TW200719083A - Radiation sensitive composition for forming a colored layer and color filter - Google Patents

Radiation sensitive composition for forming a colored layer and color filter

Info

Publication number
TW200719083A
TW200719083A TW095121640A TW95121640A TW200719083A TW 200719083 A TW200719083 A TW 200719083A TW 095121640 A TW095121640 A TW 095121640A TW 95121640 A TW95121640 A TW 95121640A TW 200719083 A TW200719083 A TW 200719083A
Authority
TW
Taiwan
Prior art keywords
radiation sensitive
sensitive composition
colored layer
forming
color filter
Prior art date
Application number
TW095121640A
Other languages
English (en)
Other versions
TWI395055B (zh
Inventor
Tatsuya Hattori
Tatsuyoshi Kawamoto
Masashi Arai
Kazuhiro Kobayashi
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW200719083A publication Critical patent/TW200719083A/zh
Application granted granted Critical
Publication of TWI395055B publication Critical patent/TWI395055B/zh

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0048Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Paints Or Removers (AREA)
TW095121640A 2005-06-16 2006-06-16 輻射敏感性組成物,使用該組成物形成濾色片之方法,濾色片及彩色液晶顯示板 TWI395055B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005175968A JP4661384B2 (ja) 2005-06-16 2005-06-16 着色層形成用感放射線性組成物およびカラーフィルタ

Publications (2)

Publication Number Publication Date
TW200719083A true TW200719083A (en) 2007-05-16
TWI395055B TWI395055B (zh) 2013-05-01

Family

ID=37519324

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095121640A TWI395055B (zh) 2005-06-16 2006-06-16 輻射敏感性組成物,使用該組成物形成濾色片之方法,濾色片及彩色液晶顯示板

Country Status (5)

Country Link
JP (1) JP4661384B2 (zh)
KR (1) KR100900389B1 (zh)
CN (1) CN1881081B (zh)
SG (1) SG128605A1 (zh)
TW (1) TWI395055B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI397768B (zh) * 2008-02-13 2013-06-01 Fujifilm Corp 感光性著色組成物、與彩色濾光片及其製法

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JP4656025B2 (ja) * 2006-08-31 2011-03-23 Jsr株式会社 着色層形成用感放射線性組成物およびカラーフィルタ
JP4403174B2 (ja) * 2006-12-25 2010-01-20 Azエレクトロニックマテリアルズ株式会社 パターン形成方法およびそれに用いる感光性樹脂組成物
JP5135820B2 (ja) * 2007-02-20 2013-02-06 Jsr株式会社 アルカリ可溶性重合体、着色層形成用感放射線性組成物、カラーフィルタおよび液晶表示素子
CN101617001B (zh) * 2007-03-09 2012-07-25 株式会社东进世美肯 具有导电性质的黑色膏状组合物、包含该组合物的屏蔽电磁干扰的滤光片和显示器件
JP4949107B2 (ja) * 2007-03-29 2012-06-06 富士フイルム株式会社 着色硬化性樹脂組成物、着色パターン形成方法、着色パターン、カラーフィルタの製造方法、カラーフィルタ、及び液晶表示素子
JP4959411B2 (ja) 2007-04-27 2012-06-20 富士フイルム株式会社 着色光重合性組成物並びにそれを用いたカラーフィルタ及びカラーフィルタの製造方法
JP5144971B2 (ja) * 2007-06-14 2013-02-13 株式会社Dnpファインケミカル 感光性樹脂組成物
JP5157522B2 (ja) * 2008-02-28 2013-03-06 Jsr株式会社 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子
JP5448352B2 (ja) * 2008-03-10 2014-03-19 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ、及び、固体撮像素子
JP5020142B2 (ja) * 2008-03-26 2012-09-05 凸版印刷株式会社 カラーレジスト組成物及び該組成物を用いたカラーフィルタ
CN104536263B (zh) 2008-09-26 2019-06-21 株式会社Lg化学 用于黑矩阵的光敏树脂组合物
KR20110083023A (ko) * 2010-01-13 2011-07-20 주식회사 엘지화학 바인더 수지 및 이를 포함하는 롤 프린트용 잉크 조성물
JP5502038B2 (ja) * 2010-08-12 2014-05-28 エルジー ケム. エルティーディ. 熱硬化性保護膜樹脂組成物
US8962741B2 (en) 2010-08-12 2015-02-24 Lg Chem, Ltd. Thermally curable resin composition for protective film
JP6175754B2 (ja) * 2011-11-07 2017-08-09 住友化学株式会社 硬化性樹脂組成物
JP2013195973A (ja) * 2012-03-22 2013-09-30 Mitsubishi Chemicals Corp 着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機el表示装置
CN104497204B (zh) * 2014-11-18 2017-12-19 惠晶显示科技(苏州)有限公司 一种碱溶性树脂及含碱溶性树脂的uv固化耐氢氟酸保护胶组合物
JP6460836B2 (ja) * 2015-02-26 2019-01-30 東京応化工業株式会社 非回転式塗布用組成物及び樹脂組成物膜形成方法
KR102475604B1 (ko) 2016-08-25 2022-12-08 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치
CN109843452A (zh) * 2016-10-21 2019-06-04 Jsr株式会社 硬化膜的形成方法、感放射线树脂组合物、具备硬化膜的显示元件及传感器
CN110358010B (zh) * 2019-07-16 2021-11-23 儒芯微电子材料(上海)有限公司 一种碱溶性聚合物树脂及其制备方法与应用

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JPH0836262A (ja) * 1994-07-25 1996-02-06 Mitsubishi Chem Corp 感放射線性組成物
JPH0915844A (ja) * 1995-06-29 1997-01-17 Hitachi Chem Co Ltd 着色画像形成用感光液、これを用いたカラーフィルタの製造法及びカラーフィルタ
JPH1010724A (ja) * 1996-06-27 1998-01-16 Hitachi Chem Co Ltd 着色画像形成用感光液、これを用いたカラーフィルタの製造法及びカラーフィルタ
JP4116342B2 (ja) * 2001-08-29 2008-07-09 関西ペイント株式会社 ポジ型感光性塗料組成物、ポジ型感光性樹脂の製造方法及びパターン形成方法
DE10237576A1 (de) * 2002-08-16 2004-02-26 Bayer Ag Wässrige Bindemittel-Dispersionen als Überzugsmittel
JP2004191472A (ja) * 2002-12-09 2004-07-08 Konica Minolta Holdings Inc 感光性組成物および感光性平版印刷版
JP2004225829A (ja) * 2003-01-24 2004-08-12 Nok Corp トーショナルダンパの製造方法
JP4627617B2 (ja) * 2003-05-23 2011-02-09 東洋インキ製造株式会社 着色組成物、カラーフィルタの製造方法およびブラックマトリックス基板の製造方法
KR100560281B1 (ko) * 2003-11-27 2006-03-10 가부시키가이샤 씽크. 라보라토리 포지티브형 감광성 조성물

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI397768B (zh) * 2008-02-13 2013-06-01 Fujifilm Corp 感光性著色組成物、與彩色濾光片及其製法

Also Published As

Publication number Publication date
JP4661384B2 (ja) 2011-03-30
KR100900389B1 (ko) 2009-06-02
TWI395055B (zh) 2013-05-01
JP2006349981A (ja) 2006-12-28
CN1881081B (zh) 2012-07-18
CN1881081A (zh) 2006-12-20
KR20060131669A (ko) 2006-12-20
SG128605A1 (en) 2007-01-30

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