SG172432A1 - Monolithic stage positioning system and method - Google Patents
Monolithic stage positioning system and method Download PDFInfo
- Publication number
- SG172432A1 SG172432A1 SG2011047867A SG2011047867A SG172432A1 SG 172432 A1 SG172432 A1 SG 172432A1 SG 2011047867 A SG2011047867 A SG 2011047867A SG 2011047867 A SG2011047867 A SG 2011047867A SG 172432 A1 SG172432 A1 SG 172432A1
- Authority
- SG
- Singapore
- Prior art keywords
- monolithic stage
- linear
- forcers
- stage
- axis
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 17
- 230000009021 linear effect Effects 0.000 claims abstract description 76
- 238000004804 winding Methods 0.000 claims abstract description 69
- 230000005294 ferromagnetic effect Effects 0.000 claims abstract description 28
- 230000005291 magnetic effect Effects 0.000 claims description 65
- 238000013519 translation Methods 0.000 claims description 14
- 230000036316 preload Effects 0.000 abstract description 3
- 230000014616 translation Effects 0.000 description 11
- 230000008901 benefit Effects 0.000 description 5
- 230000001133 acceleration Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000010438 granite Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000009022 nonlinear effect Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000013598 vector Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
- H02K41/02—Linear motors; Sectional motors
- H02K41/03—Synchronous motors; Motors moving step by step; Reluctance motors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N15/00—Holding or levitation devices using magnetic attraction or repulsion, not otherwise provided for
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K2201/00—Specific aspects not provided for in the other groups of this subclass relating to the magnetic circuits
- H02K2201/18—Machines moving with multiple degrees of freedom
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K7/00—Arrangements for handling mechanical energy structurally associated with dynamo-electric machines, e.g. structural association with mechanical driving motors or auxiliary dynamo-electric machines
- H02K7/08—Structural association with bearings
- H02K7/09—Structural association with bearings with magnetic bearings
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Electromagnetism (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Linear Motors (AREA)
- Machine Tool Units (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Magnetic Bearings And Hydrostatic Bearings (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Control Of Linear Motors (AREA)
Abstract
A magnetically levitated monolithic stage positioning system includes linear three phase motors and coil windings connected to the monolithic stage that interact with a ferromagnetic base. The linear three phase motors may be excited to provide motion in an X-axis direction, motion in a Y-axis direction, and rotation about a Z-axis. The monolithic stage is levitated on an air bearing. The plurality of coil windings connected to the monolithic stage may serve to magnetically preload the air bearing. The plurality of coil windings may be excited to provide motion in a Z-axis direction and rotation of the monolithic stage about the X-axis and about the Y-axis.
Description
MONOLITHIC STAGE POSITIONING SYSTEM AND METHOD
[0001] This disclosure relates to positioning systems and methods utilizing a monolithic stage.
Background Information
[0002] Positioning systems may be used in a variety of contexts for positioning a workpiece with respect to a tool. For example, in laser processing systems, a workpiece is typically carried on a table and positioned, before a laser beam is brought to bear on the workpiece. Traditional positioning systems utilize X-Y translation tables, which may include stacked and split designs.
[0003] In a stacked stage positioning system, the lower stage supports the inertial mass of the upper stage, which supports a workpiece. Such systems typically move the workpiece relative to a laser beam. The upper stage and lower stage may provide motion control in orthogonal dimensions. In one implementation of a stacked stage design, the X-axis motion stage carries the Y-axis motion stage. In such a configuration, the X-axis motion stage typically has less acceleration and bandwidth because it carries the mass of the Y-axis motion stage. The Y-axis motion stage is typically lighter, and is able to deliver greater acceleration and bandwidth. Stacked stage positioning systems typically account for motion dynamics caused by the relative motion of one portion of the stage to the other. These motion dynamics may result in non-linear effects arising from the moving center of gravity of the X stage as the Y stage moves relative to the X stage.
[0004] In split axis positioning systems, the upper stage is not supported by, and moves independently from, the lower stage. The workpiece is typically carried on the lower stage while a tool, such as a fixed reflecting mirror and focusing lens, is carried on the upper stage. A split axis design decouples driven stage motion along two perpendicular axes lying in separate, parallel planes. A split stage design has a benefit of a kinematic loop between the two axes passing through the force frame, which is typically a heavy granite block; however, split stages may exhibit problems of repeatability between the upper stage and the lower stage. Both stacked or split stage designs exhibit bearing tolerance stack-up (i.e., each bearing contributes some uncertainty to a process), which limits the precision of the positioning system.
[0005] A system for positioning a workpiece according to one embodiment utilizes a monolithic stage configured to support the workpiece. The monolithic stage includes a plurality of linear forcers. A ferromagnetic base is positioned below the monolithic stage. An air bearing is created between the stage and the ferromagnetic base. The air bearing provides a levitating force to the monolithic stage. A magnetic track is connected to the base plate, and creates a magnetic field. The linear forcers are each operable to carry a current through the magnetic field created by the magnetic track. The currents generate forces to provide planar motion to the monolithic stage in three degrees of freedom. A coil winding is attached to the monolithic stage, and provides motion in at least one other degree of freedom using magnetic attraction with the ferromagnetic base plate.
[0006] A method for positioning a workpiece according to another embodiment utilizes a monolithic stage that carries a workpiece. The method includes generating an air bearing between a ferromagnetic base and the monolithic stage by forcing pressurized air out of an orifice in the monolithic stage. The air bearing provides a levitating force to the monolithic stage. The method also includes generating a magnetic field using a magnetic track. Currents are selectively driven through a plurality of linear forcers attached to the monolithic stage in the presence of the magnetic field, such that the current selectively generates forces to provide planar motion to the driven linear forcers. Currents are also selectively driven through at least one coil winding attached to the monolithic stage to provide motion in at least one other degree of freedom using magnetic attraction with the ferromagnetic base.
[0007] Additional aspects and advantages will be apparent from the following detailed description of preferred embodiments, which proceeds with reference to the accompanying drawings.
[0008] FIG. 1 is a top view of a monolithic positioning system according to one embodiment.
[0009] FIG. 2 is a perspective view of a magnetic track according to one embodiment.
[0010] FIG. 3 is a side view of a monolithic stage according to one embodiment.
[0011] FIG. 4 is an elevation view from the bottom of the monolithic stage according to one embodiment.
[0012] FIG. 5A is a side view of a monolithic stage at a maximum flying height according to one embodiment.
[0013] FIG. 5B is a side view of a monolithic stage at an intermediate flying height according to one embodiment.
[0014] FIG. 5C is a side view of a monolithic stage at a minimum height according to one embodiment.
[0015] FIG. 5D is a side view of a monolithic stage rotated clockwise about the Y- axis according to one embodiment.
[0016] FIG. 5E is a side view of a monolithic stage rotated counterclockwise about the Y-axis according to one embodiment.
[0017] In the following description, numerous specific details are provided for a thorough understanding of the embodiments disclosed herein. However, those skilled in the art will recognize that the embodiments can be practiced without one or more of the specific details, or with other methods, components, or materials.
Further, in some cases, well-known structures, materials, or operations are not shown or described in detail in order to avoid obscuring aspects of the embodiments.
Furthermore, the described features, structures, or characteristics may be combined in any suitable manner in one or more embodiments.
[0018] Disclosed herein are embodiments of a monolithic stage positioning system including linear motors for motion in the X-axis and Y-axis directions, and magnetically levitated air bearings having multiple coil windings connected to the monolithic stage that interact with a ferromagnetic base. A monolithic stage positioning system as disclosed herein has an advantage over stacked stage positioning systems due to a lack of mechanical compliance between the coupled axes, and over split stage positioning systems due to eliminating the adverse effects of cross-axis bearing dynamics. A monolithic stage positioning system as disclosed herein may further reduce the complexity and associated cost of coordinated motion control of multiple moving masses. A monolithic stage as disclosed herein may allow for driving forces to be symmetric about the center of mass of the monolithic stage. Accordingly, undesired angular motion may be reduced or eliminated.
[0019] A monolithic stage positioning system is applicable to many uses in semiconductor processing including dicing, component trim, fuse processing, scribing, memory repair, singulation, inking, printed wire board (PWB) via drilling,
routing, inspection, and metrology. The advantages afforded by such a design are also of benefit to a whole class of mechanical machining tools.
[0020] The monolithic stage is levitated with one or more air bearings, and may translate in the X-axis and the Y-axis directions by coordinating the efforts of a plurality of linear motors. In one embodiment, two opposing linear motors provide motive force in the X-axis direction, and two opposing linear motors provide motive force in the Y-axis direction. Each linear motor includes a linear forcer and a magnetic track. Current passes through the linear forcer and interacts with the magnetic field created by the magnetic track to generate linear motive force.
Opposing pairs of linear motors may be driven in different directions to generate rotation about the Z-axis. Accordingly, the plurality of linear motors may allow the monolithic stage to move with three degrees of freedom.
[0021] One or more coil windings may be attached to the monolithic stage and may be selectively excited to generate an attractive force with respect to the ferromagnetic base. The plurality of coil windings may serve to magnetically preload the air bearing. The plurality of coil windings may be excited by a common mode current to translate the monolithic stage in the Z-axis direction. Differential control over the plurality of coil windings may allow rotation of the monolithic stage about the
X-axis and about the Y-axis. Accordingly, the plurality of coil windings attached to the monolithic stage may allow the monolithic stage to move with an additional three degrees of freedom.
[0022] Utilizing the plurality of linear motors in concert with the plurality of coil windings attached to the monolithic stage may allow the motion of the monolithic stage to be controlled with six degrees of freedom without mechanical contact with a supporting force frame. The monolithic stage is primarily moveable in the X-axis direction and the Y-axis direction. The range of motion in the remaining four degrees of freedom (i.e. Z-axis translation, and rotation about each of the X-axis, Y- axis, and Z-axis) is small relative to the range of motion in the X-axis and the Y-axis directions. A monolithic stage with six degrees of freedom may eliminate the need for a secondary (fine) positioning system.
[0023] FIG. 1 illustrates one embodiment of a positioning system 100 comprising a monolithic stage 101 and a magnetic track 102. A chuck 115 is attached to the monolithic stage 101 and may support a workpiece (not shown). A carriage (shown as reference number 308 in FIG. 3) may be located below the chuck 115. The carriage 308 connects the chuck 115, structures (not shown) for generating an air bearing (shown as reference number 301 in FIG. 3), a plurality of coil windings (reference numbers 303, 304, 305, 306 in FIG. 4), and a plurality of linear forcers 107, 108, 109, 110. The monolithic stage 101 includes the carriage 308 (shown in
FIG. 3), the chuck 115, the plurality of coil windings 303, 304, 305, 306 (shown in
FIG. 4), and the linear forcers 107, 108, 109, 110. The magnetic track 102 defines a working area within which the chuck 115 may be positioned.
[0024] The illustrated embodiment of the positioning system 100 comprises four linear motors. Each linear motor includes a linear forcer and a section of magnetic track. A first linear motor includes the linear forcer 107 and a section 102-1 of the magnetic track 102. A second linear motor includes the linear forcer 108 and a section 102-2 of the magnetic track 102. A third linear motor includes the linear forcer 109 and a section 102-3 of the magnetic track 102. A fourth linear motor includes the linear forcer 110 and a section 102-4 of the magnetic track 102. A ferromagnetic base plate 116 is positioned under the monolithic stage 101. The ferromagnetic base may include any material that may be attracted by a magnet, including iron, nickel, cobalt, and other known magnetic materials. As described below, the ferromagnetic base plate 116, together with the plurality of coil windings 303, 304, 305, 306 (shown in FIG. 4) attached to the monolithic stage 101 allow for control of Z-axis translation, as well as rotation about the X-axis and the Y-axis.
[0025] FIG. 2 is a perspective view of the magnetic track 102. Each section of the magnetic track 102-1, 102-2, 102-3, 102-4 includes an upper and lower section.
Using section 102-3 of the magnetic track 102 as an example, an upper section 102- 3a includes a linear array of multiple magnets arranged along its length. Similarly the lower section 102-3b includes a linear array of multiple magnets arranged along its length. As illustrated, the polarity of the magnets arranged along the length of the track may alternate. A gap 201 exists between the upper section 102-3a and the lower section 102-3b. A linear forcer (not shown) may extend through the gap 201.
The ferromagnetic base 116 is positioned below the magnetic track 102. A plurality of support members 202, 203, 204, 205 provide support for the various sections of the magnetic track 102-1, 102-2, 102-3, 102-4. A substantially square magnetic track 102 is shown in FIG. 2; however, in alternative embodiments other geometries may also be used.
[0026] Returning to FIG. 1, currents flowing through the linear forcers 107, 108, 109, 110 interact with the magnetic field of the respective portion of the magnetic track 102 to provide motive force for positioning the monolithic stage 101 at a desired location. Linear forcers 107 and 109 provide motive force in the X-axis direction, while linear forcers 108 and 110 provide motive force in the Y-axis direction. As illustrated in FIG. 1, the linear forcers 107, 108, 109, 110 may extend beyond the magnetic track 102 through a gap between an upper section and a lower section. As such, the chuck 115 is moveable within a work area defined by the magnetic track 102.
[0027] The linear forcers 107, 108, 109, 110 may include three-phase coil windings. Three phase linear motors have constant acceleration as a function of position because the force vectors that contribute from each phase combine to give smooth forces and efficient motion. Three-phase coil windings may be desirable to reduce or eliminate cogging or force ripple, which may degrade the performance of the positioning system.
[0028] Translation in the X-axis direction and the Y-axis direction may be achieved with common mode current through symmetric opposing linear forcers. For example, common mode current through linear forcers 107 and 109 results in motion in the X-axis direction. Common mode current through linear forcers 108 and 110 results in motion in the Y-axis direction.
[0029] The linear motors may also allow for small angle rotation about the Z-axis (yaw). In one embodiment, rotation about the Z-axis may be less than approximately five degrees. The range of rotation may be limited because the efficiency of the linear motors decreases as a function of the cosine of the angle of rotation. Rotation about the Z-axis may be controlled with differential currents through symmetric opposing linear forcers. For example, differential currents through linear forcers 107 and 109 results in either a clockwise or counterclockwise rotation of the monolithic stage 101 with respect to the Z-axis. The direction of the rotation may be reversed by switching the polarity of the current flowing through linear forcers 107 and 109.
Similarly, rotation about the Z-axis may also be generated using linear forcers 108 and 110.
[0030] As illustrated in FIG. 1, linear forcers 107, 108, 109, 110 are symmetrically positioned about the monolithic stage 101. The symmetrical design allows for the monolithic stage 101 to be driven by forces that are symmetric about the center of mass. Symmetric forces driving the monolithic stage 101 are advantageous because undesired angular motion of the monolithic stage 101 may be reduced or eliminated.
[0031] In certain embodiments, control logic (not shown) for exciting coil windings in each linear forcer 107, 108, 109, 110 includes an encoder or interferometer in each dimension. Three encoders, three interferometers, or some combination thereof, may determine the position of the monolithic stage 101 along the X-axis, the
Y-axis, and the rotation about the Z-axis. Position information from the three interferometers and/or encoders may be used in a closed-loop control system to control X-axis and Y-axis translation, and rotation about the Z-axis. Three capacitive sensors may be employed to measure the distance between the bottom of the carriage and the ferromagnetic plate 116. Information from the capacitive sensors may be used in a closed-loop control system to control translation of the monolithic stage 101 in the Z-axis direction and the rotation of the monolithic stage 101 about the X-axis and the Y-axis. It is contemplated that reaction motors and masses may be incorporated into the system. The reaction motors and masses may apply forces to a stationary portion of the positioning system 100, which are directed opposite to the forces generated by the motion of the monolithic stage 101, such that no net motion is created by the motion of the monolithic stage 101.
[0032] Windings in each of the linear forcers 107, 108, 109, 110 are wound with appropriate consideration of the relationship of the windings and the magnetic field created by the magnetic track 102, so as to efficiently commutate in the direction of motion while allowing for motion in the lateral direction. As illustrated, only a portion of the linear forcers 107, 108, 109, 110 is within the magnetic field generated by the magnetic track at a given time. Accordingly, current may flow through portions of windings in the linear forcers 107, 108, 109, 110 that may not generate motive force.
The increased length of windings required in the system may result in increased electrical resistance; however, the monolithic stage 101 may have a large range of motion in both the X-axis and the Y-axis directions.
[0033] FIG. 3 is a side view of the monolithic stage 101. As illustrated in FIGS. 1 and 3, the configuration of the monolithic stage 101 is such that the linear forcers 107, 108, 109, 110 remain within their respective segments of the magnetic track 102 at any position within the work area defined by the magnetic track 102. The chuck 115 sits atop the carriage 308 and may carry a workpiece (not shown). The linear forcer 106 is connected to the carriage 308 and is disposed between an upper section 102-4a and a lower section 102-4b of magnetic track section 102-4.
Similarly, the linear forcer 106 is connected to the opposite side of the carriage 308, and is disposed between an upper section 102-2a and a lower section 102-2b of magnetic track section 102-2. In operation, an air bearing 301 is disposed between the monolithic stage 101 and the ferromagnetic base 116. The air bearing 301 is generated by pressurized air forced out of an orifice 302 on the bottom side of the carriage 308. The orifice 302 may be a porous face or other suitable structure. The escaping pressurized air exerts upward force on the monolithic stage 101, causing the monolithic stage 101 to levitate. Coil windings 304 and 306 (together with coil windings 303 and 305, shown in FIG. 4) are attached to the carriage 308, and may be selectively excited to exert attractive electromagnetic force with respect to the ferromagnetic base 116. The coil windings 303, 304, 305, 306 magnetically pre-load the air bearing 301 in order to increase the stiffness of the air bearing 301, and to control z-axis translation together with rotation about the X-axis and the Y-axis.
[0034] FIG. 4 shows an elevation view from the bottom of the monolithic stage 101. The coil windings 303, 304, 305, 306 are connected to the carriage 308 and allow for translation of the monolithic stage 101 in the Z-axis direction, as well as for rotation of the monolithic stage 101 about the X-axis (roll) and about the Y-axis (pitch). Accordingly, utilizing the linear motors and the coil windings 303, 304, 305, 306 of the monolithic stage 101, the monolithic stage 101 may be controlled in all three translations and all three rotations through proper electrical actuation of the linear motors and coil windings 303, 304, 305, 306. More or fewer coil windings than the number of windings shown in FIG. 4 may be attached to the carriage 308.
If, for example, a single coil winding is attached to the monolithic stage, the single coil winding may provide motion in at least one other degree of freedom. In alternative embodiments, the coil windings 303, 304, 305, 306 may be connected to the monolithic stage 101 in other locations than those locations illustrated in FIG. 4.
For example, in one embodiment, a coil winding may be attached to the monolithic stage 101 at the outer edge of each linear forcer 107, 108, 109, 110.
[0035] FIGS. 5A, 5B, 5C, 5D, and 5E illustrate the dynamics of motion that may be controlled using the coil windings 304, 306. Air bearings that are not magnetically preloaded are typically designed for a particular flying height and corresponding pressure. Altering the pressure of the air bearing 301 may provide some control over Z-axis translation; however, the range of motion that may be achieved by altering the pressure of the air bearing is limited, and may introduce non-linearity into the system. Further, increasing the pressure of the air bearing increases the stiffness of the air bearing. Magnetically preloaded air bearings allow greater control over flying height while alleviating these problems.
[0036] Translation in the Z-axis direction may be controlled by common current through the coil windings 304, 306. FIG. 5A shows a situation in which the coil windings 304, 306 are not excited, and thus are not magnetically attracted to the ferromagnetic base 116. The upward force of the pressurized air escaping from the orifice 302 and the weight of the monolithic stage 101 are at an equilibrium position.
The flying height 501 of the monolithic stage 101 is at its maximum when no attractive force is exerted by the coil windings 304, 306. The magnetic coupling of the coil windings 304, 306 may alter the equilibrium position by exerting attractive magnetic forces with respect to the ferromagnetic base 116.
[0037] FIG. 5B illustrates a situation in which the coil windings 304, 306 are excited with a common current, which is less than a maximum current. Magnetic attraction between the coil windings 304, 306 and the ferromagnetic base 116 reduces the flying height 501 in comparison to the flying height 501 in FIG. 5A. FIG. 5C illustrates that the coil windings are excited with the maximum amount of current, and accordingly the flying height 501 is at a minimum. A suitable range of adjustment of the flying height 501 using commercially available air bearings may be between a few microns and a few tens of microns. In one embodiment, the height may be adjusted by approximately 40 microns. FIGS. 5A, 5B, and 5C are not drawn to scale and the variation in flying height 501 is exaggerated for purposes of illustration.
[0038] FIGS. 5D and 5E illustrate that rotation about the X-axis and the Y-axis may be controlled by differential currents in the coil windings 304, 306. In FIG. 5D, the monolithic stage 101 is rotated clockwise about the Y-axis. The clockwise rotation may be achieved by causing a larger current to flow through the coil winding 304 than the current that flows through the coil winding 306. Accordingly, the coil winding 304 exerts a stronger attractive force than the attractive force exerted by the coil winding 306. In FIG. 5E, the monolithic stage 101 is rotated counterclockwise about the Y-axis. The counterclockwise rotation may be achieved by causing a larger current to flow through the coil winding 306 than the current that flows through the coil winding 304. Although not illustrated, one of skill in the art will recognize that rotation about the X-axis may be achieved by similarly driving differential currents through the coil windings 303 and 305 (as shown in FIG. 4). FIGS. 5D and 5E are not drawn to scale and the rotation is exaggerated for purposes of illustration. It may also be noted that the linear motors have been omitted in FIGS. 5A, 5B, 6C, 5D, and 5E for purposes of more clearly illustrating the dynamics of motion that may be controlled using the coil windings 304, 306.
[0039] It will be understood by those having skill in the art that many changes may be made to the details of the above-described embodiments without departing from the underlying principles of the invention. The scope of the present invention should, therefore, be determined only by the following claims.
Claims (20)
1. A system for positioning a workpiece, the system comprising: a monolithic stage configured to support the workpiece, the monolithic stage comprising a plurality of linear forcers; a ferromagnetic base positioned below the monolithic stage; an air bearing between the monolithic stage and the ferromagnetic base, the air bearing to provide a levitating force to the monolithic stage; a magnetic track coupled to the base plate, the magnetic track creating a magnetic field, the linear forcers each operable to carry a current through the magnetic field created by the magnetic track, the currents generating forces to provide planar motion to the monolithic stage in three degrees of freedom; and at least one coil winding attached to the monolithic stage, the at least one coil winding to provide motion in at least one other degree of freedom using magnetic attraction with the ferromagnetic base plate.
2. The system of claim 1, wherein at least one of the linear forcers extends beyond the magnetic track, and wherein the monolithic stage is configured to move the workpiece within a work area defined by the magnetic track.
3. The system of claim 1, wherein the linear forcers provide motion in an X-axis direction, motion in a Y-axis direction, and rotation about a Z-axis.
4. The system of claim 1, wherein the magnetic track comprises a plurality of individual magnets, and wherein the plurality of magnets is arranged such that the polarity of adjacent magnets alternates.
5. The system of claim 1, wherein the linear forcers are arranged symmetrically about the monolithic stage.
6. The system of claim 1, wherein the at least one coil winding comprises four coil windings, the four coil windings operable to provide translation in a Z-axis direction, rotation about an X-axis, and rotation about a Y-axis using magnetic attraction with the ferromagnetic base plate.
7. The system of claim 6, wherein the four coil windings are arranged symmetrically about the monolithic stage.
8. The system of claim 7, wherein the plurality of linear forcers and the four coil windings allow for the monolithic stage to be positioned with six degrees of freedom.
9. A method for positioning a workpiece, the method comprising: providing a monolithic stage to carry a workpiece; generating an air bearing between a ferromagnetic base and the monolithic stage by forcing pressurized air out of an orifice in the monolithic stage, the air bearing providing a levitating force to the monolithic stage; generating a magnetic field using a magnetic track; selectively driving a current through a plurality of linear forcers attached to the monolithic stage in the presence of the magnetic field, such that the current selectively generates forces to provide planar motion to the driven linear forcers; and selectively driving a current through at least one coil winding attached to the monolithic stage to provide motion in at least one other degree of freedom using magnetic attraction with the ferromagnetic base.
10. The method of claim 9, wherein at least one of the linear forcers extends beyond the magnetic track, and wherein the monolithic stage is configured to move the workpiece within a work area defined by the magnetic track.
11. The method of claim 9, wherein selectively driving a current through a plurality of linear forcers generates motion in an X-axis direction, motion in a Y-axis direction, and rotation about a Z-axis.
12. The method of claim 9, wherein the linear forcers are arranged symmetrically about the monolithic stage.
13. The method of claim 9, wherein the at least one coil winding comprises four coil windings, and wherein the method further comprises: selectively driving a current through the four coil windings generates translation in a Z-axis direction, rotation about an X-axis, and rotation about a Y-axis using magnetic attraction with the ferromagnetic base plate.
14. The method of claim 12, wherein the four coil windings are arranged symmetrically about the monolithic stage.
15. The system of claim 12, wherein the plurality of linear forcers and the four coil windings provide motion in six degrees of freedom.
16. A system for positioning a workpiece, the system comprising: means for carrying a workpiece on a monolithic stage; means for generating an air bearing between a ferromagnetic base and the monolithic stage by forcing pressurized air out of an orifice in the monolithic stage, the air bearing providing a levitating force to the monolithic stage;
means for generating a magnetic field using a magnetic track; means for selectively driving a current through a plurality of linear forcers attached to the monolithic stage in the presence of the magnetic field, such that the current selectively generates forces to provide planar motion to the driven linear forcers; and means for selectively driving a current through at least one coil winding attached to the monolithic stage to provide motion in at least one other degree of freedom using magnetic attraction with the ferromagnetic base.
17. The system of claim 16, wherein at least one of the linear forcers extends beyond the magnetic track, and wherein the monolithic stage is moveable within a work area defined by the magnetic track.
18. The system of claim 16, wherein the linear forcers are arranged symmetrically about the monolithic stage.
19. The system of claim 18, wherein the at least one coil winding comprises four coil windings, and wherein the method further comprises: selectively driving a current through the four coil windings generates translation in a Z-axis direction, rotation about an X-axis, and rotation about a Y-axis using magnetic attraction with the ferromagnetic base plate.
20. The system of claim 19, wherein the four coil windings are arranged symmetrically about the monolithic stage.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/347,551 US8084896B2 (en) | 2008-12-31 | 2008-12-31 | Monolithic stage positioning system and method |
PCT/US2009/069033 WO2010078120A2 (en) | 2008-12-31 | 2009-12-21 | Monolithic stage positioning system and method |
Publications (1)
Publication Number | Publication Date |
---|---|
SG172432A1 true SG172432A1 (en) | 2011-07-28 |
Family
ID=42283976
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG2011047867A SG172432A1 (en) | 2008-12-31 | 2009-12-21 | Monolithic stage positioning system and method |
Country Status (7)
Country | Link |
---|---|
US (1) | US8084896B2 (en) |
JP (1) | JP5575802B2 (en) |
KR (1) | KR20110107801A (en) |
CN (1) | CN102272914B (en) |
SG (1) | SG172432A1 (en) |
TW (1) | TWI498187B (en) |
WO (1) | WO2010078120A2 (en) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IN2014KN02583A (en) | 2012-01-18 | 2015-05-08 | Techfields Pharma Co Ltd | |
DE102012207082A1 (en) * | 2012-04-27 | 2013-10-31 | Physik Instrumente (Pi) Gmbh & Co. Kg | Highly soluble positioning device i.e. two coordinate stepper motor, has position measuring system whose measuring head is located in coil array free space such that rotor is free from electrical or electronic current-carrying parts |
WO2014189371A2 (en) * | 2013-05-21 | 2014-11-27 | Sanchez-Faddiev Hernando | A process and apparatus to manufacture a three-dimensional object |
CN104570612B (en) * | 2013-10-25 | 2016-09-28 | 上海微电子装备有限公司 | A kind of work stage contact pin arm device |
JP6427332B2 (en) * | 2014-04-08 | 2018-11-21 | 株式会社ミツトヨ | Image measuring machine |
JP2015229211A (en) * | 2014-06-04 | 2015-12-21 | 日本精工株式会社 | Automatic centering device of workpiece and automatic centering method |
WO2015195493A1 (en) | 2014-06-17 | 2015-12-23 | Kateeva, Inc. | Printing systems assemblies and methods |
NL2018266B1 (en) * | 2017-01-31 | 2018-08-16 | Ccm Beheer Bv | Planar positioning device |
CN108519693B (en) * | 2018-04-16 | 2021-10-29 | 京东方科技集团股份有限公司 | Substrate alignment device, substrate and substrate alignment method |
CN111069931B (en) * | 2019-11-20 | 2021-11-05 | 北京航星机器制造有限公司 | Machining equipment and method for machining inner wall of part cavity |
CN113714846B (en) * | 2020-12-15 | 2024-03-15 | 安徽远大轴承科技有限公司 | Repairing and positioning method for bearing ring positioning groove |
CN118003296B (en) * | 2024-04-09 | 2024-06-11 | 无锡星微科技有限公司杭州分公司 | Plane movement table |
CN118197980A (en) * | 2024-05-17 | 2024-06-14 | 上海隐冠半导体技术有限公司 | XY theta positioning device and control method thereof |
Family Cites Families (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62207165A (en) * | 1986-03-06 | 1987-09-11 | Omron Tateisi Electronics Co | Two-dimensional actuator |
US4857781A (en) * | 1988-07-13 | 1989-08-15 | Eastman Kodak Company | High-speed non-contact linear motor with magnetic levitation |
US5196745A (en) * | 1991-08-16 | 1993-03-23 | Massachusetts Institute Of Technology | Magnetic positioning device |
JP3216157B2 (en) | 1991-08-29 | 2001-10-09 | 松下電器産業株式会社 | Precision 1 stage 6 degrees of freedom stage |
DE19601018A1 (en) * | 1995-01-27 | 1996-08-01 | Zeiss Carl Fa | Linearly adjustable precision table for moving cover plate relative to base plate |
JP3709896B2 (en) * | 1995-06-15 | 2005-10-26 | 株式会社ニコン | Stage equipment |
US5925956A (en) | 1995-06-30 | 1999-07-20 | Nikon Corporation | Stage construction incorporating magnetically levitated movable stage |
JPH09239628A (en) | 1996-03-05 | 1997-09-16 | Canon Inc | Self-weight bearing device |
US5886432A (en) | 1997-04-28 | 1999-03-23 | Ultratech Stepper, Inc. | Magnetically-positioned X-Y stage having six-degrees of freedom |
JP3155936B2 (en) * | 1997-06-26 | 2001-04-16 | キヤノン株式会社 | Linear motor and stage apparatus, and scanning exposure apparatus and device manufacturing method using the same |
US6097114A (en) | 1998-08-17 | 2000-08-01 | Nikon Corporation | Compact planar motor having multiple degrees of freedom |
US6144118A (en) | 1998-09-18 | 2000-11-07 | General Scanning, Inc. | High-speed precision positioning apparatus |
JP2000243693A (en) * | 1999-02-23 | 2000-09-08 | Nikon Corp | Stage device and aligner |
JP2003022960A (en) * | 2001-07-09 | 2003-01-24 | Canon Inc | Stage unit and its driving method |
JP2003159679A (en) * | 2001-11-27 | 2003-06-03 | Juki Corp | Double-axis robot |
JP2003191140A (en) * | 2001-12-25 | 2003-07-08 | Canon Inc | Positioning device |
JP2004132435A (en) * | 2002-10-09 | 2004-04-30 | Canon Inc | Bearing device |
JPWO2004105105A1 (en) * | 2003-05-21 | 2006-07-20 | 株式会社ニコン | Stage apparatus, exposure apparatus, and device manufacturing method |
JP2005093637A (en) * | 2003-09-17 | 2005-04-07 | Canon Inc | Positioning device |
JP4455004B2 (en) * | 2003-10-16 | 2010-04-21 | キヤノン株式会社 | Hydrodynamic bearing device and stage device using the same |
WO2005106385A1 (en) | 2004-04-27 | 2005-11-10 | Sumitomo Heavy Industries, Ltd. | Detector and stage device |
WO2006059634A1 (en) * | 2004-12-01 | 2006-06-08 | Nikon Corporation | Stage device and exposure apparatus |
JP4664142B2 (en) * | 2005-07-21 | 2011-04-06 | 住友重機械工業株式会社 | Stage equipment |
US8803372B2 (en) | 2005-08-29 | 2014-08-12 | Koninklijke Philips N.V. | Ironless magnetic linear motors having levitating and transversal force capacities |
KR100726711B1 (en) * | 2005-12-30 | 2007-06-12 | 한국전기연구원 | Wide area movement stage with magnetic levitation technology |
TWI457193B (en) * | 2006-03-02 | 2014-10-21 | Sumitomo Heavy Industries | Stage device |
JP4702313B2 (en) * | 2007-03-22 | 2011-06-15 | ウシオ電機株式会社 | Stage equipment |
US20080285004A1 (en) | 2007-05-18 | 2008-11-20 | Nikon Corporation | Monolithic, Non-Contact Six Degree-of-Freedom Stage Apparatus |
CN101158815A (en) * | 2007-08-31 | 2008-04-09 | 上海微电子装备有限公司 | Air-float magnetic controlled precision movement platform |
-
2008
- 2008-12-31 US US12/347,551 patent/US8084896B2/en not_active Expired - Fee Related
-
2009
- 2009-12-21 JP JP2011543620A patent/JP5575802B2/en not_active Expired - Fee Related
- 2009-12-21 SG SG2011047867A patent/SG172432A1/en unknown
- 2009-12-21 WO PCT/US2009/069033 patent/WO2010078120A2/en active Application Filing
- 2009-12-21 CN CN200980153197.XA patent/CN102272914B/en not_active Expired - Fee Related
- 2009-12-21 KR KR1020117014803A patent/KR20110107801A/en active IP Right Grant
- 2009-12-28 TW TW098145245A patent/TWI498187B/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN102272914B (en) | 2014-09-24 |
WO2010078120A2 (en) | 2010-07-08 |
TW201029791A (en) | 2010-08-16 |
WO2010078120A3 (en) | 2010-10-07 |
JP5575802B2 (en) | 2014-08-20 |
JP2012514336A (en) | 2012-06-21 |
US8084896B2 (en) | 2011-12-27 |
US20100164305A1 (en) | 2010-07-01 |
TWI498187B (en) | 2015-09-01 |
CN102272914A (en) | 2011-12-07 |
KR20110107801A (en) | 2011-10-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US8084896B2 (en) | Monolithic stage positioning system and method | |
EP0523042B1 (en) | Ultrafast electro-dynamic x, y and theta positioning stage | |
Kim et al. | Positioning performance and straightness error compensation of the magnetic levitation stage supported by the linear magnetic bearing | |
JP4639517B2 (en) | Stage apparatus, lithography system, positioning method, and stage apparatus driving method | |
US5886432A (en) | Magnetically-positioned X-Y stage having six-degrees of freedom | |
US7036408B2 (en) | Lenslathe with vibration cancelling arrangement | |
JP5872744B2 (en) | Rotating positioning device | |
Shinno et al. | Nanometer positioning of a linear motor-driven ultraprecision aerostatic table system with electrorheological fluid dampers | |
WO2017142481A1 (en) | High precision localizing platforms | |
US5962937A (en) | X-Y table for moving loads in a highly exact and dynamic manner | |
JP2004172557A (en) | Stage apparatus and its control method | |
JPS62165019A (en) | Magnetic levitation slide | |
JP2716884B2 (en) | Flat motor device | |
Williams et al. | Six degrees of freedom Mag-Lev stage development | |
US20240167616A1 (en) | Positioning device for positioning a movable element | |
JP5549108B2 (en) | Superposition device, superposition method, and semiconductor device manufacturing method | |
JP2006020478A (en) | Stage device | |
JP5549191B2 (en) | Overlay device that aligns and superimposes multiple substrates | |
JPH11186156A (en) | Xy stage | |
JP2005150616A (en) | Fine adjustment stage | |
KR20230153257A (en) | Stage apparatus, transfer apparatus and article manufacturing method | |
JP3409864B2 (en) | Motor device having linear motor structure | |
Kim et al. | Design and control of a 6-DOF positioner with high precision | |
CN112928887A (en) | Displacement device | |
JPH0851756A (en) | Planar motor |