SG71206A1 - Method of manufacturing semi-conductor silicon single crystal wafer - Google Patents
Method of manufacturing semi-conductor silicon single crystal waferInfo
- Publication number
- SG71206A1 SG71206A1 SG1999001850A SG1999001850A SG71206A1 SG 71206 A1 SG71206 A1 SG 71206A1 SG 1999001850 A SG1999001850 A SG 1999001850A SG 1999001850 A SG1999001850 A SG 1999001850A SG 71206 A1 SG71206 A1 SG 71206A1
- Authority
- SG
- Singapore
- Prior art keywords
- single crystal
- silicon single
- crystal wafer
- conductor silicon
- manufacturing semi
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10122142A JPH11314997A (ja) | 1998-05-01 | 1998-05-01 | 半導体シリコン単結晶ウェーハの製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG71206A1 true SG71206A1 (en) | 2000-03-21 |
Family
ID=14828661
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG1999001850A SG71206A1 (en) | 1998-05-01 | 1999-04-16 | Method of manufacturing semi-conductor silicon single crystal wafer |
Country Status (6)
Country | Link |
---|---|
US (1) | US6117231A (ja) |
EP (1) | EP0953658A1 (ja) |
JP (1) | JPH11314997A (ja) |
KR (1) | KR19990087977A (ja) |
SG (1) | SG71206A1 (ja) |
TW (1) | TW513768B (ja) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6214704B1 (en) * | 1998-12-16 | 2001-04-10 | Memc Electronic Materials, Inc. | Method of processing semiconductor wafers to build in back surface damage |
WO2000055397A1 (fr) * | 1999-03-16 | 2000-09-21 | Shin-Etsu Handotai Co., Ltd. | Procede de production d'une tranche de silicium et tranche de silicium ainsi obtenue |
JP3988307B2 (ja) | 1999-03-26 | 2007-10-10 | 株式会社Sumco | シリコン単結晶、シリコンウェーハ及びエピタキシャルウェーハ |
US20020142170A1 (en) | 1999-07-28 | 2002-10-03 | Sumitomo Metal Industries, Ltd. | Silicon single crystal, silicon wafer, and epitaxial wafer |
JP3787472B2 (ja) * | 1999-11-12 | 2006-06-21 | 信越半導体株式会社 | シリコンウエーハおよびその製造方法ならびにシリコンウエーハの評価方法 |
US6565652B1 (en) * | 2001-12-06 | 2003-05-20 | Seh America, Inc. | High resistivity silicon wafer and method of producing same using the magnetic field Czochralski method |
US6576501B1 (en) | 2002-05-31 | 2003-06-10 | Seh America, Inc. | Double side polished wafers having external gettering sites, and method of producing same |
JP4092993B2 (ja) * | 2002-09-13 | 2008-05-28 | 信越半導体株式会社 | 単結晶育成方法 |
US7112509B2 (en) * | 2003-05-09 | 2006-09-26 | Ibis Technology Corporation | Method of producing a high resistivity SIMOX silicon substrate |
JP5188673B2 (ja) * | 2005-06-09 | 2013-04-24 | 株式会社Sumco | Igbt用のシリコンウェーハ及びその製造方法 |
JP4760729B2 (ja) | 2006-02-21 | 2011-08-31 | 株式会社Sumco | Igbt用のシリコン単結晶ウェーハ及びigbt用のシリコン単結晶ウェーハの製造方法 |
JP5560546B2 (ja) * | 2008-08-28 | 2014-07-30 | 株式会社Sumco | シリコンウェーハ及びその製造方法 |
JP2010056316A (ja) * | 2008-08-28 | 2010-03-11 | Sumco Corp | シリコンウェーハ及びその製造方法 |
AU2020328504A1 (en) | 2019-08-09 | 2022-02-17 | Leading Edge Equipment Technologies, Inc. | Producing a ribbon or wafer with regions of low oxygen concentration |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4659421A (en) * | 1981-10-02 | 1987-04-21 | Energy Materials Corporation | System for growth of single crystal materials with extreme uniformity in their structural and electrical properties |
JPH02263793A (ja) * | 1989-04-05 | 1990-10-26 | Nippon Steel Corp | 酸化誘起積層欠陥の発生し難いシリコン単結晶及びその製造方法 |
JP2686460B2 (ja) * | 1990-03-12 | 1997-12-08 | 住友シチックス株式会社 | 単結晶製造方法 |
JP2640315B2 (ja) * | 1993-03-22 | 1997-08-13 | 住友シチックス株式会社 | シリコン単結晶の製造方法 |
JP3274246B2 (ja) * | 1993-08-23 | 2002-04-15 | コマツ電子金属株式会社 | エピタキシャルウェーハの製造方法 |
-
1998
- 1998-05-01 JP JP10122142A patent/JPH11314997A/ja active Pending
-
1999
- 1999-04-12 TW TW088105780A patent/TW513768B/zh not_active IP Right Cessation
- 1999-04-13 EP EP99302829A patent/EP0953658A1/en not_active Withdrawn
- 1999-04-13 US US09/290,261 patent/US6117231A/en not_active Expired - Fee Related
- 1999-04-16 SG SG1999001850A patent/SG71206A1/en unknown
- 1999-04-28 KR KR1019990015216A patent/KR19990087977A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
TW513768B (en) | 2002-12-11 |
KR19990087977A (ko) | 1999-12-27 |
JPH11314997A (ja) | 1999-11-16 |
US6117231A (en) | 2000-09-12 |
EP0953658A1 (en) | 1999-11-03 |
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