TWI277720B

TWI277720B - Multi-axis interferometer apparatus and method, lithography apparatus and method using same, and beam writing system and method using same

Info

Publication number: TWI277720B
Application number: TW92101675A
Authority: TW
Inventors: Henry A Hill
Original assignee: Zygo Corp
Priority date: 2002-01-28
Filing date: 2003-01-27
Publication date: 2007-04-01
Also published as: TW200400346A

Abstract

An apparatus includes a multi-axis interferometer for measuring a relative position of a reflective measurement object along multiple degrees of freedom, wherein the interferometer is configured to produce multiple output beams each comprising information about the relative position of the measurement object with respect to a different one of the degrees of freedom. Each output beam includes a beam component that contacts the measurement object at least one time along a common path, and at least one of the beam components further contacts the measurement object at least a second time along a first path different from the common path.

Description

12777201277720

發明所屬之技術領域 ’特別有關於一平面鏡量測物。種多重自本發明係有關於一種干涉儀由度量測的干涉儀，用於量測一先前技術位移量測干涉儀監視器量測物與參考物之間移動。量測物反射的量測光束以及而產生該光學干涉訊號。其位置根據光學干涉訊號，在該干涉儀藉由重疊及干涉一從一從參考物反射的參考光束，The technical field to which the invention pertains is particularly concerned with a flat mirror measurement. A multi-automatic invention relates to an interferometer metric-measured interferometer for measuring a prior art displacement measurement interferometer monitor measuring movement between a reference object and a reference object. The measuring beam reflected by the measuring object and the optical interference signal are generated. The position is based on the optical interference signal, and the interferometer is superimposed and interfered with a reference beam reflected from the reference object.

在許多例子中’該量測光束以及該參考光束具有互相垂直的偏振方向’以及不同的頻率。該不同的頻率由’例如’雷射赛曼***（Zeeman splitting)、 Acousto_optical modulation或是在雷射内部裝設雙折射元件來產生。該垂直偏振允許一偏振光束***以引導該量測光束以及該參考光束至該量測物以及該參考物，並結合反射回來的該量測光束以及該參考光束以形成相互重^白"勺量測光束以及參考光束。該等重疊光束形成一輸出光^，並經過一偏振器。In many instances, the measuring beam and the reference beam have mutually perpendicular polarization directions and different frequencies. The different frequencies are produced by, for example, 'Zeeman splitting', Acousto_optical modulation, or by mounting a birefringent element inside the laser. The vertical polarization allows a polarized beam to split to direct the measuring beam and the reference beam to the measurement and the reference, and in combination with the reflected beam and the reference beam to form a mutual white The measuring beam and the reference beam. The overlapping beams form an output light and pass through a polarizer.

該偏振器混合該量測光束以及該參考光束的偏振，而形成一混合光束。在該混合光束中的該量測光束以及該參考光束會彼此干涉，所以該混合光束的強度，隨著該量測光束以及該參考光束相對相變化而變化。一感測器量測該混合光束的沿時間變化的強度，並依據該強度的比例，產生一電子干涉訊號。由於該量測光束以及該參考光束具有不同的頻率，該干涉訊號包括一 ”外差式的（heterodyne)The polarizer mixes the measurement beam and the polarization of the reference beam to form a mixed beam. The measuring beam and the reference beam in the mixed beam interfere with each other, so the intensity of the mixed beam changes as the measuring beam and the reference beam change relative to each other. A sensor measures the intensity of the mixed beam over time and generates an electrical interference signal based on the ratio of the intensity. Since the measuring beam and the reference beam have different frequencies, the interfering signal comprises a "heterodyne"

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五、發明說明（2) "訊號，-其帛帛等於該量測光束與該參考光束的頻率差。如果該量測光束以及該參考光束的路徑長度經過調 J，藉由調整包含該量測物的平台，使該括都普勒效應（Doppler shift)等於2 νηρ/ λ，其員羊^包量測物以及參考物的相對速度，λ是量測光束以及疋束的波長，η是該等光束經過的媒介的折射率，例如/空尤或是真空，Ρ是經過該參考物以及該量測物的次數。=披量測到的參考訊號的相變化，轉換該量測物的相對位 2 7Γ的相變化等於Α/(ηρ)的L長度變化，其中L是環繞一的距離變化，例如包括該量測物的平台的環繞距離。不幸的:該等式不一定永遠正確。此外，該量測到的參考訊號的量或許會變化。一會變化的振幅會降低所量到的相變化的準確性。許多干涉儀會有非線性的特性，例如所謂的”週期誤差CyClic err〇rs”。該週期誤差可藉由相或是量測到的參考訊號的強度並與該光學路徑長度的變化呈一正弦相依。特別是，該第一個諧波的週^誤差具有一正弦相依於（2 7Γ pnL ) /又，而該第二個諧波的週期誤差具有一正弦相依於2(2 7Γ pnL)/又。更高的諧波的週期誤差亦可以此方式表現。亦可能有π非週期非線性"的情況，例如由參考光束以及量測光束於干涉儀的輸出光束中的側向位移（例如”光束剪變beam shear”），當參考光束的波前以及量測光束的波 V前具有波前誤差（wavefront errors)時。此現象可由下述說明。 ^5. Description of the invention (2) The "signal, - 帛帛 is equal to the frequency difference between the measuring beam and the reference beam. If the measuring beam and the path length of the reference beam are adjusted, by adjusting the platform including the measuring object, the Doppler shift is equal to 2 νηρ/λ, The relative velocity of the object and the reference object, λ is the wavelength of the measuring beam and the beam, and η is the refractive index of the medium through which the beam passes, such as / empty or vacuum, Ρ is the reference and the measurement The number of times. = phase change of the reference signal measured by the plunging, the phase change of the relative position of the measured object is converted to a change in the length of Α/(ηρ), where L is a change in the distance around one, including, for example, the measurement The surrounding distance of the platform of the object. Unfortunately: this equation is not always correct. In addition, the amount of reference signal measured by this measurement may vary. A varying amplitude will reduce the accuracy of the phase change that is measured. Many interferometers have non-linear characteristics, such as the so-called "cycle error CyClic err〇rs". The period error can be sinusoidally dependent on the intensity of the phase or measured reference signal and the change in length of the optical path. In particular, the period error of the first harmonic has a sinusoidal dependence (2 7 Γ pnL ) / again, and the period error of the second harmonic has a sine dependent on 2 (2 7 Γ pnL) / again. The periodic error of higher harmonics can also be expressed in this way. There may also be cases of π aperiodic nonlinearity, such as lateral displacement (eg, "beam shear") from the reference beam and the output beam of the measuring beam in the interferometer, when the wavefront of the reference beam is When the wave front of the measuring beam has wavefront errors. This phenomenon can be explained by the following. ^

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1277720 ------- 五、發明說明（3) 干涉儀儀成參考光束以該量測光束以產生同一的波該輸出光束中移，例如相對成從輸出光束此外，在的位置或是角的角度方位的角度變化會在光束剪變合輸出光束的干涉訊號的步測，其可藉由或是將該混合中，偵測傳入差的影響也取而言，當光纖 ν7干涉訊號的誤干涉訊號果機制是束以及量測光在色散量器中的不及量測光同一直線前誤差並的該參考的光束剪得到的干許多的干度方位的變化會造干涉訊號以及波前步驟以及驟。該混將該混合光束捕捉該光纖中決於光束用於將該差是複合的振幅變，例如，束於輪出測中，光均勻材質（inhomogeneities)會造束的波前誤差。當該參考光束以及的方式穿過這些不均勻材質時，會造成干涉訊號的彼此抵銷。此外，光束以及該量測光束會彼此側向位變。此光束剪變造成波前誤差並造涉訊號產生誤差。涉系統中，光束剪變隨著該量測物變化而變化。例如，平面鏡量測物成相對光束剪變。因此，量測物的中產生相應的誤差。誤差的影響將取決於根據偏振態混偵測該混合輸出光束以得到一電子合輸出光束可以利用一偵測器偵光束聚焦於該偵測器以進行伯測，進入單一模態或是多模態光纖的混合光束。光束剪變以及波前誤截斷器（beam stop)的性質。一般混合輸出光束導至該偵測器時，該式的。化會，許多個機制總和產生的淨結，於里測物的轉動而造成的參考光光束中的相對光束剪變。私里測利用複合波長，例如532^ 12777201277720 ------- V. Description of the invention (3) The interferometer is used as a reference beam to measure the beam to produce the same wave. The output beam is shifted, for example, from the output beam, in the position, or The angular change of the angular azimuth angle will be measured in the beam shearing and outputting the interference signal of the output beam, which can be used to detect the influence of the incoming difference, or the fiber ν7 interference signal. The error interfering signal mechanism is the beam and the measurement light in the dispersion meter is less than the metering error before the same line error and the reference beam clipping obtained by the reference beam changes a lot of dryness orientation will create interference signals and wavefront Steps and steps. The mixing captures the mixed beam in the fiber depending on the amplitude of the beam used to make the difference complex, for example, in the round-out measurement, the wavefront error caused by the inhomogeneities. When the reference beam and the way through these uneven materials, the interference signals are offset from each other. In addition, the beam and the measuring beam will be laterally displaced from each other. This beam shear causes a wavefront error and creates a signal error. In the system, the beam shear changes as the measured object changes. For example, a flat mirror measures the relative beam shear. Therefore, a corresponding error is generated in the measurement object. The effect of the error will depend on the mixing of the mixed output beam based on the polarization state to obtain an electronically combined output beam. A detector can be used to focus the beam on the detector for binometry, into a single mode or multimode. Mixed beam of state fiber. Beam shearing and the nature of the wavefront error stop (beam stop). Typically, when the mixed output beam is directed to the detector, this is the case. The net knot produced by the sum of many mechanisms, the relative beam shear in the reference beam caused by the rotation of the object. Private measurement using composite wavelengths, such as 532^ 1277720

五、發明說明（4) 以及1 064nm，以量測色散量體。該色散量測玎以被用於到的光程轉換為一物理長度將會由於氣流的擾動或是密換為固定不變的物理長度。上述的干涉儀通常為為元件，該掃描器或是步進機成一積體電路。此微影系統並固定該晶圓；一聚焦裝置圓；一掃瞄或步進系統，用以及至少一干涉儀。每個干收一反射的量測光束從，設涉儀將其反射的量測光束與該等干涉儀並準確的量測該變化。該干涉儀使該微影系射光束中的曝光區域。在許多的微影系統以及至jz 一平面鏡，以反射該量變化，例如平台的高度或是面鏡反射後的方向變化。如光束將會降低該量測光束以疊。此外，該量測光束以及的方式傳遞，其波前於形成此，該量測光束以及該參考測干涉儀的量測路徑中的氣將:利用位移量測干涉儀量測。這種轉換是重要的，因為可度不均而被影響的光程長度轉掃描器或是步進機系統的重要用於微影製程以在一晶圓上形包括一可可移動平台，以支撐，以將該輻射光束導至該晶以將該平台移近該輻射光束；涉儀引導一量測光束至，並接於該平台的一平面鏡。每個干一相應的參考光束進行干涉，平台相對於該輻射光束的位置統能準確的控制該晶圓於該輻其他的應用中，該量測物包括測光束。該量測物的微小角度偏轉，會造成量測光束從該平果不加以補償，該變化的量測及該參考光束在干涉儀中的重該參考光束將不會以彼此平行該混合光束時也不會對準。因光束之間的干涉將沿該混合光5. Inventive Note (4) and 1 064 nm to measure the dispersion. The dispersion measurement is converted to a physical length by the optical path used to be converted to a fixed physical length due to disturbance of the airflow. The above interferometer is usually an element, and the scanner or stepper is an integrated circuit. The lithography system secures the wafer; a focusing device; a scanning or stepping system; and at least one interferometer. Each of the reflected and reflected beams is accurately measured from the interferometer and the interferometer and accurately measured by the interferometer. The interferometer causes the lithography to illuminate the exposed area of the beam. In many lithography systems and to jz a mirror, this amount of change is reflected, such as the height of the platform or the direction of the mirror after reflection. If the beam will lower the beam of measurement. In addition, the measuring beam is transmitted in the same manner as the wavefront is formed, and the measuring beam and the gas in the measuring path of the reference interferometer are measured by a displacement measuring interferometer. This conversion is important because the optical length is affected by the unevenness of the length of the scanner or the stepper system is important for the lithography process to include a cocoa mobile platform on a wafer to support And directing the radiation beam to the crystal to move the platform closer to the radiation beam; the instrument directs a measurement beam to and is connected to a plane mirror of the platform. Each of the corresponding reference beams interferes, and the position of the platform relative to the radiation beam can accurately control the wafer in other applications of the radiation, the measurement comprising the beam. The slight angular deflection of the measurement causes the measurement beam to be uncompensated from the flat, the measurement of the change and the reference beam in the interferometer that the reference beam will not be parallel to the hybrid beam It will not be aligned. Because the interference between the beams will follow the mixed light

1277720 五、發明說明（5)1277720 V. Description of invention (5)

束的橫向剖面變化，因此會使該偵測器所量测到的干涉訊遭受損壞。 < 為了應付此問題，許多習知的干涉儀具有一回溯反射器ret rore fleet or，以將該量測光束重新導回該平面鏡，藉此該量測光束’’兩次經過double passes"該干涉儀與令量測物之間的路徑。該回溯反射器使該量測對於量測物的角度轉動變化不會那麼敏感。然而，即使使用回溯反射器，該量測光束的側向位置仍然對於量測物的角度轉動變化敏感。此外，量測光束的路徑經過干涉儀中的光學带置，該路徑也對量測物的角度轉動變化敏感。貫際上’該干涉系統用於量測該晶圓平台沿多重量測軸線（multiple measurement axes)的位置。例如設定一個卡氏座仏系為晶圓平台位於X 一 y平面，量測主要是針對平台於x-y軸上的位置以及平台在z軸向上的角度方位/此時平台是在x-y平面上移動的。此外，其也可監測晶圓平台在x-y平面外的傾斜。例如，該等傾斜的特徵可用於計算於x-y位置的Abbe of f set error s。因此，其最高可有五個量測的自由度。此外，在一些例子中，其亦可監控台於z韩方向的位置’而產生第六個自由度。工The transverse profile of the beam changes, which can cause damage to the interferometric signal measured by the detector. < To cope with this problem, many conventional interferometers have a retroreflector ret rore fleet or to redirect the measured beam back to the plane mirror, whereby the measuring beam ''passes twice passes" The path between the interferometer and the measuring object. The retroreflector makes the measurement less sensitive to angular changes in the measurement. However, even with retroreflective reflectors, the lateral position of the measuring beam is still sensitive to the angular rotation of the measurement. In addition, the path of the measuring beam passes through an optical strip in the interferometer, which path is also sensitive to angular rotation changes of the measuring object. The interferometric system is used to measure the position of the wafer platform along multiple multiple measurement axes. For example, setting a Cartesian system for the wafer platform is located on the X-y plane, and the measurement is mainly for the position of the platform on the xy axis and the angular orientation of the platform in the z-axis/the platform is moving on the xy plane. . In addition, it also monitors the tilt of the wafer platform outside the x-y plane. For example, the oblique features can be used to calculate Abbe of f set error s at the x-y position. Therefore, it can have up to five degrees of freedom of measurement. Moreover, in some examples, it can also monitor the position of the station in the z-direction to produce a sixth degree of freedom. work

為了要量測每一個自由向的位移。例如’在量測平動方位的系統中，至少有三圓平台的一側反射，並至少該的另一側反射。參照，例 ^ ’ 一干涉儀用於監測座標軸台的X-y位置以&x，y，Z方向轉個特別獨立的量測光束從該晶有兩個特別獨立的量測光束從如美國專利第5, 801，832號專In order to measure the displacement of each free direction. For example, in a system for measuring a translational orientation, at least one side of the three-circle platform reflects and at least the other side reflects. Reference, Example ^' An interferometer is used to monitor the Xy position of the coordinate pillow table to rotate a particularly independent measuring beam from the &x; y, Z direction from the crystal with two particularly independent measuring beams from, for example, the US patent 5, 801, 832

1277720 五、發明說明（6) 利：五個量測轴將光罩圖案投影在基板上的裝置及方以監測相内Λ參Λ於Λ 每Λ量Λ光/與參考光束再結合束與該晶圓二由於不同的量測光心：i:徑長度量測結果，推演出角度方位。因此，個自由度’該系統包括至少一量測光束，該先束接觸曰曰圓平台。此外’如上所述’每一量測 =:過該晶圓平台以防止晶圓平台的角度測光束可由物理分離干涉儀產生或κ 夕轴干涉儀所產生的多重量測光束。發明内容 ,本發明之特徵為多重自由度之量測干涉儀，例如量測一1面鏡量測物之多重自由度。例如，該干涉儀可併入一學總成中。有關該量測物位置變動的資訊係得自夕重輸出光束，每一輸出光束包括一分量沿一共同量測光束路徑通過該量測物。'结果，如此的干涉儀系統在某些產生自不同來源的所量測的自由度上可降低非循環性錯誤 (n〇n-cycl ic err〇r) ’例如量測光束的相對不對位會對應使餘弦（cosine )與餘割（cosecant)修正因子、起因於波前誤差（wave front error)的光束剪變（beam )、起因於玻璃不均質的光束剪變、以及溫度梯度。而且’某些接觸於平面鏡量測物的量測光束不必藉由一咬多個回溯反射器的定位來決定。同樣，該干涉儀^統通常減少所使用的光學元件的數量。1277720 V. INSTRUCTIONS (6) Lee: The five measuring axes project the reticle pattern on the substrate and the side to monitor the phase Λ Λ Λ Λ / / / 与与 / Wafer 2 due to different measurement of the optical center: i: diameter length measurement results, to promote the angular orientation. Thus, the degree of freedom 'the system includes at least one measuring beam that contacts the dome platform. In addition, 'as described above', each measurement =: the wafer platform is moved to prevent the angled beam of the wafer platform from being generated by a physically separated interferometer or a multi-weight beam of light generated by a k-axis interferometer. SUMMARY OF THE INVENTION The present invention features a multi-degree of freedom measurement interferometer, such as measuring multiple degrees of freedom of a 1 mask measurement. For example, the interferometer can be incorporated into a school assembly. Information about the change in position of the measurement is derived from the output beam, each output beam comprising a component passing the measurement along a common beam path. 'As a result, such interferometer systems can reduce non-cyclical errors (n〇n-cycl ic err〇r) in certain measured degrees of freedom from different sources. For example, the relative misalignment of the measuring beam will Corresponding to cosine and cosecant correction factors, beam shear due to wave front error, beam shear due to glass inhomogeneity, and temperature gradient. Moreover, some of the measuring beams that are in contact with the flat mirror measurements need not be determined by the positioning of a plurality of retroreflectors. Again, the interferometer typically reduces the number of optical components used.

12777201277720

•分「根據該平該干置測干涉低（例如測器中的源。該干自該多重控制，以出光束入該多系統中。現综一般儀用來沿該干涉儀包括有關每一輸出測物至少路徑相異該裝包括光束分量二光束分涉儀***可設置面鏡量測物的角涉儀糸統更可設儀的方向係由一整體去除）干涉光束剪變，並藉涉儀系統亦可設自由度量測干涉降低（例如整體射角度的變化，軸干涉儀系統可该多軸干涉儀系合本發明不同之而言，本發明之多重自由度量測係設置用以產生於該量測物對應光束包括一光束一次，而且該光為使得該所量測度與線性的位移置為使得輸入光或多個光束操縱儀中以及作為平此降低一種非循置使得輸入與輸儀係由一或多個去除）光束剪變當該平面鏡量測被併入統亦可型態與一製造半併入一光特徵。的多重自的組合。束至多重元件所控面鏡量測環性錯誤出光束朝光束操縱以及在感物傾斜時導體晶片束刻寫系由度係自由度制以降物的感的來向或來元件所測器輸〇的微影統中。• “The interference is low according to the flat dry test (eg the source in the detector. The dry from the multiple control to emit light into the multi-system. The general instrument is used along the interferometer to include each The output of the object is at least different in path. The beam component is included. The beam splitter system can set the angle of the mirror to measure the direction of the instrument. The direction of the instrument can be removed by a whole. The interference beam is sheared and borrowed. The interferometer system may also be provided with a free metrology measurement to reduce the interference (for example, the change of the overall angle of incidence, the multi-axis interferometer system may be different from the present invention, the multi-free measurement system of the present invention is used for setting The corresponding beam generated from the measuring object includes a light beam once, and the light is such that the measured amount and the linear displacement are set such that the input light or the plurality of beam manipulators are lowered and a non-circular The input and the transmission are removed by one or more of the beam shears. When the plane mirror measurement is incorporated into the system and the fabrication is semi-integrated into a light feature. Beam to multi-component controlled mirror measurement loop error The out-beam is directed toward the beam and the conductor wafer beam is written by the degree of freedom of the system to reduce the sense of the object or to the component. The lithography system.

特徵為一裳置一反射多道輸於一相分量沿束分量之一第一路徑接觸於該括任何及該第更包括置之實施例可包沿該共同路徑以的該輸出光束可量0 量測物之出光束，異之自由一共同之至少其中量測物至以下的特一路徑接未接觸於包括 '一多轴干相對位置，其每一道輸出光度的相對位置路徑接觸於該之一沿與該共少第二次。徵。觸於該量測物該量測物之一Characterizing a scatter-and-reflection multi-channel input to a phase component along a beam component, the first path contacting the arbitrarily and the further embodiment, the output beam may be included along the common path. Measuring the outgoing beam of the object, the free one of the common at least one of the measuring objects to the following special path is not in contact with the 'one multi-axis dry relative position, and the relative position path of each output luminosity is in contact with the same A second along with the second. Sign. Touching the measurement object

1277720 五、發明說明（8) 該等自由度之距離。例如包離的資訊之該輸徑接觸於該量測量測轴可由該共一量測軸上的每點為等距離。而且除了沿量更沿與該共同少第二次。包括物之光束分量的測物之距離的資路徑所定義並與與該共同路徑相次。包括沿該共束分量的該輸出距離的資訊，該定義並與該第一測軸可定義一第第一平面相異之除了沿該第可包括該量測物例如該第二輸出接觸於該量測物其中之一可為沿一第一量測轴至該量測物量測物之距含有關於沿該第一量測軸至該出光束，可包括沿該共同路徑物之該光束分量。在此實施例同路徑與該第一路徑所定義。一點與該共同路徑及該第一路與該第一路中，該第一例如，在第徑上的對應該第一路徑相沿該共該輸出訊，該該第一異之一同路徑光束可第三量量測軸的距異之一第二同路徑及該光束可包括第二量測軸由該共同路量測軸相異。而且第三路徑接離量測外，另一光束分路徑接觸於第二路徑接沿一第二量第該量測物至觸於該量測測軸至該量徑與該第二三分量更沿物至少第二量測物之光該量測物之第三路徑所觸於該量測及該第三路徑接觸於該三量測軸至同路徑與該。例如該第及第三量測軸可定與該包括沿一第測軸由該共第二量測軸相異平面，而該第二第二平面。量測軸做距離量測外及第二量第相對於一第一旋轉光束可的光束包括該第一分量，以及軸的角度方次提及、沿與該第一光二輸出光束位之資訊。該共同路徑束分量相異1277720 V. INSTRUCTIONS (8) The distance between these degrees of freedom. For example, the path of the enclosed information contacting the measuring axis can be equidistant from each point on the common measuring axis. And in addition to the interval, the second is less along with the common. The resource path including the distance of the object of the beam component of the object is defined and aligned with the common path. Including information about the output distance along the ensemble component, the definition being different from the first arbitrarily defined first first plane except that the second imaginable output, such as the second output, is contacted along the first One of the measuring objects may be such that the distance from the first measuring axis to the measuring object is related to the outgoing beam along the first measuring axis, and the beam component along the common path may be included . In this embodiment, the same path is defined by the first path. a point with the common path and the first path and the first path, the first, for example, the corresponding path on the first path along the common path, the first different one of the same path beam One of the second equal path of the distance of the three measuring axes and the beam may include a second measuring axis that is different from the common measuring axis. And the third path is separated from the measurement, and the other beam sub-path is in contact with the second path along a second quantity of the measurement object to touch the quantity measurement axis to the quantity path and the second three component A third path of the measuring object along the at least second measuring object touches the measurement and the third path contacts the three measuring axis to the same path. For example, the third and third measuring axes may be defined to include a second plane that is different from the second measuring axis along a first measuring axis. The measurement axis is outside the distance measurement and the second quantity is relative to a first rotating beam. The beam is included in the first component, and the angle of the axis is mentioned in the direction of the output beam along the first light. The common path beam components are different

1057-5464-PF(Nl).ptd 第12頁 1277720 其中該觸於該與該共第二路包括該的角度、沿該一光束該另一於該量束分量。該第相同。義之一相對於資訊。徑接觸異之另量係沿例如該道輸出自由度自由度接收該自由度設置以於不同該第一旋轉軸玎與平面正與該第該第三 ----— 五、發明說明（9) 之另一光束分量，異之一第二路徑接路徑相異，或者是由遠共同路徑與該第二輪出光束可異之一第二旋轉軸 ^括該第_次提及二嚴，以及與該第 ”玄第二輸出光束之之一第三路徑接觸於該第一旋轉軸。該多輛干涉儀束包括多重自由度軸干涉儀可提供有 ^、七個自由度的資該量測物可包該裝置更包括轴干涉儀，該輪入一沿該共同路徨接束之一分量，而且輸入分量之另一分正交的極化。 77 該裝置更包括子訊號表示該量測另一光量測物同路徑徑所定量測物方位之共同路分量相光束分測物。可產生至少四中之一相異之關於至少五個訊0 括一平面鏡。一光源設置以引導一光束包括具有外差式觸於量測物之輸出光每一輸出光束更包括 Ϊ。例如’該輸入光感測器物相關沿與該共同路徑相一路徑可與該第二交。而且，一旋轉轴相輸出光束可於該量測物的光束一光束分量，其中與該共同路徑相異第^一轉轴可正交光束，每一輸出光的資訊。而且該多的資訊，或甚至至輸入光束進入該多分頻之兩分量。每束係得自該輸入光一第二分量得自該束之分量具有彼此輸出光束並產生電之相對位置。甚 1057-5464-PF(Nl).ptd 第13頁 1277720 五、發明說明（10) 至，該裝置更包括一極化分析器，設置於每一感測器之前，並設置以通過一中介干涉極化（interfermediate polarization)至每一輸出光束的分量。同樣該裝置更包括一光纖讀取頭（fiber-optic pick-up)用來將每一輪出光束耦合至對應的感測器在其通過該對應之極化分析器之後。 ° 該干涉儀沿該共同路徑後，將該第一沿該共而且，接觸於一路徑置以從至少兩出光束一路徑同二路徑路徑及入光束的每一一對應該同路徑該干涉該量測接觸於該輪人次的該，其中所定義樣，該接觸於該第一得到另該次光之輪出干涉儀可設置以與該量測光束分成接觸於該儀可設置物至少第該量測物光束得到次光束與該第一輪之一量測干涉儀可该量測物路徑相異一組次光束與另一光束。亦可設置引導得自一輸物接觸多道次量測物之該輸以引導二次，之光束，並在光束，至少一另一次另一次出光束軸至該設置以至少第。例如束，並組與之以定義分量。光束，光束合包含沿量測物引導至 —，，該干將接觸對應的八7U不與該量其中該出光束次光束沿該共而且，並將接併，以由該共的距離少另一該第二涉儀可於該量次光束測物接觸之次光束對應的光束分量沿該第一路同路徑與該該干涉儀可觸於該量測產生第一道同路徑與該資訊。次光束沿一路徑與該共設置以從該測物至少兩合併，以產1057-5464-PF(Nl).ptd Page 12 1277720 wherein the contact with the second path includes the angle along which the beam component is further divided by the beam component. This is the same. One of the meanings is relative to the information. The radial contact is received by the degree of freedom of, for example, the degree of freedom of the output of the channel, so that the first axis of rotation and the plane are different from the third third---- Another beam component, the second path is different from the path, or the second common axis is different from the second wheel and the second axis is the second axis of rotation. And contacting the third rotating path with the third path of the first "second output beam". The plurality of interferometer beams including the multiple degrees of freedom axis interferometer can provide the amount of ^, seven degrees of freedom The apparatus may include an axis interferometer that includes one component along the common path and another orthogonal polarization of the input component. 77 The device further includes a sub-signal indicating the amount. Measure another light measurement object with the same path diameter as the common path component phase beam measurement object. It can generate at least one of the four different planes with respect to at least five signals. A light source is set to guide a beam including a heterodyne The output light of the touch object further includes Ϊ each of the output beams. For example, the path of the input light sensor related to the common path may be the second intersection. Moreover, the output beam of the rotating shaft phase may be a beam-beam component of the measurement object, wherein the common axis is different from the common path, the orthogonal beam, the information of each output light, and the information, or even the input beam entering the multi-frequency Two components. Each beam is derived from the input light. A second component is derived from the component of the beam having a relative position that outputs light beams to each other and generates electricity. 1057-5464-PF(Nl).ptd Page 13 1277720 V. Invention Description (10) The apparatus further includes a polarization analyzer disposed in front of each of the sensors and configured to perform an interferometric polarization to a component of each of the output beams. A fiber-optic pick-up is included for coupling each round of the beam to a corresponding sensor after it passes the corresponding polarization analyzer. ° The interferometer is along the common path Then, the first edge is coupled to a path from at least two outgoing beams, one path is the same as the second path, and each pair of the incoming beam should be the same path. The interference is measured by the measurement. Wherein, in the defined manner, the first interfering interferometer that is in contact with the first sub-light can be arranged to be in contact with the measuring beam to contact at least the first measuring object beam to obtain a sub-beam and One of the first rounds of the interferometer can have a different set of sub-beams and another beam. It is also possible to provide a guide from which a plurality of passes are contacted to guide the second pass, and in the beam, at least one other time, the other beam exits the beam axis to the setting to at least the first. For example, bundles, and groups are used to define components. The beam, the beam combination includes guiding along the measuring object to -, the stem will contact the corresponding eight 7U not with the amount of the outgoing beam secondary beam along the same and will be joined to reduce the total distance by the other The second instrument may generate a first path and the information along the first path and the interferometer may be in contact with the measurement along the first path and the path of the beam component corresponding to the secondary beam of the measuring beam. The secondary beam is disposed along the path to be combined with at least two of the objects to produce

自該輸入光束得到另一組次$Get another set of $ from the input beam

1057-5464-PF(Nl).ptd 第14頁 1277720 五、發明說明（11) 將接觸於該次光束合併光束沿與共將另一沿該路徑接觸於在具有將該第一光以定義一中先束以及" 量測物以產生同路徑共同路該量測該次光束在接介光束組次要量測物至少兩次的該次一輸出光束，引相異之徑接觸物的次束的實觸於該 ;ii) 參考光一第二路於該量測光束合併施例中，量測物後將該中介束；iii) ;i v ) 再將每一於該量測物後與對應之一次要參考出光束，其中每一次光束對應於相考光束其中之一。束接觸於該光束與來自另一組的一導來自其他組的另一次徑接觸於該量測物，並物之次光束與沿該第二以產生另一輸出光束。該干涉儀可設置以土）與一主要參考光束合併光束分成一組次要量测引導每一次要量測光次要量測光束在其接觸光束以產生一對應之輸異之次要量測光束與參1057-5464-PF(Nl).ptd Page 14 1277720 V. INSTRUCTION DESCRIPTION (11) Contacting the beam of light to merge the beam along with the other along the path to have the first light defined by The first beam and the " measurement object to generate the same path common path. The measurement of the secondary beam at the secondary beam of the secondary beam of the secondary beam is measured at least twice, and the second contact beam is introduced. The beam is touched by the ii; the reference light is a second path in the measurement beam combining embodiment, and the intermediate beam is measured after the measurement; iii); iv) and then each corresponding to the measurement object The beam is referenced once, and each beam corresponds to one of the beams. The beam contacts the other path of the beam from the other group and the other path from the other group contacts the measurement, and the secondary beam of the object along the second to produce another output beam. The interferometer can be configured to combine a beam with a primary reference beam into a set of secondary measurements to guide each of the secondary measurements of the secondary measurement beam at its contact beam to produce a corresponding measurement of the secondary measurement. Beam and ginseng

該干涉儀包括：一共同之極化光束分光器設置以引導知自一入射輸入光束的一主要量測光束沿該共同路徑接觸於該量測物；以及一返回光束總成用以接收具有來自該極化光束分光器之主要量測光束的一中介光束，將該中介光束分成多道光束，並將該多道光束引導回該極化光束分光器。該極化光束分光器可引導得自該入射輸入光束之一主要參考光束接觸於一反射性參考物，其中該主要量測光束以及主要參考光束對應於入射輸入光束的正交極化分量。該極化光束分光器更用於再將該主要量測光束與該參考光束合併以形成該中介光束在其分別接觸於該量測物與該參考物之後。The interferometer includes: a common polarized beam splitter disposed to direct a primary measurement beam from an incident input beam to contact the measurement along the common path; and a return beam assembly for receiving the The polarized beam splitter mainly measures an intermediate beam of the beam, divides the intermediate beam into a plurality of beams, and directs the plurality of beams back to the polarized beam splitter. The polarized beam splitter can direct a primary reference beam from the incident input beam to contact a reflective reference, wherein the primary measurement beam and the primary reference beam correspond to orthogonal polarization components of the incident input beam. The polarized beam splitter is further configured to combine the primary measuring beam with the reference beam to form the intermediate beam after it is in contact with the analyte and the reference, respectively.

第15頁 1057-5464-PF(Nl).ptd 1277720Page 15 1057-5464-PF(Nl).ptd 1277720

此外，遠極化光束分光器係設分成一組次要量測光束以及一組少i丨2|道每一次要量測光束接觸於哕量測^ ··· 光束，/ 1 \ 么成里測物；1 1 1 )引導每一次要參考光束接觸於該參考物；以及iv)再將每一次要量測光束與對應之一次要參考光束合併在其分別與該量測物與該參考物接觸後，以形成一對應之輸出光束。五、發明說明（12)In addition, the far-polarized beam splitter is divided into a set of secondary measuring beams and a set of less i丨2|-channels. Each time the measuring beam is in contact with the 哕-measurement ^··· beam, / 1 \ 莫成里Measuring 1 1 1 ) directing each reference beam to be in contact with the reference; and iv) combining each of the desired beams with the corresponding primary reference beam and the reference and the reference respectively After contact, a corresponding output beam is formed. V. Description of invention (12)

一在此實施例中，每一次要量測光束可沿一與該共同路徑相異之路徑接觸於該量測物。而且，該干涉儀可包括該參考物。另外，該參考物可對應於另一量測物，例如在依差分平面鏡干涉儀。在任一種情況中，該參考物可包括一平面鏡。該干涉儀更包括一四分之一波長阻滯器設在該極化光束分光器與該量測物之間，亦有一四分之一波長阻滯器設在該極化光束分光器與該參考物之間。In this embodiment, each time the beam to be measured is in contact with the measurement along a path that is different from the common path. Moreover, the interferometer can include the reference. Alternatively, the reference may correspond to another measurement, such as a differential plane mirror interferometer. In either case, the reference can include a flat mirror. The interferometer further includes a quarter-wave retarder disposed between the polarized beam splitter and the measuring object, and a quarter-wave retarder disposed on the polarized beam splitter Between the references.

該干涉儀更包括具有一非極化光束分光器的輸入光束光學總成，其中該輸入光束光學總成將一原始輸入光束分成該第一次提及之輸入光束以及一第二輸入光束與該第一輸入光束平行行進，並引導該第一及第二輸入光束至該極化光束分光器。該返回光束總成包括至少一組曲折光學系以及至少一非極化光束分光器用來將該中介光束分成多道光束。例如該組曲折光束包括一回溯反射器用以在任何非極化光束分光器之前接收該中介光束。該返回光束總成包括一光束分光器總成具有至少一非極化光束分光器，其中該光束分光The interferometer further includes an input beam optical assembly having a non-polarized beam splitter, wherein the input beam optical assembly splits an original input beam into the first mentioned input beam and a second input beam The first input beam travels in parallel and directs the first and second input beams to the polarized beam splitter. The return beam assembly includes at least one set of tortuous optical systems and at least one non-polarized beam splitter for splitting the intermediate beam into multiple beams. For example, the set of tortuous beams includes a retroreflector for receiving the intermediate beam prior to any non-polarized beam splitters. The return beam assembly includes a beam splitter assembly having at least one non-polarized beam splitter, wherein the beam splitting

1057-5464-PF(Nl).ptd 第16頁 1277720 五、發明說明（13) 器總成從該回溯反射器接收該中介光束，產生多道光束’ 並將該多道光束沿與該中介光束平行的方向引導回該極化光束分光器。而且，該光束分光器總成可包括多個非極化光束分光器。同樣地，該返回光束總成更包括一阻滯板設於該回溯反射板與該光束分光器總成，其中該阻滯板係用以降低由該回溯反射器所造成中介光束的極性旋轉。在其他的實施例中，該曲折光學系包括角度量測曲折光學系以及距離量測曲折光學系，其中該角度量測曲折光學系包括一半波長的阻滯器用以旋轉該多道光束至少其中之一的極性。該角度量測曲折光學系更包括一五棱鏡，而該距離量測曲折光學系包括一回溯反射器。該非極性光束分光器可用以在任何曲折光學系之前/之後接收該中介光束0 一般包括干涉而言，地產生物相對於一量測一道輸出光束包測物至少相異之第該方一次。一路徑法之實一般而言，一多軸干涉儀用其中該包括有對位置，輸出光束在另一多道輪於一相括一光而且，接觸於施例更另一方來沿多干涉儀關於一方面，本| 出光束，每異之自由度束分量沿一至少一光束該量測物至包括對應於面，本發明重自由度量係設置以產量測物相對明之特色為一道輸的相對共同之分量更少第二上述之出光束位置之路徑接沿與該次。裝置的種方法，包括有關資訊。每觸於該量共同路徑特徵。之特色為_種裝置包括射性量測物之相輪出光束，每道異之自由度的相1057-5464-PF(Nl).ptd Page 16 1277720 V. INSTRUCTION DESCRIPTION (13) The device assembly receives the intermediate beam from the retroreflector, generates a plurality of beams' and directs the plurality of beams along the intermediate beam The parallel direction is directed back to the polarized beam splitter. Moreover, the beam splitter assembly can include a plurality of non-polarized beam splitters. Similarly, the return beam assembly further includes a blocking plate disposed on the retroreflective sheeting and the beam splitter assembly, wherein the blocking plate is used to reduce the polarity rotation of the intermediate beam caused by the retroreflector. In other embodiments, the meandering optical system comprises an angular measuring meandering optical system and a distance measuring meandering optical system, wherein the angular measuring meandering optical system comprises a half wavelength retarder for rotating the plurality of light beams at least The polarity of one. The angle measuring zigzag optical system further includes a pentaprism, and the distance measuring zigzag optical system includes a retroreflector. The non-polar beam splitter can be used to receive the intermediate beam 0 before/after any tortuous optical system. Generally, including interference, the ground product is at least once different from a measurement of an output beam packet. In general, a multi-axis interferometer is used in which a multi-axis interferometer is used, and the output beam is combined with one light in another, and the other side of the embodiment is applied along the multi-interferometer. In one aspect, the present beam emits a beam of light, and each of the degrees of freedom beam component is measured along a range of at least one beam to include a surface corresponding to the surface. The heavy free measurement system of the present invention is configured to output a relatively small characteristic of the measured object. The relatively common component is less than the path of the second above-mentioned outgoing beam position. The method of the device, including information. Each touches the amount of the common path feature. It is characterized by the fact that the device includes the phase of the radiometric measurement, and the phase of each degree of freedom

测一反生多道於一相Measuring one opposite, one in one phase

12777201277720

括一光束分量沿至少一輸出光束束分量不同。該一路徑接觸於該對位置。每一接觸於該量測光束分量與第沿與該共同路次0 道輸出光束包物至少一次。一次提及之光徑相異之一第一共同之路徑包括另一輸出另一光束分量 I測物至少一 δ亥第《一次提及該共同包括沿量，以及沿該輸出光束該角度方位路徑與該第束包括有關二旋轉軸的路徑接觸於該第一，包括的資訊一路徑於該量角度方該量測該第一光束分量相一光束量測物束中之該另徑接觸於該垂直。之裝置的路徑接觸路徑接觸有關於該 °例如，所定義之測物相對位，其中物之該第實施例包括任何以於該量測物之該第於該量測物之另一量測物相對於一第該第一旋轉軸垂直一平面於與該該第二一次提異之另一光束分與該共該第二分量係沿。例如， iTFj Η ，—· 第一旋轉車由輪出光束包及之光束分量，其中該同路徑相異旋轉軸與該下之特徵。一光束分光束分量的一旋轉軸之於由該共同胃二輸出光相異之一第括沿該共同A beam component is included along at least one of the output beam components. The path is in contact with the pair of locations. Each contact with the measured beam component and the first edge and the common path zero output beam package at least once. One of the first common paths of the optical path mentioned separately includes another output, the other beam component I, at least one of the measurements, the reference to the common included edge, and the angular azimuth path along the output beam. Contacting the first beam with the path relating to the two axes of rotation, the information comprising a path at the angle of the quantity, measuring the first beam component, the path of the beam of the beam, the contact of the beam with the path vertical. The path contact path contact of the device has, for example, a defined relative position of the object, wherein the first embodiment of the object includes any other measurement object corresponding to the measurement object for the measurement object A second plane that is different from the first one of the first rotation axis is associated with the second beam that is different from the second one. For example, iTFj Η ,—· The first rotating car consists of a beam of light and a component of the beam, wherein the same path is different from the axis of rotation and the feature below. a rotation axis of a beam splitting beam component is outputted by the common stomach two

量以及第二輪出之一第二第一旋轉Quantity and second round one of the second first rotation

該第二次提及之裝置的另外的實施例包括任何斜該一次提及之裝置所描述之和外的特徵。 ^第一般而言，在另一方面，本發明之特徵為一方法包以干涉儀產生多道輸出>光束，每一道輸出光束包含有^节量測物相對於一自由度之相對位置的資訊。 μ 其中每一輸出光束包括〆光束分量沿一共同路徑接觸Further embodiments of the second mentioned device include any features that are described in addition to those described in the device mentioned at one time. In general, in another aspect, the invention features a method of generating a plurality of output > beams by an interferometer, each output beam comprising a relative position of the measure relative to a degree of freedom. News. μ each of the output beams including the 〆 beam component is in contact along a common path

第18頁 1057.5464-PF(Nl).ptdPage 18 1057.5464-PF(Nl).ptd

1277720 五、發明說明（15) 於該量測物至少一次。至少一輸出光束包括與該第— 及之光束分量相異的另一光束分量。該另一 #”=八二次提 _ 人71 尤束分量沿盥該共同路徑相異之一第一路徑接觸於該量測物。該第二次提及之方法的實施例更包括任何對廉第一次及第二次提及之裝置的特徵。 —；上述在另一塑圓上製造積體照明系系統用以及任何上述圓；一一定位一光罩、一定裝置用另來監視一型態圓上製造積體系統、幸3射源該定位，該透系統監一定位態，本發明之特徵為電路。該微影系統包統用來將圖案的輻射來調整該平台相對於之干涉儀裝置，該照位系統、一透鏡總成該晶圓相對於該映射，本發明之特徵為另電路。此微影系統包一透鏡總成以及任何將輻射引導經過該光系統調整該光罩相對鏡總成將該空間圖案視該光罩相對於來自作時該輻射，的位置該干涉置。另一種型態中，本發明來製造一微影一刻寫光束於光束引導總成一微影括一平空間地該映射明系統以及任之輻射一微影括一幸畐上述之罩用以於來自輻射映該輻射台用來映射至之輻射包括一何上述的位置糸統用射源、干涉儀空間地該輻射射至該源之輻於在一支持該蓋该晶圓；的位置；輻射源、之干涉谓 aa1277720 V. Description of invention (15) At least once on the measurement. The at least one output beam includes another beam component that is different from the first and subsequent beam components. The other #"=八次提_人71 尤 beam component is in contact with the measurement object along one of the first paths that differs from the common path. The embodiment of the second mentioned method further includes any pair The characteristics of the device mentioned in the first and second time. - The above-mentioned method for manufacturing an integrated lighting system on another plastic circle and any of the above-mentioned circles; one positioning a mask and a certain device for monitoring another The positioning circle is fabricated on the integrated system, and the positioning is performed. The illuminating system monitors a positioning state, and the invention is characterized by a circuit. The lithography system is used to adjust the pattern to adjust the platform relative to An interferometer device, the lens system, a lens assembly, the wafer relative to the map, the invention is characterized by another circuit. The lithography system includes a lens assembly and any radiation that is directed through the light system to adjust the light The cover relative mirror assembly interposes the spatial pattern depending on the position of the reticle relative to the radiation from the ray. In another form, the present invention creates a lithography and write beam to the beam guiding assembly. Included in the flat space, the mapping system and any radiation lithography include a cover for the radiation from the radiation to be mapped to the radiation source, including the above-mentioned position source, interferometer Spatially radiating the radiation to the source at a location that supports the wafer; the radiation source, the interference is aa

來在一一光罩、裝置。杏產生圖赛源之輕身晶圓，射的位曰曰光罩。該光束一基板上刻畫用來傳遞該刻之特徵為一光束刻寫系統，戶刻寫系統包括：一輻射源提令圖案，一平台支持該基板，一寫光束至該基板，一定位系影Come in a hood, device. Apricot produces the light of the source of the wafer, the position of the film 曰曰 the mask. The light beam is patterned on a substrate for transmitting the feature as a beam writing system. The household writing system includes: a radiation source drawing pattern, a platform supporting the substrate, a writing beam to the substrate, and a positioning system

1057-5464-PF(Nl).ptd 第19頁 1277720 t 五、發明說明（16) 用來使該平之干涉儀用在另一晶圓上製造可移動之平該平台之位之位置。在另一一晶圓上製通過一光罩輻射做定位於該輸入輻圓。在另一來在一晶0 第一元件相該晶圓曝光方法，監視在另一體電路，該在另一體電路，該在另一微影光罩，台與光束引導總成彼此以監視該平台相對於該型態中，本發明之特徵積體電路。該微影方法台上，空間地將圖案轄置；以及使用任何上述相對定位，以及該上述光束刻寫總成的位置。為一微影方法用來在— 包括··支持該晶圓在一射映射至該晶圓；調整之干涉方法監視該平台 .一、、v " 风彩万法造積體電路。該微影方法包括：引以產生空間圖案輻射；將該光罩相對= :使用任何上述之干涉方法，監視該光射的位置；以及將該空間圖案輻射映射型態中上製造對於一於空間該第一梨態中方法包梨態中方法包梨態中該方法，本發積體電微影糸圖案輻元件相，本發括任何，本發括使用，本發包括：明之特徵為路，其包括統之一第二射下；以及對於該第二明之特徵為上述之微影明之特徵為任何上述之明之特徵為引導一刻寫一第三 :將一元件作使用任元件的一種方方法。一種方法用於微影系統。一種方法用於種微影微影系定位，何上述位置。法用於用來在入輻射該輪入罩相對 i -晶方法用統之— 用以將之干涉製造積製造積製造—1057-5464-PF(Nl).ptd Page 19 1277720 t V. INSTRUCTIONS (16) Used to make the flat interferometer on another wafer to create a position where the platform can be moved flat. On another wafer, a reticle radiation is positioned to locate the input radiant. In another one, the wafer is exposed in a first element phase, the wafer is exposed in another body circuit, the other body circuit, the other lithography mask, the stage and the beam guiding assembly are each other to monitor the platform In contrast to this type, the feature integrated circuit of the present invention. The lithography method, on the stage, spatially aligns the pattern; and uses any of the relative positioning described above, as well as the location of the beam to write the assembly. A lithography method is used to: - support the wafer to be mapped to the wafer in one shot; the interfering method of the adjustment monitors the platform. 1., v " The lithography method includes: introducing a spatial pattern radiation; comparing the reticle to: monitoring the position of the light using any of the above-described interference methods; and fabricating the spatial pattern in a radiation pattern to create a space The method of the first pear state comprises the method in the pear state, the method of the present invention, and the method of the present invention, the present invention includes any of the present inventions, and the present invention includes: And including the second shot of the second feature; and the feature of the second feature that is characterized by any of the above features is to guide a moment to write a third: a method of using a component as a component . One method is used in lithography systems. One method is used for lithography lithography positioning, and where. The method is used to illuminate the wheel hood relative to the i-crystal method - to interfere with the fabrication of the fabricated product -

光束至一基板Beam to a substrate

1057-5464-PF(Nl).ptd 第20頁 1277720 五、發明說明（17) 基板刻晝圖案；將該基板相對於該刻寫光束作定位；以及使用任何上述之干涉方法，監視該基板相對於該刻寫的位置。 ·、、、九束除非另外定義，於此所使用之所有技術上或科學上名稱具有熟習此技藝之人士所公認之相同含意。若與出版品、專利申請案、專利公報以及其他參考資料相衝突以本說明書（包括定義）為準。本發明之一或多個實施例的詳細内容係配合圖式說明如下。本發明其他的特徵、目的以及優點係由說明、圖以及申請專利範圍而被瞭解。 °二實施方式第1圖為一干涉儀系統之示意圖，其中一平面鏡物之線性及角度位移被量測及監視。如第丨圖所示，該^ ίΐίί包括一光源10，一干涉儀14可排列及設置“種 t : Ϊ ”式’感測器70以及電子處理器及電腦90，其程之實施例詳述如4 = Γ母種形式將以個別杆推糾/雜Μ 干涉儀先束通常沿一標示為20之光路灯進到/離開面鏡9 2，且輸出光走VL 一庐—1057-5464-PF(Nl).ptd Page 20 1277720 V. Description of the invention (17) substrate engraving pattern; positioning the substrate relative to the writing beam; and monitoring the substrate relative to any of the above-described interference methods The location of the writing. • , , and Nine bundles Unless otherwise defined, all technical or scientific names used herein have the same meaning as recognized by those skilled in the art. Conflicts with publications, patent applications, patent publications, and other references are subject to this specification, including definitions. The details of one or more embodiments of the invention are described below in conjunction with the drawings. Other features, objects, and advantages of the invention are apparent from the description and drawings. ° 2 Embodiments Figure 1 is a schematic diagram of an interferometer system in which the linear and angular displacement of a planar mirror is measured and monitored. As shown in the figure, the device includes a light source 10, and an interferometer 14 can arrange and set a "species t: ”" type sensor 70 and an electronic processor and computer 90. For example, 4 = Γ parent type will be corrected by individual rods / Μ Μ Interferometer first beam usually along a light street lamp labeled 20 into/out of the mirror 9 2, and the output light goes VL 庐

干涉儀14行進至感測器7〇出“V；為。之光路從以吝头雷工α °亥輸出先束由感測器70所偵測以產生電子的干涉訊號傳遞 =j 係用於在極化益或—極化「分析器」（未圖示）束為感測器7°所伯測到之前，混合該輸量的極化作用。同樣在某』，義項取頭（未圖示）係用於將該混合極化輸The interferometer 14 travels to the sensor 7 to extract "V; the optical path is output from the front end of the beam, and the interference signal is detected by the sensor 70 to generate electrons. The polarization of the input is mixed before the polarization or polarization "analyzer" (not shown) is detected by the sensor 7°. Also in a certain 』, the meaning of the head (not shown) is used to convert the hybrid polarization

1057-5464-PF(Nl).ptd 第21頁 1277720 五、發明說明（18) 出光束耦合至一遙控感測器。輸入光束12係由光源10所提供且為一具二分量之光束。該等二分量具有不同的頻率以及互相垂直的平面極化。不同之頻率可以在光源1 〇產生，例如，雷射赛曼*** (Zeeman splitting)、Acousto-optical modulation 或是在雷射内部裝設雙折射元件來產生。干涉儀1 4的第一實施例以一立體視圖表示於第2 a圖並包括一整合光學總成中之二平面鏡干涉儀丨丨4。干涉儀1 i 4 係以干涉儀1 4之操作來作說明。量測光束1 2 2、1 2 4及1 2 6 之路徑對應於第1圖中標號20所指之路徑。該二平面鏡干 j 涉儀具有一共同之量測光束路徑用來讓其中之一通過至平面鏡量測物9 2。該共同量測光束路徑對應於該量測光束 1 2 2之路徑。光束12入射於極化光束分光器介面13〇並離開光束分光器130成為光束140，光束140包括參考及量測光束分量。輸入光束12之兩分量的極化平面在光束分光器介面 130與光束12之入射平面平行與垂直。光束14〇之量測光束分量由光束分光器130及平面鏡92所反射，由光束分光器1057-5464-PF(Nl).ptd Page 21 1277720 V. INSTRUCTIONS (18) The beam is coupled to a remote sensor. The input beam 12 is provided by the source 10 and is a two-component beam. The two components have different frequencies and mutually perpendicular plane polarization. Different frequencies can be generated at the source 1 ,, for example, Zeeman splitting, Acousto-optical modulation, or by installing a birefringent element inside the laser. The first embodiment of the interferometer 14 is shown in a perspective view in Fig. 2a and includes a second planar mirror interferometer 丨丨4 in an integrated optical assembly. The interferometer 1 i 4 is described by the operation of the interferometer 14. The paths of the measuring beams 1 2 2, 1 2 4 and 1 2 6 correspond to the paths indicated by reference numeral 20 in Fig. 1. The two-plane mirror has a common measurement beam path for passing one of them to the flat mirror measurement 92. The common measurement beam path corresponds to the path of the measurement beam 1 2 2 . Beam 12 is incident on polarized beam splitter interface 13 and exits beam splitter 130 as beam 140, which includes reference and measurement beam components. The plane of polarization of the two components of the input beam 12 is parallel and perpendicular to the plane of incidence of the beam splitter interface 130 and the beam 12. The beam component of the beam 14 is reflected by the beam splitter 130 and the plane mirror 92, and the beam splitter

1 3 0所傳遞，由四分之一波長相位阻滞板丨3 2作二次反射。二次通過阻滯板1 3 2會旋轉該量測光束之極化平面g 〇度。光束140之參考光束分量係由光束分光器所傳送，由平面鏡194及光束分光器130所反射，由四分之一波長相位阻滞板134作二次反射。二次通過阻滯板丨34旋轉該表者朵 ' 極化平面90度。尤束之Passed by 1 3 0, the quarter reflection is performed by the quarter-wave phase retardation plate 丨3 2 . The second pass through the blocking plate 133 will rotate the polarization plane g 〇 of the measuring beam. The reference beam component of beam 140 is transmitted by the beam splitter, reflected by plane mirror 194 and beam splitter 130, and secondarily reflected by quarter-wave phase block 134. The second pass through the retarding plate 丨 34 rotates the watch's polarization plane by 90 degrees. You beam

1057-5464-PF(Nl).ptd 第22頁 1277720 五、發明說明（19) 光束140之第一及第二部用來分別作為供給該二平面鏡干涉儀之光束，其中該第一及第二部具有量測光束分量，該等量測光束分量具有一共同量測光束路徑供其中之一通過到達該平面鏡量測物92。光束140由稜鏡154傳遞並由回溯反射器150反射而成為光束142。對應於光束140之第一部的光束142之一第一部由非極化光束分光器介面152 所傳遞而成為光束144，而光束142之一第二部對應於光束 140之第二部由光束分光器介面152及稜鏡154反射而成為光束1 4 6。光束144入射光束分光器介面130且離開光束分光器介面130成為包括參考及量測光束分量的輸出光束丨6〇。光束 144之量測光束分量由光束分光器介面130所傳遞，由平面鏡9 2及光束分光器介面130所反射，並由四分之一波長相位阻滯板132作二次傳遞。光束144之該參考光束分量係由光束分光器介面130及平面鏡194所反射，由光束分光器介面1 3 0所傳遞，且由四分之一波長相位阻滯板1 3 4作二次傳遞。光束146入射光束分光器介面130且離開光束分光器介面130成為包括參考及量測光束分量的輸出光束162。光束 146之量測光束分量由光束分光器介面130所傳遞，由平面鏡92及光束分光器介面130所反射，並由四分之一波長相位阻滯板132作二次傳遞。光束146之該參考光束分量係由光束分光器介面130及平面鏡94所反射，由光束分光器介面1 3 0所傳遞，且由四分之一波長相位阻滯板1 3 4作二次傳1057-5464-PF(Nl).ptd Page 22 1277720 V. INSTRUCTION DESCRIPTION (19) The first and second portions of the beam 140 are used as light beams for the two planar mirror interferometers, respectively, wherein the first and second The portion has a measured beam component having a common measurement beam path for one of the passes to reach the planar mirror measurement 92. Beam 140 is transmitted by helium 154 and reflected by retroreflector 150 to become beam 142. The first portion of one of the beams 142 corresponding to the first portion of the beam 140 is transmitted by the non-polarized beam splitter interface 152 into a beam 144, and the second portion of the beam 142 corresponds to the second portion of the beam 140 by the beam. The beam splitter interface 152 and the pupil 154 reflect and become a beam 146. Beam 144 is incident on beam splitter interface 130 and exits beam splitter interface 130 as an output beam 包括6〇 including reference and measurement beam components. The measured beam component of beam 144 is transmitted by beam splitter interface 130, reflected by plane mirror 92 and beam splitter interface 130, and is secondarily transmitted by quarter-wave phase retardation plate 132. The reference beam component of beam 144 is reflected by beam splitter interface 130 and plane mirror 194, transmitted by beam splitter interface 130, and secondarily transmitted by quarter-wave phase block 1343. Beam 146 is incident on beam splitter interface 130 and exits beam splitter interface 130 as an output beam 162 that includes a reference and measurement beam component. The measured beam component of beam 146 is transmitted by beam splitter interface 130, reflected by plane mirror 92 and beam splitter interface 130, and is secondarily transmitted by quarter-wave phase retardation plate 132. The reference beam component of beam 146 is reflected by beam splitter interface 130 and plane mirror 94, transmitted by beam splitter interface 130, and is transmitted by quarter-wave phase block 1343.

1057-5464-PF(Nl).ptd 第23頁 12777201057-5464-PF(Nl).ptd Page 23 1277720

遞0 人輸出光束160及162為感測器70所偵測而產生包括二電子介面訊號之訊號80。感測器70包括混合輸出光束16〇、 162之參考與量測光束分量的極化器。訊號8〇之電子介面 =號係傳送至電子處理器及電腦9〇，並處理有關平面鏡92 分別沿干涉儀量測軸x!及^之位移的資訊。位移七及^。之改變的平均由電子處理器及電腦9〇計算而作為平面鏡92之線性位移’而（X1G 一 Χι )的變化用於電子處理器及電腦9 〇以計算平面鏡92角位移的變化成為31^11[($)一$/1)1]其中bi 為該二干涉儀之量測軸的空間間距（見第2b圖）。在角度方位的量測變化係位於兩量測軸的平面。量測光束122、124及126的相對位置係表示於第2b 圖。同樣如第2b圖表示量測軸Xi及乂1()的相對位置，以及該量測軸之間距h。回溯反射器1 50之位置影響光束144相對於光束140之位置但不影響光束144與146之空間間距。光束144與146之空間間距係由光束分光器152以及稜鏡154的反射面所形成之菱形體之性質決定，且對應於轴x1Q以及Xl的間距N。一對應之特徵為該菱形體之放置不影響量測軸x1Q以及Xl之間的空間。回溯反射器1 5 0係顯示於第1圖成為一固相立方角回溯反射器（solid cube corner retroreflector)。對一固相立方角回溯反射器，一光束之最大直徑或用於使光束無任一部份通過立方角的扇形邊界之最大淨圓形通孔The 0-bit output beams 160 and 162 are detected by the sensor 70 to generate a signal 80 including a two-electron interface signal. The sensor 70 includes a polarizer that mixes the reference and output beam components of the output beams 16A, 162. The electronic interface of the signal 8 is transmitted to the electronic processor and the computer 9〇, and the information about the displacement of the plane mirror 92 along the interferometer measuring axes x! and ^ respectively is processed. Displacement seven and ^. The average of the changes is calculated by the electronic processor and the computer as the linear displacement of the plane mirror 92 and the change of (X1G - Χι) is used for the electronic processor and the computer 9 to calculate the angular displacement of the plane mirror 92 to become 31^11. [($)_$/1)1] where bi is the spatial separation of the measuring axes of the two interferometers (see Figure 2b). The measured change in angular orientation is in the plane of the two measuring axes. The relative positions of the measurement beams 122, 124, and 126 are shown in Figure 2b. Similarly, Figure 2b shows the relative positions of the measuring axes Xi and 乂1(), and the distance h between the measuring axes. The position of the retroreflector 150 affects the position of the beam 144 relative to the beam 140 but does not affect the spatial spacing of the beams 144 and 146. The spatial spacing of the beams 144 and 146 is determined by the nature of the diamond formed by the beam splitter 152 and the reflecting surface of the crucible 154, and corresponds to the pitch N of the axes x1Q and X1. A corresponding feature is that the placement of the diamond does not affect the space between the measurement axes x1Q and Xl. The retroreflector 150 is shown in Figure 1 as a solid cube corner retroreflector. For a solid-phase cube-corner retroreflector, the maximum diameter of a beam or the largest clear circular via for the sector boundary of the cube without any part of the beam

1057-5464-PF(Nl).ptd 第24頁 1277720 五、發明說明（21) (maximum clear circular aperture )係該立方角回溯反射器之輸入及輸出光束間距之1/2。然而，其他光學元件之最大淨通孔，例如光束分光器介面152，稜鏡154以及光束分光器介面130，與該立方角之輸入輸出光束的間距相等。係數1 / 2表示於該最大直徑中損失係數為2，該最大直徑可用於設置有傳統高穩定度平面鏡干涉儀（h i gh stability plane mirror interferometer ，HSPMIs)的一干涉系統。相較之下，第一實施例之干涉儀11 4可被建構為該第一實施例不會有損失係數當使用立方角回溯反射器時。光束140相對於光束144及146之位置不影響軸XlQ以及Xl 之空間間距h。結果，立方角回溯反射鏡1 50的尺寸可被選擇而成為無須改變間距!)！而設定該干涉儀的淨通孔之直徑的光學元件。回溯反射器150表示於第2a圖而為一固態立方角回溯反射器。立方角回溯反射器1 5 0的反射表面做電鍍以降低在訊號8 0的電子訊號中週期誤差的產生，參考如美國專利申請案60/371, 868在2002年4月11日由Henry A. Hill所提申的「Retroreflector Coating For Heterodyne Interf erometer」。回溯反射器1 50另外包括一極化保留回溯反射器（polarization preserving retroref lector )以降低週期誤差的產生如美國專利申請案第6, 1 98574B1 「Polarization Preserving Optical System」未脫離本發明之領域與精神。該所列舉之美國專利係併入之後的參1057-5464-PF(Nl).ptd Page 24 1277720 5. The invention (21) (maximum clear circular aperture) is 1/2 of the input and output beam spacing of the cube corner retroreflector. However, the largest clear vias of other optical components, such as beam splitter interface 152, 稜鏡 154, and beam splitter interface 130, are equally spaced from the input and output beams of the cube corner. The coefficient 1/2 indicates that the loss factor is 2 in the maximum diameter, and the maximum diameter can be used for an interference system provided with a conventional high stability plane mirror interferometer (HSPMIs). In contrast, the interferometer 11 of the first embodiment can be constructed such that the first embodiment does not have a loss factor when using a cube corner retroreflector. The position of the beam 140 relative to the beams 144 and 146 does not affect the spatial spacing h of the axes XlQ and X1. As a result, the size of the cube corner retrospective mirror 150 can be selected without changing the pitch!)! An optical element that sets the diameter of the net through hole of the interferometer. Retroreflector 150 is shown in Figure 2a as a solid cube corner retroreflector. The reflective surface of the cube-corner retroreflector 150 is plated to reduce the generation of periodic errors in the signal of the signal 80, as described in U.S. Patent Application Serial No. 60/371,868, issued Apr. 11, 2002 by Henry A. "Retroreflector Coating For Heterodyne Interferometer" by Hill. The retrospective reflector 150 further includes a polarization preserving retrorefector to reduce the generation of periodic errors. For example, U.S. Patent Application Serial No. 6, 1 98 574 B1 "Polarization Preserving Optical System" does not deviate from the field and spirit of the present invention. . The reference to the US patents listed after the introduction

1057-5464-PF(Nl).ptd 第25頁 1277720 五、發明說明（22) 考中。同樣地，統之有效淨通孔該第一實施通干涉儀，該雙徵有助於一更堅該第一實施對於該二雙通干一實施例之該二糸統，其包括二光程差之產生肇勻。同樣對於包傳統之HSPMIs，射器之使用通常通過量測光束間或餘割修正係數涉儀相位量測的該第一實施通干涉儀之光束鏡量測物之方位所產生的非週期號’並互相抵銷時。該波前誤差遞光束之光學表該第一實施該極化保留如立方例之優點為通干涉儀量固緊密且低例之另一優涉儀之光束干涉儀的光傳統HSPMIs 因於該干涉括二平面鏡具有二個別造成一非週肇因於製造形式中非週變化轉換成例（回溯反 @言係相同改變之光束 m差所對應 &計算從線可肇因於光面的形狀。回溯反射器未降低一干涉儀系角回溯反射器。僅使用一個回溯反射器於二雙測一量測體之二自由度。此特成本之整合光學總成。點是回溯反射器1 5 0中之光路而言係相同。此特徵降低於第程差，出現於一對應之干涉儀具有二個別之回溯反射器。該儀之玻璃及溫度梯度的不均干涉儀之一干涉儀系統，例如之回溯反射器，二個別回溯反期誤差。該雙通干涉儀之第二誤差的相對不對準，產生餘弦期誤差’該修正係數用於將干線性位移的變化。射器150中之光路對於該二雙 )之另一優點為，肇因自平面剪變所而造成的波前誤差，其的部分係共同於兩電子介面訊性位移的改變至角位移的改變學元件之雙折射以及反射或傳1057-5464-PF(Nl).ptd Page 25 1277720 V. Description of invention (22) Examination. Similarly, the first effective pass through the interferometer, the double sign helps to make the first implementation for the second embodiment of the two-passive embodiment, including two optical paths The difference is produced. Also for the conventional HSPMIs, the use of the ejector is usually performed by measuring the inter-beam or the residual correction coefficient. The aperiodic number generated by the orientation of the beam-mirror of the first interferometer is measured. And offset each other. The optical table of the wavefront error beam is the first embodiment of the polarization retention. The advantage of the cubic case is that the interferometer is tightly packed and the other is the light source of the beam interferometer. The traditional HSPMIs are due to the interference. The two plane mirrors have two individual causes of a non-circumferential transformation due to the non-circumferential change in the manufacturing form. (The back-to-back is the same as the difference in the beam m of the same change & the calculated line from the line can be caused by the shape of the smooth surface. The retroreflector does not reduce an interferometer angle retroreflector. Use only one retroreflector to measure the two degrees of freedom of the two pairs. This is the cost of the integrated optical assembly. The point is the retroreflector 1 5 0 The middle light path is the same. This feature is reduced by the first step difference, and the interferometer has two separate retroreflectors. The interferometer system of the instrument's glass and temperature gradient uneven interferometer, for example Backtracking reflector, two individual backtracking error. The relative misalignment of the second error of the two-pass interferometer produces a cosine period error 'this correction coefficient is used to change the dry linear displacement Another advantage of the optical path in the emitter 150 for the two pairs is that the wavefront error caused by the plane shearing is common to the change of the two-electron interface to the angular displacement. Change the birefringence of the element and reflect or pass

例之另一優點為回溯反射器丨5 〇的配置不Another advantage of the example is that the configuration of the retroreflector 丨5 〇 is not

第26頁 1277720 五、發明說明（23) 影響該二雙通干涉儀之量測轴之間的間距。因此在組裝一整合光學總成時該間距並非由回溯反射器之配置決定，而是由一單一光學元件的製造決定。該第一實施例之另一優點為由光束分光器介面1 52之極化介面以及反射面稜鏡154所形成之菱形體（rhomb)的配置不影響該二雙通干涉儀之量測軸之間的間距。因此在組裝一整合光學總成時該間距並非由該菱形體之配置決定，而是由一單一光學元件的製造決定，及該菱形體。該第一實施例之另一優點為由光束分光器介面1 52之極化介面以及反射面稜鏡丨54所形成之菱形體（rhomb)的配置不影響該二雙通干涉儀之電子干涉訊號之振幅。該第一實施例之另一優點為：對在該量測物平面鏡之量測光束的一給定之最大間距2bi，較大之淨通孔可被容納在相對於可能具有二平面鏡干涉儀之裝置中，如使用立方角回溯反射器的傳統HSPMIs，其中光束並不穿越回溯反射器之扇形邊界。該第一實施例之另一優點為：得自該二雙通干涉儀之位移差的角位移對溫度梯度之敏感度降低。在該第一實施例中，量測光束1 2 2可被認為一「第一光束」或「主要」量測光束，量測光束丨22第一次傳遞至遠平面鏡量測物並隨即由極化光束分光器1 30分成多道 _人光束」以及包括回溯反射器150，光束分光器介面152 以及平面鏡丨54的一「返回光束總成」。於該第一實施例中，對應於量測光束124及126的該等次光束可更被認為Page 26 1277720 V. INSTRUCTIONS (23) Affect the spacing between the measuring axes of the two-pass interferometer. Therefore, the spacing is not determined by the configuration of the retroreflector when assembling an integrated optical assembly, but by the manufacture of a single optical component. Another advantage of the first embodiment is that the configuration of the rhomb formed by the polarizing interface of the beam splitter interface 152 and the reflecting surface 154 does not affect the measuring axis of the two-pass interferometer. The spacing between the two. Thus the spacing is not determined by the configuration of the diamond when assembling an integrated optical assembly, but rather by the manufacture of a single optical component, and the diamond. Another advantage of the first embodiment is that the configuration of the rhomb formed by the polarizing interface of the beam splitter interface 152 and the reflecting surface 稜鏡丨 54 does not affect the electronic interference signal of the two-pass interferometer. The amplitude. Another advantage of the first embodiment is that a larger clear aperture can be accommodated relative to a device having a two-plane mirror interferometer for a given maximum spacing 2bi of the measuring beam of the measuring object plane mirror In the case of conventional HSPMIs using cube corner retroreflectors, where the beam does not cross the sector boundary of the retroreflector. Another advantage of this first embodiment is that the angular displacement of the displacement difference from the two-pass interferometer is less sensitive to temperature gradients. In the first embodiment, the measuring beam 1 2 2 can be regarded as a "first beam" or a "main" measuring beam, and the measuring beam 22 is first transmitted to the far-field mirror and immediately The beam splitter 1 30 is divided into a plurality of "human beams" and a "return beam assembly" including a retroreflector 150, a beam splitter interface 152, and a plane mirror 54. In the first embodiment, the sub-beams corresponding to the measurement beams 124 and 126 can be considered more

測物之輸出光束之一分量，路徑接觸於該量測物第二次面130反射向參考平面鏡194 被視為一「主要」參考光束並沿與該共同路徑相異之另一。而且，由極化光束分光器介的輸入光束12的參考部分，可 ’該「主要」參考光束第一次 1277720 五、發明說明（24) 次要j量測光束，該等次要光束沿一與對應該量測光束 1 2 2相異之路徑做一第二次傳遞至該平面鏡量測物。因此’於該第一實施例中，每一此光束對應於沿一由量測光束122 (量測光束122之部分）所定義之共同路徑接觸於量通至參考平面鏡並隨即與量測光束122再結合（在其第一次通過至該平面鏡量測物之後），以定義一「中介」光束。该「中介」光束隨即由返回光束總分量成「多重」光束，該多成光束對應於光束144及146。該極化光束分光器介面130將該多重光束分成一組次要量測光束（對應於量^ ，光束124及126 )以及一組次要參考光束（對應於做第二人通過至平面鏡參考物194)。一相似的命名方式用於下列之實施例。泫干涉儀之一第二實施例1 4表示於第3a圖中之一立體、為if。括三個平面鏡干涉儀在_整合光學總成中-般標二二H血干:歩儀21 4以干涉儀1 4之操作*式作說明，並建構以置測與監視平面鏡92在一方心 92二垂直平面之角度方位在量生位移以及平面鏡 228之路徑對應於第1圖中以桿、224、226以及鏡干涉儀具有一共同量測光代f路徑。該三平面測物92。該共同量測光束路次傳遞至平面鏡量仏對應於置測光束222之路One component of the output beam of the object, the path being contacted by the second subsurface 130 of the object is reflected toward the reference plane mirror 194 as a "primary" reference beam and along the other of the common path. Moreover, the reference portion of the input beam 12 interposed by the polarized beam splitter can be 'the main' reference beam for the first time. 1277720 5. Inventive Note (24) Secondary j-measured beam, the secondary beams along a A second pass to the plane mirror measurement is performed on a path different from the measurement beam 1 2 2 . Thus, in this first embodiment, each such beam corresponds to a common path defined by a measuring beam 122 (a portion of the measuring beam 122) that is in contact with the reference plane mirror and is then associated with the measuring beam 122. Recombination (after its first pass to the plane mirror measurement) to define an "intermediate" beam. The "intermediate" beam is then converted into a "multiple" beam by the total component of the return beam, which corresponds to beams 144 and 146. The polarized beam splitter interface 130 splits the multiple beams into a set of secondary measuring beams (corresponding to the quantity ^, beams 124 and 126) and a set of secondary reference beams (corresponding to the second person passing to the mirror reference) 194). A similar naming scheme is used for the following embodiments. The second embodiment 14 of the 泫 interferometer is shown in Fig. 3a as one of the stereoscopic, if. Including three plane mirror interferometers in the _ integrated optical assembly - the general standard two two H blood dry: Pu Yi 21 4 with the interferometer 14 operation * description, and constructed to set and monitor the plane mirror 92 in one heart The angular orientation of the 92 vertical planes in the quantum displacement and the path of the plane mirror 228 correspond to the common path of the photometric f-paths in the first diagram with rods, 224, 226 and mirror interferometers. The three planes are measured 92. The common measurement beam path is transmitted to the plane mirror amount 仏 corresponding to the path of the set beam 222

1057-5464-PF(Nl).ptd 第28頁 1277720 五、發明說明（25) 徑。第二實施例的許多元件與第一實施例的元件具有相同之功能。在第一、第二實施例中具有相同功能的元件以相差100的標號表示。光束12入射於極化光束分光介面23〇並離開極化光束分光介面230而成為光束240包括參考與量測光束分量。入射光束1 2之二分量的極化平面係平行並垂直於光束丨2在光束分光器介面230之入射平面。光束24〇的三個部分係用作分別給予三個平面鏡干涉儀的光束，其中該三部分具有量測光束分量’該量測光束分量具有一共同量測光束路徑供一次傳遞至該平面鏡量測物9 2。光束2 4 0之其他說明與該第一實施例之光束1 4 0之說明對應之部分相同。光束240之三個部分中的第一部份係依序由稜鏡254、回溯反射鏡2 50以及光束分光器介面252傳遞而成為光束 244。該三部分中的第二部分對應於光束24〇之一第二部分的一第一部份，光束240之一第二部分的一第一部份由光束分光器介面252反射並由光束分光器介面1252所傳遞，由稜鏡254反射之後而成為光束246。該三部分中的第三部分對應於光束240之一第二部分的一第二部份，光束24〇之一第二部分的一第二部份由光束分光器介面252反射並由光束分光裔介面1252所反射成為光束248，在由稜鏡256反射之後。光束244入射於極化光束分光介面230並離開極化光束分光介面230而成為光束260包括參考與量測光束分量。光1057-5464-PF(Nl).ptd Page 28 1277720 V. Description of invention (25) Path. Many of the elements of the second embodiment have the same function as the elements of the first embodiment. Elements having the same function in the first and second embodiments are denoted by reference numerals having a difference of 100. The beam 12 is incident on the polarizing beam splitting interface 23 and away from the polarizing beam splitting interface 230 to become the beam 240 comprising the reference and measuring beam components. The plane of polarization of the two components of the incident beam 12 is parallel and perpendicular to the plane of incidence of the beam 丨2 at the beam splitter interface 230. The three portions of the beam 24 系 are used as beams respectively to three plane mirror interferometers, wherein the three portions have a measured beam component 'the measured beam component has a common measuring beam path for one pass to the plane mirror measurement 9 2 . The other description of the beam 2 40 is the same as the portion corresponding to the description of the beam 1 40 of the first embodiment. The first of the three portions of beam 240 is sequentially transmitted by 稜鏡254, retroreflector 205, and beam splitter interface 252 to become beam 244. The second portion of the three portions corresponds to a first portion of the second portion of the beam 24, and a first portion of the second portion of the beam 240 is reflected by the beam splitter interface 252 and is illuminated by the beam splitter The interface 1252 is transmitted and reflected by the 稜鏡 254 to become the beam 246. A third portion of the three portions corresponds to a second portion of the second portion of one of the beams 240, and a second portion of the second portion of the beam 24 is reflected by the beam splitter interface 252 and is split by the beam splitter Interface 1252 is reflected as beam 248 after being reflected by 稜鏡 256. Beam 244 is incident on polarized beam splitting interface 230 and exits polarized beam splitting interface 230 to become beam 260 comprising reference and measured beam components. Light

第29頁 1277720 五、發明說明（26) 束260之其他說明與該第一實施例之光束160之說明對應之部分相同。光束246入射於極化光束分光介面230並離開極化光束分光介面230而成為光束262包括參考與量測光束分量。光束262之其他說明與該第一實施例之光束162之說明對應之部分相同。光束248入射於極化光束分光介面230並離開極化光束分光介面230而成為光束264包括參考與量測光束分量。光束248之參考與量測光束分量行進通過光學元件而形成光束2 6 4的說明與該第一實施例之光束丨4 4形成光束1 6 0的說明對應之部分相同。沿路徑2 0行進之量測光束2 2 4、2 2 6以及2 2 8分別由輸出光束260、262、264作結合。量測光束222以及224與量測軸X2結合，量測光束222以及226與量測軸x2G結合，而且量測光束222以及228與量測軸&()結合（參看第3圖）。、與&的空間間距為\，而&⑽與^及心形成之平面的空間間距為b2〇。量測光束222、224、226以及2 28的相對位置表示於 3b圖。同樣表示於第3b圖的是量測軸&、&。以量測軸間距b2與1)2。。Page 29 1277720 V. DESCRIPTION OF THE INVENTION (26) Other descriptions of the bundle 260 are the same as those corresponding to the description of the light beam 160 of the first embodiment. Beam 246 is incident on polarized beam splitting interface 230 and exits polarizing beam splitting interface 230 to become beam 262 comprising reference and measuring beam components. Other descriptions of the light beam 262 are the same as those corresponding to the description of the light beam 162 of the first embodiment. Beam 248 is incident on polarized beam splitting interface 230 and exits polarized beam splitting interface 230 to become beam 264 comprising reference and measurement beam components. The description of the beam 248 and the measurement of the beam component traveling through the optical element to form the beam 2 6 4 are identical to the portion of the first embodiment of the beam 丨 4 4 forming the beam 1 60. The measuring beams 2 2 4, 2 2 6 and 2 2 8 traveling along the path 20 are combined by the output beams 260, 262, 264, respectively. The measuring beams 222 and 224 are combined with the measuring axis X2, the measuring beams 222 and 226 are combined with the measuring axis x2G, and the measuring beams 222 and 228 are combined with the measuring axis & (see Fig. 3). The spatial separation from & is \, and the space between & (10) and ^ and the plane formed by the heart is b2〇. The relative positions of the measurement beams 222, 224, 226, and 2 28 are shown in Figure 3b. Also shown in Figure 3b are the measuring axes && The shaft spacing b2 and 1)2 are measured. .

平面賴三個自由度的變化係由f j用三個量測到的線性位移以及所量測的性㈣與… 第二實施例之特徵與優點光學總成，低成本，淨通孔，距1½與的決定，以及降低非例如關於一小型堅固的整合回溯反射器2 5 0的設置，間週期誤差的效果，與本發明The change of the plane by three degrees of freedom is the linear displacement measured by fj with three measurements and the measured property (4) and... The characteristics and advantages of the second embodiment Optical assembly, low cost, clear through hole, distance 11⁄2 And the decision to reduce the setting of the cycle error without, for example, regarding a small and robust integrated retroreflector 250, and the present invention

1277720 五、發明說明（27) 一 ——----------- 之第-實施例所對應之特徵與優點相同。實施例之一變形係表示於第10圖。該第二實施例 5形為一個四軸的平面鏡干涉儀，其具有包括介面“Ο 丨ί寸的極化光束分光器，以及相對於第3a圖之第二實 :1又大!!垔測光束淨通孔。此處之淨通孔係由光學表面、界所定$，例如立方角回溯反射器丨250之扇形邊界。该第二實施例之變形通常表現出較大的量測光束淨通 ^降低由波前誤差及光束剪變所產生的非週期非線性誤差。對給疋量之由波前誤差及光束剪變所產生的非週期非線性块差’在該第二實施例之變形的干涉儀之尺寸相對於第二實施例中對應之干涉儀可降低。该第二實施例之變形最後使用所遭遇的Abbe誤差相對於第二實施例中對應最後使用所遭遇的Abbe誤差可降低。該第二實施例之變形在一平面上的光學角解析度 (optical angUlar res〇iution)比第二實施例中對應之在同一平面上的光學角解析度增加。該第二實施例之變形的元件以及第二實施例中之元件具有相同之標號者具有相同之功能。參照第丨〇圖，介面 1 256的兩斷面係電鍍而作為供光束的反射介面而反射該光束成為光束2244及2246。介面1256的中心斷面係未電鑛而傳遞光束240，其中該所傳遞之光束繼而由相位阻滞板 1232以及立方角回溯反射器125〇傳遞而成為光束1242。光束1242入射於光束分光器介面2252而且該光束1242之一第1277720 V. DESCRIPTION OF THE INVENTION (27) The features and advantages of the first embodiment of the invention are the same. A variation of the embodiment is shown in Fig. 10. The second embodiment 5 is shaped as a four-axis plane mirror interferometer having a polarized beam splitter including an interface of "Ο 丨寸", and a second real with respect to the 3a figure: 1 is large! The net through hole of the beam. The net through hole here is defined by the optical surface and the boundary, for example, the sector boundary of the cube corner retroreflector 丨 250. The deformation of the second embodiment generally shows a large measurement beam pass. ^Reducing the aperiodic nonlinear error caused by the wavefront error and beam shearing. The aperiodic non-linear block difference caused by the wavefront error and the beam shearing of the given amount is a variant of this second embodiment The size of the interferometer can be reduced relative to the corresponding interferometer in the second embodiment. The Abbe error encountered in the last modification of the second embodiment can be reduced relative to the Abbe error encountered in the corresponding last use in the second embodiment. The optical angle resolution of the second embodiment is increased on the same plane as the optical angle resolution on the same plane in the second embodiment. The deformation of the second embodiment Component The elements in the second embodiment have the same functions as those of the same reference numerals. Referring to the second drawing, the two sections of the interface 1 256 are plated to reflect the light beam as the reflection interface of the light beam to become the light beams 2244 and 2246. The central section of the interface 1256 is uncharged to deliver the beam 240, wherein the transmitted beam is then transmitted by the phase blocker 1232 and the cube retroreflector 125A into a beam 1242. The beam 1242 is incident on the beam splitter interface. 2252 and one of the beams 1242

l〇57-5464.PF(Nl).ptdl〇57-5464.PF(Nl).ptd

第31頁 1277720 五、發明說明（28) 一部份被傳遞而一第二部分被反射。所傳遞之第一部份入射於光束分光器介面32 52而且其一第一部份傳遞而成為光束1244且其一第二部分反射而成為光束2244在由介面1256 之反射斷面所反射之後。由光束介面2252所反射之第二部分之一部分係由光束分光器介面3252傳遞而由反射介面 1 254反射之後形成光束1 246，而且該所反射之第二部分的另一部份係由光束分光器介面3 2 5 2所反射而由介面1 2 5 4以及介面1256之一反射斷面。Page 31 1277720 V. INSTRUCTIONS (28) One part is transmitted and the second part is reflected. The first portion transmitted is incident on beam splitter interface 32 52 and a first portion thereof is transmitted to become beam 1244 and a second portion thereof is reflected to become beam 2244 after being reflected by the reflective section of interface 1256. A portion of the second portion reflected by the beam interface 2252 is transmitted by the beam splitter interface 3252 and reflected by the reflective interface 1 254 to form a beam 1 246, and the other portion of the reflected second portion is split by the beam The interface is reflected by the interface 3 2 5 2 and is reflected by one of the interface 1 2 5 4 and the interface 1256.

光束1 244入射於極化光束分光介面230並離開極化光束分光介面230而成為光束264包括參考與量測光束分量。光束1 264之其他說明與該第二實施例之輸出光束260之說明對應之部分相同。光束1 246入射於極化光束分光介面 230並離開極化光束分光介面230而成為光束12 66包括參考與量測光束分量。光束1 2 6 6之其他說明與該第二實施例之輸出光束260之說明對應之部分相同。光束2244入射於極化光束分光介面230並離開極化光束分光介面230而成為輸出光束2264包括參考與量測光束分量。光束2244之參考與量測光束分量行進通過光學元件而形成光束2264的說明與該第二實施例之光束2 4 4形成光束2 6 0的說明對應之部分相同。光束2246入射於極化光束分光介面230並離開極化光束分光介面230而成為輸出光束2266包括參考與量測光束分量。光束2246之參考與量測光束分量行進通過光學元件而形成光束2 2 6 6的說明與該第二實施例之光束2 4 6形成光束2 62的說明對應之部分相同。Beam 1 244 is incident on polarized beam splitting interface 230 and exits polarized beam splitting interface 230 to become beam 264 comprising reference and measurement beam components. The other description of beam 1 264 is identical to the portion corresponding to the description of output beam 260 of the second embodiment. Beam 1 246 is incident on polarized beam splitting interface 230 and exits polarized beam splitting interface 230 to become beam 12 66 including reference and measured beam components. Other descriptions of the beam 1 26 6 are identical to the portions corresponding to the description of the output beam 260 of the second embodiment. Beam 2244 is incident on polarizing beam splitting interface 230 and exits polarizing beam splitting interface 230 to become output beam 2264 including reference and measuring beam components. The description of the beam 2244 and the measurement of the beam component traveling through the optical element to form the beam 2264 are identical to the portion of the second embodiment of the beam 2 4 4 forming the beam 206. Beam 2246 is incident on polarized beam splitting interface 230 and exits polarized beam splitting interface 230 to become output beam 2266 including reference and measurement beam components. The description of the beam 2246 and the measurement of the beam component traveling through the optical element to form the beam 2 26 6 are identical to the portion of the second embodiment of the beam 2 4 6 forming the beam 2 62.

1057.5464-PF(Nl).ptd 第32頁 1277720 五、發明說明（29) 由於光束2 2 2的部分當作對四量測轴之每一量測轴而言第一次傳遞至量測物92之量測光束，故量測光束222被當作主要量測光束。沿路徑20行進之量測光束1 224、 2224、1226以及2226分別與輸出光束1264、2264、1 266以及2266。如第10圖所示，由輸出光束1 242以及從/至該立方角回溯反射器1 2 5 0的對應之輪入光束所定義之平面相對於光束240之量測與參考分量之極化狀態所定義之平面成45 度。結果，輸入光束之量測與參考分量之極化狀態至立方角回溯反射器1 2 5 0之平面與立方角回溯反射器1 2 5 0之名稱上的快軸與慢軸不對準。為了對該輸入光束之量測與參考分量之極化狀態至立方角回溯反射器丨2 5 〇之平面以及立方角回溯反射器1 2 5 0之名稱上的快軸與慢軸的相對旋轉效應作補償’ 一相位阻滯板1 232置於該輸入光束至立方角回溯反射器1 250的路徑上，且相位阻滯板丨232的快軸平行或垂直於立方角回溯反射器丨2 5 〇之快軸。相位阻滯板1 2 3 2亦可至於輸出光束1 2 4 2來自立方角回潮反射器1 2 5 0的路徑上。相位阻滯性質的補償可另外藉由放置一相位阻滯板在輸入光束及輸出光束至立方角回溯反射器1250的路徑上。相位阻滯板1 232之性質被決定如立方角回溯反射器 1 2 5 0之相位阻滯性質。對言，通常在商用干涉儀中一鍍銀的立方角回溯反射器而，鍍銀之立方角回溯反射器的快與慢軸相對於輸入及輸出光束至該鍍銀的立方角回溯反射1057.5464-PF(Nl).ptd Page 32 1277720 V. DESCRIPTION OF THE INVENTION (29) Since the portion of the beam 2 2 2 is transmitted to the measuring object 92 for the first time as the measuring axis for the four measuring axes The beam is measured, so the measuring beam 222 is taken as the main measuring beam. The measured beams 1 224, 2224, 1226, and 2226 traveling along path 20 are output beams 1264, 2264, 1 266, and 2266, respectively. As shown in FIG. 10, the polarization of the plane defined by the output beam 1 242 and the corresponding wheeled beam from/to the cube corner retroreflector 1 250 is relative to the polarization of the beam 240 and the reference component. The defined plane is 45 degrees. As a result, the polarization of the input beam is measured and the polarization state of the reference component is not aligned with the plane of the cube angle retroreflector 1 2 5 0 and the cube corner retroreflector 1 2 5 0. In order to measure the polarization state of the input beam and the polarization state of the reference component to the cube-corner retroreflector 丨2 5 平面 plane and the relative rotation effect of the fast axis and the slow axis on the cube corner retroreflector 1 2 5 0 For compensation, a phase blocking plate 1 232 is placed on the path of the input beam to the cube corner retroreflector 1 250, and the fast axis of the phase blocking plate 232 is parallel or perpendicular to the cube corner retroreflector 丨 2 5 〇 The fast axis. The phase blocker 1 2 3 2 may also have an output beam 1 2 4 2 from the path of the cube corner retroreflector 1 250. The compensation of the phase blocking property can additionally be achieved by placing a phase blocking plate on the path of the input beam and the output beam to the cube corner retroreflector 1250. The nature of the phase blocker 1 232 is determined as the phase retarding nature of the cube corner retroreflector 1 250. In other words, a silver-plated cube-corner retroreflector is usually used in commercial interferometers, and the fast and slow axes of the silver-plated cube-corner retroreflector are retroreflective with respect to the input and output beams to the silver-plated cube corner.

1057-5464-PF(Nl).ptd 第33頁 1277720 五、發明說明（30) 器之方向所定義之平面轉動大約3度。此外，導入一大約 1 8 0度之相位移動（相位移動之正弦值大約為〇 · 1 )使該立方角回溯反射器表現如一半波長之相位阻滯板。相位阻滯板1 232所導入的相位移動被選定用來補償立方角回溯反射器1250，以降低以其他方式導入的週期誤差。其他的電鍍方式可用於立方角回溯反射器1250上，如美國專利中請案60/371，868於2002年4月11日所提中之 rRetroreflector Coating For Hetrodyne Interferometer」Henry A· Hill，其内容於此併入作參考。具有如該申請案所述之電鍍層，該電鍍之立方角回溯反射器1 2 5 0具有高精密度之半波長之相位阻滯板之性質相對於輸入及輸出光束之極化狀態。該相位阻滯性質於此例中係以一標準的半波長相位阻滯板作為相位阻滞板丨2 3 2使用。該第二實施例之變形的優點是供量測光束的有效淨通孔相對於第二實施例之有效淨通孔增加。此增加部分係由於主要量測光束222移動至量測光束2224及2226中間的一中央位置。移動之結果，光束2224及2226的有效淨通孔可為相等’表現相對於第二實施例之光束的有效淨通孔增加，其中有效淨通孔定義為2 2 6。該第二實施例之變形的有效淨通孔之增加部分係立方角回溯反射器1 250之快軸與慢軸相對於光束240之量測與參考分量之極化平面旋轉大約45度。對如此快軸與慢軸之旋轉而言’立方角回溯反射器丨2 5 〇的扇形邊界以有在該量1057-5464-PF(Nl).ptd Page 33 1277720 V. INSTRUCTIONS (30) The plane defined by the direction of the device is rotated approximately 3 degrees. In addition, a phase shift of approximately 180 degrees (the sine of the phase shift is approximately 〇 · 1) is introduced such that the cube corner retroreflector exhibits a phase retardation plate of half the wavelength. The phase shift introduced by phase block 1 232 is selected to compensate for cube corner retroreflector 1250 to reduce the periodic error introduced by other means. Other plating methods can be used for the cube-corner retroreflector 1250, as described in U.S. Patent Application Serial No. 60/371,868, the entire entire entire entire entire entire entire entire entire entire This is incorporated by reference. With the electroplated layer as described in this application, the plated cube corner retroreflector 1 250 has a high precision half wavelength phase retardation plate with respect to the polarization state of the input and output beams. This phase retarding property is used in this example as a phase retardation plate 丨2 3 2 with a standard half-wavelength phase retardation plate. An advantage of this variant of the second embodiment is that the effective clear aperture of the supply beam is increased relative to the effective clear via of the second embodiment. This increase is due in part to the fact that the main measurement beam 222 is moved to a central position intermediate the measurement beams 2224 and 2226. As a result of the movement, the effective clear vias of beams 2224 and 2226 can be equal' exhibiting an effective net via increase relative to the beam of the second embodiment, with an effective clear via defined as 2 26 . The increased portion of the effective clear through hole of the second embodiment is the rotation of the fast axis and the slow axis of the cube retrospective reflector 1 250 with respect to the beam 240 and the polarization plane of the reference component by about 45 degrees. For the rotation of such a fast axis and a slow axis, the sector boundary of the cube corner retroreflector 丨 2 5 以 has

1057-5464-PF(Nl).ptd 第34頁 1277720 五、發明說明（31) 測光束之兩獨立而互相垂直之自由度做1 5度以内之一對應的旋轉’相較於出現在傳統高穩定度平面鏡干涉儀。因此，立方角回溯反射器1 250的扇形邊界具有一大約15度的相對校準相對於由光束2 4之量測光束分量的光束剪變以及一對應之有效淨通孔之增加所環繞的一矩形空間。主要量測光束222移動至量測光束2224及2226中間的一中央位置無須減少立方角回溯反射器丨2 5 〇之淨通孔，而是藉由從輸出光束至立方角回溯反射器丨2 5 〇垂直與水平設置的輸出光束1242。較大的量測光束淨通孔形成該第二實施例之變形的另一優點的基礎。對於一給定之光束剪變量以及光學表面之表面配置規格，較大之通孔會導致對應之非週期非線性誤差的降低。也可能該第二實施例之變形中藉由移動主要光束2 2 2 至較接近於具有介面230之極化光束分光器之對應邊緣，而減低對遠離該光束（射向參考物294 ) 222之一表面的 Abbe效應。可能移動至對應之邊緣而不會降低第二實施例之變形有效淨通孔，由於主要光束222所經歷的光束剪變為量測光束1224、2224、1226以及2226所經歷之光束剪變的一半，其中該光束剪變係量測物92之方位改變的結果。此特徵代表該第二實施例之變形的另一優點。該第二實施例之變形的另一優點是由光束1 226及2226 所疋義之平面上的角位移解析度’可藉由移動主要光束 222接近於具有介面230之極化光束分光器之對應邊緣而增1057-5464-PF(Nl).ptd Page 34 1277720 V. INSTRUCTIONS (31) The two independent and perpendicular degrees of freedom of the beam are made to rotate within one of 1 5 degrees. Stability flat mirror interferometer. Thus, the sector boundary of the cube corner retroreflector 1 250 has a relative calibration of about 15 degrees relative to the beam shear of the beam component measured by the beam 24 and a rectangle surrounded by an increase in the effective net via. space. The main measuring beam 222 is moved to a central position between the measuring beams 2224 and 2226 without reducing the net through hole of the cube corner retroreflector 丨25 〇, but by retroreflecting the reflector from the output beam to the cube corner 丨 2 5输出 Vertically and horizontally arranged output beam 1242. The larger gauge beam clear via forms the basis for another advantage of the variation of this second embodiment. For a given beam shear variable and the surface configuration of the optical surface, a larger via will result in a corresponding reduction in the non-periodic nonlinear error. It is also possible that in the variant of the second embodiment, by moving the main beam 2 2 2 to a corresponding edge closer to the polarizing beam splitter having the interface 230, the distance from the beam (to the reference 294) 222 is reduced. The Abbe effect of a surface. It is possible to move to the corresponding edge without reducing the effective net through hole of the second embodiment, since the beam shear experienced by the primary beam 222 is half of the beam shear experienced by the measuring beams 1224, 2224, 1226 and 2226 Where the beam shear is the result of a change in orientation of the measurement object 92. This feature represents another advantage of the variant of this second embodiment. Another advantage of the variation of the second embodiment is that the angular displacement resolution on the plane defined by the beams 1 226 and 2226 can be approximated by moving the primary beam 222 to the corresponding edge of the polarized beam splitter having the interface 230. Increase

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第35頁 1277720 五、發明說明（32) 加0 該第二實施例之變形的其餘之說明與第二實施例中對應之部分的說明相同。對熟習此技藝之人士而言是很明顯的，量測光束1 2 2 6 朝光束1 224移動置疑位置介於光束1 226及1 224的中間如第 10圖所示，而與輸入光束12成一直線並不偏離本發明之範圍與精神，藉由移動反射面1 2 5 4之位置。Page 35 1277720 V. Description of Invention (32) Addition 0 The rest of the description of the modification of the second embodiment is the same as that of the corresponding portion of the second embodiment. It will be apparent to those skilled in the art that the measurement beam 1 2 2 6 is moved toward the beam 1 224. The suspect position is intermediate the beams 1 226 and 1 224 as shown in FIG. 10, and is in line with the input beam 12. A straight line does not deviate from the scope and spirit of the present invention by moving the position of the reflective surface 1 2 5 4 .

該干涉儀之一第三實施例14表示於第4a圖中之一立體圖，並包括三個平面鏡干涉儀在一整合光學總成中一般標示為314。干涉儀214以干涉儀14之操作方式作說明，並建構以量測與監視平面鏡9 2在一方向之線性位移以及平面鏡 92二垂直平面之角度方位。量測光束322、324、326、 1 322以及1 324之路徑對應於第1圖中以標號2〇所代表路位。§亥二平面鏡干涉儀中的兩者具有一共同量測光束路徑供一次傳遞至平面鏡量測物9 2。該共同量測光束路徑對應於量測光束322之路徑。 uA third embodiment 14 of the interferometer is shown in a perspective view of Fig. 4a and includes three planar mirror interferometers generally designated 314 in an integrated optical assembly. The interferometer 214 is illustrated in the manner in which the interferometer 14 operates and is configured to measure and monitor the linear displacement of the plane mirror 92 in one direction and the angular orientation of the plane perpendicular to the plane 92. The paths of the measuring beams 322, 324, 326, 1 322, and 1 324 correspond to the path represented by reference numeral 2 in Fig. 1. Both of the two mirror mirror interferometers have a common beam path for one pass to the plane mirror measurement 92. The common measurement beam path corresponds to the path of the measurement beam 322. u

弟二貫施例的許多元件與第二實施例的元件具有相同之功能。在第二、第三實施例中具有相同功能的元件以相差1 0 0的標號表示。光束12入射於光束分光器介面358且一第一部份被反射而成為一輸入光束312在稜鏡359反射之後。光束12之一第二部分由光束分光器介面358傳遞而成為一輸入光束 1312。輸入光束312入射於光束分光器介面330並離開而成為輸出光束360與362。與輸出光束360以及362結合之該量Many of the elements of the second embodiment have the same function as the elements of the second embodiment. The elements having the same function in the second and third embodiments are denoted by reference numerals having a difference of 100. Beam 12 is incident on beam splitter interface 358 and a first portion is reflected as an input beam 312 after reflection at 稜鏡359. The second portion of the beam 12 is transmitted by the beam splitter interface 358 into an input beam 1312. Input beam 312 is incident on beam splitter interface 330 and exits as output beams 360 and 362. The amount combined with output beams 360 and 362

l〇57-5464-PF(Nl).ptd 第36頁 1277720 五、發明說明（33) 測光束為322、324以及326。輸入光束1312入射於光束分光器介面330並離開干涉儀314而成為輸出光束1364。與輸出光束1364結合之該量測光束為1322、1324。輸入光束31 2行進通過干涉儀3 1 4而形成量測光束 322、324與326以及輸出光束360與362的說明，與該第一實施例中輸入光束1 2行進通過干涉儀11 4而形成量測光束 122、124與126以及輸出光束160與162的說明相同。包括回溯反射器1 350以及極化分光器介面330的該干涉儀是傳統的HSPMI，該極化分光器介面330具有量測光束 1322以及1324。按，輸入光束1312行進通過干涉儀314而形成里測光束1322、1324與1326以及輸出光束1364的說明與光束通過HSPMI之對應的說明相同。量測光束322以及324與量測軸x3結合，量測光束322以及326與量測軸x3G結合，而且量測光束1 322以及1 324與量測軸x3GQ結合（參看第4b圖）。x3Q與x3的空間間距為b3，而 X30G與x3G及x3形成之平面的空間間距為b3〇。量測光束322、324、326、1 32 2以及1 324的相對位置表示於第4b圖。同樣表示於第4b圖的是量測軸x3、x3Q以及 X30G ’還有量測軸間距b3與1}3。。平面鏡92三個自由度的變化係由電子處理器與電腦90 使用三個量測到的線性位移以及所量測的性質b3與b3Q來計算。第二實施例之特徵與優點例如關於一小型堅固的整合光學總成，低成本，淨通孔，回溯反射器3 5 0的設置，間l〇57-5464-PF(Nl).ptd Page 36 1277720 V. Description of invention (33) The beams are 322, 324 and 326. Input beam 1312 is incident on beam splitter interface 330 and exits interferometer 314 to become output beam 1364. The measurement beams combined with the output beam 1364 are 1322, 1324. The input beam 31 2 travels through the interferometer 3 1 4 to form a description of the measurement beams 322, 324 and 326 and the output beams 360 and 362, and the input beam 12 in the first embodiment travels through the interferometer 11 4 to form an amount The description of beam 114, 124 and 126 and output beams 160 and 162 are the same. The interferometer including retroreflector 1 350 and polarized beam splitter interface 330 is a conventional HSPMI having measurement beams 1322 and 1324. The description of the input beam 1312 traveling through the interferometer 314 to form the inner beams 1322, 1324 and 1326 and the output beam 1364 is the same as the corresponding description of the beam passing through the HSPMI. The measuring beams 322 and 324 are combined with the measuring axis x3, the measuring beams 322 and 326 are combined with the measuring axis x3G, and the measuring beams 1 322 and 1 324 are combined with the measuring axis x3GQ (see Fig. 4b). The space between x3Q and x3 is b3, and the space between X30G and x3G and x3 is b3〇. The relative positions of the measuring beams 322, 324, 326, 1 32 2 and 1 324 are shown in Fig. 4b. Also shown in Fig. 4b is the measuring axes x3, x3Q and X30G' and the measuring shaft spacings b3 and 1}3. . The three degrees of freedom of the mirror 92 are calculated by the electronic processor and computer 90 using three measured linear displacements and the measured properties b3 and b3Q. Features and advantages of the second embodiment are, for example, regarding a compact and sturdy integrated optical assembly, low cost, clear through hole, retroreflector 350 setting,

1057-5464-PF(Nl).ptd 第37頁 12777201057-5464-PF(Nl).ptd Page 37 1277720

五、發明說明（34) 距1>3與1½的決定，以及降低非週期誤差的效果，與本發明之第一實施例所對應之特徵與優點相同。該干涉儀之一第四貫施例1 4表示於第5 a圖中之一立體圖，並包括四個平面鏡干涉儀在一整合光學總成中一般標示為4 1 4。干涉儀41 4以干涉儀1 4之操作方式作說明，並建構以量測與監視平面鏡9 2在一方向之線性位移以及平面鏡 92二垂直平面之角度方位。量測光束422、424、426、V. DESCRIPTION OF THE INVENTION (34) The determination of the distances from > 3 and 11⁄2, and the effect of reducing the aperiodic error, are the same as those of the first embodiment of the present invention. A fourth embodiment of the interferometer is shown in a perspective view of Fig. 5a and includes four planar mirror interferometers generally designated 4 1 4 in an integrated optical assembly. The interferometer 41 4 is described in terms of the operation of the interferometer 14 and is constructed to measure and monitor the linear displacement of the plane mirror 92 in one direction and the angular orientation of the plane perpendicular to the plane 92. Measuring beams 422, 424, 426,

1 4 2 2、1 4 2 4以及1 4 2 6之路徑對應於第1圖中以標號2 〇所代表路徑。該四平面鏡干涉儀中的兩者具有一共同量測光束路徑供一次傳遞至平面鏡量測物92，而其餘之二平面鏡干涉儀具有一共同量測光束路徑供一次傳遞至平面鏡量測物 9 2。該共同量測光束路徑對應於量測光束3 2 2以及丨3 2 2之路徑。第四貫施例的許多元件與第一實施例的元件具有相同之功能。在第一、第四實施例中具有相同功能的元件以相差1 0 0的標號表示。The path of 1 4 2 2, 1 4 2 4 and 1 4 2 6 corresponds to the path represented by the number 2 第 in Fig. 1. The four planar mirror interferometers have a common measurement beam path for one pass to the planar mirror measurement 92, while the remaining two planar mirror interferometers have a common measurement beam path for one pass to the planar mirror measurement 9 2 . The common measurement beam path corresponds to the path of the measurement beam 3 2 2 and the 丨 3 2 2 . Many of the elements of the fourth embodiment have the same function as the elements of the first embodiment. The elements having the same function in the first and fourth embodiments are denoted by reference numerals having a difference of 100.

光束12入射於光束分光器介面458且一第一部份被反射而成=一輪入光束4 12在稜鏡4 59反射之後。光束12之一第一刀由光束分光器介面4 5 8傳遞而成為一輸入光束 1412 °輸入光束412入射於光束分光器介面430並離開干涉儀4 14而^成胃為輪出光束460與462。與輸出光束460以及462 、名口否之口亥里剛光束為422、424以及426 〇輸入光束1412入射於光束刀光器介面430並離開干涉儀414而成為輸出光束 1 460與1 462 °與輸出光束1 460及1 4 62結合之該量測光束為Beam 12 is incident on beam splitter interface 458 and a first portion is reflected = a round-in beam 4 12 is reflected after 稜鏡 4 59. One of the first beams of the beam 12 is transmitted by the beam splitter interface 458 to become an input beam 1412. The input beam 412 is incident on the beam splitter interface 430 and exits the interferometer 4 14 to form the stomach as the outgoing beam 460 and 462. . The output beam 1412 is input to the beam cutter interface 430 and exits the interferometer 414 as the output beam 1 460 and 1 462 ° with the output beams 460 and 462, and the input beam 1412, 424, and 426 〇. The output beam 1 460 and 1 4 62 are combined with the measuring beam

1057-5464-PF(Nl).ptd -- 第38頁 1277720 五、發明說明（35) 1422、1424 以及 1426。輸入光束412行進通過干涉儀414而形成量測光束 422、424與426以及輸出光束4 60與462的說明，與該第一實施例中輸入光束1 2行進通過干涉儀11 4而形成量測光束 122、124與126以及輸出光束160與162的說明相同。輸入光束1412行進通過干涉儀414而形成量測光束1 422、1424 與1426以及輸出光束1460與1462的說明，與該第一實施例中輸入光束12行進通過干涉儀114而形成量測光束122、1057-5464-PF(Nl).ptd -- page 38 1277720 V. Description of invention (35) 1422, 1424 and 1426. Input beam 412 travels through interferometer 414 to form measurement beams 422, 424 and 426 and output beams 4 60 and 462, and in this first embodiment input beam 12 travels through interferometer 11 4 to form a measurement beam The descriptions of 122, 124 and 126 and output beams 160 and 162 are the same. Input beam 1412 travels through interferometer 414 to form measurement beams 1 422, 1424 and 1426 and output beams 1460 and 1462, and in this first embodiment input beam 12 travels through interferometer 114 to form measurement beam 122,

124與126以及輸出光束160與162的說明相同。量測光束422以及424與量測軸x4結合，量測光束422以及426與量測軸x4Q結合，而且量測光束1 422以及1 424與量測軸X4㈣結合，而量測光束丨422以及1 426與量測軸x4_結合 (參看第5b圖）。&與\的空間間距為比，而X_Q與心⑽的空間間距為b4G，而x4_與x4Q的空間間距為b_。量測光束422、424、426、1422、1424 以及 1426 的相對位置表示於第5b圖。同樣表示於第5b圖的是量測軸χ4、〜〇、x_以及χ4_，還有量測軸間距b4與、以及b_。124 and 126 and the description of output beams 160 and 162 are the same. The measuring beams 422 and 424 are combined with the measuring axis x4, the measuring beams 422 and 426 are combined with the measuring axis x4Q, and the measuring beams 1 422 and 1 424 are combined with the measuring axis X4 (4), and the measuring beams 422 and 1 are combined. 426 is combined with the measuring axis x4_ (see Figure 5b). & is proportional to the spatial spacing of \, and the spatial spacing between X_Q and heart (10) is b4G, and the spatial spacing between x4_ and x4Q is b_. The relative positions of the measurement beams 422, 424, 426, 1422, 1424, and 1426 are shown in Figure 5b. Also shown in Figure 5b are the measurement axes 4, ~〇, x_, and χ4_, as well as the measured shaft spacings b4 and b_.

平面鏡92三個自由度的變化以及平均斜率係由電子處理器與電腦9 〇使用三個量測到的線性位移以及所量測的性質h與、來計算。一斜率之一平均斜率之變化係用於此而為由一表面之二線性位移之改變的差所決定之該表面的角度方位的變化。該平均斜率之變化係在二量測到的線性位移之變化的平面上。在該第四實施例中，平均斜率之二獨立量測值係由atan[(x4Q〜X4)/b4]以及atan[(x4_—χ_)/The change in the three degrees of freedom of the plane mirror 92 and the average slope are calculated by the electronic processor and the computer 9 using three measured linear displacements and the measured properties h and . The change in the average slope of one of the slopes is used to determine the angular orientation of the surface as determined by the difference in the change in linear displacement of a surface. The change in the average slope is in the plane of the change in the measured linear displacement. In the fourth embodiment, the two independent measurements of the average slope are from atan[(x4Q~X4)/b4] and atan[(x4_-χ_)/

1277720 五、發明說明（36) b40 ]而得。atan[ (x4〇-x4 )/b4 ]以及atan[ (x4_-x4。。）/b40 ]的差係從一超過距離b4QQ的平面量測出平面鏡92的偏移表面 (departure surface)。平均斜率量測的差值可以被使用，例如在繪製一裝設在微影工具之平台上的平面鏡物體的過程中，如美國專利申請案60/371, 172號於2002年4月9 曰提中之「Method and Apparatus For Stage Mirror Mapping」Henry Allen Hill(Z-40 2 )，其内容於此併入做為參考。額外之實施例更將上述之任何干涉儀系統彼此作合併以提供額外之量測軸。例如，一四軸及三軸干涉儀次總成’與第1 0圖所示者相似，可重疊於一整合光學總成以提供7個量測軸，如第11圖所示。第丨丨圖中之實施例包括許多與第1 0圖之實施例共同的元件，包括極化光束分光器介面2 30 ’量測四分之一波長板232，參考四分之一波長板 2 34 ’參考平面鏡294，阻滯板1 23 2，回溯反射器1 250，非極化光束分光器介面2252與3252，以及平面1254與1256。參照第1 1圖，一輸入光束丨丨〇丨（如第1圖中光源丨〇所產f者）入射一輪入光束分光器總成1 1 0 2，該輸入光束分光=總成11 0 2包括非極化分光器總成丨丨〇 3。該輸入光束分，器總成將輸入光束分成二道次要輸入光束1104及1105。次要輸光束11 〇4對應於第1〇圖之實施例中的輸入光束 12 ’並订經該干涉儀產生輸出光束1264、1266、2264以及 2 2 6 6如第1 0圖之實施例的狀態。次要輸入光束11 〇 5與次要輸入光束1104平行行進並位於其下方。次要輸入光束1277720 V. Invention description (36) b40]. The difference between atan[(x4〇-x4)/b4] and atan[(x4_-x4..)/b40] is the departure surface of the plane mirror 92 from a plane exceeding the distance b4QQ. The difference in the average slope measurement can be used, for example, in the process of drawing a mirror object mounted on a platform of a lithography tool, as described in U.S. Patent Application Serial No. 60/371, No. 172, issued Apr. "Method and Apparatus For Stage Mirror Mapping", Henry Allen Hill (Z-40 2), the contents of which are incorporated herein by reference. The additional embodiment further combines any of the interferometer systems described above to provide an additional measurement axis. For example, a four-axis and three-axis interferometer sub-assembly' similar to that shown in Figure 10 can be overlaid on an integrated optical assembly to provide seven measuring axes, as shown in Figure 11. The embodiment in the figure includes a number of elements in common with the embodiment of FIG. 10, including a polarized beam splitter interface 2 30 'measuring a quarter wave plate 232, reference to a quarter wave plate 2 34' reference plane mirror 294, blocker plate 1 23 2, retroreflector 1 250, non-polarized beam splitter interfaces 2252 and 3252, and planes 1254 and 1256. Referring to Figure 11, an input beam 丨丨〇丨 (such as the one produced by the source 第 in Fig. 1) is incident on a round-in beam splitter assembly 1 1 0 2, the input beam splitting = assembly 11 0 2 Includes a non-polarized beam splitter assembly 丨丨〇3. The input beam splitter assembly splits the input beam into two secondary input beams 1104 and 1105. The secondary beam 11 〇 4 corresponds to the input beam 12 ′ in the embodiment of the first drawing and is ordered by the interferometer to produce output beams 1264, 1266, 2264 and 2 2 6 6 as in the embodiment of FIG. status. The secondary input beam 11 〇 5 travels parallel to and below the secondary input beam 1104. Secondary input beam

12777201277720

110 5及其各分量在該干涉儀中行進，與次要輸入光束11〇4 相似，並產生輸出光束1266，、226 4，以及2266，。為產生如此之輸出光束，該實施例更包括平面鏡丨254，，非極化分光器介面2252’以及一第二回溯反射器1 250，。在此特別的實施例中，輸出光束之量測光束分量1264、1266、2264 以及2266接觸於與對應於輸出光束1266，、2264，以及 2266,之量測光束分量所接觸不同的之平面鏡量測物。而110 5 and its components travel in the interferometer, similar to the secondary input beam 11 〇 4, and produce output beams 1266, 226 4, and 2266. To produce such an output beam, the embodiment further includes a planar mirror 254, a non-polarized beam splitter interface 2252', and a second retroreflector 1 250. In this particular embodiment, the measured beam components 1264, 1266, 2264, and 2266 of the output beam are in contact with a planar mirror measurement that is different from the contact of the measured beam components corresponding to the output beams 1266, 2264, and 2266. Things. and

且，於此特殊之實施例中，一得自次要輸入光束11 〇 5之第四輸出光束是不必要的，因此光束分光介面22 5 2,之右部分僅為一平面鏡。再參照第11圖，該實施例更表示背板233，用於將四分之一波長板232固定在對應於介面230之極化光束分光器光學系，當不同的分量整合入一單一干涉儀總成時。該實施例更表示出極化洩漏過濾器11 0 7，該極化洩漏過濾器 11 0 7包括一對楔形物，其中之一為雙折射。極化洩漏過濾裔導入'微小差異於次要輸入光束之垂直極化分量間的行Moreover, in this particular embodiment, a fourth output beam from the secondary input beam 11 〇 5 is unnecessary, so that the right portion of the beam splitting interface 22 5 2 is only a plane mirror. Referring again to Figure 11, this embodiment further shows a backing plate 233 for securing the quarter-wave plate 232 to the optical beam splitter optical system corresponding to the interface 230, when different components are integrated into a single interferometer. When the assembly is completed. This embodiment further shows a polarization leak filter 117, which includes a pair of wedges, one of which is birefringent. Polarization Leakage Filtering introduces a small difference between the vertical polarization components of the secondary input beam

進方向，當該輸出光束通過該極化洩漏過濾器時該微小差異被大大地補償。該極化洩漏過濾器可降低由極化混合 (polarization mixing)所造成的週期誤差以及由干涉儀光學系的瑕疵所造成的其他效應。該極化洩漏過濾器之In the forward direction, this slight difference is greatly compensated when the output beam passes through the polarization leak filter. The polarization leak filter reduces the periodic error caused by polarization mixing and other effects caused by the ripple of the interferometer optical system. Polarized leak filter

實施例可更詳細地說明於美國專利申請案10/174, 149 rINTERFEROMETRY SYSTEM AND METHOD EMPLOYING AN ANGULAR DIFFERENCE IN PROPAGATION BETWEENThe examples can be described in more detail in U.S. Patent Application Serial No. 10/174, 149 rINTERFEROMETRY SYSTEM AND METHOD EMPLOYING AN ANGULAR DIFFERENCE IN PROPAGATION BETWEEN

ORTHOGONALLY POLARIZED INPUT BEAM COMPONENTSORTHOGONALLY POLARIZED INPUT BEAM COMPONENTS

1057-5464-PF(Nl).ptd 第41頁 1277720 五、發明說明（38)1057-5464-PF(Nl).ptd Page 41 1277720 V. Description of invention (38)

Peter J· de Groot et a 1 ·於2〇〇2 年6 月 1 7 日提申，其内容於此合併作為參考。Peter J. de Groot et a 1 · was submitted on June 17th, 2nd, and its contents are incorporated by reference.

於上述之實施例中的每一輸出光束包括有關於相對於一特殊量測軸至量測物距離之變化的資訊。如上所述，有關於該量測物之角度方位的變化之資訊可由量測物至兩相異量測軸之距離來計算。在下述附加的實施例中，該多軸干涉儀可產生一或多道輪出光束直接量測量測物之光學方位的變化。在此實施例中，該「角度量測」輸出光束包括一分ΐ於彼此分開的點上接觸於該量測物。得出之干涉訊號對應於一光學差（optical difference)，該光學差代表量測物相對於一特殊旋轉軸的角度方位變化。X實:例可包括量測相對於一或多個不同旋轉軸之角度方之變化的干涉儀。而且’此干涉儀可更包括輸出光束沿一或多個量測轴量測至該量測物之距離的變化。Each of the output beams in the above embodiments includes information regarding changes in the distance from the measuring axis to the measuring object. As described above, information about the change in the angular orientation of the measurement can be calculated from the distance from the measurement object to the two different measurement axes. In an additional embodiment described below, the multi-axis interferometer can produce one or more rounds of beam direct measurements of the optical position of the object. In this embodiment, the "angle measurement" output beam includes a point that is in contact with the measurement at a point that is separated from each other. The resulting interference signal corresponds to an optical difference that represents the angular orientation of the measured object relative to a particular axis of rotation. X Reality: An example may include an interferometer that measures changes in angular orientation relative to one or more different axes of rotation. Moreover, the interferometer can further include a change in the distance that the output beam is measured along the one or more measuring axes to the measuring object.

參照第12a-e圖，一多軸干涉儀之實施例包括一高穩定度平面鏡干涉儀（HSPMI )以及一角位移干涉儀。該心 HSPMI以及該角位移干涉儀共用某些共同之光學元件。該 HSPMI以示意圖表示於第12b圖，而該角位移干涉儀以示"音圖表示於第12c圖。該HSPMI產生一第一輸出光束127/包二有關沿一第一量測軸至一平面鏡量測物128〇之距離變化資訊，而該角位移干涉儀產生一第二「角量測 1 273包括有關該平面鏡量測物相對於一第一旋方位變化。付平J月度參照第1 2 a圖光源11 〇產生輸入光束11 2 (如上所述Referring to Figures 12a-e, an embodiment of a multi-axis interferometer includes a high stability planar mirror interferometer (HSPMI) and an angular displacement interferometer. The heart HSPMI and the angular displacement interferometer share some common optical components. The HSPMI is shown schematically in Figure 12b, and the angular displacement interferometer is shown in Figure 12c. The HSPMI generates a first output beam 127/packet 2 relating to distance change information along a first measuring axis to a plane mirror measuring object 128〇, and the angular displacement interferometer generates a second "angular measurement 1 273" The plane mirror measurement changes with respect to a first rotation direction. The flattening J month generates an input beam 11 2 with reference to the light source 11 第 (described above).

1057-5464-PF(Nl).ptd 第42頁 1277720 五、發明說明（39) 參考第1圖）並引導至極化光束分光器1281，該極化光束分光器1281將輸入光束112分成光束1291與1292。光束 1291可被視為一「主要」量測光束，而光束1292可被視為一主要參考光束。該主要量測光束由極化光束分光器傳遞，由一平面鏡量測物1 2 8 0所反射，然後返回該極化光束分光器在兩次通過一四分之一波阻滯板1 282之後，四分之一波阻滯板1282 將其線性極化旋轉90度。由於二次通過，該極化光束分光器將主要量測光束反射向返回光束總成1 285。該主要參考光束由極化光束分光器所反射，由一平面鏡參考物1 283所反射，然後返回該極化光束分光器在兩次通過一四分之一波阻滞板1 284之後，四分之一波阻滞板1 284將其線性極化旋轉90度。由於二次通過，該極化光束分光器傳遞該主要參考光束。而且，將該主要量測光束與該主要參考光束合併而定義出一中介光束1290。返回光束總成1 285包括一非極化光束分光器1 286，該非極化光束分光器1 286將該中介光束分成多道光束包括光束1 29 3以及光束12 94。光束1293由光束分光器1286傳遞，然後由回潮反射器1 2 8 7導回極化光束分光器1 2 81 ’而光束 1 2 94由光束分光器1 286反射，由五稜鏡1 288導向極化光束分光器1 2 8 1，然後由半波阻滯板1 2 8 9在到達極化光束分光器之前做傳遞。該半波阻滞板設置以旋轉光束1 294中之量測與參考分量的線性極性9 0度。光束1 2 9 3對應於該等距離量測輸出光束1 2 7 2之分量中1057-5464-PF(Nl).ptd Page 42 1277720 V. Description of the Invention (39) Referring to Figure 1) and directed to a polarizing beam splitter 1281, the polarizing beam splitter 1281 splits the input beam 112 into beams 1291 and 1292. Beam 1291 can be viewed as a "primary" measurement beam, while beam 1292 can be considered a primary reference beam. The main measuring beam is transmitted by the polarizing beam splitter, reflected by a plane mirror measuring object 1 2 80, and then returned to the polarizing beam beam splitter after passing through a quarter wave blocking plate 1 282 twice. The quarter-wave blocker 1282 rotates its linear polarization by 90 degrees. Due to the secondary pass, the polarized beam splitter reflects the primary measuring beam toward the return beam assembly 1 285. The primary reference beam is reflected by the polarized beam splitter, reflected by a mirror reference 1 283, and then returned to the polarized beam splitter after passing through a quarter-wave retarder plate 1 284 twice. One of the wave blockers 1 284 rotates its linear polarization by 90 degrees. The polarized beam splitter transmits the primary reference beam due to the second pass. Moreover, the primary measuring beam is combined with the primary reference beam to define an intermediate beam 1290. The return beam assembly 1 285 includes a non-polarized beam splitter 1 286 that splits the intermediate beam into a plurality of beams including a beam 1 29 3 and a beam 12 94. The beam 1293 is transmitted by the beam splitter 1286, which is then guided back to the polarized beam splitter 1 2 81 ' by the resurgence reflector 1 2 8 7 and the beam 1 2 94 is reflected by the beam splitter 1 286, guided by the polarization of 5 稜鏡 1 288 The beam splitter 1 2 8 1 is then passed by the half-wave blocker 1 2 8 9 before reaching the polarized beam splitter. The half-wave blocker is arranged to measure the linear polarity of the reference component by 90 degrees in the rotating beam 1 294. The beam 1 2 9 3 corresponds to the component of the equal-distance measurement output beam 1 2 7 2

1057-5464-PF(Nl).ptd 第43頁 1277720 五、發明說明（40) 之一，而且該極化光束分光器將其一第一部份反射向該平面鏡量測物以定義一次要量測光束丨2 9 5，並將其一第二部份傳遞至該平面鏡參考物以定義一次要參考光束1296。光束1 2 9 5及1 2 9 6分別從其平面鏡反射，二次通過個別之四分之一波阻滯板，並由極化光束分光器做再合併以形成距離量測輸出光束1 272。特別地，該次要量測光束1 295係得自主要量測光束1291 ,而該次要參考光束1 296係得自主要參考光束1 2 9 2。因此，距離量測輸出光束丨2 7 2之量測光束分量接觸於該量測物兩次，第一次係沿由主要量測光束所^ 義之一共同路徑，而第二次係由該次要量測光束所定義之一相異的路徑。距離量測輸出光束之量測與參考分量的垂直極化係由極化器1 274所混合，而得出之光束的強度係由感測器1 275所量測。第12b圖表示構成HSPMI並產生距離息測輸出光束之干涉儀的部分。 | 光束1 294對應於角度量測輸出光束1 273之該等分量其中之一，而且該極化光束分光器將其一第一部份反射向^ 平面鏡量測物以定義另一次要量測光束丨2 9 7，並將其一 ^ 二部份傳遞至該平面鏡參考物以定義一次要參考光束 1 298。光束1 297及1 298分別從其平面鏡反射，二次通過個別之四分之一波阻滯板，並由極化光束分光器做再合併以形成角度ΐ測輸出光束1 2 7 3。特別地，藉由半波阻滯板 1 2 8 9的極化旋轉作用，該次要量測光束1 2 9 7係得自主要表考光束1 2 9 2，而該次要參考光束丨2 9 8係得自主要量測光束 1 2 9 1。因此，角度量測輸出光束1 2 7 3之一第一分量沿—u1057-5464-PF(Nl).ptd p.43 1277720 V. One of the invention descriptions (40), and the polarized beam splitter reflects a first portion thereof toward the plane mirror to define a primary quantity The beam 丨 2 9 5 is transmitted and a second portion thereof is passed to the mirror reference to define a reference beam 1296. The beams 1 2 9 5 and 1 2 9 6 are respectively reflected from their plane mirrors, passed through individual quarter-wave blockers, and recombined by a polarizing beam splitter to form a distance measuring output beam 1 272. In particular, the secondary measuring beam 1 295 is derived from the primary measuring beam 1291, and the secondary reference beam 1 296 is derived from the primary reference beam 1 2 9 2 . Therefore, the measured beam component of the distance measuring output beam 丨2 7 2 is in contact with the measuring object twice, the first time is a common path determined by the main measuring beam, and the second time is the second time To measure a different path defined by the beam. The measurement of the measured output beam and the vertical polarization of the reference component are mixed by the polarizer 1 274, and the intensity of the resulting beam is measured by the sensor 1 275. Figure 12b shows the portion of the interferometer that forms the HSPMI and produces a distance-received output beam. The beam 1 294 corresponds to one of the components of the output beam 1 273, and the polarized beam splitter reflects a first portion thereof toward the plane mirror to define another secondary beam.丨 2 9 7 and pass one of the two parts to the mirror reference to define the reference beam 1 298. Beams 1 297 and 1 298 are respectively reflected from their plane mirrors, passed through a respective quarter-wave blocker, and recombined by a polarized beam splitter to form an angled output beam 1 2 7 3 . In particular, by the polarization rotation of the half-wave retarding plate 1 28 9 , the secondary measuring beam 1 2 9 7 is obtained from the main test beam 1 2 9 2 , and the secondary reference beam 丨 2 The 9 8 series is derived from the main measuring beam 1 2 9 1 . Therefore, the angle measurement output beam 1 2 7 3 one of the first component along the -u

1057-5464-PF(Nl).ptd 第44頁 1277720 五、發明說明（41) 同路徑接觸於該量測物一次當作主要量測光束的一部份然後接觸於參考物一次當作次要參考光束1298的一部份，角度量測輸出光束1 2 7 3之一第二分量接觸於該參考物當作主要參考光束的一部份然後沿與該共同路徑相異之一路竟接觸於量測物一次當作次要量測光束1 2 9 7的一部份。角度量測輸出光束之量測與參考分量的垂直極化係由極化器丨276 所混合，而得出之光束的強度係由感測器丨2 7 7所量測。第 I 2 c圖表示構成角位移干涉儀並產生角度量測輸出光束之干涉儀的部分。該角度位移干涉儀使角度量測輸出光束丨2 7 3的分量，在平面鏡量測物於第12a及12c圖的平面有一角度方位變化心時’產生一相對相位差。相對相位差^以及角度變化02的關係式如下： ^2 = k2n2b2 θ2 (1) 其中’ h為光束彼此之間，於量測物上（參照第1 2 a以及12c圖）平面鏡的距離，波數匕=2 7Γ / λ2，又2為輸入光束 II 2的波長，^為參考光束以及量測光束路徑中的氣體的折射率。光束光點在平面鏡量測物1 2 8 0上的的配置如第1 2 d圖所顯示的。該等光點呈一直線排列，沿直線位移量測光束干涉儀的量測軸，平行於角度位移量測干涉儀的參考光束以及量測光束。由於第丨2a圖中實施例所表示的該干涉儀總f為一非限制性的例子，其位移等於該直線位移干涉儀的量測光束於平面鏡的間隔的1 · 5倍。1057-5464-PF(Nl).ptd Page 44 1277720 V. INSTRUCTIONS (41) The same path is in contact with the measurement object as part of the main measurement beam and then contacted with the reference material once as a secondary A portion of the reference beam 1298, the second component of the angular measurement output beam 1 2 7 3 is in contact with the reference object as part of the primary reference beam and then contacted by a path different from the common path The measuring object is once used as a part of the secondary measuring beam 1 2 9 7 . The vertical polarization of the measured output beam and the reference component is mixed by the polarizer 丨276, and the intensity of the resulting beam is measured by the sensor 丨277. The Fig. 2 2 c diagram shows the portion of the interferometer that forms the angular displacement interferometer and produces an angular measurement output beam. The angular displacement interferometer causes the angular measurement of the output beam 丨 2 7 3 component to produce a relative phase difference when the planar mirror measurement object has an angular orientation change in the planes of the 12a and 12c maps. The relationship between the relative phase difference ^ and the angle change 02 is as follows: ^2 = k2n2b2 θ2 (1) where 'h is the distance between the beams, on the measuring object (refer to the 1 2 a and 12c) plane mirror, wave The number 匕 = 2 7 Γ / λ 2, and 2 is the wavelength of the input beam II 2, which is the reference beam and the refractive index of the gas in the path of the measuring beam. The configuration of the beam spot on the plane mirror measurement 1 28 is as shown in Figure 1 2 d. The spots are arranged in a line, measuring the axis of the beam interferometer along a linear displacement, measuring the reference beam of the interferometer and the measuring beam parallel to the angular displacement. Since the interferometer total f represented by the embodiment in Fig. 2a is a non-limiting example, the displacement is equal to 1.5 times the interval of the measuring beam of the linear displacement interferometer at the plane mirror.

1057-5464-PF(Nl).ptd 第45頁 1277720 五、發明說明（42) 利用面鏡以及五角稜鏡1288而作用的非極化光束分光器1286具有一單一反射表面（在第i2c圖以R表示）的影像反1057-5464-PF(Nl).ptd Page 45 1277720 V. INSTRUCTIONS (42) A non-polarized beam splitter 1286 that utilizes a mirror and a pentagonal 稜鏡 1288 has a single reflective surface (in the i2c diagram R indicates) the image is reversed

轉特性。因此，第1 2a圖中的該角度位移干涉儀被配置為該角度量測輸出光束的分量，以彼此平行的方式傳遞。此外’其被配置為，該角度量測輸出光線分量間於該角度位移干涉儀以及偵測器1 2 9 4或是光纖讀取頭的光束剪變可以被減小。如上所述，該相對光束剪變等於為/办’2 ，其中α 2表示平面鏡量測物於第1 2a圖平面的角度方位變化，丨2是角度量測光束從該平面鏡量測物至極化光束分光器1281的物理長度的變化，而A表示干涉儀中玻璃的折射率。該長度b獨立於平面鏡量測物的直線位移。同樣的，第丨2 a圖中的该角度位移干涉儀被配置為，不同的輸出光束分量在玻璃中的路徑將會相同，其中，該角度位移干涉儀對其本身的溫度變化不敏感。該角度位移干涉儀更被配置為，不同的輸出光束分量在氣體中的路徑長度將會相等，其中該角度位移干涉儀對環境中的空氣密度變化不敏感。Transfer characteristics. Thus, the angular displacement interferometer of Figure 12a is configured to measure the components of the output beam at the angles and to transmit in parallel with each other. Further, it is configured such that the beam clipping of the angular measurement output light component between the angular displacement interferometer and the detector 1294 or the fiber read head can be reduced. As described above, the relative beam shear is equal to /2, where α 2 represents the angular orientation change of the plane mirror in the plane of the 1 2a plane, and 丨 2 is the angle measuring beam from the plane mirror to the polarization The change in the physical length of the beam splitter 1281, and A represents the refractive index of the glass in the interferometer. This length b is independent of the linear displacement of the plane mirror measurement. Similarly, the angular displacement interferometer of Fig. 2a is configured such that the path of the different output beam components will be the same in the glass, wherein the angular displacement interferometer is insensitive to temperature variations of its own body. The angular displacement interferometer is further configured such that the path lengths of the different output beam components will be equal in the gas, wherein the angular displacement interferometer is insensitive to changes in air density in the environment.

第1 2a圖中的實施例的優點在於，用於量測角度位移的光束僅經過該平面鏡量測物一次。該角度位移干涉儀的單一經過配置可減少光源的設置數，而防止週期性的非線性的產生。然而，其亦可被設計為該量測光束以及該參光束多次經過該平面鏡量測物。第12a圖中的實施例的另一優點在於，該直出光束以及該角度位移輸出光束在平面鏡量測物具有相别同An advantage of the embodiment in Fig. 12a is that the beam for measuring the angular displacement passes only once through the plane mirror. The single configuration of the angular displacement interferometer reduces the number of light source settings and prevents periodic non-linear generation. However, it can also be designed such that the measuring beam and the reference beam pass through the plane mirror multiple times. Another advantage of the embodiment of Figure 12a is that the straight beam and the angularly displaced output beam are identical in the plane mirror measurements.

1277720 五、發明說明（43) 的量測光束路徑。此路徑對應於輸入光束112之分量，該輸入光束112之分量由極化光束分光器所傳遞而成為主要量測光束1291。第12a圖中的實施例的另一優點在於，光束於平面鏡量測物的位置’不會因為量測物的角度方位變化而剪變。這是由於該角度量測輸出光束中的每一分量僅接觸該平面鏡量測物一次。該非極化光束分光器使用一面鏡以及該五角稜鏡（第 12c圖中的R)具有單一反射表面的影像反轉特性。利用非極化光束分光器以及該五角稜鏡將反射光結合（第i 2c圖中的R) ’亦會產生多重反射表面反射器（如第12e圖所顯示）的影像反轉特性。第1 2e圖所示的反射器可以被換成反射器R，其有一琢面可當作非極化光束分光器。另一貫施例可包括返還光束組中的反射表面的結合，以提供單一反射表面的影像反轉特性。一般而言，設置反射表面反射主要光束的角度量測分量，如此入射光束以及反射光束之間於每一個反射表面的角度總和為零，或是 3 6 0度的整數倍，其中，每個角度皆從入射光束被量到反射光束，並為正值，以逆時鐘的方式量測，若以順時鐘的方向量測則會得到一負值。在許多實施例中，具有奇數次來自在一共同平面上具數條法線之表面的反射。第13a、13b以及1 3c圖顯示本發明的另一種實施例。該實施例相似於第12a圖的實施例，其包括一直線位移干涉儀（例如HSPMI )以及一角度位移干涉儀。然而，在此 1277720 五、發明說明（44) 實施例中’直線位移干涉儀的量測光束平面以及角度位移干涉儀的量測光束平面是相互正交的。第1 3a以及1 3b圖的平面互相平行並彼此間距b3的距離，如第1 3c圖所顯示的。第1 3 c圖描繪出該干涉儀從側面觀之的示意圖。該干涉儀的許多元件與第1 2a圖中實施例的元件相應。該第13a〜13c圖中的直線位移干涉儀為如第i2a圖中的HSPMI。由該HSPMI的該參考光束以及該量測光束所定義的平面位於第13a圖的平面上。此實施例（第1 3 a〜1 3 c圖）中角位移干涉儀之操作與第12a圖之實施例相同，產生一中介光束1290。該中介光束之後續操作中，非極化光束分光器1 386取代光束分光器 1286，而五角稜鏡1388取代五角稜鏡1288。同樣地，極化光束分光器1381取代極化光束分光器1281。參照第13a〜13c圖，光束***器1 386接受中介光束 1290，並將其一部份自第13a圖的平面反射，於此其被五角稜鏡1 3 8 8，經過半波阻滯板1 3 8 9，反射回第1 3 b圖平面的極化光束分光器1381，成為光束1394。在第i2a圖的實施例中，該半波阻滯板將光束1 394的分量的線性偏振旋轉 90度。光束1394對應於角度量測輸出光束1373之該等分量其中之一，而且該極化光束分光器將其一第一部份反射向該平面鏡量測物以定義另一次要量測光束1 3 9 7，並將其一第二部份傳遞至該平面鏡參考物以定義一次要參考光束 1398。光束1397及1398分別從其平面鏡反射，二次通過個1277720 V. Measurement beam path for invention (43). This path corresponds to the component of the input beam 112, the component of which is transmitted by the polarizing beam splitter as the primary measuring beam 1291. Another advantage of the embodiment of Fig. 12a is that the position ' of the beam at the plane mirror is not sheared by the angular orientation of the measurement. This is because the angle measures each component of the output beam to only contact the plane measurement once. The non-polarized beam splitter uses a mirror and the image inversion characteristic of the pentagonal ridge (R in Fig. 12c) having a single reflecting surface. The combination of the non-polarized beam splitter and the pentagonal ridge to combine the reflected light (R in the second image) also produces image reversal characteristics of the multiple reflective surface reflector (as shown in Figure 12e). The reflector shown in Fig. 1 2e can be replaced by a reflector R having a facet as a non-polarized beam splitter. A further embodiment may include a combination of reflective surfaces in the returned beam set to provide image reversal characteristics of the single reflective surface. Generally, the reflective surface is arranged to reflect the angular measurement component of the main beam, such that the sum of the angles between the incident beam and the reflected beam at each of the reflective surfaces is zero, or an integral multiple of 366 degrees, wherein each angle Both are measured from the incident beam to the reflected beam and are positively measured in a counterclockwise manner. If measured in a clockwise direction, a negative value is obtained. In many embodiments, there are odd times of reflections from surfaces having a plurality of normals on a common plane. Figures 13a, 13b and 13c show another embodiment of the invention. This embodiment is similar to the embodiment of Figure 12a, which includes a linear displacement interferometer (e.g., HSPMI) and an angular displacement interferometer. However, here, in the embodiment of the invention, the measuring beam plane of the linear displacement interferometer and the measuring beam plane of the angular displacement interferometer are mutually orthogonal. The planes of Figures 1 3a and 13b are parallel to each other and spaced apart from each other by a distance b3, as shown in Figure 13C. Figure 13c depicts a schematic view of the interferometer from the side. Many of the elements of the interferometer correspond to the elements of the embodiment of Figure 12a. The linear displacement interferometer in Figs. 13a to 13c is HSPMI as in the i2a diagram. The reference beam defined by the HSPMI and the plane defined by the measuring beam are located on the plane of Fig. 13a. The angular displacement interferometer of this embodiment (Fig. 1 3 a~1 3 c) operates in the same manner as the embodiment of Fig. 12a, producing an intermediate beam 1290. In the subsequent operation of the intermediate beam, the non-polarized beam splitter 1 386 replaces the beam splitter 1286, and the pentagonal 稜鏡 1388 replaces the pentagonal 稜鏡 1288. Similarly, the polarized beam splitter 1381 replaces the polarized beam splitter 1281. Referring to Figures 13a-13c, the beam splitter 1 386 receives the intermediate beam 1290 and reflects a portion thereof from the plane of Fig. 13a, where it is subjected to a pentagonal 稜鏡1 3 8 8 through a half-wave retarding plate 1 3 8 9, reflected to the polarized beam splitter 1381 of the 1 3 b plane, becomes the beam 1394. In the embodiment of Figure i2a, the half-wave blocker rotates the linear polarization of the component of beam 1 394 by 90 degrees. The beam 1394 corresponds to one of the components of the angular measurement output beam 1373, and the polarized beam splitter reflects a first portion thereof toward the planar mirror measurement to define another secondary measurement beam 1 3 9 7. Pass a second portion thereof to the mirror reference to define a reference beam 1398. Beams 1397 and 1398 are reflected from their plane mirrors, respectively

1057-5464-PF(Nl).ptd 第48頁 1277720 五、發明說明（45) ' ----- 别之四刀之波阻滯板，並由極化光束分光器做再合併以輸出光束1373。特別地，藉由半波阻滯板、疋轉作用’該次要量測光束1 397係得自主要參 2束1 392，而該次要參考光束1 398係得自主要量測光束 ’角度量測輸出光束1 373之一第一分量产一丘 ;路徑接觸於該量測物-次當作主要量測光束的一；份;; ;接觸於參考物-次當作次要參考光束1398的一部：角 ΪΐΐΪΐί束1 373之一第二分量接觸於該參考物當作主觸；量測物一：ΪΠ:與該共同路徑相異之一路竟接測輸出光走之=§ 束1 397的一部份。角度量新π /里測與參考分量的垂直極化係由極化器1 376 此:，而彳于出之光束的強度係由感測器1 3 7 7所量測。 & & ΐ角度位移干涉儀，當平面鏡量測物於第1 3b圖平面、^ :方位轉動θ3時，於角度量測輸出光束1 373的分量之 θ Μ ^ I &相對相位移…。相對相位移…以及角度變化以3的關係如下： ^3 = k3n3b3 θ3 ⑺ Μ ^中14是參考光束以及量測光束之間的距離（參照第代二tk3 = 2 “ λ3 ’ λ3代表輪人光束112的波長，n3 代表f:光束以及量測光束路徑中的氣體折射率。 _光束光點於平面鏡量測物的位置配置如第13d圖所顯不的:第13a〜13c圖的實施例具有如上所述的優點。第1 4a圖代表本發明的另—實施例。此實施例相較於第12a圖的實施例更增加了一補償元件以，以及一半波阻1057-5464-PF(Nl).ptd Page 48 1277720 V. Description of invention (45) ' ----- Four wave-blocking plates, and recombined by polarized beam splitters to output beams 1373. In particular, the secondary measurement beam 1 397 is derived from the primary reference beam 2 392 by a half-wave retarding plate, and the secondary reference beam 1 398 is derived from the primary measurement beam 'angle Measuring one of the first components of the output beam 1 373 to produce a hill; the path is in contact with the measuring object - the first time is regarded as one of the main measuring beams; the; is in contact with the reference - the secondary reference beam One part of 1398: one of the corners ί bundle 1 373 is in contact with the reference object as the main touch; the measurement object one: ΪΠ: one road different from the common path is connected to the measured output light = § bundle Part of 1 397. The amount of angle The vertical polarization of the new π / 里 and reference components is determined by the polarizer 1 376. The intensity of the beam emerging from the beam is measured by the sensor 1 37 7 . && ΐ angular displacement interferometer, when the plane mirror measuring object in the 1st 3b plane, ^: azimuth rotation θ3, the angle of the output beam 1 373 is measured θ Μ ^ I & relative phase shift... . The relative phase shift... and the angular change by 3 are as follows: ^3 = k3n3b3 θ3 (7) Μ ^ 14 is the distance between the reference beam and the measuring beam (refer to the first generation two tk3 = 2 " λ3 ' λ3 represents the wheel beam The wavelength of 112, n3 represents f: the beam and the refractive index of the gas in the path of the measuring beam. The positional arrangement of the beam spot on the plane mirror is as shown in Fig. 13d: the embodiment of Figures 13a to 13c has Advantages as described above. Figure 14a represents another embodiment of the present invention. This embodiment adds a compensating element and a half-wave resistance as compared to the embodiment of Figure 12a.

l〇57-5464.PF(Nl).ptd 第49頁 1277720 五、發明說明（46) 濟Ϊ1山48丄9，該半波阻滞板1489在補償元件U先接受距離量例並具有相同之參考^儀之許夕兀件與第㈣之實施移干：ί ΐ 了要進一步減少或是去除該角度位移干涉儀的輸出光束中之’該參考分量以及該量測分量之間的相對光束剪變。該角度位蔣+ + 、日不力夂^月度位移干涉儀的光束在玻璃中或的路徑長度維持相等。該補償元件使該角度量 ^輸出先束的，等光束分量，從其接觸到該量測物至其被 =化光束分光器結合以產生—角度量測輸出光束的過程中，其經過相等的路徑長度H任何因為角度量測光束從該量測物的非垂直反射所造成的橫向位移，對該角度量測輸出光束的兩個分量而言是相等的。元件C1的二個貫施例如第i4c、I4d以及14e圖所顯示的。忒第14c、14d以及14e圖的平面正交於第Ha圖的平 ^。該角度位移干涉儀的輸出光束的光束分量的不同路徑等於丨2 ，而元件C1中的氣體的折射率等於吣。因此，該角度位移干涉儀的輸出光束的量測光束分量以及參考光束分量之間，沒有相對切變，無論是在干涉儀組或是在偵測器，或是在光纖讀取頭（F0P)。第14c圖顯示了元件C1的實施例，其包括兩個極化光束分光器PBS6以及PBS7，連接於一回溯反射器RR41。第1 4 d圖顯示了元件C1的實施例，其包括一個極化光束分光器PBS8，以及兩個回溯反射器rr42、RR43。第1 4 e圖顯示了元件C1的實施例，其包括一個極化光l〇57-5464.PF(Nl).ptd Page 49 1277720 V. Description of invention (46) Jishang 1 Mountain 48丄9, the half-wave blocker 1489 accepts the distance in the compensation component U and has the same Referring to the implementation of the apparatus and the implementation of the fourth (4): ΐ 要 further reduce or remove the angular displacement of the interferometer's output beam of the reference component and the relative beam shear between the measured components change. The angle of the position of Jiang + +, the day is not 夂 ^ monthly displacement interferometer beam in the glass or path length remains equal. The compensating element causes the angular amount to output a first beam, equal beam component, from which it is contacted to the measuring object until it is combined by the beam splitter to produce an angle-measured output beam, which is equal Path length H Any lateral displacement caused by the angular measurement of the non-perpendicular reflection of the beam from the measurement, which is equal for the two components of the angular measurement output beam. The two passes of element C1 are shown, for example, in Figures i4c, I4d and 14e. The planes of Figures 14c, 14d, and 14e are orthogonal to the plane of the Ha diagram. The different path of the beam component of the output beam of the angular displacement interferometer is equal to 丨2, and the refractive index of the gas in element C1 is equal to 吣. Therefore, there is no relative shear between the measured beam component of the output beam of the angular displacement interferometer and the reference beam component, either in the interferometer group or in the detector, or in the fiber read head (F0P). . Figure 14c shows an embodiment of element C1 comprising two polarized beam splitters PBS6 and PBS7 coupled to a retroreflector RR41. Figure 14 4 shows an embodiment of element C1 comprising a polarized beam splitter PBS8 and two retroreflectors rr42, RR43. Figure 14 e shows an embodiment of element C1 comprising a polarized light

1057-5464-PF(Nl).ptd 第50頁 1277720 五、發明說明（47) 束分光器PBS9，連接於兩個鏡M1、M2，以及1/4波長極化片QW1以及QW2。由從該角度位移干涉儀經過元件C1的輸出光束，所產生的參考光束以及量測光束在玻璃中的路徑的不平衡，可藉由輸入光束的參考光束分量以及量測光束分量在經過元件C1時的光學路徑長度的不同予以補償。第14a圖中的半波片將相應光束的偏振旋轉9 〇度，藉此輸入光束以及輸出光束經過元件C1的通道在玻璃中具有相同的路徑。除了能利用補償元件C1更降低微分切變，第1 4a圖中的實施例亦具有如上所述的優點。在更進一步的實施例中，一個或多個補償元件可以不同於第14a圖的方法被應用。例如，補償元件C2以及C3可以如第1 4 b圖的方式設置。在更進一步的實施例中，一個或多個補償元件可以如第1 3a至1 3c圖實施例的類似方式設置’以更進一步的降低或是去除角度量測輸出光束分量間的切變。本發明干涉儀的另一實施例如第1 5a至1 5c圖所顯示的，其結合了第13a至13c圖以及第14a圖中實施例的元件，以產生距離量測輸出光束1 272以及角度量測輸出光束 1 2 73以及1 373。該等角度量測輸出光束量測平面鏡量測物相對於兩個互相垂直的旋轉軸的角度方位變化。為了產生該第三輸出光束，返還光束總成1 5 8 5包括非極化光束分光器1 286與1 386以及五角稜鏡1 288以及1 388。該實施例亦包括補償元件C5以更進一步的降低角度量測輸出光束分量1057-5464-PF(Nl).ptd Page 50 1277720 V. INSTRUCTION DESCRIPTION (47) The beam splitter PBS9 is connected to two mirrors M1, M2, and 1/4 wavelength polarizers QW1 and QW2. From the angular displacement of the interferometer through the output beam of element C1, the resulting reference beam and the path of the measuring beam in the glass are unbalanced by the reference beam component of the input beam and the measured beam component passing through element C1 The difference in optical path length is compensated. The half-wave plate in Fig. 14a rotates the polarization of the corresponding beam by 9 deg., whereby the input beam and the path of the output beam passing through element C1 have the same path in the glass. In addition to being able to reduce the differential shear by the compensating element C1, the embodiment of Fig. 14a also has the advantages described above. In still further embodiments, one or more of the compensation elements can be applied differently than the method of Figure 14a. For example, the compensating elements C2 and C3 can be arranged as in the case of Figure 14b. In still further embodiments, the one or more compensating elements can be set in a similar manner to the embodiment of Figures 13a to 13c to further measure or reduce the shear between the output beam components. Another embodiment of the interferometer of the present invention is shown in Figures 15a to 15c, which combines the elements of the embodiments of Figures 13a to 13c and 14a to produce a distance measuring output beam 1 272 and an angular amount The output beams 1 2 73 and 1 373 are measured. The angular measurement output beam measures the angular orientation of the plane mirror relative to the two mutually perpendicular axes of rotation. To generate the third output beam, the return beam assembly 1 585 includes non-polarized beam splitters 1 286 and 1 386 and pentagonal 稜鏡 1 288 and 1 388. This embodiment also includes compensating element C5 to measure the output beam component at a further reduced angle.

1057-5464-PF(Nl).ptd 第51頁 1277720 五、發明說明（48) 1 2 7 3以及1 3 7 3之間的微分切變。第15a圖顯示該干涉儀於距離量測輸出光束1 272，角 ^ ϊ測輸出光束1 2 7 3以及該用來產生該等輸出光束的分量光束的平面的示意圖。第1 5b圖顯示該干涉儀的側視圖，包括光束1 394，其被***以產生該等第二光束，用以產生第二角度量測輸出光束，輸出光束1373。第15c圖顯示該干涉儀在另一較低的平面上並與第丨5c圖之干涉儀平行的另一側視圖。五角稜鏡1 288的尺寸相應於五角稜鏡1 388的尺寸，因此該光束剪變的比率與相應的該平面鏡量測物的角度位移’對於該等角度位移干涉儀的該等輸出光束分量是相等的。因此，一單一補償器C5(參照第15c圖）可被用於直線位移干涉儀以及角度位移干涉儀。該單一補償器c 5，參照第15c圖，包括極化光束分光sPBS11以及PBS12，以及回溯反射器RR51。光束光點於平面鏡量測物的位置如第丨5d圖所顯示的。除了更進一步的藉由補償元件C5降低微分切變，第 15a至15c圖中的實施例亦具有上述的種種優點。第6圖為一干涉儀系統之示意圖，其中平面鏡量測件 9 2的直線以及角度位移均可被量測。如第6圖所顯示的，該干涉儀系統包括一干涉儀1 4，其可以為上述之任何一種干涉儀，以及一動態光束操控元件，其控制輸入光束丨2 至干涉儀1 4的方向。 ' 改變輸入光束12的目的在於去除或是減少干涉儀“的1057-5464-PF(Nl).ptd Page 51 1277720 V. Description of invention (48) Differential shear between 1 2 7 3 and 1 3 7 3 . Figure 15a shows the interferometer measuring the output beam 1 272 at an angle, the angle of the output beam 1 2 7 3 and the plane of the component beam used to generate the output beams. Figure 15b shows a side view of the interferometer, including a beam 1 394 that is split to produce the second beams for producing a second angular output beam and an output beam 1373. Figure 15c shows another side view of the interferometer in another lower plane parallel to the interferometer of Figure 5c. The size of the pentagonal 稜鏡 1 288 corresponds to the size of the pentagonal 稜鏡 1 388, so the ratio of the beam shear to the corresponding angular displacement of the plane mirror is 'for the output beam components of the angular displacement interferometer equal. Therefore, a single compensator C5 (refer to Fig. 15c) can be used for the linear displacement interferometer and the angular displacement interferometer. The single compensator c 5, referring to Fig. 15c, includes polarized beam splitting sPBS11 and PBS12, and retroreflector RR51. The position of the beam spot on the plane mirror is as shown in Figure 5d. In addition to further reducing the differential shear by compensating element C5, the embodiments of Figures 15a through 15c also have the various advantages described above. Fig. 6 is a schematic diagram of an interferometer system in which the straight line and angular displacement of the plane mirror measuring member 92 can be measured. As shown in Fig. 6, the interferometer system includes an interferometer 14 which can be any of the interferometers described above, and a dynamic beam steering element that controls the direction of the input beam 丨2 to the interferometer 14. 'The purpose of changing the input beam 12 is to remove or reduce the interferometer"

1057-5464-PF(Nl).ptd 12777201057-5464-PF(Nl).ptd 1277720

五、發明說明（49) J:光束的電子干涉訊號的非週期性誤差。非週期性變消除是藉由消除在干涉儀14以及偵測器？〇中的光束剪該干涉儀系統更包括光源10 ’其產生光束112，偵測 =，Γι:?制器94 ’換能器96，以及電子處理器以及電，90。利用母—種干涉儀的種類，接觸鏡輸出光束從干涉儀14射至㈣ :^60。光束112的種類與第1圖中的光束12相同。光束刼控兀件98的旋轉由換能器96控 9由6::”。傳遞，並以-零度的入射角入射 == 議的飼服控制訊細控制。飼服控制訊：，由電子處理器以及電腦9 〇所產生的伺服訊號8 2中得 -回可以為一或兩種模*。-種模式為口饋杈式，其中该動態元件98的旋轉根 :第例；束至鏡92與零度之間的角度：差量。的棘動# π 兮θ ^式八中控制訊號82根據於鏡92 的轉動變化。該1測角度可以完全依據例如，干涉儀14所量測到的鏡92的轉動^化口據於’ 專利=2系二包6括31fQ光束操控元件，亦被討論於美國 : ; 8號專利以及6,271，923號專利 tlon wooo/669 69 -^t^,^ 量測光束於路徑20的方向精確度需要被維持，而不同V. INSTRUCTIONS (49) J: Aperiodic error of the electronic interference signal of the beam. Is the non-periodic variable cancellation eliminated by the interferometer 14 and the detector? Beam Shear in the 该 The interferometer system further includes a light source 10' which produces a beam 112, a detection =, a :ι: controller 94' transducer 96, and an electronic processor and electricity, 90. With the type of the mother-type interferometer, the contact lens output beam is emitted from the interferometer 14 to (4): ^60. The type of the beam 112 is the same as that of the beam 12 in Fig. 1. The rotation of the beam tampering member 98 is controlled by the transducer 96 by 6::", and is incident at a zero-degree incident angle == negotiating control control. Feeding control: The servo signal generated by the processor and the computer 9 - can be one or two modes. The mode is a port feed type, wherein the dynamic root of the dynamic element 98: the first example; the beam to the mirror The angle between 92 and zero: the amount of the ripple. π 兮 θ ^ The control signal 82 of the eighth is changed according to the rotation of the mirror 92. The 1 angle can be measured completely according to, for example, the interferometer 14. The rotation of the mirror 92 is based on the 'patent=2 series two packs of 631fQ beam steering elements, also discussed in the United States:; 8 patent and 6,271,923 patents won wooo/669 69 -^t^,^ The accuracy of the measurement beam in the direction of the path 20 needs to be maintained, but different

1057-5464-PF(Nl).ptd 第53頁 1277720 五、發明說明（50) 於鏡92的角度轉叙士 , ^ 偾銘燧作一批炎動大小。該干涉儀系統14所量測到的直線 ^ aa a 先束挺控兀件於一正交於鏡92反射表斤定義的一點的位移變化。量測光束從該正交線’於方向上偏移ε所產生的誤差可以為(卜CO# & 二A fn-f 1PPb以及誤差〇. lpPb為例’其相應的£可 οηι ^^沾1曰以及^1.0 x 10-5。一般θ的範圍可以為〇. 級’其中0為該鏡92的反射表面相對於該微衫工具度置系統的固定參考結構的轉動。因此，ε相對於Θ的所需要的精確度為3.2%以及1.0%。本發明的此特徵降低了動I、光束操控元件的控制系統的性能需求。這對於前饋系統而言是很重要的。降低對ε的準確度的需求的另一結果為，前饋或是回饋控制糸統的準確性可以簡單的在原處決定。一個校正控制系統的程序的例子為掃瞄鏡92在固定的轉動後，其光束操控元件，方位，並檢測當ε =〇時，在鏡92於固定轉動下的位置丄藉由監測該外差或是電子干涉訊號的大小。將從正交直線位移至該微影工具度量系統的固定參考結構之間的量測變化的轉換因數為c〇s2 0。一般0的範圍為0· 001徑度的數量級。因此，對於轉換因數的ippb以及 0 · 1 ppb ’ =的向應誤差需為$ 5 x 1 〇-7以及$ 5 X 1 0-8。得到在<9中的=貝^所需要運用的轉換因數，是從直線位移量的變化中得到。 ' 第7圖係顯不一干涉儀系統，其平面鏡量測件9 2的直線以及角度位移可被量測及監控。如第7圖所顯示的，該1057-5464-PF(Nl).ptd Page 53 1277720 V. INSTRUCTIONS (50) At the angle of the mirror 92, the recital, ^ 偾明燧 made a batch of inflammatory size. The line measured by the interferometer system 14 is a aa a pre-gated control member that changes in displacement relative to a point defined by the reflection of the mirror 92. The error caused by the measurement beam shifting ε from the orthogonal line 'in the direction can be (Bu# & two Afn-f 1PPb and error 〇. lpPb is an example of 'the corresponding £ οηι ^^ 1曰 and ^1.0 x 10-5. The general range of θ can be 〇. Level ' where 0 is the rotation of the reflective surface of the mirror 92 relative to the fixed reference structure of the micro-tooling system. Therefore, ε is relative to The required accuracy of Θ is 3.2% and 1.0%. This feature of the invention reduces the performance requirements of the control system of the kinetic I, beam steering element. This is important for feedforward systems. Another result of the accuracy requirement is that the accuracy of the feedforward or feedback control system can be easily determined in situ. An example of a program for correcting the control system is the beam manipulation of the scanning mirror 92 after a fixed rotation. Component, orientation, and detection of the position of the mirror 92 under fixed rotation when ε = 丄 by monitoring the heterodyne or the magnitude of the electronic interference signal. The displacement from the orthogonal line to the lithography tool metric system Measurement change between fixed reference structures The conversion factor is c〇s2 0. The range of 0 is generally on the order of 0· 001. Therefore, the response error for the conversion factor ippb and 0 · 1 ppb ' = needs to be $ 5 x 1 〇 -7 and $ 5 X 1 0-8. The conversion factor required to obtain the == in the <9 is obtained from the change of the linear displacement. ' Figure 7 shows the interferometer system, the plane mirror measurement The line and angular displacement of piece 9 2 can be measured and monitored. As shown in Figure 7,

l〇57-5464-PF(Nl).ptd 第54頁 1277720 五、發明說明（51) 干涉儀系統包括控制輸入光束1 2 器7 0的方向。改變輸入光涉儀14的輸出光期性誤差的消除光束剪變，以及該干涉儀系器7 〇，伺服控制腦9 0。利用每一著一光學路徑2〇沿光學路徑6 〇。光束操控元由路徑2 0傳遞， 9 6由伺服控制器 8 6從由電子處理到0 干涉儀1 4以及一動態光束操控元件，以至干涉儀14的方向以及輸出光束6〇至偵測是為了消除干性誤差。非週偵測器7 0中的角度變化。束112，偵測處理器以及電的干涉光束沿至偵測器70，光束1 2相同。，使量測光束鏡92。換能器伺服控制訊號訊號82中得束12以及輸出光束60的方向束的電子干涉訊號的非週期疋藉由消除在干涉儀1 4以及去除偵測器70的入射光束的統更包括光源1 〇，其產生光态9 4 ’換能器g 6，以及電子種干涉儀的種類，接觸鏡92 ’而輸出光束從干涉儀14射光束112的種類與第1圖中的件98的旋轉由換能器96控制並以一零度的入射角入射至 94的伺服控制訊號86控制。以及電腦9 〇所產生的伺服差態第7圖中的該干涉儀系統 ε以及轉換因數與第6圖中光束操控系統相同。以及動態光束操控系統，誤相應的§亥干涉儀系統以及動在上述的干涉儀系統中干涉儀組。該平面鏡參考件份’例如在一微分平面鏡干涉儀可包括額外的光懸儀器，該平面鏡參考件可整合於該可以為一第二量測件的一部 /y儀中在此貫施例中，該干，用以將光束耦合至該第二量l〇57-5464-PF(Nl).ptd Page 54 1277720 V. INSTRUCTIONS (51) The interferometer system includes a direction to control the input beam 1 2 . The output optical period error of the input optical instrument 14 is eliminated. The beam shearing, and the interferometer system 7 〇, servo control the brain 90. With each optical path 2 沿 along the optical path 6 〇. The beam steering element is passed by path 20, 96 is processed by the servo controller 86 from the electronic processing to the 0 interferometer 14 and a dynamic beam steering element, to the direction of the interferometer 14 and the output beam 6〇 to the detection is for Eliminate dry errors. The angle change in the non-circumference detector 70. The beam 112, the detection processor and the electrical interference beam are directed to the detector 70, and the beam 12 is identical. , the beam mirror 92 is measured. The non-period of the electronic interference signal of the beam 12 and the direction beam of the output beam 60 in the transducer servo control signal signal 82 is eliminated by eliminating the incident beam of the interferometer 14 and the detector 70. That is, it produces the state of light 9 4 'transducer g 6, and the type of electron interferometer, contact lens 92' and the output beam from the interferometer 14 beam 112 and the rotation of the piece 98 in Fig. 1 The transducer 96 controls and is controlled by a servo control signal 86 incident at 94 at an incident angle of zero. And the servo difference generated by the computer 9 第 The interferometer system ε and conversion factor in Fig. 7 are the same as those in the beam manipulation system in Fig. 6. As well as the dynamic beam steering system, the corresponding interferometer system and the interferometer group in the interferometer system described above. The plane mirror reference component 'for example, a differential plane mirror interferometer may include an additional optical suspension instrument, and the plane mirror reference member may be integrated into the one/y instrument which may be a second measuring component in this embodiment. Causing to couple the beam to the second amount

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測件上的參考鏡。上述的干涉系統提供高精度的量測。此系統特別有用於微影上的應用，用以製作大尺寸的積體電路，例如電腦晶片。微影為半導體製造工業的關鍵技術。疊置改進是將線寬降到100四以下的重要挑戰，參照Semic〇nduct〇r ’ Industry Roadmap, p82(1997) 〇疊置直接相關於，例如，將晶圓以及光罩平台定位距離量測干涉儀的精度。由於一微影工具一年可產生 $50- 1 00M的產值，改善距離量測干涉儀的經濟價值是很巨大的。在微影工具上每1%的改善可產生約為$1M的經^效益於積體電路的製造以及微影工具的銷售。微影工具的功能在於引導光罩圖案至一塗佈有光阻晶圓。該製程包括決定晶圓的位置以及將輻射線照設於光阻之上（曝光）。曰ηίΐ要！確的設置該晶圓，1亥晶圓包括對位記號於該被專用的感測器量測。該對位記號的量測，疋義了晶圓在該工具中的位置。此資訊，校曰圓與該圖案輻射線的位置。根據此資訊，‘： ==動平台，移動該晶圓，使該輕射線可J = 射於該晶圓之上。 “、、當在曝光過程-放射光源照射一具有圖案其：射該輻射線以產生該具有圖案的輻射線。該分割 =以為一光罩，以下這兩個名詞可以互換。在縮小微影、’月況下，一縮小透鏡蒐集該散射的輻射線，並形成—^Reference mirror on the test piece. The interference system described above provides high precision measurements. This system is particularly useful for applications on lithography to make large-scale integrated circuits, such as computer chips. Photolithography is a key technology in the semiconductor manufacturing industry. Overlay improvement is an important challenge to reduce line width to below 100. Refer to Semic〇nduct〇r ' Industry Roadmap, p82 (1997). Stacking is directly related to, for example, wafer and mask platform positioning distance measurements. The accuracy of the interferometer. Since a lithography tool can produce an output value of $50-100M a year, the economic value of the improved distance measuring interferometer is enormous. Every 1% improvement in lithography tools can result in approximately $1M of manufacturing benefits and the sale of lithography tools. The function of the lithography tool is to direct the reticle pattern to a photoresist coated wafer. The process includes determining the position of the wafer and placing the radiation above the photoresist (exposure).曰ηίΐ要! The wafer is set up, and the 1 ray wafer includes the alignment mark measured by the dedicated sensor. The measurement of the alignment mark depreciates the position of the wafer in the tool. This information, the calibration circle and the location of the pattern radiation. Based on this information, ‘: == move the platform and move the wafer so that the light ray can be shot above the wafer. ", when during the exposure process - the radiation source is illuminated with a pattern: the radiation is emitted to produce the patterned radiation. The segmentation = a mask, the following two terms can be interchanged. Under the condition of month, a reduced lens collects the scattered radiation and forms -^

1〇57.5464-PF(Nl).ptd1〇57.5464-PF(Nl).ptd

輻射線經過了一短距離以產生-的1:1的影反應，並將圖案轉印至件，其可控制該晶圓以紀錄在該晶圓之上。如可最小化距離量測的週 :照射系統以及一晶圓光源，用以提供輻射，電子束或是離子束，该幸δ射線圖案，因此產縮小微影，該照射系統案的輻射線印至該晶圓晶圓上的光阻之上。該支樓該光罩，以及一定於該輻射線的位置。該以承放該晶圓以及一定於該具有圖案之轄射線數個曝光步驟。可參考 in Microlithography: Dekker， Inc, New 的量測該晶圓平台以及 1277720 五、發明說明（53) 小的影像。在近接轉印中，該散射 (一般為微米等級），接觸該晶圓，像。該放射開始了該光阻中的化學該光阻中。干涉糸統為定位機構的重要元及分劃板的位置，並將該縮小影像果該干涉系統包括上述的特徵，則期性誤差而提高精度。一般而言，該微影系統，包括定位系統。該照射系統包括一放射線，例如紫外線，可見光，X射線，以及一分劃板或是光罩，用以賦予生具有圖案的輻射線。此外，對於可包括一透鏡組，用以將該具有圖上。該具有圖案的輻射線照設於該照射系統亦包括一光罩平台，用以位系統，用以調整該光罩平台相對晶圓定位系統包括一晶圓平台，用位系統，用以調整該晶圓平台相對的位置。積體電路的製造可包括複 J. R. Sheats and B. W, Smith, Science and TechnologyCMarcel York, 1998) ° 上述的干涉系統可被用於準確The radiant line travels a short distance to produce a 1:1 shadow response and transfers the pattern to a piece that controls the wafer to be recorded on the wafer. For example, the circumference of the distance measurement can be minimized: an illumination system and a wafer light source for providing radiation, an electron beam or an ion beam, and the δ-ray pattern is produced, thereby reducing the lithography, and the radiation pattern of the illumination system case Above the photoresist on the wafer wafer. The louver of the fulfilment and the location of the radiant line. The exposure step of the wafer and the number of exposures of the pattern. Refer to in Microlithography: Dekker, Inc, New for measuring the wafer platform and 1277720 V. Inventive Note (53) Small image. In proximity transfer, the scattering (typically in the micron range) contacts the wafer, like. The radiation begins in the chemical in the photoresist. The interference system is the important element of the positioning mechanism and the position of the reticle, and the image is reduced. The interference system includes the above-mentioned features, and the accuracy is improved by the error. In general, the lithography system includes a positioning system. The illumination system includes a radiation, such as ultraviolet light, visible light, X-rays, and a reticle or reticle to impart patterned radiation. In addition, a lens group can be included for use in the drawing. The patterned radiation is disposed on the illumination system and includes a mask platform for adjusting a position of the mask platform relative to the wafer positioning system, including a wafer platform, and a bit system for adjusting the The relative position of the wafer platform. The fabrication of the integrated circuit may include complex J. R. Sheats and B. W, Smith, Science and Technology CMarcel York, 1998) ° The above interference system can be used to accurately

1057-5464-PF(Nl).ptd 第57頁括例如，壓電換能裔元件以及相應的電子零件。雖然其未被包含於上述的實施例，上述的干涉系統可以被用於準確的量測該光罩平台的位置，或其他需準確定位的可動元件supra Sheats and Smith Microlithography： 1277720 五、發明說明（54) 該光革平台相對於曝光系統的其他元件的位置，例如透鏡組’放射光源，或是承載結構。在每一個例子中，該干涉系統可以被設於一靜態結構，而該量測件可被設於一可動元件’例如光罩或是晶圓平台。該情況也可以轉換為，該干涉系統設於一可動元件而該量測件設於一靜態件。更一般而言，該干涉系統可以被用於量測曝光系統的任何元件相對於其他任何元件的位置。用於一干涉系統826的一個微影掃描器8〇〇的例子，如第8 a圖所顯示的。該干涉系統用於準確的量測一曝光系統中的晶圓位置。在此，平台822用於承載與定位該晶圓。掃描器800包括一框架802，其承受其他的支撐結構以及在这些結構上的各種元件。一曝光基礎8 〇 4其上方設有一透鏡外殼8 0 6，其設有一分劃板或是光罩平台8丨6，用以支撐該分劃板或是該光罩。一定位系統用以定位該光罩相對於該曝光設備的位置，由元件817表示。定位系統817可包 S -C i 6 n c e and Technology ) 〇懸掛於曝光基礎804之下的為支撐基礎813，其承載晶圓平台822。平台822包括一平面鏡8 28，用以反射被干涉系統826引導至平台的一量測光束8 54。一用以定位平台 822的疋位系統，以元件819表示。定位系統819可包括，1057-5464-PF(Nl).ptd Page 57 includes, for example, piezoelectric transducer elements and corresponding electronic components. Although it is not included in the above embodiments, the above-described interference system can be used to accurately measure the position of the reticle stage, or other movable elements that need to be accurately positioned. supra Sheats and Smith Microlithography: 1277720 54) The position of the light leather platform relative to other components of the exposure system, such as the lens group 'radiation source, or the load bearing structure. In each of the examples, the interferometric system can be disposed in a static configuration, and the measuring member can be disposed on a movable component such as a reticle or wafer platform. This situation can also be converted to that the interference system is provided on a movable element and the measuring element is provided on a static member. More generally, the interference system can be used to measure the position of any component of the exposure system relative to any other component. An example of a lithography scanner 8A for an interference system 826 is shown in Figure 8a. The interference system is used to accurately measure the wafer position in an exposure system. Here, platform 822 is used to carry and position the wafer. Scanner 800 includes a frame 802 that receives other support structures and various components on these structures. An exposure base 8 〇 4 is provided with a lens housing 060, which is provided with a reticle or reticle stage 8丨6 for supporting the reticle or the reticle. A positioning system is used to position the reticle relative to the exposure apparatus, as indicated by element 817. The positioning system 817 can include S -C i 6 n c e and Technology ) 悬挂 suspended below the exposure base 804 as a support base 813 that carries the crystal platform 822. The platform 822 includes a plane mirror 8 28 for reflecting a measured beam 8 54 that is directed by the interference system 826 to the platform. A clamping system for positioning platform 822 is indicated by element 819. Positioning system 819 can include,

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五、發明說明（55) 例如，壓電換能器元件以及相應的控制電子零件。該f _ 光束反射回該干涉系統，其設於曝光基礎804之上。該干' 涉系統可以為上述之任一實施例。在操作上，該放射光束8 1 0，例如紫外光，經過—光束形成光學組8 1 2並在經鏡8 1 4反射後向下傳遞。因此，兮放射光束經過一由光罩平台8 1 6承放的光罩（未圖示）。光罩經過一透鏡組808反映與晶圓平台822上的一晶圓（^ 圖示）之上。基礎804以及其所支撐的各種元件利用彈菁 8 2 0而獨立於環境的震動。 ’V. INSTRUCTIONS (55) For example, piezoelectric transducer elements and corresponding control electronics. The f _ beam is reflected back to the interference system, which is disposed above the exposure base 804. The dry system can be any of the above embodiments. In operation, the radiation beam 81, such as ultraviolet light, passes through the beam to form an optical group 8 1 2 and is transmitted downwardly after being reflected by the mirror 8 14 . Therefore, the 放射 radiation beam passes through a reticle (not shown) carried by the reticle stage 8 16 . The mask is reflected by a lens group 808 over a wafer (shown on the wafer platform 822). The base 804 and the various components it supports utilize the elasticity of the environment and are independent of the environment. ’

該微影掃描器的另一實施例’先前描述的干涉系統可被用於沿多軸量測距離以及角度，但並不僅限於，該晶圓或是該分劃板（或該光罩）平台。同樣的，除了紫外光束之外，可使用其他的光束例如X光，電子束，離子束以及可見光。Another embodiment of the lithography scanner's previously described interference system can be used to measure distance and angle along multiple axes, but is not limited to the wafer or the reticle (or reticle) platform . Similarly, in addition to the ultraviolet beam, other beams such as X-rays, electron beams, ion beams, and visible light can be used.

在一些實施例中，該干涉系統826引導該參考光束（未圖示）沿一外參考路徑，接觸設於一些結構上的一參考鏡 (未圖示）以引導該放射光束，例如透鏡外殼8〇 6。該參考鏡反射該參考光束回至該干涉系統。該干涉系統826結合量測光束854以及參考光束產生干涉訊號，表示該平台相對於該放射光束的位移。此外，在其他實施例中，該干涉系統826可以用於量測分劃板或是光罩平台816的位置變化，或是該掃瞄系統的其他可動元件的位置變 <匕。最後，該干涉系統可用於相似的微影系統，其可包括步進機或是In some embodiments, the interference system 826 directs the reference beam (not shown) along an external reference path, contacting a reference mirror (not shown) provided on some of the structures to direct the radiation beam, such as the lens housing 8. 〇 6. The reference mirror reflects the reference beam back to the interference system. The interference system 826, in conjunction with the measurement beam 854 and the reference beam, produces an interference signal indicative of the displacement of the platform relative to the radiation beam. Moreover, in other embodiments, the interference system 826 can be used to measure the positional change of the reticle or reticle stage 816, or the position of other movable elements of the scanning system. Finally, the interference system can be used in similar lithography systems, which can include stepper or

1277720 五、發明說明（56) — 微影為製作半導體裝置方法中的一困難的部分。例如，美國專利5，4 8 3，3 4 3號專利概述了此製造步驟。這此步驟在此利用第8b圖以及第8c圖描述。該8b圖為一半導體裝置的製造流程圖，如一半導體晶片，一液晶面板或是電荷耦合器。步驟85 1為一設計的製程，用以設計該半導體裝置的電路。步驟852為一製造光罩於該電路圖案設計的基礎上的製程。步驟8 5 3為利用如矽等材料製作晶圓的製程0 、步驟為一晶圓製程，稱為前處理，使用預先準備好的光罩及晶圓，電路經由微影形成於晶圓之上。為了成足夠精度的電路於晶圓之上，該微影工具相對於該晶圓的干涉定位是必須的。在此描述的該干涉方法別有利於改善微影的效果。及糸4*特 54步ΛΊ:組合步驟，其稱為後處理，其中經過步 = 854處理後的该晶圓形成為半導體晶片。此 ^以及封裝。步驟856為—檢查步驟，其中可操作且驗’耐久性檢驗’以及其他半導置由 =題:，經由這些製程，半導體裝置可以完成= 氣相沈積製程，用以乂门曰曰圓表面。步驟862為-化學 _為-電極形成二用圓表面形成一層絕緣[步驟成電極。步驟864 Γ:離：Γ:蒸鍵的方式在晶圓上形 4為離子植入製程，用以將離子植入晶1277720 V. INSTRUCTIONS (56) — lithography is a difficult part of the method of fabricating a semiconductor device. This manufacturing step is outlined, for example, in U.S. Patent No. 5,4,3,3,3,3. This step is described here using Figure 8b and Figure 8c. The Figure 8b is a manufacturing flow diagram of a semiconductor device such as a semiconductor wafer, a liquid crystal panel or a charge coupler. Step 85 1 is a design process for designing the circuit of the semiconductor device. Step 852 is a process for fabricating a reticle on the basis of the circuit pattern design. Step 8 5 3 is a process for fabricating a wafer using materials such as germanium. The process is a wafer process called pre-processing. A pre-prepared mask and wafer are used, and the circuit is formed on the wafer via lithography. . In order to form a sufficiently accurate circuit on the wafer, the interference positioning of the lithography tool relative to the wafer is necessary. The interference method described herein is advantageous for improving the effect of lithography. And 糸4* 54 54 steps: a combination step, which is called post-processing, in which the wafer processed by step = 854 is formed into a semiconductor wafer. This ^ and the package. Step 856 is an inspection step in which the "durability test" and other semi-conducting tests are performed by the problem: through these processes, the semiconductor device can complete the vapor deposition process for the rounded surface of the door. Step 862 is to form a layer of insulation for the surface of the chemical electrode. Step 864 Γ: From: Γ: The way of steaming the bond on the wafer 4 is an ion implantation process for implanting ions into the crystal

12777201277720

五、發明說明（57) 圓❹步驟8 6 5為一光阻製程，用以施加一光阻於晶圓之上❶步驟866為一曝光製程，利用曝光，將光罩上的電路圖案利用上述的曝光裝置轉印圖案。再一次的，如上所述，使用此干涉系統及方法可改善微影步驟的精度。步驟8 6 7為一顯影步驟，用以對該晶圓進行顯影。步驟868為一蝕刻步驟，用以移除經顯影光阻影像的其他部分。步驟869為一光阻剝離製程，用以去除殘留於^圓的光阻材料。藉由重複此製程，電路圖案形成並疊印於該晶圓之上。該干涉系統可用於其他的應用，當物件之間的相對位置需要準確量測的情況。例如，在直寫光束為雷射，χ 光，離子束或是電子束，將圖案標示於一基板，該干涉系統可被用於里測δ亥基板以及該直寫光束的相對運動。’' 例如，一光束直寫系統9〇〇的示意圖如第9圖所顯示的。一光源910產生一直寫光束912，以及一光束聚焦組合 914，引導該放射光束至一基板916，其由可動平台918所" 支撐。為了要決定該平台的相對位置，該干涉系統92〇引導一參考光束922至一鏡924，並引導一量測光束926至一鏡9 28。由於該參考光束接觸設於該光束聚焦組合的一鏡上，該光束直寫系統為一使用陣列參考的例子。干涉系統 920可以為任一上述的干涉系統。由該干涉系統所量測到的位置變化相應於直寫光束912以及基板916的相對位置變化。干涉系統9 2 0傳送一量測訊號9 3 2至控制器9 3 〇，其指引了直寫光束9 1 2以及基板9丨6之間的相對位置。控制器V. Description of the Invention (57) The step 8 6 5 is a photoresist process for applying a photoresist on the wafer. Step 866 is an exposure process, and the circuit pattern on the mask is utilized by exposure. The exposure device transfers the pattern. Again, as described above, the accuracy of the lithography step can be improved using this interference system and method. Step 8 6 7 is a development step for developing the wafer. Step 868 is an etching step for removing other portions of the developed photoresist image. Step 869 is a photoresist stripping process for removing the photoresist material remaining in the circle. By repeating this process, a circuit pattern is formed and overlaid on the crystal circle. The interference system can be used in other applications where the relative position between objects needs to be accurately measured. For example, in the case where the direct write beam is a laser, a xenon, an ion beam or an electron beam, the pattern is marked on a substrate, and the interference system can be used to measure the relative motion of the δH substrate and the direct write beam. For example, a schematic diagram of a beam direct writing system 9A is shown in Fig. 9. A light source 910 produces a constant write beam 912, and a beam focus combination 914 that directs the emitted light beam to a substrate 916 that is supported by the movable platform 918. To determine the relative position of the platform, the interference system 92A directs a reference beam 922 to a mirror 924 and directs a beam 926 to a mirror 928. Since the reference beam contact is provided on a mirror of the beam focus combination, the beam direct writing system is an example using an array reference. Interference system 920 can be any of the above described interference systems. The change in position measured by the interference system corresponds to the relative positional change of the write-through beam 912 and the substrate 916. The interfering system 902 transmits a quantity of signal 9 3 2 to the controller 9 3 〇 which indicates the relative position between the direct write beam 9 1 2 and the substrate 9丨6. Controller

1057-5464.PF(Nl).ptd1057-5464.PF(Nl).ptd

1277720 1 ........ ι·_ 五、發明說明（58) =傳^7輸出訊號934至一基礎936，其支撐並定位平台 918 〇此外，控制器93〇傳送一寫光束912的強度，以使該直寫豹=從以化直基板。且馬光束以足夠的強度接觸該此外’在一些實施例中， 9“於該基板的一個區域掃聪該；制寫：了：光束聚焦組號944。因此，控制哭93〇引1 έ ”、、 σ，使用吼至兮其柘# μ e 引導系統的其他元件以將圖荦印1277720 1 ........ ι·_ V. Description of the invention (58) = pass the output signal 934 to a base 936 that supports and positions the platform 918. In addition, the controller 93 transmits a write beam 912. The strength of the straight leopard = to straighten the substrate. And the horse beam is in contact with the beam with sufficient intensity 'in some embodiments, 9' in a region of the substrate; the writing: the beam focusing group number 944. Therefore, the control is crying 93 〇 1 έ ” , , σ, use 吼 to 兮其柘# μ e to guide other components of the system to print the image

至忒基板。该轉印圖案的動作竹α系P 子設計圖案。在_些應 =存於控制器中的電阻該基板上的—光阻，或利用束將圖案印至-光板。 Λ直寫光束直接餘刻該基此系統的一重要應用為為了製造一微影光罩，一 ^先罩以及劃分板。例如，基板。在此例子中，其中♦ 可被用於轉印圖案至一鉻直寫系統將該電子束路徑束為—電子束，該光束直寫光束是，例如，一電:::、空之中。同樣的，當該包括電子場產生器，例如或是離子束，該光束聚焦組子至該基板。該直寫光束=f鏡用以聚焦、並弓丨導該粒外線，或是可見光，該例如，x光，紫用以聚焦並引導該輻射線 I、、且匕括相應的光學元件，雖然本發明已於較#徐=基板。限定本發明，任何熟習此；：=露如上，然其並非用以神和範圍内，仍可作些 ' 二、’在不脫離本發明之精濩範圍當視後附之申請利A人/閏飾，因此本發明之保 J粑圍所界定者為準 1057-5464-PF(Nl).ptd 第62頁 1277720 圖式簡單說明第1圖為一干涉儀系統的示意圖。第2a圖為一多軸干涉儀之第一實施例的立體圖。第2b圖表示該量測光束在該第一實施例中之相對位第3a圖為一多軸干涉儀之第二實施例的立體圖。第3 b圖表示該量測光束在該第二實施例中之相對位置。第4a圖為一多軸干涉儀之第三實施例的立體圖。第4b圖表示該量測光束在該第三實施例中之相對位置。第5a圖為一多軸干涉儀之第四實施例的立體圖。第5b圖表示該量測光束在該第四實施例中之相對位置。第6圖為一干涉儀系統之示意圖，該干涉儀系統包括動態光操縱元件用以引導一輸入光束進入該干涉儀。第7圖為一干涉儀系統之示意圖，該干涉儀系統包括動態光束操縱元件用以引導一輸入光束進入該干涉儀並引導一或多到輸出光束離開該干涉儀。第8a圖為一用來製造積體電路之微影系統的示意圖。第8b-8c圖為流程圖，用來說明製造積體電路之步第9圖為一光束刻寫系統之示意圖。第1 0圖為第3a圖所示之第二實施例之另一立體圖。第11圖為該干涉儀整合如第1 0圖之干涉儀之另一實施As for the substrate. The action of the transfer pattern is a bamboo alpha P sub design pattern. The resistors on the substrate, or the bundles, are printed on the substrate. Λ Straight-through beam directly residing the base An important application of this system is to create a lithographic mask, a hood and a dividing plate. For example, a substrate. In this example, where ♦ can be used to transfer the pattern to a chrome direct writing system, the beam path is bundled into an electron beam that is, for example, an electric:::, empty. Similarly, when an electron field generator, such as an ion beam, is included, the beam focuses the set onto the substrate. The direct write beam=f mirror is used to focus and guide the outer line of the particle, or visible light, for example, x-ray, purple is used to focus and guide the radiation I, and the corresponding optical component is included, although The present invention has been used in comparison with the substrate. </ RTI> </ RTI> </ RTI> </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> </ RTI> </ RTI> </ RTI> </ RTI>闰 , , , , 10 57 57 57 57 57 57 57 57 57 57 57 57 57 57 57 57 57 57 57 57 57 57 57 57 57 57 57 57 57 57 57 57 57 57 57 57 57 57 57 57 57 57 57 57 57 Figure 2a is a perspective view of a first embodiment of a multi-axis interferometer. Figure 2b shows the relative position of the measuring beam in the first embodiment. Figure 3a is a perspective view of a second embodiment of a multi-axis interferometer. Figure 3b shows the relative position of the measuring beam in this second embodiment. Figure 4a is a perspective view of a third embodiment of a multi-axis interferometer. Figure 4b shows the relative position of the measuring beam in this third embodiment. Figure 5a is a perspective view of a fourth embodiment of a multi-axis interferometer. Fig. 5b shows the relative position of the measuring beam in the fourth embodiment. Figure 6 is a schematic illustration of an interferometer system including a dynamic light steering element for directing an input beam into the interferometer. Figure 7 is a schematic illustration of an interferometer system including a dynamic beam steering element for directing an input beam into the interferometer and directing one or more output beams away from the interferometer. Figure 8a is a schematic diagram of a lithography system used to fabricate integrated circuits. Figure 8b-8c is a flow chart for illustrating the steps of fabricating an integrated circuit. Figure 9 is a schematic diagram of a beam writing system. Fig. 10 is another perspective view of the second embodiment shown in Fig. 3a. Figure 11 is another implementation of the interferometer integrating the interferometer as shown in Figure 10.

1057-5464-PF(Nl).ptd 第63頁 1277720 圖式簡單說明例的立體圖。第1 2a圖為一干涉儀系統之另一實施例之平面圖。第1 2b圖為該干涉儀距離量測部分之平面圖。第1 2c圖為該干涉儀角度量測部分之平面圖。第1 2d圖為描繪光點在平面鏡量測物上的分佈圖。第1 2e圖為一元件可用於另一干涉儀系統之示意圖。第13a、13b、13c圖為該干涉儀系統之另一實施例之平面圖，第13a圖為該干涉儀系統之一第一平面的平面圖；第13b圖為該干涉儀系統之一第二平面的平面圖；第1 3c圖為該干涉儀系統之一第三平面的平面圖；以及第1 3d圖為描繪光點在該干涉儀系統之平面鏡量測物上的分佈圖。第14a圖及第14b圖為包含一或多個補償元件之干涉儀系統的額外實施例之平面圖。第14c圖、第14d圖以及第14e圖為不同形式之補償元件之示意圖。第15a、15b以及15c圖為一干涉儀系統之另一額外實施例的平面圖；第1 5a圖為該干涉儀系統之一第一平面的平面圖；第1 5b圖為該干涉儀系統之一第二平面的平面圖；第1 5 c圖為該干涉儀系統之一第三平面的平面圖；以及1057-5464-PF(Nl).ptd Page 63 1277720 Schematic description of the diagram. Figure 12a is a plan view of another embodiment of an interferometer system. Figure 12b is a plan view of the distance measuring portion of the interferometer. Figure 12c is a plan view of the angle measuring portion of the interferometer. Figure 12D is a plot depicting the distribution of spots on a flat mirror. Figure 1 2e is a schematic diagram of one component that can be used in another interferometer system. Figures 13a, 13b, 13c are plan views of another embodiment of the interferometer system, Figure 13a is a plan view of a first plane of the interferometer system; and Figure 13b is a second plane of the interferometer system Fig. 13c is a plan view of a third plane of the interferometer system; and Fig. 13d is a plot depicting the spot on the plane mirror of the interferometer system. Figures 14a and 14b are plan views of additional embodiments of an interferometer system including one or more compensating elements. Figures 14c, 14d, and 14e are schematic diagrams of different forms of compensation components. 15a, 15b, and 15c are plan views of another additional embodiment of an interferometer system; Fig. 15a is a plan view of a first plane of the interferometer system; and Fig. 15b is a diagram of the interferometer system a plan view of a second plane; a 15th c-figure is a plan view of a third plane of the interferometer system;

1057-5464-PF(Nl).ptd 第64頁 1277720 圖式簡單說明第1 5d圖為描繪光點在該干涉儀系統之平面鏡量測物上的分佈圖。相同之參考標號在不同的圖式中代表相同的元件。符號說明 10 - v光源； 1 2〜輸入光束； 14， -干涉儀； 20〜光路； 6 0〜光路； 70〜感測器； 8 0〜訊號； 82〜伺服訊號； 86， “伺服控制訊號； 9 0〜電子處理器及電腦； 92， -面鏡； 94〜伺服控制器； 9 6^ v換能器； 9 8〜動態元件； 110 〜光源； 112〜光束； 114 〜平面鏡干涉儀； 122 、1 24及126〜量測光 130 〜極化光束分光器介面 132 〜四分之一波長相位阻滯板； 134 〜四分之一波長相位阻滯板； 140 〜光束； 142 - ^光束； 144 〜光束； 146 - -光束； 150 〜回溯反射器； 152 〜非極化光束分光器介面； 154 〜棱鏡； 160〜輸出光束； 162 〜輸出光束； 1 9 4〜平面鏡； 214 〜干涉儀； 222、224、226以及228〜量測光束；1057-5464-PF(Nl).ptd Page 64 1277720 Schematic description of the diagram Figure 15D is a plot depicting the spot on the mirror of the interferometer system. The same reference numbers are used in the different drawings. DESCRIPTION OF SYMBOLS 10 - v light source; 1 2~ input beam; 14, - interferometer; 20~ optical path; 6 0~ optical path; 70~ sensor; 8 0~ signal; 82~ servo signal; 86, "servo control signal 9 0~ electronic processor and computer; 92, - mirror; 94~ servo controller; 9 6^v transducer; 9 8~ dynamic components; 110 ~ light source; 112 ~ beam; 114 ~ plane mirror interferometer; 122, 1 24 and 126~ metering 130 ~ polarized beam splitter interface 132 ~ quarter wavelength phase block; 134 ~ quarter wavelength phase block; 140 ~ beam; 142 - ^ beam 144 ~ beam; 146 - - beam; 150 ~ retroreflector; 152 ~ non-polarized beam splitter interface; 154 ~ prism; 160 ~ output beam; 162 ~ output beam; 1 9 4 ~ plane mirror; 214 ~ interferometer ; 222, 224, 226, and 228~ measuring beams;

1057-5464-PF(Nl).ptd 第65頁 1277720 圖式簡單說明 230〜極化光束分光 232〜四分之一波長 233〜背板； 244〜光束； 248〜光束； 252〜光束分光器介 2 5 4〜棱鏡； 260〜光束； 264〜光束； 322 、 324 、 326 〜量 330〜光束分光器介 358〜光束分光器介 3 5 9〜稜鏡； 4 1 2〜輸入光束； 422 、 424 ' 426 〜量 430〜光束分光器介 458〜光束分光器介 4 5 9〜稜鏡； 8 0 0〜微影掃描器； 80彳〜曝光基礎； 8 0 8〜透鏡組； 8 1 2〜光學組； 8 1 4〜鏡； 8 1 7〜定位系統；介面；板； 240〜光束； 246〜光束； 2 5 0〜回溯反射鏡；面； 2 5 6〜棱鏡； 2 6 2〜光束； 312〜輸入光束；測光束；面；面； 360、3 62〜輸出光束； 4 1 4〜干涉儀；測光束；面；面； 460、4 62〜輸出光束； 8 0 2〜框架； 8 0 6〜透鏡外殼； 8 1 0〜放射光束； 8 1 3〜支撐基礎； 816〜光罩平台； 8 1 9〜定位系統；1057-5464-PF(Nl).ptd Page 65 1277720 Schematic description 230~ polarized beam splitting 232~quarter wavelength 233~backplane; 244~beam; 248~beam; 252~beam splitter 2 5 4 ~ prism; 260 ~ beam; 264 ~ beam; 322, 324, 326 ~ amount 330 ~ beam splitter 358 ~ beam splitter dielectric 3 5 9 ~ 稜鏡; 4 1 2 ~ input beam; 422, 424 ' 426 ~ quantity 430 ~ beam splitter 458 ~ beam splitter medium 4 5 9 ~ 稜鏡; 8 0 0 ~ lithography scanner; 80 彳 ~ exposure basis; 8 0 8 ~ lens group; 8 1 2 ~ optical Group; 8 1 4 ~ mirror; 8 1 7 ~ positioning system; interface; plate; 240 ~ beam; 246 ~ beam; 2 5 0 ~ retroreflector; face; 2 5 6 ~ prism; 2 6 2 ~ beam; ~ input beam; beam; face; face; 360, 3 62 ~ output beam; 4 1 4 ~ interferometer; beam; face; face; 460, 4 62 ~ output beam; 8 0 2 ~ frame; 8 0 6 ~ lens housing; 8 1 0 ~ radiation beam; 8 1 3 ~ support base; 816 ~ reticle platform; 8 1 9 ~ positioning system;

1057-5464-PF(Nl).ptd 第66頁 1277720 圖式簡單說明 822〜平台； 8 2 6〜干涉系統； 828〜平面鏡； 854 - -量測光束； 851 ^ 852.···、857 〜步驟； 861 ' 862····、869 〜步驟； 9 0 0〜光束直寫系統 ;910， i光源； 912〜直寫光束； 914〜光束聚焦組合； 916〜基板； 918， v可動平台； 920〜干涉系統； 922， -參考光束； 924〜鏡， 926， -量測光束； 928〜 JbiL. · 鏡， 9 3 0〜控制器； 932〜量測訊號； 934〜輸出訊號； 936〜基礎； 938〜訊號； 944〜訊號； 1101 〜輸入光束； 1102' 〜光束分光器總成； 1 1 0 3〜非極化分光器總成； 1104 、1105〜次要輸入光束 1107, ^極化汽漏過濾、器； 1224 、2224 、 1226 、 2226 〜量測光束； 1 2 3 2〜相位阻滯板； 1242 〜光束； 1 244 产〜光束； 1246 〜光束； 1 2 5 0〜立方角回溯反射器； 1252〜光束分光器介面；1057-5464-PF(Nl).ptd Page 66 1277720 Schematic description 822~ platform; 8 2 6~ interference system; 828~ plane mirror; 854 - - measuring beam; 851 ^ 852.···, 857 ~ Step; 861 '862····, 869~ step; 9 0 0~ beam direct writing system; 910, i light source; 912~ direct writing beam; 914~ beam focusing combination; 916~ substrate; 918, v movable platform; 920~ interference system; 922, - reference beam; 924~ mirror, 926, - measuring beam; 928~ JbiL. · mirror, 9 3 0~ controller; 932~ measuring signal; 934~ output signal; ; 938~ signal; 944~ signal; 1101 ~ input beam; 1102' ~ beam splitter assembly; 1 1 0 3 ~ non-polarization beam splitter assembly; 1104, 1105 ~ secondary input beam 1107, ^ polarized steam Leakage filter, 1224, 2224, 1226, 2226 ~ measuring beam; 1 2 3 2~ phase blocking plate; 1242 ~ beam; 1 244 producing ~ beam; 1246 ~ beam; 1 2 5 0 ~ cube corner retroreflection 1252~beam splitter interface;

1057-5464-PF(Nl).ptd 第67頁 1277720 圖式簡單說明 1254〜反射介面； 1256〜介面； 1264、1266、2264、2266 〜輸出光束； 1 2 5 0 ’〜第二回溯反射器； 1 254,〜平面鏡； 1 266’ 、2264’ 、2266’ 〜輸出光束； 1 272〜第一輸出光束； 1273〜輸出光束； 1274〜極化器； 1 275〜感測器； 1 280〜平面鏡量測物； 1281〜極化光束分光器； 1 2 8 2〜四分之一波阻滯板； 1283〜平面鏡參考物；1284〜四分之一波阻滯板； 1 2 8 5〜返回光束總成；1 2 8 6〜非極化光束分光器； 1 287〜回溯反射器； 1 288〜五稜鏡； 1 2 8 9〜半波阻滯板； 1 2 9 0〜中介光束； 1291、1 292 〜光束； 1 293、1 294 〜光束； 1 2 9 5〜次要量測光束；1 2 9 6〜次要參考光束； 1 2 9 7〜次要量測光束；1 2 9 8〜次要參考光束； 1 3 1 2〜輸入光束； 1 322、1 324、1 32 6〜量測光束； 1350〜回溯反射器； 1364〜輸出光束； 1 373〜角度量測輸出光束； 1 3 7 6〜極化器； 1 3 7 7〜感測器； 1 3 8 1〜極化光束分光器； 1 386〜非極化光束分光器；1057-5464-PF(Nl).ptd Page 67 1277720 Schematic description of 1254~reflection interface; 1256~ interface; 1264, 1266, 2264, 2266~ output beam; 1 2 5 0 '~ second retroreflector; 1 254, ~ plane mirror; 1 266', 2264', 2266' ~ output beam; 1 272 ~ first output beam; 1273 ~ output beam; 1274 ~ polarizer; 1 275 ~ sensor; 1 280 ~ plane mirror Measurement; 1281~polarized beam splitter; 1 2 8 2~quarter wave blocker; 1283~plane mirror reference; 1284~quarter wave blocker; 1 2 8 5~return beam total 1 2 8 6~ non-polarized beam splitter; 1 287~ retroreflector; 1 288~5稜鏡; 1 2 8 9~ half-wave block; 1 2 9 0~ intermediate beam; 1291, 1 292 ~ beam; 1 293, 1 294 ~ beam; 1 2 9 5 ~ secondary measuring beam; 1 2 9 6 ~ secondary reference beam; 1 2 9 7 ~ secondary measuring beam; 1 2 9 8~ secondary Reference beam; 1 3 1 2~ input beam; 1 322, 1 324, 1 32 6~ measuring beam; 1350~ retroreflector; 1364~ output beam; 1 373~ angle measurement Out beam; 1 3 7 6~ polarizer; 1 3 7 7~ sensor; 1 3 8 1~ polarized beam splitter; 1 386~ non-polarized beam splitter;

1057-5464-PF(Nl).ptd 第68頁 12777201057-5464-PF(Nl).ptd Page 68 1277720

1388〜五角稜鏡； 1 3 9 1〜主要量測光束 1 394〜光束； 1 3 9 8〜次要參考光束 1460、1462〜輸出光束； 1422 、 1424 以、1426 1 3 8 9〜半波阻滯板； ;1 392〜主要參考光束 1 397〜次要量測光束 ;1 41 2〜輪入光束；〜量測光束； 1 489〜半波阻滯板； 2244、2246 〜光束； 2 2 5 2，〜非極化分光器 1 5 8 5〜返還光束總成 2 2 5 2〜介面；介面； 2264〜光束； 2266〜輸出光束； 3252〜介面； Cl、C2、C3、C5〜補償元件 Μ1、M2〜面鏡； PBS6、PBS7、PBS8、PBS9、PBS11、PBS12 〜極化光束分光器； QW1、QW2〜1/4波長極化片； RR41、RR51〜回溯反射器。1388~五角稜鏡; 1 3 9 1~ main measuring beam 1 394~ beam; 1 3 9 8~ secondary reference beam 1460, 1462~ output beam; 1422, 1424 to, 1426 1 3 8 9~ half wave resistance滞板; ;1 392~ main reference beam 1 397~minor measuring beam; 1 41 2~ wheeling beam; ~ measuring beam; 1 489~ half-wave blocking plate; 2244, 2246 ~ beam; 2 2 5 2, ~ non-polarized beam splitter 1 5 8 5 ~ return beam assembly 2 2 5 2 ~ interface; interface; 2264 ~ beam; 2266 ~ output beam; 3252 ~ interface; Cl, C2, C3, C5 ~ compensation component Μ 1 , M2 ~ mirror; PBS6, PBS7, PBS8, PBS9, PBS11, PBS12 ~ polarized beam splitter; QW1, QW2 ~ 1/4 wavelength polarizer; RR41, RR51 ~ retroreflector.

Claims

I277720 人 -----塞说 92101675 、"申請專利範圍 1 一種多軸干涉儀一多軸干涉儀，沿相對位置; 勹其中該干涉儀係設 I括該量測物相對於一 _ 其中每一輸出光束碼該量測物至少一次；其中該等光束分量目異之一第一路徑與該 2 ·如申請專利範圍上述之沿該共同路徑二束更包括一第二光束接觸。 3 ·如申請專利範圍中該等自由度其中之一離。曰修正裝置，包括：多重自由度來量測一 j反射I測物之 f以產生多道輪出光束，每一光束，異之自由度的相對位置；而且匕括光束分量沿一共同的路徑接而且至少其中之一，更沿盥該共同路徑量測物做第二次接觸。第1項所述之多軸干涉儀裝置，其與該第一路徑與量測物接觸之輸出分量，該第二光束分量未與量測物第1項所述之多軸干涉儀裝置，其係沿一第一量測軸至該量測物的距 t上、;申請專利範圍第3項所述之多軸干涉儀裝置，其資訊ϊϋ含有關於沿該第一量測轴至該量測物之距離之於眚钔=光束，包括沿該共同路徑以及該第一路徑接觸、里測物之該光束分量。 5哲如申請專利範圍第4項所述之多轴干涉儀裝置，其里測軸係由該共同路徑與該第一路徑所定義。 6·如申請專利範圍第5項所述之多軸干涉儀裝置，其 ι第一量測轴上之每一點至該共同路徑及該第一路租上I277720 person-----sai said 92101675, " patent application scope 1 a multi-axis interferometer-multi-axis interferometer, along the relative position; 勹 where the interferometer is set to include the measurement object relative to a Each of the output beam codes the measurement at least once; wherein the first path of the beam component is different from the second beam, and the second beam contact is further included along the common path as described in the patent application. 3 • One of these degrees of freedom in the scope of patent application.曰 correction device, comprising: multiple degrees of freedom to measure a f reflection I of the object f to generate a plurality of rounds of the beam, each beam, the relative position of the degree of freedom; and the beam component along a common path And at least one of them further makes a second contact along the common path measurement. The multi-axis interferometer device according to Item 1, wherein the first path and the measuring object are in contact with an output component, and the second beam component is not related to the multi-axis interferometer device according to the first item of the measuring object. A multi-axis interferometer device according to the third aspect of the invention, wherein the information ϊϋ contains information about the measurement along the first measurement axis to the measurement The distance of the object is based on the 眚钔=beam, including the beam component along the common path and the first path contact. 5. The multi-axis interferometer device of claim 4, wherein the measuring axis is defined by the common path and the first path. 6. The multi-axis interferometer device of claim 5, wherein ι first measures each point on the axis to the common path and the first road lease

第70頁 I277720 、1、銮號 92101675 X 8 -修正六、申請^ ^ 之詞·應點係等距離。 7·如申請專利範圍第4項所述之多軸干涉儀裝置，其中另一光束分量更沿與該共同路徑相異之一第二路徑接觸於該量測物。 ^ 8 ·如申請專利範圍第7項戶斤述之多軸干涉儀裝置，其中上述之沿該共同路徑以及該第二路徑接觸於該量測物的輪出光束包括有關於沿一第二量測軸至該量測物之距離的資訊，該第二量測軸係由該共同路徑及該第二路徑所定義並相異於該第一量測轴。 9·如申請專利範圍第8項所述之多軸干涉儀裝置，其中一第三光束分量更沿一相異於該共同路徑之第三路徑，至> 第二次接觸於該量測物。中1 0 ·如申請專利範圍第9項所述之多軸干涉儀裝置，其於上述之沿該共同路徑以及該第三路徑接觸於該量測物的 ^出光束包括有關於沿一第三量測軸至該量測物之距離的 =訊、，該第三量測軸係由該共同路徑及該第三路徑所定，並相異於該第一及第二量測軸。斯r靖辱利範圍第丨〇項所述之多 ί tΪ第丨一f第二量測軸定義出一第一平面，而該第二一里/貝丨軸疋義出相異於該第〆平面之—第二平面。由1 2 ·如申請專利範圍第4項所述之多軸干儀 :該輪出光束包括該量測物相對於-=轉 13·如申請專利範圍第1 2項所述之多輛干涉儀裝置 1277720 _____案號 92101675 车 ^^-_ 修正 ---一六、申請專利範圍其中該第二輸出光束包括該沿該共同路徑接觸於量測物的光束分量，以及與另一與該第，光束分量相異之光束分量，其中該另一光束分量沿與該共同路徑相異之一第二路徑接觸於該量測物。 1 4 ·如申請專利範圍第1 3項所述之多軸干涉儀裝置，其中該第一路徑與該第二路徑相異。 15·如申請專利範圍第14項所述之多軸干涉儀裝置，其中該第一旋轉軸垂直於由共同路徑與該第二路徑所定義之平面。 1 6 ·如申請專利範圍第1 3項所述之多軸干涉儀裝置，其中一第二輸出光束包括有關於該量測物相對於與該第一方疋轉轴相異之一第二旋轉軸的角度方位，其中該第三輸出光束包括沿該共同路徑接觸於該量測物之該第一次提及之光束分量，以及另一與該第一光束分量相異之另一光量，其中該另一光束分量沿相異於該共同路徑之一二徑接觸於該量測物。乐二路 17·如申請專利範圍第16項所述之多軸干涉其中該第二旋轉軸與該第一旋轉軸正交。、置’ 1 8.如申請專利範圍第i項所述之多軸干井中該多轴干涉儀產生至少四道輸出光束，二，裝置，其包含該多重自由度其甲相異之一自由度之資訊輪出光束均 1 9 ·如申請專利範圍第j項所述之多轴干涞中該多轴干涉儀提供有關於至少五個自由度裝置，其 20·如申請專利範圍第丨項所述之多軸干涉置，其Page 70 I277720, 1, nickname 92101675 X 8 - Amendment 6. The word ^^ should be equidistant. 7. The multi-axis interferometer device of claim 4, wherein the other beam component is further in contact with the measurement element along a second path that is different from the common path. </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; Information about the distance from the axis to the measurement object, the second measurement axis being defined by the common path and the second path and different from the first measurement axis. 9. The multi-axis interferometer device of claim 8, wherein a third beam component is further along a third path different from the common path to > second contact with the measurement object . The multi-axis interferometer device according to claim 9, wherein the beam corresponding to the measuring object along the common path and the third path includes a third along a third Measuring the distance from the axis to the measuring object, the third measuring axis is determined by the common path and the third path, and is different from the first and second measuring axes. The second measuring axis defines a first plane, and the second one is different from the first one. 〆 plane - the second plane. The multi-axis dry meter as described in claim 4: the round-out beam includes the measuring object relative to the -= turn 13 · as described in claim 12, the plurality of interferometers Device 1277720 _____ Case No. 92101675 车^^-_ Amendment---16, the patent application scope, wherein the second output beam includes the beam component contacting the measurement object along the common path, and the other and the And a beam component having a different beam component, wherein the other beam component is in contact with the measurement along a second path that is different from the common path. The multi-axis interferometer device of claim 13, wherein the first path is different from the second path. The multi-axis interferometer device of claim 14, wherein the first axis of rotation is perpendicular to a plane defined by the common path and the second path. The multi-axis interferometer device of claim 13, wherein the second output beam comprises a second rotation relative to the measurement object relative to the first square axis of rotation An angular orientation of the shaft, wherein the third output beam comprises the first mentioned beam component that is in contact with the measurement along the common path, and another amount of light that is different from the first beam component, wherein The other beam component is in contact with the measurement along a path that is different from one of the common paths. Le Er Lu 17·Multi-axis interference as described in claim 16 wherein the second axis of rotation is orthogonal to the first axis of rotation. [1] 8. The multi-axis interferometer of the multi-axis dry well described in claim i, wherein the multi-axis interferometer generates at least four output beams, and a device comprising the multiple degrees of freedom and one degree of freedom of the different degrees of freedom The information is emitted from the beam. The multi-axis interferometer described in item j of the patent application is provided with at least five degrees of freedom, 20 of which is claimed in the scope of the patent application. Multi-axis interference,

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___案號 92101 fi7!S 六、申請專利範圍中該多軸干涉儀提供有關於至少七個自由度的資訊。 2 1 ·如申請專利範圍第1項所述之多軸干涉中該量測物包括一平面鏡。、置’其 22·如申請專利範圍第1項所述之多軸干涉儀裝置盆中更包括一光源設置以引導一輸入光束進入多軸^涉儀，、中，該輸入光束包括兩外差式頻率分光的分量，' 其中，每一沿該共同路徑接觸於該量測物的輸出光矣係由輸入光束之分量其中之一得到；而且___ Case No. 92101 fi7!S VI. Patent Application The multi-axis interferometer provides information on at least seven degrees of freedom. 2 1 · The multi-axis interference as described in claim 1 of the patent application includes a plane mirror. The multi-axis interferometer device basin described in claim 1 further includes a light source disposed to guide an input beam into the multi-axis instrument, wherein the input beam includes two heterodyne a component of the frequency splitting, wherein each output pupil that is in contact with the measurement along the common path is derived from one of the components of the input beam;

其中’母一輸出光束更包括一第二分量，由該輪入光束之另一分量得到。 2 3 ·如申请專利範圍第2 2項所述之多軸干涉儀裝置，其中該输入光束之分量具有互相正交的極化。 24 ·如申請專利範圍第1項所述之多軸干涉儀裝置，其中更包括感測器配置以接收輸出光束並產生電子訊號，該電子訊说表示該1測物相關於不同自由度之相對位置的資訊0 25 ·如申請專利範圍第2 4項所述之多軸干涉儀裝置，其中更包括一極化分析器位於每一感測器之前，並配置以通過對每一輸出光束之該等分量的一中介干涉極化。 26·如申請專利範圍第25項所述之多軸干涉儀裝置，其中更包括一光纖讀取頭，用來耦合每一輸出光束至一對應之感測器，在其經過對應之極化分析器之後。 27 ·如申請專利範圍第1項所述之裝置，該干涉儀設置以引導得自一輸入光束之一第一光束沿該共同路徑接觸於Wherein the mother-output beam further comprises a second component obtained from the other component of the wheeled beam. The multi-axis interferometer device of claim 2, wherein the components of the input beam have mutually orthogonal polarizations. The multi-axis interferometer device of claim 1, further comprising a sensor configured to receive the output beam and generate an electronic signal indicating that the 1 object is related to different degrees of freedom Positional Information 0 25. The multi-axis interferometer device of claim 24, further comprising a polarization analyzer located before each sensor and configured to pass each of the output beams An intermediary of the equal component interferes with polarization. 26. The multi-axis interferometer device of claim 25, further comprising a fiber optic readhead for coupling each output beam to a corresponding sensor for corresponding polarization analysis After the device. 27. The device of claim 1, wherein the interferometer is configured to direct a first beam from an input beam to contact the common path along the common path

1057-5464-PF2(Nl).ptc 第73 I 1277720 _ _案號92101675 车月日铬g：^ 六、申請專利範圍該量測物，並在接出該量測物之後，將該第一光束分成多道K光束’其中’該等次光束對應於沿該共同路徑接觸於該量測物之該輸出光束中的該等光束分量。 28·如申請專利範圍第27項所述之多轴干涉儀裝置，其中該干涉儀設置以引導至少一次光束沿該第一路1接觸於該量測物至少第二次，以定義沿該共同路徑及該第一路徑接觸於該量測物之該光束分量。 29·如申請專利範圍第28項所述之多軸干涉儀裝置，其中該干涉儀係設置以從該輸入光束得到另一次光束，並將接觸於該量測物至少兩次之該次光束合併至產生第一個輸出光束之該次光束，其中該第一輸出光束包括關於沿由該共同路徑與該第一路徑所定義之一量測軸至該量測物之距離。 30. 如申請專利範圍第28項所述之多軸干涉儀裝置，其中該干涉儀係設置以引導至少另一次光束沿一第二路徑至少第二次接觸於該量測物，該第二路徑相異於該共同路徑及該第一路徑。 31. 如申請專利範圍第3〇項所述之多軸干涉儀裝置，其中該干涉儀係設置從該輸入光束得到另一組次光束，並將接觸於該量測物至少兩次之每一次光束與該另一組次光束中之一對應之次光束結合以產生一對應之輸出光束。 3 2.如申請專利範圍第28項所述之多軸干涉儀裝置，其中該干涉儀係設置從該輸入光束得到另一組次光束，並將接觸於該量測物至少兩次之每一次光束與該另一組次光1057-5464-PF2(Nl).ptc 73 I 1277720 _ _ Case No. 92101675 车月日铬g:^ VI. Apply for the patent range of the measured object, and after receiving the measured object, the first The beam is split into a plurality of K-beams 'where the equal-light beams correspond to the beam components in the output beam that are in contact with the measurement along the common path. The multi-axis interferometer device of claim 27, wherein the interferometer is configured to direct at least one light beam to contact the measurement object along the first path 1 at least a second time to define along the common The path and the first path are in contact with the beam component of the measurement. The multi-axis interferometer device of claim 28, wherein the interferometer is configured to obtain another beam from the input beam and combine the beams that are in contact with the measurement at least twice And generating the secondary beam of the first output beam, wherein the first output beam comprises a distance from the measuring axis defined by the common path to the first path to the measuring object. 30. The multi-axis interferometer device of claim 28, wherein the interferometer is configured to direct at least another time beam to contact the measurement object at least a second time along a second path, the second path Different from the common path and the first path. 31. The multi-axis interferometer device of claim 3, wherein the interferometer is configured to obtain another set of sub-beams from the input beam and to contact the measurement at least twice each time. The beam combines with a secondary beam corresponding to one of the other sets of sub-beams to produce a corresponding output beam. 3. The multi-axis interferometer device of claim 28, wherein the interferometer is configured to obtain another set of sub-beams from the input beam and to contact the measurement at least twice each time. Beam and the other set of sub-lights

1057-5464-PF2(Nl).ptc 1277720 -— 案號flWfl1675_年月日條正__ 六、申請專利範圍束中之一次光束結合以產生一輸出光束，並從該另-組次光束中引導另一次光束沿與該共同路徑相異之一第二路徑接觸於該量測物，並將沿該共同路徑接觸量測物之另一次光束與沿該第二路徑接觸量測物之該次光束結合，而產生另一輸出光束。 33·如申請專利範圍第27項所述之多軸干涉儀裝置，其中該干涉儀更設置以：i )將接觸該量測物後的該第一光束與一主要參考光束結合以定義一中介光束；ii )將該中介光束分成一組次要量測光束與一組次要參考光束； i i i )引導每一次要量測光束與該量測物接觸；i v )將接觸該量測物後的每一次要量測光束與該一相對應之次要參考光束再結合以產生一對應的輸出光束，其中每一次光束對應於一相異之次要量測與參考光束。 34·如申請專利範圍第1項所述之多軸干涉儀裝置，其中該干涉儀包括：一共同之極化光束分光器，引導得自一入射輸入光束的一主要量測光束沿一共同路徑與該量測物接觸；以及一返回光束總成，接收包含來自該極化光束分光器之主要量測光束的一中介光束，並將該中介光束分成多道光束’再將該等多道光束引導回該極化光束分光器。 3 5 ·如申請專利範圍第3 4項所述之多軸干涉儀裝置’ 其中該極化光束分光器更設置用以引導得自該入射輸入，束的一主要參考光束接觸一反射的參考物，其中該主要j 測光束與該主要參考光束對應於該入射的輸入光束的疋父1057-5464-PF2(Nl).ptc 1277720 -- Case number flWfl1675_年月日日正__ 6. The first beam in the bundle of patent applications is combined to produce an output beam, and from the other-group beam Directing another beam to contact the measurement object along a second path different from the common path, and contacting the other beam along the common path with the measuring object and the measuring object along the second path The beams combine to produce another output beam. 33. The multi-axis interferometer device of claim 27, wherein the interferometer is further configured to: i) combine the first beam that contacts the measurement with a primary reference beam to define an intermediary a beam; ii) dividing the intermediate beam into a set of secondary measuring beams and a set of secondary reference beams; iii) directing each of the measuring beams to contact the measuring object; iv) contacting the measuring object Each time the measurement beam is recombined with the corresponding secondary reference beam to produce a corresponding output beam, wherein each beam corresponds to a different secondary measurement and reference beam. The multi-axis interferometer device of claim 1, wherein the interferometer comprises: a common polarized beam splitter that directs a main measurement beam from an incident input beam along a common path Contacting the measuring object; and returning the beam assembly, receiving an intermediate beam comprising a main measuring beam from the polarizing beam splitter, and dividing the intermediate beam into a plurality of beams, and then multiplying the plurality of beams Guide back to the polarized beam splitter. 3. A multi-axis interferometer device as described in claim 4, wherein the polarized beam splitter is further configured to direct from the incident input, a primary reference beam of the beam contacts a reflective reference Where the primary j-beam and the primary reference beam correspond to the father of the incident input beam

1057-5464-PF2(Nl).ptc 第75頁 1277720 案號 92101675 B 修正六、申請專利範圍極化分量。 36·如申請專利範圍第34項所述之多軸干涉儀裝置，其中該極化光束分光器更設置用以將該主要量測光束與參考光束在其分別接觸於該量測物與參考物之後做再結合以形成該中介光束。 3 7 ·如申請專利範圍第3 6項所述之多轴干涉儀裝置’ 其中該極化光束分光器係設置以·· i )將該多道光束分成一組次要量測光束以及一組次要參考光束；ii )引導每一次要量測光束接觸於該量測物；i i i )引導每一次要參考光束接觸於該參考物；以及i v )將每一次要量測光束與對應之次要參考光束在分別與該量測物與參考物接觸後做再結合，而形成一對應之輸出光束。 3 8 .如申請專利範圍第3 7項所述之多轴干涉儀裝置’ 其中該每一次要量測光束沿與該共同路徑相異之一路徑接觸於該量測物。 3 9 ·如申請專利範圍第3 7項所述之多軸干涉儀裝置’ 其中該干涉儀更包括一參考物。 4 0 ·如申請專利範圍第3 9項所述之多轴干涉儀裝置，其中該參考物包括一平面鏡。 41 ·如申請專利範圍第3 7項所述之多軸干涉儀裝置’ 其中該干涉儀更包括一量測四分之一波長阻滯器，位於該該極化光束分光器與該量測物之間。 42 ·如申請專利範圍第4 1項所述之多轴干涉儀裝置，其申該干涉儀更包括一參考四分之一波長阻滯器，位於該 1^· 1057-5464-PF2(Nl).ptc 第76頁 1277720 銮號 92101675 午月一g-ϋ_ 六、申請專利範圍該極化光束分光器與該參考物之間。 43 .如申請專利範圍第3 4項所述之多轴干涉儀裝置，其中該返回光束總成包括至少一組曲折光學系以及至少一非極化光束分光器將該中介光束分成多到光束。 4 4 .如申請專利範圍第4 3項所述之多軸干涉儀裝置，其中該至少一組曲折光學系包括一回溯反射器設置優先於任何非極化光束分光器以接收中介光束。 45·如申請專利範圍第44項所述之多軸干涉儀裝置，其中該返回光束總成更包括一光束分光總成，該光束分光總成包含至少一非極化光束分光器，其中該光束分光總成接收來自該回溯反射器的該中介光束，產生多道光束，並將多道光束沿著平行於該中介光束的方向導回該極化光束分光器。 46·如申請專利範圍第45項所述之多軸干涉儀裝置，其中該光束分光總成包括多個非極化光束分光器。 4 7 ·如申請專利範圍第4 6項所述之多轴干涉儀裝置，其中該返回光束總成更包括一阻滯板，設於該回溯反射器與該光束分光總成之間，其中該阻滯板的方位係用以降低由該回溯反射器所造成的該中介光束極化的旋轉。 48·如申請專利範圍第34項所述之多轴干涉儀裝置， $中該干涉儀更包括一輸入光束光學總成，該輸入光束光學總成包括一非極化光束分光器，其中該輸入光束光學總 j係將原始的輸入光束分成該第一次提及的輸入光束以及一該第一輸入光束平行行進的一第二輸入光束，並將該第 1277720 兑修正案號 92101675_年 i^^--------- 六、申請專利範圍〆口一及第二輸入光束引導至極化光束分^/ 、 49·如申請專利範圍第43項所述之户轴干涉儀襞置，其中該至少一組曲折光學系包栝量測角度的曲折光學系以及量測距離的曲折光學系，其中該量測角度的曲折光學系包括一半波長阻滯器設置以旋轉該多道光束中至少一道光束的極化。 5 0 ·如申請專利範圍第4 9項所述之多軸干涉儀裝置，其中談量測角度曲折光學系更包括，五角陵鏡，而該量測距離曲折光學系更包括一回溯反射器/ 5 1.如申請專利範圍第4 3項所述之多軸干涉儀裝置，其中該非極化光束分光器係設置優先於任何曲折光學系以接收該中介光束。 5 2 · —種多軸干涉術方法，包括：干涉儀產生多道輸出光束，每一道輸出光束包括有關一量測物對於不同自由度的相對位置之資訊，其中每一输出光束包括一光束分量，沿一共同路徑接觸於該量測物至少一次，以及其中該等光束分量至少其中之一更沿與該共同路徑相異之第一路徑至少第二次接觸於該量測物。1057-5464-PF2(Nl).ptc Page 75 1277720 Case No. 92101675 B Amendment 6. Patent application range Polarization component. The multi-axis interferometer device of claim 34, wherein the polarized beam splitter is further configured to contact the main measuring beam and the reference beam with the measuring object and the reference object respectively This is then combined to form the intermediate beam. 3 7 · A multi-axis interferometer device as described in claim 36, wherein the polarized beam splitter is arranged to ... i) divide the multi-beam into a set of secondary measuring beams and a set a secondary reference beam; ii) directing each time the measurement beam is in contact with the measurement; iii) directing each reference beam to contact the reference; and iv) measuring each of the desired beams and corresponding minors The reference beam is recombined after being in contact with the reference and the reference, respectively, to form a corresponding output beam. The multi-axis interferometer device as described in claim 3, wherein the measuring beam is in contact with the measuring object in a path different from the common path. The multi-axis interferometer device as described in claim 3, wherein the interferometer further includes a reference. The multi-axis interferometer device of claim 39, wherein the reference object comprises a plane mirror. 41. The multi-axis interferometer device of claim 3, wherein the interferometer further comprises a measuring quarter-wave retarder located at the polarized beam splitter and the measuring object between. 42. The multi-axis interferometer device of claim 41, wherein the interferometer further comprises a reference quarter-wave retarder located at the 1^· 1057-5464-PF2 (Nl) .ptc Page 76 1277720 Nickname 92101675 Mid-monthly g-ϋ_ 6. Patent application between the polarized beam splitter and the reference. 43. The multi-axis interferometer device of claim 3, wherein the return beam assembly comprises at least one set of tortuous optical systems and at least one non-polarized beam splitter splits the intermediate beam into a plurality of beams. The multi-axis interferometer device of claim 4, wherein the at least one set of tortuous optical systems comprises a retroreflector set prior to any non-polarized beam splitter to receive the intermediate beam. The multi-axis interferometer device of claim 44, wherein the return beam assembly further comprises a beam splitting assembly, the beam splitting assembly comprising at least one non-polarized beam splitter, wherein the beam The beam splitting assembly receives the intermediate beam from the retroreflector, produces a plurality of beams, and directs the plurality of beams back to the polarized beam splitter in a direction parallel to the intermediate beam. The multi-axis interferometer device of claim 45, wherein the beam splitting assembly comprises a plurality of non-polarized beam splitters. The multi-axis interferometer device of claim 4, wherein the return beam assembly further includes a blocking plate disposed between the retroreflector and the beam splitting assembly, wherein the The orientation of the blocking plate is used to reduce the rotation of the intermediate beam polarization caused by the retroreflector. 48. The multi-axis interferometer device of claim 34, wherein the interferometer further comprises an input beam optical assembly, the input beam optical assembly comprising a non-polarized beam splitter, wherein the input The beam optics j divides the original input beam into the first mentioned input beam and a second input beam in which the first input beam travels in parallel, and the 1277720 against the amendment number 92101675_year i^ ^--------- VI. Application for patent range: First and second input beam are directed to the polarized beam split ^/, 49. The household axis interferometer device as described in claim 43 Wherein the at least one set of tortuous optical systems comprises a tortuous optical system for measuring an angle and a tortuous optical system for measuring a distance, wherein the tortuous optical system of the measuring angle comprises a half-wave retarder disposed to rotate the multi-beam at least The polarization of a beam. 5 0. The multi-axis interferometer device according to claim 49, wherein the measuring angle tortuous optical system further comprises a pentagonal mirror, and the measuring distance zigzag optical system further comprises a retroreflector/ 5. The multi-axis interferometer device of claim 4, wherein the non-polarized beam splitter is set to take precedence over any zigzag optical system to receive the intermediate beam. 5 2 - A multi-axis interferometry method comprising: an interferometer generating a plurality of output beams, each output beam comprising information about a relative position of a measuring object for different degrees of freedom, wherein each output beam comprises a beam component Contacting the measurement element at least once along a common path, and wherein at least one of the beam components further contacts the measurement object at least a second time along a first path that is different from the common path.

5 3 . —種多軸干涉儀震置，包括：一多轴干涉儀’沿多重自由度來量測一反射量測物之相對位置’其中該干涉儀係設置以產生多道輸出光束，每一光束包括該量測物相對於一相異之自由度的相對位置；而且5 3. A multi-axis interferometer is set up, comprising: a multi-axis interferometer 'measuring the relative position of a reflection measurement object along multiple degrees of freedom', wherein the interferometer is arranged to generate multiple output beams, each A beam of light includes a relative position of the measure relative to a disparity; and

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路徑接一共同的 —_案號 9210167F1^_年月曰六、申請專利範圍其中每一輸出光束包括一光束分量沿觸該量測物至少一次；其中至少一輪出光束包括另一光束分量與第一、之光束分量相異；而且一人提及其中該另一光束分量沿與共同路徑相異之一接觸於該量測物至少一次。路徑 54.如申請專利範圍第53項所述之多軸干涉儀裝其中上述之包括沿該共同路徑接觸於該量測物之該、第一，束分量以及沿該第一路徑接觸於該量測物之另一另的輸出光束，包括有關於該量測物相對於一一分i 角度方位的資訊。弟碇轉軸$ 55.如申請專利範圍第54項所述之多軸干涉儀其中該第一旋轉軸與該共同路徑以及該第_路徑所^ ，平面垂直。錢之 56.如申請專利範圍第54項所述之多軸干 /、中一第二輸出光束包括該量測物相對於邀 ^ J 相異之-第二旋轉轴的角度方位之資，1 = 輪光束包括沿該共同路徑接觸於該量測物“]出，分量，以及與該第一光束分量相異之；^ /、中在該第二輸出光束之該另一光束分量沿斑庄同=— 相異之該第二路徑接觸於該量測物。 ^ 57·如申請專利範圍第56項所述之多輛其中該第二旋轉軸與該第一旋轉轴正交。 v 5 8 · —種多軸干涉術方法，包括：The path is connected to a common one - _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ I. The beam components are different; and one mentions that the other beam component is in contact with the measurement at least once along one of the different from the common path. The multi-axis interferometer of claim 53, wherein the first beam component contacting the measurement object along the common path and contacting the amount along the first path Another additional output beam of the object includes information about the angular orientation of the measurement relative to one-to-one. A multi-axis interferometer as described in claim 54 wherein the first axis of rotation is perpendicular to the common path and the plane of the first path. The 56. The multi-axis dry/medium-second output beam as described in claim 54 of the patent application includes the angular orientation of the measuring object relative to the second axis of rotation, 1 = the wheel beam includes a component along the common path "], a component, and is different from the first beam component; ^ /, the other beam component of the second output beam along the The same second path is in contact with the measurement object. ^ 57. A plurality of vehicles as described in claim 56, wherein the second rotation axis is orthogonal to the first rotation axis. v 5 8 · A multi-axis interferometry method, including:

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干涉儀產生多道輸出光束，每一道輪出光束包括一量測物對於不同自由度的相對位置之資訊，關其中母一輸出光束包括一光束分量，沿一共同路觸於該量測物至少一次， "^ 其中至少一輸出光束包括與該第一次提及之光束分量相異的另一光束分量，以及其中該另一光束分量沿與該共同路徑相異之第一路徑接觸於該量測物至少一次。 5 9 · —種微影系統，用於製造一晶圓上之積體電路， ;該系統包括·· 一平台用於支持該晶圓；一照明系統，用於將圖案的輻射，空間地映射至晶圓上；一定位系統用於相對於該映射的輻射調整該平台之位置；以及如申請專利範圍第1項或第5 3項所述之裝置，用於監控該晶圓相對於該映射之輻射的位置。 6 〇 · —種微影系統，用於製造一晶圓上之積體電路’ 該系統包括：一平台用於支持該晶圓；以及一照明系統，包括一輻射源 '一光罩、一定位系統、一透鏡總成、以及如申請專利範圍第1項或第53頊所述之裝置，其中在操作期間，該輻射源引導該輻射通過該光罩以The interferometer generates a plurality of output beams, each of which includes information on the relative position of the measuring object for different degrees of freedom, wherein the parent-output beam includes a beam component that touches the measuring object along at least one common path. Once, "^ wherein at least one of the output beams includes another beam component that is different from the first mentioned beam component, and wherein the other beam component is in contact with the first path that is different from the common path Measure the substance at least once. 5 9 · A lithography system for manufacturing an integrated circuit on a wafer; the system includes a platform for supporting the wafer; an illumination system for spatially mapping the radiation of the pattern On the wafer; a positioning system for adjusting the position of the platform relative to the mapped radiation; and a device as described in claim 1 or 5, for monitoring the wafer relative to the map The location of the radiation. 6 〇--a lithography system for manufacturing an integrated circuit on a wafer' The system includes: a platform for supporting the wafer; and an illumination system including a radiation source 'a reticle, a positioning A system, a lens assembly, and the apparatus of claim 1 or 53, wherein during operation, the radiation source directs the radiation through the reticle

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產生空間圖案輻射，該定位系統相對於該射射調整該光罩的位置’該透鏡總成映射該空：控該光罩的位置。原發出的輻射監 ·種光束刻寫系統’用於製造一微影光罩，兮系統包括：以” 一光源，提供一刻寫光束在一基板上製作圖案，· 一平台，支持該基板； ’ 一 2束導引總成，用來將該刻寫光束傳遞至該基板；一定位系統用來使該平台及談光束引導總成彼此相互定位；以及如申請專利範圍第1項或第53項所述之該裝置用來監控該平台相對於該光束引導總成之位置。 62· 一種微影方法，用於製造一晶圓上的積體電路，該方法包括下列步驟·· 將該晶圓支持於一可移動之平台上；映射空間圖案輻射至該晶圓；調整該平台之位置；用申請專利範圍第5 2項或第58項所述的方法監控該平台的位置。 63· 一種微影方法，用於製造一晶圓上的積體電路，該方法包括下列步驟：引導入射的輻射通過一光罩以產生空間圖案輻射，相對於該入射輻射定位該光罩；Spatial pattern radiation is generated, the positioning system adjusts the position of the reticle relative to the ray. The lens assembly maps the vacancy: controlling the position of the reticle. The original radiation monitoring type beam writing system 'is used to manufacture a lithography mask. The system includes: a light source that provides a writing beam to make a pattern on a substrate, and a platform to support the substrate; a beam guiding assembly for transmitting the writing beam to the substrate; a positioning system for positioning the platform beam guiding assemblies relative to each other; and as described in claim 1 or 53 The device is configured to monitor the position of the platform relative to the beam guiding assembly. 62. A lithography method for fabricating an integrated circuit on a wafer, the method comprising the steps of: supporting the wafer On a movable platform; mapping the spatial pattern to the wafer; adjusting the position of the platform; monitoring the position of the platform using the method described in claim 5 or 58. 63. A lithography method For manufacturing an integrated circuit on a wafer, the method comprising the steps of: directing incident radiation through a reticle to generate spatial pattern radiation, positioning the optical radiation relative to the incident radiation Cover;

I277720 修^正 ~^〜^^案號92101875 年月曰^ ----------^ 六、申請專利範圍 ^用申請專利範圍第52項或第58項所述的方法監控該平台相對於該入射輻射的位置；映射空間圖案輻射至該晶圓。 =64· —種微影方法，用於製造一晶圓上的積體電路，該方法包括下列步驟：一相對於一微影系統之第二元件定位一微影系統之第一疋件’使該晶圓暴露於空間圖案輻射中；以及用申請專利範圍第52項或第58項所述的方法監控該第元件相對於該第二元件的位置。 65· —種用來製造積體電路之方法，該方法包括申請利範圍第6 2、63、64項所述之微影方法。 .66· 一種用來製造積體電路之方法，該方法包括申請利範圍第5 9、6 〇項所述之微影系統。 6 7 · —種用來製造微影光罩之方法，該方法包括：引導一刻寫光束至一基板，以使該基板產生圖案；相對於該刻寫光束定位該基板；以及 ^ ^中請專利範圍第53項之多轴干涉儀裝置或第58項所 =之夕轴干涉術方法，相對於該刻寫光束監控該基板的位I277720 修^正^^~^^ Case No. 92101875 曰月 ----^ ----------^ VI. Application for patent scope ^ Monitor the method described in item 52 or item 58 of the patent application scope a position of the platform relative to the incident radiation; a mapping spatial pattern radiates to the wafer. a lithography method for fabricating an integrated circuit on a wafer, the method comprising the steps of: locating a first component of a lithography system relative to a second component of a lithography system The wafer is exposed to spatial pattern radiation; and the position of the first element relative to the second element is monitored by the method described in claim 52 or 58. 65. A method for fabricating an integrated circuit, the method comprising applying the lithography method described in the scope of claims 6, 2, 63, and 64. .66. A method for fabricating an integrated circuit, the method comprising the application of the lithography system described in the scope of claims 5, 6 and 6. 6 7 - A method for manufacturing a lithographic mask, the method comprising: directing a write beam to a substrate to cause the substrate to be patterned; positioning the substrate relative to the writing beam; and The multi-axis interferometer device of item 53 or the y-axis interferometry method of item 58 for monitoring the position of the substrate relative to the writing beam

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