TW483031B - Thin film forming device and thin film removing device - Google Patents

Thin film forming device and thin film removing device Download PDF

Info

Publication number
TW483031B
TW483031B TW089123701A TW89123701A TW483031B TW 483031 B TW483031 B TW 483031B TW 089123701 A TW089123701 A TW 089123701A TW 89123701 A TW89123701 A TW 89123701A TW 483031 B TW483031 B TW 483031B
Authority
TW
Taiwan
Prior art keywords
thin film
substrate
section
film removing
peripheral edge
Prior art date
Application number
TW089123701A
Other languages
English (en)
Chinese (zh)
Inventor
Shunichi Yahiro
Yoichi Honda
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Application granted granted Critical
Publication of TW483031B publication Critical patent/TW483031B/zh

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/6715Apparatus for applying a liquid, a resin, an ink or the like

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mathematical Physics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
TW089123701A 1999-11-11 2000-11-09 Thin film forming device and thin film removing device TW483031B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32061899 1999-11-11

Publications (1)

Publication Number Publication Date
TW483031B true TW483031B (en) 2002-04-11

Family

ID=18123429

Family Applications (1)

Application Number Title Priority Date Filing Date
TW089123701A TW483031B (en) 1999-11-11 2000-11-09 Thin film forming device and thin film removing device

Country Status (2)

Country Link
KR (1) KR100665461B1 (ko)
TW (1) TW483031B (ko)

Also Published As

Publication number Publication date
KR20010060289A (ko) 2001-07-06
KR100665461B1 (ko) 2007-01-04

Similar Documents

Publication Publication Date Title
TW480562B (en) Coating processing apparatus
TWI401734B (zh) 洗淨裝置及其方法,塗佈,顯像裝置及其方法,以及記憶媒體
JP4040025B2 (ja) 塗布膜形成装置
TW494451B (en) Substrate processing method and substrate processing apparatus
US5965200A (en) Processing apparatus and processing method
JP2005223119A (ja) 塗布膜形成装置および塗布膜形成方法
TW425618B (en) Coating apparatus and coating method
JP2010103131A (ja) 液処理装置及び液処理方法
TW200842525A (en) Reduced-pressure drying device
KR20070092149A (ko) 프라이밍 처리 방법 및 프라이밍 처리 장치
TWI234796B (en) Solution treatment method and solution treatment unit
TWI226077B (en) Liquid processing apparatus and liquid processing method
JP3752420B2 (ja) 薄膜除去装置
JP5127080B2 (ja) 液処理装置
TWI293582B (en) Coating film forming apparatus and coating film forming method
JP4043382B2 (ja) 塗布膜除去方法及びその装置
JP3887549B2 (ja) 基板搬送装置
TWI377452B (en) Substrate processing method and resist surface processing apparatus
TWI669759B (zh) Substrate processing device, substrate processing method, and memory medium
JP3704059B2 (ja) 現像処理方法及び現像処理装置
TW483031B (en) Thin film forming device and thin film removing device
TW440923B (en) Coating film forming method and coating apparatus
JP2005243670A (ja) 塗布膜形成装置
JP2010087142A (ja) 塗布装置
KR101118885B1 (ko) 처리 장치 및 처리 방법

Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent
MM4A Annulment or lapse of patent due to non-payment of fees