201000214 六、發明說明： 【發明所屬之技術領域】 本發明是有關於一種化學物質射出器以及包括該化 學物質射出器之處理基底之裝置，且特別是有關於一種化 學物質射出器，將化學物質射出至移動之基底，以及包括 該化學物質射出器之處理基底之裝置。 【先前技術】 p 通常，平面顯示裝置為廣為使用之半導體積體電路裝 置之一，係通常經由一系列單元製程，例如在玻璃基底上 附著製程，在該玻璃基底上之薄層進行微影照相製程以形 成光罩圖案，使用該光罩圖案對該薄層蝕刻製程，以及從 晶圓去除殘留物與污染物之清潔製程。 蝕刻製程與清潔製程可在一處理室中使用各種化學 物質進行。包括一薄層與光罩之晶圓由移動單元移至處理 室中，且隨著蝕刻製程與清潔製程，化學物質經由處理基 , 底之裝置之化學物質射出器提供至晶圓。 習知化學物質射出器包括一供應管，從處理裝置之外 側提供化學物質，以及一射出管，連接至供應管，且包括 垂直連接於射出管之複數喷頭，將化學物質射出至處理室 中之晶圓。 複數射出管係隨著晶圓尺寸而彼此平行連接於供應 管。每一射出管在處理室中擺動，因而固定於射出管之喷 頭也隨著射出管擺動。因此，化學物質均勻射出至處理室 中之晶圓。 3 201000214 對於射岭之顯，軸單元 於㈣管之末端部，提供射出管驅動動力母例m 由單一驅動單元同時擺動。 射出g 然而，隨著晶圓尺寸增大，射屮总 數量:力:’單一驅動單元不足以驅動：射出i射出管之 無法均勾射==法由驅動單元充分擺動，且化學物質 【發明内容】 因此，實施例提供_ 壯 其中射出管係由㈣以將化學物質射出， 田動早凡穩定擺動。 實施例更提供一種處理基底 質射出裝置。 _ x置，已括上述化學物 根據實施例，提供—種化學物質 弟一射出官以及介於該第—I枯弟與 元。第一與第第一射出管之間之驅動單 第二射出管列在同一線上’使得該第-與 吕之上端邛彼此相鄰接，且 r喷頭，化學物質經由該第一與:二 基底。驅動單元可介於 ㈣料射出至一 驅動動力至該第—與第:射出管c間’且施加 該第-與第二射出管。 鄰接之该上端部’以擺動 在—實施例中，該第一盥 第二受媒板，位於該^部分2括第一與 板，介於該第-與第二轉早几包括-驅動 該驅動板傳輸至;$ 2 之間，其中該驅動動力係從 奴得翰至該弟—與第二受驅板。 4 201000214 在一實施例中，該驅動板與該第一與第二受驅板包括 圍繞一轉動轴之複數磁性構件，使得該驅動動力係做為磁 力而從該驅動板傳輸至該第一與第二受驅板。 在一實施例中，該驅動單元包括馬達，產生該驅動動 力；以及動力傳輸構件，連接至該馬達與該驅動板，且將 該馬達之轉動轉換成線性往復運動，因而將該線性往復運 動從該馬達傳輸至該驅動板，使得該驅動板進行擺動動 作。 / 例如，該動力傳輸構件包括：偏心輪，由該馬達產生201000214 VI. Description of the Invention: [Technical Field] The present invention relates to a chemical substance injector and a device comprising the chemical substrate injector, and in particular to a chemical substance emitter, a chemical substance A substrate that is ejected to the moving substrate and a processing substrate that includes the chemical emitter. [Prior Art] p Generally, a flat display device is one of widely used semiconductor integrated circuit devices, which is usually lithographically deposited on a thin layer of a glass substrate via a series of unit processes, such as a process on a glass substrate. The photographic process forms a reticle pattern, the etch mask process is used to etch the thin layer, and the cleaning process for removing residues and contaminants from the wafer. The etching process and the cleaning process can be carried out using a variety of chemicals in a processing chamber. The wafer including a thin layer and a reticle is moved from the moving unit to the processing chamber, and with the etching process and the cleaning process, the chemical is supplied to the wafer via the chemical emitter of the processing unit and the bottom device. The conventional chemical injector includes a supply tube for supplying chemicals from the outside of the processing device, and an injection tube connected to the supply tube, and including a plurality of nozzles vertically connected to the injection tube to eject the chemical into the processing chamber. Wafer. The plurality of injection tubes are connected to the supply tube in parallel with each other in accordance with the wafer size. Each of the injection tubes is swung in the processing chamber, so that the nozzles fixed to the injection tubes also oscillate with the injection tubes. Therefore, the chemical is evenly emitted to the wafer in the processing chamber. 3 201000214 For the display of the ridge, the shaft unit is provided at the end of the (four) tube, and the injection tube is driven to drive the power m. The single drive unit is simultaneously oscillated. Injection g However, as the wafer size increases, the total number of shots: force: 'single drive unit is not enough to drive: the i shot tube can not be uniformly ejected == method is fully oscillated by the drive unit, and the chemical substance [invented Contents] Therefore, the embodiment provides _ strong in which the pipe is fired from (4) to emit chemicals, and the field moves stably and steadily. The embodiment further provides a treatment substrate ejection device. _ x, the above-mentioned chemicals have been included. According to the embodiment, a chemical substance is provided, and the first one is emitted and the middle is separated from the first. The driving single second injection tube between the first and the first injection tube is arranged on the same line 'so that the first and the upper ends are adjacent to each other, and the r nozzle, the chemical substance passes through the first and the second Substrate. The drive unit may be injected between the (four) material and a driving force to the first and second: injection tubes c and apply the first and second injection tubes. Adjacent to the upper end portion 'to oscillate in the embodiment, the first second second receiving medium plate, the second portion including the first and the second plate, between the first and second second The drive board is transmitted to; between $2, where the drive is from the slave to the younger brother - with the second drive board. 4 201000214 In an embodiment, the driving board and the first and second driven boards comprise a plurality of magnetic members surrounding a rotating shaft, such that the driving power is transmitted as magnetic force from the driving board to the first The second drive board. In one embodiment, the driving unit includes a motor to generate the driving power; and a power transmitting member coupled to the motor and the driving plate, and converting the rotation of the motor into a linear reciprocating motion, thereby the linear reciprocating motion The motor is transmitted to the drive plate such that the drive plate performs a swinging motion. / For example, the power transmission member includes: an eccentric wheel, which is generated by the motor
K 之該驅動動力轉動；以及連桿，線性連接該偏心輪之第一 偏心部以及該驅動板之第二偏心部，且將該馬達之轉動轉 換成該線性往復運動。 在一實施例中，該驅動板包括：第一板，連接至該動 力傳輸構件且面對該第一受驅板；以及第二板，在一中心 轴上連接至該第一板，且面對該第二受驅板，使得該第二 板與該第一板一同進行該擺動動作。 i 在一實施例中，化學物質射出器可更包括一箱，包括 該動力傳輸構件與該驅動板。例如，該箱之一側壁係介於 該驅動板與該第一受驅板之間以及該驅動板與該第二受 驅板之間，使得該驅動板分別經由該箱之該側壁面對該第 一與第二受驅板。 在一實施例中，化學物質射出器可更包括平行於該第 一射出管之第三射出管以及平行於該第二射出管之第四 射出管，該第三與第四射出管包括第三與第四射出喷頭， 化學物質經由該第三與第四射出喷頭射出至該基底。 5 201000214The driving power of K is rotated; and a connecting rod linearly connecting the first eccentric portion of the eccentric wheel and the second eccentric portion of the driving plate, and converting the rotation of the motor into the linear reciprocating motion. In an embodiment, the driving board includes: a first board connected to the power transmission member and facing the first driven board; and a second board connected to the first board on a central axis, and The second driven plate is caused to perform the swinging motion together with the first plate. i In one embodiment, the chemical injector may further include a box including the power transmitting member and the drive plate. For example, one side wall of the box is interposed between the driving board and the first driven board and between the driving board and the second driven board, such that the driving board faces the side through the side wall of the box respectively First and second driven plates. In an embodiment, the chemical injector may further include a third injection tube parallel to the first injection tube and a fourth injection tube parallel to the second injection tube, the third and fourth injection tubes including a third And the fourth injection nozzle, the chemical substance is emitted to the substrate through the third and fourth injection nozzles. 5 201000214
J -射出又管⑽罷動傳輪構件，將該第 於該第四射出管，=====管連接 該第三射出管 =,出吕之5亥擺動動作傳輪至 第四射出管。 弟―射出管之該擺動動作傳輪至該 在一實施例中，該第一、 ，向該基底，且“=四射出喷頭 Ϊ結:該第三射出噴頭以及將該第二射出頭 第四射出喷頭。 j扣貨碩連結於該 輪與少-對_ 作傳輸至該第三與第四射出嘴頭。—出嘴碩之該擺動動 喜齡在：實施例中’該擺動傳輸構件包括—旬“ ㈤輪’ 該第-與第 ㈤條和複數小 該第三與第四射出嘴頭。出喷頭之该擺動動作傳輸至 根據某些實施例’提 :基底，包括第—與第二射出管、驅動：化學物質射出至 構件。第一與第二射出管彼 早⑽及擺動傳輸 二射出喷頭，化學物質經 =且分別包括第一與第 該基底。驅動單元施加驅動^ ^第二射出喷頭射出至 部，以擺動該第—射=動=:亥第-射出管之末端 至該第且將該第，管之擺 在一實施例中，該第—盥 基底’且該擺動傳輪構件將該突出朝向該 耵出噴碩連結於該第一 201000214 射出噴頭。 輪與受驅傳輪構件包括至少1驅動齒 至該第二射出嘴3將料—射出喷頭之該擺動動作傳輸 人在—實施例中，該擺動傳輸構件包括一去 齒輪，分別將該第一射 ω條和複數小 射出喷頭。 射出喷頭之該擺動動作傳輸至該第二 根據某些實施例，提供一 處理槽，第-與第二供應管，第二^底=裝f，包括一 單元。處理槽提供處; /、 一，出官以及驅動 從該處理槽之外部間。第-與第二供應管 物質從該處理槽之外部經槽化學 該處理槽。第—與第二射奸分職直連接 一^ 二供應管，且排列在同—線上，使得與第^出^ :亡端部彼此相鄰接，該第一與第 ：二 喷頭，化學物質經由該第-與第二射出= 出基底。驅動皁元介於該第-與第二射出管之間，且 施加驅^力麵第一與第二射出管鄰接之該上端部，以 擺動該第一與第二射出管。 在-實施例中，該第—與第二射出管分別包括第一盘 第二受驅板，位於該上端部’且該驅動單元包括一驅動、 板’介於該第中該驅動動力係從 該驅動板傳輸至該第一與第二受驅板。 在-實施例中，該驅動單元包括馬達，產生該驅動動 力；以及動力傳輸構件’連接至該馬達與該驅動板，且將 201000214 該f達之轉動轉換成線性往復運翁，因而將該線性往復運 \ A馬達傳輪至該驅動板，使得該驅動板進行擺動 作0 應其^第'一實^例尹’該裝置更包括轉合器’介於該第一供 二η 射出^間以及該第二供應管與第二射出管 第二Γ旱2學物質分別從該第一與第二供應管流經該 射出管時’由該驅動單元可擺動該第-與第二 根據某些實施例’提供一種處 處理槽，複數供應管，第一與第二射出管^置包2 擺動傳輸構件。處理槽提供處理 門動=以及 伸至該處理槽之内部彼二= 貝攸5亥處理槽之外部經㈣等供應管供應至 一與第二射出管分別垂直連接於該等供^ '曰。， 排列’該第-與第二射出管分別包括第::第平行 驅動單元施加驅動動力至該該基底。 ::二_。擺動傳輸構件將該第二射出管連接= 出管。g’且㈣第-射出管之擺動動作傳輸至該第二射 上 根據某些實施例，第—盥_ — ，且驅動動力在介於該第二:管排列在同一線 域施加至第一與第二射出管，因間之共同區 體成形且驅動動力施加於末^弟=第二射 動作之穩定性。 增加射出管擺動 201000214 另外，上述設置中，化學物質經由第一與第二射出管 之兩個通道射出至基底，可有利於近來大尺寸化之基底。 亦即，由於第一與第二射出管，化學物質可穩定均勻地提 供至大尺寸基底，因而增進基底品質。 為讓本發明之上述内容能更明顯易懂，下文特舉一較 佳實施例，並配合所附圖式，作詳細說明如下： 【實施方式】 以下請參照相關圖式，詳細說明本發明適用之具體實 施例。然而，本發明可適用於各種不同形態，不應限定於 所揭露之實施例。實施例係用以揭露完整之技術，且提供 熟悉此技藝之人士本發明之技術，且提供熟悉此技藝之人 士本發明之完整内容。在圖式中，塗層與區域之尺寸及相 關比例可能因明確繪示而誇大。 當元件或塗層之說明係為「在其上」、「連結於」或「接 續於」另一元件或塗層時，可為直接在其上、連結或接續， 也可有中介之元件或塗層。相反地，當元件之說明係為「直 接在其上」、「直接連結於」或「直接接續於」另一元件或 塗層時，沒有中介之元件或塗層。相同之標號係標示相同 之元件。名詞「及/或」係包括所列出項目之任何所有組 合。 雖然說明中可能採用第一、第二、第三等名詞描述各 種元件、配件、區域、塗層及/或區段，這些元件、配件、 區域、塗層及/或區段不應限定於此。上述名詞僅用於區 9 201000214 I \MJ ^ ,. 刀不同之^件 '配件、區域、塗層及/或區段。因此，以 下所述之第-元件、配件、區域、塗層及/或區段可在 ，離本發明之教示之下做為第二元件、配件 及/或區段。 至禮 「丄空間性相對名詞’例如「在其下」、「低於」、「在1上」、 徵IS:可用以便於描述元件或特徵與其他元件或特 蓋=^ 對關係。這些空間性相對名詞係為涵 ΐ裝！=示以外在使用或操作時之不同方向。舉例而 圖：之裝置被反置’所述之在其他元件或特徵「之 」或較低」之疋件則會變為在其他元件或特徵「之 i上=」°因此’實施例令之名詞「在其下」可涵蓋在 他^其下。裝置也可以其他方向放置（旋轉9〇度或其 "故工間性相對名詞也需做對應之解讀。 限制;^Γ使之名㈣僅為描述特定實施例，且並非用以 J 士發：:：下:斤述’除非内容明確另行指示，單數形 -!「+」/、 係為包括複數。使用於本說明書中之名 q「包括」係指明特徵、整數本况月曰中之名 配件之存在，但絲_—<似、=、元件及/或 操作、元#、β 次夕個其他特徵、整數、步驟、 太m或群組之存在或添加。 中間块構）之干土_為本么明理想化實施例（及其 、、。構）之不思圖之剖面圖顯示 或公差等圖式形狀之改變係 &心技射及/ 施例並非用以限制區域之特：:之。因此’本發明之實 狀之變形。舉例而言，圖示二應包括製造時等形 緣具有圓角或曲角之特徵植f入區域通常在其邊 次植入>辰度之梯度而非從植 201000214 入到未植入區域之二元化改變。相似地，由植入形成之埋 入區域可能導致埋入區域與植入所進行之表面之間區域 產生部分植入。因此，圖式中之區域係為示意，其形狀並 非裝置之區域實際形狀，也非用以限定本發明之範圍。 除非另行定義，在此使用之所有名詞（包括技術與科 學名詞）均具有與熟習本發明相關技藝之人士所普遍理解 之相同意義。除非明確定義，否則這些名詞例如一般使用 之字典中所定義，應解讀為與相關技藝之内容中意義一致 而非解讀為理想化或過度正式化。 以下請參照相關圖式，詳細說明本發明適用之具體實 施例。 第1圖係本發明之實施例之處理基底之裝置之結構 圖，且第2圖係第1圖所示之處理基底之裝置之驅動單元 周圍區域之平面圖。 請參見第1圖與第2圖，實施例中之處理基底之裝置 1000 (以下稱為處理裝置）可包括一處理室100，傳輸單 i 元200，第一與第二供應管300與400，以及化學物質射 出器500。 處理室100可提供處理包括做為平面顯示裝置之玻 璃材料之玻璃基底G之空間。在玻璃基底G上之處理可包 括蝕刻製程與清潔製程。基底G也可包括半導體基底，包 括半導體材料，例如半導體裝置之晶片。 傳輸單元200可位於處理室100内。傳輸單元200可 將基底G連續移動至處理室100。傳輸單元200可包括複 數滾輪210，在基底G寬度之方向對齊且彼此平行。 11 201000214 i vv n. 1 1 移動基底G之力矩可施加在滾輪之一部分以增進效 能。在此場合中，由力矩滾動之滾輪之間距可較基底G之 長度短。 在一實施例中，第一供應管300可越過處理室100之 外部與内部之間。亦即，第一供應管300可連接至位於處 理室100外部之化學物質保存槽10,因此化學物質C可經 由第一供應管300供應至處理室100。 化學物質C可用於蝕刻製程或清潔製程，且化學物質 C之範例可包括硫酸、鹽酸、氫氟酸、H202、去離子水等。 這些可單獨或混合使用。 在一實施例中，第二供應管400也可越過處理室100 之外部與内部之間，因而第一與第二供應管300與400可 彼此鄰接於處理室100之入口與出口處。因此，化學物質 C之射出區域可在處理室100内擴大。 如第一供應管，第二供應管400也可連接至化學物質 保存槽10，且化學物質C可流入第二供應管400。 在一實施例中，化學物質射出器500可包括第一與第 二射出管510與520，分別連接於第一與第二供應管，以 及驅動單元530,以擺動該第一與第二射出管510與520。 請參見第3圖至第5圖，詳細說明化學物質射出器 500。 第3圖係第2圖所示之驅動單元之驅動板之正視圖， 且第4圖係第2圖所示之驅動單元之驅動板之側視圖。第 5圖係由第2圖所示之驅動單元對第一射出喷頭之擺動狀 態之示意圖。 12 201000214 請參見第1圖至第5圖，第一與第二射出管510與 520可分別連接至第一與第二供應管300與400，且排列 成第一與第二射出管510與520可位於同一線上。 化學物質射出器500可更包括複數耦合器570，介於 第一射出管510與第一供應管300之間以及第二射出管 520與第二供應管400之間。耦合器570可使得在化學物 質分別流經由驅動單元530擺動之第一與第二射出管510 與520以及第一與第二射出喷頭512與522。 / 第一與第二射出喷頭512與522可分別在縱向安裝於J - the injection tube (10) strikes the transmission member, the fourth injection tube is connected to the fourth injection tube, the ===== tube is connected to the third injection tube =, and the 5th swing motion transmission to the fourth injection tube . The oscillating motion of the injection tube to the one, in the embodiment, the first, to the base, and "= four shot nozzles: the third shot head and the second shot head The four-shot sprinkler is connected to the wheel and the less-to-send _ is transmitted to the third and fourth ejecting mouths. - The spouting movement is in the embodiment: 'the oscillating transmission The components include -10" (5) rounds - the first and the fifth (five) and the plural small third and fourth shots. The oscillating motion of the ejection head is transmitted to the substrate according to certain embodiments: a substrate, including first and second ejection tubes, driving: chemical substances are ejected to the member. The first and second injection tubes are early (10) and the oscillating transmission is emitted from the nozzles, and the chemical substances pass through and include the first and the first substrates, respectively. Driving the drive unit to emit a second injection nozzle to the portion to swing the end of the first shot to the first and the first tube, and the tube is placed in an embodiment, And the oscillating roller member is coupled to the first 201000214 injection nozzle toward the ejector. The wheel and the driven wheel member comprise at least one driving tooth to the second injection nozzle 3, and the oscillating motion of the injection nozzle is transmitted to the embodiment, wherein the oscillating transmission member comprises a de-gear, respectively A shot of ω and a plurality of small shots. The oscillating motion of the ejection nozzle is transmitted to the second. According to some embodiments, a processing tank is provided, the first and second supply tubes, the second unit, and the second unit, including a unit. The treatment tank is provided; /, one, the official and the drive from the outside of the treatment tank. The first and second supply tubes are chemically treated from the outside of the treatment tank through the tank. The first-and second-stage sprinklers are directly connected to one and two supply pipes, and are arranged on the same line, so that the first and second ends are adjacent to each other. The substance exits the substrate via the first and second exits. The driving soap element is interposed between the first and second injection tubes, and the upper end portion of the first and second injection tubes adjacent to the driving force surface is applied to swing the first and second injection tubes. In an embodiment, the first and second ejection tubes respectively comprise a first disk second driven plate at the upper end portion and the driving unit comprises a driving plate, wherein the driving power system is The drive board is transmitted to the first and second driven boards. In an embodiment, the driving unit includes a motor to generate the driving power; and a power transmitting member 'connects to the motor and the driving plate, and converts the rotation of the 201000214 into a linear reciprocating gear, thereby linearizing the linear Reciprocating \ A motor transmission wheel to the driving plate, so that the driving plate performs the pendulum action 0 should be the first one of the case, the device further includes the revolver 'between the first and the second η And the second supply pipe and the second injection pipe are respectively flown from the first and second supply pipes through the injection pipe, and the drive unit can swing the first and second according to certain The embodiment 'provides a processing tank, a plurality of supply pipes, and first and second injection pipes 2 to swing the transmission member. The treatment tank provides the treatment of the door movement = and extends to the inside of the treatment tank. The outside of the treatment tank is supplied to the outside of the chamber (four) and the supply tube is connected to the second and second injection tubes, respectively. And arranging the first and second injection tubes respectively including: a: parallel drive unit applying driving power to the substrate. ::two_. The oscillating transmission member connects the second injection pipe to the outlet pipe. g' and (d) the oscillating motion of the first-injection tube is transmitted to the second shot. According to some embodiments, the first 盥__, and the driving power is applied to the first in the second: tube arrangement in the same line domain With the second injection tube, the common zone is formed and the driving power is applied to the stability of the second shot = the second shot. Increasing the swing of the injection tube 201000214 In addition, in the above arrangement, the chemical substance is emitted to the substrate through the two passages of the first and second injection tubes, which is advantageous for the recently large-sized substrate. That is, since the first and second injection tubes, the chemical substance can be stably and uniformly supplied to the large-sized substrate, thereby improving the quality of the substrate. In order to make the above-mentioned contents of the present invention more comprehensible, the following description of the preferred embodiments and the accompanying drawings will be described in detail as follows: [Embodiment] Hereinafter, the present invention will be described in detail with reference to the related drawings. Specific embodiment. However, the invention is applicable to a variety of different forms and should not be limited to the disclosed embodiments. The embodiments are used to disclose the complete technology, and the technology of the present invention is provided by those skilled in the art, and the entire contents of the present invention are provided by those skilled in the art. In the drawings, the size and relative proportions of the coating and the area may be exaggerated due to the explicit depiction. When the description of a component or coating is "on," "connected to," or "connected to" another element or coating, it may be directly on, connected or connected, or may have an intervening component or coating. On the contrary, when the description of the component is "directly connected", "directly connected" or "directly connected" to another component or coating, there is no intervening component or coating. The same reference numerals are used to identify the same elements. The term "and/or" includes any and all combinations of the listed items. Although the terms first, second, third, etc. may be used in the description to describe various elements, components, regions, coatings and/or sections, these elements, components, regions, coatings and/or sections are not limited thereto. . The above nouns are only used in the area 9 201000214 I \MJ ^ ,. The different parts of the knife 'accessories, areas, coatings and / or sections. Thus, the elements, components, regions, coatings, and/or sections described below can be considered as a second component, accessory, and/or section from the teachings of the present invention. To the ceremony "丄 spatial relative nouns" such as "below", "below", "on 1", IS: can be used to describe the relationship between elements or features and other components or features. These spatial relative nouns are 涵 !! = indicates different directions outside of use or operation. For example, if the device is reversed, the other components or features are "or" or "lower", and the other components or features "i" = "therefore" The noun "below" can be covered under him. The device can also be placed in other directions (rotation of 9 degrees or its "there is also a corresponding interpretation of the terminology relative to the term. Limits; ^ Γ 之 ( (4) is only for describing a specific embodiment, and not for J Shifa :::下: 斤说' Unless the content is expressly stated otherwise, the singular form -! "+"/, is a plural. The name used in this specification q "includes" is the characteristic, the integer is in the month of the month. The existence of a name accessory, but the silk__<like, =, component and / or operation, meta #, β other features, integers, steps, too m or group presence or addition. Dry soil_This is an idealized embodiment (and its structure), which is an unconventional cross-sectional view display or a change in the shape of the pattern, such as a tolerance, and the heart is not used to limit the area. Special:: It. Therefore, the deformation of the actual form of the invention. For example, Figure 2 should include features such as rounded corners or curved corners at the time of manufacture. The implanted area is usually implanted at its side by a gradient rather than from the implant 201000214 into the unimplanted area. The dualization changes. Similarly, the buried area formed by implantation may result in partial implantation of the area between the buried area and the surface being implanted. Therefore, the regions in the drawings are schematic and their shapes are not intended to limit the scope of the invention. Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning meaning Unless explicitly defined, these nouns, as defined in the commonly used dictionary, should be interpreted as consistent with the meaning of the relevant art rather than interpreted as idealized or over-formalized. Hereinafter, specific embodiments to which the present invention is applied will be described in detail with reference to the drawings. Fig. 1 is a structural view of a device for processing a substrate according to an embodiment of the present invention, and Fig. 2 is a plan view showing a region around a driving unit of the device for processing a substrate shown in Fig. 1. Referring to FIG. 1 and FIG. 2, the apparatus 1000 for processing a substrate (hereinafter referred to as a processing apparatus) in the embodiment may include a processing chamber 100, a transmission unit 200, and first and second supply tubes 300 and 400. And a chemical injector 500. The processing chamber 100 can provide a space for processing the glass substrate G including the glass material as a flat display device. The treatment on the glass substrate G may include an etching process and a cleaning process. Substrate G may also include a semiconductor substrate, including a semiconductor material, such as a wafer of a semiconductor device. The transfer unit 200 can be located within the process chamber 100. The transfer unit 200 can continuously move the substrate G to the process chamber 100. The transport unit 200 can include a plurality of rollers 210 aligned in the direction of the width of the substrate G and parallel to each other. 11 201000214 i vv n. 1 1 The moment of moving the base G can be applied to one part of the roller to enhance the efficiency. In this case, the distance between the rollers that are rolled by the moment can be shorter than the length of the base G. In an embodiment, the first supply tube 300 can pass between the exterior and interior of the processing chamber 100. That is, the first supply pipe 300 can be connected to the chemical substance holding tank 10 located outside the processing chamber 100, so that the chemical substance C can be supplied to the processing chamber 100 via the first supply pipe 300. The chemical substance C can be used in an etching process or a cleaning process, and examples of the chemical substance C may include sulfuric acid, hydrochloric acid, hydrofluoric acid, H202, deionized water, and the like. These can be used singly or in combination. In an embodiment, the second supply tube 400 can also pass between the exterior and interior of the processing chamber 100 such that the first and second supply tubes 300 and 400 can abut each other at the inlet and outlet of the processing chamber 100. Therefore, the injection region of the chemical substance C can be expanded in the processing chamber 100. Like the first supply pipe, the second supply pipe 400 can also be connected to the chemical storage tank 10, and the chemical substance C can flow into the second supply pipe 400. In an embodiment, the chemical injector 500 may include first and second injection tubes 510 and 520 connected to the first and second supply tubes, respectively, and a driving unit 530 to swing the first and second injection tubes. 510 and 520. Referring to Figures 3 through 5, the chemical injector 500 will be described in detail. Fig. 3 is a front view of the drive plate of the drive unit shown in Fig. 2, and Fig. 4 is a side view of the drive plate of the drive unit shown in Fig. 2. Fig. 5 is a schematic view showing the swinging state of the first injection head by the driving unit shown in Fig. 2. 12 201000214 Referring to FIGS. 1 to 5 , the first and second injection tubes 510 and 520 may be respectively connected to the first and second supply tubes 300 and 400 and arranged in the first and second ejection tubes 510 and 520 . Can be on the same line. The chemical injector 500 may further include a plurality of couplers 570 between the first injection tube 510 and the first supply tube 300 and between the second injection tube 520 and the second supply tube 400. The coupler 570 can cause the first and second injection tubes 510 and 520 and the first and second ejection nozzles 512 and 522 to be oscillated via the driving unit 530 in the chemical substance, respectively. / The first and second ejection nozzles 512 and 522 can be respectively mounted in the longitudinal direction
V 第一與第二射出管510與520,因而在第一與第二射出管 510與520流動之化學物質C可直接射出至基底G。 第一與第二射出喷頭512與522可以一既定射出角度 從第一與第二射出管510與520突出朝向基底G。第一與 第二射出喷頭512與522可分別包括一孔，形成於第一與 第二射出管510與520之表面上。 在一實施例中，驅動單元500可在第一與第二射出管 ν 510與520之間從處理室100之外部延伸。例如，驅動單 元500可包括產生驅動動力且位於處理室100外側之馬達 540，在第一與第二射出管510與520之間延伸且連接至 馬達540之動力傳輸構件550，以及一驅動板560，連接 至動力傳輸構件550以由馬達540擺動。例如，複數驅動 板560可分別隨第一與第二射出管510與520而安裝。 動力傳輸構件550可包括偏心輪552，根據馬達540 之轉動而順時針或逆時針轉動，以及連桿554，機械連接 偏心輪552之第一偏心部以及驅動板560之第二偏心部。 13 201000214 1 νν^Η^Γ/\ 連桿554可包括第一桿 一偏心邻.筮—± 連接至偏心輪552之第 第一柃556 ’連接至驅動板560之第二偏心部· 以及連接構件557,連接第一桿盥第-一 ? 一扭a 杆”弟—才于555與556。第 一才干與弟二桿555與556可分別由接 由接D構件，例如鉚釘， 接s至偏心輪552與驅動板560。 因此’偏心輪552之偏心棘動可士势 ^ /iL r 埚得動了由弟一桿555與由連 ^ 557連接至第-桿555之第二桿咖轉換成線性往 復運動。因此，機械連接至第二桿556之驅動板56〇可由 往復運動而擺動。 另外’化學物質射出器500可包括一箱58〇，用以承 載在處理室100中操作之動力傳輸構件咖與驅動板 560,因而動力傳輸構件55〇與驅動板56〇可與處理室1〇〇 内部之環境隔絕。 、 因此，基底G可足以防止由動力傳輪構件55〇與驅動 板560之操作而污染。例如，箱58〇可更包括上蓋582與 下蓋584，因而實行動力傳輸構件55〇與驅動板56〇之維 護。 第一與第二受驅板514與524可分別安裝於第一與第 二射出管51〇與520面對驅動板560之末端部。驅動板560 之線性往復運動可傳輸至第一與第二受驅板514與524， 因而將擺動動作傳輸至第一與第二受驅板514與524。 當驅動板因為第二桿556難以同步傳輸擺動動作至 第一與第二受驅板514與524時，每一驅動板560可分別 安裝成對應於第一與第二受驅板514與524之第一與第二 驅動板。 14 201000214 例如，第一驅動板562可面對第一受驅板514，且連 接至連桿554之第二桿556。亦即，第一驅動板562可由 馬達之轉動而擺動。 第二驅動板564可面對第二受驅板524，且沿同一中 心軸連接至第一驅動板562，使得第一驅動板562之擺動 動作可直接傳輸至第二驅動板564。 箱580之一側壁可位於第一驅動板562與第一受驅板 514之間以及第二驅動板564與第二受驅板524之間。因 f 此，第一與第二驅動板562與564之擺動動作可傳輸至第 一與第二受驅板514與524，其並非以直接之方法’而係 以間接之方法，例如磁力方法。 例如，第一與第二磁性部563與565可位於第一與第 二驅動板562與564周圍’且第三與第四磁性部515與525 可位於第一與第二受驅板514與524周圍。 因此，第一與第二驅動板562與564可由馬達540之 轉動而進行擺動動作，且第一與第二受驅板514與524也 I 可隨第一與第二驅動板562與564進行擺動動作。第一與 第二射出管510與520由於第一與第二受驅板514與524 分別安裝入而可進行擺動動作，且最後第一與第二射出喷 頭512與522係安裝於第一與第二射出管510與520，可 進行擺動動作。 又，造成第一與第二射出管510與520之擺動動作之 轉動動力，可施加在介於第一與第二射出管510與520之 間之共同區域，相較於當第一與第二射出管510與520 — 體成形且造成擺動動作之轉動動力驅動動力施加於末端 15 201000214 部，增加射出管擺動動作之穩定性。 第一與第二射出 可有利於近來大 另外，上述設置中’化學物質c經由 管510與520之兩個通道射出至基底6， 尺寸化之基底G。 仆即，由於 叮禮—仏a 穴不一听扣官與520,化學物質 了私疋#地提供至大尺寸基底G，因而增進基底品質。 第6圖係本發明之實施例之處理基底之裝置之結 圖’且第7圖係第6圖所示之處理基底之I置之驅動。單元 周圍部分之平面圖。 本實施例之處理裝置1100實質上有與第i圖至第5 =示之處理裝置聰相同之結構，除了第—與第二射 出官之擺動動作之產生以外，使得以下圖式中，相同之 ，標林第i圖至第5 _同之科，且省略相同元件: 洋細§兄明。 —實施例中處理裝置11〇〇 200 ’第一與第二供應管 器 600。 請參見第6圖與第7圖，另 可包括一處理室1〇〇，傳輸單元 300與4〇〇，以及化學物質射出 處理室H)0可提供處理包括做為平面顯示裝置之玻 之玻璃基底G之空間。基底G可由傳輸單元2〇〇移 >處理室100。第一與第二供絲300肖400可彼此平 =描且化學物質C可從位於處理室⑽外部之化學物質保 ^槽1〇經由第一與第二供應管300與400供應至處理室 管組 在-實施例中，化學物質射出器_可包括第一射出 610與第一射出官組64〇，分別由搞合器剛連接至 201000214 第一與第二供應管300與400，以及驅動單元670，施加 驅動動力至第一與第二射出管組61〇與64〇其中之一。每 一射出管組可包括至少兩根射出管。 在本實施例中’施加驅動力之第一射出管組61〇之射 出管係稱為第一射出管620，且施加驅動力之第二射出管 組640之射出管係稱為第二射出管650。另外，未施加驅 動力之第一射出管組610之其他射出管係稱為第三射出管 630 ’且未施加驅動力之第二射出管組640之其他射出管 係稱為第四射出管660。 第—射出管620可位於與第二射出管650同一線上， 且第三射出管630可位於與第四射出管660同一線上。第 一、第一、第三與第四射出喷頭622、632、652與662可 刀別女裝於第-、第二、第三與第四射出管620、630、650 與660使侍化學物質c可經由每一射出喷頭直接射出至 基底G。 i 驅動單元670可在第一與第二射出管 '、 之間從處理室丨⑼之外部延伸。例如，驅動單 元670可包括甚*姑& 1 驅動早 .在第-食笛動力且位於處理室刚外側之馬達 馬達672之動力傳H官^與㈣之間延伸且連接至 接至動力傳輸構件^件674，以及複數驅動板676，連 復運動造成之擺動動作控動力傳輸構件674產生之往 673，件674可包括連桿675，機械連接於馬達 運動。驅動板6 67= 轉動可由連桿675轉換成線性往復 6之偏心部可連接至連桿奶，使得驅動 201000214 板676可由於連桿675之線性往復運動而進行擺動動作 另外，化學物質射出器600可包括一箱685，用: 載在處理室1〇〇中操作之動力傳輸構件674與驅動板7 676’因而動力傳輸構件674與驅動板676可與處理室 内部之環境隔絕。 ~ 00 第一與第一受驅板624與654可分別安裝於第〜與 二射出管620與650面對驅動板676之末端部。驅動板' 之線性往復運動可傳輸至第一與第二受驅板624與防4，6 因而將擺動動作傳輸至第一與第二受驅板624與。 箱685之一侧壁可位於驅動板676與第一與第二射出 管620與650之間。因此，驅動板676之擺動動作可傳衿 至苐一與第一受驅板624與654，其並非以直接之方、去3 而係以間接之方法，例如磁力方法。例如，複數磁性部可 位於驅動板676以及第一與第二受驅板624與654周園 另外，化學物質射出器600可包括擺動傳輸構件 690，以將該第一與第二射出管62〇與65〇之擺動動作傳 輪至第三與第四射出管630與660。 擺動傳輸構件690可將第一射出管620連結於第三射 出管630，且可將第二射出管650連結於第四射出管660。 第一射出管620與第三射出管630之間之連結具有與 第二射出管650與第四射出管660之間實質相同之結構， 因而以下根據第一射出管620與第三射出管630之間之連 結對擺動傳輸構件690詳細說明。 第8圖係本發明之實施例之第7圖所示之驅動單元之 動力傳輸構件之示意圖。 18 201000214 請參見第8圖，第一與第三射出噴頭622與632可從 第一與第三射出管620與630之第一與第三本體626與636 以一既定射出角度突出朝向基底G。本實施例中，擺動傳 輸構件690可連結於每一第一與第三射出喷頭622與632。 因此，當第一射出喷頭622可經由第一射出管620進 行擺動動作時，擺動傳輸構件690可直接將在第一射出喷 頭622之擺動動作傳輸至第三射出喷頭632。因此，第三 射出喷頭632可與第一射出喷頭622同步進行擺動動作。 雖然本實施例揭示兩個第一與第三射出喷頭622與 632都可連結於擺動傳輸構件690，只有在驅動力足夠時 第一與第三射出喷頭622與632之其中一者可連結於擺動 傳輸構件690，如熟習此技蓋人士所知。 因此，驅動單元670之驅動力可僅施加於第一與第二 射出管620與650,因而只有第一與第二射出管620與650 可進行擺動動作。然後，第一與第二射出管620與650之 擺動動作可傳輸至第三與第四射出管630與660，因而簡 化動力傳輸系統6 7 4與驅動板6 7 6之間之機械連桿系統。 又，箱6 8 5也可因動力傳輸系統6 7 4與驅動板6 7 6之間之 簡化機械連桿系統而小尺寸化。 請參見第9圖與第10圖，說明第一修正擺動傳輸構 件。 第9圖係第7圖所示之驅動單元之第一修正擺動傳輸 構件之示意圖，且第10圖係第9圖之A部分之部分放大 圖。 包括第一修正擺動傳輸構件之處理裝置實質上有與 19 201000214 1 vvj 外 ' ' 第6圖至第8圖所示之處理裝置相同之結構，除了擺動傳 輸構件以外，使得第9圖與第10圖中，相同之標號標示 與第6圖至第8圖相同之元件，且省略相同元件之詳細說 明。 請參見第9圖與第10圖，第一與第三射出喷頭762 與772可從化學物質射出器750之第一與第三射出管760 與770之第一與第三本體764與774突出朝向基底G。另 外，第一與第三射出喷頭762與772可分別於第一與第三 射出管760與770之第一與第三本體764與774上形成 孔。第一受驅板786可位於第一射出管760之第一本體764 之末端部。 擺動傳輸構件780可包括驅動齒輪與受驅齒輪782與 784。驅動齒輪782可耦合於第一射出管760之第一本體 764，使得第一射出管760之擺動動作可直接經由第一射 出管760之第一本體764傳輸至驅動齒輪782。 受驅齒輪784可耦合於第三射出管770之第三本體 774，且可機械連接至驅動齒輪782。亦即，受驅齒輪784 之第二齒可接觸於驅動齒輪782之第一齒之齒面。 驅動齒輪782之擺動動作可根據一既定齒輪比直接 傳輸至受驅齒輪784。然後，受驅齒輪784之擺動動作可 傳輸至第三射出管770之第三本體774，且因此第三射出 喷頭772可由擺動第三本體774而擺動。 上述驅動齒輪與受驅齒輪之範例可包括正齒輪系統 與螺旋齒輪系統。 因此，第一射出管7 6 0之擺動動作可經由包括驅動齒 20 201000214 輪與受驅齒輪782與784之擺動傳輸構件780傳輸至第三 射出管770。 請參見第11圖與第12圖，說明第二修正擺動傳輸構 件。 第11圖係第7圖所示之驅動單元之第二修正擺動傳 輸構件之示意圖，且第12圖係第11圖之B部分之部分放 大圖。 包括第二修正擺動傳輸構件之處理裝置實質上有與 第6圖至第8圖所示之處理裝置相同之結構，除了擺動傳 輸構件以外，使得第11圖與第12圖中，相同之標號標示 與第6圖至第8圖相同之元件，且省略相同元件之詳細說 明。 請參見第11圖與第12圖，第一與第三射出喷頭712 與722可從化學物質射出器750之第一與第三射出管710 與720之第一與第三本體714與724突出朝向基底G。第 一受驅板716可位於第一射出管710之第一本體714之末 、 端部。 擺動傳輸構件730可接觸於相對於第一與第三射出 喷頭712與722的第一與第三本體714與724。 特別是，擺動傳輸構件730可包括條狀之齒條732， 其第一齒面對第一與第三本體714與724,以及小齒輪715 或725，在每一第一與第三射出喷頭712與722嚙合於齒 條 732。 例如，第一小齒輪715之第二齒可在第一射出管710 之第一本體714嚙合於齒條732之第一齒，且第二小齒輪 21 201000214 1 VV ' * 725之第三齒可在第三射出管720之第三本體724嚙合於 齒條732之第一齒。 小齒輪715與725可分別一體成形於第一與第三本體 714與724以及第一與第三射出管710與720。另外，每 一小齒輪715與725可與射出管分離製造，然後小齒輪715 與725可分別耦合於第一與第三射出管710與720之第一 與第三本體714與724。雖然上述實施例揭示齒條與小齒 輪系統，任何熟悉此技藝人士已知之其他修正或傳輸系統 也可應用以取代或連接於齒條與小齒輪系統。 因此，第一射出管710之擺動動作可經由包括齒條和 小齒輪系統之擺動傳輸構件730傳輸至第三射出管720。 又，化學物質射出器600可更包括一導引構件（未圖 示），用以根據第一射出管710之第一本體714之擺動動 作控制擺動傳輸構件730之線性運動。 根據某些實施例，第一與第二射出管排列在同一線 上，且驅動動力在介於該第一與第二射出管之間之共同區 域施加至第一與第二射出管，因而相較於當第一與第二射 出管一體成形且驅動動力施加於末端部，增加射出管擺動 動作之穩定性。 綜上所述，雖然本發明已以一較佳實施例揭露如上， 然其並非用以限定本發明。本發明所屬技術領域中具有通 常知識者，在不脫離本發明之精神和範圍内，當可作各種 之更動與潤飾。因此，本發明之保護範圍當視後附之申請 專利範圍所界定者為準。 22 201000214 【圖式簡單說明】 第1圖係本發明之實施例之處理基底之裝置之結構 圖。 苐2圖係第1圖所示之處理基底之裝置之驅動單元周 圍區域之平面圖。 第3圖係第2圖所示之驅動單元之驅動板之正視圖。 第4圖係第2圖所示之驅動單元之驅動板之側視圖。 I 第5圖係由第2圖所示之驅動單元對第一射出喷頭之 擺動狀態之示意圖。 第6圖係本發明之實施例之處理基底之裝置之結構 圖。 第7圖係第6圖所示之處理基底之裝置之驅動單元周 圍部分之平面圖。 第8圖係本發明之實施例之第7圖所示之驅動翠元之 動力傳輸構件之示意圖。 第9圖係第7圖所示之驅動單元之第一修正擺動傳輸 構件之示意圖。 第10圖係第9圖之A部分之部分放大圖。 第11圖係第7圖所示之驅動單元之第二修正擺動傳 輸構件之示意圖。 第12圖係第11圖之B部分之部分放大圖。 23 201000214V First and second injection tubes 510 and 520, whereby the chemical substance C flowing in the first and second injection tubes 510 and 520 can be directly emitted to the substrate G. The first and second ejection nozzles 512 and 522 can protrude from the first and second ejection tubes 510 and 520 toward the substrate G at a predetermined exit angle. The first and second ejection nozzles 512 and 522 may respectively include a hole formed in the surfaces of the first and second ejection tubes 510 and 520. In an embodiment, the drive unit 500 can extend from the exterior of the process chamber 100 between the first and second exit tubes 510 and 520. For example, the drive unit 500 may include a motor 540 that generates drive power and is located outside the process chamber 100, a power transmission member 550 that extends between the first and second injection tubes 510 and 520 and that is coupled to the motor 540, and a drive plate 560. Connected to the power transmitting member 550 to be swung by the motor 540. For example, the plurality of drive plates 560 can be mounted with the first and second injection tubes 510 and 520, respectively. The power transmitting member 550 can include an eccentric 552 that rotates clockwise or counterclockwise in accordance with rotation of the motor 540, and a link 554 that mechanically couples the first eccentric portion of the eccentric 552 and the second eccentric portion of the drive plate 560. 13 201000214 1 νν^Η^Γ/\ The link 554 may include a first rod-eccentricity. 筮-± connected to the first 柃 556 ' of the eccentric 552 'connected to the second eccentric portion of the drive plate 560 · and connected The member 557 is connected to the first pole, the first one, the first one, and the second one, the 555 and the 556. The first and the second poles 555 and 556 can be respectively connected by D components, such as rivets, to s to The eccentric wheel 552 and the driving plate 560. Therefore, the eccentricity of the eccentric wheel 552 can be converted by the second pole 555 and the second pole connected by the connecting rod 557 to the first rod 555. The linear motion is reciprocated. Therefore, the drive plate 56 that is mechanically coupled to the second rod 556 can be swung by reciprocating motion. Further, the chemical injector 500 can include a box 58 〇 for carrying the power of operation in the process chamber 100. The transmission member and the driving plate 560, and thus the power transmitting member 55 and the driving plate 56, can be isolated from the environment inside the processing chamber 1. Therefore, the substrate G can be sufficiently prevented from being driven by the power transmitting member 55 and the driving plate 560. The operation is contaminated. For example, the box 58 can further include an upper cover 582 and a lower cover 584. The maintenance of the power transmitting member 55A and the driving plate 56 is performed. The first and second driven plates 514 and 524 are respectively attached to the end portions of the first and second emitting pipes 51A and 520 facing the driving plate 560. The linear reciprocating motion of the drive plate 560 can be transmitted to the first and second driven plates 514 and 524, thereby transmitting the swinging motion to the first and second driven plates 514 and 524. When the driving plate is difficult to synchronize because of the second lever 556 Each of the drive plates 560 can be mounted to correspond to the first and second drive plates of the first and second driven plates 514 and 524, respectively, when transmitting the swing motion to the first and second driven plates 514 and 524. 14 201000214 For example, the first driving plate 562 can face the first driven plate 514 and be connected to the second rod 556 of the connecting rod 554. That is, the first driving plate 562 can be swung by the rotation of the motor. The second driving plate 564 can be Facing the second driven plate 524 and connected to the first driving plate 562 along the same central axis, the swinging action of the first driving plate 562 can be directly transmitted to the second driving plate 564. One side wall of the box 580 can be located at the first Between the driving board 562 and the first driven board 514 and the second driving board 564 Between the second driven plates 524. Because of this, the swinging motions of the first and second driving plates 562 and 564 can be transmitted to the first and second driven plates 514 and 524, which are not in a straightforward manner. In an indirect method, such as a magnetic method. For example, the first and second magnetic portions 563 and 565 may be located around the first and second driving plates 562 and 564' and the third and fourth magnetic portions 515 and 525 may be located at the first Around the second driven plates 514 and 524. Therefore, the first and second driving plates 562 and 564 can be swung by the rotation of the motor 540, and the first and second driven plates 514 and 524 can also be swung with the first and second driving plates 562 and 564. action. The first and second injection tubes 510 and 520 can be swung by the first and second driven plates 514 and 524 respectively, and finally the first and second ejection nozzles 512 and 522 are mounted on the first and second The second injection tubes 510 and 520 can perform a swing operation. Moreover, the rotational power causing the swinging motion of the first and second exit pipes 510 and 520 can be applied to a common area between the first and second exit pipes 510 and 520, as compared to when the first and second The injection power of the injection tubes 510 and 520 and the rotational power driving force that causes the swinging motion is applied to the end portion 15002002, and the stability of the swinging motion of the injection tube is increased. The first and second shots may be advantageous in the near future. In addition, in the above arrangement, the chemical substance c is ejected to the substrate 6, the sized substrate G via two channels of the tubes 510 and 520. The servant, because the 叮 仏 仏 仏 不 不 不 520 520 520 520 520 520 520 520 520 520 520 520 520 520 520 520 520 520 520 520 520 520 520 520 520 520 520 Fig. 6 is a diagram of a device for processing a substrate according to an embodiment of the present invention, and Fig. 7 is a diagram showing the driving of the processing substrate shown in Fig. 6. A plan view of the area around the unit. The processing device 1100 of the present embodiment has substantially the same structure as the processing device of the first to fifth embodiments, except for the generation of the swinging motions of the first and second shots, so that the following figures are the same. , the standard i to the 5th _ the same subject, and omit the same components: Yang fine § brother Ming. - In the embodiment the processing means 11 〇〇 200 'the first and second supply pipes 600. Please refer to FIG. 6 and FIG. 7 , which may further include a processing chamber 1 , transfer units 300 and 4 , and a chemical injection processing chamber H) 0 for providing treatment of glass including glass as a flat display device. The space of the base G. The substrate G can be moved by the transfer unit 2 > processing chamber 100. The first and second supply wires 300 may be flush with each other and the chemical C may be supplied to the process chamber via the first and second supply tubes 300 and 400 from the chemical reservoir 1 located outside the processing chamber (10). In the embodiment, the chemical injector _ may include a first shot 610 and a first shot set 64 〇, which are respectively connected to the 201000214 first and second supply tubes 300 and 400 by the fitter, and the drive unit 670, driving power is applied to one of the first and second injection tube groups 61 and 64. Each of the injection tube sets may include at least two injection tubes. In the present embodiment, the injection pipe of the first injection pipe group 61 that applies the driving force is referred to as a first injection pipe 620, and the injection pipe of the second injection pipe group 640 to which the driving force is applied is referred to as a second injection pipe. 650. In addition, the other injection pipe of the first injection pipe group 610 to which the driving force is not applied is referred to as a third injection pipe 630 ′, and the other injection pipe of the second injection pipe group 640 to which the driving force is not applied is referred to as a fourth injection pipe 660 . . The first ejection tube 620 may be located on the same line as the second ejection tube 650, and the third ejection tube 630 may be located on the same line as the fourth ejection tube 660. The first, first, third and fourth injection nozzles 622, 632, 652 and 662 can be used to make the first, second, third and fourth injection tubes 620, 630, 650 and 660 The substance c can be directly emitted to the substrate G via each of the ejection nozzles. The i drive unit 670 can extend from the outside of the process chamber 9 (9) between the first and second injection tubes '. For example, the driving unit 670 may include a driver and a driver to be powered by the motor-motor 672 just outside the processing chamber and connected to the power transmission. The member member 674, and the plurality of driving plates 676, which are caused by the oscillating motion control power transmission member 674 generated by the continuous motion, may include a link 675 mechanically coupled to the motor. The drive plate 6 67 = the eccentric portion that can be converted into the linear reciprocation 6 by the link 675 can be connected to the link milk, so that the drive 201000214 plate 676 can be swung by the linear reciprocating motion of the link 675. In addition, the chemical injector 600 A box 685 can be included for: the power transfer member 674 and the drive plate 7 676' that are operated in the process chamber 1 and thus the power transfer member 674 and the drive plate 676 can be isolated from the environment inside the process chamber. The first and first driven plates 624 and 654 may be mounted to the end portions of the first and second exit pipes 620 and 650 facing the driving plate 676, respectively. The linear reciprocating motion of the drive plate' can be transmitted to the first and second driven plates 624 and 4, 6 thereby transmitting the oscillating motion to the first and second driven plates 624. One of the side walls of the box 685 can be located between the drive plate 676 and the first and second injection tubes 620 and 650. Therefore, the swinging motion of the driving board 676 can be transmitted to the first and first driven boards 624 and 654, which is not indirect, and indirect, such as a magnetic method. For example, the plurality of magnetic portions may be located on the drive plate 676 and the first and second driven plates 624 and 654. Further, the chemical injector 600 may include a swing transmission member 690 to slap the first and second injection tubes 62. The oscillating motion is transmitted to the third and fourth exit pipes 630 and 660. The swing transmission member 690 can couple the first injection tube 620 to the third emission tube 630, and can connect the second emission tube 650 to the fourth emission tube 660. The connection between the first injection tube 620 and the third injection tube 630 has substantially the same structure as that between the second injection tube 650 and the fourth emission tube 660, and thus is based on the first injection tube 620 and the third emission tube 630. The connection between the two is explained in detail for the swing transmission member 690. Fig. 8 is a view showing the power transmission member of the drive unit shown in Fig. 7 of the embodiment of the present invention. 18 201000214 Referring to Fig. 8, the first and third ejection nozzles 622 and 632 can protrude from the first and third bodies 626 and 636 of the first and third ejection tubes 620 and 630 toward the substrate G at a predetermined exit angle. In this embodiment, the oscillating transmission member 690 can be coupled to each of the first and third ejection nozzles 622 and 632. Therefore, when the first injection nozzle 622 can perform the swinging motion via the first injection tube 620, the swing transmission member 690 can directly transmit the swing motion of the first injection nozzle 622 to the third injection nozzle 632. Therefore, the third injection head 632 can perform a swing operation in synchronization with the first injection head 622. Although the present embodiment discloses that both the first and third ejection nozzles 622 and 632 can be coupled to the oscillating transmission member 690, only one of the first and third ejection nozzles 622 and 632 can be coupled when the driving force is sufficient. The oscillating transmission member 690 is known to those skilled in the art. Therefore, the driving force of the driving unit 670 can be applied only to the first and second exit pipes 620 and 650, so that only the first and second exit pipes 620 and 650 can perform the swinging motion. Then, the swinging motions of the first and second exit pipes 620 and 650 can be transmitted to the third and fourth exit pipes 630 and 660, thereby simplifying the mechanical linkage system between the power transmission system 674 and the drive plate 67. . Further, the case 658 can also be downsized by the simplified mechanical linkage system between the power transmission system 647 and the drive plate 676. Referring to Figures 9 and 10, the first modified wobble transmission member will be described. Fig. 9 is a view showing a first modified wobble transmission member of the drive unit shown in Fig. 7, and Fig. 10 is a partially enlarged view of a portion A of Fig. 9. The processing device including the first modified wobble transmission member has substantially the same structure as the processing device shown in FIG. 6 to FIG. 8 in the form of 19 201000214 1 vvj except for the wobble transmission member, making FIG. 9 and FIG. In the figures, the same reference numerals are given to the same elements as in FIGS. 6 to 8, and the detailed description of the same elements is omitted. Referring to Figures 9 and 10, the first and third ejection nozzles 762 and 772 can protrude from the first and third bodies 764 and 774 of the first and third ejection tubes 760 and 770 of the chemical injector 750. Facing the base G. In addition, the first and third ejection nozzles 762 and 772 may form holes in the first and third bodies 764 and 774 of the first and third ejection tubes 760 and 770, respectively. The first driven plate 786 can be located at a distal end of the first body 764 of the first injection tube 760. The oscillating transmission member 780 can include drive and driven gears 782 and 784. The drive gear 782 can be coupled to the first body 764 of the first injection tube 760 such that the swinging motion of the first injection tube 760 can be transmitted directly to the drive gear 782 via the first body 764 of the first injection tube 760. The driven gear 784 can be coupled to the third body 774 of the third injection tube 770 and can be mechanically coupled to the drive gear 782. That is, the second tooth of the driven gear 784 can contact the tooth flanks of the first teeth of the drive gear 782. The swinging motion of the drive gear 782 can be directly transmitted to the driven gear 784 according to a predetermined gear ratio. Then, the swinging motion of the driven gear 784 can be transmitted to the third body 774 of the third shooting tube 770, and thus the third shooting head 772 can be swung by the swinging third body 774. Examples of the above-described drive gear and driven gear may include a spur gear system and a helical gear system. Therefore, the swinging motion of the first injection tube 760 can be transmitted to the third ejection tube 770 via the oscillating transmission member 780 including the driving teeth 20 201000214 and the driven gears 782 and 784. Referring to Figures 11 and 12, a second modified wobble transmission member will be described. Fig. 11 is a view showing a second modified oscillating transmission member of the drive unit shown in Fig. 7, and Fig. 12 is a partial enlarged view of a portion B of Fig. 11. The processing device including the second modified wobble transmission member has substantially the same structure as the processing device shown in FIGS. 6 to 8, except for the wobble transmission member, so that the same reference numerals are used in FIGS. 11 and 12. The same components as those of FIGS. 6 to 8 are omitted, and the detailed description of the same components is omitted. Referring to Figures 11 and 12, the first and third ejection nozzles 712 and 722 can protrude from the first and third bodies 714 and 724 of the first and third ejection tubes 710 and 720 of the chemical injector 750. Facing the base G. The first driven plate 716 can be located at the end, end of the first body 714 of the first injection tube 710. The oscillating transmission member 730 is contactable with the first and third bodies 714 and 724 with respect to the first and third ejection nozzles 712 and 722. In particular, the oscillating transmission member 730 may include a strip-shaped rack 732 having a first tooth facing the first and third bodies 714 and 724, and a pinion 715 or 725 at each of the first and third injection nozzles 712 and 722 are engaged with the rack 732. For example, the second tooth of the first pinion 715 can be engaged with the first tooth of the rack 732 at the first body 714 of the first injection tube 710, and the third tooth of the second pinion 21 201000214 1 VV '* 725 can be The third body 724 of the third injection tube 720 is engaged with the first tooth of the rack 732. Pinion gears 715 and 725 can be integrally formed with first and third bodies 714 and 724 and first and third injection tubes 710 and 720, respectively. Additionally, each of the pinions 715 and 725 can be fabricated separately from the injection tube, and then the pinions 715 and 725 can be coupled to the first and third bodies 714 and 724 of the first and third injection tubes 710 and 720, respectively. While the above embodiments disclose a rack and pinion system, any other correction or transmission system known to those skilled in the art can be utilized in place of or in connection with the rack and pinion system. Therefore, the swinging motion of the first injection tube 710 can be transmitted to the third emission tube 720 via the swing transmission member 730 including the rack and pinion system. Further, the chemical injector 600 may further include a guiding member (not shown) for controlling the linear motion of the oscillating transmission member 730 according to the oscillating motion of the first body 714 of the first injection tube 710. According to some embodiments, the first and second injection tubes are arranged on the same line, and the driving power is applied to the first and second injection tubes in a common area between the first and second injection tubes, thereby comparing When the first and second injection tubes are integrally formed and the driving power is applied to the distal end portion, the stability of the swinging motion of the injection tube is increased. In view of the above, the present invention has been disclosed in a preferred embodiment, and is not intended to limit the present invention. It will be apparent to those skilled in the art that various changes and modifications can be made without departing from the spirit and scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims. 22 201000214 [Simplified description of the drawings] Fig. 1 is a structural view of a device for processing a substrate according to an embodiment of the present invention. Fig. 2 is a plan view showing the peripheral area of the driving unit of the apparatus for processing the substrate shown in Fig. 1. Figure 3 is a front elevational view of the drive plate of the drive unit shown in Figure 2. Figure 4 is a side view of the drive plate of the drive unit shown in Figure 2. I Fig. 5 is a schematic view showing the state of oscillation of the first injection head by the driving unit shown in Fig. 2. Fig. 6 is a structural view of a device for treating a substrate according to an embodiment of the present invention. Fig. 7 is a plan view showing the peripheral portion of the driving unit of the apparatus for processing the substrate shown in Fig. 6. Fig. 8 is a view showing the power transmission member for driving the Tsui Yuan shown in Fig. 7 of the embodiment of the present invention. Fig. 9 is a view showing the first modified wobble transmission member of the drive unit shown in Fig. 7. Fig. 10 is a partially enlarged view of a portion A of Fig. 9. Fig. 11 is a view showing the second modified oscillating transmission member of the drive unit shown in Fig. 7. Fig. 12 is a partially enlarged view of a portion B of Fig. 11. 23 201000214
1 W 【主要元件符號說明】 1000處理裝置 10化學物質保存槽 100 處理室 200 傳輸單元 210 滚輪 300 第一供應管 400 第二供應管 500 化學物質射出器 510 第一射出管 512 第一射出喷頭 514 第一受驅板 515 第三磁性部 520 第二射出管 522 第二射出喷頭 524 第二受驅板 525 第四磁性部 530 驅動單元 540 馬達 550 動力傳輸構件 552 偏心輪 554 連桿 555 第一桿 556 第二桿 557 連接構件 560 驅動板 563 第一磁性部 565 第二磁性部 570 耦合器 580 箱 201000214 582 上蓋 584 下蓋 G基底 C化學物質 1100 處理裝置 600 化學物質射出器 610 第一射出管組 620 第一射出管 622 第一射出喷頭 624 第一受驅板 626 第一本體 630 第三射出管 632 第三射出喷頭 636 第三本體 640 第二射出管組 650 第二射出管 652 第二射出喷頭 654 弟一受驅板 660 第四射出管 662 第四射出喷頭 670 驅動單元 672 馬達 674 動力傳輸構件 675 連桿 676 驅動板 680 耦合器 685 箱 690 擺動傳輸構件 710 第一射出管 712 第一射出喷頭 25 201000214 714 第一本體 715 第一小齒輪 716 第一受驅板 720 第三射出管 722 第三射出喷頭 724 第三本體 725 第二小齒輪 730 擺動傳輸構件 732 齒條 750 化學物質射出器 760 第一射出管 762 第一射出喷頭 764 第一本體 770 第三射出管 772 第三射出喷頭 774 第三本體 780 擺動傳輸構件 782 驅動齒輪 784 受驅齒輪 786 第一受驅板1 W [Description of main component symbols] 1000 processing device 10 chemical substance storage tank 100 Processing chamber 200 Transmission unit 210 Roller 300 First supply pipe 400 Second supply pipe 500 Chemical substance injector 510 First injection pipe 512 First injection nozzle 514 first driven plate 515 third magnetic portion 520 second injection tube 522 second injection nozzle 524 second driven plate 525 fourth magnetic portion 530 drive unit 540 motor 550 power transmission member 552 eccentric wheel 554 link 555 One rod 556 second rod 557 connecting member 560 driving plate 563 first magnetic portion 565 second magnetic portion 570 coupler 580 box 201000214 582 upper cover 584 lower cover G base C chemical substance 1100 processing device 600 chemical substance injector 610 first shot Tube set 620 first shot tube 622 first shot head 624 first driven plate 626 first body 630 third shot tube 632 third shot head 636 third body 640 second shot tube set 650 second shot tube 652 Second injection nozzle 654, one drive plate 660, fourth injection tube 662, fourth injection nozzle 670, drive unit 672, motor 674, power transmission Transmission member 675 link 676 drive plate 680 coupler 685 box 690 swing transmission member 710 first injection tube 712 first injection nozzle 25 201000214 714 first body 715 first pinion 716 first driven plate 720 third injection tube 722 third injection nozzle 724 third body 725 second pinion 730 swing transmission member 732 rack 750 chemical injector 760 first injection tube 762 first injection nozzle 764 first body 770 third injection tube 772 third Injection nozzle 774 third body 780 oscillating transmission member 782 drive gear 784 driven gear 786 first driven plate