TW201838060A - Coating apparatus and coating method - Google Patents

Coating apparatus and coating method Download PDF

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TW201838060A
TW201838060A TW106134114A TW106134114A TW201838060A TW 201838060 A TW201838060 A TW 201838060A TW 106134114 A TW106134114 A TW 106134114A TW 106134114 A TW106134114 A TW 106134114A TW 201838060 A TW201838060 A TW 201838060A
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Taiwan
Prior art keywords
nozzle
delivery mechanism
recording
platform
unit
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TW106134114A
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Chinese (zh)
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TWI729224B (en
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有川徹
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日商東京應化工業股份有限公司
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02296—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
    • H01L21/02299—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment
    • H01L21/02307—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment treatment by exposure to a liquid
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

The present invention relates to a coating apparatus, and a coating method. An object of the present invention is to quickly perform replacement of a nozzle. The coating apparatus (1) selectively supports one of stages (4) on which a substrate (S) is placed and a plurality of nozzles (NZ) capable of discharging liquid (L). The coating apparatus also comprises: a nozzle support unit (6) having a lift drive unit (15) for lifting the supported nozzles (NZ); and a drive unit (5) for relatively moving the nozzle support unit (6) and the stage (4).

Description

塗布裝置及塗布方法Coating device and coating method

[0001] 本發明係有關於塗布裝置、及塗布方法。[0001] The present invention relates to a coating apparatus and a coating method.

[0002] 在對向於已被載置於平台的基板的位置配置噴嘴，一面使基板與噴嘴做相對性移動一面從噴嘴吐出液狀體，藉此以在基板上塗布液狀體的塗布裝置，已為人知。如上述的塗布裝置的情況下，例如，噴嘴的維護，或是更換使用於塗布之液狀體之際，會進行噴嘴的更換。例如，將複數個噴嘴在基板的移動路徑上做切換配置的塗布裝置，已被提出(例如參照下記的專利文獻1)。 [先前技術文獻] [專利文獻] 　　[0003] 　　[專利文獻1] 日本特開2008-160044號公報[0002] A coating device that applies a liquid to a substrate while arranging a nozzle at a position opposite to a substrate placed on the stage, and ejecting the liquid from the nozzle while moving the substrate and the nozzle relatively It is already known. In the case of the above-described coating device, for example, when the nozzle is maintained or when the liquid to be applied is replaced, the nozzle is replaced. For example, a coating device that switches a plurality of nozzles on a moving path of a substrate has been proposed (for example, refer to Patent Document 1 below). [Prior Art Document] [Patent Document] [0003] [Patent Document 1] Japanese Patent Laid-Open Publication No. 2008-160044

[發明所欲解決之課題] 　　[0004] 噴嘴的更換，係要停止塗布裝置之動作才進行，因此會導致生產性降低。因此，可迅速地進行噴嘴的更換的塗布裝置，係受人期待。 　　[0005] 有鑑於以上的事情，本發明係的目的在於提供一種，可迅速地進行噴嘴的更換的塗布裝置、及塗布方法。 [用以解決課題之手段] 　　[0006] 若依據本發明的第1態樣，則可提供一種塗布裝置，係具備：平台，係載置基板；和噴嘴支持部，係從可吐出液狀體的複數個噴嘴中選擇出1個並加以支持，且具備使所支持的噴嘴做升降的升降驅動部；和驅動部，係使噴嘴支持部與平台做相對性移動。 　　[0007] 若依據本發明的第2態樣，則可提供一種塗布方法，係為對基板塗布液狀體的方法，其係含有：將基板載置於平台之步驟；和從可吐出液狀體的複數個噴嘴中選擇出1個，而支持在具備使噴嘴做升降之升降驅動部的噴嘴支持部之步驟；和一面使噴嘴支持部與平台做相對性移動，一面在基板以噴嘴塗布液狀體之步驟。 [發明效果] 　　[0008] 若依據本發明，則可迅速地進行噴嘴的更換。[Problems to be Solved by the Invention] [0004] The replacement of the nozzle is performed only after the operation of the coating device is stopped, so that productivity is lowered. Therefore, a coating apparatus that can quickly replace a nozzle is expected. In view of the above, it is an object of the present invention to provide a coating apparatus and a coating method which can quickly replace a nozzle. [Means for Solving the Problem] According to a first aspect of the present invention, a coating apparatus including: a platform on which a substrate is placed; and a nozzle support portion from which a liquid can be discharged can be provided One of the plurality of nozzles is selected and supported, and has a lifting drive unit for raising and lowering the supported nozzles; and a driving portion for relatively moving the nozzle support portion and the platform. According to a second aspect of the present invention, there is provided a coating method which is a method for applying a liquid to a substrate, comprising: a step of placing the substrate on a stage; and a liquid dischargeable from the substrate One of the plurality of nozzles is selected, and the nozzle support portion having the elevation drive portion for raising and lowering the nozzle is supported; and the nozzle support portion and the platform are relatively moved while the nozzle is coated on the substrate. The steps of the shape. [Effect of the Invention] According to the present invention, nozzle replacement can be performed promptly.

[0010] [第1實施形態] 　　說明第1實施形態。在以下的說明中，適宜參照圖1等所示的XYZ正交座標系。該XYZ正交座標系，係X方向及Y方向為水平方向(橫方向)，Z方向為鉛直方向。又，於各方向上，適宜將與箭頭的尖端相同側稱為+側(例如+Z側)，將與箭頭的尖端相反側稱為-側(例如-Z側)。例如，於鉛直方向(Z方向)上，上方係為+Z側，下方係為-Z側。此外，於圖式中，係為了說明實施形態，而將部分或全部予以模式性記載，同時，會將一部分予以放大或強調而記載等，會含有適宜變更縮尺所表現的部分。 　　[0011] 圖1係第1實施形態所述之塗布裝置之一例的上面圖。圖2係沿著圖1的A-A線之剖面，從-Y方向觀看的剖面圖。圖3係沿著圖1的B-B線之剖面，從-Y方向觀看的剖面圖。本實施形態的塗布裝置1，係對基板S塗布液狀體L(參照圖7(B))。塗布裝置1係具備例如：框體2、控制部3、平台4、平台驅動部5(驅動部)、噴嘴NZ、噴嘴支持部6、噴嘴交接機構7。 　　[0012] 框體2，係支持各部。框體2係含有例如：平台支持部9、門架10(參照圖2及圖3)。平台支持部9係例如，將平台4支持成可朝與X方向平行之方向移動。平台支持部9係具備例如：腳部9a、基台9b。腳部9a，係被設置在地面，從下方支持基台9b。腳部9a係例如，由4個構件所構成，被配置在基台9b的四個角部的下方。基台9b係例如，從上方觀看為矩形狀。基台9b，係可將平台4從下方，透過導引件(未圖示)等，支持成可朝與X方向平行之方向移動。 　　[0013] 門架10係具有一對支柱部10a、架橋部10b(參照圖1～圖3)。支柱部10a係將平台4在Y方向上予以夾住而設置2個(參照圖1)。各支柱部10a係分別沿著鉛直方向而延伸，被設置在地面(參照圖2及圖3)。各支柱部10a，係支持架橋部10b。架橋部10b，係往與Y方向平行之方向而延伸。架橋部10b，其兩端係分別連接至各支柱部10a的上端側(＋Z側)的面(參照圖1)。架橋部10b係將後面說明的噴嘴支持部6予以支持。此外，門架10係可為可移動。例如，門架10係亦可為，相對於基台9b而可朝X方向移動之構成。 　　[0014] 控制部3係控制各部。控制部3，係與塗布裝置1的各部可通訊地連接。控制部3係為例如，具備CPU(未圖示)、硬碟或記憶體等之記憶裝置(未圖示)的電腦裝置。控制部3係例如可執行，控制塗布裝置1之各部的程式。該程式係預先被記憶在例如記憶裝置。此外，控制部3係亦可與例如鍵盤、滑鼠、觸控面板等之輸入裝置連接，又，亦可與顯示器等之顯示裝置連接。 　　[0015] 平台4係載置基板S。平台4，係在基台9b的上方，被基台9b支持成可朝X方向移動。平台4係例如，從上方觀看，係為矩形狀(參照圖1)。平台4係含有例如，與XY平面(水平面)平行的上面。上面係例如以定盤而被形成。基板S係藉由被載置於上面，基板S係被配置在與XY平面平行(水平面)的面。基板S係例如，藉由被設在平台4的定位機構(未圖示)而被定位，藉由被設在上面的吸附部(未圖示)而被吸附，藉此而被上面所支持。 　　[0016] 平台驅動部5，係驅動平台4。平台驅動部5係為例如電動馬達等。平台驅動部5係例如，使平台4相對於基台9b而朝與X方向平行之方向移動。平台4，係藉由平台驅動部5之驅動，而對之後所說明的噴嘴支持部6，做相對性移動。平台驅動部5係例如，與控制部3可通訊地連接，驅動的時序、驅動量、驅動方向、驅動的速度等是被控制部3所控制，使平台4移動至所定位置。此外，平台驅動部5，係亦可不被連接至控制部3。例如，平台驅動部5係亦可為，藉由平台4的使用者以手動來驅動之構成。 　　[0017] 噴嘴NZ，係對基板S塗布液狀體L。在本實施形態中，塗布裝置1係具備複數個噴嘴NZ(NZ1、NZ2)。例如，在圖1所示的例子中，噴嘴NZ1係為被噴嘴支持部6所支持而為可塗布狀態，噴嘴NZ2係為被之後所說明的噴嘴交接機構7B所支持的與噴嘴NZ1做更換用的噴嘴。例如，噴嘴NZ1、NZ2係皆為狹縫噴嘴。噴嘴NZ1、NZ2係皆具有，吐出液狀體L的吐出口OP(參照圖2(B))。例如，吐出口OP係為例如，朝下方向的狹縫狀之開口。 　　[0018] 噴嘴NZ1、NZ2係分別被連接至，對應的噴嘴交接機構7的送液部19。噴嘴NZ1，係被連接至噴嘴交接機構7A的送液部19，被噴嘴支持部6及噴嘴交接機構7A任一者所支持。噴嘴NZ2，係被連接至噴嘴交接機構7B的送液部19，被噴嘴支持部6及噴嘴交接機構7A任一者所支持。噴嘴NZ1、NZ2係分別，例如，藉由管子等之配管(未圖示)，而被連接至對應的送液部19。噴嘴NZ1、NZ2，係在塗布之際，藉由來自送液部19的液狀體L之供給，而從吐出口OP吐出液狀體L，對基板S塗布液狀體L。關於噴嘴交接機構7、送液部19，係在之後說明。 　　[0019] 此外，噴嘴NZ不限定於狹縫噴嘴，而為任意。例如，噴嘴NZ，係亦可為噴墨方式的噴嘴、棒塗器、分注噴嘴等。又，複數個噴嘴NZ係亦可分別為不同種類的噴嘴。又，複數個噴嘴NZ，係亦可包含用途不同的噴嘴。例如，噴嘴NZ1及噴嘴NZ2，係亦可使用於彼此互異種類之液狀體L的塗布。又，複數個噴嘴NZ1、NZ2係亦可分別不被連接至送液部19。例如，複數個噴嘴NZ1、NZ2係亦可分別在塗布之際，才連接至送液部19。 　　[0020] 噴嘴支持部6，係從複數個噴嘴NZ中選擇出1個並加以支持，且使所支持的噴嘴NZ做升降。噴嘴支持部6係具備例如：導引部12、支持部13、噴嘴保持部14、升降驅動部15。噴嘴支持部6係例如，被門架10所支持。 　　[0021] 導引部12係例如，被門架10的架橋部10b所支持。導引部12，係將支持部13支持成，可朝鉛直方向移動。支持部13，係將噴嘴保持部14予以支持。導引部12係例如，將支持部13、噴嘴保持部14及噴嘴NZ支持成，可朝鉛直方向(與Z方向平行之方向)移動。 　　[0022] 噴嘴保持部14，係將噴嘴NZ予以保持。噴嘴保持部14，係定位而將噴嘴NZ予以保持。噴嘴保持部14係被形成為，可將所保持的噴嘴NZ予以釋放。噴嘴保持部14係例如，被安裝在支持部13。噴嘴保持部14係被構成為，與之後所說明的噴嘴交接機構7之間可進行噴嘴NZ之交接。噴嘴保持部14係例如，從之後所說明的噴嘴交接機構7接受噴嘴NZ之際，係將噴嘴NZ予以接受並保持，又，向噴嘴交接機構7交付噴嘴NZ之際，係將所支持的噴嘴NZ予以釋放而交給噴嘴交接機構7。此外，關於噴嘴保持部14的噴嘴NZ的保持及釋放之機構，係在之後於圖8～圖11中說明。又，關於噴嘴NZ的定位之機構，係在之後於圖11中說明。 　　[0023] 升降驅動部15，係使噴嘴NZ做升降。升降驅動部15，係被連接至支持部13。升降驅動部15係例如，藉由使支持部13做升降，而使已被噴嘴保持部14所保持的噴嘴NZ，對基板S做升降。升降驅動部15係為例如電動馬達等。升降驅動部15，係可將支持部13移動至所定位置。例如，升降驅動部15，係在塗布之際，以使得噴嘴NZ的吐出口OP與基板S之間隔會是所定之間隔的方式，驅動支持部13。升降驅動部15係例如，與控制部3可通訊地連接，其驅動是被控制部3所控制。升降驅動部15係例如，驅動的時序、驅動量、驅動方向、驅動的速度等，是被控制部3所控制。此外，升降驅動部15，係亦可不被連接至控制部3。例如，升降驅動部15係亦可為，由使用者以手動來控制升降之構成。又，亦可沒有升降驅動部15。例如，噴嘴支持部6係亦可為，由使用者以人力而使支持部13做升降之構成。 　　[0024] 如上記而被構成的噴嘴支持部6，係從噴嘴NZ1、NZ2中選擇出噴嘴NZ1或噴嘴NZ2並以噴嘴保持部14加以支持。例如，在圖1所示的例子中，噴嘴支持部6，係從噴嘴NZ1、NZ2中選擇出噴嘴NZ1，並加以支持。又，噴嘴支持部6，係將所支持的噴嘴NZ1，在塗布等之際，藉由升降驅動部15之驅動而使其升降，配置在所定之位置。 　　[0025] 接著說明噴嘴交接機構7。噴嘴交接機構7，係對噴嘴支持部6進行噴嘴NZ的交接。塗布裝置1係具備例如，複數個噴嘴交接機構7(7A、7B)。噴嘴交接機構7A、7B係分別具備例如：迴旋部18、送液部19。噴嘴交接機構7A、7B係分別被配置在平台4附近。例如，噴嘴交接機構7A、7B係分別被配置在，平台4的-Y側及+Y側。 　　[0026] 在本實施形態中，噴嘴交接機構7A、7B係皆為相同之構成。在以下的說明中，以噴嘴交接機構7A為例做說明。 　　[0027] 迴旋部18，係以上下方向(鉛直方向)為軸而將噴嘴NZ保持成可迴旋。迴旋部18係具備例如：軸部20、支持部21、迴旋驅動部22、噴嘴保持部23。 　　[0028] 軸部20，係沿著鉛直方向而延伸。軸部20係例如被固定在地面。此外，軸部20係亦可被固定在地面以外。例如，軸部20亦可被固定在框體2(例如基台9b)。軸部20，係將支持部21，透過安裝構件(未圖示)，支持成可繞著軸部20的鉛直方向的軸而旋轉。 　　[0029] 支持部21，係將噴嘴保持部23予以支持。支持部21，係繞著軸部20的軸而迴旋。支持部21，係被連接至迴旋驅動部22，藉由迴旋驅動部22之驅動而迴旋。軸部20及支持部21，係在噴嘴NZ是被保持在噴嘴保持部23中的狀態下，使支持部21迴旋之際，以使得噴嘴NZ的下端，不會干擾到已被載置在平台4之基板S的方式，而被配置在已被載置於平台4之基板S的上方地被形成(參照圖2所示的噴嘴交接機構7B)。 　　[0030] 迴旋驅動部22，係將支持部21予以驅動、迴旋。迴旋驅動部22係為例如電動馬達等。迴旋驅動部22係例如，與控制部3可通訊地連接，其驅動是被控制部3所控制。迴旋驅動部22係為例如，驅動的時序、驅動量、驅動方向、驅動的速度等是被控制部3所控制，使支持部21移動至所定位置。此外，迴旋驅動部22，係亦可不被連接至控制部3。例如，迴旋驅動部22係亦可為，由使用者以手動來控制迴旋之構成。又，亦可沒有迴旋驅動部22。例如，交接機構7係亦可為，由使用者以人力而使支持部21迴旋之構成。 　　[0031] 噴嘴保持部23，係將噴嘴NZ予以保持。噴嘴保持部23係被構成為，可將所保持的噴嘴NZ予以釋放。噴嘴保持部23係被構成為例如，可與噴嘴支持部6的噴嘴保持部14之間，進行噴嘴NZ的交接。關於噴嘴NZ的交接，係在之後說明。此外，關於噴嘴保持部23的噴嘴NZ的保持及釋放之機構，係在之後於圖8～圖11中說明。 　　[0032] 送液部19，係對噴嘴NZ供給液狀體L。送液部19係為例如泵浦。送液部19係例如，如圖3所示，被形成在台車25。台車25係例如，被配置在平台4的側方(與Y方向平行之方向)。台車25係被配置在例如，相對於迴旋部18而從平台4遠離之一側(-Y側)之附近。台車25係具備例如：複數個車輪25a、收容部25b、送液部19。台車25係被形成為，藉由被設在收容部25b之下部的複數個車輪25a，而可移動。收容部25b，係被形成為箱體，在內部可收容物品。例如，在收容部25b的內部係收容有，儲存液狀體L的複數個容器27。送液部19係例如，被配置在收容部25b的上部的管部25c。送液部19係例如，透過收容部25b中所被收容的容器27、管部25c，而藉由管子等之配管(未圖示)而被連接。又，送液部19係例如，與複數個噴嘴NZ之中的，對應的所定之噴嘴NZ，以管子等之配管(未圖示)而連接。例如，噴嘴交接機構7A的送液部19，係被連接至噴嘴NZ1，噴嘴交接機構7B的送液部19，係被連接至噴嘴NZ2。此外，噴嘴NZ1與送液部19之間的配管的長度、和噴嘴NZ2與送液部19之間的配管的長度，係被設定成大致相同。此時，可使送液部19之控制，在噴嘴NZ1與噴嘴NZ2間為相同。 　　[0033] 送液部19，係將容器27中所儲存的液狀體L，對噴嘴NZ送液所定量。送液部19，係與控制部3可通訊地連接，藉由控制部3而控制其動作。送液部19係例如，對噴嘴NZ供給液狀體L的時序、對噴嘴NZ所供給之液狀體L的量等，是被控制部3所控制。送液部19係例如，藉由控制部3之控制而驅動，將容器27中所儲存之液狀體L以所定之量，供給至噴嘴NZ。藉此，塗布之際，被噴嘴支持部6所支持的噴嘴NZ，係藉由送液部19的液狀體L的供給，從吐出口OP將所定量之液狀體L對基板S進行吐出，將液狀體L塗布至基板S。 　　[0034] 此外，送液部19及容器27之其中至少一者，係亦可不被形成在台車25。又，塗布裝置1是否具備台車25，係為任意。 　　[0035] 如以上所被構成的噴嘴交接機構7A、7B係分別，在交接位置P1A、P1B、與待機位置P2A、P2B之間移動，在交接位置P1A、P1B上，對噴嘴支持部6進行噴嘴NZ的交接，在待機位置P2A、P2B上進行待機(參照圖5(A)、圖6(A))。此外，本實施形態的噴嘴交接機構7A、7B係分別被形成為，藉由迴旋所致之只有水平的移動，而可在交接位置P1A、P1B、與待機位置P2A、P2B之間移動。此時，可迅速地進行噴嘴NZ的交接。 　　[0036] 交接位置P1A、P1B係分別被設定在，噴嘴支持部6與噴嘴交接機構7A、7B之間，可進行噴嘴NZ之交接的位置。例如，噴嘴交接機構7A、7B係分別被形成為，在交接位置P1A、P1B上，支持部21的長邊方向，會是與平台4的移動方向正交之方向(與Y方向平行之方向)。 　　[0037] 待機位置P2A、P2B係分別被設定在，當噴嘴交接機構7A、7B保持噴嘴NZ時，噴嘴NZ會從平台4的上方跑開的位置。噴嘴交接機構7A、7B係分別被形成為，在待機位置P2A、P2B上，支持部21的長邊方向，會是與X方向平行之方向。例如，噴嘴交接機構7A、7B係分別，在待機位置P2A、P2B上，進行噴嘴NZ的維護等。 　　[0038] 以下，基於塗布裝置1之動作，說明本實施形態所述之塗布方法。圖4係實施形態所述之塗布方法的流程圖。圖5～圖7係為塗布裝置1之動作之一例的圖示。此外，在說明圖4之際，適宜參照圖1～圖3、及圖5～圖7。 　　[0039] 本塗布方法係為，對基板S塗布液狀體L的方法。本塗布方法係例如，於圖4所示的步驟S1中，使未保持噴嘴NZ的噴嘴交接機構7A，相對於噴嘴支持部6而前進。例如，如圖5(A)所示，未保持噴嘴NZ的位於待機位置P2A的噴嘴交接機構7A，係藉由控制部3之控制而迴旋驅動部22係做驅動，藉由迴旋部18的迴旋，而移動至交接位置P1A。噴嘴交接機構7A係被形成為，藉由迴旋所致之只有水平的移動，而可在交接位置P1A與待機位置P2A之間移動，因此可迅速地移動。 　　[0040] 接下來，於圖4所示的步驟S2中，藉由噴嘴交接機構7A來保持噴嘴NZ。例如，於交接位置P1A上，噴嘴交接機構7A，係將正被噴嘴支持部6所保持之狀態的噴嘴NZ1，以噴嘴保持部23加以保持。此時，噴嘴NZ1，係藉由噴嘴支持部6的噴嘴保持部14及噴嘴交接機構7A的噴嘴保持部23之雙方的保持機構所保持。 　　[0041] 接下來，於圖4所示的步驟S3中，將噴嘴支持部6所致之噴嘴NZ的保持，予以釋放。例如，噴嘴支持部6，係在噴嘴交接機構7A正在保持著噴嘴NZ1的狀態下，將噴嘴NZ1予以釋放，噴嘴NZ1係被交給噴嘴交接機構7A。噴嘴NZ1，係在被噴嘴支持部6與噴嘴交接機構7A之任一者所保持的狀態下，進行交接，因此可確實地進行噴嘴NZ的交接。 　　[0042] 接下來，於圖4所示的步驟S4中，將噴嘴交接機構7A予以退避。未被噴嘴支持部6所選擇之噴嘴NZ1，係藉由噴嘴交接機構7A而從平台之上方退避。例如，如圖5(B)所示，噴嘴交接機構7A，係在正在保持著噴嘴NZ1的狀態下，藉由控制部3之控制而迴旋驅動部22係做驅動，而移動到待機位置P2A。例如，於待機位置P2A上，被噴嘴交接機構7A所保持的噴嘴NZ1，係進行噴嘴的更換、噴嘴的維護等。 　　[0043] 接下來，於圖4所示的步驟S5中，使正在保持著噴嘴NZ2的另一噴嘴交接機構7B，相對於噴嘴支持部6而前進。例如，如圖6(A)所示，正在保持著噴嘴NZ2的位於待機位置P2B的噴嘴交接機構7B，係藉由控制部3之控制而迴旋驅動部22係做驅動，藉由迴旋部18的迴旋，而移動至交接位置P1B。噴嘴交接機構7B係被形成為，藉由迴旋所致之只有水平方向的移動，而可在交接位置P1B與待機位置P2B之間移動，因此可迅速地移動。 　　[0044] 接下來，於圖4所示的步驟S6中，藉由噴嘴支持部6而將噴嘴NZ2予以保持。例如，於交接位置P2A上，噴嘴支持部6，係將正被噴嘴交接機構7B所保持之狀態的噴嘴NZ2，以噴嘴保持部14加以保持。此時，噴嘴NZ，係藉由噴嘴支持部6的噴嘴保持部14及噴嘴交接機構7B的噴嘴保持部23之雙方的保持機構所保持。 　　[0045] 接下來，於圖4所示的步驟S7中，將噴嘴交接機構7B所致之噴嘴NZ2的保持予以釋放。例如，噴嘴交接機構7B，係在噴嘴支持部6正在保持著噴嘴NZ的狀態下，將噴嘴NZ2予以釋放，噴嘴NZ2係被交給噴嘴支持部6。噴嘴NZ2，係在被噴嘴支持部6與噴嘴交接機構7A之任一者所保持的狀態下，進行交接，因此可確實地進行噴嘴NZ的交接。 　　[0046] 接下來，於圖4所示的步驟S8中，將噴嘴交接機構7B予以退避。例如，如圖6(B)所示，噴嘴交接機構7B，係藉由控制部3之控制而迴旋驅動部22係做驅動，而移動到待機位置P2B並待機。此外，是否進行步驟S8，係為任意。 　　[0047] 接下來，於圖4所示的步驟S9中，在平台4上載置基板S。例如，如圖7(A)所示，將基板S定位於平台4而載置。此外，基板S的載置係例如，可藉由使用者以人力來為之，也可藉由搬送裝置等之裝置而為之。 　　[0048] 接下來，於圖4所示的步驟S10中，使平台4移動而在基板S上塗布液狀體L。例如，如圖7(B)所示，使平台4與噴嘴支持部6做相對性移動，在基板S上塗布液狀體L。例如，首先，藉由控制部3之控制，升降驅動部15，係以使得噴嘴NZ2的下端與基板S的間隔會是所定之間隔的方式，驅動支持部13，以移動噴嘴NZ2。接著，藉由控制部3之控制，平台驅動部5係使平台4往-X方向移動，同時，送液部19係將所定之量的液狀體L，供給至噴嘴NZ2。藉此，噴嘴NZ2，係將液狀體L從吐出口OP予以吐出，在基板S上塗布液狀體L。對基板S的液狀體L的塗布結束後，將基板S予以搬出。基板S的搬出係例如，可藉由使用者以手動來為之，也可藉由搬送裝置等而為之。此外，步驟S9所致之平台4上的基板S的載置係亦可例如，在上記的步驟S1的開始前進行。 　　[0049] 接著，說明噴嘴支持部6的噴嘴保持部14及噴嘴交接機構7的噴嘴保持部23。圖8～圖10係分別為，噴嘴支持部6及噴嘴交接機構7的噴嘴保持部的第1例～第3例的圖示。 　　[0050] 噴嘴支持部6的噴嘴保持部14及噴嘴交接機構7的噴嘴保持部23係分別為，只要可彼此交接噴嘴NZ，則構成係為任意。噴嘴支持部6的噴嘴NZ的保持機構係亦可使用例如，圖8～圖10所示的第1例～第3例之任一構成。 　　[0051] 首先說明，圖8(A)及(B)所示的噴嘴支持部6的噴嘴保持部14A、及噴嘴交接機構7的噴嘴保持部23A的第1例。第1例的噴嘴支持部6的噴嘴保持部14A、及噴嘴交接機構7的噴嘴保持部23A，係分別將噴嘴NZ以噴嘴NZ的長邊方向予以夾入，而將噴嘴NZ予以保持。噴嘴支持部6的噴嘴保持部14A及噴嘴交接機構7的噴嘴保持部23A係分別具備有把持部30。 　　[0052] 噴嘴支持部6的把持部30係為例如，如圖8(A)所示，是被形成為，可將噴嘴NZ在長邊方向(與Y方向平行之方向)上予以夾入的一對把持構件。一對把持構件，係在噴嘴NZ的長邊方向上將噴嘴NZ予以夾住而被配置。一對把持構件係分別具有凹部30a。凹部30a係被形成為，可讓噴嘴NZ的長邊方向的端部***。一對把持構件，係被支持部13所支持。一對把持構件，係透過未圖示的導引件，而可相對於支持部13而朝與噴嘴NZ的長邊方向平行之方向移動，被支持部13所支持。一對把持構件，係在保持噴嘴NZ之際，藉由往噴嘴NZ靠近的方向移動，噴嘴NZ的長邊方向的端部會***至凹部30a，藉由按壓噴嘴NZ而將噴嘴NZ予以支持。又，一對把持構件，係在將噴嘴NZ從保持予以釋放之際，藉由往遠離噴嘴NZ之方向移動，噴嘴NZ的長邊方向的端部就會從凹部30a離開，而釋放噴嘴NZ。 　　[0053] 接著，噴嘴交接機構7的把持部30，係有一對把持構件是被支持部21所支持。噴嘴交接機構7的把持部30，係除了所被配置的位置為不同以外，其餘係和噴嘴支持部6的把持部30相同地被構成。噴嘴交接機構7的把持部30，係從噴嘴NZ的長邊方向予以夾住而保持，藉由解除把持部30對噴嘴NZ的夾入，而將所保持噴嘴NZ予以釋放。 　　[0054] 噴嘴支持部6的把持部30與噴嘴交接機構7的把持部30，係如圖8(B)所示，分別在進行噴嘴NZ之交接的位置P1A、P1B(參照圖5(A)，圖6(A))上，被形成在不同的高度。例如，在圖8(B)所示的例子中，係於位置P1A、P1B上，噴嘴支持部6的把持部30，係相對於噴嘴交接機構7的把持部30，被形成在位於下方。此外，於位置P1A、P1B上，噴嘴支持部6的把持部30，係亦可相對於噴嘴交接機構7的把持部30，被形成在位於上方。 　　[0055] 在第1例中，噴嘴支持部6的把持部30與噴嘴交接機構7的把持部30，係如圖8(B)所示，分別在進行噴嘴NZ之交接的位置P1(參照圖5(A)，圖6(A))上，被形成在不同的高度。因此在噴嘴支持部6的把持部30及噴嘴交接機構7的把持部30中，各自的噴嘴保持動作及噴嘴釋放動作係不會發生干擾，可獨立進行。藉此，可在噴嘴支持部6及噴嘴交接機構7之一方有保持著噴嘴NZ的狀態下，他方係可釋放噴嘴NZ。 　　[0056] 接下來，說明圖9所示的噴嘴支持部6的噴嘴保持部14、及噴嘴交接機構7的噴嘴保持部23的第2例。第2例的噴嘴支持部6的噴嘴保持部14B及噴嘴交接機構7的噴嘴保持部23B係分別具備有把持部32，將被設在噴嘴NZ的被把持部31，以把持部32予以夾入，藉此而將噴嘴NZ予以保持。 　　[0057] 如圖9所示，在噴嘴NZ係設有被把持部31。被把持部31係被設在，噴嘴NZ的短邊方向(與X方向平行之方向)之兩側的各自的面。被把持部31係為例如，具有突出部31a的凸緣構件。被設在靠近噴嘴支持部6側(-X側)的被把持部31，係被噴嘴支持部6的把持部32所夾入。被設在相對於靠近噴嘴支持部6而遠離側(+X側)的被把持部31，係被噴嘴交接機構7的把持部32所夾入。 　　[0058] 噴嘴支持部6的把持部32係為例如，如圖9所示，被形成為，可將被把持部31的突出部31a在噴嘴NZ的長邊方向(與Y方向平行之方向)上予以夾入的一對把持構件。一對把持構件，係將被把持部31在噴嘴NZ的長邊方向上予以夾住而配置。一對把持構件係分別具有凹部32a。凹部32a係被形成為，可***至被把持部31的突出部31a。一對把持構件，係被支持部13所支持。一對把持構件，係透過未圖示的導引件，相對於支持部13而可朝與噴嘴NZ的長邊方向平行之方向移動地，被支持部13所支持。一對把持構件，係在保持噴嘴NZ之際，藉由往靠近噴嘴NZ之方向移動，噴嘴NZ的噴嘴支持部6側的突出部31a會被***至凹部32a，藉由按壓突出部31a，而將噴嘴NZ予以支持。又，一對把持構件，係將噴嘴NZ從保持予以釋放之際，藉由朝遠離噴嘴NZ的方向移動，突出部31a就會從凹部32a跑開，藉此而釋放噴嘴NZ。 　　[0059] 噴嘴交接機構7的把持部32，係除了一對把持構件是被支持部21所支持這點以外，其餘係和噴嘴支持部6的把持部32相同地被構成，藉由將噴嘴NZ的遠離噴嘴支持部6側的突出部31a從長邊方向予以夾住，而將噴嘴NZ予以保持，藉由解除把持部32對噴嘴NZ的夾入，而將所保持的噴嘴NZ予以釋放。 　　[0060] 在本例中，被把持部31，係被設在噴嘴NZ的短邊方向的各自的面，因此噴嘴支持部6的把持部32及噴嘴交接機構7的把持部32，係在位置P1(參照圖5(A)、圖6(A))上，在對噴嘴NZ的短邊方向的相反側，可將各自的噴嘴保持動作及噴嘴釋放動作，不會干擾地，獨立進行之。藉此，在噴嘴支持部6及噴嘴交接機構7的一方正在保持噴嘴NZ的狀態下，他方係可釋放噴嘴NZ，因此可確實地進行噴嘴NZ的交接。 　　[0061] 此外，被把持部31及把持部32係分別只要是可將被把持部31以把持部32加以把持(保持)，則可採用任意之構成。又，把持部32係亦可藉由例如驅動部(未圖示)來為之。 　　[0062] 接下來，說明圖10所示的噴嘴支持部6的噴嘴保持部14及噴嘴交接機構7的噴嘴保持部23的第3例。第3例的噴嘴支持部6的噴嘴保持部14C及噴嘴交接機構7的噴嘴保持部23C係分別具備電磁石部38，藉由將噴嘴NZ上所被設置的被吸附部37以電磁石部38加以吸附，而保持噴嘴NZ。 　　[0063] 如圖10所示，在噴嘴NZ係分別設有被吸附部37。被吸附部37係被設在，噴嘴NZ的短邊方向(與X方向平行之方向)之兩側的各自的面。被吸附部37，係由可被電磁石部38吸附的鐵等之磁性材料所形成。 　　[0064] 噴嘴支持部6的電磁石部38係例如，在以磁性材料所形成的芯的周圍繞捲線圈，藉由通電而會暫時性產生磁力的磁石。噴嘴支持部6的電磁石部38，係被連接至電源(未圖示)及開關39，會進行通電及斷電的切換。電磁石部38，係被支持部13所支持。電磁石部38，係藉由開關39進行通電，就會產生磁力而將被吸附部37予以吸附，將噴嘴NZ予以保持。電磁石部38，係藉由開關39進行斷電，磁力就會消失而解除與被吸附部37之吸附，釋放噴嘴NZ。開關39所致之通電及斷電的切換係藉由例如控制部3而被控制。此外，開關39所致之通電及斷電的切換係亦可為，藉由使用者以手動來進行之構成。 　　[0065] 噴嘴交接機構7的噴嘴保持部23C，係除了電磁石部38是被支持部21所支持這點以外，其餘係和噴嘴支持部6的噴嘴保持部14C相同地被構成，噴嘴NZ上所被設置的被吸附部37藉由被電磁石部38所吸附而將噴嘴NZ予以保持，藉由解除電磁石部38所致之被吸附部37的吸附，而將所保持的噴嘴NZ予以釋放。 　　[0066] 在本例中，被吸附部37，係被設在噴嘴NZ的短邊方向的各自的面，因此噴嘴支持部6的電磁石部38及噴嘴交接機構7的電磁石部38，係在位置P1(參照圖5(A)、圖6(A))上，在對噴嘴NZ的短邊方向的相反側，可將各自的噴嘴保持動作及噴嘴釋放動作，不會干擾地，獨立進行之。藉此，在噴嘴支持部6及噴嘴交接機構7的一方正在保持噴嘴NZ的狀態下，他方係可釋放噴嘴NZ。 　　[0067] 接著說明定位部41。圖11(A)及(B)係定位部之一例的圖示，(A)係從上方觀看的圖，(B)係從側方觀看的圖。 　　[0068] 以下，以圖8(A)及(B)所示的噴嘴支持部6的噴嘴保持部14A的定位部41為例做說明。定位部41係例如，如圖11(A)及(B)所示，具備：支持面42、2個凸部43、2個凹部44。支持面42係為例如矩形平板狀。支持面42係被設在例如，支持部13的2個面之中的將噴嘴NZ予以保持的一側(+X側)的面。支持面42的+X側的面，係當噴嘴NZ是被噴嘴保持部14A所保持時，是密接於噴嘴NZ的-X側的面而被形成。 　　[0069] 2個凸部43，係在支持面42的+X側的面的、支持面42的高度方向上的中央部分，朝與Y方向平行之方向排列而被形成。2個凸部43係為例如圓錐狀(推拔狀)。2個凹部44，係在噴嘴NZ的-X側的面，朝與Y方向平行之方向排列而被形成，係被形成為，當噴嘴NZ是被噴嘴保持部14A所保持時，2個凸部43係會嵌合。 　　[0070] 此外，凸部43及凹部44的個數係分別亦可不是2個，例如，凸部43及凹部44的個數係亦可為3個以上。此外，凸部43的形狀，係不限定於圓錐狀(推拔狀)，而為任意。例如，凸部43的形狀，係亦可為圓柱狀，也可為矩形柱狀。 　　[0071] 定位部41，係當噴嘴NZ是被保持在噴嘴保持部14A時，藉由支持面42與噴嘴NZ的-X側的面密接，而限制噴嘴NZ的繞Y軸及繞Z軸之移動，且，藉由2個凸部43與2個凹部44做嵌合，而限制噴嘴NZ的繞X軸之移動。藉此，定位部41，係當噴嘴NZ是被噴嘴保持部14A所保持時，可將噴嘴NZ定位在所定位置。又，2個凸部，係為圓錐狀(推拔狀)，因此噴嘴交接機構7將噴嘴NZ對噴嘴支持部6進行交接之際，即使噴嘴NZ的位置有若干偏移，仍可將噴嘴NZ予以定位。 　　[0072] 此外，在圖9所示的噴嘴保持部14B設置定位部41的情況下，例如，支持面42及2個凸部43，係被配置在把持部32的上方或下方，2個凹部44係被配置在，當噴嘴NZ被保持於噴嘴保持部14B時，2個凸部43會做嵌合的位置。 　　[0073] 又，在圖10所示的噴嘴保持部14C設置定位部41的情況下，例如，支持面42及2個凸部43，係被配置在電磁石部38的上方或下方，2個凹部44係被配置在，當噴嘴NZ被保持於噴嘴保持部14C時，2個凸部43會嵌合的位置。 　　[0074] 此外，亦可在圖8～圖10所示的噴嘴交接機構7，設置定位部41。例如，在圖8所示的噴嘴交接機構7的噴嘴保持部23A設置定位部41的情況下，支持面42及2個凸部43，係被配置在噴嘴保持部23A的支持部21，2個凹部44係被配置在，當噴嘴NZ被保持於噴嘴保持部14A時，2個凸部43會做嵌合的位置。又，例如，在圖9所示的噴嘴交接機構7的噴嘴保持部23B設置定位部41的情況下，例如，支持面42及2個凸部43，係被配置在噴嘴保持部23B的把持部32的上方或下方，2個凹部44係被配置在，當噴嘴NZ被保持於噴嘴保持部14A時，2個凸部43會做嵌合的位置。又，例如，在圖10所示的噴嘴交接機構7的噴嘴保持部23C設置定位部41的情況下，例如，支持面42及2個凸部43，係被配置在電磁石部38的上方或下方，2個凹部44係被配置在，當噴嘴NZ被保持於噴嘴保持部14A時，2個凸部43會做嵌合的位置。 　　[0075] 如此，本實施形態的塗布裝置1及塗布方法，係藉由對噴嘴支持部6進行噴嘴NZ的交接以從複數個噴嘴NZ中選擇出1個，因此可將噴嘴支持部6在複數個噴嘴NZ間做共用。藉此，可抑制裝置的成本，又，可使裝置的構成變得簡單且精巧。又，由於是在複數個噴嘴NZ間共用噴嘴支持部6，因此可抑制噴嘴的更換所致之，噴嘴支持部6的噴嘴的支持機構、或噴嘴之驅動機構的調整所需要的時間，可迅速地進行噴嘴的更換。 　　[0076] 如以上所述，本實施形態的塗布裝置1及塗布方法，係可迅速地進行噴嘴的更換。 　　[0077] [第2實施形態] 　　說明第2實施形態。於本實施形態中，關於和上述的實施形態相同之構成，係標示相同符號並省略或簡化其說明。 　　[0078] 圖12(A)及(B)係第2實施形態所述之塗布裝置1A的圖示，(A)係從X方向觀看的圖，(B)係從上方觀看的圖。本實施形態的塗布裝置1A，係具備維護部46。塗布裝置1A，係除了台車25A，維護部46以外，其餘係和第1實施形態的塗布裝置1相同之構成。此外，於圖12中，除了塗布裝置1A的維護部46以外，其餘係省略或簡化圖示。 　　[0079] 維護部46，係為進行噴嘴NZ之維護的部分。例如，塗布裝置1A的台車25A，係具備維護部46。台車25A，係除了具備維護部46這點以外，其餘係和第1實施形態的台車25相同之構成。此外，台車25A，係在噴嘴交接機構7A、7B之附近，配置2個。 　　[0080] 維護部46，係被配置在台車25A的上部。維護部46係被形成為例如，可讓位於待機位置P2A、P2B之位置上的被噴嘴交接機構7A、7B所保持之狀態的噴嘴NZ做取用。例如，在本實施形態中，藉由台車25A的移動，已被噴嘴交接機構7A、7B所保持之狀態的噴嘴NZ是可對台車25A的維護部46做取用。 　　[0081] 維護部46係具備例如：將噴嘴NZ的尖端予以洗淨的洗淨部(未圖示)、從噴嘴NZ將液狀體L做預備性吐出所需的預備吐出部(未圖示)、將噴嘴NZ的尖端做擦拭的擦拭部(未圖示)。此外，維護部46，係只要具備這些其中至少1者即可。 　　[0082] 洗淨部係具備例如：將用來洗淨噴嘴NZ所需之洗淨液予以保持的容器。預備吐出部係具備：用來承受從噴嘴NZ所預備吐出之液狀體L所需的容器。擦拭部係具備例如：藉由對噴嘴NZ的尖端做移動以將噴嘴NZ予以擦拭的擦拭構件。 　　[0083] 如以上所述，本實施形態的塗布裝置1A，係具備維護部46，因此可在塗布動作中進行噴嘴NZ的維護。藉此，塗布裝置1A，係可抑制生產性的降低。又，本實施形態的塗布裝置1A，係台車25A是具備維護部46，因此可簡化維護部46之構成。又，維護部46及送液部19係共用台車25A，因此可使塗布裝置1A的裝置尺寸變得精巧。 　　[0084] [第3實施形態] 　　說明第3實施形態。於本實施形態中，關於和上述的實施形態相同之構成，係標示相同符號並省略或簡化其說明。 　　[0085] 圖13係第3實施形態所述之塗布裝置1B的上面圖。本實施形態的塗布裝置1B係具備例如：框體2、控制部3(未圖示)、平台4、平台驅動部5(驅動部)、4個噴嘴NZ(NZ1～NZ4)、2個噴嘴支持部6(6A、6B)、4個噴嘴交接機構7(7A～7D)。此外，控制部3、平台4、及平台驅動部5(驅動部)係和第1實施形態相同，因此省略或簡化說明。 　　[0086] 本實施形態的框體2，係具備平台支持部9B、門架10。本實施形態的平台支持部9B，係除了比第1實施形態的平台支持部9在X方向上被形成為較長以外，其餘係和第1實施形態相同之構成。平台4，係在平台支持部9B的與X方向平行之方向的兩端部之間移動。門架10，係和第1實施形態的門架10相同之構成。 　　[0087] 2個噴嘴支持部6A、6B係分別，被例如門架10的架橋部10b所支持。例如，噴嘴支持部6A，係被支持在門架10的架橋部10b的+X側，噴嘴支持部6B，係被支持在門架10的架橋部10b的-X側。 　　[0088] 噴嘴支持部6A，係和第1實施形態的噴嘴支持部6相同之構成，從複數個噴嘴NZ1、NZ2中選擇出1個而加以支持，且可使所支持的噴嘴NZ做升降。噴嘴支持部6B，係從複數個噴嘴NZ3、NZ4中選擇出1個而加以支持，且使所支持的噴嘴NZ做升降。噴嘴支持部6B，係除了被門架10所支持的位置、及所支持的噴嘴NZ為不同以外，其餘係和第1實施形態的噴嘴支持部6相同之構成。又，噴嘴支持部6A、6B之動作係分別和第1實施形態的噴嘴支持部6相同。 　　[0089] 噴嘴交接機構7A～7D係分別被設置在平台支持部9B之附近。例如，噴嘴交接機構7A、AC，係在平台支持部9B的-Y側，朝與X方向平行之方向排列而被形成。例如，噴嘴交接機構7B、7D，係在平台支持部9B的+Y側，朝與X方向平行之方向排列而被形成。噴嘴交接機構7A～AD係分別除了所被配置的位置為不同這點以外，其餘係和第1實施形態的噴嘴交接機構7A相同之構成。噴嘴交接機構7A、7B係分別被形成為，可在噴嘴支持部6A之間，進行噴嘴NZ的交接。又，噴嘴交接機構7C、AD係分別被形成為，可對噴嘴支持部6B進行噴嘴NZ的交接。噴嘴交接機構7A～7D之動作係分別和第1實施形態的噴嘴交接機構7相同。 　　[0090] 噴嘴NZ1～NZ4係分別是和第1實施形態相同的狹縫噴嘴。噴嘴NZ1，係被連接至噴嘴交接機構7A的送液部19，被噴嘴支持部6及噴嘴交接機構7A任一者所支持。又，噴嘴NZ2，係被連接至噴嘴交接機構7B的送液部19，被噴嘴支持部6及噴嘴交接機構7B任一者所支持。又，噴嘴NZ3，係被連接至噴嘴交接機構7C的送液部19，被噴嘴支持部6及噴嘴交接機構7C任一者所支持。又，噴嘴NZ4，係被連接至噴嘴交接機構7D的送液部19，被噴嘴支持部6及噴嘴交接機構7D任一者所支持。 　　[0091] 接著說明塗布裝置1B之動作。本實施形態的塗布裝置1B，係將4個噴嘴NZ1～NZ4的其中1個，以噴嘴支持部6A或噴嘴支持部6B加以選擇，對基板S進行塗布這點是和第1實施形態不同，至於其以外之動作，係和第1實施形態的塗布裝置1之動作相同。 　　[0092] 本實施形態的塗布裝置1B，係從噴嘴NZ1～NZ4中選擇出1個，而被噴嘴支持部6A或噴嘴支持部6B所支持。例如，噴嘴NZ1、NZ2之任一者被選擇的情況下，噴嘴NZ1、NZ2，係藉由對應的噴嘴交接機構7A、7B，而被交給噴嘴支持部6A，被噴嘴支持部6A所支持。又，噴嘴NZ3、NZ4之任一者被選擇的情況下，噴嘴NZ3、NZ4，係藉由對應的噴嘴交接機構7C、7D，而被交給噴嘴支持部6B，被噴嘴支持部6B所支持。 　　[0093] 已被噴嘴支持部6A或噴嘴支持部6B所支持的噴嘴NZ，係藉由對應的升降驅動部15，以使噴嘴NZ的下端相對於基板S而移動所定之距離。接下來，藉由控制部3之控制，平台驅動部5係做驅動，平台4係一面朝與+X方向或-X方向平行之方向移動，噴嘴NZ係一面藉由對應的送液部19而被供給液狀體L，從吐出口OP吐出液狀體L。藉此，塗布裝置1B，係對基板S塗布液狀體L。 　　[0094] 被噴嘴支持部6A或噴嘴支持部6B所支持的噴嘴NZ，係在更換之際，被交給對應之噴嘴交接機構7A～7D之任一者。此時，噴嘴支持部6A及噴嘴支持部6B係分別處於未支持噴嘴NZ的狀態。接下來，回到最初，塗布裝置1B，係從複數個噴嘴NZ1～NZ4中選擇出1個，以噴嘴支持部6A或噴嘴支持部6B加以支持，進行下次的塗布。 　　[0095] 如以上所述，本實施形態的塗布裝置1B，係4個噴嘴NZ是可更換，因此能夠使得可使用的噴嘴變多。 　　[0096] [第4實施形態] 　　說明第4實施形態。於本實施形態中，關於和上述的實施形態相同之構成，係標示相同符號並省略或簡化其說明。以下以本實施形態與上記實施形態的相異點為中心做說明。 　　[0097] 圖14係第4實施形態所述之塗布裝置之一例的上面圖。本實施形態的塗布裝置1C係具備例如：框體2、控制部3、平台4、平台驅動部5(驅動部)、噴嘴NZ、噴嘴支持部6C(門架10的支柱部10c)、噴嘴交接機構7(7A、7B)、及台車25。控制部3、平台4、平台驅動部5、及台車25，係和第1實施形態相同。 　　[0098] 框體2，係支持各部。框體2係含有例如：平台支持部9(參照圖2)、門架10。平台支持部9，係和第1實施形態相同。 　　[0099] 圖15(A)係第4實施形態的噴嘴的圖示。第4實施形態的噴嘴NZ，係在上部被安裝有適配器55。噴嘴NZ，係除了被安裝有適配器55這點以外，其餘係和第1實施形態相同。適配器55，係長邊方向(與Y方向平行之方向)的長度，是被形成為比噴嘴NZ還長。在適配器55的下面(下部)係被設置有定位部56，其係將適配器55定位在之後所說明的門架10的支柱部10c。定位部56係具備：被設在適配器55之下面的凹部56a、和被設在支柱部10c之上面的凸部56b(參照圖15(B))。凹部56a，係被設在適配器55之下部的+Y側及-Y側。各凹部56a係朝下方開口。各凹部56a中，係在噴嘴NZ是被設置在門架10(支柱部10c(噴嘴支持部6C))之際，支柱部10c的凸部56b係會嵌入，其結果為，噴嘴NZ係對支柱部10c而被定位。 　　[0100] 適配器55的上面係設有被支持部57。被支持部57係被之後所說明的噴嘴交接機構7的噴嘴保持部23D(參照圖16(A))所支持。被支持部57係由例如一對L字狀的構件(L字狀構件)所構成。被支持部57係例如，一對L字狀的構件，是沿著與Y方向平行之方向(與噴嘴NZ的長邊方向平行之方向)而被配置。+Y側的L字狀構件係具有朝-Y側突出的突出部57a，-Y側的L字狀構件係具有朝+Y側突出的突出部57a。在各L字狀構件的突出部57a的下面(下部)係設有，對噴嘴保持部23D做定位的定位部60的凹部60a。凹部60a係為例如圓錐狀(推拔狀)。各定位部60係具備：凹部60a、和被設在之後所說明的噴嘴保持部23D的突出部65之上面的凸部60b(參照圖16(B))。各凹部60a係朝下方開口。各凹部60a，係在噴嘴NZ被保持於噴嘴交接機構7之際，噴嘴交接機構7的支持部Q的凸部60b係會嵌入，其結果為，噴嘴NZ係對噴嘴交接機構7的支持部21而被定位。 　　[0101] 圖15(B)係第4實施形態的噴嘴及門架的圖示。本實施形態的門架10，係具備一對支柱部10c。一對支柱部10c係將平台4在Y方向上予以夾住而設置2個。各支柱部10c，係分別被平台支持部9所支持。各支柱部10c，係沿著鉛直方向而延伸，藉由之後所說明的升降驅動部15之驅動而朝鉛直方向移動。各支柱部10c係為，以其上面(+Z側的面)而透過適配器55而將噴嘴NZ予以支持的噴嘴支持部6C。各支柱部10c(噴嘴支持部6C)係從複數個噴嘴NZ(NZ1、NZ2)中選擇出1個並支持，被構成為與之後所說明的噴嘴交接機構7之間可進行噴嘴NZ的交接。此外，支柱部10c係亦可不被平台支持部9所支持。例如，支柱部10c係亦可被地面所支持，亦可被第1實施形態的門架10的支柱部10a所支持。 　　[0102] 各支柱部10c係被設有，將適配器55做定位的，定位部56的凸部56b。各凸部56b係為例如圓錐狀(推拔狀)。各凸部56b，係在噴嘴NZ是被門架10(支柱部10c)所支持之際，係會嵌入至適配器55的凹部56a，噴嘴NZ係被定位。此外，凹部56a及凸部56b的個數係分別亦可不是2個，例如，凹部56a及凸部56b的個數係亦可為3個以上。此外，凹部56a及凸部56b的形狀係分別不限定於圓錐狀(推拔狀)，而為任意。例如，凹部56a及凸部56b的形狀係亦可為圓柱狀，也可為矩形柱狀。 　　[0103] 本實施形態的塗布裝置1C，係具備鉗夾機構62(參照圖15(B))。鉗夾機構62，係將適配器55和支柱部10c予以固定。鉗夾機構62係被設在+Y側及-Y側。各鉗夾機構62係例如，被安裝在支柱部10c。各鉗夾機構62係例如，將適配器55往支柱部10c的上面做推壓而固定。各鉗夾機構62，係藉由控制部3(參照圖14)之控制，藉由未圖示之驅動部而被驅動，將適配器55與支柱部10c予以固定。又，各鉗夾機構62，係藉由控制部3之控制，藉由未圖示之驅動部而被驅動，將適配器55與支柱部10c之固定予以釋放。此外，鉗夾機構62，在圖15(B)的例子中，係被設在+Y側及-Y側，但亦可被設在+Y側及-Y側的至少一方。又，塗布裝置1C是否具備鉗夾機構62，係為任意。 　　[0104] 又，各支柱部10c，係藉由升降驅動部15而朝鉛直方向做驅動。升降驅動部15，係藉由將各支柱部10c朝鉛直方向做驅動，以使所支持的噴嘴NZ做升降。升降驅動部15係為例如電動馬達等。升降驅動部15，係被控制部3(參照圖14)所控制，在塗布時的噴嘴NZ與基板S之距離的調整時(微調整時)、及門架10(支柱部10c)與噴嘴NZ與噴嘴交接機構7(7A、7B)的噴嘴NZ之交接時等之際，使噴嘴NZ做升降。 　　[0105] 接著，回到圖14的說明，說明第4實施形態的噴嘴交接機構7。噴嘴交接機構7，係具備複數個噴嘴交接機構7A、7B。噴嘴交接機構7A、7B係分別被配置在平台4附近。噴嘴交接機構7A，係被配置在平台4的-Y側，將噴嘴NZ1予以支持。噴嘴交接機構7B，係被配置在平台4的+Y側，將噴嘴NZ2予以支持。噴嘴交接機構7A、7B係分別具備：迴旋部18、送液部19。各送液部19，係和第1實施形態相同，被連接至對應之噴嘴NZ，將液狀體L(參照圖7(B))予以送液。 　　[0106] 圖16(A)係第4實施形態的噴嘴交接機構的圖示。圖16(A)係將第4實施形態的噴嘴交接機構7B從-Y方向觀看的圖。此外，在本實施形態中，噴嘴交接機構7A、7B係皆為相同之構成。在以下的說明中，以噴嘴交接機構7B為例做說明。 　　[0107] 迴旋部18，係以上下方向(鉛直方向)為軸而將噴嘴NZ保持成可迴旋。迴旋部18係具備例如：軸部20、支持部21、迴旋驅動部22、噴嘴保持部23D。軸部20、支持部21、及迴旋驅動部22，係和第1實施形態相同。迴旋驅動部22，係被控制部3(參照圖14)所控制，使在軸部20被可旋轉地支持的支持部21做迴旋。支持部21，係藉由迴旋驅動部22之驅動，而和第1實施形態同樣地，朝水平方向而迴旋。此外，交接機構7，係亦可不具備迴旋驅動部22，而是由使用者以人力而使支持部21做迴旋之構成。 　　[0108] 噴嘴保持部23D，係將噴嘴NZ予以保持。噴嘴保持部23D係由例如一對L字狀的構件(L字狀構件)所構成。該一對L字狀構件，係朝與X方向平行之方向(與支持部21的長邊方向平行之方向)排列而被配置。+X側的L字狀構件係具有朝+X側突出的突出部65，-X側的L字狀構件係具有朝-X側突出的突出部65。各突出部65，係位於噴嘴NZ(適配器55)的被支持部57的內側(中央側)。各突出部65，係以其上面，將噴嘴NZ的被支持部57的突出部57a的下面予以支持。噴嘴保持部23D，係藉由將噴嘴NZ的被支持部57予以支持，以支持噴嘴NZ。 　　[0109] 圖16(B)係本實施形態的噴嘴保持部23D的放大圖。噴嘴保持部23D，係在各突出部65的上面(上部)，設有將噴嘴NZ予以定位的定位部60的凸部60b。各凸部60b，係在噴嘴NZ是被噴嘴保持部23D所支持之際，係會嵌入至適配器55的被支持部57的各凹部60a，噴嘴NZ係被定位。此外，凹部60a及凸部60b的個數係分別亦可不是2個，例如，凹部60a及凸部60b的個數係亦可為3個以上。此外，凹部60a及凸部60b的形狀係分別不限定於圓錐狀(推拔狀)，而為任意。例如，凹部60a及凸部60b的形狀係亦可為圓柱狀，也可為矩形柱狀。關於噴嘴NZ的交接，係在之後說明。此外，關於噴嘴保持部23D的噴嘴NZ的保持及釋放之機構，係在之後說明。 　　[0110] 如上記而被構成的本實施形態的噴嘴交接機構7A、7B係分別在交接位置P1A、P1B(參照圖14)、待機位置P2A、P2B之間移動，在交接位置P1A、P1B上，對門架10的支柱部10c進行噴嘴NZ的交接，在待機位置P2A、P2B上進行待機。 　　[0111] 交接位置P1A、P1B係分別被設定成，在門架10的支柱部10c與噴嘴交接機構7A、7B之間，可進行噴嘴NZ之交接。例如，噴嘴交接機構7A、7B係分別被形成為，在交接位置P1A、P1B上，支持部21的長邊方向，會是與平台4之移動方向正交之方向(與Y方向平行之方向)(參照圖14)。 　　[0112] 待機位置P2A、P2B係分別被設定在，當噴嘴交接機構7A、7B將噴嘴NZ予以保持時，噴嘴NZ會是從平台4的上方跑開的位置。噴嘴交接機構7A、7B係分別被形成為，在待機位置P2A、P2B上，支持部21的長邊方向，會變成與X方向平行之方向(參照圖14)。例如，噴嘴交接機構7A、7B係分別在待機位置P2A、P2B上，進行噴嘴NZ的維護等。 　　[0113] 接著說明塗布裝置1C之動作。圖17～圖19係分別為塗布裝置1C之動作的圖示。在說明塗布裝置1C之動作之際，適宜參照圖14～圖16。 　　[0114] 本實施形態的塗布裝置1C，係如圖14所示，將2個噴嘴NZ1、NZ2之其中1者以門架10的支柱部10c(噴嘴支持部6C)加以選擇，而對基板S進行塗布。例如，噴嘴NZ1、NZ2之任一者被選擇的情況下，噴嘴NZ1、NZ2，係藉由對應的噴嘴交接機構7A、7B，而被各支柱部10c所支持。此外，圖14係圖示了，由支柱部10c將噴嘴NZ1予以支持的例子。 　　[0115] 各支柱部10c係例如，如圖17(A)所示，將噴嘴NZ以各支柱部10c的上面，從下方，將噴嘴NZ的適配器55予以支持，以支持噴嘴NZ。各支柱部10c，係將噴嘴NZ從下方加以支持，因此可將噴嘴NZ不會落下而確實地加以保持。又，噴嘴NZ，係藉由定位部56，而被各支柱部10c在已被定位之狀態下，而被支持。噴嘴NZ，係在適配器55的下面(下部)的凹部56a中，嵌入各支柱部10c的凸部56b，而被定位。鉗夾機構62，係在噴嘴NZ是被各支柱部10c所定位並支持的狀態下，將適配器55與各支柱部10c予以固定。+Y側及-Y側的鉗夾機構62係例如，將適配器55的下面，往各支柱部10c的上面推壓而固定。適配器55與各支柱部10c、係藉由鉗夾機構62，而被確實地固定。各鉗夾機構62，係藉由控制部3(參照圖14)之控制，藉由未圖示之驅動部而被驅動，將適配器55與各支柱部10c予以固定。塗布裝置1C，係藉由控制部3之控制而驅動升降驅動部15(參照圖14)，微調基板S與噴嘴NZ之間的距離，對基板S進行塗布。塗布裝置1C所致之基板S的塗布之動作，係和第1實施形態相同。 　　[0116] 接著說明，塗布裝置1C所致之，更換已被各支柱部10c所支持之噴嘴NZ之動作。此外，以下的說明中，係說明使用噴嘴交接機構7B來更換噴嘴的例子，但關於噴嘴交接機構7A也是同樣如此。 　　[0117] 塗布裝置1C，係在更換已被各支柱部10c所支持之噴嘴NZ之際，首先，如圖17(B)所示，控制部3(參照圖14)係驅動升降驅動部15，使支柱部10c往鉛直上方移動。控制部3，係使各支柱部10c往鉛直上方的所定位置移動。該所定位置係為，在各支柱部10c與噴嘴交接機構7(7A、7B)之間，可進行噴嘴NZ之交接的位置。例如，該所定位置係被設定成，在適配器55的被支持部57的下方，可配置噴嘴交接機構7的噴嘴保持部23D的位置。 　　[0118] 接下來，圖18(A)所示，控制部3，係驅動迴旋驅動部22，使噴嘴交接機構7的迴旋部18迴旋。控制部3，係使迴旋部18，往交接位置P1B移動。在該交接位置P1B上，迴旋部18係被配置在，各支柱部10c的鉛直上方的所定位置。例如，在交接位置P1B上，噴嘴交接機構7的噴嘴保持部23D，係被設定在適配器55的被支持部57的下方(正下方)之位置。 　　[0119] 接下來，如圖18(B)所示，控制部3，係驅動升降驅動部15，使各支柱部10c往鉛直下方移動。此外，控制部3係早於該各支柱部10c的鉛直下方之移動，先驅動鉗夾機構62，以釋放鉗夾機構62所致之支柱部10c與適配器55之固定。藉由各支柱部10c的鉛直下方之移動，而進行支柱部10c與噴嘴交接機構7B之間的噴嘴NZ的交接。藉由各支柱部10c的鉛直下方之移動，噴嘴保持部23D的凸部60b就會嵌入適配器55的被支持部57的凹部60a，噴嘴NZ係被定位。 　　[0120] 接下來，如圖19(A)所示，控制部3，係驅動升降驅動部15，使各支柱部10c再往鉛直下方移動。藉此，噴嘴NZ，係在被定位於噴嘴交接機構7B的噴嘴保持部23D的狀態下，被從各支柱部10c交給噴嘴交接機構7。 　　[0121] 接下來，圖19(B)所示，控制部3，係驅動迴旋驅動部22，使噴嘴交接機構7A往待機位置P2A移動。於待機位置P2A、P2B上，噴嘴NZ係被進行維護等。 　　[0122] 接下來，進行從噴嘴交接機構7B往支柱部10c的噴嘴NZ1之交接，以進行噴嘴NZ的更換。從噴嘴交接機構7B往各支柱部10c的交接之動作，係依照和上記的從各支柱部10c往噴嘴交接機構7A的噴嘴之交接之動作相反的順序，而被進行。 　　[0123] 如以上所述，本實施形態的塗布裝置1C，係可迅速且確實地進行噴嘴的更換。 　　[0124] 此外，本發明的技術範圍，係不限定於上述的實施形態等中所說明的態樣。上述的實施形態等中所說明的要件的1個以上，有時候會被省略。又，上述的實施形態等中所說明的要件，係可適宜地組合。又，在法令所容許的範圍內，上述的實施形態等中所引用的全部文獻的揭露，都被沿用而作為本文的記載之一部分。 　　[0125] 例如，在上述的實施形態中雖然說明了，塗布裝置1、1A、1B、1C係為，相對於噴嘴支持部6，平台4會做移動之構成的例子，但塗布裝置1、1A、1B、1C之構成，係不限定於此。例如，塗布裝置1、1A、1B、1C係亦可為，相對於平台4，而由噴嘴支持部6來做移動之構成。 　　[0126] 例如，噴嘴交接機構7，係不限定於上記之構成，可採用任意之構成。圖20，係噴嘴交接機構7的其他的例圖示。例如，亦可如圖20所示，噴嘴交接機構7係被形成為，藉由驅動部50之驅動而可朝上下方向及水平方向移動，可與噴嘴支持部6之間進行噴嘴NZ之交接的構成。[First Embodiment] A first embodiment will be described. In the following description, It is preferable to refer to the XYZ orthogonal coordinate system shown in Fig. 1 and the like. The XYZ orthogonal coordinate system, The X direction and the Y direction are horizontal (horizontal direction), The Z direction is the vertical direction. also, In all directions, It is appropriate to refer to the same side as the tip of the arrow as the + side (for example, the +Z side), The side opposite to the tip end of the arrow is referred to as the - side (for example, the -Z side). E.g, In the vertical direction (Z direction), The top is +Z side, The bottom is the -Z side. In addition, In the schema, In order to illustrate the embodiment, And some or all of them will be documented, Simultaneously, Some will be enlarged or emphasized and recorded, etc. It will contain the part that is suitable for changing the scale.  1 is a top view showing an example of a coating apparatus according to a first embodiment. Figure 2 is a section along the line A-A of Figure 1, A section view from the -Y direction. Figure 3 is a section along the line B-B of Figure 1, A section view from the -Y direction. The coating device 1 of the present embodiment, The liquid material L is applied to the substrate S (see FIG. 7(B)). The coating device 1 is provided with, for example: Frame 2 Control unit 3, Platform 4, Platform drive unit 5 (drive unit), Nozzle NZ, Nozzle support portion 6, Nozzle delivery mechanism 7.  [0012] frame 2, Departments support each department. The frame 2 contains, for example: Platform Support Department 9, The gantry 10 (see Figs. 2 and 3). The platform support unit 9 is, for example, The platform 4 is supported to be movable in a direction parallel to the X direction. The platform support unit 9 has, for example: Foot 9a, Abutment 9b. Foot 9a, The system is set on the ground, The base 9b is supported from below. The foot 9a is, for example, Consists of 4 components, It is disposed below the four corners of the base 9b. The base 9b is, for example, Viewed from the top as a rectangle. Abutment 9b, Can pull platform 4 from below, Through guides (not shown), etc. Support can be moved in a direction parallel to the X direction.  [0013] The gantry 10 has a pair of pillar portions 10a, Bridge portion 10b (see Figs. 1 to 3). The pillar portion 10a is provided by sandwiching the platform 4 in the Y direction (see Fig. 1). Each of the pillar portions 10a extends in the vertical direction. It is placed on the ground (see Figures 2 and 3). Each pillar portion 10a, The bridge portion 10b is supported. Bridge portion 10b, It extends in a direction parallel to the Y direction. Bridge portion 10b, Both ends are connected to the upper end side (+Z side) of each pillar part 10a (refer FIG. 1). The bridge portion 10b is supported by a nozzle support portion 6 which will be described later. In addition, The gantry 10 can be movable. E.g, The door frame 10 can also be It is configured to be movable in the X direction with respect to the base 9b.  [0014] The control unit 3 controls each unit. Control unit 3, It is communicably connected to each part of the coating device 1. The control unit 3 is for example, CPU (not shown), A computer device of a memory device (not shown) such as a hard disk or a memory. The control unit 3 is executable, for example, The program of each part of the coating device 1 is controlled. This program is previously memorized in, for example, a memory device. In addition, The control unit 3 can also be connected to, for example, a keyboard, mouse, An input device such as a touch panel is connected, also, It can also be connected to a display device such as a display.  [0015] The stage 4 mounts the substrate S. Platform 4, Attached to the top of the base 9b, Supported by the base 9b to be movable in the X direction. Platform 4 is for example, Viewed from above, It is rectangular (see Figure 1). Platform 4 contains, for example, The top parallel to the XY plane (horizontal plane). The above is formed, for example, in a fixed plate. The substrate S is placed on top by The substrate S is disposed on a surface parallel to the XY plane (horizontal plane). The substrate S is, for example, Positioned by a positioning mechanism (not shown) provided on the platform 4, Adsorbed by an adsorption unit (not shown) provided on the upper surface, This is supported by the above.  [0016] platform driving unit 5, Drive the platform 4. The platform drive unit 5 is, for example, an electric motor or the like. The platform drive unit 5 is, for example, The stage 4 is moved in a direction parallel to the X direction with respect to the base 9b. Platform 4, Driven by the platform driver 5, And for the nozzle support portion 6, which will be described later, Do relative movement. The platform drive unit 5 is, for example, Connected to the control unit 3 in communication, Drive timing, Driving amount, Driving direction, The speed of the drive or the like is controlled by the control unit 3, Move platform 4 to the desired position. In addition, Platform drive unit 5, It is also possible not to be connected to the control unit 3. E.g, The platform driving unit 5 can also be The configuration is driven manually by the user of the platform 4.  [0017] nozzle NZ, The liquid material L is applied to the substrate S. In this embodiment, The coating device 1 is provided with a plurality of nozzles NZ (NZ1) NZ2). E.g, In the example shown in Figure 1, The nozzle NZ1 is supported by the nozzle support portion 6 and is in a coatable state. The nozzle NZ2 is a nozzle for replacement of the nozzle NZ1 supported by the nozzle delivery mechanism 7B described later. E.g, Nozzle NZ1 The NZ2 series are slit nozzles. Nozzle NZ1 NZ2 series have, The discharge port OP of the liquid L is discharged (see FIG. 2(B)). E.g, The spout outlet OP is, for example, A slit-like opening in the downward direction.  [0018] Nozzle NZ1 The NZ2 series are connected to, The liquid supply portion 19 of the corresponding nozzle delivery mechanism 7 is provided. Nozzle NZ1, Is connected to the liquid supply portion 19 of the nozzle delivery mechanism 7A, It is supported by either of the nozzle support unit 6 and the nozzle delivery mechanism 7A. Nozzle NZ2, Is connected to the liquid supply portion 19 of the nozzle delivery mechanism 7B, It is supported by either of the nozzle support unit 6 and the nozzle delivery mechanism 7A. Nozzle NZ1 NZ2 is separate, E.g, By piping or the like (not shown), It is connected to the corresponding liquid supply portion 19. Nozzle NZ1 NZ2, At the time of coating, By the supply of the liquid L from the liquid supply portion 19, And the liquid L is discharged from the discharge port OP, The liquid material L is applied to the substrate S. Regarding the nozzle delivery mechanism 7, Liquid supply unit 19, It will be explained later.  [0019] In addition, The nozzle NZ is not limited to the slit nozzle, And for any. E.g, Nozzle NZ, Can also be an inkjet nozzle, Bar coater, Dispensing nozzles, etc. also, The plurality of nozzles NZ can also be different types of nozzles. also, a plurality of nozzles NZ, It can also contain nozzles with different uses. E.g, Nozzle NZ1 and nozzle NZ2, It can also be used for coating of liquids L of mutually different types. also, Multiple nozzles NZ1 The NZ2 system may not be connected to the liquid supply unit 19, respectively. E.g, Multiple nozzles NZ1 The NZ2 series can also be applied separately. It is connected to the liquid supply portion 19.  [0020] the nozzle support portion 6, Select one from a plurality of nozzles NZ and support them. And the supported nozzle NZ is lifted and lowered. The nozzle support unit 6 is provided with, for example: Guide portion 12, Support department 13, Nozzle holding portion 14, The lifting drive unit 15 is provided. The nozzle support portion 6 is, for example, Supported by the gantry 10.  [0021] The guiding portion 12 is, for example, It is supported by the bridge portion 10b of the gantry 10. Guide 12, Supported by the support unit 13, It can move in the vertical direction. Support section 13, The nozzle holding portion 14 is supported. The guiding portion 12 is, for example, Support section 13, The nozzle holding portion 14 and the nozzle NZ are supported, It can move in the vertical direction (the direction parallel to the Z direction).  [0022] the nozzle holding portion 14, The nozzle NZ is held. Nozzle holding portion 14, Positioning to hold the nozzle NZ. The nozzle holding portion 14 is formed such that The held nozzle NZ can be released. The nozzle holding portion 14 is, for example, It is installed in the support unit 13. The nozzle holding portion 14 is configured to The transfer of the nozzle NZ can be performed between the nozzle delivery mechanism 7 described later. The nozzle holding portion 14 is, for example, When the nozzle NZ is received from the nozzle delivery mechanism 7 described later, The nozzle NZ is accepted and held, also, When the nozzle NZ is delivered to the nozzle delivery mechanism 7, The supported nozzle NZ is released and delivered to the nozzle delivery mechanism 7. In addition, Regarding the mechanism for holding and releasing the nozzle NZ of the nozzle holding portion 14, This will be described later with reference to Figs. 8 to 11 . also, Regarding the mechanism of positioning of the nozzle NZ, This is illustrated later in FIG.  [0023] the lifting drive unit 15, The nozzle NZ is raised and lowered. Lifting drive unit 15, It is connected to the support section 13. The elevation drive unit 15 is, for example, By making the support portion 13 lift, And the nozzle NZ that has been held by the nozzle holding portion 14 is The substrate S is raised and lowered. The elevation drive unit 15 is, for example, an electric motor or the like. Lifting drive unit 15, The support portion 13 can be moved to a predetermined position. E.g, Lifting drive unit 15, At the time of coating, In such a manner that the interval between the discharge port OP of the nozzle NZ and the substrate S is a predetermined interval, The drive support unit 13. The elevation drive unit 15 is, for example, Connected to the control unit 3 in communication, The drive is controlled by the control unit 3. The elevation drive unit 15 is, for example, Drive timing, Driving amount, Driving direction, Speed of driving, etc. It is controlled by the control unit 3. In addition, Lifting drive unit 15, It is also possible not to be connected to the control unit 3. E.g, The lifting drive unit 15 can also be The user controls the configuration of the lift manually. also, There is also no lifting drive unit 15. E.g, The nozzle support portion 6 can also be The support unit 13 is configured to be lifted and lowered by the user.  [0024] The nozzle support portion 6 configured as described above, From the nozzle NZ1 The nozzle NZ1 or the nozzle NZ2 is selected in the NZ2 and supported by the nozzle holding portion 14. E.g, In the example shown in Figure 1, Nozzle support portion 6, From the nozzle NZ1 The nozzle NZ1 is selected in the NZ2, And support. also, Nozzle support portion 6, Will support the nozzle NZ1, At the time of coating, etc. Lifting and lowering by driving the lifting drive unit 15 Configured at the location you have set.  [0025] Next, the nozzle delivery mechanism 7 will be described. Nozzle delivery mechanism 7, The nozzle NZ is transferred to the nozzle support portion 6. The coating device 1 is provided with, for example, Multiple nozzle delivery mechanisms 7 (7A, 7B). Nozzle delivery mechanism 7A, The 7B system has, for example: Swing portion 18, Liquid supply unit 19. Nozzle delivery mechanism 7A, The 7B system is disposed near the platform 4, respectively. E.g, Nozzle delivery mechanism 7A, 7B is configured separately, The -Y side and the +Y side of the platform 4.  In this embodiment, Nozzle delivery mechanism 7A, The 7B system is the same. In the following description, The nozzle delivery mechanism 7A will be described as an example.  [0027] the convolution portion 18, The nozzle NZ is held to be rotatable by the upper and lower directions (vertical direction) being the axes. The turning portion 18 is provided with, for example: Shaft portion 20, Support department 21, Cyclotron drive unit 22, Nozzle holding portion 23.  [0028] the shaft portion 20, It extends along the vertical direction. The shaft portion 20 is fixed to the ground, for example. In addition, The shaft portion 20 can also be fixed outside the ground. E.g, The shaft portion 20 may also be fixed to the frame 2 (for example, the base 9b). Shaft portion 20, Department will support part 21, Through the mounting member (not shown), It is supported to rotate about an axis in the vertical direction of the shaft portion 20.  [0029] support portion 21, The nozzle holding portion 23 is supported. Support section 21, It is rotated around the axis of the shaft portion 20. Support section 21, Is connected to the swing drive unit 22, The rotation is driven by the driving of the turning drive unit 22. The shaft portion 20 and the support portion 21, In a state where the nozzle NZ is held in the nozzle holding portion 23, When the support unit 21 is rounded, So that the lower end of the nozzle NZ, Does not interfere with the way the substrate S has been placed on the platform 4, On the other hand, it is disposed above the substrate S that has been placed on the stage 4 (see the nozzle delivery mechanism 7B shown in FIG. 2).  [0030] the whirling drive unit 22, The support unit 21 is driven, Roundabout. The turning drive unit 22 is, for example, an electric motor or the like. The swing driving unit 22 is, for example, Connected to the control unit 3 in communication, The drive is controlled by the control unit 3. The swing drive unit 22 is, for example, Drive timing, Driving amount, Driving direction, The speed of the drive or the like is controlled by the control unit 3, The support portion 21 is moved to a predetermined position. In addition, Cyclotron drive unit 22, It is also possible not to be connected to the control unit 3. E.g, The swing drive unit 22 can also be The configuration of the convolution is controlled manually by the user. also, There is also no turning drive unit 22. E.g, The handover mechanism 7 can also be The support unit 21 is rotated by the user by human power.  [0031] the nozzle holding portion 23, The nozzle NZ is held. The nozzle holding portion 23 is configured to The held nozzle NZ can be released. The nozzle holding portion 23 is configured, for example, as Between the nozzle holding portion 14 of the nozzle support portion 6 and The transfer of the nozzle NZ is performed. Regarding the handover of the nozzle NZ, It will be explained later. In addition, Regarding the mechanism for holding and releasing the nozzle NZ of the nozzle holding portion 23, This will be described later with reference to Figs. 8 to 11 .  [0032] liquid supply portion 19, The liquid material L is supplied to the nozzle NZ. The liquid supply unit 19 is, for example, a pump. The liquid supply unit 19 is, for example, As shown in Figure 3, It is formed on the trolley 25. Trolley 25 series, for example, It is disposed on the side of the platform 4 (the direction parallel to the Y direction). The trolley 25 is configured, for example, It is away from the platform 4 by one side (-Y side) with respect to the turning portion 18. The trolley 25 series has, for example: a plurality of wheels 25a, Housing portion 25b, Liquid supply unit 19. The trolley 25 series is formed as By a plurality of wheels 25a provided at the lower portion of the accommodating portion 25b, And can be moved. Housing portion 25b, The system is formed into a box, It can accommodate items inside. E.g, The inside of the accommodating portion 25b is housed, A plurality of containers 27 for storing the liquid L. The liquid supply unit 19 is, for example, The tube portion 25c is disposed on the upper portion of the accommodating portion 25b. The liquid supply unit 19 is, for example, Through the container 27 accommodated in the accommodating portion 25b, Tube portion 25c, It is connected by piping (not shown) such as a pipe. also, The liquid supply unit 19 is, for example, With a plurality of nozzles NZ, Corresponding to the specified nozzle NZ, It is connected by piping (not shown) such as a pipe. E.g, The liquid supply portion 19 of the nozzle delivery mechanism 7A, Is connected to the nozzle NZ1, The liquid supply portion 19 of the nozzle delivery mechanism 7B, It is connected to the nozzle NZ2. In addition, The length of the pipe between the nozzle NZ1 and the liquid supply portion 19, And the length of the pipe between the nozzle NZ2 and the liquid supply portion 19, The system is set to be approximately the same. at this time, The control of the liquid supply unit 19 can be controlled, It is the same between the nozzle NZ1 and the nozzle NZ2.  [0033] liquid supply portion 19, Is the liquid L stored in the container 27, The amount of liquid supplied to the nozzle NZ is quantified. Liquid supply unit 19, And the control unit 3 is communicably connected, The operation is controlled by the control unit 3. The liquid supply unit 19 is, for example, The timing of supplying the liquid material L to the nozzle NZ, The amount of the liquid L supplied to the nozzle NZ, etc. It is controlled by the control unit 3. The liquid supply unit 19 is, for example, Driven by the control of the control unit 3, The liquid L stored in the container 27 is in a predetermined amount, Supply to the nozzle NZ. With this, At the time of coating, The nozzle NZ supported by the nozzle support portion 6, The supply of the liquid L by the liquid supply unit 19 is performed. The quantitative liquid L is discharged from the discharge port OP to the substrate S, The liquid L is applied to the substrate S.  [0034] In addition, At least one of the liquid supply portion 19 and the container 27, The system may also not be formed in the trolley 25. also, Whether the coating device 1 is provided with the trolley 25, The system is arbitrary.  [0035] The nozzle delivery mechanism 7A configured as above, 7B is separate, At the handover location P1A, P1B, With standby position P2A, Moving between P2B, At the handover location P1A, On P1B, The nozzle support portion 6 is transferred to the nozzle NZ, In standby position P2A, Standby on P2B (refer to Figure 5(A), Figure 6 (A)). In addition, The nozzle delivery mechanism 7A of the present embodiment, 7B is formed separately, Only horizontal movement caused by maneuvers, But at the handover location P1A, P1B, With standby position P2A, Move between P2B. at this time, The transfer of the nozzle NZ can be performed quickly.  [0036] handover location P1A, The P1B system is set to Nozzle support portion 6 and nozzle delivery mechanism 7A, Between 7B, The position at which the nozzle NZ is handed over can be performed. E.g, Nozzle delivery mechanism 7A, 7B is formed separately, At the handover location P1A, On P1B, The longitudinal direction of the support portion 21, It will be the direction orthogonal to the direction of movement of the platform 4 (the direction parallel to the Y direction).  [0037] Standby position P2A, The P2B system is set to When the nozzle delivery mechanism 7A, When 7B holds the nozzle NZ, The position where the nozzle NZ will run away from above the platform 4. Nozzle delivery mechanism 7A, 7B is formed separately, In standby position P2A, On P2B, The longitudinal direction of the support portion 21, It will be in the direction parallel to the X direction. E.g, Nozzle delivery mechanism 7A, 7B is separate, In standby position P2A, On P2B, Maintenance of the nozzle NZ is performed.  [0038] Below, Based on the action of the coating device 1, The coating method described in the embodiment will be described. Figure 4 is a flow chart of the coating method described in the embodiment. 5 to 7 are views showing an example of the operation of the coating device 1. In addition, In the description of Figure 4, Suitable for referring to Figures 1 to 3, And Figures 5 to 7.  [0039] The coating method is A method of applying the liquid material L to the substrate S. The coating method is, for example, In step S1 shown in FIG. 4, The nozzle delivery mechanism 7A that does not hold the nozzle NZ, Advancing with respect to the nozzle support portion 6. E.g, As shown in Figure 5 (A), The nozzle delivery mechanism 7A at the standby position P2A of the nozzle NZ is not held, The steering drive unit 22 is driven by the control of the control unit 3, By the swirl of the turning portion 18, Move to the handover position P1A. The nozzle delivery mechanism 7A is formed such that Only horizontal movement caused by maneuvers, And can move between the handover position P1A and the standby position P2A, Therefore, it can move quickly.  [0040] Next, In step S2 shown in FIG. 4, The nozzle NZ is held by the nozzle delivery mechanism 7A. E.g, At the handover position P1A, Nozzle delivery mechanism 7A, a nozzle NZ1 in a state of being held by the nozzle support portion 6, It is held by the nozzle holding portion 23. at this time, Nozzle NZ1, It is held by the holding means of both the nozzle holding portion 14 of the nozzle support portion 6 and the nozzle holding portion 23 of the nozzle delivery mechanism 7A.  [0041] Next, In step S3 shown in FIG. 4, Holding the nozzle NZ caused by the nozzle support portion 6, Release it. E.g, Nozzle support portion 6, When the nozzle delivery mechanism 7A is holding the nozzle NZ1, Release nozzle NZ1, The nozzle NZ1 is delivered to the nozzle delivery mechanism 7A. Nozzle NZ1, In a state of being held by either of the nozzle support unit 6 and the nozzle delivery mechanism 7A, Hand over, Therefore, the transfer of the nozzle NZ can be performed reliably.  [0042] Next, In step S4 shown in FIG. 4, The nozzle delivery mechanism 7A is retracted. The nozzle NZ1 not selected by the nozzle support portion 6, It is retracted from above the platform by the nozzle delivery mechanism 7A. E.g, As shown in Figure 5 (B), Nozzle delivery mechanism 7A, While maintaining the nozzle NZ1, The swing drive unit 22 is driven by the control of the control unit 3, Move to the standby position P2A. E.g, At the standby position P2A, The nozzle NZ1 held by the nozzle delivery mechanism 7A, Replace the nozzle, Maintenance of the nozzle, etc.  [0043] Next, In step S5 shown in FIG. 4, Having the other nozzle delivery mechanism 7B holding the nozzle NZ2, Advancing with respect to the nozzle support portion 6. E.g, As shown in Figure 6 (A), The nozzle delivery mechanism 7B at the standby position P2B of the nozzle NZ2 is being held, The steering drive unit 22 is driven by the control of the control unit 3, By the swirl of the turning portion 18, And move to the handover position P1B. The nozzle delivery mechanism 7B is formed such that Only horizontal movement caused by maneuvers, And can move between the handover position P1B and the standby position P2B, Therefore, it can move quickly.  [0044] Next, In step S6 shown in FIG. 4, The nozzle NZ2 is held by the nozzle support portion 6. E.g, At the handover position P2A, Nozzle support portion 6, a nozzle NZ2 in a state of being held by the nozzle delivery mechanism 7B, It is held by the nozzle holding portion 14. at this time, Nozzle NZ, It is held by the holding means of both the nozzle holding portion 14 of the nozzle support portion 6 and the nozzle holding portion 23 of the nozzle delivery mechanism 7B.  [0045] Next, In step S7 shown in FIG. 4, The holding of the nozzle NZ2 by the nozzle delivery mechanism 7B is released. E.g, Nozzle delivery mechanism 7B, In a state where the nozzle support portion 6 is holding the nozzle NZ, Release nozzle NZ2, The nozzle NZ2 is delivered to the nozzle support portion 6. Nozzle NZ2, In a state of being held by either of the nozzle support unit 6 and the nozzle delivery mechanism 7A, Hand over, Therefore, the transfer of the nozzle NZ can be performed reliably.  [0046] Next, In step S8 shown in FIG. 4, The nozzle delivery mechanism 7B is retracted. E.g, As shown in Figure 6 (B), Nozzle delivery mechanism 7B, The steering drive unit 22 is driven by the control of the control unit 3, Move to the standby position P2B and stand by. In addition, Whether to proceed to step S8, The system is arbitrary.  [0047] Next, In step S9 shown in FIG. 4, The substrate S is placed on the stage 4. E.g, As shown in Figure 7 (A), The substrate S is positioned on the stage 4 and placed. In addition, The mounting of the substrate S is, for example, It can be done by the user by manpower. It can also be made by a device such as a transport device.  [0048] Next, In step S10 shown in FIG. 4, The liquid crystal L is applied onto the substrate S by moving the stage 4. E.g, As shown in Figure 7 (B), Relatively moving the platform 4 and the nozzle support portion 6, The liquid material L is applied onto the substrate S. E.g, First of all, By the control of the control unit 3, Lifting drive unit 15, So that the interval between the lower end of the nozzle NZ2 and the substrate S is a predetermined interval, Drive support unit 13, To move the nozzle NZ2. then, By the control of the control unit 3, The platform driving unit 5 moves the platform 4 in the -X direction. Simultaneously, The liquid supply unit 19 is a liquid amount L of a predetermined amount. It is supplied to the nozzle NZ2. With this, Nozzle NZ2, Discharging the liquid L from the discharge port OP, The liquid material L is applied onto the substrate S. After the application of the liquid L of the substrate S is completed, The substrate S is carried out. The substrate S is carried out, for example, Can be manually used by the user, It can also be carried out by means of a transport device or the like. In addition, The mounting of the substrate S on the platform 4 caused by the step S9 may also be, for example, This is done before the start of step S1 above.  [0049] Next, The nozzle holding portion 14 of the nozzle support portion 6 and the nozzle holding portion 23 of the nozzle delivery mechanism 7 will be described. Figures 8 to 10 are respectively The first to third examples of the nozzle holding portion of the nozzle support portion 6 and the nozzle delivery mechanism 7 are shown.  [0050] The nozzle holding portion 14 of the nozzle support portion 6 and the nozzle holding portion 23 of the nozzle delivery mechanism 7 are respectively As long as the nozzle NZ can be handed over to each other, The composition is arbitrary. The holding mechanism of the nozzle NZ of the nozzle support portion 6 can also use, for example, Any of the first to third examples shown in Figs. 8 to 10 .  [0051] First, the description The nozzle holding portion 14A of the nozzle support portion 6 shown in Figs. 8(A) and (B), And the first example of the nozzle holding portion 23A of the nozzle delivery mechanism 7. The nozzle holding portion 14A of the nozzle support portion 6 of the first example, And the nozzle holding portion 23A of the nozzle delivery mechanism 7, The nozzle NZ is sandwiched by the longitudinal direction of the nozzle NZ, respectively. The nozzle NZ is held. The nozzle holding portion 14A of the nozzle support portion 6 and the nozzle holding portion 23A of the nozzle delivery mechanism 7 each include a grip portion 30.  [0052] The grip portion 30 of the nozzle support portion 6 is, for example, As shown in Figure 8(A), Is formed into, A pair of holding members that can sandwich the nozzle NZ in the longitudinal direction (the direction parallel to the Y direction). a pair of holding members, The nozzle NZ is sandwiched and arranged in the longitudinal direction of the nozzle NZ. The pair of grip members each have a recess 30a. The recess 30a is formed such that The end of the nozzle NZ in the longitudinal direction can be inserted. a pair of holding members, It is supported by the support unit 13. a pair of holding members, Through the guides not shown, Further, it is movable in a direction parallel to the longitudinal direction of the nozzle NZ with respect to the support portion 13, Supported by the support department 13. a pair of holding members, While holding the nozzle NZ, By moving toward the nozzle NZ, The end portion of the nozzle NZ in the longitudinal direction is inserted into the recess 30a. The nozzle NZ is supported by pressing the nozzle NZ. also, a pair of holding members, When the nozzle NZ is released from the hold, By moving away from the nozzle NZ, The end portion of the nozzle NZ in the longitudinal direction is separated from the recess 30a. The nozzle NZ is released.  [0053] Next, The grip portion 30 of the nozzle delivery mechanism 7, A pair of grip members are supported by the support portion 21. The grip portion 30 of the nozzle delivery mechanism 7, In addition to being configured differently, The remaining portions are configured in the same manner as the grip portion 30 of the nozzle support portion 6. The grip portion 30 of the nozzle delivery mechanism 7, It is clamped and held from the longitudinal direction of the nozzle NZ. By releasing the gripping portion 30 on the nozzle NZ, The retained nozzle NZ is released.  [0054] the grip portion 30 of the nozzle support portion 6 and the grip portion 30 of the nozzle delivery mechanism 7, As shown in Figure 8 (B), At the position P1A where the nozzle NZ is handed over, P1B (refer to Figure 5 (A), Figure 6 (A)), They are formed at different heights. E.g, In the example shown in FIG. 8(B), At position P1A, On P1B, The grip portion 30 of the nozzle support portion 6, Relative to the grip portion 30 of the nozzle delivery mechanism 7, It is formed below. In addition, At position P1A, On P1B, The grip portion 30 of the nozzle support portion 6, It can also be relative to the grip portion 30 of the nozzle delivery mechanism 7, It is formed at the top.  [0055] In the first example, The grip portion 30 of the nozzle support portion 6 and the grip portion 30 of the nozzle delivery mechanism 7, As shown in Figure 8 (B), Position P1 at which the nozzle NZ is transferred (refer to FIG. 5(A), Figure 6 (A)), They are formed at different heights. Therefore, in the grip portion 30 of the nozzle support portion 6 and the grip portion 30 of the nozzle delivery mechanism 7, The respective nozzle holding action and nozzle releasing action are not disturbed. Can be done independently. With this, In a state in which the nozzle NZ is held in one of the nozzle support portion 6 and the nozzle delivery mechanism 7, The other side can release the nozzle NZ.  [0056] Next, The nozzle holding portion 14 of the nozzle support portion 6 shown in Fig. 9 will be described. And a second example of the nozzle holding portion 23 of the nozzle delivery mechanism 7. The nozzle holding portion 14B of the nozzle support portion 6 of the second example and the nozzle holding portion 23B of the nozzle delivery mechanism 7 each include a grip portion 32. Will be placed in the grip portion 31 of the nozzle NZ, The grip portion 32 is sandwiched, Thereby, the nozzle NZ is held.  [0057] As shown in FIG. 9, The held portion 31 is provided in the nozzle NZ. The held portion 31 is provided, The respective faces on both sides of the short side direction (the direction parallel to the X direction) of the nozzle NZ. The held portion 31 is, for example, A flange member having a projection 31a. The held portion 31 is provided on the side closer to the nozzle support portion 6 (-X side), It is sandwiched by the grip portion 32 of the nozzle support portion 6. The grip portion 31 is provided on the far side (+X side) with respect to the nozzle support portion 6 and It is sandwiched by the grip portion 32 of the nozzle delivery mechanism 7.  [0058] The grip portion 32 of the nozzle support portion 6 is, for example, As shown in Figure 9, Was formed as A pair of holding members that can be sandwiched by the protruding portion 31a of the grip portion 31 in the longitudinal direction of the nozzle NZ (the direction parallel to the Y direction). a pair of holding members, The grip portion 31 is placed in the longitudinal direction of the nozzle NZ and placed. The pair of grip members have recesses 32a, respectively. The recess 32a is formed such that It can be inserted into the protruding portion 31a of the grip portion 31. a pair of holding members, It is supported by the support unit 13. a pair of holding members, Through the guides not shown, It is movable in a direction parallel to the longitudinal direction of the nozzle NZ with respect to the support portion 13, Supported by the support department 13. a pair of holding members, While holding the nozzle NZ, By moving toward the nozzle NZ, The projection 31a on the nozzle support portion 6 side of the nozzle NZ is inserted into the recess 32a. By pressing the protrusion 31a, The nozzle NZ is supported. also, a pair of holding members, When the nozzle NZ is released from the hold, By moving away from the nozzle NZ, The protruding portion 31a will run away from the recess 32a. Thereby the nozzle NZ is released.  [0059] the grip portion 32 of the nozzle delivery mechanism 7, In addition to the fact that the pair of holding members are supported by the support portion 21, The remaining portions are configured identically to the grip portion 32 of the nozzle support portion 6. By sandwiching the protruding portion 31a of the nozzle NZ away from the nozzle support portion 6 from the longitudinal direction, And the nozzle NZ is kept, By releasing the gripping portion 32 from the nozzle NZ, The held nozzle NZ is released.  [0060] In this example, Being held 31, They are disposed on the respective faces of the short side of the nozzle NZ, Therefore, the grip portion 32 of the nozzle support portion 6 and the grip portion 32 of the nozzle delivery mechanism 7 are Is at position P1 (refer to Figure 5 (A), Figure 6 (A)), On the opposite side of the short side direction of the nozzle NZ, The nozzles can be kept in motion and the nozzles are released. Will not interfere with the ground, Do it independently. With this, In a state where one of the nozzle support portion 6 and the nozzle delivery mechanism 7 is holding the nozzle NZ, The other side can release the nozzle NZ, Therefore, the transfer of the nozzle NZ can be performed reliably.  [0061] In addition, The grip portion 31 and the grip portion 32 can hold (hold) the grip portion 31 with the grip portion 32, respectively. Any configuration can be employed. also, The grip portion 32 can also be made by, for example, a drive unit (not shown).  [0062] Next, A third example of the nozzle holding portion 14 of the nozzle support portion 6 and the nozzle holding portion 23 of the nozzle delivery mechanism 7 shown in Fig. 10 will be described. The nozzle holding portion 14C of the nozzle support portion 6 of the third example and the nozzle holding portion 23C of the nozzle delivery mechanism 7 each include an electromagnet portion 38. The adsorption portion 37 provided on the nozzle NZ is adsorbed by the electromagnet portion 38, While holding the nozzle NZ.  [0063] As shown in FIG. 10, The adsorbed portion 37 is provided in each of the nozzles NZ. The adsorbed portion 37 is provided, The respective faces on both sides of the short side direction (the direction parallel to the X direction) of the nozzle NZ. Adsorbed portion 37, It is formed of a magnetic material such as iron which can be adsorbed by the electromagnet portion 38.  [0064] The electromagnet portion 38 of the nozzle support portion 6 is, for example, Around the coil of the core formed of a magnetic material, A magnet that temporarily generates a magnetic force by energization. The electromagnet portion 38 of the nozzle support portion 6, Is connected to a power source (not shown) and switch 39, Switching between power on and power off will occur. Electromagnet part 38, It is supported by the support unit 13. Electromagnet part 38, Power is applied by switch 39. Magnetic force is generated and is adsorbed by the adsorption portion 37. The nozzle NZ is held. Electromagnet part 38, Power off by switch 39, The magnetic force disappears and the adsorption to the adsorbed portion 37 is released. The nozzle NZ is released. The switching of energization and de-energization by the switch 39 is controlled by, for example, the control unit 3. In addition, The switching of the energization and de-energization caused by the switch 39 can also be It is constructed by the user manually.  [0065] the nozzle holding portion 23C of the nozzle delivery mechanism 7, In addition to the fact that the electromagnet portion 38 is supported by the support portion 21, The rest of the system is configured in the same manner as the nozzle holding portion 14C of the nozzle support portion 6. The adsorbed portion 37 provided on the nozzle NZ is held by the electromagnetic stone portion 38 to hold the nozzle NZ. By releasing the adsorption of the adsorbed portion 37 by the electromagnet portion 38, The held nozzle NZ is released.  [0066] In this example, Adsorbed portion 37, They are disposed on the respective faces of the short side of the nozzle NZ, Therefore, the electromagnet portion 38 of the nozzle support portion 6 and the electromagnet portion 38 of the nozzle delivery mechanism 7 are Is at position P1 (refer to Figure 5 (A), Figure 6 (A)), On the opposite side of the short side direction of the nozzle NZ, The nozzles can be kept in motion and the nozzles are released. Will not interfere with the ground, Do it independently. With this, In a state where one of the nozzle support portion 6 and the nozzle delivery mechanism 7 is holding the nozzle NZ, The other side can release the nozzle NZ.  [0067] Next, the positioning unit 41 will be described. 11(A) and (B) are diagrams showing an example of a positioning portion, (A) is a view from above, (B) is a view from the side.  [0068] Below, The positioning portion 41 of the nozzle holding portion 14A of the nozzle support portion 6 shown in Figs. 8(A) and (B) will be described as an example. The positioning portion 41 is, for example, As shown in Figures 11(A) and (B), have: Support surface 42, 2 convex parts 43, Two recesses 44. The support surface 42 is, for example, a rectangular flat plate shape. The support surface 42 is provided, for example, The surface (+X side) on which the nozzle NZ is held among the two faces of the support portion 13. Supporting the face of the +X side of the face 42, When the nozzle NZ is held by the nozzle holding portion 14A, It is formed by being in close contact with the surface on the -X side of the nozzle NZ.  [0069] 2 convex portions 43, Attached to the surface of the +X side of the support surface 42, The central portion of the support surface 42 in the height direction, They are formed by being aligned in a direction parallel to the Y direction. The two convex portions 43 are, for example, conical (push-up shape). 2 recesses 44, Attached to the side of the -X side of the nozzle NZ, Formed in a direction parallel to the Y direction, Is formed into When the nozzle NZ is held by the nozzle holding portion 14A, The two convex portions 43 are fitted.  [0070] In addition, The number of the convex portion 43 and the concave portion 44 may not be two, respectively. E.g, The number of the convex portions 43 and the concave portions 44 may be three or more. In addition, The shape of the convex portion 43, It is not limited to a conical shape (push-up shape). And for any. E.g, The shape of the convex portion 43, The system can also be cylindrical. It can also be rectangular columnar.  [0071] the positioning portion 41, When the nozzle NZ is held in the nozzle holding portion 14A, By the support surface 42 being in close contact with the surface on the -X side of the nozzle NZ, And restricting the movement of the nozzle NZ about the Y axis and about the Z axis, And, By fitting the two convex portions 43 and the two concave portions 44, The movement of the nozzle NZ about the X axis is restricted. With this, Positioning unit 41, When the nozzle NZ is held by the nozzle holding portion 14A, The nozzle NZ can be positioned at a predetermined position. also, 2 convex parts, The system is conical (push-up), Therefore, when the nozzle delivery mechanism 7 transfers the nozzle NZ to the nozzle support portion 6, Even if there is a slight offset in the position of the nozzle NZ, The nozzle NZ can still be positioned.  [0072] In addition, In the case where the positioning portion 41 is provided in the nozzle holding portion 14B shown in FIG. 9 , E.g, Support surface 42 and two convex portions 43, Is disposed above or below the grip portion 32, Two recesses 44 are arranged, When the nozzle NZ is held by the nozzle holding portion 14B, The two convex portions 43 will be fitted to each other.  [0073] Again, In the case where the positioning portion 41 is provided in the nozzle holding portion 14C shown in FIG. 10, E.g, Support surface 42 and two convex portions 43, Is disposed above or below the electromagnet portion 38, Two recesses 44 are arranged, When the nozzle NZ is held by the nozzle holding portion 14C, The position at which the two convex portions 43 are fitted.  [0074] In addition, The nozzle delivery mechanism 7 shown in FIGS. 8 to 10 can also be used. The positioning portion 41 is provided. E.g, In the case where the positioning portion 41 is provided in the nozzle holding portion 23A of the nozzle delivery mechanism 7 shown in FIG. Support surface 42 and two convex portions 43, Is disposed in the support portion 21 of the nozzle holding portion 23A, Two recesses 44 are arranged, When the nozzle NZ is held by the nozzle holding portion 14A, The two convex portions 43 will be fitted to each other. also, E.g, In the case where the positioning portion 41 is provided in the nozzle holding portion 23B of the nozzle delivery mechanism 7 shown in FIG. 9, E.g, Support surface 42 and two convex portions 43, It is disposed above or below the grip portion 32 of the nozzle holding portion 23B. Two recesses 44 are arranged, When the nozzle NZ is held by the nozzle holding portion 14A, The two convex portions 43 will be fitted to each other. also, E.g, In the case where the positioning portion 41 is provided in the nozzle holding portion 23C of the nozzle delivery mechanism 7 shown in FIG. 10, E.g, Support surface 42 and two convex portions 43, Is disposed above or below the electromagnet portion 38, Two recesses 44 are arranged, When the nozzle NZ is held by the nozzle holding portion 14A, The two convex portions 43 will be fitted to each other.  [0075] Thus, The coating device 1 and the coating method of the present embodiment, One of the plurality of nozzles NZ is selected by handing over the nozzle NZ to the nozzle support portion 6, Therefore, the nozzle support portion 6 can be shared between the plurality of nozzles NZ. With this, Can suppress the cost of the device, also, The composition of the device can be made simple and compact. also, Since the nozzle support portion 6 is shared between the plurality of nozzles NZ, Therefore, it is possible to suppress the replacement of the nozzle, a support mechanism of the nozzle of the nozzle support portion 6, Or the time required for the adjustment of the drive mechanism of the nozzle, The nozzle can be replaced quickly.  [0076] As described above, The coating device 1 and the coating method of the present embodiment, The nozzle can be quickly replaced.  [Second Embodiment] A second embodiment will be described. In this embodiment, The same configuration as the above embodiment, The same symbols are denoted and their description is omitted or simplified.  12(A) and 12(B) are diagrams showing a coating apparatus 1A according to a second embodiment, (A) is a view viewed from the X direction, (B) is a view from above. The coating device 1A of the present embodiment, A maintenance unit 46 is provided. Coating device 1A, In addition to the trolley 25A, Outside the maintenance unit 46, The rest is the same as the coating apparatus 1 of the first embodiment. In addition, In Figure 12, Except for the maintenance unit 46 of the coating device 1A, The rest is omitted or simplified.  [0079] Maintenance unit 46, It is the part that performs maintenance of the nozzle NZ. E.g, The trolley 25A of the coating device 1A, A maintenance unit 46 is provided. Trolley 25A, In addition to the maintenance unit 46, The rest is the same as the bogie 25 of the first embodiment. In addition, Trolley 25A, Attached to the nozzle delivery mechanism 7A, Near 7B, Configure 2 pieces.  [0080] Maintenance unit 46, It is disposed on the upper portion of the trolley 25A. The maintenance unit 46 is formed as, for example, Can be placed in the standby position P2A, The nozzle delivery mechanism 7A at the position of P2B, The nozzle NZ in the state maintained by 7B is taken. E.g, In this embodiment, By the movement of the trolley 25A, Has been the nozzle delivery mechanism 7A, The nozzle NZ in the state held by 7B is available for the maintenance portion 46 of the carriage 25A.  [0081] The maintenance unit 46 is provided with, for example: a cleaning unit (not shown) that cleans the tip end of the nozzle NZ, a preliminary discharge unit (not shown) required for preliminary discharge of the liquid material L from the nozzle NZ, A wiping portion (not shown) that wipes the tip end of the nozzle NZ. In addition, Maintenance unit 46, As long as at least one of these is available.  [0082] The washing unit is provided with, for example: A container for holding the washing liquid required for washing the nozzle NZ. The pre-discharge department has: A container for receiving the liquid L to be discharged from the nozzle NZ. The wiping part has, for example: A wiping member that wipes the nozzle NZ by moving the tip end of the nozzle NZ.  [0083] As described above, The coating device 1A of the present embodiment, The maintenance unit 46 is provided. Therefore, the maintenance of the nozzle NZ can be performed in the coating operation. With this, Coating device 1A, It can suppress the decrease in productivity. also, The coating device 1A of the present embodiment, The bogie 25A is provided with a maintenance unit 46. Therefore, the configuration of the maintenance unit 46 can be simplified. also, The maintenance unit 46 and the liquid supply unit 19 share the trolley 25A. Therefore, the size of the apparatus of the coating device 1A can be made fine.  [Third Embodiment] A third embodiment will be described. In this embodiment, The same configuration as the above embodiment, The same symbols are denoted and their description is omitted or simplified.  13 is a top view of the coating device 1B according to the third embodiment. The coating device 1B of the present embodiment is provided with, for example: Frame 2 Control unit 3 (not shown), Platform 4, Platform drive unit 5 (drive unit), 4 nozzles NZ (NZ1 ~ NZ4), 2 nozzle support parts 6 (6A, 6B), Four nozzle delivery mechanisms 7 (7A to 7D). In addition, Control unit 3, Platform 4, And the platform drive unit 5 (drive unit) is the same as that of the first embodiment. Therefore, the explanation is omitted or simplified.  [0086] The housing 2 of the embodiment, The system has a platform support unit 9B, Door frame 10. The platform support unit 9B of the present embodiment, In addition to being formed longer than the platform support portion 9 of the first embodiment in the X direction, The rest are the same as those of the first embodiment. Platform 4, It moves between the both ends of the platform support part 9B in the direction parallel to the X direction. Door frame 10, The configuration is the same as that of the gantry 10 of the first embodiment.  [0087] two nozzle support portions 6A, 6B is separate, It is supported by, for example, the bridge portion 10b of the gantry 10. E.g, Nozzle support portion 6A, It is supported on the +X side of the bridge portion 10b of the gantry 10, Nozzle support portion 6B, It is supported on the -X side of the bridge portion 10b of the gantry 10.  [0088] nozzle support portion 6A, The same configuration as the nozzle support portion 6 of the first embodiment. From a plurality of nozzles NZ1 NZ2 chooses one and supports it. And the supported nozzle NZ can be raised and lowered. Nozzle support portion 6B, From a plurality of nozzles NZ3, One of NZ4 is selected and supported. And the supported nozzle NZ is lifted and lowered. Nozzle support portion 6B, In addition to the position supported by the gantry 10, And the supported nozzles NZ are different, The rest of the configuration is the same as that of the nozzle support portion 6 of the first embodiment. also, Nozzle support portion 6A, The operation of 6B is the same as that of the nozzle support unit 6 of the first embodiment.  [0089] The nozzle delivery mechanisms 7A to 7D are respectively disposed in the vicinity of the platform support portion 9B. E.g, Nozzle delivery mechanism 7A, AC, It is on the -Y side of the platform support unit 9B. It is formed by being aligned in a direction parallel to the X direction. E.g, Nozzle delivery mechanism 7B, 7D, It is on the +Y side of the platform support unit 9B. It is formed by being aligned in a direction parallel to the X direction. The nozzle delivery mechanisms 7A to AD are respectively different from the positions at which they are arranged. The rest is the same as the nozzle delivery mechanism 7A of the first embodiment. Nozzle delivery mechanism 7A, 7B is formed separately, Between the nozzle support portions 6A, The transfer of the nozzle NZ is performed. also, Nozzle delivery mechanism 7C, The AD system is formed separately, The nozzle NZ can be transferred to the nozzle support portion 6B. The operation of the nozzle delivery mechanisms 7A to 7D is the same as that of the nozzle delivery mechanism 7 of the first embodiment.  The nozzles NZ1 to NZ4 are the same slit nozzles as in the first embodiment. Nozzle NZ1, Is connected to the liquid supply portion 19 of the nozzle delivery mechanism 7A, It is supported by either of the nozzle support unit 6 and the nozzle delivery mechanism 7A. also, Nozzle NZ2, Is connected to the liquid supply portion 19 of the nozzle delivery mechanism 7B, It is supported by either of the nozzle support unit 6 and the nozzle delivery mechanism 7B. also, Nozzle NZ3, Is connected to the liquid supply portion 19 of the nozzle delivery mechanism 7C, It is supported by either of the nozzle support unit 6 and the nozzle delivery mechanism 7C. also, Nozzle NZ4, Is connected to the liquid supply portion 19 of the nozzle delivery mechanism 7D, It is supported by either of the nozzle support unit 6 and the nozzle delivery mechanism 7D.  [0091] Next, the operation of the coating device 1B will be described. The coating device 1B of the present embodiment, One of the four nozzles NZ1 to NZ4, Selecting by the nozzle support portion 6A or the nozzle support portion 6B, The coating of the substrate S is different from that of the first embodiment. As for the other actions, The operation of the coating device 1 of the first embodiment is the same.  [0092] The coating device 1B of the present embodiment, One of the nozzles NZ1 to NZ4 is selected. It is supported by the nozzle support portion 6A or the nozzle support portion 6B. E.g, Nozzle NZ1 In the case where either NZ2 is selected, Nozzle NZ1 NZ2, By the corresponding nozzle delivery mechanism 7A, 7B, And is delivered to the nozzle support portion 6A, It is supported by the nozzle support unit 6A. also, Nozzle NZ3, In the case where either NZ4 is selected, Nozzle NZ3, NZ4, By the corresponding nozzle delivery mechanism 7C, 7D, And is delivered to the nozzle support portion 6B, It is supported by the nozzle support unit 6B.  [0093] the nozzle NZ that has been supported by the nozzle support portion 6A or the nozzle support portion 6B, By the corresponding lifting drive unit 15, The lower end of the nozzle NZ is moved by a predetermined distance with respect to the substrate S. Next, By the control of the control unit 3, The platform drive unit 5 is driven, The platform 4 moves in a direction parallel to the +X direction or the -X direction. The nozzle NZ is supplied with the liquid material L by the corresponding liquid supply portion 19, The liquid L is discharged from the discharge port OP. With this, Coating device 1B, The liquid material L is applied to the substrate S.  [0094] the nozzle NZ supported by the nozzle support portion 6A or the nozzle support portion 6B, At the time of replacement, It is delivered to any of the corresponding nozzle delivery mechanisms 7A to 7D. at this time, The nozzle support portion 6A and the nozzle support portion 6B are in a state in which the nozzle NZ is not supported. Next, back to the begining, Coating device 1B, One of a plurality of nozzles NZ1 to NZ4 is selected. Supported by the nozzle support portion 6A or the nozzle support portion 6B, Carry out the next coating.  [0095] As described above, The coating device 1B of the present embodiment, Four nozzles NZ are replaceable, Therefore, it is possible to increase the number of nozzles that can be used.  [Fourth embodiment] A fourth embodiment will be described. In this embodiment, The same configuration as the above embodiment, The same symbols are denoted and their description is omitted or simplified. Hereinafter, the difference between the present embodiment and the above-described embodiment will be mainly described.  [0097] FIG. 14 is a top view showing an example of a coating device according to a fourth embodiment. The coating device 1C of the present embodiment is provided with, for example: Frame 2 Control unit 3, Platform 4, Platform drive unit 5 (drive unit), Nozzle NZ, The nozzle support portion 6C (the pillar portion 10c of the gantry 10), Nozzle delivery mechanism 7 (7A, 7B), And trolley 25. Control unit 3, Platform 4, Platform driver 5 And the trolley 25, It is the same as that of the first embodiment.  [0098] frame 2, Departments support each department. The frame 2 contains, for example: Platform support unit 9 (refer to FIG. 2), Door frame 10. Platform support 9, It is the same as that of the first embodiment.  15(A) is a view showing a nozzle of a fourth embodiment. The nozzle NZ of the fourth embodiment, An adapter 55 is attached to the upper portion. Nozzle NZ, In addition to being equipped with the adapter 55, The rest are the same as in the first embodiment. Adapter 55, The length of the long side direction (the direction parallel to the Y direction), It is formed to be longer than the nozzle NZ. A positioning portion 56 is provided on the lower surface (lower portion) of the adapter 55, It positions the adapter 55 at the pillar portion 10c of the gantry 10 described later. The positioning unit 56 is provided with: a recess 56a provided under the adapter 55, And a convex portion 56b provided on the upper surface of the pillar portion 10c (see Fig. 15(B)). Concave 56a, It is provided on the +Y side and the -Y side of the lower portion of the adapter 55. Each of the recesses 56a is opened downward. In each recess 56a, When the nozzle NZ is provided on the gantry 10 (the pillar portion 10c (the nozzle support portion 6C)), The convex portion 56b of the pillar portion 10c is embedded, The result is that The nozzle NZ is positioned against the pillar portion 10c.  [0100] The supported portion 57 is provided on the upper surface of the adapter 55. The supported portion 57 is supported by the nozzle holding portion 23D (see FIG. 16(A)) of the nozzle delivery mechanism 7 described later. The supported portion 57 is composed of, for example, a pair of L-shaped members (L-shaped members). The supported portion 57 is, for example, a pair of L-shaped members, It is arranged along a direction parallel to the Y direction (a direction parallel to the longitudinal direction of the nozzle NZ). The L-shaped member on the +Y side has a protruding portion 57a that protrudes toward the -Y side, The L-shaped member on the -Y side has a protruding portion 57a that protrudes toward the +Y side. It is provided on the lower surface (lower portion) of the protruding portion 57a of each L-shaped member, The concave portion 60a of the positioning portion 60 that positions the nozzle holding portion 23D. The recess 60a is, for example, a conical shape (push-out shape). Each positioning unit 60 is provided with: Concave 60a, And a convex portion 60b provided on the upper surface of the protruding portion 65 of the nozzle holding portion 23D described later (see FIG. 16(B)). Each of the recesses 60a is opened downward. Each recess 60a, When the nozzle NZ is held at the nozzle delivery mechanism 7, The convex portion 60b of the support portion Q of the nozzle delivery mechanism 7 is embedded. The result is that The nozzle NZ is positioned to the support portion 21 of the nozzle delivery mechanism 7.  15(B) is a view showing a nozzle and a gantry according to a fourth embodiment. The gantry 10 of the embodiment, A pair of pillar portions 10c are provided. The pair of pillar portions 10c are provided by sandwiching the platform 4 in the Y direction. Each pillar portion 10c, They are supported by the platform support unit 9, respectively. Each pillar portion 10c, It extends in the vertical direction. The vertical drive unit 15 is moved in the vertical direction by the driving of the elevation drive unit 15 described later. Each of the pillar portions 10c is The nozzle support portion 6C that supports the nozzle NZ through the adapter 55 on the upper surface (the surface on the +Z side). Each of the pillar portions 10c (nozzle supporting portion 6C) is from a plurality of nozzles NZ (NZ1) One of NZ2) is selected and supported. The nozzle NZ can be transferred to and from the nozzle delivery mechanism 7 described later. In addition, The pillar portion 10c may not be supported by the platform support portion 9. E.g, The pillar portion 10c can also be supported by the ground. It can also be supported by the pillar portion 10a of the gantry 10 of the first embodiment.  [0102] Each pillar portion 10c is provided, Positioning the adapter 55, The convex portion 56b of the positioning portion 56. Each of the convex portions 56b is, for example, a conical shape (push-out shape). Each convex portion 56b, When the nozzle NZ is supported by the gantry 10 (the pillar portion 10c), Will be embedded in the recess 56a of the adapter 55, The nozzle NZ is positioned. In addition, The number of the concave portions 56a and the convex portions 56b may not be two, respectively. E.g, The number of the concave portions 56a and the convex portions 56b may be three or more. In addition, The shapes of the concave portion 56a and the convex portion 56b are not limited to a conical shape (push-up shape), respectively. And for any. E.g, The shape of the concave portion 56a and the convex portion 56b may also be cylindrical. It can also be rectangular columnar.  [0103] The coating device 1C of the present embodiment, A clamping mechanism 62 is provided (see FIG. 15(B)). Clamping mechanism 62, The adapter 55 and the post portion 10c are fixed. The jaw mechanism 62 is provided on the +Y side and the -Y side. Each of the jaw mechanisms 62 is, for example, It is attached to the pillar portion 10c. Each of the jaw mechanisms 62 is, for example, The adapter 55 is pressed and fixed to the upper surface of the pillar portion 10c. Each jaw mechanism 62, Controlled by the control unit 3 (refer to FIG. 14), Driven by a drive unit (not shown), The adapter 55 is fixed to the pillar portion 10c. also, Each jaw mechanism 62, Controlled by the control unit 3, Driven by a drive unit (not shown), The adapter 55 and the post portion 10c are fixed and released. In addition, Clamping mechanism 62, In the example of Fig. 15(B), It is set on the +Y side and the -Y side. However, it may be provided on at least one of the +Y side and the -Y side. also, Whether the coating device 1C is provided with the clamping mechanism 62, The system is arbitrary.  [0104] Again, Each pillar portion 10c, The driving is performed in the vertical direction by the elevation driving unit 15. Lifting drive unit 15, By driving each of the pillar portions 10c in the vertical direction, In order to raise and lower the supported nozzle NZ. The elevation drive unit 15 is, for example, an electric motor or the like. Lifting drive unit 15, Controlled by the control unit 3 (see Fig. 14), When adjusting the distance between the nozzle NZ and the substrate S at the time of coating (when fine adjustment), And the gantry 10 (the pillar portion 10c) and the nozzle NZ and the nozzle delivery mechanism 7 (7A, 7B) When the nozzle NZ is handed over, etc. The nozzle NZ is raised and lowered.  [0105] Next, Returning to the description of Figure 14, The nozzle delivery mechanism 7 of the fourth embodiment will be described. Nozzle delivery mechanism 7, It has a plurality of nozzle delivery mechanisms 7A, 7B. Nozzle delivery mechanism 7A, The 7B system is disposed near the platform 4, respectively. Nozzle delivery mechanism 7A, Is configured on the -Y side of platform 4, The nozzle NZ1 is supported. Nozzle delivery mechanism 7B, Is configured on the +Y side of platform 4, The nozzle NZ2 is supported. Nozzle delivery mechanism 7A, The 7B series has: Swing portion 18, Liquid supply unit 19. Each liquid supply portion 19, It is the same as the first embodiment. Connected to the corresponding nozzle NZ, The liquid L (see Fig. 7 (B)) is supplied with liquid.  16(A) is a view showing a nozzle delivery mechanism according to a fourth embodiment. Fig. 16(A) is a view of the nozzle delivery mechanism 7B of the fourth embodiment as seen from the -Y direction. In addition, In this embodiment, Nozzle delivery mechanism 7A, The 7B system is the same. In the following description, The nozzle delivery mechanism 7B will be described as an example.  [0107] the convolution portion 18, The nozzle NZ is held to be rotatable by the upper and lower directions (vertical direction) being the axes. The turning portion 18 is provided with, for example: Shaft portion 20, Support department 21, Cyclotron drive unit 22, Nozzle holding portion 23D. Shaft portion 20, Support department 21, And the turning drive unit 22, It is the same as that of the first embodiment. Cyclotron drive unit 22, Controlled by the control unit 3 (see Fig. 14), The support portion 21 that is rotatably supported by the shaft portion 20 is rotated. Support section 21, Driven by the swing drive unit 22, As in the first embodiment, Swing in the horizontal direction. In addition, Handover mechanism 7, The rotation drive unit 22 may not be provided. Instead, the user constructs the support unit 21 by manpower.  [0108] the nozzle holding portion 23D, The nozzle NZ is held. The nozzle holding portion 23D is composed of, for example, a pair of L-shaped members (L-shaped members). The pair of L-shaped members, The arrangement is arranged in a direction parallel to the X direction (a direction parallel to the longitudinal direction of the support portion 21). The L-shaped member on the +X side has a protruding portion 65 that protrudes toward the +X side, The L-shaped member on the -X side has a protruding portion 65 that protrudes toward the -X side. Each protrusion 65, It is located inside (center side) of the supported portion 57 of the nozzle NZ (adapter 55). Each protrusion 65, Attached to it, The lower surface of the protruding portion 57a of the supported portion 57 of the nozzle NZ is supported. Nozzle holding portion 23D, By supporting the supported portion 57 of the nozzle NZ, To support the nozzle NZ.  16(B) is an enlarged view of the nozzle holding portion 23D of the embodiment. Nozzle holding portion 23D, Attached to the upper surface (upper portion) of each of the projections 65, A convex portion 60b of the positioning portion 60 that positions the nozzle NZ is provided. Each convex portion 60b, When the nozzle NZ is supported by the nozzle holding portion 23D, Embedding into each recess 60a of the supported portion 57 of the adapter 55, The nozzle NZ is positioned. In addition, The number of the concave portions 60a and the convex portions 60b may not be two, respectively. E.g, The number of the concave portions 60a and the convex portions 60b may be three or more. In addition, The shapes of the concave portion 60a and the convex portion 60b are not limited to a conical shape (push-up shape), respectively. And for any. E.g, The shape of the concave portion 60a and the convex portion 60b may also be cylindrical. It can also be rectangular columnar. Regarding the handover of the nozzle NZ, It will be explained later. In addition, Regarding the mechanism for holding and releasing the nozzle NZ of the nozzle holding portion 23D, It will be explained later.  [0110] The nozzle delivery mechanism 7A of the present embodiment configured as described above, 7B is at the handover position P1A, P1B (refer to Figure 14), Standby position P2A, Moving between P2B, At the handover location P1A, On P1B, Handing over the nozzle NZ to the pillar portion 10c of the gantry 10, In standby position P2A, Standby on P2B.  [0111] handover position P1A, The P1B system is set to In the pillar portion 10c of the gantry 10 and the nozzle delivery mechanism 7A, Between 7B, The transfer of the nozzle NZ can be performed. E.g, Nozzle delivery mechanism 7A, 7B is formed separately, At the handover location P1A, On P1B, The longitudinal direction of the support portion 21, It will be a direction orthogonal to the moving direction of the stage 4 (a direction parallel to the Y direction) (refer to FIG. 14).  [0112] Standby position P2A, The P2B system is set to When the nozzle delivery mechanism 7A, When 7B holds the nozzle NZ, The nozzle NZ will be a position that ran away from above the platform 4. Nozzle delivery mechanism 7A, 7B is formed separately, In standby position P2A, On P2B, The longitudinal direction of the support portion 21, It will become a direction parallel to the X direction (refer to Figure 14). E.g, Nozzle delivery mechanism 7A, 7B is in the standby position P2A, On P2B, Maintenance of the nozzle NZ is performed.  [0113] Next, the operation of the coating device 1C will be described. 17 to 19 are diagrams each showing the operation of the coating device 1C. In explaining the action of the coating device 1C, Reference is made to Figs. 14 to 16 as appropriate.  [0114] The coating device 1C of the present embodiment, As shown in Figure 14, Will have 2 nozzles NZ1 One of the NZs 2 is selected by the pillar portion 10c (nozzle supporting portion 6C) of the gantry 10, The substrate S is coated. E.g, Nozzle NZ1 In the case where either NZ2 is selected, Nozzle NZ1 NZ2, By the corresponding nozzle delivery mechanism 7A, 7B, It is supported by each pillar portion 10c. In addition, Figure 14 is a diagram, An example in which the nozzle NZ1 is supported by the pillar portion 10c.  [0115] Each of the pillar portions 10c is, for example, As shown in Figure 17 (A), The nozzle NZ is placed on the upper surface of each of the pillar portions 10c. From below, Support the adapter 55 of the nozzle NZ, To support the nozzle NZ. Each pillar portion 10c, The nozzle NZ is supported from below, Therefore, the nozzle NZ can be surely held without falling. also, Nozzle NZ, By the positioning unit 56, While being held by each of the pillar portions 10c, And is supported. Nozzle NZ, Attached in the recess 56a of the lower (lower) portion of the adapter 55, Embedding the convex portion 56b of each of the pillar portions 10c, And being positioned. Clamping mechanism 62, In a state where the nozzle NZ is positioned and supported by each of the pillar portions 10c, The adapter 55 is fixed to each of the pillar portions 10c. The clamping mechanism 62 on the +Y side and the -Y side is, for example, Under the adapter 55, It is pressed and fixed to the upper surface of each pillar part 10c. The adapter 55 and each of the pillar portions 10c, By the clamping mechanism 62, It is fixed. Each jaw mechanism 62, Controlled by the control unit 3 (refer to FIG. 14), Driven by a drive unit (not shown), The adapter 55 is fixed to each of the pillar portions 10c. Coating device 1C, The elevation drive unit 15 is driven by the control of the control unit 3 (see FIG. 14). Fine-tuning the distance between the substrate S and the nozzle NZ, The substrate S is coated. The coating operation of the substrate S by the coating device 1C, It is the same as that of the first embodiment.  [0116] Next, Due to the coating device 1C, The action of the nozzle NZ that has been supported by each of the pillar portions 10c is replaced. In addition, In the following description, An example of replacing the nozzle using the nozzle delivery mechanism 7B is described. The same is true for the nozzle delivery mechanism 7A.  [0117] coating device 1C, When the nozzle NZ that has been supported by each of the pillar portions 10c is replaced, First of all, As shown in Figure 17 (B), The control unit 3 (see FIG. 14) drives the elevation drive unit 15, The pillar portion 10c is moved vertically upward. Control unit 3, Each of the pillar portions 10c is moved to a predetermined position vertically above. The specified location is In each of the pillar portions 10c and the nozzle delivery mechanism 7 (7A, Between 7B), The position at which the nozzle NZ is handed over can be performed. E.g, The specified position is set to Below the supported portion 57 of the adapter 55, The position of the nozzle holding portion 23D of the nozzle delivery mechanism 7 can be arranged.  [0118] Next, Figure 18 (A), Control unit 3, Driving the cyclotron drive unit 22, The swirling portion 18 of the nozzle delivery mechanism 7 is rotated. Control unit 3, Making the turning portion 18, Move to the handover position P1B. At the handover position P1B, The turning portion 18 is disposed at, A predetermined position of each of the pillar portions 10c vertically above. E.g, At the handover position P1B, The nozzle holding portion 23D of the nozzle delivery mechanism 7, The position is set below (directly below) the supported portion 57 of the adapter 55.  [0119] Next, As shown in Figure 18 (B), Control unit 3, Driving the lifting drive unit 15, Each of the pillar portions 10c is moved vertically downward. In addition, The control unit 3 moves earlier than the vertical direction of each of the pillar portions 10c. First driving the clamping mechanism 62, The fixing of the column portion 10c and the adapter 55 by the release jaw mechanism 62 is performed. By the vertical movement of each pillar portion 10c, The delivery of the nozzle NZ between the pillar portion 10c and the nozzle delivery mechanism 7B is performed. By the vertical movement of each pillar portion 10c, The convex portion 60b of the nozzle holding portion 23D is fitted into the concave portion 60a of the supported portion 57 of the adapter 55, The nozzle NZ is positioned.  [0120] Next, As shown in Figure 19 (A), Control unit 3, Driving the lifting drive unit 15, Each pillar portion 10c is moved further vertically downward. With this, Nozzle NZ, In a state of being positioned at the nozzle holding portion 23D of the nozzle delivery mechanism 7B, It is delivered from the respective pillar portions 10c to the nozzle delivery mechanism 7.  [0121] Next, Figure 19 (B), Control unit 3, Driving the cyclotron drive unit 22, The nozzle delivery mechanism 7A is moved to the standby position P2A. In standby position P2A, On P2B, The nozzle NZ is subjected to maintenance or the like.  [0122] Next, The transfer from the nozzle delivery mechanism 7B to the nozzle NZ1 of the pillar portion 10c is performed, To replace the nozzle NZ. The operation of transferring from the nozzle delivery mechanism 7B to each of the pillar portions 10c, In the reverse order of the above-described operation from the respective pillar portions 10c to the nozzles of the nozzle delivery mechanism 7A, And was carried out.  [0123] As described above, The coating device 1C of the present embodiment, The nozzle can be replaced quickly and surely.  [0124] In addition, The technical scope of the present invention, It is not limited to the aspect described in the above embodiment and the like. One or more of the requirements described in the above embodiments and the like, Sometimes it will be omitted. also, The requirements described in the above embodiments and the like, They can be combined as appropriate. also, Within the scope permitted by the Act, The disclosure of all the documents cited in the above embodiments and the like, Both are used as part of the record in this article.  [0125] For example, Although described in the above embodiment, Coating device 1, 1A, 1B, 1C is, With respect to the nozzle support portion 6, Platform 4 will do an example of the composition of the move, But coating device 1, 1A, 1B, The composition of 1C, It is not limited to this. E.g, Coating device 1, 1A, 1B, 1C can also be, Relative to platform 4, The nozzle support portion 6 is configured to move.  [0126] For example, Nozzle delivery mechanism 7, The system is not limited to the composition of the above, Any configuration can be employed. Figure 20, Another example of the nozzle delivery mechanism 7 is shown. E.g, Can also be as shown in Figure 20. The nozzle delivery mechanism 7 is formed such that The drive unit 50 is driven to move up and down and horizontally. The nozzle NZ can be transferred to and from the nozzle support portion 6.

[0127][0127]

1、1A、1B、1C‧‧‧塗布裝置1, 1A, 1B, 1C‧‧‧ coating device

4‧‧‧平台4‧‧‧ platform

5‧‧‧平台驅動部(驅動部)5‧‧‧ Platform drive unit (drive unit)

6、6A、6B、6C‧‧‧噴嘴支持部6, 6A, 6B, 6C‧‧‧ nozzle support

7、7A～7D‧‧‧噴嘴交接機構7, 7A ~ 7D‧‧‧ nozzle delivery mechanism

L‧‧‧液狀體L‧‧‧ liquid body

S‧‧‧基板S‧‧‧Substrate

15‧‧‧升降驅動部15‧‧‧ Lifting and Driving Department

18‧‧‧迴旋部18‧‧‧Revolving Department

19‧‧‧送液部19‧‧‧ liquid supply department

20‧‧‧軸部20‧‧‧Axis

22‧‧‧迴旋驅動部22‧‧‧ Cyclotron drive

25、25A‧‧‧台車25, 25A‧‧‧Trolley

46‧‧‧維護部46‧‧‧Maintenance Department

NZ、NZ1～NZ4‧‧‧噴嘴NZ, NZ1 ~ NZ4‧‧‧ nozzle

P1、P1A、P1B‧‧‧交接位置P1, P1A, P1B‧‧‧ handover location

P2、P2A、P2B‧‧‧待機位置P2, P2A, P2B‧‧‧ standby position

[0009] 　　[圖1] 第1實施形態所述之塗布裝置之一例的上面圖。 　　[圖2] 沿著圖1的A-A線之剖面的剖面圖。 　　[圖3] 沿著圖1的B-B線之剖面的剖面圖。 　　[圖4] 實施形態所述之塗布方法之一例的流程圖。 　　[圖5] (A)及(B)係塗布裝置之動作之一例的圖示。 　　[圖6] 接續圖5，(A)及(B)係塗布裝置之動作之一例的圖示。 　　[圖7] 接續圖6，(A)及(B)係塗布裝置之動作之一例的圖示。 　　[圖8] (A)及(B)係噴嘴支持部及噴嘴交接機構的噴嘴保持部的第1例的圖示。 　　[圖9] 噴嘴支持部及噴嘴交接機構的噴嘴保持部的第2例的圖示。 　　[圖10] 噴嘴支持部及噴嘴交接機構的噴嘴保持部的第3例的圖示。 　　[圖11] (A)及(B)係定位部之一例的圖示。 　　[圖12] 第2實施形態所述之塗布裝置之一例的圖示。 　　[圖13] 第3實施形態所述之塗布裝置之一例的圖示。 　　[圖14] 第4實施形態所述之塗布裝置之一例的上面圖。 　　[圖15] (A)係第4實施形態的噴嘴的圖示。(B)係第4實施形態的噴嘴及門架的圖示。 　　[圖16] (A)係第4實施形態的噴嘴交接機構的圖示。(B)係噴嘴保持部的放大圖。 　　[圖17] (A)及(B)係塗布裝置之動作之一例的圖示。 　　[圖18] 接續圖17，(A)及(B)係塗布裝置之動作之一例的圖示。 　　[圖19] 接續圖18，(A)及(B)係塗布裝置之動作之一例的圖示。 　　[圖20] 噴嘴交接機構的其他例的圖示。[Fig. 1] Fig. 1 is a top view showing an example of a coating apparatus according to a first embodiment. Fig. 2 is a cross-sectional view taken along line A-A of Fig. 1. Fig. 3 is a cross-sectional view taken along line B-B of Fig. 1. Fig. 4 is a flow chart showing an example of a coating method according to an embodiment. Fig. 5 is a view showing an example of the operation of the coating device of (A) and (B). Fig. 6 is a view showing an example of the operation of the coating apparatus according to Fig. 5, (A) and (B). Fig. 7 is a view showing an example of the operation of the coating device in (A) and (B). 8] (A) and (B) are diagrams showing a first example of a nozzle holding portion and a nozzle holding portion of a nozzle delivery mechanism. Fig. 9 is a view showing a second example of the nozzle holding portion and the nozzle holding portion of the nozzle delivery mechanism. Fig. 10 is a view showing a third example of the nozzle holding portion and the nozzle holding portion of the nozzle delivery mechanism. [Fig. 11] (A) and (B) are diagrams showing an example of a positioning unit. Fig. 12 is a view showing an example of a coating device according to a second embodiment. Fig. 13 is a view showing an example of a coating device according to a third embodiment. Fig. 14 is a top view showing an example of a coating apparatus according to a fourth embodiment. Fig. 15 (A) is a view showing a nozzle of a fourth embodiment. (B) is a view showing a nozzle and a gantry according to the fourth embodiment. Fig. 16 (A) is a view showing a nozzle delivery mechanism of a fourth embodiment. (B) is an enlarged view of the nozzle holding portion. Fig. 17 is a view showing an example of the operation of the coating apparatus of (A) and (B). Fig. 18 is a view showing an example of the operation of the coating device in (A) and (B). Fig. 19 is a view showing an example of the operation of the coating device in (A) and (B). Fig. 20 is a view showing another example of the nozzle delivery mechanism.

Claims (14)

一種塗布裝置，係具備： 　　平台，係載置基板；和 　　噴嘴支持部，係從可吐出液狀體的複數個噴嘴中選擇出1個並加以支持，且具備使所支持的前記噴嘴做升降的升降驅動部；和 　　驅動部，係使前記噴嘴支持部與前記平台做相對性移動。A coating apparatus comprising: a platform on which a substrate is placed; and a nozzle support portion that is selected from a plurality of nozzles capable of discharging a liquid material and supported, and has a support for supporting the front nozzle to be lifted and lowered The lifting drive unit and the driving unit move the front nozzle support portion relative to the front platform. 如請求項1所記載之塗布裝置，其中，前記噴嘴係為狹縫噴嘴。The coating device according to claim 1, wherein the pre-recording nozzle is a slit nozzle. 如請求項1或請求項2所記載之塗布裝置，其中，具備複數個噴嘴交接機構，係對前記噴嘴支持部進行前記噴嘴之交接。The coating apparatus according to claim 1 or claim 2, wherein the plurality of nozzle delivery mechanisms are provided, and the front nozzle support portion is delivered to the front nozzle. 如請求項3所記載之塗布裝置，其中，前記噴嘴交接機構，係可在對前記噴嘴支持部進行前記噴嘴之交接的交接位置、與前記噴嘴從前記平台之上方離開的待機位置之間移動。The coating device according to claim 3, wherein the pre-recording nozzle delivery mechanism is movable between a delivery position at which the pre-recording nozzle is delivered to the pre-recording nozzle support portion and a standby position at which the pre-recorded nozzle is separated from the upper portion of the pre-recording platform. 如請求項4所記載之塗布裝置，其中，前記噴嘴交接機構係具備：迴旋部，係以上下方向為軸而將前記噴嘴保持成可迴旋。The coating apparatus according to claim 4, wherein the pre-recording nozzle delivery mechanism includes a turning portion that holds the front nozzle so as to be rotatable in the vertical direction. 如請求項3至請求項5之任1項所記載之塗布裝置，其中，前記噴嘴交接機構係具備：送液部，係對前記噴嘴供給液狀體。The coating apparatus according to any one of the preceding claims, wherein the pre-recording nozzle delivery mechanism includes a liquid supply unit that supplies a liquid to the front nozzle. 如請求項6所記載之塗布裝置，其中，前記送液部係被形成在：被配置在前記平台之側方而可移動的台車。The coating device according to claim 6, wherein the pre-feeding liquid supply portion is formed in a trolley that is movable on a side of the front platform. 如請求項7所記載之塗布裝置，其中，前記台車係具備：可維護前記噴嘴的維護部。The coating apparatus according to claim 7, wherein the front carriage system includes a maintenance unit that can maintain the front nozzle. 如請求項1至請求項8之任1項所記載之塗布裝置，其中，前記驅動部，係使前記平台相對於前記噴嘴支持部而移動。The coating device according to any one of claims 1 to 8, wherein the pre-recording unit moves the pre-recording platform with respect to the front nozzle supporting portion. 一種塗布方法，係為對基板塗布液狀體的方法，其係含有： 　　將前記基板載置於平台之步驟；和 　　從可吐出液狀體的複數個噴嘴中選擇出1個，而支持在具備使前記噴嘴做升降之升降驅動部的噴嘴支持部之步驟；和 　　一面使前記噴嘴支持部與前記平台做相對性移動，一面在前記基板以前記噴嘴塗布液狀體之步驟。A coating method is a method of applying a liquid to a substrate, comprising: a step of placing a substrate on a stage; and selecting one of a plurality of nozzles capable of discharging the liquid, and supporting The step of causing the front nozzle to be the nozzle support portion of the elevation driving portion of the lifting and lowering; and the step of coating the liquid material with the nozzle before the substrate is described before the front nozzle supporting portion and the front platform are relatively moved. 如請求項10所記載之塗布方法，其中，含有：藉由將複數個前記噴嘴分別予以保持的複數個交接機構，對前記噴嘴支持部進行前記噴嘴之交接，以從複數個前記噴嘴中選擇出1個之步驟。The coating method according to claim 10, further comprising: a plurality of delivery mechanisms for holding the plurality of pre-recorded nozzles, and performing pre-recording nozzle delivery on the front nozzle support portion to select from the plurality of pre-recording nozzles 1 step. 如請求項11所記載之塗布方法，其中，含有：未被前記噴嘴支持部所選擇之前記噴嘴，係藉由前記交接機構而從前記平台之上方做退避之步驟。The coating method according to claim 11, further comprising the step of: before the nozzle is selected by the preceding nozzle support unit, the nozzle is retracted from the top of the pre-recording platform by the pre-recording transfer mechanism. 如請求項11或請求項12所記載之塗布方法，其中，含有：前記噴嘴係被從前記交接機構所具備之送液部供給液狀體之步驟。The coating method according to claim 11 or claim 12, wherein the pre-recording nozzle is configured to supply a liquid material from a liquid supply unit provided in the pre-recording transfer mechanism. 如請求項10至請求項13之任1項所記載之塗布方法，其中，含有：藉由使前記平台相對於前記塗布部而移動，以對前記基板塗布液狀體之步驟。The coating method according to any one of claims 1 to 3, further comprising the step of applying a liquid material to the pre-recording substrate by moving the pre-recording platform relative to the preceding coating portion.
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