TWI255835B - Radiation sensitive composition for use as a projection material for vertically aligned color liquid crystal displays panels - Google Patents

Radiation sensitive composition for use as a projection material for vertically aligned color liquid crystal displays panels

Info

Publication number
TWI255835B
TWI255835B TW091114072A TW91114072A TWI255835B TW I255835 B TWI255835 B TW I255835B TW 091114072 A TW091114072 A TW 091114072A TW 91114072 A TW91114072 A TW 91114072A TW I255835 B TWI255835 B TW I255835B
Authority
TW
Taiwan
Prior art keywords
radiation sensitive
sensitive composition
liquid crystal
color liquid
vertically aligned
Prior art date
Application number
TW091114072A
Other languages
English (en)
Chinese (zh)
Inventor
Shigeru Abe
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Application granted granted Critical
Publication of TWI255835B publication Critical patent/TWI255835B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
TW091114072A 2001-06-27 2002-06-26 Radiation sensitive composition for use as a projection material for vertically aligned color liquid crystal displays panels TWI255835B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001194864A JP4660985B2 (ja) 2001-06-27 2001-06-27 垂直配向型カラー液晶表示パネルの突起材

Publications (1)

Publication Number Publication Date
TWI255835B true TWI255835B (en) 2006-06-01

Family

ID=19032925

Family Applications (1)

Application Number Title Priority Date Filing Date
TW091114072A TWI255835B (en) 2001-06-27 2002-06-26 Radiation sensitive composition for use as a projection material for vertically aligned color liquid crystal displays panels

Country Status (4)

Country Link
JP (1) JP4660985B2 (ko)
KR (1) KR20030004057A (ko)
SG (1) SG94877A1 (ko)
TW (1) TWI255835B (ko)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4619835B2 (ja) * 2005-03-11 2011-01-26 富士フイルム株式会社 液晶配向制御用突起、この製造方法及び液晶表示装置
JP4739048B2 (ja) * 2005-03-11 2011-08-03 富士フイルム株式会社 液晶配向制御用突起及びその製造方法、感光性樹脂組成物、樹脂転写材料、液晶表示装置用基板、液晶表示素子、及び液晶表示装置
JP4739065B2 (ja) * 2005-03-29 2011-08-03 富士フイルム株式会社 液晶配向制御用突起、並びに、組成物、樹脂転写材料、液晶配向制御用突起の製造方法、液晶表示装置用基板、液晶表示素子、および、液晶表示装置
JP4739066B2 (ja) * 2005-03-29 2011-08-03 富士フイルム株式会社 液晶配向制御用突起、並びに、組成物、樹脂転写材料、液晶配向制御用突起の製造方法、液晶表示装置用基板、液晶表示素子、および、液晶表示装置
JP4715575B2 (ja) * 2006-03-20 2011-07-06 Ｊｓｒ株式会社 スペーサー用感放射線性樹脂組成物、スペーサーおよび液晶表示素子
JP5235305B2 (ja) * 2007-01-09 2013-07-10 早川ゴム株式会社 突起導電微粒子、異方性導電材料及び突起導電微粒子の製造方法
JP5764931B2 (ja) * 2010-02-02 2015-08-19 東レ株式会社 有機−無機複合導電性パターン形成用感光性ペーストおよび有機−無機複合導電性パターンの製造方法
JP5461372B2 (ja) * 2010-11-26 2014-04-02 株式会社ジャパンディスプレイ 配向膜形成用溶媒、それを用いた配向膜材料および液晶表示装置の製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3916722B2 (ja) * 1997-04-30 2007-05-23 シャープ株式会社 液晶表示装置
DE69838927T2 (de) * 1997-06-12 2009-02-26 Sharp K.K. Anzeigevorrichtung mit vertical ausgerichtetem Flüssigkristall
JPH11249299A (ja) * 1998-02-27 1999-09-17 Fuji Photo Film Co Ltd 感光性分散物、感光性シート、及び導電性パターンの製法
JP3422938B2 (ja) * 1998-08-05 2003-07-07 松下電器産業株式会社 液晶表示装置及びその製造方法
JP3940535B2 (ja) * 1998-11-30 2007-07-04 Ｊｓｒ株式会社 ブラックレジスト用感放射線性組成物
JP2003055583A (ja) * 1998-12-08 2003-02-26 Taiyo Ink Mfg Ltd 光硬化型異方性導電組成物及びそれを用いて形成した異方性導電パターン

Also Published As

Publication number Publication date
JP2003015276A (ja) 2003-01-15
KR20030004057A (ko) 2003-01-14
SG94877A1 (en) 2003-03-18
JP4660985B2 (ja) 2011-03-30

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees