管400也可連接至化學物質 保存槽10，且化學物質C可流入第二供應管400。 在一實施例中，化學物質射出器500可包括第一與第 二射出管510與520，分別連接於第一與第二供應管，以 及驅動單元530,以擺動該第一與第二射出管510與520。 請參見第3圖至第5圖，詳細說明化學物質射出器 500。 第3圖係第2圖所示之驅動單元之驅動板之正視圖， 且第4圖係第2圖所示之驅動單元之驅動板之側視圖。第 5圖係由第2圖所示之驅動單元對第一射出喷頭之擺動狀 態之示意圖。 12 1351318 • _ TW5445PA' 請參見第1圖至第5圖，第一與第二射出管510與 520可分別連接至第一與第二供應管3〇〇與400，且排列 成第一與第二射出管510與520可位於同一線上。 化學物質射出器500可更包括複數耦合器570，介於 第一射出管510與第一供應管300之間以及第二射出管 520與第二供應管400之間。耦合器570可使得在化學物 質分別流經由驅動單元530擺動之第一與第二射出管510 與520以及第一與第二射出喷頭512與522。 Φ 第一與第二射出喷頭512與522可分別在縱向安裝於 第一與第二射出管51〇與520，因而在第一與第二射出管 510與520流動之化學物質c可直接射出至基底g。 第一與第二射出噴頭512與522可以一既定射出角度 從第一與第二射出管510與520突出朝向基底G。第一與 第二射出喷頭512與522可分別包括一孔，形成於第一與 第二射出管510與520之表面上。 在一實施例中’驅動單元500可在第一與第二射出管 510與520之間從處理室1〇〇之外部延伸。例如，驅動單 元500可包括產生驅動動力且位於處理室1〇〇外側之馬達 540，在第一與第二射出管51〇與52〇之間延伸且連接至 馬達540之動力傳輸構件55〇，以及一驅動板56〇，連接 至動力傳輸構件550以由馬達54〇擺動❶例如，複數驅動 板560可分別隨第一與第二射出管51〇與52〇而安裝。 動力傳輸構件550可包括偏心輪552，根據馬達540 之轉動而順時針或逆時針轉動，以及連桿554，機械連接 偏〜輪552之第一偏心部以及驅動板56〇之第二偏心部。 13TVV5445PA is divided into different components, accessories 'area.', the following - components, accessories, areas = or sections. Thus, 4 may be deviated from the teachings of the present invention as two, θ and/or segments may be in the in/out section. '·, a piece of space, accessories, areas, coating space relative nouns, such as "under the stagnation", etc., can be used to "below", "on", in the pattern Relative to other components or special cover devices, except for the illustration, external use or = inter-relative relative nouns are the words, if the device in the figure is reversed, the direction. For example or "higher". Thus, in the embodiments, the elements or features are "above" above and below. The device is also underneath "can be covered in his direction", so the spatial relative name: the position to be placed (rotated 90 degrees or its η relative name η also needs to be used in correspondence with the terminology used only for the description. Limit the invention. In addition, _容财实=: and, for the two and the "this" is included in the plural. Used in =: book; t: cattle number, step, operation one or match: existence 'but not limited The presence or addition of one or more other features, integers, steps, (four), 7C, parts, and/or groups. The embodiment of the present invention is intended to be an idealized embodiment of the present invention (and its intermediate 4). The cross-sectional view of the intent is shown. Thus, variations in the shape of the drawings, such as manufacturing techniques and/or tolerances, are contemplated. Therefore, embodiments of the present invention are not intended to limit the particular shape of the region, but rather include deformation of the shape during manufacture. For example, an implanted area illustrated as a rectangle typically has a rounded or sinuous feature and/or a gradient of implant concentration at its edges rather than a binary from the 1513318 'TW5445PA· into the unimplanted region. Change. Similarly, the buried area formed by implantation can be It is possible to cause partial implantation of the region between the buried region and the surface on which the implant is performed. Therefore, the regions in the drawings are schematic and their shapes are not actual shapes of the regions of the device, nor are they intended to limit the scope of the invention. Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning meaning of the meaning of the It should be interpreted as being consistent with the meaning of the relevant art φ rather than interpreted as idealized or over-formalized. Hereinafter, specific embodiments of the present invention will be described in detail with reference to the accompanying drawings. FIG. 1 is an embodiment of the present invention. A structural view of a device for processing a substrate, and Fig. 2 is a plan view of a region around a driving unit of the device for processing a substrate shown in Fig. 1. Referring to Figures 1 and 2, the apparatus for processing a substrate 1000 in the embodiment (hereinafter referred to as a processing device) may include a processing chamber 100, a transfer unit 200, first and second supply tubes 300 and 400, and chemistry The ejector 500. The processing chamber 100 can provide a space for processing a glass substrate G including a glass material as a flat display device. The processing on the glass substrate G can include an etching process and a cleaning process. The substrate G can also include a semiconductor substrate. A semiconductor material, such as a wafer of a semiconductor device, is included. The transfer unit 200 can be located within the process chamber 100. The transfer unit 200 can continuously move the substrate G to the process chamber 100. The transfer unit 200 can include a plurality of rollers 210 aligned in the direction of the width of the substrate G. 11 1351318 TW5445PA I · The moment of moving the base G can be applied to one part of the roller to improve performance. In this case, the distance between the rollers rolling by the moment can be shorter than the length of the base G. In an embodiment The first supply tube 300 can pass between the exterior and interior of the process chamber 100. That is, the first supply pipe 300 can be connected to the chemical substance holding tank 10 located outside the processing chamber 100, so that the chemical substance C can be supplied to the processing chamber 100 via the first supply pipe 300. The chemical substance C can be used in an etching process or a cleaning process, and examples of the chemical substance C may include sulfuric acid, hydrochloric acid, hydrofluoric acid, H202, deionized water, and the like. These can be used singly or in combination. In an embodiment, the second supply tube 400 can also pass between the exterior and interior of the processing chamber 100 such that the first and second supply tubes 300 and 400 can abut each other at the inlet and outlet of the processing chamber 100. Therefore, the injection region of the chemical substance C can be expanded in the processing chamber 100. Like the first supply pipe, the second supply pipe 400 can also be connected to the chemical storage tank 10, and the chemical substance C can flow into the second supply pipe 400. In an embodiment, the chemical injector 500 may include first and second injection tubes 510 and 520 connected to the first and second supply tubes, respectively, and a driving unit 530 to swing the first and second injection tubes. 510 and 520. Referring to Figures 3 through 5, the chemical injector 500 will be described in detail. Fig. 3 is a front view of the drive plate of the drive unit shown in Fig. 2, and Fig. 4 is a side view of the drive plate of the drive unit shown in Fig. 2. Fig. 5 is a schematic view showing the swinging state of the first injection head by the driving unit shown in Fig. 2. 12 1351318 • _ TW5445PA' Referring to Figures 1 to 5, the first and second injection tubes 510 and 520 can be connected to the first and second supply tubes 3 and 400, respectively, and arranged in the first and the second The two injection tubes 510 and 520 can be on the same line. The chemical injector 500 may further include a plurality of couplers 570 between the first injection tube 510 and the first supply tube 300 and between the second injection tube 520 and the second supply tube 400. The coupler 570 can cause the first and second injection tubes 510 and 520 and the first and second ejection nozzles 512 and 522 to be oscillated via the driving unit 530 in the chemical substance, respectively. Φ The first and second ejection nozzles 512 and 522 are respectively longitudinally mounted to the first and second ejection tubes 51 and 520, so that the chemical substance c flowing in the first and second ejection tubes 510 and 520 can be directly emitted. To the substrate g. The first and second ejection nozzles 512 and 522 can protrude from the first and second ejection tubes 510 and 520 toward the substrate G at a predetermined exit angle. The first and second ejection nozzles 512 and 522 may respectively include a hole formed in the surfaces of the first and second ejection tubes 510 and 520. In an embodiment, the drive unit 500 can extend from the exterior of the process chamber 1 在 between the first and second exit tubes 510 and 520. For example, the drive unit 500 may include a motor 540 that generates driving power and is located outside the processing chamber 1 , a power transmission member 55 that extends between the first and second injection tubes 51 〇 and 52 且 and is connected to the motor 540, And a drive plate 56A, coupled to the power transmission member 550 for swinging by the motor 54. For example, the plurality of drive plates 560 can be mounted with the first and second injection tubes 51A and 52B, respectively. The power transmitting member 550 may include an eccentric wheel 552 that rotates clockwise or counterclockwise in accordance with the rotation of the motor 540, and a link 554 that mechanically connects the first eccentric portion of the biasing wheel 552 and the second eccentric portion of the drive plate 56A. 13
TW5445PA 連桿554可包括第一桿 一作、、如，战 杆bb5連接至偏心輪552之第 〜邰，第二桿556，連接至驅動 以及連接構件557，連接第一桿盥第=第一偏心#， 4日扣外_L 弗才干與第一杯555與556。第 弟一桿555與556可分別由接合構件，例如_， 接σ至偏心輪552與驅動板56〇。 因此’偏心輪552之偏心轉動可由第〜55與由連 接構件557連接至第一桿555 t第_ ρ ' 仵⑽5之弟一杯轉換成線性往 復運動。因此’機械連接至第__棍夕 往復運動而擺動。 帛一 # 556之鱗動板_可由 另外，化學物質射出器500可包括一箱58〇， 載在處理室100中操作之動力傳輸構件55〇與驅動板 560’因而動力傳輸構件55〇與驅動板56〇可與處理室 内部之環境隔絕。 〃 因此，基底G可足以防止由動力傳輪構件55〇與驅動 板560之操作而污染。例如，箱58〇可更包括上蓋M2與 下蓋584，因而實行動力傳輸構件55〇與驅動板56〇之維 護。 第一與第二受驅板514與524可分別安裝於第一與第 二射出管510與520面對驅動板560之末端部。驅動板56〇 之線性往復運動可傳輸至第一與第二受驅板514與犯4， 因而將擺動動作傳輸至第一與第二受驅板514與524。 當驅動板因為第二桿556難以同步傳輪擺動動作至 第一與第二受驅板514與524時，每一驅動板56〇可分別 安裝成對應於第一與第二受驅板514與524之第一與第一 驅動板。 一 一 1351318 ' TW5445PA' 例如，第一驅動板562可面對第一受驅板514，且連 接至連桿554之第二桿556。亦即，第一驅動板562可由 馬達之轉動而擺動。 第二驅動板564可面對第二受驅板524，且沿同一中 心軸連接至第一驅動板562，使得第一驅動板562之擺動 動作可直接傳輸至第二驅動板564。 箱580之一側壁可位於第一驅動板562與第一受驅板 514之間以及第二驅動板564與第二受驅板524之間。因 _ 此，第一與第二驅動板562與564之擺動動作可傳輸至第 一與第二受驅板514與524’其並非以直接之方法’而係 以間接之方法，例如磁力方法。 例如，第一與第二磁性部563與565可位於第一與第 二驅動板562與564周圍’且第三與第四磁性部515與525 可位於第一與第二受驅板514與524周圍。 因此，第一與第二驅動板562與564可由馬達540之 轉動而進行擺動動作，且第一與第二受驅板514與524也 鲁可隨第一與第二驅動板562與564進行擺動動作。第一與 第二射出管510與520由於第一與第二受驅板514與524 分別安裝入而可進行擺動動作，且最後第一與第二射出嘴 頭512與522係安裝於第一與第二射出管510與520，可 進行擺動動作。 又，造成第一與第二射出管510與520之擺動動作之 轉動動力’可施加在介於第一與第二射出管510與52〇之 間之共同區域，相較於當第一與第二射出管510與52〇〜 體成形且造成擺動動作之轉動動力驅動動力施加於束端 15 1351318 TW5445PA ' 部，增加射出管擺動動作之穩定性。 另外，上述設置中，化學物質C經由第一與第二射出 管510與520之兩個通道射出至基底G，可有利於近來大 尺寸化之基底G。 亦即，由於第一與第二射出管510與520，化學物質 可穩定均句地提供至大尺寸基底G，因而增進基底品質。 第6圖係本發明之實施例之處理基底之裝置之結構 圖，且第7圖係第6圖所示之處理基底之裝置之驅動單元 周圍部分之平面圖。 本實施例之處理裝置1100實質上有與第1圖至第5 圖所示之處理裝置1000相同之結構，除了第一與第二射 出管之擺動動作之產生以外，使得以下圖式中，相同之標 號標示與第1圖至第5圖相同之元件，且省略相同元件之 詳細說明。 請參見第6圖與第7圖，另一實施例中處理裝置1100 可包括一處理室100，傳輸單元200，第一與第二供應管 300與400，以及化學物質射出器600。 處理室100可提供處理包括做為平面顯示裝置之玻 璃材料之玻璃基底G之空間。基底G可由傳輸單元200移 動至處理室100。第一與第二供應管300與400可彼此平 行，且化學物質C可從位於處理室100外部之化學物質保 存槽10經由第一與第二供應管300與400供應至處理室 100。 在一實施例中，化學物質射出器600可包括第一射出 管組610與第二射出管組640，分別由耦合器680連接至 1351318 TW5445PA' 第一與第二供應管300與400，以及驅動單元670，施加 驅動動力至第一與第二射出管組61〇與640其中之一。每 一射出管組可包括至少兩根射出管。The TW5445PA link 554 may include a first lever, for example, the battlebar bb5 is coupled to the first to the eccentric 552, the second lever 556 is coupled to the drive and the connecting member 557, and is coupled to the first lever 盥 = first eccentric #, 4日扣外_L Fucai and the first cup 555 and 556. The first levers 555 and 556 can be coupled to the drive plate 56 by a joint member, such as _, σ to the eccentric 552, respectively. Therefore, the eccentric rotation of the eccentric wheel 552 can be converted into a linear reciprocating motion by the first cup 55 and the cup connected by the connecting member 557 to the first rod 555 t _ ρ ' ) (10) 5. Therefore, the mechanical connection to the __ stick reciprocates and swings. Further, the chemical injector 500 may include a case 58 〇, the power transmission member 55 操作 and the drive plate 560 ′ that are operated in the process chamber 100 and thus the power transmission member 55 〇 and drive The plate 56 can be isolated from the environment inside the processing chamber. 〃 Therefore, the substrate G may be sufficient to prevent contamination by the operation of the power transmitting member 55 and the driving plate 560. For example, the case 58 can further include an upper cover M2 and a lower cover 584, thereby performing maintenance of the power transmission member 55A and the drive plate 56A. The first and second driven plates 514 and 524 are respectively attached to the end portions of the first and second ejection tubes 510 and 520 facing the driving plate 560. The linear reciprocating motion of the drive plate 56A can be transmitted to the first and second driven plates 514 and 4, thereby transmitting the swinging motion to the first and second driven plates 514 and 524. When the driving plate is difficult to synchronize the transmission swinging motion to the first and second driven plates 514 and 524, each of the driving plates 56 can be respectively installed to correspond to the first and second driven plates 514 and The first and first drive boards of 524. One 1351318 'TW5445PA' For example, the first drive plate 562 can face the first driven plate 514 and be coupled to the second rod 556 of the link 554. That is, the first driving plate 562 can be swung by the rotation of the motor. The second driving plate 564 can face the second driven plate 524 and is coupled to the first driving plate 562 along the same central axis such that the swinging motion of the first driving plate 562 can be directly transmitted to the second driving plate 564. One of the side walls of the case 580 can be located between the first drive plate 562 and the first driven plate 514 and between the second drive plate 564 and the second driven plate 524. Because of this, the oscillating motion of the first and second drive plates 562 and 564 can be transmitted to the first and second drive plates 514 and 524', which are not in a straightforward manner, such as a magnetic method. For example, the first and second magnetic portions 563 and 565 can be located around the first and second drive plates 562 and 564' and the third and fourth magnetic portions 515 and 525 can be located at the first and second driven plates 514 and 524. around. Therefore, the first and second driving plates 562 and 564 can be swung by the rotation of the motor 540, and the first and second driven plates 514 and 524 can also be swung with the first and second driving plates 562 and 564. action. The first and second injection tubes 510 and 520 are respectively swingable by the first and second driven plates 514 and 524, and finally the first and second ejection nozzles 512 and 522 are mounted on the first and second The second injection tubes 510 and 520 can perform a swing operation. Further, the rotational power of the swinging motion of the first and second exit pipes 510 and 520 can be applied to a common area between the first and second exit pipes 510 and 52, as compared to when the first and the first The two injection tubes 510 and 52 are formed and the rotational power driving force that causes the swinging motion is applied to the beam end 15 1351318 TW5445PA ', which increases the stability of the swinging motion of the injection tube. Further, in the above arrangement, the chemical substance C is emitted to the substrate G via the two passages of the first and second injection tubes 510 and 520, which is advantageous for the recently-sized substrate G. That is, since the first and second injection tubes 510 and 520, the chemical substance can be stably supplied to the large-sized substrate G, thereby improving the substrate quality. Fig. 6 is a structural view of a device for processing a substrate according to an embodiment of the present invention, and Fig. 7 is a plan view showing a portion around a driving unit of the apparatus for processing a substrate shown in Fig. 6. The processing apparatus 1100 of the present embodiment has substantially the same configuration as the processing apparatus 1000 shown in Figs. 1 to 5, except that the swinging motions of the first and second emitting tubes are generated, so that the same is true in the following drawings. The same reference numerals are given to elements that are the same as those in FIGS. 1 to 5, and the detailed description of the same elements is omitted. Referring to Figures 6 and 7, in another embodiment the processing apparatus 1100 can include a processing chamber 100, a transfer unit 200, first and second supply tubes 300 and 400, and a chemical injector 600. The processing chamber 100 can provide a space for processing the glass substrate G including the glass material as a flat display device. The substrate G can be moved by the transfer unit 200 to the process chamber 100. The first and second supply tubes 300 and 400 may be parallel to each other, and the chemical substance C may be supplied to the process chamber 100 from the chemical substance storage tank 10 located outside the processing chamber 100 via the first and second supply tubes 300 and 400. In an embodiment, the chemical injector 600 may include a first injection tube set 610 and a second output tube set 640, which are respectively coupled by the coupler 680 to the 1351318 TW5445PA' first and second supply tubes 300 and 400, and the drive The unit 670 applies driving power to one of the first and second emission tube groups 61 and 640. Each of the injection tube sets may include at least two injection tubes.
在本實施例中，施加驅動力之第一射出管組61〇之射 出官係稱為第一射出管620，且施加驅動力之第二射出管 組640之射出管係稱為第二射出管65〇。另外，未施加驅 動力之第一射出管組610之其他射出管係稱為第三射出管 630 ’且未施加驅動力之第二射出管組64〇之其他射出管 係稱為第四射出管660。 第—射出管620可位於與第二射出管650同一線上， 且第二山々々 —、出官630可位於與第四射出管660同一線上。第 -、势一 八 一、第三與第四射出喷頭622、632、652與662可 二^安裝於第—、第二、第三與第四射出管620、630、650 =6〇 ’使得化學物質c可經由每一射出喷頭直接射出至 620 一實施例中，驅動單元670可在第一與第二射出管 元670 〇之間從處理室1 〇〇之外部延伸。例如，驅動單 672，|第包括產生轉動動力且位於處理室100外側之馬達 馬達672第與第二射出管620與650之間延伸且連接至 接至動動力傳輸構件674，以及複數驅動板676，連 復運動造#輪構件674 ’以由動力傳輸構件674產生之往 &战之擺動動作控制。 673，構件674可包括連桿675，機械連接於馬達 運動。駆673之轉動可由連桿675轉換成線性往復 676之偏心部可連接至連桿675，使得驅動 1351318 TW5445PA , · 板676可由於連桿675之線性往復運動而進行擺動動作。 另外’化學物質射出器600可包括一箱685，用以承 載在處理室100中操作之動力傳輸構件674與驅動板 676’因而動力傳輪構件674與驅動板676可與處理室100 内部之環境隔絕。 第一與第二受驅板624與654可分別安裝於第一與第 二射出管620與650面對驅動板676之末端部。驅動板676 之線性往復運動可傳輸至第一與第二受驅板624與654， 因而將擺動動作傳輸至第一與第二受驅板624與654。 箱685之一側壁可位於驅動板676與第一與第二射出 官620與650之間。因此，驅動板676之擺動動作可傳輸 至第一與第二受驅板624與654，其並非以直接之方法， 而係以間接之方法，例如磁力方法。例如，複數磁性部可 位於驅動板676以及第一與第二受驅板624與654周圍。 另外’化學物質射出器600可包括擺動傳輸構件 690 ’以將該第一與第二射出管62〇與mo之擺動動作傳 輸至第三與第四射出管630與660。 擺動傳輸構件690可將第一射出管620連結於第三射 出管630 ’且可將第二射出管650連結於第四射出管66〇。 第一射出管620與第三射出管630之間之連結具有與 第二射出管650與第四射出管660之間實質相同之結構， 因而以下根據第一射出管620與第三射出管630之間之連 結對擺動傳輸構件690詳細說明。 第8圖係本發明之實施例之第7圖所示之驅動單元之 動力傳輸構件之示意圖。 1351318 TW5445PA' 請參見第8圖’第一與第三射出噴頭622與632可從 第與第一射出g 620與63〇之第一與第三本體626與636 於:疋射出角度犬出朝向基底G。本實施例中擺動傳 輪構件_可連結於每1—與第三射出喷頭622與632。In the present embodiment, the emission unit of the first emission tube group 61 to which the driving force is applied is referred to as a first emission tube 620, and the emission tube of the second emission tube group 640 to which the driving force is applied is referred to as a second emission tube. 65〇. In addition, the other injection pipe of the first injection pipe group 610 to which the driving force is not applied is referred to as a third injection pipe 630', and the other injection pipe system of the second injection pipe group 64 that does not apply the driving force is referred to as a fourth injection pipe. 660. The first ejection tube 620 may be located on the same line as the second ejection tube 650, and the second mountain 々々, the outgoing 630 may be located on the same line as the fourth ejection tube 660. The first, the first one, the third and fourth injection nozzles 622, 632, 652 and 662 may be mounted on the first, second, third and fourth exit pipes 620, 630, 650 = 6 〇 ' The chemical substance c can be directly ejected through each of the ejection nozzles to 620. In an embodiment, the driving unit 670 can extend from the outside of the processing chamber 1 在 between the first and second ejection tubes 670 。. For example, the drive unit 672, the first includes a motor 672 that generates rotational power and is located outside the processing chamber 100, and extends between the second and second injection tubes 620 and 650 and is connected to the power transmission member 674, and the plurality of driving plates 676. The continuous motion making #wheel member 674' is controlled by the swinging motion generated by the power transmission member 674 to the & 673, member 674 can include a link 675 that is mechanically coupled to the motor for movement. The rotation of the 駆 673 can be converted to a linear reciprocation by the link 675. The eccentric portion of the 676 can be coupled to the link 675 such that the drive 1351318 TW5445PA, the plate 676 can be oscillated due to the linear reciprocating motion of the link 675. In addition, the chemical injector 600 may include a tank 685 for carrying the power transmitting member 674 and the driving plate 676' that are operated in the processing chamber 100. Thus, the power transmitting member 674 and the driving plate 676 may be in an environment with the interior of the processing chamber 100. Isolated. The first and second driven plates 624 and 654 may be respectively mounted at the end portions of the first and second ejection tubes 620 and 650 facing the driving plate 676. The linear reciprocating motion of the drive plate 676 can be transmitted to the first and second driven plates 624 and 654, thereby transmitting the swinging motion to the first and second driven plates 624 and 654. One of the side walls of the box 685 can be located between the drive plate 676 and the first and second emitters 620 and 650. Thus, the oscillating motion of the drive plate 676 can be transmitted to the first and second driven plates 624 and 654, which are not in a straightforward manner, but in an indirect method, such as a magnetic method. For example, a plurality of magnetic portions can be located around the drive plate 676 and the first and second drive plates 624 and 654. Further, the chemical substance injector 600 may include a swing transmission member 690' to transmit the swinging motion of the first and second emission tubes 62 and mo to the third and fourth emission tubes 630 and 660. The swing transmission member 690 can couple the first injection tube 620 to the third emission tube 630' and can connect the second emission tube 650 to the fourth emission tube 66. The connection between the first injection tube 620 and the third injection tube 630 has substantially the same structure as that between the second injection tube 650 and the fourth emission tube 660, and thus is based on the first injection tube 620 and the third emission tube 630. The connection between the two is explained in detail for the swing transmission member 690. Fig. 8 is a view showing the power transmission member of the drive unit shown in Fig. 7 of the embodiment of the present invention. 1351318 TW5445PA' See Fig. 8 'The first and third injection nozzles 622 and 632 can be ejected from the first and third bodies g 620 and 63 第一 first and third bodies 626 and 636 at: 疋 ejection angles toward the base G. In the present embodiment, the oscillating roller member _ can be coupled to each of the 1- and third injection nozzles 622 and 632.
1因此*第射出噴頭622可經由第一射出管620進 =擺動動料’擺動料構件_可直接將在第—射出嗔 f 622之擺動動作傳輸至第三射出喷頭632。因此，第三 ^出嘴頭632可與第—射出噴頭622同步進行擺動動作。 雖然本實施例揭示兩個第一與第三射出喷頭622與 32都可連結於擺動傳輸構件_，只有在驅動力足夠時 —與第三射出喷頭622與632之其中一者可連結於擺動 傳輪構件690 ’如熟習此技蓋人士所知。 因此，驅動單元670之驅動力可僅施加於第一與第二 射出管620與650,因而只有第一與第二射出管620與650 可進行擺動動作。然後，第一與第二射出管620與650之 擺動動作可傳輸至第三與第四射出管630與660，因而簡 化動力傳輸系統674與驅動板676之間之機械連桿系統。 又’箱685也可因動力傳輸系統674與驅動板676之間之 間化機械連桿系統而小尺寸化。 請參見第9圖與第1〇圖，說明第一修正擺動傳輸構 件。 第9圖係第7圖所示之驅動單元之第一修正擺動傳輸 構件之示意圖，且第1〇圖係第9圖之A部分之部分放大 圖〇 包括第一修正擺動傳輸構件之處理裝置實質上有與 19 1351318 TW5445PA ' * 第6圖至第8圖所示之處理裝置相同之結構，除了擺動傳 輸構件以外，使得第9圖與第10圖中，相同之標號標示 與第6圖至第8圖相同之元件，且省略相同元件之詳細說 明。 請參見第9圖與第10圖，第一與第三射出喷頭762 與772可從化學物質射出器750之第一與第三射出管760 與770之第一與第三本體764與774突出朝向基底G。另 外，第一與第三射出噴頭762與772可分別於第一與第三 射出管760與770之第一與第三本體764與774上形成 孔。第一受驅板786可位於第一射出管760之第一本體764 之末端部。 擺動傳輸構件780可包括驅動齒輪與受驅齒輪782與 784。驅動齒輪782可耦合於第一射出管760之第一本體 764，使得第一射出管760之擺動動作可直接經由第一射 出管760之第一本體764傳輸至驅動齒輪782。 受驅齒輪784可耦合於第三射出管770之第三本體 774，且可機械連接至驅動齒輪782。亦即，受驅齒輪784 之第二齒可接觸於驅動齒輪782之第一齒之齒面。 驅動齒輪782之擺動動作可根據一既定齒輪比直接 傳輸至受驅齒輪784。然後，受驅齒輪784之擺動動作可 傳輸至第三射出管770之第三本體774，且因此第三射出 喷頭772可由擺動第三本體774而擺動。 上述驅動齒輪與受驅齒輪之範例可包括正齒輪系統 與螺旋齒輪系統。 因此，第一射出管760之擺動動作可經由包括驅動齒 20 1351318 * TW5445PA' 輪與受驅齒輪782與784之擺動傳輸構件780傳輸至第三 射出管770。 請參見第11圖與第12圖，說明第二修正擺動傳輸構 件。 第11圖係第7圖所示之驅動單元之第二修正擺動傳 輸構件之示意圖，且第12圖係第11圖之B部分之部分放 大圖。 包括第二修正擺動傳輸構件之處理裝置實質上有與 • 第6圖至第8圖所示之處理裝置相同之結構，除了擺動傳 輸構件以外，使得第11圖與第12圖中，相同之標號標示 與第6圖至第8圖相同之元件，且省略相同元件之詳細說 明。 請參見第11圖與第12圖，第一與第三射出喷頭712 與722可從化學物質射出器750之第一與第三射出管710 與720之第一與第三本體714與724突出朝向基底G。第 一受驅板716可位於第一射出管710之第一本體714之末 # 端部。 擺動傳輸構件730可接觸於相對於第一與第三射出 喷頭712與722的第一與第三本體714與724。 特別是，擺動傳輸構件730可包括條狀之齒條732， 其第一齒面對第一與第三本體714與724,以及小齒輪715 或725，在每一第一與第三射出喷頭712與722嚙合於齒 條 732。 例如，第一小齒輪715之第二齒可在第一射出管710 之第一本體714嚙合於齒條732之第一齒，且第二小齒輪 21 13513181 Therefore, the first ejection nozzle 622 can transmit the swinging motion at the first ejection orifice f 622 to the third ejection nozzle 632 via the first ejection tube 620. Therefore, the third nozzle head 632 can perform the swinging motion in synchronization with the first injection nozzle 622. Although the present embodiment discloses that both the first and third ejection nozzles 622 and 32 can be coupled to the oscillating transmission member _, only when the driving force is sufficient - one of the third ejection nozzles 622 and 632 can be coupled to The oscillating roller member 690' is known to those skilled in the art. Therefore, the driving force of the driving unit 670 can be applied only to the first and second exit pipes 620 and 650, so that only the first and second exit pipes 620 and 650 can perform the swinging motion. Then, the swinging motions of the first and second exit tubes 620 and 650 can be transmitted to the third and fourth exit tubes 630 and 660, thereby simplifying the mechanical linkage between the power transmission system 674 and the drive plate 676. Further, the box 685 can also be downsized by the intermediate mechanical linkage between the power transmission system 674 and the drive plate 676. Refer to Figure 9 and Figure 1 for the first modified swing transmission component. Figure 9 is a schematic view showing a first modified wobble transmission member of the drive unit shown in Figure 7, and a partial enlarged view of a portion A of the first drawing of Fig. 9 includes the processing device of the first modified wobble transmission member. There is the same structure as the processing device shown in Fig. 6 to Fig. 8 except for the 19 1351318 TW5445PA ' *, except for the oscillating transmission member, the same reference numerals and signs are shown in Fig. 9 and Fig. 10 8 is the same component, and the detailed description of the same component is omitted. Referring to Figures 9 and 10, the first and third ejection nozzles 762 and 772 can protrude from the first and third bodies 764 and 774 of the first and third ejection tubes 760 and 770 of the chemical injector 750. Facing the base G. In addition, the first and third ejection nozzles 762 and 772 may form holes in the first and third bodies 764 and 774 of the first and third ejection tubes 760 and 770, respectively. The first driven plate 786 can be located at a distal end of the first body 764 of the first injection tube 760. The oscillating transmission member 780 can include drive and driven gears 782 and 784. The drive gear 782 can be coupled to the first body 764 of the first injection tube 760 such that the swinging motion of the first injection tube 760 can be transmitted directly to the drive gear 782 via the first body 764 of the first injection tube 760. The driven gear 784 can be coupled to the third body 774 of the third injection tube 770 and can be mechanically coupled to the drive gear 782. That is, the second tooth of the driven gear 784 can contact the tooth flanks of the first teeth of the drive gear 782. The swinging motion of the drive gear 782 can be directly transmitted to the driven gear 784 according to a predetermined gear ratio. Then, the swinging motion of the driven gear 784 can be transmitted to the third body 774 of the third shooting tube 770, and thus the third shooting head 772 can be swung by the swinging third body 774. Examples of the above-described drive gear and driven gear may include a spur gear system and a helical gear system. Therefore, the swinging motion of the first injection tube 760 can be transmitted to the third ejection tube 770 via the swing transmission member 780 including the driving teeth 20 1351318 * TW5445PA' wheel and the driven gears 782 and 784. Referring to Figures 11 and 12, a second modified wobble transmission member will be described. Fig. 11 is a view showing a second modified oscillating transmission member of the drive unit shown in Fig. 7, and Fig. 12 is a partial enlarged view of a portion B of Fig. 11. The processing apparatus including the second modified wobble transmission member has substantially the same structure as the processing apparatus shown in Figs. 6 to 8 except for the wobble transmission member, so that the same reference numerals are used in Figs. 11 and 12. The same elements as those in FIGS. 6 to 8 are denoted, and detailed descriptions of the same elements are omitted. Referring to Figures 11 and 12, the first and third ejection nozzles 712 and 722 can protrude from the first and third bodies 714 and 724 of the first and third ejection tubes 710 and 720 of the chemical injector 750. Facing the base G. The first driven plate 716 can be located at the end # end of the first body 714 of the first injection tube 710. The oscillating transmission member 730 is contactable with the first and third bodies 714 and 724 with respect to the first and third ejection nozzles 712 and 722. In particular, the oscillating transmission member 730 may include a strip-shaped rack 732 having a first tooth facing the first and third bodies 714 and 724, and a pinion 715 or 725 at each of the first and third injection nozzles 712 and 722 are engaged with the rack 732. For example, the second tooth of the first pinion 715 can be engaged with the first tooth of the rack 732 at the first body 714 of the first injection tube 710, and the second pinion 21 1351318
TW5445PA 725之第三齒可在第三射出管720之第三本體724嚙合於 齒條732之第一齒。 小齒輪715與725可分別一體成形於第一與第三本體 714與724以及第一與第三射出管71〇與720。另外，每 一小齒輪715與725可與射出管分離製造，然後小齒輪715 與725可分別輕合於第一與第三射出管γιο與720之第一 與第二本體714與724。雖然上述實施例揭示齒條與小齒 輪系統，任何熟悉此技藝人士已知之其他修正或傳輸系統 也可t用以取代或連接於齒條與小齒輪系統。 小齒輪系統出管71G之擺動動作可經由包括齒條和 又，化學:傳輪構件730傳輪至第三射出管720。 示），用以根據楚質射出器600可更包括—導引構件（未圖 作控制擺動傳 射出管710之第一本體714之擺動動 根據某730之線性運動。 上，且驅動動&列，第一與第二射出管排列在同一線 域施加至第〜迤，）丨於該第一與第二射出管之間之共同區 出管一體成形^第二射出管，因而相較於當第一與第二射 動作之穩定性。驅動動力施加於末端部，增加射出管擺動 乡示戶斤 然其並非用以，^本發明已以一較佳實施例揭露如上， 常知識者，在X疋本發明。本發明所屬技術領域中具有通 之更動與潤飾。脫離本發明之精神和範圍内，當可作各種 專利範圍所界定^二:’本發明之保護範圍當視後附之申請 1351318 1 TW5445PA- 【圖式簡單說明】 第1圖係本發明之實施例之處理基底之裝置之結構 圖。 第2圖係第1圖所示之處理基底之裝置之驅動單元周 圍區域之平面圖。 第3圖係第2圖所示之驅動單元之驅動板之正視圖。 第4圖係第2圖所示之驅動單元之驅動板之側視圖。 第5圖係由第2圖所示之驅動單元對第一射出喷頭之 擺動狀態之示意圖。 第6圖係本發明之實施例之處理基底之裝置之結構 圖。 第7圖係第6圖所示之處理基底之裝置之驅動單元周 圍部分之平面圖。 第8圖係本發明之實施例之第7圖所示之驅動單元之 動力傳輸構件之示意圖。 第9圖係第7圖所示之驅動單元之第一修正擺動傳輸 構件之示意圖。 第10圖係第9圖之A部分之部分放大圖。 第11圖係第7圖所示之驅動單元之第二修正擺動傳 輸構件之示意圖。 第12圖係第11圖之B部分之部分放大圖。 23 1351318The third tooth of the TW5445PA 725 can engage the first tooth of the rack 732 at the third body 724 of the third injection tube 720. The pinion gears 715 and 725 are integrally formed to the first and third bodies 714 and 724 and the first and third emission tubes 71 and 720, respectively. Additionally, each of the pinions 715 and 725 can be fabricated separately from the injection tube, and the pinions 715 and 725 can then be coupled to the first and second bodies 714 and 724 of the first and third delivery tubes γιο and 720, respectively. While the above embodiments disclose a rack and pinion system, any other correction or transmission system known to those skilled in the art can be used in place of or in connection with the rack and pinion system. The oscillating motion of the pinion system out-of-pipe 71G can be transmitted to the third injection tube 720 via the inclusion of the rack and, again, the transfer member 730. The display unit 600 can further include a guiding member (not shown as a control for controlling the swinging motion of the first body 714 of the swinging and outgoing tube 710 according to a linear motion of a certain 730. a column, the first and second injection tubes are arranged in the same line domain to be applied to the first to the second line, and the common area between the first and second injection tubes is integrally formed with the second injection tube, thereby comparing When the first and second shots are stable. The driving force is applied to the end portion to increase the swing of the injection tube. The present invention has not been used. The present invention has been disclosed in a preferred embodiment as described above. There are various changes and refinements in the technical field to which the present invention pertains. Within the spirit and scope of the present invention, it can be defined as various patent ranges. The scope of protection of the present invention is attached to the attached application 1351318 1 TW5445PA- [Simple Description of the Drawing] FIG. 1 is the implementation of the present invention. A structural diagram of a device for processing a substrate. Fig. 2 is a plan view showing a peripheral region of a driving unit of the apparatus for processing a substrate shown in Fig. 1. Figure 3 is a front elevational view of the drive plate of the drive unit shown in Figure 2. Figure 4 is a side view of the drive plate of the drive unit shown in Figure 2. Fig. 5 is a view showing a state in which the first injection nozzle is swung by the driving unit shown in Fig. 2. Fig. 6 is a structural view of a device for treating a substrate according to an embodiment of the present invention. Fig. 7 is a plan view showing the peripheral portion of the driving unit of the apparatus for processing the substrate shown in Fig. 6. Fig. 8 is a view showing the power transmission member of the drive unit shown in Fig. 7 of the embodiment of the present invention. Fig. 9 is a view showing the first modified wobble transmission member of the drive unit shown in Fig. 7. Fig. 10 is a partially enlarged view of a portion A of Fig. 9. Fig. 11 is a view showing the second modified oscillating transmission member of the drive unit shown in Fig. 7. Fig. 12 is a partially enlarged view of a portion B of Fig. 11. 23 1351318
TW5445PA 【主要元件符號說明】 1000處理裝置 10化學物質保存槽 100 處理室 200 傳輸單元 210 滾輪 300 第一供應管 400 第二供應管 500 化學物質射出器 510 第一射出管 512 第一射出喷頭 514 第一受驅板 515 第三磁性部 520 第二射出管 522 第二射出喷頭 524 第二受驅板 525 第四磁性部 530 驅動單元 540 馬達 550 動力傳輸構件 552 偏心輪 554 連桿 555 第一桿 556 第二桿 557 連接構件 560 驅動板 563 第一磁性部 565 第二磁性部 570 耦合器 580 箱 1351318TW5445PA [Description of main component symbols] 1000 processing apparatus 10 chemical substance storage tank 100 processing chamber 200 transmission unit 210 roller 300 first supply pipe 400 second supply pipe 500 chemical substance injector 510 first injection pipe 512 first injection nozzle 514 First driven plate 515 third magnetic portion 520 second injection tube 522 second injection nozzle 524 second driven plate 525 fourth magnetic portion 530 drive unit 540 motor 550 power transmission member 552 eccentric wheel 554 link 555 first Rod 556 second rod 557 connecting member 560 driving plate 563 first magnetic portion 565 second magnetic portion 570 coupler 580 box 1351318
* TW5445PA* 582 上蓋 584 下蓋 G基底 C化學物質 1100 處理裝置 600 化學物質射出器 610 第一射出管組 620 第一射出管 622 第一射出喷頭 624 第一受驅板 626 第一本體 630 第三射出管 632 第三射出喷頭 636 第三本體 640 第二射出管組 650 第二射出管 652 第二射出喷頭 654 第二受驅板 660 第四射出管 662 第四射出喷頭 670 驅動單元 672 馬達 674 動力傳輸構件 675 連桿 676 驅動板 680 搞合器 685 箱 690 擺動傳輸構件 710 第一射出管 712 第一射出喷頭 25 1351318* TW5445PA* 582 Upper cover 584 Lower cover G Substrate C chemical 1100 Processing device 600 Chemical substance injector 610 First injection tube set 620 First injection tube 622 First injection head 624 First driven plate 626 First body 630 Three injection tube 632 third injection nozzle 636 third body 640 second injection tube group 650 second injection tube 652 second injection nozzle 654 second driven plate 660 fourth injection tube 662 fourth injection nozzle 670 driving unit 672 Motor 674 Power Transmission Member 675 Link 676 Drive Plate 680 Adapter 685 Box 690 Swing Transmission Member 710 First Injection Tube 712 First Injection Head 25 1351318
TW5445PA 714 第一本體 715 第一小齒輪 716 第一受驅板 720 第三射出管 722 第三射出喷頭 724 第三本體 725 第二小齒輪 730 擺動傳輸構件 732 齒條 750 化學物質射出器 760 第一射出管 762 第一射出喷頭 764 第一本體 770 第三射出管 772 第三射出喷頭 774 第三本體 780 擺動傳輸構件 782 驅動齒輪 784 受驅齒輪 786 第一受驅板TW5445PA 714 first body 715 first pinion 716 first driven plate 720 third injection pipe 722 third injection nozzle 724 third body 725 second pinion 730 oscillating transmission member 732 rack 750 chemical substance injector 760 An injection tube 762 a first injection nozzle 764 a first body 770 a third injection tube 772 a third injection nozzle 774 a third body 780 a swing transmission member 782 a drive gear 784 a drive gear 786 a first drive plate
Claims (1)
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| KR1020080050066A KR100962520B1 (en) | 2008-05-29 | 2008-05-29 | Apparatus for spraying a chemical and apparatus for processing a substrate including the same |
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| TWI351318B true TWI351318B (en) | 2011-11-01 |
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| KR (1) | KR100962520B1 (en) |
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| KR101904026B1 (en) * | 2011-11-30 | 2018-10-04 | 세메스 주식회사 | Module for supplying liquid |
| CN103316862B (en) * | 2013-07-12 | 2016-01-06 | 合肥京东方光电科技有限公司 | A kind of base plate cleaning device |
| CN104588346A (en) * | 2013-11-01 | 2015-05-06 | 谭建忠 | Swing cleaning technology |
| JP6901763B2 (en) * | 2017-07-26 | 2021-07-14 | 株式会社森機械製作所 | Swing type watering device |
| CN111851389B (en) * | 2020-07-08 | 2021-08-17 | 山东省高速路桥养护有限公司 | Rotatable deicing fluid spray head for bridge road |
| CN114290563A (en) * | 2021-12-15 | 2022-04-08 | 江士英 | Raw material treatment process applied to plastic film manufacturing |
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| JPH0468760A (en) * | 1990-07-05 | 1992-03-04 | Fuji Xerox Co Ltd | Facsimile equipment |
| KR0170214B1 (en) * | 1995-12-29 | 1999-03-30 | 김광호 | Wafer cleaning apparatus having an agitator |
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| JP2004273868A (en) * | 2003-03-11 | 2004-09-30 | Dainippon Screen Mfg Co Ltd | Substrate processor |
| JP2004275989A (en) * | 2003-03-19 | 2004-10-07 | Sumitomo Precision Prod Co Ltd | Substrate processing apparatus |
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| JP2009285652A (en) | 2009-12-10 |
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| CN101604621A (en) | 2009-12-16 |
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