SG68712A1 - Continuous gas saturation system and method - Google Patents

Continuous gas saturation system and method

Info

Publication number
SG68712A1
SG68712A1 SG1999001250A SG1999001250A SG68712A1 SG 68712 A1 SG68712 A1 SG 68712A1 SG 1999001250 A SG1999001250 A SG 1999001250A SG 1999001250 A SG1999001250 A SG 1999001250A SG 68712 A1 SG68712 A1 SG 68712A1
Authority
SG
Singapore
Prior art keywords
continuous gas
gas saturation
saturation system
continuous
saturation
Prior art date
Application number
SG1999001250A
Other languages
English (en)
Inventor
Douglas B Nurmi
Original Assignee
Air Liquide
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Liquide filed Critical Air Liquide
Publication of SG68712A1 publication Critical patent/SG68712A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S261/00—Gas and liquid contact apparatus
    • Y10S261/29—Heaters submerged in liquid

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Chemical Vapour Deposition (AREA)
SG1999001250A 1998-02-27 1999-02-25 Continuous gas saturation system and method SG68712A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US7629498P 1998-02-27 1998-02-27
US09/251,744 US6135433A (en) 1998-02-27 1999-02-18 Continuous gas saturation system and method

Publications (1)

Publication Number Publication Date
SG68712A1 true SG68712A1 (en) 1999-11-16

Family

ID=26757922

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1999001250A SG68712A1 (en) 1998-02-27 1999-02-25 Continuous gas saturation system and method

Country Status (7)

Country Link
US (2) US6135433A (de)
EP (1) EP0939145B1 (de)
JP (1) JPH11317374A (de)
KR (1) KR19990072962A (de)
DE (1) DE69907299T2 (de)
SG (1) SG68712A1 (de)
TW (1) TW463206B (de)

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GB9929279D0 (en) * 1999-12-11 2000-02-02 Epichem Ltd An improved method of and apparatus for the delivery of precursors in the vapour phase to a plurality of epitaxial reactor sites
JP3741253B2 (ja) * 1999-12-24 2006-02-01 富士通株式会社 薬品製造装置
US6443435B1 (en) * 2000-10-23 2002-09-03 Applied Materials, Inc. Vaporization of precursors at point of use
DE10059386A1 (de) * 2000-11-30 2002-06-13 Aixtron Ag Verfahren und Vorrichtung zur dosierten Abgabe kleiner Flüssigkeitsvolumenströme
US6761109B2 (en) 2001-03-28 2004-07-13 The Boc Group, Inc. Apparatus and method for mixing a gas and a liquid
US6863268B2 (en) * 2001-11-27 2005-03-08 Chaojiong Zhang Dew point humidifier (DPH) and related gas temperature control
US6715743B2 (en) * 2001-11-27 2004-04-06 Chaojiong Zhang Gas humidifier
US7008658B2 (en) 2002-05-29 2006-03-07 The Boc Group, Inc. Apparatus and method for providing treatment to a continuous supply of food product by impingement
US7011299B2 (en) * 2002-09-16 2006-03-14 Matheson Tri-Gas, Inc. Liquid vapor delivery system and method of maintaining a constant level of fluid therein
US6988717B2 (en) * 2003-12-15 2006-01-24 Chemflow Systems, Inc. Method and system for near saturation humidification of a gas flow
US7416170B2 (en) * 2004-09-21 2008-08-26 Jablonski Thaddeus M Carbonator with remote liquid level sensor
KR100625320B1 (ko) * 2005-03-18 2006-09-20 세메스 주식회사 기판 세정 설비의 기능수 공급 장치
KR100697691B1 (ko) * 2005-07-27 2007-03-20 삼성전자주식회사 소스 가스 공급 유닛 및 이를 갖는 화학 기상 증착 장치
US20090032982A1 (en) * 2007-07-31 2009-02-05 Air Liquide System and method for providing a gas mixture
JP2009045619A (ja) * 2007-08-22 2009-03-05 Jong Hoo Park 集約型微細気泡発生装置
GB0718801D0 (en) * 2007-09-25 2007-11-07 P2I Ltd Vapour delivery system
GB0718686D0 (en) * 2007-09-25 2007-10-31 P2I Ltd Vapour delivery system
GB0802687D0 (en) * 2008-02-14 2008-03-19 P2I Ltd Vapour delivery system
JP5690498B2 (ja) * 2009-03-27 2015-03-25 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． 基体上に膜を堆積する方法および気化前駆体化合物を送達する装置
US20120042838A1 (en) * 2009-04-21 2012-02-23 Horiba Stec, Co., Ltd. Liquid source vaporizer
US8889081B2 (en) 2009-10-15 2014-11-18 Medivators Inc. Room fogging disinfection system
JP2013512080A (ja) 2009-12-03 2013-04-11 ミンテック コーポレーション 医療装置を噴霧によって浄化する容器及びシステム
US8555809B2 (en) * 2010-01-14 2013-10-15 Rohm And Haas Electronic Materials, Llc Method for constant concentration evaporation and a device using the same
US8852693B2 (en) 2011-05-19 2014-10-07 Liquipel Ip Llc Coated electronic devices and associated methods
WO2012173756A1 (en) 2011-05-27 2012-12-20 Minntech Corporation Decontamination system including environmental control using a decontaminating substance
DE102013103603A1 (de) * 2013-04-10 2014-10-16 Osram Opto Semiconductors Gmbh Verfahren zum Versorgen eines Prozesses mit einem angereicherten Trägergas
US9957612B2 (en) 2014-01-17 2018-05-01 Ceres Technologies, Inc. Delivery device, methods of manufacture thereof and articles comprising the same
DE102018118771B4 (de) 2018-08-02 2022-07-07 Leoni Kabel Gmbh Verfahren und Vorrichtung zum reproduzierbaren Erzeugen einer Preform für die Glasfaserherstellung
JP6887688B2 (ja) * 2019-02-07 2021-06-16 株式会社高純度化学研究所 蒸発原料用容器、及びその蒸発原料用容器を用いた固体気化供給システム
JP6901153B2 (ja) * 2019-02-07 2021-07-14 株式会社高純度化学研究所 薄膜形成用金属ハロゲン化合物の固体気化供給システム。
CN110567546A (zh) * 2019-09-26 2019-12-13 张家港市江南锅炉压力容器有限公司 一种气体自饱和装置
CN111554565A (zh) * 2020-05-08 2020-08-18 四川广瑞半导体有限公司 硅8英寸大功率元器件外延片制备工艺

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US3323578A (en) * 1964-12-11 1967-06-06 Gen Motors Corp Method and apparatus for controlling temperatures
US3987133A (en) * 1975-09-05 1976-10-19 Fisher Scientific Company Humidifier
US4212663A (en) * 1978-01-26 1980-07-15 Corning Glass Works Reactants delivery system for optical waveguide manufacturing
US4436674A (en) * 1981-07-30 1984-03-13 J.C. Schumacher Co. Vapor mass flow control system
FR2560064A1 (fr) * 1984-02-29 1985-08-30 Air Liquide Procede d'obtention de solutions a forte teneur en gaz dissous, solutions obtenues et installation de mise en oeuvre
DE3708967A1 (de) * 1987-03-19 1988-10-06 Merck Patent Gmbh Vorrichtung zur erzeugung eines gasgemisches nach dem saettigungsverfahren
NL9002164A (nl) * 1990-10-05 1992-05-06 Philips Nv Werkwijze voor het voorzien van een substraat van een oppervlaktelaag vanuit een damp en een inrichting voor het toepassen van een dergelijke werkwijze.
US5078922A (en) * 1990-10-22 1992-01-07 Watkins-Johnson Company Liquid source bubbler
JP3208671B2 (ja) * 1991-06-06 2001-09-17 日本酸素株式会社 気相成長方法及び装置
JP2000252269A (ja) * 1992-09-21 2000-09-14 Mitsubishi Electric Corp 液体気化装置及び液体気化方法
JPH06196415A (ja) * 1992-12-25 1994-07-15 Kawasaki Steel Corp 気相成長用ガス供給方法及びその装置
JP2996101B2 (ja) * 1994-08-05 1999-12-27 信越半導体株式会社 液体原料ガスの供給方法および装置
JP3770409B2 (ja) * 1995-01-06 2006-04-26 東京エレクトロン株式会社 Ｈｍｄｓ供給装置

Also Published As

Publication number Publication date
US6283066B1 (en) 2001-09-04
DE69907299T2 (de) 2004-02-19
TW463206B (en) 2001-11-11
JPH11317374A (ja) 1999-11-16
EP0939145A1 (de) 1999-09-01
EP0939145B1 (de) 2003-05-02
KR19990072962A (ko) 1999-09-27
DE69907299D1 (de) 2003-06-05
US6135433A (en) 2000-10-24

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