SG81886A1 - Tetraphenol compounds & process for producing the same - Google Patents
Tetraphenol compounds & process for producing the sameInfo
- Publication number
- SG81886A1 SG81886A1 SG9606126A SG1996006126A SG81886A1 SG 81886 A1 SG81886 A1 SG 81886A1 SG 9606126 A SG9606126 A SG 9606126A SG 1996006126 A SG1996006126 A SG 1996006126A SG 81886 A1 SG81886 A1 SG 81886A1
- Authority
- SG
- Singapore
- Prior art keywords
- producing
- same
- tetraphenol compounds
- tetraphenol
- compounds
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C245/00—Compounds containing chains of at least two nitrogen atoms with at least one nitrogen-to-nitrogen multiple bond
- C07C245/02—Azo compounds, i.e. compounds having the free valencies of —N=N— groups attached to different atoms, e.g. diazohydroxides
- C07C245/06—Azo compounds, i.e. compounds having the free valencies of —N=N— groups attached to different atoms, e.g. diazohydroxides with nitrogen atoms of azo groups bound to carbon atoms of six-membered aromatic rings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
- C07C309/01—Sulfonic acids
- C07C309/28—Sulfonic acids having sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
- C07C309/45—Sulfonic acids having sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing nitrogen atoms, not being part of nitro or nitroso groups, bound to the carbon skeleton
- C07C309/52—Sulfonic acids having sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing nitrogen atoms, not being part of nitro or nitroso groups, bound to the carbon skeleton the carbon skeleton being further substituted by doubly-bound oxygen atoms
- C07C309/53—Sulfonic acids having sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing nitrogen atoms, not being part of nitro or nitroso groups, bound to the carbon skeleton the carbon skeleton being further substituted by doubly-bound oxygen atoms the carbon skeleton containing carbon atoms of quinone rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C39/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
- C07C39/12—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings
- C07C39/15—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings with all hydroxy groups on non-condensed rings, e.g. phenylphenol
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP07048219A JP3139319B2 (ja) | 1995-03-08 | 1995-03-08 | テトラフェノール系化合物、その製法および用途 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG81886A1 true SG81886A1 (en) | 2001-08-21 |
Family
ID=12797311
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG9606126A SG81886A1 (en) | 1995-03-08 | 1996-02-29 | Tetraphenol compounds & process for producing the same |
Country Status (6)
Country | Link |
---|---|
US (1) | US5726217A (ja) |
EP (1) | EP0731074B1 (ja) |
JP (1) | JP3139319B2 (ja) |
KR (1) | KR100395581B1 (ja) |
DE (1) | DE69604314T2 (ja) |
SG (1) | SG81886A1 (ja) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3512191B2 (ja) * | 1994-09-12 | 2004-03-29 | シーメンス アクチエンゲゼルシヤフト | フォトリソグラフィパターン製造方法 |
JP3600713B2 (ja) * | 1997-08-06 | 2004-12-15 | 東京応化工業株式会社 | ポジ型ホトレジスト組成物 |
JP3369471B2 (ja) | 1998-05-29 | 2003-01-20 | 東京応化工業株式会社 | ポジ型ホトレジスト組成物およびレジストパターンの形成方法 |
JP3729641B2 (ja) | 1998-05-29 | 2005-12-21 | 東京応化工業株式会社 | ポジ型ホトレジスト組成物およびレジストパターンの形成方法 |
JP3688469B2 (ja) | 1998-06-04 | 2005-08-31 | 東京応化工業株式会社 | ポジ型ホトレジスト組成物およびこれを用いたレジストパターンの形成方法 |
US6387982B1 (en) | 1998-11-23 | 2002-05-14 | Dentsply Detrey G.M.B.H. | Self etching adhesive primer composition and polymerizable surfactants |
JP3499165B2 (ja) | 1999-09-27 | 2004-02-23 | 東京応化工業株式会社 | ポジ型ホトレジスト組成物、感光性膜付基板、およびレジストパターンの形成方法 |
JP4179579B2 (ja) | 2000-05-08 | 2008-11-12 | 東洋合成工業株式会社 | 1,2−ナフトキノンジアジド系感光剤の製造方法 |
JP2002035684A (ja) * | 2000-07-28 | 2002-02-05 | Clariant (Japan) Kk | 保護膜の形成方法 |
US6964838B2 (en) * | 2001-01-17 | 2005-11-15 | Tokyo Ohka Kogyo Co., Ltd. | Positive photoresist composition |
JP3708049B2 (ja) | 2001-12-26 | 2005-10-19 | 東京応化工業株式会社 | ポジ型ホトレジスト組成物 |
JP2003195495A (ja) | 2001-12-26 | 2003-07-09 | Tokyo Ohka Kogyo Co Ltd | ポジ型ホトレジスト組成物 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5153096A (en) * | 1988-01-26 | 1992-10-06 | Fuji Photo Film Co., Ltd. | Positive type photoresist composition comprising as a photosensitive ingredient a derivative of a triphenylmethane condensed with an o-quinone diazide |
US5384228A (en) * | 1992-04-14 | 1995-01-24 | Tokyo Ohka Kogyo Co., Ltd. | Alkali-developable positive-working photosensitive resin composition |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05204148A (ja) * | 1992-01-27 | 1993-08-13 | Sumitomo Chem Co Ltd | レジスト組成物の製造方法 |
JP3466218B2 (ja) * | 1992-06-04 | 2003-11-10 | 住友化学工業株式会社 | ポジ型レジスト組成物 |
-
1995
- 1995-03-08 JP JP07048219A patent/JP3139319B2/ja not_active Expired - Lifetime
-
1996
- 1996-02-29 SG SG9606126A patent/SG81886A1/en unknown
- 1996-03-07 EP EP96103563A patent/EP0731074B1/en not_active Expired - Lifetime
- 1996-03-07 KR KR1019960005887A patent/KR100395581B1/ko not_active IP Right Cessation
- 1996-03-07 DE DE69604314T patent/DE69604314T2/de not_active Expired - Lifetime
- 1996-03-08 US US08/613,243 patent/US5726217A/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5153096A (en) * | 1988-01-26 | 1992-10-06 | Fuji Photo Film Co., Ltd. | Positive type photoresist composition comprising as a photosensitive ingredient a derivative of a triphenylmethane condensed with an o-quinone diazide |
US5384228A (en) * | 1992-04-14 | 1995-01-24 | Tokyo Ohka Kogyo Co., Ltd. | Alkali-developable positive-working photosensitive resin composition |
Also Published As
Publication number | Publication date |
---|---|
KR100395581B1 (ko) | 2003-11-28 |
DE69604314D1 (de) | 1999-10-28 |
JP3139319B2 (ja) | 2001-02-26 |
KR960034162A (ko) | 1996-10-22 |
JPH08245461A (ja) | 1996-09-24 |
DE69604314T2 (de) | 2000-03-02 |
EP0731074A2 (en) | 1996-09-11 |
EP0731074A3 (en) | 1997-01-08 |
US5726217A (en) | 1998-03-10 |
EP0731074B1 (en) | 1999-09-22 |
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