TWI281695B - Semiconductor single crystal manufacturing equipment and graphite crucible - Google Patents
Semiconductor single crystal manufacturing equipment and graphite crucible Download PDFInfo
- Publication number
- TWI281695B TWI281695B TW094110300A TW94110300A TWI281695B TW I281695 B TWI281695 B TW I281695B TW 094110300 A TW094110300 A TW 094110300A TW 94110300 A TW94110300 A TW 94110300A TW I281695 B TWI281695 B TW I281695B
- Authority
- TW
- Taiwan
- Prior art keywords
- heater
- heat
- heaters
- single crystal
- crucible
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/10—Crucibles or containers for supporting the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/14—Heating of the melt or the crystallised materials
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
- Y10T117/1068—Seed pulling including heating or cooling details [e.g., shield configuration]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
- Y10T117/1072—Seed pulling including details of means providing product movement [e.g., shaft guides, servo means]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1076—Apparatus for crystallization from liquid or supercritical state having means for producing a moving solid-liquid-solid zone
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1076—Apparatus for crystallization from liquid or supercritical state having means for producing a moving solid-liquid-solid zone
- Y10T117/1088—Apparatus for crystallization from liquid or supercritical state having means for producing a moving solid-liquid-solid zone including heating or cooling details
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004105341 | 2004-03-31 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200535981A TW200535981A (en) | 2005-11-01 |
TWI281695B true TWI281695B (en) | 2007-05-21 |
Family
ID=35063808
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094110300A TWI281695B (en) | 2004-03-31 | 2005-03-31 | Semiconductor single crystal manufacturing equipment and graphite crucible |
Country Status (6)
Country | Link |
---|---|
US (1) | US7390361B2 (de) |
JP (1) | JP4773340B2 (de) |
KR (1) | KR101072664B1 (de) |
DE (1) | DE112005000715B4 (de) |
TW (1) | TWI281695B (de) |
WO (1) | WO2005095680A1 (de) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI681087B (zh) * | 2018-04-27 | 2020-01-01 | 日商Sumco股份有限公司 | 矽單結晶的製造方法及矽單結晶的提拉裝置 |
US10844513B2 (en) | 2016-05-24 | 2020-11-24 | Siltronic Ag | Method for producing a semiconductor wafer of monocrystalline silicon, device for producing a semiconductor wafer of monocrystalline silicon and semiconductor wafer of monocrystalline |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7497907B2 (en) * | 2004-07-23 | 2009-03-03 | Memc Electronic Materials, Inc. | Partially devitrified crucible |
DE112006002595B4 (de) * | 2005-09-30 | 2018-03-01 | Sumco Techxiv K.K. | Herstellungsvorrichtung und Herstellungsverfahren für einen Einkristall-Halbleiter |
JP5073257B2 (ja) * | 2006-09-27 | 2012-11-14 | Sumco Techxiv株式会社 | 単結晶製造装置及び方法 |
KR100831809B1 (ko) | 2006-12-29 | 2008-05-28 | 주식회사 실트론 | 쵸크랄스키법에 의한 잉곳 성장용 히터 및 이를 구비하는단결정 잉곳 제조 장치 |
US20090090135A1 (en) * | 2007-10-04 | 2009-04-09 | Infrared Focal Systems, Inc. | Method of making optical glass windows free of defects |
JP5131170B2 (ja) * | 2008-12-05 | 2013-01-30 | 信越半導体株式会社 | 単結晶製造用上部ヒーターおよび単結晶製造装置ならびに単結晶製造方法 |
JP5554401B2 (ja) * | 2009-04-27 | 2014-07-23 | アキュライド インターナショナル,インコーポレイテッド | 引出しスライド及び錠止機構 |
JP5317117B2 (ja) * | 2009-07-23 | 2013-10-16 | 株式会社フジクラ | 窒化物単結晶の製造装置 |
JP5392040B2 (ja) * | 2009-12-04 | 2014-01-22 | 信越半導体株式会社 | 単結晶製造装置及び単結晶製造方法 |
CN102517624A (zh) * | 2011-12-16 | 2012-06-27 | 华中科技大学 | 一种多段控温晶体生长炉 |
CN102758248A (zh) * | 2012-06-20 | 2012-10-31 | 合肥景坤新能源有限公司 | 单晶炉用均热式加热*** |
CN102758254A (zh) * | 2012-06-20 | 2012-10-31 | 合肥景坤新能源有限公司 | 单晶炉加热*** |
KR101333791B1 (ko) * | 2013-01-30 | 2013-11-29 | 한국세라믹기술원 | 단결정 성장장치 |
KR101467103B1 (ko) * | 2013-06-21 | 2014-11-28 | 주식회사 엘지실트론 | 실리콘 단결정 성장 장치 및 그 성장 방법 |
CN105379415A (zh) * | 2013-07-15 | 2016-03-02 | 莫门蒂夫性能材料股份有限公司 | 带涂层的石墨加热器构造 |
JP6458451B2 (ja) * | 2014-10-31 | 2019-01-30 | 住友電気工業株式会社 | 炭化珪素単結晶の製造装置および炭化珪素単結晶の製造方法 |
CN106637386A (zh) * | 2015-10-30 | 2017-05-10 | 西安通鑫半导体辅料有限公司 | 提高拉晶速度的直拉单晶用加热器及直拉单晶方法 |
CN106637387B (zh) * | 2015-10-30 | 2019-12-17 | 西安通鑫半导体辅料有限公司 | 直拉单晶用加热器及直拉单晶方法 |
CN108350603B (zh) | 2015-11-13 | 2020-11-13 | 胜高股份有限公司 | 单晶硅的制造方法 |
JP6579046B2 (ja) | 2016-06-17 | 2019-09-25 | 株式会社Sumco | シリコン単結晶の製造方法 |
KR102237292B1 (ko) | 2019-07-31 | 2021-04-06 | 에스케이실트론 주식회사 | 잉곳 성장 장치용 도가니 |
CN110965118B (zh) * | 2019-12-25 | 2022-04-15 | 西安奕斯伟材料科技有限公司 | 一种导流筒装置和拉晶炉 |
KR20230105339A (ko) * | 2020-11-12 | 2023-07-11 | 글로벌웨이퍼스 씨오., 엘티디. | 측면 히터 아래에 배치되는 열 차폐부를 갖는 잉곳 풀러 장치 및 이러한 장치를 이용하여 잉곳을 준비하기 위한 방법들 |
US20220145492A1 (en) * | 2020-11-12 | 2022-05-12 | GlobalWaters Co., Ltd. | Ingot puller apparatus having a heat shield disposed below a side heater and methods for preparing an ingot with such apparatus |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62153191A (ja) * | 1985-12-27 | 1987-07-08 | Mitsubishi Metal Corp | 単結晶引き上げ装置 |
JP2681115B2 (ja) | 1989-02-14 | 1997-11-26 | 住友シチックス株式会社 | 単結晶製造方法 |
JP3031470B2 (ja) | 1989-05-29 | 2000-04-10 | ヤマハ発動機株式会社 | 4サイクルエンジン |
DE4204777A1 (de) * | 1991-02-20 | 1992-10-08 | Sumitomo Metal Ind | Vorrichtung und verfahren zum zuechten von einkristallen |
JP2979770B2 (ja) | 1991-09-11 | 1999-11-15 | 住友電気工業株式会社 | 単結晶の製造装置 |
JPH09227286A (ja) * | 1996-02-24 | 1997-09-02 | Komatsu Electron Metals Co Ltd | 単結晶製造装置 |
JPH09263491A (ja) * | 1996-03-27 | 1997-10-07 | Shin Etsu Handotai Co Ltd | シリコン単結晶の製造装置 |
JP3000923B2 (ja) | 1996-03-28 | 2000-01-17 | 住友金属工業株式会社 | 単結晶引き上げ方法 |
JP3788116B2 (ja) * | 1999-07-26 | 2006-06-21 | 株式会社Sumco | 単結晶成長用多機能ヒーターおよび単結晶引上装置 |
US6285011B1 (en) * | 1999-10-12 | 2001-09-04 | Memc Electronic Materials, Inc. | Electrical resistance heater for crystal growing apparatus |
JP3595977B2 (ja) * | 1999-10-15 | 2004-12-02 | 株式会社日鉱マテリアルズ | 結晶成長装置及び単結晶の製造方法 |
DE19959416C1 (de) * | 1999-12-09 | 2001-03-15 | Freiberger Compound Mat Gmbh | Heizelement zum Beheizen von Schmelztiegeln und Anordnung von Heizelementen |
JP2001270797A (ja) | 2000-03-28 | 2001-10-02 | Wacker Nsce Corp | シリコン単結晶製造装置 |
-
2005
- 2005-03-31 WO PCT/JP2005/006321 patent/WO2005095680A1/ja active Application Filing
- 2005-03-31 US US10/594,175 patent/US7390361B2/en active Active
- 2005-03-31 DE DE112005000715.4T patent/DE112005000715B4/de active Active
- 2005-03-31 JP JP2006511810A patent/JP4773340B2/ja active Active
- 2005-03-31 TW TW094110300A patent/TWI281695B/zh active
-
2006
- 2006-09-27 KR KR1020067020043A patent/KR101072664B1/ko active IP Right Grant
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10844513B2 (en) | 2016-05-24 | 2020-11-24 | Siltronic Ag | Method for producing a semiconductor wafer of monocrystalline silicon, device for producing a semiconductor wafer of monocrystalline silicon and semiconductor wafer of monocrystalline |
TWI681087B (zh) * | 2018-04-27 | 2020-01-01 | 日商Sumco股份有限公司 | 矽單結晶的製造方法及矽單結晶的提拉裝置 |
Also Published As
Publication number | Publication date |
---|---|
DE112005000715B4 (de) | 2016-02-04 |
US7390361B2 (en) | 2008-06-24 |
KR20070001203A (ko) | 2007-01-03 |
JPWO2005095680A1 (ja) | 2008-07-31 |
US20070215038A1 (en) | 2007-09-20 |
KR101072664B1 (ko) | 2011-10-11 |
DE112005000715T5 (de) | 2008-07-03 |
JP4773340B2 (ja) | 2011-09-14 |
WO2005095680A1 (ja) | 2005-10-13 |
TW200535981A (en) | 2005-11-01 |
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