TW200520052A - Exposure apparatus, exposure method, and device-producing method - Google Patents

Exposure apparatus, exposure method, and device-producing method

Info

Publication number
TW200520052A
TW200520052A TW093132654A TW93132654A TW200520052A TW 200520052 A TW200520052 A TW 200520052A TW 093132654 A TW093132654 A TW 093132654A TW 93132654 A TW93132654 A TW 93132654A TW 200520052 A TW200520052 A TW 200520052A
Authority
TW
Taiwan
Prior art keywords
liquid
substrate
exposure
optical system
projection optical
Prior art date
Application number
TW093132654A
Other languages
English (en)
Other versions
TWI373063B (zh
Inventor
Motokatsu Imai
Susumu Makinouchi
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200520052A publication Critical patent/TW200520052A/zh
Application granted granted Critical
Publication of TWI373063B publication Critical patent/TWI373063B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW093132654A 2003-10-28 2004-10-28 Exposure apparatus, exposure method, and device-producing method TW200520052A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003366914 2003-10-28

Publications (2)

Publication Number Publication Date
TW200520052A true TW200520052A (en) 2005-06-16
TWI373063B TWI373063B (zh) 2012-09-21

Family

ID=34510271

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093132654A TW200520052A (en) 2003-10-28 2004-10-28 Exposure apparatus, exposure method, and device-producing method

Country Status (6)

Country Link
US (3) US7932996B2 (zh)
EP (1) EP1679738A4 (zh)
JP (1) JP4605014B2 (zh)
KR (1) KR101121260B1 (zh)
TW (1) TW200520052A (zh)
WO (1) WO2005041276A1 (zh)

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US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
EP2179330A1 (en) 2007-10-16 2010-04-28 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
KR101546987B1 (ko) 2007-10-16 2015-08-24 가부시키가이샤 니콘 조명 광학 시스템, 노광 장치 및 디바이스 제조 방법
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
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Also Published As

Publication number Publication date
JP4605014B2 (ja) 2011-01-05
KR20060128877A (ko) 2006-12-14
US20110189613A1 (en) 2011-08-04
US8272544B2 (en) 2012-09-25
US8797506B2 (en) 2014-08-05
US7932996B2 (en) 2011-04-26
EP1679738A1 (en) 2006-07-12
KR101121260B1 (ko) 2012-03-23
EP1679738A4 (en) 2008-08-06
JPWO2005041276A1 (ja) 2007-04-26
US20120320350A1 (en) 2012-12-20
WO2005041276A1 (ja) 2005-05-06
TWI373063B (zh) 2012-09-21
US20070002299A1 (en) 2007-01-04

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees