TW200818995A - Structure for attaching plasma gun to chamber - Google Patents
Structure for attaching plasma gun to chamber Download PDFInfo
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- TW200818995A TW200818995A TW96127187A TW96127187A TW200818995A TW 200818995 A TW200818995 A TW 200818995A TW 96127187 A TW96127187 A TW 96127187A TW 96127187 A TW96127187 A TW 96127187A TW 200818995 A TW200818995 A TW 200818995A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/08—Ion sources
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- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
200818995200818995
V 九、發明說明： 【發明所屬之技術領域】 本發明係關於一種將電漿槍安裝於電漿室之構造。 【先前技術】 電漿成膜裝置，係將從電漿搶產生之電聚使用為離子 源以成膜的裝置。此種電漿成膜裝置所使用之電藥槍，已 知有複合陰極型電漿搶、麼力梯度型電浆搶、及組合此等 之複合型電漿搶（例如，參考專利文獻υ。根據專利例文 獻1，複合型電漿搶係兼具複合陰極型電聚槍之優點及壓 力梯度型電漿搶之優點兩者的電漿搶。 然而，此複合型電漿槍，在安褒於電聚成膜裝置時， 必須同時安裝2個中間電極，因 U此具有作業效率不佳的問 遽〇 對於此問題，ρ知古_ ^ . 空成膜裝置的電漿源(例如，參:::二之:業性之真 ::r真空成膜裝置的電漿源 間琶極，因此可提昇安裝作業之作業性。 專利文獻1 :日本專利第2921874號 專利文獻2 :日太姓pq亚1 - W本特開千U —31537 【發明内容】 U么報 然而，專利文獻2所揭示之電Μ 位困難，因此安裝作孝 " 間電極之定 m #之作純仍有改善的空間。V IX. DESCRIPTION OF THE INVENTION: TECHNICAL FIELD The present invention relates to a structure in which a plasma gun is mounted in a plasma chamber. [Prior Art] A plasma film forming apparatus is a device which uses electricity generated by plasma grabbing as an ion source to form a film. As the electric medicine gun used in such a plasma film forming apparatus, a composite cathode type plasma grab, a force gradient type plasma grab, and a composite type plasma grab are known (for example, refer to the patent document). According to the patent example 1, the composite plasma grabs both the advantages of the composite cathode type electric gun and the advantages of the pressure gradient type plasma grab. Both of these composite type plasma guns are in the ampoule. When using the electro-polymerization film-forming device, two intermediate electrodes must be installed at the same time. Because of this, there is a problem of poor work efficiency. For this problem, ρ知古_ ^ . The plasma source of the empty film-forming device (for example, :::2: The truth of the industry:: r The bucking of the plasma source of the vacuum film forming apparatus, so that the workability of the mounting work can be improved. Patent Document 1: Japanese Patent No. 2921874 Patent Document 2: Japanese name Pq sub-1 - W Bent open thousand U - 31537 [Summary of the Invention] However, the electric power position disclosed in Patent Document 2 is difficult, so the installation of the filial " interelectrode is still pure. Space.
本叙明係為解決上M 種可容易定位構成，其目的在於提供一 女衣作業之作業性高之將電裝搶安裝於電 10 200818995This description is to solve the above-mentioned M kinds of easy-to-position components, and its purpose is to provide a woman's work with high workability and install the electric equipment on the electricity 10 200818995
V .漿室之構造。 為了解決上述問題，本發明之將電裝搶安裝於電 之構k ’其具備·電漿室，在其壁面設有電漿流入口；第 1卡合部及第1定位部，係設於該電漿流入口的周圍；兩 漿搶，在其電漿流出口的周圍具有凸緣，在該凸緣形成: 該=1卡合部卡合的第2卡合部及藉由該第i定位部定位 ㈣2^位部；以及鎖止機構；該第2卡合部係與該電裝 )a “第1卡σ"卩卡合，該第2定位部係藉由該電漿室之 :::1疋位部定位，該電漿流出口連通於該電漿室之該電 :抓入口且忒凸緣係藉由該鎖止機構緊壓固定於該電漿 室之壁面，以將該電漿搶安裝於該電漿室。 據此可谷易疋位，提高安裝作業之作業效率。 本發明之將電漿搶安裝於電漿室之構造中，該第！卡 合部係以卡合凸部構成，該帛2卡合部係以卡合凹部構成 亦可。 ^本發明之將電漿搶安裝於電漿室之構造中，該卡合凸 W係由本體部與設於該本體部前端之截面積大於該本體部 :頭销構成的第i銷，該卡合凹部係貫通孔，具有該卡 P之頭邠可插通的大孔部與連通於該大孔部之該卡合 凸部之本體部可插通的小孔部。 本發明之將電漿搶安裝於電漿室之構造中，該第i定 位部係定位凸部，該第2定位部係定位凹部亦可。 /本發明之將電漿槍安裝於電漿室之構造中，該定位凸 系第2鎖’該疋位凹部，在待定位方向具有該第2銷可 200818995 卡合的寬度’在其他方向具有大於 本發明之將電漿搶安裝於電聚室之構=度的：度。 構係以夹鉗機構構成亦可。 、μ鎖止機 依據本發明之將雷婿拾& # 可容易 ^ τ %氷槍女裝於電漿室之構造 疋位，提兩安裝作業之作業效率。 【實施方式】 以下參考圖式說明本發明之較佳實施形態。V. The construction of the pulp chamber. In order to solve the above problem, in the present invention, the electric device is mounted on the electric structure k', and the plasma chamber is provided, and a plasma inflow port is provided on the wall surface; the first engaging portion and the first positioning portion are provided in a periphery of the plasma inflow port; the two pulps have a flange around the outlet of the plasma, and the flange is formed: the second engaging portion of the engaging portion of the =1 and the i-th engaging portion Positioning portion positioning (4) 2^ position portion; and locking mechanism; the second engagement portion is engaged with the electric device) a "first card σ", the second positioning portion is by the plasma chamber: ::1 clamping position, the plasma outlet is connected to the electricity of the plasma chamber: the inlet is closed and the flange is fixed to the wall surface of the plasma chamber by the locking mechanism to The plasma is rushed to the plasma chamber. According to this, the valley can be used to improve the efficiency of the installation work. The plasma of the invention is installed in the structure of the plasma chamber, and the first engagement portion is a card. The ridge 2 engaging portion may be configured by an engaging recess. In the present invention, the plasma is smashed into the structure of the plasma chamber, and the engaging convex W is composed of the body portion and The cross-sectional area of the front end of the main body portion is larger than the main portion: the i-th pin formed by the pin, the engaging recess is a through hole, and has a large hole portion through which the head of the card P can be inserted and communicates with the large hole portion. The small hole portion through which the main body portion of the engaging convex portion can be inserted. In the structure of the plasma chamber of the present invention, the ith positioning portion is a positioning convex portion, and the second positioning portion is positioned The recess may also be installed. The plasma gun of the present invention is installed in the structure of the plasma chamber, and the positioning projection 2nd lock 'the recess of the clamp has the width of the second pin which can be engaged in 200818995 in the direction to be positioned' In other directions, there is a degree greater than the degree of construction of the plasma in the electropolymer chamber of the present invention. The configuration may be constituted by a clamping mechanism. The μ locking machine according to the present invention will be used for picking up &#可易^ τ % Ice gun women's construction in the plasma chamber, and the efficiency of the two installation operations. [Embodiment] Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings.
(實施形態1) ^圖1係顯示本發明實施形態1之將電漿搶安裝於電漿 至之構造之概略構成的示意圖。又，圖1中，省略一部分。 又’圖1中’將電漿搶安裝於電漿室之構造之上下方向係 顯示為圖中的上下方向。 如圖1所示’本實施形態1之將電漿槍安裝於電漿室 之構造100具備電漿槍1、電漿室2、及鎖止機構3(參考 圖4) 〇 電漿槍1具有陰極部7與中間電極單元6，中間電極 VU 一 早元6具有由第1中間電極4及第i磁鐵49構成之第J 中間電極子單元96、由第2中間電極5及第2磁鐵72構 成之第2中間電極子單元97、及絕緣構件5 1。 首先，說明陰極部7。 陰極部7具有圓筒狀的容器10。並藉由容器的内 部空間，形成放電空間11。 在容器10兩端分別設有凸緣12，13。容器10之凸緣 13側之端係敞開。另一方面，容器1〇之凸緣12側之端， 12 200818995(Embodiment 1) Fig. 1 is a schematic view showing a schematic configuration of a structure in which plasma is attached to a plasma according to Embodiment 1 of the present invention. In addition, in Fig. 1, a part is omitted. Further, the lower direction of the structure in which the plasma is attached to the plasma chamber is shown in the upper and lower directions in the drawing. As shown in Fig. 1, the structure 100 for mounting a plasma gun to a plasma chamber according to the first embodiment includes a plasma gun 1, a plasma chamber 2, and a lock mechanism 3 (refer to Fig. 4). The plasma gun 1 has The cathode portion 7 and the intermediate electrode unit 6, the intermediate electrode VU and the early element 6 have the Jth intermediate electrode subunit 96 composed of the first intermediate electrode 4 and the i-th magnet 49, and the second intermediate electrode 5 and the second magnet 72. The second intermediate electrode subunit 97 and the insulating member 51. First, the cathode portion 7 will be described. The cathode portion 7 has a cylindrical container 10. The discharge space 11 is formed by the inner space of the container. Flanges 12, 13 are provided at each end of the container 10. The end of the flange 10 side of the container 10 is open. On the other hand, the end of the flange 12 side of the container 1〇, 12 200818995
VV
被囫板狀之盍構件U to # 斤封閉。在盍構件14之盥凸缕 抵接之面（以下，稱為芸 ，、凸緣12 ~皿構件14之背面）設有在 陷之環狀的第1定位凹在厗度方向凹 15，以使凸緣12之外月而彻磁 成第1定位凹部15之外H b 之外周面與構 你二 之外周壁接觸。亦即，第1定位凹邻Η 係没成與凸緣12卡人。祕， 415 ^ . σ。據此，容器10與蓋構件14被定 位成彼此之中心軸一致。 破疋 在第1定位凹都1 ς ^ > 之厚度方向形成環狀的槽26，在 用以保持氣密性的。型環27。又，在容器⑺之 凸㈣側端部，圓環狀之固定構件28係嵌入容蒸 抑 固疋構件28與凸緣12之間’環構件3G係礙入容 在固定構1 28之適當部位，於厚度方向設置複數 貝k ? 29，在貫通孔29插通螺栓31。此螺栓31之前 :部螺入形成於蓋構件14㈣孔。以此方式，藉由以螺 1 口定固定構件28與蓋構件丨4，固定容器1 〇與蓋構 牛14此日守，藉由環構件30，可避免過度的力量施加於 了防止凸緣12破損。據此，能容易進行容器1 〇 與蓋構件14之定位及安裝。 在盍構件14表面，在厚度方向凹陷之環狀的冷卻流路 用凹# 21 ’係設成圍繞後述辅助陰極16之基端部。在冷 部流路用凹部21設有冷卻流路用蓋構件22，以覆蓋冷卻 /瓜路用凹部21的開口部。冷卻流路用凹部21與冷卻流路 用盖構件22所形成之空間構成第3冷卻流路23。此外， 在冷卻流路用蓋構件22之適當部位，分別設有用以將冷 部介質供應至第3冷卻流路23及從第3冷卻流路23排出 13 200818995 的弟,3::介質供應口 24及第3冷卻介質排出σ 25。第 3二二應口24係透過L字狀的接頭78，藉由適當 的-I、後返第i冷卻介質排出口 45連接。又，第3冷 二介I係藉由適當的配管與冷卻介質供應裝二 第二★接。藉由使冷卻介質(此處為水)流過如此形成之 弟7部机路23，可冷卻輔助陰極“The 囫 状 盍 member U to # 斤 is closed. A surface of the dam member 14 where the ridges abut against each other (hereinafter referred to as a cymbal, the flange 12 to the back surface of the dish member 14) is provided with a first positioning recess in the annular shape and a concave portion 15 in the twist direction. The outer periphery of the flange 12 is made magnetically outside the first positioning recess 15 and the outer peripheral surface of the Hb is in contact with the outer peripheral wall of the second. That is, the first positioning concave adjacent system is not in contact with the flange 12. Secret, 415 ^ . σ. Accordingly, the container 10 and the cover member 14 are positioned to coincide with each other's central axes. Breaking The annular groove 26 is formed in the thickness direction of the first positioning recess 1 ς ^ > to maintain airtightness. Type ring 27. Further, at the convex (four) side end portion of the container (7), the annular fixing member 28 is fitted between the vapor-suppressing member 28 and the flange 12, and the ring member 3G is prevented from being accommodated in the appropriate portion of the fixed structure 128. A plurality of shells k 29 are provided in the thickness direction, and the bolts 31 are inserted through the through holes 29. The front portion of the bolt 31 is screwed into the hole of the cover member 14 (four). In this way, by fixing the fixing member 28 and the cover member 丨4 with the screw 1, the container 1 and the cover member 14 are fixed, and by the ring member 30, excessive force can be prevented from being applied to the flange. 12 broken. Accordingly, the positioning and mounting of the container 1 〇 and the lid member 14 can be easily performed. On the surface of the crucible member 14, an annular cooling passage recessed in the thickness direction is recessed #21' to surround the base end portion of the auxiliary cathode 16 to be described later. The cooling flow path cover member 22 is provided in the cold portion flow path concave portion 21 so as to cover the opening portion of the cooling/guar path concave portion 21. The space formed by the cooling flow path concave portion 21 and the cooling flow path cover member 22 constitutes the third cooling flow path 23. Further, at a suitable portion of the cooling flow path cover member 22, a supply for supplying the cold medium to the third cooling flow path 23 and discharging the third cooling flow path 23 to the 200818995 is provided, respectively. 24 and the third cooling medium are discharged σ 25 . The 322th port 24 is connected through the L-shaped joint 78 by an appropriate -I and back to the i-th cooling medium discharge port 45. In addition, the third cold type I is connected to the cooling medium by a suitable pipe and a second supply. The auxiliary cathode can be cooled by flowing a cooling medium (here, water) through the thus formed sub-system 23
在蓋構…❿離)構成之圓二輔助陰極 ’以敦密性貫通蓋構件14的中心部，沿著容H 10的中 ::延伸：辅助…6之基端部，係藉由適當的配管與 回不之虱（Ar)氣體槽連接，Ar氣體從辅助 :應至放電空間U内。又，在輔助陰極16前端附近二 周面没有以六職鑭（LaB6)構成之圓環狀的主陰極Η。以 輔助陰極16與主降極17禮成险ϋ 1。. _ 構成陰極18。陰極18係藉由適 二配線’透過電阻(未圖示)與由直流電源構成之主電源 (禾圖不）之負極電氣連接。 。又，在蓋構件14的背面，氣密性配置直徑大於辅助降 ，上6之以鉬（Μο)或鎢（W)構成之圓筒狀的保護構件Η，二 與蓋構件14之中心軸同軸狀地延伸於蓋構件14的厚度方 :。在保護構# 19前端，設有以鎢構成之圓環狀的：構 件2〇°以此保護構件19與窗構件20保護陰極18。 接著，說明中間電極單元6。 首先，說明第1中間電極子單元96。 第1中間電極子單元96具備第i中間電極4 ,該第丄 中間電極4具有由板狀之第1凸緣32與筒狀之第丨保持 200818995The second auxiliary cathode formed in the cover structure is separated from the center portion of the cover member 14 along the center of the container H:: the base end of the auxiliary: 6 is provided by appropriate The piping is connected to the argon (Ar) gas tank, and the Ar gas is supplied from the auxiliary: to the discharge space U. Further, in the vicinity of the tip end of the auxiliary cathode 16, there is no annular main cathode 以 which is formed of a hexagonal lanthanum (LaB6). It is dangerous to assist the cathode 16 and the main descending pole 17 . . _ constitutes the cathode 18. The cathode 18 is electrically connected to a negative electrode of a main power source (not shown) composed of a direct current power source via a suitable wiring (not shown). . Further, on the back surface of the cover member 14, the airtight arrangement is larger than the auxiliary drop, and the upper 6 is a cylindrical protective member 钼 composed of molybdenum (Μο) or tungsten (W), and is coaxial with the central axis of the cover member 14. Extending in the thickness of the cover member 14: At the front end of the protective structure #19, an annular ring made of tungsten is provided: the member 2〇° to protect the cathode 18 by the protective member 19 and the window member 20. Next, the intermediate electrode unit 6 will be described. First, the first intermediate electrode subunit 96 will be described. The first intermediate electrode sub-unit 96 includes an i-th intermediate electrode 4 having a first flange 32 in a plate shape and a cylindrical first crucible. 200818995
VV
:構件43構成的第1殼體8、及筒狀的第1電極構件47, :1中間電極子單元96係設成與凸緣13抵接。具體而言， 第1凸緣32與凸緣13抵接。此外，第丨保持具構件u 之—端係連接於第1凸緣32之一侧主面。又，在第"呆 持具構件43之内孔嵌插第！電極構件。 第1凸緣32具有圓板狀之第1凸緣本體部32a與圓板 狀之第i蓋部32b。在第！凸緣本體部❿與第】蓋部… ，中心部設有貫通孔33a，33be此貫通孔仏，㈣構成電 此外在弟1凸緣本體部32a之與凸緣13 抵接的主面(以下，稱為第1凸緣本體部32a之表面），設 有在厚度方向凹陷之環狀的第2定位凹部34。藉由凸緣广3 卡合（嵌插）於此第2定位凹部34，容器1〇定位在第^凸 緣本體部32a，以使容g 1G之中心軸與第i凸緣本體部％ 之中心軸-致。又，在比第！凸緣本體部仏之表面之第 2定位凹部34内側的部分，形成低於該第2定位凹部Μ 的凹部m。此外’第2定位凹部34之内侧端部，構成為 與凸緣13之内周面面高相同。據此’能使容器1〇與第【 凸緣本體部32a之定位變容易。 ' 在第2定位凹部34之底面形成環狀的槽”，在槽Μ 配置用以保持氣密性的0型環36…在容器1〇之曰周壁 之凸緣13侧端部，圓環狀之固定構件37係嵌入容器1〇, 在固定構件37與凸緣13之間，環構件4〇係嵌入容^ 1〇。 在固定構件37之適當部位，設置複數個貫通1 3二在貫 通孔38插通螺栓39。此螺栓39之前端部螺入設於第^ = 15 200818995 緣本體部32a的螺：f丨γ+、 . ,, 系孔（未圖不）。以此方式，藉由以螺栓39 2定固定構件37與第i凸緣本體部32a，固定容器1〇與 弟1凸緣本體部32a。此時，#由環構件4〇，可避免過度 的力量施加於凸緣13，可防止凸緣13破損。據此，能容 易進行容益10與第i凸緣本體部32a之定位及安裝。 在第1凸緣本體部32a之背面形成凹部123以使外周 部122彡留為凸部。在凹部123設有構成後述第}冷卻流 路41的第1冷卻流路槽42。此外，在凹部123嵌入第i 现P 32b，以覆蓋第1冷卻流路槽42。在第1蓋部32b之 上部設有貫通孔46以與第丨冷卻流路槽42連通，該貫通 孔46形成第1冷卻介質供應口 46。第1冷卻介質供應口 46係藉由適當之配管，與後述第2冷卻介質排出口 連 接。 此外’第1保持具構件43之一端係連接於第1凸緣32， 第1保持具構件43係設成與電漿通過口 33之中心轴呈同 轴狀。第1保持具構件43係以第1外筒43a與第1内筒43bThe first casing 8 composed of the member 43 and the cylindrical first electrode member 47 and the intermediate electrode subunit 96 are abutted against the flange 13 . Specifically, the first flange 32 abuts against the flange 13 . Further, the end of the second holding member u is connected to one side main surface of the first flange 32. Also, insert the hole in the hole of the "stay member 43! Electrode member. The first flange 32 has a disk-shaped first flange body portion 32a and a disk-shaped i-th cover portion 32b. In the first! The flange body portion ❿ and the first cover portion are provided with through holes 33a, 33b for the through holes, and (4) for the main surface of the flange body portion 32a that is in contact with the flange 13 (hereinafter) The surface of the first flange main body portion 32a is provided with a second positioning recessed portion 34 that is recessed in the thickness direction. The container 1 is positioned on the second flange portion 32a by the flange 3 being inserted (inserted) in the second positioning recess 34 so that the central axis of the cavity g 1G and the i-th flange body portion are Center axis - to. Also, in the second! A portion inside the second positioning recess 34 on the surface of the flange main body portion forms a recess m lower than the second positioning recess portion 。. Further, the inner end portion of the second positioning concave portion 34 is configured to have the same height as the inner circumferential surface of the flange 13. According to this, the positioning of the container 1 and the [flange body portion 32a can be facilitated. 'An annular groove is formed on the bottom surface of the second positioning recess 34, and an O-ring 36 for maintaining airtightness is disposed in the groove. The end portion of the flange 13 of the peripheral wall of the container 1 is annular. The fixing member 37 is fitted into the container 1A, and the ring member 4 is fitted between the fixing member 37 and the flange 13. The appropriate portion of the fixing member 37 is provided with a plurality of through holes 13 through holes. 38. Insert the bolt 39. The front end of the bolt 39 is screwed into the screw provided on the edge body portion 32a of the ^=15 200818995: f丨γ+, . , , a hole (not shown). The fixing member 37 and the i-th flange body portion 32a are fixed by the bolt 39 2 to fix the container 1 and the flange body portion 32a of the first body. At this time, # is caused by the ring member 4 to prevent excessive force from being applied to the flange 13 Therefore, the flange 13 can be prevented from being damaged. Accordingly, the positioning and attachment of the accommodating portion 10a and the ith flange main body portion 32a can be easily performed. The concave portion 123 is formed on the back surface of the first flange main portion 32a so that the outer peripheral portion 122 is retained. The convex portion is provided with a first cooling channel groove 42 constituting a cooling passage 41 to be described later in the recess portion 123. Further, the first portion P 32b is fitted in the recess portion 123 to The first cooling channel groove 42 is covered. A through hole 46 is formed in the upper portion of the first lid portion 32b to communicate with the second cooling channel groove 42, and the through hole 46 forms the first cooling medium supply port 46. The first cooling medium The supply port 46 is connected to a second cooling medium discharge port to be described later by appropriate piping. Further, one end of the first holder member 43 is connected to the first flange 32, and the first holder member 43 is electrically connected. The central axis of the slurry passage port 33 is coaxial. The first holder member 43 is formed by the first outer cylinder 43a and the first inner cylinder 43b.
才筹 ° t tA 承i外同43a之内孔在離陰極i 8較遠側的端部形成 為』彳^ ’第1内筒43b嵌插於第1外筒43a以嵌合於此小 住4 56。據此，在第1内筒4扑與第1外筒43a之間形成 延伸於軸方向的第1筒狀空間44。第1内筒43b之接近陰 極1 8側的端部，嵌插於設在第1凸緣本體部32a之貫通孔 3 3 a p 3 、用口部。第1外筒43a之接近陰極18側的端部，嵌 插於第1蓋部32b之貫通孔33b，其端部與第1凸緣本體 立β q q a之凹部123的底面抵接。據此，封閉第1筒狀空間 16The inner hole of the outer surface 43a is formed at the end portion farther from the cathode i8, and the first inner cylinder 43b is inserted into the first outer cylinder 43a to fit in the small space. 4 56. As a result, the first cylindrical space 44 extending in the axial direction is formed between the first inner cylinder 4 and the first outer cylinder 43a. The end portion of the first inner cylinder 43b close to the cathode 18 is inserted into the through hole 3 3 a p 3 and the mouth portion provided in the first flange main portion 32a. The end portion of the first outer cylinder 43a on the side closer to the cathode 18 is inserted into the through hole 33b of the first lid portion 32b, and the end portion thereof abuts against the bottom surface of the concave portion 123 of the first flange body. According to this, the first cylindrical space is closed 16
I 200818995 44 〇 又，在第1外筒43a之離陰極18較遠侧的 朝向中心轴突φ $ & A n W又有 至内侧的凸緣56，藉由凸緣％ 筒狀空間44 〇此外，筮卜人”士 封閉弟 卜弟1冷部流路槽42及第1 介 44構成第1冷卻流路41。此 工曰 較遠側的端部，俜配詈…士 同之離陰極18 係配置成在轴方向突出至超過凸緣56的I 200818995 44 Further, the central axon φ $ & A n W on the far side of the first outer cylinder 43a from the cathode 18 has a flange 56 to the inner side, by the flange % cylindrical space 44 〇 In addition, the 筮 人 人 “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ “ The 18 series is configured to protrude in the axial direction beyond the flange 56
。，弟1中間電極4係藉由適當之配線，透 圖示）與主電源（未圖示）之正極電氣連接。、電阻（未 此處：參考圖！至圖3詳細說明第i冷卻流路Μ。 圖係、&著圖1所不之將電漿搶i安裝於電漿室2之 構造100之n — π線的截面圖。目3係顯示第i冷卻流路 之概略構成的示意圖。此外，圖2及圖3中，將電裝槍 1文I於電漿室2之構$ 1〇〇之上下左右方向係顯示為圖 中的上下左右方向。 如圖1及圖2所不’在第i凸緣32之帛J凸緣本體部 32a之下部設有f通厚度，方向的貫通孔45。該貫通孔c構 成第1冷卻介質排出口 45。此外，在第1凸緣本體部32a 之凹部123的底面設有第丨冷卻流路槽42以連通於貫通 孔45 〇 如圖2所示，第1冷卻流路槽42係由第丨冷卻流路槽 42a至第1冷卻流路槽42d構成，第1冷卻流路槽42a係 形成為從第1冷卻介質供應口 46沿著第i凸緣本體部32a 之外周，繞設至第1凸緣本體部32a之下部。接著，第1 冷郃流路槽42b沿著徑方向延伸至第1筒狀空間44。接著， 17 200818995 $ 1冷卻流路槽42c係形成為從第i筒狀空間料之上部沿 著钇方向延伸至第i凸緣本體，3之上部。接著，第1 冷部流路槽42d沿著第i凸緣本體部32a之外周，繞設至 第1凸緣本體音"2a之下部，以與貫通孔45(第1冷卻介 質排出口 45)連通。 斤又如圖3所不，在第1筒狀空間44設有分隔該第！ 筒狀工間44的一對分隔板丨〇丨，i 〇〗。分隔板i 〇 ^係連接於 第内筒43b之外周面與第1外筒43a之内周面，接近陰 極18侧之端部與第i凸緣本體部32a連接，另一方面，離 陰極1 8¾遂侧之端部，係設成在與帛1外冑心之小徑部 有間隙102。第1筒狀空間44之被分隔板1 〇 1 岡之側的二間（與第1冷卻流路槽42b連通側的空間） 構成第1冷部往路1G3a，另一侧的空間（與第^冷卻流路 槽^2C連通侧的空間）構成第1冷卻返路l〇3b。藉由使冷 貝l過如此形成之由冷卻流路槽與第1筒狀空間44 構成的第1冷卻流路41，可冷卻Ο型環36、第1磁鐵49、 及第1電極構件47。 山又’在第1保持具構件43(正確應為第i内筒43b)， 人插t所構成、具有耐熱性之圓筒狀的第1電極構件π， 弟1電極構件47係設成與電漿通過口 33之中心軸呈同軸 狀。此處，® 1 A _ ,弟1電極構件47螺入在外周面形成公螺桿、 在2面形成母螺桿的第1内筒43b。陰極18產生之電漿通 ^ 1 ^構件47的内部空間°第1電極構件47,在接 近陰極1 8彳目、丨+ ^ t 側之、部具有突出至外側的凸緣57，以該凸緣 200818995 57與第1凸緣32之第！凸緣本體部❿挾持甜甜圈狀的 保護板48。據此，能以存在於放電空間u等之電漿防止 第1凸緣3 2被濺;錄。. The middle electrode 4 of the brother 1 is electrically connected to the positive electrode of the main power source (not shown) by appropriate wiring. , resistance (not here: refer to the figure! to Figure 3 to explain the i-th cooling flow path in detail. Figure 1 &Figure; Figure 1 does not install the plasma to install the plasma chamber 2 of the structure 100 - Fig. 3 is a schematic view showing the schematic configuration of the i-th cooling flow path. Further, in Fig. 2 and Fig. 3, the electric gun 1 is placed above the structure of the plasma chamber 2. The left-right direction is shown in the up, down, left, and right directions in the drawing. As shown in Fig. 1 and Fig. 2, the through hole 45 is formed in the lower portion of the flange portion 32a of the i-th flange 32. The through hole c constitutes a first cooling medium discharge port 45. Further, a second cooling flow path groove 42 is provided in the bottom surface of the concave portion 123 of the first flange main portion 32a so as to communicate with the through hole 45. The cooling passage groove 42 is composed of a second cooling flow path groove 42a to a first cooling flow path groove 42d, and the first cooling flow path groove 42a is formed from the first cooling medium supply port 46 along the i-th flange body. The outer circumference of the portion 32a is wound around the lower portion of the first flange main portion 32a. Then, the first cold flow passage groove 42b extends in the radial direction to the first cylindrical space 44. Next, 17 200818995 $1 The cooling flow path groove 42c is formed to extend from the upper portion of the i-th cylindrical space material in the 钇 direction to the upper portion of the ith flange body 3, and then the first cold portion flow path groove 42d is along the ith The outer periphery of the flange main body portion 32a is wound around the lower portion of the first flange body sound "2a, and communicates with the through hole 45 (the first cooling medium discharge port 45). The pin is also shown in Fig. 3, in the first The tubular space 44 is provided with a pair of partition plates 分隔, i 〇 分隔, which partition the second cylindrical chamber 44. The partition plate i is connected to the outer circumferential surface of the inner cylinder 43b and the first outer cylinder On the inner peripheral surface of 43a, the end portion close to the cathode 18 side is connected to the i-th flange main body portion 32a, and on the other hand, the end portion on the side opposite to the cathode 1 83⁄4 side is set to have a small diameter outside the crucible 1 In the first cylindrical space 44, the two partitions 1 〇1 on the side of the partition (the space on the side communicating with the first cooling flow passage 42b) constitute the first cold portion forward path 1G3a, and the other side The space (the space on the side in communication with the second cooling channel groove ^2C) constitutes the first cooling return path l〇3b, and the cooling channel groove and the first cylindrical space 44 are formed by forming the cold shell 1 The first cooling flow path 41 can cool the Ο-shaped ring 36, the first magnet 49, and the first electrode member 47. The mountain is further in the first holder member 43 (correctly, the ith inner tube 43b). The cylindrical first electrode member π having heat resistance is formed, and the first electrode member 47 is coaxial with the central axis of the plasma passage opening 33. Here, the 1 1 A _ , the 1 electrode member 47. A first inner cylinder 43b is formed on the outer peripheral surface to form a male screw and a female screw is formed on both sides. The plasma generated by the cathode 18 passes through the internal space of the member 47. The first electrode member 47 is close to the cathode 18. The 彳, 丨 + ^ t side has a flange 57 protruding to the outside, with the flange 200818995 57 and the first flange 32! The flange body portion holds the donut-shaped protective plate 48. According to this, it is possible to prevent the first flange 3 2 from being splashed by the plasma existing in the discharge space u or the like;
再者，在第1保持具構件43(正確應為第！外筒43^， 嵌入圓環狀之第1磁鐵m磁鐵49係設.成與電漿通 過口 33之中心轴呈同軸狀。此處’第i磁鐵49係以永久 磁鐵構成，配置成接近陰極18之側為_，離陰極以較 遠之侧為s極。此外’第1壓止構件5〇(此處為螺帽）與第 \凸緣32(正確應為第1蓋部32b)挾持第1磁鐵49,將該 第1磁鐵49壓止成不會從第！外筒43a脫落。 第1保持具構件43之另-側端部(正確應為第"卜筒 43a之端面）’與圓環狀之絕緣構件51之―侧端面抵接。 在第1外筒43a之與絕緣構件51的抵接面形成環狀的槽 52’在該槽52配置心㈣氣密性的〇型環53。又1 賴件51之一部分歲入第1内筒视。據此，可容易進行 弟1保持具構件43與絕緣構件51的定位及安裝。 又，在絕緣構件51之外周面設有環狀之短路防止槽 5 4。據此，可防止因第中 缝椹m 專產生之結露水弄濕絕 之外周面所產生的第，中間電極4與第 電極5之間的短路。 :外’此處’雖短路防止槽54係環狀設於絕緣構件η 。面但並不限於此’只要槽設於絕緣構件5工之至 ::側部分即可…雖絕緣構件5 外同仏之直徑尺寸、及後述第2外筒58a之直徑^大1 19 200818995 致一定，絕緣構件51、第1外筒43a、及第2外筒58a之 外表面形成為無段差，但並不限於此，絕緣構件51之直 徑尺寸大於第1外筒43a及第2外筒58a之直徑尺寸，形 成為具有段差亦可。以此方式形成時，能更確實防止因結 露水造成之第1中間電極4與第2中間電極5之間產生的 短路。 接著，說明第2中間電極子單元97。Further, in the first holder member 43 (the first outer cylinder 43 is correctly formed, the first magnet m magnet 49 embedded in the annular shape is formed coaxially with the central axis of the plasma passage opening 33. The 'i-th magnet 49 is composed of a permanent magnet, and is disposed so that the side closer to the cathode 18 is _, and the far side from the cathode is the s pole. Further, the 'first pressing member 5 (here, the nut) and The first flange 32 (correctly the first cover portion 32b) holds the first magnet 49, and the first magnet 49 is pressed so as not to fall off from the outer cylinder 43a. The other side of the first holder member 43 The end portion (correctly the end face of the first cylinder) is abutted against the side end surface of the annular insulating member 51. The abutting surface of the first outer cylinder 43a and the insulating member 51 is formed in a ring shape. The groove 52' is provided with a core (4) airtight 〇-shaped ring 53 in the groove 52. One of the first members 51 is inserted into the first inner cylinder. Accordingly, the holder member 43 and the insulating member 51 can be easily performed. Further, an annular short-circuit preventing groove 5 is provided on the outer peripheral surface of the insulating member 51. Accordingly, it is possible to prevent the dew condensation water generated by the middle slit 椹m from being wetted by the outer peripheral surface. The first, the short circuit between the intermediate electrode 4 and the first electrode 5. The outer short-circuit preventing groove 54 is annularly provided on the insulating member η. The surface is not limited to this 'as long as the groove is provided in the insulating member 5 It is sufficient that the diameter of the outer diameter of the insulating member 5 and the diameter of the second outer cylinder 58a to be described later are larger than the diameter of the second outer cylinder 58a. 1 19 200818995, the insulating member 51, the first outer cylinder 43a, and the first The outer surface of the outer cylinder 58a is formed without a step, but the diameter of the insulating member 51 is larger than the diameter of the first outer cylinder 43a and the second outer cylinder 58a, and may be formed to have a step. At the time of formation, it is possible to more reliably prevent a short circuit occurring between the first intermediate electrode 4 and the second intermediate electrode 5 due to dew condensation water. Next, the second intermediate electrode subunit 97 will be described.
第2中間電極子單元97具備第2中間電極5，該第2 中間電極5具有由筒狀之第2保持具構件58與板狀之第2 2緣64與構成的第2殼體9、及筒狀的第2電極構件， 乐2中間電極子單元97與絕緣構件5丨之另一側端面抵接。 =體而言，第2保持具構件58與絕緣構#51抵接。此外， *保持具構件58之離陰極】8較遠侧的端部抵接於第2 凸緣6 4。又，太结〇 弟2保持具構件Μ之内孔嵌插鉬所構成、 :坧耐熱性之圓筒狀的第2電極構件71。此外，第2中間 ::係猎由適當的配線，透過電阻(未圖示)與 圖不）之正極電氣連接。 、不 狀之：2内I’、構件—58具有圓筒狀之第2外筒58a與圓筒 口 33之+ @5扑，第2保持具構件58係設成與電漿通過 之端部形成狀at2外筒*之接近陰極18侧 以嵌合此小徑部61。播 間娜丧插於第2外筒58a， 之間形成延伸於軸方Θ此’在第2内筒挪與第2外筒58a 、輛方向的第2筒狀空間62。 迷，第2保持具構件58(正確應為第2外筒_ 20 200818995 之接近陰極1 8伽夕* 8側之鳊面，與絕緣構件 第2外筒58a之盥举 之鳊面抵接，在 在評59配晋。 抵接面形成環狀的槽59, :日9配置。型環60。又’在第2内筒通之接近陰 ★側之端部設置外周面側具有 絕緣構件51之—^ 以位大起部63。 且Α 刀肷入此定位突起部63,藉此，可容 易進：絕緣:籌件51與第2保持具構件58的定位及安裝。The second intermediate electrode unit 97 includes a second intermediate electrode 5 having a second holder 9 having a tubular second holder member 58 and a plate-shaped second edge 64, and The tubular second electrode member, the second intermediate electrode subunit 97, abuts against the other end surface of the insulating member 5''. = Body The second holder member 58 is in contact with the insulating structure #51. Further, * the distal end portion of the holder member 58 from the cathode 8 abuts against the second flange 64. Further, the Tayakuji 2 holds a cylindrical second electrode member 71 which is formed by inserting molybdenum into the inner hole of the member. In addition, the second middle :: hunting is electrically connected to the positive electrode of the resistor (not shown) through a suitable wiring. No. 2, I-, member-58 has a cylindrical outer cylinder 58a and a cylindrical mouth 33 + @5, and the second holder member 58 is formed to form an end with the plasma. The outer portion of the outer tube *2 is close to the side of the cathode 18 to fit the small diameter portion 61. The broadcaster is inserted into the second outer cylinder 58a, and a second cylindrical space 62 extending in the second inner cylinder 58a and the vehicle direction is formed between the second inner cylinder and the second outer cylinder 58a. The second holder member 58 (correctly should be the second outer tube _ 20 200818995 close to the cathode 1 8 夕 * 8 side , surface, and the insulating member second outer tube 58a is abutted against the 鳊 surface, In the evaluation of 59, the abutting surface is formed with an annular groove 59, which is disposed on the day 9. The ring 60 is further provided with an insulating member 51 at the end portion of the second inner tube that is close to the female side. The erector is inserted into the positioning projection 63, whereby the insulation: the positioning and attachment of the assembly 51 and the second holder member 58 can be easily performed.
第弟21:158b之離陰極18較遠侧之端部嵌插於設在後 ^ 本體部⑷之貫通孔…的開口部。第2外筒 W之離陰極18較遠侧之端部嵌插於第2蓋部咐之貫通 孔州’其端部與第2凸緣本體·"4a之凹冑125的底面 抵接。據此，封閉第2筒壯办pq <。 、— 了闭弟2同狀工間62。又，第2筒狀空間62 構成第2冷卻流路66。 ’在弟2保持具構件58(正確應為第2外筒58a)， 嵌入圓環狀之第2磁鐵72,帛2磁鐵72係設成與電聚通 過口 33之中心轴呈同轴狀。此處，帛2磁鐵72係以電磁 線圈構成，通電有以接近陰極 較遠之側為N極之方向的電流 18之侧為s極，離陰極18 。此外，第2壓止構件77(此 處為螺帽）與第2凸緣64挾持第2磁鐵72，將該第2磁鐵 72壓止成不會從第2外筒58a脫落。 第2凸緣64具有圓板狀之第2凸緣本體部64a與圓板 狀之第2盍部64b，在第2凸緣本體部64a及第2蓋部04b 之中心部分別設有貫通於厚度方向的貫通孔65a，65b。此 貫通孔65a，65b構成電漿流出口 65。 在第2凸緣本體部64a之貫通孔65a，嵌插第2内筒58b 21 200818995 之離陰極18較遠側之端部，第2凸緣本體部64a係設成與 電漿通過口 33之中心軸呈同轴狀。又，在第2凸緣本體 部64a之接近陰極18側之主面（以下，稱為第2凸緣本體 部64a之表面）形成凹部125,以使外周部124成為凸部。 在凹部125設有構成第2冷卻流路66的第2冷卻流路槽 67。此外’第2蓋部64b嵌入凹部125以覆蓋第2冷卻^ 路槽67。The end portion of the second leg 21:158b which is farther from the cathode 18 is inserted into the opening of the through hole provided in the rear body portion (4). The end portion of the second outer cylinder W that is farther from the cathode 18 is inserted into the second cover portion, and the end portion thereof is in contact with the bottom surface of the recess 125 of the second flange body &4a. According to this, the second cylinder is closed and pq < , - Closed brother 2 the same situation 62. Further, the second cylindrical space 62 constitutes the second cooling flow path 66. The second holding member 58 (correctly the second outer cylinder 58a) is fitted into the annular second magnet 72, and the second magnet 72 is coaxial with the central axis of the electrical communication port 33. Here, the 帛2 magnet 72 is constituted by an electromagnetic coil, and is energized with a side of the current 18 which is in the direction of the N pole from the side closer to the cathode as the s pole and away from the cathode 18. Further, the second pressing member 77 (here, the nut) and the second flange 64 hold the second magnet 72, and the second magnet 72 is pressed so as not to fall off from the second outer cylinder 58a. The second flange 64 has a disk-shaped second flange body portion 64a and a disk-shaped second flange portion 64b, and is provided at a central portion of the second flange body portion 64a and the second lid portion 04b. Through holes 65a, 65b in the thickness direction. The through holes 65a, 65b constitute a plasma outflow port 65. In the through hole 65a of the second flange main portion 64a, the end portion of the second inner cylinder 58b 21 200818995 which is farther from the cathode 18 is inserted, and the second flange main portion 64a is connected to the plasma passage opening 33. The central axis is coaxial. Further, a concave portion 125 is formed on the main surface of the second flange main portion 64a close to the cathode 18 side (hereinafter referred to as the surface of the second flange main portion 64a) so that the outer peripheral portion 124 becomes a convex portion. The second cooling flow path groove 67 constituting the second cooling flow path 66 is provided in the concave portion 125. Further, the second cover portion 64b is fitted into the concave portion 125 to cover the second cooling passage groove 67.
第2蓋部64b係設成與電漿通過〇33之中心軸呈同軸 狀，第2外筒58a之離陰極1 8較遠側之端部抵接於第2芸 部64b。具體而言，在第2外筒58a之該端部形成小徑部68， 该小位部68肷插於第2盍部64b之貫通孔65b，其前端抵 接於第2凸緣本體部64a之凹部125的底面。 又，在第2盍部64b之上部，貫通孔69係設成與第2 冷卻流路槽67之上流端連通，該貫通孔69形成第2冷卻 介質供應口 69。再者，在第2蓋部64b之下部，貫通於厚 度方向之貫通孔70係設成與第2冷卻流路槽67之下流端 連通，該貫通孔70形成第2冷卻介質排出口 7〇。又，第 2冷卻介質供應口 69係藉由適當之配管連接於冷卻介質供 應裝置（未圖示），第2冷卻介質排出口 7〇係藉由適當之配 管與第1冷卻介質供應口 46連接。 此處，麥考圖1、圖4、及圖5詳細說明第2冷卻流路 66 ° 圖4係沿著圖1所示之將電漿槍丨安裝於電漿室2之 構造100之皿一HI線的截面圖。圖5係顯示圖J所示之電 22 200818995 水搶1之第2冷卻流路66之概略構成的示意圖。又，圖4 及圖5中’將電漿搶1安裝於電漿室2之構造1〇〇之上下 左右方向係顯示為圖中的上下左右方向。The second cover portion 64b is coaxial with the central axis of the plasma passage cymbal 33, and the distal end portion of the second outer cylinder 58a that is further away from the cathode 18 abuts against the second dam portion 64b. Specifically, the small diameter portion 68 is formed at the end portion of the second outer cylinder 58a, and the small portion 68 is inserted into the through hole 65b of the second flange portion 64b, and the tip end thereof abuts against the second flange body portion 64a. The bottom surface of the recess 125. Further, in the upper portion of the second weir portion 64b, the through hole 69 is formed to communicate with the upper end of the second cooling flow path groove 67, and the through hole 69 forms the second cooling medium supply port 69. Further, in the lower portion of the second lid portion 64b, the through hole 70 penetrating through the thickness direction is connected to communicate with the lower end of the second cooling flow path groove 67, and the through hole 70 forms the second cooling medium discharge port 7?. Further, the second cooling medium supply port 69 is connected to a cooling medium supply device (not shown) by an appropriate pipe, and the second cooling medium discharge port 7 is connected to the first cooling medium supply port 46 by an appropriate pipe. . Here, the first cooling flow path 66 ° is illustrated in detail in FIG. 1 , FIG. 4 , and FIG. 5 . FIG. 4 is a tray 100 of the structure 100 in which the plasma gun is mounted to the plasma chamber 2 as shown in FIG. 1 . A cross-sectional view of the HI line. Fig. 5 is a schematic view showing a schematic configuration of a second cooling flow path 66 of the electric water 22 200818995 shown in Fig. J. Further, in Fig. 4 and Fig. 5, the plasma is attached to the structure 1 of the plasma chamber 2, and the left and right directions are shown in the up, down, left, and right directions in the drawing.
如圖4所示’在第2凸緣本體部64a之凹部125的底 配置弟2冷卻流路槽67。第2冷卻流路槽67係由第2 冷郃流路槽67a至第2冷卻流路槽67d構成，第2冷卻流 路槽67a係形成為從第2冷卻介質供應口 69沿著第2凸緣 本體部64a之外周，繞設至第2凸緣本體部6乜之下部。 接著，第2冷卻流路槽67b沿著徑方向延伸至第2筒狀空 間62。接著，第2冷卻流路槽6八係形成為從第2筒狀空 =62之上部沿著徑方向延伸至第2凸緣本體部6物之上 部。接著，第2冷卻流路槽67d沿著第2凸緣本體部6牦 之外周，繞設至第2凸緣本體部64a之 7〇(第2冷卻介質排出π观通。 μ又，如圖5所示，在第2筒狀空間62設有分隔該第2 =狀空間62的-對分隔板1G4, 1()4。分隔板，係連接於 弟2内筒58b之外周面盘箆9 「η囬與弟2外同58a之内周面，離陰極 U較遠侧之端部與第2凸緣本體部連接，另—方面， 接近陰極關之端冑，係設成在與第2外筒…之小徑部 61之間具有間隙1〇5。帛2筒狀空間62之被分隔板1〇4 刀隔之-侧的空間(與第2冷卻流路#㈣連通侧的空間 構成第2冷卻往路106a，另一側的空間(與第2冷卻流路 槽67c連通側的空間）構成第2冷卻返路祕。藉由使a 部介質流過如此形成之由第2冷卻流路槽67與第2筒： 23 200818995 f間62構成的第2冷卻流路66,可冷卻後述〇型環89、 弟2磁鐵72、及第2電極構件71。 在第2凸緣本體部⑷之背面，在厚度方向具有 貝通孔之圓環狀之保護& 73,係安裝成與電漿通過口 33 之中心軸呈同軸狀。保護板73 之貝通孔之直徑尺寸稍微 ;弟2凸緣本體部64a之貫通孔…之直徑尺寸，保護 :之開口部係形成為較第2凸緣本體部64a之内周面更As shown in Fig. 4, the second cooling channel groove 67 is disposed at the bottom of the concave portion 125 of the second flange main portion 64a. The second cooling flow path groove 67 is formed by the second cooling flow path groove 67a to the second cooling flow path groove 67d, and the second cooling flow path groove 67a is formed so as to be along the second convex portion from the second cooling medium supply port 69. The outer periphery of the main body portion 64a is wound around the lower portion of the second flange main portion 6乜. Next, the second cooling flow path groove 67b extends in the radial direction to the second cylindrical space 62. Next, the second cooling flow path groove 6 is formed so as to extend from the upper portion of the second cylindrical space = 62 to the upper portion of the second flange main portion 6 in the radial direction. Next, the second cooling flow path groove 67d is wound around the outer circumference of the second flange main portion 6牦, and is wound around the second flange main portion 64a (the second cooling medium is discharged by π. μ, as shown in the figure As shown in Fig. 5, the second tubular space 62 is provided with a pair of partition plates 1G4, 1() 4 that partition the second = space 62. The partition plate is connected to the outer peripheral disk of the inner cylinder 58b.箆9 "The inner circumference of the outer surface 58a of the η back and the brother 2 is connected to the second flange main body portion from the far side of the cathode U, and the other end is close to the end of the cathode, and is set to There is a gap 1〇5 between the small-diameter portions 61 of the second outer cylinders. The partitioning plate 1〇4 of the 筒2 cylindrical space 62 is spaced apart from the space on the side of the knife (the second cooling flow path #4) The space constitutes the second cooling path 106a, and the other space (the space on the side in communication with the second cooling channel groove 67c) constitutes the second cooling path. The second medium is formed by the second medium. The cooling passage groove 67 and the second cooling passage 66 formed by the second cylinder 23 are connected to the second cooling passage 66, which can be cooled, and the second flange member, the second magnet 72, and the second electrode member 71 can be cooled. The back of the part (4), in the thickness direction The ring-shaped protection & 73 of the Beton hole is mounted coaxially with the central axis of the plasma passage port 33. The diameter of the bead through hole of the protection plate 73 is slightly smaller; the second flange body portion 64a is penetrated. The diameter of the hole, the protection: the opening portion is formed to be larger than the inner peripheral surface of the second flange body portion 64a.
:出至中心軸侧。據此，第2電極構件71之離陰極18較 • i之端邠與保濩S 73之開口部抵接，可容易進行第2 :極構件71之定位。又’能以存在於電漿流出口 65等之 私漿防止第2凸緣64被濺鍍。 在第2凸緣64(正確應為第2凸緣本體部64&之表面） Ρ σ又有在厚度方向凹陷的螺孔74(參考圖1及圖4)。 *、在第1凸緣32之上部，對應於螺孔74的位置，設有 ^於厚度方向的^位貫通孔75(參考圖i及圖2)。又， 在第1凸緣本體部32a之表面嵌插定位貫通孔75，並設有 :累孔74的螺栓（固定具）76。螺栓76將第1凸緣32固 定於第2凸緣64。據此，能容易將第i中間電極4與第2 中間電極5定位、安裝。 / 接著，就明本實施形態丨之將電漿搶i安裝於電漿室 2之狀態之構造。 如圖1所示，在電漿室2之安裝電漿槍丄之壁面8〇的 表面，叹有在厚度方向凹陷、具有段面82的凹部81。在 凹邛8 1之底面設有貫通於厚度方向的貫通孔，以與電 24 200818995 聚流出口 6 5遠摘 外| 該貝通孔83構成電漿流入口 83。 在凹部Μ配置短圓筒狀的第2 絕緣構件84之外在弟2 # α面之一側端部（離陰極18較遠側的端部） 二ir向外側的突起部84a。第2絕緣構件… : 大起部84a與段面82、將配置於該等之上的環構 件Μ以螺桿固定於凹部81，而安裳於凹㈣。又= 2凹部82之第？ pm 你乐 ^ 、吧緣構件84抵接的部分設有環狀的槽86， 在忒槽86 β又有0型環87。據此，可將電漿室2與第2中 間雜5料成氣密狀態，且使彼此絕緣。 第2、、巴緣構件Μ之與壁面8〇抵接之面的相反面（以 下，稱為第2絕緣構件84的表面），與電漿搶」之第2凸 、、彖本體4 64a抵接，在該表面設有環狀的槽88。此外，在 槽88設有用以保持氣密性的0型環89。 在J面8〇的上部配置第1卡合部（卡合凸部）之第1銷 90 .亥第1銷90 ’係由具有圓筒狀之絕緣轴環％盘私入 該絕緣軸環92之軸部99的本體部⑽，及以絕緣材：構 成。又於β亥本體^ 90a前端之截面積大於本體部9彻的頭 部90b構成。另一方面，在第2凸緣構件64的上部設有 卡合凹部（第2卡合部）91，該卡合凹部91，係由貫通於厚 度方向、第1銷90之頭部暢可插通的大孔部，及連 通於該大孔部9la、帛“肖9〇之本體部9〇a可插通的小孔 部91b構成（參考圖4)。 又，在壁面80的下部配置由圓筒狀之絕緣軸環與 嵌入該絕緣轴環93a之輛部9孙構成之定位凸部（第i定^ 25 200818995 部）之第2銷94。 凸緣本體部6 4 a的下: Exit to the center axis side. As a result, the second electrode member 71 is closer to the opening of the cathode 18 than the opening of the gate S, and the second electrode member 71 can be easily positioned. Further, the second flange 64 can be prevented from being sputtered by the smear existing in the plasma outflow port 65 or the like. In the second flange 64 (which should be the surface of the second flange main portion 64 & correctly), σ σ has a screw hole 74 recessed in the thickness direction (refer to Figs. 1 and 4). * In the upper portion of the first flange 32, a through hole 75 in the thickness direction is provided corresponding to the position of the screw hole 74 (refer to Figs. i and 2). Further, a positioning through hole 75 is fitted into the surface of the first flange main portion 32a, and a bolt (fixture) 76 of the hole 74 is provided. The bolt 76 fixes the first flange 32 to the second flange 64. According to this, the i-th intermediate electrode 4 and the second intermediate electrode 5 can be easily positioned and mounted. / Next, the structure in which the plasma is mounted in the plasma chamber 2 is exemplified in the embodiment. As shown in Fig. 1, on the surface of the wall chamber 8 of the plasma chamber 2 where the plasma gun is mounted, a recess 81 having a segment surface 82 recessed in the thickness direction is smacked. A through hole penetrating in the thickness direction is provided on the bottom surface of the recess 8 1 so as to be separated from the current outlet 6 5 of the electric power. The beacon hole 83 constitutes a plasma inflow port 83. In addition to the second insulating member 84 having a short cylindrical shape in the recessed portion, the one end portion of the second side of the second side of the second side (the end portion farther from the side of the cathode 18) and the outer side protruding portion 84a. The second insulating member: the raised portion 84a and the segment surface 82, and the ring member disposed on the above-mentioned surface are screwed to the concave portion 81 by screws, and are held in the concave portion (four). Also = 2 the second part of the recess 82 Pm You have a ring groove 86 in the portion where the edge member 84 abuts, and a 0 ring 87 in the groove 86 β. According to this, the plasma chamber 2 and the second intermediate material 5 can be made airtight and insulated from each other. Second, the surface opposite to the surface on which the wall member 8 abuts against the wall surface 8 (hereinafter referred to as the surface of the second insulating member 84) is in contact with the second projection of the plasma and the body 4 64a. Then, an annular groove 88 is provided on the surface. Further, the groove 88 is provided with a 0-ring 89 for maintaining airtightness. The first pin 90 of the first engaging portion (engaging convex portion) is disposed on the upper portion of the J-face 8A. The first pin 90' is privately inserted into the insulating collar 92 by a cylindrical insulating collar. The main body portion (10) of the shaft portion 99 is formed of an insulating material. Further, the cross-sectional area of the front end of the β-body body 90a is larger than the head portion 90b of the body portion 9. On the other hand, an engagement recess (second engagement portion) 91 is provided on the upper portion of the second flange member 64, and the engagement recess 91 is inserted through the head in the thickness direction and the first pin 90. The large hole portion that is opened and the small hole portion 91b that is connected to the large hole portion 91a and the "body portion 9a" of the shaft 9b are formed (refer to FIG. 4). Further, the lower portion of the wall surface 80 is disposed. The cylindrical insulating collar and the second pin 94 of the positioning convex portion (the second portion of the first portion) are embedded in the portion of the arm portion 9a of the insulating collar 93a. The lower portion of the flange body portion 6 4 a
第2銷94 之直徑尺寸，以 另一方面，在第2 部設有從第2凸緣本體部 凹部（第2定位部）之缺口 待定位方向具有第2銷 ϊ 94定位。又，缺口部 2凸緣本體部64a的下 有大於第2鎖94之寬度g 方向之尺寸係設計成稍微大於第2〜 使第2銷94可插通、且藉由第2銷 95之上下方向之尺寸係設計成從第： 端大於第2銷94之直徑尺寸。 此外，使卡合凹部91(正確應為小孔部91b)之内面的 上端部抵接於第1銷90之本體部90a(正確應為絕緣軸環92) 之上端部，以將電漿槍丨相對電漿室2定位於上下方向。 又’卡合凹部91之小孔部91b之上侧的緣部與第i銷9〇 之本體部90a(正確應為絕緣轴環92)卡合，又，第2銷94 在左右方向抵接缺口部9 5的内面，藉此將電毁搶ϊ相對 電漿室2定位於周方向（左右方向）。據此，可容易將電浆 室2與電漿搶1定位及暫時固定。 以此方式，以鎖止機構3將暫時固定於電漿室2之電 漿槍1加以鎖止，藉此能容易將電漿搶1安裝於電漿室2。 此處，參考圖6說明鎖止機構3之將電漿槍ϊ鎖止於 電漿室2的方法。 圖6係顯示圖4所示之鎖止機構3之概略構成的示专 圖。 如圖4及圖6所示，鎖止機構3係配置於設在電聚室 26 200818995 2之土面80的平台98，此處，使用公知之肘節型的夾鉗。 鎖止機構3具有基部3a、操作臂扑、卡止臂“、及 連結操作臂3b與卡止臂3c的連結構件％。基部係由 固定於平台98之板狀的固定部3〇la、及在垂直方向突出 至該固定部3〇la的基座部拠構成。在基座部廳的基 端部設有操作f 3b，又，在基座部3()lb的前端部設有卡On the other hand, in the second portion, the second pin portion 94 is provided with the second pin ϊ 94 in the direction in which the second flange main body concave portion (second positioning portion) is to be positioned. Further, the size of the notch portion 2 of the flange main body portion 64a is larger than the width g direction of the second lock 94, and is designed to be slightly larger than the second to the second pin 94, and the second pin 95 can be inserted. The dimension of the direction is designed to be larger than the diameter of the second pin 94 from the first end. Further, the upper end portion of the inner surface of the engaging recessed portion 91 (which should be the small hole portion 91b correctly) abuts against the upper end portion of the main body portion 90a of the first pin 90 (correctly, the insulating collar 92) to apply the plasma gun The crucible is positioned relative to the plasma chamber 2 in the up and down direction. Further, the edge portion on the upper side of the small hole portion 91b of the engaging recessed portion 91 is engaged with the main body portion 90a of the i-th pin 9 (correctly, the insulating collar 92), and the second pin 94 abuts in the left-right direction. The inner surface of the notch portion 915 is thereby positioned to be positioned in the circumferential direction (left-right direction) with respect to the plasma chamber 2 with respect to the electric blast. According to this, the plasma chamber 2 and the plasma can be easily positioned and temporarily fixed. In this manner, the plasma gun 1 temporarily fixed to the plasma chamber 2 is locked by the lock mechanism 3, whereby the plasma can be easily attached to the plasma chamber 2. Here, a method of locking the plasma gun to the plasma chamber 2 of the lock mechanism 3 will be described with reference to FIG. Fig. 6 is a view showing a schematic configuration of the lock mechanism 3 shown in Fig. 4. As shown in Figs. 4 and 6, the lock mechanism 3 is disposed on a platform 98 provided on the soil surface 80 of the electropolymer chamber 26 200818995 2, and a known toggle type clamp is used. The lock mechanism 3 has a base portion 3a, an operation arm flap, a locking arm ", and a coupling member % that connects the operation arm 3b and the locking arm 3c. The base portion is a plate-shaped fixing portion 3〇la fixed to the platform 98, and The base portion 突出 protruding to the fixing portion 3〇1a in the vertical direction is provided. The operation f 3b is provided at the base end portion of the base portion hall, and the card is provided at the front end portion of the base portion 3 () lb
操作臂3b係由手柄部3〇2a與臂部遍構成。此外， 插作臂3b係設成臂部_之基端部能在基部3&之基座部 3〇lb以旋動軸201為軸旋動自如。 卜丁、两茛度尺寸長的第 入，下止霄 寸短的第2部分_構成，形成為L字狀。第！部 》303a之基端係設成能在基部3a之基座部如 以旋動轴202為軸旋動自如 月㈤ 第2凸緣64之第2凸缘本體二…㈣之前端部與 弟凸緣本體部“a抵接、或離開。 弟1部分303a之接近其嫂认你 〜 ^的位置，連結構件3d之一端係 权成能以旋動軸203為軸旋動自如。 鈿係 連結構件3 d之另一 止、另鸲係設成能在操作臂外之大致中 央以方疋動轴204為軸旋動白 從山 自如。又，在連結構件3d之女 致中央部分設有與卡止臂3e笛 之大 的制動件304。 弟1 B咖抵接或離開 〜辟 级㈣2〇1為起點，使操作臂3b擺動於豐立方 U面80之犀度方向)時，伴隨於此 > 軸202為起點擺動。卡止 — 詹以％動 C之第2部分之前端部與第2 27 200818995 凸緣本體部64a之表面抵接，將第2 凸緣本體部64a緊壓 主私漿至2之壁面80側。此時，連蛀 ^ ^ , 逆、、°構件3d之制動件3〇4 之^ 4與卡止臂3c之第i部分抵接， w人，猎由使旋動軸203 /、紅動軸204排列於卡止臂3c之豎立方向，卡止臂孔不 會擺動於登立方向，因此可將電聚搶i鎖止於電聚室2。 又’此處，雖鎖止機構3使用肘節型的失鉗，但並不限於 此可使用具備倍力機構的各種夾甜。 接著，說明本實施形態1之電漿搶〗之冷卻介質的流 動0 百先，以未圖示之冷卻介質供應裝置冷卻之冷卻介質， 係透過適當的配管供應至第2冷卻介質供應口 69。接著， 冷卻介質從第2冷卻介質供應口 69沿著第2凸緣本體部64a 之外周’流經第2冷卻流路槽67a至第2凸緣本體部64a 的下部，接著，流經第2冷卻流路槽67b至第2筒狀空間 62(正確應為第2冷卻往路1〇^)(參考圖4)。接著，冷卻介 質流經第2冷卻往路l〇6a，在間隙105折返，流經第2冷 卻返路106b(參考圖5)。此時，第2電極構件71透過第2 内筒58b被冷卻，且第2磁鐵72透過第2外筒58&被冷卻。 接著，冷卻介質流經第2冷卻流路槽67c至第2凸緣本體 部64a的上部，接著，沿著第2凸緣本體部64a之外周， 流經第2冷卻流路槽67d至第2冷卻介質排出口 70。以此 方式，藉由冷卻介質流經第2冷卻流路槽67a至67d，可 冷卻第2凸緣本體部64a，藉此可冷卻〇型環89。如此， 藉由冷卻介質流經第2冷卻流路66，可冷卻〇型環89、 28 200818995 第2磁鐵72、及第2電極構件71。The operating arm 3b is constituted by the handle portion 3〇2a and the arm portion. Further, the insertion arm 3b is provided such that the base end portion of the arm portion can be rotated about the rotation shaft 201 at the base portion 3〇1b of the base portion 3&. The pudding, the second entry with a long dimension, and the second part _, which is short in length, are formed in an L shape. The first! The base end of the portion 303a is configured to be rotatable on the base portion of the base portion 3a, such as with the rotation shaft 202 as a shaft. (5) The second flange body 2 of the second flange 64 is the front end portion of the second flange body. The edge body portion "a abuts or leaves. The position of the part 1 303a close to the 嫂 〜 〜 ^ ^ , , , , , , , , , , , , , , , , , , , , , ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ 。 。 。 。 。 The other end of the 3d is set to be able to rotate the white shaft from the center of the outer side of the operating arm with the square tilting shaft 204 as an axis. Also, the central part of the female member of the connecting member 3d is provided with a card. The brake member 304 of the large arm 3e flute. When the brother 1 B is abutted or left, the level (4) 2〇1 is the starting point, and the operating arm 3b is swung in the rhythm direction of the Umbrella U plane 80, accompanied by this > The shaft 202 is pivoted from the starting point. The locking--the front end portion of the second portion of the movable portion C is abutted against the surface of the flange body portion 64a of the second 27 200818995, and the second flange body portion 64a is pressed against the main slab. At the side of the wall 80 of the 2nd wall. At this time, the brake member 3〇4 of the 蛀^^, reverse, and the member 3d abuts the i-th portion of the locking arm 3c, w, hunting The rotation shaft 203 / and the red motion shaft 204 are arranged in the vertical direction of the locking arm 3c, and the locking arm hole does not swing in the climbing direction, so that the electric energy can be locked in the electric polymerization chamber 2. In the lock mechanism 3, the toggle mechanism is used, but the clamp is not limited thereto. Various types of clips having a double force mechanism can be used. Next, the flow of the cooling medium of the plasma of the first embodiment will be described. First, the cooling medium cooled by the cooling medium supply device (not shown) is supplied to the second cooling medium supply port 69 through an appropriate pipe. Then, the cooling medium is supplied from the second cooling medium supply port 69 along the second flange body. The outer circumference of the portion 64a flows through the lower portion of the second cooling flow path groove 67a to the second flange main portion 64a, and then flows through the second cooling flow path groove 67b to the second cylindrical space 62 (correctly, the second cooling is required) Then, the cooling medium flows through the second cooling path l〇6a, turns back in the gap 105, and flows through the second cooling return path 106b (refer to FIG. 5). At this time, the second electrode The member 71 is cooled by the second inner cylinder 58b, and the second magnet 72 is cooled by the second outer cylinder 58 & The medium flows through the second cooling channel groove 67c to the upper portion of the second flange body portion 64a, and then flows through the second cooling channel groove 67d to the second cooling medium row along the outer circumference of the second flange body portion 64a. In this manner, the second flange body portion 64a can be cooled by the cooling medium flowing through the second cooling flow path grooves 67a to 67d, whereby the 〇-shaped ring 89 can be cooled. Thus, the cooling medium flows through The second cooling flow path 66 cools the 〇-shaped ring 89, 28 200818995, the second magnet 72, and the second electrode member 71.
接著，冷卻介質，係透過適當的配營從第2冷卻介質 排出Π 70供應至第i冷卻介質供應σ 46。接著，冷卻介 質從第1冷卻介質供應口 46沿著第1凸緣本體部32a之外 周’流經$ 1冷卻流路槽42a至第1凸緣本體部32a的下 部’接著，流經第i冷卻流路槽42b至第i筒狀空間料（正 確應為第i冷卻往路1()3a)(參考圖2)。接著，冷卻介質流 經第丨冷卻往路1〇3&，在間隙102折返，流經第】冷卻返 路103b(參考圖3)。此時，第i電極構件47透過第i内筒 43b被冷卻，且第i磁鐵49透過第！外筒43&被冷卻。接 著，冷卻介質流經第1冷卻流路槽42c至第丨凸緣本體部 32a的上部，接著，沿著第！凸緣本體部32&之外周，流 經第1冷卻流路槽42d至第1冷卻介質排出口 45。以此方 式’藉由冷卻介質流經第1冷卻流路槽42a至42d，可冷 卻第1凸緣本體部32a，藉此可冷卻Ο型環36。如此，藉 由冷卻介質流經第1冷卻流路41，可冷卻〇型環36、第j 磁鐵49、及第1電極構件47。 接著，冷卻介質，係透過適當的配管從第1冷卻介質 排出口 45供應至第3冷卻介質供應口 24，流經第3冷卻 流路23。據此，可冷卻輔助陰極16的基端部。接著，冷 卻介質，係透過適當的配管從第3冷卻介質排出口 25排 出至冷卻介質供應裝置。 接著，說明本實施形態1之將電漿槍1安裝於電聚室 2之構造100之電漿槍1的組裝方法。 29 200818995 首先’說明陰極部7的組裝方法。 在蓋構件14的背面安裝陰極18等。由於此陰極^與 =知複合陰極型相同，因此省略其詳細安裝方法。將〇型 環27嵌入設於安裝有陰極18等 <盍構件14背面之環狀 的槽26，將容器1〇之凸緣12嵌 瓜八弟1定位凹部15。此 時，由於凸緣12之外周面與構成第i定位凹部15的外周 壁接觸，因此容器1〇與蓋構件14互相定位。是以，可容 易進行定位。Next, the cooling medium is supplied from the second cooling medium discharge port 70 to the i-th cooling medium supply σ 46 through an appropriate distribution. Then, the cooling medium flows from the first cooling medium supply port 46 along the outer circumference of the first flange main portion 32a through the $1 cooling flow path groove 42a to the lower portion of the first flange main portion 32a, and then flows through the i-th The cooling flow path groove 42b to the i-th cylindrical space material (correctly should be the i-th cooling path 1 () 3a) (refer to FIG. 2). Then, the cooling medium flows through the second cooling path 1〇3&, and is folded back in the gap 102 to flow through the first cooling return path 103b (refer to Fig. 3). At this time, the i-th electrode member 47 is cooled by the i-th inner cylinder 43b, and the i-th magnet 49 is transmitted through the first! The outer cylinder 43& is cooled. Then, the cooling medium flows through the first cooling flow path groove 42c to the upper portion of the second flange body portion 32a, and then, along the first! The outer periphery of the flange main body portion 32 & passes through the first cooling flow path groove 42d to the first cooling medium discharge port 45. In this manner, by flowing the cooling medium through the first cooling flow path grooves 42a to 42d, the first flange main portion 32a can be cooled, whereby the Ο-shaped ring 36 can be cooled. As described above, the cooling medium flows through the first cooling flow path 41, whereby the 〇-shaped ring 36, the j-th magnet 49, and the first electrode member 47 can be cooled. Then, the cooling medium is supplied from the first cooling medium discharge port 45 to the third cooling medium supply port 24 through an appropriate pipe, and flows through the third cooling flow path 23. According to this, the base end portion of the auxiliary cathode 16 can be cooled. Then, the cooling medium is discharged from the third cooling medium discharge port 25 to the cooling medium supply device through an appropriate piping. Next, a method of assembling the plasma gun 1 in which the plasma gun 1 is attached to the structure 100 of the electric polymerization chamber 2 will be described. 29 200818995 First, a method of assembling the cathode portion 7 will be described. A cathode 18 or the like is attached to the back surface of the cover member 14. Since this cathode is the same as the composite cathode type, the detailed mounting method is omitted. The 〇-shaped ring 27 is fitted into an annular groove 26 provided with a back surface of the yoke member 14 such as the cathode 18, and the flange 12 of the container 1 is fitted into the positioning recess 15 of the guise. At this time, since the outer peripheral surface of the flange 12 is in contact with the outer peripheral wall constituting the i-th positioning recess 15, the container 1 and the cover member 14 are positioned to each other. Therefore, it is easy to locate.
接著，將螺栓31插通設於固定構件28之貫通孔π， 藉由螺栓固定^構件28與蓋構件14。據此，容器 固定於蓋構件14。 接著，說明中間電極單元6的組裝方法。 將保護板48配置於第！内筒43b的一端，將第【電極 構件47嵌插於第i内冑43b的内孔。此處，在第i内筒心 之内周面及第i電極構件47之外周面設有螺紋，將第i 電極構件47螺嵌於第i内筒43b。此時，第i内筒杨的 —側端面與第i電極構件47之凸緣57挾持並固定保護板 '接著，在第1内筒43b將第】凸緣本體部32a嵌入貫 L孔33a ’使第丨凸緣本體部32a抵接於保護板。接著， ^第1蓋構件32b叙人設於第1凸緣本體部32a背面的凹 =123，將其安裝於第！凸緣本體部32a，將第丄外筒“a 耿入第1内筒43b。以此方式，組裝第i中間電極4。 接著，將第1磁鐵49嵌入第！外筒43a，將第i壓止 30 200818995 構件（螺帽）50螺嵌於第1外饩 第mu 弟1外同43a ’以第1壓止構件50與 弟1盍構件32b挟持第】成供w t子弟1磁鐵49以固定第1外筒43a。以 式，組裝第1中間電極子單元96。 另：方面’以下述方式組裝第2中間電極子單元97β 百先，以螺桿將保護板73 的背面 2凸緣本體部64a ^ 特弟2盍構件64b嵌入笛立丄止 19,从务 瓜入弟2凸緣本體部04a的凹 口 H25。接著，將第2保 “之電漿流出口 65,將第2電二:之“入弟2凸緣 58b 電極構件71嵌插於第2内筒 的内孔。此處，在第2 構件71之冰田, 内同58b之内周面及第2電極 之外周面设有螺紋，將第2 、 2 ^ 5R1. 肝弟2電極構件71螺嵌於第 同抓。以此方式’組裝第2中間電極5。 接著，將第2磁鐵72嵌入第 構件(螺帽m碟…入入弟2外同…，將第2壓止 第2二外筒…，以第2壓止構件77與 现構件64b挟持、固定第2 第2中門^ U疋弟2磁鐵72。以此方式，組裝 乐 f間電極子單元97。 妾者將〇型壞60嵌入此^且步少楚 元97之 八此、、且衣之弟2中間電極子單 弟2外同58a的槽59，且將〇 1中間雷托2时— 肝U型％ 53嵌入上述第 °子早元96之第1外筒43a的择^ ^ 1凸緣本體部32a的背面”2凸=52。接者，使第 對向m _ m緣本㈣64a的表面相 弟1外筒43a的端面盥第2外饩 絕緣構件^ ^ /、弟2外同58a的端面挾持 。接著，將螺㈣固定具^插通於第丨凸㈣ 7二定第5:將螺检76之前端部螺…凸緣“的螺孔 u疋弟1凸緣32(第1中間雷炻不s 一 Λ 第2中間雷…、間電極子早70 96)與第2凸緣 中間電極子早兀97)，彼此加以固定。此時，絕緣 31 200818995 構件51之一側端部嵌入第1内筒⑽的外周面， 構件51之另一側端部嵌入第2内芮58b & + & 、、 接著，第！凸緣32之貫通孔：疋起部63’ 之螺孔7m 於與設在第2凸緣64 ” 的位置，因此能容易進行第1中間電極+ 單元96、料構#51、及帛 〗電極子 τ間冤極子早兀97的定仿 及安裝。以此方式，組裝中間電極單元6。 的-位Next, the bolt 31 is inserted into the through hole π provided in the fixing member 28, and the member 28 and the cover member 14 are fixed by bolts. Accordingly, the container is fixed to the cover member 14. Next, a method of assembling the intermediate electrode unit 6 will be described. The protective plate 48 is placed in the first! At one end of the inner cylinder 43b, the [electrode member 47] is inserted into the inner hole of the i-th inner bore 43b. Here, the inner peripheral surface of the i-th inner core and the outer peripheral surface of the i-th electrode member 47 are provided with screws, and the i-th electrode member 47 is screwed into the i-th inner cylinder 43b. At this time, the side end surface of the i-th inner tube Yang and the flange 57 of the i-th electrode member 47 are held and fixed to the protective plate. Next, the first flange main portion 32a is fitted into the through hole 33a' in the first inner tube 43b. The second flange main body portion 32a is brought into contact with the protective plate. Next, the first cover member 32b is provided with a recess = 123 provided on the back surface of the first flange main portion 32a, and is attached to the first! In the flange main body portion 32a, the first outer cylinder "a" is inserted into the first inner cylinder 43b. In this manner, the i-th intermediate electrode 4 is assembled. Next, the first magnet 49 is fitted into the outer cylinder 43a, and the ith pressure is applied. 30 30 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 18 1 outer cylinder 43a. The first intermediate electrode subunit 96 is assembled by the formula. In addition, the second intermediate electrode subunit 97β is assembled in the following manner, and the back surface 2 of the protective plate 73 is screwed to the flange main body portion 64a. The second member member 64b is embedded in the flute 19, and is inserted into the notch H25 of the flange body portion 04a of the second member. Next, the second proof "plasma outflow port 65, the second electric two: "Electrical member 2 flange 58b The electrode member 71 is inserted into the inner hole of the second inner cylinder. Here, in the ice field of the second member 71, the inner peripheral surface of the same 58b and the outer surface of the second electrode are provided with threads. The 2nd, 2^5R1. liver 2 electrode member 71 is screwed into the same grip. In this way, the second intermediate electrode 5 is assembled. Next, the second magnet 72 is embedded in the first member (the nut m disc) The second and second outer cylinders of the second and second inner cylinders are held by the second pressure-retaining member 77 and the second member 72b. In this way, the inter-electrode sub-unit 97 is assembled. The latter inserts the 坏-type bad 60 into this ^ and the step is less than the Chu-Yu 97, and the second brother of the second brother of the second brother is the same as the slot 59 of 58a. And the middle of the 雷1 intermediate retort 2 - the liver U type % 53 is fitted into the back surface of the first outer tube 43a of the first tempo 96, and the back surface of the flange body portion 32a is 2 convex = 52. , the end face of the first pair of m _ m edge (four) 64a, the end face of the outer tube 43a, the end face of the second outer insulating member ^^ /, the outer face of the outer same 58a. Next, the screw (four) fixture is inserted Through the third convex (four) 7 two fixed fifth: the screw before the 76 front end screw ... flange "the screw hole u 疋 brother 1 flange 32 (the first middle thunder is not a Λ second middle thunder ..., The inter-electrode is as early as 70 96) and is fixed to each other by the second flange intermediate electrode 97. At this time, one end portion of the insulating member 31 200818995 is embedded in the outer peripheral surface of the first inner cylinder (10), and the member 51 is The other end is embedded in the second inner 芮 58b & + & Then, the through hole of the first flange 32: the screw hole 7m of the raised portion 63' is disposed at the position of the second flange 64", so that the first intermediate electrode + unit 96 and the material structure can be easily performed. 51, and 帛 〗 〖Immediate imitation and installation of the electrode τ between the electrode τ. In this way, the intermediate electrode unit 6 is assembled. - bit
將〇型％ 36嵌入此組裝之中間電極單元6之第1 凸緣输P 32a的槽35。接著，將上述陰極部7之凸 緣13嵌入中間電極單元6之第2定位凹部34。接著， 將：栓39插通於固定構件37的貫通孔38，以螺栓刊 口疋固疋構件37與第i凸緣32，彼此固定中間電極單 元6與陰極部7。此時，帛2定位凹部34之外周壁與 =緣13之外周面接觸，且第2定位凹部34之内側端部 舁凸緣13之内周面面高相同，因此可容易進行中間電 極單το 6與陰極部7的定位及安裝，以此方式，组裝電 漿搶1。 接著’說明將電漿搶i安裝於電漿室2之方法。 將設於電漿室2之壁面80表面的第1銷90插通於 没在上述組裝之電漿槍1之第2基座構件64上部之卡 合凹部91的大孔部91a。此時，將設於壁面8〇表面的 第2銷94插通於設在第2基座構件64下部的缺口部％。 接著’使電漿槍1整體移動至下方，將第1銷9〇插通 於卡5凹部91的小孔部91 b，使小孔部91 b之内面的 上端部抵接於第1銷90之本體部90a(正確應為絕緣軸 32 200818995 環92)的上端部。據此，小孔 1 D之上侧緣部與第1 銷9〇之本體部9〇a(正確應為絕緣抽環叫卡合了以此 方式，轉搶i相對電漿室2定位及暫時固定於上下方 向。又，卡合凹部91的小孔 之本體部_在左右方向抿接P之内面與弟1銷90 外 方向抵接，在缺口部95之内面， 弟2銷94抵接於左右方向， 稭此’電漿槍1相對 至2定位於周方向（左右方向）。 接者’如圖6所示，使德μ她盆 動於跃f Α 鎖止機構3之操作臂3b擺 勤於豆立方向，使卡止臂〜盥 雷將^ ! μ ”弟2凸緣64抵接，以將 電水搶1鎖止於電漿室2。 2之二二本口:態1之將電裝搶1安裝於電聚室 之構k 100,可容易組裝電漿搶 此組裝之電漿搶i安裝 了合易將如 時間。 女衣於電漿至2’可謀求縮短其作業 此外，在本實施形態，雖 I邻八^ + 保持具部及第2保持 /、口P刀別由外同與内筒構成 一偏心 並不限於此，亦可為以 個構件一體成形的構成。又， 分别丄η 雖弟1凸緣及第2凸緣 別由凸緣本體部與蓋部構成 η 2 風仁並不限於此，亦可為 从—個構件一體成形的構 J ^ 殼體分別由保拉且it ，雖第1殼體及第2 刀另J由保持具部與凸緣立 可乂 凸緣邛構成，但並不限於此，亦 2 Α 霉成。又，亦可為在電漿官 下邛設置用以冷卻第2中 u , Y間電極5等之風扇的構成。 識者而▲ γ 口士 所屬技術領域中具有通常知 考而g，可明確得知本發 了加以改良及具有其他實 33 200818995 施形態。是以，應將上述說明僅解釋為一示例，其目的 在於將本發明之最佳實施形態教導給本發明所屬技術領 域中具有通#知識者。只要不違背本發明之精神，可實 質變更其構造及/或功能的詳細内容。 由於本發明之將電漿搶安裝於電漿室之構造，可容 易定位，因此有用於安裝作業之作業效率佳之將電漿搶 安裝於電漿室之構造。 【圖式簡單說明】 圖1係顯示本發明實施形態1之將電漿槍安裝於電漿 至之構造之概略構成的示，意圖。 圖2係顯示沿著圖丨所示之將電漿搶安裝於電漿室之 構造之Π — Π線之截面的截面圖。 圖3係顯示圖1所示之電漿槍之第1冷卻流路之概略 構成的示意圖。 圖4係顯示沿著圖1所示之將電漿槍安裝於電漿室之 構造之m—Η線之截面的截面圖。 圖5係顯示圖1所示之電漿槍之第2冷卻流路之概略 構成的示意圖。 圖6係顯示圖4所示之鎖止機構之概略構成的示意圖。 【主要元件符號說明】 1 電漿搶 2 電漿室 3 鎖止機構 3 a 基部 34 200818995The % type % 36 is fitted into the groove 35 of the first flange transmission P 32a of the assembled intermediate electrode unit 6. Next, the flange 13 of the cathode portion 7 is fitted into the second positioning recess portion 34 of the intermediate electrode unit 6. Next, the plug 39 is inserted into the through hole 38 of the fixing member 37, and the yoke member 37 and the i-th flange 32 are bolted, and the intermediate electrode unit 6 and the cathode portion 7 are fixed to each other. At this time, the outer peripheral wall of the 定位2 positioning recessed portion 34 is in contact with the outer peripheral surface of the rim 13 and the inner peripheral end of the second locating recessed portion 34 has the same inner peripheral surface of the flange 13, so that the intermediate electrode τ can be easily performed. 6 and the positioning and installation of the cathode portion 7, in this way, assembling the plasma to grab. Next, a method of installing the plasma in the plasma chamber 2 will be described. The first pin 90 provided on the surface of the wall surface 80 of the plasma chamber 2 is inserted into the large hole portion 91a of the engaging recess 91 which is not in the upper portion of the second base member 64 of the plasma gun 1 to be assembled. At this time, the second pin 94 provided on the surface of the wall surface 8 is inserted into the notch portion % provided in the lower portion of the second base member 64. Next, 'the entire plasma gun 1 is moved downward, and the first pin 9 is inserted into the small hole portion 91 b of the concave portion 91 of the card 5, and the upper end portion of the inner surface of the small hole portion 91 b is brought into contact with the first pin 90. The upper end portion of the body portion 90a (which should be the insulating shaft 32 200818995 ring 92 correctly). Accordingly, the upper edge portion of the small hole 1 D and the main body portion 9〇a of the first pin 9〇 (the correct should be the insulated extraction ring called in this way, the transfer i is positioned relative to the plasma chamber 2 and temporarily Further, the main body portion of the small hole of the engaging recessed portion 91 is in contact with the outer surface of the pin 1 in the left-right direction, and the inner surface of the notch portion 95 is in contact with the outer surface of the notch portion 95. In the left and right direction, the 'plasma gun 1' is positioned in the circumferential direction (left and right direction) relative to 2. The connector 'shows as shown in Fig. 6, so that she is immersed in the operating arm 3b of the locking mechanism 3 Diligent in the direction of the bean, so that the locking arm ~ 盥雷 will ^ ! μ " brother 2 flange 64 abut, to lock the electric water 1 in the plasma chamber 2. 2 two two mouth: state 1 Install the electric equipment to install the k 100 in the electric accumulating chamber, which can be easily assembled with the plasma. Grab the assembly of the plasma to grab the installation of the easy-to-use time. The women's clothing in the plasma to 2' can be shortened. In the present embodiment, the eccentricity of the first and second holders and the second holding/portion P are not limited to the outer tube and the inner tube, and may be integrally formed by a single member. Further, the 凸缘 虽 弟 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘 凸缘In the case of the Paula and it, the first casing and the second blade are constituted by the holder portion and the flange vertical flange 邛, but the invention is not limited thereto, and it is also a mold. The plasma shovel is provided with a fan for cooling the second intermediate u, the Y interelectrode 5, etc. 识 ▲ ▲ γ 口 所属 所属 所属 所属 所属 所属 所属 所属 所属 所属 所属 所属 所属 所属 所属 所属 所属 所属 所属 所属 所属 所属 所属 所属 所属 所属 所属 所属And the description of the present invention is to be construed as merely an example, and the preferred embodiment of the present invention is to be given to the skilled person in the technical field of the present invention. The spirit of the present invention can substantially change the details of its structure and/or function. Since the structure of the present invention for smashing the plasma into the plasma chamber can be easily positioned, there is a work efficiency for the installation work. Grab the structure installed in the plasma chamber. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a view showing a schematic configuration of a structure in which a plasma gun is attached to a plasma according to a first embodiment of the present invention, and Fig. 2 is a view showing a state in which plasma is attached to a plasma as shown in Fig. Fig. 3 is a schematic view showing a schematic configuration of a first cooling flow path of the plasma gun shown in Fig. 1. Fig. 4 is a view showing a structure along the first cooling path of the plasma gun shown in Fig. 1. Fig. 5 is a schematic view showing a schematic configuration of a second cooling flow path of the plasma gun shown in Fig. 1. Fig. 6 is a view showing a schematic view of a cross section of a m-Η line of a plasma gun. Schematic diagram of the schematic configuration of the locking mechanism shown in Fig. 4. [Explanation of main component symbols] 1 Plasma grab 2 Plasma chamber 3 Locking mechanism 3 a Base 34 200818995
3b 操作臂 3c 卡止臂 3d 連結構件 4 第1中間電極 5 第2中間電極 6 中間電極單元 7 陰極部 8 第1殼體 9 第2殼體 10 容器 11 放電空間 12 凸緣 13 凸緣 14 蓋構件 15 第1定位凹部 16 辅助陰極 17 主陰極 18 陰極 19 保護構件 20 窗構件 21 冷卻流路用凹部 22 冷卻流路用蓋構件 23 第3冷卻流路 24 第3冷卻介質供應口 35 200818995 25 第3冷卻介質排出口 26 槽 27 Ο型環 28 固定構件 29 貫通孔 30 環構件 31 螺栓 32 第1凸緣3b operating arm 3c locking arm 3d connecting member 4 first intermediate electrode 5 second intermediate electrode 6 intermediate electrode unit 7 cathode portion 8 first housing 9 second housing 10 container 11 discharge space 12 flange 13 flange 14 cover Member 15 First positioning concave portion 16 Auxiliary cathode 17 Main cathode 18 Cathode 19 Protective member 20 Window member 21 Cooling flow path concave portion 22 Cooling flow path cover member 23 Third cooling flow path 24 Third cooling medium supply port 35 200818995 25 3 cooling medium discharge port 26 groove 27 Ο type ring 28 fixing member 29 through hole 30 ring member 31 bolt 32 first flange
32a 第1凸緣本體部 3 2b 第1蓋部 33 電漿通過口 33a 貫通孔 33b 貫通孔 34 第2定位凹部 3 5 槽 3 6 Ο型環 37 固定構件 38 貫通孔 39 螺栓 40 環構件 41 第1冷卻流路 42 第1冷卻流路槽 43 第1保持具部 43a 第1外筒 36 20081899532a first flange main body portion 3 2b first cover portion 33 plasma passage port 33a through hole 33b through hole 34 second positioning recess portion 3 5 groove 3 6 Ο ring 37 fixing member 38 through hole 39 bolt 40 ring member 41 1 cooling flow path 42 first cooling flow path groove 43 first holder portion 43a first outer tube 36 200818995
43b 第1内筒 44 第1筒狀空間 45 第1冷卻介質排出 口（貫通孔） 46 第1冷卻介質供應 口（貫通孔） 47 第1電極構件 48 保護板 49 第1磁鐵 50 第1壓止構件 51 絕緣構件 52 槽 53 〇型環 54 短路防止槽 56 小徑部 57 凸緣 58 第2保持具構件 5 8 a 第2外筒 58b 第2内筒 59 槽 60 0型環 61 小徑部 62 第2筒狀空間 63 定位突起部 64 第2凸緣 64a 第2凸緣本體部 37 20081899543b first inner cylinder 44 first cylindrical space 45 first cooling medium discharge port (through hole) 46 first cooling medium supply port (through hole) 47 first electrode member 48 protective plate 49 first magnet 50 first pressing Member 51 Insulating member 52 Slot 53 〇-ring 54 Short-circuit preventing groove 56 Small-diameter portion 57 Flange 58 Second holder member 5 8 a Second outer tube 58b Second inner tube 59 Groove 60 0-ring 61 Small-diameter portion 62 Second cylindrical space 63 positioning projection 64 second flange 64a second flange main portion 37 200818995
64b 第2蓋部 65 電漿流出口 65a 貫通孔 65b 貫通孔 66 第2冷卻流路 67 第2冷卻流路槽 68 小徑部 69 第2冷卻介質供應口（貫通孔） 70 第2冷卻介質排出口（貫通孔） 71 第2電極構件 72 第2磁鐵 73 保護板 74 螺孔 75 定位貫通孔 76 固定具 77 第2壓止構件 78 接頭 80 壁面 81 凹部 82 段面 83 電漿流入口（貫通孔） 84 第2絕緣構件 84a 突起部 85 環構件 38 200818995 86 槽 87 Ο型環 88 槽 89 Ο型環 90 第1銷（第1卡合部；卡合凸部） 90 a 本體部 90 b 頭部 91 卡合凹部（第2卡合部）64b second cover portion 65 plasma outflow port 65a through hole 65b through hole 66 second cooling flow path 67 second cooling flow path groove 68 small diameter portion 69 second cooling medium supply port (through hole) 70 second cooling medium row Outlet (through hole) 71 Second electrode member 72 Second magnet 73 Protective plate 74 Screw hole 75 Positioning through hole 76 Fixing piece 77 Second pressing member 78 Joint 80 Wall surface 81 Recessed portion 82 Segment surface 83 Plasma inlet (through hole) 84 second insulating member 84a projection 85 ring member 38 200818995 86 groove 87 Ο ring 88 groove 89 Ο ring 90 first pin (first engaging portion; engaging convex portion) 90 a body portion 90 b head 91 Engagement recess (2nd engagement)
91a 大孔部 91b 小孔部 92 絕緣軸環 93a 絕緣軸環 93b 軸部 94 第2銷（定位凸部；第1定位部） 95 缺口部（第2定位部） 96 第1中間電極子單元 97 第2中間電極子單元 98 平台 99 轴部 100 將電漿槍安裝於電漿室之構造 101 分隔板 102 間隙 103a 第1冷卻往路 103 b 第1冷卻返路 39 200818995 104 分隔板 105 間隙 106a 第2冷卻往路 106b 第2冷卻返路 121 凹部 122 外周部 123 凹部 124 外周部 φ 125 凹部 201 旋轉軸 202 旋轉軸 203 旋轉軸 204 旋轉軸 301a 基座部 301b 固定部 302a 手柄部 ® 302b臂部 303a 第1部分 303b 第2部分 4091a large hole portion 91b small hole portion 92 insulating collar 93a insulating collar 93b shaft portion 94 second pin (positioning convex portion; first positioning portion) 95 notch portion (second positioning portion) 96 first intermediate electrode sub-unit 97 Second intermediate electrode subunit 98 Platform 99 Shaft portion 100 Structure for mounting the plasma gun to the plasma chamber 101 Separator 102 Clearance 103a First cooling passage 103 b First cooling return 39 200818995 104 Partition 105 Clearance 106a Second cooling passage 106b Second cooling return 121 concave portion 122 outer peripheral portion 123 concave portion 124 outer peripheral portion φ 125 concave portion 201 rotating shaft 202 rotating shaft 203 rotating shaft 204 rotating shaft 301a base portion 301b fixing portion 302a handle portion 3.0 302b arm portion 303a Part 1 303b Part 2 40
Claims (1)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006245759A JP4641014B2 (en) | 2006-09-11 | 2006-09-11 | Mounting structure of plasma gun to chamber |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW200818995A true TW200818995A (en) | 2008-04-16 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW96127187A TW200818995A (en) | 2006-09-11 | 2007-07-26 | Structure for attaching plasma gun to chamber |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP4641014B2 (en) |
| TW (1) | TW200818995A (en) |
| WO (1) | WO2008032489A1 (en) |
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| TWI554630B (en) * | 2010-07-02 | 2016-10-21 | 應用材料股份有限公司 | Deposition apparatus and methods to reduce deposition asymmetry |
| JP6205527B2 (en) * | 2015-05-19 | 2017-09-27 | 株式会社アルバック | Rotary cathode unit for magnetron sputtering equipment |
| CH712835A1 (en) * | 2016-08-26 | 2018-02-28 | Amt Ag | Plasma injector. |
| CN108601192B (en) * | 2018-06-25 | 2019-07-12 | 超力等离子技术(常州)有限公司 | A kind of plasma generator |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5980469U (en) * | 1982-11-22 | 1984-05-31 | 日本電気株式会社 | Target for sputtering equipment |
| JPH05287521A (en) * | 1992-04-09 | 1993-11-02 | Tel Varian Ltd | Sputtering device |
| JPH11315371A (en) * | 1998-05-07 | 1999-11-16 | Sumitomo Heavy Ind Ltd | Plasma source of vacuum film forming device |
-
2006
- 2006-09-11 JP JP2006245759A patent/JP4641014B2/en not_active Expired - Fee Related
-
2007
- 2007-07-23 WO PCT/JP2007/064418 patent/WO2008032489A1/en active Search and Examination
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| Publication number | Publication date |
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| WO2008032489A1 (en) | 2008-03-20 |
| JP4641014B2 (en) | 2011-03-02 |
| JP2008066240A (en) | 2008-03-21 |
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