SG81886A1 - Tetraphenol compounds & process for producing the same - Google Patents

Tetraphenol compounds & process for producing the same

Info

Publication number
SG81886A1
SG81886A1 SG9606126A SG1996006126A SG81886A1 SG 81886 A1 SG81886 A1 SG 81886A1 SG 9606126 A SG9606126 A SG 9606126A SG 1996006126 A SG1996006126 A SG 1996006126A SG 81886 A1 SG81886 A1 SG 81886A1
Authority
SG
Singapore
Prior art keywords
producing
same
tetraphenol compounds
tetraphenol
compounds
Prior art date
Application number
SG9606126A
Other languages
English (en)
Inventor
Ichikawa Koji
Osaki Haruyoshi
Tomioka Jun
Original Assignee
Sumitomo Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=12797311&utm_source=***_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=SG81886(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Sumitomo Chemical Co filed Critical Sumitomo Chemical Co
Publication of SG81886A1 publication Critical patent/SG81886A1/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C245/00Compounds containing chains of at least two nitrogen atoms with at least one nitrogen-to-nitrogen multiple bond
    • C07C245/02Azo compounds, i.e. compounds having the free valencies of —N=N— groups attached to different atoms, e.g. diazohydroxides
    • C07C245/06Azo compounds, i.e. compounds having the free valencies of —N=N— groups attached to different atoms, e.g. diazohydroxides with nitrogen atoms of azo groups bound to carbon atoms of six-membered aromatic rings
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/01Sulfonic acids
    • C07C309/28Sulfonic acids having sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
    • C07C309/45Sulfonic acids having sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing nitrogen atoms, not being part of nitro or nitroso groups, bound to the carbon skeleton
    • C07C309/52Sulfonic acids having sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing nitrogen atoms, not being part of nitro or nitroso groups, bound to the carbon skeleton the carbon skeleton being further substituted by doubly-bound oxygen atoms
    • C07C309/53Sulfonic acids having sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing nitrogen atoms, not being part of nitro or nitroso groups, bound to the carbon skeleton the carbon skeleton being further substituted by doubly-bound oxygen atoms the carbon skeleton containing carbon atoms of quinone rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C39/00Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
    • C07C39/12Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings
    • C07C39/15Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings with all hydroxy groups on non-condensed rings, e.g. phenylphenol

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
SG9606126A 1995-03-08 1996-02-29 Tetraphenol compounds & process for producing the same SG81886A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP07048219A JP3139319B2 (ja) 1995-03-08 1995-03-08 テトラフェノール系化合物、その製法および用途

Publications (1)

Publication Number Publication Date
SG81886A1 true SG81886A1 (en) 2001-08-21

Family

ID=12797311

Family Applications (1)

Application Number Title Priority Date Filing Date
SG9606126A SG81886A1 (en) 1995-03-08 1996-02-29 Tetraphenol compounds & process for producing the same

Country Status (6)

Country Link
US (1) US5726217A (ja)
EP (1) EP0731074B1 (ja)
JP (1) JP3139319B2 (ja)
KR (1) KR100395581B1 (ja)
DE (1) DE69604314T2 (ja)
SG (1) SG81886A1 (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3512191B2 (ja) * 1994-09-12 2004-03-29 シーメンス アクチエンゲゼルシヤフト フォトリソグラフィパターン製造方法
JP3600713B2 (ja) * 1997-08-06 2004-12-15 東京応化工業株式会社 ポジ型ホトレジスト組成物
JP3369471B2 (ja) 1998-05-29 2003-01-20 東京応化工業株式会社 ポジ型ホトレジスト組成物およびレジストパターンの形成方法
JP3729641B2 (ja) 1998-05-29 2005-12-21 東京応化工業株式会社 ポジ型ホトレジスト組成物およびレジストパターンの形成方法
JP3688469B2 (ja) 1998-06-04 2005-08-31 東京応化工業株式会社 ポジ型ホトレジスト組成物およびこれを用いたレジストパターンの形成方法
US6387982B1 (en) 1998-11-23 2002-05-14 Dentsply Detrey G.M.B.H. Self etching adhesive primer composition and polymerizable surfactants
JP3499165B2 (ja) 1999-09-27 2004-02-23 東京応化工業株式会社 ポジ型ホトレジスト組成物、感光性膜付基板、およびレジストパターンの形成方法
JP4179579B2 (ja) 2000-05-08 2008-11-12 東洋合成工業株式会社 1,2−ナフトキノンジアジド系感光剤の製造方法
JP2002035684A (ja) * 2000-07-28 2002-02-05 Clariant (Japan) Kk 保護膜の形成方法
US6964838B2 (en) * 2001-01-17 2005-11-15 Tokyo Ohka Kogyo Co., Ltd. Positive photoresist composition
JP3708049B2 (ja) 2001-12-26 2005-10-19 東京応化工業株式会社 ポジ型ホトレジスト組成物
JP2003195495A (ja) 2001-12-26 2003-07-09 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト組成物

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5153096A (en) * 1988-01-26 1992-10-06 Fuji Photo Film Co., Ltd. Positive type photoresist composition comprising as a photosensitive ingredient a derivative of a triphenylmethane condensed with an o-quinone diazide
US5384228A (en) * 1992-04-14 1995-01-24 Tokyo Ohka Kogyo Co., Ltd. Alkali-developable positive-working photosensitive resin composition

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05204148A (ja) * 1992-01-27 1993-08-13 Sumitomo Chem Co Ltd レジスト組成物の製造方法
JP3466218B2 (ja) * 1992-06-04 2003-11-10 住友化学工業株式会社 ポジ型レジスト組成物

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5153096A (en) * 1988-01-26 1992-10-06 Fuji Photo Film Co., Ltd. Positive type photoresist composition comprising as a photosensitive ingredient a derivative of a triphenylmethane condensed with an o-quinone diazide
US5384228A (en) * 1992-04-14 1995-01-24 Tokyo Ohka Kogyo Co., Ltd. Alkali-developable positive-working photosensitive resin composition

Also Published As

Publication number Publication date
KR100395581B1 (ko) 2003-11-28
DE69604314D1 (de) 1999-10-28
JP3139319B2 (ja) 2001-02-26
KR960034162A (ko) 1996-10-22
JPH08245461A (ja) 1996-09-24
DE69604314T2 (de) 2000-03-02
EP0731074A2 (en) 1996-09-11
EP0731074A3 (en) 1997-01-08
US5726217A (en) 1998-03-10
EP0731074B1 (en) 1999-09-22

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