TW200417755A - Radiation sensitive composition for color filter, color filter, manufacturing method of liquid crystal color display, and forming method of colored layer of color filter - Google Patents

Radiation sensitive composition for color filter, color filter, manufacturing method of liquid crystal color display, and forming method of colored layer of color filter Download PDF

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Publication number
TW200417755A
TW200417755A TW092132336A TW92132336A TW200417755A TW 200417755 A TW200417755 A TW 200417755A TW 092132336 A TW092132336 A TW 092132336A TW 92132336 A TW92132336 A TW 92132336A TW 200417755 A TW200417755 A TW 200417755A
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TW
Taiwan
Prior art keywords
color filter
acid
meth
weight
sensitive composition
Prior art date
Application number
TW092132336A
Other languages
Chinese (zh)
Other versions
TWI264564B (en
Inventor
Hideyuki Kamii
Yoshinobu Suzuki
Kazuaki Niwa
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Jsr Corp
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Publication of TW200417755A publication Critical patent/TW200417755A/en
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Publication of TWI264564B publication Critical patent/TWI264564B/en

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)

Abstract

The present invention provides a forming method of a radiation sensitive composition of a color filter and a colored layer of a color filter, which can form a colored layer of an even thickness with a high production yield without making uneven coating often caused by a slot die coater. The radiation sensitive composition of a color filter contains (A) pigment, (B) alkaline soluble resin, (C)poly-function monomer, (D) optical radical generator, and (E) solvent. When denoting its viscosity by A (mPa.s), its surface tension by B (mN/m), and the coating speed by V (m/s), the value (AxV/B)is less than 4.0x10 <SP>-2</SP>, and it is used when coating by using a slot die coater. The forming method of the colored layer of a color filter uses the above composition, while making the coating speed 0.07 m/s or faster but 0.15 m/s or less.

Description

200417755 (1) 政、發明說明 【發明所屬之技術領域】 本發明係有關彩色濾光片用輻射線敏感性組成物、彩 色濾光片、彩色液晶顯示裝置及彩色濾光片用著色層的形 成方法，更詳細係有關可用於製造穿透型或反射型之彩色 液晶顯示裝置、彩色攝像管元件等所用之彩色濾光片之狹 縫模塗機塗佈用之彩色濾光片用輻射線敏感性組成物、具 有由該彩色濾光片用輻射線敏感性組成物所形成之著色層 之彩色濾光片 '具備該彩色濾光片之彩色液晶顯示裝置及 使用該彩色濾光片用輻射線敏感性組成物之彩色濾光片用 著色層的形成方法。 【先前技術】 使用著色福射敏感性組成物製造彩色濾光片時，一般 係使用旋轉塗佈機或狹縫、旋轉塗佈機塗佈，但是近年爲 了高效率塗佈被塗液，降低成本，使無旋轉機構之塗佈機 、即狹縫模塗機受到矚目。 近年，爲了增加一片基板之斜面數，使基板朝大尺寸 發展，因此必須提高塗佈速度，防止生產時間過長的情形 〇 狹縫模塗機如月刊顯示器（（股）Technotimes發行 )，’02，9月份，pi 11-1 15或月刊顯示器（（股） Technotimes發行），’02，9月份，ρ·34-41所介紹，具備 具有與塗佈方向直交之狹縫噴嘴之狹縫模，使該狹縫模或 -5- (2) (2)200417755 塗佈之基板依塗佈方向移動，由該狹縫噴嘴吐出被塗液， 然後進行塗佈之裝置，可將被塗液在不浪費的狀態下塗佈 於基板上，且相較於旋轉器等之旋轉系之塗佈機而言，狹 縫模塗機之生產時間較短，可節省使用之能源等之優點。 但是以狹縫模塗機塗佈提高塗佈速度時，以往之彩色 濾光片用輻射線敏感性組成物對於狹縫噴嘴之吐出速度與 基板之潤濕性失去平衡，產生塗佈不均的問題。 【發明內容】 發明欲解決的問題 本發明之目的係提供利用狹縫模塗機塗佈時，不會產 生塗佈不均，可以高產品良率，且高效率形成均勻膜厚之 著色層的彩色濾光片用輻射線敏感性組成物及彩色濾光片 用著色層的形成方法。本發明之其他目的即優點如下述。 解決問題的方法 本發明人等精心檢討狹縫模塗機之前述問題，結果發 現彩色濾光片用輻射線敏感性組成物之黏度及由表面張力 與塗佈速度所得之特定參數與塗佈性有密切關係，遂完成 本發明。 依據本發明時，本發明之上述目的及優點，第i可藉 由下述彩色濾光片用輻射線敏感性組成物來達成，該彩色 濾、光片用輻射線敏感性組成物係含有（A )顏料、（b ) 鹼可溶性樹脂、（C )多官能性單體、（D )光自由基引 -6 - (3) (3)200417755 發劑及（E )溶媒，其黏度爲A ( mPa · s )、其表面張力 爲，且塗佈速度爲V(m/s)時，（AxV + B )之値未達4·0χ1(Γ2，用於狹縫模塗機之塗佈。 本發明中所謂「輻射線」係指包含可見光、紫外線、 遠紫外線、電子射線、X射線等。 依據本發明時，本發明之上述目的及優點，第2可藉 由下述彩色濾光片用著色層的形成方法來達成，其特徵係 使用前述彩色濾光片用輻射線敏感性組成物，在基板上形 成著色層的方法，其中該輻射線敏感性組成物之塗佈速度 爲〇· 07 m/ S以上，且利用狹縫模塗機來形成。 發明之效果 依據本發明時，利用狹縫模塗機塗佈時，不會產生塗 佈不均，可以高產品良率，且高效率形成均勻膜厚之彩色 濾光片用著色層。 因此，本發明之彩色濾光片用輻射線敏感性組成物及 彩色濾光片用著色層的形成方法極適用於形成電子工業領 域之彩色液晶顯示裝置用彩色濾光片之各種彩色濾光片用 【實施方式】 實施發明之最佳形態 以下詳細說明本發明。 (4) (4)200417755 彩色濾光片用輻射線敏感性組成物 一（A)顏料一 本發明之顏料由於彩色濾光片要求高純度及高透過性 之發色及耐熱性，因此有機顏料爲佳。 前述有機顏料例如有顏料索引（C.I. ( Colour Index )•’ The Society of Dyers and Colourists 公司出版）中分 類爲色素（Pigment )之化合物，具體例如下述顏料索引 (C · I.)編號者。 C· I·色素黃12、C· I·色素黃13、C· I.色素黃14、C. I·色素黃17、C· I·色素黃20、C. I·色素黃24、C· I·色素 黃31、C· I·色素黃55、C· I.色素黃83、C· I.色素黃93、 C· I·色素黃109、C· I.色素黃110、C. I.色素黃138、C. I·色素黃139、C· I·色素黃150、C. I·色素黃153、C. I.色 素黃154、C· I.色素黃155、C· I·色素黃166、C. I.色素 黃168、C.I.色素黃211; C· I·色素橘36、C. I·色素橘43、C· I.色素橘51、C. I ·色素橘6 1、C . I.色素橘7 1 ; C· I·色素紅9、C· I.色素紅97、C. I.色素紅122、C. I ·色素紅1 2 3、C · I ·色素紅1 4 9、C · I ·色素紅1 6 8、C · I.色 素紅1 7 6、C · I.色素紅1 7 7、C · I ·色素紅1 8 0、C . I ·色素 紅207、C· I·色素紅208、C. I.色素紅209、C. I·色素紅 215、C· I·色素紅224、C· I.色素紅242、C· I·色素紅254 C· I·色素紫19、C. I.色素紫23、C. I.色素紫29; (5) (5)200417755 C. I·色素藍15、C· I·色素藍60、c· I.色素藍15: 3 、C. I.色素藍 15 ·· 4、C· I.色素藍 15 : 6、 C. I·色素綠7、C. I·色素綠36、C. I.色素綠136、C. I.色素綠2 1 Ο ; C . I.色素棕2 3、C · I.色素棕2 5 ; 這些有機顏料可單獨或混合2種以上使用。 k 本發明中，有機顏料可使用再結晶法、再沉澱法、溶 · 劑洗淨法、昇華法、真空加熱法或這些組合之方法來純化 __ 〇 無機顏料例如有氧化鈦、硫酸鋇、碳酸鈣、氧化鋅、 硫酸鉛、黃色鉛、鋅黃、紅色氧化鐵（丨π )、鎘紅、群 青、普魯士監、氧化銘綠、銘綠、號班、献黑、合成鐵黑 '碳黑等。 這些無機顏料可單獨使用或混合兩種以上使用。 本發明中’必要時，前述顏料可與一種以上之染料、 天然色素等倂用。 φ 本發明中，各顏料可依需要以聚合物將其粒子表面改 、 質來使用。顏料之粒子表面之改質之聚合物例如有日本特 開平8-259876號公報等所記載之聚合物或市售之各種顏 料分散用之聚合物或低聚物等。 本發明中，必要日寸，顏料可與分散劑一同使用。 前述分散劑，例如有陽離子系、陰離子系、非離子系 、兩1'生、μ ϊ 夕氧丨兀系、截系等之界面活性劑。 這種界面活性劑例如有聚氧乙烯月桂醚、聚氧乙烯硬 (6) (6)200417755 脂醯醚、聚氧乙烯油醚等之聚氧乙烯烷醚類；聚氧乙烯正 辛基苯醚、聚氧乙烯正壬基苯醚等之聚氧乙烯烷基苯醚類 ;聚乙二醇二月桂酸酯、聚乙二醇二硬脂酸酯等之聚乙二 醇二酯類；山梨糖醇酐脂肪酸酯類；脂肪酸改性聚酯類； 三級胺改性聚胺基甲酸酯類；聚乙烯亞胺類等，及以下商 品名之KP (信越化學工業（股）製）、Polyfl〇w (共榮 公司化學（股）製）、FTOP ( ΤΟΚΕM PRODUCTS公司製 )、Megafac (大日本油墨化學工業（股）製）、F1〇rade (住友 3M (股）製）、AsahiGard、Sarflone (以上爲旭 玻璃（股）製）、Disperbyk(BeakChemi 公司製）、 Solserse ( ZENEKA 公司製）等。 這些界面活性劑可單獨或混合兩種以上使用。 分散劑之使用量係對於顏料1 0 0重量份時，通常爲 5 0重量份以下，理想爲3 0重量份以下。 一（B )鹼可溶性樹脂一 本發明之（B )鹼可溶性樹脂係對於（A )顏料具有 黏者劑作用’且於製造彩色滤光片時，對於顯像處理步，驟 中所用之顯像液，特別是對於驗顯像液具有可溶性者gp司* ，並無特別限定，但以具有羧基之鹼可溶性樹脂爲佳，特 別以具有1個以上之羧基的乙烯性不飽和單體（以下稱爲 「含羧基不飽和單體」）與其他可共聚之乙烯性不飽％胃 體（以下稱爲「共聚性不飽和單體」）的共聚物（以下稱 爲「含羧基共聚物」）爲佳。 -10- (7) (7)200417755 含羧基不飽和單體例如有： (甲基）丙烯酸、丁烯酸、α -氯丙烯酸、肉桂酸等 不飽和單羧酸類； 馬來酸、馬來酸酐、富馬酸、衣康酸、衣康酸酐、檸 康酸、檸康酸酐、中康酸等之不飽和二殘酸或其酸酐類； 二價以上之不飽和多元殘酸或其酸酐類； 號拍酸單〔2-(甲基）丙燒醯氧基乙基〕酯、琥拍酸 單〔2-(甲基）丙烯醯氧基乙基〕酯等之二價以上之多元 羧酸之單〔（甲基）丙烯醯氧基烷基〕酯類； ω-羧基聚己內酯單（甲基）丙烯酸酯等之兩末端具 有竣基與經基之聚合物的單（甲基）丙嫌酸酯類等。 這些含羧基不飽和單體中，琥珀酸單（2 -丙烯醯氧基 乙基）酯及苯二甲酸單（2 -丙烯醯氧基乙基）酯係分別以 Μ-5 3 00及Μ- 5 400 (東亞合成（股）公司製）之商品名在 市面販售。 上述含羧基不飽和單體可單獨或混合2種以上使用。 此外，共聚性不飽和單體例如有： 苯乙烯、α -甲基苯乙烯、鄰-乙烯基甲苯、間-乙烯 基甲苯、對-乙烯基甲苯、對-氯苯乙烯、鄰-甲氧基苯乙 烯、間-甲氧基苯乙烯、對-甲氧基苯乙烯、鄰-乙烯苯甲 基甲醚、間-乙烯苯甲基甲醚、對-乙烯苯甲基甲醚、鄰· 乙烯苯甲基縮水甘油醚、間-乙烯苯甲基縮水甘油醚、對-乙烯苯甲基縮水甘油醚等芳香族乙烯基化合物； ΕΡ、1-甲基茚等之茚類； -11 - (8) (8)200417755 (甲基）丙烯酸甲酯、（甲基）丙烯酸乙酯、（甲基 )丙烯酸正丙酯、（甲基）丙烯酸異丙酯、（甲基）丙烯 酸正丁酯、（甲基）丙烯酸異丁酯、（甲基）丙烯酸第二 丁酯、（甲基）丙烯酸第三丁酯、（甲基）丙烯酸2 -羥 乙酯、（甲基）丙烯酸2 -羥丙酯、（甲基）丙烯酸3 -羥 丙酯、（甲基）丙烯酸2-羥丁酯、（甲基）丙烯酸3-羥 丁酯、（甲基）丙烯酸4-羥丁酯、（甲基）丙烯酸烯丙 酯、（甲基）丙烯酸苯甲酯、（甲基）丙烯酸環己酯、（ 甲基）丙嫌酸苯酯、（甲基）丙嫌酸2 -甲氧基乙酯、（ 甲基）丙烯酸2 -苯氧基乙酯、（甲基）丙烯酸甲氧基二 乙二醇酯、（甲基）丙烯酸甲氧基三乙二醇酯、（甲基） 丙烯酸甲氧基丙二醇酯、（甲基）丙烯酸甲氧基二丙二醇 醋、（甲基）丙嫌酸異冰片酯、（甲基）丙燃酸三環〔 5·2·1·〇2’6〕癸烷-8-酯、（甲基）丙烯酸2-羥基-3-苯氧基 丙酯、（甲基）甘油單丙烯酸酯等之不飽和羧酸酯類； (甲基）丙烯酸2-胺基乙酯、（甲基）丙烯酸2-二 甲胺基乙酯、（甲基）丙烯酸2 -胺基丙酯、（甲基）丙 烯酸2 -二甲胺基丙酯、（甲基）丙烯酸3 ·胺基丙酯、（ 甲基）丙烯酸3 ·二甲胺基丙酯等之不飽和羧酸胺基烷酯 類； (甲基）丙烯酸縮水甘油酯等之不飽和羧酸縮水甘油 酯類； 乙酸乙烯酯、丙酸乙烯酯、丁酸乙烯酯、苯甲酸乙烯 酯等之羧酸乙烯酯類； -12- (9) (9)200417755 乙烯基甲醚、乙烯基***、烯丙基縮水甘油醚等之不 飽和醚類； (甲基）丙烯醯腈、α-氯丙烯醯腈、乙烯叉二腈等 之乙烯腈化合物； (甲基）丙烯醯胺、α -氯丙烯醯胺、（甲基）Ν-2-經基乙基丙烯醯胺等之不飽和醯胺類； 馬來醯亞胺、Ν-苯基馬來醯亞胺、Ν-環己基馬來醯亞 胺等之不飽和醯亞胺類； 1,3 -丁二烯、異戊二烯、氯丁二烯等之脂肪族共軛二 烯類； 聚苯乙烯、（甲基）聚丙烯酸甲酯、（甲基）聚丙烯 酸正丁酯、聚矽氧烷等之聚合物分子鏈末端具有單（甲基 )丙烯醯基之巨分子單體類等。 這些共聚性不飽和單體可單獨或混合2種以上使用。 本發明中含羧基共聚物係以（甲基）丙烯酸爲必須成 分，視情況可爲含有至少一種選自琥珀酸單〔2 -(甲基） 丙烯醯氧基乙基〕酯及ω-羧基聚己內酯單（甲基）丙烯 酸酯群之化合物之含羧基不飽和單體成分與至少一種選自 苯乙烯、（甲基）丙烯酸甲酯、（甲基）2-羥基乙基丙烯 酸酯、（甲基）烯丙基丙烯酸酯、（甲基）丙烯酸苯甲酯 、（甲基）甘油單甲基丙烯酸酯、Ν-苯基馬來醯亞胺、聚 苯乙烯巨單體及聚甲基丙烯酸甲酯巨單體組群之單體的共 聚物。 這種共聚物之具體例有： -13- (10) 200417755 (甲基）丙烯酸/ (甲基）丙烯酸甲酯共聚物、 (甲基）丙烯酸/(甲基）丙烯酸苯甲酯共聚物、 (甲基）丙烯酸/(甲基）丙烯酸2-羥乙酯/(甲 基）丙烯酸苯甲酯共聚物、 (甲基）丙烯酸/(甲基）丙烯酸甲酯/聚苯乙烯巨 單體共聚物、200 417 755 (1) political, description of the invention [Field of the Invention belongs The present invention is related to a color filter is formed by a radiation-sensitive composition, a color filter, a color liquid crystal display device and a color filter colored layer method, more detail about the system useful for the manufacture of a reflection type or a transmission type color liquid crystal display color filter, a color filter radiation of the apparatus used, a color image pickup element or the like using a slit die coater of sensitive of the composition, the color filter having a color filter with a color of the colored layer formed of a radiation-sensitive composition "means and includes the use of radiation with a color filter of the color liquid crystal display color filter the method of forming the colored layer is a color filter with the sensitivity of the composition. [Prior art] When a color filter is manufactured using a colored radiation sensitive composition, it is generally applied using a spin coater, a slit, or a spin coater. However, in recent years, in order to apply a coating liquid efficiently, the cost is reduced. , so that no rotary mechanism of the coater, i.e., a slit die coater attracted attention. In recent years, in order to increase a number of inclined surfaces of the substrate, the substrate toward the development of a large size, it is necessary to increase the coating speed, to prevent the case of long production time slot die coater such as a square Monthly Display ((shares) Technotimes Issue), '02 September, pi 11-1 15 displays or monthly ((shares) Technotimes issue), '02, September, ρ · 34-41 introduced, the slit nozzle comprising a slit die having a direction perpendicular to the coating, The slit die or -5- (2) (2) 200417755 coated substrate is moved in the coating direction, and the coating liquid is ejected from the slit nozzle, and then the coating device can be used for coating the liquid the waste of a state coated on the substrate, and compared to the rotating frame of the coater, etc. For a spinner, a slit die coater or the short production time, energy savings, etc. the advantage of using. However, when the slit die coater to improve the coating speed, the conventional color filter with respect to the radiation-sensitive composition of the ejection speeds of the slit nozzle and the wettability of the substrate to lose balance, resulting in uneven application of the problem. [Summary of the Invention] Problem to be Solved by the Invention The object of the present invention is to provide a colored layer that does not cause uneven coating when coating with a slit die coater, can produce a high product yield, and efficiently form a uniform film thickness. the method for forming a color filter colored layer with a radiation-sensitive composition and a color filter. Other objects of the present invention, i.e., advantages as described below. Solution to Problem The present inventors carefully review the problems of the slit die coater, and found that the viscosity-sensitive composition for color filters of radiation and by the particular parameters of the resultant surface tension of the coating speed and the coating closely, then completed the present invention. According to the present invention, the above-mentioned object and advantages of the present invention can be achieved by the following radiation-sensitive composition for a color filter. The radiation-sensitive composition for a color filter and a light filter contains ( A) Pigment, (b) alkali-soluble resin, (C) polyfunctional monomer, (D) photoradical-6-(3) (3) 200417755 hair agent and (E) solvent, the viscosity of which is A ( mPa · s), its surface tension is, and the coating speed is V (m / s), the A of (AxV + B) is less than 4 · 0χ1 (Γ2, which is used for the coating of a slit die coater. In the present invention, "radiation" means visible light, ultraviolet rays, far ultraviolet rays, electron rays, X-rays, etc. According to the present invention, the above-mentioned objects and advantages of the present invention can be colored by the following color filters: This is achieved by a method for forming a layer, which is characterized by using the aforementioned radiation sensitive composition for color filters to form a colored layer on a substrate, wherein the coating speed of the radiation sensitive composition is 0.07 m / S or more and formed by a slit die coater. Effects of the Invention According to the present invention, When a slit die coater, coating unevenness does not occur, may be higher product yield, and efficiently formed with a uniform thickness of the color filter colored layer. Thus, the color filter of the present invention with a radiation line-sensitive composition and method of forming a color filter colored layer formed is very suitable for the electronics industry various color liquid crystal display device using a color filter [color filter best mode embodiment of the invention the present invention is described in detail below. (4) (4) 200 417 755 color filter with a radiation-sensitive composition (a) pigments in the pigment of the present invention a high purity since the color filters and the high permeability and color Organic pigments are preferred because of heat resistance. The organic pigments are, for example, compounds classified as pigments in the CI (Color Index) • 'The Society of Dyers and Colourists, and specific examples include the following pigment indexes ( (C.I.) Numbers: C.I.Pigment Yellow 12, C.I.Pigment Yellow 13, C.I.Pigment Yellow 14, C.I.Pigment Yellow 17, C.I.Pigment Yellow 20, C.I. I · pigment yellow 24, C · I · Pigment Yellow 31, C.I.Pigment Yellow 55, C.I.Pigment Yellow 83, C.I.Pigment Yellow 93, C.I.Pigment Yellow 109, C.I.Pigment Yellow 110, CI Pigment Yellow 138, C I. Pigment Yellow 139, C. I. Pigment Yellow 150, C. I. Pigment Yellow 153, CI Pigment Yellow 154, C. I. Pigment Yellow 155, C. I. Pigment Yellow 166, CI Pigment Yellow 168, CI Pigment Yellow 211; C.I.Pigment Orange 36, C.I.Pigment Orange 43, C.I.Pigment Orange 51, C.I.Pigment Orange 6 1, C.I.Pigment Orange 7 1; C.I. Pigment Red 9, C · I. Pigment Red 97, CI Pigment Red 122, C. I · Pigment Red 1 2 3, C · I · Pigment Red 1 4 9, C · I · Pigment Red 1 6 8, C · I Pigment Red 1 7 6, C. I. Pigment Red 1 7 7, C. I. Pigment Red 1 8 0, C. I. Pigment Red 207, C. I. Pigment Red 208, CI Pigment Red 209, C. I. Pigment Red 215, C. I. Pigment Red 224, C. I. Pigment Red 242, C. I. Pigment Red 254 C. I. Pigment Violet 19, CI Pigment Violet 23, CI Pigment Violet 29; (5) (5) 200417755 C.I.Pigment Blue 15, C.I.Pigment Blue 60, c.I.Pigment Blue 15: 3, CI.Pigment Blue 15 ... 4, C.I.Pigment Blue 15: 6, C.I. I. Pigment Green 7, C. I. Pigment Green 36 C. I. Pigment Green 136, C. I. Pigment Green 2 1 0; C. I. Pigment Brown 2 3, C. I. Pigment Brown 2 5; These organic pigments can be used alone or as a mixture of two or more. k the present invention, the organic pigments can be used recrystallization method, reprecipitation method, a solvent-washing method agents, inorganic pigments square purified __ example, titanium sublimation method, a vacuum heating method or a combination of these, barium sulfate, Calcium carbonate, zinc oxide, lead sulfate, yellow lead, zinc yellow, red iron oxide (丨 π), cadmium red, ultramarine blue, Prussian prison, oxidized Ming green, Ming green, shift, black, synthetic iron black 'carbon black Wait. These inorganic pigments can be used individually or in mixture of 2 or more types. In the present invention, when necessary, the aforementioned pigment may be used in combination with one or more dyes, natural pigments, and the like. φ the present invention, the need to follow each pigment particle to polymer surface modification, quality used. The polymer modified on the surface of the pigment particles includes, for example, the polymers described in Japanese Patent Application Laid-Open No. 8-259876, and polymers or oligomers for dispersing various pigments on the market. In the present invention, a pigment may be used together with a dispersant if necessary. The dispersing agent, for example, cationic, anionic interface, nonionic, two 1 'Health, μ ϊ Shu Wu Xi oxygen-based, etc. based truncated active agent. This interfacial active agents such as polyoxyethylene lauryl ether, polyoxyethylene hard (6) (6) 200 417 755 aliphatic acyl ether, polyoxyethylene oleyl ether of polyoxyethylene alkyl ethers; polyoxyethylene n-octyl phenyl ether , Polyoxyethylene alkyl nonyl phenyl ethers, etc .; polyethylene glycol dilaurate, polyethylene glycol distearate, etc .; polyethylene glycol diesters; sorbose sorbitan fatty acid esters; fatty acid modified polyesters; tertiary amine modified poly amino acid esters; polyethylene imines, and the trade names of KP (Shin-Etsu chemical (shares), Ltd.), Polyfl〇 w (Kyoei Chemicals Co., Ltd.), FTOP (TOKEKM Products Co., Ltd.), Megafac (Da Nihon Ink Chemical Industry Co., Ltd.), F10rade (Sumitomo 3M Co., Ltd.), AsahiGard, Sarflone (above Asahi Glass Co., Ltd.), Disperbyk (BeakChemi Company), Solserse (ZENEKA Company), etc. These surfactant may be used alone or in combination of two or more. When the amount of the dispersant is 100 parts by weight of the pigment, it is usually 50 parts by weight or less, and preferably 30 parts by weight or less. A (B) an alkali-soluble resin of the invention, when the (B) alkali-soluble resin-based (A) and a pigment having a viscosity by acting agent 'and is in the manufacture of color filters, for developing processing step, used in the developing step liquid, particularly for developing liquid has a solubility test by gp Division * not particularly limited, but alkali-soluble resin having a carboxyl preferred, particularly in having one or more ethylenically unsaturated monomers of carboxyl groups (hereinafter referred to as copolymers "carboxyl group-containing unsaturated monomer") and other copolymerizable ethylenic unsaturated% of the gastric body (hereinafter referred to as "copolymerizable unsaturated monomer") (hereinafter referred to as "carboxyl group-containing copolymer") is good. -10- (7) (7) 200417755 Unsaturated carboxyl-containing monomers include, for example: (meth) acrylic acid, butenoic acid, α-chloroacrylic acid, cinnamic acid and other unsaturated monocarboxylic acids; maleic acid, maleic anhydride , fumaric acid, itaconic acid, itaconic anhydride, citraconic acid, citraconic anhydride, mesaconic acid residues of unsaturated dicarboxylic acids or their anhydrides; valent residue of an unsaturated polycarboxylic acid or anhydrides; No. single Sign acid [2- (methyl) propoxy] ethyl ester burning acyl group, or more of the succinic Sign divalent acid mono [2- (meth) Bing Xixi ethyl] oxy ester of polycarboxylic acid Mono [(meth) acrylic alkoxyalkyl] esters; ω-carboxy polycaprolactone mono (meth) acrylates, etc. Mono (meth) acrylic polymers having end and end groups at both ends Suspicious esters and so on. Among these carboxyl group-containing unsaturated monomers, mono (2-propenyloxyethyl) succinate and mono (2-propenyloxyethyl) phthalate are M-5 3 00 and M- 5400 (East Asia synthesis (shares) Co., Ltd.) the trade name sold in the market. These carboxyl group-containing unsaturated monomers can be used individually or in mixture of 2 or more types. Further, copolymerizable unsaturated monomer, for example: styrene, [alpha] - methylstyrene, o - vinyltoluene, m - vinyltoluene, p - vinyltoluene, p - chlorostyrene, o - methoxy Styrene, m-methoxystyrene, p-methoxystyrene, o-vinylbenzyl methyl ether, m-vinylbenzyl methyl ether, p-vinylbenzyl methyl ether, o-vinylbenzene Aromatic vinyl compounds such as methyl glycidyl ether, m-vinyl benzyl glycidyl ether, p-vinyl benzyl glycidyl ether; indines such as EP, 1-methylindene; -11-(8) (8) 200417755 methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, n-butyl (meth) acrylate, (meth) ) Isobutyl acrylate, second butyl (meth) acrylate, third butyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, (a -Based) 3-hydroxypropyl acrylate, 2-hydroxybutyl (meth) acrylate, 3-hydroxybutyl (meth) acrylate, 4-hydroxy (meth) acrylate Esters, allyl (meth) acrylate, benzyl (meth) acrylate, cyclohexyl (meth) acrylate, phenyl (meth) propionic acid, 2-methyloxypropionic acid ethoxyethyl (meth) acrylate, 2 - phenoxyethyl acrylate, (meth) acrylate, methoxy diethylene glycol (meth) acrylate, methoxy triethylene glycol (meth) acrylate, Methoxypropylene glycol ester, methoxydipropylene glycol (meth) acrylate, isobornyl (meth) propionic acid, tricyclic (meth) propionic acid [5 · 2 · 1 · 〇2'6] decane-8 acrylate, (meth) acrylate, 2-hydroxy-3-phenoxypropyl acrylate, (meth) acrylate, monoglyceride of an unsaturated carboxylic acid esters and the like; (meth) acrylate, 2-amino ethyl (meth) acrylate, 2-dimethylamino-ethyl (meth) acrylate, 2 - amino propyl (meth) acrylate, 2 - dimethylamino propyl (meth) acrylate, 3- amino propyl (meth) acrylate, 3-dimethylamino-propyl, etc. amino alkyl esters of unsaturated carboxylic acids; (meth) acrylate and the like of an unsaturated carboxylic acid glycidyl ester type; Vinyl carboxylates such as vinyl acetate, vinyl propionate, vinyl butyrate, vinyl benzoate, etc .; -12- (9) (9) 200417755 vinyl methyl ether, vinyl ether, allyl glycidol unsaturated ethers of ether and the like; (meth) Bing Xixi nitrile, chloro Bing Xixi alpha] carbonitrile, vinylidene dinitrile of vinyl nitrile compound and the like; (meth) acrylamide, α - chloro acrylamide, (A yl) Ν-2- yl-ethyl acrylamide, etc. by an unsaturated Amides; acyl maleic imide, Ν- phenylmaleimide (PEI), Ν- cyclohexylmaleimide unsaturated (PEI), etc.醯 imines; 1,3-butadiene, isoprene, chloroprene, etc. aliphatic conjugated diene; polystyrene, (meth) polymethyl acrylate, (meth) poly end of the polymer chains, n-butyl acrylate, poly-silicon, etc. having siloxane macromer based mono (meth) Bing Xixi group of the like. These copolymerizable unsaturated monomers may be used alone or as a mixture of two or more. The carboxyl group-containing copolymer in the present invention contains (meth) acrylic acid as an essential component, and may optionally contain at least one selected from the group consisting of [2- (meth) acryloxyethyl] succinate and ω-carboxy poly caprolactone mono (meth) acrylate, the carboxyl group-containing compound of an unsaturated group and at least one monomer component selected from styrene, (meth) acrylate, ethyl (meth) acrylate, 2-hydroxyethyl, ( meth) acrylate, allyl (meth) acrylate, benzyl ester, (meth) glycerol monomethacrylate, Ν- (PEI) phenylmaleimide, polystyrene macromonomer and polymethyl methacrylate ester macromonomer copolymer of a monomer of the group. Specific examples of such copolymers are: -13- (10) 200417755 (meth) acrylic acid / (meth) acrylic acid copolymer, (meth) acrylic acid / (meth) acrylic acid methyl ester copolymer, ( (Meth) acrylic acid / 2-hydroxyethyl (meth) acrylate / benzyl (meth) acrylate copolymer, (meth) acrylic acid / methyl (meth) acrylate / polystyrene macromonomer copolymer,

(甲基）丙烯酸/(甲基）丙烯酸甲酯/聚甲基丙烯 酸甲酯巨單體共聚物、 (甲基）丙烯酸/(甲基）丙烯酸苯甲酯/聚苯乙烯 巨單體共聚物、 (甲基）丙烯酸/(甲基）丙烯酸苯甲酯/聚甲基丙 烯酸甲酯巨單體共聚物、 (甲基）丙烯酸/(甲基）丙烯酸2-羥乙酯/(甲 基）丙烯酸苯甲酯共聚物/聚苯乙烯巨單體共聚物、(Meth) acrylic acid / methyl (meth) acrylate / polymethyl methacrylate macromonomer copolymer, (meth) acrylic acid / benzyl (meth) acrylate / polystyrene macromonomer copolymer, (Meth) acrylic acid / benzyl (meth) acrylate / polymethyl methacrylate macromonomer copolymer, (meth) acrylic acid / 2-hydroxyethyl (meth) acrylate / (meth) acrylic acid benzene Methyl ester copolymer / polystyrene macromonomer copolymer,

(甲基）丙烯酸/(甲基）丙烯酸2-羥乙酯/(甲 基）丙烯酸苯甲酯/聚甲基丙烯酸甲酯巨單體共聚物、 甲基丙烯酸/苯乙烯/(甲基）丙烯酸苯甲酯/ N-苯 基馬來醯亞胺共聚物、 (甲基）丙烯酸/琥珀酸單〔2-(甲基）丙烯醯氧基 乙基〕酯/苯乙烯/(甲基）丙烯酸苯甲酯/ N-苯基馬來 醯亞胺共聚物、 (甲基）丙烯酸/琥珀酸單〔2-(甲基）丙烯醯氧基 乙基〕酯/苯乙烯/(甲基）丙烯酸烯丙酯/ N-苯基馬來 醯亞胺共聚物、 -14- (11) (11)200417755 (甲基）丙烯酸/苯乙烯/ (甲基）丙稀酸苯甲@旨/ 甘油單（甲基）丙烯酸酯/ N -苯基馬來醯亞胺共聚物、 (甲基）丙烯酸/ ω-羧基聚己內醋單（甲基）丙嫌 酸酯/苯乙烯/(甲基）丙烯酸苯甲酯/甘油單（甲基） 丙烯酸酯/ Ν-苯基馬來醯亞胺共聚物等。 含羧基共聚物中含羧基不飽和單體之共聚比例理想、胃 5〜5 0重量％，更理想爲1 〇〜4 0重量％。此種情況下，若 上述共聚比例未達5重量％時，所得輻射線敏感性組成物 對鹼顯像液之溶解度有降低的傾向，又超過5 0重量％時 ’對鹼顯像液之溶解度過高，以鹼顯像液顯像時，容易導 致由著色層基板上脫落或畫素表面產生膜粗糙的傾向。 鹼可溶性樹脂以膠體滲透層析法（GPC、溶出溶劑： 四氫呋喃）所測定之聚苯乙烯換算的重量平均分子量（以 下稱爲「Mw」）爲 3,000〜1〇〇5〇〇〇，更佳爲 5,000〜 50.000 〇 又’鹼可溶性樹脂以膠體滲透層析法（GP C、溶出溶 劑：四氫呋喃）所測定之聚苯乙烯換算的數目平均分子量 (以下稱爲「Μη」）爲1，〇〇〇〜40,000,較佳爲2,000〜 20.000 〇 又’驗可溶性樹脂之M w與Μ η比（M w / Μ η )理想 爲1〜5，更理想爲】〜4。 本發明中’錯由使用具有這種特定及Μη之驗可 溶性樹脂’可獲得顯像性優異之輻射線敏感性組成物，藉 此可形成具有淸晰圖案邊緣之像素圖案，而且顯像時未曝 -15 - (12) (12)200417755 光部分之基板上及遮光層上不易產生殘渣、污染、膜殘留 等。 本發明中，（B )鹼可溶性樹脂可單獨使用或混合2 種以上來使用。 本發明之（B )鹼可溶性樹脂之使用量係對於（a ) 顏料100重量份時，理想爲使用10〜1，〇 〇〇重量份，更理 想爲20〜5 00重量份。此種情況下，若鹼可溶性樹脂之使 用量未達1 0重量份時，可能發生例如鹼顯像性降低，未 曝光部分之基板上及遮光層上產生污染或膜殘留，另一方 面若超過1，0 0 0重量份時’由於顏料濃度降低，因此，有 時薄膜難以達到目的之色濃度。 一 （C )多官能性單體一 本發明之（C )多官能性單體係具有2個以上聚合性 不飽和鍵之單體。 多官能性單體例如有： 乙一醇、丙二醇等之烷二醇之二（甲基）丙烯酸酯類 &gt; 聚乙二醇、聚丙二醇等之聚烷二醇之二（甲基）丙烯 酸酯類； 甘油、二經甲基丙烷、季戊四醇、二季戊四醇等之3 價以上之多兀醇之聚（甲基）丙烯酸酯類或其二羧酸改質 物； 聚酯、壌氧樹脂、胺基甲酸酯樹酯、醇酸樹脂、聚矽 -16- (13) (13)200417755 氧樹酯、螺烷樹酯等之低聚（甲基）丙烯酸酯類； 兩末端羥基聚丁二烯 '兩末端羥基聚異戊二烯、 兩末端羥基聚己內酯等兩末端羥基化聚合物之二（甲基） 丙烯酸酯類；或 三〔2-(甲基）丙烯醯氧基乙基〕磷酸酯等。 這些多官能性單體中，3價以上之多元醇之聚（甲基 )丙烯酸酯類或其二羧酸改質物中，從著色層之強度及表 面平滑性優越，且未曝光部分之基板上及遮光層上不易產 生污染、膜殘留等方面而言，較佳者爲三羥甲基丙烷三（ 甲基）丙烯酸酯、季戊四醇三（甲基）丙烯酸酯、季戊四 醇四（甲基）丙烯酸酯、二季戊四醇五（甲基）丙烯酸酯 '二季戊四醇六（甲基）丙烯酸酯等，特別理想爲三羥甲 基丙烷三丙烯酸酯、季戊四醇三丙烯酸酯及二季戊四醇六 丙烯酸酯。 上述多官能性單體可單獨使用或混合兩種以上使用。 本發明之多官能性單體之使用量係對於（B )鹼可溶 性樹脂1 0 0重量份時，理想爲使用5 0〜2 0 0重量份，更理 想爲7 5〜1 5 0重量份。此時，若多官能性單體之使用量未 達5重量份時，著色層之強度或表面平滑性有降低的傾向 ’另一方面，若超過200重量份時，例如有鹼顯像性降低 或未曝光部分之基板上或遮光層上容易產生表面污染、膜 殘留等的傾向。 本發明中，可以具有1個聚合性不飽和鍵之單官能性 單體取代多官能性單體之一部份。 -17- (14) (14)200417755 上述單官能性單體例如有與（B )鹼可溶性樹脂所例 示之含羧基之不飽和單體或共聚性不飽和單體相同tM ，或N-(甲基）丙烯醯基嗎啉、N-乙烯基吡咯烷酮、N_ 乙烯基-ε ·己內醯胺，以及市售品Μ- 5 3 00、M-5 4 00、Μ-5 60 0 (商品名，東亞合成（股）公司製）等。 這些單官能性單體可單獨使用或混合兩種以上使用。 單官能性單體之使用比例係對於單官能性單體與多官 能性單體之合計量時，使用5 0重量％以下，更理想爲20 重量％以下。此種情況下，若單官能性單體之使用比例超 過50重量％時，著色層之強度或表面平滑性恐不足。 此外，本發明中多官能性單體與單官能性單體之合計 使用量係對於（B )鹼可溶性樹脂之使用量1 〇〇重量份時 ，使用50〜300重量份，更理想爲75至180重量份。此 種情況時，上述合計使用量未達50重量份時，著色層之 強度或表面平滑性有降低之傾向，而超過3 0 0重量份時， 例如有鹼顯像性降低或未曝光部分之基板上或遮光層上容 易產生污染、膜殘留等的情形。 一（D)光自由基產生劑一 本發明之光自由基產生劑係經可見光、紫外線、遠紫 外線、電子線、X射線等之曝光，產生可使上述（c )多 官能性單體及視情況使用之單官能性單體開始聚合之自由 基的化合物。這種光自由基產生劑例如有乙醯苯系化合物 、聯二咪唑系化合物、三哄光化合物、苯偶姻系化合物、 -18- (15) (15)200417755 二苯甲酮系化合物、α _二酮系化合物、多核醌系化合物 、噻噸酮系化合物、重氮系化合物等。 本發明中，光自由基產生劑可單獨使用或混合兩種以 上使用’但本發明之中光自由基產生劑理想爲選自乙醯苯 系化合物、聯二咪唑系化合物及三哄系化合物群之至少一 種。 本發明之較佳光自由基產生劑中，乙醯苯系化合物之 具體例有： 2-羥基-2-甲基-1-苯基丙烷-1-酮、 2 -甲基-1- ( 4 -甲硫基苯基）-2 -嗎琳基丙酬、 2 -本甲基-2- 一甲胺基-1- ( 4 -嗎琳基苯基）丁嗣-1、 1-羥基環己基•苯基酮、 2,2-二甲氧基-1，2-二苯基乙烷-1-酮等。 這些乙醯苯系化合物中，特別理想爲2-甲基-1- ( 4-甲硫基苯基）-2-嗎啉基丙酮-1、2-苯甲基-2-二甲胺基-卜 (4-嗎啉基苯基）丁酮-1等。 上述乙醯苯系化合物可單獨使用或混合兩種以上使用 〇 本發明中，光自由基產生劑使用乙醯苯系化合物時， 其使用量係對於（C )多官能性單體與單官能性單體之合 計1 0 0重量份時，使用5〜8 0重量份，更理想爲1 0〜6 0 重量份，更理想爲2 0〜5 0重量份。此種情況下，乙醯苯 系化合物之使用量未達5重量份時，藉由曝光之硬化不足 ，有時很難獲得畫素依據所期望排列配置之像素陣列，而 -19- 200417755 (16) 超過 8 0重量份，所形成之著色層在顯像時，容易由基板 上脫落的傾向。 聯二咪唑系化合物之具體例有： 雙（2-氯苯基）-4 5 4 ’55,5’-四（4-乙氧羰基苯基 )-1，2 ’ -聯二咪唑、 2,2’-雙（2-溴苯基）-4,45,5,55-四（4-乙氧羰基苯基 )-1，2、聯二咪唑、 2.2、 雙（2-氯苯基）-454’，5,5、四苯基-1，2’-聯二咪唑 &gt; 2.2、 雙（2,4-二氯苯基）-4,4，，5,5’-四苯基-1，2，-聯二 咪唑、 2.2、 雙（2,4,6-三氯苯基）-4,45,5 5 5、四苯基-1，2、聯 二咪唑、 2.2、 雙（2-溴苯基）-4,4’，5,5’-四苯基-1，2、聯二咪唑 2;25-雙（2,4-二溴苯基）-4,4’，5,5、四苯基-1，2、聯二 咪唑、 2.2、 雙（2,4,6-三溴苯基）-4,4’，5 5 5 ’-四苯基-1，2、聯 二咪唑等。 這些聯二咪唑系化合物中，較佳者爲2,25-雙（2-氯 苯基）-4,4’55,5、四苯基聯二咪唑、2,2、雙（2,4 -二 氯苯基）-4,4’，5,5、四苯基-1,2’·聯二咪唑、2,2、雙（ 2,4,6 -三氯苯基）-4,4\5,5’ -四苯基-1,2’-聯二咪唑等，特 別理想爲2;2、雙（2,4-二氯苯基）-4,4’，5,5’-四苯基-1，2、 -20- (17) (17)200417755 聯二咪唑。 前述聯二咪唑系化合物對於溶劑之溶解性優異，不會 產生未溶解物或析出物等異物，而且感度高，僅以少能量 曝光可充分進行硬化反應，且未曝光部位不產生硬化反應 ，因此，曝光後之塗膜可明確區分爲對於顯像液爲不溶性 之硬化部分與對於顯像液具有高溶解性之未硬化部分，藉 此可形成無凹陷之像素圖案依所定排列配置之高精細的像 素陣列。 前述聯二咪唑系化合物可單獨使用或混合兩種以上使 用。 本發明中，光自由基產生劑使用聯二咪唑系化合物時 之使用量係對於（C )多官能性單體與單官能性單體之合 計100重量份時，使用0.1〜40重量份，較佳爲0.1〜30 重量份，更佳爲0 · 1〜2 0重量份。此時，聯二咪唑系化合 物之使用量未達0 · 1重量份時，曝光之硬化不足，很難獲 得畫素圖案依所定排列配置之像素陣列，另一方面若超過 40重量份時，顯像時，形成後之著色層有容易自基板脫 落的傾向。 一氫給予體一 本發明中，光自由基產生劑使用聯二咪唑系化合物時 ，與下述氫給予體倂用可進一步改良感度。 所謂「氫給予體」係指對於經曝光由聯二咪唑系化合 物產生之自由基，可提供氫原子的化合物。 -21 - (18) (18)200417755 本發明之氫給予體理想爲以下述定義之毓系化合物、 胺系化合物等。 上述疏系化合物係由以苯環或雜環爲母核，具有1個 以上’較佳爲1〜3個，更佳爲1〜2個直接與該母環鍵結 之疏基的化合物（以下稱爲「毓系氫給予體」）所構成。 胺系化合物係由以苯環或雜環爲母核，具有1個以上 ’較佳爲1〜3個，更佳爲1〜2個直接與該母環鍵結之胺 基的化合物（以下稱爲「胺系氫給予體」）所構成。 又’這些氫給予體也可同時具有锍基與胺基。 以下更具體說明這些氫給予體。 疏系氫給予體可分別具有1個以上之苯環或雜環，也 可同時具有苯環與雜環，具有2個以上之這些環時，可形 成或不形成縮合環。 又’酼系氫給予體具有2個以上毓基時，只要有至少 1個游離毓基殘留時，其餘锍基之1個以上可被烷基、芳 烷基或芳基取代，此外只要至少有1個游離毓基殘留時， 可具有2個硫原子經由伸烷基等2價有機基鍵結之結構單 位’或具有2個硫原子以二硫形式鍵結的結構單位。 又，系氫給予體在锍基以外的部位可被羧基、烷氧 羰基、取代之烷氧羰基、苯氧羰基、取代之苯氧羰基、腈 基等取代。 此類锍系氫給予體可具體例有2-酼基苯并噻唑、2-毓 基苯并噁噻唑、2-锍基苯并咪唑、2,5-二锍基-1，3,4-噻二 唑、21荒基-2,5-二甲胺基吡啶等。 -22 - (19) (19)200417755 這些毓系氫給予體中，較佳者爲2-毓基苯并噻唑、h 毓基苯并噁噻唑等，特別理想爲毓基苯并噻唑。 其次’胺系氫給予體可分別具有1個以上之苯環或雜 環’也可同時具有苯環與雜環二者，具有2個以上之這些 環時，可形成或不形成縮合環。 胺系氫給予體之1個以上之胺基可被烷基或取代之院 基取代’此外，胺基以外之部位可被羧基、烷氧羰基、取 代之烷氧羰基、苯氧羰基、取代之苯氧羰基、腈基等取代 〇 這種胺系氫給予體之具體例有4,4，-雙（二甲胺基） 二苯甲酮、4,4，-雙（二乙胺基）二苯甲酮、4-二乙胺基乙 醯苯、4_二甲胺基丙醯苯、乙基-4-二甲胺基苯甲酸酯、4-二甲胺基苯甲酸、4 -二甲胺基苯腈等。 這些胺系氫給予體中，較佳者爲4,4，-雙（二甲胺基 )二苯甲酮、4 5 4，_雙（二乙胺基）二苯甲酮等，特別理想 爲4,4’-雙（二乙胺基）二苯甲酮。 胺系氫給予體即使在聯二咪唑系化合物以外之光聚合 起始劑中，也具有增感劑之作用。 本發明中，氫給予體可單獨使用或混合兩種以上使用 ’組合1種以上之锍系氫給予體與1種以上之胺系氫給予 體來使用，可使形成後之著色層在顯像時不易自基板脫落 ’且可提高著色層之強度及感度。 锍系氫給予體與胺系氫給予體之組合之具體例爲2-锍基苯并噻唑/ 4，4 5 -雙（二甲胺基）二苯甲酮、2 -巯基苯 -23- (20) (20)200417755 并噻哇/ 4,4乂雙（二乙胺基）二苯甲酮、2_锍基苯并噁唑 /4,4’-雙（二甲胺基）二苯甲酮、2_毓基苯并噁唑/ 4,4，· 雙（二乙胺基）二苯甲酮等，更佳之組合爲厂巯基苯并 噻P坐/ 4，4’-雙（二乙胺基）二苯甲酮、锍基苯并噁唑/ 4，4’-雙（二乙胺基）二苯甲酮等，特別理想的組合爲2_ 毓基苯并噻卩坐/4,4’-雙（二乙胺基）二苯甲酮。 I荒系氬給予體與胺系氫給予體之組合，其中毓系氫給 予體與胺系氫給予體之重量比一般爲I:〗〜I:#，更佳 爲 1 : 1 〜1 : 3。 本發明中’氫給予體與聯二咪唑系化合物倂用時，其 使用量係對於（C )多官能性單體與單官能性單體之合計 1〇〇重量份時，使用0.1〜30重量份，更佳爲0.1〜20重 量份’特別理想爲0 · 1〜1 〇重量份。此時，氫給予體之使 用量未達0.1重量份時，感度之改良效果有降低的傾向， 而超過3 0重量份時，形成後之著色層在顯像時有容易自 基板脫落的傾向。 上述三嗪系化合物之具體例有 2,4,6-三（三氯甲基）-s-三嗪、 2-甲基-4,6-雙（三氯甲基）-s-三嗪、 2-〔 2-(5-甲基呋喃-2-基）乙烯基〕-4,6-雙（三氯甲 基）-s-三嗪、 2-〔2-(呋喃-2-基）乙烯基〕-4,6·雙（三氯甲基）-s-三嗪、 2-〔2- (4-二乙胺基-2-甲基苯基）乙烯基〕-4,6-雙（ -24- (21) (21)200417755 三氯甲基）-s-三嗪、 2- [ 2- ( 3,4 - 一甲氧基苯基）乙嫌基〕-4,6 -雙（三氯 甲基）-s -三嗪、 2- (4 -甲氧基苯基）-4,6 -雙（三氯甲基）-s-三嗪、 2-(4-乙氧基苯乙稀基）-4,6-雙（三氯甲基）-3-三嗪 2-(4-正丁氧基苯基）-4,6-雙（三氯甲基）-s-三嗪等 具有鹵甲基之三嗪系化合物。 這些三嗪系化合物中，特別理想者爲2-〔 2- ( 3,4·二甲 氧基苯基）乙嫌基〕-4,6-雙（二氯甲基）-s-三嗦。 上述三嗪系化合物可單獨使用或混合兩種以上使用。 本發明中’使用三嗪系化合物作爲光自由基產生劑時 之使用量係對於（C )多官能性單體與單官能性單體之合 計100重量份時，使用1〜40重量份，較佳爲1〜30重量 份，更佳爲1〜2 0重量份。此時，三嗪系化合物之使用量 未達1重量份時，曝光之硬化不足，很難獲得畫素圖案依 所定排列配置之像素陣列，而超過4 0重量份時，形成後 之著色層在顯像時，有容易自基板脫落的傾向。 一添加劑一 本發明之彩色濾光片用輻射線敏感性組成物中，必要 時可添加各種添加劑。 前述添加劑例如進一步改善輻射線敏感性組成物對於 驗顯像液之溶解特性，且抑制顯像後未溶解物殘留的作用 -25- (22) (22)200417755 等之有機酸或有機胺化合物（但是不包括前述氫給予體） 〇 前述有機酸係以分子中具有1個以上羧基之脂族羧酸 或含苯基之羧酸爲佳。 上述脂族羧酸例如有甲酸、乙酸、丙酸、丁酸、戊酸 、三甲基乙酸、己酸、二乙基乙酸、庚酸、辛酸等脂族單 羧酸類； 草酸、丙二酸、琥珀酸、戊二酸、己二酸、庚二酸、 辛二酸、壬二酸、癸二酸、巴西二酸、甲基丙二酸、乙基 丙二酸、二甲基丙二酸、甲基琥珀酸、四甲基琥珀酸、環 辛二酸、衣康酸、檸康酸、馬來酸、富馬酸、中康酸等脂 族二羧酸類； 丙三羧酸、烏頭酸、樟腦三酸等脂族三羧酸類等。 上述含苯基之羧酸例如有羧基直接與苯基鍵結之化合 物或羧基經由碳鏈與苯基連接之化合物等。 含苯基之羧酸例如有： 苯甲酸、甲苯甲酸、枯茗酸、二甲基苯甲酸、三甲基 苯甲酸等芳族單羧酸類； 鄰-苯二甲酸、間-苯二甲酸、對-苯二甲酸等芳族二 羧酸類； 偏苯三酸、均苯三酸、偏苯四甲酸、均苯四甲酸等三 價以上之芳族多羧酸類；或 苯基乙酸、氫阿托酸、氫肉桂酸、苦杏仁酸、苯基琥 珀酸、阿托酸、肉桂酸、肉桂叉二酸、香豆酸、傘形酸等 -26- (23) 200417755 這些有機酸中’從對於鹼溶解性、後述溶劑之溶解性 及防止未曝光部之基板及遮光層上產生污染或膜殘留等觀 點而言，脂族羧酸類以脂族二羧酸類爲佳，特別是己二酸 、衣康酸、檸康酸、富馬酸、中康酸等更佳，含苯基之羧 酸以芳族二羧酸類爲佳，苯二甲酸更佳。 上述有機酸可單獨使用或混合2種以上來使用。 有機酸之使用量係對於（A)〜（D)之各成分及添 加劑之合計1 〇 0重量份時，一般使用1 5重量份以下，較 佳爲1 〇重量份以下。此種情況，若有機酸之使用量超過 1 5重量份時，形成後之著色層對於基板之接著性有降低 的傾向。 上述有機胺化合物以分子中具有1個以上胺基之脂族 胺或含苯基之胺爲佳。(Meth) acrylic acid / 2-hydroxyethyl (meth) acrylate / benzyl (meth) acrylate / polymethyl methacrylate macromonomer copolymer, methacrylic acid / styrene / (meth) acrylic acid Phenylmethyl ester / N-phenylmaleimide copolymer, (meth) acrylic acid / succinic acid mono [2- (meth) acryloxyethyl] ester / styrene / (meth) acrylic acid benzene methacrylate / N- phenylmaleimide copolymer (PEI), (meth) acrylic acid / succinic acid mono [2- (meth) Bing Xixi oxy] ethyl acrylate / styrene / (meth) acrylate, allyl Ester / N-phenylmaleimide copolymer, -14- (11) (11) 200417755 (meth) acrylic acid / styrene / (meth) acrylic acid ) Acrylate / N-phenylmaleimide copolymer, (meth) acrylic acid / ω-carboxy polycaprolactone mono (meth) propionate / styrene / (meth) acrylic acid methyl ester / glycerol mono (meth) acrylate / Ν- phenylmaleimide copolymer (PEI). The copolymerization ratio of the carboxyl group-containing unsaturated monomer in the carboxyl group-containing copolymer is preferably 50 to 50% by weight, and more preferably 10 to 40% by weight. In this case, if the above-mentioned copolymerization ratio of less than 5 wt%, the resulting radiation-sensitive composition tends to decrease the solubility to an alkali developing solution, and is more than 50 wt% 'of the solubility in an alkali developing solution too high an alkali developing fluid to easily fall off from the lead on the substrate or the pixel colored layer film surface roughness tends to generate. The polystyrene-equivalent weight average molecular weight (hereinafter referred to as "Mw") of the alkali-soluble resin measured by colloidal permeation chromatography (GPC, elution solvent: tetrahydrofuran) is 3,000 to 10,000, more preferably 5,000~ 50.000 square and 'alkali-soluble resin colloidal permeation chromatography (GP C, elution solvent: tetrahydrofuran) in terms of polystyrene as measured number average molecular weight (hereinafter referred to as "Μη") 1, 〇〇〇~ 40,000, preferably 2,000 to 20.000, and the ratio of M w to M η (M w / M η) of the soluble resin is preferably 1 to 5, and more preferably 4 to 4. In the present invention, 'a dislocation having this particular test-soluble resin and the Μη' availability of excellent imaging radiation-sensitive composition, thereby forming a pixel pattern may be the pattern edge of the Qing clarity, and not the time of development Exposure -15-(12) (12) 200417755 It is not easy to produce residue, pollution, film residue, etc. on the substrate and light shielding layer of the light part. In this invention, (B) alkali-soluble resin can be used individually or in mixture of 2 or more types. When the amount of the (B) alkali-soluble resin of the present invention is 100 parts by weight of the (a) pigment, it is desirable to use 10 to 1,000 parts by weight, and more preferably 20 to 5000 parts by weight. In this case, if the alkali-soluble resin used in an amount of less than 10 parts by weight, may occur e.g. alkaline developer is reduced, contamination or the unexposed film remaining on the substrate and a portion of the light-shielding layer, on the other hand if it exceeds At 1,000,000 parts by weight, 'the pigment concentration decreases, so it may be difficult for the film to achieve the intended color density. -(C) polyfunctional monomer-(C) The polyfunctional monosystem of the present invention is a monomer having two or more polymerizable unsaturated bonds. For example, polyfunctional monomers: a ethyl alcohol, propylene glycol, etc. The alkylene glycol di (meth) acrylate &gt; polyethylene glycol, polypropylene glycol of the polyalkylene glycol bis (meth) acrylates ; Poly (meth) acrylates of trivalent or higher polyhydric alcohols, such as glycerin, dimethanol, pentaerythritol, dipentaerythritol, etc., or their dicarboxylic acid modified products; polyesters, epoxy resins, aminocarboxylic acids Ester resins, alkyd resins, polysilicon-16- (13) (13) 200417755 oligo (meth) acrylates such as oxo resins, spirane resins, etc; hydroxy polybutadienes at both ends Bis (meth) acrylates of hydroxylated polymers such as hydroxypolyisoprene, hydroxypolycaprolactone at both ends, etc .; or tris [2- (meth) acryloxyethyl] phosphate, etc. . Among these polyfunctional monomers, poly (meth) acrylates of trivalent or higher polyhydric alcohols or their dicarboxylic acid modifiers have superior strength and surface smoothness of the colored layer, and on the substrate of the unexposed portion. In terms of preventing pollution and film residue on the light-shielding layer, trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, Dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate and the like are particularly preferably trimethylolpropane triacrylate, pentaerythritol triacrylate, and dipentaerythritol hexaacrylate. These polyfunctional monomers can be used alone or in combination of two or more. When the amount of the polyfunctional monomer of the present invention is 100 parts by weight with respect to the (B) alkali-soluble resin, it is preferably 50 to 200 parts by weight, and more preferably 75 to 150 parts by weight. At this time, if the amount of the polyfunctional monomer is less than 5 parts by weight, the strength or surface smoothness of the colored layer tends to decrease. On the other hand, when it exceeds 200 parts by weight, for example, alkali developability decreases. Or the surface of the unexposed part or the light-shielding layer tends to cause surface contamination and film residue. In the present invention, a monofunctional monomer having one polymerizable unsaturated bond may be substituted for a part of the polyfunctional monomer. -17- (14) (14) 200417755 The above monofunctional monomer has, for example, the same tM as the unsaturated carboxyl group-containing unsaturated monomer or copolymerizable unsaturated monomer exemplified for the (B) alkali-soluble resin, or N- (formaldehyde) Group) acrylfluorenylmorpholine, N-vinylpyrrolidone, N_vinyl-ε-caprolactam, and commercially available products M-5 3 00, M-5 4 00, M-5 60 0 (trade names, East Asia synthesis (shares) Co., Ltd.). These monofunctional monomers may be used alone or in combination of two or more. Used in a proportion of monofunctional monomer respect to the total amount of monofunctional monomer and a polyfunctional monomer, the use of 50 wt% or less, more preferably 20 wt% or less. In this case, if the use ratio of the monofunctional monomer exceeds 50% by weight, the strength or surface smoothness of the colored layer may be insufficient. In addition, in the present invention, when the total usage amount of the polyfunctional monomer and the monofunctional monomer is 100 parts by weight with respect to the use amount of the (B) alkali-soluble resin, 50 to 300 parts by weight is used, and more preferably 75 to 180 parts by weight. When such a case, the total amount less than 50 parts by weight, strength of the colored layer surface smoothness tends to decrease the, when it exceeds 300 parts by weight, for example, an alkali developer is lowered or unexposed portions of prone to environmental pollution, and the like remaining on the film substrate or the light shielding layer. A (D) photoradical generator light invention based radical generator by a visible light, ultraviolet light, far ultraviolet rays, electron beam, X-ray exposure, etc., can produce the above-described (c) a polyfunctional monomer and optionally the compound where monofunctional monomer to start the polymerization of the radicals. Such photo-radical generators include, for example, acetophenone-based compounds, biimidazole-based compounds, trioxine-based compounds, benzoin-based compounds, -18- (15) (15) 200417755 benzophenone-based compounds, α _ diketone-based compound, polynuclear quinone-based compound, thioxanthone-based compound, a diazo-based compound. In the present invention, an optical radical generator may be used singly or in combination of two or more 'but in the present invention over the photo radical generator is selected from acetyl benzene compounds, biimidazole-based compound and a group of three coax compound of at least one. Among the preferred photoradical generators of the present invention, specific examples of acetophenone-based compounds are: 2-hydroxy-2-methyl-1-phenylpropane-1-one, 2-methyl-1- (4 -Methylthiophenyl) -2 -morpholinylpropanone, 2-benzyl-2-monomethylamino-1- (4-morpholinylphenyl) butyridine-1, 1-hydroxycyclohexyl • phenyl ketone, 2,2-dimethoxy-1,2-diphenylethane-1-one. Among these acetophenone-based compounds, 2-methyl-1- (4-methylthiophenyl) -2-morpholinoneacetone-1, 2-benzyl-2-dimethylamino- Bu (4-morpholinophenyl) -1-butanone and the like. The acetophenone-based compound may be used alone or in combination of two or more. In the present invention, when the acetophenone-based compound is used as the photoradical generator, the amount used is based on (C) the polyfunctional monomer and monofunctionality. When the total amount of the monomers is 100 parts by weight, 5 to 80 parts by weight are used, more preferably 10 to 60 parts by weight, and even more preferably 20 to 50 parts by weight. In this case, when the amount of acetophenone-based compound is less than 5 parts by weight, it is sometimes difficult to obtain a pixel array in which pixels are arranged in a desired arrangement due to insufficient hardening due to exposure, and -19- 200417755 (16 ) When it exceeds 80 parts by weight, the formed colored layer tends to fall off from the substrate during development. Specific examples of the biimidazole-based compound include: bis (2-chlorophenyl) -4 5 4 '55, 5'-tetrakis (4-ethoxycarbonylphenyl) -1,2'-biimidazole, 2, 2'-bis (2-bromophenyl) -4,45,5,55-tetra (4-ethoxycarbonylphenyl) -1,2, bidiimidazole, 2.2, bis (2-chlorophenyl)- 454 ', 5,5, tetraphenyl-1,2'-biimidazole &gt; 2.2, bis (2,4-dichlorophenyl) -4,4,5,5'-tetraphenyl-1 , 2, -biimidazole, 2.2, bis (2,4,6-trichlorophenyl) -4,45,5 5 5, tetraphenyl-1,2, bibiimidazole, 2.2, bis (2- bromophenyl) -4,4 ', 5,5'-tetraphenyl-1,2, 2 biimidazole; 25-bis (2,4-dibromophenyl) -4,4', 5,5 , Tetraphenyl-1, 2, bibiimidazole, 2.2, bis (2,4,6-tribromophenyl) -4,4 ', 5 5 5' -tetraphenyl-1,2, bidiimidazole Wait. Of these biimidazole-based compounds, 2,25-bis (2-chlorophenyl) -4,4'55,5, tetraphenylbiimidazole, 2,2, bis (2,4- Dichlorophenyl) -4,4 ', 5,5, Tetraphenyl-1,2' · bidiimidazole, 2,2,2 (2,4,6-trichlorophenyl) -4,4 \ 5,5'-tetraphenyl-1,2'-biimidazole and the like, particularly preferably 2; 2, bis (2,4-dichlorophenyl) -4,4 ', 5,5'-tetrabenzene Base-1,2, -20- (17) (17) 200417755 biimidazole. The biimidazole-based compound is excellent in solubility in a solvent for the not undissolved foreign matter or precipitates, and a high sense, only little energy exposure curing reaction can be sufficiently performed, the exposed portion is not generated and no hardening reaction, , exposing the coating film to be a clear distinction is insoluble in the developing solution hardened portion with respect to the developing solution having a high solubility in the uncured portion, whereby a pixel pattern may be formed without the recess are arranged by a predetermined high fine pixel array. The aforementioned biimidazole-based compounds may be used alone or in combination of two or more. In the present invention, when using a biimidazole-based compound as the photo radical generator, when the total amount of (C) the polyfunctional monomer and the monofunctional monomer is 100 parts by weight, 0.1 to 40 parts by weight is used, It is preferably from 0.1 to 30 parts by weight, and more preferably from 0.1 to 20 parts by weight. At this time, when the amount of the biimidazole-based compound is less than 0.1 parts by weight, the hardening of the exposure is insufficient, and it is difficult to obtain a pixel array in which the pixel pattern is arranged in a predetermined arrangement. when the like, after forming the coloring layer tends to easily fall off from the substrate. A a hydrogen donor of the present invention, the radical generator using light biimidazole-based compound, a hydrogen donor described below can be further modified by Merger sensitivity. The so-called "hydrogen donor" refers to the radical produced by the biimidazole-based compound upon exposure, a hydrogen atom may be provided. -21-(18) (18) 200417755 The hydrogen donor of the present invention is preferably an amphoteric compound, an amine compound, or the like as defined below. Repelling based compound is a benzene ring or a heterocyclic nucleus having one or more 'more preferably 1 ~ 3, more preferably 1 ~ 2 with the parent compound is directly bonded rings hydrophobic group (hereinafter, called "Yu-based hydrogen donor") posed. Amine-based compound from the compound nucleus is a benzene ring or a heterocyclic ring, having one or more 'more preferably 1 ~ 3, more preferably 1 ~ 2 is directly bonded to the ring of the female group (hereinafter referred to "amine-based hydrogen donor" is) posed. And 'The hydrogen donor may have both a sulfonium group and an amine group. The following more detailed description of these hydrogen donors. When thinning-based hydrogen donor may have at least one of the benzene or heterocyclic ring, respectively, it can also have a benzene ring and a heterocyclic ring, having two or more of these rings may be formed or may not form a condensed ring. And 'Hai-based hydrogen donor has two or more when Yuji, as long as there is at least one free Yuji residue, the remaining one or more of the sulfonium group can be an alkyl, aralkyl or aryl group substituted with, in addition, at least as long as when a residual free Yuji, may have two sulfur atoms and the like via an alkylene structure divalent organic group bonded to the units' or 2 sulfur atoms having as disulfide bonded structure units. Further, the body portion other than the sulfonium group-based hydrogen donor may be a carboxyl group, an alkoxycarbonyl group, the substituted alkoxycarbonyl group, phenoxycarbonyl group, substituted phenoxycarbonyl group substituted with the nitrile group. Such sulfonium-based hydrogen donor may Specific examples include 2-Hai-mercaptobenzothiazole, 2-benzoxazine Yuji thiazole, 2-sulfonium-benzimidazole, 2,5-sulfonium-1,3,4 Thiadiazole, 21-Alkyl-2,5-dimethylaminopyridine, etc. -22-(19) (19) 200417755 Among these fluorene-based hydrogen donors, 2-fluorenylbenzothiazole, h fluorenylbenzoxazole and the like are preferred, and fluorenylbenzothiazole is particularly preferred. Further, the 'amine-based hydrogen donor may have one or more benzene rings or heterocyclic rings', or may have both a benzene ring and a heterocyclic ring. When two or more of these rings are present, a condensed ring may or may not be formed. One or more amine groups of the amine-based hydrogen donor may be substituted by an alkyl group or a substituted alkyl group. In addition, the site other than the amine group may be substituted by a carboxyl group, an alkoxycarbonyl group, a substituted alkoxycarbonyl group, a phenoxycarbonyl group, phenoxycarbonyl group, a nitrile group, etc. specific examples of the substituted amine such square of the hydrogen donor has 4,4, - bis (dimethylamino) benzophenone, 4,4 - bis (diethylamino) bis Benzophenone, 4-Diethylaminoacetophenone, 4-dimethylaminopropanbenzene, ethyl-4-dimethylaminobenzoate, 4-dimethylaminobenzoic acid, 4-diamine Methylaminobenzonitrile and the like. Of these amine-based hydrogen donors, 4,4, -bis (dimethylamino) benzophenone, 4 5 4, _bis (diethylamino) benzophenone, etc. are preferred, and particularly preferred are 4,4'-bis (diethylamino) benzophenone. The amine-based hydrogen donor functions as a sensitizer even in a photopolymerization initiator other than a biimidazole-based compound. In the present invention, the hydrogen donors can be used alone or in combination of two or more kinds. 'A combination of one or more fluorene-based hydrogen donors and one or more amine-based hydrogen donors can be used, so that the colored layer formed can be developed. It is not easy to fall off the substrate from time to time, and the strength and sensitivity of the colored layer can be improved. Specific examples of the combination of the fluorene-based hydrogen donor and the amine-based hydrogen donor are 2-fluorenylbenzothiazole / 4,4 5 -bis (dimethylamino) benzophenone, 2-mercaptobenzene-23- ( 20) (20) 200 417 755 thiazol wow and / qe 4,4-bis (diethylamino) benzophenone, sulfonium mercaptobenzoxazole 2_ / 4,4'-bis (dimethylamino) benzophenone ketones, benzoxazole 2_ Yuji / 4,4, bis (diethylamino) benzophenone and the like, more preferably the combination of plant P sitting mercaptobenzothiazole / 4,4'-bis (diethylamino Amino) benzophenone, fluorenylbenzoxazole / 4,4'-bis (diethylamino) benzophenone, etc., a particularly desirable combination is 2_ fluorenylbenzothiazole / 4,4 '-Bis (diethylamino) benzophenone. The combination of a hydrogen-based argon donor and an amine-based hydrogen donor, wherein the weight ratio of the hydrogen-based hydrogen donor and the amine-based hydrogen donor is generally I: 〖~ I: #, and more preferably 1: 1 ~ 1: 3 . In the present invention, when the hydrogen donor and the biimidazole-based compound are used, the amount used is based on 100 parts by weight of the total of (C) the polyfunctional monomer and the monofunctional monomer, and 0.1 to 30 weight is used. parts, more preferably 0.1~20 parts by weight 'is particularly preferably 1~1 0.5 billion parts by weight. At this time, when the amount of the hydrogen donor is less than 0.1 part by weight, the sensitivity improvement effect tends to decrease, and when it exceeds 30 parts by weight, the colored layer after formation tends to be easily detached from the substrate during development. Specific examples of the triazine-based compound include 2,4,6-tris (trichloromethyl) -s-triazine, 2-methyl-4,6-bis (trichloromethyl) -s-triazine, 2- [2- (5-methylfuran-2-yl) vinyl] -4,6-bis (trichloromethyl) -s-triazine, 2- [2- (furan-2-yl) ethylene Group] -4,6 · bis (trichloromethyl) -s-triazine, 2- [2- (4-diethylamino-2-methylphenyl) vinyl] -4,6-bis ( -24- (21) (21) 200417755 trichloromethyl) -s-triazine, 2- [2- (3,4 -monomethoxyphenyl) ethanyl] -4,6 -bis (tri Chloromethyl) -s-triazine, 2- (4-methoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-ethoxyphenylethene Group) -4,6-bis (trichloromethyl) -3-triazine 2- (4-n-butoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine etc. Halomethyltriazine compounds. Among these triazine-based compounds, 2- [2- (3,4 · dimethoxyphenyl) ethanyl] -4,6-bis (dichloromethyl) -s-triamidine is particularly preferred. These triazine-based compounds can be used alone or in combination of two or more. In the present invention, when a triazine-based compound is used as a photoradical generator, the amount used is 100 to 40 parts by weight with respect to the total of (C) the polyfunctional monomer and the monofunctional monomer. It is preferably 1 to 30 parts by weight, and more preferably 1 to 20 parts by weight. At this time, when the amount of the triazine-based compound is less than 1 part by weight, the hardening of the exposure is insufficient, and it is difficult to obtain a pixel array in which the pixel pattern is arranged in a predetermined arrangement. During development, it tends to be easily detached from the substrate. -Additives-In the radiation-sensitive composition for a color filter of the present invention, various additives may be added as necessary. Additives such as to further improve the radiation-sensitive composition (22) (22) 200 417 755 or the like organic acid organic amine compound (dissolution characteristics of the test liquid developer, and the remaining undissolved after development inhibiting effect -25- but does not include the hydrogen donor) to square the organic-based molecule having one or more carboxyl-containing aliphatic carboxylic acid or the carboxylic acid preferably phenyl. The above-described aliphatic carboxylic acids, for example formic acid, acetic acid, propionic acid, butyric acid, valeric acid, trimethylacetic acid, caproic acid, diethylacetic acid, heptanoic acid, octanoic acid and other aliphatic monocarboxylic acids; oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, Brazil acid, methyl malonic acid, ethyl malonic acid, dimethyl malonic acid, methyl succinic acid, tetramethyl succinic acid, suberic acid ring, itaconic acid, citraconic acid, maleic acid, fumaric acid, mesaconic acid, aliphatic dicarboxylic acids; propionic acid, aconitic acid, Aliphatic tricarboxylic acids such as camphor triacid and the like. The phenyl group-containing carboxylic acid compound having a carboxyl group, for example, connected directly to the phenyl group bonded via a carboxyl group of compound or a carbon chain with a phenyl. Examples of phenyl-containing carboxylic acids include aromatic monocarboxylic acids such as benzoic acid, toluic acid, cumic acid, dimethylbenzoic acid, and trimethylbenzoic acid; - phthalic acid and aromatic dicarboxylic acids; trimellitic acid, trimesic acid, trimellitic acid, pyromellitic acid, etc. the above trivalent aromatic polycarboxylic acids; or phenylacetic acid, hydrogen atropic acid , Hydrocinnamic acid, amygdalic acid, phenylsuccinic acid, atropic acid, cinnamic acid, cinnamic acid, coumaric acid, umbellic acid, etc.-26- (23) 200417755 These organic acids are 'dissolved from alkali' From the viewpoints of properties such as the solubility of solvents described below and the prevention of contamination or film residue on the substrate and light-shielding layer of the unexposed part, aliphatic dicarboxylic acids are preferred, especially adipic acid and itaconic acid. , Citraconic acid, fumaric acid, mesaconic acid, etc. are more preferred, phenyl-containing carboxylic acids are preferably aromatic dicarboxylic acids, and phthalic acid is more preferred. These organic acids can be used alone or in combination of two or more. When the amount of the organic acid used is 1,000 parts by weight with respect to the total of the components (A) to (D) and the additive, 15 parts by weight or less is generally used, and preferably 10 parts by weight or less. This case, if the amount of the organic acid exceeds 15 parts by weight, the colored layer after the formation of the adhesive property to the substrate tends to decrease. In the above-mentioned organic amine compound having in the molecule at least one aliphatic amine-containing group or a phenyl group of the amine is preferred.

上述脂族胺例如有正丙胺、異丙胺、正丁胺、異丁胺 、第二丁胺、第三丁胺、正戊胺、正己胺等單（環）烷胺 類； 甲基乙胺、二乙胺、甲基正丙胺、乙基正丙胺、二正 丙胺、二異丙胺、二正丁胺、二異丁胺、二第二丁胺、二 第三丁胺等二（環）烷胺類； 二甲基乙胺、甲基二乙胺、三乙胺、二甲基正丙胺、 二乙基正丙胺、甲基二正丙胺、乙基二正丙胺、三正丙胺 、三異丙胺、三正丁胺、三異丁胺、三第二丁胺、三第三 丁胺等三（環）烷胺類； -27- (24) (24)200417755 2- 胺基乙醇、3-胺基-卜丙醇、卜胺基-2-丙醇、4-胺 基-1- 丁醇等單（環）烷醇胺類； 二乙醇胺、二正丙醇胺、二異丙醇胺、二正丁醇胺、 二異丁醇胺等二（環）烷醇胺類； 三乙醇胺、三正丙醇胺、三異丙醇胺、三正丁醇胺、 三異丁醇胺等三（環）烷醇胺類； 3- 胺基-1，2-丙二醇、2-胺基-1，3-丙二醇、4-胺基-1,2-丁二醇、4-胺基-1，3-丁二醇、3-二甲胺基-1，2-丙二醇、3-二乙胺基-1,2 -丙二醇、2 -二甲胺基-1，3 -丙二醇、2 -二乙胺 基-1,3-丙二醇等胺基（環）烷二醇類； yS -丙胺酸、2-胺基丁酸、3-胺基丁酸、4-胺基丁酸、 2-胺基異丁酸、3-胺基異丁酸等胺基羧酸類等。 又，含苯基之胺例如有胺基直接與苯基鍵結之化合物 、胺基經由碳鏈與苯基鍵結之化合物等。 含苯基之胺例如有： 苯胺、鄰-甲基苯胺、間-甲基苯胺、對·甲基苯胺、 對-乙基苯胺、1-萘胺乙胺、2-萘胺、N，N-二乙基苯胺、 對-甲基-N，N-二甲基苯胺等芳族胺類； 鄰-胺基苯甲醇、間-胺基苯甲醇、對-胺基苯甲醇、 對-二甲胺基苯甲醇、對-二乙胺基苯甲醇等胺基苯甲醇類 y 鄰-胺基酚、間-胺基酚、對-胺基酚、對-二甲基胺基 酚、對-二乙基胺基酚等胺基酚類； 間-胺基苯甲酸、對-胺基苯甲酸、對-二甲胺基苯甲 -28- (25) (25)200417755 酸、對-二乙胺基苯甲酸等胺基苯甲酸類等。 這些有機胺化合物中，從對於下述溶劑之溶解性及防 止未曝光部之基板及遮光層上產生污染或膜殘留等觀點而 g ’脂族胺以單（環）院醇胺類及胺基（環）院二醇類爲 佳，特別是2-胺基乙醇、3-胺基-1-丙醇、胺基-^戊醇 、3•胺基-1,2 -丙二醇' 2 -胺基-1，3 -丙二醇、4 -胺基-1,2 -丁 二醇等更佳，又含苯基之胺以胺基酚類爲佳，特別是鄰_ 胺基酚、間-胺基酚、對-胺基酚等更佳。 上述有機胺化合物可單獨使用或混合2種以上來使用 〇 有機胺化合物之使用量係對於（A )至（D )成分及 添加劑之合計1 0 0重量份時，一般使用1 5重量份以下， 較佳爲1 0重量份以下。此時若有機胺化合物之使用量超 過15重量份時，形成之著色層與基板之接著性有降低的 傾向。 其他添加劑例如有： 銅酿靑衍生物等藍色顏料衍生物或黃色顏料衍生物等 之分散助劑； 玻璃、氧化鋁等塡充劑； 聚乙烯醇、聚乙二醇單烷基醚類、聚（氟烷基丙烯酸 酯）類等高分子化合物； 非離子系、陽離子系、陰離子系等界面活性劑： 乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、乙烯基 參（2-甲氧基乙氧基）矽烷、N-(2-胺乙基）-3-胺丙基· -29- (26) 200417755 甲基·二甲氧基矽烷、N- (2 -胺乙基）-3 -胺丙基三 基矽烷、3 -胺丙基三乙氧基矽烷、3 -環氧丙氧基丙基 氧基i夕院、3 -環氧丙氧基丙基·甲基·二甲氧基砂院 環氧基環己基）乙基三甲氧基矽烷、3-氯丙基 基·二甲氧基矽烷、3_氯丙基三甲氧基矽烷、3 -甲基 醯氧基丙基三甲氧基矽烷、3 -锍基丙基三甲氧基矽烷 著促進劑； 2,2-硫雙（4-甲基-6-第三丁基酚）、2,6-二-第三 酚等抗氧化劑； 2-(3-第三丁基-5-甲基-2-羥苯基）-5-氯苯并三 烷氧基二苯甲酮類等紫外線吸收劑； 聚丙烯酸鈉等抗凝劑； 1，1’·偶氮雙（環己烷-卜甲腈）、2-苯基偶氮-4-基-2，4-二甲基戊腈等熱自由基產生劑等。 一（E )溶劑— 本發明之溶劑只要是可將構成輻射敏感性組成物 A)〜（D)成分或添加劑成分予以分散或溶解，且 這些成分產生反應，具有適度揮發性者，即可適當選 用。 這種溶劑例如有： 乙二醇單甲醚、乙二醇單***、乙二醇單正丙醚 二醇單正丁醚、二乙二醇單甲醚、二乙二醇單***、 二醇單正丙醚、二乙二醇單正丁醚、三乙二醇單甲醚 甲氧 三甲 、2 - •甲 丙烯 等接 丁基 口坐、 甲氧 之（ 不與 擇使 、乙 二乙 -30- (27) (27)200417755 乙二醇單***、丙二醇單甲醚、丙二醇單*** '丙二醇單 正丙醚、丙二醇單正丁醚、二丙二醇單甲醚、二丙二醇單 ***、二丙二醇單正丙醚、二丙二醇單正丁醚、三丙二醇 單甲醚、三丙二醇單***等之（聚）烷二醇單烷醚類·， 乙二醇單甲醚乙酸酯、乙二醇單***乙酸酯、二乙二 醇單甲醚乙酸酯、二乙二醇單***乙酸酯、丙二醇單甲醚 乙酸酯、丙二醇單***乙酸酯等之（聚）烷二醇單烷醚乙 酸酯類； 二乙二醇單二甲醚、二乙二醇甲基***、二乙二醇二 ***、四氫呋喃等其他醚類； 甲基乙基酮、2 -庚酮' 3 -庚酮、環己酮等酮類； 羥基丙酸甲酯、2-羥基丙酸乙酯等乳酸烷酯類； 2 -羥基-2-甲基丙酸乙酯、3 -甲氧基丙酸甲酯、3 -甲氧 基丙酸乙酯、3 -乙氧基丙酸甲酯、3 -乙氧基丙酸乙酯、乙 氧基乙酸乙酯、羥基乙酸乙酯、2 -羥基-3-甲基丁酸甲酯 、3 -甲基-3-甲氧基丁基丙酸酯、乙酸乙酯、乙酸正丙酯 、乙酸異丙酯、乙酸正丁酯、乙酸異丁酯、甲酸正戊酯、 乙酸異戊酯、丙酸正丁酯、丁酸乙酯、丁酸正丙酯、丁酸 異丙酯、丁酸正丁酯、丙酮酸甲酯、丙酮酸乙酯、丙酮酸 正丙酯、乙醯乙酸甲酯、乙醯乙酸乙酯、2-氧代丁酸乙醋 等其他酯類；甲苯、二甲苯等芳族烴類； N-甲基吡咯烷酮、N，N-二甲基甲醯胺、N，N-二甲基乙 醯胺等醯胺類等。 這些溶劑中，從溶解性、顏料之分散性及塗佈性等觀 -31 - (28) (28)200417755 點而言，較佳爲丙二醇單甲醚、乙二醇單甲醚乙酸酯 '丙 二醇單甲醚乙酸酯、丙二醇單***乙酸酯、二乙二醇二甲 醚、二乙二醇甲基***、2 -庚酮、3 -庚酮、環己酮、2 -羥 基丙酸乙酯、3 -甲氧基丙酸乙酯、3 -乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、3-甲氧基丁基乙酸酯、3-甲基-3-甲氧基 丁基丙酸酯 '乙酸正丁酯、乙酸異丁酯、甲酸正戊酯、乙 酸異戊酯、丙酸正丁酯、丁酸乙酯、丁酸異丙酯、丁酸正 丁酯、丙酮酸乙酯等，更理想爲丙二醇單甲醚乙酸酯、二 乙二醇甲基***、3 -乙氧基丙酸乙酯、3 -甲氧基丁基乙酸 酯、環己酮等。 前述溶劑可單獨使用或混合兩種以上使用。 又，上述溶劑可與苯甲基***、二正己醚、丙酮基丙 酮、異佛爾_、己酸、辛酸、1-辛醇、卜萘酚、苯甲醇、 乙酸苯甲酯、苯甲酸乙酯、草酸二乙酯、馬來酸二乙酯、 r-丁內醋、碳酸乙烯酯、碳酸丙烯酯、乙二醇單苯醚乙 酸酯等高沸點溶劑倂用。 這些高沸點溶劑可單獨使用或混合兩種以上使用。 溶劑之使用量並無特別限制，但就所得之輻射敏感性 組成物之塗佈性及安全性等觀點而言，使該組成物之不含 溶劑之各成分的合計濃度成爲5〜30重量％ ,更佳爲10〜 2 0重量％的量。 彩色濾光片用輻射線敏感性組成物之特性 本發明之彩色濾光片用輻射線敏感性組成物，其係具 有當表面張力爲B(mN/m)，黏度爲A(mPa.s)、且 -32- (29)200417755 形成著色層 所得之數値 理想爲2 . 〇 X 1 (Γ2的特^ 產生塗佈不 本發明 A V / B値相 形成彩色濾 與基板之潤 產品良率， 〇 本發明 2.0 m P a · s ^ 彩色濾光片 本發明 前述特性之 敏感性組成 塗機在基板 以下更 方法。 首先在 素陣列之部 之塗佈速度爲_ V(m/s)時，以（AxV+B) (以下稱爲「AV/ B値」）未達4.0 X 1 〇·2， x 1 〇·3 〜3.5 X 1 0·2，特別理想爲 2 · Ox 1 0·3 〜3.0 1'生。此時A V / B値爲4.0 X 1 (Γ2以上時，容易 均的傾向。 t彩色濾光片用輻射線敏感性組成物係藉由 ®足前述要件，因此利用狹縫模塗機在基板上 光片用著色層時，可保持狹縫噴嘴之吐出速度 濕性的高度平衡，不會產生塗佈不均，可以高 I高效率形成均勻膜厚之彩色濾光片用著色層 之彩色濾光片用輻射線敏感性組成物之黏度爲 ^8.0mPa· s，特別理想爲 2.0mPa· s〜6.0mPa 用著色層之形成方法 之彩色濾光片用著色層之形成方法係使用具有 彩色濾光片用輻射線敏感性組成物，該輻射線 物之塗佈速度爲〇· 07 m/ s以上，利用狹縫模 上形成彩色濾光片用著色層的方法。 具體說明本發明之彩色濾光片用著色層之形成 基板表面上，視需要形成遮光層以區分形成像 分，於該基板上藉由狹縫模塗機塗佈例如已有 -33- (30) (30)200417755 分散紅色顏料之輻射敏感性組成物。 接著，進行預烘烤，使溶劑蒸發形成塗膜，經由光罩 對此塗膜進行曝光後’特別理想爲使用鹼顯像液顯像，溶 解除去塗膜之未曝光部，然後藉由後烘烤在相同基板上形 成綠色像素陣列及藍色的像素陣列，可得到在基板上配置 紅色、綠色及藍色三原色之像素陣列的著色層。 但是本發明之各色之像素陣列的形成順序未被限定如 上述。 塗佈厚度爲去除溶劑後之膜厚一般爲0 . 1 μιη 〜1 0 μηι ，更理想爲0·2 μπι〜8·0 μηι，特別理想爲0.2 μιη〜6.0 μιη ο 形成著色層所使用之幅射線例如有可見光、紫外線、 遠紫外線、電子線、X射線等，而以波長爲190〜4 5 0nm 範圍之幅射線爲佳。 輻射線之曝光量理想爲1 0〜1 0,0 0 0 J / m2。 又，前述理想之鹼顯影液例如有碳酸鈉、氫氧化鈉、 氫氧化鉀、氫氧化四甲基銨、膽鹼、1，8 -二氮雜雙環-〔 5.4.0〕-7-十一烯、1，5-二氮雜雙環-〔4.3.0〕-5-壬烯等之 水溶液。 前述鹼顯影液中可添加適量之甲醇、乙醇等之水溶性 有機溶媒或界面活性劑等。鹼顯影後，通常進行水洗。 顯影處理法可應用淋洗顯影法、噴霧顯影法、浸漬顯 影法、攪拌顯影法等。顯影條件係在常溫下，5〜3 00秒 爲佳。 - 34- (31) (31)200417755 形成彩色濾光片之著色層時所使用之基板例如有玻璃 、聚矽氧、聚碳酸酯、聚酯、芳族聚醯胺、聚醯胺醯亞胺 、聚醯亞胺、聚醚、環狀烯烴之開環聚合物或其加氫物 等。 這些基板視需要可施與矽偶合劑等之藥品處理、電漿 處理、離子電鍍、濺鍍、氣相反應法、真空蒸鍍等適當之 前處理。 彩色濾光片 本發明之彩色濾光片係具有由本發明之彩色濾光片用 輻射線敏感性組成物所形成之著色層者。 本發明之彩色濾光片非常適合作爲穿透型或反射型之 彩色液晶顯示裝置、彩色攝影元件、彩色感知器等。 私色液晶顯不裝置 本發明之彩色液晶顯示裝置係具備本發明之彩色濾光 片者。 本發明之彩色液晶顯示裝置可採用適當的構造。例如 與配置薄膜電晶體（TFT )之驅動用基板不同之基板上， 製作彩色濾光片，而驅動用基板與彩色濾光片經由液晶層 對向配置的構造。另外也可採用在配置薄膜電晶體（TFT )之驅動用基板表面上形成彩色濾光片的基板，與形成 1 τ 〇 (摻雜錫之氧化銦）電極之基板經由液晶層對向配置 的構造。後者之構造可格外提昇開口率，可獲得明亮、高 -35- (32) (32)200417755 精細之顯示元件。 〔實施例〕 以下’舉實施例更具體說明本發明之實施形態。但本 發明並不限定於下列實施例。 實施例1 混合（A )顏料之C · I ·顏料紅2 5 4與C . I.顏料黃1 3 9 之6 5 / 3 5 (重量比）混合物4 0重量份、（B )鹼可溶性 樹脂之甲基丙烯酸/苯乙烯/苯甲基甲基丙烯酸酯/甘油 基單甲基丙烯酸酯/ N-苯基順丁烯二胺共聚物（共聚重量 比=15 / 15/ 35/ 10/ 25，Mw=30,000、Mn=10,000) 70 重量份、（C )多官能性單體之六丙烯酸二季戊四醇酯8 〇 重量份、（D)光自由基產生劑之2 -苯甲基-2-二甲胺基--嗎啉基苯基）丁酮q 50重量份及（e)溶劑之丙二 醇單甲醚乙酸酯1 5 0 0 0重量份，調製組成物（R1 )。 組成物（R1 )之黏度係藉由EL型黏度計（東機產業 (股）製DVM-EII型：測定溫度25°C、以20 rpm在30 秒後所測定之數値爲黏度値）測定，測得黏度爲3.6 mPa • s ’以Dynometer ((股）島津製作所製）測定表面張 力’測得表面張力2 7 mN / m。 &lt;塗膜之形成&gt; 使用狹縫模塗機（東京應化工業（股）製T R 6 3 2 1 0 S- -36- (33) (33)200417755 CL )，塗佈速度爲 〇.〇7m/ s、0.11 m/s 或 〇.15m/ s， 將組成物（R1 )旋轉塗佈於表面上形成防止鈉離子溶出之 Si〇2膜之鈉釣玻璃基板（1，1〇〇 mmxl，250 mm)表面之 1，0 8 0 m m X 1，2 3 0 m m (由基板之各端緣往內側各 1 〇 m m 之區域內）上，然後使溶劑揮發，製作3片分別形成膜厚 2.0 μπι之塗膜的基板。 此時，組成物（R1 )之 A V / Β値配合塗佈速度依序 爲 9·3χ10·3，14·7χ10·3 及 20.0xl0·3。 &lt;塗佈性之評價&gt; 塗佈後之塗膜表面以鈉燈光照射，進行觀察時，全區 域未發現乾燥斑等外觀上之問題的塗佈斑時，評價爲良好 ，有塗佈斑時，評價爲不良，結果如表1所示。 如圖1所示，測定由基板1之各端緣往內側各1 〇mm 之細線所圍繞之區域所形成之塗膜2，包括塗膜之端緣部 與其附近部及中央部共計3 5個測定點（黑色圓點）測定 膜厚時，若所有的測定點之膜厚偏差在± 〇 . 1 〇 μιη以內， 顯示非常均勻之塗佈性時，評價爲優良，膜厚偏差在土 0.2 0 μιη以內，顯示非常均勻之塗佈性時，評價爲良好， 月吴厚偏差超過ί〇.20 μιη時5評價爲不良。 實施例2 混合（Α)顏料之C.I·顏料綠36與C.I.顏料黃138之 60/ 40 (重量比）混合物60重量份、（Β )鹼可溶性樹脂 -37 - (34) (34)200417755 之甲基丙烯酸/苯乙烯/苯甲基甲基丙烯酸酯/甘油基單 甲基丙烯酸酯/ N -苯基順丁烯二胺共聚物（共聚重量比 = 15/ 15/ 35/ 10/25，Mw = 30,000、Mn = l 0,〇〇〇 ) 7〇 重 量份、（C)多官能性單體之六丙烯酸二季戊四醇酯80重 量份、（D)光自由基產生劑之2-苯甲基-2-二甲胺基·：!-(4 -嗎啉基苯基）丁酮-丨5 〇重量份及（e )溶劑之3 -甲氧 基丁基乙酸酯8 00重量份，調製組成物（R2 )。 與實施例1相同測定組成物（R2 )之黏度及表面張力 的結果及AV / B値如表1所示。 與實施例1相同評價塗佈性，結果如表1所示。 實施例3 混合（A )顏料之C · I ·顏料紅2 5 4與C . I.顏料黃1 3 9 之6 5 / 3 5 (重量比）混合物9 0重量份、（B )鹼可溶性 樹脂之甲基丙烯酸/苯乙烯/苯甲基甲基丙烯酸酯/甘油 基單甲基丙;(¾酸酯/ N-苯基順丁烯二胺共聚物（共聚重量 J±=15/15/35/1〇/25，Mw=155〇〇〇、Mn = 6,000) 7 0 重 量份、（C )多官能性單體之六丙烯酸二季戊四醇酯8 〇重 量份、（D)光自由基產生劑之2-苯甲基-2-二甲胺基-1-(4 -嗎啉基苯基）丁酮-1 30重量份及（E)溶劑之丙二醇 單甲醚乙酸酯1，5 00重量份，調製組成物（r3 )。 與實施例1相同測定組成物（R3 )之黏度及表面張力 的結果及A V / B値如表1所示。 與實施例1相同評價塗佈性，結果如表1所示。 -38- (35) (35)200417755 實施例4 混合（A )顏料之C · I ·顏料綠3 6與C · I.顏料黃1 3 8之 6 〇 / 4 0 (重量比）混合物1 〇 〇重量份、（B )鹼可溶性樹 脂之甲基丙烯酸/苯乙烯/苯甲基甲基丙烯酸酯/甘油基 單甲基丙烯酸酯/ N-苯基順丁烯二胺共聚物（共聚重量比 / 15 / 35 / 10 / 25，Mw=12,000、Μη = 5?000 ) 70 重量 份、（C )多官能性單體之六丙烯酸二季戊四醇酯8 0重量 份、（D)光自由基產生劑之2 -苯甲基-2-二甲胺基-1-( 4 ·嗎啉基苯基）丁酮-1 3 0重量份及（E )溶劑之3 -甲氧基 丁基乙酸酯1，2 0 0重量份，調製組成物（R4 )。 與實施例1相同測定組成物（R4 )之黏度及表面張力 的結果及A V / B値如表1所示。 與實施例1相同評價塗佈性，結果如表1所示。 實施例5 除了實施例1之丙二醇單甲醚乙酸酯的量改爲7 0 0重 量份外，其餘與實施例〗相同調製組成物（R5 )。 與實施例1相同測定組成物（R5 )之黏度及表面張力 的結果及A V / B値如表1所示。 與實施例1相同評價塗佈性，結果如表1所示。 實施例6 混合（A)顏料之c.l顏料紅254與C.I·顏料黃I77 之9 0 / 1 0 (重量比）混合物8 0重量份、（B )鹼可溶性 -39 (36) (36)200417755 樹脂之甲基丙烯酸/苯乙烯/苯甲基甲基丙烯酸酯/甘油 基單甲基丙烯酸酯/ N-苯基順丁烯二胺共聚物（共聚重量 比二 15/20/30 / 10/25，Mw=15,〇〇〇、Mn = 65000 ) 6 0 重 量份、（C )多官能性單體之六丙烯酸二季戊四醇酯9 0重 纛份、（D)光自由基產生劑之2-苯甲基-2-二甲胺基-卜 (4-嗎啉基苯基）丁酮_1/2,2’-雙（254-二氯苯基）-4,4，，5,5、四苯基-1,2、聯二咪唑/4,4、雙（二乙胺基）二 苯甲酮之30/4/2/4(重量比）混合物40重量份及（E )溶劑之3 -乙氧基丙酮酸乙酯/丙二醇單甲醚乙酸酯50 / 50 (重量比）1，400重量份，調製組成物（R6 )。 與實施例1相同測定組成物（R6 )之黏度及表面張力 的結果及A V / B値如表1所示。 與實施例1相同評價塗佈性，結果如表1所示。 實施例7 混合（A )顏料之C.I.顏料藍1 5 : 6與C.I.顏料紫23 之9 7 / 3 (重量比）混合物8 0重量份、（B )鹼可溶性樹 脂之甲基丙烯酸/苯乙烯/苯甲基甲基丙烯酸酯/甘油基 輩甲基丙烯酸酯/ N-苯基順丁烯二胺共聚物（共聚重量比 &lt; 1 5 / 1 5 / 3 0 / 1 0/ 3 0，Mw=1 2,000、Mn = 5,000 ) 6 5 重量 份、（C )多官能性單體之六丙烯酸二季戊四醇酯8 5重量 份、（D)光自由基產生劑之2 -甲基-1-(心甲基苯硫基 )-2-嗎啉基丙酮-1/2,2’-雙（2,4-二氯苯基）-4,4’，5,5，-四苯基-1，2，-聯二咪唑/ 2-毓基苯并噻唑/ 4,4’-雙（二乙 - 40- (37) 200417755 胺基）二苯甲酮之30 / 3/ 2 / 5 (重量比）混合物 量份及（E )溶劑之3 -乙氧基丙酮酸乙酯/丙二醇 乙酸酯/二乙二醇甲基***之 45/40/15 (重 1，600重量份，調製組成物（R7 )。 與實施例1相同測定組成物（R7 )之黏度及赛 的結果及AV/ B値如表1所示。 與實施例1相同評價塗佈性，結果如表1所示 40重 單甲醚 量比） 面張力 -41 - (38)200417755For example, the above aliphatic amine n-propylamine, isopropylamine, n-butylamine, isobutylamine, butylamine second, third butylamine, n-pentylamine, n-hexylamine, etc. mono (cyclo) alkylamines; methylethylamine, Di (cyclo) alkylamines such as diethylamine, methyl-n-propylamine, ethyl-n-propylamine, di-n-propylamine, diisopropylamine, di-n-butylamine, diisobutylamine, second-second butylamine, and second-third butylamine Class; dimethylethylamine, methyldiethylamine, triethylamine, dimethyl-n-propylamine, diethyl-n-propylamine, methyl-di-n-propylamine, ethyl-di-n-propylamine, tri-n-propylamine, triisopropylamine, Tri (cyclo) alkylamines such as tri-n-butylamine, tri-isobutylamine, tri-second butylamine, and tri-third butylamine; -27- (24) (24) 200417755 2-aminoethanol, 3-amine -Monol (cyclo) alkanolamines such as propanol, propan-2-propanol, 4-amino-1-butanol; diethanolamine, di-n-propanolamine, diisopropanolamine, di-n-propanol butanolamine, diisobutanolamine other two (cyclo) alkanolamines; triethanolamine, n-propanolamine, triisopropanolamine, tri-n-butanol amine, isobutanol amine three tri (cyclo) Alkanolamines; 3-amino-1,2-propanediol, 2-amino-1 3-propanediol, 4-amino-1,2-butanediol, 4-amino-1,3-butanediol, 3-dimethylamino-1,2-propanediol, 3-diethylamino- Amino (cyclo) alkanediols such as 1,2-propanediol, 2-dimethylamino-1,3-propanediol, 2-diethylamino-1,3-propanediol; yS -alanine, 2-amine acid, 3,3-aminobutyric acid, 4-aminobutyric acid, 2-amino isobutyric acid, 3-amino-isobutyric acid and the like amino acids. And, a phenyl amine-containing compound, for example, a phenyl group bonded to an amine compound, the amine via a carbon chain knot direct bond to the phenyl. Examples of phenyl-containing amines include aniline, o-methylaniline, m-methylaniline, p-methylaniline, p-ethylaniline, 1-naphthylamine, 2-naphthylamine, N, N- diethyl aniline, - methyl -N, N- dimethylaniline and aromatic amines; o - amino benzyl alcohol, meta - amino benzyl alcohol, - amino benzyl alcohol, - dimethylamine benzene alcohol, - diethylamine phenyl group such as methanol aminobenzylalcohols y o - amino phenol, m - amino phenol, p - amino phenol, p - dimethylamino phenol, p - diethyl Aminophenols such as aminoaminophenol; m-aminobenzoic acid, p-aminobenzoic acid, p-dimethylaminobenzyl-28- (25) (25) 200417755 acid, p-diethylamino Aminobenzoic acids such as benzoic acid. The organic amine compounds, or the contamination from residual film and the like for the perspective of solubility in the following solvents and preventing an unexposed portion of the substrate and the light-shielding layer g 'of aliphatic amine to mono (cycloalkyl) amines and amine alcohols homes (cyclo) glycols preferably homes, particularly 2-aminoethanol, 3-amino-1-propanol, amino - ^ pentanol, 3 • amino - 1,2 - propanediol '2 - group -1,3-propanediol, 4-amino-1,2-butanediol, etc. are more preferable, and amines containing phenyl group are preferably aminophenols, especially o-aminophenol, m-aminophenol , P-aminophenol and the like are more preferable. The organic amine compound may be used alone or in combination of two or more. When the amount of the organic amine compound is 100 parts by weight based on the total of (A) to (D) components and additives, 15 parts by weight or less is generally used. It is preferably 10 parts by weight or less. If the amount of the organic amine compound used exceeds 15 parts by weight, the adhesion between the colored layer and the substrate tends to decrease. Other additives, for example: copper brewing blue pigment derivative or yellow pigment derivative Celadon derivatives of dispersing aid; glass, alumina and other filling agents Chen; polyvinyl alcohol, polyethylene glycol monoalkyl ethers, Polymer compounds such as poly (fluoroalkyl acrylates); non-ionic, cationic, anionic surfactants: vinyltrimethoxysilane, vinyltriethoxysilane, vinyl ginseng (2-methyl) Ethoxyethoxy) silane, N- (2-aminoethyl) -3-aminopropyl · -29- (26) 200417755 methyl · dimethoxysilane, N- (2-aminoethyl)- 3 -aminopropyltriylsilane, 3 -aminopropyltriethoxysilane, 3 -glycidoxypropyloxy, 3 -glycidoxypropyl, methyl, dimethyl sand group hospital epoxycyclohexyl) ethyl trimethoxy Silane, 3-chloropropyl dimethoxy silane-Kiki, 3_ chloropropyl trimethoxy Silane, 3 - methyl acyl trimethoxysilane Oxysilane, 3-methylpropyltrimethoxysilane adhesion promoter; 2,2-thiobis (4-methyl-6-third butylphenol), 2,6-di-third phenol, etc. oxidants; 2- (3-butyl-5- 2-hydroxyphenyl) -5-chlorobenzotrialkoxybenzophenones and other ultraviolet absorbers; Anticoagulants such as sodium polyacrylate; 1,1 '· azobis (cyclohexane-bu Nitrile), thermal radical generators such as 2-phenylazo-4-yl-2,4-dimethylvaleronitrile and the like. One (E) solvent — The solvent of the present invention may be suitable as long as it can disperse or dissolve the components constituting the radiation-sensitive composition A) to (D) or the additive components, and these components react, and have moderate volatility. Optional. Examples of such solvents are: ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-propyl ether glycol, mono-n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, and glycol Mono-n-propyl ether, diethylene glycol mono-n-butyl ether, triethylene glycol monomethyl ether, methoxytrimethyl, 2-• methyl propylene, etc. are connected to butyl mouth, methoxy (not with optional, ethylene glycol- 30- (27) (27) 200 417 755 ethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether 'propylene glycol mono n-propyl ether, propylene glycol mono-n-butyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monomethyl n-propyl ether, dipropylene glycol mono-n-butyl ether, tripropylene glycol monomethyl ether, triethylene glycol monoethyl ether of (poly) alkylene glycol monoalkyl ether and ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether (Poly) alkanediol monoalkane ethers such as acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, and the like acetates; diethylene glycol monomethyl dimethyl ether, diethylene glycol methyl ether, diethylene glycol diethyl ether, tetrahydrofuran and other ethers; Ketones such as methyl ethyl ketone, 2-heptanone '3-heptanone, cyclohexanone; alkyl lactates such as methyl hydroxypropionate and ethyl 2-hydroxypropionate; 2-hydroxy-2-methyl Ethyl propionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl ethoxyacetate Ester, ethyl hydroxyacetate, methyl 2-hydroxy-3-methylbutanoate, 3-methyl-3-methoxybutylpropionate, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, n-amyl formate, isoamyl acetate, n-butyl propionate, ethyl butyrate, n-propyl, isopropyl butyrate, n-butyl butyrate, acetone Methyl ester, ethyl pyruvate, n-propyl pyruvate, methyl ethyl acetate, ethyl ethyl acetate, ethyl 2-oxobutyrate and other esters; aromatic hydrocarbons such as toluene and xylene; these solvents, solubility, pigment dispersibility and coating properties of N- methylpyrrolidone, N, N- dimethylformamide, N, N- dimethylacetamide, etc., etc. Amides Guan-31-(28) (28) 200417755, preferably propylene glycol mono Ether, ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, diethylene glycol dimethyl ether, diethylene glycol methyl ether, 2-heptanone, 3- heptanone, cyclohexanone, 2 - hydroxypropionate, ethyl 3 - methoxypropionate, ethyl 3 - methyl ethoxypropionate, ethyl 3-ethoxypropionate, 3-methoxy Butyl acetate, 3-methyl-3-methoxybutyl propionate 'n-butyl acetate, isobutyl acetate, n-amyl formate, isoamyl acetate, n-butyl propionate, butyric acid ethyl, isopropyl butyrate, n-butyl butyrate, ethyl pyruvate, more preferably propylene glycol monomethyl ether acetate, diethylene glycol methyl ether, 3 - ethyl ethoxypropionate, 3 - methoxybutyl acetate, and cyclohexanone. The aforementioned solvents can be used alone or in combination of two or more. And the solvent may be benzyl ethyl ether, di-n-hexyl ether, acetonyl acetone, isophorone _, caproic acid, caprylic acid, 1-octanol, Bu naphthol, benzyl alcohol, benzyl acetate, ethyl benzoate , Diethyl oxalate, diethyl maleate, r-butyrolactone, ethylene carbonate, propylene carbonate, ethylene glycol monophenyl ether acetate and other high boiling point solvents. These high boiling point solvents can be used alone or in combination of two or more. The amount of solvent is not particularly limited, but is sensitive to the composition of the coating properties of the resulting radiation and other safety viewpoint, the respective components of the composition excluding the solvent of the total concentration of 5~30 wt% , more preferably an amount of 10~ 20% by weight of. Color filter radiation-sensitive composition characteristics of the color filter of the present invention with a radiation sensitive composition which is based has a surface tension when B (mN / m), a viscosity of A (mPa.s) And -32- (29) 200417755 The number 所得 obtained by forming the colored layer is preferably 2.0 × 1 (the characteristic of Γ2). The yield of the product obtained by applying the AV / B phase of the present invention to form a color filter and a substrate, 〇 The 2.0 m P a · s ^ color filter of the present invention has a sensitive composition coating machine of the aforementioned characteristics of the present invention below the substrate. First, when the coating speed of the element array is _ V (m / s), (AxV + B) (hereinafter referred to as "AV / B 値") is less than 4.0 X 1 〇 · 2, x 1 〇 · 3 ~ 3.5 X 1 0 · 2, particularly preferably 2 · Ox 1 0 · 3 ～ 3.0 1 '. At this time, AV / B 値 is 4.0 X 1 (at Γ2 or more, the tendency to be uniform is easy. T The radiation-sensitive composition for color filters is based on the above-mentioned requirements, so the slit mold is used. coater the substrate sheet by coating a colored layer may be kept slit nozzle discharge velocity of the highly balanced wet, coating unevenness does not occur, can be formed with high efficiency are high I The viscosity of the radiation-sensitive composition for the color filter of the color layer for the color filter with a uniform film thickness is ^ 8.0 mPa · s, and it is particularly preferably 2.0 mPa · s to 6.0 mPa. the method for forming a colored filter layer system using the radiation sensitive composition for a color filter with a coating speed of the radiation object is square · 07 m / s or more, using the color filter is formed on a slot die A method for forming a colored layer for a sheet. Specifically, on the surface of a substrate on which the colored layer for a color filter of the present invention is formed, a light-shielding layer is formed as needed to distinguish the image components, and the substrate is coated with a slit die coater, for example. There are -33- (30) (30) 200417755 radiation-sensitive compositions for dispersing red pigments. Next, pre-baking is performed to evaporate the solvent to form a coating film, and this coating film is exposed through a photomask. Develop with alkali developing solution, dissolve and remove the unexposed part of the coating film, and then form a green pixel array and a blue pixel array on the same substrate by post-baking to obtain red, green and blue on the substrate the three primary colors The coloring layer of the element array. However, the formation order of the pixel array of each color of the present invention is not limited as described above. The coating thickness is generally from 0.1 μm to 1 0 μm, and more preferably 0.2. μπι ~ 8 · 0 μηι, particularly preferably 0.2 μιη ~ 6.0 μιη ο The radiation used to form the colored layer includes visible light, ultraviolet light, far ultraviolet light, electron rays, X-rays, etc., and the wavelength is 190 ~ 4 50 nm A range of rays is preferred. The exposure of the radiation is preferably 10 to 10,0 0 0 J / m2. Further, the alkali developer is ideal e.g. sodium carbonate, sodium hydroxide, potassium hydroxide, tetramethylammonium hydroxide, choline, 1,8 - diazabicyclo - [5.4.0] undec-7 Aqueous solution of alkene, 1,5-diazabicyclo- [4.3.0] -5-nonene and the like. An appropriate amount of a water-soluble organic solvent such as methanol, ethanol, or a surfactant may be added to the alkali developing solution. After alkali development, it is usually washed with water. As the development treatment method, a shower development method, a spray development method, an immersion development method, and a stirring development method can be applied. The developing conditions are at room temperature, preferably from 5 to 300 seconds. -34- (31) (31) 200417755 The substrate used when forming the coloring layer of a color filter is, for example, glass, polysiloxane, polycarbonate, polyester, aromatic polyamide, polyimide , Polyimide, polyether, ring-opening polymers of cyclic olefins or their hydrogenation products. These substrates may be administered as required by chemical treatment of the silicon coupling agent, plasma treatment, ion plating, sputtering, vapor phase reaction process prior to an appropriate method, vacuum vapor deposition. Color filter The color filter of the present invention has a coloring layer formed of the radiation-sensitive composition for a color filter of the present invention. The color filter of the present invention is very suitable as a transmissive or reflective color liquid crystal display device, a color photographing element, a color sensor, and the like. Private color liquid crystal display device The color liquid crystal display device of the present invention is provided with the color filter of the present invention. The color liquid crystal display device of the present invention can adopt an appropriate structure. For example, a structure in which a color filter is produced on a substrate different from a driving substrate on which a thin film transistor (TFT) is arranged, and the driving substrate and the color filter are arranged to face each other via a liquid crystal layer. Further the substrate may also be formed with a color filter disposed on the substrate surface in a thin film transistor (TFT) of the drive, with the formation of 1 τ billion (tin-doped indium oxide) electrodes on the substrate via a liquid crystal layer structure disposed . The latter structure can significantly increase the aperture ratio, and can obtain bright, high -35- (32) (32) 200417755 fine display elements. [Embodiments] Hereinafter, embodiments of the present invention will be described more specifically with reference to examples. However, the present invention is not limited to the following examples. Example 1 (A) Pigment C · I · Pigment Red 2 5 4 and C. I. Pigment Yellow 1 3 9 6 5/3 5 (weight ratio) mixture 40 parts by weight, (B) alkali-soluble resin Methacrylic acid / styrene / benzyl methacrylate / glyceryl monomethacrylate / N-phenyl maleic acid diamine copolymer (copolymerization weight ratio = 15/15/35/10/25, (Mw = 30,000, Mn = 10,000) 70 parts by weight, (C) dipentaerythritol hexaacrylate, 80 parts by weight, (D) 2-benzyl-2-dimethylformate of photoradical generator 50 parts by weight of amino-morpholinylphenyl) butanone q and (e) 1 500 parts by weight of propylene glycol monomethyl ether acetate of the solvent were prepared as a composition (R1). Composition (R1) by the viscosity-based EL type viscometer (Toki Sangyo (shares) manufactured DVM-EII type: measurement temperature 25 ° C, measured in the number of 20 rpm after 30 seconds of viscosity Zhi Zhi) assay The measured viscosity was 3.6 mPa • s 'The surface tension was measured with a Dynameter (made by Shimadzu Corporation)' and the surface tension was measured at 27 mN / m. &lt; Formation of coating film &gt; Using a slit die coater (TR 6 3 2 1 0 S- -36- (33) (33) 200417755 CL) manufactured by Tokyo Inochemical Industry Co., Ltd., the coating speed was 0. 〇7m / s, 0.11m / s or 0.15m / s, spin coating the composition (R1) on the surface to form a sodium fishing glass substrate (1, 100mmxl) to prevent the dissolution of sodium ions from the Si〇2 film , 250 mm) on the surface of 1,0 0 0 mm X 1,2 3 0 mm (from the end edges of the substrate to the inner area of 10 mm each), and then the solvent was volatilized to make 3 pieces to form a film thickness. 2.0 μm coated substrate. At this time, the A V / Β 値 compounding coating speed of the composition (R1) was 9 · 3x10 · 3, 14.7x10 · 3, and 20.0x10 · 3 in that order. &lt; Evaluation of coating properties &gt; When the surface of the coating film after coating was irradiated with sodium light, when observation was made, no coating problems such as dry spots on the entire area were found, the evaluation was good and there were coating spots At that time, it was evaluated as bad, and the results are shown in Table 1. 1, the coating film was measured by the respective end edge of the substrate 1 to a region inside of each of the thin line around the 〇mm formed of 2, includes a film portion of the end edge portion and the central portion in the vicinity thereof Total 3 5 Measurement points (black dots) When the film thickness is measured, if the film thickness deviation of all the measurement points is within ± 0.10 μm, when the coating property is very uniform, the evaluation is excellent, and the film thickness deviation is 0.2. When the coating property was very uniform within μm, the coating was evaluated as good, and when the thickness deviation was more than 0.20 μm, 5 was evaluated as bad. Example 2 60% by weight of a 60/40 (weight ratio) mixture of CI Pigment Green 36 and CI Pigment Yellow 138 mixed with (A) pigment, (B) Alkali-soluble resin-37-(34) (34) 200417755 Acrylic acid / styrene / benzyl methacrylate / glyceryl monomethacrylate / N-phenyl butene diamine copolymer (copolymerization weight ratio = 15/15/35 / 10/25, Mw = 30,000, Mn = 10, 000) 70 parts by weight, (C) 80 parts by weight of dipentaerythritol hexaacrylate of polyfunctional monomer, (D) 2-benzyl-2 of photoradical generator -Dimethylamino group:!-(4-morpholinylphenyl) butanone-500 parts by weight and (e) 8,000 parts by weight of 3-methoxybutyl acetate, to prepare a composition (R2). Table 1 shows the results of measuring the viscosity and surface tension of the composition (R2) in the same manner as in Example 1. The applicability was evaluated in the same manner as in Example 1. The results are shown in Table 1. Example 3 (A) Pigment C · I · Pigment Red 2 5 4 and C. I. Pigment Yellow 1 3 9 6 5/3 5 (weight ratio) mixture 90 parts by weight, (B) alkali-soluble resin Of methacrylic acid / styrene / benzyl methacrylate / glyceryl monomethyl propylene; (¾ester / N-phenylcis-butene diamine copolymer (copolymerization weight J ± = 15/15/35 / 1〇 / 25, Mw = 155,000, Mn = 6,000) 70 parts by weight, (C) 80 parts by weight of dipentaerythritol hexaacrylate of polyfunctional monomer, (D) of photoradical generator 2-benzyl-2-dimethylamino-1- (4 - morpholinophenyl) -butanone-1 and 30 parts by weight (E) of the solvent propylene glycol monomethyl ether acetate 00 parts by weight of 1,5 The composition (r3) was prepared. The results of measuring the viscosity and surface tension of the composition (R3) and AV / B 値 are the same as those in Example 1. Table 1 shows the same applicability as in Example 1, and the results are shown in Table 1. Shown as 1. -38- (35) (35) 200417755 Example 4 (A) Pigment C · I · Pigment Green 3 6 and C · I.Pigment Yellow 1 3 8-6 〇 / 4 0 (weight ratio ) Mixture of 1000 parts by weight, (B) methacrylic acid of alkali-soluble resin / Ethylene / benzyl methacrylate / glyceryl monomethacrylate / N-phenyl butene diamine copolymer (copolymerization weight ratio / 15/35/10/25, Mw = 12,000, Mn = 5? (000) 70 parts by weight, (C) dipentaerythritol hexaacrylate, 80 parts by weight, (D) 2-benzyl-2-dimethylamino-1- ( 4 · morpholinylphenyl) butanone-1 3 0 parts by weight and (2) 3-methoxybutyl acetate (1,2) parts by weight of the solvent, to prepare a composition (R4). 1 The results of measuring the viscosity and surface tension of the same composition (R4) and AV / B 値 are shown in Table 1. The applicability was evaluated in the same manner as in Example 1, and the results are shown in Table 1. Example 5 Except Example 1 Except that the amount of propylene glycol monomethyl ether acetate was changed to 700 parts by weight, the rest were the same as in Example 1 to prepare the composition (R5). The results of measuring the viscosity and surface tension of the composition (R5) were the same as in Example 1. Table 1 and AV / B 値 are shown in Table 1. The applicability was evaluated in the same manner as in Example 1. The results are shown in Table 1. Example 6 (A) Pigment Cl Pigment Red 254 and CI · Pigment Yellow I77-9 0/1 0 (weight ratio) mixture 80 parts by weight, (B) alkali-soluble -39 (36) (36) 200417755 resin methacrylic acid / styrene / benzyl methacrylate / glyceryl monomethyl Acrylate / N-phenyl butene diamine copolymer (copolymerization weight ratio of 15/20/30/10/25, Mw = 15,000, Mn = 65000) 60 parts by weight, (C) 90 parts by weight of dipentaerythritol hexaacrylate, (D) 2-benzyl-2-dimethylamino-bu (4-morpholinylphenyl) butanone (D) as a photoradical generator _1 / 2,2'-bis (254-dichlorophenyl) -4,4,5,5, tetraphenyl-1,2, biimidazole / 4,4, bis (diethylamino) 40/4/2/4 (weight ratio) mixture of benzophenone and (E) ethyl 3-ethoxypyruvate / propylene glycol monomethyl ether acetate 50/50 (weight ratio) of the solvent 1,400 parts by weight to prepare a composition (R6). Table 1 shows the results of measuring the viscosity and surface tension of the composition (R6) in the same manner as in Example 1. The applicability was evaluated in the same manner as in Example 1. The results are shown in Table 1. Example 7 CI Pigment Blue 15: 6 mixed with (A) pigment and CI Pigment Violet 23 of 9 7/3 (weight ratio) mixture 80 weight part, (B) methacrylic acid / styrene / Benzyl methacrylate / glyceryl methacrylate / N-phenyl butene diamine copolymer (copolymerization weight ratio &lt; 1 5/1 5/3 0/1 0/3 0, Mw = 1 2,000, Mn = 5,000) 6 5 parts by weight, (C) dipentaerythritol hexaacrylate, a polyfunctional monomer, 8 5 parts by weight, (D) 2-methyl-1- (cardiomethyl) Phenylphenylthio) -2-morpholinylacetone-1 / 2,2'-bis (2,4-dichlorophenyl) -4,4 ', 5,5, -tetraphenyl-1,2, -Bisimidazole / 2-Yenylbenzothiazole / 4,4'-bis (diethyl-40- (37) 200417755 amino) benzophenone 30/3/2/5 (weight ratio) mixture amount (E) 45-40 / 15 of ethyl 3-ethoxypyruvate / propylene glycol acetate / diethylene glycol methyl ether (weight: 1,600 parts by weight) to prepare a composition (R7). The viscosity of the composition (R7), the results of the measurement, and the AV / B 値 are the same as in Example 1. Table 1 shows the same evaluation as in Example 1. Coatability, the results shown in Table 1. monomethyl ether 40 weight ratio) the surface tension -41-- (38) 200 417 755

-42- (39) 200417755 【圖式簡單說明】 圖1係膜厚測定要領的說明圖。 符號說明 1 :基板 2 :塗膜 -43 --42- (39) 200417755 [Brief description of the drawings] Figure 1 is an explanatory diagram of the method for measuring the film thickness. Explanation of Symbols 1: Substrate 2: Coating -43-

Claims (1)

200417755 ⑴ 拾、申請專利範圍 1 ·—種彩色濾光片用輻射線敏感性組成物’其係含有 (A )顏料、（B )鹼可溶性樹脂、（C )多官能性單體、 (D )光自由基引發劑及（E )溶媒之輻射線敏感性組成 物，其特徵係黏度爲A ( mPa · s )、其表面張力爲B ( mN/ m )，且形成著色層之塗佈速度爲V ( m/ s )時，以 (A X V - B )所得之數値未達4.Oxl〇_2，用於狹縫模塗機 之塗佈。 2 .如申請專利範圍第1項之彩色濾光片用輻射線敏感 性組成物，其中輻射線敏感性組成物之黏度爲2.0 mP a · s 〜8 · 0 m P a · s 〇 3 · —種彩色濾光片，其特徵係具有由如申請專利範圍 第1或2項之彩色濾光片用輻射線敏感性組成物所形成之 著色層。 4 · 一種彩色液晶顯不裝置’其特徵係具備如申請專利 範圍第3項之彩色濾光片。 5 · —種彩色濾光片用著色層的形成方法，其特徵係使 用如申請專利範圍第1或2項之彩色濾光片用輻射線敏感 性組成物，在基板上形成著色層的方法，其中該輻射線敏 感性組成物之塗佈速度爲〇 . 〇 7 m / s以上，利用狹縫模塗 機來形成。 -44 -200417755 拾 Patent application scope 1 · A radiation-sensitive composition for color filters' which contains (A) pigment, (B) alkali-soluble resin, (C) polyfunctional monomer, (D) The radiation-sensitive composition of the photo-radical initiator and (E) solvent is characterized by a viscosity of A (mPa · s), a surface tension of B (mN / m), and a coating speed to form a colored layer is At V (m / s), the number obtained by (AXV-B) is less than 4.0xl0_2, which is used for the coating of a slit die coater. 2. The radiation-sensitive composition for a color filter according to item 1 of the patent application scope, wherein the viscosity of the radiation-sensitive composition is 2.0 mP a · s to 8 · 0 m P a · s 〇3 · — A color filter is characterized by having a coloring layer formed of a radiation-sensitive composition for a color filter as described in item 1 or 2 of the patent application. 4. A color liquid crystal display device is not 'further includes a system such as the patented scope Item of the color filter 3. 5-A method for forming a colored layer for a color filter, which is characterized by using a radiation-sensitive composition for a color filter as described in item 1 or 2 of the patent application to form a colored layer on a substrate, The radiation-sensitive composition has a coating speed of 0.07 m / s or more, and is formed using a slot die coating machine. -44-
TW092132336A 2002-12-19 2003-11-18 Radiation sensitive composition for color filter, color filter, manufacturing method of liquid crystal color display, and forming method of colored layer of color filter TWI264564B (en)

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