TW289864B - - Google Patents
Info
- Publication number
- TW289864B TW289864B TW084105623A TW84105623A TW289864B TW 289864 B TW289864 B TW 289864B TW 084105623 A TW084105623 A TW 084105623A TW 84105623 A TW84105623 A TW 84105623A TW 289864 B TW289864 B TW 289864B
- Authority
- TW
- Taiwan
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/30—Cold cathodes, e.g. field-emissive cathode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/022—Manufacture of electrodes or electrode systems of cold cathodes
- H01J9/025—Manufacture of electrodes or electrode systems of cold cathodes of field emission cathodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/02—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
- H01J29/04—Cathodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/02—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
- H01J29/06—Screens for shielding; Masks interposed in the electron stream
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/86—Vessels; Containers; Vacuum locks
- H01J29/89—Optical or photographic arrangements structurally combined or co-operating with the vessel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J31/00—Cathode ray tubes; Electron beam tubes
- H01J31/08—Cathode ray tubes; Electron beam tubes having a screen on or from which an image or pattern is formed, picked up, converted, or stored
- H01J31/10—Image or pattern display tubes, i.e. having electrical input and optical output; Flying-spot tubes for scanning purposes
- H01J31/12—Image or pattern display tubes, i.e. having electrical input and optical output; Flying-spot tubes for scanning purposes with luminescent screen
- H01J31/123—Flat display tubes
- H01J31/125—Flat display tubes provided with control means permitting the electron beam to reach selected parts of the screen, e.g. digital selection
- H01J31/127—Flat display tubes provided with control means permitting the electron beam to reach selected parts of the screen, e.g. digital selection using large area or array sources, i.e. essentially a source for each pixel group
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2201/00—Electrodes common to discharge tubes
- H01J2201/30—Cold cathodes
- H01J2201/319—Circuit elements associated with the emitters by direct integration
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
- Cold Cathode And The Manufacture (AREA)
- Electrodes For Cathode-Ray Tubes (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US30736594A | 1994-09-16 | 1994-09-16 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW289864B true TW289864B (zh) | 1996-11-01 |
Family
ID=23189435
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW084105623A TW289864B (zh) | 1994-09-16 | 1995-06-05 |
Country Status (6)
Country | Link |
---|---|
US (5) | US5866979A (zh) |
JP (1) | JP3082897B2 (zh) |
KR (1) | KR100235504B1 (zh) |
DE (1) | DE19526042C2 (zh) |
FR (1) | FR2724767B1 (zh) |
TW (1) | TW289864B (zh) |
Families Citing this family (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6417605B1 (en) | 1994-09-16 | 2002-07-09 | Micron Technology, Inc. | Method of preventing junction leakage in field emission devices |
TW289864B (zh) | 1994-09-16 | 1996-11-01 | Micron Display Tech Inc | |
US6786998B1 (en) * | 1995-12-29 | 2004-09-07 | Cypress Semiconductor Corporation | Wafer temperature control apparatus and method |
US6040613A (en) * | 1996-01-19 | 2000-03-21 | Micron Technology, Inc. | Antireflective coating and wiring line stack |
US20010045794A1 (en) * | 1996-01-19 | 2001-11-29 | Alwan James J. | Cap layer on glass panels for improving tip uniformity in cold cathode field emission technology |
US5668437A (en) | 1996-05-14 | 1997-09-16 | Micro Display Technology, Inc. | Praseodymium-manganese oxide layer for use in field emission displays |
DE69723433T2 (de) * | 1996-05-14 | 2004-05-13 | Micron Technology, Inc. | Feldemissionsanzeigevorrichtungen mit praseodym-mangan-oxid-schicht |
US5903100A (en) * | 1997-03-07 | 1999-05-11 | Industrial Technology Research Institute | Reduction of smearing in cold cathode displays |
US5956611A (en) * | 1997-09-03 | 1999-09-21 | Micron Technologies, Inc. | Field emission displays with reduced light leakage |
FR2769114B1 (fr) * | 1997-09-30 | 1999-12-17 | Pixtech Sa | Simplification de l'adressage d'un ecran a micropointes |
US6278229B1 (en) * | 1998-07-29 | 2001-08-21 | Micron Technology, Inc. | Field emission displays having a light-blocking layer in the extraction grid |
US6236149B1 (en) * | 1998-07-30 | 2001-05-22 | Micron Technology, Inc. | Field emission devices and methods of forming field emission devices having reduced capacitance |
US6104139A (en) | 1998-08-31 | 2000-08-15 | Candescent Technologies Corporation | Procedures and apparatus for turning-on and turning-off elements within a field emission display device |
US6252348B1 (en) | 1998-11-20 | 2001-06-26 | Micron Technology, Inc. | Field emission display devices, and methods of forming field emission display devices |
US6537427B1 (en) * | 1999-02-04 | 2003-03-25 | Micron Technology, Inc. | Deposition of smooth aluminum films |
JP3101713B2 (ja) * | 1999-02-22 | 2000-10-23 | 東北大学長 | 電界放射陰極およびそれを用いる電磁波発生装置 |
US6008063A (en) * | 1999-03-01 | 1999-12-28 | Micron Technology, Inc. | Method of fabricating row lines of a field emission array and forming pixel openings therethrough |
US6822386B2 (en) * | 1999-03-01 | 2004-11-23 | Micron Technology, Inc. | Field emitter display assembly having resistor layer |
US6369497B1 (en) * | 1999-03-01 | 2002-04-09 | Micron Technology, Inc. | Method of fabricating row lines of a field emission array and forming pixel openings therethrough by employing two masks |
US6344378B1 (en) * | 1999-03-01 | 2002-02-05 | Micron Technology, Inc. | Field effect transistors, field emission apparatuses, thin film transistors, and methods of forming field effect transistors |
US6710525B1 (en) | 1999-10-19 | 2004-03-23 | Candescent Technologies Corporation | Electrode structure and method for forming electrode structure for a flat panel display |
US6570322B1 (en) | 1999-11-09 | 2003-05-27 | Micron Technology, Inc. | Anode screen for a phosphor display with a plurality of pixel regions defining phosphor layer holes |
FR2821982B1 (fr) * | 2001-03-09 | 2004-05-07 | Commissariat Energie Atomique | Ecran plat a emission electronique et a dispositif integre de commande d'anode |
US6630786B2 (en) * | 2001-03-30 | 2003-10-07 | Candescent Technologies Corporation | Light-emitting device having light-reflective layer formed with, or/and adjacent to, material that enhances device performance |
US6963160B2 (en) * | 2001-12-26 | 2005-11-08 | Trepton Research Group, Inc. | Gated electron emitter having supported gate |
US20060099400A1 (en) | 2002-09-11 | 2006-05-11 | Koji Okomori | Coated paper for photogravure |
KR100539735B1 (ko) * | 2003-07-03 | 2005-12-29 | 엘지전자 주식회사 | 전계 방출 표시 소자 구조 |
CN1320593C (zh) * | 2004-02-09 | 2007-06-06 | 东元奈米应材股份有限公司 | 具反射层的场发射显示器 |
US7559226B2 (en) * | 2006-05-16 | 2009-07-14 | Agilent Technologies, Inc. | Radiant thermal energy absorbing analytical column |
JP4347343B2 (ja) * | 2006-05-09 | 2009-10-21 | 富士重工業株式会社 | 発光装置 |
DE102014009677A1 (de) * | 2014-02-19 | 2015-08-20 | Pierre-Alain Cotte | Anzeigevorrichtung mit verbessertem Kontrast |
Family Cites Families (56)
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US3500102A (en) * | 1967-05-15 | 1970-03-10 | Us Army | Thin electron tube with electron emitters at intersections of crossed conductors |
US3671795A (en) * | 1970-08-28 | 1972-06-20 | Northrop Corp | High contrast display for electron beam scanner |
US3883760A (en) * | 1971-04-07 | 1975-05-13 | Bendix Corp | Field emission x-ray tube having a graphite fabric cathode |
US3814968A (en) * | 1972-02-11 | 1974-06-04 | Lucas Industries Ltd | Solid state radiation sensitive field electron emitter and methods of fabrication thereof |
US3970887A (en) * | 1974-06-19 | 1976-07-20 | Micro-Bit Corporation | Micro-structure field emission electron source |
DE3243596C2 (de) * | 1982-11-25 | 1985-09-26 | M.A.N. Maschinenfabrik Augsburg-Nürnberg AG, 8000 München | Verfahren und Vorrichtung zur Übertragung von Bildern auf einen Bildschirm |
US5015912A (en) | 1986-07-30 | 1991-05-14 | Sri International | Matrix-addressed flat panel display |
FR2623013A1 (fr) * | 1987-11-06 | 1989-05-12 | Commissariat Energie Atomique | Source d'electrons a cathodes emissives a micropointes et dispositif de visualisation par cathodoluminescence excitee par emission de champ,utilisant cette source |
US5090932A (en) * | 1988-03-25 | 1992-02-25 | Thomson-Csf | Method for the fabrication of field emission type sources, and application thereof to the making of arrays of emitters |
US4874981A (en) * | 1988-05-10 | 1989-10-17 | Sri International | Automatically focusing field emission electrode |
US4859304A (en) * | 1988-07-18 | 1989-08-22 | Micron Technology, Inc. | Temperature controlled anode for plasma dry etchers for etching semiconductor |
EP0382554A3 (en) * | 1989-02-10 | 1992-09-30 | Matsushita Electric Industrial Co., Ltd. | Method of forming a metal-backed layer and a method of forming an anode |
US5229682A (en) * | 1989-12-18 | 1993-07-20 | Seiko Epson Corporation | Field electron emission device |
US5049520A (en) * | 1990-06-06 | 1991-09-17 | Micron Technology, Inc. | Method of partially eliminating the bird's beak effect without adding any process steps |
US5024722A (en) * | 1990-06-12 | 1991-06-18 | Micron Technology, Inc. | Process for fabricating conductors used for integrated circuit connections and the like |
US5000208A (en) * | 1990-06-21 | 1991-03-19 | Micron Technology, Inc. | Wafer rinser/dryer |
US5204581A (en) * | 1990-07-12 | 1993-04-20 | Bell Communications Research, Inc. | Device including a tapered microminiature silicon structure |
US4992137A (en) * | 1990-07-18 | 1991-02-12 | Micron Technology, Inc. | Dry etching method and method for prevention of low temperature post etch deposit |
JP2613669B2 (ja) * | 1990-09-27 | 1997-05-28 | 工業技術院長 | 電界放出素子及びその製造方法 |
US5212426A (en) * | 1991-01-24 | 1993-05-18 | Motorola, Inc. | Integrally controlled field emission flat display device |
JP2626276B2 (ja) * | 1991-02-06 | 1997-07-02 | 双葉電子工業株式会社 | 電子放出素子 |
EP0503638B1 (en) * | 1991-03-13 | 1996-06-19 | Sony Corporation | Array of field emission cathodes |
JP3116398B2 (ja) * | 1991-03-13 | 2000-12-11 | ソニー株式会社 | 平面型電子放出素子の製造方法及び平面型電子放出素子 |
US5100355A (en) * | 1991-06-28 | 1992-03-31 | Bell Communications Research, Inc. | Microminiature tapered all-metal structures |
US5358601A (en) * | 1991-09-24 | 1994-10-25 | Micron Technology, Inc. | Process for isotropically etching semiconductor devices |
US5191217A (en) * | 1991-11-25 | 1993-03-02 | Motorola, Inc. | Method and apparatus for field emission device electrostatic electron beam focussing |
US5199917A (en) * | 1991-12-09 | 1993-04-06 | Cornell Research Foundation, Inc. | Silicon tip field emission cathode arrays and fabrication thereof |
JPH05182609A (ja) * | 1991-12-27 | 1993-07-23 | Sharp Corp | 画像表示装置 |
US5223083A (en) * | 1992-01-23 | 1993-06-29 | Micron Technology, Inc. | Process for etching a semiconductor device using an improved protective etching mask |
US5229331A (en) * | 1992-02-14 | 1993-07-20 | Micron Technology, Inc. | Method to form self-aligned gate structures around cold cathode emitter tips using chemical mechanical polishing technology |
US5358908A (en) * | 1992-02-14 | 1994-10-25 | Micron Technology, Inc. | Method of creating sharp points and other features on the surface of a semiconductor substrate |
US5151061A (en) * | 1992-02-21 | 1992-09-29 | Micron Technology, Inc. | Method to form self-aligned tips for flat panel displays |
US5259799A (en) * | 1992-03-02 | 1993-11-09 | Micron Technology, Inc. | Method to form self-aligned gate structures and focus rings |
US5186670A (en) * | 1992-03-02 | 1993-02-16 | Micron Technology, Inc. | Method to form self-aligned gate structures and focus rings |
US5205770A (en) * | 1992-03-12 | 1993-04-27 | Micron Technology, Inc. | Method to form high aspect ratio supports (spacers) for field emission display using micro-saw technology |
US5210472A (en) * | 1992-04-07 | 1993-05-11 | Micron Technology, Inc. | Flat panel display in which low-voltage row and column address signals control a much pixel activation voltage |
US5232549A (en) * | 1992-04-14 | 1993-08-03 | Micron Technology, Inc. | Spacers for field emission display fabricated via self-aligned high energy ablation |
US5329207A (en) * | 1992-05-13 | 1994-07-12 | Micron Technology, Inc. | Field emission structures produced on macro-grain polysilicon substrates |
US5391259A (en) * | 1992-05-15 | 1995-02-21 | Micron Technology, Inc. | Method for forming a substantially uniform array of sharp tips |
US5283500A (en) * | 1992-05-28 | 1994-02-01 | At&T Bell Laboratories | Flat panel field emission display apparatus |
US5374868A (en) * | 1992-09-11 | 1994-12-20 | Micron Display Technology, Inc. | Method for formation of a trench accessible cold-cathode field emission device |
JP3226238B2 (ja) * | 1993-03-15 | 2001-11-05 | 株式会社東芝 | 電界放出型冷陰極およびその製造方法 |
JP2812851B2 (ja) * | 1993-03-24 | 1998-10-22 | シャープ株式会社 | 反射型液晶表示装置 |
JPH07111868B2 (ja) * | 1993-04-13 | 1995-11-29 | 日本電気株式会社 | 電界放出冷陰極素子 |
KR970004885B1 (ko) * | 1993-05-12 | 1997-04-08 | 삼성전자 주식회사 | 평판표시장치 및 그 제조방법 |
US5342477A (en) * | 1993-07-14 | 1994-08-30 | Micron Display Technology, Inc. | Low resistance electrodes useful in flat panel displays |
US5451830A (en) * | 1994-01-24 | 1995-09-19 | Industrial Technology Research Institute | Single tip redundancy method with resistive base and resultant flat panel display |
KR950034365A (ko) * | 1994-05-24 | 1995-12-28 | 윌리엄 이. 힐러 | 평판 디스플레이의 애노드 플레이트 및 이의 제조 방법 |
KR100307514B1 (ko) | 1994-07-30 | 2001-12-01 | 김영환 | 차지펌프회로 |
TW289864B (zh) * | 1994-09-16 | 1996-11-01 | Micron Display Tech Inc | |
US5975975A (en) * | 1994-09-16 | 1999-11-02 | Micron Technology, Inc. | Apparatus and method for stabilization of threshold voltage in field emission displays |
US5578896A (en) * | 1995-04-10 | 1996-11-26 | Industrial Technology Research Institute | Cold cathode field emission display and method for forming it |
US5620832A (en) * | 1995-04-14 | 1997-04-15 | Lg Electronics Inc. | Field emission display and method for fabricating the same |
US5621272A (en) * | 1995-05-30 | 1997-04-15 | Texas Instruments Incorporated | Field emission device with over-etched gate dielectric |
US5632664A (en) * | 1995-09-28 | 1997-05-27 | Texas Instruments Incorporated | Field emission device cathode and method of fabrication |
US5648699A (en) * | 1995-11-09 | 1997-07-15 | Lucent Technologies Inc. | Field emission devices employing improved emitters on metal foil and methods for making such devices |
-
1995
- 1995-06-05 TW TW084105623A patent/TW289864B/zh not_active IP Right Cessation
- 1995-07-14 JP JP20176995A patent/JP3082897B2/ja not_active Expired - Fee Related
- 1995-07-15 KR KR1019950021251A patent/KR100235504B1/ko not_active IP Right Cessation
- 1995-07-17 FR FR9508619A patent/FR2724767B1/fr not_active Expired - Fee Related
- 1995-07-17 DE DE19526042A patent/DE19526042C2/de not_active Expired - Fee Related
-
1997
- 1997-07-18 US US08/897,240 patent/US5866979A/en not_active Expired - Lifetime
-
1998
- 1998-11-12 US US09/190,737 patent/US6020683A/en not_active Expired - Fee Related
-
1999
- 1999-12-15 US US09/461,917 patent/US6186850B1/en not_active Expired - Fee Related
-
2000
- 2000-11-27 US US09/723,012 patent/US6398608B1/en not_active Expired - Fee Related
-
2002
- 2002-02-14 US US10/077,529 patent/US6676471B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US6398608B1 (en) | 2002-06-04 |
DE19526042A1 (de) | 1996-03-21 |
KR960012179A (ko) | 1996-04-20 |
US6186850B1 (en) | 2001-02-13 |
JP3082897B2 (ja) | 2000-08-28 |
FR2724767A1 (fr) | 1996-03-22 |
US6020683A (en) | 2000-02-01 |
FR2724767B1 (fr) | 1997-03-28 |
DE19526042C2 (de) | 2003-07-24 |
US20020098765A1 (en) | 2002-07-25 |
US6676471B2 (en) | 2004-01-13 |
US5866979A (en) | 1999-02-02 |
KR100235504B1 (ko) | 1999-12-15 |
JPH08202286A (ja) | 1996-08-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |