SG158040A1 - Substrate cleaning apparatus, substrate cleaning method, and storage medium - Google Patents

Substrate cleaning apparatus, substrate cleaning method, and storage medium

Info

Publication number
SG158040A1
SG158040A1 SG200904094-0A SG2009040940A SG158040A1 SG 158040 A1 SG158040 A1 SG 158040A1 SG 2009040940 A SG2009040940 A SG 2009040940A SG 158040 A1 SG158040 A1 SG 158040A1
Authority
SG
Singapore
Prior art keywords
substrate
substrate cleaning
brush
cleaning
cleaning apparatus
Prior art date
Application number
SG200904094-0A
Other languages
English (en)
Inventor
Nobuhiko Mouri
Satoru Tanaka
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2008159031A external-priority patent/JP4976341B2/ja
Priority claimed from JP2008159033A external-priority patent/JP4976343B2/ja
Priority claimed from JP2008159032A external-priority patent/JP4976342B2/ja
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of SG158040A1 publication Critical patent/SG158040A1/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
    • B08B1/12—Brushes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • A—HUMAN NECESSITIES
    • A46—BRUSHWARE
    • A46B—BRUSHES
    • A46B13/00—Brushes with driven brush bodies or carriers
    • A46B13/001—Cylindrical or annular brush bodies
    • A—HUMAN NECESSITIES
    • A46—BRUSHWARE
    • A46B—BRUSHES
    • A46B9/00—Arrangements of the bristles in the brush body
    • A46B9/005—Arrangements of the bristles in the brush body where the brushing material is not made of bristles, e.g. sponge, rubber or paper
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/50—Cleaning by methods involving the use of tools involving cleaning of the cleaning members
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/04—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by a combination of operations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • A—HUMAN NECESSITIES
    • A46—BRUSHWARE
    • A46B—BRUSHES
    • A46B13/00—Brushes with driven brush bodies or carriers
    • A46B13/02—Brushes with driven brush bodies or carriers power-driven carriers

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
SG200904094-0A 2008-06-18 2009-05-29 Substrate cleaning apparatus, substrate cleaning method, and storage medium SG158040A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2008159031A JP4976341B2 (ja) 2008-06-18 2008-06-18 基板洗浄装置および基板洗浄方法、ならびに記憶媒体
JP2008159033A JP4976343B2 (ja) 2008-06-18 2008-06-18 基板洗浄装置および基板洗浄方法、ならびに記憶媒体
JP2008159032A JP4976342B2 (ja) 2008-06-18 2008-06-18 基板洗浄装置および基板洗浄方法、ならびに記憶媒体

Publications (1)

Publication Number Publication Date
SG158040A1 true SG158040A1 (en) 2010-01-29

Family

ID=41429993

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200904094-0A SG158040A1 (en) 2008-06-18 2009-05-29 Substrate cleaning apparatus, substrate cleaning method, and storage medium

Country Status (4)

Country Link
US (1) US8356376B2 (ko)
KR (2) KR101267208B1 (ko)
SG (1) SG158040A1 (ko)
TW (1) TWI405253B (ko)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4813185B2 (ja) * 2006-01-17 2011-11-09 富士通セミコンダクター株式会社 ウェハの洗浄装置及び洗浄方法
DE102006007442A1 (de) * 2006-02-17 2007-08-23 BSH Bosch und Siemens Hausgeräte GmbH Reinigungsvorrichtung für ein Bauteil eines Haushaltswäschetrockners
JP5535687B2 (ja) * 2010-03-01 2014-07-02 株式会社荏原製作所 基板洗浄方法及び基板洗浄装置
TWI411025B (zh) * 2010-03-22 2013-10-01 Grand Plastic Technology Co Ltd 處理晶圓背面方向及角度可調之噴嘴
US20110296634A1 (en) * 2010-06-02 2011-12-08 Jingdong Jia Wafer side edge cleaning apparatus
JP5705666B2 (ja) * 2011-07-07 2015-04-22 東京エレクトロン株式会社 基板処理方法、基板処理システム及び基板処理プログラムを記憶したコンピュータ読み取り可能な記憶媒体
JP6181438B2 (ja) * 2013-06-24 2017-08-16 株式会社荏原製作所 基板保持装置および基板洗浄装置
JP6279276B2 (ja) * 2013-10-03 2018-02-14 株式会社荏原製作所 基板洗浄装置及び基板処理装置
TWI834489B (zh) * 2017-12-13 2024-03-01 日商東京威力科創股份有限公司 基板處理裝置
JP6957429B2 (ja) * 2018-09-18 2021-11-02 株式会社東芝 クリーナーヘッド、除去装置及び除去方法
CN111939296B (zh) * 2020-08-18 2021-12-14 吉安职业技术学院 一种计算机键盘用杀菌消毒装置
JP2022152042A (ja) * 2021-03-29 2022-10-12 株式会社ディスコ 研磨装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04331062A (ja) 1991-05-07 1992-11-18 Suteyoshi Numao ローラー
JPH0579939U (ja) 1992-03-30 1993-10-29 大日本スクリーン製造株式会社 基板洗浄具
JP3539834B2 (ja) 1997-02-10 2004-07-07 大日本スクリーン製造株式会社 基板洗浄方法および基板洗浄装置
JPH11283952A (ja) * 1998-03-30 1999-10-15 Shibaura Mechatronics Corp ブラシ洗浄装置
US6523553B1 (en) * 1999-03-30 2003-02-25 Applied Materials, Inc. Wafer edge cleaning method and apparatus
JP3953716B2 (ja) 2000-08-01 2007-08-08 株式会社荏原製作所 基板洗浄装置
JP2003151943A (ja) 2001-11-19 2003-05-23 Speedfam Clean System Co Ltd スクラブ洗浄装置
JP4125148B2 (ja) * 2003-02-03 2008-07-30 株式会社荏原製作所 基板処理装置
JP4486003B2 (ja) * 2005-07-07 2010-06-23 大日本スクリーン製造株式会社 基板洗浄ブラシ、ならびにこれを用いた基板処理装置および基板処理方法
JP2007157936A (ja) 2005-12-02 2007-06-21 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法
JP4589863B2 (ja) 2005-12-16 2010-12-01 大日本スクリーン製造株式会社 基板処理装置および基板処理方法
JP4813185B2 (ja) * 2006-01-17 2011-11-09 富士通セミコンダクター株式会社 ウェハの洗浄装置及び洗浄方法
JP2007273608A (ja) * 2006-03-30 2007-10-18 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法
JP4928343B2 (ja) * 2007-04-27 2012-05-09 大日本スクリーン製造株式会社 基板処理装置

Also Published As

Publication number Publication date
TW201003757A (en) 2010-01-16
US20090314311A1 (en) 2009-12-24
KR101276488B1 (ko) 2013-06-18
KR20120088639A (ko) 2012-08-08
TWI405253B (zh) 2013-08-11
KR20090131641A (ko) 2009-12-29
US8356376B2 (en) 2013-01-22
KR101267208B1 (ko) 2013-05-24

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