SG94877A1 - Radiation sensitive composition for use as a projection material for vertically aligned color liquid crystal displays panels - Google Patents
Radiation sensitive composition for use as a projection material for vertically aligned color liquid crystal displays panelsInfo
- Publication number
- SG94877A1 SG94877A1 SG200203910A SG200203910A SG94877A1 SG 94877 A1 SG94877 A1 SG 94877A1 SG 200203910 A SG200203910 A SG 200203910A SG 200203910 A SG200203910 A SG 200203910A SG 94877 A1 SG94877 A1 SG 94877A1
- Authority
- SG
- Singapore
- Prior art keywords
- liquid crystal
- vertically aligned
- crystal displays
- color liquid
- radiation sensitive
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Liquid Crystal (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001194864A JP4660985B2 (en) | 2001-06-27 | 2001-06-27 | Projection material for vertical alignment color LCD panel |
Publications (1)
Publication Number | Publication Date |
---|---|
SG94877A1 true SG94877A1 (en) | 2003-03-18 |
Family
ID=19032925
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200203910A SG94877A1 (en) | 2001-06-27 | 2002-06-26 | Radiation sensitive composition for use as a projection material for vertically aligned color liquid crystal displays panels |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4660985B2 (en) |
KR (1) | KR20030004057A (en) |
SG (1) | SG94877A1 (en) |
TW (1) | TWI255835B (en) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4619835B2 (en) * | 2005-03-11 | 2011-01-26 | 富士フイルム株式会社 | Projection for liquid crystal alignment control, manufacturing method thereof, and liquid crystal display device |
JP4739048B2 (en) * | 2005-03-11 | 2011-08-03 | 富士フイルム株式会社 | Projection for liquid crystal alignment control and manufacturing method thereof, photosensitive resin composition, resin transfer material, substrate for liquid crystal display device, liquid crystal display element, and liquid crystal display device |
JP4739065B2 (en) * | 2005-03-29 | 2011-08-03 | 富士フイルム株式会社 | Projection for liquid crystal alignment control, and composition, resin transfer material, method for manufacturing liquid crystal alignment control projection, substrate for liquid crystal display device, liquid crystal display element, and liquid crystal display device |
JP4739066B2 (en) * | 2005-03-29 | 2011-08-03 | 富士フイルム株式会社 | Projection for liquid crystal alignment control, and composition, resin transfer material, method for manufacturing liquid crystal alignment control projection, substrate for liquid crystal display device, liquid crystal display element, and liquid crystal display device |
JP4715575B2 (en) * | 2006-03-20 | 2011-07-06 | Jsr株式会社 | Radiation sensitive resin composition for spacer, spacer and liquid crystal display element |
JP5235305B2 (en) * | 2007-01-09 | 2013-07-10 | 早川ゴム株式会社 | Protruding conductive fine particles, anisotropic conductive material, and manufacturing method of protruding conductive fine particles |
JP5764931B2 (en) * | 2010-02-02 | 2015-08-19 | 東レ株式会社 | Photosensitive paste for forming organic-inorganic composite conductive pattern and method for producing organic-inorganic composite conductive pattern |
JP5461372B2 (en) * | 2010-11-26 | 2014-04-02 | 株式会社ジャパンディスプレイ | Alignment film forming solvent, alignment film material using the same, and method for producing liquid crystal display device |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3916722B2 (en) * | 1997-04-30 | 2007-05-23 | シャープ株式会社 | Liquid crystal display |
DE69838927T2 (en) * | 1997-06-12 | 2009-02-26 | Sharp K.K. | Display device with vertically aligned liquid crystal |
JPH11249299A (en) * | 1998-02-27 | 1999-09-17 | Fuji Photo Film Co Ltd | Photosensitive dispersed matter, photosensitive sheet and manufacture of conductive pattern |
JP3422938B2 (en) * | 1998-08-05 | 2003-07-07 | 松下電器産業株式会社 | Liquid crystal display device and manufacturing method thereof |
JP3940535B2 (en) * | 1998-11-30 | 2007-07-04 | Jsr株式会社 | Radiation sensitive composition for black resist |
JP2003055583A (en) * | 1998-12-08 | 2003-02-26 | Taiyo Ink Mfg Ltd | Photocurable anisotropic electroconductive composition and anisotropic electroconductive pattern formed by using the same |
-
2001
- 2001-06-27 JP JP2001194864A patent/JP4660985B2/en not_active Expired - Fee Related
-
2002
- 2002-06-26 SG SG200203910A patent/SG94877A1/en unknown
- 2002-06-26 KR KR1020020035873A patent/KR20030004057A/en not_active Application Discontinuation
- 2002-06-26 TW TW091114072A patent/TWI255835B/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JP2003015276A (en) | 2003-01-15 |
KR20030004057A (en) | 2003-01-14 |
JP4660985B2 (en) | 2011-03-30 |
TWI255835B (en) | 2006-06-01 |
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