1249609 政、發明說明： 【發明所屬之技術領域】 本發明為一種繞射式角定位五自由度量測裝置，特別指 一種能同時檢測出㈣圓冑角以立誤差與其他因旋轉而産 生的誤差，以得到角定位五自由度誤差的量測裝置。 【先前技術】 對於多軸工具機而言，角定位量測系統為不可缺少的校 正設備’包括第四軸與第五軸，皆需要高精密度角定位檢測 系統來進行校正。如圖—所示，其中心)也就是角度定位誤 差（Indexing Error)。 有關角度定位誤差之檢測系統發展至今有量規法、圓分 度法、影象法和全組合法等方法。 ① 讀法：利用著色法、光隙法和指示表法（如量規）將 被測角度與圓錐量規、角度量塊、角 里兄角度樣板、角尺和正弦規 等的準確角度作比較。 ② 圓分度法：利用具有度盤(如線紋尺)、圓光柵、磁盤 :端面齒盤等精確圓分度元件的測量工具測量角度。這類測 量工具有萬能角度尺、光學分度頭、光學迴轉工作台、多齒 分度台和測角儀等。 ③ 影像法：利用光學放大原理把被❹度放大，再測f 其影像…般是在卫具顯微鏡或投影儀上測量。 ④ 全組合法：它用於測量具有封閉圓周、並能整除⑽。 1249609 的角度。將被測角度與圓周角對比後’通過數據處理即 算出被測角的量值。上述轉盤種類，有些係直接使用當朴 準校正盤（當然這些轉盤本身仍須接受校正）。 " 有關角度檢測技術及補償早期有使用多面菱鏡 檢測技術爲使用準直儀與高精度多面稜鏡，但是以此量、、/ 式只能檢測轉盤某H點角度誤差，如若使用十二^ = 鏡’則是以每三十度的角声$翼 ' 角度块差進仃檢測。目前雖然已有七 十二面稜鏡，但是在製造價格上非常昂貴，亦不容易靖買。 之後又有多家大型儀器公司相 射檢測距離轉換成 'Λ又正刀度盤。因此發展出整合一高精度旋轉圓盤 與二面：或干涉角度的角定位量測系統。目前角定位量測 糸統-格卬貴而且只能檢 ^ ^ 朽疋位决差，並無法同檢測其他 轉盤誤差，對於檢測多軸工呈 ，、钱之弟四軸角定位與 位將花費許多時間。 軸角疋 因此，本發明係建立-套「-種繞射式角定位五自由产 -測裝置此系統能同時檢測出旋轉圓盤角 他因旋轉而產生的誤差（radia :、 errors)，目前世只 μ angular 夕軸工且機 1無具此多功能的商品，以期能減化 夕軸工具械的校正作業。 【發明内容】 Μ明的目的在於提供—種繞射式角定位五自由度量 1249609 測裝置，為一種線性雙軸幾何誤差之量測裝置，其設計一反 射式圓柱形光柵，並纟士八#满、八也妒 、、口 口九，原刀先鏡、位置感測器、透鏡 組及光電二極體陣列，組成一種繞射式角定位五自由度量測 裝置’而這樣的檢測裝置對於多軸卫具機的校正將減少很多 時間。 為了能夠同時量測旋轉盤的位置誤差、角度偏擺誤差及 角度定位誤差，本發明設計了一種繞射式角定位五自由度量 測裝置，裝置架設如圖二所示，系統架構包含一光源、一反 射式圓柱形光栅、三個分光鏡、兩個位置感測器、一個透鏡 組與一光電二極體陣列。 其中角定位的五自由度誤差量’係利用雷射二極體產生 光源配合反射式圓柱形光柵、雷射四象儀及光電二極體陣列 力等裝置來達到測量的目的。系統架構爲將反射式圓柱形光柵 架設在欲校正之待測轉盤外徑上，當光源垂直人射至反射式 圓柱形光栅面上産生了正負—階繞射光，當待測轉轴在旋轉 的時候，反射式圓柱形光柵所產生正負一階的繞射光的光點 經第-分光鏡與第二分光鏡分光後，穿透光束分別入射在雷 射—極體兩邊對稱放置的兩組雷射四象儀上，利用雷射四象 儀去接收由反射式圓柱形光栅所產生的繞射光，而雷射四象 儀會根據光點人射在雷射四象儀上的隸位置，而改變其輪 出的電壓’再由類比/數位卡去將這些電麗的值讀到電月^ 1249609 « 中，由電腦去分析，經由計算後可獲得待測轉軸的徑向軸定 位誤差及角度偏擺誤差，而正負一階繞射光分別經第一分光 鏡與第二分光鏡分光後，反射光束在第三分光鏡會合產生干 V現象’此干涉現象的干涉條紋經由一透鏡組放大，使條紋 大小配合光電二極體寬度，並由該光電二極體組成的陣列接 收，藉由干涉條紋的變化可得到待測轉軸的旋轉角度，如此 可得到角定位五自由度誤差。 【實施方式】 本發明如圖二所示，其係為一種繞射式角定位五自 由度里/則農置，其糸統架構包含一光源1，通常為雷射二 極體（Laser Diode)，可為單頻雷射光、雙頻雷射光、線 性a周頻半導體雷射光等，皆可運用於絕對距離量測，或為 可見光、微波、紅外光、紫外光、χ射線，皆可運用於絕 對距離量測；一特製的反射式圓柱形光柵（Reflective Cylinder Diffracti〇n Grating)2;三個分光鏡（Be⑽1249609 Administration, invention description: [Technical field of invention] The present invention is a diffraction angle positioning five-free measurement device, in particular, a method capable of simultaneously detecting (4) a rounded corner with an error and other rotations. Error to obtain a measuring device for angular positioning five degrees of freedom error. [Prior Art] For the multi-axis machine tool, the angular positioning measurement system is an indispensable correction device' including the fourth axis and the fifth axis, and all require a high-precision angular position detecting system for correction. As shown in the figure, the center is the Indexing Error. The development of detection systems for angular positioning errors has been developed by methods such as gauge method, circle index method, image method and full combination method. 1 Reading method: The coloring method, the light gap method and the indicator table method (such as a gauge) are used to compare the measured angle with the accurate angles of the cone gauge, the angle gauge block, the angle brother angle model, the square ruler and the sine gauge. 2 Circular indexing method: The angle is measured by a measuring tool having a precise circular indexing element such as a dial (such as a ruler), a circular grating, or a disk: a faceted toothed disc. These measuring tools include universal angle gauges, optical indexing heads, optical rotary tables, multi-tooth indexing tables and goniometers. 3 Image method: use the principle of optical amplification to amplify the degree of the sputum, and then measure the image of it... it is measured on a microscope or projector. 4 Full combination method: It is used to measure a closed circumference and can be divisible (10). The angle of 1249609. After comparing the measured angle with the circumferential angle, the magnitude of the measured angle is calculated by data processing. Some of the above types of turntables are used directly as standard calibration discs (of course these turntables themselves still have to be corrected). " Regarding angle detection technology and compensation, the multi-faceted mirror detection technology used in the early stage is to use collimator and high-precision multi-faceted cymbal, but this quantity, / / can only detect the angle error of a certain H point of the turntable, if using twelve ^ = Mirror' is detected by the angle of the 'wing' angle block every 30 degrees. Although there are currently 72 face squats, it is very expensive in terms of manufacturing price and it is not easy to buy. Later, a number of large-scale instrument companies converted the detection distance into a 'Λ and a knife. Therefore, an angular positioning measurement system integrating a high-precision rotating disk with two sides: or an interference angle has been developed. At present, the angular positioning measurement system is very expensive and can only be used to check the ^^ 疋 决 决 , , , , , , , , , , , , , , , , , 决 决 决 决 决 决 决 决 决 决 决 决 , , 决 , , , , a lot of time. Therefore, the present invention establishes a set of "-------------------------------- The company only has a multi-functional product, in order to reduce the calibration work of the tool. [Invention] The purpose of the invention is to provide a diffraction-angle positioning five-free metric. 1249609 measuring device, which is a linear biaxial geometric error measuring device, which is designed with a reflective cylindrical grating, and is equipped with a gentleman's eight full, eight also, nine mouth, original knife first mirror, position sensor , the lens group and the photodiode array form a diffraction angle positioning five-free metrology device' and such a detection device will reduce the time for the correction of the multi-axis guard machine. In order to be able to simultaneously measure the rotating disk Position error, angle yaw error and angle positioning error, the present invention designs a diffraction angle positioning five-free measurement device, the device is erected as shown in Figure 2, the system architecture includes a light source, a reflective circle Shape grating, three beam splitters, two position sensors, one lens group and one photodiode array. The five-degree-of-freedom error amount of angular positioning is generated by using a laser diode with a reflective cylindrical shape. Gratings, laser quadrupoles, and photodiode arrays are used to achieve the purpose of measurement. The system is designed to mount a reflective cylindrical grating on the outer diameter of the to-be-corrected turntable to be calibrated. The positive and negative-order diffracted light is generated on the cylindrical grating surface. When the rotating shaft to be tested is rotating, the reflective cylindrical grating generates the light of the first-order negative-order diffracted light through the first beam splitter and the second beam splitter. After splitting, the penetrating beams are respectively incident on two sets of laser four-image cameras symmetrically placed on both sides of the laser-pole body, and the laser four-imager is used to receive the diffracted light generated by the reflective cylindrical grating, and the laser is irradiated. The four-imager will change the voltage of its turn based on the position of the spotlight on the laser quadrature. Then the analog/digital card will read the value of these electrics into the electric moon ^ 1249609 « Analyzed by computer, After the calculation, the radial axis positioning error and the angular yaw error of the shaft to be tested can be obtained, and the positive and negative first-order diffracted beams are split by the first beam splitter and the second beam splitter respectively, and the reflected beam is combined at the third beam splitter to generate a dry V phenomenon 'The interference fringes of this interference phenomenon are amplified by a lens group, the stripe size is matched with the width of the photodiode, and is received by the array of the photodiode, and the rotation of the shaft to be tested can be obtained by the change of the interference fringe Angle, so that the angular positioning five-degree-of-freedom error can be obtained. [Embodiment] The present invention is shown in FIG. 2, which is a diffraction angle positioning five degrees of freedom / then agricultural, and its system includes a light source 1 , usually a laser diode (Laser Diode), can be single-frequency laser light, dual-frequency laser light, linear a-frequency semiconductor laser light, etc., can be used for absolute distance measurement, or visible light, microwave, infrared Light, ultraviolet and x-ray can be used for absolute distance measurement; a special reflective cylindrical grating (Reflective Cylinder Diffracti〇n Grating) 2; three beamsplitters (Be(10)
Splitter ) 3-：l、3-2 ' 3-3 ; —個透鏡組（Lens) 5 ; —光 電二極體陣列6，通常為光電二極體陣列（ph〇t〇di〇de Array );以及兩個位置感測器（2D psD) 4 —卜4 —2，通常 為雷射四像儀，或者光檢測器（卯）、電荷耦合器件（CCD) 任意一種。 其中，將反射式圓柱形光柵2架設在欲校正之待測 1249609 旋轉盤7外徑上’將光源卜三個分光鏡3-1、3·—2、3 — 3、Splitter ) 3-:l, 3-2 ' 3-3 ; a lens group (Lens) 5 ; - photodiode array 6, usually a photodiode array (ph〇t〇di〇de Array); And two position sensors (2D psD) 4 - Bu 4 - 2, usually a laser four-imager, or either a photodetector (卯) or a charge coupled device (CCD). Wherein, the reflective cylindrical grating 2 is mounted on the outer diameter of the 1249609 rotating disk 7 to be corrected, and the light source is divided into three beamsplitters 3-1, 3·-2, 3-3,
-個透鏡組5、-光電二極體陣列6與兩個位置感測器 4-卜4-2固定在待測旋轉盤7外圍之特定位置處。光源j 垂直入射至反射式圓柱形光栅2後産生繞射光，正負一階 繞射光分別㈣—分純3-1與第二分光鏡3 —2分光，兩 道穿透光束分別垂直入射至兩個位置感測器4-1、4-2， 而兩道反射光束經過同—第三分光鏡3-3會合後產生干 涉現象，此干涉現象產生的干涉光束經由—透鏡組5放大 後，干涉條紋由一光電二極體陣列6接收。如此，除了可 由光電二極體陣列6接收干涉條紋變化量，量測待測旋轉 盤7的角定位外，還可利用位置感測器4_丨、4一2接收光 點位置變化，同時量測旋轉盤之兩徑向軸誤差及兩角度偏 擺誤差，組成的一種角定位五自由度量測裝置。 本發明需使用各項光學組件，現就各項組件加以說A lens group 5, a photodiode array 6, and two position sensors 4-b 4-2 are fixed at specific positions on the periphery of the rotating disk 7 to be tested. The light source j is incident perpendicularly to the reflective cylindrical grating 2 to generate diffracted light, and the positive and negative first-order diffracted light respectively (four)-divided pure 3-1 and the second dichroic mirror 2-3 splits, and the two penetrating beams are respectively incident perpendicularly to two The position sensors 4-1, 4-2, and the two reflected beams are combined by the same-third beam splitter 3-3 to generate an interference phenomenon, and the interference beam generated by the interference phenomenon is amplified by the lens group 5, and the interference fringes Received by a photodiode array 6. In this way, in addition to receiving the amount of interference fringe change by the photodiode array 6, measuring the angular position of the rotating disk 7 to be tested, the position sensor 4_丨, 4-2 can also be used to receive the position change of the spot, and the amount An angular positioning five-free measuring device is constructed by measuring two radial axis errors of the rotating disk and two angle yaw errors. The invention requires the use of various optical components, and now the components are said
明： 1、 光源1 (雷射二極體Laser Diode):主要為雷射二極 體，其與一般的雷射一樣，其光波具有高度的指向性 與同调性，但疋部具有更小的體積與更大的效率。 2、 反射式圓柱形光栅2 (Diffraction Gratlng) ··光柵有 穿透式、反射式兩種，主要功能是讓光源經過光栅產生 繞射現象，當雷射光入射光柵後產生繞射光，繞射階數 與光栅常數、入射光波長及入射方向有關。 10 1249609 、分光鏡 3-；l、3-2、3-3 (Beam SpHtter):光源入射 時，會產生穿透光及反射光，其光強度可在製造時分 別選擇光強度比例，本裝置在架構中作用有二··一為 將光束分光，由位置感測器接收穿透光，藉以判斷位 置受化’一為將兩道光束會合產生干涉現象。 4、 位置感測器4-1、4-2 ( PSD):藉由不同位置上光點， 感應的不同電壓’得知位置。 5、 透鏡組5 (Lens):由多個透鏡組合而成，藉此調整干 涉條紋大小，使其與光電二極體陣列6上光電二極體 單元的幾何形狀相配合。 6、 光電二極體陣列6(Ph〇t〇d1〇de Array) ··光電二極體 陣列由數個光電二極體單元組成，光電二極體是操作 在逆向偏壓之一極體，當光照射在此二極體受光區合 產生電子-電洞對，在外電路上產生電流。 另對文内部份名詞作一解釋如後·· 卜繞射（diffraction):當光波前進時，遇到大小與本 身波長相近的障礙物或狹縫時，其傳播的波形會產生 變化，而與原來的波形不同，此現象稱為繞射。 2、一般旋轉軸旋轉軸誤差源可分成六個，如圖一所示。 一般旋轉軸誤差定義爲三個位置誤差（〜⑻、'⑻、 心⑼），兩個角度偏擺誤差〜⑻、心⑼及一個角度定位 1249609 誤差5⑻旋轉軸的6個自由度誤差： 干〜（interference )·頻率相同的兩波沿同方向進疒 且保持相位差不隨時間改變時，則此兩波重疊時其能 I不均勻地分佈於空間，而在某些位置有極大值及極 小值的現象稱為干涉。 【圖式簡單說明】 。月參閱以下有關本發明一較佳實施例之詳細說明及其Ming: 1. Light source 1 (Laser Diode): mainly laser diode, which is the same as general laser, its light wave has high directivity and homology, but the crotch has smaller Volume and greater efficiency. 2, reflective cylindrical grating 2 (Diffraction Gratlng) · · Grating has two types of transmission, reflection, the main function is to let the light source through the grating to produce diffraction phenomenon, when the laser light is incident on the grating to produce diffracted light, diffraction order The number is related to the grating constant, the incident light wavelength, and the incident direction. 10 1249609, Beamsplitter 3-; 1, 3, 3-3 (Beam SpHtter): When the light source is incident, it will produce transmitted light and reflected light, and its light intensity can be selected separately at the time of manufacture. In the architecture, there is a role of two. One is to split the beam, and the position sensor receives the penetrating light, so as to judge the positionalization 'one is to combine the two beams to produce interference phenomenon. 4. Position sensors 4-1, 4-2 (PSD): The position is known by the different voltages sensed by the light spots at different positions. 5. Lens group 5 (Lens): a combination of a plurality of lenses, thereby adjusting the interference fringe size to match the geometry of the photodiode unit on the photodiode array 6. 6. Photodiode array 6 (Ph〇t〇d1〇de Array) · The photodiode array is composed of several photodiode units, and the photodiode is operated in a reverse biased one pole body. When the light is irradiated on the polarized region of the diode to generate an electron-hole pair, a current is generated on the external circuit. Another explanation for the internal nouns of the text is as follows: Diffraction: When the light wave advances, when it encounters an obstacle or a slit whose size is close to its own wavelength, the waveform of its propagation changes. Unlike the original waveform, this phenomenon is called diffraction. 2, the general rotary axis rotation axis error source can be divided into six, as shown in Figure 1. The general rotation axis error is defined as three position errors (~(8), '(8), heart (9)), two angle yaw errors ~(8), heart (9) and one angle position 1249609 error 5 (8) 6 degrees of freedom error of the rotation axis: dry ~ (interference) · When two waves of the same frequency enter in the same direction and keep the phase difference from changing with time, the energy I is unevenly distributed in the space when the two waves overlap, and there are maxima and minimum in some positions. The phenomenon of values is called interference. [Simple description of the diagram]. Please refer to the following detailed description of a preferred embodiment of the present invention and
寸圖將可進-步瞭解本發明之技術内容及其目的功效；有 關該實施例之附圖為： 圖一為一般旋轉軸的旋轉軸誤差示意圖；以及 圖二為本發明之五自由度角定位量測系統示意圖 【主要元件符號說明】 1光源 2反射式圓柱形光柵 3 -1第一分光鏡 3-2第二分光鏡 3-3第三分光鏡 1 ’ 4-2位置感測器 5透鏡組 6光電二極體陣列 7待測旋轉盤 12The figure will further understand the technical content of the present invention and the purpose of the present invention; the drawings relating to the embodiment are: FIG. 1 is a schematic diagram of the rotation axis error of a general rotating shaft; and FIG. 2 is a five-degree-of-freedom angle of the present invention. Schematic diagram of positioning measurement system [Main component symbol description] 1 light source 2 reflective cylindrical grating 3 -1 first beam splitter 3-2 second beam splitter 3-3 third beam splitter 1 ' 4-2 position sensor 5 Lens group 6 photodiode array 7 to be tested rotating disk 12