TWI281599B - Substrate processing system - Google Patents
Substrate processing system Download PDFInfo
- Publication number
- TWI281599B TWI281599B TW091132308A TW91132308A TWI281599B TW I281599 B TWI281599 B TW I281599B TW 091132308 A TW091132308 A TW 091132308A TW 91132308 A TW91132308 A TW 91132308A TW I281599 B TWI281599 B TW I281599B
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- substrate processing
- processing system
- processing unit
- unit
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
- G03F7/3064—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations characterised by the transport means or means for confining the different units, e.g. to avoid the overflow
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3092—Recovery of material; Waste processing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Nonlinear Science (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Environmental & Geological Engineering (AREA)
- Optics & Photonics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Cleaning By Liquid Or Steam (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001376695A JP3850281B2 (ja) | 2001-12-11 | 2001-12-11 | 基板処理システム |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200300875A TW200300875A (en) | 2003-06-16 |
TWI281599B true TWI281599B (en) | 2007-05-21 |
Family
ID=19184835
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW091132308A TWI281599B (en) | 2001-12-11 | 2002-10-31 | Substrate processing system |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP3850281B2 (ja) |
KR (1) | KR100918165B1 (ja) |
TW (1) | TWI281599B (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4407970B2 (ja) * | 2006-11-28 | 2010-02-03 | 東京エレクトロン株式会社 | 基板処理装置及び基板処理方法 |
JP7097759B2 (ja) * | 2018-06-22 | 2022-07-08 | 東京エレクトロン株式会社 | 基板処理装置および基板処理方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3364294B2 (ja) * | 1993-10-07 | 2003-01-08 | 株式会社荏原製作所 | 搬送装置および搬送方法 |
JPH07231028A (ja) * | 1994-02-18 | 1995-08-29 | Ebara Corp | 搬送装置および搬送方法 |
JP3100839B2 (ja) * | 1994-06-30 | 2000-10-23 | 大日本スクリーン製造株式会社 | 基板表面処理装置 |
JPH11121344A (ja) * | 1997-10-21 | 1999-04-30 | Nec Yamagata Ltd | スピン塗布装置 |
JPH11156771A (ja) * | 1997-11-28 | 1999-06-15 | Dainippon Screen Mfg Co Ltd | 基板搬送装置および基板搬送方法 |
JP3884170B2 (ja) * | 1998-06-18 | 2007-02-21 | 大日本スクリーン製造株式会社 | 基板処理装置 |
-
2001
- 2001-12-11 JP JP2001376695A patent/JP3850281B2/ja not_active Expired - Fee Related
-
2002
- 2002-10-31 TW TW091132308A patent/TWI281599B/zh active
- 2002-12-04 KR KR1020020076482A patent/KR100918165B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JP3850281B2 (ja) | 2006-11-29 |
JP2003178949A (ja) | 2003-06-27 |
TW200300875A (en) | 2003-06-16 |
KR100918165B1 (ko) | 2009-09-17 |
KR20030047746A (ko) | 2003-06-18 |
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