TW200632541A - Mask for film-forming and mask assembling jig - Google Patents

Mask for film-forming and mask assembling jig

Info

Publication number
TW200632541A
TW200632541A TW094145208A TW94145208A TW200632541A TW 200632541 A TW200632541 A TW 200632541A TW 094145208 A TW094145208 A TW 094145208A TW 94145208 A TW94145208 A TW 94145208A TW 200632541 A TW200632541 A TW 200632541A
Authority
TW
Taiwan
Prior art keywords
mask
film
forming
cover member
mask body
Prior art date
Application number
TW094145208A
Other languages
Chinese (zh)
Other versions
TWI298819B (en
Inventor
Akira Ohba
Youichi Yoshidome
Tsuyoshi Shibamoto
Yasuteru Ueda
Original Assignee
Ulvac Singapore Pte Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Singapore Pte Ltd filed Critical Ulvac Singapore Pte Ltd
Publication of TW200632541A publication Critical patent/TW200632541A/en
Application granted granted Critical
Publication of TWI298819B publication Critical patent/TWI298819B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/34—Masking

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physical Vapour Deposition (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Details Or Accessories Of Spraying Plant Or Apparatus (AREA)

Abstract

This invention provides a mask for film-forming and mask assembling jig, whereby the deposition film of the mask can be washed and removed without causing damage to mask base member, and which is also superior in washing operating efficiency. In the present invention, the mask for film-forming (11) comprises a mask body (2) where an opening (20) is disposed to be opposite to film-forming surface of a substrate (W) so as to restrain film-forming area is formed, and a cover member (3) for covering predetermined area of appearance of the mask body (2), wherein the cover member (3) is comprised of aggregate of plural cover division sheets (3A~3C) installed detachably with respect to the mask body (2).An adherence of the deposition film to the mask body (2) can be restrained and a damage of the mask base member while cleaning mask can be prevented by using the cover member (3) covering the predetermined area of the surface of the mask body (2). A removal of deposition film adhered on the cover member (3) is performed in the condition that the cover member (3) being separated to individual cover division sheet (3A~3C), such that cleaning operation can be simplified and the mask can easily adapt to large-size.
TW094145208A 2004-12-21 2005-12-20 Mask for film-forming and mask assembling jig TWI298819B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2004/019098 WO2006067836A1 (en) 2004-12-21 2004-12-21 Film forming mask and mask assembly jig

Publications (2)

Publication Number Publication Date
TW200632541A true TW200632541A (en) 2006-09-16
TWI298819B TWI298819B (en) 2008-07-11

Family

ID=36601449

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094145208A TWI298819B (en) 2004-12-21 2005-12-20 Mask for film-forming and mask assembling jig

Country Status (4)

Country Link
JP (1) JP4761569B2 (en)
KR (1) KR101082866B1 (en)
TW (1) TWI298819B (en)
WO (1) WO2006067836A1 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI561652B (en) * 2012-01-12 2016-12-11 Dainippon Printing Co Ltd
US10160000B2 (en) 2012-01-12 2018-12-25 Dai Nippon Printing Co., Ltd. Vapor deposition mask with metal plate
TWI714128B (en) * 2018-06-20 2020-12-21 日商愛發科股份有限公司 Adhesion preventing member and vacuum processing device
CN114540770A (en) * 2022-02-10 2022-05-27 深圳市华星光电半导体显示技术有限公司 Evaporation plating system

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103238374B (en) * 2010-12-27 2015-06-24 夏普株式会社 Vapor deposition apparatus, vapor deposition method, and organic electroluminescence (EL) display apparatus
KR101226478B1 (en) * 2011-02-01 2013-01-25 (주)이루자 Sputtering mask and sputtering apparatus using the same
GB2488568B (en) 2011-03-02 2014-01-01 Rolls Royce Plc A method and apparatus for masking a portion of a component
JP2011168894A (en) * 2011-04-20 2011-09-01 Ulvac Singapore Pte Ltd Mask for film-deposition and method for cleaning the same
JP5736513B2 (en) * 2011-08-25 2015-06-17 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ Edge exclusion mask shielding protection
WO2013151786A1 (en) * 2012-04-05 2013-10-10 Applied Materials, Inc. Flip edge shadow frame
KR102269136B1 (en) 2014-11-24 2021-06-25 삼성디스플레이 주식회사 Mask for deposition and the fabrication method thereof
CN109324472A (en) * 2018-11-16 2019-02-12 浙江大学昆山创新中心 A kind of mask plate guard method
KR102458281B1 (en) 2018-12-27 2022-10-24 가부시키가이샤 아루박 Anti-stick member and vacuum processing device

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3909608B2 (en) * 1994-09-30 2007-04-25 株式会社アルバック Vacuum processing equipment
JPH1060624A (en) * 1996-08-20 1998-03-03 Matsushita Electric Ind Co Ltd Sputtering device
JP4096567B2 (en) * 2001-01-31 2008-06-04 東レ株式会社 Integrated mask, method for manufacturing organic EL element using integrated mask, and manufacturing apparatus therefor
JP2003332057A (en) * 2002-05-16 2003-11-21 Dainippon Printing Co Ltd Multiple-surfaced mask device for vacuum deposition used in manufacturing organic el element
JP2004300495A (en) * 2003-03-31 2004-10-28 Nippon Seiki Co Ltd Evaporation mask and evaporation method using the same
JP4071670B2 (en) * 2003-04-17 2008-04-02 信越化学工業株式会社 Method for producing single-domain lithium tantalate crystals

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI561652B (en) * 2012-01-12 2016-12-11 Dainippon Printing Co Ltd
US9548453B2 (en) 2012-01-12 2017-01-17 Dai Nippon Printing Co., Ltd. Multiple-surface imposition vapor deposition mask
US10160000B2 (en) 2012-01-12 2018-12-25 Dai Nippon Printing Co., Ltd. Vapor deposition mask with metal plate
US10189042B2 (en) 2012-01-12 2019-01-29 Dai Nippon Printing Co., Ltd. Vapor deposition mask with metal plate
US10391511B2 (en) 2012-01-12 2019-08-27 Dai Nippon Printing Co., Ltd. Vapor deposition mask with metal plate
US10894267B2 (en) 2012-01-12 2021-01-19 Dai Nippon Printing Co., Ltd. Vapor deposition mask with metal plate
US11511301B2 (en) 2012-01-12 2022-11-29 Dai Nippon Printing Co., Ltd. Vapor deposition mask with metal plate
TWI714128B (en) * 2018-06-20 2020-12-21 日商愛發科股份有限公司 Adhesion preventing member and vacuum processing device
CN114540770A (en) * 2022-02-10 2022-05-27 深圳市华星光电半导体显示技术有限公司 Evaporation plating system

Also Published As

Publication number Publication date
KR101082866B1 (en) 2011-11-11
JP4761569B2 (en) 2011-08-31
KR20070085424A (en) 2007-08-27
JPWO2006067836A1 (en) 2008-06-12
WO2006067836A1 (en) 2006-06-29
TWI298819B (en) 2008-07-11

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees