TWI729224B - Coating device and coating method - Google Patents

Coating device and coating method Download PDF

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TWI729224B
TWI729224B TW106134114A TW106134114A TWI729224B TW I729224 B TWI729224 B TW I729224B TW 106134114 A TW106134114 A TW 106134114A TW 106134114 A TW106134114 A TW 106134114A TW I729224 B TWI729224 B TW I729224B
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nozzle
platform
transfer mechanism
support
liquid
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TW106134114A
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TW201838060A (en
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有川徹
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日商東京應化工業股份有限公司
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02296—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
    • H01L21/02299—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment
    • H01L21/02307—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment treatment by exposure to a liquid
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

[課題] 迅速地進行噴嘴的更換。 　　[解決手段] 塗布裝置(1)係具備：平台(4)，係載置基板(S)；和噴嘴支持部(6)，係從可吐出液狀體(L)的複數個噴嘴(NZ)中選擇出1個並加以支持，且具備使所支持的噴嘴(NZ)做升降的升降驅動部(15)；和驅動部(5)，係使噴嘴支持部(6)與平台(4)做相對性移動。[Question] The nozzle can be replaced quickly. [Solution] The coating device (1) is equipped with: a platform (4) to mount the substrate (S); and a nozzle support part (6) to discharge liquid (L) from multiple nozzles (NZ) One of them is selected and supported, and it is equipped with a lifting drive part (15) for raising and lowering the supported nozzle (NZ); and a drive part (5) that makes the nozzle support part (6) and the platform (4) do Relative movement.

Description

塗布裝置及塗布方法Coating device and coating method

[0001] 本發明係有關於塗布裝置、及塗布方法。[0001] The present invention relates to a coating device and a coating method.

[0002] 在對向於已被載置於平台的基板的位置配置噴嘴，一面使基板與噴嘴做相對性移動一面從噴嘴吐出液狀體，藉此以在基板上塗布液狀體的塗布裝置，已為人知。如上述的塗布裝置的情況下，例如，噴嘴的維護，或是更換使用於塗布之液狀體之際，會進行噴嘴的更換。例如，將複數個噴嘴在基板的移動路徑上做切換配置的塗布裝置，已被提出(例如參照下記的專利文獻1)。 [先前技術文獻] [專利文獻] 　　[0003] 　　[專利文獻1] 日本特開2008-160044號公報[0002] A coating device in which a nozzle is arranged at a position opposite to a substrate placed on a platform, and a liquid is discharged from the nozzle while the substrate and the nozzle are moved relative to each other, thereby coating the liquid on the substrate , Already known. In the case of the above-mentioned coating device, for example, when the nozzle is maintained or the liquid used for coating is replaced, the nozzle is replaced. For example, a coating device in which a plurality of nozzles are switchably arranged on the movement path of the substrate has been proposed (for example, refer to Patent Document 1 below). [Prior Art Document] [Patent Document] 　　[0003] 　　 [Patent Document 1] JP 2008-160044 A

[發明所欲解決之課題] 　　[0004] 噴嘴的更換，係要停止塗布裝置之動作才進行，因此會導致生產性降低。因此，可迅速地進行噴嘴的更換的塗布裝置，係受人期待。 　　[0005] 有鑑於以上的事情，本發明係的目的在於提供一種，可迅速地進行噴嘴的更換的塗布裝置、及塗布方法。 [用以解決課題之手段] 　　[0006] 若依據本發明的第1態樣，則可提供一種塗布裝置，係具備：平台，係載置基板；和噴嘴支持部，係從可吐出液狀體的複數個噴嘴中選擇出1個並加以支持，且具備使所支持的噴嘴做升降的升降驅動部；和驅動部，係使噴嘴支持部與平台做相對性移動。 　　[0007] 若依據本發明的第2態樣，則可提供一種塗布方法，係為對基板塗布液狀體的方法，其係含有：將基板載置於平台之步驟；和從可吐出液狀體的複數個噴嘴中選擇出1個，而支持在具備使噴嘴做升降之升降驅動部的噴嘴支持部之步驟；和一面使噴嘴支持部與平台做相對性移動，一面在基板以噴嘴塗布液狀體之步驟。 [發明效果] 　　[0008] 若依據本發明，則可迅速地進行噴嘴的更換。[Problem to be solved by the invention] 　　[0004] The replacement of the nozzle is carried out only after the operation of the coating device is stopped, which may result in a decrease in productivity. Therefore, a coating device that can quickly replace the nozzle is expected.　　[0005] In view of the above, an object of the present invention is to provide a coating device and a coating method that can quickly replace the nozzle. [Means to Solve the Problem] 　　[0006] According to the first aspect of the present invention, a coating device can be provided, which is provided with: a platform, which mounts a substrate; and a nozzle support part, which can discharge liquid One of the plurality of nozzles is selected and supported, and it is equipped with a lifting driving part for raising and lowering the supported nozzles; and a driving part, which makes the nozzle support part and the platform move relative to each other. [0007] According to the second aspect of the present invention, a coating method can be provided, which is a method of applying a liquid to a substrate, which includes: a step of placing the substrate on a platform; One of the plural nozzles of the body is selected, and the step is supported in the nozzle support part equipped with the lifting drive part to make the nozzle go up and down; and the nozzle support part and the platform are moved relative to each other, while the nozzle is applied to the substrate. The steps of the body. [Effects of the Invention] 　　[0008] According to the present invention, the nozzle can be replaced quickly.

[0010] [第1實施形態] 　　說明第1實施形態。在以下的說明中，適宜參照圖1等所示的XYZ正交座標系。該XYZ正交座標系，係X方向及Y方向為水平方向(橫方向)，Z方向為鉛直方向。又，於各方向上，適宜將與箭頭的尖端相同側稱為+側(例如+Z側)，將與箭頭的尖端相反側稱為-側(例如-Z側)。例如，於鉛直方向(Z方向)上，上方係為+Z側，下方係為-Z側。此外，於圖式中，係為了說明實施形態，而將部分或全部予以模式性記載，同時，會將一部分予以放大或強調而記載等，會含有適宜變更縮尺所表現的部分。 　　[0011] 圖1係第1實施形態所述之塗布裝置之一例的上面圖。圖2係沿著圖1的A-A線之剖面，從-Y方向觀看的剖面圖。圖3係沿著圖1的B-B線之剖面，從-Y方向觀看的剖面圖。本實施形態的塗布裝置1，係對基板S塗布液狀體L(參照圖7(B))。塗布裝置1係具備例如：框體2、控制部3、平台4、平台驅動部5(驅動部)、噴嘴NZ、噴嘴支持部6、噴嘴交接機構7。 　　[0012] 框體2，係支持各部。框體2係含有例如：平台支持部9、門架10(參照圖2及圖3)。平台支持部9係例如，將平台4支持成可朝與X方向平行之方向移動。平台支持部9係具備例如：腳部9a、基台9b。腳部9a，係被設置在地面，從下方支持基台9b。腳部9a係例如，由4個構件所構成，被配置在基台9b的四個角部的下方。基台9b係例如，從上方觀看為矩形狀。基台9b，係可將平台4從下方，透過導引件(未圖示)等，支持成可朝與X方向平行之方向移動。 　　[0013] 門架10係具有一對支柱部10a、架橋部10b(參照圖1～圖3)。支柱部10a係將平台4在Y方向上予以夾住而設置2個(參照圖1)。各支柱部10a係分別沿著鉛直方向而延伸，被設置在地面(參照圖2及圖3)。各支柱部10a，係支持架橋部10b。架橋部10b，係往與Y方向平行之方向而延伸。架橋部10b，其兩端係分別連接至各支柱部10a的上端側(＋Z側)的面(參照圖1)。架橋部10b係將後面說明的噴嘴支持部6予以支持。此外，門架10係可為可移動。例如，門架10係亦可為，相對於基台9b而可朝X方向移動之構成。 　　[0014] 控制部3係控制各部。控制部3，係與塗布裝置1的各部可通訊地連接。控制部3係為例如，具備CPU(未圖示)、硬碟或記憶體等之記憶裝置(未圖示)的電腦裝置。控制部3係例如可執行，控制塗布裝置1之各部的程式。該程式係預先被記憶在例如記憶裝置。此外，控制部3係亦可與例如鍵盤、滑鼠、觸控面板等之輸入裝置連接，又，亦可與顯示器等之顯示裝置連接。 　　[0015] 平台4係載置基板S。平台4，係在基台9b的上方，被基台9b支持成可朝X方向移動。平台4係例如，從上方觀看，係為矩形狀(參照圖1)。平台4係含有例如，與XY平面(水平面)平行的上面。上面係例如以定盤而被形成。基板S係藉由被載置於上面，基板S係被配置在與XY平面平行(水平面)的面。基板S係例如，藉由被設在平台4的定位機構(未圖示)而被定位，藉由被設在上面的吸附部(未圖示)而被吸附，藉此而被上面所支持。 　　[0016] 平台驅動部5，係驅動平台4。平台驅動部5係為例如電動馬達等。平台驅動部5係例如，使平台4相對於基台9b而朝與X方向平行之方向移動。平台4，係藉由平台驅動部5之驅動，而對之後所說明的噴嘴支持部6，做相對性移動。平台驅動部5係例如，與控制部3可通訊地連接，驅動的時序、驅動量、驅動方向、驅動的速度等是被控制部3所控制，使平台4移動至所定位置。此外，平台驅動部5，係亦可不被連接至控制部3。例如，平台驅動部5係亦可為，藉由平台4的使用者以手動來驅動之構成。 　　[0017] 噴嘴NZ，係對基板S塗布液狀體L。在本實施形態中，塗布裝置1係具備複數個噴嘴NZ(NZ1、NZ2)。例如，在圖1所示的例子中，噴嘴NZ1係為被噴嘴支持部6所支持而為可塗布狀態，噴嘴NZ2係為被之後所說明的噴嘴交接機構7B所支持的與噴嘴NZ1做更換用的噴嘴。例如，噴嘴NZ1、NZ2係皆為狹縫噴嘴。噴嘴NZ1、NZ2係皆具有，吐出液狀體L的吐出口OP(參照圖2(B))。例如，吐出口OP係為例如，朝下方向的狹縫狀之開口。 　　[0018] 噴嘴NZ1、NZ2係分別被連接至，對應的噴嘴交接機構7的送液部19。噴嘴NZ1，係被連接至噴嘴交接機構7A的送液部19，被噴嘴支持部6及噴嘴交接機構7A任一者所支持。噴嘴NZ2，係被連接至噴嘴交接機構7B的送液部19，被噴嘴支持部6及噴嘴交接機構7A任一者所支持。噴嘴NZ1、NZ2係分別，例如，藉由管子等之配管(未圖示)，而被連接至對應的送液部19。噴嘴NZ1、NZ2，係在塗布之際，藉由來自送液部19的液狀體L之供給，而從吐出口OP吐出液狀體L，對基板S塗布液狀體L。關於噴嘴交接機構7、送液部19，係在之後說明。 　　[0019] 此外，噴嘴NZ不限定於狹縫噴嘴，而為任意。例如，噴嘴NZ，係亦可為噴墨方式的噴嘴、棒塗器、分注噴嘴等。又，複數個噴嘴NZ係亦可分別為不同種類的噴嘴。又，複數個噴嘴NZ，係亦可包含用途不同的噴嘴。例如，噴嘴NZ1及噴嘴NZ2，係亦可使用於彼此互異種類之液狀體L的塗布。又，複數個噴嘴NZ1、NZ2係亦可分別不被連接至送液部19。例如，複數個噴嘴NZ1、NZ2係亦可分別在塗布之際，才連接至送液部19。 　　[0020] 噴嘴支持部6，係從複數個噴嘴NZ中選擇出1個並加以支持，且使所支持的噴嘴NZ做升降。噴嘴支持部6係具備例如：導引部12、支持部13、噴嘴保持部14、升降驅動部15。噴嘴支持部6係例如，被門架10所支持。 　　[0021] 導引部12係例如，被門架10的架橋部10b所支持。導引部12，係將支持部13支持成，可朝鉛直方向移動。支持部13，係將噴嘴保持部14予以支持。導引部12係例如，將支持部13、噴嘴保持部14及噴嘴NZ支持成，可朝鉛直方向(與Z方向平行之方向)移動。 　　[0022] 噴嘴保持部14，係將噴嘴NZ予以保持。噴嘴保持部14，係定位而將噴嘴NZ予以保持。噴嘴保持部14係被形成為，可將所保持的噴嘴NZ予以釋放。噴嘴保持部14係例如，被安裝在支持部13。噴嘴保持部14係被構成為，與之後所說明的噴嘴交接機構7之間可進行噴嘴NZ之交接。噴嘴保持部14係例如，從之後所說明的噴嘴交接機構7接受噴嘴NZ之際，係將噴嘴NZ予以接受並保持，又，向噴嘴交接機構7交付噴嘴NZ之際，係將所支持的噴嘴NZ予以釋放而交給噴嘴交接機構7。此外，關於噴嘴保持部14的噴嘴NZ的保持及釋放之機構，係在之後於圖8～圖11中說明。又，關於噴嘴NZ的定位之機構，係在之後於圖11中說明。 　　[0023] 升降驅動部15，係使噴嘴NZ做升降。升降驅動部15，係被連接至支持部13。升降驅動部15係例如，藉由使支持部13做升降，而使已被噴嘴保持部14所保持的噴嘴NZ，對基板S做升降。升降驅動部15係為例如電動馬達等。升降驅動部15，係可將支持部13移動至所定位置。例如，升降驅動部15，係在塗布之際，以使得噴嘴NZ的吐出口OP與基板S之間隔會是所定之間隔的方式，驅動支持部13。升降驅動部15係例如，與控制部3可通訊地連接，其驅動是被控制部3所控制。升降驅動部15係例如，驅動的時序、驅動量、驅動方向、驅動的速度等，是被控制部3所控制。此外，升降驅動部15，係亦可不被連接至控制部3。例如，升降驅動部15係亦可為，由使用者以手動來控制升降之構成。又，亦可沒有升降驅動部15。例如，噴嘴支持部6係亦可為，由使用者以人力而使支持部13做升降之構成。 　　[0024] 如上記而被構成的噴嘴支持部6，係從噴嘴NZ1、NZ2中選擇出噴嘴NZ1或噴嘴NZ2並以噴嘴保持部14加以支持。例如，在圖1所示的例子中，噴嘴支持部6，係從噴嘴NZ1、NZ2中選擇出噴嘴NZ1，並加以支持。又，噴嘴支持部6，係將所支持的噴嘴NZ1，在塗布等之際，藉由升降驅動部15之驅動而使其升降，配置在所定之位置。 　　[0025] 接著說明噴嘴交接機構7。噴嘴交接機構7，係對噴嘴支持部6進行噴嘴NZ的交接。塗布裝置1係具備例如，複數個噴嘴交接機構7(7A、7B)。噴嘴交接機構7A、7B係分別具備例如：迴旋部18、送液部19。噴嘴交接機構7A、7B係分別被配置在平台4附近。例如，噴嘴交接機構7A、7B係分別被配置在，平台4的-Y側及+Y側。 　　[0026] 在本實施形態中，噴嘴交接機構7A、7B係皆為相同之構成。在以下的說明中，以噴嘴交接機構7A為例做說明。 　　[0027] 迴旋部18，係以上下方向(鉛直方向)為軸而將噴嘴NZ保持成可迴旋。迴旋部18係具備例如：軸部20、支持部21、迴旋驅動部22、噴嘴保持部23。 　　[0028] 軸部20，係沿著鉛直方向而延伸。軸部20係例如被固定在地面。此外，軸部20係亦可被固定在地面以外。例如，軸部20亦可被固定在框體2(例如基台9b)。軸部20，係將支持部21，透過安裝構件(未圖示)，支持成可繞著軸部20的鉛直方向的軸而旋轉。 　　[0029] 支持部21，係將噴嘴保持部23予以支持。支持部21，係繞著軸部20的軸而迴旋。支持部21，係被連接至迴旋驅動部22，藉由迴旋驅動部22之驅動而迴旋。軸部20及支持部21，係在噴嘴NZ是被保持在噴嘴保持部23中的狀態下，使支持部21迴旋之際，以使得噴嘴NZ的下端，不會干擾到已被載置在平台4之基板S的方式，而被配置在已被載置於平台4之基板S的上方地被形成(參照圖2所示的噴嘴交接機構7B)。 　　[0030] 迴旋驅動部22，係將支持部21予以驅動、迴旋。迴旋驅動部22係為例如電動馬達等。迴旋驅動部22係例如，與控制部3可通訊地連接，其驅動是被控制部3所控制。迴旋驅動部22係為例如，驅動的時序、驅動量、驅動方向、驅動的速度等是被控制部3所控制，使支持部21移動至所定位置。此外，迴旋驅動部22，係亦可不被連接至控制部3。例如，迴旋驅動部22係亦可為，由使用者以手動來控制迴旋之構成。又，亦可沒有迴旋驅動部22。例如，交接機構7係亦可為，由使用者以人力而使支持部21迴旋之構成。 　　[0031] 噴嘴保持部23，係將噴嘴NZ予以保持。噴嘴保持部23係被構成為，可將所保持的噴嘴NZ予以釋放。噴嘴保持部23係被構成為例如，可與噴嘴支持部6的噴嘴保持部14之間，進行噴嘴NZ的交接。關於噴嘴NZ的交接，係在之後說明。此外，關於噴嘴保持部23的噴嘴NZ的保持及釋放之機構，係在之後於圖8～圖11中說明。 　　[0032] 送液部19，係對噴嘴NZ供給液狀體L。送液部19係為例如泵浦。送液部19係例如，如圖3所示，被形成在台車25。台車25係例如，被配置在平台4的側方(與Y方向平行之方向)。台車25係被配置在例如，相對於迴旋部18而從平台4遠離之一側(-Y側)之附近。台車25係具備例如：複數個車輪25a、收容部25b、送液部19。台車25係被形成為，藉由被設在收容部25b之下部的複數個車輪25a，而可移動。收容部25b，係被形成為箱體，在內部可收容物品。例如，在收容部25b的內部係收容有，儲存液狀體L的複數個容器27。送液部19係例如，被配置在收容部25b的上部的管部25c。送液部19係例如，透過收容部25b中所被收容的容器27、管部25c，而藉由管子等之配管(未圖示)而被連接。又，送液部19係例如，與複數個噴嘴NZ之中的，對應的所定之噴嘴NZ，以管子等之配管(未圖示)而連接。例如，噴嘴交接機構7A的送液部19，係被連接至噴嘴NZ1，噴嘴交接機構7B的送液部19，係被連接至噴嘴NZ2。此外，噴嘴NZ1與送液部19之間的配管的長度、和噴嘴NZ2與送液部19之間的配管的長度，係被設定成大致相同。此時，可使送液部19之控制，在噴嘴NZ1與噴嘴NZ2間為相同。 　　[0033] 送液部19，係將容器27中所儲存的液狀體L，對噴嘴NZ送液所定量。送液部19，係與控制部3可通訊地連接，藉由控制部3而控制其動作。送液部19係例如，對噴嘴NZ供給液狀體L的時序、對噴嘴NZ所供給之液狀體L的量等，是被控制部3所控制。送液部19係例如，藉由控制部3之控制而驅動，將容器27中所儲存之液狀體L以所定之量，供給至噴嘴NZ。藉此，塗布之際，被噴嘴支持部6所支持的噴嘴NZ，係藉由送液部19的液狀體L的供給，從吐出口OP將所定量之液狀體L對基板S進行吐出，將液狀體L塗布至基板S。 　　[0034] 此外，送液部19及容器27之其中至少一者，係亦可不被形成在台車25。又，塗布裝置1是否具備台車25，係為任意。 　　[0035] 如以上所被構成的噴嘴交接機構7A、7B係分別，在交接位置P1A、P1B、與待機位置P2A、P2B之間移動，在交接位置P1A、P1B上，對噴嘴支持部6進行噴嘴NZ的交接，在待機位置P2A、P2B上進行待機(參照圖5(A)、圖6(A))。此外，本實施形態的噴嘴交接機構7A、7B係分別被形成為，藉由迴旋所致之只有水平的移動，而可在交接位置P1A、P1B、與待機位置P2A、P2B之間移動。此時，可迅速地進行噴嘴NZ的交接。 　　[0036] 交接位置P1A、P1B係分別被設定在，噴嘴支持部6與噴嘴交接機構7A、7B之間，可進行噴嘴NZ之交接的位置。例如，噴嘴交接機構7A、7B係分別被形成為，在交接位置P1A、P1B上，支持部21的長邊方向，會是與平台4的移動方向正交之方向(與Y方向平行之方向)。 　　[0037] 待機位置P2A、P2B係分別被設定在，當噴嘴交接機構7A、7B保持噴嘴NZ時，噴嘴NZ會從平台4的上方跑開的位置。噴嘴交接機構7A、7B係分別被形成為，在待機位置P2A、P2B上，支持部21的長邊方向，會是與X方向平行之方向。例如，噴嘴交接機構7A、7B係分別，在待機位置P2A、P2B上，進行噴嘴NZ的維護等。 　　[0038] 以下，基於塗布裝置1之動作，說明本實施形態所述之塗布方法。圖4係實施形態所述之塗布方法的流程圖。圖5～圖7係為塗布裝置1之動作之一例的圖示。此外，在說明圖4之際，適宜參照圖1～圖3、及圖5～圖7。 　　[0039] 本塗布方法係為，對基板S塗布液狀體L的方法。本塗布方法係例如，於圖4所示的步驟S1中，使未保持噴嘴NZ的噴嘴交接機構7A，相對於噴嘴支持部6而前進。例如，如圖5(A)所示，未保持噴嘴NZ的位於待機位置P2A的噴嘴交接機構7A，係藉由控制部3之控制而迴旋驅動部22係做驅動，藉由迴旋部18的迴旋，而移動至交接位置P1A。噴嘴交接機構7A係被形成為，藉由迴旋所致之只有水平的移動，而可在交接位置P1A與待機位置P2A之間移動，因此可迅速地移動。 　　[0040] 接下來，於圖4所示的步驟S2中，藉由噴嘴交接機構7A來保持噴嘴NZ。例如，於交接位置P1A上，噴嘴交接機構7A，係將正被噴嘴支持部6所保持之狀態的噴嘴NZ1，以噴嘴保持部23加以保持。此時，噴嘴NZ1，係藉由噴嘴支持部6的噴嘴保持部14及噴嘴交接機構7A的噴嘴保持部23之雙方的保持機構所保持。 　　[0041] 接下來，於圖4所示的步驟S3中，將噴嘴支持部6所致之噴嘴NZ的保持，予以釋放。例如，噴嘴支持部6，係在噴嘴交接機構7A正在保持著噴嘴NZ1的狀態下，將噴嘴NZ1予以釋放，噴嘴NZ1係被交給噴嘴交接機構7A。噴嘴NZ1，係在被噴嘴支持部6與噴嘴交接機構7A之任一者所保持的狀態下，進行交接，因此可確實地進行噴嘴NZ的交接。 　　[0042] 接下來，於圖4所示的步驟S4中，將噴嘴交接機構7A予以退避。未被噴嘴支持部6所選擇之噴嘴NZ1，係藉由噴嘴交接機構7A而從平台之上方退避。例如，如圖5(B)所示，噴嘴交接機構7A，係在正在保持著噴嘴NZ1的狀態下，藉由控制部3之控制而迴旋驅動部22係做驅動，而移動到待機位置P2A。例如，於待機位置P2A上，被噴嘴交接機構7A所保持的噴嘴NZ1，係進行噴嘴的更換、噴嘴的維護等。 　　[0043] 接下來，於圖4所示的步驟S5中，使正在保持著噴嘴NZ2的另一噴嘴交接機構7B，相對於噴嘴支持部6而前進。例如，如圖6(A)所示，正在保持著噴嘴NZ2的位於待機位置P2B的噴嘴交接機構7B，係藉由控制部3之控制而迴旋驅動部22係做驅動，藉由迴旋部18的迴旋，而移動至交接位置P1B。噴嘴交接機構7B係被形成為，藉由迴旋所致之只有水平方向的移動，而可在交接位置P1B與待機位置P2B之間移動，因此可迅速地移動。 　　[0044] 接下來，於圖4所示的步驟S6中，藉由噴嘴支持部6而將噴嘴NZ2予以保持。例如，於交接位置P2A上，噴嘴支持部6，係將正被噴嘴交接機構7B所保持之狀態的噴嘴NZ2，以噴嘴保持部14加以保持。此時，噴嘴NZ，係藉由噴嘴支持部6的噴嘴保持部14及噴嘴交接機構7B的噴嘴保持部23之雙方的保持機構所保持。 　　[0045] 接下來，於圖4所示的步驟S7中，將噴嘴交接機構7B所致之噴嘴NZ2的保持予以釋放。例如，噴嘴交接機構7B，係在噴嘴支持部6正在保持著噴嘴NZ的狀態下，將噴嘴NZ2予以釋放，噴嘴NZ2係被交給噴嘴支持部6。噴嘴NZ2，係在被噴嘴支持部6與噴嘴交接機構7A之任一者所保持的狀態下，進行交接，因此可確實地進行噴嘴NZ的交接。 　　[0046] 接下來，於圖4所示的步驟S8中，將噴嘴交接機構7B予以退避。例如，如圖6(B)所示，噴嘴交接機構7B，係藉由控制部3之控制而迴旋驅動部22係做驅動，而移動到待機位置P2B並待機。此外，是否進行步驟S8，係為任意。 　　[0047] 接下來，於圖4所示的步驟S9中，在平台4上載置基板S。例如，如圖7(A)所示，將基板S定位於平台4而載置。此外，基板S的載置係例如，可藉由使用者以人力來為之，也可藉由搬送裝置等之裝置而為之。 　　[0048] 接下來，於圖4所示的步驟S10中，使平台4移動而在基板S上塗布液狀體L。例如，如圖7(B)所示，使平台4與噴嘴支持部6做相對性移動，在基板S上塗布液狀體L。例如，首先，藉由控制部3之控制，升降驅動部15，係以使得噴嘴NZ2的下端與基板S的間隔會是所定之間隔的方式，驅動支持部13，以移動噴嘴NZ2。接著，藉由控制部3之控制，平台驅動部5係使平台4往-X方向移動，同時，送液部19係將所定之量的液狀體L，供給至噴嘴NZ2。藉此，噴嘴NZ2，係將液狀體L從吐出口OP予以吐出，在基板S上塗布液狀體L。對基板S的液狀體L的塗布結束後，將基板S予以搬出。基板S的搬出係例如，可藉由使用者以手動來為之，也可藉由搬送裝置等而為之。此外，步驟S9所致之平台4上的基板S的載置係亦可例如，在上記的步驟S1的開始前進行。 　　[0049] 接著，說明噴嘴支持部6的噴嘴保持部14及噴嘴交接機構7的噴嘴保持部23。圖8～圖10係分別為，噴嘴支持部6及噴嘴交接機構7的噴嘴保持部的第1例～第3例的圖示。 　　[0050] 噴嘴支持部6的噴嘴保持部14及噴嘴交接機構7的噴嘴保持部23係分別為，只要可彼此交接噴嘴NZ，則構成係為任意。噴嘴支持部6的噴嘴NZ的保持機構係亦可使用例如，圖8～圖10所示的第1例～第3例之任一構成。 　　[0051] 首先說明，圖8(A)及(B)所示的噴嘴支持部6的噴嘴保持部14A、及噴嘴交接機構7的噴嘴保持部23A的第1例。第1例的噴嘴支持部6的噴嘴保持部14A、及噴嘴交接機構7的噴嘴保持部23A，係分別將噴嘴NZ以噴嘴NZ的長邊方向予以夾入，而將噴嘴NZ予以保持。噴嘴支持部6的噴嘴保持部14A及噴嘴交接機構7的噴嘴保持部23A係分別具備有把持部30。 　　[0052] 噴嘴支持部6的把持部30係為例如，如圖8(A)所示，是被形成為，可將噴嘴NZ在長邊方向(與Y方向平行之方向)上予以夾入的一對把持構件。一對把持構件，係在噴嘴NZ的長邊方向上將噴嘴NZ予以夾住而被配置。一對把持構件係分別具有凹部30a。凹部30a係被形成為，可讓噴嘴NZ的長邊方向的端部***。一對把持構件，係被支持部13所支持。一對把持構件，係透過未圖示的導引件，而可相對於支持部13而朝與噴嘴NZ的長邊方向平行之方向移動，被支持部13所支持。一對把持構件，係在保持噴嘴NZ之際，藉由往噴嘴NZ靠近的方向移動，噴嘴NZ的長邊方向的端部會***至凹部30a，藉由按壓噴嘴NZ而將噴嘴NZ予以支持。又，一對把持構件，係在將噴嘴NZ從保持予以釋放之際，藉由往遠離噴嘴NZ之方向移動，噴嘴NZ的長邊方向的端部就會從凹部30a離開，而釋放噴嘴NZ。 　　[0053] 接著，噴嘴交接機構7的把持部30，係有一對把持構件是被支持部21所支持。噴嘴交接機構7的把持部30，係除了所被配置的位置為不同以外，其餘係和噴嘴支持部6的把持部30相同地被構成。噴嘴交接機構7的把持部30，係從噴嘴NZ的長邊方向予以夾住而保持，藉由解除把持部30對噴嘴NZ的夾入，而將所保持噴嘴NZ予以釋放。 　　[0054] 噴嘴支持部6的把持部30與噴嘴交接機構7的把持部30，係如圖8(B)所示，分別在進行噴嘴NZ之交接的位置P1A、P1B(參照圖5(A)，圖6(A))上，被形成在不同的高度。例如，在圖8(B)所示的例子中，係於位置P1A、P1B上，噴嘴支持部6的把持部30，係相對於噴嘴交接機構7的把持部30，被形成在位於下方。此外，於位置P1A、P1B上，噴嘴支持部6的把持部30，係亦可相對於噴嘴交接機構7的把持部30，被形成在位於上方。 　　[0055] 在第1例中，噴嘴支持部6的把持部30與噴嘴交接機構7的把持部30，係如圖8(B)所示，分別在進行噴嘴NZ之交接的位置P1(參照圖5(A)，圖6(A))上，被形成在不同的高度。因此在噴嘴支持部6的把持部30及噴嘴交接機構7的把持部30中，各自的噴嘴保持動作及噴嘴釋放動作係不會發生干擾，可獨立進行。藉此，可在噴嘴支持部6及噴嘴交接機構7之一方有保持著噴嘴NZ的狀態下，他方係可釋放噴嘴NZ。 　　[0056] 接下來，說明圖9所示的噴嘴支持部6的噴嘴保持部14、及噴嘴交接機構7的噴嘴保持部23的第2例。第2例的噴嘴支持部6的噴嘴保持部14B及噴嘴交接機構7的噴嘴保持部23B係分別具備有把持部32，將被設在噴嘴NZ的被把持部31，以把持部32予以夾入，藉此而將噴嘴NZ予以保持。 　　[0057] 如圖9所示，在噴嘴NZ係設有被把持部31。被把持部31係被設在，噴嘴NZ的短邊方向(與X方向平行之方向)之兩側的各自的面。被把持部31係為例如，具有突出部31a的凸緣構件。被設在靠近噴嘴支持部6側(-X側)的被把持部31，係被噴嘴支持部6的把持部32所夾入。被設在相對於靠近噴嘴支持部6而遠離側(+X側)的被把持部31，係被噴嘴交接機構7的把持部32所夾入。 　　[0058] 噴嘴支持部6的把持部32係為例如，如圖9所示，被形成為，可將被把持部31的突出部31a在噴嘴NZ的長邊方向(與Y方向平行之方向)上予以夾入的一對把持構件。一對把持構件，係將被把持部31在噴嘴NZ的長邊方向上予以夾住而配置。一對把持構件係分別具有凹部32a。凹部32a係被形成為，可***至被把持部31的突出部31a。一對把持構件，係被支持部13所支持。一對把持構件，係透過未圖示的導引件，相對於支持部13而可朝與噴嘴NZ的長邊方向平行之方向移動地，被支持部13所支持。一對把持構件，係在保持噴嘴NZ之際，藉由往靠近噴嘴NZ之方向移動，噴嘴NZ的噴嘴支持部6側的突出部31a會被***至凹部32a，藉由按壓突出部31a，而將噴嘴NZ予以支持。又，一對把持構件，係將噴嘴NZ從保持予以釋放之際，藉由朝遠離噴嘴NZ的方向移動，突出部31a就會從凹部32a跑開，藉此而釋放噴嘴NZ。 　　[0059] 噴嘴交接機構7的把持部32，係除了一對把持構件是被支持部21所支持這點以外，其餘係和噴嘴支持部6的把持部32相同地被構成，藉由將噴嘴NZ的遠離噴嘴支持部6側的突出部31a從長邊方向予以夾住，而將噴嘴NZ予以保持，藉由解除把持部32對噴嘴NZ的夾入，而將所保持的噴嘴NZ予以釋放。 　　[0060] 在本例中，被把持部31，係被設在噴嘴NZ的短邊方向的各自的面，因此噴嘴支持部6的把持部32及噴嘴交接機構7的把持部32，係在位置P1(參照圖5(A)、圖6(A))上，在對噴嘴NZ的短邊方向的相反側，可將各自的噴嘴保持動作及噴嘴釋放動作，不會干擾地，獨立進行之。藉此，在噴嘴支持部6及噴嘴交接機構7的一方正在保持噴嘴NZ的狀態下，他方係可釋放噴嘴NZ，因此可確實地進行噴嘴NZ的交接。 　　[0061] 此外，被把持部31及把持部32係分別只要是可將被把持部31以把持部32加以把持(保持)，則可採用任意之構成。又，把持部32係亦可藉由例如驅動部(未圖示)來為之。 　　[0062] 接下來，說明圖10所示的噴嘴支持部6的噴嘴保持部14及噴嘴交接機構7的噴嘴保持部23的第3例。第3例的噴嘴支持部6的噴嘴保持部14C及噴嘴交接機構7的噴嘴保持部23C係分別具備電磁石部38，藉由將噴嘴NZ上所被設置的被吸附部37以電磁石部38加以吸附，而保持噴嘴NZ。 　　[0063] 如圖10所示，在噴嘴NZ係分別設有被吸附部37。被吸附部37係被設在，噴嘴NZ的短邊方向(與X方向平行之方向)之兩側的各自的面。被吸附部37，係由可被電磁石部38吸附的鐵等之磁性材料所形成。 　　[0064] 噴嘴支持部6的電磁石部38係例如，在以磁性材料所形成的芯的周圍繞捲線圈，藉由通電而會暫時性產生磁力的磁石。噴嘴支持部6的電磁石部38，係被連接至電源(未圖示)及開關39，會進行通電及斷電的切換。電磁石部38，係被支持部13所支持。電磁石部38，係藉由開關39進行通電，就會產生磁力而將被吸附部37予以吸附，將噴嘴NZ予以保持。電磁石部38，係藉由開關39進行斷電，磁力就會消失而解除與被吸附部37之吸附，釋放噴嘴NZ。開關39所致之通電及斷電的切換係藉由例如控制部3而被控制。此外，開關39所致之通電及斷電的切換係亦可為，藉由使用者以手動來進行之構成。 　　[0065] 噴嘴交接機構7的噴嘴保持部23C，係除了電磁石部38是被支持部21所支持這點以外，其餘係和噴嘴支持部6的噴嘴保持部14C相同地被構成，噴嘴NZ上所被設置的被吸附部37藉由被電磁石部38所吸附而將噴嘴NZ予以保持，藉由解除電磁石部38所致之被吸附部37的吸附，而將所保持的噴嘴NZ予以釋放。 　　[0066] 在本例中，被吸附部37，係被設在噴嘴NZ的短邊方向的各自的面，因此噴嘴支持部6的電磁石部38及噴嘴交接機構7的電磁石部38，係在位置P1(參照圖5(A)、圖6(A))上，在對噴嘴NZ的短邊方向的相反側，可將各自的噴嘴保持動作及噴嘴釋放動作，不會干擾地，獨立進行之。藉此，在噴嘴支持部6及噴嘴交接機構7的一方正在保持噴嘴NZ的狀態下，他方係可釋放噴嘴NZ。 　　[0067] 接著說明定位部41。圖11(A)及(B)係定位部之一例的圖示，(A)係從上方觀看的圖，(B)係從側方觀看的圖。 　　[0068] 以下，以圖8(A)及(B)所示的噴嘴支持部6的噴嘴保持部14A的定位部41為例做說明。定位部41係例如，如圖11(A)及(B)所示，具備：支持面42、2個凸部43、2個凹部44。支持面42係為例如矩形平板狀。支持面42係被設在例如，支持部13的2個面之中的將噴嘴NZ予以保持的一側(+X側)的面。支持面42的+X側的面，係當噴嘴NZ是被噴嘴保持部14A所保持時，是密接於噴嘴NZ的-X側的面而被形成。 　　[0069] 2個凸部43，係在支持面42的+X側的面的、支持面42的高度方向上的中央部分，朝與Y方向平行之方向排列而被形成。2個凸部43係為例如圓錐狀(推拔狀)。2個凹部44，係在噴嘴NZ的-X側的面，朝與Y方向平行之方向排列而被形成，係被形成為，當噴嘴NZ是被噴嘴保持部14A所保持時，2個凸部43係會嵌合。 　　[0070] 此外，凸部43及凹部44的個數係分別亦可不是2個，例如，凸部43及凹部44的個數係亦可為3個以上。此外，凸部43的形狀，係不限定於圓錐狀(推拔狀)，而為任意。例如，凸部43的形狀，係亦可為圓柱狀，也可為矩形柱狀。 　　[0071] 定位部41，係當噴嘴NZ是被保持在噴嘴保持部14A時，藉由支持面42與噴嘴NZ的-X側的面密接，而限制噴嘴NZ的繞Y軸及繞Z軸之移動，且，藉由2個凸部43與2個凹部44做嵌合，而限制噴嘴NZ的繞X軸之移動。藉此，定位部41，係當噴嘴NZ是被噴嘴保持部14A所保持時，可將噴嘴NZ定位在所定位置。又，2個凸部，係為圓錐狀(推拔狀)，因此噴嘴交接機構7將噴嘴NZ對噴嘴支持部6進行交接之際，即使噴嘴NZ的位置有若干偏移，仍可將噴嘴NZ予以定位。 　　[0072] 此外，在圖9所示的噴嘴保持部14B設置定位部41的情況下，例如，支持面42及2個凸部43，係被配置在把持部32的上方或下方，2個凹部44係被配置在，當噴嘴NZ被保持於噴嘴保持部14B時，2個凸部43會做嵌合的位置。 　　[0073] 又，在圖10所示的噴嘴保持部14C設置定位部41的情況下，例如，支持面42及2個凸部43，係被配置在電磁石部38的上方或下方，2個凹部44係被配置在，當噴嘴NZ被保持於噴嘴保持部14C時，2個凸部43會嵌合的位置。 　　[0074] 此外，亦可在圖8～圖10所示的噴嘴交接機構7，設置定位部41。例如，在圖8所示的噴嘴交接機構7的噴嘴保持部23A設置定位部41的情況下，支持面42及2個凸部43，係被配置在噴嘴保持部23A的支持部21，2個凹部44係被配置在，當噴嘴NZ被保持於噴嘴保持部14A時，2個凸部43會做嵌合的位置。又，例如，在圖9所示的噴嘴交接機構7的噴嘴保持部23B設置定位部41的情況下，例如，支持面42及2個凸部43，係被配置在噴嘴保持部23B的把持部32的上方或下方，2個凹部44係被配置在，當噴嘴NZ被保持於噴嘴保持部14A時，2個凸部43會做嵌合的位置。又，例如，在圖10所示的噴嘴交接機構7的噴嘴保持部23C設置定位部41的情況下，例如，支持面42及2個凸部43，係被配置在電磁石部38的上方或下方，2個凹部44係被配置在，當噴嘴NZ被保持於噴嘴保持部14A時，2個凸部43會做嵌合的位置。 　　[0075] 如此，本實施形態的塗布裝置1及塗布方法，係藉由對噴嘴支持部6進行噴嘴NZ的交接以從複數個噴嘴NZ中選擇出1個，因此可將噴嘴支持部6在複數個噴嘴NZ間做共用。藉此，可抑制裝置的成本，又，可使裝置的構成變得簡單且精巧。又，由於是在複數個噴嘴NZ間共用噴嘴支持部6，因此可抑制噴嘴的更換所致之，噴嘴支持部6的噴嘴的支持機構、或噴嘴之驅動機構的調整所需要的時間，可迅速地進行噴嘴的更換。 　　[0076] 如以上所述，本實施形態的塗布裝置1及塗布方法，係可迅速地進行噴嘴的更換。 　　[0077] [第2實施形態] 　　說明第2實施形態。於本實施形態中，關於和上述的實施形態相同之構成，係標示相同符號並省略或簡化其說明。 　　[0078] 圖12(A)及(B)係第2實施形態所述之塗布裝置1A的圖示，(A)係從X方向觀看的圖，(B)係從上方觀看的圖。本實施形態的塗布裝置1A，係具備維護部46。塗布裝置1A，係除了台車25A，維護部46以外，其餘係和第1實施形態的塗布裝置1相同之構成。此外，於圖12中，除了塗布裝置1A的維護部46以外，其餘係省略或簡化圖示。 　　[0079] 維護部46，係為進行噴嘴NZ之維護的部分。例如，塗布裝置1A的台車25A，係具備維護部46。台車25A，係除了具備維護部46這點以外，其餘係和第1實施形態的台車25相同之構成。此外，台車25A，係在噴嘴交接機構7A、7B之附近，配置2個。 　　[0080] 維護部46，係被配置在台車25A的上部。維護部46係被形成為例如，可讓位於待機位置P2A、P2B之位置上的被噴嘴交接機構7A、7B所保持之狀態的噴嘴NZ做取用。例如，在本實施形態中，藉由台車25A的移動，已被噴嘴交接機構7A、7B所保持之狀態的噴嘴NZ是可對台車25A的維護部46做取用。 　　[0081] 維護部46係具備例如：將噴嘴NZ的尖端予以洗淨的洗淨部(未圖示)、從噴嘴NZ將液狀體L做預備性吐出所需的預備吐出部(未圖示)、將噴嘴NZ的尖端做擦拭的擦拭部(未圖示)。此外，維護部46，係只要具備這些其中至少1者即可。 　　[0082] 洗淨部係具備例如：將用來洗淨噴嘴NZ所需之洗淨液予以保持的容器。預備吐出部係具備：用來承受從噴嘴NZ所預備吐出之液狀體L所需的容器。擦拭部係具備例如：藉由對噴嘴NZ的尖端做移動以將噴嘴NZ予以擦拭的擦拭構件。 　　[0083] 如以上所述，本實施形態的塗布裝置1A，係具備維護部46，因此可在塗布動作中進行噴嘴NZ的維護。藉此，塗布裝置1A，係可抑制生產性的降低。又，本實施形態的塗布裝置1A，係台車25A是具備維護部46，因此可簡化維護部46之構成。又，維護部46及送液部19係共用台車25A，因此可使塗布裝置1A的裝置尺寸變得精巧。 　　[0084] [第3實施形態] 　　說明第3實施形態。於本實施形態中，關於和上述的實施形態相同之構成，係標示相同符號並省略或簡化其說明。 　　[0085] 圖13係第3實施形態所述之塗布裝置1B的上面圖。本實施形態的塗布裝置1B係具備例如：框體2、控制部3(未圖示)、平台4、平台驅動部5(驅動部)、4個噴嘴NZ(NZ1～NZ4)、2個噴嘴支持部6(6A、6B)、4個噴嘴交接機構7(7A～7D)。此外，控制部3、平台4、及平台驅動部5(驅動部)係和第1實施形態相同，因此省略或簡化說明。 　　[0086] 本實施形態的框體2，係具備平台支持部9B、門架10。本實施形態的平台支持部9B，係除了比第1實施形態的平台支持部9在X方向上被形成為較長以外，其餘係和第1實施形態相同之構成。平台4，係在平台支持部9B的與X方向平行之方向的兩端部之間移動。門架10，係和第1實施形態的門架10相同之構成。 　　[0087] 2個噴嘴支持部6A、6B係分別，被例如門架10的架橋部10b所支持。例如，噴嘴支持部6A，係被支持在門架10的架橋部10b的+X側，噴嘴支持部6B，係被支持在門架10的架橋部10b的-X側。 　　[0088] 噴嘴支持部6A，係和第1實施形態的噴嘴支持部6相同之構成，從複數個噴嘴NZ1、NZ2中選擇出1個而加以支持，且可使所支持的噴嘴NZ做升降。噴嘴支持部6B，係從複數個噴嘴NZ3、NZ4中選擇出1個而加以支持，且使所支持的噴嘴NZ做升降。噴嘴支持部6B，係除了被門架10所支持的位置、及所支持的噴嘴NZ為不同以外，其餘係和第1實施形態的噴嘴支持部6相同之構成。又，噴嘴支持部6A、6B之動作係分別和第1實施形態的噴嘴支持部6相同。 　　[0089] 噴嘴交接機構7A～7D係分別被設置在平台支持部9B之附近。例如，噴嘴交接機構7A、AC，係在平台支持部9B的-Y側，朝與X方向平行之方向排列而被形成。例如，噴嘴交接機構7B、7D，係在平台支持部9B的+Y側，朝與X方向平行之方向排列而被形成。噴嘴交接機構7A～AD係分別除了所被配置的位置為不同這點以外，其餘係和第1實施形態的噴嘴交接機構7A相同之構成。噴嘴交接機構7A、7B係分別被形成為，可在噴嘴支持部6A之間，進行噴嘴NZ的交接。又，噴嘴交接機構7C、AD係分別被形成為，可對噴嘴支持部6B進行噴嘴NZ的交接。噴嘴交接機構7A～7D之動作係分別和第1實施形態的噴嘴交接機構7相同。 　　[0090] 噴嘴NZ1～NZ4係分別是和第1實施形態相同的狹縫噴嘴。噴嘴NZ1，係被連接至噴嘴交接機構7A的送液部19，被噴嘴支持部6及噴嘴交接機構7A任一者所支持。又，噴嘴NZ2，係被連接至噴嘴交接機構7B的送液部19，被噴嘴支持部6及噴嘴交接機構7B任一者所支持。又，噴嘴NZ3，係被連接至噴嘴交接機構7C的送液部19，被噴嘴支持部6及噴嘴交接機構7C任一者所支持。又，噴嘴NZ4，係被連接至噴嘴交接機構7D的送液部19，被噴嘴支持部6及噴嘴交接機構7D任一者所支持。 　　[0091] 接著說明塗布裝置1B之動作。本實施形態的塗布裝置1B，係將4個噴嘴NZ1～NZ4的其中1個，以噴嘴支持部6A或噴嘴支持部6B加以選擇，對基板S進行塗布這點是和第1實施形態不同，至於其以外之動作，係和第1實施形態的塗布裝置1之動作相同。 　　[0092] 本實施形態的塗布裝置1B，係從噴嘴NZ1～NZ4中選擇出1個，而被噴嘴支持部6A或噴嘴支持部6B所支持。例如，噴嘴NZ1、NZ2之任一者被選擇的情況下，噴嘴NZ1、NZ2，係藉由對應的噴嘴交接機構7A、7B，而被交給噴嘴支持部6A，被噴嘴支持部6A所支持。又，噴嘴NZ3、NZ4之任一者被選擇的情況下，噴嘴NZ3、NZ4，係藉由對應的噴嘴交接機構7C、7D，而被交給噴嘴支持部6B，被噴嘴支持部6B所支持。 　　[0093] 已被噴嘴支持部6A或噴嘴支持部6B所支持的噴嘴NZ，係藉由對應的升降驅動部15，以使噴嘴NZ的下端相對於基板S而移動所定之距離。接下來，藉由控制部3之控制，平台驅動部5係做驅動，平台4係一面朝與+X方向或-X方向平行之方向移動，噴嘴NZ係一面藉由對應的送液部19而被供給液狀體L，從吐出口OP吐出液狀體L。藉此，塗布裝置1B，係對基板S塗布液狀體L。 　　[0094] 被噴嘴支持部6A或噴嘴支持部6B所支持的噴嘴NZ，係在更換之際，被交給對應之噴嘴交接機構7A～7D之任一者。此時，噴嘴支持部6A及噴嘴支持部6B係分別處於未支持噴嘴NZ的狀態。接下來，回到最初，塗布裝置1B，係從複數個噴嘴NZ1～NZ4中選擇出1個，以噴嘴支持部6A或噴嘴支持部6B加以支持，進行下次的塗布。 　　[0095] 如以上所述，本實施形態的塗布裝置1B，係4個噴嘴NZ是可更換，因此能夠使得可使用的噴嘴變多。 　　[0096] [第4實施形態] 　　說明第4實施形態。於本實施形態中，關於和上述的實施形態相同之構成，係標示相同符號並省略或簡化其說明。以下以本實施形態與上記實施形態的相異點為中心做說明。 　　[0097] 圖14係第4實施形態所述之塗布裝置之一例的上面圖。本實施形態的塗布裝置1C係具備例如：框體2、控制部3、平台4、平台驅動部5(驅動部)、噴嘴NZ、噴嘴支持部6C(門架10的支柱部10c)、噴嘴交接機構7(7A、7B)、及台車25。控制部3、平台4、平台驅動部5、及台車25，係和第1實施形態相同。 　　[0098] 框體2，係支持各部。框體2係含有例如：平台支持部9(參照圖2)、門架10。平台支持部9，係和第1實施形態相同。 　　[0099] 圖15(A)係第4實施形態的噴嘴的圖示。第4實施形態的噴嘴NZ，係在上部被安裝有適配器55。噴嘴NZ，係除了被安裝有適配器55這點以外，其餘係和第1實施形態相同。適配器55，係長邊方向(與Y方向平行之方向)的長度，是被形成為比噴嘴NZ還長。在適配器55的下面(下部)係被設置有定位部56，其係將適配器55定位在之後所說明的門架10的支柱部10c。定位部56係具備：被設在適配器55之下面的凹部56a、和被設在支柱部10c之上面的凸部56b(參照圖15(B))。凹部56a，係被設在適配器55之下部的+Y側及-Y側。各凹部56a係朝下方開口。各凹部56a中，係在噴嘴NZ是被設置在門架10(支柱部10c(噴嘴支持部6C))之際，支柱部10c的凸部56b係會嵌入，其結果為，噴嘴NZ係對支柱部10c而被定位。 　　[0100] 適配器55的上面係設有被支持部57。被支持部57係被之後所說明的噴嘴交接機構7的噴嘴保持部23D(參照圖16(A))所支持。被支持部57係由例如一對L字狀的構件(L字狀構件)所構成。被支持部57係例如，一對L字狀的構件，是沿著與Y方向平行之方向(與噴嘴NZ的長邊方向平行之方向)而被配置。+Y側的L字狀構件係具有朝-Y側突出的突出部57a，-Y側的L字狀構件係具有朝+Y側突出的突出部57a。在各L字狀構件的突出部57a的下面(下部)係設有，對噴嘴保持部23D做定位的定位部60的凹部60a。凹部60a係為例如圓錐狀(推拔狀)。各定位部60係具備：凹部60a、和被設在之後所說明的噴嘴保持部23D的突出部65之上面的凸部60b(參照圖16(B))。各凹部60a係朝下方開口。各凹部60a，係在噴嘴NZ被保持於噴嘴交接機構7之際，噴嘴交接機構7的支持部Q的凸部60b係會嵌入，其結果為，噴嘴NZ係對噴嘴交接機構7的支持部21而被定位。 　　[0101] 圖15(B)係第4實施形態的噴嘴及門架的圖示。本實施形態的門架10，係具備一對支柱部10c。一對支柱部10c係將平台4在Y方向上予以夾住而設置2個。各支柱部10c，係分別被平台支持部9所支持。各支柱部10c，係沿著鉛直方向而延伸，藉由之後所說明的升降驅動部15之驅動而朝鉛直方向移動。各支柱部10c係為，以其上面(+Z側的面)而透過適配器55而將噴嘴NZ予以支持的噴嘴支持部6C。各支柱部10c(噴嘴支持部6C)係從複數個噴嘴NZ(NZ1、NZ2)中選擇出1個並支持，被構成為與之後所說明的噴嘴交接機構7之間可進行噴嘴NZ的交接。此外，支柱部10c係亦可不被平台支持部9所支持。例如，支柱部10c係亦可被地面所支持，亦可被第1實施形態的門架10的支柱部10a所支持。 　　[0102] 各支柱部10c係被設有，將適配器55做定位的，定位部56的凸部56b。各凸部56b係為例如圓錐狀(推拔狀)。各凸部56b，係在噴嘴NZ是被門架10(支柱部10c)所支持之際，係會嵌入至適配器55的凹部56a，噴嘴NZ係被定位。此外，凹部56a及凸部56b的個數係分別亦可不是2個，例如，凹部56a及凸部56b的個數係亦可為3個以上。此外，凹部56a及凸部56b的形狀係分別不限定於圓錐狀(推拔狀)，而為任意。例如，凹部56a及凸部56b的形狀係亦可為圓柱狀，也可為矩形柱狀。 　　[0103] 本實施形態的塗布裝置1C，係具備鉗夾機構62(參照圖15(B))。鉗夾機構62，係將適配器55和支柱部10c予以固定。鉗夾機構62係被設在+Y側及-Y側。各鉗夾機構62係例如，被安裝在支柱部10c。各鉗夾機構62係例如，將適配器55往支柱部10c的上面做推壓而固定。各鉗夾機構62，係藉由控制部3(參照圖14)之控制，藉由未圖示之驅動部而被驅動，將適配器55與支柱部10c予以固定。又，各鉗夾機構62，係藉由控制部3之控制，藉由未圖示之驅動部而被驅動，將適配器55與支柱部10c之固定予以釋放。此外，鉗夾機構62，在圖15(B)的例子中，係被設在+Y側及-Y側，但亦可被設在+Y側及-Y側的至少一方。又，塗布裝置1C是否具備鉗夾機構62，係為任意。 　　[0104] 又，各支柱部10c，係藉由升降驅動部15而朝鉛直方向做驅動。升降驅動部15，係藉由將各支柱部10c朝鉛直方向做驅動，以使所支持的噴嘴NZ做升降。升降驅動部15係為例如電動馬達等。升降驅動部15，係被控制部3(參照圖14)所控制，在塗布時的噴嘴NZ與基板S之距離的調整時(微調整時)、及門架10(支柱部10c)與噴嘴NZ與噴嘴交接機構7(7A、7B)的噴嘴NZ之交接時等之際，使噴嘴NZ做升降。 　　[0105] 接著，回到圖14的說明，說明第4實施形態的噴嘴交接機構7。噴嘴交接機構7，係具備複數個噴嘴交接機構7A、7B。噴嘴交接機構7A、7B係分別被配置在平台4附近。噴嘴交接機構7A，係被配置在平台4的-Y側，將噴嘴NZ1予以支持。噴嘴交接機構7B，係被配置在平台4的+Y側，將噴嘴NZ2予以支持。噴嘴交接機構7A、7B係分別具備：迴旋部18、送液部19。各送液部19，係和第1實施形態相同，被連接至對應之噴嘴NZ，將液狀體L(參照圖7(B))予以送液。 　　[0106] 圖16(A)係第4實施形態的噴嘴交接機構的圖示。圖16(A)係將第4實施形態的噴嘴交接機構7B從-Y方向觀看的圖。此外，在本實施形態中，噴嘴交接機構7A、7B係皆為相同之構成。在以下的說明中，以噴嘴交接機構7B為例做說明。 　　[0107] 迴旋部18，係以上下方向(鉛直方向)為軸而將噴嘴NZ保持成可迴旋。迴旋部18係具備例如：軸部20、支持部21、迴旋驅動部22、噴嘴保持部23D。軸部20、支持部21、及迴旋驅動部22，係和第1實施形態相同。迴旋驅動部22，係被控制部3(參照圖14)所控制，使在軸部20被可旋轉地支持的支持部21做迴旋。支持部21，係藉由迴旋驅動部22之驅動，而和第1實施形態同樣地，朝水平方向而迴旋。此外，交接機構7，係亦可不具備迴旋驅動部22，而是由使用者以人力而使支持部21做迴旋之構成。 　　[0108] 噴嘴保持部23D，係將噴嘴NZ予以保持。噴嘴保持部23D係由例如一對L字狀的構件(L字狀構件)所構成。該一對L字狀構件，係朝與X方向平行之方向(與支持部21的長邊方向平行之方向)排列而被配置。+X側的L字狀構件係具有朝+X側突出的突出部65，-X側的L字狀構件係具有朝-X側突出的突出部65。各突出部65，係位於噴嘴NZ(適配器55)的被支持部57的內側(中央側)。各突出部65，係以其上面，將噴嘴NZ的被支持部57的突出部57a的下面予以支持。噴嘴保持部23D，係藉由將噴嘴NZ的被支持部57予以支持，以支持噴嘴NZ。 　　[0109] 圖16(B)係本實施形態的噴嘴保持部23D的放大圖。噴嘴保持部23D，係在各突出部65的上面(上部)，設有將噴嘴NZ予以定位的定位部60的凸部60b。各凸部60b，係在噴嘴NZ是被噴嘴保持部23D所支持之際，係會嵌入至適配器55的被支持部57的各凹部60a，噴嘴NZ係被定位。此外，凹部60a及凸部60b的個數係分別亦可不是2個，例如，凹部60a及凸部60b的個數係亦可為3個以上。此外，凹部60a及凸部60b的形狀係分別不限定於圓錐狀(推拔狀)，而為任意。例如，凹部60a及凸部60b的形狀係亦可為圓柱狀，也可為矩形柱狀。關於噴嘴NZ的交接，係在之後說明。此外，關於噴嘴保持部23D的噴嘴NZ的保持及釋放之機構，係在之後說明。 　　[0110] 如上記而被構成的本實施形態的噴嘴交接機構7A、7B係分別在交接位置P1A、P1B(參照圖14)、待機位置P2A、P2B之間移動，在交接位置P1A、P1B上，對門架10的支柱部10c進行噴嘴NZ的交接，在待機位置P2A、P2B上進行待機。 　　[0111] 交接位置P1A、P1B係分別被設定成，在門架10的支柱部10c與噴嘴交接機構7A、7B之間，可進行噴嘴NZ之交接。例如，噴嘴交接機構7A、7B係分別被形成為，在交接位置P1A、P1B上，支持部21的長邊方向，會是與平台4之移動方向正交之方向(與Y方向平行之方向)(參照圖14)。 　　[0112] 待機位置P2A、P2B係分別被設定在，當噴嘴交接機構7A、7B將噴嘴NZ予以保持時，噴嘴NZ會是從平台4的上方跑開的位置。噴嘴交接機構7A、7B係分別被形成為，在待機位置P2A、P2B上，支持部21的長邊方向，會變成與X方向平行之方向(參照圖14)。例如，噴嘴交接機構7A、7B係分別在待機位置P2A、P2B上，進行噴嘴NZ的維護等。 　　[0113] 接著說明塗布裝置1C之動作。圖17～圖19係分別為塗布裝置1C之動作的圖示。在說明塗布裝置1C之動作之際，適宜參照圖14～圖16。 　　[0114] 本實施形態的塗布裝置1C，係如圖14所示，將2個噴嘴NZ1、NZ2之其中1者以門架10的支柱部10c(噴嘴支持部6C)加以選擇，而對基板S進行塗布。例如，噴嘴NZ1、NZ2之任一者被選擇的情況下，噴嘴NZ1、NZ2，係藉由對應的噴嘴交接機構7A、7B，而被各支柱部10c所支持。此外，圖14係圖示了，由支柱部10c將噴嘴NZ1予以支持的例子。 　　[0115] 各支柱部10c係例如，如圖17(A)所示，將噴嘴NZ以各支柱部10c的上面，從下方，將噴嘴NZ的適配器55予以支持，以支持噴嘴NZ。各支柱部10c，係將噴嘴NZ從下方加以支持，因此可將噴嘴NZ不會落下而確實地加以保持。又，噴嘴NZ，係藉由定位部56，而被各支柱部10c在已被定位之狀態下，而被支持。噴嘴NZ，係在適配器55的下面(下部)的凹部56a中，嵌入各支柱部10c的凸部56b，而被定位。鉗夾機構62，係在噴嘴NZ是被各支柱部10c所定位並支持的狀態下，將適配器55與各支柱部10c予以固定。+Y側及-Y側的鉗夾機構62係例如，將適配器55的下面，往各支柱部10c的上面推壓而固定。適配器55與各支柱部10c、係藉由鉗夾機構62，而被確實地固定。各鉗夾機構62，係藉由控制部3(參照圖14)之控制，藉由未圖示之驅動部而被驅動，將適配器55與各支柱部10c予以固定。塗布裝置1C，係藉由控制部3之控制而驅動升降驅動部15(參照圖14)，微調基板S與噴嘴NZ之間的距離，對基板S進行塗布。塗布裝置1C所致之基板S的塗布之動作，係和第1實施形態相同。 　　[0116] 接著說明，塗布裝置1C所致之，更換已被各支柱部10c所支持之噴嘴NZ之動作。此外，以下的說明中，係說明使用噴嘴交接機構7B來更換噴嘴的例子，但關於噴嘴交接機構7A也是同樣如此。 　　[0117] 塗布裝置1C，係在更換已被各支柱部10c所支持之噴嘴NZ之際，首先，如圖17(B)所示，控制部3(參照圖14)係驅動升降驅動部15，使支柱部10c往鉛直上方移動。控制部3，係使各支柱部10c往鉛直上方的所定位置移動。該所定位置係為，在各支柱部10c與噴嘴交接機構7(7A、7B)之間，可進行噴嘴NZ之交接的位置。例如，該所定位置係被設定成，在適配器55的被支持部57的下方，可配置噴嘴交接機構7的噴嘴保持部23D的位置。 　　[0118] 接下來，圖18(A)所示，控制部3，係驅動迴旋驅動部22，使噴嘴交接機構7的迴旋部18迴旋。控制部3，係使迴旋部18，往交接位置P1B移動。在該交接位置P1B上，迴旋部18係被配置在，各支柱部10c的鉛直上方的所定位置。例如，在交接位置P1B上，噴嘴交接機構7的噴嘴保持部23D，係被設定在適配器55的被支持部57的下方(正下方)之位置。 　　[0119] 接下來，如圖18(B)所示，控制部3，係驅動升降驅動部15，使各支柱部10c往鉛直下方移動。此外，控制部3係早於該各支柱部10c的鉛直下方之移動，先驅動鉗夾機構62，以釋放鉗夾機構62所致之支柱部10c與適配器55之固定。藉由各支柱部10c的鉛直下方之移動，而進行支柱部10c與噴嘴交接機構7B之間的噴嘴NZ的交接。藉由各支柱部10c的鉛直下方之移動，噴嘴保持部23D的凸部60b就會嵌入適配器55的被支持部57的凹部60a，噴嘴NZ係被定位。 　　[0120] 接下來，如圖19(A)所示，控制部3，係驅動升降驅動部15，使各支柱部10c再往鉛直下方移動。藉此，噴嘴NZ，係在被定位於噴嘴交接機構7B的噴嘴保持部23D的狀態下，被從各支柱部10c交給噴嘴交接機構7。 　　[0121] 接下來，圖19(B)所示，控制部3，係驅動迴旋驅動部22，使噴嘴交接機構7A往待機位置P2A移動。於待機位置P2A、P2B上，噴嘴NZ係被進行維護等。 　　[0122] 接下來，進行從噴嘴交接機構7B往支柱部10c的噴嘴NZ1之交接，以進行噴嘴NZ的更換。從噴嘴交接機構7B往各支柱部10c的交接之動作，係依照和上記的從各支柱部10c往噴嘴交接機構7A的噴嘴之交接之動作相反的順序，而被進行。 　　[0123] 如以上所述，本實施形態的塗布裝置1C，係可迅速且確實地進行噴嘴的更換。 　　[0124] 此外，本發明的技術範圍，係不限定於上述的實施形態等中所說明的態樣。上述的實施形態等中所說明的要件的1個以上，有時候會被省略。又，上述的實施形態等中所說明的要件，係可適宜地組合。又，在法令所容許的範圍內，上述的實施形態等中所引用的全部文獻的揭露，都被沿用而作為本文的記載之一部分。 　　[0125] 例如，在上述的實施形態中雖然說明了，塗布裝置1、1A、1B、1C係為，相對於噴嘴支持部6，平台4會做移動之構成的例子，但塗布裝置1、1A、1B、1C之構成，係不限定於此。例如，塗布裝置1、1A、1B、1C係亦可為，相對於平台4，而由噴嘴支持部6來做移動之構成。 　　[0126] 例如，噴嘴交接機構7，係不限定於上記之構成，可採用任意之構成。圖20，係噴嘴交接機構7的其他的例圖示。例如，亦可如圖20所示，噴嘴交接機構7係被形成為，藉由驅動部50之驅動而可朝上下方向及水平方向移動，可與噴嘴支持部6之間進行噴嘴NZ之交接的構成。[0010] [First Embodiment] "The first embodiment will be described." In the following description, it is appropriate to refer to the XYZ orthogonal coordinate system shown in FIG. 1 and the like. In this XYZ orthogonal coordinate system, the X direction and the Y direction are horizontal directions (horizontal direction), and the Z direction is the vertical direction. In addition, in each direction, it is appropriate to call the side the same as the tip of the arrow as the + side (for example, +Z side), and the side opposite to the tip of the arrow as the-side (for example, -Z side). For example, in the vertical direction (Z direction), the upper part is the +Z side, and the lower part is the -Z side. In addition, in the drawings, part or all of the drawings are described schematically for the purpose of explaining the embodiment, and a part of the drawings is enlarged or emphasized, etc., and may include parts expressed by changing the scale as appropriate.　　[0011] Fig. 1 is a top view of an example of the coating device described in the first embodiment. Fig. 2 is a cross-sectional view taken along the line A-A of Fig. 1, viewed from the -Y direction. Fig. 3 is a cross-sectional view taken along the line B-B of Fig. 1, viewed from the -Y direction. The coating apparatus 1 of the present embodiment applies a liquid L to the substrate S (see FIG. 7(B)). The coating device 1 includes, for example, a housing 2, a control unit 3, a platform 4, a platform drive unit 5 (drive unit), a nozzle NZ, a nozzle support unit 6, and a nozzle transfer mechanism 7.　　[0012] Frame 2, which supports all parts. The frame 2 includes, for example, a platform support 9 and a door frame 10 (refer to FIGS. 2 and 3). The platform support part 9 supports the platform 4 so as to be movable in a direction parallel to the X direction, for example. The platform support 9 is provided with, for example, a leg 9a and a base 9b. The legs 9a are set on the ground and support the base 9b from below. The leg portion 9a is composed of, for example, four members, and is arranged below the four corner portions of the base 9b. The base 9b is, for example, rectangular when viewed from above. The base 9b can support the platform 4 from below, through guides (not shown), etc., so as to be movable in a direction parallel to the X direction.　　[0013] The door frame 10 has a pair of pillar portions 10a and a bridge portion 10b (refer to FIGS. 1 to 3). Two pillar parts 10a are provided by sandwiching the platform 4 in the Y direction (refer to FIG. 1). Each pillar portion 10a extends in the vertical direction, and is installed on the ground (refer to FIGS. 2 and 3). Each pillar portion 10a supports the bridging portion 10b. The bridge portion 10b extends in a direction parallel to the Y direction. Both ends of the bridge portion 10b are respectively connected to the upper end side (+Z side) surface of each pillar portion 10a (refer to FIG. 1). The bridge portion 10b supports the nozzle support portion 6 described later. In addition, the mast 10 may be movable. For example, the gantry 10 may be configured to be movable in the X direction with respect to the base 9b.　　[0014] The control unit 3 controls each unit. The control part 3 is communicably connected with each part of the coating device 1. The control unit 3 is, for example, a computer device provided with a memory device (not shown) such as a CPU (not shown), a hard disk, or a memory. The control unit 3 can execute, for example, a program that controls each unit of the coating device 1. The program is memorized in advance in, for example, a memory device. In addition, the control unit 3 can also be connected to an input device such as a keyboard, a mouse, a touch panel, etc., and can also be connected to a display device such as a display.　　[0015] The stage 4 is for mounting the substrate S. The platform 4 is tied above the base 9b, and is supported by the base 9b so as to be movable in the X direction. The platform 4 is, for example, rectangular when viewed from above (refer to FIG. 1). The platform 4 includes, for example, an upper surface parallel to the XY plane (horizontal plane). The upper part is formed with a fixed plate, for example. The substrate S is placed on the upper surface, and the substrate S is arranged on a surface parallel to the XY plane (horizontal plane). The substrate S is positioned by, for example, a positioning mechanism (not shown) provided on the platform 4, and is sucked by a suction part (not shown) provided on the upper surface, thereby being supported by the upper surface.　　[0016] The platform driving part 5 is the driving platform 4. The platform driving unit 5 is, for example, an electric motor or the like. The stage driving unit 5 moves the stage 4 in a direction parallel to the X direction with respect to the base 9b, for example. The platform 4 is driven by the platform driving part 5 to move relative to the nozzle support part 6 described later. The platform drive unit 5 is, for example, communicably connected with the control unit 3, and the drive timing, drive amount, drive direction, drive speed, etc. are controlled by the control unit 3 to move the platform 4 to a predetermined position. In addition, the platform drive unit 5 may not be connected to the control unit 3. For example, the platform driving unit 5 may be configured to be manually driven by the user of the platform 4.　　[0017] Nozzle NZ applies liquid L to substrate S. In the present embodiment, the coating device 1 includes a plurality of nozzles NZ (NZ1, NZ2). For example, in the example shown in FIG. 1, the nozzle NZ1 is supported by the nozzle supporting portion 6 and is in a coatable state, and the nozzle NZ2 is supported by the nozzle transfer mechanism 7B described later to replace the nozzle NZ1. Nozzle. For example, the nozzles NZ1 and NZ2 are all slit nozzles. Both the nozzles NZ1 and NZ2 have a discharge port OP for discharging the liquid L (refer to FIG. 2(B)). For example, the discharge port OP is, for example, a slit-shaped opening in the downward direction.　　[0018] The nozzles NZ1 and NZ2 are respectively connected to the liquid feeding portion 19 of the corresponding nozzle transfer mechanism 7. The nozzle NZ1 is connected to the liquid feeding part 19 of the nozzle transfer mechanism 7A, and is supported by either the nozzle support part 6 or the nozzle transfer mechanism 7A. The nozzle NZ2 is connected to the liquid feeding part 19 of the nozzle transfer mechanism 7B, and is supported by either the nozzle support part 6 or the nozzle transfer mechanism 7A. The nozzles NZ1 and NZ2 are respectively connected to the corresponding liquid feeding part 19 by a pipe (not shown) such as a pipe, for example. The nozzles NZ1 and NZ2 discharge the liquid L from the discharge port OP by supplying the liquid L from the liquid feeder 19 during coating, and apply the liquid L to the substrate S. The nozzle transfer mechanism 7 and the liquid supply unit 19 will be described later.　　[0019] In addition, the nozzle NZ is not limited to a slit nozzle, but is arbitrary. For example, the nozzle NZ may be an inkjet nozzle, a bar coater, a dispensing nozzle, or the like. In addition, the plurality of nozzles NZ may be different types of nozzles. In addition, the plurality of nozzles NZ may include nozzles with different uses. For example, the nozzle NZ1 and the nozzle NZ2 can also be used for coating liquids L of mutually different types. In addition, the plurality of nozzles NZ1 and NZ2 may not be connected to the liquid feeding unit 19, respectively. For example, a plurality of nozzles NZ1 and NZ2 may be connected to the liquid supply unit 19 at the time of coating, respectively.　　[0020] The nozzle support part 6 selects one from a plurality of nozzles NZ and supports it, and the supported nozzle NZ is raised and lowered. The nozzle support portion 6 includes, for example, a guide portion 12, a support portion 13, a nozzle holding portion 14, and an up-and-down driving portion 15. The nozzle support part 6 is supported by the mast 10, for example.　　[0021] The guide portion 12 is supported by the bridging portion 10b of the mast 10, for example. The guiding part 12 supports the supporting part 13 so as to be movable in the vertical direction. The support part 13 supports the nozzle holding part 14. The guide portion 12 supports, for example, the support portion 13, the nozzle holding portion 14, and the nozzle NZ so as to be movable in the vertical direction (direction parallel to the Z direction).　　[0022] The nozzle holder 14 holds the nozzle NZ. The nozzle holder 14 is positioned to hold the nozzle NZ. The nozzle holding portion 14 is formed to be able to release the held nozzle NZ. The nozzle holding portion 14 is attached to the supporting portion 13, for example. The nozzle holding portion 14 is configured to be able to transfer the nozzle NZ to the nozzle transfer mechanism 7 described later. The nozzle holder 14 is, for example, when receiving the nozzle NZ from the nozzle transfer mechanism 7 described later, it receives and holds the nozzle NZ, and when the nozzle NZ is delivered to the nozzle transfer mechanism 7, it transfers the supported nozzle NZ is released and handed over to the nozzle transfer mechanism 7. In addition, the mechanism for holding and releasing the nozzle NZ of the nozzle holding portion 14 will be described later in FIGS. 8 to 11. In addition, the mechanism for positioning the nozzle NZ will be described later in FIG. 11.　　[0023] The elevating drive unit 15 raises and lowers the nozzle NZ. The lifting driving part 15 is connected to the supporting part 13. The up-and-down driving part 15 raises and lowers the substrate S by raising and lowering the support part 13, so that the nozzle NZ held by the nozzle holding part 14 is raised and lowered. The lift drive unit 15 is, for example, an electric motor or the like. The lifting driving part 15 can move the supporting part 13 to a predetermined position. For example, the up-and-down drive unit 15 drives the support unit 13 in such a manner that the distance between the discharge port OP of the nozzle NZ and the substrate S is a predetermined distance during coating. The lift drive unit 15 is, for example, communicably connected with the control unit 3, and its drive is controlled by the control unit 3. The raising/lowering drive unit 15 is controlled by the control unit 3, for example, the timing of the drive, the amount of drive, the drive direction, the speed of the drive, and the like. In addition, the elevating drive unit 15 may not be connected to the control unit 3. For example, the lifting driving part 15 may be a structure in which the user manually controls the lifting. In addition, the raising/lowering drive unit 15 may not be provided. For example, the nozzle support portion 6 may be configured such that the support portion 13 is raised and lowered by the user's human power.　　[0024] The nozzle support portion 6 configured as described above is selected from the nozzles NZ1 and NZ2, and the nozzle NZ1 or the nozzle NZ2 is supported by the nozzle holding portion 14. For example, in the example shown in FIG. 1, the nozzle support part 6 selects and supports the nozzle NZ1 from the nozzles NZ1 and NZ2. In addition, the nozzle support part 6 is to raise and lower the supported nozzle NZ1 by the driving of the raising and lowering drive part 15 during coating or the like, and to arrange it at a predetermined position.　　[0025] Next, the nozzle transfer mechanism 7 will be described. The nozzle transfer mechanism 7 transfers the nozzle NZ to the nozzle support part 6. The coating apparatus 1 is provided with, for example, a plurality of nozzle transfer mechanisms 7 (7A, 7B). The nozzle transfer mechanisms 7A and 7B are provided with, for example, a swirling portion 18 and a liquid feeding portion 19, respectively. The nozzle transfer mechanisms 7A and 7B are respectively arranged near the platform 4. For example, the nozzle transfer mechanisms 7A and 7B are arranged on the -Y side and the +Y side of the platform 4, respectively.　　[0026] In this embodiment, the nozzle transfer mechanisms 7A and 7B have the same configuration. In the following description, the nozzle transfer mechanism 7A is taken as an example.　　[0027] The swirling part 18 holds the nozzle NZ so as to be able to rotate with the vertical direction (vertical direction) as the axis. The swirling part 18 includes, for example, a shaft part 20, a supporting part 21, a swirling driving part 22, and a nozzle holding part 23.　　[0028] The shaft portion 20 extends in the vertical direction. The shaft portion 20 is fixed to the ground, for example. In addition, the shaft portion 20 may be fixed outside the ground. For example, the shaft part 20 may be fixed to the frame 2 (for example, the base 9b). The shaft portion 20 supports the support portion 21 through a mounting member (not shown) so as to be rotatable about the vertical axis of the shaft portion 20.　　[0029] The support part 21 supports the nozzle holding part 23. The support part 21 is rotated around the axis of the shaft part 20. The support part 21 is connected to the gyration driving part 22 and gyrates by the driving of the gyrating driving part 22. The shaft portion 20 and the support portion 21 are attached to the state where the nozzle NZ is held in the nozzle holding portion 23, and when the support portion 21 is rotated, so that the lower end of the nozzle NZ does not interfere with being placed on the platform The 4 substrate S is formed so as to be arranged above the substrate S placed on the platform 4 (refer to the nozzle transfer mechanism 7B shown in FIG. 2).　　[0030] The gyration driving part 22 drives and gyrates the support part 21. The orbiting drive unit 22 is, for example, an electric motor or the like. The orbiting drive unit 22 is, for example, communicably connected with the control unit 3, and its drive is controlled by the control unit 3. The gyration driving unit 22 is, for example, the timing of driving, the amount of driving, the driving direction, the speed of driving, etc. are controlled by the control unit 3 to move the supporting unit 21 to a predetermined position. In addition, the orbiting drive unit 22 may not be connected to the control unit 3. For example, the gyration driving unit 22 may be configured in which the gyration is manually controlled by the user. In addition, the turning drive unit 22 may not be provided. For example, the delivery mechanism 7 may be configured such that the support part 21 is rotated by the user with human power.　　[0031] The nozzle holder 23 holds the nozzle NZ. The nozzle holding portion 23 is configured to be able to release the held nozzle NZ. The nozzle holding portion 23 is configured, for example, to allow the nozzle NZ to be transferred to and from the nozzle holding portion 14 of the nozzle support portion 6. The transfer of the nozzle NZ will be described later. In addition, the mechanism for holding and releasing the nozzle NZ of the nozzle holding portion 23 will be described later in FIGS. 8 to 11.　　[0032] The liquid feeding part 19 supplies the liquid L to the nozzle NZ. The liquid delivery unit 19 is, for example, a pump. The liquid feeding part 19 is formed in the cart 25 as shown in FIG. 3, for example. The trolley 25 is, for example, arranged on the side of the platform 4 (a direction parallel to the Y direction). The bogie 25 is arranged, for example, in the vicinity of a side (-Y side) away from the platform 4 with respect to the revolving portion 18. The trolley 25 is provided with, for example, a plurality of wheels 25a, a receiving portion 25b, and a liquid feeding portion 19. The trolley 25 is formed to be movable by a plurality of wheels 25a provided at the lower part of the accommodating portion 25b. The accommodating part 25b is formed as a box and can accommodate articles inside. For example, a plurality of containers 27 storing the liquid body L are accommodated in the interior of the accommodating portion 25b. The liquid feeding portion 19 is, for example, a pipe portion 25c arranged in an upper portion of the accommodating portion 25b. The liquid feeding portion 19 is connected by a pipe (not shown) such as a pipe through the container 27 and the pipe portion 25c accommodated in the accommodating portion 25b, for example. In addition, the liquid feeding unit 19 is connected to a predetermined nozzle NZ corresponding to a plurality of nozzles NZ, for example, by a pipe (not shown) such as a pipe. For example, the liquid feeding part 19 of the nozzle transfer mechanism 7A is connected to the nozzle NZ1, and the liquid feeding part 19 of the nozzle transfer mechanism 7B is connected to the nozzle NZ2. In addition, the length of the pipe between the nozzle NZ1 and the liquid feeding unit 19 and the length of the pipe between the nozzle NZ2 and the liquid feeding unit 19 are set to be substantially the same. At this time, the control of the liquid feeding unit 19 can be made the same between the nozzle NZ1 and the nozzle NZ2.　　[0033] The liquid feeding part 19 is for feeding the liquid L stored in the container 27 to the nozzle NZ in a fixed amount. The liquid feeding unit 19 is communicably connected with the control unit 3, and its operation is controlled by the control unit 3. The liquid supply unit 19 is controlled by the control unit 3, for example, the timing of supplying the liquid L to the nozzle NZ, the amount of the liquid L supplied to the nozzle NZ, and the like. The liquid feeding unit 19 is driven by the control of the control unit 3, for example, to supply the liquid L stored in the container 27 to the nozzle NZ in a predetermined amount. In this way, during coating, the nozzle NZ supported by the nozzle supporting portion 6 is supplied with the liquid L from the liquid feeding portion 19, and a predetermined amount of the liquid L is discharged to the substrate S from the discharge port OP. , The liquid L is applied to the substrate S.　　[0034] In addition, at least one of the liquid feeding portion 19 and the container 27 may not be formed on the trolley 25. In addition, it is arbitrary whether the coating apparatus 1 is equipped with the trolley 25. [0035] The nozzle transfer mechanisms 7A and 7B configured as described above move between the transfer positions P1A and P1B and the standby positions P2A and P2B, respectively. At the transfer positions P1A and P1B, the nozzle support portion 6 is sprayed. The transfer of NZ is performed in standby positions P2A and P2B (refer to FIG. 5(A) and FIG. 6(A)). In addition, the nozzle transfer mechanisms 7A and 7B of the present embodiment are respectively formed so that they can move between the transfer positions P1A, P1B, and the standby positions P2A, P2B by only horizontal movement due to rotation. In this case, the nozzle NZ can be delivered quickly.　　[0036] The transfer positions P1A and P1B are respectively set at positions where the nozzle NZ can be transferred between the nozzle support 6 and the nozzle transfer mechanisms 7A, 7B. For example, the nozzle transfer mechanisms 7A and 7B are respectively formed such that at the transfer positions P1A and P1B, the longitudinal direction of the support 21 will be the direction orthogonal to the moving direction of the stage 4 (the direction parallel to the Y direction) .　　[0037] The standby positions P2A and P2B are respectively set at positions where the nozzle NZ will run away from the top of the platform 4 when the nozzle transfer mechanisms 7A and 7B hold the nozzle NZ. The nozzle transfer mechanisms 7A and 7B are respectively formed so that the longitudinal direction of the support part 21 is a direction parallel to the X direction at the standby positions P2A and P2B. For example, the nozzle transfer mechanisms 7A and 7B respectively perform maintenance of the nozzle NZ in the standby positions P2A and P2B.　　[0038] Hereinafter, based on the operation of the coating device 1, the coating method described in this embodiment will be described. Fig. 4 is a flowchart of the coating method described in the embodiment. 5 to 7 are diagrams showing an example of the operation of the coating device 1. In addition, in describing FIG. 4, FIGS. 1 to 3, and FIGS. 5 to 7 are appropriately referred to.　　[0039] This coating method is a method of coating the substrate S with the liquid L. In this coating method, for example, in step S1 shown in FIG. 4, the nozzle transfer mechanism 7A that does not hold the nozzle NZ is advanced relative to the nozzle support 6. For example, as shown in FIG. 5(A), the nozzle transfer mechanism 7A in the standby position P2A that does not hold the nozzle NZ is controlled by the control unit 3 and the swivel driving unit 22 is driven by the swiveling of the swiveling unit 18. , And move to the transfer position P1A. The nozzle transfer mechanism 7A is formed so that it can move between the transfer position P1A and the standby position P2A by only horizontal movement caused by the rotation, and therefore can move quickly.　　[0040] Next, in step S2 shown in FIG. 4, the nozzle NZ is held by the nozzle transfer mechanism 7A. For example, in the transfer position P1A, the nozzle transfer mechanism 7A holds the nozzle NZ1 in the state being held by the nozzle support part 6 by the nozzle holding part 23. At this time, the nozzle NZ1 is held by both the nozzle holding portion 14 of the nozzle support portion 6 and the nozzle holding portion 23 of the nozzle transfer mechanism 7A.　　[0041] Next, in step S3 shown in FIG. 4, the holding of the nozzle NZ by the nozzle support 6 is released. For example, the nozzle support 6 releases the nozzle NZ1 while the nozzle transfer mechanism 7A is holding the nozzle NZ1, and the nozzle NZ1 is delivered to the nozzle transfer mechanism 7A. The nozzle NZ1 is transferred while being held by either of the nozzle support 6 and the nozzle transfer mechanism 7A, so that the transfer of the nozzle NZ can be performed reliably.　　[0042] Next, in step S4 shown in FIG. 4, the nozzle transfer mechanism 7A is retracted. The nozzle NZ1 that is not selected by the nozzle support part 6 is retreated from above the platform by the nozzle transfer mechanism 7A. For example, as shown in FIG. 5(B), the nozzle transfer mechanism 7A is in a state where the nozzle NZ1 is being held, and is driven by the swivel drive section 22 under the control of the control section 3 to move to the standby position P2A. For example, in the standby position P2A, the nozzle NZ1 held by the nozzle transfer mechanism 7A is subjected to nozzle replacement, nozzle maintenance, and the like.　　[0043] Next, in step S5 shown in FIG. 4, the other nozzle transfer mechanism 7B holding the nozzle NZ2 is moved forward with respect to the nozzle support portion 6. For example, as shown in FIG. 6(A), the nozzle transfer mechanism 7B in the standby position P2B holding the nozzle NZ2 is controlled by the control unit 3 and the swirling drive unit 22 is driven by the rotation of the swirling unit 18 Swivel, and move to the transfer position P1B. The nozzle transfer mechanism 7B is formed so that it can move between the transfer position P1B and the standby position P2B due to only horizontal movement due to the rotation, and therefore can move quickly.　　[0044] Next, in step S6 shown in FIG. 4, the nozzle NZ2 is held by the nozzle supporting portion 6. For example, at the transfer position P2A, the nozzle support 6 holds the nozzle NZ2 in the state being held by the nozzle transfer mechanism 7B by the nozzle holding portion 14. At this time, the nozzle NZ is held by the holding mechanism of both the nozzle holding part 14 of the nozzle support part 6 and the nozzle holding part 23 of the nozzle transfer mechanism 7B.　　[0045] Next, in step S7 shown in FIG. 4, the holding of the nozzle NZ2 by the nozzle transfer mechanism 7B is released. For example, the nozzle transfer mechanism 7B releases the nozzle NZ2 while the nozzle support section 6 is holding the nozzle NZ, and the nozzle NZ2 is delivered to the nozzle support section 6. The nozzle NZ2 is delivered and delivered in a state held by either the nozzle support 6 and the nozzle delivery mechanism 7A, so that the delivery of the nozzle NZ can be performed reliably.　　[0046] Next, in step S8 shown in FIG. 4, the nozzle transfer mechanism 7B is retracted. For example, as shown in FIG. 6(B), the nozzle transfer mechanism 7B is driven by the swivel drive section 22 under the control of the control section 3 to move to the standby position P2B and wait. In addition, it is arbitrary whether to perform step S8.　　[0047] Next, in step S9 shown in FIG. 4, the substrate S is placed on the platform 4. For example, as shown in FIG. 7(A), the substrate S is positioned and placed on the platform 4. In addition, the placement of the substrate S may be performed by a user manually, or may be performed by a device such as a conveying device.　　[0048] Next, in step S10 shown in FIG. 4, the stage 4 is moved and the liquid L is applied on the substrate S. For example, as shown in FIG. 7(B), the platform 4 and the nozzle support 6 are moved relative to each other, and the liquid L is applied on the substrate S. For example, first, under the control of the control unit 3, the lift drive unit 15 drives the support unit 13 to move the nozzle NZ2 so that the distance between the lower end of the nozzle NZ2 and the substrate S will be a predetermined distance. Next, under the control of the control unit 3, the platform driving unit 5 moves the platform 4 in the -X direction, and at the same time, the liquid feeding unit 19 supplies a predetermined amount of liquid L to the nozzle NZ2. Thereby, the nozzle NZ2 discharges the liquid L from the discharge port OP, and coats the liquid L on the substrate S. After the application of the liquid L on the substrate S is completed, the substrate S is carried out. The unloading of the substrate S may be performed manually by the user, or may be performed by a conveying device or the like, for example. In addition, the placement system of the substrate S on the platform 4 by step S9 may be performed, for example, before the start of step S1 described above.　　[0049] Next, the nozzle holding portion 14 of the nozzle support portion 6 and the nozzle holding portion 23 of the nozzle transfer mechanism 7 will be described. FIGS. 8 to 10 are diagrams of the first to third examples of the nozzle support part 6 and the nozzle holding part of the nozzle transfer mechanism 7, respectively.　　[0050] The nozzle holding portion 14 of the nozzle support portion 6 and the nozzle holding portion 23 of the nozzle transfer mechanism 7 are each configured to be arbitrary as long as the nozzles NZ can be transferred to each other. The holding mechanism system of the nozzle NZ of the nozzle support part 6 can also use any structure of the 1st-3rd example shown in FIG. 8-10, for example.　　[0051] First, a first example of the nozzle holding portion 14A of the nozzle support portion 6 and the nozzle holding portion 23A of the nozzle transfer mechanism 7 shown in FIGS. 8(A) and (B) will be described. The nozzle holding portion 14A of the nozzle support portion 6 and the nozzle holding portion 23A of the nozzle transfer mechanism 7 of the first example respectively sandwich the nozzle NZ in the longitudinal direction of the nozzle NZ and hold the nozzle NZ. The nozzle holding portion 14A of the nozzle support portion 6 and the nozzle holding portion 23A of the nozzle transfer mechanism 7 are each provided with a holding portion 30. [0052] The gripping portion 30 of the nozzle support portion 6 is, for example, as shown in FIG. 8(A), it is formed so that the nozzle NZ can be sandwiched in the longitudinal direction (the direction parallel to the Y direction). A pair of holding members. A pair of gripping members are arranged to sandwich the nozzle NZ in the longitudinal direction of the nozzle NZ. The pair of gripping members each have a recess 30a. The recess 30a is formed so that the end of the nozzle NZ in the longitudinal direction can be inserted. A pair of holding members is supported by the supporting part 13. The pair of gripping members is movable in a direction parallel to the longitudinal direction of the nozzle NZ with respect to the support part 13 through a guide not shown in the figure, and is supported by the support part 13. When a pair of holding members hold the nozzle NZ, by moving in a direction in which the nozzle NZ approaches, the longitudinal end of the nozzle NZ is inserted into the recess 30a, and the nozzle NZ is supported by pressing the nozzle NZ. In addition, when the pair of holding members releases the nozzle NZ from the holding, by moving in a direction away from the nozzle NZ, the longitudinal end of the nozzle NZ is separated from the recess 30a, and the nozzle NZ is released.　　[0053] Next, in the gripping portion 30 of the nozzle transfer mechanism 7, a pair of gripping members are supported by the supporting portion 21. The gripping portion 30 of the nozzle transfer mechanism 7 is configured in the same manner as the gripping portion 30 of the nozzle support portion 6 except that the position where it is arranged is different. The grip portion 30 of the nozzle transfer mechanism 7 is clamped and held from the longitudinal direction of the nozzle NZ, and the held nozzle NZ is released by releasing the clamping portion 30 from the nozzle NZ. [0054] The gripping portion 30 of the nozzle support portion 6 and the gripping portion 30 of the nozzle transfer mechanism 7 are shown in FIG. 8(B), respectively, at positions P1A, P1B where the nozzle NZ is transferred (see FIG. 5(A)) , Figure 6(A)), are formed at different heights. For example, in the example shown in FIG. 8(B), at positions P1A and P1B, the grip portion 30 of the nozzle support 6 is formed below the grip portion 30 of the nozzle transfer mechanism 7. In addition, at the positions P1A and P1B, the grip portion 30 of the nozzle support portion 6 may be formed above the grip portion 30 of the nozzle transfer mechanism 7. [0055] In the first example, the grip portion 30 of the nozzle support portion 6 and the grip portion 30 of the nozzle transfer mechanism 7 are shown in FIG. 5(A), Fig. 6(A)), are formed at different heights. Therefore, in the gripping section 30 of the nozzle support section 6 and the gripping section 30 of the nozzle transfer mechanism 7, the respective nozzle holding operations and nozzle release operations can be performed independently without interference. With this, when one of the nozzle support 6 and the nozzle transfer mechanism 7 holds the nozzle NZ, the other can release the nozzle NZ.　　[0056] Next, a second example of the nozzle holding portion 14 of the nozzle support portion 6 and the nozzle holding portion 23 of the nozzle transfer mechanism 7 shown in FIG. 9 will be described. The nozzle holding portion 14B of the nozzle support portion 6 and the nozzle holding portion 23B of the nozzle transfer mechanism 7 of the second example are each provided with a holding portion 32, and the held portion 31 provided on the nozzle NZ is sandwiched by the holding portion 32 , Thereby holding the nozzle NZ.　　[0057] As shown in FIG. 9, a gripped portion 31 is provided in the nozzle NZ system. The gripped portions 31 are provided on the respective surfaces on both sides of the short side direction (direction parallel to the X direction) of the nozzle NZ. The grasped portion 31 is, for example, a flange member having a protruding portion 31a. The gripped portion 31 provided on the side (−X side) of the nozzle supporting portion 6 is sandwiched by the gripping portion 32 of the nozzle supporting portion 6. The grasped portion 31 provided on the far side (+X side) with respect to the nozzle support portion 6 is sandwiched by the grasping portion 32 of the nozzle transfer mechanism 7. [0058] The gripping portion 32 of the nozzle support portion 6 is, for example, as shown in FIG. 9, and is formed so that the protrusion 31a of the gripped portion 31 can be positioned in the longitudinal direction of the nozzle NZ (the direction parallel to the Y direction) A pair of gripping members clamped on top. The pair of gripping members is arranged by sandwiching the gripped portion 31 in the longitudinal direction of the nozzle NZ. The pair of holding members each have a recess 32a. The recessed portion 32a is formed so as to be insertable into the protruding portion 31a of the grasped portion 31. A pair of holding members is supported by the supporting part 13. The pair of gripping members is supported by the support 13 so as to be movable in a direction parallel to the longitudinal direction of the nozzle NZ with respect to the support 13 through a guide (not shown). A pair of gripping members are used to hold the nozzle NZ. By moving in a direction closer to the nozzle NZ, the protrusion 31a on the nozzle support 6 side of the nozzle NZ is inserted into the recess 32a. By pressing the protrusion 31a, Support the nozzle NZ. In addition, when the pair of gripping members release the nozzle NZ from the holding, by moving in a direction away from the nozzle NZ, the protrusion 31a runs away from the recess 32a, thereby releasing the nozzle NZ. [0059] The gripping portion 32 of the nozzle transfer mechanism 7 is constructed in the same manner as the gripping portion 32 of the nozzle support portion 6 except that a pair of gripping members are supported by the support portion 21, and the nozzle NZ The protruding portion 31a on the side away from the nozzle support portion 6 clamps the nozzle NZ from the longitudinal direction, and releases the held nozzle NZ by releasing the clamping portion 32 from the nozzle NZ. [0060] In this example, the gripped portion 31 is provided on each surface in the short-side direction of the nozzle NZ. Therefore, the gripping portion 32 of the nozzle support portion 6 and the gripping portion 32 of the nozzle transfer mechanism 7 are tied in position On P1 (refer to FIGS. 5(A) and 6(A)), on the opposite side to the short side direction of the nozzle NZ, the nozzle holding operation and the nozzle releasing operation can be independently performed without interference. With this, while one of the nozzle support portion 6 and the nozzle transfer mechanism 7 is holding the nozzle NZ, the other can release the nozzle NZ, so that the nozzle NZ can be transferred reliably.　　[0061] In addition, the grasped portion 31 and the grasping portion 32 may have any configuration as long as the grasped portion 31 can be grasped (held) by the grasping portion 32, respectively. In addition, the gripping portion 32 may be implemented by, for example, a driving portion (not shown).　　[0062] Next, a third example of the nozzle holding portion 14 of the nozzle support portion 6 and the nozzle holding portion 23 of the nozzle transfer mechanism 7 shown in FIG. 10 will be described. The nozzle holding portion 14C of the nozzle support portion 6 and the nozzle holding portion 23C of the nozzle transfer mechanism 7 of the third example are each equipped with an electromagnet portion 38, and the attracted portion 37 provided on the nozzle NZ is adsorbed by the electromagnet portion 38 , And keep the nozzle NZ.　　[0063] As shown in Fig. 10, the nozzle NZ system is provided with an adsorbed portion 37 respectively. The adsorbed portions 37 are provided on respective surfaces on both sides of the short side direction (direction parallel to the X direction) of the nozzle NZ. The adsorbed portion 37 is formed of a magnetic material such as iron that can be adsorbed by the electromagnet portion 38.　　[0064] The electromagnet portion 38 of the nozzle support portion 6 is, for example, a magnet in which a coil is wound around a core formed of a magnetic material, and a magnetic force is temporarily generated by energization. The electromagnet portion 38 of the nozzle support portion 6 is connected to a power source (not shown) and a switch 39, and switches between power-on and power-off. The electromagnet part 38 is supported by the support part 13. When the electromagnet portion 38 is energized by the switch 39, a magnetic force is generated to attract the attracted portion 37 and hold the nozzle NZ. The electromagnet part 38 is de-energized by the switch 39, the magnetic force disappears, the adsorption with the attracted part 37 is released, and the nozzle NZ is released. The switching of power-on and power-off caused by the switch 39 is controlled by, for example, the control unit 3. In addition, the switching between power-on and power-off caused by the switch 39 may also be configured manually by the user. [0065] The nozzle holding portion 23C of the nozzle transfer mechanism 7 is configured in the same manner as the nozzle holding portion 14C of the nozzle support portion 6 except that the electromagnet portion 38 is supported by the support portion 21. The installed adsorbed portion 37 holds the nozzle NZ by being adsorbed by the electromagnet portion 38, and releases the held nozzle NZ by releasing the adsorption of the adsorbed portion 37 by the electromagnet portion 38. [0066] In this example, the attracted portion 37 is provided on each surface in the short-side direction of the nozzle NZ, so the electromagnet portion 38 of the nozzle support portion 6 and the electromagnet portion 38 of the nozzle transfer mechanism 7 are located at the position On P1 (refer to FIGS. 5(A) and 6(A)), on the opposite side to the short side direction of the nozzle NZ, the nozzle holding operation and the nozzle releasing operation can be independently performed without interference. With this, while one of the nozzle support 6 and the nozzle transfer mechanism 7 is holding the nozzle NZ, the other can release the nozzle NZ.　　[0067] Next, the positioning unit 41 will be described. Fig. 11 (A) and (B) are illustrations of an example of the positioning portion, (A) is a diagram viewed from above, and (B) is a diagram viewed from the side.　　[0068] Hereinafter, the positioning portion 41 of the nozzle holding portion 14A of the nozzle supporting portion 6 shown in FIGS. 8(A) and (B) will be described as an example. The positioning portion 41 is, for example, as shown in FIGS. 11(A) and (B), and includes a supporting surface 42, two convex portions 43, and two concave portions 44. The supporting surface 42 is, for example, a rectangular flat plate shape. The support surface 42 is provided on, for example, the surface on the side (+X side) where the nozzle NZ is held among the two surfaces of the support portion 13. The +X side surface of the support surface 42 is formed in close contact with the −X side surface of the nozzle NZ when the nozzle NZ is held by the nozzle holding portion 14A.　　[0069] Two convex portions 43 are formed on the +X-side surface of the supporting surface 42 at the central portion in the height direction of the supporting surface 42 and arranged in a direction parallel to the Y direction. The two convex parts 43 are, for example, a conical shape (push-and-pull shape). Two recesses 44 are formed on the -X side surface of the nozzle NZ and are aligned in a direction parallel to the Y direction. They are formed so that when the nozzle NZ is held by the nozzle holding portion 14A, the two convex portions The 43 line will be mosaic.　　[0070] In addition, the number system of the convex portion 43 and the concave portion 44 may not be two, respectively. For example, the number system of the convex portion 43 and the concave portion 44 may be three or more. In addition, the shape of the convex part 43 is not limited to the conical shape (push-out shape), but is arbitrary. For example, the shape of the convex portion 43 may be cylindrical or rectangular columnar. [0071] When the positioning portion 41 is held by the nozzle holding portion 14A, the supporting surface 42 is in close contact with the -X side surface of the nozzle NZ, thereby restricting the nozzle NZ around the Y axis and around the Z axis. It moves, and the movement of the nozzle NZ around the X axis is restricted by the fitting of the two convex portions 43 and the two concave portions 44. Thereby, the positioning portion 41 can position the nozzle NZ at a predetermined position when the nozzle NZ is held by the nozzle holding portion 14A. In addition, the two convex portions are conical (push-pull-shaped), so when the nozzle transfer mechanism 7 transfers the nozzle NZ to the nozzle support 6, even if the position of the nozzle NZ is slightly shifted, the nozzle NZ can still be transferred. Be positioned. [0072] In addition, in the case where the nozzle holding portion 14B shown in FIG. 9 is provided with the positioning portion 41, for example, the support surface 42 and the two convex portions 43 are arranged above or below the grip portion 32, and the two concave portions The 44 system is arranged at a position where the two convex portions 43 will fit when the nozzle NZ is held by the nozzle holding portion 14B. [0073] Furthermore, in the case where the nozzle holding portion 14C shown in FIG. 10 is provided with the positioning portion 41, for example, the supporting surface 42 and the two convex portions 43 are arranged above or below the electromagnet portion 38, and the two concave portions The 44 system is arranged at a position where the two convex portions 43 will fit when the nozzle NZ is held by the nozzle holding portion 14C.　　[0074] In addition, the nozzle transfer mechanism 7 shown in FIGS. 8 to 10 may be provided with a positioning portion 41. For example, in the case where the nozzle holding portion 23A of the nozzle transfer mechanism 7 shown in FIG. 8 is provided with the positioning portion 41, the supporting surface 42 and the two convex portions 43 are arranged on the supporting portion 21 of the nozzle holding portion 23A. The concave portion 44 is arranged at a position where the two convex portions 43 will fit when the nozzle NZ is held by the nozzle holding portion 14A. Also, for example, when the nozzle holding portion 23B of the nozzle transfer mechanism 7 shown in FIG. 9 is provided with the positioning portion 41, for example, the supporting surface 42 and the two convex portions 43 are arranged on the holding portion of the nozzle holding portion 23B. Above or below 32, the two concave portions 44 are arranged at a position where the two convex portions 43 are fitted when the nozzle NZ is held by the nozzle holding portion 14A. Also, for example, in the case where the nozzle holding portion 23C of the nozzle transfer mechanism 7 shown in FIG. 10 is provided with the positioning portion 41, for example, the supporting surface 42 and the two convex portions 43 are arranged above or below the electromagnet portion 38 The two concave portions 44 are arranged at positions where the two convex portions 43 will fit when the nozzle NZ is held by the nozzle holding portion 14A. [0075] In this way, in the coating device 1 and coating method of the present embodiment, the nozzle NZ is handed over to the nozzle support part 6 to select one from a plurality of nozzles NZ. Therefore, the nozzle support part 6 can be placed in the plurality of nozzles NZ. The nozzles NZ are shared. Thereby, the cost of the device can be suppressed, and the structure of the device can be simplified and compact. In addition, since the nozzle support 6 is shared among a plurality of nozzles NZ, the replacement of nozzles can be suppressed. The time required for the adjustment of the nozzle support mechanism of the nozzle support 6 or the nozzle drive mechanism can be quickly The nozzle is replaced at the same time.　　[0076] As described above, the coating device 1 and coating method of the present embodiment can quickly replace the nozzle.　　[0077] [Second Embodiment] 　　 The second embodiment will be described. In this embodiment, the same components as those in the above-mentioned embodiment are designated by the same reference numerals, and the description thereof will be omitted or simplified.　　[0078] FIGS. 12(A) and (B) are diagrams of the coating device 1A described in the second embodiment, (A) is a diagram viewed from the X direction, and (B) is a diagram viewed from above. The coating device 1A of this embodiment includes a maintenance unit 46. The coating device 1A has the same configuration as the coating device 1 of the first embodiment except for the trolley 25A and the maintenance unit 46. In addition, in FIG. 12, the illustration is omitted or simplified except for the maintenance part 46 of the coating device 1A.　　[0079] The maintenance part 46 is a part that performs maintenance of the nozzle NZ. For example, the trolley 25A of the coating device 1A includes a maintenance unit 46. The trolley 25A has the same structure as the trolley 25 of the first embodiment except for the point that it is provided with the maintenance unit 46. In addition, two trolleys 25A are arranged in the vicinity of the nozzle transfer mechanisms 7A and 7B.　　[0080] The maintenance unit 46 is arranged on the upper part of the trolley 25A. The maintenance section 46 is formed, for example, to allow the nozzles NZ in the state held by the nozzle transfer mechanisms 7A, 7B at the positions of the standby positions P2A, P2B to be used. For example, in this embodiment, the nozzle NZ in the state held by the nozzle transfer mechanisms 7A and 7B can be used for the maintenance section 46 of the cart 25A by the movement of the cart 25A. [0081] The maintenance unit 46 is provided with, for example, a cleaning unit (not shown) for washing the tip of the nozzle NZ, and a preliminary discharge unit (not shown) necessary for preliminary discharge of the liquid L from the nozzle NZ. ). Wipe the tip of the nozzle NZ as a wiping part (not shown). In addition, the maintenance unit 46 only needs to include at least one of these.　　[0082] The cleaning part is equipped with, for example, a container that holds the cleaning liquid needed to clean the nozzle NZ. The preliminary discharge part is provided with a container required to receive the liquid L prepared to be discharged from the nozzle NZ. The wiping unit includes, for example, a wiping member that wipes the nozzle NZ by moving the tip of the nozzle NZ.　　[0083] As described above, the coating apparatus 1A of the present embodiment is provided with the maintenance unit 46, so that the nozzle NZ can be maintained during the coating operation. Thereby, the coating device 1A can suppress a decrease in productivity. In addition, since the coating apparatus 1A of this embodiment is equipped with the maintenance part 46 for the trolley 25A, the structure of the maintenance part 46 can be simplified. In addition, since the maintenance unit 46 and the liquid feeding unit 19 share the trolley 25A, the device size of the coating device 1A can be made compact.　　[0084] [Third Embodiment] 　　 The third embodiment will be described. In this embodiment, the same components as those in the above-mentioned embodiment are designated by the same reference numerals, and the description thereof will be omitted or simplified.　　[0085] Fig. 13 is a top view of the coating device 1B according to the third embodiment. The coating device 1B of this embodiment is equipped with, for example, a housing 2, a control unit 3 (not shown), a platform 4, a platform drive unit 5 (drive unit), 4 nozzles NZ (NZ1 to NZ4), and 2 nozzle supports Section 6 (6A, 6B), 4 nozzle transfer mechanisms 7 (7A-7D). In addition, the control unit 3, the platform 4, and the platform drive unit 5 (drive unit) are the same as those in the first embodiment, and therefore the description is omitted or simplified.　　[0086] The housing 2 of this embodiment includes a platform support portion 9B and a door frame 10. The platform support portion 9B of the present embodiment has the same configuration as the first embodiment except that it is formed longer in the X direction than the platform support portion 9 of the first embodiment. The platform 4 moves between the two ends of the platform support portion 9B in a direction parallel to the X direction. The gantry 10 has the same structure as the gantry 10 of the first embodiment.　　[0087] The two nozzle support parts 6A and 6B are respectively supported by the bridging part 10b of the mast 10, for example. For example, the nozzle support portion 6A is supported on the +X side of the bridge portion 10b of the gantry 10, and the nozzle support portion 6B is supported on the -X side of the bridge portion 10b of the gantry 10.　　[0088] The nozzle support part 6A has the same structure as the nozzle support part 6 of the first embodiment. One of the nozzles NZ1 and NZ2 is selected and supported, and the supported nozzle NZ can be raised and lowered. The nozzle support part 6B selects and supports one of a plurality of nozzles NZ3 and NZ4, and raises and lowers the supported nozzle NZ. The nozzle support portion 6B has the same configuration as the nozzle support portion 6 of the first embodiment, except that the position supported by the gantry 10 and the supported nozzle NZ are different. In addition, the operation systems of the nozzle support parts 6A and 6B are the same as those of the nozzle support part 6 of the first embodiment, respectively.　　[0089] The nozzle transfer mechanisms 7A to 7D are respectively installed in the vicinity of the platform support portion 9B. For example, the nozzle transfer mechanisms 7A and AC are formed on the -Y side of the stage support portion 9B and are aligned in a direction parallel to the X direction. For example, the nozzle transfer mechanisms 7B and 7D are formed on the +Y side of the stage support portion 9B and arranged in a direction parallel to the X direction. The nozzle transfer mechanisms 7A to AD have the same configuration as the nozzle transfer mechanism 7A of the first embodiment, except for the point that the positions where they are arranged are different. The nozzle transfer mechanisms 7A and 7B are respectively formed so that the nozzle NZ can be transferred between the nozzle support parts 6A. In addition, the nozzle transfer mechanism 7C and the AD system are respectively formed so as to be able to transfer the nozzle NZ to the nozzle support 6B. The operation systems of the nozzle transfer mechanisms 7A to 7D are the same as those of the nozzle transfer mechanism 7 of the first embodiment, respectively.　　[0090] The nozzles NZ1 to NZ4 are respectively the same slit nozzles as in the first embodiment. The nozzle NZ1 is connected to the liquid feeding part 19 of the nozzle transfer mechanism 7A, and is supported by either the nozzle support part 6 or the nozzle transfer mechanism 7A. In addition, the nozzle NZ2 is connected to the liquid feeding part 19 of the nozzle transfer mechanism 7B, and is supported by either the nozzle support part 6 and the nozzle transfer mechanism 7B. In addition, the nozzle NZ3 is connected to the liquid feeding part 19 of the nozzle transfer mechanism 7C, and is supported by either the nozzle support part 6 or the nozzle transfer mechanism 7C. In addition, the nozzle NZ4 is connected to the liquid feeding part 19 of the nozzle transfer mechanism 7D, and is supported by either the nozzle support part 6 or the nozzle transfer mechanism 7D.　　 [0091] Next, the operation of the coating device 1B will be described. The coating device 1B of the present embodiment is different from the first embodiment in that one of the four nozzles NZ1 to NZ4 is selected by the nozzle support 6A or the nozzle support 6B, and the substrate S is coated in that it is different from the first embodiment. The other operations are the same as those of the coating device 1 of the first embodiment.　　[0092] The coating device 1B of this embodiment is one selected from the nozzles NZ1 to NZ4, and is supported by the nozzle support portion 6A or the nozzle support portion 6B. For example, when any one of the nozzles NZ1 and NZ2 is selected, the nozzles NZ1 and NZ2 are passed to the nozzle support part 6A by the corresponding nozzle transfer mechanisms 7A and 7B, and are supported by the nozzle support part 6A. Moreover, when any one of the nozzles NZ3 and NZ4 is selected, the nozzles NZ3 and NZ4 are delivered to the nozzle support part 6B by the corresponding nozzle transfer mechanisms 7C and 7D, and are supported by the nozzle support part 6B.　　[0093] The nozzle NZ that has been supported by the nozzle support portion 6A or the nozzle support portion 6B is moved by the corresponding lift drive portion 15 so that the lower end of the nozzle NZ moves a predetermined distance relative to the substrate S. Next, under the control of the control unit 3, the platform drive unit 5 is driven. The platform 4 moves in a direction parallel to the +X direction or -X direction, and the nozzle NZ is driven by the corresponding liquid feeding unit 19 The liquid L is supplied, and the liquid L is discharged from the discharge port OP. In this way, the coating device 1B applies the liquid L to the substrate S.　　[0094] The nozzle NZ supported by the nozzle support portion 6A or the nozzle support portion 6B is delivered to any one of the corresponding nozzle transfer mechanisms 7A to 7D at the time of replacement. At this time, the nozzle support part 6A and the nozzle support part 6B are each in the state which does not support the nozzle NZ. Next, returning to the beginning, the coating device 1B selects one from a plurality of nozzles NZ1 to NZ4, and is supported by the nozzle support portion 6A or the nozzle support portion 6B, and performs the next coating.　　[0095] As described above, in the coating device 1B of the present embodiment, the four nozzles NZ are replaceable, so it is possible to increase the number of nozzles that can be used.　　[0096] [Fourth Embodiment] 　　 The fourth embodiment will be described. In this embodiment, the same components as those in the above-mentioned embodiment are designated by the same reference numerals, and the description thereof will be omitted or simplified. The following description focuses on the differences between this embodiment and the above-mentioned embodiment.　　[0097] Fig. 14 is a top view of an example of the coating device according to the fourth embodiment. The coating device 1C of this embodiment includes, for example, a frame body 2, a control unit 3, a platform 4, a platform drive unit 5 (drive unit), a nozzle NZ, a nozzle support unit 6C (pillar portion 10c of the gantry 10), and a nozzle transfer Mechanism 7 (7A, 7B), and trolley 25. The control unit 3, the platform 4, the platform drive unit 5, and the trolley 25 are the same as in the first embodiment.　　[0098] Frame 2, which supports all parts. The frame 2 includes, for example, a platform support 9 (refer to FIG. 2) and a door frame 10. The platform support unit 9 is the same as the first embodiment.　　[0099] Fig. 15(A) is a diagram of the nozzle of the fourth embodiment. In the nozzle NZ of the fourth embodiment, an adapter 55 is attached to the upper part. The nozzle NZ is the same as the first embodiment except that the adapter 55 is attached. The adapter 55 has a length in the longitudinal direction (a direction parallel to the Y direction), and is formed to be longer than the nozzle NZ. The lower surface (lower part) of the adapter 55 is provided with a positioning portion 56 that positions the adapter 55 on the pillar portion 10c of the gantry 10 described later. The positioning part 56 is provided with the recessed part 56a provided in the lower surface of the adapter 55, and the convex part 56b provided in the upper surface of the support|pillar part 10c (refer FIG. 15(B)). The recesses 56a are provided on the +Y side and -Y side of the lower part of the adapter 55. Each recess 56a opens downward. In each recessed portion 56a, when the nozzle NZ is installed on the gantry 10 (pillar portion 10c (nozzle support portion 6C)), the convex portion 56b of the pillar portion 10c is fitted, and as a result, the nozzle NZ is opposed to the pillar The part 10c is positioned.　　[0100] The upper surface of the adapter 55 is provided with a supported portion 57. The supported portion 57 is supported by the nozzle holding portion 23D (see FIG. 16(A)) of the nozzle transfer mechanism 7 described later. The supported portion 57 is composed of, for example, a pair of L-shaped members (L-shaped members). The supported portion 57 is, for example, a pair of L-shaped members arranged along a direction parallel to the Y direction (a direction parallel to the longitudinal direction of the nozzle NZ). The L-shaped member on the +Y side has a protruding portion 57a that protrudes toward the -Y side, and the L-shaped member on the -Y side has a protruding portion 57a that protrudes toward the +Y side. A recessed portion 60a of the positioning portion 60 for positioning the nozzle holding portion 23D is provided on the lower surface (lower portion) of the protruding portion 57a of each L-shaped member. The recessed portion 60a has a conical shape (push-pull shape), for example. Each positioning portion 60 includes a concave portion 60a and a convex portion 60b provided on the upper surface of the protruding portion 65 of the nozzle holding portion 23D described later (see FIG. 16(B)). Each recess 60a opens downward. When the nozzle NZ is held by the nozzle transfer mechanism 7, the convex portion 60b of the support part Q of the nozzle transfer mechanism 7 is fitted into each recess 60a. As a result, the nozzle NZ is opposed to the support part 21 of the nozzle transfer mechanism 7. And be positioned.　　[0101] Fig. 15(B) is a diagram of the nozzle and the gantry of the fourth embodiment. The door frame 10 of this embodiment is equipped with a pair of pillar parts 10c. The pair of pillar parts 10c sandwiches the platform 4 in the Y direction to provide two pillars. Each pillar part 10c is supported by the platform support part 9 respectively. Each pillar portion 10c extends in the vertical direction, and moves in the vertical direction by the driving of the up-and-down driving portion 15 described later. Each pillar portion 10c is a nozzle support portion 6C that supports the nozzle NZ with its upper surface (the +Z side surface) through the adapter 55. Each pillar portion 10c (nozzle support portion 6C) selects and supports one of a plurality of nozzles NZ (NZ1, NZ2), and is configured to be able to transfer the nozzle NZ to the nozzle transfer mechanism 7 described later. In addition, the pillar portion 10c may not be supported by the platform support portion 9. For example, the pillar portion 10c may be supported by the ground, or may be supported by the pillar portion 10a of the gantry 10 of the first embodiment.　　[0102] Each pillar portion 10c is provided with a convex portion 56b of the positioning portion 56 for positioning the adapter 55. Each convex part 56b is a cone shape (push-and-pull shape), for example. Each convex part 56b is fitted into the concave part 56a of the adapter 55 when the nozzle NZ is supported by the gantry 10 (pillar part 10c), and the nozzle NZ is positioned. In addition, the number system of the concave portion 56a and the convex portion 56b may not be two, respectively. For example, the number system of the concave portion 56a and the convex portion 56b may be three or more. In addition, the shape of the recessed part 56a and the convex part 56b is not limited to a conical shape (push-out shape), respectively, but is arbitrary. For example, the shape of the concave portion 56a and the convex portion 56b may be cylindrical or rectangular columnar.　　[0103] The coating apparatus 1C of the present embodiment includes a nipper mechanism 62 (see FIG. 15(B)). The clamp mechanism 62 fixes the adaptor 55 and the pillar portion 10c. The clamp mechanism 62 is provided on the +Y side and the -Y side. Each clamp mechanism 62 is attached to the pillar part 10c, for example. Each clamp mechanism 62 is fixed by pushing the adapter 55 to the upper surface of the support|pillar part 10c, for example. Each clamp mechanism 62 is controlled by the control part 3 (refer to FIG. 14), and it is driven by the drive part which is not shown in figure, and the adapter 55 and the support|pillar part 10c are fixed. Moreover, each clamp mechanism 62 is controlled by the control part 3, and is driven by the drive part which is not shown in figure, and the fixation of the adapter 55 and the support|pillar part 10c is released. In addition, the clamp mechanism 62 is provided on the +Y side and the -Y side in the example of FIG. 15(B), but it may be provided on at least one of the +Y side and the -Y side. In addition, whether the coating apparatus 1C is provided with the clamp mechanism 62 is arbitrary.　　[0104] In addition, each pillar portion 10c is driven in the vertical direction by the up-and-down driving portion 15. The up-and-down drive part 15 drives each support|pillar part 10c to a vertical direction, so that the supported nozzle NZ is raised and lowered. The lift drive unit 15 is, for example, an electric motor or the like. The up-and-down drive unit 15 is controlled by the control unit 3 (see FIG. 14) and is used to adjust the distance between the nozzle NZ and the substrate S during coating (during fine adjustment), and the door frame 10 (pillar portion 10c) and the nozzle NZ When handing over the nozzle NZ of the nozzle handover mechanism 7 (7A, 7B), etc., the nozzle NZ is raised and lowered.　　[0105] Next, returning to the description of FIG. 14, the nozzle transfer mechanism 7 of the fourth embodiment will be described. The nozzle transfer mechanism 7 is provided with a plurality of nozzle transfer mechanisms 7A and 7B. The nozzle transfer mechanisms 7A and 7B are respectively arranged near the platform 4. The nozzle transfer mechanism 7A is arranged on the -Y side of the platform 4 and supports the nozzle NZ1. The nozzle transfer mechanism 7B is arranged on the +Y side of the platform 4 and supports the nozzle NZ2. The nozzle transfer mechanisms 7A and 7B are provided with a swirling portion 18 and a liquid feeding portion 19, respectively. Each liquid feeding portion 19 is the same as in the first embodiment, and is connected to the corresponding nozzle NZ to feed the liquid L (refer to FIG. 7(B)).　　[0106] Fig. 16(A) is a diagram of the nozzle transfer mechanism of the fourth embodiment. Fig. 16(A) is a view of the nozzle transfer mechanism 7B of the fourth embodiment viewed from the -Y direction. In addition, in this embodiment, the nozzle transfer mechanisms 7A and 7B have the same structure. In the following description, the nozzle transfer mechanism 7B is taken as an example.　　[0107] The swirling part 18 holds the nozzle NZ so as to be able to rotate with the vertical direction (vertical direction) as the axis. The swirling portion 18 includes, for example, a shaft portion 20, a supporting portion 21, a swirling driving portion 22, and a nozzle holding portion 23D. The shaft portion 20, the support portion 21, and the orbiting drive portion 22 are the same as those in the first embodiment. The swing drive unit 22 is controlled by the control unit 3 (see FIG. 14) to swing the support unit 21 rotatably supported by the shaft unit 20. The support part 21 is driven by the turning drive part 22, and like the first embodiment, it turns in the horizontal direction. In addition, the transfer mechanism 7 may not be provided with the turning drive part 22, and the user may use human power to turn the support part 21 into a structure.　　[0108] The nozzle holder 23D holds the nozzle NZ. The nozzle holding portion 23D is composed of, for example, a pair of L-shaped members (L-shaped members). The pair of L-shaped members are aligned and arranged in a direction parallel to the X direction (a direction parallel to the longitudinal direction of the support portion 21). The L-shaped member on the +X side has a protruding portion 65 protruding to the +X side, and the L-shaped member on the -X side has a protruding portion 65 protruding to the -X side. Each protrusion 65 is located inside (center side) of the supported portion 57 of the nozzle NZ (adapter 55). Each protrusion 65 is attached to its upper surface to support the lower surface of the protrusion 57a of the supported portion 57 of the nozzle NZ. The nozzle holding portion 23D supports the nozzle NZ by supporting the supported portion 57 of the nozzle NZ.　　[0109] FIG. 16(B) is an enlarged view of the nozzle holding portion 23D of this embodiment. The nozzle holding portion 23D is attached to the upper surface (upper portion) of each protruding portion 65, and is provided with the convex portion 60b of the positioning portion 60 for positioning the nozzle NZ. When the nozzle NZ is supported by the nozzle holding portion 23D, each convex portion 60b is fitted into each concave portion 60a of the supported portion 57 of the adapter 55, and the nozzle NZ is positioned. In addition, the number system of the concave portion 60a and the convex portion 60b may not be two, respectively. For example, the number system of the concave portion 60a and the convex portion 60b may be three or more. In addition, the shape of the recessed part 60a and the convex part 60b is not limited to the conical shape (push-out shape), respectively, but is arbitrary. For example, the shape of the concave portion 60a and the convex portion 60b may be cylindrical or rectangular columnar. The transfer of the nozzle NZ will be described later. In addition, the mechanism for holding and releasing the nozzle NZ of the nozzle holding portion 23D will be described later. [0110] The nozzle transfer mechanisms 7A and 7B of this embodiment configured as described above move between the transfer positions P1A and P1B (see FIG. 14) and the standby positions P2A and P2B, respectively, and at the transfer positions P1A and P1B, The nozzle NZ is transferred to and from the pillar portion 10c of the mast 10, and waits at the standby positions P2A and P2B.　　[0111] The transfer positions P1A and P1B are respectively set so that the nozzle NZ can be transferred between the pillar portion 10c of the mast 10 and the nozzle transfer mechanisms 7A, 7B. For example, the nozzle transfer mechanisms 7A and 7B are respectively formed such that at the transfer positions P1A and P1B, the longitudinal direction of the support 21 will be the direction orthogonal to the moving direction of the stage 4 (the direction parallel to the Y direction) (Refer to Figure 14).　　[0112] The standby positions P2A and P2B are respectively set at positions where the nozzle NZ will run away from the top of the platform 4 when the nozzle transfer mechanism 7A, 7B holds the nozzle NZ. The nozzle transfer mechanisms 7A and 7B are respectively formed so that the longitudinal direction of the support part 21 becomes a direction parallel to the X direction at the standby positions P2A and P2B (refer to FIG. 14). For example, the nozzle transfer mechanisms 7A and 7B perform maintenance of the nozzle NZ in the standby positions P2A and P2B, respectively.　　[0113] Next, the operation of the coating device 1C will be described. FIGS. 17-19 are diagrams respectively showing the operation of the coating device 1C. When describing the operation of the coating device 1C, FIGS. 14 to 16 are appropriately referred to. [0114] The coating apparatus 1C of the present embodiment, as shown in FIG. 14, selects one of the two nozzles NZ1 and NZ2 by the pillar portion 10c (nozzle support portion 6C) of the gantry 10, and the substrate S Carry out coating. For example, when any one of the nozzles NZ1 and NZ2 is selected, the nozzles NZ1 and NZ2 are supported by the respective pillar portions 10c by the corresponding nozzle transfer mechanisms 7A and 7B. In addition, FIG. 14 illustrates an example in which the nozzle NZ1 is supported by the pillar portion 10c.　　[0115] For example, as shown in FIG. 17(A), the nozzle NZ is supported by the adaptor 55 of the nozzle NZ from below on the upper surface of each of the pillar portions 10c to support the nozzle NZ. Each pillar portion 10c supports the nozzle NZ from below, so that the nozzle NZ can be reliably held without falling. In addition, the nozzle NZ is supported by the positioning portion 56 in a state where each pillar portion 10c has been positioned. The nozzle NZ is attached to the concave portion 56a on the lower surface (lower portion) of the adapter 55, and is inserted into the convex portion 56b of each pillar portion 10c to be positioned. The clamp mechanism 62 fixes the adaptor 55 and each support 10c in a state where the nozzle NZ is positioned and supported by each support 10c. The clamp mechanisms 62 on the +Y side and -Y side are, for example, fixed by pushing the lower surface of the adapter 55 to the upper surface of each pillar portion 10c. The adaptor 55 and each pillar portion 10c are securely fixed by the clamp mechanism 62. Each clamp mechanism 62 is controlled by the control part 3 (refer to FIG. 14), and it is driven by the drive part which is not shown in figure, and the adapter 55 and each support|pillar part 10c are fixed. The coating device 1C drives the up-and-down drive unit 15 (see FIG. 14) under the control of the control unit 3, fine-tunes the distance between the substrate S and the nozzle NZ, and coats the substrate S. The operation of coating the substrate S by the coating device 1C is the same as that of the first embodiment.　　[0116] Next, the operation of replacing the nozzle NZ supported by each pillar portion 10c due to the coating device 1C will be described. In addition, in the following description, an example in which nozzles are replaced using the nozzle transfer mechanism 7B is described, but the same applies to the nozzle transfer mechanism 7A. [0117] When the coating device 1C replaces the nozzles NZ supported by each pillar portion 10c, first, as shown in FIG. 17(B), the control unit 3 (refer to FIG. 14) drives the up-and-down drive unit 15. The pillar portion 10c is moved vertically upward. The control unit 3 moves each pillar portion 10c to a predetermined position vertically above. The predetermined position is a position where the nozzle NZ can be transferred between each of the pillar portions 10c and the nozzle transfer mechanism 7 (7A, 7B). For example, the predetermined position is set so that the nozzle holding portion 23D of the nozzle transfer mechanism 7 can be arranged below the supported portion 57 of the adapter 55.　　[0118] Next, as shown in FIG. 18(A), the control unit 3 drives the swirling drive unit 22 to rotate the swirling unit 18 of the nozzle transfer mechanism 7. The control unit 3 moves the turning unit 18 to the handover position P1B. In this transfer position P1B, the turning part 18 is arrange|positioned at the predetermined position of the vertical upper direction of each support|pillar part 10c. For example, in the delivery position P1B, the nozzle holding portion 23D of the nozzle delivery mechanism 7 is set at a position below (just below) the supported portion 57 of the adapter 55.　　[0119] Next, as shown in FIG. 18(B), the control unit 3 drives the up-and-down drive unit 15 to move each pillar portion 10c vertically downward. In addition, the control part 3 is earlier than the vertical movement of the pillar parts 10c, and drives the clamping mechanism 62 first to release the fixing of the pillar part 10c and the adapter 55 caused by the clamping mechanism 62. The transfer of the nozzle NZ between the column part 10c and the nozzle transfer mechanism 7B is performed by the movement of the vertical downward direction of each column part 10c. By the vertical downward movement of each pillar portion 10c, the convex portion 60b of the nozzle holding portion 23D fits into the concave portion 60a of the supported portion 57 of the adapter 55, and the nozzle NZ is positioned.　　[0120] Next, as shown in FIG. 19(A), the control unit 3 drives the up-and-down drive unit 15 to further move each pillar portion 10c vertically downward. Thereby, the nozzle NZ is placed in the nozzle holding part 23D of the nozzle transfer mechanism 7B, and is transferred from each pillar part 10c to the nozzle transfer mechanism 7.　　[0121] Next, as shown in FIG. 19(B), the control unit 3 drives the orbiting drive unit 22 to move the nozzle transfer mechanism 7A to the standby position P2A. In the standby positions P2A and P2B, the nozzle NZ system is being maintained.　　[0122] Next, transfer from the nozzle transfer mechanism 7B to the nozzle NZ1 of the pillar portion 10c to replace the nozzle NZ. The transfer operation from the nozzle transfer mechanism 7B to each pillar portion 10c is performed in the reverse order of the above-mentioned transfer operation from each pillar portion 10c to the nozzle of the nozzle transfer mechanism 7A.　　[0123] As described above, the coating device 1C of the present embodiment can quickly and reliably perform nozzle replacement.　　[0124] In addition, the technical scope of the present invention is not limited to the aspects described in the above-mentioned embodiments and the like. One or more of the requirements described in the above-mentioned embodiments and the like may be omitted in some cases. In addition, the requirements described in the above-mentioned embodiments and the like can be combined as appropriate. In addition, within the scope permitted by laws and regulations, the disclosures of all the documents cited in the above-mentioned embodiments and the like are used as part of the description of this text. [0125] For example, in the above-mentioned embodiment, although it is described that the coating devices 1, 1A, 1B, and 1C are examples of a configuration in which the platform 4 moves with respect to the nozzle support portion 6, but the coating devices 1, 1A The composition of, 1B, 1C is not limited to this. For example, the coating devices 1, 1A, 1B, and 1C may be configured to move with respect to the platform 4 by the nozzle support part 6.　　[0126] For example, the nozzle transfer mechanism 7 is not limited to the above-mentioned configuration, and any configuration can be adopted. FIG. 20 is a diagram showing another example of the nozzle transfer mechanism 7. For example, as shown in FIG. 20, the nozzle transfer mechanism 7 may be formed such that it can be moved in the vertical and horizontal directions by the drive of the drive unit 50, and the nozzle NZ can be transferred to and from the nozzle support 6 constitute.

[0127]1、1A、1B、1C‧‧‧塗布裝置4‧‧‧平台5‧‧‧平台驅動部(驅動部)6、6A、6B、6C‧‧‧噴嘴支持部7、7A～7D‧‧‧噴嘴交接機構L‧‧‧液狀體S‧‧‧基板15‧‧‧升降驅動部18‧‧‧迴旋部19‧‧‧送液部20‧‧‧軸部22‧‧‧迴旋驅動部25、25A‧‧‧台車46‧‧‧維護部NZ、NZ1～NZ4‧‧‧噴嘴P1、P1A、P1B‧‧‧交接位置P2、P2A、P2B‧‧‧待機位置[0127] 1, 1A, 1B, 1C‧‧‧Coating device 4‧‧‧Platform 5‧‧‧Platform drive unit (drive unit) 6, 6A, 6B, 6C‧‧‧Nozzle support unit 7, 7A～7D‧ ‧‧Nozzle transfer mechanism L‧‧‧Liquid body S‧‧‧Substrate 15‧‧‧Elevating drive part 18‧‧‧Swivel part 19‧‧‧Liquid delivery part 20‧‧‧Shaft part 22‧‧‧Swivel drive part 25, 25A‧‧‧Trolley 46‧‧‧Maintenance section NZ, NZ1～NZ4‧‧‧Nozzle P1, P1A, P1B‧‧‧Handover position P2, P2A, P2B‧‧‧Standby position

[0009] 　　[圖1] 第1實施形態所述之塗布裝置之一例的上面圖。 　　[圖2] 沿著圖1的A-A線之剖面的剖面圖。 　　[圖3] 沿著圖1的B-B線之剖面的剖面圖。 　　[圖4] 實施形態所述之塗布方法之一例的流程圖。 　　[圖5] (A)及(B)係塗布裝置之動作之一例的圖示。 　　[圖6] 接續圖5，(A)及(B)係塗布裝置之動作之一例的圖示。 　　[圖7] 接續圖6，(A)及(B)係塗布裝置之動作之一例的圖示。 　　[圖8] (A)及(B)係噴嘴支持部及噴嘴交接機構的噴嘴保持部的第1例的圖示。 　　[圖9] 噴嘴支持部及噴嘴交接機構的噴嘴保持部的第2例的圖示。 　　[圖10] 噴嘴支持部及噴嘴交接機構的噴嘴保持部的第3例的圖示。 　　[圖11] (A)及(B)係定位部之一例的圖示。 　　[圖12] 第2實施形態所述之塗布裝置之一例的圖示。 　　[圖13] 第3實施形態所述之塗布裝置之一例的圖示。 　　[圖14] 第4實施形態所述之塗布裝置之一例的上面圖。 　　[圖15] (A)係第4實施形態的噴嘴的圖示。(B)係第4實施形態的噴嘴及門架的圖示。 　　[圖16] (A)係第4實施形態的噴嘴交接機構的圖示。(B)係噴嘴保持部的放大圖。 　　[圖17] (A)及(B)係塗布裝置之動作之一例的圖示。 　　[圖18] 接續圖17，(A)及(B)係塗布裝置之動作之一例的圖示。 　　[圖19] 接續圖18，(A)及(B)係塗布裝置之動作之一例的圖示。 　　[圖20] 噴嘴交接機構的其他例的圖示。[0009] 　　 [FIG. 1] A top view of an example of the coating device described in the first embodiment.　　[Fig. 2] A cross-sectional view taken along the line A-A in Fig. 1.　　[Fig. 3] A cross-sectional view along the line B-B in Fig. 1.　　 [Figure 4] A flowchart of an example of the coating method described in the embodiment.　　[Figure 5] (A) and (B) are diagrams of an example of the operation of the coating device.　　[Figure 6] Continuing from Figure 5, (A) and (B) are illustrations of an example of the operation of the coating device.　　[Fig. 7] Continuing from Fig. 6, (A) and (B) are illustrations of an example of the operation of the coating device.　　 [FIG. 8] (A) and (B) are illustrations of the first example of the nozzle support part and the nozzle holding part of the nozzle transfer mechanism.　　 [Fig. 9] Illustration of the second example of the nozzle support part and the nozzle holding part of the nozzle transfer mechanism.　　 [Fig. 10] A diagram of the third example of the nozzle support part and the nozzle holding part of the nozzle transfer mechanism.　　[Figure 11] (A) and (B) are illustrations of an example of the positioning part.　　 [Fig. 12] An illustration of an example of the coating device described in the second embodiment.　　 [Fig. 13] An illustration of an example of the coating device described in the third embodiment.　　[Figure 14] The top view of an example of the coating device described in the fourth embodiment.　　 [FIG. 15] (A) is a diagram of the nozzle of the fourth embodiment. (B) is an illustration of the nozzle and the gantry of the fourth embodiment.　　 [Fig. 16] (A) is a diagram of the nozzle transfer mechanism of the fourth embodiment. (B) is an enlarged view of the nozzle holder.　　[Figure 17] (A) and (B) are diagrams showing an example of the operation of the coating device.　　[Figure 18] Continuing from Figure 17, (A) and (B) are illustrations of an example of the operation of the coating device.　　[Figure 19] Continuing from Figure 18, (A) and (B) are illustrations of an example of the operation of the coating device.　　[Figure 20] An illustration of another example of the nozzle transfer mechanism.

1‧‧‧塗布裝置 1‧‧‧Coating device

2‧‧‧框體 2‧‧‧Frame

3‧‧‧控制部 3‧‧‧Control Department

4‧‧‧平台 4‧‧‧Platform

5‧‧‧平台驅動部 5‧‧‧Platform Drive

6‧‧‧噴嘴支持部 6‧‧‧Nozzle Support

7‧‧‧噴嘴交接機構 7‧‧‧Nozzle transfer mechanism

10‧‧‧門架 10‧‧‧Mast

12‧‧‧導引部 12‧‧‧Guiding Department

13‧‧‧支持部 13‧‧‧Support Department

14‧‧‧噴嘴保持部 14‧‧‧Nozzle holding part

15‧‧‧升降驅動部 15‧‧‧Lift drive unit

18‧‧‧迴旋部 18‧‧‧Swivel Club

19‧‧‧送液部 19‧‧‧Liquid delivery department

20‧‧‧軸部 20‧‧‧Shaft

21‧‧‧支持部 21‧‧‧Support Department

22‧‧‧迴旋驅動部 22‧‧‧Swivel Drive

23‧‧‧噴嘴保持部 23‧‧‧Nozzle holding part

25‧‧‧台車 25‧‧‧Trolley

10a‧‧‧支柱部 10a‧‧‧Pillars

10b‧‧‧架橋部 10b‧‧‧Bridge Building Department

7A‧‧‧噴嘴交接機構 7A‧‧‧Nozzle transfer mechanism

7B‧‧‧噴嘴交接機構 7B‧‧‧Nozzle transfer mechanism

NZ、NZ1、NZ2‧‧‧噴嘴 NZ、NZ1、NZ2‧‧‧Nozzle

S‧‧‧基板 S‧‧‧Substrate

OP‧‧‧吐出口 OP‧‧‧Exit

Claims (12)

一種塗布裝置，係具備：平台，係載置基板；和噴嘴支持部，係從可吐出液狀體的複數個噴嘴中選擇出1個並加以支持，且具備使所支持的前記噴嘴做升降的升降驅動部；和驅動部，係使前記噴嘴支持部與前記平台做相對性移動；及複數個噴嘴交接機構，係對前記噴嘴支持部進行前記噴嘴之交接。 A coating device is provided with: a platform for placing a substrate; and a nozzle support part, which selects and supports one of a plurality of nozzles that can discharge liquid, and has a device for raising and lowering the supported nozzle Lifting and driving part; and driving part, which make the front nozzle support part and the front head platform move relative to each other; and multiple nozzle transfer mechanisms are used to transfer the front head nozzle to the front nozzle support part. 如請求項1所記載之塗布裝置，其中，前記噴嘴係為狹縫噴嘴。 The coating device according to claim 1, wherein the aforementioned nozzle is a slit nozzle. 如請求項1或請求項2所記載之塗布裝置，其中，前記噴嘴交接機構，係可在對前記噴嘴支持部進行前記噴嘴之交接的交接位置、與前記噴嘴從前記平台之上方離開的待機位置之間移動。 The coating device described in claim 1 or claim 2, wherein the front nozzle transfer mechanism can be at the transfer position where the front nozzle transfers to the front nozzle support part, and the standby position where the front nozzle is separated from the upper side of the front platform Move between. 如請求項3所記載之塗布裝置，其中，前記噴嘴交接機構係具備：迴旋部，係以上下方向為軸而將前記噴嘴保持成可迴旋。 The coating device according to claim 3, wherein the aforementioned nozzle transfer mechanism is provided with a swirling portion that holds the aforementioned nozzle so as to be rotatable with the vertical direction as an axis. 如請求項1或請求項2所記載之塗布裝置，其中，前記噴嘴交接機構係具備：送液部，係對前記噴嘴供給液狀體。 The coating device described in claim 1 or claim 2, wherein the aforementioned nozzle transfer mechanism is provided with a liquid feeding part that supplies liquid to the aforementioned nozzle. 如請求項5所記載之塗布裝置，其中，前記送液部係被形成在：被配置在前記平台之側方而可移動的台車。 The coating device according to claim 5, wherein the pre-description liquid supply unit is formed on a movable carriage that is arranged on the side of the pre-description platform. 如請求項6所記載之塗布裝置，其中，前記台車係具備：可維護前記噴嘴的維護部。 The coating device described in claim 6, wherein the front-end trolley system is equipped with a maintenance section that can maintain the front-end nozzle. 如請求項1或請求項2所記載之塗布裝置，其中，前記驅動部，係使前記平台相對於前記噴嘴支持部而移動。 The coating device described in claim 1 or claim 2, wherein the preamble drive section moves the preamble platform relative to the preamble nozzle support section. 一種塗布方法，係為對基板塗布液狀體的方法，其係含有：將前記基板載置於平台之步驟；和從可吐出液狀體的複數個噴嘴中選擇出1個，而支持在具備使前記噴嘴做升降之升降驅動部的噴嘴支持部之步驟；和一面使前記噴嘴支持部與前記平台做相對性移動，一面在前記基板以前記噴嘴塗布液狀體之步驟；及藉由將複數個前記噴嘴分別予以保持的複數個交接機構，對前記噴嘴支持部進行前記噴嘴之交接，以從複數個前記噴嘴中選擇出1個之步驟。 A coating method is a method of applying a liquid to a substrate, which includes: the step of placing the substrate on the platform; and selecting one nozzle from a plurality of nozzles that can discharge the liquid, and the support is provided with The step of making the nozzle support part of the lifting driving part of the up-and-down nozzle; and the step of making the nozzle support part of the preceding note move relative to the platform of the preceding note, and the step of applying the liquid to the nozzle before the substrate of the preceding note; and by adding the plural number A plurality of transfer mechanisms that hold each of the forehead nozzles respectively transfer the forehead nozzles to the forehead nozzle support part to select one from the plurality of inscribed nozzles. 如請求項9所記載之塗布方法，其中，含有：未被前記噴嘴支持部所選擇之前記噴嘴，係藉由前記交接機構而從前記平台之上方做退避之步驟。 The coating method described in claim 9, which includes the step of retreating from the upper side of the front-end platform by the front-end nozzle not selected by the front-end nozzle support part by the front-end transfer mechanism. 如請求項9或請求項10所記載之塗布方法，其中，含有：前記噴嘴係被從前記交接機構所具備之送液部供給液狀體之步驟。 The coating method described in claim 9 or claim 10, which includes: the aforementioned nozzle is a step of supplying the liquid from the liquid feeding part provided in the aforementioned delivery mechanism. 如請求項9或請求項10所記載之塗布方法，其中，含有：藉由使前記平台相對於前記噴嘴支持部而移動，以對前記基板塗布液狀體之步驟。 The coating method as described in claim 9 or claim 10, which includes a step of applying a liquid to the preamble substrate by moving the preamble platform relative to the preamble nozzle support part.
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