SG47370A1 - Substrate independent superpolishing process and slurry - Google Patents

Substrate independent superpolishing process and slurry

Info

Publication number
SG47370A1
SG47370A1 SG1995002236A SG1995002236A SG47370A1 SG 47370 A1 SG47370 A1 SG 47370A1 SG 1995002236 A SG1995002236 A SG 1995002236A SG 1995002236 A SG1995002236 A SG 1995002236A SG 47370 A1 SG47370 A1 SG 47370A1
Authority
SG
Singapore
Prior art keywords
slurry
substrate independent
superpolishing
superpolishing process
independent
Prior art date
Application number
SG1995002236A
Other languages
English (en)
Inventor
Van Den Brent Hartog
Dennis Leonard Fox
James Aloysius Hagan
John Chen Shen
Kannimagnlam V Viswanathan
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Publication of SG47370A1 publication Critical patent/SG47370A1/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y10S977/86—Scanning probe structure
    • Y10S977/863—Atomic force probe
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/88—Manufacture, treatment, or detection of nanostructure with arrangement, process, or apparatus for testing
    • Y10S977/881—Microscopy or spectroscopy, e.g. sem, tem
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/888—Shaping or removal of materials, e.g. etching
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/895—Manufacture, treatment, or detection of nanostructure having step or means utilizing chemical property
SG1995002236A 1994-01-21 1994-12-20 Substrate independent superpolishing process and slurry SG47370A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/184,718 US6236542B1 (en) 1994-01-21 1994-01-21 Substrate independent superpolishing process and slurry

Publications (1)

Publication Number Publication Date
SG47370A1 true SG47370A1 (en) 1998-04-17

Family

ID=22678061

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1995002236A SG47370A1 (en) 1994-01-21 1994-12-20 Substrate independent superpolishing process and slurry

Country Status (4)

Country Link
US (2) US6236542B1 (ja)
EP (1) EP0664540A3 (ja)
JP (1) JP3159423B2 (ja)
SG (1) SG47370A1 (ja)

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JPH09190626A (ja) * 1995-11-10 1997-07-22 Kao Corp 研磨材組成物、磁気記録媒体用基板及びその製造方法並びに磁気記録媒体
JP3211683B2 (ja) 1996-07-18 2001-09-25 株式会社日立製作所 情報記録ディスク用ガラス基板
SG65718A1 (en) * 1996-12-27 1999-06-22 Hoya Corp Glass substrate for information recording medium method of manufacturing the substrate magnetic recording medium using the glass substrate and method of manufacturing the medium
CN100449616C (zh) * 1999-02-12 2009-01-07 通用电气公司 数据存储介质及其形成方法、压印衬底及检索数据的方法
JP4028163B2 (ja) 1999-11-16 2007-12-26 株式会社デンソー メカノケミカル研磨方法及びメカノケミカル研磨装置
US7416680B2 (en) * 2001-10-12 2008-08-26 International Business Machines Corporation Self-cleaning colloidal slurry composition and process for finishing a surface of a substrate
US6582279B1 (en) 2002-03-07 2003-06-24 Hitachi Global Storage Technologies Netherlands B.V. Apparatus and method for reclaiming a disk substrate for use in a data storage device
US7010939B2 (en) * 2002-06-05 2006-03-14 Hoya Corporation Glass substrate for data recording medium and manufacturing method thereof
US6911261B2 (en) * 2002-06-13 2005-06-28 International Business Machines Corporation pH adjustment of a melt for use in microetching glass substrates
US7001827B2 (en) * 2003-04-15 2006-02-21 International Business Machines Corporation Semiconductor wafer front side protection
US20050045852A1 (en) * 2003-08-29 2005-03-03 Ameen Joseph G. Particle-free polishing fluid for nickel-based coating planarization
JP2005138197A (ja) * 2003-11-04 2005-06-02 Fujimi Inc 研磨用組成物及び研磨方法
US7419421B2 (en) * 2004-05-04 2008-09-02 Seagate Technology Llc Slider having rounded corners and edges, and method for producing the same
WO2005123857A1 (en) * 2004-06-22 2005-12-29 Asahi Glass Company, Limited Polishing method for glass substrate, and glass substrate
JP2007257811A (ja) * 2006-03-24 2007-10-04 Hoya Corp 磁気ディスク用ガラス基板の製造方法および磁気ディスクの製造方法
US7820068B2 (en) * 2007-02-21 2010-10-26 Houghton Technical Corp. Chemical assisted lapping and polishing of metals
JP5013986B2 (ja) * 2007-06-22 2012-08-29 花王株式会社 ガラス基板の製造方法
JP5975654B2 (ja) 2011-01-27 2016-08-23 Hoya株式会社 磁気ディスク用ガラス基板の製造方法及び磁気ディスクの製造方法
MY165019A (en) 2011-03-31 2018-02-28 Hoya Corp Method of manufacturing a glass substrate for a magnetic disk and method of manufacturing a magnetic disk

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JPS55125976A (en) * 1979-03-15 1980-09-29 Nec Corp Method for finishing base plate to mirror finished surface
JPS5671821A (en) 1979-11-14 1981-06-15 Hitachi Ltd Substrate for magnetic disc and its manufacture
US4466218A (en) 1981-05-04 1984-08-21 International Business Machines Corporation Fixed abrasive polishing media
US4393628A (en) 1981-05-04 1983-07-19 International Business Machines Corporation Fixed abrasive polishing method and apparatus
US4459779A (en) 1982-09-16 1984-07-17 International Business Machines Corporation Fixed abrasive grinding media
US4475981A (en) 1983-10-28 1984-10-09 Ampex Corporation Metal polishing composition and process
JPS61291674A (ja) 1985-06-17 1986-12-22 Kobe Steel Ltd 研磨剤
JPS6225187A (ja) * 1985-07-25 1987-02-03 Fujimi Kenmazai Kogyo Kk メモリ−ハ−ドデイスクの研磨用組成物
JPS6226623A (ja) 1985-07-26 1987-02-04 Hoya Corp 磁気記録媒体
JPS6243819A (ja) 1985-08-22 1987-02-25 Tdk Corp 磁気記録媒体
US4645561A (en) 1986-01-06 1987-02-24 Ampex Corporation Metal-polishing composition and process
DE3629582A1 (de) 1986-08-30 1988-03-03 Basf Ag Verfahren zur oberflaechenbearbeitung scheibenfoermiger vernickelter aluminiumsubstrate
EP0263512B1 (en) 1986-10-09 1994-06-01 Asahi Glass Company Ltd. Glass substrate for a magnetic disc and process for its production
JP2737901B2 (ja) * 1987-09-09 1998-04-08 旭硝子株式会社 磁気ディスク用ガラス基板の製造方法
JPS6419525A (en) * 1987-07-13 1989-01-23 Ayao Wada Substrate for magnetic disk
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JPH02190258A (ja) 1989-01-20 1990-07-26 Nkk Corp チタン板の両面研磨方法
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US5202810A (en) 1989-04-27 1993-04-13 Hitachi, Ltd. Magnetic disk having an improved surface configuration
JPH02285518A (ja) * 1989-04-27 1990-11-22 Yamaha Corp 磁気記録ディスク基板の製法
US4959113C1 (en) 1989-07-31 2001-03-13 Rodel Inc Method and composition for polishing metal surfaces
JP2640276B2 (ja) 1989-07-31 1997-08-13 富士写真フイルム株式会社 磁気記録媒体
CA2033004C (en) 1989-12-25 2000-03-07 Iwao Okazaki Magnetic recording medium
JPH0495221A (ja) * 1990-08-10 1992-03-27 Hitachi Ltd 薄膜磁気ディスクの製造方法
JPH04170715A (ja) * 1990-11-02 1992-06-18 Tdk Corp 磁気ディスク用ガラス基板
US5268207A (en) 1990-12-21 1993-12-07 International Business Machines Corporation Texturing the surface of a recording disk using particle impact
JPH04259908A (ja) * 1991-02-15 1992-09-16 Kobe Steel Ltd 磁気ディスク基板
US5166006A (en) 1991-06-03 1992-11-24 Hmt Technology Corporation Textured thin-film substrate and method
US5149338A (en) * 1991-07-22 1992-09-22 Fulton Kenneth W Superpolishing agent, process for polishing hard ceramic materials, and polished hard ceramics
JPH05234054A (ja) * 1992-02-25 1993-09-10 Matsushita Electric Ind Co Ltd 磁気ディスク媒体用基板
JPH05303735A (ja) * 1992-04-27 1993-11-16 Hitachi Ltd 磁気ディスクおよび磁気ディスク装置
US5374412A (en) 1992-07-31 1994-12-20 Cvd, Inc. Highly polishable, highly thermally conductive silicon carbide
US5302434A (en) 1992-08-07 1994-04-12 International Business Machines Corporation Magnetic recording disk for contact recording
US5340370A (en) 1993-11-03 1994-08-23 Intel Corporation Slurries for chemical mechanical polishing
US5487931A (en) 1993-12-02 1996-01-30 Annacone; William R. Rigid disc substrate comprising a central hard core substrate with a hard, thermally and mechanically matched overlying smoothing layer and method for making the same
US5552204A (en) * 1995-01-13 1996-09-03 International Business Machines Corporation Magnetic disk with boron carbide overcoat layer

Also Published As

Publication number Publication date
EP0664540A2 (en) 1995-07-26
EP0664540A3 (en) 1996-05-29
JP3159423B2 (ja) 2001-04-23
JPH07240025A (ja) 1995-09-12
US6801396B1 (en) 2004-10-05
US6236542B1 (en) 2001-05-22

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