TW200503067A - Method of replicating a high resolution three-dimensional imprint pattern on a compliant media of arbitrary size - Google Patents

Method of replicating a high resolution three-dimensional imprint pattern on a compliant media of arbitrary size

Info

Publication number
TW200503067A
TW200503067A TW092133560A TW92133560A TW200503067A TW 200503067 A TW200503067 A TW 200503067A TW 092133560 A TW092133560 A TW 092133560A TW 92133560 A TW92133560 A TW 92133560A TW 200503067 A TW200503067 A TW 200503067A
Authority
TW
Taiwan
Prior art keywords
compliant media
replicating
high resolution
media
imprint pattern
Prior art date
Application number
TW092133560A
Other languages
English (en)
Inventor
Albert H Jeans
Original Assignee
Hewlett Packard Development Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hewlett Packard Development Co filed Critical Hewlett Packard Development Co
Publication of TW200503067A publication Critical patent/TW200503067A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C99/00—Subject matter not provided for in other groups of this subclass
    • B81C99/0075—Manufacture of substrate-free structures
    • B81C99/009—Manufacturing the stamps or the moulds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0015—Production of aperture devices, microporous systems or stamps

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW092133560A 2003-04-29 2003-11-28 Method of replicating a high resolution three-dimensional imprint pattern on a compliant media of arbitrary size TW200503067A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/425,891 US6808646B1 (en) 2003-04-29 2003-04-29 Method of replicating a high resolution three-dimensional imprint pattern on a compliant media of arbitrary size

Publications (1)

Publication Number Publication Date
TW200503067A true TW200503067A (en) 2005-01-16

Family

ID=33029751

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092133560A TW200503067A (en) 2003-04-29 2003-11-28 Method of replicating a high resolution three-dimensional imprint pattern on a compliant media of arbitrary size

Country Status (5)

Country Link
US (1) US6808646B1 (zh)
EP (1) EP1477849A3 (zh)
JP (1) JP4303638B2 (zh)
CN (1) CN1542550A (zh)
TW (1) TW200503067A (zh)

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US8158728B2 (en) 2004-02-13 2012-04-17 The University Of North Carolina At Chapel Hill Methods and materials for fabricating microfluidic devices
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US7521313B2 (en) * 2005-01-18 2009-04-21 Hewlett-Packard Development Company, L.P. Thin film device active matrix by pattern reversal process
US7585424B2 (en) * 2005-01-18 2009-09-08 Hewlett-Packard Development Company, L.P. Pattern reversal process for self aligned imprint lithography and device
US20060177535A1 (en) * 2005-02-04 2006-08-10 Molecular Imprints, Inc. Imprint lithography template to facilitate control of liquid movement
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KR100645641B1 (ko) 2005-05-17 2006-11-14 삼성전기주식회사 Ｐｔｆｅ를 이용한 인쇄회로기판용 임프린트 몰드 및 그제조방법
US7994509B2 (en) 2005-11-01 2011-08-09 Hewlett-Packard Development Company, L.P. Structure and method for thin film device with stranded conductor
US7341893B2 (en) * 2005-06-02 2008-03-11 Hewlett-Packard Development Company, L.P. Structure and method for thin film device
EP1905065B1 (en) * 2005-06-20 2014-08-13 Microcontinuum, Inc. Roll-to-roll patterning
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US7795062B2 (en) * 2007-04-03 2010-09-14 Hewlett-Packard Development Company, L.P. Method of forming a pressure switch thin film device
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US8182982B2 (en) * 2008-04-19 2012-05-22 Rolith Inc Method and device for patterning a disk
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CN102712110B (zh) * 2009-09-03 2015-07-22 Lg电子株式会社 制造用于形成应用于家用电器外部的微图案膜的主模的方法,以及使用主模的膜的制造设备和方法
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CN106750473B (zh) * 2016-12-02 2019-09-03 江南大学 一种采用室温反压印技术制备高分辨率热塑性聚合物图案的方法
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CN112731763A (zh) * 2020-12-31 2021-04-30 嘉兴驭光光电科技有限公司 一种微纳光学器件制造方法

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Also Published As

Publication number Publication date
US6808646B1 (en) 2004-10-26
CN1542550A (zh) 2004-11-03
JP2004327994A (ja) 2004-11-18
EP1477849A2 (en) 2004-11-17
JP4303638B2 (ja) 2009-07-29
US20040217085A1 (en) 2004-11-04
EP1477849A3 (en) 2005-07-27

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