201143913 六、發明說明： 【發明所屬之技術領域】 【先前技術】 非旋咖，經常使用 於破域其μ w 縫錄之噴吐口之長條型狹縫喷嘴相對 塗佈液，例如板移動，在基板上塗佈處理液或化學液等 之基佈法中，自狹縫噴嘴對在平台上經固定載置 向!交之:水平°方21 ’並同時令狹缝喷嘴沿與喷嘴的長邊方 縫2 fi移動。如此，在基板上滿溢之光阻液即自狹 縫噴嘴之喷吐口朝噴嘴後方平扫伸， 佈膜(例如專利文獻。十乂伸於基板一整面形成先阻塗 板於非旋轉塗佈法，更多半使用在平台上使基 送方式。水平方向(平台長邊方向)運送之浮動運 過立正 ^ ’㉝置於浮動平台上方之長條型狹縫喷嘴朝通 板^端呈帶狀嘴吐光阻液’藉此沿基板運送方向自基 5叫。卩朝後端部形成光阻塗佈膜於基板上-整面(例如專利文獻 【先前技術文獻】 【專利文獻】 ^利文獻1】日本特開平1(Μ56255號公報 【專利文獻2】日本綱期5·2·92號公報 【發明内容】 <發明所欲解決之課題> 201143913 用於如上述非旋轉法之塗佈處理之狹縫喷嘴中，喷吐光阻液 之狹縫間隙非常狹窄(通常在ΙΟΟμιη以下），故於光阻供給管或是 狹縫噴嘴内光阻凝膠化而形成之固化物易於在狹缝内阻塞，於狹 縫内某處光阻固化物一旦阻塞即會於該處缺乏光阻液流出（亦即對 供給\’在光阻塗佈膜上沿塗佈掃描方向產生筆直延伸之條 、—以往，為預防於狹缝喷嘴的狹縫内光阻固化物阻塞，以人工 進行去除附著於狹缝喷嘴的狹缝内壁之光阻固化物之清掃作業。 ^詳細而言，自狹缝喷嘴狹縫外(喷嘴喷吐口侧)朝内***金屬或樹 脂所構成之薄板材，在狹縫内使薄板材沿噴嘴的長邊方向滑動以 刮出固化物。然而，此種狹縫噴嘴之狹縫間隙如上述通常極細窄 而在ΙΟΟμιη以下，朝其中***薄板材而清掃係非常麻煩而繁雜之 作業亦係降低光阻塗佈裝置維修性或作動率之要因。且清掃作 ，效率低並需長時間，故於作業中朝周圍四散之微粒多亦係一問 題。 ^為解決如上述習知技術之問題點，本發明提供一狹縫喷嘴清 掃裳置及非旋轉方式之塗佈裝置，可抑制在祕魏轉法塗佈處 理之狹縫噴嘴的狹縫内微粒之產生，並同時自動且高效率地清 掃，藉由對狹縫喷嘴改善其維修功能實現塗佈膜品質、 作 動率之提升。 <解決課題之手段> 為達成上述目的，本發明第1觀點中之狹縫喷嘴清掃裝置用 以清掃塗佈處理中所使狀長條型狹縫喷嘴驗縫内，其g徵在 於包含： 薄板狀刮出構件，可自該狹缝喷嘴狹縫外朝内插拔丨及 清掃機構’固持該刮出構件，將該刮出構件***該狹 的狹縫内’令_出構件沿既定方向雜，俾_狹縫内 '固 化物’自該狹縫撤出該刮出構件。 上述構成之狹縫喷嘴清掃裝置中，所有狹缝喷嘴的狹縫内關 於清掃或清洗之主要作業，亦即相對於狹縫喷嘴刮出構件之插拔 201143913 作業及到出作業皆自動化•模式化，藉此可 制微粒產生，大幅縮短所需時間。、見作業义輪升，抑 本發明第2觀點中之狹縫嘴嘴清掃裝置厂主 所使^之絲酸射嘴敝勒，其概在於佈處理中 薄板狀刮出構件，可自該狹縫噴嘴狹縫外 ^ 清掃機構，固持該刮出構件，使該刮出構方 俾於該狹縫_出物。 研〜既疋方向移動， 上述構成之狹缝喷嘴清掃裝置中，係、 ^或清洗之主要作業之-之狹縫喷嘴内自内^於 g式化’藉此可實現作業效率提升，抑繼粒產生^短所動需^ 本發明之塗佈裝置包含： 嘴，於塗佈處理中對被處理基板呈帶狀喷吐塗佈液. 給部’於塗佈處理帽該狹縫嘴嘴供給塗佈液. 基板支持部，支持該基板； 掃描機構’在該狹縫喷嘴與該基板之間沿— 動，俾該狹縫喷嘴於塗佈處理中在該基板上進行塗佈 ' .及夕 ，明之狹缝喷嘴清掃裝置，用以於塗佈處理時 知該狹缝喷嘴的狹缝内。 工閒日守間 >月 上述構成之塗佈裝置包含本發明之上述狹縫噴嘴& 魏㈣32改善轉魏，齡級 <發明之效果> 發明之狹縫喷嘴清掃裝魏塗佈裝 ^及作用’可抑制在用於非旋轉法塗佈處 並同時自動且高效率地清掃。且 。其維修魏，可實·佈膜品f、產出及作動率之提改 【實施方式】 以下，參照附圖，說明本發明之適當實施形態。 201143913 顯示本發明之狹缝喷嘴清掃裝置可適用之光阻塗 一構成例。 此光阻塗佈裝置包含： 基板?=台中:起藉由氣體動使被處理基板，例如FPD用玻璃 .動平長邊娜擁送在此浮 光』縫Γ32 ’ _浮動平台10上運送之基板g上表面供給 噴嘴重清部42 ’在塗佈處理之空閒時間重清狹縫喷嘴32。 平台1〇上表面設有朝上方喷射既定氣體(例如空氣)之 -體壓= 基板運送機構20包含： 一對導軌22A、22B，夹隔著浮動平台1()沿 -對滑件24，可沿此等導執22A、22B來回移^^伸， 平台，她料24，俾在浮動 σ 了裝卸之方式固持基板G兩側端部； 藉由直進移動機構(未經圖示)使滑件24沿 移動，藉此在浮動平台1〇上浮動運送基板G。 ' Π ° 光阻喷嘴32沿與運送方向(χ方向)直交之水平 板跨洋動平纟1G上方，自親时相^ 亡表面(被處理面)呈帶狀噴吐光阻液R。且狹縫喷嘴32 上含滾珠螺桿機構或引導構件等之喷嘴昇降機' ^主: 縫喷嘴32經由光阻供給管3〇連接光阻液二 專所構成之光阻供給部12〇(圖8)。 次液版輸达泵 鄰接狹縫噴嘴32於浮動平台1〇上方設有噴 喷嘴重清部42之詳細情形參照圖2及圖3後述之。β ° 。 201143913 段單ί此例塗佈裝置中之光阻塗佈動作。首先，自前 美板G送入-·二於，··叙未經圖示〉經由分類機構(未經圖示〕將 之氣體(例如高梅);力而:大 如此基板G以水平姿能外;靈& +1^ 動，同時狹缝喷嘴32朝正向(Χ方向)以—定速度移 =液’藉此自基板“ 如圖2所示，喷嘴重清部42併設有： 於預塗滾輪46; 、 先阻液以將該光阻液捲取 口於溶_氣蒙【，燥1止之目的而用以保持狹縫喷嘴32之喷吐 部(特別近)用以清婦或清洗狹縫喷嘴32内部及外 清掃/清洗部52接受清lit佈最初藉由噴嘴 下一=處理開始前藉由預塗處理===待命，緊接於 為使狹鏠喷嘴32抵達噴嘴重、、主 預主處理。 =如滚珠螺桿機構所構成之χ方^移動^各^、5()、52)，藉 整體’亦即殼體44沿基板運送方向 4使喷嘴重清部42 降機構26(圖〗)使狹縫喷嘴32沿錯直方“移·^藉，嘴弄 201143913 元5ί含分，之喷嘴清掃單 移動部6〇例如由齒條向(γ方向)一體移動。γ方向 65搭載朝狹縫喷嘴32下、^開口，剖面呈门子狀之清洗頭 釋•乾燥用氣體(例別喷附清洗液(例如稀 而使該，洗液往下掉下接收集至排㈣ 此貫施形態中狹縫喷嘴、、主搞；# @ π丄 t . 構成： 運送方向(X i向&’用^使預塗處理部48整體(殼體44)沿基板 沿喷以使喷嘴清掃單元56整體 ^圖4所示，噴嘴清掃單元允包含： 64，剖2 3 :2 ’ -體結合Y方向移動部6。之Y方向托架 (喷吐出構件)74 ’可自狹縫喷嘴32之狹缝32a外 76 ’固持此侧器74基端部； 亦即，部76 一體沿錯直方向， 迴旋。。機構82 ’用以使刮削益74繞著設於固持部76之樞軸80 ^詳細而言，昇降機構78包含ί . 幵降驅動部84，固定於主框72底部；及 201143913 紅μ剖面ί L形之昇降框88 ’結合此昇降驅動部84之昇降驅動 H 昇降移動之方式卡合安裝於主框72内側面之錯直 ，，動部84雖亦可使用氣壓缸，但就回應速度或位置精度 而δ且以伺服馬達與旋轉/直進轉換機構構成。 迴旋機構82包含： 馬達90 ’經由支持構件水平安裝在昇降框88上； ，轉驅動軸92 ’連結此馬達9〇之輸出軸與固持部％ ;及 承151，在幵降支持體88上支持旋轉驅動軸92。 •旋轉驅動軸92形成上述樞軸8〇。 固持部76如圖5及圖6所示，設有： 夕持方塊96，在用以使刮削器74通過而形成上表面開口 之框體94内，固持刮削器74基端部；及 科===固定於框體94底面’經由線圈彈簧或橡 膠雜f轉件98支持上部支持方塊％及糊界％。 琴74上由螺栓如將自兩嫩三明治狀夾住刮削 f ^一對+刀割方塊9如、96b鎖緊以夾持固定刮削器74 . m高相對於糊器74迴旋方向外力之彈性抗力 之線圈译育104狄於可動方塊％與框體94内壁之間。 (基準外ί時以相對於固持部76呈垂直站立之狀態 '又支持…、而，一旦施加外力，特別是一旦對刮削哭 之夕^或力1有與_器74板面平行之橫方向分i 侧器74及上部支持方塊％即會以樞輪 綠圈彈簧98、辦而沿迴旋方向位移(傾斜）。 特別二為判餘對於固持部76刮削器74之位移， 特別疋如上述之迴旋位移是否超過一定基準值，具有光 位移^部106與使用加14度感測器之第2位移判定部⑽。 第1位移判定部1〇6包含： 才又光。卩110 ’與刮削器74正面相對，安裝於固持部76 ;及 201143913 裝於自此投光部110觀之在刮削器Μ後方或後侧安 投光部110具有發光元件，例如發光二極 有”轉換元件，例如光二極體，可適當使又m具 在到削器74與投光部11〇及受光邻 式先子感測益。 f開口 74a。刮削器74以基準姿態直 成 光部112經由開口 74a對向。此時，白杈先部110與受 光束LB穿過刮削器74開口 ％而抵達^光°部二出射爲^光之 輸出之電信號顯示光束LB已受光自夂光部il2 開口 ㈣。又，顺 上部T中’分別安裳加速度感測器114、116於 W之作用參照圖寺。方塊100。此等加速度感測器114、 器74^?J曰圖略4 ’於主框72上部板狀水平支持部，形成有使刮削 並於1上安持部76正上方位置之狹縫開口 72a， 缝開口' 72a重導部118在與主框72狹 之狹縫狀空洞ί 118a 〃有朝上方狹縫喷嘴32喷吐口逐漸縮窄 圖4 喷嘴32狹縫瓜内時’如 t位。此狀態下，刮削器74自下通過引導部⑽狹 辰部=2,喷嘴的長邊方向平行延伸 *隔著塾片35對接此等唇部33a、33b而以螺栓 32al端内中心部，形成有連接狹縫 衷衡。卩或歧官部32b。於狹縫喷嘴32上表面喷嘴的長201143913 VI. Description of the invention: [Technical field to which the invention pertains] [Prior Art] A non-rotating coffee, which is often used for a long slit nozzle of a spray port of a μ w slit, relative to a coating liquid, such as a plate movement, In the base fabric method of coating a processing liquid or a chemical liquid on a substrate, the fixed nozzle is placed on the platform from the slit nozzle: the horizontal angle is 21' and the slit nozzle is along the length of the nozzle. The side seam 2 fi moves. In this way, the photoresist solution overflowing on the substrate is swept away from the nozzle of the slit nozzle toward the rear of the nozzle, and the film is spread (for example, in the patent document, the tenth surface extends over the entire surface of the substrate to form a first-resistance coated sheet for non-rotation coating. The method is more than half used on the platform to make the base delivery method. The horizontal direction (longitudinal direction of the platform) is transported by the vertical transporting ^ '33. The long slit nozzle placed above the floating platform is facing the through-plate end. The mouthpiece spit liquid retardant 'is thereby called from the base 5 in the substrate transport direction. The photoresist coating film is formed on the substrate toward the rear end portion - the entire surface (for example, Patent Document [Prior Art Document] [Patent Literature] [Patent 1] Japanese Patent Laid-Open No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. In the slit nozzle of the cloth treatment, the slit gap of the jetting photoresist is very narrow (usually below ΙΟΟμηη), so the cured product formed by the photoresist in the photoresist supply tube or the slit nozzle is easy to be narrow. Blocking inside the seam, curing the photoresist somewhere in the slit Once blocked, there will be no lack of photoresist outflow (ie, supply to the strip on the photoresist coating film that produces a straight extension in the direction of the coating scan. - In the past, to prevent the slit nozzle from being slit The photoresist is blocked by the photoresist, and the cleaning operation of removing the photoresist from the inner wall of the slit of the slit nozzle is manually performed. ^ In detail, the metal is inserted inward from the slit nozzle (the nozzle spout side) Or a thin plate made of a resin, the thin plate is slid in the slit in the longitudinal direction of the nozzle to scrape the cured product. However, the slit gap of the slit nozzle is generally extremely narrow as described above, and is below ΙΟΟμη The process of inserting a thin plate and cleaning the system is very troublesome and complicated, which is also a factor for reducing the maintainability or the actuation rate of the photoresist coating device. Moreover, the cleaning process is low in efficiency and takes a long time, so that there are many particles scattered around the operation during the operation. It is also a problem. In order to solve the problems of the above-mentioned prior art, the present invention provides a slit nozzle cleaning and non-rotating coating device, which can suppress the slit in the coating process of the Miwei transfer coating. The generation of particles in the slit of the nozzle is automatically and efficiently cleaned at the same time, and the quality of the coating film and the actuation rate are improved by improving the maintenance function of the slit nozzle. <Means for Solving the Problem> It is to be noted that the slit nozzle cleaning device according to the first aspect of the present invention is used for cleaning the slit nozzle nozzle in the coating process, and the g-mark includes: a thin plate-shaped scraping member which can be self-contained The slit nozzle is externally inserted into the plucking and cleaning mechanism to hold the scraping member, and the scraping member is inserted into the narrow slit. The _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ 'Removal of the scraping member from the slit. In the slit nozzle cleaning device of the above configuration, the main operation of cleaning or cleaning in the slit of all the slit nozzles, that is, the insertion of the scraping member with respect to the slit nozzle Pulling 201143913 The operation and the outbound operation are all automated and modeled, so that the generation of particles can be made, and the time required can be greatly shortened. Seeing the operation of the wheel, the slit nozzle nozzle cleaning device of the second aspect of the present invention makes the silk acid nozzle Mule, which is mainly a thin plate-shaped scraping member in the cloth processing, which can be The slit nozzle is disposed outside the slit cleaning mechanism to hold the scraping member so that the scraping structure is tied to the slit. In the slit nozzle cleaning device of the above-mentioned structure, the slit nozzle of the main operation of the cleaning or cleaning process is self-incorporated into the g-form, thereby achieving work efficiency improvement and suppression. The coating device of the present invention comprises: a nozzle which is a strip-shaped spray coating liquid on a substrate to be processed in a coating process. The donor portion is supplied with a coating nozzle at the slit nozzle. a substrate supporting portion that supports the substrate; a scanning mechanism 'between the slit nozzle and the substrate, and the slit nozzle is coated on the substrate during the coating process'. The slit nozzle cleaning device is used to know the slit of the slit nozzle during the coating process. The sewing apparatus of the above-described configuration includes the above-described slit nozzle of the present invention, the Wei (four) 32, the improvement of the Wei, the age level < the effect of the invention, and the slit nozzle cleaning apparatus of the invention. ^ and "action" can be suppressed at the same time for non-rotation coating and simultaneous automatic and efficient cleaning. And . The maintenance, the real film, the film, the output, and the actuation rate are modified. [Embodiment] Hereinafter, a preferred embodiment of the present invention will be described with reference to the drawings. 201143913 shows a configuration example of a photoresist coating which is applicable to the slit nozzle cleaning device of the present invention. The photoresist coating device comprises: a substrate?==中中: The substrate to be processed by gas movement, for example, FPD glass. The moving flat long side is carried on the floating light Γ Γ 32 ' _ floating platform 10 The upper surface of the substrate g is supplied to the nozzle refining portion 42' to clear the slit nozzle 32 during the idle time of the coating process. The upper surface of the platform 1 is provided with a predetermined gas (for example, air) sprayed upward-body pressure = the substrate transport mechanism 20 includes: a pair of guide rails 22A, 22B sandwiching the floating platform 1 () along the pair of sliders 24, The guides 22A, 22B are moved back and forth along the guides 22A, 22B, and the platform 24, the material 24 is held in the floating σ loading and unloading manner to hold the ends of the substrate G; the slider is moved by a straight moving mechanism (not shown) The 24 is moved along, thereby floating the transport substrate G on the floating platform 1〇. ' Π ° The photoresist nozzle 32 is placed above the 1G horizontal beam in a direction perpendicular to the transport direction (χ direction), and the self-time phase surface (processed surface) is sprayed with a photoresist R. Further, the slit nozzle 32 includes a nozzle lifter such as a ball screw mechanism or a guide member. ^Main: The slit nozzle 32 is connected to the photoresist supply unit 12 of the photoresist liquid supply unit via the photoresist supply tube 3 (Fig. 8). . Sub-liquid plate delivery pump The details of the nozzle-removing portion 42 provided above the floating platform 1A in the adjacent slit nozzle 32 will be described later with reference to Figs. 2 and 3 . β ° . 201143913 paragraph single ί photoresist coating action in this example coating device. First of all, from the former US plate G to send - · two in, · · · 〗 〖 not shown > through the classification mechanism (not shown) to put the gas (such as Gao Mei); force and: so the substrate G in a horizontal position Outside; the spirit & +1 ^ move, while the slit nozzle 32 moves toward the forward direction (Χ direction) at a constant speed = liquid 'by the substrate" as shown in Fig. 2, the nozzle resection portion 42 is provided with: Pre-coating roller 46; first blocking the liquid to take the photoresist liquid to the mouth to dissolve the gas, and to keep the spout portion (especially near) of the slit nozzle 32 for the purpose of clearing the woman or The inner and outer cleaning/cleaning portions 52 of the cleaning slit nozzle 32 receive the clear lit cloth initially by the nozzle next = before the start of the process by the pre-coating treatment === standby, next to the narrow nozzle 32 reaching the nozzle weight, Main pre-master processing = If the ball screw mechanism is configured to move ^^^, 5(), 52), by the whole 'that is, the casing 44 moves the nozzle retreating portion 42 in the substrate carrying direction 4 26 (Fig.) The slit nozzle 32 is moved in the wrong direction, and the nozzle cleaning head moving portion 6 is integrally moved, for example, by the rack to the (γ direction). In the γ direction 65, a cleaning head that discharges toward the slit nozzle 32 and has a cross-section in the shape of a door is used. (Example of spraying a cleaning liquid (for example, it is thin, the washing liquid falls down and the receiving set is discharged to the row). (4) In the embodiment, the slit nozzle and the main body are engaged; #@ π丄t. Configuration: The transport direction (X i to & 'uses the entire precoat processing unit 48 (housing 44) along the substrate edge The nozzle cleaning unit 56 is integrally shown in FIG. 4. The nozzle cleaning unit includes: 64, the cross-section 2 3 : 2 ' - the body is combined with the Y-direction moving portion 6. The Y-direction bracket (spraying and discharging member) 74 is self-contained The outer portion 76' of the slit 32a of the slit nozzle 32 holds the base end portion of the side portion 74; that is, the portion 76 integrally rotates in the wrong direction. The mechanism 82' is used to cause the scraping benefit 74 to be disposed around the holding portion 76. Pivot 80 ^ In detail, the lifting mechanism 78 includes a lowering driving portion 84 fixed to the bottom of the main frame 72; and 201143913 a red μ-shaped lifting frame 88' combined with the lifting drive H of the lifting driving portion 84 The lifting and lowering manner is engaged with the wrong side of the inner side of the main frame 72, and the movable portion 84 can also use the pneumatic cylinder, but responds to the speed or The positional accuracy is δ and is composed of a servo motor and a rotary/straight-forward conversion mechanism. The swing mechanism 82 includes: a motor 90' is horizontally mounted on the lifting frame 88 via a support member; and the rotary drive shaft 92' is coupled to the output shaft of the motor 9' The holding portion 5% supports the rotary drive shaft 92 on the squat support 88. The rotary drive shaft 92 forms the pivot 8 〇. The holding portion 76 is provided as shown in FIGS. 5 and 6 Block 96, in the frame 94 for passing the scraper 74 to form the upper surface opening, the base end portion of the scraper 74 is fixed; and the base === fixed to the bottom surface of the frame 94 via the coil spring or rubber misf The piece 98 supports the upper support block % and the paste boundary %. The piano 74 is clamped by two bolts, such as a pair of + knife-cut blocks 9, such as 96b, to lock the fixed scraper 74. m The coil of the elastic resistance of the external force with respect to the direction of the whirling of the paste 74 is between the movable square % and the inner wall of the frame 94. (The reference outer ί is in a state of standing vertically with respect to the holding portion 76' and supports... And, once an external force is applied, especially once it is crying The evening or the force 1 has a lateral direction parallel to the plate surface of the _ 74, and the upper side support 74 and the upper support block % are displaced (tilted) in the direction of the revolution by the pivot green circle spring 98. For the displacement of the scraper 74 of the holding portion 76, in particular, if the above-described swirling displacement exceeds a certain reference value, the optical displacement portion 106 and the second displacement determining portion (10) using the 14-degree sensor are used. The part 1〇6 includes: only the light. The 卩110' is opposite to the front side of the scraper 74, and is mounted on the holding portion 76; and 201143913 is mounted on the rear side or the rear side of the scraper 观110 has a light-emitting element, for example, a light-emitting diode has a "conversion element, such as a photodiode, which can be appropriately measured at the edger 74 and the light projecting portion 11 and the light-receiving neighboring sense. f opening 74a. The scraper 74 is straight in the reference position and the light portion 112 is opposed via the opening 74a. At this time, the white light first portion 110 and the light receiving beam LB pass through the opening of the scraper 74 and reach the electric light signal outputted by the light portion LB to indicate that the light beam LB has been received from the light emitting portion il2 (4). Further, the action of the acceleration sensors 114 and 116 in the upper portion of the upper T is referred to the temple. Block 100. The acceleration sensor 114, the device 74 is substantially in the upper plate-shaped horizontal support portion of the main frame 72, and is formed with a slit opening 72a for scraping the position directly above the holding portion 76. The slit opening '72a' of the retracting portion 118 is narrowed toward the slit hole 32 of the main frame 72, and the spout is gradually narrowed toward the upper slit nozzle 32. In this state, the scraper 74 passes through the guide portion (10) and the narrow portion = 2, and the longitudinal direction of the nozzle extends in parallel. * The lip portions 33a, 33b are butted against each other via the cymbal 35, and the inner portion of the end portion of the bolt 32al is formed. There is a connection slit to balance.卩 or the official section 32b. The length of the nozzle on the upper surface of the slit nozzle 32
S 12 201143913 设有光阻導入口 32e’此光阻導入口 32e與歧管邻 部卿8)之 。。光阻導入口您連接來自光阻供i 周圍塊圖顯示此實施形態之光阻塗佈裝置中狹縫喷嘴32 』浮4=。合控制此光阻塗佈裝置内整體。 ㈣H + 18)、基板運送機構(20、30、20，）、噴嘴異 部i22控制下=嘴清掃裝置7〇、細共給部120等皆在主控制 置70作為局部控制器具有喷嘴清掃控制部 自主124與主控制部122交換控制信號，因庫來 ^ ΪΪ it 指令控制狹㈣嘴清掃裝置7G内各部，‘ί 80 klTt5M 1 iTltT^0 ' ^ W 78 ' ^ 號賦予喷嘴2位移判定部1〇6、⑽之輪出信 來自途中設有切換閥126。此切換閥以亦連接 祕給部128之親液供給管130，可在對狹縫 供給來自光阻供給部12G之光阻液之位自^^ 給部128之清洗液(稀釋劑)之位置之間進行切來“洗液供 於狹縫喷嘴32長邊方向兩端設有連通歧管 其次，參照圖9〜圖17，說明狹縫喷嘴清 ^控置70之動作皆在主控制部122及喷嘴清掃=部 圖9顯示狹縫喷嘴清掃褒置7〇中狹喷 作。此狹缝喷嘴清掃處理可定期，例如以i 於光阻塗佈處理之空間時間實施。 人次數批-人為早位 最初之初始化(步驟S!)中，將殘留於狹縫 更換為清洗液(稀釋劑液)。此賴更換中 ‘ 部_由清歧供給㈣Q、切_26 ==== 13 201143913 狹缝噴嘴32内，將大量光阻液自狹縫噴嘴32出口 32e經由液體 排除管132及導通狀態之開合閥134朝排放槽排出之。且一部分 光阻液自狹縫喷嘴32之喷吐口流出。 初始化(步驟S〗)中，如圖10之(a)所示亦進行相對於狹縫喷嘴 32到削器74及固持部76之對準(定位）。為進行此對準，不僅使 用狹縫喷嘴清掃裝置70侧之移動機構54、60、78、80亦使用啥 嘴昇降機構26。 、 接著，進行將刮削器74***狹缝喷嘴32狹缝32a内之動作(牛 驟so。適當之一實施例中，此刮削器***動作如圖ι〇所示，= 1刮削器迴旋移動(b)、到削器上昇移動(e)及第 迴^ 移動(d)3p純進行。 $ 圖U顯示此刮削器***動作之程序。第丨到 於步驟s『Sm之程序進行，刮削器昇降移動(c)== 夕動(=) 程序進行，第2刮削器迴旋移動(d)於步驟d 二，。之 第1 _ii峨移蝴巾，實齡简器74 < °一 體恰迴旋移動既定動程(旋轉角)之動作(步^符°卩76 一 順暢進展時，動作中_器74之變形，亦12)= 迴旋移動動作 削器74之相對迴旋轉大致不存在;料％到 位移判定部106、108發出實質上無位移(未非^i、’故自 驟S13)，此時轉移至下一到削器昇降移動⑷。）之判疋結果(步 然而，刮削器74前端部於狹缝噴 而無法進人其巾時，糊!！ 74 —、 崎接觸某物 旋位移），其變形量超過基準值，即—自於固持部76相對迴 質上發生位移(被卡住)之判定結果(步驟$ H部106、108發出實 令刮削器74及_部76 _ f接於迴旋’ 12所示， Si4)，重新嘗試迴旋移動動作(步驟 則之原來位置(步驟 =欠數&)時，於此階段t止本次狹縫 新嘗試次數達設 或巧不器發出無法清掃之警報(步 Μ處理，通過蜂鳴 _器昇降移動(C)係令刮肖二二5,。 動既定動程(距離)之動作(步驟Sis)。 201143913 ，與以姻自位移判定 狹處理，《無法翁之Si:mp 姿態為初始』:===32内設定到削器74之 irr：11 ί8 s22—s23->s27->s6)。 赉出無法清知之警報(步驟 ;:一=:刮削器74前端皆宜***至抵W嘴 1=ί 如上述3階段之刮削器***動作 明之刮削器***動作中可進行各種變(形)。( (c)係-例，依本發 動之動作(步购。圖13顯示此74沿既 ，作如圖14所示以令到削器74與固持部^^之程序。此刮 方向σ方向)移動之動作為基本動作，使其—體沿嘴嘴的長邊 η昇ΐ動作等，自喷嘴—端部側終點'至ϋί周期之迴旋動 ’ 1動程或1節距之到削器驅動(步驟 、鸯另-端部終點重 動作開始前，藉由喷嘴昇降機=3=33為〜 釉裰上幵，使引導部118脫離狹縫喷嘴％。毒8使狹縫喷嘴32 201143913 ^{動作途中，於狭縫噴嘴32内刮削器74被固化物或其他 -物卡住，大幅變形時，自位移判定部1〇6、1〇8發出實 被卡住)之概結果(步驟W，故例如圖15A及圖ΐ5β所示 =肖|器74以俾回捲至！ _(1節距)前的原來位置之相反動作 ，再重新嘗試或重新開始(步驟S3G)。此時，在重新 :f或後退(步驟S26)次數達設定次數⑹之情形下，亦於此階段中 s34—s2·^縫清掃處理，發出無法清掃之警報（步驟 在此’就圖16及圖17,說明第2位移判定部1〇8之作用。 干;交器i40比較兩加速度感測器114、116之輸出’輸出表S 12 201143913 is provided with a light-resistance introduction port 32e' and the light-resistance introduction port 32e and the manifold adjacent portion 8). . The photoresist inlet port is connected to the block diagram from the photoresist for i. The slit nozzle 32 in the photoresist coating device of this embodiment is floated 4=. The whole of the photoresist coating device is controlled. (4) H + 18), substrate transport mechanism (20, 30, 20,), nozzle irregularity i22 control = nozzle cleaning device 7 〇, fine common portion 120, etc. are all in the main control unit 70 as a local controller with nozzle cleaning control The part autonomous 124 exchanges a control signal with the main control unit 122, and controls each part of the narrow (four) mouth cleaning device 7G by the library ^ it command, 'ί 80 klTt5M 1 iTltT^0 ' ^ W 78 ' ^ is given to the nozzle 2 displacement determination unit 1〇6, (10) The round of the letter comes from the switch valve 126. The switching valve is also connected to the lyophilic supply tube 130 of the secret portion 128, and is capable of supplying the cleaning liquid (diluent) from the photoresist portion of the photoresist supply portion 12G to the cleaning liquid (diluent) from the photoresist portion 12 of the photoresist supply portion 12G. The cutting liquid is supplied to the slit nozzle 32 at both ends in the longitudinal direction, and the communication manifold is provided. Referring to FIG. 9 to FIG. 17, the operation of the slit nozzle cleaning control unit 70 is described in the main control unit 122. And nozzle cleaning = part of Figure 9 shows the narrow nozzle spray in the slit nozzle cleaning device. This slit nozzle cleaning process can be performed periodically, for example, in the space time of the photoresist coating process. In the initial initialization (step S!), the remaining residue is replaced with a cleaning solution (diluent solution). This is replaced by the 'part_ from the differential supply (four) Q, cut _26 ==== 13 201143913 slit In the nozzle 32, a large amount of photoresist liquid is discharged from the slit 32 outlet 32e through the liquid discharge pipe 132 and the opening and closing opening valve 134 toward the discharge groove, and a part of the photoresist liquid flows out from the discharge port of the slit nozzle 32. In the initialization (step S), as shown in FIG. 10(a), the slit nozzle 32 to the scraper 74 are also performed. Alignment (positioning) of the holding portion 76. To perform this alignment, not only the moving mechanisms 54, 60, 78, 80 on the side of the slit nozzle cleaning device 70 are used but also the nozzle lifting mechanism 26. Next, the scraper is used. The action of inserting 74 into the slit 32a of the slit nozzle 32 (in a suitable embodiment, the scraper insertion action is as shown in Fig. ,, = 1 scraper swinging movement (b), the cutter is raised Move (e) and the first move ^ Move (d) 3p purely. $ Figure U shows the procedure for inserting the scraper. The second step is the procedure of step S s "Sm, the scraper moves up and down (c) == eve The motion (=) program is performed, and the second scraper is rotated (d) in step d2. The first _ii 蝴 蝴 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , The action (step 卩 76 一 76, when the smooth progress, the deformation of the _ 74 in the action, also 12) = the relative rotation of the gyro moving blade 74 is substantially absent; the material % to the displacement determining portion 106, 108 is issued There is essentially no displacement (not ^i, 'so from step S13), at this time, the result is transferred to the next to the lower lifter movement (4). However, when the front end of the scraper 74 is sprayed in the slit and cannot enter the towel, the paste is in contact with the reference value, that is, the relative rest of the retaining portion 76 is relatively high. The result of the determination of the displacement (stuck) occurs (the step $H part 106, 108 issues the actual scraper 74 and the _ part 76 _ f is connected to the convolution '12, Si4), and re-attempts the whirling movement (step At the original position (step = less number &), at this stage t, the number of new attempts of the slit is set or the alarm is not cleared (step processing, moving by buzzer _ lifting (C) ) The order is shaved two or two. The action of the established motion (distance) (step Sis). 201143913, and with the self-displacement judgment narrowly, "Si: mp posture is initial": ===32 set to the rr 74 of the rr 74: s8 . An alarm that cannot be clarified is detected (step: one =: the front end of the scraper 74 should be inserted into the W-nozzle 1 = ί. The above-mentioned three-stage scraper insertion action can be performed in various types of deformation (shape). ((c) Department-example, according to the action of this action (step by step. Figure 13 shows the 74 edge, as shown in Figure 14 to make the blade 74 and the holding part ^^. This scraping direction σ direction The moving action is the basic action, so that the body is raised along the long side of the mouth, η, and the like, from the nozzle-end side end point to the ϋί cycle of the rotation '1 move or 1 pitch to the sharpener Drive (step, 鸯 - - - - - 端 , 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴 喷嘴In the middle of the operation, when the scraper 74 is caught by the solidified object or other material in the slit nozzle 32, the result of the self-displacement determining unit 1〇6, 1〇8 is actually stuck (step W, Therefore, for example, as shown in Fig. 15A and Fig. 5β, the device 74 rewinds to the original position before the _ (1 pitch), and then tries again or restarts. (Step S3G) At this time, in the case of re:f or retreat (step S26) for the set number of times (6), the s34-s2·^ seam cleaning process is also issued in this stage, and an uncleanable alarm is issued (step is here) The operation of the second displacement determining unit 1〇8 will be described with reference to Fig. 16 and Fig. 17. The output of the two acceleration sensors 114 and 116 is compared with the output of the two acceleration sensors 114 and 116.
^定“ίϊί。判定電路輸出顯示來自比較器140之差分E 之大小關係之判定信號MS。亦即，e<t 位準之廳。將此判定信Μ 列如ί述之刮出動作中，削器74及固持部76以如圖Π之 形之速度特性V沿Y方向移動。此時，對安裳於 施ίίί Π 度感測器114與施加於刮削器74者相同 ，加加速度’對安胁下部支持 = 施加於固持部76之柩體94者相同施加加速度迷度氣m與 上即動作中到削器74若未被卡住，刮削器74實質 a 存在受形或位移，兩加速度感測器U4、116之輸出波 ^目同’差分E大致為零，判定信號廳為1位準。The decision circuit outputs a decision signal MS indicating the magnitude relationship of the difference E from the comparator 140. That is, the e<t level hall. This decision signal is listed in the scraping action. The scraper 74 and the retaining portion 76 move in the Y direction in the shape of the speed characteristic V. At this time, the same is applied to the scraper 74, and the jerk is 'against' The lower part of the support = the same applies to the body 94 of the holding portion 76. The same applies to the acceleration of the gas m and the upper action, if the blade 74 is not caught, the scraper 74 is substantially deformed or displaced, and the two accelerations The output waves of the sensors U4 and 116 are the same as the 'difference E', and the decision signal hall is 1 level.
來二動作中麵器74紐固化物或異物卡住而變 Ϊ丄感測器m之輸出中即會出現負的加速度二^ ί刀差分E大到超過基準值™時，判定信號MS 嘴32^^= 忖料終地結树，其柳進行自狹縫喷 構78使到削系°74 1?之動作(步驟S4)。此撤出動作中，藉由昇降機 構78使到削益74與固持部76 -體下降。When the second action of the middle surface device 74 is solidified or the foreign matter is stuck, the negative acceleration is generated in the output of the sensor m. When the difference E is larger than the reference value TM, the determination signal MS mouth 32 ^^= The end of the tree is knotted, and the willow is subjected to the action of the slitting structure 78 to the cutting system 74 (step S4). In this withdrawal operation, the lift 74 and the holding portion 76 are lowered by the lift mechanism 78.
S 16 201143913 刮出動作結束後，即切換圖8之切換閥126至清洗 m側，對狹縫喷嘴32供給清洗液。同時，開啟開 大部分清洗液於狹縫喷嘴32光阻導入口 32cy 1 I， 32d—歧管部32b—出口部32e—液體排除管132之路 = 藉此朝排放口排除刮下的固著物。如此，與刮放 口排除清洗液，藉此可提高固著物之排出性能。川_排放 ，出動作-旦結束，即進行後處理，也就是將 之>月洗液更換為光阻液之動作(步驟s )。此 士噴背32内 間光阻液供給部Τ側，將光阻液自光阻液供給ί Si 入狹縫喷嘴32内，將大量清洗液自狹缝 ^ ° 、 圖18所示，亦可為用於刮下 狀任思、，例如 ⑽、74Q、: ^附細之獅傾斜之刮細狀 且於到削态插人動作(步驟^ ^ 所示以完全非接觸式變形 部m亦可如圖19 二為藉由經由旋_ 146中，形成 於主框72之一對彎曲柘丨％ 148以可彈性位移之方式設 而朝狹縫喷嘴32喷吐p逐&亚同時使刮削器74前端部通過 重新嘗試彻^入tit：之狹縫狀空洞部152。 來位置之情形下(步 ===在使刮削器74回到原 部76之位置。 /〇 X方向微調刮削器74及固持 即，亦™目使獅(未經圖示）。亦 201143913 JL- =上施形態之狹縫喷嘴清掃裝置70完全不需藉由人 举i現模式化狹縫喷嘴32狹縫内之清掃 =====短所需時間。 可對狹縫嘴嘴32改善維喷嘴清掃裝置7〇， 動率。 則/力此知升先阻塗佈膜品質、產出及作 會、主之'"變形例’亦可以人工代替狹縫喷 插^狹“嘴32 3 Ϊ^自到削器74 之簡化。 特化為刮出功新可，可實現裝置構成 且上述實施形態中，為判定相對於固持 移是否超過-絲準簡㈣料帛 σ 速度感測II之第2 _，㈣雨。_ 一方之位移狀部，省略另-方位移狀^錢协載其中任 _其;說=月二2圖實二又:與前述實施形態相 圍主要構成。 紙細第2 a施形態狹縫喷嘴32周 32elS=f23\長邊方向兩端分別設有連通歧管32b之出口 i6r ? 162亦連接來自清>=;s 月先液供、，、σ & 164，猎由切換切換閥162，可切 ，、排放槽，或是連接清洗液供給部128盥 、 ^ :====給管 :出，。又’切換閥則心=== 201143913 〒欠’說明關於本實施形態之動作。例#，首先，雖將 ，二4***狹缝处，但此時，於圖Μ中狹缝喷嘴 削器74***狹缝32a。 1 Ί欠’令刮削器74朝狹缝噴嘴32右端如前述實施形態移動， 亚同時切換切換閥162，連接清洗液供給部128與出口 32el， =切換閥163，連接排放口與出口逝。因此，刮削器％自狹 雜右端轉，朗_膽观β自左齡使清洗液 l = 一旦移動’即可將狹缝孤内已固化之光阻於歧 i除^内托南，使該光阻乘著清洗液之流動而自歧管32b内加以 刮削器74抵達狹縫32a右端後，刮削器74即停止 左朝右持續流動既定時間。其次，刮削器74於 ίί Ϊ 朗物細細163，連接清洗液供給部 28出口 32e2，且切換切換閥162，連接出口 ％盘排放口。 管==:瓜右端朝左端移動’並同時清洗液於歧 向流刮削器74移動之方向相同方 而代之以複數荷重元170。 錢用祕構件98 使用何重兀170，故可計測分別對荷重元170 作用的力，不需前述實施形態中之第 ^ 件數故提域置可纽。 叫W 106，減少零件 w其次，說明關於刮削器74之其他形狀。如圖 斋74D之形狀前端宜為梯形型。此因水平移動 =垆1姑 ，32a内光阻之固化物H接觸該梯形型 ^二 加朝上的力F，可托高固化物Η至歧管孤。丨了對固化物Η施 19 201143913 又’刮削器74之材料宜為硬度低於狹縫喷嘴32之金屬材質， 不傷害狹縫喷嘴32，且具有剛性故適於清掃。 發明不限於如上述實施形態中用於基板浮動方式或是非旋 轉f式塗佈處理之狹縫喷嘴’可以鎌任意塗佈處理或液體處理 之狹縫喷嘴為對象。 私粗明中作為塗佈液’除光阻液以外，亦可係例如層間絕緣 二^電質材料、配線材料等塗佈液’亦可係各種化學液、顯 二二，潤洗液等。本發明巾減理基板稀於1(：;〇基板，亦可係 ^他平面顯示器用基板、半導體晶圓、CD基板、光罩、印刷基板 【圖式簡單說明】 置-明之狹縫喷嘴清掃裝置可適用之光阻塗佈裝 分剖面前;^圖 。"" 、 ' ^ 立體^ _她驗上射嘴㈣敎健清掃/清洗部構成之 視圖圖4麵雜實顧彡驗縫倾清掃裝紅部分剖面側 構成上述狹縫喷嘴清掃裝置所包含之到削器朗 内構嘴清職置所包含之聰及固持部 圖。圖7係顯示刮削器變形時固持部内各部狀態之部分剖面前視 圖8係以方塊形式顯示上述光阻塗 =9係顯示上述狹缝喷嘴清掃裝置整體 力，。 削器插：〜Γ階段顯示依實 20 201143913 述棚器插场作程权流程圖。 應處理之麵歸地_插人動縣賴進行時對 之流係顯示依實郷態狹縫喷嘴清掃處理㈣出動作程序 上述娜動作情形之分解立體圖。 U;1不上述刮出動作中1動程動作之-例圖。 -例ΐ。 上制_作情生摊之情料恢復動作之 器之位圖=== 上述狹縫喷嘴清掃裝置中使用加速度感測 之各〜⑷係顯示使用地口速度感測器之位移判定部作用 ======刮削器形狀圖。 部構成例之剖_ Λ縫噴^城置中完全非接觸式的引導 要構似χ方塊形趣示上述光阻塗騎置第2實施形態之主 第2対_裝置所包含之觸器及固持部 内第舰含之_及固持部 圖23係顯示侧器之另—實施形態圖。 【主要元件符號說明】 1(λ.，浮動平台 12…氣體噴射孔 20...基板運送機構 22Α、22Β...導執 24…滑件 21 201143913 26.. .喷嘴昇降機構 28.. .喷嘴支持構件 30.. .光阻供給管 32.. .光阻喷嘴（狹縫喷嘴） 32a...狹缝 32b··.歧管（歧管部） 32c...光阻導入口 32d...光阻導入通路 32el、32e2...出口 32e…出口（出口部） 33A...前唇部（唇部） 33B...後唇部（唇部） 35…墊片 38.. .喷嘴昇降機構 42.. .喷嘴重清部 44.. .殼體 46.. .預塗滚輪 48.. .預塗處理部 50.. .喷嘴槽 52.. .喷嘴清掃/清洗部 54.. .X方向移動部（移動機構) 56.. .喷嘴清掃單元 58.. .喷嘴清洗單元 60.. .Y方向移動部（移動機構) 62.. .齒條 64.. .Y方向托架 65.. .清洗頭 66…清洗噴嘴 68.. .排放口 70.. .狹缝喷嘴清掃裝置S 16 201143913 After the scraping operation is completed, the switching valve 126 of Fig. 8 is switched to the cleaning m side, and the cleaning liquid is supplied to the slit nozzle 32. At the same time, the majority of the cleaning liquid is opened to the slit nozzle 32 of the light-resistance introduction port 32cy 1 I, 32d - the manifold portion 32b - the outlet portion 32e - the path of the liquid discharge tube 132 = thereby removing the scraping fixation toward the discharge port Things. In this way, the cleaning liquid is removed from the scraping port, whereby the discharge performance of the fixing material can be improved. The _ discharge, the discharge operation, is finished, that is, the post-treatment, that is, the action of replacing the monthly wash liquid with the photoresist (step s). The photoresist is supplied to the side of the photoresist supply portion, and the photoresist is supplied from the photoresist into the slit nozzle 32, and a large amount of the cleaning liquid is applied from the slit, as shown in FIG. For the purpose of scraping the shape, for example, (10), 74Q, : ^ The lion of the fine slant is scraped and the action is inserted into the cut state (the step ^ ^ shows the completely non-contact deformation part m) As shown in FIG. 19, by means of one of the main frames 72 formed in the rotary 146, the bending 柘丨% 148 is elastically displaceable, and the slit nozzle 32 is ejected toward the slit nozzle 32 while the scraper 74 is simultaneously disposed. The front end portion is re-introduced into the slit-shaped hollow portion 152. In the case of position (step === at the position where the scraper 74 is returned to the original portion 76. /〇X direction fine-tunes the scraper 74 and Hold, ie, the lion (not shown). Also 201143913 JL- = the slit nozzle cleaning device 70 of the upper application mode does not need to be cleaned by the slitting nozzle 32 in the slot ===== Short time required. The nozzle nozzle cleaning device 7 can be improved on the slit nozzle 32, and the dynamic rate can be improved. The ""variation" of the main and the main can also be used instead of the slit injection molding. The narrowing of the mouth 32 3 Ϊ ^ from the simplification of the shaving device 74. The specialization is the scraping work, the device configuration and the above implementation can be realized. In the form, it is determined whether or not the relative movement with respect to the holding movement exceeds the second _ _ σ speed sensing II of the second _, (4) rain. _ one of the displacement parts, omitting the other - side displacement _其;说=月二二图实二又: The main structure is adjacent to the above embodiment. Paper thin 2a application slit nozzle 32 weeks 32elS=f23\The long sides are respectively provided with a communication manifold 32b The outlet i6r?162 is also connected from the clear >=;s monthly liquid supply,, σ & 164, the hunting switch valve 162, the cut, the drain tank, or the cleaning liquid supply unit 128, ^ :==== give the tube: out, and 'switch the valve to the heart === 201143913 〒 '' explains the action of this embodiment. Example #, first, although the second 4 is inserted into the slit, but this At the time of the drawing, the slit nozzle 74 is inserted into the slit 32a. 1 Ί ' 'The scraper 74 is moved toward the right end of the slit nozzle 32 as in the above embodiment, The switching valve 162 is switched, and the cleaning liquid supply unit 128 and the outlet 32el are connected, and the switching valve 163 is connected to connect the discharge port and the outlet. Therefore, the scraper % is rotated from the narrow right end, and the cleaning liquid l is made from the left age. = Once moved, the photoresist that has been solidified in the slit can be removed from the heat, and the photoresist is allowed to flow through the cleaning fluid from the manifold 32b to the right end of the slit 32a. Thereafter, the scraper 74 stops moving left to right and continues to flow for a predetermined time. Next, the scraper 74 is connected to the outlet 32e2 of the cleaning liquid supply unit 28 at the ίί 朗 tang 163, and the switching valve 162 is switched to connect the outlet % disk discharge port. Tube ==: the right end of the melon moves toward the left end' and at the same time the cleaning fluid moves in the same direction as the direction of the cross-flow scraper 74 and is replaced by a plurality of load cells 170. The money using the secret member 98 uses the heavy weight 170, so the force acting on the load cell 170 can be measured, and the number of the first embodiment is not required. Call W 106, reduce the part w, and describe the other shapes of the scraper 74. The front end of the shape of Figure 74D should be trapezoidal. Because of the horizontal movement = 垆1 ,, the cured material H of the photoresist in the 32a contacts the trapezoidal type, and the force F of the upward direction is high, so that the cured product can be lifted to the manifold.固化Applied to the cured product 19 201143913 Further, the material of the scraper 74 is preferably a metal material having a hardness lower than that of the slit nozzle 32, does not damage the slit nozzle 32, and has rigidity and is suitable for cleaning. The invention is not limited to the slit nozzles for the substrate floating method or the non-rotating f coating treatment in the above embodiment, and the slit nozzles of any coating treatment or liquid treatment can be used. In addition to the photoresist, the coating liquid may be, for example, a coating liquid such as an interlayer insulating material or a wiring material, or may be a chemical liquid, a second liquid, or a lotion. The towel reduction substrate of the invention is thinner than 1 (:; 〇 substrate, can also be used for the substrate for flat panel display, semiconductor wafer, CD substrate, reticle, printed substrate [simple description of the drawing] The device can be applied to the photoresist coating sub-section before; ^Fig. "" , ' ^ Stereo ^ _ She check the nozzle (4) 敎 Jian cleaning / cleaning department composition view Figure 4 face complex inspection The cross-sectional side of the dumping red portion constitutes a diagram of the Cong and holding portions included in the slit nozzle cleaning device, and the portion of each portion of the holding portion of the retaining portion when the scraper is deformed is shown. The cross-sectional front view 8 shows the above-mentioned photoresist coating = 9 series in the form of a square to show the overall force of the slit nozzle cleaning device. The cutting device insert: ~ Γ stage display according to the real 20 201143913. The surface to be treated is returned to the ground. _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The action of the motion - example map. - Example. _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ ===Shaper shape chart. Sectional configuration example _ Λ 喷 ^ 城 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全 完全_ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ ...substrate transport mechanism 22Α, 22Β...guide 24...slider 21 201143913 26.. nozzle lift mechanism 28.. nozzle support member 30.. photoresist supply tube 32.. photoresist nozzle ( Slot nozzle 32a...slit 32b··. manifold (manifold portion) 32c...resistance introduction port 32d...photoresist introduction path 32el, 32e2...outlet 32e...outlet (outlet part) 33A... front lip (lip) 33B... rear lip (lip) 35... spacer 38.. nozzle lifting mechanism 42.. nozzle refining unit 44.. housing 46. . Precoat Roller 48.. Pre-coating part 50.. . Nozzle groove 52.. Nozzle cleaning/cleaning part 54.. X-direction moving part (moving mechanism) 56.. Nozzle cleaning unit 58.. Nozzle cleaning unit 60.. .Y direction moving part (moving mechanism) 62.. . Rack 64.. .Y direction bracket 65.. Cleaning head 66... Washing nozzle 68.. Discharge port 70.. Slot nozzle cleaning Device
22 S 201143913 72a...狹缝開口 72.. .主框 74A、74B、74C、74D...刮削器形狀 74a…開口 74…刮削器(刮出構件） 76.. .固持部 78···昇降機構（移動機構） 80…迴旋機構（枢軸）（移動機構） 82.. .迴旋機構 84a...昇降驅動軸 84.. .昇降驅動部 86.. .鉛直導執 88.. .昇降框 90…馬達 92.. .旋轉驅動軸 94.. .框體 151.. .軸承 96a、96b...半分割方塊 96…上部支持方塊（可動方塊） 98…彈性構件(線圈彈簧） 100.. .下部支持方塊 102.. .螺栓 104.. .線圈彈簣 106.. .第1位移判定部 108.. .第2位移判定部 110.. .投光部 112.. .受光部 114、116…加速度感測器 118a...空洞部 118.. .引導部 23 201143913 120…光阻供給部 122.. .主控制部 124.. .喷嘴清掃控制部 126.. .切換閥 128.. .清洗液供給部 130.. .清洗液供給管 132.. .液體排除管 134…開合閥 140…比較器 146.. .旋轉軸 148.. .線圈彈簧 15.2.. .空洞部 ' 150...彎曲板 160、161...液體排除管 162、163...切換閥 164、165…清洗液供給管 170.. .荷重元 E. ..差分 F. ..力（外力） K...加速度分量 G. ..基板 H. ..固化物 LB...光束 MS...判定信號 R...光阻液 81〜...837...步驟 ΤΉ...基準值 V...速度特性22 S 201143913 72a... slit opening 72.. main frame 74A, 74B, 74C, 74D... scraper shape 74a... opening 74... scraper (scraping member) 76.. holding portion 78·· · Lifting mechanism (moving mechanism) 80... Rotating mechanism (pivoting) (moving mechanism) 82.. Rotating mechanism 84a... Elevating drive shaft 84.. Lifting and lowering drive 86.. .. Vertical guide 88.. Frame 90...motor 92.. Rotary drive shaft 94.. frame 151.. bearing 96a, 96b... semi-divided block 96... upper support block (movable block) 98... elastic member (coil spring) 100. .. lower support block 102.. bolt 104.. . coil magazine 106... first displacement determination unit 108.. second displacement determination unit 110.. light projection unit 112.. light receiving unit 114, 116... Acceleration sensor 118a... Cavity 118.. Guide portion 23 201143913 120... Photoresist supply unit 122.. Main control unit 124.. Nozzle cleaning control unit 126.. Switching valve 128.. Cleaning liquid supply unit 130.. Cleaning liquid supply pipe 132.. Liquid discharge pipe 134... Opening and closing valve 140... Comparator 146.. Rotary shaft 148.. Coil spring 15.2.. . Cavity portion 150. .. curved plate 160, 161 ...liquid discharge pipe 162, 163... switching valve 164, 165... cleaning liquid supply pipe 170.. load element E. .. differential F. . . force (external force) K... acceleration component G. Substrate H.. Cured material LB... Light beam MS... Judgment signal R... Photoresist liquid 81~...837...Step ΤΉ...Reference value V...Speed characteristic
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