TW202007479A - Origin position setting mechanism and origin position setting method for grinding device installing a grinding device with high precision without using a contact sensor - Google Patents
Origin position setting mechanism and origin position setting method for grinding device installing a grinding device with high precision without using a contact sensor Download PDFInfo
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- TW202007479A TW202007479A TW108126586A TW108126586A TW202007479A TW 202007479 A TW202007479 A TW 202007479A TW 108126586 A TW108126586 A TW 108126586A TW 108126586 A TW108126586 A TW 108126586A TW 202007479 A TW202007479 A TW 202007479A
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- 238000000034 method Methods 0.000 title claims description 16
- 238000001514 detection method Methods 0.000 claims abstract description 50
- 239000004575 stone Substances 0.000 claims description 55
- 238000009966 trimming Methods 0.000 abstract description 21
- 238000000691 measurement method Methods 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 238000001179 sorption measurement Methods 0.000 description 4
- 239000006061 abrasive grain Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B47/00—Drives or gearings; Equipment therefor
- B24B47/22—Equipment for exact control of the position of the grinding tool or work at the start of the grinding operation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B47/00—Drives or gearings; Equipment therefor
- B24B47/20—Drives or gearings; Equipment therefor relating to feed movement
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/10—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
- B24B53/06—Devices or means for dressing or conditioning abrasive surfaces of profiled abrasive wheels
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
- B24B53/12—Dressing tools; Holders therefor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
Abstract
Description
本發明係關於在研削裝置中,用於設定研削磨石相對於卡盤台之原點位置的原點位置設定機構及原點位置設定方法。The invention relates to an origin position setting mechanism and an origin position setting method for setting an origin position of a grinding stone with respect to a chuck table in a grinding device.
形成有多個IC或LSI等元件之半導體晶圓等的工件係研削其背面而形成預定厚度,藉由切割裝置等的分割裝置而分割為各個元件,並用於行動電話、電腦等的電子設備。Workpieces such as semiconductor wafers on which multiple ICs or LSIs are formed are ground on the back to form a predetermined thickness, and are divided into individual components by a dividing device such as a dicing device, and are used in electronic devices such as mobile phones and computers.
研削工件背面之研削裝置的構成係具備:卡盤台,保持工件,及研削單元,可旋轉地支撐研削磨石,該研削磨石係研削被卡盤台保持之工件,且該研削裝置可有效率地研削工件。 在此種研削裝置中,要完成將半導體晶圓等的工件背面研削並完工至預定厚度,需要進行設置(setup),該設置係高精確度地掌握從卡盤台保持面到研削磨石加工面(下表面)的相對距離。The grinding device for grinding the back of the workpiece consists of: a chuck table, holding the workpiece, and a grinding unit that rotatably supports the grinding stone. The grinding stone grinds the workpiece held by the chuck table, and the grinding device can have Grind the workpiece efficiently. In this type of grinding device, to complete grinding of the back surface of a workpiece such as a semiconductor wafer to a predetermined thickness, a setup is required, which is a high-precision grasp from the chuck table holding surface to grinding stone processing The relative distance of the surface (lower surface).
作為掌握卡盤台保持面到研削磨石加工面的相對距離之方法,以往,是將預先設定在距卡盤台保持面預定距離之上方高度位置的接觸感應器移動至研削磨石下方並使研削單元下降,在研削磨石接觸到接觸感應器的時間點,檢測研削單元的位置,並由所檢測出的該位置與該預定距離來掌握該相對距離(例如參照專利文獻1)。As a method for grasping the relative distance between the holding surface of the chuck table and the processing surface of the grinding stone, in the past, a contact sensor previously set at a height above a predetermined distance from the holding surface of the chuck table was moved below the grinding stone and the The grinding unit descends, and when the grinding stone touches the contact sensor, the position of the grinding unit is detected, and the relative distance is grasped from the detected position and the predetermined distance (for example, refer to Patent Document 1).
[先前技術文獻] [專利文獻] [專利文獻1]日本特許5815422號公報[Prior Technical Literature] [Patent Literature] [Patent Document 1] Japanese Patent No. 5815422
[發明所欲解決的課題] 然而,在上述以往的方法中,在設置接觸感應器時,每次都要移動接觸感應器至研削磨石下方,使裝置的動作機構變複雜。又,研削磨石為如擦光輪等較柔軟構件所構成時,因接觸感應器的前端形狀形成為細針狀,故接觸感應器接觸研削磨石時會咬入研削磨石、或研削磨石會凹陷,而有誤判接觸位置之虞。[Problems to be solved by the invention] However, in the above-mentioned conventional method, when the touch sensor is installed, the touch sensor must be moved under the grinding stone every time, which complicates the operation mechanism of the device. In addition, when the grinding stone is composed of a relatively soft member such as a polishing wheel, the shape of the tip of the contact sensor is formed into a thin needle, so the contact sensor will bite into the grinding stone or grinding stone when it contacts the grinding stone It will sag, and there is a risk of misjudging the contact position.
因此,在掌握卡盤台保持面至研削磨石加工面的相對距離之設置中,其課題為可不使用接觸感應器而完成,且可高精確度地設置。Therefore, in setting the relative distance between the holding surface of the chuck table and the grinding grindstone processing surface, the problem is that it can be completed without using a touch sensor and can be set with high accuracy.
[解決課題的技術手段] 為了解決上述課題,本發明為一種研削裝置的原點位置設定機構,用於設定研削磨石之相對於卡盤台的原點位置;該研削裝置係具備:卡盤台,具備保持工件之保持面;研削單元,具備主軸及使該主軸旋轉驅動的馬達,該主軸裝設有將保持於該卡盤台之工件進行研削的研削磨石;及研削單元進給機構,使該研削單元在與該卡盤台保持面垂直的方向上移動;該研削裝置的原點位置設定機構之特徵在於具備:電流值檢測手段,檢測該馬達之負載電流值;研削單元位置檢測手段,係檢測藉由該研削單元進給機構而被移動之該研削單元的位置;及控制手段,係根據從該電流值檢測手段及該研削單元位置檢測手段得到的檢測訊號而設定該原點位置;該控制手段係藉由該研削單元進給機構而使旋轉之該研削磨石在垂直方向往該卡盤台移動,使該研削磨石之研削面接觸修整板表面,該修整板具備被保持於該卡盤台保持面且用以修整該研削磨石之板狀磨石,藉此,將在該馬達之負載電流值變成為預先設定閾值以上之時間點,將從該研削單元位置檢測手段所檢測出之該研削單元之位置減去該修整板之厚度所得的位置,設定為該原點位置。[Technical means to solve the problem] In order to solve the above-mentioned problems, the present invention is an origin position setting mechanism of a grinding device for setting the origin position of a grinding stone relative to a chuck table; the grinding device is provided with: a chuck table, which is provided with a holder for holding a workpiece Grinding unit, equipped with a spindle and a motor that drives the spindle to rotate, the spindle is equipped with a grinding grindstone that grinds the workpiece held on the chuck table; and a grinding unit feed mechanism that makes the grinding unit work with The holding surface of the chuck table moves in the vertical direction; the origin position setting mechanism of the grinding device is characterized by: current value detection means, which detects the load current value of the motor; grinding unit position detection means, which detects The position of the grinding unit that is moved by the grinding unit feed mechanism; and the control means sets the origin position based on the detection signals obtained from the current value detection means and the grinding unit position detection means; the control means is borrowed The grinding unit feed mechanism moves the grinding grindstone rotating in the vertical direction to the chuck table, so that the grinding surface of the grinding grindstone contacts the surface of the dressing plate, and the dressing plate is held by the chuck table. The plate-shaped grindstone used to trim the grinding grindstone, by which the grinding current detected by the grinding unit position detection means will be changed at a time point when the load current value of the motor becomes a predetermined threshold value or more The position of the unit minus the thickness of the trimming plate is set as the origin position.
又,為了解決上述課題,本發明為一種研削裝置的原點位置設定方法,用於設定研削磨石之相對於卡盤台的原點位置;該研削裝置具備:卡盤台,具備保持工件之保持面;研削單元,具備主軸及使該主軸旋轉驅動的馬達,該主軸裝設有將保持於該卡盤台之工件進行研削的研削磨石;及研削單元進給機構,使該研削單元在與該卡盤台之保持面垂直的方向上移動;該研削裝置的原點位置設定方法之特徵在於具備:修整板保持步驟,將修整板保持於該卡盤台,該修整板具備用於實施該研削磨石之修整的板狀磨石;研削磨石接觸步驟,藉由該研削單元進給機構而將以該馬達旋轉之該研削磨石而在垂直方向往該卡盤台移動,使該研削磨石接觸該修整板表面;及位置記憶步驟,在該馬達之負載電流值變成為閾值以上之時間點,記憶該研削單元的位置;將由該位置記憶步驟所記憶之研削單元的位置減去該修整板之厚度所得的位置,設定為該原點位置。In addition, in order to solve the above-mentioned problems, the present invention is a method of setting the origin position of a grinding device for setting the origin position of a grinding stone relative to a chuck table; the grinding device is provided with: a chuck table provided with a workpiece holding Holding surface; grinding unit, equipped with a spindle and a motor that drives the spindle to rotate, the spindle is equipped with a grinding stone for grinding the workpiece held on the chuck table; and a grinding unit feed mechanism, which makes the grinding unit in It moves in the direction perpendicular to the holding surface of the chuck table; the origin position setting method of the grinding device is characterized by: a trimming plate holding step, which holds the trimming plate on the chuck table, and the trimming plate is provided for implementation The trimmed plate-shaped grindstone of the grinding grindstone; the grinding grindstone contacting step moves the grinding grindstone rotated by the motor to the chuck table in the vertical direction by the grinding unit feed mechanism, so that the Grinding grindstone contacts the surface of the dressing board; and the position memory step, at the time when the load current value of the motor becomes above the threshold value, memorize the position of the grinding unit; subtract the position of the grinding unit memorized by the position memory step The position obtained by the thickness of the trimming plate is set as the origin position.
[發明功效] 關於本發明之原點位置設定機構係藉由研削單元進給機構而將旋轉之研削磨石在垂直方向往卡盤台移動,使研削磨石之研削面接觸被保持於卡盤台保持面之修整板的表面,藉此,因為可以在馬達之負載電流值變成為預先設定閾值以上之時間點,將從研削單元位置檢測手段所檢測出研削單元之位置減去修整板之厚度所得的位置,設定為原點位置,故可不使用接觸感應器而完成,且可高精確度地設置。[Effect of invention] The origin position setting mechanism of the present invention moves the rotating grinding stone to the chuck table in the vertical direction by the grinding unit feed mechanism, so that the grinding surface contact of the grinding stone is held on the chuck table holding surface The surface of the trimming board can be used to subtract the thickness of the trimming board from the position of the grinding unit detected by the grinding unit position detection means when the load current value of the motor becomes a predetermined threshold or more The setting is the origin position, so it can be done without using a touch sensor, and can be set with high accuracy.
關於本發明之原點位置設定方法係具備:研削磨石接觸步驟,藉由研削單元進給機構而將以馬達旋轉之研削磨石在垂直方向往卡盤台移動,使研削磨石接觸修整板表面;及位置記憶步驟,在旋轉之研削磨石接觸修整板表面且馬達之負載電流值變成為閾值以上之時間點,記憶研削單元的位置;因為可以將從位置記憶步驟所記憶之研削單元的位置減去修整板之厚度所得的位置,設定為原點位置,故可不使用接觸感應器而完成,且可高精確度地設置。The origin position setting method of the present invention includes: a grinding grindstone contacting step, the grinding grindstone rotated by a motor is moved to a chuck table in a vertical direction by a grinding unit feeding mechanism, and the grinding grindstone contacts the dressing plate Surface; and position memory step, when the rotating grinding stone contacts the surface of the dressing board and the load current value of the motor becomes above the threshold, the position of the grinding unit is memorized; because the grinding unit can be memorized from the position memory step The position obtained by subtracting the thickness of the trimming plate from the position is set as the origin position, so it can be completed without using a contact sensor and can be set with high accuracy.
圖1所示之研削裝置1,係藉由研削單元6而將保持於卡盤台30上之半導體晶圓等的工件W進行研削的裝置。研削裝置1之基台10上的前方(-X方向側)成為相對於卡盤台30之裝卸工件W或修整板B的區域,基台10上的後方(+X方向側)成為藉由研削單元6而進行保持於卡盤台30上之工件W的研削或修整板B的研削(研削單元6的研削磨石641之修整)之區域。
又,在研削裝置1所進行之研削,亦包括以毛氈等之不織布所構成的研磨墊來研磨工件W。The
在研削裝置1之基台10上的後方側立設有柱體17,在柱體17前面配設有研削單元進給機構7,該研削單元進給機構7係使研削單元6在與卡盤台30的保持面300a垂直之方向上(Z軸方向)移動。研削單元進給機構7係由具有Z軸方向之軸心的滾珠螺桿70、與滾珠螺桿70平行地配設之一對導軌71、與滾珠螺桿70連結並使滾珠螺桿70轉動之馬達72、使內部之螺帽螺合於滾珠螺桿70並使側部滑接於導軌71之昇降板73、及與昇降板73連結並保持研削單元6之支架74所構成,若以馬達72使滾珠螺桿70轉動,則隨著昇降板73被導軌71導引並在Z軸方向上來回移動,支撐於支架74之研削單元6亦在Z軸方向上來回移動。On the rear side of the
研削單元6係具備:主軸60,軸方向為Z軸方向;外殼61,可旋轉地支撐主軸60;馬達62,旋轉驅動主軸60;底座63,裝設於主軸60的下端;及研削輪64,可裝卸地連接於底座63。研削輪64具備:輪基台640、及研削磨石641,具備略呈長方體形狀外形且環狀配設多個於輪基台640的下表面。研削磨石641係以適當結合劑黏著並固定金剛石磨粒等而成型。
外形為圓形狀之卡盤台30係具備:吸附部300,由多孔構件等所構成且吸附工件W;及框體301,支撐吸附部300。卡盤台30之吸附部300係與未圖示的吸引源連通,該吸引源是由真空泵或噴射器等真空產生裝置所構成,以吸引源吸引所產生的吸力傳達至成為卡盤台30之保持面300a的上表面,藉此,卡盤台30為可在其保持面300a上吸取保持工件W。如圖2所示,保持面300a形成為圓錐面,該圓錐面係以卡盤台30之旋轉中心為頂點且具備極平緩的傾斜度。又,卡盤台30係藉由罩蓋39圍住其周圍,並藉由未圖示之X軸方向進給手段,而變得可在基台10上的X軸方向上來回移動,該X軸方向進給手段係配置於罩蓋39及與罩蓋39連結之蛇腹罩蓋39a下方。The chuck table 30 having a circular shape is provided with: an
如圖2所示,卡盤台30的下方配設有由馬達及旋轉軸等所構成之旋轉手段32,卡盤台30係藉由旋轉手段32而變得可繞Z軸方向之軸心旋轉。As shown in FIG. 2, a rotating
如圖2所示,例如卡盤台30是藉由配設於其下方之傾斜調節部35而變得可調節保持面300a的傾斜程度。傾斜調節部35是在卡盤台30底面側且在周方向隔有固定間隔處配設多個(例如3個)。傾斜調節部35具備:支撐柱35a,支撐卡盤台30;連結部35e,透過軸承等而與支持柱35a連結;螺絲部35b,螺合於連結部35e並可繞Z軸方向之軸心旋轉;及馬達35d,透過軸承等所構成的連結器35c而與螺絲部35b連結;若馬達35d使螺絲部35b轉動,則支持柱35a隨之在Z軸方向上來回移動,調節卡盤台30之保持面300a相對於水平面的傾斜程度。As shown in FIG. 2, for example, the chuck table 30 is adjusted by the
如圖1所示,例如在卡盤台30之移動路徑旁配設有接觸式之一對高度測量手段(高度規),亦即測量卡盤台30之保持面300a之高度用的第1高度測量手段381、及測量被保持於卡盤台30之工件W上表面Wb之高度用的第2高度測量手段382。As shown in FIG. 1, for example, a pair of contact-type height measuring means (height gauge) is arranged beside the moving path of the chuck table 30, that is, the first height for measuring the height of the holding
第1高度測量手段381及第2高度測量手段382是在其各前端具備接觸頭,該接觸頭係在上下方向上昇降並接觸各被測量面,在將個別接觸頭以適當力推抵至各被測量面之狀態下,進行高度測量。又,第1高度測量手段381及第2高度測量手段382並不限定於接觸式高度規,例如可為反射型光感應器,該反射型光感應器係具備投光部及受光部,且可在非接觸下測量被測量面的高度。
第1高度測量手段381及第2高度測量手段382係與後述控制手段92電性連接。控制手段92係計算出高度差並當作工件W的厚度,該高度差是指在研削加工中,第2高度測量手段382所測量的工件W上表面Wb之高度與第1高度測量手段381所測量的卡盤台30保持面300a之高度的差。The first height measuring means 381 and the second height measuring means 382 are provided with contact heads at their respective front ends. The contact heads are moved up and down in the up-down direction to contact the measured surfaces. After pushing the individual contact heads to each The height is measured in the state of the measured surface. In addition, the first height measuring means 381 and the second height measuring means 382 are not limited to contact height gauges, and may be, for example, a reflective photo sensor. The reflective photo sensor includes a light projection unit and a light receiving unit. Measure the height of the measured surface without contact.
The first height measuring means 381 and the second height measuring means 382 are electrically connected to the control means 92 described later. The control means 92 calculates the height difference and regards it as the thickness of the workpiece W. The height difference means that the height of the upper surface Wb of the workpiece W measured by the second height measuring means 382 and the first height measuring means 381 during the grinding process The measured difference in height of the chuck table 30 holding
如圖2所示,研削裝置1係具備原點位置設定機構9,用以設定研削單元6相對於卡盤台30之原點位置。原點位置設定機構9係具備:電流值檢測手段90,檢測研削單元6之馬達62的負載電流值;研削單元位置檢測手段91,檢測藉由研削單元進給機構7而移動之研削單元6的位置;及控制手段92,根據從電流值檢測手段90及研削單元位置檢測手段91所得到的檢測訊號而設定原點位置。As shown in FIG. 2, the grinding
控制手段92係由根據控制程式進行演算處理之CPU及記憶體等的記憶元件等所構成,並藉由未圖示之配線而與研削單元進給機構7、及未圖示之X軸方向移動手段等電性連接,在控制手段92的控制下,控制研削單元6藉由研削單元進給機構7而在Z軸方向上的移動開始及移動停止、及卡盤台30藉由X軸方向移動手段的移動開始及移動停止等。The control means 92 is composed of a memory element such as a CPU and a memory that performs calculation processing according to a control program, and moves with the grinding
研削單元位置檢測手段91例如具備:尺標910,固定於柱體17並在研削單元6的移動方向上(Z軸方向)延伸,及讀取部911,固定於昇降板73且沿著尺標910與昇降板73一起移動並讀取尺標910之刻度。讀取部911例如為光學式,讀取形成於尺標910之刻度的反射光,檢測尺標910之刻度,並檢測研削單元6在Z軸方向中的高度位置。The grinding unit position detection means 91 includes, for example, a
研削單元位置檢測手段91並不限定於上述例。例如,上述研削單元進給機構7之馬達72為脈衝馬達,該脈衝馬達係藉由未圖示之脈衝振盪器所供給的驅動脈衝而運作。研削單元位置檢測手段91係計算供給至馬達72之驅動脈衝數,而確認研削單元6的高度位置。又,也可為以下構成:將研削單元進給機構7之馬達72作為伺服馬達,並在伺服馬達連接旋轉編碼器。旋轉編碼器係由未圖示之伺服放大器對伺服馬達供給運作訊號後,將編碼器訊號(伺服馬達轉數)對研削單元位置檢測手段91輸出。研削單元位置檢測手段91係藉由所接收之編碼器訊號而計算出研削單元6在Z軸方向中的移動量,並確認其高度位置。The grinding unit position detection means 91 is not limited to the above example. For example, the
以下說明使用研削裝置1實施本發明之原點位置設定方法時的各步驟。The following describes each step when the
(1)修整板保持步驟
圖1所示的修整板B是,例如由用以實施研削磨石641之修整(削磨)的板狀磨石B1、及保持板狀磨石B1之圓形板狀保持板B2所構成。板狀磨石B1是,例如以適當結合劑黏著並固定金剛石磨粒或CBN磨粒並形成為圓形板狀。板狀磨石B1係以接著劑接著於保持板B2的上表面。
關於該修整板B之厚度T1(參照圖2)為已知資訊,預先記憶於控制手段92。(1) Maintenance steps of trimming board
The dressing plate B shown in FIG. 1 is composed of, for example, a plate-shaped grindstone B1 for performing dressing (sharpening) of the
首先,在圖1所示研削裝置1之裝卸區域內,藉由未圖示之搬入搬出手段,將修整板B以表面B1a(板狀磨石B1的上表面)為上側之方式載置於卡盤台30的保持面300a上。接著,將藉由未圖示之吸引源所產生的吸引力傳達至保持面300a,藉此,如圖2所示,使卡盤台30在保持面300a上吸引保持修整板B。First, in the loading and unloading area of the
極平緩的圓錐面之保持面300a,係以與研削磨石641(參照圖2)之研削面(下表面)平行的方式,藉由圖2所示之傾斜調節部35而調節卡盤台30的傾斜程度,藉此,緊貼圓錐面之保持面300a並被吸取保持之修整板B的表面B1a變得相對於研削磨石641之研削面呈平行。The
(2)研削磨石接觸步驟
如圖2所示,卡盤台30係藉由未圖示之X軸方向進給手段而往+X方向移動至研削單元6的下方,並進行研削輪64與保持於卡盤台30之修整板B的對位。
進行研削輪64與修整板B的對位後,隨著以馬達62使主軸60旋轉驅動,研削輪64亦繞Z軸方向之軸心旋轉。
又,因為卡盤台30的目的並非修整研削磨石641,故吸引保持修整板B之卡盤台30可繞Z軸方向之軸心旋轉,或也可為不旋轉之狀態。(2) Grinding stone contact steps
As shown in FIG. 2, the chuck table 30 is moved to the +X direction below the grinding
又,研削單元進給機構7係使研削單元6以對卡盤台30之保持面300a所保持之修整板B之表面B1a呈垂直且以預定研削進給速度下降。
若藉由研削單元進給機構7而開始研削單元6往-Z方向之研削進給時,則圖2所示的電流值檢測手段90開始檢測在旋轉驅動主軸60的馬達62之流動電流值。接著,電流值檢測手段90將所檢測出的馬達62之負載電流值的資訊依序作為檢測訊號而輸送至控制手段92,控制手段92開始監視旋轉驅動主軸60的馬達62之負載電流值。In addition, the grinding
在研削單元6之旋轉研削磨石641為空切狀態下,電流值檢測手段90所檢測之馬達62的負載電流值是成為未滿預先記憶於控制手段92之預定閾值(電流值)。又,該閾值係對應研削磨石641之旋轉速度或修整板B之板狀磨石B1之材質等,而以實驗性、經驗性、或理論性地選擇的電流值。
又,若藉由研削單元進給機構7而開始研削單元6往-Z方向之研削進給時,則藉由研削單元位置檢測手段91依序檢測研削單元6在Z軸方向中的位置,且研削單元位置檢測手段91將檢測訊號(位置資訊)依序發送至控制手段92。When the
接著,以預定研削進給速度下降的研削單元6之旋轉研削磨石641與修整板B的表面B1a接觸。Next, the rotating grinding
(3)位置記憶步驟
原本空切中的研削磨石641接觸修整板B的表面B1a,亦即切入修整板B的表面B1a,因此施加於研削磨石641之研削負荷會變大。接著,在研削輪64旋轉途中時,持續由未圖示之電源供給電力至馬達62,因為即使在研削輪往修整板B之表面B1a切入而使作用在研削磨石641之負荷變大的情況下,也會使主軸60以固定轉數旋轉的方式反饋控制馬達62,故馬達62之負載電流值會上升。亦即,電流值檢測手段90所檢測之馬達62的電流值會急速上升至閾值以上。接著,因為該負載電流值變為閾值以上,所以藉由從電流值檢測手段90所送達的檢測訊號,對旋轉驅動主軸60之馬達62的負載電流值進行監視之控制手段92,會判斷研削磨石641已切入(接觸)修整板B之表面B1a,並停止藉由研削單元進給機構7之往研削單元6的-Z方向之研削進給。(3) Location memory steps
The grinding
又,控制手段92記憶在馬達62負載電流值變成為閾值以上之時間點中的研削單元6的位置。亦即,控制手段92是在停止研削單元進給機構7之往研削單元6的-Z方向之研削進給的時間點中,藉由從研削單元位置檢測手段91所送達的檢測訊號,掌握並記憶該時間點中之研削單元6的位置Z1。Moreover, the control means 92 memorizes the position of the grinding
(4)原點位置之設定
以上述方式實施位置記憶步驟後,控制手段92係以由研削單元6的位置Z1減去修整板B厚度T1所得的位置Z2,作為研削單元6之研削磨石641相對於卡盤台30保持面300a之原點位置,亦即,作為研削磨石641接觸保持面300a時之研削單元6的高度位置,並設定(設置)於研削裝置1。例如,在研削單元進給機構7之馬達72為脈衝馬達的情況下,控制手段92係記憶作為原點位置之脈衝數0的位置。
如上述方式實施設置,該設置係確認研削磨石641之研削面(下表面)接觸卡盤台30之保持面300a時的研削單元6的高度位置,換言之,研削裝置1高精確度地掌握由卡盤台30之保持面300a至研削磨石641之研削面(下表面)的相對距離,藉此,在以圖1所示之卡盤台30保持工件W並進行研削的情況下,能夠以該高度位置Z2作為基準來決定研削單元6之研削進給位置,可對工件W進行高精確度之研削加工。(4) Setting of origin position
After performing the position memory step in the above manner, the control means 92 takes the position Z2 obtained by subtracting the thickness T1 of the trimming plate B from the position Z1 of the grinding
本發明之原點位置設定機構9係藉由研削單元進給機構7使旋轉之研削磨石641於垂直方向往卡盤台30移動,研削磨石641之研削面與保持於卡盤台30之保持面300a的修整板B之表面B1a接觸,藉此,因為能在研削單元6之馬達62之負載電流值變成為預先設定閾值以上之時間點中,將研削單元位置檢測手段91所檢測出的研削單元6之位置Z1減去修整板B之厚度T1所得的位置Z2設定作為原點位置,故可不使用接觸感應器而完成,且可高精確度地設置。The origin
本發明之原點位置設定方法係具備:研削磨石接觸步驟,係藉由研削單元進給機構7而將以研削單元6之馬達62旋轉之研削磨石641於垂直方向往卡盤台30移動,並使研削磨石641接觸修整板B表面B1a;及位置記憶步驟,在旋轉之研削磨石641接觸修整板B之表面B1a且馬達62之負載電流值成為閾值以上之時間點中,記憶研削單元6的位置Z1。因為可將由位置記憶步驟所記憶之研削單元6的位置Z1減去修整板B之厚度T1所得的位置Z2設定作為原點位置,故可不使用接觸感應器而完成,且可進行高精確度地設置。The origin position setting method of the present invention includes: a grinding grindstone contacting step, which moves the grinding
又,以下表示本發明之原點位置設定機構9及原點位置設定方法的效果之具體例(與以往手動設置比較)。
以往研削裝置1所進行手動設置為:操作者以手動將研削磨石641往接近卡盤台30之方向研削進給,且檢測研削磨石641之研削面接觸卡盤台30之保持面300a的位置,並作為原點位置。或是操作者使用預定厚度的基準片(塊規),並找出在研削磨石641之研削面及卡盤台30之保持面300a之間無間隙地容納塊規之狀態,藉此進行該手動設置。並且,在手動設置中,研削磨石641之研削面(下表面)接觸卡盤台30之保持面300a時,研削單元6之高度位置之公差為約20~約25μm的程度。In addition, the following shows specific examples of the effects of the origin
在上述所說明之(3)位置記憶步驟中,在研削磨石641接觸修整板B之表面B1a後,才呈現馬達62之電流值變為閾值以上之變化,亦即在電流值檢測手段90可檢測到該變化為止,會有些微時滯。該時滯為,例如在研削單元6以研削進給速度50μm/秒的研削進給的情況下為0.25秒,以研削進給速度1μm/秒研削進給的情況下變成為10秒,以研削進給速度0.5μm/秒研削進給的情況下變成為20秒的程度。伴隨著該時滯,在研削磨石641接觸修整板B之表面B1a後,到電流值檢測手段90可檢測到該變化為止之研削磨石641的研削量為,在研削進給速度50μm/秒的情況下為12.5μm,在研削進給速度1μm/秒的情況下變成為10μm,在研削進給速度0.5μm/秒的情況下變成為7.5μm程度。In the position memory step (3) described above, the
又,電流值檢測手段90檢測到馬達62之電流值變成為閾值以上的變化,並將該檢測訊號傳送至控制手段92,而在接收到檢測訊號後的控制手段92停止藉由研削單元進給機構7之往研削單元6之-Z方向的研削進給為止,也會有些微時滯。因該時滯,在電流值檢測手段90檢測到馬達62之電流值變成為閾值以上之變化後,到停止往研削單元6之-Z方向的研削進給為止之研削磨石641的研削量為,在研削進給速度50μm/秒的情況下為8μm,在研削進給速度1μm/秒的情況下變成為0.16μm,在研削進給速度0.5μm/秒的情況下變成為0.08μm程度。In addition, the current value detection means 90 detects that the current value of the
因此,本發明之原點位置設定機構9及原點位置設定方法中,可得到研削磨石641之研削面(下表面)接觸卡盤台30之保持面300a時的研削單元6之高度位置的公差為,在研削進給速度50μm/秒的情況下為12.5μm+8μm=20.5μm,在研削進給速度1μm/秒的情況下變成為10μm+0.16μm=10.16μm,在研削進給速度0.5μm/秒的情況下變成為7.5μm+0.08μm=7.58μm。因此,因為公差最大也只有在研削進給速度50μm/秒的情況下的20.5μm,故即使與以往手動設置中的公差約20~25μm相比,本發明之原點位置設定機構9及原點位置設定方法也能夠以同等以上之精確度進行設置。Therefore, in the origin
本發明之原點位置設定機構9及原點位置設定方法並不限定於上述實施方式,在其技術思想範圍內可以各種不同方式實施,此係不需贅言。又,關於隨附圖面所示之研削裝置1的各構成必要條件也並不限定於此,在可發揮本發明效果的範圍內能適當變更。The origin
1‧‧‧研削裝置
10‧‧‧基台
17‧‧‧柱體
30‧‧‧卡盤台
300‧‧‧吸附部
300a‧‧‧保持面
301‧‧‧框體
32‧‧‧旋轉手段
35‧‧‧傾斜調節部
381‧‧‧第1高度測量手段
382‧‧‧第2高度測量手段
39‧‧‧罩蓋
6‧‧‧研削單元
60‧‧‧主軸
61‧‧‧外殼
62‧‧‧馬達
63‧‧‧底座
64‧‧‧研削輪
640‧‧‧輪基台
641‧‧‧研削磨石
7‧‧‧研削單元進給機構
72‧‧‧馬達
9‧‧‧原點位置設定機構
90‧‧‧電流值檢測手段
91‧‧‧研削單元位置檢測手段
910‧‧‧尺標
911‧‧‧讀取部
92‧‧‧控制手段
B‧‧‧ 修整板
W‧‧‧工件1‧‧‧
圖1係表示研削裝置一例之斜視圖。 圖2係說明研削裝置的原點位置設定方法之剖面圖。Fig. 1 is a perspective view showing an example of a grinding device. 2 is a cross-sectional view illustrating a method of setting the origin position of the grinding device.
1‧‧‧研削裝置 1‧‧‧ Grinding device
10‧‧‧基台 10‧‧‧Abutment
17‧‧‧柱體 17‧‧‧pillar
30‧‧‧卡盤台 30‧‧‧Chuck table
300‧‧‧吸附部 300‧‧‧Adsorption Department
300a‧‧‧保持面 300a‧‧‧Keep
301‧‧‧框體 301‧‧‧frame
32‧‧‧旋轉手段 32‧‧‧Rotation means
35‧‧‧傾斜調節部 35‧‧‧Tilt adjustment section
35a‧‧‧支持柱 35a‧‧‧support column
35b‧‧‧螺絲部 35b‧‧‧Screw part
35c‧‧‧連結器 35c‧‧‧Connector
35d‧‧‧馬達 35d‧‧‧Motor
35e‧‧‧連結部 35e‧‧‧Link
381‧‧‧第1高度測量手段 381‧‧‧The first height measurement method
382‧‧‧第2高度測量手段 382‧‧‧The second height measurement method
6‧‧‧研削單元 6‧‧‧ Grinding unit
60‧‧‧主軸 60‧‧‧spindle
61‧‧‧外殼 61‧‧‧Housing
62‧‧‧馬達 62‧‧‧Motor
63‧‧‧底座 63‧‧‧Base
64‧‧‧研削輪 64‧‧‧ Grinding wheel
640‧‧‧輪基台 640‧‧‧wheel abutment
641‧‧‧研削磨石 641‧‧‧ grinding stone
7‧‧‧研削單元進給機構 7‧‧‧ Grinding unit feed mechanism
70‧‧‧滾珠螺桿 70‧‧‧ball screw
71‧‧‧導軌 71‧‧‧rail
72‧‧‧馬達 72‧‧‧Motor
73‧‧‧昇降板 73‧‧‧ Lifting board
74‧‧‧支架 74‧‧‧Bracket
9‧‧‧原點位置設定機構 9‧‧‧Origin position setting mechanism
90‧‧‧電流值檢測手段 90‧‧‧Current value detection method
91‧‧‧研削單元位置檢測手段 91‧‧‧ Grinding unit position detection method
910‧‧‧尺標 910‧‧‧foot scale
911‧‧‧讀取部 911‧‧‧Reading Department
92‧‧‧控制手段 92‧‧‧Control
B‧‧‧修整板 B‧‧‧Finishing board
B1‧‧‧板狀磨石 B1‧‧‧Slabstone
B1a‧‧‧修整板表面 B1a‧‧‧ Finishing board surface
B2‧‧‧保持板 B2‧‧‧ keep plate
T1‧‧‧修整板之厚度 T1‧‧‧ Thickness of trimming board
Z1‧‧‧研削單元的位置 Z1‧‧‧Position of grinding unit
Z2‧‧‧研削單元位置減去修整板厚度所得的位置 Z2‧‧‧The position of grinding unit minus the thickness of trimming board
Claims (2)
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JP2018143441A JP2020019082A (en) | 2018-07-31 | 2018-07-31 | Origin position setting mechanism of grinding device, and origin position setting method |
JP2018-143441 | 2018-07-31 |
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KR (1) | KR20200014193A (en) |
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JP7517875B2 (en) | 2020-06-25 | 2024-07-17 | 株式会社ディスコ | Chuck table and processing device |
CN112123054A (en) * | 2020-09-23 | 2020-12-25 | 河北力准机械制造有限公司 | Automatic compensation grinding machine |
CN112643476B (en) * | 2021-01-29 | 2022-06-28 | 深圳市纬泰技研有限公司 | Mechanical precision grinding machine and operation method thereof |
CN117862965B (en) * | 2024-03-11 | 2024-05-28 | 江苏京创先进电子科技有限公司 | Grinding wheel tool setting Z-axis coordinate determining method and thinning machine |
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JPS5815422B2 (en) | 1977-10-31 | 1983-03-25 | 株式会社神戸製鋼所 | wire winding device |
JPS63174873A (en) * | 1987-01-09 | 1988-07-19 | Disco Abrasive Syst Ltd | Blade face position detecting method for tool and detecting device |
JP3632500B2 (en) * | 1999-05-21 | 2005-03-23 | 株式会社日立製作所 | Rotating machine |
JP4245141B2 (en) * | 2003-04-23 | 2009-03-25 | 株式会社ディスコ | Grinding equipment |
JP4338458B2 (en) * | 2003-06-30 | 2009-10-07 | コマツ工機株式会社 | Grinding apparatus and grinding method |
WO2006049269A1 (en) * | 2004-11-01 | 2006-05-11 | Ebara Corporation | Polishing apparatus |
JP5260139B2 (en) * | 2008-05-22 | 2013-08-14 | 株式会社日進製作所 | Grinding wheel contact sensing method and apparatus, honing method and honing machine |
TWI474388B (en) * | 2009-11-04 | 2015-02-21 | Disco Corp | A laser processing method, a laser processing apparatus, and a manufacturing method of a wafer |
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