TWI317851B - Positive resist composition and resist pattern formation method - Google Patents
Positive resist composition and resist pattern formation methodInfo
- Publication number
- TWI317851B TWI317851B TW094101312A TW94101312A TWI317851B TW I317851 B TWI317851 B TW I317851B TW 094101312 A TW094101312 A TW 094101312A TW 94101312 A TW94101312 A TW 94101312A TW I317851 B TWI317851 B TW I317851B
- Authority
- TW
- Taiwan
- Prior art keywords
- formation method
- pattern formation
- resist pattern
- resist composition
- positive
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/126—Halogen compound containing
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004015716 | 2004-01-23 | ||
JP2004351701A JP4347205B2 (ja) | 2004-01-23 | 2004-12-03 | ポジ型レジスト組成物およびレジストパターン形成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200537246A TW200537246A (en) | 2005-11-16 |
TWI317851B true TWI317851B (en) | 2009-12-01 |
Family
ID=34810129
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094101312A TWI317851B (en) | 2004-01-23 | 2005-01-17 | Positive resist composition and resist pattern formation method |
Country Status (5)
Country | Link |
---|---|
US (1) | US7727701B2 (zh) |
EP (1) | EP1710628B1 (zh) |
JP (1) | JP4347205B2 (zh) |
TW (1) | TWI317851B (zh) |
WO (1) | WO2005071490A1 (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1662321A1 (en) * | 2004-11-24 | 2006-05-31 | Rohm and Haas Electronic Materials, L.L.C. | Photoresist compositions |
US8062825B2 (en) | 2004-12-03 | 2011-11-22 | Tokyo Ohka Kogyo Co., Ltd. | Positive resist composition and resist pattern forming method |
JP2007225647A (ja) | 2006-02-21 | 2007-09-06 | Tokyo Ohka Kogyo Co Ltd | 超臨界現像プロセス用レジスト組成物 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR0159808B1 (ko) * | 1993-01-19 | 1999-02-18 | 가나가와 지히로 | 레지스트 조성물 |
JP3709657B2 (ja) * | 1997-06-10 | 2005-10-26 | Jsr株式会社 | 感放射線性組成物 |
KR100533402B1 (ko) | 1998-04-14 | 2005-12-02 | 후지 샤신 필름 가부시기가이샤 | 포지티브 감광성 조성물 |
US6159653A (en) * | 1998-04-14 | 2000-12-12 | Arch Specialty Chemicals, Inc. | Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations |
JP4262427B2 (ja) * | 2000-09-12 | 2009-05-13 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
JP4253427B2 (ja) * | 2000-09-19 | 2009-04-15 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
JP2002169288A (ja) | 2000-11-30 | 2002-06-14 | Tokyo Ohka Kogyo Co Ltd | ポジ型レジスト組成物及びそれを用いたポジ型レジスト基材 |
JP2002341538A (ja) | 2001-05-11 | 2002-11-27 | Fuji Photo Film Co Ltd | 電子線またはx線用ポジ型レジスト組成物 |
JP4004820B2 (ja) * | 2001-10-01 | 2007-11-07 | 富士フイルム株式会社 | ポジ型電子線、x線又はeuv用レジスト組成物 |
JP2003295444A (ja) * | 2001-10-09 | 2003-10-15 | Shipley Co Llc | アセタール/脂環式ポリマーおよびフォトレジスト組成物 |
JP2003307840A (ja) | 2002-02-13 | 2003-10-31 | Fuji Photo Film Co Ltd | ポジ型フォトレジスト組成物 |
JP2003302754A (ja) * | 2002-04-12 | 2003-10-24 | Fuji Photo Film Co Ltd | レジスト組成物 |
JP4149306B2 (ja) * | 2003-04-30 | 2008-09-10 | 東京応化工業株式会社 | ポジ型レジスト組成物およびレジストパターン形成方法 |
-
2004
- 2004-12-03 JP JP2004351701A patent/JP4347205B2/ja active Active
-
2005
- 2005-01-14 US US10/586,694 patent/US7727701B2/en active Active
- 2005-01-14 WO PCT/JP2005/000351 patent/WO2005071490A1/ja active Application Filing
- 2005-01-14 EP EP05703590.9A patent/EP1710628B1/en active Active
- 2005-01-17 TW TW094101312A patent/TWI317851B/zh active
Also Published As
Publication number | Publication date |
---|---|
WO2005071490A1 (ja) | 2005-08-04 |
EP1710628A1 (en) | 2006-10-11 |
EP1710628B1 (en) | 2013-07-03 |
TW200537246A (en) | 2005-11-16 |
US20080241747A1 (en) | 2008-10-02 |
EP1710628A4 (en) | 2010-01-13 |
US7727701B2 (en) | 2010-06-01 |
JP2005234534A (ja) | 2005-09-02 |
JP4347205B2 (ja) | 2009-10-21 |
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