TW200804757A

TW200804757A - Measuring error method for high precision and nano-scale rotation axis and the apparatus thereof

Info

Publication number: TW200804757A
Application number: TW95125741A
Authority: TW
Inventors: Chien-Hong Liu; Wen-Yuh Jywe; De-Hua Fang; Liang-Wen Ji; Hsueh-Liang Huang; Shing-Ju Wu; Hung-Shu Wang
Original assignee: Univ Nat Formosa
Priority date: 2006-07-14
Filing date: 2006-07-14
Publication date: 2008-01-16
Also published as: TWI287616B

Abstract

The invention is a kind of measuring error method for high precision and nano-scale rotation axis and the apparatus thereof. It includes a laser source, plural numbers of spectrometers, a cat-eyed reflective mirror, a reflective optical grating, plural numbers of polarized spectrometers, and glasses and optical sensor modules. The injected light beam is paralleled with exited beam using the cat-eyed reflective mirror. It can overcome the light discontinuity from angle prism. The invention can achieve a kind of propose of measuring error on the nano-scale rotation axis with high precision.

Description

200804757 九、發明說明：【發明所屬之技術領域】本發明係有1㈣—種旋轉轴誤差量測方法與裝置，尤其是指 -種應用於微型機台上’作為高精密加工時，該微型機台之旋轉主轴的誤差量測方法與裝置，而^高精度奈米級的旋轉軸誤差量測。【先前技術】南精密加卫之微型機台’如微型銑床、微型鑽床、微型雕刻機等微型加母機，對於現代高精密度工業及高科技產業之影響與曰俱增，是這些產業得以蓬勃發展的主要動力之一。微型加工母機的旋轉主軸具有多自由度的誤差，實際運動時會產生六自由度的誤差，如圖一所示，該誤差包括三個線誤差 (X、y、z)與二個角誤差（俯仰（pitch)、搖擺（γ_及滾動 (Ro 11) δ吳差）。由於旋轉主軸是經由主軸、軸承、驅動器等許多π件依序組裝而成，會因為此等諸多元件尺寸的誤差、各元件間配合度等關係，而產生具有多自由度的誤差。眾所皆知，機器中之旋轉軸的特性將影響整台機器的精度與加工產品的品質，被加工之精密工件的加工尺寸皆需要考慮六個自由度的誤差，才能確保加工品質及誤差是在容許之範圍内。隨著技術的發展^現有旋轉軸量測技術有以下幾種分類，如下所述： 200804757 一、直接使用master ball/axis/cylinder ’但不補償標準 •軸之誤差： ' 此方法是最早的旋轉軸量測技術，但會受限於標準棒/球的加工精度，因此不適用於高精度量測。在2000年12月Eric的論文，其提供之技術可測得1 // in解析度，然而在E. G1 eason文，章，他提出以目前加工技術極限，標準球之球度（out of roundness)為75 nm。以Air Spindle之極限精度可達到50醒，故此第一類方法，以目前的技術而言尚無法達成。二、直接使用master ball/axis/cylinder，但有做補償標準軸之誤差，其補償標準軸誤差之方式為單探頭多次設定 (multi-steps): 採用單（多）探頭多次設定是誤差分離的第一種方法（如圖二所示）。上述標準軸之誤差必須再加以分離，分解才能得到所需之解析精度。有關此論文之發表皆以數學理論為主，部分以模擬 — 為輔，樣本分析是建立之模式。因此，皆未能有實際之用途，主要原因在於由量測時候架設多次，每架設一次量取一次資料，量測方式係依不同指定角度位置固定探頭，因此，最困難之部份，就是角位置定位不易（有偏心問題）。另外，還有待測標準軸及旋轉差誤差之重複性（repeatabi 1 ity)、及探頭之重複性是此方法必須克服之處，如圖三所示。另有一種旋轉軸誤差量測方法與裝置，主要是利用一般雷射 200804757 光繞射與光干涉的原理及架構來組成，將標準棒内置-角隅菱鏡在放於U5L機口上（如微型銳床、微型鑽床、微型雕刻機等微型加工母機）之主軸上，t絲有迴轉誤差時，會造成繞射光的變化，進而影響到反射光打到光柵上，由光感㈣器上之位置，再經由數學運算後而得到其平移誤差值。此技術對於要求更高精度且要達奈米級，X限於角隅菱鏡構造的問題，有3個接缝處會形成仏號的不易判讀導致系統誤差產生。本發明人因從事多年有關於旋轉軸誤差量測方法之研究，發現目前現有旋轉軸誤差量測方法雖有4之功效，但常因旋轉轴玦差罝測方法之諸多缺失的限制，而無法發揮最大之效益，因而提供一種極具創新與實用價值之旋轉軸誤差量測方法與裝置。【發明内容】因此，本發明之目的在於提供一種旋轉軸誤差量測方法與裝置，系統中的直度誤差利用這光栅移動所產生的都卜勒效應及偏振的現象，再加上電子訊號處理的光路組合，將干涉所產生的直流飄移問題降到最低，以達到最佳的量測效果，可以有效達成高精度奈米級旋轉軸誤差量測之積極目的。根據本發明之上述目的，提出一旋轉軸誤差量測方法與裝置，包含有··一雷射光源、複數個分光鏡、一貓眼反射鏡、一反射式光柵、複數個極化分光鏡、複數個玻片及複數個光感測器組成；貓眼反射器，植入於標準棒一端；該標準棒固定於微型機台 200804757 之旋轉轴；複數個分光鏡，包含有第一、二、三分光鏡，雷射光源產生之雷射光束射向第一分光鏡將光反射至旋轉軸之貓眼反 ‘ 射器，貓眼反射器再將光反射且穿過第一分光鏡；一反射式光柵，該反射式光柵及貓眼反射器、第一分光鏡成一直線，穿過第一分光鏡的雷射光束射入該反射式光柵；複數個極化分光鏡，包含有第一、二及第三極化分光鏡；上述反射之光路在第一極化分光鏡重合後，在這第一極化分光鏡接收分光射出之反射光，使兩 # 道正負一階反射光疊加形成一干涉光；複數個波片，包含有第一、二波片；該波片其中第一玻片與第二極化分光鏡為一組相對應；第二玻片與第三極化分光鏡為另組對應，兩組成90度分佈；複數個光感測器，包含有第一、二、三及第四光感測器；其中第一、第二光感測器與第二極化分光鏡一組且成90度分佈；第三、第四光感測器與第三極化分光鏡一組亦成9 0度分佈。根據本發明之上述目的，提出一旋轉軸誤差量測方法與裝 ® 置，實施步驟包含有：將含有貓眼反射器的標準棒固定於為型機台之旋轉軸上；將雷射光源置於定位，使雷射光源射出一雷射光束至第一分光鏡，將雷射光束反射至貓眼反射器來測量旋轉軸之誤差；貓眼反射器再將該雷射光束予以反射產生一反射光並反射，該反射光將穿過上述之第一分光鏡；穿過第一分光鏡之反射光照射到反射式光柵，通過反射式光柵的反射光將會產生產生三道繞射光；其中之正一階繞射光、負一階繞射光則分別射入兩邊 200804757 ) 之第二分光鏡與第三分光鏡；射入之繞射光，將產生兩道光，一道穿透’一道反射；反射之光路會在第一極化分光鏡重合，在這第一極化分光鏡會產生干涉現象以產生另一道反射光及一道穿透光，各自分別穿過第一、第二玻片後，再分別射入第二及第三極化分光鏡；第二及第三極化分光鏡後方各放置第一、第二、第三及第四光感測器等四個光感測器；利用這四個光感測器負責接收處理干涉條紋的變化。 •【實施方式】請參照圖四與圖五，係本發明之旋轉軸誤差量測裝置之平面及立體組成示意圖。本發明之旋轉軸誤差量測裝置，包含有雷射光源（1)、貓眼反射器（2)、分光鏡、反射式光柵（4)、極化反光透鏡（5)、波片（6)及光感測器（7)組成，其中： * 雷射光源（1)，為一般的氦氖（He-Ne)雷射，也可使用半導體雷射或線偏振雷射光源皆可。 ® 貓眼反射器（2)，係植入於標準棒一端；該標準棒固定於微型機台之旋轉轴（21)。該貓眼反射4器（2)使入射光與出射光相互平行（請參照圖七），其構造可以克服角隅菱鏡有接面照成光的不連續問題。另外，標準棒的直徑約為微型銑床、鑽床、雕刻機等加工母機之刀具大小。複數個分光鏡（Beam Spl i tter，BS )，包含有第一分光鏡 (31)、第二分光鏡（32)及第三分光鏡（33)，可為圓形，方型或矩 200804757 形；該分光鏡會讓振動方向90度的光反射，振動方向0度的光則可以直接穿透。光源通過分光鏡後會產生分光，且為垂直及水 '平方向之分光效果；該分光鏡比圓板形分光鏡有較大的穿透與反射的接觸面積。該分光鏡用來使雷射光分光，在此用來使反射光分出二道光，一道光（與反射光平行.）穿過透鏡打入位移感測器，量測俯仰度、滾動度、搖偏度、所需的數值，另一道光直接打入極化分光鏡（5)，產生干涉進而測量值度誤差。其中第一分光鏡 • (31)與雷射光源（1)、貓眼反射器（2)成90度角分佈設置。雷射光源（1)產生之雷射光束射向第一分光鏡（31)將光反射至旋轉軸 (21)之貓眼反射器（2)，貓眼反射器（2)再將光反射且穿過第一分光鏡（31)照射至反射式光栅（4)。一反射式光柵（4) ( Diffraction Grating)，該反射式光栅 (4)及貓眼反射器（2)、第一分光鏡（31)成一直線，且可以如圖五所示，於反射式光柵（4)之下另設有一反射鏡（41)將穿過第一分胃光鏡（31)的雷射光束，作90度之轉折以直接反射至反射式光柵 (4)，使光順利進入系統，同時可以有效縮減整個裝置之組成體積；係藉由雷射光束入射後，該反射式光柵（4)會利用光的繞射現象產生正、負一階繞射光及零階繞射光之三道光，並將其中之正、負一階繞射光反分別射至兩侧的第二分光鏡（32)及第三分光鏡（33)。射入第二分光鏡（32)與第三分光鏡（33)之正一階繞射光、負一階繞射光，將產生兩道光，一道穿透，一道反射。反射 200804757 、 s 之光路會在極化分光鏡（5)之第一極化分光鏡（51)重合。複數個極化分光鏡（5) ( Polarizing Beam Splitter，PBS)， ' 包含有第一極化分光鏡（51)、第二極化分光鏡（52)及第三極化分光鏡（53);其中上述反射之光路在第一極化分光鏡（51)重合後，在這第一極化分光鏡（51)接收分光射出之反射光，使兩道正負一階反射光疊加形成一干涉光。該第一極化分光鏡（51)產生干涉現象，將產生另一道反射光及一道穿透光。極化分光鏡（5)用來使 Φ 雷射光分光，在此用來使入射光及反射光分出二道光，一道水平偏振，一道垂直偏振，都會穿過1/4 λ玻片（6)以分別進入光強度檢測器（7)。複數個波片（6)，包含有第一波片（61)，第二波片（62);該波片（6)為1/4又玻片，用來調整光的相位，改變雷射光振動方向，通過二次會使雷射光振動方向轉90度，亦即讓兩組訊號有 90度的相位差而達到干涉訊號的要求。其中第一玻片（61)與第二 ® 極化分光鏡（52)為一組相對應；第二玻片（62)與第三極化分光鏡 (53)為另組對應，兩組成90度分佈。複數個光感測器（7 ) ’包含有第一光感測器（71)、第二光感測器（72)、第三光感測器（73)、第四光感測器（74)。光感測器（7) 可為光檢測器或位移感測器，可以感測光強度的變化，利用光強度的變化來做後面的信號處理。其中第一光感測器（71)、第二光感測器（72)與第二極化分光鏡（52) —組且成90度分佈；第三光 11 4Ϋ) 200804757 感測器（73)、第四光感測器（74)與第三極化分光鏡（53)一組亦成 90度分佈。光感測器（7)對光強度信號變化的接收，處理干涉條紋。而第一光感測器（71)、第二光感測器（72)、第三光感測器 (73)、第四光感測器（74)所形成之四象限感測器，依據光點的變化來量測，再經由類比/數位轉換卡（A/D卡）轉換求的其他自由度誤差。200804757 IX. Description of the invention: [Technical field of the invention] The present invention relates to a method and apparatus for measuring the error of a rotating shaft, in particular, the invention is applied to a micro-machine table. The method and device for measuring the error of the rotating spindle of the table, and the measurement of the error of the rotating axis of the high-precision nanometer. [Prior Art] The micro-machinery of the South Precision Plus, such as micro-milling machines, micro-drilling machines, micro-engraving machines, etc., has a growing influence on modern high-precision industrial and high-tech industries. One of the main drivers of development. The rotating spindle of the micro-machining machine has multiple degrees of freedom error, and six degrees of freedom error occurs in actual motion. As shown in Figure 1, the error includes three line errors (X, y, z) and two angular errors ( Pitch, sway (γ_ and rolling (Ro 11) δ 差 )). Because the rotating spindle is assembled by many π parts such as spindle, bearing, drive, etc., due to the error of many component sizes, The degree of fit between the components, etc., produces errors with multiple degrees of freedom. It is well known that the characteristics of the rotating shaft in the machine will affect the accuracy of the entire machine and the quality of the processed product, and the machining size of the precision workpiece being machined. It is necessary to consider the error of six degrees of freedom to ensure that the processing quality and error are within the allowable range. With the development of technology, the existing rotary axis measurement technology has the following classifications, as follows: 200804757 I. Direct use Master ball/axis/cylinder 'But does not compensate for the standard • Axis error: ' This method is the earliest rotary axis measurement technique, but it is limited by the standard rod/ball machining accuracy, so it is not For high-precision measurement. In December 2000 Eric's paper, the technology provided can measure 1 // in resolution, however in E. G1 eason, chapter, he proposes the current processing technology limit, standard ball The out of roundness is 75 nm. The ultimate accuracy of the Air Spindle can reach 50 awake, so the first method can not be achieved with the current technology. Second, directly use master ball/axis/cylinder, However, there is an error in compensating the standard axis. The way to compensate the standard axis error is multi-steps. The single-multiple probe setting is the first method of error separation (see Figure 2). The error of the above standard axis must be separated and decomposed to obtain the required analytical precision. The publication of this paper is based on mathematical theory, partly by simulation - supplementation, and sample analysis is the established model. There is no practical use. The main reason is that the measurement is carried out several times. Each set of equipment is used to measure the data once. The measurement method fixes the probe according to different specified angular positions. Therefore, the most difficult one is The position is not easy to position the angular position (there is an eccentricity problem). In addition, the repeatability of the standard axis and the rotation difference error to be tested, and the repeatability of the probe are the points that must be overcome by this method, as shown in Figure 3. Another method and device for measuring the error of the rotating shaft is mainly composed of the principle and structure of the general laser 200804757 light diffraction and optical interference. The standard rod built-in angle mirror is placed on the U5L machine port. (such as micro-sharp bed, micro-drilling machine, micro-engraving machine and other micro-machining machine) on the main shaft, when the t-wire has a rotation error, it will cause the diffracted light to change, which in turn affects the reflected light hitting the grating, by the light sense (four) The position above, and then through the mathematical operation to get its translation error value. This technique is more demanding and requires a nanometer scale. X is limited to the problem of the 隅隅镜 mirror construction. There are three seams that form an nickname that is difficult to interpret and causes systematic errors. The inventor of the present invention has been engaged in research on the measurement method of the rotating shaft error for many years, and found that the current rotating shaft error measuring method has the effect of 4, but often cannot be limited by the many missing limitations of the rotating shaft enthalpy measuring method. To maximize the benefits, it provides a method and device for measuring the rotational axis error with great innovation and practical value. SUMMARY OF THE INVENTION Accordingly, it is an object of the present invention to provide a method and apparatus for measuring the error of a rotating shaft. The straightness error in the system utilizes the Doppler effect and the polarization phenomenon generated by the grating movement, plus electronic signal processing. The combination of optical paths minimizes the DC drift problem caused by interference to achieve the best measurement effect, and can effectively achieve the positive purpose of high-precision nano-level rotary axis error measurement. According to the above object of the present invention, a method and a device for measuring the error of a rotating shaft are provided, comprising: a laser light source, a plurality of beam splitters, a cat's eye mirror, a reflection grating, a plurality of polarization beamsplitters, and a plurality a slide and a plurality of photo sensors; a cat's eye reflector implanted at one end of the standard rod; the standard rod is fixed to the rotating shaft of the micromachine station 200804757; and a plurality of spectroscopes including the first, second and third splitters a mirror, a laser beam generated by a laser source is directed toward the first beam splitter to reflect light to a cat's eye reflector of the rotating shaft, and the cat's eye reflector reflects the light and passes through the first beam splitter; a reflective grating, The reflective grating and the cat's eye reflector and the first beam splitter are in a straight line, and the laser beam passing through the first beam splitter is incident on the reflective grating; and the plurality of polarizing beamsplitters include the first, second and third polarizations a beam splitter; the reflected light path is superposed after the first polarizing beam splitter, and the first polarizing beam splitter receives the reflected light of the splitting light, so that the two positive and negative first-order reflected lights are superimposed to form an interference light; the plurality of waves The slice includes a first wave and a second wave plate; wherein the first slide corresponds to the second polarized beam splitter; the second slide and the third polarized beam splitter correspond to another group, and the two components a 90-degree distribution; a plurality of photosensors including first, second, third, and fourth photosensors; wherein the first and second photosensors and the second polarized beam splitter are in a group and at 90 degrees The distribution; the third, fourth, and third polarizing beamsplitters are also distributed at 90 degrees. According to the above object of the present invention, a rotating shaft error measuring method and a mounting device are provided. The implementing step includes: fixing a standard rod containing a cat's eye reflector to a rotating shaft of a type machine; and placing the laser light source Positioning, causing the laser source to emit a laser beam to the first beam splitter, and reflecting the laser beam to the cat's eye reflector to measure the error of the rotating shaft; the cat's eye reflector then reflects the laser beam to generate a reflected light and reflects The reflected light will pass through the first beam splitter; the reflected light passing through the first beam splitter is irradiated to the reflective grating, and the reflected light passing through the reflective grating will generate three diffracted lights; The diffracted light and the negative first-order diffracted light are respectively injected into the second beam splitter and the third beam splitter on both sides of the 200804757); the diffracted light that is incident will generate two lights, one through which a 'reflection; the reflected light path will be in the first A polarizing beam splitter coincides, and the first polarizing beam splitter generates an interference phenomenon to generate another reflected light and a penetrating light, which respectively pass through the first and second slides, and then respectively Into the second and third polarizing beamsplitters; four photosensors, such as first, second, third, and fourth photo sensors, are disposed behind the second and third polarizing beamsplitters; The light sensor is responsible for receiving changes in the processing interference fringes. • [Embodiment] Please refer to Fig. 4 and Fig. 5, which are schematic diagrams showing the plane and three-dimensional composition of the rotating shaft error measuring device of the present invention. The rotating shaft error measuring device of the present invention comprises a laser light source (1), a cat's eye reflector (2), a beam splitter, a reflective grating (4), a polarized reflective lens (5), a wave plate (6) and The photo sensor (7) is composed of: * The laser source (1) is a general He-Ne laser, and a semiconductor laser or a linearly polarized laser source can also be used. ® Cat's Eye Reflector (2) is implanted at one end of a standard rod; the standard rod is attached to the rotating shaft (21) of the micro-machine. The cat's eye reflection device (2) makes the incident light and the outgoing light parallel to each other (refer to Fig. 7), and the structure thereof can overcome the discontinuity problem that the corner ridge mirror has a junction surface to form light. In addition, the diameter of the standard rod is about the size of the machining machine such as a micro-milling machine, a drilling machine, and an engraving machine. a plurality of beamsplitters (Beam Spl i tter, BS), comprising a first beam splitter (31), a second beam splitter (32) and a third beam splitter (33), which may be circular, square or moment 200804757 The beam splitter will reflect light with a vibration direction of 90 degrees, and light with a vibration direction of 0 degrees can directly penetrate. After the light source passes through the beam splitter, it will generate splitting, and it is a vertical and water splitting effect; the beam splitter has a larger penetration and reflection contact area than the circular plate beam splitter. The beam splitter is used to split the laser light, where it is used to split the reflected light out of two lights, and a light (parallel to the reflected light) passes through the lens and enters the displacement sensor to measure the pitch, roll, and shake. The skewness, the required value, and the other light directly enter the polarizing beam splitter (5), causing interference and measuring the value error. The first beam splitter • (31) is arranged at an angle of 90 degrees to the laser source (1) and the cat's eye reflector (2). The laser beam generated by the laser source (1) is directed toward the first beam splitter (31) to reflect the light to the cat's eye reflector (2) of the rotating shaft (21), and the cat's eye reflector (2) reflects and passes the light. The first beam splitter (31) is irradiated to the reflective grating (4). a reflective grating (4) (Diffraction Grating), the reflective grating (4) and the cat's eye reflector (2), the first beam splitter (31) are in line, and can be shown in Figure 5, in a reflective grating ( 4) A mirror (41) is provided underneath the laser beam passing through the first gastroscope (31) for a 90 degree turn to directly reflect to the reflective grating (4), allowing light to enter the system smoothly. At the same time, the composition volume of the whole device can be effectively reduced; after being incident by the laser beam, the reflective grating (4) can generate three rays of positive and negative first-order diffracted light and zero-order diffracted light by using light diffraction phenomenon. And the positive and negative first-order diffracted lights are respectively reflected to the second beam splitter (32) and the third beam splitter (33) on both sides. The first-order diffracted light and the negative first-order diffracted light incident on the second dichroic mirror (32) and the third dichroic mirror (33) will generate two lights, one through and one reflection. The reflection 200804757, s light path will coincide with the first polarization beam splitter (51) of the polarization beam splitter (5). a plurality of polarizing beamsplitters (5) (including a first polarization beam splitter (51), a second polarization beam splitter (52), and a third polarization beam splitter (53); The light path of the reflection is superposed on the first polarization beam splitter (51), and the first polarization beam splitter (51) receives the reflected light of the split light, so that the two positive and negative first-order reflected lights are superimposed to form an interference light. The first polarization beam splitter (51) produces an interference phenomenon that will produce another reflected light and a transmitted light. The polarizing beam splitter (5) is used to split the Φ laser light, which is used to separate the incident light and the reflected light, and a horizontal polarization and a vertical polarization will pass through the 1/4 λ slide (6). To enter the light intensity detector (7) separately. The plurality of wave plates (6) include a first wave plate (61) and a second wave plate (62); the wave plate (6) is a 1/4 and a glass plate for adjusting the phase of the light and changing the laser light. In the direction of vibration, the direction of the laser light is rotated by 90 degrees by two times, that is, the two groups of signals have a phase difference of 90 degrees to achieve the interference signal requirement. The first slide (61) corresponds to the second polarized beam splitter (52); the second slide (62) corresponds to the third polarized beam splitter (53), and the two components are 90. Degree distribution. The plurality of photo sensors (7) include a first photo sensor (71), a second photo sensor (72), a third photo sensor (73), and a fourth photo sensor (74). ). The photo sensor (7) can be a photodetector or a displacement sensor that senses the change in light intensity and uses the change in light intensity for subsequent signal processing. The first photo sensor (71), the second photo sensor (72) and the second polarizing beam splitter (52) are grouped and distributed at 90 degrees; the third light 11 4 Ϋ) 200804757 sensor (73) The fourth photo sensor (74) and the third polarization beam splitter (53) are also distributed at a 90 degree angle. The light sensor (7) receives the change in the light intensity signal and processes the interference pattern. The four-quadrant sensor formed by the first photo sensor (71), the second photo sensor (72), the third photo sensor (73), and the fourth photo sensor (74) is The change in the spot is measured, and the other degrees of freedom error is converted by the analog/digital conversion card (A/D card).

本發明之量測系統，整個雷射光之光路順序射向如圖八所根據光學理論，光強度正比於電場向量振幅的平方，而在討論光強度分佈時，總是討論相對光強度，所以上述方程式中常數疋不重要的’可以直接認為光強度等於電場相量振幅的平方，因壓訊號，可以表示示’其信號表示如此由光感測器所接收到的干涉光強度訊號為電如下公式的四組信號，前面4為常數項用γ表圖九所示’係本發明之-較佳實施例之光栅χ轴移動與四個光感測器訊號對應示意圖。In the measuring system of the present invention, the optical path of the entire laser light is sequentially directed to the optical theory according to FIG. 8. The light intensity is proportional to the square of the amplitude of the electric field vector, and when discussing the light intensity distribution, the relative light intensity is always discussed, so The constant 疋 in the equation is not important. It can be directly considered that the light intensity is equal to the square of the amplitude of the electric field phasor. Because of the pressure signal, it can indicate that the signal indicates that the intensity of the interference light received by the photosensor is the following formula. The four sets of signals, the first 4 is a constant term, and the γ-table is shown in FIG. 9 is a schematic diagram corresponding to the grating axis movement of the preferred embodiment of the present invention and the four photosensor signals.

Vpm =4 + 4sin(2A^)Vpm = 4 + 4sin(2A^)

Vpdi =4-4sin^A^) VPm =4+4cos^A^) ypDA ~ 4 - 4cos(2A^) 若將以上訊號做適當的相減處理可以得到兩組相位角相差的弦波訊號，可表示如下的另兩組公式： 12 200804757 Vλ = Vpm - VPD2 == 8sin(2A^))Vpdi =4-4sin^A^) VPm =4+4cos^A^) ypDA ~ 4 - 4cos(2A^) If the above signals are properly subtracted, two sets of chord signals with phase angle differences can be obtained. Express the following two sets of formulas: 12 200804757 Vλ = Vpm - VPD2 == 8sin(2A^))

Vb ^ ypDz - VPD4 - 8cos(2A^) 以消的問而且原本直流電壓訊號的部份也藉由這種處理方式得除-留下交流電壓訊號的部分降低產生直流電壓訊號飄移將如上的兩組公式簡化，可以得到一圓方程式：Vb ^ ypDz - VPD4 - 8cos (2A^) to eliminate the problem and the original part of the DC voltage signal is also removed by this processing method - leaving part of the AC voltage signal reduced to produce DC voltage signal drift will be as above The group formula is simplified, and a circular equation can be obtained:

圖來檢測，圖十為I彳^ 口十為Llssa J0US圖。另外若是與兩訊號的相位差並非剛好，也會使圖形成為橢，不過這些差異都很小，也能夠藉由光路與電路的調整來修正。其中當光束對準不良時，圓的直徑會變小，可以用此做為調 H且及;k準光束的翏考，若直流訊號未去除乾淨，圓心將會偏離原點’可以接示波器利用X軸和γ軸關係組成為Lissa j0usFigure to detect, Figure 10 is I 彳 ^ mouth ten for the Llssa J0US map. In addition, if the phase difference with the two signals is not exactly, the pattern will be elliptical, but these differences are small, and can be corrected by the adjustment of the optical path and the circuit. When the beam is poorly aligned, the diameter of the circle will become smaller. You can use this as the adjustment of H and the k-beam. If the DC signal is not removed, the center of the circle will deviate from the origin. The X-axis and γ-axis relationships are composed of Lissa j0us

請參照圖四與圖八，其繪示依照本發明一較佳實施例的一種旋轉軸誤差量測方法的實施系統及量測說明示意圖。本發明之旋轉軸誤差量測方法的實施步驟如下：步驟一 ·將含有㈣反射器⑵的標準棒固定於為型機台之旋轉軸（21)上。步驟二：將雷射光源⑴置於定位且與第一分光鏡（31)成垂直的又角（如X Y軸）相對應處。該第一分光鏡⑶)與貓眼反射Please refer to FIG. 4 and FIG. 8 , which are schematic diagrams showing an implementation system and a measurement description of a method for measuring the error of a rotating shaft according to a preferred embodiment of the present invention. The steps of the method for measuring the rotational axis error of the present invention are as follows: Step 1 - The standard rod containing the (four) reflector (2) is fixed to the rotating shaft (21) of the type machine. Step 2: Place the laser source (1) at a position corresponding to the vertical angle of the first beam splitter (31) (such as the X Y axis). The first beam splitter (3)) and the cat's eye reflection

13 200804757 器（2)亦成垂直的交角（如Υ-Χ軸）相對應。使雷射光源（1)從X 方向射出一雷射光束至第一分光鏡（31)，該第一分光鏡（31)將雷 * 射光束反射至貓眼反射器（2)來測量旋轉軸（21)之誤差；貓眼反射器（2)再將該雷射光束予以反射產生一反射光並反射，該反射光將穿過上述之第一分光鏡（31)。步驟三：穿過第一分光鏡（31)之反射光照射到反射式光柵 (4)，此時通過反射式光柵（4)的反射光將會產生產生三道繞射 ® 光，即：正一階繞射光、負一階繞射光及零階繞射光。步驟四：上述之正一階繞射光、負一階繞射光則分別射入兩邊之另兩組分光鏡，即：第二分光鏡（32)與第三分光鏡（33)。射入第二分光鏡（32)與第三分光鏡（33)之正一階繞射光、負一階繞射光，將產生兩道光，一道穿透，一道反射。反射之光路會在第一極化分光鏡（51)重合，在這第一極化分光鏡（51)會產生干涉現象，然而也是產生另一道反射光及一道穿透光，各自分別穿過第 ® 一玻片（61)、第二玻片（62)。該第一玻片（61)、第二玻片（62)為 ί/4λ玻片。步驟五:上述之穿透光分別穿過第一玻片（61)、第二玻片（62) 後，再分別射入第二極化分光鏡（52)及第三極化分光鏡（53)。. 步驟六··第二極化分光鏡（52)及第三極化分光鏡（53)後方各放置四個光感測器，即：第一光感測器（71)、第二光感測器（72)、第三光感測器（73)及第四光感測器（74);利用這四個光感測器負13 200804757 The device (2) also corresponds to a vertical angle of intersection (such as the Υ-Χ axis). The laser source (1) emits a laser beam from the X direction to the first beam splitter (31), and the first beam splitter (31) reflects the beam of lightning light to the cat's eye reflector (2) to measure the axis of rotation ( 21) error; the cat's eye reflector (2) then reflects the laser beam to produce a reflected light that is reflected and passed through the first beam splitter (31). Step 3: The reflected light passing through the first beam splitter (31) is irradiated to the reflective grating (4), and the reflected light passing through the reflective grating (4) will generate three diffraction® lights, namely: positive First-order diffracted light, negative first-order diffracted light, and zero-order diffracted light. Step 4: The first-order diffracted light and the negative first-order diffracted light are respectively incident on the other two components of the two mirrors, namely, the second dichroic mirror (32) and the third dichroic mirror (33). The first-order diffracted light and the negative first-order diffracted light incident on the second dichroic mirror (32) and the third dichroic mirror (33) will generate two lights, one through and one reflection. The reflected light path will coincide with the first polarizing beam splitter (51), and the first polarizing beam splitter (51) will generate interference, but also generate another reflected light and a penetrating light, each passing through the first ® One slide (61), second slide (62). The first slide (61) and the second slide (62) are ί/4λ slides. Step 5: The penetrating light passes through the first slide (61) and the second slide (62), respectively, and then enters the second polarized beam splitter (52) and the third polarized beam splitter (53). ). Step 6··The second polarizing beam splitter (52) and the third polarizing beam splitter (53) are respectively placed with four light sensors, namely: a first light sensor (71) and a second light sensor. a detector (72), a third photo sensor (73) and a fourth photo sensor (74); using the four photosensors to be negative

14 200804757 責接收處理干涉條紋的變化。14 200804757 Responsible for receiving changes in interference fringes.

其中.第一光感測器（71)、第二光感測器（72)為—組，第三光感測器（73)及第四光感測器（74)為—組，2組相位差⑽度。在這之前旋轉前面的1/4λ之第-玻片⑽、第二玻片⑽即利用 2組光感測⑸目位差9G度，使純中的直度誤差鮮i用這光柵移動所產生的都卜勒效應及偏振的現象，再加上電子訊號處理四組光感測器的光路組合，將干涉所產生的直流飄移問題降到最低，以達到最佳的量測效果。另外，本發日相時湘；〇嶋矩陣、㈣相量與複數形式來分析與朗偏振光的干涉疊加問題。上列詳細說日聽針對本發明之—可行實施狀具體說明，惟該實施例並非用以限制本發明之專利範圍，凡未脫離本發明技获精神：為之等效實施或變更’均應包含於本案之專利範圍中。综上所述’本案不但在方法上销_，並能㈣用處理方法增進上述多項功效，應已充分符合新贿及進步性之法定發明專利要件，爰依法提出中請，懇_貴局核准本件發明專利申請案，以勵發明，至感德便。【圖式簡單說明】圖-係旋轉平台的六個自由度誤差之立體示意圖；圖一係傳統的旋轉軸量測系統示意圖；圖三係傳統的單探頭多次設定旋轉袖量測系統示意圖；圖四係本發明之—較佳實施例的-種實施量測原理平面示 15 200804757 意圖；圖五係本發明之一較佳實施例的一種實施量測立體組成示意圖；圖六係本發明之一較佳實施例的一種貓眼反射器實施立體不意圖，圖七係本發明之一較佳實施例的一種實施光路射向示意圖；圖八係本發明之一較佳實施例的一種實施方法之流程示意圖；圖九係本發明之一較佳實施例的一種實施方法之光柵X軸移動與四個光感測器訊號對應示意圖；圖十係本發明之一較佳實施例的一種實施方法之Lissa jous 示意圖。【主要元件符號說明】 1雷射光源 2貓眼反射器 21旋轉軸 31第一分光鏡 32第二分光鏡 33第三分光鏡 4反射式光柵 41反射鏡 5極化分光鏡The first photo sensor (71), the second photo sensor (72) are a group, the third photo sensor (73) and the fourth photo sensor (74) are a group, two groups Phase difference (10) degrees. Before this, the first 1/4λ of the first slide (10) and the second slide (10) are rotated by using 2 sets of light sensing (5) and the head position difference is 9G degrees, so that the straightness error in the pure is generated by the grating movement. The Doppler effect and the polarization phenomenon, together with the optical signal processing of the four sets of photosensors, minimize the DC drift caused by the interference to achieve the best measurement results. In addition, the present day phase Xiang Xiang; 〇嶋 matrix, (4) phasor and complex form to analyze the interference superposition problem with the lang polarized light. The above is a detailed description of the possible embodiments of the present invention, but the embodiment is not intended to limit the scope of the invention, and the invention is not deviated from the spirit of the invention: It is included in the patent scope of this case. In summary, 'this case is not only on the method of sales _, and can (4) use the treatment method to enhance the above-mentioned multiple functions, should have fully met the new bribe and progressive statutory invention patent requirements, 提出提出提出 _ _ _ _ _ _ _ This invention patent application, in order to invent invention, to the sense of virtue. [Simple diagram of the diagram] Figure - is a three-dimensional diagram of the six degrees of freedom error of the rotating platform; Figure 1 is a schematic diagram of the traditional rotary axis measurement system; Figure 3 is a schematic diagram of a conventional single-probe multiple setting rotary sleeve measurement system; Figure 4 is a schematic diagram showing the principle of the implementation of the preferred embodiment of the present invention. FIG. 5 is a schematic diagram of a three-dimensional composition of a preferred embodiment of the present invention; FIG. FIG. 7 is a schematic diagram of a light path of a preferred embodiment of the present invention; FIG. 8 is an embodiment of a preferred embodiment of the present invention. FIG. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 9 is a schematic diagram of a grating X-axis movement and four photosensor signals corresponding to an implementation method according to a preferred embodiment of the present invention; FIG. 10 is an implementation method of a preferred embodiment of the present invention. Schematic of Lissa jous. [Main component symbol description] 1 laser light source 2 cat's eye reflector 21 rotating shaft 31 first beam splitter 32 second beam splitter 33 third beam splitter 4 reflective grating 41 mirror 5 polarized beam splitter

16 200804757 第一極化分光鏡第二極化分光鏡第三極化分光鏡玻片第一玻片第二玻片光感測器第一光感測器第二光感測器第三光感測器第四光感測器16 200804757 First polarized beam splitter second polarized beam splitter third polarized beam splitter slide first slide second slide light sensor first light sensor second light sensor third light sense Detector fourth light sensor

Claims

200804757 十、申請專利範圍： 1- 一種高精度奈米級旋轉軸誤差量測裝置，包括：雷射光源，貓眼反射器，植入於標準棒一端；複數個分光鏡，包含有第一分光鏡、第二分光鏡及第三分光鏡，雷射光源產生之雷射光束射向第一分光鏡將光反射至貓眼反射器，貓眼反射器再將光反射且穿過第一分光鏡；反射式光柵，該反射式光柵及貓眼反射器、第一分光鏡成一直線，穿過第一分光鏡的雷射光束射入該反射式光柵； . 複數個極化分光鏡，包含有第一極化分光鏡、第二極化分光鏡及第三極化分光鏡；上述反射之光路在第一極化分光鏡重合後，在這第一極化分光鏡接收分光射出之反射光，使兩道正負一階反射光疊加形成一干涉光；複數個波片，包含有第一波片、第二波片；該波片其中第一玻片與第二極化分光鏡為一組相對應；第二玻片與第三極化分光鏡為另組對應；複數個光感測器，包含有第一光感測器、第二光感測器、第三光感測器及第四光感測器。 2 如申請專利範圍第1項所述之一種高精度奈米級旋轉軸誤差量測裝置，其中該雷射光源為氦氖雷射光源，半導體雷射光源或線偏振雷射光源其中之一種。 3 如申請專利範圍第1項所述之一種高精度奈米級旋轉軸誤200804757 X. Patent application scope: 1- A high-precision nano-level rotary axis error measuring device, including: a laser source, a cat-eye reflector, implanted at one end of a standard rod; a plurality of beamsplitters including a first beam splitter a second beam splitter and a third beam splitter, the laser beam generated by the laser source is directed toward the first beam splitter to reflect the light to the cat's eye reflector, and the cat's eye reflector reflects the light and passes through the first beam splitter; a grating, the reflective grating and the cat's eye reflector, the first beam splitter are in line, and the laser beam passing through the first beam splitter is incident on the reflective grating; a plurality of polarizing beamsplitters including the first polarization beam splitting a mirror, a second polarization beam splitter and a third polarization beam splitter; the reflected light path is superposed after the first polarization beam splitter, and the first polarization beam splitter receives the reflected light from the split light beam to make two positive and negative ones The step reflected light is superimposed to form an interference light; the plurality of wave plates comprise a first wave plate and a second wave plate; wherein the first slide plate and the second polarized beam splitter are corresponding to each other; the second glass Sheet and third pole Corresponding to the dichroic mirror group to another; a plurality of optical sensors, comprising a first optical sensor, second optical sensor, the first sensor and the fourth photo sensor triphosgene. 2 A high-precision nano-scale rotary axis error measuring device according to claim 1, wherein the laser light source is one of a neon laser source, a semiconductor laser source or a linearly polarized laser source. 3 A high-precision nano-rotation axis error as described in item 1 of the patent application scope

18 200804757 差量測裝置，其中該分光鏡為圓形，方型或矩形其中之一種。如申清專利範圍第1項所述之一種高精度奈米級旋轉軸誤差量測裝置，其中該波片為1/4 λ玻片。如申凊專利la圍第1項所述之一種高精度奈米級旋轉軸誤 6差置測裝置，其中該反射式光柵與第一分光鏡設有反光鏡。如申明專利範圍第1項所述之一種高精度奈米級旋轉軸誤差里測裝置，其中該標準棒固定於微型機台之旋轉軸。如申印專利範圍第1項所述之一種高精度奈米級旋轉軸誤差里測裝置，其中該波片其中第一玻片與第二極化分光鏡為一組相對應，第二玻片與第三極化分光鏡為另組對應，兩組成9 〇度分佈。如申凊專利範圍第1項所述之一種高精度奈米級旋轉軸誤差ϊ測裝置，其中該第一光感測器、第二光感測器與第二極化分光鏡一組且成90度分佈。 9如I料利範圍第i項所述之一種高精度奈米級旋轉軸誤差$測裝置，其中該第三光感測器、第四光感測器與第三極化分光鏡一組亦成9〇度分佈。〇一種咼精度奈米級旋轉軸誤差量測方法，實施步驟為：步驟一·將含有福眼反射器的標準棒固定於為型機台之旋轉軸上；步驟二·將雷射光源置於定位且與第一分光鏡成垂直的交角相對應處’該第一分光鏡與貓眼反射器亦成垂直的交角相對應，使雷射光源射出一雷射光束至第一分光鏡，該第一分光鏡將雷射光束反射至貓眼反射器來測量旋轉軸之誤差；貓眼反射器再將該雷射光束予以反射產生一反射光並反射，該反射光將穿過上述之第一分光鏡； 20080475718 200804757 Differential measuring device, wherein the beam splitter is one of a circular shape, a square shape or a rectangular shape. A high-precision nano-rotational axis error measuring device according to claim 1, wherein the wave plate is a 1/4 λ slide. For example, a high-precision nano-level rotating shaft error-detecting device according to the first aspect of the invention, wherein the reflective grating and the first beam splitter are provided with a mirror. A high-precision nano-rotating shaft error measuring device according to the first aspect of the invention, wherein the standard rod is fixed to a rotating shaft of the micro-machine. A high-precision nano-scale rotating shaft error measuring device according to the first aspect of the patent application, wherein the first slide and the second polarized beam splitter correspond to one set, the second slide Corresponding to the third polarization beam splitter, the two components have a 9-degree distribution. A high-precision nano-level rotating shaft error detecting device according to claim 1, wherein the first photo sensor, the second photo sensor and the second polarizing beam splitter are combined. 90 degree distribution. 9 is a high-precision nano-scale rotating shaft error measuring device according to item i of item I, wherein the third photo sensor, the fourth photo sensor and the third polarizing beam splitter are also In a 9 degree distribution. 〇 A method for measuring the error of the nanometer-level rotating shaft error, the implementation steps are as follows: Step 1: Fix the standard rod containing the eye reflector to the rotating shaft of the model machine; Step 2: Place the laser source Corresponding to the intersection angle of the positioning and perpendicular to the first beam splitter, the first beam splitter and the cat's eye reflector also intersect perpendicularly, so that the laser light source emits a laser beam to the first beam splitter, the first a beam splitter reflects the laser beam to the cat's eye reflector to measure the error of the rotating shaft; the cat's eye reflector then reflects the laser beam to generate a reflected light and reflects the reflected light to pass through the first beam splitter; 200804757

步驟三：穿過第一分光鏡之反射光照射到反射式光柵，此時通過反射式光栅的反射光將會產生產生正一階繞射光、負一階繞射光及零階繞射光的三道繞射光；步驟四：上述之正一階繞射光、負一階繞射光則分別射入兩邊之苐一分光鏡與第三分光鏡；射入第二分光鏡與第三分光鏡之正一階繞射光、負一階繞射光，將產生兩道光，一道穿透，一道反射；反射之光路會在第一極化分光鏡重合，在這第一極化分光鏡會產生干涉現象以產生另一道反射光及一這穿透光，各自分別穿過第一玻片、第二玻片；步驟五：上述之穿透光分別穿過第一玻片、第二玻片後，再分別射入第二極化分光鏡及第三極化分光鏡；乂驟^、.苐一極化分光鏡及第三極化分光鏡後方各放置第一光感測器、第二光感測器、第三光感測器及第四光感測器等四個光感測器；利用這四個光感測器負貴接收處理干涉條紋的變化。 11.Step 3: The reflected light passing through the first beam splitter is irradiated to the reflective grating, and the reflected light passing through the reflective grating will generate three paths of generating positive first-order diffracted light, negative first-order diffracted light, and zero-order diffracted light. Diffraction light; Step 4: The first-order diffracted light and the negative first-order diffracted light are respectively incident on the two sides of the first beam splitter and the third beam splitter; the first step of the second beam splitter and the third beam splitter are injected The diffracted light, the negative first-order diffracted light, will produce two lights, one through, one reflection; the reflected light path will coincide in the first polarizing beam splitter, in which the first polarizing beam splitter will produce interference to generate another The reflected light and the transmitted light respectively pass through the first slide and the second slide respectively; Step 5: the above-mentioned transmitted light passes through the first slide and the second slide respectively, and then respectively enters the first a polarizing beam splitter and a third polarizing beam splitter; a first light sensor, a second light sensor, and a third rear after the polarizing beam splitting mirror and the third polarizing beam splitter Four light sensors, such as a light sensor and a fourth light sensor; use these four Reception processing sensor change your negative interference fringes. 11.

12. 13. ^申明專利範圍第1〇所述之一種高精度奈米級旋轉軸誤差量測分法，其中該射光源為氦氖雷射光源，半導體雷射光源或線偏振雷射光源其中之一種。 =申明專利範圍第1〇所述之一種高精度奈米級旋轉軸誤差量測分法，其中該分光鏡為圓形，方型或矩形其中之一種。 2申請專利範圍第10所述之一種高精度奈米級旋轉軸誤差 ®測分法，其中該波片為1/4 λ玻片。 $申請專利範圍第10所述之一種高精度奈米級旋轉軸誤差曰、】刀去，其中该反射式光栅與第一分光鏡設有反光鏡。12. 13. ^ A high-precision nano-scale rotary axis error measurement method according to the scope of claim 1 wherein the source is a krypton laser source, a semiconductor laser source or a linearly polarized laser source. One of them. = A high-precision nano-scale rotary axis error measurement method according to the scope of claim 1 wherein the beam splitter is one of a circular shape, a square shape or a rectangular shape. 2 A high-precision nano-scale rotary axis error ® method for measuring the patent range 10, wherein the wave plate is a 1/4 λ slide. A high-precision nano-scale rotating shaft error according to the tenth patent application scope, wherein the reflective grating and the first beam splitter are provided with mirrors.

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