TW208721B - - Google Patents

Abstract

An economical method for applying nitride layers to titanium and titanium alloys. In a short time, layer thicknesses of 20 mu m are achieved by nitriding under pressure in an ammonia atmosphere. Temperatures of 500 to 1000 DEG C and pressures of 0.2 to 10 Mpa are required for this purpose.

Description

A6 B6 2087^1 五、發明説明（1 ) 本發明有關於一種方法，用於氮化物覆蓋至由鈦及鈦 合金組成之零件上，此方法俗使該零件在壓力及在高於5 〇 〇 °C .之溫度下，受氨或含氨氣體混合物之熱化學處理。 鈦在作為建築材料方面比鋼具備一些更佳之點，亦即 ，其有低比重，抗腐蝕性及高強度。在另一方面，其硬度 相當低，而需要有表面處理以增加其抗磨損力。此表面處 理通常包括産生碩化鈦及一氮化鈦層。迄今已知用來氮化 由鈦及鈦合金組成之零件的方法包括了使用高能氣體或電 磁場，這些方法非常昂貴，且只能施用於具有簡單幾何構 造之零件。 在DE-PS 17 96 212中，提到於相當 高溫度及常壓下，在氨氣圍中藉著形成氮化物層以達到硬 化鈦的目的。 雖然如此做是為了造成相當厚而硬之層，此方法並無 實用價值，因為所牽涉到之氫擴散會使組件之核心變脆。 EP — OS 0 105 835敘述一種方法，可 在由鈦及鈦合金組成之組件上製成氮化物層，其傜將組件 露在壓熱器中，至壓力為至少1 OMP a及溫度為至少2 〇 〇°C，且在氨氣圍中。在此例中，氨必須非常純。最好 是氮化作用在9 0〜1 3 OMPa及9 3 0°〜1 0 0 0 °C之溫度中發生。此方法有一缺點，即由於使用了壓熱器 及極純之氨，使其極為昂貴，且2 0 urn厚之層只能在3 或更多小時之期間内製得。 故本發明之目標在發展一種方法，使氮化物層覆蓋在 ί請先閱讀背面之注意事項再填寫本頁) .裝· •綠· 甲 4(210X297 乂沒） -3 - 08'似 A6 B6 五、發明説明（2 ) (請先閱讀背面之注竞事項再填寫本頁) 由鈦及鈦合金組成之零件上，俗藉著用氨或含氨之氣體混 合物對零件作熱化學處理，其中在一壓力下及在高於5 0 〇 °C之溫度下，此方法為很經濟的，且能使氮化物層在相 當短之時間内形成，厚度為2 0 urn或更大。 依照本發明，可藉著在5 0 0〜1 0 0 0°C之溫度及 0 . 2〜1 0 Μ P a之壓力中進行處理，而逹到此目標。 其中氨之分壓須至少0. 2MPa。 已證明7 0 0- 9 5 0°€：之溫度及0.5-71^?& 之壓力有特別之優點，其中亦必須使氨之分壓為至少0 . 2 Μ P a 〇A6 B6 2087 ^ 1 V. Description of the invention (1) The present invention relates to a method for covering the parts composed of titanium and titanium alloys with nitrides. This method generally makes the parts under pressure and above 500. At a temperature of ° C, it is subjected to thermochemical treatment of ammonia or a gas mixture containing ammonia. Titanium has some advantages over steel as a building material, that is, it has a low specific gravity, corrosion resistance and high strength. On the other hand, its hardness is quite low, and surface treatment is required to increase its wear resistance. This surface treatment usually involves the generation of a titanium master and a titanium nitride layer. The methods known to date for nitriding parts composed of titanium and titanium alloys include the use of high-energy gases or electromagnetic fields. These methods are very expensive and can only be applied to parts with a simple geometric construction. In DE-PS 17 96 212, it is mentioned that at a relatively high temperature and normal pressure, the purpose of hardening titanium is achieved by forming a nitride layer in an ammonia gas enclosure. Although this is done to create a fairly thick and hard layer, this method has no practical value because the hydrogen diffusion involved can make the core of the component brittle. EP — OS 0 105 835 describes a method for forming a nitride layer on a component composed of titanium and a titanium alloy, its exposing the component in an autoclave to a pressure of at least 1 OMP a and a temperature of at least 2 〇〇 ° C, and in the ammonia gas. In this case, the ammonia must be very pure. Preferably, nitridation occurs at a temperature of 9 0 ~ 1 3 OMPa and 9 3 0 ° ~ 1 0 0 0 ° C. This method has the disadvantage that it is extremely expensive due to the use of autoclaves and extremely pure ammonia, and that a 20 urn thick layer can only be prepared within a period of 3 or more hours. Therefore, the goal of the present invention is to develop a method to cover the nitride layer with ί, please read the precautions on the back before filling in this page). Install · • Green · A 4 (210X297 佂 没) -3-08 'like A6 B6 5. Description of the invention (2) (please read the notes on the back and then fill in this page) On the parts composed of titanium and titanium alloys, it is common to use ammonia or ammonia-containing gas mixtures for thermochemical treatment of the parts. Under a pressure and at a temperature higher than 500 ° C, this method is very economical, and enables a nitride layer to be formed in a relatively short time, with a thickness of 20 urn or more. According to the present invention, this goal can be achieved by processing at a temperature of 500 to 100 ° C. and a pressure of 0.2 to 10 M Pa. 2MPa。 Wherein the partial pressure of ammonia must be at least 0. 2MPa. It has been proved that the temperature of 7 0 0- 9 5 0 ° €: the temperature and the pressure of 0.5-71 ^? &Amp; have special advantages, among which the partial pressure of ammonia must also be at least 0.2 Mpa.

經由此種加壓方法，由鈦及鈦合金組成之組件，不論 有任何形狀及大小，皆可在箱式爐中成為具有2 0 厚 或更厚之氮化物層，此已為足夠的厚。驚人的是不需要格 外純之氣體，只要正常之商業级品質的氨便足夠。此外， 可以混合氮與氨，因而在氮化過程中只需至少0. 2MP a之氨分壓便可。 在廣大之壓力範圍内，所形成一氮化鈦層之厚度視溫 度及處理時間而定。表面層為金色，且有顯著增加乏·%度 。當壓力在高於6MP a之範圍内，層之厚度幾乎與壓力 無關。 下圖示出在由純鈦組成之零件上一氮化鈦層之形成， 俗為含氨氣團中壓力與溫度之函數。 即使在5 0 0 °C之溫度，例如在2MPa (=20巴 )之絶對壓力下，1小時後可測出1 〇 u m厚的T i N層 甲4(210X297公沒） -4 - Α6 ____Β6 五、發明説明（3 ) ◊在8 8 0 °C時，此例中可構成2 0 um厚之純Τ i Ν層 Ο 當壓力為6MPa (=6 0巴），構成3 0ttm之τ i Ν層，此偽例如當樣品保持在8 8 0 °C中1小時之時間 後所逹成。 當壓力更增加至9MPa (=9 0巴）時，壓力對T i N層之厚度的效應會減低。此增加不再為線性的。即使 壓力再高，由於緊密T i N層之快速形成，只有氮經由該 層之擴散為依時間而變之因素。 與純鈦有相同方式，例如為T i A 1 6V4之欽合金亦 可被氮化。 這些覆蓋層不需用到壓熱器，但可在標準商用箱式爐 中進行處理。 請先KI讀背面之注意事項再填寫本頁) •装· •線· 甲 4 (210X297 公发） -5 *Through this pressurization method, components made of titanium and titanium alloys, regardless of their shape and size, can become a nitride layer with a thickness of 20 or more in a box furnace, which is already sufficiently thick. Surprisingly, no extra pure gas is needed, as long as normal commercial quality ammonia is sufficient. In addition, nitrogen and ammonia can be mixed, so that only a partial pressure of ammonia of at least 0.2 MP a is required during the nitriding process. Over a wide range of pressures, the thickness of a titanium nitride layer formed depends on temperature and processing time. The surface layer is golden, and there is a significant increase. When the pressure is in the range above 6MP a, the thickness of the layer is almost independent of the pressure. The figure below shows the formation of a titanium nitride layer on a part composed of pure titanium, commonly a function of pressure and temperature in an ammonia-containing air mass. Even at a temperature of 500 ° C, such as an absolute pressure of 2 MPa (= 20 bar), a 1 μm thick TiN layer 4 (210X297 male) can be measured after 1 hour -4-Α6 ____ Β6 V. Description of the invention (3) ◊ At 8 8 0 ° C, this example can form a pure T i Ν layer with a thickness of 20 um. When the pressure is 6 MPa (= 60 bar), it forms a τ i Ν of 3 0ttm Layer, this pseudo example is formed when the sample is kept at 880 ° C for 1 hour. When the pressure is increased to 9MPa (= 90 bar), the effect of pressure on the thickness of the TiN layer will be reduced. This increase is no longer linear. Even if the pressure is higher, due to the rapid formation of the tight TiN layer, only the diffusion of nitrogen through the layer is a time-dependent factor. In the same way as pure titanium, for example Ti alloy A6 6V4 can also be nitrided. No autoclaves are required for these overlays, but they can be processed in standard commercial box furnaces. Please read the precautions on the back of KI before filling out this page) • Install · • Line · Armor 4 (210X297 Public Issue) -5 *

Claims (1)

愈 A7 B7 C7 D7 (A) 六、中访專利範81 r 〇81乙1 附件二：&第79109059號專利申請案 中文申請專利範圍修正本 民國82年2月修正 1 . 一種方法，用於將氮化物層覆蓋在由鈦及鈦合金 組成之零件上，此方法僳在壓力以及高於5001之溫度 下，使該零件受氨或含氨氣體混合物之熱化學處理，此方 法之特徴在該處理係在500〜1〇〇〇它之溫度中及 0. 2〜lOMPa之壓力中進行，且氨之分壓須為至少 0 . 2 Μ P a 〇 2 ·如申請專利範圍第項之方法，其特徵在於該處 理像在7 0 ◦〜9 5 0 *0之溫度及在〇 . 5〜7 μ p a之 壓力中進行，且氨之分壓須為至少0. 2N1Pa (請先«!讀背面之注意事項再填寫本頁) .¾. 經濟部屮央標準局貝工消贽合作社印製 本《»尺度適用中B Η家標準(CNS) T4規格(210x297公*)A7 B7 C7 D7 (A) VI. China Interview Patent Scope 81 r 〇81 B 1 Annex II: & Patent Application No. 79109059 Chinese Application Patent Scope Amendment February 2002 Amendment 1. A method for The nitride layer is covered on the part composed of titanium and titanium alloy. This method is to subject the part to thermochemical treatment of ammonia or an ammonia-containing gas mixture under pressure and a temperature higher than 5001. The treatment is carried out at a temperature of 500 ~ 1000, and a pressure of 0.2 ~ 10 MPa, and the partial pressure of ammonia must be at least 0.2 MPa Pa2. It is characterized in that the processing is carried out at a temperature of 7 0 ◦ ~ 9 5 0 * 0 and a pressure of 0.5 ~ 7 μ pa, and the partial pressure of ammonia must be at least 0.2N1Pa (please first «! Read the back Please pay attention to this page and then fill out this page). ¾. Printed by the Beigong Xiaozhi Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs "» Standards Applicable to B Η Family Standards (CNS) T4 Specification (210x297)