TW202124499A - 黑色阻劑用感光性樹脂組成物、遮光膜、濾色器、觸控面板及顯示裝置 - Google Patents

黑色阻劑用感光性樹脂組成物、遮光膜、濾色器、觸控面板及顯示裝置 Download PDF

Info

Publication number
TW202124499A
TW202124499A TW109146244A TW109146244A TW202124499A TW 202124499 A TW202124499 A TW 202124499A TW 109146244 A TW109146244 A TW 109146244A TW 109146244 A TW109146244 A TW 109146244A TW 202124499 A TW202124499 A TW 202124499A
Authority
TW
Taiwan
Prior art keywords
light
solvent
photosensitive resin
resin composition
shielding film
Prior art date
Application number
TW109146244A
Other languages
English (en)
Chinese (zh)
Inventor
内田一幸
小川淳也
Original Assignee
日商日鐵化學材料股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商日鐵化學材料股份有限公司 filed Critical 日商日鐵化學材料股份有限公司
Publication of TW202124499A publication Critical patent/TW202124499A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/13338—Input devices, e.g. touch panels
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0385—Macromolecular compounds which are rendered insoluble or differentially wettable using epoxidised novolak resin
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Optics & Photonics (AREA)
  • Human Computer Interaction (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
TW109146244A 2019-12-26 2020-12-25 黑色阻劑用感光性樹脂組成物、遮光膜、濾色器、觸控面板及顯示裝置 TW202124499A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019236814 2019-12-26
JP2019-236814 2019-12-26

Publications (1)

Publication Number Publication Date
TW202124499A true TW202124499A (zh) 2021-07-01

Family

ID=76508492

Family Applications (1)

Application Number Title Priority Date Filing Date
TW109146244A TW202124499A (zh) 2019-12-26 2020-12-25 黑色阻劑用感光性樹脂組成物、遮光膜、濾色器、觸控面板及顯示裝置

Country Status (4)

Country Link
JP (1) JP2021105711A (ja)
KR (1) KR20210083185A (ja)
CN (1) CN113050372A (ja)
TW (1) TW202124499A (ja)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6318699B2 (ja) 2014-02-27 2018-05-09 凸版印刷株式会社 黒色感光性樹脂組成物、ブラックマトリクス、ブラックマトリクス基板、カラーフィルタ、液晶表示装置及び有機エレクトロルミネッセンス表示装置

Also Published As

Publication number Publication date
KR20210083185A (ko) 2021-07-06
CN113050372A (zh) 2021-06-29
JP2021105711A (ja) 2021-07-26

Similar Documents

Publication Publication Date Title
JP6426469B2 (ja) ブラックマトリックス用感光性樹脂組成物およびその製造方法
TWI686669B (zh) 遮光膜用感光性樹脂組成物、使其硬化而成的遮光膜及彩色濾光片
JP2011039165A (ja) アルカリ可溶性光硬化型組成物、該組成物を使用した硬化塗膜及び透明部材
JP6713746B2 (ja) スペーサー機能を有する遮光膜用の感光性樹脂組成物、遮光膜、液晶表示装置、スペーサー機能を有する遮光膜用の感光性樹脂組成物の製造方法、遮光膜の製造方法、および液晶表示装置の製造方法
TWI709818B (zh) 具有間隔件功能的遮光膜用的感光性樹脂組成物、遮光膜、液晶顯示裝置、具有間隔件功能的遮光膜用的感光性樹脂組成物的製造方法、遮光膜的製造方法以及液晶顯示裝置的製造方法
KR20170113390A (ko) 차광막용 감광성 수지 조성물, 이것을 경화시킨 차광막을 구비한 디스플레이용 기판, 및 디스플레이용 기판의 제조 방법
KR20200115270A (ko) 감광성 수지 조성물, 감광성 수지 조성물을 경화해서 이루어지는 경화막, 경화막 부착 기판 및 경화막 부착 기판의 제조 방법
TW202340861A (zh) 感光性樹脂組成物、使感光性樹脂組成物硬化而成的硬化膜、附有硬化膜的基板及附有硬化膜的基板的製造方法
TWI829905B (zh) 黑色抗蝕劑用感光性樹脂組成物以及使其硬化而成的遮光膜以及彩色濾光片
TW202115147A (zh) 黑阻劑用感光性樹脂組成物、該感光性樹脂組成物的製造方法、及使其硬化而成的遮光膜、具有該遮光膜的彩色濾光片及觸控面板、具有該彩色濾光片及觸控面板的顯示裝置
TW202124499A (zh) 黑色阻劑用感光性樹脂組成物、遮光膜、濾色器、觸控面板及顯示裝置
TW202138418A (zh) 感光性樹脂組成物及其硬化膜、具有該硬化膜的彩色濾光片
KR20220002124A (ko) 블랙 레지스트용 감광성 수지 조성물, 그 감광성 수지 조성물의 제조 방법 및 이것을 경화하여 이루어지는 차광막, 그 차광막을 갖는 컬러 필터 및 터치 패널, 그 컬러 필터 및 터치 패널을 갖는 표시 장치
JP2024068130A (ja) ブラックレジスト用感光性樹脂組成物、遮光膜、カラーフィルター、タッチパネルおよび表示装置
TW202419474A (zh) 黑色阻劑用感光性樹脂組成物、遮光膜、濾色器、觸控面板及顯示裝置
CN117991589A (zh) 黑色阻剂用感光性树脂组合物、遮光膜、滤色器、触控面板及显示装置
KR20200115269A (ko) 감광성 수지 조성물, 감광성 수지 조성물을 경화해서 이루어지는 경화막, 경화막 부착 기판 및 경화막 부착 기판의 제조 방법
JP2023051765A (ja) 感光性樹脂組成物、硬化膜、カラーフィルター、タッチパネルおよび表示装置
TW202349036A (zh) 感光性樹脂組成物、硬化膜、顯示器構成要素及顯示裝置
TW202307479A (zh) 資訊顯示裝置用硬化膜、透明硬化膜用組成物及資訊顯示裝置
TW202319407A (zh) 感光性樹脂組成物、硬化膜、彩色濾光片、觸控面板及顯示裝置
TW202041561A (zh) 含有聚合性不飽和基之鹼可溶性樹脂之製造方法、含有聚合性不飽和基之鹼可溶性樹脂、氫化化合物及其製造方法、感光性樹脂組成物及其硬化所成之硬化膜、含有該硬化膜作為構成成分之觸控面板及彩色濾光片
KR20230100680A (ko) 블랙 레지스트용 감광성 수지 조성물, 그 제조 방법, 차광막, 컬러 필터, 터치 패널 및 표시 장치
CN111752101A (zh) 感光性树脂组合物、硬化膜、带有硬化膜的基板及带有硬化膜的基板的制造方法
CN118259550A (zh) 感光性树脂组合物、硬化膜、彩色滤光片、触摸面板及显示装置