1260394 九、發明說明： 【發明所屬之技術領域】 本發明係關於一種奈米級旋轉軸誤差量測裝置，特別是指 一種針對旋轉軸的平移誤差作量測，其利用光學繞射與干涉原 理所量測之旋轉軸誤差量測裝置。 【先前技術】 目前微型！先I、微型鑽纟、微型雕刻機等微型加工母機之 φ旋轉軸在實際運動時，乃會產生六個自由度的誤差，其包括三 個線誤差（x、y、z)與俯仰（pitch)、搖擺（Yaw)及滾動（_ 等三個角誤差，由於旋轉軸是經由旋轉軸、軸承、驅動器等元 件組裝而成，會因為元件尺寸的誤差、元件間配合度等關係， 而產生具有多自由度的誤差，是在其機器中之旋轉轴的特性， 將影響整台微型加工母機的作業精度與加工產品的品質，是此 被加工之精密工件的加工尺寸，皆需要考慮六個自由度的誤 ® 差，才能精確加工出所需之產品。 如圖一所示’ 一般旋轉軸旋轉誤差源可分 三個位置誤差…⑷…⑷），二個角 統’乃使用五個探 =Ux⑷、eyU))及—個角度定位誤差εζ⑷。為了 1測這六個誤差源，最早的旋轉軸量測系 以分析旋轉轴誤差，如圖二所示。 而隨著技術的發展，現有旋轉軸量測技術有以下四種分 類，如下所述·· 5 1260394 1·直接使用master ball/axis/cylinder，但不補償標準轴之 誤差··此方法是最早的旋轉軸量測技術，但會受限於標準棒 /球的加工精度，因此不適用於高精度量測。 2·直接使用master ball/axis/cylinder，但補償標準軸之誤 差，補償方式為multi-steps(單探頭多次設定採用單（多） 探頭多次設定旋轉軸誤差分離的另一種方法，如圖三（a)〜 圖三（C)所示。1260394 IX. Description of the Invention: [Technical Field] The present invention relates to a nanometer-level rotary axis error measuring device, and more particularly to a measurement of translational error for a rotating shaft, which utilizes the principle of optical diffraction and interference The measured rotary axis error measuring device. [Prior Art] Currently miniature! First, I, micro drill, micro engraving machine and other micro-machining machine φ rotation axis will produce six degrees of freedom error in actual motion, including three line errors (x, y, z) and pitch (pitch ), three-angle error such as yaw and scroll (_), since the rotating shaft is assembled via components such as a rotating shaft, a bearing, a driver, etc., it is caused by the difference in component size and the degree of fit between components. The error of multi-degree of freedom is the characteristic of the rotating shaft in the machine, which will affect the working precision of the whole micro-machining machine and the quality of the processed product. It is the processing size of the precision workpiece to be processed, and six freedoms need to be considered. The error of the degree can be accurately processed to produce the desired product. As shown in Figure 1, the general rotation axis error source can be divided into three position errors...(4)...(4)), and the two angles are using five probes. Ux(4), eyU)) and an angular positioning error εζ(4). In order to measure these six error sources, the earliest rotation axis measurement system is to analyze the rotation axis error, as shown in Figure 2. With the development of technology, the existing rotary axis measurement technology has the following four classifications, as described below. · 5 1260394 1· Direct use of master ball/axis/cylinder, but does not compensate for the error of the standard axis··This method is the earliest Rotary axis measurement technology, but will be limited by the standard rod / ball processing accuracy, so it is not suitable for high-precision measurement. 2. Directly use master ball/axis/cylinder, but compensate for the error of standard axis. The compensation method is multi-steps. (Single probe multiple setting uses single (multi) probe to set the rotation axis error separation multiple times, as shown in the figure. Three (a) ~ Figure III (C).
明人鐘於上述習用微型加工機械而言，無法做很奈 ，乃亟思加以改良創新，並經多年苦心孤諸潛心研 本案發 米級的量測 究後，終於成功研發完成本件奈米級旋轉軸誤差量測裝置 【發明内容】 本發明之目的即在於提供一種用光繞射與干涉之原理所建 立之奈米級旋轉誤差量測方法及裝置。 本發明之次-目的係在於提供一種光柵移動所產生的都卜 ^力效應及偏振的現象，再加上電子訊號處理的奈米級旋轉誤差 量測方法及裝置。 本發明之另-目的係在於提供一種一次能量取三個線誤差 與俯仰、搖擺及滾動等三個角誤差資料之奈米級旋轉誤差量測 方法及裝置， 可達成上述發明目的之一 置，包括有： 種奈米級旋轉誤差量測方法及裝 1260394 一雷射光源’係用以發射出一雷射光束； 一 BS分光鏡，係配置於該雷射光源的一光束路徑中，以將 5亥雷射光束產生为光為一水平光束與一垂直光束； 一角隅稜鏡，係設置於旋轉軸上，其可接收垂直光束後， 產光反射光，該反射光並再穿過分光鏡； 一反射鏡，係配置於該角隅稜鏡的一反射光路徑中，以將 穿過BS分光鏡之反射光作90度的轉折； 一反射式光柵，係設置於該反射鏡之一側，以將該反射光 產生一正一階繞射光、一負一階繞射光以及一零階繞射光； 一第一分光鏡，係設置於該反射式光柵之一侧，以將該正 一階繞射光分為一第一穿透光與一第一反射光； 一第二分光鏡，係設置於該反射式光栅相對於該第一分光 鏡之另一侧，以將該負一階繞射光分為一第二穿透光與一第二 反射光； 一第三分光鏡，係設置於該第一分光鏡與第二分光鏡相對 於該反射式光栅之另一側，以分別接收該第一反射光與第二反 射光’並於第三分光鏡内產生干涉現象，其後再分別產生一第 三穿透光與一第三反射光； 一第一光路量測單元，係具有一 1/4 λ波片、—第四分光鏡 及二光檢知器，該1/4λ波片可將第三穿透光通過二次，並使第 三穿透光振動方向轉90度，而該第四分光鏡於接收第三穿透光 1260394 後’並分別產生一第四穿透光與一第四反射光，使各該光檢知 杰係各能接收第四穿透光與第四反射光之信號強度變化；以及 一第二光路量測單元，係具有一 1/4 λ波片、一第五分光鏡 及一光檢知器，該1/4 λ波片可將第三反射光通過二次，並使第 一反射光振動方向轉9〇度，而該第五分光鏡於接收第三反射光 後並刀別產生一第五穿透光與一第五反射光，使各該光檢知 杰係各旎接收第五穿透光與第五反射光之信號強度變化； 違雷射光束繞射於繞射，微型機台其旋轉軸上之角隅稜鏡 後田碇轉軸有迴轉誤差時，會造成繞射光的變化，進而影響 到反射光打到光栅上之移動量，進而由光檢知器上之信號位置 變化，再經由數學運算後而得到其平移誤差值。 【實施方式】 請參閱圖四，本發明所提供之一種奈米級旋轉誤差量測方 法及裝置，主要包括有：一雷射光源1、- BS分光鏡2、-角 隅稜鏡3、一反射鏡4、_光拇5、一第一分光鏡61、一第二分 光鏡62、-第三分光鏡63、_第—光路量測單元7以及一第二 光路量測單元8。 該雷射光源i，係用以發射出一雷射光束，該雷射光源丄 係為一 Μ射一極體所激發； 該BS分光鏡2 ’係配置於該雷射光源i的—光束路徑中， 以將該雷射光束產生分光為一水平光束與一垂直光束； 1260394 該角隅稜鏡3，係内置於標準棒後，再將標準棒設置於微型 枝台之旋轉軸91上，該標準棒之直徑約為微型銑床、鑽床、雕 刻機等加工母機之刀具大小，其可接收垂直光束後，產光反射 光，該反射光並再穿過BS分光鏡2 ; - 該反射鏡4，係配置於該角隅稜鏡3的一反射光路徑中，以 * 將穿過BS分光鏡2，量測俯仰度、滾動度、搖偏度、所需的數 值之反射光作90度的轉折，以使反射光能射入光柵5内，讓雷 Φ 射光源1順利進入各光檢知器73,74,83,84 ; 該光柵5 ’係為一反射式光柵，其設置於微型機台之床台 92及該反射鏡4之一側，以將該反射光產生一正一階繞射光、 一負一階繞射光以及一零階繞射光； 該第一分光鏡61，係設置於該光栅5之一側，以將該正一 階繞射光分為一第一穿透光與一第一反射光； 該第二分光鏡62，係設置於該光柵5相對於該第一分光鏡 ^ 61之另一侧，以將該負一階繞射光分為一第二穿透光與一第二 反射光； 該第二分光鏡63,係設置於該第一分光鏡61與第二分光鏡 62相對於該光栅5之另一側，以分別接收該第一反射光與第二 反射光，疊加形成一干涉光後，並分別再產生一第三穿透光與 一第三反射光； 該第一光路量測單元7，係具有一 1/4 λ波片71、一第四分 9 1260394 光鏡72及二光檢知器73,74，該1/4 λ波片71可將第三穿透光 通過一-人，並使第二穿透光振動方向轉9〇度，而該第四分光鏡 72於接收第三穿透光後，並分別產生一第四穿透光與一第四反 射光，使各該光檢知器73,74係各能接收第四穿透光與第四反 射光之“號強度變化（干涉光強度訊號以及Mingren Zhong can't do very much in the above-mentioned micro-processing machinery, but he has made innovations and innovations. After years of painstaking research and research, he finally succeeded in researching and developing this piece of nanometer. BACKGROUND OF THE INVENTION The object of the present invention is to provide a nanometer-level rotational error measurement method and apparatus established by the principle of light diffraction and interference. The second objective of the present invention is to provide a method and apparatus for measuring the force and polarization of the grating caused by the movement of the grating, together with the nanometer rotation error measurement by the electronic signal processing. Another object of the present invention is to provide a nanometer-level rotational error measurement method and apparatus for three angular error and three angular error data such as pitch, sway, and roll, which can achieve one of the above objects. The method includes: a nanometer-level rotation error measurement method and a 1260394 laser light source for emitting a laser beam; a BS beam splitter disposed in a beam path of the laser source to The 5 ray laser beam is generated as a horizontal beam and a vertical beam; a corner 设置 is disposed on the rotating shaft, and after receiving the vertical beam, the light is reflected, and the reflected light passes through the beam splitter. a mirror disposed in a reflected light path of the corner to deflect the reflected light passing through the BS beam splitter by 90 degrees; a reflective grating disposed on one side of the mirror The first light splitting mirror is disposed on one side of the reflective grating to generate the positive first order. The diffracted light is divided into a first wear Light and a first reflected light; a second beam splitter disposed on the other side of the reflective grating relative to the first beam splitter to divide the negative first-order diffracted light into a second transmitted light and a second reflected light; a third beam splitter disposed on the other side of the first beam splitter and the second beam splitter relative to the reflective grating to receive the first reflected light and the second reflected light respectively And generating an interference phenomenon in the third beam splitter, and then generating a third transmitted light and a third reflected light respectively; a first optical path measuring unit having a 1/4 λ wave plate, - fourth a beam splitter and a two-light detector, the 1/4 lambda wave plate can pass the third transmitted light twice, and the third transmitted light vibrates in a direction of 90 degrees, and the fourth beam splitter receives the third through After transmitting light 1260394, and respectively generating a fourth penetrating light and a fourth reflected light, respectively, each of the light detecting devices can receive the signal intensity changes of the fourth penetrating light and the fourth reflected light; The two-light path measuring unit has a 1/4 λ wave plate, a fifth beam splitter and a light detector, the 1/4 λ wave The third reflected light may be passed twice, and the first reflected light is rotated by 9 degrees, and the fifth splitter receives a third reflected light and generates a fifth transmitted light and a fifth Reflecting the light, so that each of the light detecting signals receives the change of the signal intensity of the fifth penetrating light and the fifth reflected light; the laser beam is diffracted by the diffraction, and the corner of the micro-machine is rotated on the axis of rotation When the mirror has a rotation error, the rotation of the field will cause a change in the diffracted light, which in turn affects the amount of movement of the reflected light onto the grating, and then the position of the signal on the optical detector changes, and then the translation is obtained by mathematical operation. difference. [Embodiment] Referring to FIG. 4, a nanometer-level rotation error measurement method and apparatus provided by the present invention mainly includes: a laser light source 1, a BS beam splitter 2, an angle cube 3, and a The mirror 4, the optical thumb 5, a first dichroic mirror 61, a second dichroic mirror 62, a third dichroic mirror 63, a first optical path measuring unit 7, and a second optical path measuring unit 8. The laser light source i is configured to emit a laser beam, which is excited by a sputtering body; the BS beam splitter 2' is disposed on the beam path of the laser source i The splitting beam is split into a horizontal beam and a vertical beam; 1260394, the corner 隅稜鏡3 is built in the standard bar, and the standard bar is placed on the rotating shaft 91 of the micro branch. The diameter of the standard rod is about the size of the machining machine of the micro-milling machine, the drilling machine, the engraving machine, etc., and after receiving the vertical beam, the light is reflected, and the reflected light passes through the BS beam splitter 2; - the mirror 4, It is disposed in a reflected light path of the corner ,3, and will pass through the BS beam splitter 2, and measure the pitch, the rolling degree, the shake degree, and the required value of the reflected light to make a 90 degree turn. So that the reflected light can be incident into the grating 5, and the Ray Φ light source 1 can smoothly enter each of the light detectors 73, 74, 83, 84; the grating 5' is a reflective grating, which is disposed on the micro-machine a bed 92 and one side of the mirror 4 to generate a positive first-order diffracted light and a negative First-order diffracted light and zero-order diffracted light; the first dichroic mirror 61 is disposed on one side of the grating 5 to divide the first-order diffracted light into a first transmitted light and a first reflected light The second beam splitter 62 is disposed on the other side of the grating 5 relative to the first beam splitter 61 to divide the negative first-order diffracted light into a second transmitted light and a second reflected light. The second beam splitter 63 is disposed on the other side of the first beam splitter 61 and the second beam splitter 62 with respect to the grating 5 to receive the first reflected light and the second reflected light, respectively, to form a After the interference light, a third transmitted light and a third reflected light are respectively generated; the first optical path measuring unit 7 has a 1/4 λ wave plate 71 and a fourth minute 9 1260394 light mirror 72 And a two-light detector 73, 74, the 1/4 λ wave plate 71 can pass the third transmitted light through a person, and the second transmitted light vibrates in a direction of 9 degrees, and the fourth beam splitter 72 after receiving the third transmitted light, and respectively generating a fourth transmitted light and a fourth reflected light, so that each of the optical detectors 73, 74 can receive the fourth transmitted light and the fourth opposite The intensity of the "light intensity" (interference light intensity signal and
該第二光路量測單元8，係具有一 1/4又波片81、一第五分 光鏡82及二光檢知器83,84，該1/4λ波片81可將第三反射光 通過二次，並使第三反射光振動方向轉9〇度，而該第五分光鏡 82於接收第二反射光後，並分別產生一第五穿透光與一第五反 射光，使各該光檢知器83,84係各能接收第五穿透光與第五反 射光之信號強度變化（干涉光強度訊號）。 其後根據光學理論，當光強度正比於電場向量振幅的平 方，而在纣論光強度分佈時，總是討論相對光強度，所以直接 可濕為光強度等於電場相量振幅的平方，如圖五之光柵^軸移動 與四個光檢知器量測訊號之對應圖所示，因此由各光檢測器所 接收到的信號強度變化（干涉光強度訊號）為電壓訊號，可以表 示為（31)、（32)、（33)、（34) (31) (32) (33) (34) ^pd\ ~ 4 + 4sin(2A^) ^ρ〇2 ~ 4 - 4sin(2A^) Km ~ 4 + 4cos(2A^>) ^ρ〇4 ~ 4-4cos(2A^?) 10 1260394 • 若將以上訊號做適當的相減處理可以得到兩組相位角相差 90度的弦波訊號，可表示為（36)、（36) - VPDX - VPD2 = 8sin(2A^)) (3 5) - VPD3 - VPDA = 8cos(2A^?) .................(36) • >再將原本直流電壓訊號的部份’也藉由這種處理方式得 -以消除，只留下交流電愿訊號的部分，則可降低產生直流電壓 訊號飄移的問題。其後，將（35)、（36)公式簡化，可以得到—員 _ 方程式（4〇) 胃 .(40) 其中當光束對準不良時，圓的直徑會變小，可以用此做為 調整鏡組及校準光束的參考，若直流電壓訊號未去除乾淨，圓 心將會偏離原點，另外若是匕與、訊號的相位差並非剛好二 度’也會使圖形成為橢圓狀’不過這些差異都很小，也能夠·The second optical path measuring unit 8 has a 1/4 wave plate 81, a fifth beam splitter 82 and two light detectors 83, 84. The 1/4 lambda plate 81 can pass the third reflected light. Secondly, the third reflected light is rotated by 9 degrees, and the fifth splitter 82 receives a second reflected light and generates a fifth transmitted light and a fifth reflected light respectively. The light detectors 83, 84 are each capable of receiving signal intensity variations (interference light intensity signals) of the fifth transmitted light and the fifth reflected light. Then according to the optical theory, when the light intensity is proportional to the square of the amplitude of the electric field vector, and in the light intensity distribution of the paradox, the relative light intensity is always discussed, so the direct wettable light intensity is equal to the square of the amplitude of the electric field phasor, as shown in the figure. The corresponding diagram of the five-axis grating movement and the four optical detector measurement signals is shown. Therefore, the signal intensity change (interference light intensity signal) received by each photodetector is a voltage signal, which can be expressed as (31). ), (32), (33), (34) (31) (32) (33) (34) ^pd\ ~ 4 + 4sin(2A^) ^ρ〇2 ~ 4 - 4sin(2A^) Km ~ 4 + 4cos(2A^>) ^ρ〇4 ~ 4-4cos(2A^?) 10 1260394 • If the above signals are properly subtracted, two sets of chord signals with phase angles of 90 degrees can be obtained. Expressed as (36), (36) - VPDX - VPD2 = 8sin(2A^)) (3 5) - VPD3 - VPDA = 8cos(2A^?) ............... ..(36) • > Then the part of the original DC voltage signal is also obtained by this processing method to eliminate, leaving only the part of the AC power signal, which can reduce the problem of DC voltage signal drift. After that, the formulas (35) and (36) are simplified, and the _ _ equation (4 〇) stomach can be obtained. (40) When the beam is poorly aligned, the diameter of the circle becomes small, which can be used as an adjustment. For the reference of the mirror group and the calibration beam, if the DC voltage signal is not removed, the center of the circle will deviate from the origin. In addition, if the phase difference between the signal and the signal is not exactly two degrees, the pattern will be elliptical. Small, can also
由光路與電路的調整來修正。 曰 本發明係將第-光路量測單元7與第二光路量測單元8, 二組相位差90度，再引入J〇nes 轉J〇nes相量與複數形式 來分析來說明偏振光的干涉疊加問題’本發明較佳實施例中的 直度誤差就利用這光栅5移動所產生㈣卜勒 象’再加上電子_處理的統組合，將切所Μ的直流飄 移問題降到最低，以達到最佳的量測效果。 ^ 綜上所述’本案不但在空間型態上侧新，並能較習用物 11 1260394 t * ' 品增進上述多Corrected by adjustment of the optical path and circuit. In the present invention, the first optical path measuring unit 7 and the second optical path measuring unit 8 are phase-shifted by 90 degrees, and then introduced into the J〇nes to J〇nes phasor and complex forms to analyze the interference of polarized light. The superposition problem 'the straightness error in the preferred embodiment of the present invention utilizes the combination of the (4) Buhler image and the electronic_processing generated by the movement of the grating 5 to minimize the DC drift problem of the cut. Achieve the best measurement results. ^ In summary, the case is not only new in the spatial pattern, but also more than the conventional 11 1260394 t * '
貞功效，應已充分符合新結R 專利要件，爰依法提”請，態請=性及進步性之法定發明 案，以勵發明，$ 、°核准本件發明專利申請 芝鐵德便。 【圖式簡單說明】 差之 二=加工母機之旋轉軸的六個自由度誤差之示意圖。 示意圖，、輪_，❹爾物旋轉輛誤 圖三係為單探頭多次設定量測旋轉輛誤差之示意圖。 測裝置之較佳實施例之 圖四係為一種奈米級旋轉軸誤差量 示意圖 回五係為光柵X軸移動與四個光檢知器量測訊號之對應 5 〇 【主要部分代表符號】 1雷射光源 2 BS分光鏡 3角隅稜鏡 4反射鏡 5光栅 61第一分光鏡 62第二分光鏡 63第三分光鏡 12 1260394 7第一光路量測單元 71 1/4 λ波片 72第四分光鏡 73, 74光檢知器The effect of cockroaches should be fully in line with the new R patent requirements, and the statutory inventions of “sex, sexuality and progress” should be submitted in accordance with the law, in order to encourage invention, $, ° to approve the invention patent application Zhi Tiede. Brief description of the formula] The difference between the two degrees of freedom error of the rotating shaft of the machining machine. Schematic diagram, wheel _, 误 物 旋转 误 误 误 误 误 误 误 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图The fourth embodiment of the preferred embodiment of the measuring device is a nanometer-level rotating shaft error amount diagram back to the fifth system for the grating X-axis movement and the corresponding of the four optical detector measuring signals 〇 [main part representative symbol] 1 laser light source 2 BS spectroscope 3 angle 隅稜鏡 4 mirror 5 grating 61 first beam splitter 62 second beam splitter 63 third beam splitter 12 1260394 7 first optical path measuring unit 71 1/4 λ wave plate 72 Fourth beam splitter 73, 74 light detector
8第二光路量測單元 81 1/4 λ波片 82第五分光鏡 83, 84光檢知器 91旋轉轴 92床台 100旋轉軸 101探頭8 second optical path measuring unit 81 1/4 λ wave plate 82 fifth beam splitter 83, 84 light detector 91 rotating shaft 92 bed 100 rotating shaft 101 probe
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