TW200914959A - Photosensitive resin composition, method of producing photo spacer, substrate for liquid crystal display device, liquid crystal display element, and liquid crystal display device - Google Patents

Photosensitive resin composition, method of producing photo spacer, substrate for liquid crystal display device, liquid crystal display element, and liquid crystal display device Download PDF

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TW200914959A
TW200914959A TW097131512A TW97131512A TW200914959A TW 200914959 A TW200914959 A TW 200914959A TW 097131512 A TW097131512 A TW 097131512A TW 97131512 A TW97131512 A TW 97131512A TW 200914959 A TW200914959 A TW 200914959A
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liquid crystal
group
photosensitive resin
crystal display
resin composition
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TW097131512A
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Chinese (zh)
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Nori Miyagishima
Yuuichi Fukushige
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Fujifilm Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C59/00—Compounds having carboxyl groups bound to acyclic carbon atoms and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups
    • C07C59/235—Saturated compounds containing more than one carboxyl group
    • C07C59/245—Saturated compounds containing more than one carboxyl group containing hydroxy or O-metal groups
    • C07C59/285—Polyhydroxy dicarboxylic acids having five or more carbon atoms, e.g. saccharic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Liquid Crystal (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

The invention provides a photosensitive resin composition including at least: a resin containing in its side chain a group having a branched and/or alicyclic structure, a group having an acidic group, and a group having an ethylenic unsaturated group; a polymerizable monomer having a urethane group; and a photopolymerization initiator. Further, by using the photosensitive resin composition of the invention, the invention also provides a spacer which can secure excellent display quality without being affected by changes in the distance between substrates caused by temperature changes or the like.

Description

200914959 九、發明說明： 【發明所屬之技術領域] 本發明係有關於一種感光性樹脂組成物、光間隙物之 氣：法、液日日顯不裝置用基板、液晶顯示元件及液晶顯示裝 置。 【先前技術】 以往’液晶顯示裝置被廣泛地利用於顯示高畫質影像 之顯不裝置。通常，液晶顯示裝置係在一對基板間配置有 肯匕夠依照規疋配向顯不影像之液晶層，將該基板間隔、亦 即液晶層的厚度均勻地維持係決定畫質的重要因素之一， 因此’配設有隔隙物用以將液晶層的厚度保持一定。該基 板之間的厚度通常稱爲「液晶胞厚度」，液晶胞厚度通常係 表示前述液晶層的厚度，換言之’係表示對顯示區域的液 晶施加電場之2片電極間的距離。 先前’間隙物係藉由撒布珠粒來形成，但是近年來， 逐漸使用感光性樹脂組成物並藉由光微影法來形成位置精 確度高的間隙物。使用此種感光性樹脂組成物所形成的間 隙物，被稱呼爲光間隙物（Photo spacer ;光柱）。 在液晶顯示裝置之液晶顯示面板之基板間的液晶胞厚 度’常溫狀態時係藉由配置在該基板間之間隙物而被控制 爲一定値，因此，被封入基板間之液晶的層厚度係被均勻 地保持著。 但是，在液晶顯示面板製程之液晶注入密封後的退火 製程或液晶顯示裝置曝露於高溫環境時，因爲被封入基板 200914959 間的液晶產生熱膨脹之結果，膨脹壓力所弓丨起液晶胞 變化，致使基板變形、液晶的層厚度部分性地產生不均 因此’顯示對比產生不均且與顯示品質的低落有關連 別是在基板面積大的大型畫面液晶顯示面板，液晶的 脹所引起基板的變形有變爲顯著之趨向，例如由於·電 等之液晶顯不面板的大型化正進展中，液晶的熱膨脹 起顯示對比不均成爲重大問題。 另一方面，例如液晶顯示裝置曝露在低溫環境時 爲間隙物的收縮不如液晶收縮程度，致使基板內液晶 度產生變化’會有顯示對比產生不均而與顯示品質的 有關連，亦成爲重大問題。 作爲光間隙物用材料’有揭示（例如，參照！ 2003-315998號公報）一種含有具有胺基甲酸酯鍵的多 (甲基）丙烯酸酯類之感光性樹脂組成物。但是，用以 晶層的厚度（液晶胞厚度）保持一定之間隙物形成技術 具在某負荷之高變形量及高彈性恢復率係必要而不可 的，特開2003-315998號公報的組成物並無法滿足上 求。 作爲曝露於高溫環境時能夠追隨液晶胞厚度變化 料，有揭示（例如，參照特開2 0 0 5 - 3 9 3 0號公報）一種形 示面板用間隙物之含有（al)未含有胺基甲酸酯鍵之多 (甲基）丙烯酸酯類及含有胺基甲酸酯鍵之多官能（甲2 烯酸酯類作爲多官能不飽和單體（B)之感光性樹脂組 (al成分的含有率係（B)成分的總量的〜5〇°/。）。然而 厚度 勻。 。特 熱膨 視用 所引 ，因 胞厚 低落 待開 官能 將液 ，兼 缺少 述要 之材 成顯 官能 S )丙 成物 ，特 200914959 開2005 -3 93 0號公報之組成物雖然能夠抑制曝露高溫環境 時之顯示對比的不均，但是在曝露低溫環境時會有顯示不 均之問題，並非能夠充分地滿足顯示品質者。 【發明內容】 [發明所欲解決之課題] 鑒於上述現狀，本發明之目的係提供一種不會受到溫 度變化的影響且變形恢復性優良之感光性樹脂組成物。 又，本發明之目的係提供一種基板間的間隙寬度變化 不會受到溫度變化等的影響且變形恢復性優良的光間隙物 之製法，及具備依照該製法所製造的光間隙物而成之液晶 顯示裝置用基板》 又，本發明之目的係提供一種具備本發明的前述液晶 顯示裝置用基板而成之液晶顯示器元件，及具備液晶顯示 器元件而成之液晶顯示裝置。 [解決課題之手段] &lt;1&gt; —種感光性樹脂組成物，其至少含有樹脂（其在側鏈 含有分枝及/或脂環結構之基、具有酸性基之基及具有乙烯 性不飽和基之基）、具有胺基甲酸酯基之聚合性單體及光聚 合引發劑。 &lt;2&gt; 如&lt;1&gt;之感光性樹脂組成物，其中更含有未含有胺基 甲酸酯基之具有（甲基）丙烯醯基之聚合性單體。 &lt;3&gt; 如&lt;2&gt;之感光性樹脂組成物，其中前述未含有胺基甲 酸酯基之具有（甲基）丙烯醯基之聚合性單體係具有2個以 上之不飽和鍵。 200914959 &lt;4&gt; 如&lt; 1 &gt;之感光性樹脂組成物，其中前述具有胺基甲酸 酯基之聚合性單體係具有2個以上之不飽和鍵。 &lt;5&gt; 如&lt;2&gt;之感光性樹脂組成物，其中前述具有胺基甲酸 酯基之聚合性單體係具有2個以上之不飽和鍵。 &lt;6&gt; 如&lt;3&gt;之感光性樹脂組成物，其中前述具有胺基甲酸 酯基之聚合性單體係具有2個以上之不飽和鍵。 &lt;7&gt; 一種光間隙物之製法，係在液晶顯示裝置（其至少具 備2片基板、設置在前述基板間之液晶、用以對前述液晶 施加電場之2片電極、及用以控制前述基板間的液晶胞厚 度之光間隙物）之光間隙物之製法，具有以下製程， 層形成製程，其係在前述2片基板的一方上面，使用 如&lt; 1 &gt;至&lt;6&gt;項中任一項之感光性樹脂組成物形成感光性樹 脂層；及 圖案化製程，其係將所形成之前述感光性樹脂層曝光 及鹼顯像而圖案化。 &lt;8&gt; 如&lt;7&gt;之光間隙物之製法，其中前述感光性樹脂層係 藉由使用具有由前述感光性樹脂組成物所形成的感光性樹 脂層之感光性轉印材料，以接觸前述2片基板的一方之方 式轉印而形成。 &lt;9&gt; 如&lt;7&gt;之光間隙物之製法，其中前述感光性樹脂層係 藉由將前述感光性樹脂組成物塗布在前述2片基板的一方 上面並乾燥而形成。 &lt; 1 0&gt; —種液晶顯示裝置用基板，其具備依照如&lt;7&gt;之光間 隙物之製法所製成的光間隙物。 200914959 &lt; 1 1 &gt; 一種液晶顯示元件，其具備如&lt; 1 〇&gt;之液晶顯示裝置 用基板。 &lt; 1 2&gt; —種液晶顯示裝置，其具備如&lt; 1 1 &gt;之液晶顯示元件。 [發明之效果] 依照本發明能夠提供一種不會受到溫度變化的影響且 變形恢復性優良之感光性樹脂組成物。 又，依照本發明能夠提供一種基板間的間隙寬度變化 不會受到溫度變化等的影響且變形恢復性優良的光間隙物 之製法，及具備依照該製法所製造的光間隙物而成之液晶 顯示裝置用基板。 又，依照本發明能夠提供一種具備本發明的前述液晶 顯示裝置用基板而成之液晶顯示器元件，及具備液晶顯示 器元件而成之液晶顯示裝置。 【實施方式】 以下，詳細地說明本發明的感光性樹脂組成物及光間 隙物之製法、以及液晶顯示裝置用基板、液晶顯示元件及 液晶顯示裝置。 &lt;感光性樹脂組成物及光間隙物之製法&gt; 本發明的感光性樹脂組成物其特徵係至少含有樹脂 (A)(含有在側鏈具有分枝及/或脂環結構之基、在側鏈具有 酸性基之基、及在側鏈具有乙烯性不飽和基之基）、具有胺 基甲酸酯基之聚合性單體（B 1 )(以下，亦稱爲「聚合性單體 (B1)」）及光聚合引發劑（C)。 本發明的感光性樹脂組成物藉由前述構成，能夠作爲 200914959 可得到兼具高度的變形量及高度的恢復性 成物，又，能夠作爲可得到未有顯示不均 成物。因爲使用本發明的感光性樹脂組成 隙物具有局度的變形恢復性，能夠消除在 不均。 又，液晶顯示裝置其係具備有至少2 則述基板間之液晶、用以對前述液晶施力I 極、及用以控制前述基板間的液晶胞厚度 發明的光間隙物之製法係製造前述光間隙 徵係具有層形成製程，其係在2片基板的 使用本發明的感光性樹脂組成物而成之感 圖案化製程，其係用以將所形成的前述感 並鹼顯像而圖案化。 依照本發明的光間隙物之製法，能夠 高度變形恢復性之光間隙物。 以下說明本發明的光間隙物之製法， 細地敘述本發明的感光性樹脂組成物。 [層形成製程] 本發明之層形成製程係在支撐體（基4 明的感光性樹脂組成物來形成感光性樹脂 「感光性樹脂組成物層」）之製程。 該感光性樹脂層經過後述的製程，能 恢復性良好且能夠將液晶胞厚度保持均勻 別是在因液晶胞厚度變動而容易產生顯 的光間隙物之組 的顯示裝置之組 物所製成的光間 顯示裝置之顯示 片基板、設置在 丨電場之 2片電 之光間隙物，本 物之方法，其特 一方上面，形成 光性樹脂層；及 光性樹脂層曝光 容易地製造具有 透過該說明來詳 泛）上，使用本發 層（以下，亦簡稱 夠得到作爲變形 之光間隙物。特 承不均之顯示裝 -10- 200914959 置’藉由使用該光間隙物能夠有效地消除影像中的顯示不 均。 在基板上形成感光性樹脂層之方法可適合舉出（a)依 照眾所周知的塗布法塗布含有本發明的感光性樹脂組成物 之溶液之方法，及（b)層壓方法其係藉由使用感光性樹脂轉 印薄膜而成之轉印法。以下，對各自進行敘述。 (a) 塗布法 藉由使用本發明之感光性樹脂組成物在本發明之2片 基板的一方上面塗布並乾燥，來形成光間隙物係較佳態樣》 感光性樹脂組成物的塗布能夠依照眾所周知的塗布法 例如旋轉塗布法、簾流塗布法、狹縫塗布法、浸漬塗布法、 空氣刮刀塗布法、$昆塗布法 '繞線棒塗布法及凹版塗布法， 或是美國專利第2 6 8 1 294號說明書所記載之使用料斗之擠 壓塗布法（extrusion coating)等方法來進行。其中以特開 2 004- 8 9 8 5 1號公報、特開2 004- 1 7 043號公報、特開2〇〇3_ 170098號公報、特開2003-164787號公報、特開2〇〇3-1〇767 號公報、特開2002-79163號公報及特開2001-310147號公 報等所記載之使用狹縫噴嘴或狹縫塗布器之方法爲f圭。 感光性樹脂組成物的沒有特別限定，能夠使用在上述 公報所記載之乾燥方法。 (b) 轉印法 藉由轉印時，較佳是使用具有在暫時支撐體上膜狀地 形成而成的感光性樹脂層之感光性樹脂轉印材料，以接觸 2片基板的一方側（支撐體面）的方式，藉由經加熱及/或加 200914959 壓的輥或平板壓黏或加熱壓黏而貼合後’將暫時支撐體剝 離並將感光性樹脂組成物層轉印至支撐體上，來形成光間 隙物。 具體上可舉出特開平7-110575號公報、特開平11-77942 號公報、特開2000-334836號公報及特開2002-148794號公 報所記載之層壓機及層壓方法，從低異物的觀點，以使用特 開平7- 1 1 05 75號公報所記載之方法爲佳。 形成感光性樹脂層時，能夠在感光性樹脂層與暫時支 撐體間更設置氧隔離層（以下，亦稱爲「氧隔離膜」或「中 間層」）。藉此，能夠提升曝光敏感度。又，亦可設置具有 緩衝性之熱塑性樹脂層用以提升轉印性。 關於構成該感光性轉印薄膜之暫時支撐體、氧隔離 層、熱塑性樹脂層、其他的層或該感光性轉印薄膜之製法， 係與特開2 00 6 - 2 3 69 6號公報之段落號碼[0024]〜[00 3 0]所 記載之構成、製法同樣。 塗布感光性樹脂層時，（a)塗布法、（b)轉印法之該層都 是以0 · 5〜1 0 · 0微米爲佳，以1〜6微米爲更佳。感光性樹 脂層的層厚度在前述範圍時，能夠防止在製造之塗布形成 時產生針孔，且不需要長時間來進行顯像除去未曝光部分。 形成感光性樹脂層之支撐體（亦稱爲基板），可舉出例 如透明基板（例如玻璃基板或塑膠基板）、附帶透明導電膜 (例如ITO膜）之基板、附帶彩色濾光片之基板（亦稱爲彩色 濾光片基板）、附帶驅動元件（例如薄膜電晶體[TFT])之驅動 基板等。支撐體的厚度通常以〜1200微米爲佳。 200914959 在本發明的光間隙物之製法，關於前述液晶、前述2 片的電極係在後述的液晶顯示裝置用基板、液晶顯示元件 及液晶顯示裝置說明。 〜感光性樹脂組成物〜 以下，說明感光性樹脂組成物。 感光性樹脂組成物係至少含有樹脂（A)(以下亦簡稱爲 「樹脂（A)」）（含有在側鏈具有分枝及/或脂環結構之基、在 側鏈具有酸性基之基、及在側鏈具有乙烯性不飽和基之 基）、具有胺基甲酸酯基之聚合性單體（B 1 )及光聚合引發劑 (C)。又，按照必要能夠使用著色劑或界面活性劑等其他成 分而構成。 前述感光性樹脂組成物以使用於光間隙物用爲特佳。 -樹脂（A)- 樹脂（A)係含有在側鏈具有分枝及/或脂環結構之基： X、具有酸性基之基：γ及具有環氧基之基：Z，亦可按照 必要具有其他的基（L)。又，在樹脂（A)中的一個基之中，X、 γ及Z亦可以是複數組合。 -在側鏈具有分枝及/或脂環結構之基：X- 說明前述「具有分枝及/或脂環結構之基」。 首先’具有分枝之基係表示碳原子數爲3〜12個之分 枝狀的烷基，可舉出例如異丙基、異丁基 '第二丁基、第 三丁基、異戊基、新戊基、2-甲基丁基、異己基、2_乙基 己基、2-甲基己基、異戊基、第三戊基、3_辛基及第三辛 基等。此等之中’以異丙基、第二丁基 '第三丁基 '異戊 200914959 基等爲佳，以異丙基、第二丁基、第三丁基等爲更佳。 接者’具有脂環結構之基係表示碳原子數5〜20個的 月曰環族烴基’例如環戊基、環己基、環庚基、環辛基、降 范基、異茨基、金剛烷基、三環癸基、二環戊烯基、二環 戊基、二環戊烯基及三環戊基等。此等之中，以環己基、 降萡基、異莰基、金剛烷基、三環癸基、三環戊烯基及三 環戊基等爲佳，以環己基、降宿基、異茨基及三環戊嫌基 等爲更佳。 含有在側鏈具有分枝及/或脂環結構之基之單體可舉 出苯乙烯類、（甲基）丙烯酸酯類、乙烯醚類、乙烯酯類及（甲 基）丙烯醯胺類等，以（甲基）丙烯酸酯類、乙烯酯類及（甲基） 丙烯醯胺類等爲佳，以（甲基）丙烯酸酯類爲更佳。 前述含有在側鏈具有分枝結構之基之單體的具體例’ 可舉出（甲基）丙烯酸異丙酯、（甲基）丙烯酸異丁酯、（甲基） 丙烯酸第二丁酯、（甲基）丙烯酸第三丁酯、（甲基）丙烯酸異 戊酯、（甲基）丙烯酸第三戊酯、（甲基）丙烯酸第二異戊酯、 (甲基）丙烯酸2-辛酯、（甲基）丙烯酸3-辛酯及（甲基）丙烯酸 第三辛酯等，其中以（甲基）丙烯酸異丙酯、（甲基）丙烯酸異 丁酯及甲基丙烯酸第三丁酯等爲佳’以甲基丙烯酸異丙 酯、甲基丙烯酸第三丁酯爲更佳。 接著，前述含有在側鍵具有脂環結構之基之單體的具 體例係具有碳原子數5〜20個的脂環族烴基之（甲基）丙稀 酸酯。具體上的例子可舉出（甲基）丙稀酸（雙環[2.2.1]庚基 -2 )醋、（甲基）丙嫌酸-1 -金剛院醋、（甲基）丙烧酸_ 2 _金剛院 酯、（甲基）丙烯酸-3 -甲基-1 -金剛烷醋、（甲基）丙稀酸-3，5 _ 200914959 二甲基-1 -金剛院酯、（甲基）丙嫌酸-3 _乙基金剛院醋、（甲 基）丙烯酸-3 -甲基-5 -乙基-1-金剛院酯、（甲基）丙嫌酸 -3,5,8-三乙基-卜金剛烷酯、（甲基）丙烯酸_3,5_二甲基-8-乙 基-1-金剛烷酯、（甲基）丙烯酸-2-甲基-2-金剛烷酯、（甲基） 丙嫌酸-2 -乙基_ 2 -金剛院酯、（甲基）丙烯酸_ 3 ·羥基-1 -金剛 烷酯、（甲基）丙烯酸八氫-4,7-亞甲基節-5-酯、（甲基）丙烧 酸八氫-4,7-亞甲基茚-1-酯、（甲基）丙烯酸-卜蓋烷酯、（甲 基）丙烯酸三環癸酯、（甲基）丙烯酸-3-羥基-2,6,6-三甲基_ 環[3.1.1]庚酯、（甲基）丙烯酸-3,7,7_三甲基-4-羧基-雙環 [4.1.0]庚酯、（甲基）丙烯酸（降）萡烷酯、（甲基）丙烯酸異茨 酯、（甲基）丙烯酸葑烷酯 '(甲基）丙烯酸-2,2,5-三甲基環己 酯及（甲基）丙烯酸環己酯等。該等（甲基）丙烯酸酯之中’以 (甲基）丙烯酸環己酯、（甲基）丙烯酸（降）萡烷酯、（甲基）丙 烯酸異莰酯、（甲基）丙烯酸-1-金剛烷酯、（甲基）丙烯酸蔚 烷酯、（甲基）丙烯酸-1-蓋烷酯及（甲基）丙烯酸三環癸酯等 爲佳，以（甲基）丙烯酸環己酯、（甲基）丙烯酸（降）萡烷酯、 (甲基）丙烯酸異莰酯及（甲基）丙烯酸-2-金剛烷酯爲特佳。 而且，前述含有在側鏈具有脂環結構之基之單體的具 體例可舉出下述通式（1 )或（2 )所示化合物。在此，在通式 (丄）、（2)，X係表示1或2，R係表示氫原子或甲基。m &amp; η 係各自獨立地表示0〜15。通式（1)、（2)之中’以X=1或2、 m = 〇〜8、n = 0〜4爲佳，以m=l〜4、n = 〇〜2爲更佳。通式 (1)或（2)所示化合物之較佳具體例可舉出下述化合物D-1 〜：D - 5、T-1 〜T- 8。 200914959[Technical Field] The present invention relates to a photosensitive resin composition, a photo spacer, a substrate for a liquid crystal display device, a liquid crystal display device, and a liquid crystal display device. [Prior Art] Conventionally, liquid crystal display devices have been widely used as display devices for displaying high-quality images. Generally, in a liquid crystal display device, a liquid crystal layer which is capable of aligning and displaying an image in accordance with a rule is disposed between a pair of substrates, and the substrate spacing, that is, the thickness of the liquid crystal layer is uniformly maintained, is one of important factors determining the image quality. Therefore, 'a spacer is provided to keep the thickness of the liquid crystal layer constant. The thickness between the substrates is generally referred to as "liquid crystal cell thickness", and the liquid crystal cell thickness generally indicates the thickness of the liquid crystal layer, in other words, the distance between two electrodes for applying an electric field to the liquid crystal of the display region. Previously, the interstitial system was formed by spreading beads, but in recent years, photosensitive resin compositions have been gradually used and photo spacers have been used to form spacers having high positional accuracy. The gap formed by using such a photosensitive resin composition is referred to as a photo spacer (Photo spacer; light column). When the thickness of the liquid crystal cell between the substrates of the liquid crystal display panel of the liquid crystal display device is normal temperature, the layer thickness between the substrates is controlled to be constant, so that the layer thickness of the liquid crystal sealed between the substrates is Keep it evenly. However, when the annealing process after the liquid crystal injection molding of the liquid crystal display panel process or the liquid crystal display device is exposed to a high temperature environment, the expansion pressure causes the liquid crystal cell to change due to the thermal expansion of the liquid crystal sealed between the substrates 200914959, resulting in the substrate. The deformation and the layer thickness of the liquid crystal are partially uneven. Therefore, the display contrast is uneven and the display quality is low. The large-size liquid crystal display panel has a large substrate area, and the deformation of the liquid crystal causes the deformation of the substrate to change. In the progress of the large-scale liquid crystal display panel, for example, the thermal expansion of the liquid crystal has become a major problem. On the other hand, for example, when the liquid crystal display device is exposed to a low-temperature environment, the shrinkage of the spacer is not as good as the degree of shrinkage of the liquid crystal, resulting in a change in the liquid crystality in the substrate, which may cause unevenness in display contrast and display quality, and becomes a major problem. . As a material for the optical spacers, a photosensitive resin composition containing a poly (meth) acrylate having a urethane bond is disclosed (for example, see JP-A-2003-315998). However, it is not necessary to maintain a certain thickness of the crystal layer (the thickness of the liquid crystal cell), and it is necessary to have a high deformation amount and a high elastic recovery rate at a certain load, and the composition of JP-A-2003-315998 Can not meet the above requirements. In the case of exposure to a high-temperature environment, it is possible to follow the liquid crystal cell thickness change material (for example, refer to JP-A-2005-399), and the inclusion of the spacer for the display panel (al) does not contain an amine group. a poly(meth)acrylate of a formate bond and a polyfunctional group containing a urethane bond (a type of photosensitive resin group of the polyunsaturated monomer (B)) (al component) The content rate is ~5 〇 ° /.) of the total amount of the component (B). However, the thickness is uniform. The special thermal expansion is caused by the low cell thickness to be opened, and the lack of the desired material is displayed. Functional S) Propylene, special 200914959 The composition of the publication No. 2005-3 93 0 can suppress the unevenness of the display contrast when exposed to a high temperature environment, but there is a problem of uneven display when exposed to a low temperature environment, and it is not capable of Fully meet the display quality. [Problems to be Solved by the Invention] In view of the above-mentioned circumstances, an object of the present invention is to provide a photosensitive resin composition which is not affected by temperature changes and which is excellent in deformation recovery property. Further, an object of the present invention is to provide a method for producing an optical spacer which is excellent in deformation recovery property without being affected by temperature changes or the like, and a liquid crystal having optical spacers manufactured by the method. Further, the object of the present invention is to provide a liquid crystal display device including the substrate for a liquid crystal display device of the present invention and a liquid crystal display device including the liquid crystal display device. [Means for Solving the Problem] &lt;1&gt; A photosensitive resin composition containing at least a resin having a branching and/or alicyclic structure in a side chain, having an acidic group, and having an ethylenic unsaturated group A base group having a urethane group and a photopolymerization initiator. &lt;2&gt; The photosensitive resin composition of &lt;1&gt; further contains a polymerizable monomer having a (meth)acryl fluorenyl group which does not contain an urethane group. <3> The photosensitive resin composition according to <2>, wherein the polymerizable single system having a (meth)acryl fluorenyl group having no urethane group has two or more unsaturated bonds. The photosensitive resin composition of the above-mentioned <1>, wherein the polymerizable single system having a urethane group has two or more unsaturated bonds. &lt;5&gt; The photosensitive resin composition of &lt;2&gt; wherein the polymerizable single system having an urethane group has two or more unsaturated bonds. &lt;6&gt; The photosensitive resin composition of the above-mentioned <3>, wherein the polymerizable single system having the urethane group has two or more unsaturated bonds. &lt;7&gt; A method for producing a photo spacer is a liquid crystal display device (having at least two substrates, a liquid crystal provided between the substrates, two electrodes for applying an electric field to the liquid crystal, and a substrate for controlling the substrate) The method of manufacturing the optical spacer of the optical cell thickness of the liquid crystal cell has the following process, a layer forming process, which is performed on one of the two substrates, and is used in items <1> to <6> A photosensitive resin composition of any one of them forms a photosensitive resin layer; and a patterning process for patterning the formed photosensitive resin layer by exposure and alkali development. &lt;8&gt; The method of producing the optical spacer according to <7>, wherein the photosensitive resin layer is contacted by using a photosensitive transfer material having a photosensitive resin layer formed of the photosensitive resin composition. One of the two substrates is transferred and formed. The method of producing the optical spacer according to <7>, wherein the photosensitive resin layer is formed by applying the photosensitive resin composition onto one of the two substrates and drying the photosensitive resin layer. &lt; 1 0&gt; A substrate for a liquid crystal display device comprising a photo spacer formed by a method for fabricating an optical gap according to &lt;7&gt;. 200914959 &lt; 1 1 &gt; A liquid crystal display device comprising the substrate for a liquid crystal display device of &lt;1&gt;&gt;. &lt; 1 2&gt; A liquid crystal display device comprising the liquid crystal display element of &lt;1 1 &gt;. [Effects of the Invention] According to the present invention, it is possible to provide a photosensitive resin composition which is not affected by temperature changes and which is excellent in deformation recovery property. Moreover, according to the present invention, it is possible to provide a method for producing an optical spacer which is excellent in deformation recovery property without being affected by temperature changes or the like, and a liquid crystal display having an optical spacer manufactured by the method. Substrate for the device. Moreover, according to the present invention, it is possible to provide a liquid crystal display device comprising the substrate for a liquid crystal display device of the present invention and a liquid crystal display device comprising the liquid crystal display device. [Embodiment] Hereinafter, a method for producing a photosensitive resin composition and an optical gap of the present invention, a substrate for a liquid crystal display device, a liquid crystal display device, and a liquid crystal display device will be described in detail. &lt;Manufacturing method of photosensitive resin composition and optical spacers&gt; The photosensitive resin composition of the present invention is characterized in that it contains at least a resin (A) (containing a group having a branching and/or alicyclic structure in a side chain, a polymerizable monomer (B 1 ) having a urethane group in the side chain having an acidic group and a group having an ethylenic unsaturated group in the side chain (hereinafter, also referred to as "polymerizable monomer ( B1)") and a photopolymerization initiator (C). According to the above-described configuration, the photosensitive resin composition of the present invention can be used as a recovery product having a high degree of deformation and height as 200914959, and an undisplayed unevenness can be obtained. Since the photosensitive resin composition of the present invention has a degree of deformation recovery property, the unevenness can be eliminated. Further, the liquid crystal display device is provided with a liquid crystal display system having at least two liquid crystals between the substrates, an optical spacer for applying the liquid crystal to the liquid crystal, and an optical spacer for controlling the liquid crystal cell thickness between the substrates. The gap sign has a layer forming process which is a patterning process using a photosensitive resin composition of the present invention on two substrates, and is used to pattern the formed sense and alkali. According to the method of fabricating the optical spacer of the present invention, the restorative optical spacer can be highly deformed. Hereinafter, the method for producing the optical spacer of the present invention will be described, and the photosensitive resin composition of the present invention will be described in detail. [Layer forming process] The layer forming process of the present invention is a process of forming a photosensitive resin "photosensitive resin composition layer" by a support (the photosensitive resin composition of the base 4). The photosensitive resin layer can be made into a group of display devices which are excellent in restorability and can maintain uniform thickness of the liquid crystal cell, which is a group of display devices which are likely to cause a remarkable optical spacer due to fluctuations in the thickness of the liquid crystal cell. The display sheet substrate of the inter-light display device, the two optical spacers provided in the electric field, and the method of the material, the optical resin layer is formed on the upper surface of the optical display, and the optical resin layer is easily exposed and exposed. In the above, the hair layer is used (hereinafter, it is also referred to as a light spacer which can be obtained as a deformation. The display device with uneven coverage is -10-200914959). By using the light spacer, the image can be effectively eliminated. The method of forming the photosensitive resin layer on the substrate is preferably (a) a method of applying a solution containing the photosensitive resin composition of the present invention in accordance with a well-known coating method, and (b) a lamination method. A transfer method in which a film is transferred by using a photosensitive resin. Hereinafter, each of them will be described. (a) Coating method by using the photosensitive resin group of the present invention The coating is applied to one of the two substrates of the present invention and dried to form a preferred embodiment of the optical spacer. The application of the photosensitive resin composition can be carried out according to a well-known coating method such as a spin coating method, a curtain coating method, or a narrow coating method. Slot coating method, dip coating method, air knife coating method, "Kun coating method", wire bar coating method and gravure coating method, or extrusion coating method using a hopper described in the specification of US Pat. No. 2 6 8 294 (Extrusion coating) and the like are carried out by a method such as JP-A No. 2,004-89, 1985 The method using a slit nozzle or a slit coater described in Japanese Laid-Open Patent Publication No. Hei. No. 2002-310147, and the like. The photosensitive resin composition is not particularly limited, and the drying method described in the above publication can be used. (b) When the transfer method is carried out, it is preferable to use a film formed on the temporary support. Photosensitive resin layer photosensitive resin The printed material is bonded to one side (support surface) of the two substrates by pressing or heat-pressing or/or adding a pressure of 200914959 to press or heat-bond and then peeling off the temporary support and The photosensitive resin composition layer is transferred to a support to form a light-gap material. Specific examples thereof include JP-A-7-110575, JP-A-H11-77942, JP-A-2000-334836, and JP-A-. In the laminating machine and the laminating method described in JP-A-H07-148794, it is preferable to use the method described in JP-A-7-105075. When the photosensitive resin layer is formed, an oxygen barrier layer (hereinafter also referred to as "oxygen barrier film" or "intermediate layer") may be further provided between the photosensitive resin layer and the temporary support. Thereby, the exposure sensitivity can be improved. Further, a cushioning thermoplastic resin layer may be provided to improve transferability. The preparation method of the temporary support, the oxygen barrier layer, the thermoplastic resin layer, the other layer or the photosensitive transfer film constituting the photosensitive transfer film is a paragraph of the Japanese Patent Publication No. 2000-23397. The configurations and manufacturing methods described in the numbers [0024] to [00 3 0] are the same. When the photosensitive resin layer is applied, the layer of (a) the coating method and (b) the transfer method are preferably 0. 5 to 1 0. 0 μm, more preferably 1 to 6 μm. When the layer thickness of the photosensitive resin layer is within the above range, pinholes can be prevented from occurring during the formation of the coating to be produced, and it is not necessary to carry out development for a long time to remove the unexposed portion. The support (also referred to as a substrate) forming the photosensitive resin layer may, for example, be a transparent substrate (for example, a glass substrate or a plastic substrate), a substrate with a transparent conductive film (for example, an ITO film), or a substrate with a color filter ( Also known as a color filter substrate), a drive substrate with a driving element (for example, a thin film transistor [TFT]), or the like. The thickness of the support is usually preferably -1200 microns. In the method of producing the optical spacer of the present invention, the liquid crystal and the electrodes of the two sheets described above are described in a substrate for a liquid crystal display device, a liquid crystal display device, and a liquid crystal display device, which will be described later. ~Photosensitive Resin Composition ~ Hereinafter, a photosensitive resin composition will be described. The photosensitive resin composition contains at least a resin (A) (hereinafter also referred to simply as "resin (A)") (containing a group having a branching and/or an alicyclic structure in a side chain, and having an acidic group in a side chain, And a polymerizable monomer (B 1 ) having a urethane group and a photopolymerization initiator (C) having a group having an ethylenically unsaturated group in the side chain. Further, other components such as a coloring agent or a surfactant may be used as necessary. The photosensitive resin composition is particularly preferably used for an optical spacer. - Resin (A) - Resin (A) contains a group having a branching and/or alicyclic structure in a side chain: X, a group having an acidic group: γ and a group having an epoxy group: Z, and may be necessary Has other bases (L). Further, among one of the resins (A), X, γ and Z may be plural combinations. - a group having a branching and/or alicyclic structure in the side chain: X- illustrates the aforementioned "base having a branched and/or alicyclic structure". First, the "branched group" represents a branched alkyl group having 3 to 12 carbon atoms, and examples thereof include an isopropyl group, an isobutyl group, a second butyl group, a tert-butyl group, and an isopentyl group. , neopentyl, 2-methylbutyl, isohexyl, 2-ethylhexyl, 2-methylhexyl, isopentyl, tert-pentyl, 3-octyl and trioctyl. Among these, isopropyl, a second butyl 't-butyl 'isoprene 200914959 group or the like is preferred, and an isopropyl group, a second butyl group, a third butyl group or the like is more preferred. The ligament of the alicyclic structure represents a ruthenium ring hydrocarbon group having 5 to 20 carbon atoms, such as a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, a descending group, an isotizyl group, and a diamond. An alkyl group, a tricyclodecanyl group, a dicyclopentenyl group, a dicyclopentyl group, a dicyclopentenyl group, a tricyclopentyl group, and the like. Among these, cyclohexyl, norbornyl, isodecyl, adamantyl, tricyclodecyl, tricyclopentenyl and tricyclopentyl are preferred, and cyclohexyl, sulphate, and sigma are preferred. Base and tricyclopentanyl groups are preferred. Examples of the monomer having a branch having a branching and/or an alicyclic structure in a side chain include styrenes, (meth)acrylates, vinyl ethers, vinyl esters, and (meth)acrylamides. Further, (meth) acrylates, vinyl esters, and (meth) acrylamides are preferred, and (meth) acrylates are more preferred. Specific examples of the monomer having a group having a branching structure in a side chain include isopropyl (meth)acrylate, isobutyl (meth)acrylate, and second butyl (meth)acrylate. Tert-butyl methacrylate, isoamyl (meth)acrylate, third amyl (meth)acrylate, second isoamyl (meth)acrylate, 2-octyl (meth)acrylate, ( 3-octyl methacrylate and third octyl (meth) acrylate, among which isopropyl (meth) acrylate, isobutyl (meth) acrylate and t-butyl methacrylate are preferred. 'Isopropyl methacrylate and third butyl methacrylate are more preferred. Next, a specific example of the monomer having a group having an alicyclic structure at a side bond is a (meth) acrylate having an alicyclic hydrocarbon group having 5 to 20 carbon atoms. Specific examples thereof include (meth)acrylic acid (bicyclo[2.2.1]heptyl-2) vinegar, (meth)acrylic acid-1-diamond vinegar, and (meth)propanoic acid _ 2 _ King Kong Court Ester, (meth)acrylic acid 3-methyl-1-adamantane vinegar, (meth) acrylic acid-3,5 _ 200914959 dimethyl-1 - Donkey Kong ester, (methyl) Acrylic acid-3 _ethyl brocade vinegar, (meth)acrylic acid 3-methyl-5-ethyl-1-goldenate ester, (meth)acrylic acid-3,5,8-triethyl Ketobumantanate, _3,5-dimethyl-8-ethyl-1-adamantyl (meth)acrylate, 2-methyl-2-adamantyl (meth)acrylate, ( Methyl) propyl succinic acid-2-ethyl -2- 2 - fused acid ester, (meth)acrylic acid _ 3 · hydroxy-1 - adamantyl ester, octahydro-4,7-methylene (meth) acrylate -5-ester, (meth)propionic acid octahydro-4,7-methylene fluorene-1-ester, (meth)acrylic acid-brocenedyl ester, tricyclodecyl (meth) acrylate, ( Methyl)acrylic acid-3-hydroxy-2,6,6-trimethyl-cyclo[3.1.1]heptyl ester, (meth)acrylic acid-3,7,7-trimethyl-4-carboxy-bicyclo[ 4.1.0]heptyl ester, (meth)acrylic acid Lower) decyl ester, isobutyl (meth)acrylate, decyl (meth) acrylate - 2,2,5-trimethylcyclohexyl (meth)acrylate and cyclomethacrylate Ester and the like. Among these (meth) acrylates, 'cyclohexyl (meth) acrylate, decyl (meth) acrylate, isodecyl (meth) acrylate, (meth) acrylate - 1 Adamantyl ester, silane alkyl (meth)acrylate, 1-captanyl (meth)acrylate, tricyclodecyl (meth)acrylate, etc., preferably cyclohexyl (meth)acrylate, (A) The ethyl (meth) decyl acrylate, isodecyl (meth) acrylate and 2-adamantyl (meth) acrylate are particularly preferred. Further, as a specific example of the monomer having a group having an alicyclic structure in a side chain, a compound represented by the following formula (1) or (2) can be given. Here, in the formula (丄) and (2), X represents 1 or 2, and R represents a hydrogen atom or a methyl group. The m &amp; η series each independently represent 0 to 15. In the general formulae (1) and (2), it is preferable that X = 1 or 2, m = 〇 〜 8 and n = 0 to 4, and m = 1 to 4 and n = 〇 〜 2 are more preferable. Preferable specific examples of the compound represented by the formula (1) or (2) include the following compounds D-1 to D: 5 and T-1 to T-8. 200914959

通式（1) 通式（2) / Η H2〇=C—C—0_ΟΗ2〇Η2—〇ό D— 1General formula (1) General formula (2) / Η H2〇=C—C—0_ΟΗ2〇Η2—〇ό D— 1

ch3 H2〇=C—0—ΟΌΗ2〇Η2—οόCh3 H2〇=C—0—ΟΌΗ2〇Η2—οό

h2c=ch-c-oό D -4H2c=ch-c-oό D -4

D - 2 ch3 h2c=ch-c-oD - 2 ch3 h2c=ch-c-o

D - 5 -16- 200914959D - 5 -16- 200914959

前述含有在側鏈具有脂環結構之基之單體可使用適當 製成者，亦可使用市售品。 前述市售品可舉出日立化成工業（股）製：FA-51 1A、 FA-5 1 2 A(S) ' FA-512M、FA-5 1 3 A ' FA-513M、TCPD-A、 TCPD-M 、 H-TCPD-A 、 H-TCPD-M 、 TOE-A 、 TOE-M 、 H - T Ο E · A、H - T Ο E - M等。此等之中’就顯像性優良、變形 恢復率優良而言，以FA-512(S)、FA-512M爲佳。 -具有酸性基之基：Y- 前述酸性基沒有特別限制，能夠適當地選自眾所周知 者，可舉出例如羧基、磺酸基、磺醯胺基、磷酸基、酚性 羥基等。此等之中，從顯像性及硬化膜的耐水性優良而言’ 以羧基、酚性羥基爲佳。 200914959 前述在側鏈具有酸性基之基之單體沒有特別限制，可 舉出苯乙烯類、（甲基）丙烯酸酯類、乙烯醚類、乙烯酯類、 (甲基）丙烯醯胺類等，以（甲基）丙烯酸酯類、乙烯酯類、（甲 基）丙烯醯胺類爲佳，以（甲基）丙烯酸酯類爲更佳。 前述在側鏈具有酸性基之基之單體的具體例，能夠適 當地選自眾所周知者，可舉出例如（甲基）丙烯酸、乙烯基 苯甲酸、順丁烯二酸、順丁烯二酸一烷基酯、反丁烯二酸、 伊康酸、巴豆酸、桂皮酸、山梨酸、α -氰基桂皮酸、丙烯 酸二聚物、具有羥基之單體與環狀酸酐之加成反應物、ω -羧基-聚己內酯一（甲基）丙烯酸酯等。此等可使用適當製造 而成者，亦可使用市售品。 前述具有羥基之單體與環狀酸酐之加成反應物所使用 具有羥基之單體，可舉出例如（甲基）丙烯酸2-羥基乙酯 等。前述環狀酸酐可舉出例如順丁烯二酸酐、酞酸酐、環 己烷二羧酸酐等。 前述市售品可舉出東亞合成化學工業（股）製：ARON IX M- 5 3 00、ARONIX M- 5 4 00、ARONIX M- 5 5 00、ARONIX M-5600、新中村化學工業（股）製：NKESTER CB]、NKESTER CBX-1、共榮社化學工業（股）製：HOA-MP、HOA-MS、大 阪有機化學工業（股）製：BISCO AT #2100等。此等之中，就 顯像性優良、低成本而言，以（甲基）丙烯酸等爲佳。 -在側鏈具有乙烯性不飽和基之基：Z - 前述「在側鏈具有乙烯性不飽和基」沒有特別限制， 乙烯性不飽和基以（甲基）丙烯醯基爲佳。又，乙烯性不飽 -18- 200914959 和基與單體之連結若是醋基、酸胺基、胺基甲酿基等2價 的連結基時沒有特別限制。在側鏈導入乙烯性不飽和基之 方法能夠從眾所周知者之中適當地選擇’例如在具有酸性 基之基加添具有環氧基之（甲基）丙嫌酸醋之方法；在具有 羥基之基加添具有異氰酸酯之（甲基）丙烯酸酯之方法；及 在具有異氰酸酯基之基加添具有羥基之（甲基）丙烯酸酯之 方法等。 此等之中，就最容易製造且低成本而言，以在酸性基 之重複單位加添具有環氧基之（甲基）丙烯酸酯之方法爲 佳。 具有前述乙烧性不飽和鍵及環氧基之（甲基）丙燃酸 酯’若具有此等時沒有特別限制，以例如下述結構式（1 )所 示化合物及下述結構式（2)所示化合物爲佳。 R1The monomer containing a group having an alicyclic structure in a side chain can be suitably used, and a commercially available product can also be used. The above-mentioned commercial products are exemplified by Hitachi Chemical Co., Ltd.: FA-51 1A, FA-5 1 2 A(S) 'FA-512M, FA-5 1 3 A 'FA-513M, TCPD-A, TCPD -M, H-TCPD-A, H-TCPD-M, TOE-A, TOE-M, H - T Ο E · A, H - T Ο E - M, etc. Among these, FA-512(S) and FA-512M are preferable in terms of excellent imaging performance and excellent deformation recovery rate. - The group having an acidic group: Y- The acidic group is not particularly limited, and may be appropriately selected from the group consisting of a carboxyl group, a sulfonic acid group, a sulfonylamino group, a phosphoric acid group, and a phenolic hydroxyl group. Among these, a carboxyl group or a phenolic hydroxyl group is preferred from the viewpoint of excellent visibility and excellent water resistance of the cured film. 200914959 The monomer having a group having an acidic group in the side chain is not particularly limited, and examples thereof include styrenes, (meth)acrylates, vinyl ethers, vinyl esters, and (meth)acrylamides. The (meth) acrylates, the vinyl esters, and the (meth) acrylamides are preferred, and the (meth) acrylates are more preferred. Specific examples of the monomer having a group having an acidic group in the side chain can be appropriately selected from those well-known, and examples thereof include (meth)acrylic acid, vinylbenzoic acid, maleic acid, and maleic acid. Addition reaction of monoalkyl ester, fumaric acid, itaconic acid, crotonic acid, cinnamic acid, sorbic acid, α-cyano cinnamic acid, acrylic acid dimer, monomer having hydroxyl group and cyclic acid anhydride , ω-carboxy-polycaprolactone mono(meth)acrylate, and the like. These may be suitably manufactured or commercially available. The monomer having a hydroxyl group used for the addition reaction of the monomer having a hydroxyl group and the cyclic acid anhydride may, for example, be 2-hydroxyethyl (meth)acrylate. The cyclic acid anhydride may, for example, be maleic anhydride, decanoic anhydride or cyclohexanedicarboxylic anhydride. The above-mentioned commercial products can be found in the East Asian Synthetic Chemical Industry Co., Ltd.: ARON IX M- 5 3 00, ARONIX M- 5 4 00, ARONIX M- 5 5 00, ARONIX M-5600, Xinzhongcun Chemical Industry Co., Ltd. System: NKESTER CB], NKESTER CBX-1, Kyoritsu Chemical Industry Co., Ltd.: HOA-MP, HOA-MS, Osaka Organic Chemical Industry Co., Ltd.: BISCO AT #2100, etc. Among them, (meth)acrylic acid or the like is preferable in terms of excellent imageability and low cost. - The group having an ethylenically unsaturated group in the side chain: Z - The above "having an ethylenically unsaturated group in the side chain" is not particularly limited, and the ethylenically unsaturated group is preferably a (meth) acrylonitrile group. Further, the ethylenic unsaturated -18-200914959 and the linking of the group and the monomer are not particularly limited as long as it is a divalent linking group such as a acetic acid group, an acid amine group or an aminomethyl group. The method of introducing an ethylenically unsaturated group into a side chain can appropriately select, for example, a method of adding a (meth)acrylic acid vinegar having an epoxy group to a group having an acidic group; A method of adding a (meth) acrylate having an isocyanate; and a method of adding a (meth) acrylate having a hydroxyl group to a group having an isocyanate group. Among these, a method of adding an epoxy group-containing (meth) acrylate to a repeating unit of an acidic group is preferred in terms of easiest to manufacture and low cost. The (meth)propionate having the above-mentioned ethylenically unsaturated bond and epoxy group is not particularly limited as long as it is, for example, a compound represented by the following structural formula (1) and the following structural formula (2) The compound shown is preferred. R1

結構式（1) 前述結構式U)中，R1係表示氫原子或甲基，Ll係表示 有機基。In the above structural formula U), R1 represents a hydrogen atom or a methyl group, and L1 represents an organic group.

結構式（2) 200914959 前述結構式（2)中，R2係表示氫原子或甲基’ l2係表示 有機基，w係表示4〜7員環的脂肪族烴基。 前述結構式（1 )所示化合物及結構式（2)所示化合物之 中，結構式（1)所示化合物比結構式（2)佳。在前述結構式（1 ) 及（2) ’ L1及L2以各自獨立地表示碳數！〜4的伸烷基者爲 更佳。 在述結構式（1 )所示化合物及結構式（2)所示之單體 沒有特別限制’可舉出例如以下的例示化合物（1 )〜（1 0)。 -20 - 200914959Structural Formula (2) 200914959 In the above structural formula (2), R2 represents a hydrogen atom or a methyl group, and the alkyl group represents an aliphatic hydrocarbon group of 4 to 7 membered rings. Among the compounds represented by the above structural formula (1) and the compound represented by the structural formula (2), the compound represented by the structural formula (1) is more preferable than the structural formula (2). In the above structural formulae (1) and (2)', L1 and L2 each independently represent the carbon number! The alkylene group of ~4 is better. The compound represented by the structural formula (1) and the monomer represented by the structural formula (2) are not particularly limited, and examples thereof include the following exemplified compounds (1) to (10). -20 - 200914959

-其他的單體- 前述其他的單體沒有特別限制，可舉出例如由未具有 分枝結構及/或脂環結構之（甲基）丙烯酸酯、苯乙烯、乙烯 醚、具有二元酸酐基、乙烯酯基、烴烯基等之單體等。 -21- 200914959 前述乙烯醚基沒有特別限制，可舉出例如 基等。 前述二元酸酐基沒有特別限制，可舉出例 酸酐基、伊康酸酐基等。 前述乙烯酯基沒有特別限制，可舉出例如 基等。 前述烴烯基沒有特別限制，可舉出例如丁 戊二稀基等。 在前述樹脂（A)之其他的單體的含有率係 以0〜30莫耳％爲佳’以0〜2〇莫耳％爲更佳 樹脂（A)的具體例可舉出例如下述化合物 P - 3 5所示化合物。 又，下述結構中，x、y&amp;z係表示各自的 %)。 了基乙烯醚 如順丁烯二 乙酸乙烯酯 二烯基、異 莫耳組成比 結構IM〜 冓成比（莫耳 -22 - 200914959- Other monomer - The other monomer is not particularly limited, and examples thereof include (meth) acrylate having no branched structure and/or alicyclic structure, styrene, vinyl ether, and dibasic acid anhydride group. a monomer such as a vinyl ester group or a hydrocarbon alkenyl group. -21-200914959 The vinyl ether group is not particularly limited, and examples thereof include a group. The dibasic acid anhydride group is not particularly limited, and examples thereof include an acid anhydride group and an Ikonic anhydride group. The vinyl ester group is not particularly limited, and examples thereof include a group. The hydrocarbon alkenyl group is not particularly limited, and examples thereof include a pentaerythritol group. The content of the other monomer of the resin (A) is preferably 0 to 30 mol%, and the specific compound (A) is 0 to 2 mol%, and the following compounds are exemplified. Compound represented by P - 3 5 . Further, in the following structures, x, y &amp; z indicate respective %). A vinyl ether such as vinylidene vinyl acetate dialkyl, isomolar composition ratio IM~ 冓成比(莫耳-22 - 200914959

yy

coo、、Coo,,

C〇〇H z C〇〇&gt; 〇C〇〇H z C〇〇&gt; 〇

OH x:y:z=45:20:35OH x:y:z=45:20:35

Xcoo. &lt;Xcoo. &lt;

COOH 〇COOH 〇

P-2 COO OH x：y：z=40：25：35P-2 COO OH x:y:z=40:25:35

Xcoo.Xcoo.

y COOH 〇y COOH 〇

OH P-3 x：y：z=40：20：40OH P-3 x:y:z=40:20:40

X COO.X COO.

yy

COOHCOOH

COO 〇 H〇^」、0 P-4COO 〇 H〇^”, 0 P-4

Xcoo.Xcoo.

&lt;&lt;

y COOHy COOH

x：y：z=40；30：30 P-5x:y:z=40;30:30 P-5

Xcoo. -HrlvXcoo. -Hrlv

COOH C〇〇^^ P-6 〇COOH C〇〇^^ P-6 〇

HOHO

I x：y：z=40：20：40 -23 - 200914959I x:y:z=40:20:40 -23 - 200914959

c〇〇、C〇〇,

C〇〇HC〇〇H

C〇〇^\ HO P-7 〇\〇Λ^· x：y：2=40：25:35C〇〇^\ HO P-7 〇\〇Λ^· x:y:2=40:25:35

X COO、X COO,

&lt; COOH COO 〇 H〇人〉、0人〆^ x：y:2=35:30:35 P-8&lt; COOH COO 〇 H〇人〉, 0人〆^ x:y:2=35:30:35 P-8

X coo. COOH COO,X coo. COOH COO,

HOHO

〇 P-9 x:y:z=30:25:45 X coo.〇 P-9 x:y:z=30:25:45 X coo.

/y 〇 COOH 。〇〇产丫〜〇八'''j OH P-10 x:y:z=30:30:40/y 〇 COOH. 〇〇产丫~〇八'''j OH P-10 x:y:z=30:30:40

HO P-11 x：y：z=40：25：35 〇 C〇〇^\HO P-11 x:y:z=40:25:35 〇 C〇〇^\

'Ί COOH'Ί COOH

z COO P-12 〇 Η O人/^〇人〆 x：y：z=30：30：40 200914959z COO P-12 〇 Η O people/^〇人〆 x:y:z=30:30:40 200914959

HO, ,0 '^^COOH〇〇'^^CO°^v^ -13 x: y : 2=45:彳 5:40 C〇〇 厶HO, ,0 '^^COOH〇〇'^^CO°^v^ -13 x: y : 2=45:彳 5:40 C〇〇 厶

y C〇〇H C〇〇' H〇' 〇 P-14 Ό* x：y：z=35：30：35 COO. ) COOH C〇〇/^_ 〇 P-15y C〇〇H C〇〇' H〇' 〇 P-14 Ό* x:y:z=35:30:35 COO. ) COOH C〇〇/^_ 〇 P-15

OH x:y:z=45:30:25 婦x COO.OH x:y:z=45:30:25 Women x COO.

y COOHy COOH

coo. )Coo. )

y COOHy COOH

zcoo H7 〇 x：y ：z=45'-25：30 -25 - 200914959 coo [_Zcoo H7 〇 x:y :z=45'-25:30 -25 - 200914959 coo [_

C〇〇HC〇〇H

P-18 COO八丫^〇 OH x:y:z=40:25:35 X C〇〇P-18 COO 八丫^〇 OH x:y:z=40:25:35 X C〇〇

[_ C〇〇H COO、 P-19 H〇 〇 .x:y:z=45:20:35 COO.[_ C〇〇H COO, P-19 H〇 〇 .x:y:z=45:20:35 COO.

[_ C〇〇H coo、 ^|〇人7^〇人〆 P-20 x：y：z=40；30：30 ^4); coo[_ C〇〇H coo, ^|〇人7^〇人〆 P-20 x:y:z=40;30:30 ^4); coo

COOHCOOH

COO-^Y^O OH 〇COO-^Y^O OH 〇

乂 P-21 x:y:z=45:20:35乂 P-21 x:y:z=45:20:35

X GOO.X GOO.

fy COOH C〇〇y^ 〇 P-22Fy COOH C〇〇y^ 〇 P-22

HerHer

X COOX COO

COOHCOOH

zcoo HOZcoo HO

x:y:z=35:25:40 〇 P-23 x：y：z=40：20：40 200914959 c〇〇\^^x:y:z=35:25:40 〇 P-23 x:y:z=40:20:40 200914959 c〇〇\^^

y C〇〇Hy C〇〇H

COO-^γ^Ό OH 〇COO-^γ^Ό OH 〇

P-24 x:y：z=44:16:40P-24 x:y:z=44:16:40

C〇〇^^ COOMe C〇〇HC〇〇^^ COOMe C〇〇H

&gt; Olo-rW OH P—25 x：I：y：z=46；2：20：32&gt; Olo-rW OH P—25 x:I:y:z=46; 2:20:32

COO Me COOHCOO Me COOH

COO 〇 COO八人f P-26 OH 1 x： I '.'i'.z-Ah. 5:2:19:33. 5 〇 COOH COO^'Y^xr p-27COO 〇 COO eight people f P-26 OH 1 x: I '.'i'.z-Ah. 5:2:19:33. 5 〇 COOH COO^'Y^xr p-27

OHOH

x:y:z=48:22:30x:y:z=48:22:30

y COOH COO&quot; 〇 P-28y COOH COO&quot; 〇 P-28

OH x:y:z=51. 5:18.5:30 200914959OH x:y:z=51. 5:18.5:30 200914959

cooCoo

C〇〇HC〇〇H

cooCoo

'Ί'Ί

x：y：z=45：25：35 〇x:y:z=45:25:35 〇

C〇〇HC〇〇H

ϊο〇-γ-〇ν P_3° OH x：y：z=41：24：35Ϊο〇-γ-〇ν P_3° OH x:y:z=41:24:35

COO ch2ch2-oCOO ch2ch2-o

COO P-31COO P-31

C〇〇H COO&quot;^Y^O OHC〇〇H COO&quot;^Y^O OH

COO x:y:z=39:26:35 〇COO x:y:z=39:26:35 〇

y COOHy COOH

OH P-32 x：y：z=35：30：35 ?i〇Z〇-V-〇V P&quot;33 OH x：y：z=42：28：30 -28 - 200914959OH P-32 x:y:z=35:30:35 ?i〇Z〇-V-〇V P&quot;33 OH x:y:z=42:28:30 -28 - 200914959

coo ch2ch2-oCoo ch2ch2-o

COOHCOOH

OH 〇 P-34 x：y：z=37：28：35OH 〇 P-34 x:y:z=37:28:35

Xcoo ch2ch2-oXcoo ch2ch2-o

COOH 和〇 c〇〇八丫^〇人〆p-35COOH and 〇 c〇〇八丫^〇人〆p-35

x：y：z=39：26：35 -製法_ 前述樹脂（A)能夠藉由至少包含使上述單體（m on 〇mer) 的（共）聚合反應之二階段的製程來製造。 首先，（共）聚合反應的方法沒有特別限制，能夠適當 地選自眾所周知者。例如’聚合的活性種能夠適當地選擇 自由基聚合、陽離子聚合、陰離子聚合及配位聚合等。此 等之中就合成容易且低成本而言，以自由基聚合爲佳。又’ 聚合方法亦沒有特別限制，能夠從眾所周知者之中適當地 選擇。例如能夠適當地選擇塊狀聚合法、懸浮聚合法' ?L 化聚合法及溶液聚合法等。此等之中，以溶液聚合法爲車父 佳。 -分子量- 樹脂（A)之較佳前述共聚物的重量平均分子寥爲 10,000〜10萬，以12,000〜6萬爲更佳’以15，000〜45 萬爲特佳。就樹脂（A)的製造適合性、顯像性而β ’重虞平 -29 - 200914959 均分子量以在前述範圍爲佳。又，就所形成的形狀不容易 崩潰而言、不容易產生交聯不良而言、制顯像時間隙物的 殘渣較少而言’以降低熔融黏度爲佳。 -玻璃轉移溫度- 樹脂（A)之較佳的玻璃轉移溫度（Tg)以 40〜180 °C爲 佳，以4 5〜1 4 0 °C爲更佳，以5 0〜1 3 0 °C爲特佳。玻璃轉移 溫度（Tg)在前述較佳範圍時，能夠得到具有良好的顯像 性、力學強度之光間隙物。 -酸價_ 樹脂（A)之較佳酸價係依照能夠得到的分子結構其較 佳範圍產生變動，通常以20毫克KOH/克以上爲佳，以50 毫克KOH/克以上爲更佳，以70〜130毫克KOH/克爲特佳。 酸價在上述較佳範圍內時，能夠得到具有良好的顯像性、 力學強度之光間隙物。 就能夠得到具有良好的顯像性、力學強度之光間隙物 而言’前述樹脂（A)以玻璃轉移溫度（Tg)爲40〜180。(：且重 量平均分子量爲10,000〜100,000爲佳。 而且，前述樹脂（A)的較佳例子，以組合各自的較佳的 前述分子量、玻璃轉移溫度（Tg)及酸價爲更佳。 從變形恢復率、顯像殘渣及網紋的觀點，在本發明之 樹脂（A)係以在各自各別的共聚合單位具有：在前述側鏈具 有分枝及/或脂環結構之基：X(x莫耳％)、具有酸性基之基： Y(y莫耳％)及具有環氧基之基：乙卜莫耳％)之至少3元共聚 合以上的共聚物爲佳。具體上，係以使構成前述X、y、z -30 - 200914959 之各自的單體至少1個共聚合而構成之共聚物爲佳。 前述樹脂（A)之前述各成分的共聚合組成比係考慮玻 璃轉移溫度及酸價而決定，未可一槪而論，「在側鏈具有分 枝結構及/或環狀結構之基」的組成比以1 〇〜7 0莫耳％爲 佳，以1 5〜6 5莫耳％爲更佳’以2 0〜6 0莫耳％爲特佳。在 側鏈具有分枝及/或脂環結構之基的組成比在前述範圍內 時’能夠得到良好的顯像性，同時影像部對顯像液耐性亦 良好。 又’「在側鏈具有酸性基之基」以5〜7 0莫耳％爲佳， 以10〜60莫耳％爲更佳，以20〜5〇莫耳％特佳。在側鏈具 有酸性基之基的組成比係在前述範圍時，能夠得到良好的 硬化性、顯像性。 又’「在側鏈具有環氧基之基」以1 〇〜7 0莫耳％爲佳， 以20〜70莫耳％爲更佳，以30〜70莫耳％爲特佳。在側鏈 具有乙燦性不飽合基之基的組成比係在前述範圍時，顏料 分散性優良’同時顯像性及硬化特性亦良好。 相對於前述感光性樹脂組成物總固體成分，前述樹脂 (A )的含量以5〜7 0質量％爲佳，以1 0〜5 0質量％爲更佳。 本發明的感光性樹脂組成物亦可含有樹脂（A)以外的樹 脂’但以只含有樹脂（A)爲佳。 -其他的樹脂- 能夠與前述樹脂（A)並用的樹脂，以對鹼性水溶液顯示 潤脹性之化合物爲佳，以對鹼性水溶液具有可溶性之化合 物爲更佳。 200914959 對鹼性水溶液顯示潤脹性或溶解性之樹脂，例如可適 合舉出具有酸性基者，具體上，以在環氧化合物導入乙烯 性不飽和基與酸性基而成的化合物（環氧丙烯酸酯化合 物）、在側鏈具有（甲基）丙烯醯基及酸性基之乙烯系共聚 物、環氧丙烯酸酯化合物與在側鏈具有（甲基）丙烯醯基及 酸性基之乙烯系共聚物的混合物、順丁烯醯胺酸系共聚物 等爲佳。 前述酸性基沒有特別限制，能夠按照目的而適當地選 擇，可舉出例如羧基、磺酸基、磷酸基等，此等之中，從 原料的取得性的觀點，可舉出較佳者爲羧基。 -樹脂（A)與樹脂（A)以外的樹脂之合計含量- 相對於前述感光性樹脂組成物總固體成分，前述樹脂 (A)與能夠並用之其他樹脂之合計含量，以70質量％以下爲 佳，以5 0質量％以下爲更佳。大於70質量％時，會有曝光 敏感度降低的情形。又，前述含量係表示固體成分含量。 -聚合性單體- 本發明的感光性樹脂組成物至少含有具有胺基甲酸酯 基之聚合性單體（B 1 )作爲聚合性單體。 本發明的感光性樹脂組成物藉由至少含有前述聚合單 體（B1)’能夠具有尚變形量。 從高彈性恢復率的觀點，前述具有胺基甲酸酯基之聚 合性單體（B1)以多官能（甲基）丙烯酸酯類爲佳’其中以3〜 1 5個官能爲較佳，以4〜1 5個官能爲更佳’以8〜1 5個官 能爲特佳。藉由使前述具有胺基甲酸酯基之聚合性單體 -32 - 200914959 (B 1 )的官能數在上述範圍，能夠兼具高變形量及高彈性恢 復率，乃是較佳。 又，從高變形量的觀點，前述具有胺基甲酸酯基之聚 合性單體（B 1 )以含有2個以上之胺.基甲酸酯基爲佳，以含 有3個以上爲更佳。藉由使前述具有胺基甲酸酯基之聚合 性單體（B 1 )的胺基甲酸酯基收在上述範圍，能夠在某負荷 具有高變形量，乃是較佳。 在本發明之具有胺基甲酸酯基之聚合性單體（B 1 )係如 下述具體例所示，但是未限定於此等。 在前述具有胺基甲酸酯基之聚合性單體（B1)，具有胺 基甲酸酯鍵之 2官能（甲基）丙烯酸酯類可舉出例如 ACRONIXM-1100、同-1200、同-1210、同-1310、同-1600(以 上、東亞合成（股）製）、R-1000號系列、同-1204、同1211、 同-1213(以上、第一工業製藥（股）製、AH-600、AT-600、 UA- 3 0 6H(以上、共榮社化學（股）製）等。 在前述具有胺基甲酸酯基之聚合性單體（B 1 )，具有胺 基甲酸酯鍵之3官能（甲基）丙烯酸酯類可舉出例如R-1000 號系列、同-1301、同-1302、同-1304、同-1306、同-1308(以 上、第一工業製藥（股）製等。 在前述具有胺基甲酸酯基之聚合性單體（B1)，具有胺 基甲酸酯鍵之 4官能（甲基）丙烯酸酯類可舉出例如 ACRONIX M-1960(東亞合成（股）製）、R-1150(第一工業製藥 (股）製、UN-3320HS(根上工業公司製）、UN-901T(根上工業 公司製）、U-6HA(新中村化學工業公司製）、U-15HA(新中 200914959 村化學工業公司製）、UA-3 2P (新中村化學工業公司製）等。 前述感光性樹脂組成物亦可同時使用具有胺基甲酸酯 基之聚合性單體（B1)及未具有胺基甲酸酯基之具有（甲基） 丙烯酸酯基之聚合性單體（B2)。從相溶性及高變形量的觀 點，具有含胺基甲酸酯基之聚合性單體（B 1 )之含有率係在 總聚合性單體的總質量中，以5〇質量％以上爲佳，以70 質量％以上爲更佳，以75質量％以上爲特佳。 從高彈性模數的觀點，前述未具有胺基甲酸酯基之具 有（甲基）丙烯酸酯基之聚合性單體（B2)以含有2個以上之 不飽和鍵爲佳，以含有4個以上爲較佳，以含有6個以上 爲更佳。 前述未具有胺基甲酸酯基之具有（甲基）丙烯酸酯基之 聚合性單體（B 2)的具體例係如下述所示，但是未限定於此 等。 在前述未具有胺基甲酸酯基之具有（甲基）丙;)；希酸醋基 之聚合性單體（B 2 )，前述多官能（甲基）丙烯酸酯類之中，2 官能（甲基）丙烯酸酯類可舉出例如乙二醇二（甲基）丙，稀酸 酯、丙二醇二（甲基）丙烯酸酯、1，6-己二醇二（甲基）丙稀酸 酯、1，9-壬二醇二（甲基）丙烯酸酯、二甘醇二（甲基）丙稀酸 酯、四甘醇二（甲基）丙烯酸酯、聚乙二醇二（甲基）丙燦酸 酯、聚丙一醇二（甲基）丙稀酸酯及雙本氧基乙醇鲔二（甲基） 丙烯酸酯等。 2官能（甲基）丙烯酸酯類的市售品可舉出例如 ACRONIX M-210、同-240、同-6200(以上、東亞合成（股） -34 - 200914959 製）、K AYARADH DD A、同 HX-220、同 R-604(以上、日本 化藥（股）製）、BISCOAT260、同312、同3 3 5 HP(以上、大阪 有機化學工業（股）製）。 3官能以上的（甲基）丙烯酸酯類的可舉出例如三羥甲 基丙烷三（甲基）丙烯酸酯、新戊四醇三（甲基）丙烯酸酯、新 戊四醇四（甲基）丙烯酸酯、二新戊四醇五（甲基）丙烯酸酯、 二新戊二醇六（甲基）丙烯酸酯、三[2-(甲基）丙烯醯氧基乙 基]磷酸酯等。 3官能以上的（甲基）丙烯酸酯類的市售品可舉出例如 ACRONIX M-3 09、同-400、同-4 0 2、同-4 0 5、同-4 5 0、同 -7100、同- 8030、同-8060、同-1310、同-1600' 同-1960、 同- 8100、同- 8350、同- 8560、同- 9050、ACRONIX TO-1450(以 上、東亞合成（股）製）、KAYARADTMPTA、同 DPHA、同 DPCA-20、同 DPCA-30、同 DPCA-60、同 DPCA-120、同 ΜΑΧ-3510(以上、日本化藥（股）製）、BISCOAT295、同 300、 同3 6 0、同40 0、同GPT、同3ΡΑ(以上、大阪有機化學工 業（股）製）。 在本發明的感光性樹脂組成物，從良好的顯像性及提 高力學強度的觀點，前述聚合性單體（Β 1 )及前述聚合性單 體（Β2)的總量係相對於樹脂（A)l質份，以0.5〜2質量份爲 佳，以〇 . 7〜1 _ 8質量份爲更佳，以〇 . 9〜1 . 5質量份爲特佳。 藉由使前述聚合性單體（Β1)及前述聚合性單體（Β2)的 總量在上述範圍，本發明的感光性樹脂組成物能夠得到具 有良好的顯像性及力學強度之光間隙物。 -35 - 200914959 前述感光性樹脂組成物按照必要能夠含有後述的其他 聚合性單體’聚合性單體（B 1 )、聚合性單體（B 2 )及其他的 聚合性單體之總含量以在前述聚合性單體（B 1 )及前述聚合 性單體（B2)的總含量之範圍內爲佳。 -光聚合引發劑（C)、其他成分- 在本發明’上述聚合性單體以外的其他聚合性單體、 光聚合引發劑（C)及其他成分能夠適合使用構成眾所周知 的組成物之成分。可舉出例如特開2 0 0 6 - 2 3 6 9 6號公報的段 落號碼[〇〇1〇]〜[0020]所記載的成分、或特開2006-64921 號公報的段落號碼[0027]〜[005 3 ]所記載之成分。 前述光聚合引發劑之具體例，以至少含有一種在大約 300奈米〜500奈米的波長區域具有大約50以上的分子吸 光係數之成分者爲佳，可舉出芳香族酮類、咯吩二聚物、 苯偶姻、苯偶姻醚類、多鹵類、鹵化烴衍生物、酮化合物、 酮Η弓化合物、有機過氧化物、硫化合物、六芳基二咪唑、 芳香族鑰鹽及酮肟醚等。 上述之中’以4,4’-雙（二乙胺基）二苯基酮與2-(鄰氯苯 基）-4,5 -二苯咪唑二聚物之組合、4_[對Ν，Ν，-雙（乙氧基羰 基甲基）-2,6-雙（三氯甲基）-s·三阱]、2，4-雙（三氯甲 基）-6-[4-(N，N，-雙（乙氧基羰基甲基）胺基）-3，-溴苯基]-S·三 哄等爲佳。 上述的光聚合引發劑（C)可單獨使用1種，亦可並用2 種以上。 前述光聚合引發劑（C)的含量係相對於樹脂（A)及其他 -36 - 200914959 樹脂的合計100質量％，以0.1〜20質量％爲佳，以0_ 5〜 1 〇質量％爲更佳。 -微粒子（D)- 在前述感光性組成物，以添加微粒子爲佳。前述微粒 子（D)沒有特別限制，能夠按照目的而適當地選擇，例如以 特開2003-302639號公報[0035]〜[0041]所記載的體質顏^斗 爲佳，其中能夠得到具有良好的顯像性、力學強度的光間 隙物之觀點，以膠體二氧化矽爲佳。 前述微粒子（D)的平均粒徑從能夠得到具有高力學強 度的光間隙物之觀點，以5〜5 0奈米爲佳，以1 〇〜4 0奈米 爲更佳，以1 5〜3 0奈米爲特佳。 又’從能夠得到具有高力學強度的光間隙物之觀點， 前述微粒子（D )的含量相對於在本發明之感光性組成物中 的總固體成分之質量比率，以5〜5 0質量％，以丨〇〜4 0質 量％爲更佳’以1 5〜3 0質量。/〇爲特佳。 [圖案化製程] 在本發明之圖案化製程係用以對在支撐體上形成的感 光性樹脂層進行曝光及顯像而圖案化之製程。圖案化製程 的具體例可舉出在特開2〇〇6-64921號公報所記載之段落號 碼[0071]〜[0077]所記載之形成例、或在特開2〇〇6_23696 號公報所記載之段落號碼[0 0 4 0 ]〜[〇 〇 5 1 ]所記載之製程 等，亦能夠作爲本發明的較佳例子。 以下說明在圖案化製程之曝光及顯像。 (曝光及顯像） -37 - 200914959 在形成有上述基板的感光性樹脂層的上方配置有規定 光罩’隨後使該光罩、熱塑性樹脂層、及中間層介於中間， 從光罩的上方曝光’接著使用顯像液進行顯像，並進行圖 案化製程。 在此’前述曝光的光源若係能夠對感光性樹脂層照射 能夠硬化的波長區域的光線（例如3 6 5奈米、4 0 5奈米等） 者時’可以適當地選定使用。具體上，可舉出的有超高壓 水銀燈、高壓水銀燈 '鹵化金屬燈等。曝光量通常爲5〜 200mJ/cm2左右，以左右爲佳。 又’前述顯像液沒有特別限定，能夠選用特開平 5 -72724號公報所記載之物等通常的顯像液。又，顯像液係 以使感光性樹脂層進行溶解型顯像舉動爲佳，例如以〇 〇 5 〜5旲耳/升的濃度含有pKa = 7〜13的化合物之物爲佳，亦 可更少量添加與水具有混合性之有機溶劑。 與水具有混合性之有機溶劑可舉出的有甲醇、乙醇、 2-丙醇、1-丙醇、丁醇、二丙酮醇、乙二醇單甲基醚、乙 二醇一乙基醚、乙二醇一正丁基醚、苄醇、丙酮、甲基乙 基酮、環己酮、ε-己內酯、丁內酯、二甲基甲醯胺、 二甲基乙醯胺、六甲基磷醯胺、乳酸乙酯、乳酸甲酯、£ _ 己內醯胺及N-甲基吡咯啶酮等。該有機溶劑的濃度以〇.工 質量％〜30質量％爲佳。 又’在上述顯像液，能夠更添加通常的界面活性劑。 界面活性劑的濃度以0.0 1質量％〜！ 〇質量％爲佳。 顯像的方式能夠使用浸置式顯像、噴淋顯像、噴淋&amp; -38- 200914959 旋轉顯像、浸漬顯像等任一種方法均可。 在此’說明上述噴淋顯像時，藉由噴淋將顯像液噴塗 在曝光後的感光性樹脂層，能夠夠除去未硬化部分。又， 以在顯像前藉由噴淋等噴吹感光性樹脂層的溶解性低之鹼 性液，來預先除去熱塑性樹脂層、中間層等爲佳。又，在 顯像後，以藉由噴淋噴塗洗淨液等，邊使用刷子等擦拭、 邊去除顯像殘澄爲佳。 顯像液的液溫以20°c〜4 0°c爲佳，又，顯像液的pH 以8〜1 3爲佳。 (後曝光） 從控制影像的剖面形狀、影像的硬度、控制影像表面 凹凸、控制影像的膜減量等之觀點，以在顯像與後述的熱 處理之間實施後曝光爲佳。使用作爲後曝光之光源可舉出 特開2 0 0 5 - 3 8 6 1號公報的段落號碼0 0 7 4所記載之超高壓水 銀燈、高壓水銀燈及鹵化金屬燈等，從設備之簡單化及省 電力的觀點，後曝光以來自超高壓水銀燈或鹵化金屬燈的 光線未透過曝光光罩而直接照射在基板爲佳。可以按照必 要從兩面實施。又，曝光量亦可以按照上述控制目的，在 上面：1〇〇至2000mJ /平方公分、下面：100至2000 mJ /平 方公分的範圍適當地調整。 (熱處理） 藉由熱處理來使本發明的感光性樹脂組成物所含有的 單體或交聯劑反應’能夠確保影像的硬度。熱處理的溫度 以在1 5 0 t至2 5 0 °C的範圍爲佳。1 5 0 °C以下時硬度變爲不 -39 - 200914959 充分，2 5 0 °C以上時與基板的黏附性容易變差。熱處理的時 間以1 〇分鐘至1 5 0分鐘。小於1 〇分鐘時硬度不足，大於 1 5 0分鐘時黏附性容易變差。 因爲依照本發明的光間隙物之製法所製造的光間隙物 係使用本發明的感光性樹脂組成物所形成’在塑性變形時 顯示高變形恢復率（較佳是7 5 %以上）且具有充分的力學特 性之緣故，用以將液晶胞的液晶胞厚度保持一定係有效 的。因此，該光間隙物能夠適合使用於因液晶胞的液晶胞 厚度的變動而容易產生顯示不均之顯示裝置。 依照本發明的光間隙物之製法所製造的光間隙物之變 形恢復率，係將2 0微米4的光間隙物使用5 0微米0的圓 錘台壓頭，以負荷速度0.1 45 gf/秒、最大負荷50mN、保持 時間5秒、測定溫度2 3 °C的條件，進行負荷-除負荷測定時 之變形恢復率。 最大荷重爲5 0 mN時，以8 5 %以上〜小於9 0 %爲佳， 以90%以上爲更佳。 變形恢復率在前述範圍內時，能夠經得起來自外部的 壓縮強度，且在面板形成時能夠防止性變形而得到需要厚 度的液晶層。結果，能夠消除因厚度變化而產生的顯示不 均，且能夠得到高畫質影像。 本發明的光間隙物，能夠在形成含有黑色矩陣等的黑 色遮蔽部及著色像素等的著色部之彩色濾光片後形成。 前述黑色遮蔽部、著色部及光間隙物，能夠任意地組 合塗布感化性組成物之塗布法及使用轉印材料（具有由感 -40 - 200914959 化性組成物所構成的感光性樹脂層）之轉印法來形成。 前述黑色遮蔽部' 著色部及前述光間隙物能夠由各自 感光性組成物所形成，具體上係例如藉由在基板上直接塗 布前述感化性組成物而形成感光性樹脂層後，進行曝光、 顯像’來圖案狀地形成前述黑色遮蔽部及著色部，隨後， 藉由使用在與前述基板不同的另外基板（暫時支撐體）上設 置另外液體的前述感化性組成物來形成感光性樹脂層所製 成的硬化性樹脂轉印材料，並使該感光性樹脂轉印材料黏 附於形成有黑色遮蔽部及著色部之前述基板而將感光性樹 脂層轉印後’進行曝光、顯像，能夠圖案狀地形成光間隙 物。如此進行，能夠製造設置有光間隙物之彩色濾光片。 &lt;液晶顯示器用基板&gt; 本發明的液晶顯示器用基板係具備藉由前述本發明的 光間隙物之製法所得到的光間隙物者。光間隙物以形成在 黑色矩陣（形成於支撐體上）等的顯示用遮光部的上面或 TFT等的驅動元件上爲佳。又，在黑色矩陣等顯示用遮光 部或T F T等的驅動元件與光間隙物之間亦可存在有〗τ 〇等 的透明導電層（透明電極）或聚醯亞胺等的液晶配向膜。 例如’光間隙物係設置在顯示用遮光部（黑色矩陣等） 或驅動元件上面時’藉由以覆蓋預先配設在支撐體之顯示 用遮光部（黑色矩陣等）或驅動元件的方式，將例如感光性 樹脂轉印薄膜的感光性樹脂層層壓在支撐體面，並剝離轉 印來形成感光性樹脂層後，藉由將其施加曝光、顯像、加 熱處理等形成光間隙物，能夠製造本發明的液晶顯示器用 -41 - 200914959 基板。 在本發明的液晶顯示器用基板，亦可按照必要設置紅 色（R)、綠色（G)、藍色（B)3色等的著色像素。 &lt;液晶顯不兀件&gt; 能夠設置前述本發明的液晶顯示器用基板而構成液晶 顯示元件。液晶顯示元件之一可舉出在至少一側係光透射 性的一對支撐體（包含本發明的液晶顯示器用基板）之間， 至少具備液晶層及液晶驅動構件（包含單純矩陣驅動方式 及主動驅動方式）者。 此時，本發明的液晶顯示器用基板能夠以具有複數個 RGB像素群且構成該等像素群之各像素係互相藉由黑色矩 陣隔離而作爲彩色濾光片基板的方式來構成。因爲在該彩 色濾光片基板設置有高度均句且變形恢復性優良的光間隙 物，具備有該彩色濾光片基板而成之液晶顯示元件能夠抑 制在彩色濾光片基板與相向基板間產液晶胞間隙不均（液 晶胞厚度變動），能夠有效地防止產生顏色不均等顯示不 _ 均。藉此，所製造的液晶顯示元件能夠顯示鮮明的影像。 又，液晶顯示元件的另外態樣係在至少一側係光透射 性的一對支撐體（包含本發明的液晶顯示器用基板）之間， 至少具備液晶層及液晶驅動構件，前述液晶驅動構件具有 主動元件（例如TFT)，並且一對基板之間係藉由高度均勻 且變形恢復性優良的光間隙物來控制規定寬度而構成者。 此時，本發明的液晶顯示器用基板亦具有複數個RGB 像素群且構成該等像素群之各像素係互相藉由黑色矩陣隔 -42 - 200914959 離而作爲彩色濾光片基板的方式來構成。 在本發明能夠使用的液晶可舉出向列液晶、膽固醇、液 晶、矩列液晶及鐵電液晶。 又，前述彩色瀘光片基板的前述像素群可以由呈現相 異顏色的2色像素所構成，亦可由3色像素、4色像素所 構成者。例如3色時能夠由紅色（R)、綠色（G)、藍色（B)之 3色相所構成。配置R G B 3色的像素群時，以配置馬賽克 型、三角型等爲佳，配置4色以上的像素群時，係任何配 置都可以。彩色濾光片基板的製造例如可以在形成2色以 上的像素群後形成黑色矩陣，亦可相反地，在形成黑色矩 陣後形成像素群。形成R G B像素能夠參考特開2 0 0 4 - 3 4 7 8 3 1 號公報等。 &lt;液晶顯示裝置&gt; 本發明的液晶顯示裝置係具備前述液晶顯示裝置用基 板而構成者。又，本發明的液晶顯示裝置係設置有前述液 晶顯示元件而構成者。亦即如前述，在相向配置而成的一 對基板間，並藉由本發明的光間隙物之製法所製造的光間 隙物控制規定寬度，且在經控制的間隙封入液晶材料（將封 入部位稱爲液晶層）而構成，液晶層的厚度（液晶胞厚度）係 保持在需要的均勻厚度。 在液晶顯不裝置之液晶顯币模式可適合舉出STN型、 TN型、GH型、ECB型、鐵電性液晶、反鐵電性液晶、VA 型、IPS型、OCB型、ASM型及其他各種。其中，在本發 明的液晶顯示裝置，從最有效地達成本發明的效果之觀 -43 - 200914959 點，以因液晶胞的液晶胞厚度變動而容易產生顯示不均之 顯示模式爲佳。以液晶胞厚度爲2〜4微米之VA型顯示模 式、IPS型顯示模式、OCB型顯示模式所構成者爲佳。 本發明的液晶顯示裝置的基本構成態樣可舉出以下 者，包含（a)將使薄膜電晶體（TFT)等的驅動元件與像素電 極（導電層）配列形成的驅動側基板、及具備相對電極（導電 層）而成相對基板’使光間隙物介於其間而相對配置，並在 其間隙部4入液晶材料而構成者，及（b)將驅動基板與具備 相對電極（導電層）而成相對基板，使光間隙物介於其間而 相對配置’並在其間隙部封入液晶材料而構成者等，本發 明的液晶顯示裝置能夠適合應用於各種液晶顯示機器。 關於液晶顯示裝置係例如在「次世代液晶顯示裝置技 術（內田龍男編集、側工業調查會、1 9 9 4年發行）」之記載。 本發明的液晶顯示裝置除了具備本發明的液晶顯示元件以 外沒有特別限制’例如可以是前述在「次世代液晶顯示裝 置技術」所記載的各種方式的液晶顯示裝置之構成。其中 特別是用以構成彩色TFT方式的液晶顯示裝置最有效。關 於彩色TFT方式的液晶顯示裝置，係例如在「彩色TFT液 晶顯示器（共立出版（股）、1996年發行）之記載。 本發明的液晶顯示裝置除了具備前述本發明的液晶顯 示器用光間隙物以外’通常能夠使用電極基板、偏光薄膜、 相位差薄膜、背光板、間隙物、視野角補償薄膜、抗反射 薄膜、光擴散薄膜及防眩薄膜等各種構件而構成。關於此 等構件係例如在「1 994年液晶顯示器周邊材料、化學品市 -44- 200914959 場（島健太郎、CMC(股）、1994年發行）」、「2003年液晶相 關市場的現狀及將來展望（下卷）（表良吉 '富士 CHIMERA 總硏（股）、2〇〇3年發行）」之記載。 [實施例] 以下，藉由實施例來更具體地說明本發明，但是只要 未脫離其主旨’未限定於以下的實施例。又，若未預先告 知，「％」及「份」係質量基準。 雖然在本實施例係以轉印法及L E D背光板的組合爲中 心而詳細敘述’但是在本發明亦可藉由使用狹縫塗布器之 塗布法來實施’又，背光板亦可使用冷陰極管來構成。 前述化合物結構P - 1所示樹脂（A)的合成係如下述合成 例1所示。 (合成例1) 在反應容器中預先添加8.57份1-甲氧基-2-丙基乙酸 酯（MMPGAc、DAICEL化學工業（股）製）並升溫至90°C，且 在氮氣環境下、90 °C的反應容中以2小時滴加由6.27份甲 基丙烯酸異丙酯、5 . 1 5份甲基丙烯酸、1份偶氮系聚合引 發劑（和光純藥公司製、V- 6 0 1)及8 · 5 7份1 -甲氧基-2 -丙醇 所構成的混合溶液。滴加後使其反應4小時而得到丙烯酸 樹脂溶液。 接著，在前述丙烯酸樹脂溶液添加0.0 2 5份氫醌一甲 基醚及〇 . 〇 8 4份溴化四乙銨後，以2小時滴加5 · 4 1份甲基 丙烯酸環氧丙酯。滴加後邊吹入空氣邊在9 0 °C反應4小時 後，以固體成分濃度成爲45 %的方式添加溶劑MMPGAC調 200914959 製，來得具有不飽和基之前述化合物結構p -1所 溶液。 又，前述化合物結構P -1所示樹脂的分子量 示重量平均分子量，且前述分子量的測定方法係 透過層析儀（GPC)來測定。 接著，前述化合物結構P-2、P-3、P-7、P-8 P - 1 2〜P 1 5所示樹脂的合成例係如下述合成例2 1 〇所示。 (合成例2) 前述化合物結構P - 2所示樹脂的合成例係如 前述化合物結構Ρ-2所示樹脂係除了以前述 構Ρ-2中的x:y:z成爲40莫耳％: 25莫耳％: 35 方式來變更甲基丙烯酸第三丁酯、甲基丙烯酸及 酸環氧丙酯的添加量以外，依照合成例1同樣 成’來得到具有不飽和基之前述化合物結構P - 2 脂溶液。 (合成例3) 前述化合物結構P - 3所示樹脂的合成例3係 行。 前述化合物結構P - 3所示樹脂係除了以前述 構P-3中的x:y:z成爲4〇莫耳％: 20莫耳％: 40 方式來變更甲基丙烯酸峩丁酯、甲基丙烯酸及甲 環氧丙醋的添加虽以外，依照合成例丨同樣的方 來得到具有不飽和基之前述化合物結構p_3所示 示之樹脂 Mw係表 吏用凝膠 、P- 10、 〜合成例 下進行。 化合物結 莫耳％的 甲基丙烯 的方法合 所示之樹 如以下進 化合物結 莫耳％的 基丙烯酸 法合成’ 之樹脂溶 -46 - 200914959 液。 (合成例4) 前述化合物結構P - 7所示樹脂的合成例4係如以下進 行。 前述P-7所示樹脂係除了以前述化合物結構P-7中的 x:y:z成爲40莫耳％: 25莫耳％: 35莫耳％的方式來變更甲 基丙烯酸異丙酯、甲基丙烯酸及CYCLOMERM-200(DAICEL 化學工業（股）製）的添加量以外，依照合成例1同樣的方法 合成’來得到具有不飽和基之前述化合物結構P - 7所示之 樹脂溶液。 (合成例5) 前述化合物結構P - 8所示樹脂的合成例5係如以下進 行。 前述P - 8所示樹脂係除了以前述化合物結構P - 8中的 x:y:z成爲35莫耳％: 30莫耳％: 35莫耳％的方式來變更甲x: y: z = 39: 26: 35 - Process _ The above-mentioned resin (A) can be produced by a process comprising at least two stages of (co)polymerization of the above monomer (m on 〇mer). First, the method of the (co)polymerization reaction is not particularly limited, and can be appropriately selected from those skilled in the art. For example, the polymerized active species can be appropriately selected from radical polymerization, cationic polymerization, anionic polymerization, and coordination polymerization. Among these, radical polymerization is preferred in terms of ease of synthesis and low cost. Further, the polymerization method is not particularly limited, and can be appropriately selected from among those skilled in the art. For example, a bulk polymerization method, a suspension polymerization method, a ?L polymerization method, a solution polymerization method, or the like can be appropriately selected. Among these, the solution polymerization method is the best for the car. - Molecular weight - The preferred copolymer of the resin (A) has a weight average molecular weight of 10,000 to 100,000, more preferably 12,000 to 60,000, and particularly preferably 15,000 to 450,000. In terms of the suitability and development of the resin (A), β ’ 虞 -29 - 200914959 The average molecular weight is preferably in the above range. Further, it is preferable that the formed shape is less likely to collapse, and that the cross-linking defect is less likely to occur, and the residue of the spacer is less when the image is formed. - Glass transition temperature - The preferred glass transition temperature (Tg) of the resin (A) is preferably 40 to 180 ° C, more preferably 4 5 to 1 40 ° C, and 50 to 1 30 ° C. It is especially good. When the glass transition temperature (Tg) is in the above preferred range, an optical spacer having good developability and mechanical strength can be obtained. - Acid value _ The preferred acid value of the resin (A) varies depending on the preferred range of the molecular structure that can be obtained, and is usually preferably 20 mgKOH/g or more, more preferably 50 mgKOH/g or more. 70~130 mg KOH/g is especially good. When the acid value is within the above preferred range, an optical spacer having good developability and mechanical strength can be obtained. In the case of obtaining an optical spacer having good developability and mechanical strength, the resin (A) has a glass transition temperature (Tg) of 40 to 180. (The weight average molecular weight is preferably 10,000 to 100,000. Further, as a preferred example of the above resin (A), it is more preferable to combine the respective preferred molecular weight, glass transition temperature (Tg) and acid value. From the viewpoints of recovery rate, development residue, and texture, the resin (A) of the present invention has a group having a branching and/or alicyclic structure in the side chain in each of the respective copolymerization units: X ( Preferably, the copolymer having an acidic group: Y (y mole %) and an epoxy group (ethyl bromide) are at least 3 copolymerized copolymers. Specifically, a copolymer composed of at least one of the monomers constituting the above X, y, z -30 - 200914959 is preferably used. The copolymerization composition ratio of each of the above-mentioned components of the resin (A) is determined in consideration of the glass transition temperature and the acid value, and it is not unanimous that "the base chain has a branching structure and/or a cyclic structure." The composition ratio is preferably 1 〇 to 7 0 mol%, and 1 5 to 6 5 mol% is more preferable to 2 0 to 6 0 mol%. When the composition ratio of the branch having a branching and/or alicyclic structure in the side chain is within the above range, good development performance can be obtained, and the image portion is also excellent in resistance to the developing solution. Further, the "base having an acidic group in the side chain" is preferably 5 to 70 mol%, more preferably 10 to 60 mol%, and most preferably 20 to 5 mol%. When the composition ratio of the group having an acidic group in the side chain is within the above range, good hardenability and developability can be obtained. Further, the "base having an epoxy group in the side chain" is preferably from 1 〇 to 70% by mole, more preferably from 20 to 70 mol%, and particularly preferably from 30 to 70 mol%. When the composition ratio of the group having an ethylenic unsaturated group in the side chain is in the above range, the pigment dispersibility is excellent, and the development and curing properties are also good. The content of the resin (A) is preferably from 5 to 70% by mass, more preferably from 10 to 50% by mass, based on the total solid content of the photosensitive resin composition. The photosensitive resin composition of the present invention may contain a resin other than the resin (A), but it is preferred to contain only the resin (A). - Other resin - A resin which can be used in combination with the above-mentioned resin (A) is preferably a compound which exhibits swellability to an alkaline aqueous solution, and more preferably a compound which is soluble in an aqueous alkaline solution. 200914959 A resin which exhibits swellability or solubility in an aqueous alkaline solution, for example, a compound having an acidic group, specifically, an ethylenically unsaturated group and an acidic group introduced into an epoxy compound (epoxy acrylic acid) An ester compound), an ethylene-based copolymer having a (meth)acrylonyl group and an acidic group in a side chain, an epoxy acrylate compound, and a vinyl copolymer having a (meth)acrylonyl group and an acidic group in a side chain. A mixture, a maleic acid-based copolymer or the like is preferred. The acidic group is not particularly limited, and can be appropriately selected according to the purpose, and examples thereof include a carboxyl group, a sulfonic acid group, and a phosphoric acid group. Among these, a carboxyl group is preferred from the viewpoint of availability of a raw material. . - the total content of the resin (A) and the resin other than the resin (A) - the total content of the resin (A) and the other resin which can be used in combination is 70% by mass or less based on the total solid content of the photosensitive resin composition Preferably, it is preferably 50% by mass or less. When it is more than 70% by mass, there is a case where the exposure sensitivity is lowered. Further, the above content means a solid content. - Polymerizable monomer - The photosensitive resin composition of the present invention contains at least a polymerizable monomer (B 1 ) having a urethane group as a polymerizable monomer. The photosensitive resin composition of the present invention can have a deformation amount by containing at least the above-mentioned polymerized monomer (B1)'. The above-mentioned polymerizable monomer (B1) having a urethane group is preferably a polyfunctional (meth) acrylate from the viewpoint of a high elastic recovery ratio, wherein 3 to 15 functions are preferred, 4 to 1 5 functionalities are better - 8 to 1 5 functionalities are particularly preferred. By having the functional group of the urethane group-containing polymerizable monomer -32 - 200914959 (B 1 ) in the above range, it is preferable to have both a high deformation amount and a high elastic recovery ratio. Further, from the viewpoint of the high amount of deformation, the polymerizable monomer (B 1 ) having a urethane group preferably contains two or more amine groups, and more preferably three or more. . By setting the urethane group of the urethane group-containing polymerizable monomer (B 1 ) in the above range, it is possible to have a high deformation amount at a certain load, which is preferable. The polymerizable monomer (B 1 ) having a urethane group in the present invention is as shown in the following specific examples, but is not limited thereto. The bifunctional (meth) acrylate having a urethane group-containing polymerizable monomer (B1) and having a urethane bond may, for example, be ACRONIXM-1100, homo-1200, and -1210. , the same -1310, the same -1600 (above, East Asia Synthetic (share) system), R-1000 series, the same -1204, the same 1211, the same -1213 (above, the first industrial pharmaceutical (share) system, AH-600 , AT-600, UA- 3 0 6H (above, manufactured by Kyoeisha Chemical Co., Ltd.), etc. The above-mentioned polymerizable monomer (B 1 ) having a urethane group has a urethane bond Examples of the trifunctional (meth) acrylates include R-1000 series, the same -1301, the same -1302, the same -1304, the same -1306, the same -1308 (above, the first industrial pharmaceutical company) In the above-mentioned polymerizable monomer (B1) having a urethane group, a tetrafunctional (meth) acrylate having a urethane bond may, for example, be ACRONIX M-1960 (East Asia Synthesis) ), R-1150 (First Industrial Pharmaceutical Co., Ltd., UN-3320HS (manufactured by Kokusai Industrial Co., Ltd.), UN-901T (manufactured by Kokusai Industrial Co., Ltd.), U-6HA (manufactured by Shin-Nakamura Chemical Co., Ltd.), U-15HA (manufactured by Shin-mura 200914959, Ltd.), UA-3 2P (manufactured by Shin-Nakamura Chemical Co., Ltd.), etc. The photosensitive resin composition may also use a polymerizable monomer having a urethane group. (B1) and a polymerizable monomer (B2) having a (meth) acrylate group having no urethane group, and having an urethane group-containing polymerization from the viewpoint of compatibility and high deformation amount The content of the monomer (B 1 ) is preferably 5% by mass or more based on the total mass of the total polymerizable monomer, more preferably 70% by mass or more, and particularly preferably 75% by mass or more. In view of the high elastic modulus, the polymerizable monomer (B2) having a (meth) acrylate group having no urethane group as described above preferably contains two or more unsaturated bonds, and contains four or more. More preferably, it is more preferably 6 or more. Specific examples of the (meth) acrylate group-containing polymerizable monomer (B 2 ) having no urethane group described above are as follows, but It is not limited to this. In the foregoing, it does not have a urethane group and has (meth) propyl;); The polymerizable monomer (B 2 ), and among the polyfunctional (meth) acrylates, for example, a bifunctional (meth) acrylate may, for example, be ethylene glycol di(methyl) propyl or a dilute ester. , propylene glycol di(meth) acrylate, 1,6-hexanediol di(meth) acrylate, 1,9-nonanediol di(meth) acrylate, diethylene glycol di(methyl) Acrylate, tetraethylene glycol di(meth)acrylate, polyethylene glycol di(methyl)propanoate, polypropanol di(meth)propacrylate, and di-oxyoxyethanol (Methyl) acrylate, etc. Commercial products of the bifunctional (meth) acrylates include, for example, ACRONIX M-210, homo-240, homo-6200 (above, East Asia Synthetic Co., Ltd. -34 - 200914959), K AYARADH DD A, and the same HX-220, the same R-604 (above, Nippon Kayaku Co., Ltd.), BISCOAT260, 312, and 3 3 5 HP (above, Osaka Organic Chemical Industry Co., Ltd.). Examples of the trifunctional or higher (meth) acrylates include trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, and pentaerythritol tetra(methyl). Acrylate, dipentaerythritol penta (meth) acrylate, di neopentyl glycol hexa (meth) acrylate, tris[2-(methyl) propylene methoxyethyl] phosphate, and the like. Commercial products of a trifunctional or higher (meth) acrylate may, for example, be ACRONIX M-3 09, the same -400, the same - 4 0 2, the same - 4 0 5 , the same - 4 50 , the same - 7100 , the same - 8030, the same -8601, the same -1310, the same -1600' with -1960, the same - 8100, the same - 8350, the same - 8560, the same - 9050, ACRONIX TO-1450 (above, East Asia Synthetic (share) system ), KAYARADTM PTA, the same DPHA, the same DPCA-20, the same DPCA-30, the same DPCA-60, the same DPCA-120, the same -3510 (above, Nippon Chemical Co., Ltd.), BISCOAT295, the same 300, the same 3 60, with 40 0, with GPT, with 3 ΡΑ (above, Osaka Organic Chemical Industry Co., Ltd.). In the photosensitive resin composition of the present invention, the total amount of the polymerizable monomer (Β 1 ) and the polymerizable monomer (Β2) is relative to the resin (A) from the viewpoint of good developability and improvement of mechanical strength. l parts by mass, preferably 0.5 to 2 parts by mass, preferably 7. 7~1 _ 8 parts by mass, to 〇. 9~1. 5 parts by mass is particularly good. When the total amount of the polymerizable monomer (Β1) and the polymerizable monomer (Β2) is in the above range, the photosensitive resin composition of the present invention can obtain a light spacer having good developability and mechanical strength. . -35 - 200914959 The photosensitive resin composition may contain a total content of another polymerizable monomer 'polymerizable monomer (B 1 ), a polymerizable monomer (B 2 ), and other polymerizable monomers to be described later as necessary. It is preferably in the range of the total content of the polymerizable monomer (B 1 ) and the polymerizable monomer (B2). - Photopolymerization Initiator (C) and Other Components - The polymerizable monomer, photopolymerization initiator (C) and other components other than the above polymerizable monomer of the present invention can be suitably used as components constituting a well-known composition. For example, the components described in the paragraph numbers [〇〇1〇] to [0020] of JP-A-2000- 2 3 6 9 6 or the paragraph number of [0027] in JP-A-2006-64921 ~ [005 3 ] The ingredients described. The specific example of the photopolymerization initiator is preferably one containing at least one molecular absorption coefficient of about 50 or more in a wavelength region of about 300 nm to 500 nm, and examples thereof include aromatic ketones and azoles. Polymer, benzoin, benzoin ether, polyhalogen, halogenated hydrocarbon derivative, ketone compound, ketone oxime compound, organic peroxide, sulfur compound, hexaaryldiimidazole, aromatic key salt and ketone Ether ether and the like. Among the above, '4,4'-bis(diethylamino)diphenyl ketone and 2-(o-chlorophenyl)-4,5-dibenzimidazole dimer, 4_[pair, Ν ,-bis(ethoxycarbonylmethyl)-2,6-bis(trichloromethyl)-s.trim], 2,4-bis(trichloromethyl)-6-[4-(N, N,-bis(ethoxycarbonylmethyl)amino)-3,-bromophenyl]-S.triterpene or the like is preferred. The photopolymerization initiator (C) may be used singly or in combination of two or more. The content of the photopolymerization initiator (C) is preferably from 0.1 to 20% by mass, more preferably from 0 to 5 to 1% by mass, based on 100% by mass of the total of the resin (A) and other -36 - 200914959 resins. . - Fine Particles (D) - In the photosensitive composition described above, it is preferred to add fine particles. The fine particles (D) are not particularly limited, and can be appropriately selected according to the purpose. For example, it is preferable to use the physical properties described in JP-A-2003-302639 [0035] to [0041], and it is possible to obtain a good display. From the viewpoint of optical and mechanical strength optical spacers, colloidal cerium oxide is preferred. The average particle diameter of the fine particles (D) is preferably from 5 to 50 nm from the viewpoint of obtaining a light spacer having high mechanical strength, and more preferably from 1 to 400 nm, and from 1 to 5 0 nano is a special. Further, from the viewpoint of obtaining a light spacer having high mechanical strength, the mass ratio of the fine particles (D) to the total solid content in the photosensitive composition of the present invention is 5 to 50% by mass. Take 丨〇~40% by mass for better 'to 1 5~3 0 quality. /〇 is especially good. [Patterning Process] The patterning process of the present invention is a process for patterning and developing a photosensitive resin layer formed on a support. Specific examples of the patterning process are described in the paragraphs [0071] to [0077] described in JP-A No. 6-64921, or in JP-A-6-23696. The process described in the paragraph numbers [0 0 4 0 ] to [〇〇5 1 ] can also be a preferred example of the present invention. The exposure and development in the patterning process are described below. (Exposure and development) -37 - 200914959 A predetermined mask is placed above the photosensitive resin layer on which the substrate is formed. Then, the mask, the thermoplastic resin layer, and the intermediate layer are interposed therebetween, from above the mask. The exposure was followed by development using a developing solution and a patterning process. Here, when the light source to be exposed is capable of irradiating the photosensitive resin layer with light (for example, 365 nm, 405 nm, etc.) in a wavelength region which can be cured, it can be appropriately selected and used. Specifically, there may be mentioned an ultrahigh pressure mercury lamp, a high pressure mercury lamp, a halogenated metal lamp, and the like. The exposure amount is usually about 5 to 200 mJ/cm2, preferably about left and right. Further, the developing liquid is not particularly limited, and a usual developing liquid such as the one described in JP-A-5-72724 can be used. Further, it is preferable that the developing liquid layer is subjected to a dissolution type developing action, and for example, a compound having a pKa of 7 to 13 at a concentration of 〇〇5 to 5 旲/liter is preferable, or may be more preferable. A small amount of an organic solvent which is miscible with water is added. Examples of the organic solvent which is miscible with water include methanol, ethanol, 2-propanol, 1-propanol, butanol, diacetone alcohol, ethylene glycol monomethyl ether, and ethylene glycol monoethyl ether. Ethylene glycol mono-n-butyl ether, benzyl alcohol, acetone, methyl ethyl ketone, cyclohexanone, ε-caprolactone, butyrolactone, dimethylformamide, dimethylacetamide, hexa Phosphonamide, ethyl lactate, methyl lactate, £_caprolactam, and N-methylpyrrolidone. The concentration of the organic solvent is preferably from 3% by mass to 30% by mass. Further, in the above developing solution, a usual surfactant can be further added. The concentration of the surfactant is 0.01% by mass~! 〇% by mass is preferred. The development method can be performed by any method such as dip-type development, spray development, spray &amp; -38- 200914959 rotary development, immersion imaging, and the like. Here, when the above-described shower development is described, the developer liquid is sprayed on the exposed photosensitive resin layer by spraying, whereby the unhardened portion can be removed. In addition, it is preferred to remove the thermoplastic resin layer, the intermediate layer, and the like in advance by spraying the alkali liquid having low solubility of the photosensitive resin layer by spraying or the like before the development. Further, after the development, it is preferable to use a brush or the like to wipe the cleaning liquid by spraying or the like while removing the development residue. The liquid temperature of the developing liquid is preferably from 20 ° C to 40 ° C, and the pH of the developing liquid is preferably from 8 to 13. (post-exposure) From the viewpoints of controlling the cross-sectional shape of the image, the hardness of the image, controlling the unevenness of the image surface, and controlling the film amount of the image, it is preferable to perform post-exposure between the development and the heat treatment to be described later. As the light source for the post-exposure, an ultrahigh pressure mercury lamp, a high pressure mercury lamp, a halogenated metal lamp, and the like described in the paragraph No. 0 0 7 of JP-A-2005- 3 8 6 1 can be used, and the simplification of the device is as follows. From the viewpoint of power saving, post-exposure is preferably performed by directly irradiating the substrate with light from an ultrahigh pressure mercury lamp or a halogenated metal lamp without passing through an exposure mask. It can be implemented from both sides as necessary. Further, the exposure amount may be appropriately adjusted in accordance with the above control purpose in the range of 1 〇〇 to 2000 mJ / cm 2 and the following: 100 to 2000 mJ / square centimeter. (Heat treatment) The monomer or the crosslinking agent contained in the photosensitive resin composition of the present invention is reacted by heat treatment to ensure the hardness of the image. The temperature of the heat treatment is preferably in the range of from 150 to 250 °C. When the hardness is below 150 °C, the hardness is not -39 - 200914959. When the temperature is above 250 °C, the adhesion to the substrate is likely to be deteriorated. The heat treatment time is from 1 Torr to 155 minutes. When the hardness is less than 1 minute, the hardness is insufficient, and when it is more than 150 minutes, the adhesion is likely to be deteriorated. The optical spacer produced by the method for producing an optical spacer according to the present invention is formed by using the photosensitive resin composition of the present invention to exhibit a high deformation recovery rate (preferably 75% or more) and sufficient in plastic deformation. The mechanical properties of the liquid crystal cell to maintain a certain thickness of the liquid crystal cell is effective. Therefore, the optical spacer can be suitably used for a display device which is liable to cause display unevenness due to variations in the thickness of the liquid crystal cell of the liquid crystal cell. The deformation recovery rate of the optical spacer manufactured by the method for fabricating the optical spacer according to the present invention is to use a 50 μm 0 round hammer indenter of 20 μm 4 optical spacer at a load speed of 0.1 45 gf/sec. The maximum load of 50 mN, the holding time of 5 seconds, and the measurement of the temperature of 23 ° C, and the deformation recovery rate at the time of load-removal load measurement. When the maximum load is 50 mN, it is preferably 85% or more to less than 90%, and more preferably 90% or more. When the deformation recovery ratio is within the above range, the compressive strength from the outside can be withstood, and the liquid crystal layer having a desired thickness can be obtained while preventing deformation at the time of forming the panel. As a result, display unevenness due to thickness variation can be eliminated, and a high-quality image can be obtained. The optical spacer of the present invention can be formed after forming a color filter including a black mask portion such as a black matrix or a coloring portion such as a coloring pixel. The black shielding portion, the colored portion, and the optical spacer can be arbitrarily combined with a coating method in which a sensory composition is applied and a transfer material (a photosensitive resin layer having a composition of a composition of -40 - 200914959) Transfer method to form. The black shielding portion' colored portion and the optical spacer can be formed of the respective photosensitive compositions. Specifically, for example, the photosensitive composition layer is formed by directly applying the inductive composition on the substrate, and then exposed and exposed. The black masking portion and the coloring portion are formed in a pattern shape, and then the photosensitive resin layer is formed by using the above-described inductive composition in which another liquid is provided on another substrate (temporary support) different from the substrate. The curable resin transfer material is formed, and the photosensitive resin transfer material is adhered to the substrate on which the black shielding portion and the colored portion are formed, and the photosensitive resin layer is transferred, and then exposed and developed to be patterned. The optical spacers are formed in a shape. In this way, a color filter provided with a light spacer can be manufactured. &lt;Substrate for Liquid Crystal Display&gt; The substrate for liquid crystal display of the present invention includes the optical spacer obtained by the method for producing the optical spacer of the present invention. The optical spacer is preferably formed on the upper surface of the display light-shielding portion such as a black matrix (formed on the support) or a driving element such as a TFT. Further, a transparent conductive layer (transparent electrode) such as τ 〇 or a liquid crystal alignment film such as polyimide may be present between the light-shielding portion for display such as a black matrix or a driving element such as TF T or the optical spacer. For example, when the light-shielding material is provided on the display light-shielding portion (black matrix or the like) or the upper surface of the driving element, the light-shielding portion (the black matrix or the like) or the driving element which is disposed in advance on the support body will be covered. For example, a photosensitive resin layer of a photosensitive resin transfer film is laminated on a support surface, and after being transferred and formed to form a photosensitive resin layer, an optical spacer can be formed by applying exposure, development, heat treatment, or the like, thereby producing a photosensitive spacer. The liquid crystal display of the present invention uses a substrate of -41 - 200914959. In the substrate for a liquid crystal display of the present invention, colored pixels of three colors of red (R), green (G), and blue (B) may be provided as necessary. &lt;Liquid crystal display device&gt; The liquid crystal display device can be configured by providing the substrate for a liquid crystal display of the present invention. One of the liquid crystal display elements includes a pair of supports (including the substrate for liquid crystal display of the present invention) which are light-transmitting at least on one side, and at least a liquid crystal layer and a liquid crystal drive member (including a simple matrix driving method and an active method) Drive mode). In this case, the substrate for a liquid crystal display of the present invention can be configured such that each pixel group having a plurality of RGB pixel groups and constituting the pixel groups is separated from each other by a black matrix as a color filter substrate. Since the color filter substrate is provided with an optical spacer having a high degree of uniformity and excellent deformation recovery property, the liquid crystal display element including the color filter substrate can be suppressed from being produced between the color filter substrate and the opposite substrate. The liquid crystal cell gap is uneven (the liquid crystal cell thickness varies), and it is possible to effectively prevent the occurrence of color unevenness and the like. Thereby, the manufactured liquid crystal display element can display a clear image. Further, another aspect of the liquid crystal display device includes at least one of a pair of light-transmitting support bodies (including the substrate for liquid crystal display of the present invention), and at least a liquid crystal layer and a liquid crystal drive member, wherein the liquid crystal drive member has An active element (for example, a TFT) is formed by controlling a predetermined width between the pair of substrates by an optical spacer having a high degree of uniformity and excellent deformation recovery. In this case, the substrate for a liquid crystal display of the present invention also has a plurality of RGB pixel groups, and each of the pixels constituting the pixel group is configured as a color filter substrate by a black matrix spacer -42 - 200914959. The liquid crystal which can be used in the present invention includes nematic liquid crystal, cholesterol, liquid crystal, rectangular liquid crystal, and ferroelectric liquid crystal. Further, the pixel group of the color light-emitting sheet substrate may be composed of two-color pixels that exhibit different colors, or may be composed of three-color pixels or four-color pixels. For example, in three colors, it can be composed of three colors of red (R), green (G), and blue (B). When configuring a pixel group of R G B 3 colors, it is preferable to configure a mosaic type or a triangle type, and any of the four or more color pixel groups may be arranged. For example, the color filter substrate can be formed by forming a black matrix after forming a pixel group of two or more colors, or conversely, forming a pixel group after forming a black matrix. For the formation of the R G B pixel, reference can be made to the Japanese Patent Publication No. 2 0 0 4 - 3 4 7 8 3 1 and the like. &lt;Liquid Crystal Display Device&gt; The liquid crystal display device of the present invention includes the above-described substrate for a liquid crystal display device. Further, the liquid crystal display device of the present invention is constructed by providing the above liquid crystal display element. That is, as described above, the optical spacers manufactured by the method of manufacturing the optical spacer of the present invention are controlled to have a predetermined width between the pair of substrates which are disposed opposite each other, and the liquid crystal material is sealed in the controlled gap (the enclosed portion is called It is composed of a liquid crystal layer), and the thickness (liquid crystal cell thickness) of the liquid crystal layer is maintained at a desired uniform thickness. In the liquid crystal display mode of the liquid crystal display device, STN type, TN type, GH type, ECB type, ferroelectric liquid crystal, antiferroelectric liquid crystal, VA type, IPS type, OCB type, ASM type and others can be suitably used. Various. In the liquid crystal display device of the present invention, from the viewpoint of most effectively achieving the effect of the present invention, it is preferable to display a display mode in which display unevenness is likely to occur due to variations in the liquid crystal cell thickness of the liquid crystal cell. It is preferable that the VA type display mode, the IPS type display mode, and the OCB type display mode have a liquid crystal cell thickness of 2 to 4 μm. The basic configuration of the liquid crystal display device of the present invention includes the following: (a) a driving side substrate in which a driving element such as a thin film transistor (TFT) and a pixel electrode (conductive layer) are arranged, and a relative substrate The electrode (conductive layer) is formed by opposing the substrate with the optical spacer interposed therebetween, and the liquid crystal material is formed in the gap portion 4, and (b) the driving substrate and the counter electrode (conductive layer) are provided. The liquid crystal display device of the present invention can be suitably applied to various liquid crystal display devices by forming a counter substrate with the optical spacer interposed therebetween and arranging the liquid crystal material in the gap portion. The liquid crystal display device is described in, for example, "Second Generation Liquid Crystal Display Device Technology (Endowed by Natsuta Ryuo, Side Industry Survey, Issued in 1994)". The liquid crystal display device of the present invention is not particularly limited as long as it is provided with the liquid crystal display device of the present invention. For example, the liquid crystal display device of the various embodiments described in the "Second Generation Liquid Crystal Display Device Technology" may be employed. Among them, a liquid crystal display device for forming a color TFT method is particularly effective. The liquid crystal display device of the color TFT system is described in, for example, the "color TFT liquid crystal display (Kyoto Publishing Co., Ltd., issued in 1996). In addition to the optical spacer for the liquid crystal display of the present invention, the liquid crystal display device of the present invention is provided. 'Generally, it is possible to use various members such as an electrode substrate, a polarizing film, a retardation film, a backlight, a spacer, a viewing angle compensation film, an antireflection film, a light diffusion film, and an antiglare film. For example, these components are " 1 994 LCD Peripheral Materials, Chemicals City -44- 200914959 Field (Island Kentaro, CMC (shares), issued in 1994)", "2003 LCD related market status and future prospects (volume) (Formian Liangji' The record of Fuji Chimera (shares, 2, 3 years). [Examples] Hereinafter, the present invention will be specifically described by way of examples, but the invention is not limited to the following examples. Also, "%" and "parts" are quality benchmarks without prior notice. Although the present embodiment is described in detail by the combination of the transfer method and the LED backlight panel, 'the present invention can also be implemented by a coating method using a slit coater', and the backlight can also use a cold cathode. The tube is formed. The synthesis of the resin (A) represented by the above compound structure P-1 is shown in the following Synthesis Example 1. (Synthesis Example 1) 8.57 parts of 1-methoxy-2-propyl acetate (MMPGAc, manufactured by DAICEL Chemical Industry Co., Ltd.) was previously added to a reaction vessel and heated to 90 ° C under a nitrogen atmosphere. In a reaction volume of 90 ° C, 6.27 parts of isopropyl methacrylate, 515 parts of methacrylic acid, and 1 part of an azo polymerization initiator were added dropwise in 2 hours (manufactured by Wako Pure Chemical Industries, Ltd., V-6 0) 1) and 8 · 5 7 parts of a mixed solution of 1-methoxy-2-propanol. After the dropwise addition, the mixture was reacted for 4 hours to obtain an acrylic resin solution. Next, after adding 0.025 part of hydroquinone monomethyl ether and 〇. 4 4 parts of tetraethylammonium bromide to the above acrylic resin solution, 54.1 parts of glycidyl methacrylate was added dropwise over 2 hours. After the dropwise addition, the mixture was reacted at 90 ° C for 4 hours, and then the solvent MMPGAC was adjusted to have a solid content of 45% to prepare a solution of the above-mentioned compound structure p -1 having an unsaturated group. Further, the molecular weight of the resin represented by the above compound structure P -1 is a weight average molecular weight, and the method for measuring the molecular weight is measured by a chromatograph (GPC). Next, a synthesis example of the resin represented by the above-mentioned compound structures P-2, P-3, P-7, and P-8 P - 1 2 to P 15 is as shown in the following Synthesis Example 2 1 . (Synthesis Example 2) The synthesis example of the resin represented by the above-mentioned compound structure P-2 is such that the resin structure represented by the above-mentioned compound structure Ρ-2 is 40 mol% in addition to x:y:z in the above structure Ρ-2: 25 Mohr %: The compound structure P-2 having an unsaturated group was obtained in the same manner as in Synthesis Example 1 except that the amount of the addition of the third butyl methacrylate, methacrylic acid, and the acid propyl acrylate was changed. Lipid solution. (Synthesis Example 3) Synthesis Example 3 of the resin represented by the above compound structure P-3 was carried out. The resin represented by the above-mentioned compound structure P-3 is modified such that x:y:z in the above-mentioned constitution P-3 is 4 mol%: 20 mol%: 40, and the butyl methacrylate and methacrylic acid are changed. In the same manner as in the synthesis example, the resin Mw-based gel for the resin shown in the above-mentioned compound structure p_3 having an unsaturated group, P-10, and the synthesis example, were obtained in the same manner as in the synthesis example. get on. The compound is a mixture of methacrylic acid and methacrylic acid as shown in the following figure. The following is a compound of the present invention. (Synthesis Example 4) Synthesis Example 4 of the resin represented by the above compound structure P-7 was carried out as follows. The resin represented by the above P-7 is characterized in that isopropyl methacrylate is changed in such a manner that x:y:z in the compound structure P-7 is 40 mol%: 25 mol%: 35 mol%. A resin solution represented by the above-mentioned compound structure P-7 having an unsaturated group was synthesized in the same manner as in Synthesis Example 1 except that the amount of the acrylic acid and CYCLOMERM-200 (manufactured by DAICEL Chemical Co., Ltd.) was added. (Synthesis Example 5) Synthesis Example 5 of the resin represented by the above compound structure P-8 was carried out as follows. The resin represented by the above P-8 is modified in such a manner that x:y:z in the compound structure P-8 is 35 mol%: 30 mol%: 35 mol%.

基丙烯酸第三丁酯、甲基丙烯酸及CYCLOMER A-200(DAICEL 化學工業（股）製）的添加量以外，依照合成例1同樣的方法 合成，來得到具有不飽和基之前述化合物結構P - 8所示之 樹脂溶液。 (合成例6) 前述化合物結構P- 1 〇所示樹脂的合成例6係如以下進 行。 前述P -1 0所示樹脂係除了以前述化合物結構P - 1 〇中 的x:y:z成爲3〇旲耳％: 30莫耳。/〇: 40莫耳。/。的方式來變 200914959 更甲基丙烯酸環己酯、甲基丙儲酸及甲基丙烯酸環氧丙酯 的添加量以外’依煦合成例1同樣的方法合成，來得到具 有不飽和基之前述化合物結構p _丨〇所示之樹脂溶液。 (合成例7) 則述化合物結構P _丨2所示樹脂的合成例7係如以下進 行。 前述p_ 12所示樹脂係除了以前述化合物結構p-12中 的x:y:z成爲3〇莫耳％: 莫耳。/。： 4〇莫耳。/。的方式來變 更甲基丙嫌酸環己酯、甲基丙烯酸及CYCLOMER A - 2 0 0 (D A I C E L化學工業（股）製）的添加量以外’依照合成 例1同樣的方法合成’來得到具有不飽和基之前述化合物 結構P·12所示之樹脂溶液。 (合成例8) 則述化口物結構Ρ · 1 3所示樹脂的合成例8係如以下進 行。 則 P - 1 3 所元^ n τ樹脂係除了以前述化合物結構ρ- π中 的x:y:z成爲45莫苴。/ — &amp; + 穴耳％ : 1 5莫耳％ : 4 0莫耳％的方式來變 更甲基丙烯酸異茨酷 人％、甲基丙烯酸二聚物及cyclomer M-20 0 (DAICEL 仆與 &gt; 年工業（股）製）的添加量以外，依照合成 例1同樣的方法合故 Ώ吹’來得到具有不飽和基之前述化合物 結構Ρ -13所示之樹r〜 I促」3日溶液。 (合成例9) 行 刖述化口物結_ P -1 4所示樹脂的合成㈣9係如以下進 -48 - 200914959 前述P - 1 4所示樹脂係除了以前述化合物結構P _ i 4中 的X : y : Z成爲3 5莫耳°/« : 3 0莫耳％ : 3 5莫耳。/。的方式來變 更甲基丙稀酸異坎醋、甲基丙嫌酸及 CYCLOMER A-2 00 (DAICEL化學工業（股）製）的添加量以外，依照合成 例1同樣的方法合成’來得到具有不飽和基之前述化合物 結構P _ 1 4所示之樹脂溶液。 (合成例10) 前述化合物結構P -1 5所示樹脂的合成例1 〇係如以下 進行。 前述P -1 5所示樹脂係除了以前述化合物結構P -1 5中 的x:y:Z成爲45莫耳％ : 30莫耳％ : 25莫耳％的方式來變 更甲基丙烯酸異莰酯、丙烯酸二聚物及甲基丙烯酸環氧^ 酯的添加量以外，依照合成例1同樣的方法合成，來得_ 具有不飽和基之前述化合物結構P - 1 5所示之樹脂溶液。 (合成例1 1〜1 4) 在前述合成例2，以成爲表1中的固體成分、酸價、 M w的方式調整合成例2所使用成分的添加量，來得得到眞 有不飽和基之前述化合物結構Ρ - 2所示之樹脂溶液。 (合成例1 5〜1 7 ) 在前述合成例1，以成爲表1中的固體成分、酸價、 Mw的方式調整合成例1所使用成分的添加量，來得得到鸟 有不飽和基之前述化合物結構P - 1所示之樹脂溶液。 (合成例1 8 ) 前述化合物結構P-24所示樹脂的合成例1 8係如以下 -49 - 200914959 進行。 則述P - 2 4所示樹脂係除了以前述化合物結構 的X : y : z成爲4 4莫耳％ : 1 6莫耳％ : 4 0莫耳％的 更甲基丙烯酸環己酯、甲基丙烯酸及甲基丙烯酸 的添加量以外’依照合成例1同樣的方法合成， 有不飽和基之前述化合物結構P_24所示之樹脂溶 (合成例1 9) 前述化合物結構P - 2 5所示樹脂的合成例i 9 進行。 前述P-25所示樹脂係除了以前述化合物結榍 的X : 1: y : z成爲4 6莫耳％ : 2莫耳％ : 2 0莫耳％ : 的方式來變更甲基丙烯酸環己酯、甲基丙烯酸甲 丙嫌酸及甲基丙烯酸環氧丙酯的添加量以外，依 1同樣的方法合成，來得到具有不飽和基之前述 構P - 2 5所示之樹脂溶液。 (合成例2 0) 即述化合物結構p - 2 6所示樹脂的合成例2 0 進行。 前述P-26所示樹脂係除了以前述化合物結釋 的X : 1: y : z成爲4 5 . 5莫耳％ : 2莫耳％ : 1 9莫耳％ 耳％的方式來變更甲基丙烯酸環己酯、甲基丙烯 甲基丙烯酸及甲基丙烯酸環氧丙酯的添加量以外 成例1同樣的方法合成，來得到具有不飽和基之 物結構P-26所禾之樹脂溶液。 丨p-h中 方式來變 環萌1的酉旨 來得到臭 液。 係如以卞 I P-18 中 3 2旲耳％ 酯、甲基 照合成例 化合物結 係如以下 I P-26 中 :33.5 莫 酸甲酯、 ，依照合 前述化合 -50 - 200914959 (合成例21) 前述化合物結構P-27所示樹脂的合成例2 1係如以下 進行。 前述P-27所示樹脂係除了以前述化合物結構ρ_2·7中 的x:y:z成爲48莫耳％ : 22莫耳％ : 30莫耳。/。的方式來變 更甲基丙烯酸環己酯、甲基丙烯酸及甲基丙烯酸環氧丙酉旨 的添加量以外，依照合成例1同樣的方法合成，來得到胃 有不飽和基之前述化合物結構P - 2 7所示之樹脂溶液。 (合成例22) 前述化合物結構P-28所示樹脂的合成例22係如以下 進行。 前述P - 2 8所示樹脂係除了以前述化合物結構p _ 2 8中 的x:y:z成爲51.5莫耳％: 18.5莫耳％: 30莫耳％的方式來 變更甲基丙烯酸環己酯 '甲基丙烯酸及甲基丙烯酸環氧丙 酯的添加量以外’依照合成例1同樣的方法合成，來得到 具有不飽和基之前述化合物結構P - 2 8所示之樹脂溶液。 (合成例2 3 ):鹼可溶樹脂（2 〇)的調製 在反應容器中預先添加25克1-甲氧基-2-丙醇與25克 乙酸1 -甲氧基-2 -丙酯的混合之混合溶液並升溫至9 0 °C，且 在氮氣環境下、90 °C的反應容中以2小時滴加由32.1克苯 乙烯、36.5克甲基丙烯酸、6.73克偶氮系聚合引發劑（和光 純藥公司製、V-601)、25克1-甲氧基-2-丙醇及25克乙酸 卜甲氧基-2-丙酯的混合溶液所構成的混合溶液。滴加後使 其反應4小時而得到丙烯酸樹脂溶液。 200914959 接著，在前述丙烯酸樹脂溶液添加0.5克氫醌一甲基 醚及〇 . 0 1 5克溴化四乙銨後，以2小時滴加3 1 . 3克甲基丙 烯酸環氧丙酯。滴加後邊吹入空氣邊在9 0 °C反應4小時來 得到鹼可溶樹脂溶液。該鹼可溶樹脂（2 0)溶液中的固體成 分爲5 0 %。 (合成例24) 前述化合物結構P·25所示樹脂的合成例係如以下進 行。 在合成例1 9，除了調整引發劑量及反應溫度以外，依 照同樣的方法合成，來得到具有不飽和基之前述化合物結 構P-25所示之樹脂溶液。 (合成例2 5 ) 前述化合物結構P - 2 9所示樹脂的合成例係如以下進 行。 前述化合物結構P - 2 9所示樹脂係除了以前述化合物結 構P-29中的x:y:z成爲45莫耳％: 25莫耳％: 35莫耳°/。的 方式來變更甲基丙烯酸二環戊烯酯、甲基丙烯酸及甲基丙 烯酸環氧丙酯的添加量以外，依照合成例1同樣的方法合 成，來得到具有不飽和基之前述化合物結構P-29所示之樹 脂溶液。 (合成例26) 前述化合物結構P - 3 0所示樹脂的合成例係如以下進 行。 前述化合物結構P - 3 0所示樹脂係除了以前述化合物結 200914959 構P-30中的x:y:z成爲41莫耳％: 24莫耳％: 35莫耳％的 方式來變更丙烯酸二環戊烯酯、甲基丙烯酸及甲基丙烯酸 環氧丙酯的添加量以外’依照合成例1同樣的方法合成’ 來得到具有不飽和基之前述化合物結構p_3〇所示之樹脂溶 液。 (合成例27) 前述化合物結構p - 3 1所示樹脂的合成例係如以下進 行。 前述化合物結構p - 3 1所示樹脂係除了以前述化合物結 構P-31中的x:y:z成爲39吴耳％: 26莫耳％: 35莫耳％的 方式來變更丙烯酸二環戊烯氧基乙酯、甲基丙烯酸及甲基 丙烯酸環氧丙酯的添加量以外’依照合成例1同樣的方法 合成’來得到具有不飽和基之前述化合物結構p _ 3 1所示之 樹脂溶液。 (合成例28) 前述化合物結構p - 3 2所示樹脂的合成例係如以下進 行。 前述化合物結構P-32所示樹脂係除了以前述化合物結 構P-32中的x:y:z成爲35莫耳。/。： 30莫耳。/。： 35莫耳。/。的 方式來變更甲基丙燒酸三環戊稀酯、甲基丙烯酸及甲基丙 烯酸環氧丙醋的添加量以外’依照合成例1同樣的方法合 成，來得到具有不飽和基之前述化合物結構p_32所示之樹 脂溶液。 (合成例29) -53 - 200914959 前述化合物結構P - 3 3所示樹脂的合成例係如以下進 行。 前述化合物結構P - 3 3所示樹脂係除了以前述化合物結 構P-33中的x:y:z成爲42莫耳％: 28莫耳％: 3〇莫耳％的 方式來變更甲基丙烯酸三環戊烷酯、甲基丙烯酸及甲基丙 烯酸環氧丙酯的添加量以外，依照合成例1同樣的方法合 成’來得到具有不飽和基之前述化合物結構p - 3 3所示之樹 脂溶液。 (合成例30) 前述化合物結構P-3 4所示樹脂的合成例係如以下進 行。 前述化合物結構P-34所示樹脂係除了以前述化合物結 構P-34中的x:y:z成爲37莫耳％ : 28莫耳％ : 35莫耳％的 方式來變更甲基丙烯酸三環戊烯基氧基乙酯、甲基丙烯酸 及甲基丙烯酸環氧丙酯的添加量以外，依照合成例1同樣 的方法合成，來得到具有不飽和基之前述化合物結構P-3 4 所示之樹脂溶液。 (合成例3 1 ) 前述化合物結構P - 3 5所示樹脂的合成例係如以下進 行。 前述化合物結構P-3 5所示樹脂係除了以前述化合物結 構P-35中的x:y:z成爲39莫耳％: 26莫耳。/。： 35莫耳％的 方式來變更甲基丙烯酸三環戊烷基氧基乙酯、甲基丙烯酸 及甲基丙烯酸環氧丙酯的添加量以外，依照合成例1同樣 -54 - 200914959 的方法合成，來得到具有不飽和基之前述化合物結構P-3 5 所不之樹脂溶液。 (合成例3 2 ) 前述化合物結構P -2 1所示樹脂的合成例係如以下進 行。 前述化合物結構p -21所示樹脂係除了以前述化合物結 構P - 2 1中的X : y : Z成爲4 5莫耳％ : 2 0莫耳％ : 3 5莫耳％的 方式來變更ADMA(甲基丙燒酸2-金剛院酯）、甲基丙烯酸 及甲基丙烯酸環氧丙酯的添加量以外，依照合成例1同樣 的方法合成，來得到具有不飽和基之前述化合物結構P - 2 1 所示之樹脂溶液。 (合成例3 3 ): 前述樹脂PH-1的合成例24係如以下進行。 在反應容器中添加4份2,2’-偶氮雙異丁腈（AIBN)及 2〇〇份二乙二醇乙基甲基醚，接著，添加5份1，3_丁二燦、 1 8份甲基丙烯酸、40份甲基丙烯酸苄酯及3 7份甲基丙冑 酸正丁酯並以氮氣取代後，慢慢地攪拌並使反應溶液的溫 度上升至8 0 °C ’且將該溫度保持5小時，隨後升溫至} 〇 〇 °C進而反應1小時。接著將反應溶液的溫度下降至室溫而 得到PH-1的樹脂溶液（固體成分濃度=30.0重量。/。）。 200914959 [表i] 樹脂(A) 化合物 玻璃轉 重量平均 酸價 合成例 結構 移溫度 分子量 X :單元 X 1 V Z CC) mgKOH/g 1 P-1 60 10000 73 甲基丙烯酸異丙酯 45 0 20 35 2 P-2 73 15000 89 甲基丙烯酸第三丁酯 40 0 25 35 3 P-3 47 13000 68 甲基丙烯酸異丁酯 40 0 20 40 4 P-7 109 11000 84 甲基丙烯酸異丙酯 40 0 25 35 5 P-8 125 11000 100 甲基丙烯酸第三丁酯 35 0 30 35 6 P-10 62 18000 100 甲基丙烯酸環己酯 30 0 30 40 7 P-12 85 10000 92 甲基丙烯酸環己酯 30 0 30 40 8 P-13 80 13000 36 甲基丙烯酸異莰酯 45 0 15 40 9 P-14 120 14000 87 甲基丙烯酸異莰酯 35 0 30 35 10 P-15 100 10000 80 甲基丙烯酸降萡酯 45 0 30 25 11 P-2 65 5000 89 甲基丙烯酸第三丁酯 40 0 25 35 12 P-2 74 19000 88 甲基丙烯酸第三丁酯 40 0 25 35 13 P-2 76 90000 89 甲基丙烯酸第三丁酯 40 0 25 35 14 P-2 75 110000 90 甲基丙烯酸第三丁酯 40 0 25 35 15 P-1 52 9000 30 甲基丙烯酸異丙酯 45 0 20 35 16 P-1 57 14000 60 甲基丙烯酸異丙酯 45 0 20 35 17 P-1 70 12000 150 甲基丙烯酸異丙酯 45 0 20 35 18 P-24 57 13000 53 甲基丙烯酸環己酯 44 0 16 44 19 P-25 64 12000 67 甲基丙烯酸環己酯 46 2 20 32 20 P-26 63 13000 63 甲基丙烯酸環己酯 45.5 2 19 33.5 21 P-27 67 13000 74 甲基丙烯酸環己酯 48 _ 22 30 22 P-28 65 13000 63 甲基丙烯酸環己酯 51.5 _ 18.5 30 23 P-29 68 12000 100 (苯乙烯） 32 _ 45 23 P-31 30000 24 PH-1 27000 ()括弧內係記載相當於χ者。 -56 - 200914959 (實施例1):轉印法 -間隙物用感光性轉印薄膜之製造- 在厚度75微米的聚對酞酸乙二酯薄膜暫時支撐體 (PET暫時支撐體）上，塗布由下述處方A所構成的熱塑性 樹脂層用塗布並乾燥’來形成乾燥層厚度爲6.0微米的熱 塑性樹脂層。 [熱塑性樹脂層用塗布液的處方A] •甲基丙烯酸甲酯/丙烯酸2 —乙基己酯/甲基丙烯酸苄酯/甲 基丙烯酸共聚物 ...25.0份 ( = 55/11.7/4.5/28.8[莫耳比]、質量平均分子量90,000) •苯乙烯/丙烯酸共聚物 _··58.4份 ( = 63/37[莫耳比]、質量平均分子量8,000) .2，2-雙[4-(甲基丙烯醯基聚乙氧基）苯基]丙烷 .· . 39.0 份 •界面活性劑1 (下述結構物1 ) · · · 1 0.0份 •甲醇 · . · 9 0.0份 .1-甲氧基-2-丙醇 ...51.0份 •甲基乙基酮 ...700份 接著，在所形成的熱樹脂層上’塗布由下述處方8所 構成的中間層用塗布液並乾燥’來層積乾燥層厚度I·5微 米的中間層。 *界面活性劑1的組成 .下述結構物1 ... 30% .甲基乙基酮 ...70% -57- 200914959 結構物1 —(CH2—CH)4〇— o=c OCH2CH2〇nF 2n+1 —(CH2-CH)x— 0=0In the same manner as in Synthesis Example 1, except that the amount of the third butyl acrylate, methacrylic acid, and CYCLOMER A-200 (manufactured by DAICEL Chemical Co., Ltd.) was added, the structure P of the above compound having an unsaturated group was obtained. The resin solution shown in 8. (Synthesis Example 6) Synthesis Example 6 of the resin represented by the above compound structure P-1 is carried out as follows. The resin represented by the above P -10 is in the range of x:y:z in the above-mentioned compound structure P - 1 成为 to 3 〇旲%: 30 mol. /〇: 40 moles. /. In the same manner as in the synthesis method of Example 1, except that the amount of cyclohexyl methacrylate, methyl propyl acid storage, and glycidyl methacrylate added was changed in the same manner as in 200914959, the above compound having an unsaturated group was obtained. The resin solution shown by structure p _ 。. (Synthesis Example 7) Synthesis Example 7 of the resin represented by the compound structure P _ 丨 2 is carried out as follows. The resin represented by the above p-12 is in the range of x:y:z in the above-mentioned compound structure p-12 to be 3 mol%: Mohr. /. : 4 〇 Mo Er. /. In the same manner as in the case of the addition of methacrylic acid, cyclohexyl acrylate, methacrylic acid, and CYCLOMER A-200 (manufactured by DAICEL Chemical Industry Co., Ltd.), it was synthesized in the same manner as in Synthesis Example 1. A resin solution represented by the above compound structure P·12 of a saturated group. (Synthesis Example 8) The synthesis example 8 of the resin shown in Fig. 1 is carried out as follows. Then, the P - 1 3 element ^ n τ resin is 45 苴 except for x: y: z in the above compound structure ρ - π. / — &amp; + Ears % : 1 5 mole % : 4 0 % of the way to change methicone isopropanol %, methacrylic acid dimer and cyclomer M-20 0 (DAICEL servant &gt In addition to the addition amount of the industrial (manufactured by the Industrial Co., Ltd.), the same procedure as in Synthesis Example 1 was carried out to obtain a tree of the above-mentioned compound structure Ρ-13 having an unsaturated group. . (Synthesis Example 9) Synthesis of a resin as shown in Fig. _ P -1 4 (4) 9 is as follows -48 - 200914959 The resin represented by the above P - 14 is in addition to the above-mentioned compound structure P _ i 4 X: y: Z becomes 3 5 Moh ° / « : 3 0 Moer % : 3 5 Mo Er. /. In the same manner as in Synthesis Example 1, except that the amount of methic acid isoamyl vinegar, methacrylic acid and CYCLOMER A-2 00 (manufactured by DAICEL Chemical Industry Co., Ltd.) was changed, A resin solution of the above-mentioned compound structure P _ 14 which is unsaturated. (Synthesis Example 10) Synthesis Example 1 of the resin represented by the above compound structure P -1 5 was carried out as follows. The resin represented by the above P-15 is modified such that isodecyl methacrylate is changed in such a manner that x:y:Z in the compound structure P-15 is 45 mol%: 30 mol%: 25 mol%. Further, in the same manner as in Synthesis Example 1, except that the amount of the acrylic acid dimer and the methacrylic acid epoxy ester was added, a resin solution represented by the above-mentioned compound structure P-15 having an unsaturated group was obtained. (Synthesis Example 1 1 to 1 4) In the above Synthesis Example 2, the amount of the component used in Synthesis Example 2 was adjusted so that the solid content, the acid value, and the M w in Table 1 were adjusted to obtain an unsaturated group. The above compound has a structure of a resin solution represented by Ρ-2. (Synthesis Example 1 5 to 1 7) In the above Synthesis Example 1, the amount of the component used in Synthesis Example 1 was adjusted so as to have the solid content, the acid value, and the Mw in Table 1, and the above-mentioned unsaturated group of the bird was obtained. A resin solution of the compound structure P-1. (Synthesis Example 18) The synthesis example 1 of the resin represented by the above compound structure P-24 was carried out as follows -49 - 200914959. The resin represented by P - 24 is in addition to the structure of the above compound X: y: z is 4 4 mol%: 16 mol%: 40 mol% of cyclohexyl methacrylate, methyl In addition to the addition amount of acrylic acid and methacrylic acid, it was synthesized in the same manner as in Synthesis Example 1, and the resin represented by the above-mentioned compound structure P_24 having an unsaturated group was dissolved (Synthetic Example 19). The resin represented by the above compound structure P - 25 Synthesis Example i 9 was carried out. The resin represented by the above P-25 is a system in which the cyclohexyl methacrylate is changed in such a manner that X: 1: y: z of the above compound is 4 6 mol % : 2 mol % : 2 mol % : Further, in the same manner as in Example 1, except that the amount of the methyl propyl methacrylate and the glycidyl methacrylate was added, a resin solution represented by the above-mentioned structure P - 25 having an unsaturated group was obtained. (Synthesis Example 2 0) The synthesis example 20 of the resin represented by the compound structure p - 26 is carried out. The resin represented by the above P-26 is modified by changing the methacrylic acid in such a manner that X: 1: y : z which is released by the above compound becomes 4 5 . 5 mol % : 2 mol % : 1 9 mol % ear % The addition amount of cyclohexyl ester, methacrylic methacrylic acid, and glycidyl methacrylate was synthesized in the same manner as in Example 1 to obtain a resin solution of the structure P-26 having an unsaturated group.丨p-h in the way to change the purpose of the ring 1 to get the smell. For example, in the case of 3I P-18, 3 2 旲 % % ester, methyl exemplified compound compound, such as the following I P-26: 33.5 methyl methacrylate, according to the above compound -50 - 200914959 (synthesis example) 21) Synthesis Example 2 of the resin represented by the above compound structure P-27 was carried out as follows. The resin represented by the above P-27 is 48 mol% in the above compound structure ρ_2·7: 22 mol%: 22 mol%: 30 mol. /. In the same manner as in Synthesis Example 1, except that the amount of cyclohexyl methacrylate, methacrylic acid, and methacrylic acid oxime was changed, the compound structure P of the stomach-unsaturated group was obtained. The resin solution shown in 2 7 . (Synthesis Example 22) Synthesis Example 22 of the resin represented by the above compound structure P-28 was carried out as follows. The resin represented by the above P - 28 is a cyclohexyl methacrylate modified in such a manner that x:y:z in the above compound structure p _ 28 is 51.5 mol%: 18.5 mol%: 30 mol%. In the same manner as in Synthesis Example 1, except that the amount of methacrylic acid and propylene glycol methacrylate was added, a resin solution represented by the above-mentioned compound structure P - 28 having an unsaturated group was obtained. (Synthesis Example 2 3 ): Preparation of alkali-soluble resin (2 〇) In the reaction vessel, 25 g of 1-methoxy-2-propanol and 25 g of 1-methoxy-2-propyl acetate were previously added. The mixed solution was mixed and heated to 90 ° C, and 32.1 g of styrene, 36.5 g of methacrylic acid, and 6.73 g of an azo polymerization initiator were added dropwise in a reaction atmosphere at 90 ° C for 2 hours under a nitrogen atmosphere. A mixed solution of a mixed solution of (produced by Wako Pure Chemical Co., Ltd., V-601), 25 g of 1-methoxy-2-propanol, and 25 g of p-methoxy-2-propyl acetate. After the dropwise addition, it was allowed to react for 4 hours to obtain an acrylic resin solution. 200914959 Next, after adding 0.5 g of hydroquinone monomethyl ether and 0.15 g of tetraethylammonium bromide to the above acrylic resin solution, 31.3 g of glycidyl methacrylate was added dropwise over 2 hours. After the dropwise addition, air was blown at 90 ° C for 4 hours to obtain an alkali-soluble resin solution. The solid content of the alkali-soluble resin (20) solution was 50%. (Synthesis Example 24) A synthesis example of the resin represented by the above compound structure P·25 was carried out as follows. In Synthesis Example 1, 9, except that the initiator amount and the reaction temperature were adjusted, it was synthesized in the same manner to obtain a resin solution represented by the above-mentioned compound structure P-25 having an unsaturated group. (Synthesis Example 2 5) A synthesis example of the resin represented by the above compound structure P - 29 was carried out as follows. The above-mentioned compound structure P - 29 showed a resin of 45 mol% in addition to x:y:z in the structure of the above compound P-25: 25 mol%: 35 mol%. In the same manner as in Synthesis Example 1, except that the amount of addition of dicyclopentenyl methacrylate, methacrylic acid, and glycidyl methacrylate was changed, the compound structure P- having an unsaturated group was obtained. The resin solution shown in 29. (Synthesis Example 26) A synthesis example of the resin represented by the above compound structure P - 30 is carried out as follows. The resin represented by the above-mentioned compound structure P - 30 is modified in such a manner that x:y:z in the structure of the compound of the above-mentioned compound 200914959 is changed to 41 mol%: 24 mol%: 35 mol%. In addition to the addition amount of pentene ester, methacrylic acid, and glycidyl methacrylate, 'the same method as in Synthesis Example 1 was carried out' to obtain a resin solution represented by the above-mentioned compound structure p_3〇 having an unsaturated group. (Synthesis Example 27) A synthesis example of the resin represented by the above compound structure p - 3 1 was carried out as follows. The resin represented by the above-mentioned compound structure p - 3 1 is substituted with dicyclopentene acrylate in such a manner that x:y:z in the above-mentioned compound structure P-31 is 39 mil%: 26 mol%: 35 mol%. In addition to the addition amount of oxyethyl ketone, methacrylic acid, and glycidyl methacrylate, 'the compound was synthesized in the same manner as in Synthesis Example 1 to obtain a resin solution represented by the above-mentioned compound structure p _ 3 1 having an unsaturated group. (Synthesis Example 28) A synthesis example of the resin represented by the above compound structure p - 3 2 was carried out as follows. The resin represented by the above compound structure P-32 was 35 mols in addition to x:y:z in the above-mentioned compound structure P-32. /. : 30 moles. /. : 35 moles. /. In the same manner as in Synthesis Example 1, except that the amount of the trimethyl pentyl methacrylate, methacrylic acid, and methacrylic acid propylene acrylate was changed, the compound structure having an unsaturated group was obtained. Resin solution shown by p_32. (Synthesis Example 29) -53 - 200914959 The synthesis example of the resin represented by the above compound structure P-3 is carried out as follows. The resin represented by the above-mentioned compound structure P-3 is modified in such a manner that x:y:z in the above-mentioned compound structure P-33 is 42 mol%: 28 mol%: 3 mol%. A resin solution represented by the above-mentioned compound structure p - 3 3 having an unsaturated group was synthesized in the same manner as in Synthesis Example 1 except that the amount of cyclopentyl ester, methacrylic acid, and glycidyl methacrylate was added. (Synthesis Example 30) A synthesis example of the resin represented by the above compound structure P-3 4 was carried out as follows. The resin represented by the above-mentioned compound structure P-34 is changed by trimethyl pentyl methacrylate in such a manner that x:y:z in the above-mentioned compound structure P-34 is 37 mol % : 28 mol % : 35 mol % In the same manner as in Synthesis Example 1, except that the amount of the alkenyloxyethyl ester, the methacrylic acid, and the glycidyl methacrylate was added, the resin represented by the above-mentioned compound structure P-3 4 having an unsaturated group was obtained. Solution. (Synthesis Example 3 1) A synthesis example of the resin represented by the above compound structure P - 3 is carried out as follows. The resin represented by the above compound structure P-3 5 was 39 mol%: 26 mol% in addition to x:y:z in the above-mentioned compound structure P-35. /. A method of synthesizing the amount of trimethylpentamethoxyethyl methacrylate, methacrylic acid, and glycidyl methacrylate in a manner of 35 mol%, in the same manner as in Synthesis Example 1 -54 - 200914959 To obtain a resin solution of the above-mentioned compound structure P-3 5 having an unsaturated group. (Synthesis Example 3 2) A synthesis example of the resin represented by the above compound structure P-2 is carried out as follows. The resin represented by the above-mentioned compound structure p -21 is modified in such a manner that XDMA is changed in such a manner that X: y : Z in the above-mentioned compound structure P - 2 1 is 4 5 mol % : 20 mol % : 3 5 mol % The compound of the above-mentioned compound P-2 having an unsaturated group was synthesized in the same manner as in Synthesis Example 1 except that the amount of methyl propyl acetoacetate (2-methyl sulphate), methacrylic acid, and glycidyl methacrylate was added. The resin solution shown in 1. (Synthesis Example 3 3): Synthesis Example 24 of the above-mentioned resin PH-1 was carried out as follows. 4 parts of 2,2'-azobisisobutyronitrile (AIBN) and 2 parts of diethylene glycol ethyl methyl ether were added to the reaction vessel, followed by addition of 5 parts of 1,3-butancan, 1 After 8 parts of methacrylic acid, 40 parts of benzyl methacrylate and 37 parts of n-butyl methacrylate and substituted with nitrogen, slowly stir and raise the temperature of the reaction solution to 80 ° C ' and The temperature was maintained for 5 hours, and then the temperature was raised to 〇〇 ° C for further 1 hour. Then, the temperature of the reaction solution was lowered to room temperature to obtain a resin solution of PH-1 (solid content concentration = 30.0% by weight). 200914959 [Table i] Resin (A) Compound Glass Transfer Weight Average Acid Price Synthesis Example Structure Shift Temperature Molecular Weight X: Unit X 1 VZ CC) mgKOH/g 1 P-1 60 10000 73 Isopropyl methacrylate 45 0 20 35 2 P-2 73 15000 89 T-butyl methacrylate 40 0 25 35 3 P-3 47 13000 68 Isobutyl methacrylate 40 0 20 40 4 P-7 109 11000 84 Isopropyl methacrylate 40 0 25 35 5 P-8 125 11000 100 Tert-butyl methacrylate 35 0 30 35 6 P-10 62 18000 100 Cyclohexyl methacrylate 30 0 30 40 7 P-12 85 10000 92 Cyclohexyl methacrylate 30 0 30 40 8 P-13 80 13000 36 Isodecyl methacrylate 45 0 15 40 9 P-14 120 14000 87 Isodecyl methacrylate 35 0 30 35 10 P-15 100 10000 80 Methacrylic acid Ester 45 0 30 25 11 P-2 65 5000 89 Tert-butyl methacrylate 40 0 25 35 12 P-2 74 19000 88 Third butyl methacrylate 40 0 25 35 13 P-2 76 90000 89 Methyl Tert-butyl acrylate 40 0 25 35 14 P-2 75 110000 90 Third butyl methacrylate 40 0 25 35 15 P-1 52 9000 30 Isopropyl methacrylate 45 0 20 35 16 P-1 57 14000 60 isopropyl methacrylate 45 0 20 35 17 P-1 70 12000 150 isopropyl methacrylate 45 0 20 35 18 P-24 57 13000 53 methacrylic acid cyclohexane Ester 44 0 16 44 19 P-25 64 12000 67 Cyclohexyl methacrylate 46 2 20 32 20 P-26 63 13000 63 Cyclohexyl methacrylate 45.5 2 19 33.5 21 P-27 67 13000 74 Methacrylic acid ring Hexyl ester 48 _ 22 30 22 P-28 65 13000 63 Cyclohexyl methacrylate 51.5 _ 18.5 30 23 P-29 68 12000 100 (styrene) 32 _ 45 23 P-31 30000 24 PH-1 27000 () brackets The internal record is equivalent to the latter. -56 - 200914959 (Example 1): Transfer method - Production of photosensitive transfer film for spacers - Coating on a polyethylene n-butyl phthalate film temporary support (PET temporary support) having a thickness of 75 μm The thermoplastic resin layer composed of the following prescription A was coated and dried to form a thermoplastic resin layer having a dry layer thickness of 6.0 μm. [Prescription A of coating liquid for thermoplastic resin layer] • Methyl methacrylate/2-ethylhexyl acrylate/benzyl methacrylate/methacrylic acid copolymer... 25.0 parts (= 55/11.7/4.5/ 28.8 [mole ratio], mass average molecular weight 90,000) • styrene/acrylic acid copolymer _·· 58.4 parts (= 63/37 [mole ratio], mass average molecular weight 8,000) . 2, 2-double [4-( Methyl propylene decyl polyethoxy) phenyl] propane. · 39.0 parts • Surfactant 1 (structure 1 below) · · · 1 0.0 parts • methanol · · · 9 0.0 parts. 1-methoxy Benzyl-2-propanol, 51.0 parts, methyl ethyl ketone, 700 parts, and then 'coating the coating liquid for an intermediate layer composed of the following prescription 8 on the formed hot resin layer and drying' An intermediate layer having a dry layer thickness of 1·5 μm was laminated. *Composition of surfactant 1 . The following structure 1 ... 30% . Methyl ethyl ketone ... 70% -57- 200914959 Structure 1 - (CH2 - CH) 4 〇 - o = c OCH2CH2 〇 nF 2n+1 —(CH2-CH)x— 0=0

i(PO)7Hi(PO)7H

—&quot;(CH2—〒 H)y-— O-C i(EO)7H (n = 6、x = 5 5、y = 5、—&quot;(CH2—〒 H)y-— O-C i(EO)7H (n = 6, x = 5 5, y = 5,

Mw—3 3 9 4 0» Mw//Mn = 2. P〇 :環氧丙烷、EO :環氧乙烷) [中間層用塗布液的處方B ] .聚乙烯醇 · · · 3.22份 (PVA-205、巷化率 80%、KURARAY(股）製） •聚乙烯基吡咯啶酮 · · · 1 .49份 (PVA K-3 0、ISP Japan 股份公司製） •甲醇 ...4 2.3份 •蒸餾水 · . · 5 24份 接著，在所形成的中間層，塗布由下述表2所示處方 1所構成的感光性樹脂組成物層用塗布液並乾燥’來層積 乾燥層厚度4.1微米的感光性樹脂組成物層。 如此進行，構成PET暫時支撐體/熱塑性樹脂/中間層/ 感光性樹脂組成物層的積層結構（3層的合計層厚度爲Π · 6 微米）後，在感光性樹脂組成物層的表面將作爲保護薄膜之 厚度1 2微米的聚丙烯製薄膜加熱、加壓並貼合，來得到間 隙物用感光性轉印薄膜（1)。 -彩色濾光片基板的製造- 藉由特開200 5 -3 8 6 1號公報所記載之段落號碼[0084] -58 - 200914959 〜[0095]所記載的方法製造具有黑色矩陣、R像素、G像素 及B像素之彩色濾光片。接著，在彩色濾光片基板的R像 素、G像素及 B像素和黑色矩陣上更藉由濺鍍形成 I TO (Indium Tin Oxide ;銦錫氧化物）的透明電極。 -光間隙物的製造- 將所得到的間隙物用感光性轉印薄膜（1 )的保護薄膜 剝離，並將露出的感光性樹脂組成物的表面重疊在上述所 製造之濺鍍形成有ITO膜之彩色濾光片基板的ITO膜上， 且使用層壓機Lamic II型（日立INSTRUMENTS公司製）， 在線壓ΙΟΟΝ/cm、13(TC的加壓、加熱條件下以搬運速度2 公尺/分鐘貼合。隨後，將PET暫時支撐體從熱塑性樹脂層 的界面剝離除去後，將感光性樹脂組成物層與熱塑性樹脂 層及中間層一同轉印（層形成製程）。 接著，使用具有超高水銀燈之接近型曝光機（HITACHI HIGH TECH ELECTROENGINEERING (股）公司製），在使光 罩（具有影像圖案之石英曝光光罩）與彩色濾光片基板（該光 罩與熱塑性樹脂層以相向的方式配置而成）大略平行地垂 直立起狀態，設定光罩面與感光性樹脂組成物層的中間層 接觸側的表面之間的距離爲40微米’並以曝光量60m】/Cm2 透過光罩而自熱塑性樹脂層側進行接近式曝光。 接著，使用三乙醇胺顯像液（將含有3 〇°/❶三乙醇胺、商 品名：T-PD2(富士 FILM (股）製）以純水稀釋成爲12倍（以1 份T- P D 2與1 1份純水的比例的方式混合）而成的液體），在 30。(：、平口噴嘴壓力 〇.〇4MPa的條件下進行噴淋顯像50 -59- 200914959 秒，來除去熱塑性樹脂層及中間層。接著在該玻璃基彳反的 上面噴吹空氣來除去液體後，使用噴淋器噴吹純水10秒來 進行噴吹純水洗淨，並噴吹空氣來減少基板上的 '液體積存。 接著，使用碳酸鈉系顯像液（將含有0.38莫耳/升的碳 酸氫鈉' 0.47莫耳/升的碳酸鈉、5 %的二丁基萘磺酸鈉 '陰 離子界面活性劑、消泡劑、安定劑、商品名：T—CD1 (富士 FILM (股）製），以純水稀釋爲10倍而成之液體），在29 °C、 圓錐形噴嘴壓力〇 · 1 5 Μ P a的條件下，進行噴淋顯像來使感 光性樹脂層顯像3 0秒，來得到間隙物的圖案影像。 接著，使用純水將洗淨劑（含有磷酸鹽、矽酸鹽、非離 子界面活性劑 '消泡劑、安定劑；商品名「T— S D 3 (富士照 相軟片公司製）」稀釋成1 0倍的稀擇液）’在3 3 °C 20秒、 圓錐形噴嘴壓力0.0 2 Μ P a，使用噴淋器噴吹進行除去所形 成的圖案影像周邊的殘渣，來得到需要間隙物圖案。 接著將設置有間隙物圖案之彩色濾光片基板在230 °C 下加熱處理3 0分鐘（熱處理製程），來製造光間隙物。 所得到的光間隙物係直徑24微米、平均高度爲3.6微 米的圓柱狀。又，平均高度係使用三維表面積結構解析顯 微鏡（廠商：ZYGO Corporation、型式：New View 5022)對 1 0 0 〇個所得到的光間隙物，從IT 0的透明電極形成面最高 的光間隙物之最高位置起20個高位的平均來求得。 隨後，準備TFT基板作爲相對基板，並在該TFT基板 的一側表面使用濺鍍形成I τ Ο (I n d i u m T i η Ο X i d e ;銦錫氧化 物）膜。 -60 - 200914959 接著，在上述所得到的彩色濾光片基板的ITO膜（透明 電極）及TFT基板的ΙΤΟ膜各自施加PVA模式用圖案化， 且在其上面更設置由聚醯亞胺所構成的配向膜。 隨後，在相當於以包圍彩色濾光片的像素群的方式設 置於周圍的黑色矩陣外框之寬度爲0.5毫米、高度爲40微 米的密封部，藉由分配方式塗布紫外線硬化樹脂的密封 劑，並滴加PVA模式用液晶且使彩色濾光片基板與TFT基 板.貼合。 隨後，恢復至常壓，並施加負荷且以液晶胞厚度爲4 微米的方式控制。在該狀態，使用鹵化金屬燈並濾、光器截 止小於340奈米的紫外線，以340〜390奈米的累積光量且 相當3,OOOmJ/cm2的光量之方式，在氮氣環境下曝光使密 封劑硬化後，熱處理使密封劑硬化，來得到液晶胞。在如 此進行所得到的液晶胞的兩面，貼合偏光板（HLC2-2518、 (ANRITZ(股）製）。接著，構成CCFL的背光板，並設置於 安裝有偏光板之液晶胞的背面側，來製造P V A模式液晶顯 示裝置。 -1 _變形率及變形恢復率（條件1 )-(1 )變形率 對光間隙物，使用微小硬度計（DUH-W201、島津製作 所（股）製）並如下進行測定，並依照下述基準進行評價。結 果如表3所示。 測定係使用5 0微米0的圓錘台壓頭，以最大負荷爲 50mN、保持時間5秒、並依照負荷-除負荷試驗法進行測 -61- 200914959 定。依照該測定能夠求得變形量，並能夠依照下述式求取 變形率。 變形率（％)=(因加重之變形量[微米]/光間隙物的高度[微米]X i 00 (評價基準） A :變形率爲2 0 %以上。 B :變形率爲1 5%以上、小於20。/。。 C :變形率爲1 0 %以上、小於1 5 %。 D :變形率爲小於1 0 %。 (2)變形恢復率 變形恢復率係依照下式求取變形恢復率[%]，並依照τ 述基準進行評價。結果如表3所示。 變形恢復率（％)=(因加重之變形量[微米]/加重釋放 後的恢復量[微米])Χ1〇〇 (評價基準） A :變形恢復率9 0 %以上。 B :變形恢復率爲85%以上、小於90%。 C :變形率爲7 5 %以上、小於8 5 %。 D :變形率爲小於7 5 %。 -2.顯示不均- (1)因重力不良之顯示不均 對液晶顯不裝置，在使液晶顯示裝置爲與水平面的法 線方向平行地立起狀態’在6 0 C的條件下放置2天後，使 用目視及放大透鏡觀察施加灰階測試信號時之灰階顯示， -62 - 200914959 並依照下述評價基準評價有無顯示不均。結果如表3所示。 (評價基準） A :完全未觀察到顯示不均。 B:觀察到稍微有顯示不均。 C :觀察到顯著地有顯示不均。 (2 )因低溫發泡之顯示不均 將液晶顯示裝置在〇 °c的條件下放置2天後，使用目 視及放大透鏡觀察施加灰階測試信號時之灰階顯示，並依 照下述評價基準評價有無顯示不均。結果如表3所示。 (評價基準） A:完全未觀察到顯示不均 B :觀察到稍微有顯示不均。 C :顯著地觀察到顯示不均。 (實施例2〜1 2、比較例1〜3 ) 在實施例1，除了將樹脂（A)由合成例1所得到的化合 物結構P -1變更爲表1〜3之化合物結構，且將感光性樹脂 組成物層用塗布液的處方1更爲表2之處方以外，與實施 例1同樣的方法製造光間隙物及液晶顯示裝置。對前述光 間隙物及液晶顯示裝置，與實施例1同樣地進行評價。結 果如表3所示。所得到的光間隙物係直徑爲1 4微米、平均 高度爲3.6微米之圓柱狀。 (實施例13〜18):塗布（光阻液）法 -光間隙物製造- 在上述製造之濺鍍形成有ITO膜之彩色濾光片基板的 200914959 ITO膜上’使用具有狹縫狀噴嘴之玻璃基板 MH- 1 600(FAS-Asia公司製）來塗布由下述表2所 構成的感光性樹脂組成物層用塗布液。接著使用 機V CD (東京應化公司製）並乾燥30秒使溶劑的一 來使塗布膜失去流動性後，在1 2 (TC預烘烤3分 膜厚度爲2.4微米的感光性樹脂組成物層（層形成 接著，藉由與實施例1同樣的圖案化製程及 程，在彩色濾光片基板上製造光間隙物。但是， 3 00mJ/cm2、碳酸鈉系顯像液之顯像爲23°C、60 光間隙物製造後，使用該彩色濾光片基板與 同樣地進行製造PVA模式液晶顯示裝置。 上述所得到的光間隙物及PVA模式液晶顯示 實施例1同樣地進行評價。結果如表3所示。 用塗布器 示處方所 真空乾燥 部分乾燥 鐘來形成 製程）。 熱處理製 曝光量爲 秒。 實施例1 裝置係與 -64- 200914959 【&lt;Nt(〕 T^s SO 比較 4 fS 00 0.42 U-15 ΗΑ - IBA 00 (N P-31 20.5 0.227 0.0004 0.032 2.05 處方 15 ! 比較例 3 (N 00 CN 0.42 DPHA Ον \〇 丨 P-31 20.5 0.227 0.0004 0.032 2.05 處方 14 比較例 2 fS 00 (N 14.1 0.42 U-15 ΗΑ *Τ) DPHA iT) tri 1 K CU 20.5 0.227 0.0004 0.032 2.05 處方 13 比較例 1 (N 00 rvj 0.42 U-15 ΗΑ ON \6 1 X CU 20.5 0.227 0.0004 0.032 2.05 處方 12 ； 實施例 12 \〇 CN 00 (N 寸· 0.42 U-15 ΗΑ 〇 VO &gt;η P-9 20.5 0.227 i_ ：0.0004 0.032 2.05 處方 11 實施例 11 Ό (N 00 &lt;N 14.1 0.42 U-15 ΗΑ 1 〇s Ό P-25 20.5 0.227 i_ ；0.0004 0.032 2.05 處方 10 實施例 10 Ό CS 00 &lt;N 对· 0.42 U- 6ΗΑ •rt Ό DPHA 00 (N Ό P-31 20.5 0.227 0.0004 0.032 2.05 處方 9 ： 實施^ \D &lt;N 00 CM 14.1 ! 0.42 U-15 ΗΑ Ό DPHA P-31 20.5 0.227 0.0004 0.032 2.05 處方 8 ! 實施例 8 fN 00 fN 0.42 U-15 ΗΑ oo (N «Ο DPHA P-31 20.5 0.227 0.0004 0.032 2.05 處方 7 實施例 7 \D (N 00 fN 0.42 U-15 ΗΑ DPHA 00 &lt;N | P-31 20.5 ! 0.227 0.0004 0.032 2.05 處方 6 實施例; 6、18: &lt;N 〇0 cs 0.42 U-15 ΗΑ «Τί Ό DPHA ：P-31 20.5 :0.227 0.0004 0.032 2.05 處方 5 實施例 5 ' 17 rs 00 &lt;N 0.42 R- 1301 On P-31 20.5 0.227 0.0004 0.032 2.05 處方 4 實施例 4、16 v〇 (N 00 (N 0.42 U- 6ΗΑ Os Ό P-31 20.5 0.227 0.0004 0.032 2.05 處方 3 實施例 3 ' 15 Ό CN CO CS 0.42 UA- 32Ρ 〇\ 'O ΟΝ P-31 20.5 0.227 0.0004 1 0.032 2.05 處方 2 實施例 2 ' 14 VO (N 00 fN 0.42 UN- 3320HS Os «Ί P-31 20.5 0.227 0.0004 1 ! 0.032 2.05 處方 1 實施例 1、13 &lt;N 00 (N 14.1 0.42 U-15 ΗΑ Os Ό P-31 20.5 0.227 0.0004 0.032 2.05 感光性樹脂組成物層用塗布液 乙酸1-甲氧基-2-丙酯 甲基乙基酮 w ^ »- S 欠s 〇 ^ Μ &amp; § 孕撇 W Η ι|» 豳翠 酸Μ I ra 安· 嫲匾 丨丨湖 ^ Η 豳《 SOLUSPARS20000 含胺基甲酸酯基單體(Β1)的種類 含胺基甲酸酯基單體(Bl)量 含胺基甲酸酯基單體(Β 1)的不飽和鍵數 未含胺基甲酸酯基之含丙烯基之單體(B2)的種類 未含胺基甲酸酯基之含丙烯基之單體(B2)量 未含胺基甲酸酯基之含丙烯基之單體(B2)的不飽 和鍵數 樹脂(A)的溶液種 樹脂(A)的溶液量 W &amp;- w w 祕 κ) « ζ ζ y隹 ;Ill fr擀 U Μ Π1 1： f ί 氫醌一甲基醚 fi? I Η _ 掩 m +&lt; IX ό OO Si 廿1 ^ its a B f _ 晚s雜 撇 Η 義 α ο Q ο 芸裝 1 « £ s « a- g ^ H -s. ^ w -- (3ί(^)®4πκ&gt;ιΒ60ε-ΙΑΙΧΙΝΟΗν ,itsg)«A3&gt; 件SVHda ((Nffl Φ¥Μ :扫i §啶负嫌Bt*H—疵)ιοετΉ'ιβΙΜ&lt;-4»Λ3&gt;£ίΜ*νΗ9.η 二1ίρ&lt;4»Λ3&gt;£:·&amp;-ϋ)νΗΠ-η 二3iiiF&lt;4纖 H-MSOSHOZee-Nn (Iffi 200914959 [表3] 處方 方式 變形 恢復率 變形率 因重力不良 之顯示不均 因低溫發泡 之顯示不均 實施例1 處方1 轉印法 A A A A 實施例2 處方2 轉印法 A A A A 實施例3 處方3 轉印法 A A A A 實施例4 處方4 轉印法 B A A B 實施例5 處方5 轉印法 B B A B 實施例6 處方6 轉印法 A A A A 實施例7 處方7 轉印法 A A A A 實施例8 處方8 轉印法 A A A A 實施例9 處方9 轉印法 B A A A 實施例10 處方10 轉印法 A A A A 實施例11 處方11 轉印法 B A B A 實施例12 處方12 轉印法 A B A A 實施例13 處方1 塗布法 A A A A 實施例14 處方2 塗布法 A A A A 實施例15 處方3 塗布法 A A A A 實施例16 處方4 塗布法 B A A B 實施例17 處方5 塗布法 B B A B 實施例18 處方6 塗布法 A A A A 比較例1 處方14 轉印法 C C C B 比較例2 處方15 轉印法 B c A c 比較例3 處方16 轉印法 D A c c 從上述表3，能夠清楚明白在實施例之變形恢復率、 顯示不均、低溫發泡的任一者均良好。另一方面，得知在 比較例之評價項目的任一者均差。 -66- 200914959 【圖式簡單說明】 Μ 。 【元件符號說明】 4ηϊ· 〇Mw—3 3 9 4 0» Mw//Mn = 2. P〇: propylene oxide, EO: ethylene oxide) [Prescription B for coating solution for intermediate layer] . Polyvinyl alcohol · · · 3.22 parts (PVA -205, 80% of laneping rate, KURARAY (share) system) • Polyvinylpyrrolidone · · · 1.49 parts (PVA K-3 0, manufactured by ISP Japan Co., Ltd.) • Methanol...4 2.3 parts • Distilled water·. 5 24 parts Next, a coating liquid for a photosensitive resin composition layer composed of the prescription 1 shown in Table 2 below was applied to the formed intermediate layer and dried to "layer dry layer thickness 4.1 μm A photosensitive resin composition layer. In this way, the laminated structure of the PET temporary support/thermoplastic resin/intermediate layer/photosensitive resin composition layer (the total thickness of the three layers is Π·6 μm) is formed on the surface of the photosensitive resin composition layer. A polypropylene film having a thickness of 12 μm as a protective film is heated, pressed, and bonded to obtain a photosensitive transfer film (1) for a spacer. - Manufacturing of a color filter substrate - A black matrix, an R pixel, and a method described in paragraph number [0084] - 58 - 200914959 to [0095] described in JP-A-2005-83801 Color filters for G pixels and B pixels. Next, a transparent electrode of I TO (Indium Tin Oxide) is formed by sputtering on the R pixel, the G pixel, the B pixel, and the black matrix of the color filter substrate. - Production of Photo-Interstrate - The obtained spacer is peeled off by the protective film of the photosensitive transfer film (1), and the surface of the exposed photosensitive resin composition is superposed on the above-described sputtering to form an ITO film. On the ITO film of the color filter substrate, using a lamin type Lamic II type (manufactured by Hitachi INSTRUMENTS Co., Ltd.), on-line pressure/cm, 13 (pressure and heating conditions of TC at a conveying speed of 2 m/min) Then, after the PET temporary support is peeled off from the interface of the thermoplastic resin layer, the photosensitive resin composition layer is transferred together with the thermoplastic resin layer and the intermediate layer (layer formation process). Next, using a super high mercury lamp The proximity type exposure machine (manufactured by HITACHI HIGH TECH ELECTROENGINEERING Co., Ltd.) is configured such that a photomask (a quartz exposure mask having an image pattern) and a color filter substrate (the photomask and the thermoplastic resin layer are disposed to face each other) In a state of being vertically aligned in a substantially parallel manner, the distance between the surface of the contact surface of the photomask surface and the photosensitive resin composition layer is set to 40 μm and exposed The amount of 60m]/Cm2 is subjected to proximity exposure from the side of the thermoplastic resin layer through the mask. Next, a triethanolamine imaging solution (which will contain 3 〇 ° / ❶ triethanolamine, trade name: T-PD2 (Fuji FILM) The liquid is diluted with pure water to a ratio of 12 times (mixed in a ratio of 1 part of T-PD 2 to 11 parts of pure water) at 30° (:, flat nozzle pressure 〇.〇4MPa) Spray-image 50-59-200914959 seconds to remove the thermoplastic resin layer and the intermediate layer. Then, after blowing air on the glass substrate to remove the liquid, spray the pure water for 10 seconds using a shower. Wash with pure water and blow air to reduce the 'liquid volume on the substrate. Next, use sodium carbonate-based imaging solution (will contain 0.38 mol / liter of sodium bicarbonate '0.47 mol / liter of carbonic acid Sodium, 5% sodium dibutylnaphthalene sulfonate 'anionic surfactant, defoamer, stabilizer, trade name: T-CD1 (Fuji FILM), diluted 10 times with pure water Liquid), sprayed at 29 °C, conical nozzle pressure 〇 · 15 Μ P a The photosensitive resin layer was developed for 30 seconds to obtain a pattern image of the spacer. Next, the detergent (containing phosphate, citrate, nonionic surfactant, defoamer, stabilizer) was used with pure water. The product name "T-SD 3 (made by Fuji Photo Film Co., Ltd.)" is diluted to 10 times the dilution liquid) 'at 3 3 ° C for 20 seconds, the conical nozzle pressure is 0.0 2 Μ P a, using a shower spray The residue around the formed pattern image is removed by blowing to obtain a spacer pattern. Next, the color filter substrate provided with the spacer pattern is heat-treated at 230 ° C for 30 minutes (heat treatment process) to produce light. Interstitial. The obtained optical spacer was a columnar shape having a diameter of 24 μm and an average height of 3.6 μm. In addition, the average height is the highest optical spacer formed by the transparent electrode formation surface of IT 0 using a three-dimensional surface structure analysis microscope (manufactured by ZYGO Corporation, type: New View 5022) for 100 Å. The position is obtained from the average of 20 highs. Subsequently, a TFT substrate was prepared as a counter substrate, and a film of I τ Ο (I n d i u m T i η X i d e ; indium tin oxide) was formed on one surface of the TFT substrate by sputtering. -60 - 200914959 Next, the ITO film (transparent electrode) of the color filter substrate obtained above and the ruthenium film of the TFT substrate are patterned by PVA mode, and the polyimide film is further provided with a polyimide film. Alignment membrane. Subsequently, a sealing portion corresponding to a width of 0.5 mm and a height of 40 μm in a black matrix outer frame provided to surround the pixel group surrounding the color filter is applied to the sealing agent of the ultraviolet curable resin by a dispensing method. The liquid crystal for PVA mode was added dropwise, and the color filter substrate and the TFT substrate were bonded together. Subsequently, it was returned to normal pressure, and a load was applied and controlled in such a manner that the liquid crystal cell thickness was 4 μm. In this state, using a metal halide lamp and filtering, the optical device cuts off ultraviolet light of less than 340 nm, and exposes the sealant in a nitrogen atmosphere at a cumulative light amount of 340 to 390 nm and a light amount equivalent to 3,000 mJ/cm 2 . After hardening, the heat treatment causes the sealant to harden to obtain a liquid crystal cell. A polarizing plate (HLC 2-2518, manufactured by ANRITZ Co., Ltd.) was bonded to both surfaces of the liquid crystal cell obtained in this manner. Next, a backlight plate of the CCFL was formed and provided on the back side of the liquid crystal cell to which the polarizing plate was attached. To manufacture a PVA mode liquid crystal display device. -1 _ Deformation rate and deformation recovery rate (Condition 1) - (1) Deformation rate For the optical spacer, a micro hardness tester (DUH-W201, manufactured by Shimadzu Corporation) is used as follows. The measurement was carried out and evaluated according to the following criteria. The results are shown in Table 3. The measurement was carried out using a 50 μm 0 round hammer indenter with a maximum load of 50 mN, a holding time of 5 seconds, and a load-load-removal test. The measurement is performed in the range of -61 to 200914959. The deformation amount can be obtained according to the measurement, and the deformation rate can be obtained according to the following formula: Deformation rate (%) = (the amount of deformation due to weighting [micrometer] / height of the optical spacer [μm] X i 00 (Evaluation Criteria) A : The deformation ratio is 20% or more B: The deformation ratio is 1 5% or more and less than 20% C: The deformation ratio is 10% or more and less than 15%. D: The deformation rate is less than 10%. (2) Deformation recovery rate The deformation recovery rate is in accordance with The deformation recovery rate [%] was obtained and evaluated according to the τ reference. The results are shown in Table 3. The deformation recovery rate (%) = (the amount of deformation due to aggravation [micron] / the amount of recovery after exacerbation [micron] ])Χ1〇〇(Evaluation Criteria) A: The deformation recovery rate is 90% or more B: The deformation recovery rate is 85% or more and less than 90% C: The deformation rate is 75% or more and less than 85%. The deformation rate is less than 75 %. -2. Display unevenness - (1) Display unevenness due to poor gravity is not applied to the liquid crystal display device, and the liquid crystal display device is raised in parallel with the normal direction of the horizontal plane. After standing for 2 days under the conditions of 60 ° C, the gray scale display when the gray scale test signal was applied was observed using a visual and magnifying lens, -62 - 200914959, and the display unevenness was evaluated according to the following evaluation criteria. The results are shown in Table 3. (Evaluation criteria) A: No display unevenness was observed at all B: A slight unevenness was observed. C: Significantly uneven display was observed. (2) Liquid crystal display due to uneven display of low-temperature foaming The device was placed under 〇°c conditions for 2 days, and the gray scale test was observed using a visual and magnifying lens. The gray scale of the signal was displayed, and the display unevenness was evaluated according to the following evaluation criteria. The results are shown in Table 3. (Evaluation criteria) A: No display unevenness was observed at all B: A slight unevenness was observed. : Display unevenness was observed remarkably. (Examples 2 to 1 2, Comparative Examples 1 to 3) In Example 1, except that the compound (P) of the resin (A) obtained in Synthesis Example 1 was changed to Table 1 The optical spacers and the liquid crystal display device were produced in the same manner as in Example 1 except that the formulation 1 of the coating liquid for a photosensitive resin composition layer was further changed to the surface of the coating composition. The optical spacers and the liquid crystal display device were evaluated in the same manner as in the first embodiment. The results are shown in Table 3. The resulting optical spacer system had a cylindrical shape with a diameter of 14 μm and an average height of 3.6 μm. (Examples 13 to 18): Coating (Photoresist) Method - Photointerstitial Production - On the 200914959 ITO film of the above-described manufactured color filter substrate on which an ITO film was formed, 'using a slit-like nozzle A glass substrate MH-1600 (manufactured by FAS-Asia Co., Ltd.) was used to apply a coating liquid for a photosensitive resin composition layer composed of the following Table 2. Then, using a machine V CD (manufactured by Tokyo Ohka Co., Ltd.) and drying for 30 seconds to cause the coating film to lose fluidity, the film was first pre-baked with a film thickness of 2.4 μm. Layer (layer formation) Next, a photo spacer was produced on the color filter substrate by the same patterning process and procedure as in Example 1. However, the development of the carbonic acid-based developing solution was 300 μM/cm 2 . After the production of the optical spacers of °C and 60, the PVA mode liquid crystal display device was produced in the same manner as in the above-described color filter substrate. The obtained optical spacers and the PVA mode liquid crystal display were evaluated in the same manner as in the first embodiment. Table 3. The applicator is used to show the vacuum drying part of the drying oven to form the process. The exposure amount of the heat treatment is sec. Example 1 The device is compared with -64-200914959 [&lt;Nt(] T^s SO 4 fS 00 0.42 U-15 ΗΑ - IBA 00 (N P-31 20.5 0.227 0.0004 0.032 2.05 Prescription 15 ! Comparative Example 3 (N 00 CN 0.42 DPHA Ον \〇丨P-31 20.5 0.227 0.0004 0.032 2.05 Prescription 14 Comparative Example 2 fS 00 (N 14.1 0.42 U-15 ΗΑ * DPHA iT) tri 1 K CU 20.5 0.227 0.0004 0.032 2.05 Prescription 13 Comparative Example 1 (N 00 rvj 0.42 U-15 ΗΑ ON \6 1 X CU 20.5 0.227 0.0004 0.032 2.05 Prescription 12 ; Example 12 \〇CN 00 (N Inch · 0.42 U-15 ΗΑ 〇 VO &gt; η P-9 20.5 0.227 i_ : 0.0004 0.032 2.05 Prescription 11 Example 11 Ό (N 00 &lt; N 14.1 0.42 U-15 ΗΑ 1 〇s Ό P-25 20.5 0.227 i_ ;0.0004 0.032 2.05 Prescription 10 Example 10 Ό CS 00 &lt;N pair · 0.42 U- 6ΗΑ •rt Ό DPHA 00 (N Ό P-31 20.5 0.227 0.0004 0.032 2.05 Prescription 9 : Implementation ^ \D &lt;N 00 CM 14.1 0.42 U-15 ΗΑ Ό DPHA P-31 20.5 0.227 0.0004 0.032 2.05 Prescription 8 ! Example 8 fN 00 fN 0.42 U-15 ΗΑ oo (N «Ο DPHA P-31 20.5 0.227 0.0004 0.032 2.05 Prescription 7 Example 7 \ D (N 00 fN 0.42 U-15 ΗΑ DPHA 00 &lt;N | P-31 20.5 ! 0.227 0.0004 0.032 2.05 Prescription 6 Example; 6, 18: &lt;N 〇0 cs 0.42 U-15 ΗΑ «Τί Ό DPHA : P-31 20.5 : 0.227 0.0004 0.032 2.05 Prescription 5 Example 5 ' 17 rs 00 &lt; N 0.42 R- 1301 On P-31 20.5 0.227 0.000 4 0.032 2.05 Prescription 4 Example 4, 16 v〇(N 00 (N 0.42 U- 6ΗΑ Os Ό P-31 20.5 0.227 0.0004 0.032 2.05 Prescription 3 Example 3 ' 15 Ό CN CO CS 0.42 UA- 32Ρ 〇\ 'O ΟΝ P-31 20.5 0.227 0.0004 1 0.032 2.05 Prescription 2 Example 2 ' 14 VO (N 00 fN 0.42 UN- 3320HS Os «Ί P-31 20.5 0.227 0.0004 1 ! 0.032 2.05 Prescription 1 Example 1, 13 &lt; N 00 (N 14.1 0.42 U-15 ΗΑ Os Ό P-31 20.5 0.227 0.0004 0.032 2.05 Coating liquid for photosensitive resin composition layer 1-methoxy-2-propyl ester methyl ethyl ketone w ^ »- S ow s 〇^ Μ & § Pregnancy W Η ι|» 豳 Μ Μ ra ra ra SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL SOL The amount of the ester group-containing monomer (B1) containing the urethane group-containing monomer (Β 1) and the number of the propylene group-containing monomer (B2) having no urethane group are not containing an amine group. The amount of the acrylate group-containing monomer (B2) of the formate group is not the urethane group-containing monomer (B2) unsaturated bond number of the resin (A) solution of the resin (A) Solution amount W &amp;- Ww 秘 )) « ζ ζ y隹; Ill fr擀U Μ Π1 1: f ί hydroquinone monomethyl fi? I Η _ mask m + &lt; IX ό OO Si 廿 1 ^ its a B f _ night s撇Η 撇Ηα ο Q ο 芸 1 « £ s « a- g ^ H -s. ^ w -- (3ί(^)®4πκ>ιΒ60ε-ΙΑΙΧΙΝΟΗν ,itsg)«A3&gt; pieces SVHda ((Nffl Φ ¥Μ :Sweep i § pyridine negative Bt*H-疵)ιοετΉ'ιβΙΜ&lt;-4»Λ3&gt;£ίΜ*νΗ9.η二1ίρ&lt;4»Λ3&gt;£:·&amp;-ϋ)νΗΠ-η II 3iiiF&lt 4 fiber H-MSOSHOZee-Nn (Iffi 200914959 [Table 3] Formulation method deformation recovery rate deformation rate due to poor display of gravity due to poor display of low temperature foaming Example 1 Prescription 1 Transfer method AAAA Example 2 Prescription 2 Transfer method AAAA Example 3 Prescription 3 Transfer method AAAA Example 4 Prescription 4 Transfer method BAAB Example 5 Prescription 5 Transfer method BBAB Example 6 Prescription 6 Transfer method AAAA Example 7 Prescription 7 Transfer method AAAA Example 8 Formulation 8 Transfer Method AAAA Example 9 Prescription 9 Transfer Method BAAA Example 10 Prescription 10 Transfer Method AAAA Example 11 Prescription 11 Transfer Method BABA Implementation Example 12 Formulation 12 Transfer Method ABAA Example 13 Formulation 1 Coating Method AAAA Example 14 Formulation 2 Coating Method AAAA Example 15 Formulation 3 Coating Method AAAA Example 16 Prescription 4 Coating Method BAAB Example 17 Prescription 5 Coating Method BBAB Example 18 Formulation 6 Coating method AAAA Comparative example 1 Formulation 14 Transfer method CCCB Comparative example 2 Prescription 15 Transfer method B c A c Comparative example 3 Prescription 16 Transfer method DA cc From the above Table 3, the deformation of the embodiment can be clearly understood Any of the recovery rate, uneven display, and low-temperature foaming were good. On the other hand, it was found that any of the evaluation items in the comparative example was poor. -66- 200914959 [Simple description of the diagram] Μ . [Component Symbol Description] 4ηϊ· 〇

Claims (1)

200914959 十、申請專利範圍： 1 . 一種感光性樹脂組成物，其至少含有樹脂（其在側鏈含有 分枝及/或脂環結構之基、具有酸性基之基及具有乙烯性 不飽和基之基）、具有胺基甲酸酯基之聚合性單體及光$ 合引發劑。 2 .如申請專利範圍第1項之感光性樹脂組成物，其中更含 有未含有胺基甲酸酯基之具有（甲基）丙烯醯基之聚合性 單體。 3 ·如申請專利範圍第2項之感光性樹脂組成物，其中該未 含有胺基甲酸酯基之具有（甲基）丙烯醯基之聚合性單體 係具有2個以上之不飽和鍵。 4 如申請專利範圍第1項之感光性樹脂組成物，其中該具 有胺基甲酸酯基之聚合性單體係具有2個以上之不飽和 鍵。 5 .如申請專利範圍第2項之感光性樹脂組成物，其中該具 有胺基甲酸酯基之聚合性單體係具有2個以上之不飽和 鍵。 6.如申請專利範圍第3項之感光性樹脂組成物，其中該具 有胺基甲酸酯基之聚合性單體係具有2個以上之不飽和 鍵。 7 . —種光間隙物之製法，係在液晶顯示裝置（其至少具備2 片基板、設置在該基板間之液晶、用以對該液晶施加電 場之2片電極、及用以控制該基板間的液晶胞厚度之光 間隙物）之光間隙物之製法，具有以下製程， -68 - 200914959 層形成製程’其係在該2片基板的一方上面，使用 如申請專利範圍第1至6項中任〜項之感光性樹脂組成 物形成感光性樹脂層；及 圖案化製程，其係將所形成之該感光性樹脂層曝光 及驗顯像而圖案化。 8 ·如申請專利範圍第7項之光間隙物之製法，其中該感光 性樹脂層係藉由使用具有由該感光性樹脂組成物所形成 的感光性樹脂層之感光性轉印材料，以接觸該2片基板 的一方之方式轉印而形成。 9 .如申請專利範圍第7項之光間隙物之製法，其中該感光 性樹脂層係藉由將該感光性樹脂組成物塗布在該2片基 板的一方上面並乾燥而形成。 1 〇 . —種液晶顯示裝置用基板’其具備依照如申請專利範圍 第7項之光間隙物之製法所製成的光間隙物。 Π · —種液晶顯示元件，其具備如申請專利範圍第1 〇項之液 晶咸不裝置用基板。 1 2 . —種液晶顯示裝置，其具備如申請專利範圍第2丨項之液 晶顯示元件。 -69- 200914959 七、指定代表圖： (一） 本案指定代表圖為：無。 (二) 本代表圖之元件符號簡單說明： 〇 八、本案若有化學式時，請揭示最能顯示發明特徵的化學式：200914959 X. Patent application scope: 1. A photosensitive resin composition containing at least a resin (which has a branching and/or alicyclic structure in a side chain, a group having an acidic group, and an ethylenically unsaturated group) a polymerizable monomer having a urethane group and a photoinitiator. 2. The photosensitive resin composition of claim 1, which further comprises a polymerizable monomer having a (meth) acrylonitrile group which does not contain a urethane group. 3. The photosensitive resin composition according to claim 2, wherein the polymerizable monomer having a (meth)acryl fluorenyl group which does not contain a urethane group has two or more unsaturated bonds. 4. The photosensitive resin composition of claim 1, wherein the polymerizable single system having a urethane group has two or more unsaturated bonds. 5. The photosensitive resin composition of claim 2, wherein the polymerizable single system having a urethane group has two or more unsaturated bonds. 6. The photosensitive resin composition of claim 3, wherein the polymerizable single system having a urethane group has two or more unsaturated bonds. 7. A method for fabricating a light spacer according to a liquid crystal display device comprising at least two substrates, a liquid crystal disposed between the substrates, two electrodes for applying an electric field to the liquid crystal, and a substrate for controlling the substrate The method of manufacturing the optical spacer of the liquid crystal cell thickness of the liquid crystal cell has the following process, the -68 - 200914959 layer forming process is carried out on one of the two substrates, and is used in the first to sixth patent applications. The photosensitive resin composition of any one of the items forms a photosensitive resin layer; and a patterning process is performed by exposing and visualizing the formed photosensitive resin layer. 8. The method of producing a photo spacer according to claim 7, wherein the photosensitive resin layer is contacted by using a photosensitive transfer material having a photosensitive resin layer formed of the photosensitive resin composition. One of the two substrates is transferred and formed. 9. The method of producing an optical spacer according to claim 7, wherein the photosensitive resin layer is formed by applying the photosensitive resin composition onto one of the two substrates and drying. A substrate for a liquid crystal display device is provided with an optical spacer formed by a method of fabricating an optical spacer according to claim 7 of the patent application. A liquid crystal display element comprising the liquid crystal salt-free substrate according to the first aspect of the patent application. A liquid crystal display device comprising the liquid crystal display element of the second aspect of the patent application. -69- 200914959 VII. Designation of representative representatives: (1) The representative representative of the case is: None. (2) A brief description of the symbol of the representative figure: 八 8. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention:
TW097131512A 2007-09-28 2008-08-19 Photosensitive resin composition, method of producing photo spacer, substrate for liquid crystal display device, liquid crystal display element, and liquid crystal display device TW200914959A (en)

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