TW200508049A - Processes and donor elements for transferring thermally sensitive materials to substrates by thermal imaging - Google Patents
Processes and donor elements for transferring thermally sensitive materials to substrates by thermal imagingInfo
- Publication number
- TW200508049A TW200508049A TW093108334A TW93108334A TW200508049A TW 200508049 A TW200508049 A TW 200508049A TW 093108334 A TW093108334 A TW 093108334A TW 93108334 A TW93108334 A TW 93108334A TW 200508049 A TW200508049 A TW 200508049A
- Authority
- TW
- Taiwan
- Prior art keywords
- processes
- donor
- donor elements
- semiconductive
- disclosed
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 7
- 239000000758 substrate Substances 0.000 title abstract 3
- 239000000463 material Substances 0.000 title abstract 2
- 238000001931 thermography Methods 0.000 title 1
- 239000003989 dielectric material Substances 0.000 abstract 3
- 239000010409 thin film Substances 0.000 abstract 2
- 238000010438 heat treatment Methods 0.000 abstract 1
- 238000002347 injection Methods 0.000 abstract 1
- 239000007924 injection Substances 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 150000003384 small molecules Chemical class 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/40—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
- B41M5/42—Intermediate, backcoat, or covering layers
- B41M5/44—Intermediate, backcoat, or covering layers characterised by the macromolecular compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/382—Contact thermal transfer or sublimation processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/382—Contact thermal transfer or sublimation processes
- B41M5/38207—Contact thermal transfer or sublimation processes characterised by aspects not provided for in groups B41M5/385 - B41M5/395
- B41M5/38214—Structural details, e.g. multilayer systems
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/40—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/18—Deposition of organic active material using non-liquid printing techniques, e.g. thermal transfer printing from a donor sheet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M2205/00—Printing methods or features related to printing methods; Location or type of the layers
- B41M2205/30—Thermal donors, e.g. thermal ribbons
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/40—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
- B41M5/42—Intermediate, backcoat, or covering layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/464—Lateral top-gate IGFETs comprising only a single gate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/466—Lateral bottom-gate IGFETs comprising only a single gate
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Thin Film Transistor (AREA)
- Electroluminescent Light Sources (AREA)
- Formation Of Insulating Films (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Abstract
Methods of forming a patterned semiconducting-dielectric material on a substrate by thermal processes are disclosed, comprising heating a thermally imageable donor element comprising a substrate and a transfer layer of semiconductive material in conjunction with a dielectric. The donor is exposed with the positive image of the desired pattern to be formed on the receiver, such that the exposed portions of the layer of semiconductive and dielectric material are simultaneously transferred, forming the desired pattern of semiconductive and dielectric material on the receiver. The semiconducting material can be patterned to form a thin film transistor. The method can also be used to pattern a light-emitting polymer or small molecule in conjunction with the charge injection layer to form the light-emitting display for light-sensitive organic electronic devices, Donor elements for use in the process are also disclosed. Methods for forming thin film transistors and donor elements for use in the processes, are also disclosed.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US45805803P | 2003-03-27 | 2003-03-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200508049A true TW200508049A (en) | 2005-03-01 |
Family
ID=33131744
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW093108334A TW200508049A (en) | 2003-03-27 | 2004-03-26 | Processes and donor elements for transferring thermally sensitive materials to substrates by thermal imaging |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP1606120A1 (en) |
JP (1) | JP2006524916A (en) |
KR (1) | KR20050109604A (en) |
CN (1) | CN1764551A (en) |
TW (1) | TW200508049A (en) |
WO (1) | WO2004087434A1 (en) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100557842C (en) | 2004-11-01 | 2009-11-04 | 毫微纤维公司 | Organic nanofibers soft lift-off |
US7408187B2 (en) | 2004-11-19 | 2008-08-05 | Massachusetts Institute Of Technology | Low-voltage organic transistors on flexible substrates using high-gate dielectric insulators by room temperature process |
JP4945899B2 (en) * | 2005-01-05 | 2012-06-06 | コニカミノルタホールディングス株式会社 | Organic thin film transistor and manufacturing method thereof |
US20060188721A1 (en) * | 2005-02-22 | 2006-08-24 | Eastman Kodak Company | Adhesive transfer method of carbon nanotube layer |
US7645478B2 (en) * | 2005-03-31 | 2010-01-12 | 3M Innovative Properties Company | Methods of making displays |
JP4856900B2 (en) * | 2005-06-13 | 2012-01-18 | パナソニック株式会社 | Method for manufacturing field effect transistor |
KR101223718B1 (en) * | 2005-06-18 | 2013-01-18 | 삼성디스플레이 주식회사 | Method for patterning nano conductive film |
KR101174871B1 (en) * | 2005-06-18 | 2012-08-17 | 삼성디스플레이 주식회사 | Patterning method for organic semiconductor |
FR2894514B1 (en) * | 2005-12-08 | 2008-02-15 | Essilor Int | METHOD OF TRANSFERRING A MICRONIC PATTERN TO AN OPTICAL ARTICLE AND OPTICAL ARTICLE THUS OBTAINED |
US7528448B2 (en) * | 2006-07-17 | 2009-05-05 | E.I. Du Pont De Nemours And Company | Thin film transistor comprising novel conductor and dielectric compositions |
US7582403B2 (en) | 2006-07-17 | 2009-09-01 | E. I. Du Pont De Nemours And Company | Metal compositions, thermal imaging donors and patterned multilayer compositions derived therefrom |
US7744717B2 (en) * | 2006-07-17 | 2010-06-29 | E. I. Du Pont De Nemours And Company | Process for enhancing the resolution of a thermally transferred pattern |
US7651896B2 (en) | 2006-08-30 | 2010-01-26 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing semiconductor device |
JP5216276B2 (en) * | 2006-08-30 | 2013-06-19 | 株式会社半導体エネルギー研究所 | Method for manufacturing semiconductor device |
KR20100016643A (en) | 2007-04-19 | 2010-02-12 | 바스프 에스이 | Method for forming a pattern on a substrate and electronic device formed thereby |
GB2453766A (en) | 2007-10-18 | 2009-04-22 | Novalia Ltd | Method of fabricating an electronic device |
KR20090111091A (en) * | 2008-04-21 | 2009-10-26 | (주)모디스텍 | Conductive film structure and patterning method |
GB2462591B (en) * | 2008-08-05 | 2013-04-03 | Cambridge Display Tech Ltd | Organic thin film transistors and methods of making the same |
JP5446434B2 (en) * | 2009-04-30 | 2014-03-19 | Jsr株式会社 | Curable composition for nanoimprint lithography and nanoimprint method |
JP5990121B2 (en) * | 2013-03-19 | 2016-09-07 | 富士フイルム株式会社 | Method for manufacturing organic semiconductor element |
KR102480950B1 (en) * | 2014-12-24 | 2022-12-23 | 올싸거널 인코포레이티드 | Photolithographic patterning of electronic devices |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2083726A (en) | 1980-09-09 | 1982-03-24 | Minnesota Mining & Mfg | Preparation of multi-colour prints by laser irradiation and materials for use therein |
US4942141A (en) | 1989-06-16 | 1990-07-17 | Eastman Kodak Company | Infrared absorbing squarylium dyes for dye-donor element used in laser-induced thermal dye transfer |
US4948776A (en) | 1989-06-16 | 1990-08-14 | Eastman Kodak Company | Infrared absorbing chalcogenopyrylo-arylidene dyes for dye-donor element used in laser-induced thermal dye transfer |
US5019549A (en) | 1990-10-25 | 1991-05-28 | Kellogg Reid E | Donor element for thermal imaging containing infra-red absorbing squarylium compound |
JP3899566B2 (en) | 1996-11-25 | 2007-03-28 | セイコーエプソン株式会社 | Manufacturing method of organic EL display device |
US6087196A (en) | 1998-01-30 | 2000-07-11 | The Trustees Of Princeton University | Fabrication of organic semiconductor devices using ink jet printing |
GB9803763D0 (en) | 1998-02-23 | 1998-04-15 | Cambridge Display Tech Ltd | Display devices |
GB9813326D0 (en) | 1998-06-19 | 1998-08-19 | Cambridge Display Tech Ltd | Backlit displays |
US6355598B1 (en) * | 1998-09-24 | 2002-03-12 | Dai Nippon Printing Co., Ltd. | Thermal transfer sheet, thermal transfer recording method, thermal transfer recording system, resonance circuit and process for producing the same |
US6358664B1 (en) * | 2000-09-15 | 2002-03-19 | 3M Innovative Properties Company | Electronically active primer layers for thermal patterning of materials for electronic devices |
US20020158574A1 (en) * | 2001-04-27 | 2002-10-31 | 3M Innovative Properties Company | Organic displays and devices containing oriented electronically active layers |
-
2004
- 2004-03-25 JP JP2006509301A patent/JP2006524916A/en active Pending
- 2004-03-25 CN CNA2004800083329A patent/CN1764551A/en active Pending
- 2004-03-25 KR KR1020057018045A patent/KR20050109604A/en not_active Application Discontinuation
- 2004-03-25 WO PCT/US2004/009187 patent/WO2004087434A1/en not_active Application Discontinuation
- 2004-03-25 EP EP04758354A patent/EP1606120A1/en not_active Withdrawn
- 2004-03-26 TW TW093108334A patent/TW200508049A/en unknown
Also Published As
Publication number | Publication date |
---|---|
EP1606120A1 (en) | 2005-12-21 |
JP2006524916A (en) | 2006-11-02 |
WO2004087434A1 (en) | 2004-10-14 |
CN1764551A (en) | 2006-04-26 |
KR20050109604A (en) | 2005-11-21 |
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