SG60116A1 - Device and method for sensing wafer-shaped objects and shelves in a container - Google Patents

Device and method for sensing wafer-shaped objects and shelves in a container

Info

Publication number
SG60116A1
SG60116A1 SG1997003422A SG1997003422A SG60116A1 SG 60116 A1 SG60116 A1 SG 60116A1 SG 1997003422 A SG1997003422 A SG 1997003422A SG 1997003422 A SG1997003422 A SG 1997003422A SG 60116 A1 SG60116 A1 SG 60116A1
Authority
SG
Singapore
Prior art keywords
shelves
container
shaped objects
sensing wafer
wafer
Prior art date
Application number
SG1997003422A
Other languages
English (en)
Inventor
Klaus Schultz
Sebastaian Kaden
Original Assignee
Jenoptik Jena Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jenoptik Jena Gmbh filed Critical Jenoptik Jena Gmbh
Publication of SG60116A1 publication Critical patent/SG60116A1/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/137—Associated with semiconductor wafer handling including means for charging or discharging wafer cassette

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Image Processing (AREA)
  • Geophysics And Detection Of Objects (AREA)
SG1997003422A 1997-07-03 1997-09-16 Device and method for sensing wafer-shaped objects and shelves in a container SG60116A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19728478A DE19728478C2 (de) 1997-07-03 1997-07-03 Verfahren zur optoelektronischen Erkennung von scheibenförmigen Objekten unter Nutzung derer Stirnseiten

Publications (1)

Publication Number Publication Date
SG60116A1 true SG60116A1 (en) 1999-02-22

Family

ID=7834564

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1997003422A SG60116A1 (en) 1997-07-03 1997-09-16 Device and method for sensing wafer-shaped objects and shelves in a container

Country Status (8)

Country Link
US (1) US6211514B1 (ja)
JP (1) JP3604542B2 (ja)
KR (1) KR100218898B1 (ja)
DE (1) DE19728478C2 (ja)
FR (1) FR2765729B1 (ja)
GB (1) GB2327122B (ja)
SG (1) SG60116A1 (ja)
TW (1) TW378269B (ja)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19535871C2 (de) * 1995-09-27 2000-02-10 Jenoptik Jena Gmbh Indexer für Magazinfächer eines Magazins und darin enthaltene scheibenförmige Objekte
US6390754B2 (en) * 1997-05-21 2002-05-21 Tokyo Electron Limited Wafer processing apparatus, method of operating the same and wafer detecting system
US6202482B1 (en) * 1998-03-23 2001-03-20 Lehighton Electronics, Inc. Method and apparatus for testing of sheet material
DE19814046C1 (de) * 1998-03-30 1999-11-18 Jenoptik Jena Gmbh Anordnung zur Detektion von scheibenförmigen Objekten in einer Kassette
DE10045203C2 (de) 2000-09-13 2002-08-01 Infineon Technologies Ag Prüfvorrichtung und Verfahren zum Feststellen einer Kerben- beziehungsweise Nockenposition bei Scheiben
DE10204408B4 (de) * 2002-02-04 2007-02-15 Promos Technologies, Inc. Vorrichtung und Verfahren zur Verhinderung einer Verschmutzung eines Substratpositionsaufzeichnungssystems in einem SMIF-System mit korrodierenden Gasen, die sich auf den Substraten befinden
WO2003080479A2 (en) * 2002-03-20 2003-10-02 Fsi International, Inc. Systems and methods incorporating an end effector with a rotatable and/or pivotable body and/or an optical sensor having a light path that extends along a length of the end effector
US6885116B2 (en) * 2002-05-06 2005-04-26 Jeffrey G. Knirck Moving coil linear motor positioning stage with a concentric aperture
DE10250353B4 (de) 2002-10-25 2008-04-30 Brooks Automation (Germany) Gmbh Einrichtung zur Detektion von übereinander mit einem bestimmten Abstand angeordneten Substraten
JP2004325389A (ja) * 2003-04-28 2004-11-18 Renesas Technology Corp 端部検査装置
DE102004035010B4 (de) * 2004-07-20 2006-04-27 Leuze Electronic Gmbh & Co Kg Optischer Sensor
US8207748B2 (en) * 2004-08-11 2012-06-26 Lehighton Electronics, Inc. Device and handling system for measurement of mobility and sheet charge density
US8428706B2 (en) * 2005-11-14 2013-04-23 Austin Blew Sheet conductance/resistance measurement system
DE102014117104B4 (de) * 2014-11-21 2021-04-08 Bdt Media Automation Gmbh Verfahren zur Kalibrierung einer Robotik relativ zu einem Lagermagazin

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NO125195B (ja) 1968-10-24 1972-07-31 Goete Einar Erling Blomberg
JPS5931814B2 (ja) * 1978-06-19 1984-08-04 オムロン株式会社 反射形光電スイッチ
US4895486A (en) * 1987-05-15 1990-01-23 Roboptek, Inc. Wafer monitoring device
JP3135243B2 (ja) 1989-11-28 2001-02-13 キヤノン株式会社 画像データ送受信方法及びそれに使用する装置
DE4013743A1 (de) * 1990-04-28 1991-11-07 Klaschka Ind Elektronik Optischer abstandsschalter
DE4238834A1 (en) * 1991-11-18 1993-05-19 Fusion Systems Corp Robotic semiconductor wafer transporter with vertical photodetector array - scans detectors to determine which slots are occupied by wafers illuminated from emitter on robot arm
JPH06244268A (ja) * 1993-02-16 1994-09-02 Tokyo Electron Tohoku Ltd 移載装置
US5605428A (en) * 1993-03-05 1997-02-25 Jenoptik Gmbh Device for indexing magazine compartments and wafer-shaped objects in the compartments
DE4311691C2 (de) * 1993-04-08 1996-07-04 Sick Erwin Gmbh Verfahren zum Justieren eines Lichtabstandstasters und Lichtabstandstaster
US5418382A (en) * 1993-09-23 1995-05-23 Fsi International, Inc. Substrate location and detection apparatus
US5504345A (en) * 1994-04-14 1996-04-02 Hama Laboratories, Inc. Dual beam sensor and edge detection system and method
DE19535871C2 (de) * 1995-09-27 2000-02-10 Jenoptik Jena Gmbh Indexer für Magazinfächer eines Magazins und darin enthaltene scheibenförmige Objekte
US5822213A (en) * 1996-03-29 1998-10-13 Lam Research Corporation Method and apparatus for determining the center and orientation of a wafer-like object

Also Published As

Publication number Publication date
DE19728478C2 (de) 2003-08-21
US6211514B1 (en) 2001-04-03
GB2327122A (en) 1999-01-13
KR19990013225A (ko) 1999-02-25
FR2765729A1 (fr) 1999-01-08
JPH1140651A (ja) 1999-02-12
FR2765729B1 (fr) 2001-06-22
DE19728478A1 (de) 1999-02-04
GB9720143D0 (en) 1997-11-26
KR100218898B1 (ko) 1999-09-01
GB2327122B (en) 1999-09-08
TW378269B (en) 2000-01-01
JP3604542B2 (ja) 2004-12-22

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