TW200535993A - Adjusting apparatus and method for tip end of slit nozzle - Google Patents

Adjusting apparatus and method for tip end of slit nozzle Download PDF

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Publication number
TW200535993A
TW200535993A TW094109478A TW94109478A TW200535993A TW 200535993 A TW200535993 A TW 200535993A TW 094109478 A TW094109478 A TW 094109478A TW 94109478 A TW94109478 A TW 94109478A TW 200535993 A TW200535993 A TW 200535993A
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Taiwan
Prior art keywords
nozzle
section
cleaning
slotted nozzle
liquid
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TW094109478A
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Chinese (zh)
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TWI364063B (en
Inventor
Futoshi Shimai
Shigeru Kawata
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Tokyo Ohka Kogyo Co Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/02Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops, or having an outlet of particular shape
    • B05B1/04Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops, or having an outlet of particular shape in flat form, e.g. fan-like, sheet-like
    • B05B1/044Slits, i.e. narrow openings defined by two straight and parallel lips; Elongated outlets for producing very wide discharges, e.g. fluid curtains
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/6715Apparatus for applying a liquid, a resin, an ink or the like

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Coating Apparatus (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

To provide a device for adjusting a compact slit nozzle without causing washing nonuniformity of the slit nozzle and also being able to save a washing liquid, and a method for adjusting the slit nozzle using the device for adjusting. The device for adjusting the tip end of the slit nozzle opened with the discharge port of a coating liquid having a predetermined width comprises an immersion type washing part for washing the slit nozzle, a drying part for drying the nozzle after washing and a pre-dispense part for preparing the discharge port of the slit nozzle, and is mounted on the same apparatus. The immersion type washing part also serves as a drying prevention part which holds the tip end of the slit nozzle in immersed state when the slit nozzle is not used for a prescribed time or longer.

Description

200535993 (1) 九、發明說明 【發明所屬之技術領域】 本發明係有關一種調整開縫式噴嘴前端的調整裝置及 調整方法。 【先前技術】 以往,雖然在半導體晶圓或玻璃基板等的板狀被處理 Φ 物表面塗佈抗蝕劑液等,從噴嘴滴下塗佈液於載置在旋轉 頭上的被處理物的中心部,以藉由旋轉頭旋轉被處理物所 產生的離心力,使塗佈液朝向外側擴散,但在該方法中, 殘留在被處理物表面的塗佈液僅些微,由於大部分飛散而 去,故相當浪費。因此,考慮對噴嘴本身開口特定寬度的 塗佈液體吐出口,並藉著移動噴嘴對被處理物表面以特定 寬度塗佈塗佈液體,以取代旋轉頭塗佈。 若使用具有上述特定寬度的塗佈液體吐出口之縫隙噴 Φ 嘴,使塗佈液的浪費消失,且可進行有效率的塗佈,但成 爲寬度寬的部分,在噴嘴前端的周邊部塗佈液的回入量亦 多,這是乾燥時成爲異物產生的主因。因此,必須藉由塗 佈後的洗淨,除去噴嘴前端及其周邊部的塗佈液。 因此,作爲洗淨開口有特定寬度的塗佈液吐出口之開 縫式噴嘴的裝置,設有噴嘴接受台,該噴嘴接受台以略等 於開縫式噴嘴的寬度形成洗淨部,在該洗淨部開口形成與 洗淨部供給源連繫的縫隙以及與吸引裝置連繫的排氣孔, 以從縫隙供給的洗淨液,溶解附著在噴嘴前端及其周邊部 -4- 200535993 (2) 的塗佈液以及其之乾燥物等,並且從排氣孔排出已溶解塗 佈液的成分之洗淨液的洗淨裝置。(專利文獻1之第2頁 至第3頁、第3圖) 又,倂設開縫式噴嘴的洗淨部與洗淨液的滯留部,在 洗淨部載置開縫式噴嘴的狀態下,形成實質上的密閉空間 ,又,使氣體供給管與洗淨液供給管面臨洗淨部的長邊方 向的一端側,另一端側面臨氣體排氣管,藉著從氣體排氣 φ 管排出從氣體供給管所供給的氣體,在洗淨部內形成氣體 的流動,藉著該氣體的流動,使來自洗淨液供給管的洗淨 液普及開縫式噴嘴的表面,以洗淨開縫式噴嘴。(專利文 獻2之第2頁至第3頁、第1圖) 再者,在載置開縫式噴嘴的狀態下,在形成實質的密 閉空間之洗淨部內,以與開縫式噴嘴相對向的方式,沿著 長邊方向多數形成洗淨液的吐出口,並且對於使各開縫式 噴嘴的洗淨液體的噴出方向與開縫式噴嘴相對的垂直方向 φ ,具有角度(65°至75M的噴嘴洗淨裝置。(專利文獻3 的第3頁至第4頁,第2圖) [專利文獻1]日本專利第3 3 8 1 2 1 6號公報 [專利文獻2 ]日本特開平1 〇 - 3 0 8 3 3 8號公報 [專利文獻3]日本特開2000-288488號公報 【發明內容】 [發明所欲解決之課題] 然而,上述日本專利第3 3 8 1 2 1 6號公報、日本特開平 200535993 (3) 10-308338號公報、以及日本特開2000-288488號公報所 揭示的噴嘴洗淨裝置,全部是一邊對噴嘴的前端供給洗淨 液一邊清洗。在上述的場合中,具有噴嘴的前端無法均勻 洗淨,同時有需要大量洗淨液的問題。 又’上述的噴嘴洗淨裝置之洗淨結束的噴嘴,由於是 以設置在其他場所的乾燥部乾燥,因此在裝置全體的小型 化有問題。 φ 除了以洗淨液體洗淨的形式之外,亦考慮在洗淨液中 浸漬噴嘴前端的形式。但是,爲浸漬式時,在浸漬時從開 縫式噴嘴的開口部浸入洗淨液,使塗佈液變薄,最初在擴 張液滴時不均勻。 本發明係有鑑於上述問題而硏創者,目的在於提供一 種在開縫式噴嘴前端不會引起洗淨不均,且可節約洗淨液 之小型的開縫式噴嘴的調整裝置以及使用該調整裝置的開 縫式噴嘴的調整方法。 [用以解決課題之手段] 爲了解決上述課題,本申請案之發明的開縫式噴嘴的 調整裝置,係使由:使噴嘴乾燥之乾燥部、洗淨開縫式噴 嘴的浸瀆式洗淨部、及調整開縫式噴嘴的吐出口之預先分 配部所構成,並且與上述浸漬式洗淨部鄰接,設置有上述 乾燥部與上述預先分配部,且設置於相同裝置。 如此,藉著與浸漬式洗淨部鄰接,具備乾燥部與預先 分配部,由於物理性乾燥洗淨後之開縫式噴嘴的前端,縮 -6- 200535993 (4) 短塗佈開始之前的時間,因此可迅速且有效率 式噴嘴的前端。 開縫式噴嘴的浸漬式洗淨’雖然洗淨液的 洗淨效率佳,但在洗淨後噴嘴的前端很難乾燥 開始之前花費太多時間,因此本發明設置與浸 鄰接的乾燥部。 本發明在開縫式噴嘴洗淨後,馬上乾燥之 φ 行預先分配,排出噴嘴前端部的已稀釋之塗佈 開始時,均勻形成塗佈液滴。雖然不限於浸漬 的前端洗淨時,無法防止洗淨液從開口部浸入 述構成,可獲得均勻的塗佈液滴。 又,上述浸漬式洗淨部不使用開縫式噴嘴 上時,藉著兼作浸漬保持開縫式噴嘴前端的乾 不需要另外設置乾燥防止部,因此可省空間化 而且,當供給至上述浸漬式洗淨部的洗淨 φ 量時,藉著流出至預先分配部,不會浪費洗淨 利用。 又,乾燥部是吹附氮氣以使開縫式噴嘴前 因應需要也可將其切換爲將洗淨液吹附至開縫 而予以洗淨的洗淨部。 而且,在上述預先分配部,不僅是從浸漬 流出來的洗淨液,藉由在預先分配部設置與循 的排出口與返回口,通過循環用過濾器使預先 洗淨液循環,可降低長時持有之洗淨液的使用 的調整開縫 使用量少, 時,至塗佈 漬式洗淨部 後,藉著進 液,在塗佈 式,在噴嘴 ,但藉著上 一定時間以 燥防止部, 〇 液超過一定 液,而可再 端乾燥,但 式噴嘴前端 式洗淨部溢 環路徑連繫 分配部內的 量。再者, -7- 200535993 (5) 在預先分配部設置從供給槽供給新的洗淨液之供給口。 又,藉由在上述浸漬式洗淨部開口的排出口與在預先 分配部開口的排出口的升降動作來調整液面較爲理想。 又,在浸漬式洗淨部經常少量的供給新的洗淨液,不 斷地切換洗淨液,因此浸漬式洗淨部保持一定以上的乾淨 度。在預先分配部雖洗淨觸發輥子,但是除了觸發輥子之 外,由於倂用物理性手段(例如載置台),因此與洗淨液 φ 相對不需要如浸漬式洗淨部的乾淨度。雖然預先分配必須 在對被處理物塗布處理前執行,但噴嘴的前端洗淨可在處 理複數片之後或經過一定時間之後進行。 又,在使用上述的開縫式噴嘴前端的調整裝置之開縫 式噴嘴前端的調整方法中,上述開縫式噴嘴在對被處理物 供給塗佈液之前,在預先分配部整理開縫式噴嘴前端較爲 理想。 再者,上述開縫式噴嘴在處理複數片之後或經過一定 • 時間之後,在浸漬式洗淨部洗淨開縫式噴嘴的前端,然後 在乾燥部使開縫式噴嘴的前端乾燥,最後在預先分配部整 理開縫式噴嘴的前端較爲理想。 [發明之效果] 如以上所說明,根據本發明,藉著與浸漬式洗淨部鄰 接,具有乾燥部與預先分配部,物理性乾燥洗淨後的開縫 式噴嘴前端,由於可縮短塗佈開始之前的時間,因此可迅 速且有效率的調整開縫式噴嘴的前端。 -8- 200535993 (6) 又,在開縫式噴嘴洗淨後藉著進行預先分配,排出在 噴嘴前端部的已稀釋之塗佈液,可在塗佈開始時均勻形成 塗佈液滴。 而且,浸漬式洗淨部不使用開縫式噴嘴固定時間以上 時,藉著兼作浸漬保持開縫式噴嘴前端的乾燥防止部,由 於不需要另外設置乾燥防止部,因此可省空間化。 又,當供給至浸漬式洗淨部的洗淨液超過一定量時, φ 藉著流出至相鄰接的預先分配部,不會浪費洗淨液而可再 利用。 再者,乾燥部是吹附氮氣以使開縫式噴嘴前端乾燥, 但因應需要也可將其切換爲將洗淨液吹附至開縫式噴嘴前 端而予以洗淨的洗淨部。 【實施方式】 以下,依據添附圖面,說明本發明的實施形態。在此 ’第1圖係有關本發明的開縫式噴嘴前端的調整裝置的構 成圖,第2圖係第1圖的預先分配部之配管圖,第3(a) 及(b)圖係弟2圖b-b的剖面圖,c-c的剖面圖,第4圖 係第1圖d-d的剖面圖的洗淨布的配管圖,第5 ( a )圖係 預先分配部的其他實施例,(b )係(a )的e - e剖面圖。 如第1圖所示,在開縫式噴嘴的前端之調整裝置1的 正中央配置有浸漬式洗淨部2,在該浸漬式洗淨部的底面 設置有供給洗淨液之供給口( A )及可調節洗淨液面的排 出口( B )(參照第3圖)。 -9- 200535993 (7) 又,在調整裝置1中間且接近浸漬式洗淨部2處設置 有預先分配部3。在該預先分配部的底面,設置有用來供 給新的洗淨液之供給口( C )及排出其廢液的排出口( D ) ,且設置有用來循環洗淨液的排出口( E )及使藉由循環 液用過濾器4淨化的洗淨液返回的返回口( F )(參照第 3圖),更設置有可調節洗淨液面(調整排出口的高度進 行液面調整)之排出口( G )。 (I 此外,在浸漬式洗淨部2與預先分配部3之間設置有 溢流部5,從浸漬式洗淨部2溢流而出的洗淨液流下至預 先分配部3再利用。 又,在預先分配部3中設置有觸發輥子6,更設置有 物理性清洗觸發輥子6的載置台7。 再者,在調整裝置1中且接近浸漬式洗淨部2設置有 乾燥開縫式噴嘴的乾燥部8。在該乾燥部8於其兩側設置 有乾燥氣體供給管9,於其下方設置有排氣部1 0。 φ 如第4圖所示,在浸漬式洗淨部2開口有以20cc/min 的流量經常供給新的洗淨液之供給口( A ),開口有使廢 液排出至廢液槽之排出口(B)。該排出口(B)雖具有昇 降快以調整液面的功能,但不僅液面調整,也使用在浸漬 式洗淨部2洗淨開縫式噴嘴之後,排出全部的洗淨液,及 排出浮游於液面的異物。 又,如第2圖所示,開口有在預先分配部3的底面從 未圖示的供給槽供給新的洗淨液之供給口( C )、及用來 排出預先洗分配部3內的全部洗淨液之排出口( D )。從 -10- 200535993 (8) 浸漬式洗淨部2經由溢流部5溢流而出的洗淨液流下至預 先分配部3再利用。又,在預先分配部3的底部設置有洗 淨液的循環路徑,從該循環路徑之排出口( E )排出的洗 淨液藉著通過循環液用過濾器4,過濾異物,再從返回口 (F )供給。因而,藉著洗淨液通過循環液用過濾器4, 可延長洗淨液的使用期間。再者,在預先分配部3的底面 設置有將洗淨液體排出至廢液槽的液體面調整用排出口( φ G ),該液體面調整用排出口(G)調節排出口的高度, 進行液面調整。 再者,如第1圖至第3圖所示,在預先分配部3中設 置有觸發輥子6及載置台7。該載置台7物理性洗淨附著 於觸發輥子6的塗佈液。又,液體面調整用排出口( G ) 將載置台7調整到沒入水中的程度。物理性洗淨觸發輥子 6不限於載置台7,亦可使用刷子,如氣刀般噴出強力的 液體或氣體亦可。 • 如此,在浸漬式洗淨部2洗淨開縫式噴嘴之後,在乾 燥部8從乾燥氣體供給管9吹附氮氣,使開縫式噴嘴的前 端及側面乾燥,最後在預先分配部3進行預備吐出之後塗 佈在基板上。在浸漬式洗淨部2經常以20cc/min的流量 供給新的洗淨液,超過溢流部5的洗淨液流入至預先分配 部3再使用。 第5(a)圖所示者,爲第3(a)及(b)圖的其他實 施例,循環液的返回口( F )不在預先分配部3的底面, 載置在位於更接近觸發輥子6的位置。藉由從該位置供給 -11 - 200535993 (9) 循環液,以液流的力量使附著在觸發輥子6的塗佈液落下 〇 第5圖(b)所示者,爲 (a)的e-e剖面圖,循環 液的返回口( F )的長度大致上與觸發輥子6的長度相同 〇 由於本申請案發明者擔心浸漬式洗淨裝置從噴嘴離開 的塗佈液產生再度附著之情況,而經常使洗淨液流動,因 φ 此離開的塗佈液不會再度附著。 亦即,使用開縫式噴嘴,在被處理基板上供給塗佈液 時,開始塗佈的部分不會變厚,以預先分配部3的觸發輥 子6進行預備吐出,均一化開縫式噴嘴前端。該處理塗佈 在被處理基板時一定要進行。然而,在反覆塗佈液的供給 中,在開縫式噴嘴的側面附著塗佈液,當此剝落時成爲異 物。因此,在某一定期間或對複數片供給塗佈液之後,將 開縫式噴嘴的前端浸漬在浸漬式洗淨部2,不僅洗淨開縫 φ 式噴嘴前端,也洗淨開縫式噴嘴的側面。此時,雖然擔心 來自於開縫式噴嘴的洗淨液會滲入內部,但由於供給塗佈 液至開縫式噴嘴前端附近爲止,且塗佈在基板時必須進行 預先分配,因此洗淨液不會造成影響。 在以往的開縫式噴嘴前端從吐出口噴射洗淨液而洗淨 的型式,從具有與開縫式噴嘴大致相同的長度之洗淨部開 口的複數個吐出口,難以以均勻的壓力均勻的供給洗淨液 ,導致產生洗淨不均。而且,由於洗淨液不斷地流動,因 此也需要大量洗淨液,若開縫式噴嘴變長,則洗淨部也變 -12- 200535993 (10) 長,吐出口必須變多,因此加工困難。因而,在本申請案 發明的浸漬式洗淨裝置中,在可節約洗淨液體的同時,洗 淨裝置本身也成爲小型化,也可降低成本。 此外,在浸漬式洗淨部2中,不長時間洗淨開縫式噴 嘴時,可使用浸漬式洗淨部2作爲乾燥防止部。此時,藉 著浸漬開縫式噴嘴的前端,防止開縫式噴嘴的乾燥。又, 在乾燥部8中,一般吹附氮氣,因應需要使開縫式噴嘴前 φ 端乾燥,以噴附洗淨液之方式切換使用也可。 〔產業上利用的可能性〕 本申請案發明的浸漬式洗淨裝置,由於提供縮短開始 塗佈之前的時間的小型裝置,因此在半導體製造工廠等中 ,在可節約洗淨液的同時,洗淨裝置本身也成爲小型化, 成本也降低。200535993 (1) IX. Description of the invention [Technical field to which the invention belongs] The present invention relates to an adjusting device and an adjusting method for adjusting the front end of a slotted nozzle. [Prior Art] Conventionally, although a resist liquid or the like is applied to the surface of a plate-like object to be processed such as a semiconductor wafer or a glass substrate, the coating solution is dropped from a nozzle onto the center portion of the object to be mounted on the rotary head. In order to spread the coating liquid to the outside by the centrifugal force generated by rotating the processing object by the rotary head, in this method, the coating liquid remaining on the surface of the processing object is only slightly, and most of it is scattered away, so Quite wasteful. Therefore, it is considered that a coating liquid discharge port having a specific width is opened to the nozzle itself, and the coating liquid is coated with a specific width on the surface of the object to be processed by moving the nozzle instead of the rotary head coating. If a Φ nozzle with a gap of the coating liquid discharge port having the above specific width is used, the waste of the coating liquid disappears, and efficient coating can be performed, but it becomes a wide part and is coated on the periphery of the front end of the nozzle. The amount of liquid re-entry is also large, which is the main cause of foreign matter generation during drying. Therefore, it is necessary to remove the coating liquid at the tip of the nozzle and its peripheral portion by washing after coating. Therefore, as a device for cleaning a slit-type nozzle having a coating liquid discharge port with a specific width, a nozzle receiving table is provided. The nozzle-receiving table forms a cleaning portion with a width approximately equal to that of the slit-type nozzle. The opening of the cleaning part forms a gap connected to the supply source of the cleaning part and an exhaust hole connected to the suction device. The cleaning liquid supplied from the gap dissolves and adheres to the front end of the nozzle and its peripheral part -4- 200535993 (2) A cleaning device that removes a coating liquid, a dried product thereof, and the like, and discharges a cleaning liquid in which components of the coating liquid have been dissolved from an exhaust hole. (Pages 2 to 3, and FIG. 3 of Patent Document 1) A cleaning unit with a slotted nozzle and a retention portion of the cleaning liquid are provided, and the slotted nozzle is placed in the cleaning unit. A substantially enclosed space is formed, and the gas supply pipe and the cleaning liquid supply pipe face one end side in the longitudinal direction of the cleaning portion, and the other end side faces the gas exhaust pipe, and is discharged from the gas exhaust φ pipe. The gas supplied from the gas supply pipe forms a gas flow in the cleaning section, and the flow of the gas is used to spread the cleaning liquid from the cleaning liquid supply pipe to the surface of the slotted nozzle, thereby cleaning the slotted nozzle. nozzle. (Pages 2 to 3, and Fig. 1 of Patent Document 2) Furthermore, in a state where the slotted nozzle is placed, the cleaning portion forming a substantially closed space is opposed to the slotted nozzle. In most cases, the discharge port of the cleaning liquid is formed along the longitudinal direction, and the vertical direction φ of the discharge direction of the cleaning liquid of each slotted nozzle and the slotted nozzle is at an angle (65 ° to 75M). (Patent Document 3, pages 3 to 4, page 2) [Patent Document 1] Japanese Patent No. 3 3 8 1 2 16 [Patent Document 2] Japanese Patent Laid-Open No. 1 〇 -3 0 8 3 3 [Patent Document 3] Japanese Patent Laid-Open No. 2000-288488 [Summary of the Invention] [Problems to be Solved by the Invention] However, the aforementioned Japanese Patent No. 3 3 8 1 2 16 The nozzle cleaning devices disclosed in Japanese Patent Application Laid-Open No. 200535993 (3) 10-308338 and Japanese Patent Application Laid-Open No. 2000-288488 all clean while supplying cleaning liquid to the tip of the nozzle. In the above-mentioned case, The front end with the nozzle cannot be washed uniformly, and there is a need for a large amount of washing at the same time There is also a problem with the liquid. The nozzles of the above-mentioned nozzle cleaning device have been cleaned because they are dried in a drying section provided in another place, so there is a problem in miniaturization of the entire device. In addition to the form, a form in which the tip of the nozzle is immersed in the cleaning solution is also considered. However, in the case of the immersion type, the cleaning solution is immersed in the opening of the slotted nozzle during immersion to make the coating liquid thin, and it is initially expanding. The liquid droplets are not uniform. The present invention was created in view of the above-mentioned problems, and an object of the present invention is to provide a small slotted nozzle that does not cause uneven cleaning at the front end of the slotted nozzle and can save cleaning liquid. Adjustment device and method for adjusting slotted nozzle using the same. [Means for solving the problem] In order to solve the above-mentioned problem, the slotted nozzle adjustment device of the invention of the present application is to dry the nozzle The drying section, the submerged cleaning section for cleaning the slotted nozzle, and the pre-dispensing section for adjusting the discharge port of the slotted nozzle are arranged adjacent to the above-mentioned immersion cleaning section and provided. The drying section and the pre-dispensing section are provided in the same device. In this way, by adjoining the submerged cleaning section, the drying section and the pre-dispensing section are provided, and the front end of the slotted nozzle after physical drying and cleaning is provided. , Shrink-6- 200535993 (4) Short time before the start of coating, so the front end of the nozzle can be quickly and efficiently. The immersion cleaning of the slotted nozzle 'While the cleaning efficiency of the cleaning liquid is good, but After washing, it is difficult for the front end of the nozzle to take too much time before drying begins. Therefore, the present invention provides a drying section adjacent to the immersion. In the present invention, after the slotted nozzle is cleaned, the φ line immediately before drying is distributed to discharge the front end of the nozzle. When the diluted coating is started, the coating droplets are uniformly formed. Although it is not limited to the immersed front-end cleaning, it is impossible to prevent the cleaning liquid from immersing in the structure from the opening, and a uniform coating liquid droplet can be obtained. In addition, when the dip-type cleaning section is not used with a slotted nozzle, the dry tip of the slotted nozzle that doubles as a dip is not required to be provided with a drying prevention section, so it can save space. When the amount of cleaning φ in the cleaning section is discharged to the pre-dispensing section, the cleaning use is not wasted. The drying section is a cleaning section in which nitrogen gas is blown before the slit-type nozzle can be switched to blow-washing liquid to the slit to be washed if necessary. In addition, in the above-mentioned pre-dispensing section, not only the washing liquid flowing out from the immersion, but also the discharge port and the return port provided and circulated in the pre-dispensing section, the pre-washing liquid is circulated through the circulation filter, thereby reducing the length. The adjustment of the use of the cleaning liquid held at the time is small, and when the amount of slitting is used, when it reaches the coating stain-type cleaning section, the liquid is applied, the coating type is at the nozzle, but the drying is performed for a certain period of time. In the prevention section, the 〇 solution exceeds a certain amount of liquid, and can be dried again. However, the overflow ring path of the front-end type cleaning section of the nozzle is connected to the amount in the distribution section. Furthermore, -7-200535993 (5) A supply port for supplying a new washing liquid from a supply tank is provided in the pre-dispensing section. Further, it is preferable to adjust the liquid level by a lifting operation of the discharge port opened in the above-mentioned immersion washing section and the discharge port opened in the pre-dispensing section. In addition, since the new washing liquid is often supplied in a small amount to the dipping type washing section and the washing liquid is constantly switched, the dipping type washing section maintains a certain degree of cleanliness or more. Although the trigger rollers are cleaned in the pre-dispensing section, in addition to the trigger rollers, because physical means (such as a mounting table) are used, the cleanliness of the immersion type cleaning section is not required compared to the cleaning liquid φ. Although pre-dispensing must be performed before the object is coated, the cleaning of the tip of the nozzle can be performed after a plurality of pieces have been processed or after a certain period of time has elapsed. Further, in the method for adjusting the tip of a slotted nozzle using the aforementioned device for adjusting the tip of a slotted nozzle, the slotted nozzle arranges the slotted nozzle in a pre-dispensing section before supplying the coating liquid to the object to be processed. The front end is ideal. Furthermore, after the slotted nozzle is processed for a plurality of pieces or after a certain period of time, the tip of the slotted nozzle is washed in the immersion washing section, then the tip of the slotted nozzle is dried in the drying section, and finally The pre-dispensing section is preferably arranged at the tip of the slotted nozzle. [Effects of the Invention] As described above, according to the present invention, by adjoining the immersion washing section and having a drying section and a pre-dispensing section, the slit-type nozzle tip after physically drying and washing can shorten the coating The time before the start, so the front end of the slotted nozzle can be adjusted quickly and efficiently. -8- 200535993 (6) After the slotted nozzle is cleaned, the diluted coating liquid at the front end of the nozzle can be discharged by pre-dispensing to form uniform coating droplets at the beginning of coating. In addition, when the dip-type cleaning section does not use a slotted nozzle for a fixed period of time or longer, it also serves as a drying prevention section that also holds the tip of the slotted nozzle. When the amount of the cleaning liquid supplied to the immersion-type cleaning unit exceeds a certain amount, φ can be reused without wasting the cleaning liquid by flowing out to the adjacent pre-dispensing unit. The drying section is a cleaning section that blows nitrogen to dry the front end of the slotted nozzle, but may be switched to a cleaning section that blows a cleaning solution to the front end of the slotted nozzle and cleans it if necessary. [Embodiment] Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. Here, FIG. 1 is a configuration diagram of an adjustment device of a slit nozzle front end according to the present invention, FIG. 2 is a piping diagram of a pre-dispensing unit in FIG. 1, and FIGS. 3 (a) and (b) are brothers. 2 is a cross-sectional view of bb, cc is a cross-sectional view, FIG. 4 is a piping diagram of a cleaning cloth in a cross-sectional view in FIG. 1 dd, and FIG. 5 (a) is another embodiment of a pre-dispensing section, and (b) is a (A) e-e sectional view. As shown in FIG. 1, an immersion cleaning unit 2 is disposed in the center of the adjustment device 1 at the front end of the slotted nozzle, and a supply port for supplying a cleaning liquid is provided on the bottom surface of the immersion cleaning unit (A ) And adjustable discharge port (B) (see Figure 3). -9- 200535993 (7) A pre-dispensing section 3 is provided in the middle of the adjusting device 1 and near the dipping-type washing section 2. On the bottom surface of the pre-dispensing section, a supply port (C) for supplying a new cleaning liquid and a discharge port (D) for discharging a waste liquid thereof are provided, and a discharge port (E) for circulating the cleaning liquid and A return port (F) (see FIG. 3) for returning the cleaning liquid purified by the circulating liquid filter 4 is provided with an adjustable cleaning liquid level (the height of the discharge port is adjusted for liquid level adjustment). Exit (G). (I In addition, an overflow section 5 is provided between the dip-type washing section 2 and the pre-dispensing section 3, and the washing liquid overflowing from the dip-type washing section 2 flows down to the pre-dispensing section 3 for reuse. A trigger roller 6 is provided in the pre-dispensing section 3, and a mounting table 7 for physically cleaning the trigger roller 6 is further provided. Furthermore, in the adjustment device 1, a dry slotted nozzle is provided near the dip-type cleaning section 2. The drying section 8. A drying gas supply pipe 9 is provided on both sides of the drying section 8, and an exhaust section 10 is provided below it. Φ As shown in FIG. 4, an opening is provided in the submerged cleaning section 2. The supply port (A) of new cleaning liquid is constantly supplied at a flow rate of 20cc / min, and the opening has a discharge port (B) for discharging the waste liquid to the waste liquid tank. Although the discharge port (B) has a rapid lifting speed to adjust the liquid The function of the surface is not only for the adjustment of the liquid surface, but also for cleaning the slotted nozzle of the dip-type cleaning unit 2 and then draining all the cleaning liquid and foreign matter floating on the liquid surface. Also, as shown in Figure 2 As shown in the figure, the opening has a supply port (C ), And the discharge port (D) for discharging all the cleaning liquid in the pre-wash distribution section 3. From -10- 200535993 (8) The overflow from the submerged cleaning section 2 through the overflow section 5 The liquid flows down to the pre-dispensing unit 3. The circulation path of the washing liquid is provided at the bottom of the pre-dispensing unit 3. The washing liquid discharged from the discharge port (E) of the circulation path is filtered through the circulating liquid. The filter 4 filters foreign matter and supplies it from the return port (F). Therefore, the cleaning liquid can be used for a longer period of time by passing the cleaning liquid through the filter 4 for circulating liquid. Furthermore, it is provided on the bottom surface of the pre-dispensing section 3. There is a liquid surface adjustment discharge port (φ G) that discharges the washing liquid to the waste liquid tank, and the liquid surface adjustment discharge port (G) adjusts the height of the discharge port for liquid level adjustment. Moreover, as shown in FIG. 1 As shown in FIG. 3, the pre-dispensing section 3 is provided with a trigger roller 6 and a mounting table 7. The mounting table 7 physically cleans the coating liquid adhered to the trigger roller 6. Also, the liquid surface adjustment discharge port ( G) Adjust the mounting table 7 to the level of being submerged in water. The physical cleaning trigger roller 6 is not limited It is also possible to use a brush on the mounting table 7 and spray a strong liquid or gas like an air knife. • In this way, after the slotted nozzle is cleaned in the immersion washing section 2, the drying section 8 is supplied from the dry gas supply pipe 9 Nitrogen is blown to dry the front end and side of the slotted nozzle, and it is finally coated on the substrate after preliminary discharge in the pre-dispensing section 3. The dip-type cleaning section 2 is often supplied with new cleaning at a flow rate of 20 cc / min. The cleaning liquid exceeding the overflow section 5 flows into the pre-dispensing section 3 for reuse. The one shown in Fig. 5 (a) is another embodiment of Figs. 3 (a) and (b), and the return of the circulating liquid The port (F) is not located on the bottom surface of the pre-dispensing section 3, and is placed closer to the trigger roller 6. By supplying -11-200535993 (9) circulating liquid from this position, the liquid is caused to adhere to the trigger roller. The coating liquid of 6 drops. The one shown in FIG. 5 (b) is an ee cross-sectional view of (a). The length of the return opening (F) of the circulating liquid is substantially the same as the length of the trigger roller 6. Because of the present application, The inventor is worried that the coating liquid leaving the nozzle of the dipping cleaning device will reattach Case, the cleaning liquid flows frequently, because this departure φ coating liquid does not re-attached. That is, using a slotted nozzle, when the coating liquid is supplied on the substrate to be processed, the portion to be coated does not become thick. The trigger roller 6 of the pre-dispensing unit 3 is used for preliminary discharge, and the slotted nozzle tip is uniformized. . This process coating must be performed when the substrate is processed. However, in the supply of the repeated coating liquid, the coating liquid is adhered to the side of the slit-type nozzle, and when it is peeled off, it becomes a foreign substance. Therefore, the tip of the slotted nozzle is immersed in the immersion cleaning unit 2 during a certain period of time or after the coating liquid is supplied to a plurality of tablets, not only the tip of the slotted φ nozzle but also the slotted nozzle. side. At this time, although there is concern that the cleaning liquid from the slotted nozzle may penetrate into the interior, the coating liquid is supplied to the vicinity of the front end of the slotted nozzle and must be pre-dispensed when coated on the substrate. Will have an impact. A type in which a cleaning liquid is sprayed from a discharge port at the tip of a conventional slotted nozzle and washed, and a plurality of discharge ports opened from a cleaning unit having a length approximately the same as that of a slotted nozzle is difficult to achieve uniform pressure evenly. Supply of the washing liquid causes uneven washing. In addition, since the cleaning liquid continuously flows, a large amount of cleaning liquid is also required. If the slotted nozzle becomes longer, the cleaning section also becomes -12-200535993 (10), and the number of discharge ports must be increased, which makes processing difficult. . Therefore, in the immersion type cleaning device of the present invention, the cleaning liquid can be saved, and the cleaning device itself can be miniaturized, and the cost can be reduced. Further, in the immersion-type cleaning section 2, when the slit nozzle is not cleaned for a long time, the immersion-type cleaning section 2 may be used as a drying prevention section. At this time, the tip of the slotted nozzle is dipped to prevent the slotted nozzle from drying. In addition, in the drying section 8, nitrogen is generally blown, and if necessary, the front φ end of the slotted nozzle is dried, and the cleaning liquid may be sprayed and switched for use. [Possibility of Industrial Utilization] Since the dip-type cleaning device invented in the present application provides a small device that shortens the time before coating is started, in a semiconductor manufacturing plant, etc., the cleaning solution can be saved and the cleaning can be performed. The net device itself has been miniaturized and the cost has been reduced.

【圖式簡單說明】 第1圖係有關本申請案發明的開縫式噴嘴前端的調整 裝置的構成圖。 第2圖係第1圖的a-a剖面圖之預先分配部的配管圖 第3 ( a )圖係第2圖b - b的剖面圖,第3 ( b )圖係 第2圖c-c的剖面圖。 第4圖係第1圖d-d之剖面圖的洗淨部的配管圖。 a 第5 ( a )圖係預先分配部的其他實施例,(b )係( -13- 200535993 (11) )的e - e剖面圖。 【主要元件符號說明】 1 :調整裝置 2 :浸漬式洗淨部(兼乾燥防止部) 3 :預先分配部 4 :循環液用過濾器 5 :溢流部 6 :觸發輥子 7 :載置台 8 :乾燥部 9 :乾燥氣體供給管(兼作洗淨液供給管) 1 〇 :排氣部[Brief Description of the Drawings] Fig. 1 is a block diagram of a device for adjusting the tip of a slotted nozzle according to the invention of the present application. Fig. 2 is a piping diagram of the pre-dispensing section of the a-a sectional view of Fig. 1. Fig. 3 (a) is a sectional view of Fig. 2 b-b, and Fig. 3 (b) is a sectional view of Fig. 2 c-c. Fig. 4 is a piping diagram of the cleaning unit in the cross-sectional view of Fig. 1d-d. a Figure 5 (a) is another embodiment of the pre-allocation section, and (b) is an e-e sectional view of (-13-200535993 (11)). [Description of symbols of main components] 1: Adjustment device 2: Dip-type washing section (and drying prevention section) 3: Pre-dispensing section 4: Circulating fluid filter 5: Overflow section 6: Trigger roller 7: Mounting table 8: Drying section 9: Dry gas supply pipe (also serves as cleaning liquid supply pipe) 1 〇: Exhaust section

-14--14-

Claims (1)

200535993 ⑴ 十、申請專利範圍 1 · 一種開縫式噴嘴前端的調整裝置,係開口有特定 寬度的塗佈液吐出口,其特徵在於:該裝置係由:洗淨開 縫式噴嘴的浸漬式洗淨部、乾燥洗淨後的噴嘴之乾燥部、 及調整開縫式噴嘴的吐出口之預先分配部所構成。 2 ·如申請專利範圍第1項之開縫式噴嘴前端的調整 裝置,其中,與上述浸漬式洗淨部鄰接的一方之側設置有 φ 上述乾燥部,另一方之側設置有上述預先分配部,且上述 浸漬式洗淨部、乾燥部、預先分配部設置於相同裝置。 3 ·如申請專利範圍第1或2項之開縫式噴嘴前端的 調整裝置,其中,上述浸漬式洗淨部在不使用開縫式噴嘴 一定時間以上時,兼作浸漬保持縫隙噴嘴前端之乾燥防止 4·如申請專利範圍第1或2項之開縫式噴嘴前端的 調整裝置,其中,供給至上述浸漬式洗淨部的洗淨液超過 • 一定量時,流出至鄰接的預先分配部。 5 ·如申請專利範圍第1或2項之開縫式噴嘴前端的 調整裝置,其中,可將上述乾燥部切換爲將洗淨液吹附至 開縫式噴嘴前端而予以洗淨的洗淨部。 6. 如申請專利範圍第1或2項之開縫式噴嘴前端的 調整裝置,其中,上述預先分配部具有與循環路徑連接的 排出口與返回口。 7. 如申請專利範圍第1或2項之開縫式噴嘴前端的 調整裝置,其中,在上述浸漬式洗淨部開口的排出口與在 -15- 200535993 (2) 上述預先分配部開口的排出口藉由升降動作調整液面。 8. 一種開縫式噴嘴前端的調整方法,係使用申請專 利範圍第1至7項中任一項之開縫式噴嘴前端的調整裝置 的開縫式噴嘴前端的調整方法,其特徵在於:上述縫式噴 嘴在對被處理物供給塗佈液之前,在預先分配部調整開縫 式噴嘴前端。 9 ·如申請專利範圍第8項之開縫式噴嘴前端的調整 φ 方法,其中,上述開縫式噴嘴在處理複數片之後或經過一 定時間後,在浸漬式洗淨部洗淨開縫式噴嘴的前端,然後 在乾燥部使開縫式噴嘴的前端乾燥,最後在預先分配部調 整開縫式噴嘴的前端。200535993 十 X. Patent application scope 1 · An adjustment device for the front end of a slotted nozzle, which has a coating liquid outlet with a specific width, which is characterized in that the device consists of: immersion washing for cleaning the slotted nozzle The cleaning section, the drying section of the nozzle after drying and washing, and the pre-dispensing section for adjusting the discharge port of the slotted nozzle. 2 · The device for adjusting the tip of a slotted nozzle according to item 1 of the scope of the patent application, wherein the side adjacent to the dipping washing unit is provided with the φ drying unit and the other side is provided with the pre-dispensing unit. In addition, the above-mentioned immersion washing section, drying section, and pre-dispensing section are provided in the same device. 3. If the slit nozzle front end adjustment device of item 1 or 2 of the scope of patent application is applied, wherein the dipping type cleaning unit is also used to prevent the tip of the dipping nozzle from drying when the slit nozzle is not used for a certain period of time. 4. The adjustment device for the slit-type nozzle tip according to item 1 or 2 of the patent application scope, wherein when the cleaning liquid supplied to the above-mentioned immersion-type cleaning section exceeds a certain amount, it flows out to the adjacent pre-dispensing section. 5 · According to the adjustment device for the front end of a slotted nozzle according to item 1 or 2 of the patent application scope, the above-mentioned drying section can be switched to a cleaning section that blows the cleaning liquid to the front end of the slotted nozzle and cleans it . 6. The adjustment device for the front end of a slotted nozzle according to item 1 or 2 of the patent application scope, wherein the pre-dispensing section has a discharge port and a return port connected to the circulation path. 7. The adjustment device of the slit nozzle front end according to item 1 or 2 of the patent application scope, wherein the discharge port opened in the above-mentioned submerged washing section and the discharge port opened in -15-200535993 (2) The outlet adjusts the liquid level by a lifting action. 8. A method for adjusting the front end of a slotted nozzle, which is a method for adjusting the front end of a slotted nozzle using the device for adjusting the front end of a slotted nozzle in any one of claims 1 to 7, which is characterized in that: The slit nozzle adjusts the tip of the slit nozzle in the pre-dispensing section before supplying the coating liquid to the object. 9 · The method of adjusting the front end of a slotted nozzle according to item 8 of the scope of patent application, wherein the slotted nozzle cleans the slotted nozzle in the immersion cleaning section after processing a plurality of pieces or after a certain period of time has passed. The front end of the slotted nozzle is dried in the drying section, and the front end of the slotted nozzle is adjusted in the pre-dispensing section. -16--16-
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US7018481B2 (en) * 2002-01-28 2006-03-28 Kabushiki Kaisha Toshiba Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle

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JP4526288B2 (en) 2010-08-18
CN1672806A (en) 2005-09-28
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KR20060044674A (en) 2006-05-16
CN100450643C (en) 2009-01-14

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