TW200746232A - Substrate measuring instrument - Google Patents

Substrate measuring instrument

Info

Publication number
TW200746232A
TW200746232A TW095133294A TW95133294A TW200746232A TW 200746232 A TW200746232 A TW 200746232A TW 095133294 A TW095133294 A TW 095133294A TW 95133294 A TW95133294 A TW 95133294A TW 200746232 A TW200746232 A TW 200746232A
Authority
TW
Taiwan
Prior art keywords
substrate
measuring instrument
objective lens
stage
incident pupil
Prior art date
Application number
TW095133294A
Other languages
English (en)
Inventor
Nariaki Fujiwara
Keiji Hatano
Original Assignee
Dainippon Screen Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Mfg filed Critical Dainippon Screen Mfg
Publication of TW200746232A publication Critical patent/TW200746232A/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/255—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures for measuring radius of curvature
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW095133294A 2005-11-07 2006-09-08 Substrate measuring instrument TW200746232A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005321764A JP2007127566A (ja) 2005-11-07 2005-11-07 基板測定装置

Publications (1)

Publication Number Publication Date
TW200746232A true TW200746232A (en) 2007-12-16

Family

ID=38150339

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095133294A TW200746232A (en) 2005-11-07 2006-09-08 Substrate measuring instrument

Country Status (3)

Country Link
JP (1) JP2007127566A (zh)
KR (1) KR20070049061A (zh)
TW (1) TW200746232A (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5459944B2 (ja) * 2006-11-13 2014-04-02 大日本スクリーン製造株式会社 表面形状測定装置および応力測定装置、並びに、表面形状測定方法および応力測定方法
KR102491575B1 (ko) 2017-09-28 2023-01-25 삼성전자주식회사 반도체 기판을 검사하는 방법 및 이를 이용하여 반도체 소자를 제조 하는 방법
CN114858053B (zh) * 2021-01-20 2023-03-10 四川大学 一种确定工业相机的入瞳中心空间坐标的方法

Also Published As

Publication number Publication date
JP2007127566A (ja) 2007-05-24
KR20070049061A (ko) 2007-05-10

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