TW200719083A - Radiation sensitive composition for forming a colored layer and color filter - Google Patents
Radiation sensitive composition for forming a colored layer and color filterInfo
- Publication number
- TW200719083A TW200719083A TW095121640A TW95121640A TW200719083A TW 200719083 A TW200719083 A TW 200719083A TW 095121640 A TW095121640 A TW 095121640A TW 95121640 A TW95121640 A TW 95121640A TW 200719083 A TW200719083 A TW 200719083A
- Authority
- TW
- Taiwan
- Prior art keywords
- radiation sensitive
- sensitive composition
- colored layer
- forming
- color filter
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optical Filters (AREA)
- Materials For Photolithography (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Paints Or Removers (AREA)
Abstract
A radiation sensitive composition comprising a colorant, an alkali-soluble resin, a polyfunctional monomer, a photopolymerization initiator and a solvent, wherein the solvent contains 5 to 40 wt% of dipropylene glycol dimethyl ether and the composition is used to form a colored layer. A dried product of this radiation sensitive composition which is produced in a slit nozzle has high solvent re-solubility and the composition does not produce a bumping hole.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005175968A JP4661384B2 (en) | 2005-06-16 | 2005-06-16 | Radiation-sensitive composition for forming colored layer and color filter |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200719083A true TW200719083A (en) | 2007-05-16 |
TWI395055B TWI395055B (en) | 2013-05-01 |
Family
ID=37519324
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095121640A TWI395055B (en) | 2005-06-16 | 2006-06-16 | Radiation sensitive composition, method of forming a color filter using said composition, color filter and color liquid crystal display panel |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP4661384B2 (en) |
KR (1) | KR100900389B1 (en) |
CN (1) | CN1881081B (en) |
SG (1) | SG128605A1 (en) |
TW (1) | TWI395055B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI397768B (en) * | 2008-02-13 | 2013-06-01 | Fujifilm Corp | Colored photosensitive composition, color filter and method of producing thereof |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4656025B2 (en) * | 2006-08-31 | 2011-03-23 | Jsr株式会社 | Radiation-sensitive composition for forming colored layer and color filter |
JP4403174B2 (en) * | 2006-12-25 | 2010-01-20 | Azエレクトロニックマテリアルズ株式会社 | Pattern forming method and photosensitive resin composition used therefor |
JP5135820B2 (en) * | 2007-02-20 | 2013-02-06 | Jsr株式会社 | Alkali-soluble polymer, radiation-sensitive composition for forming colored layer, color filter, and liquid crystal display device |
CN101617001B (en) * | 2007-03-09 | 2012-07-25 | 株式会社东进世美肯 | Black paste composition having conductive property, filter for shielding electromagnetic interference and display device comprising the same |
JP4949107B2 (en) * | 2007-03-29 | 2012-06-06 | 富士フイルム株式会社 | Colored curable resin composition, colored pattern forming method, colored pattern, method for producing color filter, color filter, and liquid crystal display element |
JP4959411B2 (en) | 2007-04-27 | 2012-06-20 | 富士フイルム株式会社 | Colored photopolymerizable composition, color filter using the same, and method for producing color filter |
JP5144971B2 (en) * | 2007-06-14 | 2013-02-13 | 株式会社Dnpファインケミカル | Photosensitive resin composition |
JP5157522B2 (en) * | 2008-02-28 | 2013-03-06 | Jsr株式会社 | Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element |
JP5448352B2 (en) * | 2008-03-10 | 2014-03-19 | 富士フイルム株式会社 | Colored curable composition, color filter, and solid-state imaging device |
JP5020142B2 (en) * | 2008-03-26 | 2012-09-05 | 凸版印刷株式会社 | Color resist composition and color filter using the composition |
CN104536263B (en) | 2008-09-26 | 2019-06-21 | 株式会社Lg化学 | Photosensitive resin composition for black matrix |
KR20110083023A (en) * | 2010-01-13 | 2011-07-20 | 주식회사 엘지화학 | Binder resin and ink composition comprising the same for roll printing |
JP5502038B2 (en) * | 2010-08-12 | 2014-05-28 | エルジー ケム. エルティーディ. | Thermosetting protective film resin composition |
US8962741B2 (en) | 2010-08-12 | 2015-02-24 | Lg Chem, Ltd. | Thermally curable resin composition for protective film |
JP6175754B2 (en) * | 2011-11-07 | 2017-08-09 | 住友化学株式会社 | Curable resin composition |
JP2013195973A (en) * | 2012-03-22 | 2013-09-30 | Mitsubishi Chemicals Corp | Coloring resin composition, color filter, liquid crystal display device, and organic el display device |
CN104497204B (en) * | 2014-11-18 | 2017-12-19 | 惠晶显示科技(苏州)有限公司 | A kind of alkali soluble resins and the UV solidification hydrofluoric acid resistant protection glue compositions containing alkali soluble resins |
JP6460836B2 (en) * | 2015-02-26 | 2019-01-30 | 東京応化工業株式会社 | Non-rotating coating composition and resin composition film forming method |
KR102475604B1 (en) | 2016-08-25 | 2022-12-08 | 동우 화인켐 주식회사 | Colored photosensitive resin composition, color filter and image display device produced using the same |
CN109843452A (en) * | 2016-10-21 | 2019-06-04 | Jsr株式会社 | The forming method of cured film, radiation resin combination, the display element and sensor for having cured film |
CN110358010B (en) * | 2019-07-16 | 2021-11-23 | 儒芯微电子材料(上海)有限公司 | Alkali soluble polymer resin and preparation method and application thereof |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05113664A (en) * | 1991-10-21 | 1993-05-07 | Nippon Kayaku Co Ltd | Material for color filter and hardened body thereof |
JPH0836262A (en) * | 1994-07-25 | 1996-02-06 | Mitsubishi Chem Corp | Radiation sensitive composition |
JPH0915844A (en) * | 1995-06-29 | 1997-01-17 | Hitachi Chem Co Ltd | Colored image forming photosensitive solution, manufacture of color filter using it, and color filter |
JPH1010724A (en) * | 1996-06-27 | 1998-01-16 | Hitachi Chem Co Ltd | Color image forming photosensitive liquid, production of color filter using that, and color filter |
JP4116342B2 (en) * | 2001-08-29 | 2008-07-09 | 関西ペイント株式会社 | Positive photosensitive coating composition, method for producing positive photosensitive resin, and pattern forming method |
DE10237576A1 (en) * | 2002-08-16 | 2004-02-26 | Bayer Ag | Aqueous binder dispersions as coating agents |
JP2004191472A (en) * | 2002-12-09 | 2004-07-08 | Konica Minolta Holdings Inc | Photosensitive composition and photosensitive lithographic printing plate |
JP2004225829A (en) * | 2003-01-24 | 2004-08-12 | Nok Corp | Method of manufacturing torsional damper |
JP4627617B2 (en) * | 2003-05-23 | 2011-02-09 | 東洋インキ製造株式会社 | Coloring composition, method for producing color filter, and method for producing black matrix substrate |
KR100560281B1 (en) * | 2003-11-27 | 2006-03-10 | 가부시키가이샤 씽크. 라보라토리 | Positive-type photosensitive composition |
-
2005
- 2005-06-16 JP JP2005175968A patent/JP4661384B2/en active Active
-
2006
- 2006-06-14 SG SG200604040A patent/SG128605A1/en unknown
- 2006-06-15 KR KR1020060053818A patent/KR100900389B1/en active IP Right Grant
- 2006-06-16 TW TW095121640A patent/TWI395055B/en active
- 2006-06-16 CN CN2006101060378A patent/CN1881081B/en active Active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI397768B (en) * | 2008-02-13 | 2013-06-01 | Fujifilm Corp | Colored photosensitive composition, color filter and method of producing thereof |
Also Published As
Publication number | Publication date |
---|---|
JP4661384B2 (en) | 2011-03-30 |
KR100900389B1 (en) | 2009-06-02 |
TWI395055B (en) | 2013-05-01 |
JP2006349981A (en) | 2006-12-28 |
CN1881081B (en) | 2012-07-18 |
CN1881081A (en) | 2006-12-20 |
KR20060131669A (en) | 2006-12-20 |
SG128605A1 (en) | 2007-01-30 |
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